JP2005266052A - Development replenisher supplement method of automatically developing machine for photosensitive lithographic printing plate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a development replenisher supplement method of an automatically developing machine for a photosensitive lithographic printing plate by which variation of sensitivity of a developer to the change of a developing treatment condition using a development replenisher having concentration of an electrolyte and a dregs dispersant higher than that of the developer can be suppressed to the minimum and dregs are not generated while a developing part of the automatically developing machine is made to be a simple and inexpensive construction. <P>SOLUTION: The development replenisher having concentration of the electrolyte and the dregs higher than that of the developer is supplemented for compensating reduction of development activity at the time of working and/or suspension of the automatically developing machine based on a preset supplement condition. After the development replenisher is supplemented for compensating reduction of developer activity due to treatment of a photosensitive material based on the preset supplement condition, when a measured value of electric conductivity of the developer to which the replenisher is supplemented is greater than the target value of electric conductivity calculated by using a replenisher replacement ratio and/or a supplement ratio in time and/or a developer dilution ratio, a dilution liquid is supplemented in a development vessel until the measured value of the electric conductivity is made to be lower than the target value of the electric conductivity. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a developer replenisher replenishment method for a photosensitive lithographic printing plate automatic developing machine, and more particularly to the change in developer sensitivity with respect to changes in development processing conditions in a developer / replenisher system containing an electrolyte and a residue dispersant. Concerning technology to minimize.

In recent years, the development of lasers has been remarkable. Especially, solid lasers and semiconductor lasers with light emitting regions from near infrared to infrared are easily available in high output and small size. These lasers are very useful as exposure light sources for the system. As an image recording material suitable for laser writing, for example, JP-A-7-285275 discloses a binder such as a cresol resin, a substance that generates heat by absorbing light, and a thermal decomposable material such as quinonediazide. In addition, there has been proposed a positive type image recording material containing a compound that can substantially reduce the solubility of the binder in a state before decomposition. This is a substance that generates heat by absorbing the light in the exposed area by near-infrared irradiation, and makes the exposed area alkali-soluble (heat mode type). Therefore, the thermal efficiency is low, and the solubility in an alkali developing solution in the development process is not satisfactory. For this reason, the alkali concentration of a developing solution was raised and the solubility of the exposed part was ensured. However, the heat mode type lithographic printing plate precursor has low resistance to alkali developing solution in the image area under the high concentration alkaline conditions as described above, and dissolves with only slight scratches on the surface of the image recording material. As a result, there are problems such as defects in the image area. In particular, the tendency was more remarkable in a positive type lithographic printing plate precursor using a polymer compound that is highly soluble in an alkaline aqueous solution. Therefore, there is a limit to increasing the alkali concentration of the alkali developer so that no residual film is formed in the non-image area, and it is difficult to form a sharp and clear image without causing defects in the formed image area. Met. In particular, in a fine image including a dot portion and a thin line, it is required to increase the sharpness and improve the reproducibility. Therefore, in the photosensitive lithographic printing plate automatic developing machine, as a method of managing the sensitivity of the developer,
(1) Replenish developer replenisher over time into the developer tank in which developer is stored, measure the plate area of the lithographic printing plate to be processed, and replenish developer replenisher in an amount corresponding to the measured value. Development replenisher over time and processing replenishment method (hereinafter referred to as "Area time-based replenishment method")
(2) A developer conductivity value at which the developer activity is appropriate is experimentally obtained in advance and set as a conductivity target value, and the automatic processor is operated and / or stopped based on preset replenishment conditions. The developer replenisher is replenished to compensate for a decrease in developing activity at the time, and the developer replenisher is compensated to compensate for a decrease in developer activity due to processing of the photosensitive lithographic printing plate based on preset replenishment conditions. After replenishing the solution and measuring the conductivity of the developer replenished with the developer replenisher at predetermined time intervals, if the conductivity measurement value exceeds the conductivity target value, There is a development replenishment method in an automatic developing machine that replenishes the developer with a diluting solution until a measured conductivity value falls below the target conductivity value.
In addition, many substances that absorb heat and generate heat in the exposed area by near-infrared irradiation are generally difficult to dissolve in an alkaline aqueous solution, and as the amount of processing increases, insoluble components precipitate in the developer. Furthermore, it adheres onto the plate being processed and may become soiled with printed matter. As a means for preventing this, there is a technique of adding a scum dispersant to a developer / replenisher.

