JP2005275029A - Back reflection mirror and pentaprism equipped with same - Google Patents

Back reflection mirror and pentaprism equipped with same Download PDF

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JP2005275029A
JP2005275029A JP2004088715A JP2004088715A JP2005275029A JP 2005275029 A JP2005275029 A JP 2005275029A JP 2004088715 A JP2004088715 A JP 2004088715A JP 2004088715 A JP2004088715 A JP 2004088715A JP 2005275029 A JP2005275029 A JP 2005275029A
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film
intermediate layer
reflective film
silver
back reflector
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JP2005275029A5 (en
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Shigeru Iketani
繁 池谷
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Nikon Corp
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Nikon Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a back reflection mirror excellent in corrosion resistance, and to provide a pentaprism equipped with the back reflection mirror. <P>SOLUTION: The corrosion of a silver is prevented by laminating a protective film 12 made of chrome oxide on a reflection film 11 made of silver laminated on a glass substrate 10. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

この発明は裏面反射鏡及びそれを備えるペンタプリズムに関する。   The present invention relates to a back reflector and a pentaprism having the same.

裏面反射鏡はガラス等の透明基板の裏面に反射層を形成してなる。透明基板の表面から入射した光は反射層で反射され、透明基板の表面から出射される。裏面反射鏡は例えばカメラのペンタプリズムの反射鏡として用いられる。   The back reflector is formed by forming a reflective layer on the back surface of a transparent substrate such as glass. Light incident from the surface of the transparent substrate is reflected by the reflective layer and emitted from the surface of the transparent substrate. The back surface reflecting mirror is used as a reflecting mirror of a pentaprism of a camera, for example.

反射層としては銀が多用されている。銀薄膜には他の金属薄膜と比べて可視光の反射率が高いという特性がある。   Silver is frequently used as the reflective layer. The silver thin film has a characteristic that the reflectance of visible light is higher than that of other metal thin films.

しかし、銀は大気中における耐食性に乏しく、酸化や硫化を起こし、長期間の使用によって銀薄膜が変色したり剥離したりする。このため、従来、銀薄膜の上に銅等の金属を蒸着し、その金属薄膜の上に更に吹付け塗装を行なったり、銀薄膜の上に酸化セリウムと金属層とで構成される保護層を形成したり(特開平7−5308号公報参照)する方法を用い、銀薄膜の腐食を防止している。
特開平7−5308号公報
However, silver has poor corrosion resistance in the atmosphere, causes oxidation and sulfurization, and the silver thin film is discolored or peeled off after long-term use. For this reason, conventionally, a metal such as copper is vapor-deposited on a silver thin film, and spray coating is further performed on the metal thin film, or a protective layer composed of a cerium oxide and a metal layer is formed on the silver thin film. Corrosion of the silver thin film is prevented by using a method of forming (see JP-A-7-5308).
Japanese Patent Laid-Open No. 7-5308

銀薄膜の上に銅を蒸着するとき、突沸(膜厚に比べて非常に大きい直径を有する銅粒子が激しく蒸発すること)により粒径の大きい銅粒子が銅薄膜に衝突し、銅粒子が銅薄膜を突き抜けて銀薄膜、更に透明基板の表面にまで達することがある。このとき、銅薄膜と銀薄膜との間に水分が入り込む。その結果、イオン化傾向に起因する電池作用によって銀薄膜に腐食が発生する。   When copper is deposited on a silver thin film, copper particles having a large particle size collide with the copper thin film due to bumping (copper particles having a diameter larger than the film thickness evaporate violently). It may penetrate the thin film and reach the surface of the silver thin film and further the transparent substrate. At this time, moisture enters between the copper thin film and the silver thin film. As a result, the silver thin film is corroded by the battery action resulting from the ionization tendency.