However, such an area aging reference replenishment method requires a high-accuracy planographic printing plate area measuring device in the development processing section of the automatic processor, resulting in a complicated structure and high cost. . Further, it is difficult to determine whether the lithographic printing plate has only one side or both sides (hereinafter referred to as “single side / both sides”) and the type of plate (plates having different photosensitive layer coating amounts, etc.). For this reason, if the replenishment amount of the required development replenisher changes due to changes in the plate area, single side / both sides, and plate type of the lithographic printing plate, it becomes difficult to properly replenish the development replenishment amount. there were. Further, a developer conductivity value at which the developer activity is appropriate is experimentally obtained in advance and set as a conductivity target value. Based on the replenishment conditions set in advance, the automatic developer is operated and / or stopped. A developer replenisher is replenished to compensate for a decrease in development activity, and the developer replenisher is added to compensate for a decrease in developer activity due to processing of the photosensitive lithographic printing plate based on preset replenishment conditions. After replenishing and measuring the conductivity of the developer replenished with the developer replenisher at predetermined time intervals, if the conductivity measured value exceeds the conductivity target value, the conductivity the developing replenishing method for an automatic developing machine measurements to replenish the diluent to the developer to below the electric conductivity target value, for processing replenishment rate, time lapse replenishment amount is an amount crowded seen, the environmental CO ₂ concentration change Cannot be refilled accordingly. In addition, when water is replenished as a diluent, the concentration of the developer component may be extremely thin. For this reason, when the concentration of the residue dispersant in the replenisher is the same as that of the developer, the concentration of residue dispersant is reduced and it is difficult to maintain the residue prevention effect.

  In view of such circumstances, the present invention develops an exposed photosensitive lithographic printing plate with a developer containing an electrolyte and a residue dispersant, while making the developing unit of an automatic processor simple and inexpensive. Photosensitive lithographic printing plate automatic developing machine that can minimize fluctuations in developer sensitivity to changes in development processing conditions and can prevent the generation of debris by making the concentration of debris dispersant in the replenisher higher than that of the developer. It is an object of the present invention to provide a developing replenisher replenishing method.

  In the present invention, the “developing replenisher” is a processing liquid that is replenished in order to keep development performance constant. In general, as this replenisher, there are those prepared by diluting the replenisher stock solution with a diluent (e.g., water) and those using the replenisher stock solution as it is without being diluted. “Liquid” means a solution prepared by diluting a replenisher stock solution with a diluent. Further, as a replenishment method, there are a method of replenishing the developer with a replenisher prepared by diluting in advance, and a method of directly replenishing the developer with a replenisher stock solution and a diluted solution separately.

  Furthermore, in the present invention, the conductivity sensor for measuring the conductivity value of the developer is a known means such as an AC conductivity meter, an AC bridge meter, or other conductivity meter. The measurement current value and oscillation frequency of the measuring device vary depending on the developer composition, etc., but the current value is low to some extent in order to prevent electrolysis of the water-soluble developer. It is preferably several hundred mA to several μA. Further, the frequency is preferably several hundred Hz to several hundred kHz from the relationship with the electrostatic capacitance component in the developer.

  The conductivity value of the developer containing the electrolyte depends on the temperature of the aqueous solution, and the value decreases as the liquid temperature increases. Therefore, it is more preferable to measure the conductivity value with a measuring instrument equipped with a temperature sensor and a temperature compensation circuit. In the control device that controls replenishment, it is also possible to compensate for the temperature by converting the actually measured liquid resistance value and liquid temperature into a conductivity value at a predetermined temperature. The sensor installation position of the AC conductivity meter, AC bridge meter, or other conductivity meter may be any location where it can be immersed in the developer at the time of measurement and the AC conductivity value of the developer can be measured. The developer circulation system, particularly in the developing tank or the circulation pipe is a preferable position. Moreover, as a detection part, the well-known measurement cell which used platinum, stainless steel, etc. for the electrode can be used.

The above object can be achieved by the developing replenisher replenishing method of the photosensitive lithographic printing plate automatic developing machine shown below.
(1) Development of an exposed photosensitive lithographic printing plate with a developer containing an electrolyte and a residue dispersant, and development of the photosensitive lithographic printing plate automatically maintaining the developer activity of the developer at a constant level A developer replenisher replenishment method for the machine, wherein a developer conductivity value at which the developer activity of the developer is appropriate is experimentally determined in advance and set as a conductivity target value. Based on the above, a developing replenisher having a dregs dispersant concentration higher than that of the developing solution is replenished to compensate for a decrease in the developing activity of the developing solution during operation and / or stoppage of the automatic developing machine. Based on the replenishment conditions, the developer replenisher is replenished to compensate for a decrease in the developer activity of the developer due to the processing of the photosensitive lithographic printing plate, and the residue dispersant concentration is set at a predetermined time interval. Replenished with developer replenisher higher than the developer After measuring the conductivity of the developer, if the measured conductivity value exceeds the target conductivity value, the developer is diluted until the measured conductivity value falls below the target conductivity value. A replenishing solution replenishing method for a photosensitive lithographic printing plate automatic developing machine, wherein
(2) The conductivity target value is sequentially calculated each time the developer replenisher is replenished using a replenisher replacement rate that is a ratio of the developer replenisher replenished to the developer in the developer tank. (1) The method for replenishing a developing replenisher of the photosensitive lithographic printing plate automatic developing machine according to (1).
(3) A replenishment ratio with time which is a ratio of the developer replenisher replenished based on the operation time and / or stop time of the automatic developing machine with respect to the total replenisher replenishment amount replenished to the developer in the developing tank; Using the replenisher replacement rate, which is the ratio of the developer replenisher replenished to the developer in the developer tank, the conductivity target value is replenished with either the developer replenisher or the diluent. (1) The development replenisher replenishing method of the photosensitive lithographic printing plate automatic developing machine, wherein the replenishing solution is calculated every time.
(4) A developer dilution ratio that is a ratio of a diluent replenished to the developer to a developer replenisher stock solution replenished to the developer in the developer tank, and a total developer replenisher replenished to the developer in the developer tank. A replenishment ratio with time which is a ratio of the developer replenisher replenished based on the operation time and / or stop time of the automatic developing machine with respect to a replenishment amount, and a developer replenisher replenished to the developer with respect to the developer in the developing tank. The replenisher replacement rate, which is a ratio of the above, is used to sequentially calculate the conductivity target value every time either the developer replenisher or the diluent is replenished. Development replenisher replenishment method for lithographic printing plate automatic processor.
(5) The photosensitive lithographic printing according to any one of (1) to (4), wherein the concentration of the scum dispersant in the developer replenisher is 1.01 to 50 times that of the developer. Development replenisher replenishment method for plate automatic processor.

  According to the present invention, the developer replenisher is replenished over time and in a developing tank in which the developer is stored, based on preset developer replenishment conditions in accordance with the actual operating conditions of the automatic processor. In addition, when the measured conductivity value of the developer replenished with the developer replenisher exceeds a predetermined conductivity target value, the development is performed until the measured conductivity value falls below the target conductivity value. Fill the tank with diluent. Therefore, despite the simple and inexpensive device configuration, it can cope with fluctuations in the appropriate conductivity value due to changes in development processing conditions (ratio of processing replenishment amount and replenishment amount with time) and environmental conditions (humidity) By using a development replenisher having a residue dispersant concentration higher than that of the developer, it is possible to realize an automatic development process with high sensitivity stability and no generation of residue.

First, the alkali developing solution used in the plate making method of the lithographic printing plate of the present invention will be described.
An alkali developing solution (hereinafter also simply referred to as “developing solution”) used in the developing process is an alkaline aqueous solution, and can be appropriately selected from conventionally known alkaline aqueous solutions.
Examples of the alkaline aqueous solution include a developer composed of an alkali silicate or non-reducing sugar and a base, and those having a pH of 12.5 to 14.0 are particularly preferable.
The alkali silicate exhibits alkalinity when dissolved in water, and examples thereof include alkali metal silicates such as sodium silicate, potassium silicate and lithium silicate, and ammonium silicate.
The alkali silicate may be used alone or in combination of two or more.