また、銀薄膜の上に酸化セリウムと金属層とで構成される保護層を形成しても、この保護層と銀薄膜との間に水分が入り込み、同様に銀薄膜に腐食が発生することは避けられなかった。   In addition, even if a protective layer composed of cerium oxide and a metal layer is formed on the silver thin film, moisture will enter between the protective layer and the silver thin film, and corrosion will occur in the silver thin film as well. It was inevitable.

上述のように、いずれの方法を用いても、銀薄膜の腐食を十分に防ぐことはできなかった。   As described above, the corrosion of the silver thin film could not be sufficiently prevented by using any method.

この発明はこのような事情に鑑みてなされたもので、その課題は耐食性に優れた裏面反射鏡及びそれを備えるペンタプリズムを提供することである。   The present invention has been made in view of such circumstances, and an object thereof is to provide a back reflector having excellent corrosion resistance and a pentaprism having the same.

上記課題を解決するため請求項1記載の発明は、銀を材料とする反射膜と、この反射膜に積層された酸化クロムを材料とする保護膜とを備えていることを特徴とする。   In order to solve the above problems, the invention described in claim 1 is characterized by comprising a reflective film made of silver and a protective film made of chromium oxide laminated on the reflective film.

請求項2記載の発明は、請求項1記載の裏面反射鏡において、前記保護膜の膜厚が10〜300nmであることを特徴とする。   According to a second aspect of the present invention, in the back reflector according to the first aspect, the protective film has a thickness of 10 to 300 nm.

請求項3記載の発明は、請求項1記載の裏面反射鏡において、前記保護膜の膜厚が50〜200nmであることを特徴とする。   According to a third aspect of the present invention, in the back reflector according to the first aspect, the protective film has a thickness of 50 to 200 nm.

請求項4記載の発明は、請求項1〜3のいずれか1項記載の裏面反射鏡において、前記反射膜は透明なプラスチック基板上に積層され、このプラスチック基板と前記反射膜との間に、一酸化珪素を材料とする第1の中間層と酸化アルミニウムを材料とする第2の中間層とが形成され、前記プラスチック基板の上に前記第1の中間層が位置し、前記第1の中間層の上に前記第2の中間層が位置し、前記第2の中間層の上に前記反射膜が位置していることを特徴とする。   According to a fourth aspect of the present invention, in the back reflector according to any one of the first to third aspects, the reflective film is laminated on a transparent plastic substrate, and between the plastic substrate and the reflective film, A first intermediate layer made of silicon monoxide and a second intermediate layer made of aluminum oxide are formed, the first intermediate layer is located on the plastic substrate, and the first intermediate layer The second intermediate layer is located on the layer, and the reflective film is located on the second intermediate layer.

請求項5記載の発明は、請求項1〜4のいずれか1項記載の裏面反射鏡を備えていることを特徴とするペンタプリズム。   The invention according to claim 5 is a pentaprism comprising the back reflector according to any one of claims 1 to 4.

以上に説明したようにこの発明によれば、耐食性に優れた裏面反射鏡及びそれを備えるペンタプリズムを提供することができる。   As described above, according to the present invention, a back reflector having excellent corrosion resistance and a pentaprism having the same can be provided.

以下、この発明の実施の形態を図面に基づいて説明する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings.

図1はこの発明の第1実施形態に係る裏面反射鏡の断面を示す概念図である。   FIG. 1 is a conceptual diagram showing a cross section of a back reflector according to the first embodiment of the present invention.

この裏面反射鏡は反射膜11と保護膜12と保護膜13とで構成されている。   This back reflector is composed of a reflective film 11, a protective film 12, and a protective film 13.

反射膜11は銀を材料として形成され、ガラス基板10の裏面(入射側と反対側の面)に積層されている。ガラス基板10はBK7(硼珪クラウンガラス(n=1、5163))を材料として形成されている。   The reflective film 11 is formed using silver as a material, and is laminated on the back surface (surface opposite to the incident side) of the glass substrate 10. The glass substrate 10 is made of BK7 (borosilicate crown glass (n = 1, 5163)).