The alkali aqueous solution is easy to develop by adjusting the mixing ratio and concentration of silicon oxide SiO ₂ and alkali oxide M ₂ O (M represents an alkali metal or ammonium group), which is a silicate component. Can be adjusted to.
Among the alkaline aqueous solutions, those having a mixing ratio (SiO ₂ / M ₂ O: molar ratio) of silicon oxide SiO ₂ and alkali oxide M ₂ O of 0.5 to 3.0 are preferable, and 1.0 to 2.0 is more preferable.
If the SiO ₂ / M ₂ O is less than 0.5, the alkali strength becomes stronger, which may cause a problem of etching a general-purpose aluminum plate or the like as a support for a lithographic printing plate precursor. If it exceeds 3.0, the developability may be lowered.

  Moreover, as a density | concentration of the alkali silicate in a developing solution, 1-10 mass% is preferable with respect to the mass of alkaline aqueous solution, 3-8 mass% is more preferable, and 4-7 mass% is the most preferable. If this concentration is less than 1% by mass, the developability and processing ability may be lowered. If it exceeds 10% by mass, precipitation and crystals are likely to occur, and further gelation tends to occur during neutralization in the waste liquid. , It may interfere with waste liquid treatment.

In a developer comprising a non-reducing sugar and a base, the non-reducing sugar means a saccharide that has no free aldehyde group or ketone group and therefore has no reducing property, and is a trehalose-type oligosaccharide in which reducing groups are bonded to each other. Glycosides in which saccharide reducing groups and non-saccharides are combined, and sugar alcohols reduced by hydrogenation of saccharides. Any of these can be suitably used in the present invention.
Examples of trehalose type oligosaccharides include saccharose and trehalose, and examples of the glycoside include alkyl glycosides, phenol glycosides, and mustard oil glycosides.
Examples of the sugar alcohol include D, L-arabit, rebit, xylit, D, L-sorbit, D, L-mannit, D, L-exit, D, L-talit, zulsiit, allozulcit and the like. Furthermore, maltitol obtained by hydrogenation of a disaccharide, a reduced form (reduced water candy) obtained by hydrogenation of an oligosaccharide, and the like can also be suitably exemplified.

Among the above, as the non-reducing sugar, sugar alcohol and saccharose are preferable, and among them, D-sorbite, saccharose, and reduced starch syrup are more preferable because they have a buffering action in an appropriate pH region.
These non-reducing sugars may be used singly or in combination of two or more. The proportion of the non-reducing sugar in the developer is preferably 0.1 to 30% by mass, and more preferably 1 to 20% by mass.

In the alkali silicate or non-reducing sugar, an alkali agent as a base can be appropriately selected from conventionally known compounds and combined.
Examples of the alkali agent include sodium hydroxide, potassium hydroxide, lithium hydroxide, trisodium phosphate, tripotassium phosphate, triammonium phosphate, disodium phosphate, dipotassium phosphate, diammonium phosphate, carbonic acid. Inorganic alkaline agents such as sodium, potassium carbonate, ammonium carbonate, sodium bicarbonate, potassium bicarbonate, ammonium bicarbonate, sodium borate, potassium borate, ammonium borate, potassium citrate, tripotassium citrate, sodium citrate, etc. Is mentioned.

Furthermore, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, ethylene An organic alkali agent such as imine, ethylenediamine, pyridine and the like can also be suitably exemplified.
These alkaline agents may be used alone or in combination of two or more.
Of these, sodium hydroxide and potassium hydroxide are preferred. The reason is that the pH can be adjusted in a wide pH range by adjusting the amount added to the non-reducing sugar. Further, trisodium phosphate, tripotassium phosphate, sodium carbonate, potassium carbonate and the like are preferable because they have a buffering action. The alkaline development processing solution of the present invention is one in which at least one selected from the group consisting of an anionic surfactant and an amphoteric surfactant is contained in the above alkaline aqueous solution.

-Anionic surfactant-
Examples of the anionic surfactant used in the present invention include higher alcohol sulfates such as sodium lauryl alcohol sulfate, ammonium lauryl alcohol sulfate, sodium octyl alcohol sulfate, higher alkyl ether sulfates, isopropyl naphthalene, etc. C 8 -C 8 such as sodium salt of sulfonic acid, sodium salt of isobutylnaphthalene sulfonic acid, sodium salt of dodecylbenzene sulfonic acid, sodium salt of metanitrobenzene sulfonic acid, etc., secondary sodium alkyl sulfate 22 higher alcohol sulfates, aliphatic alcohol phosphates such as sodium salt of cetyl alcohol phosphate, etc. If _{C 17 H 33 CON (CH 3} ) CH 2 CH 2 SO 3 sulfonates of alkylamides such as Na, sodium dioctylsulfosuccinate, dibasic aliphatic ester such as sodium sulfosuccinate dihexyl ester Sulfonates, hydroxyalkane sulfonates, alkane sulfonates, alkyl diphenyl ether sulfonates, diphenyl ether disulfonates, dialkyl sulfosuccinate esters, olefin sulfonates, linear alkyl benzene sulfonates, branched alkyl benzene sulfonic acids Salts, alkyl naphthalene sulfonates, alkylphenoxy polyoxyethylene propyl sulfonates, polyoxyethylene alkyl sulfophenyl ether salts, N-alkyl sulfo Preferred examples include oxalic acid monoamide disodium salt and petroleum sulfonates.
Among these, compounds represented by the following (I) to (IV) are exemplified as the aromatic type anionic surfactant.

(In formula (I), R ¹ and R ² each independently represent a hydrogen atom or an optionally branched alkyl group, and X and Y each independently represent a single bond or a formula: —O— (CH ₂ CH ₂ O) n- (n is an integer of 1 to 100), and M represents a monovalent alkali metal.)
In the above formula (I), the alkyl group represented by R ¹ or R ² has 1 to 40 carbon atoms, preferably 2 to 20 carbon atoms, particularly preferably 4 to 12 carbon atoms. , X and Y each independently represent a single bond or the formula: —O— (CH ₂ CH ₂ O) n— (n is preferably an integer of 2 to 50, particularly preferably an integer of 3 to 30). , M represents sodium, potassium, lithium or the like, and sodium is particularly preferable. Preferred examples of the compound represented by the above formula (I) include the following (1) to (3).

In the above formula, particularly preferred examples of R ¹ and R ² include nC ₈ H ₁₇ and nC ₁₂ H ₂₅ .

(In the formulas (II) and (III), R represents a hydrogen atom or an optionally branched alkyl group, X is a single bond or a formula: —O— (CH ₂ CH ₂ O) n— (n is 1). And M represents a monovalent alkali metal.) In the above formula (II), the alkyl group represented by R suitably has 1 to 40 carbon atoms, preferably carbon. atoms 2-20, particularly preferably from 4 to 12 carbon atoms, X is a single bond or a _{formula: -O- (CH 2 CH 2 O} ) n- (n is preferably 2 to 50 integer, particularly preferably Represents an integer of 3 to 30), M represents sodium, potassium, lithium and the like, and sodium is particularly preferable.
Preferred examples of the compound represented by the formula (II) include the following (4) and (5).

In the above formula, R is particularly preferably nC ₈ H ₁₇ or nC ₁₂ H ₂₅ .

In the above formula (III), the alkyl group represented by R suitably has 1 to 40 carbon atoms, preferably 2 to 20 carbon atoms, particularly preferably 4 to 12 carbon atoms, and X is a single bond. Or the formula: —O— (CH ₂ CH ₂ O) n— (n is preferably an integer of 2 to 50, particularly preferably an integer of 3 to 30), and M represents sodium, potassium, lithium and the like. In particular, sodium is preferred.
Preferred examples of the compound represented by the formula (III) include the following (6) and (7).

In the above formula, R is particularly preferably nC ₈ H ₁₇ or nC ₁₂ H ₂₅ .