保護膜12は酸化クロム(Cr23)を材料として形成され、反射膜11に積層されている。 The protective film 12 is formed using chromium oxide (Cr 2 O 3 ) as a material, and is laminated on the reflective film 11.

保護膜13はエポキシ樹脂製の塗料(例えばエポラ2000H(商標):日本特殊塗料株式会社)を材料として形成され、ガラス基板10、反射膜11及び保護膜12を覆っている。   The protective film 13 is formed using an epoxy resin paint (for example, Epola 2000H (trademark): Nippon Special Paint Co., Ltd.) and covers the glass substrate 10, the reflective film 11, and the protective film 12.

次に、裏面反射鏡の形成方法を説明する。   Next, a method for forming a back reflector will be described.

真空装置(図示せず)内を所定の真空度(2×10-5Torr)に設定し、裏面を洗浄したガラス基板10を配置し、その裏面に膜厚100〜300nmの銀の反射膜11を真空蒸着又はスパッタリングによって形成する。 A vacuum apparatus (not shown) is set to a predetermined degree of vacuum (2 × 10 −5 Torr), a glass substrate 10 having a cleaned back surface is disposed, and a silver reflective film 11 having a film thickness of 100 to 300 nm is disposed on the back surface. Is formed by vacuum evaporation or sputtering.

裏面反射鏡に求められる基本的な機能として、ガラス基板10の表面から入射した光を反射膜11で反射させなければならないが、反射膜11の膜厚が100nm未満になると、入射光の一部が反射膜を透過するため、反射率が低下する。入射光の透過を回避するには反射膜11の膜厚を100nm以上にすればよいが、反射膜11の膜厚が300nmを超えると、反射膜11に生じる引張り応力によってガラス基板10との密着性が低下し、反射膜11がガラス基板10から剥離する。そこで、反射膜11の膜厚を100〜300nmにすることが望ましい。   As a basic function required for the back reflector, light incident from the surface of the glass substrate 10 must be reflected by the reflective film 11, but when the thickness of the reflective film 11 becomes less than 100 nm, a part of the incident light is reflected. Is transmitted through the reflective film, the reflectivity decreases. In order to avoid the transmission of incident light, the thickness of the reflective film 11 may be set to 100 nm or more. However, when the thickness of the reflective film 11 exceeds 300 nm, the film is in close contact with the glass substrate 10 due to tensile stress generated in the reflective film 11. And the reflective film 11 peels from the glass substrate 10. Therefore, it is desirable that the thickness of the reflective film 11 be 100 to 300 nm.

次に、銀の反射膜11の上に膜厚10〜300nmの酸化クロムの保護膜12を真空蒸着又はスパッタリングによって形成する。このとき、製造誤差を考慮して酸化クロムの保護膜12の膜厚を50〜200nmとするのが好ましい。   Next, a chromium oxide protective film 12 having a thickness of 10 to 300 nm is formed on the silver reflective film 11 by vacuum deposition or sputtering. At this time, it is preferable that the film thickness of the protective film 12 of chromium oxide be 50 to 200 nm in consideration of manufacturing errors.

なお、膜厚が10nm未満の保護膜12を形成することは難しい。また、保護膜12の膜厚が300nmを超えると保護膜12に生じる引張り応力によって反射膜11との密着性が低下し、保護膜12が反射膜11から剥離する。   It is difficult to form the protective film 12 having a thickness of less than 10 nm. Further, when the thickness of the protective film 12 exceeds 300 nm, the adhesiveness with the reflective film 11 is lowered by the tensile stress generated in the protective film 12, and the protective film 12 is peeled off from the reflective film 11.

最後に、図1に示すように保護膜12の上に、エポキシ樹脂製の塗料で膜厚40μm程度に塗装して保護膜13を形成する。なお、図示しないが、エポキシ樹脂製の塗料で塗装する代わりに銅等の金属を蒸着してもよい。   Finally, as shown in FIG. 1, the protective film 13 is formed on the protective film 12 by coating with an epoxy resin paint to a film thickness of about 40 μm. Although not shown, a metal such as copper may be vapor-deposited instead of painting with an epoxy resin paint.

その結果、反射膜11が大気中に晒されなくなり、硫化水素ガス(H2S )等による反射膜11の腐食を低減できる。 As a result, the reflective film 11 is not exposed to the atmosphere, and corrosion of the reflective film 11 due to hydrogen sulfide gas (H 2 S) or the like can be reduced.

このようにして保護膜12,13を形成した後の裏面反射鏡の評価方法としてガス腐食試験がある。ガス腐食試験を以下のような条件(温度、湿度、濃度等)下で行うことがJISに規定されている。   There is a gas corrosion test as a method for evaluating the back reflector after the protective films 12 and 13 are formed in this manner. JIS stipulates that the gas corrosion test be performed under the following conditions (temperature, humidity, concentration, etc.).

温度40℃、湿度80%の環境下でCl2 (濃度0.1ppm)ガス雰囲気内に裏面反射鏡を放置した(JISC0090)。20時間後に裏面反射鏡を検査したところ、腐食は認められなかった。 The back reflector was left in a Cl 2 (concentration 0.1 ppm) gas atmosphere in an environment of a temperature of 40 ° C. and a humidity of 80% (JISC0090). When the back reflector was inspected after 20 hours, no corrosion was observed.

温度50℃、湿度90%の環境下でH2S (濃度15ppm)ガス雰囲気内に裏面反射鏡を放置した(JIS C0092)。20時間後に裏面反射鏡を検査したところ、腐食は認められなかった。 The back reflector was left in a H 2 S (concentration 15 ppm) gas atmosphere in an environment of temperature 50 ° C. and humidity 90% (JIS C0092). When the back reflector was inspected after 20 hours, no corrosion was observed.

この実施形態によれば、保護膜12,13によって銀を材料とする反射膜11の耐食性を向上させることができる。   According to this embodiment, the protective films 12 and 13 can improve the corrosion resistance of the reflective film 11 made of silver.

図2はこの発明の第2実施形態に係る裏面反射鏡の断面を示す概念図である。   FIG. 2 is a conceptual diagram showing a cross section of a back reflector according to the second embodiment of the present invention.

この裏面反射鏡は透明なプラスチック基板21と第1の中間層22と第2の中間層23と反射膜24と保護膜25とで構成される。   This back reflector is composed of a transparent plastic substrate 21, a first intermediate layer 22, a second intermediate layer 23, a reflective film 24, and a protective film 25.

プラスチック基板21の材料はポリカーボネート樹脂、アクリル樹脂等である。   The material of the plastic substrate 21 is polycarbonate resin, acrylic resin, or the like.

反射膜24は銀を材料として形成され、プラスチック基板21の裏面(入射側と反対側の面)に積層されている。   The reflection film 24 is formed using silver as a material, and is laminated on the back surface (surface opposite to the incident side) of the plastic substrate 21.

保護膜25は酸化クロム(Cr23)を材料として形成され、反射膜24に積層されている。 The protective film 25 is formed using chromium oxide (Cr 2 O 3 ) as a material, and is laminated on the reflective film 24.

透明なプラスチック基板21を用いた場合、反射膜24の密着性が不十分であることが多いため、その密着性を高める必要がある。   When the transparent plastic substrate 21 is used, the adhesion of the reflective film 24 is often insufficient, so that the adhesion needs to be improved.

そこで、プラスチック基板21と反射膜24との間に、一酸化珪素を材料とする第1の中間層22と酸化アルミニウムを材料とする第2の中間層23とを配置した。   Therefore, a first intermediate layer 22 made of silicon monoxide and a second intermediate layer 23 made of aluminum oxide are arranged between the plastic substrate 21 and the reflective film 24.

図2に示すように、プラスチック基板21の上に第1の中間層22が位置し、この第1の中間層22の上に第2の中間層23が位置し、この第2の中間層23の上に反射膜24が位置する。この構造によって、プラスチック基板21と反射膜24との密着性が向上する。   As shown in FIG. 2, the first intermediate layer 22 is located on the plastic substrate 21, the second intermediate layer 23 is located on the first intermediate layer 22, and the second intermediate layer 23 is located on the first intermediate layer 22. The reflective film 24 is located on the top. With this structure, the adhesion between the plastic substrate 21 and the reflective film 24 is improved.

保護膜25によって硫化水素ガス等による反射膜24の腐食を低減することができる。   The protective film 25 can reduce corrosion of the reflective film 24 due to hydrogen sulfide gas or the like.

次に、裏面反射鏡の形成方法を説明する。   Next, a method for forming a back reflector will be described.

真空装置(図示せず)内を所定の真空度(2×10-5Torr)に設定し、この真空装置内にプラスチック基板21を配置し、その裏面に一酸化珪素の第1の中間層22を真空蒸着又はスパッタリングによって形成する。 A vacuum device (not shown) is set to a predetermined degree of vacuum (2 × 10 −5 Torr), a plastic substrate 21 is disposed in the vacuum device, and a first intermediate layer 22 of silicon monoxide is provided on the back surface thereof. Is formed by vacuum evaporation or sputtering.

次に、第1の中間層22の上に酸化アルミニウムの第2の中間層23を真空蒸着又はスパッタリングによって形成する。   Next, a second intermediate layer 23 made of aluminum oxide is formed on the first intermediate layer 22 by vacuum evaporation or sputtering.

このとき、プラスチック基板21と反射膜24との密着性及び反射率を考慮して第1の中間層22の膜厚及び第2の中間層23の膜厚をそれぞれ5〜30nm及び20〜50nmにする。   At this time, the film thickness of the first intermediate layer 22 and the film thickness of the second intermediate layer 23 are set to 5 to 30 nm and 20 to 50 nm, respectively, in consideration of the adhesion between the plastic substrate 21 and the reflective film 24 and the reflectance. To do.

その後、第2の中間層23の上に膜厚100〜300nmの銀の反射膜24を真空蒸着又はスパッタリングによって形成する。   Thereafter, a silver reflective film 24 having a thickness of 100 to 300 nm is formed on the second intermediate layer 23 by vacuum deposition or sputtering.

最後に、銀の反射膜24の上に膜厚10〜300nmの酸化クロムの保護膜25を真空蒸着又はスパッタリングによって形成する。このとき、製造誤差を考慮して酸化クロムの保護膜25の膜厚を50〜200nmとするのが好ましい。   Finally, a protective film 25 of chromium oxide having a thickness of 10 to 300 nm is formed on the silver reflective film 24 by vacuum deposition or sputtering. At this time, it is preferable that the film thickness of the chromium oxide protective film 25 be 50 to 200 nm in consideration of manufacturing errors.

その結果、反射膜24が保護膜25で覆われ、反射膜24が大気中に晒されなくなる。   As a result, the reflective film 24 is covered with the protective film 25 and the reflective film 24 is not exposed to the atmosphere.

この実施形態によれば、第1実施形態と同様の効果を奏するとともに、プラスチック基板21と反射膜24との密着性が向上する。   According to this embodiment, the same effect as that of the first embodiment is achieved, and the adhesion between the plastic substrate 21 and the reflective film 24 is improved.

なお、プラスチック基板21、第1の中間層22、第2の中間層23、反射膜24、保護膜25を覆うように、エポキシ樹脂製の塗料で塗装したり、銅等の金属を蒸着したりしてもよい(図示せず)。これによって、裏面反射鏡の耐食性が一層向上する。   The plastic substrate 21, the first intermediate layer 22, the second intermediate layer 23, the reflective film 24, and the protective film 25 are covered with an epoxy resin paint, or a metal such as copper is evaporated. It may be done (not shown). This further improves the corrosion resistance of the back reflector.

また、上述の各実施形態の裏面反射鏡では銀の反射膜の特性が損なわれず、極めて良好な反射率を得られることが認められるので、それらの裏面反射鏡は可視域の全体に亘って高い反射率が求められるペンタプリズムの反射鏡に適する。   Moreover, since it is recognized that the characteristics of the silver reflecting film are not impaired in the back surface reflecting mirrors of the above-described embodiments and an extremely good reflectance can be obtained, the back surface reflecting mirrors are high over the entire visible range. Suitable for pentaprism reflectors that require reflectivity.

図1はこの発明の第1実施形態に係る裏面反射鏡の断面を示す概念図である。FIG. 1 is a conceptual diagram showing a cross section of a back reflector according to the first embodiment of the present invention. 図2はこの発明の第2実施形態に係る裏面反射鏡の断面を示す概念図である。FIG. 2 is a conceptual diagram showing a cross section of a back reflector according to the second embodiment of the present invention.

符号の説明Explanation of symbols

11,24 反射膜
12,25 保護膜
21 プラスチック基板
22 第1の中間層
23 第2の中間層
11,24 Reflective film 12,25 Protective film 21 Plastic substrate 22 First intermediate layer 23 Second intermediate layer

Claims (5)

銀を材料とする反射膜と、
この反射膜に積層された酸化クロムを材料とする保護膜と
を備えていることを特徴とする裏面反射鏡。
A reflective film made of silver,
And a protective film made of chromium oxide laminated on the reflective film.
前記保護膜の膜厚が10〜300nmであることを特徴とする請求項1記載の裏面反射鏡。   The back reflector according to claim 1, wherein the protective film has a thickness of 10 to 300 nm. 前記保護膜の膜厚が50〜200nmであることを特徴とする請求項1記載の裏面反射鏡。   The back reflector according to claim 1, wherein the protective film has a thickness of 50 to 200 nm. 前記反射膜は透明なプラスチック基板上に積層され、
このプラスチック基板と前記反射膜との間に、一酸化珪素を材料とする第1の中間層と酸化アルミニウムを材料とする第2の中間層とが形成され、
前記プラスチック基板の上に前記第1の中間層が位置し、前記第1の中間層の上に前記第2の中間層が位置し、前記第2の中間層の上に前記反射膜が位置していることを特徴とする請求項1〜3のいずれか1項記載の裏面反射鏡。
The reflective film is laminated on a transparent plastic substrate,
A first intermediate layer made of silicon monoxide and a second intermediate layer made of aluminum oxide are formed between the plastic substrate and the reflective film,
The first intermediate layer is located on the plastic substrate, the second intermediate layer is located on the first intermediate layer, and the reflective film is located on the second intermediate layer. The back reflector according to any one of claims 1 to 3, wherein
請求項1〜4のいずれか1項記載の裏面反射鏡を備えていることを特徴とするペンタプリズム。   A pentaprism comprising the back reflecting mirror according to claim 1.
JP2004088715A 2004-03-25 2004-03-25 Back reflection mirror and pentaprism equipped with same Pending JP2005275029A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009013944A1 (en) * 2007-07-23 2009-01-29 Toyo Kohan Co., Ltd. Light reflection plate, process for producing the light reflection plate, and light reflection apparatus
WO2009066101A1 (en) 2007-11-22 2009-05-28 Pilkington Group Limited Solar mirrorå
US8174748B2 (en) 2007-11-26 2012-05-08 Ricoh Company, Ltd. Mirror and optical scanning device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009013944A1 (en) * 2007-07-23 2009-01-29 Toyo Kohan Co., Ltd. Light reflection plate, process for producing the light reflection plate, and light reflection apparatus
US7857470B2 (en) 2007-07-23 2010-12-28 Toyo Kohan Co., Ltd. Light reflecting plate and method of manufacturing the same, and light reflecting device
WO2009066101A1 (en) 2007-11-22 2009-05-28 Pilkington Group Limited Solar mirrorå
US8174748B2 (en) 2007-11-26 2012-05-08 Ricoh Company, Ltd. Mirror and optical scanning device

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