(In Formula (IV), X and Y each independently represent a single bond or the formula: —O— (CH ₂ CH ₂ O) n— (n is an integer of 1 to 100), and M is a monovalent group. Represents an alkali metal.)
In the above formula (IV), X and Y are each independently a single bond or the formula: —O— (CH ₂ CH ₂ O) n— (n is preferably an integer of 2 to 50, particularly preferably an integer of 3 to 30. M represents sodium, potassium, lithium and the like, and sodium is particularly preferable.
Preferable examples of the compound represented by the formula (IV) include the following (8) to (10).

Among the compounds represented by the above formulas (I) to (IV), the compound represented by the formula (I) is preferable.
Specific examples of the aromatic anionic surfactant are listed below.

-Amphoteric surfactant-
Examples of amphoteric surfactants used in the present invention include amino acid type amphoteric surfactants and betaine type amphoteric surfactants.
Examples of the amino acid type amphoteric surfactant include those selected from the following compounds of formula (V) and compounds of formula (VI).

(Wherein R ³ and R ⁴ each represent a hydrocarbon group having 2 to 30 carbon atoms, R ′, R ″ and R ′ ″ each represents a hydrogen atom or a monovalent alkali metal, m, n And p each represents an integer of 1 to 10.)
In the above formula (V), R ³ preferably represents a hydrocarbon group having 3 to 20 carbon atoms, more preferably 4 to 12 carbon atoms, and is generally an aliphatic hydrocarbon group which may be linear or branched, preferably It is linear and may be saturated or unsaturated, and is preferably an alkyl group or an alkenyl group. R 'is a hydrogen atom or a monovalent alkali metal such as sodium, potassium or lithium, with sodium being particularly preferred. m represents an integer of 1 to 10, preferably 2 to 8, particularly preferably 2 to 6.
Preferred examples of the compound represented by the above formula (V) include the following (11).

As R ³ , nC ₈ H ₁₇ and nC ₁₂ H ₂₅ are particularly preferable.

In the above formula (VI), R ⁴ preferably represents a hydrocarbon group having 3 to 20 carbon atoms, more preferably 4 to 12 carbon atoms, and is generally an aliphatic hydrocarbon group which may be linear or branched, preferably It is linear and may be saturated or unsaturated, and is preferably an alkyl group or an alkenyl group. R ″ and R ′ ″ are a hydrogen atom or a monovalent alkali metal such as sodium, potassium or lithium, particularly sodium, and n and p are preferably 1 to 10, preferably 2 to 8, and particularly preferably. It represents an integer of 2 to 6. Preferred examples of the compound represented by the above formula (VI) include the following (12).

R ⁴ is particularly preferably nC ₈ H ₁₇ or nC ₁₂ H ₂₅ .
Of the compounds represented by the formula (V) or (VI), the compound represented by the formula (VI) is preferable.
The said compound can be manufactured in accordance with a conventional method. Moreover, it can also be obtained as a commercial product such as, for example, trade name Piion C-158 (manufactured by Takemoto Yushi Co., Ltd.).

  Examples of betaine amphoteric surfactants include compounds of the following formula (VII).

(In the formula, R ⁵ , R ⁶ and R ⁷ each represent a hydrocarbon group having 1 to 30 carbon atoms, and q represents an integer of 1 to 10).
In the formula (VII), R ⁵ , R ⁶ and R ⁷ preferably represent a hydrocarbon group having 1 to 20 carbon atoms, more preferably 1 to 12 carbon atoms, generally an aliphatic hydrocarbon group, It may be linear or branched, and may be saturated or unsaturated, and specific examples thereof include an alkyl group and an alkenyl group. q represents an integer of 1 to 10, preferably 2 to 8, and more preferably 2 to 6.
Preferred examples of the compound represented by the formula (VII) include the following (13).

As R ⁵ , nC ₈ H ₁₇ and nC ₁₂ H ₂₅ are particularly preferable.
Other amphoteric surfactants include imidazolinium salts, imidazolines, sulfobetaines, and the like.

  In the alkaline developing solution used in the present invention, one kind selected from an anionic surfactant and an amphoteric surfactant can be contained alone or in combination of two or more kinds. The content of the anionic surfactant and / or the amphoteric surfactant in the developer is preferably 0.001 to 10% by mass, and 0.005 to 1% by mass from the viewpoint of the development effect and the inhibitory effect on the development of development residue. % Is more preferable, and 0.01 to 0.5% by mass is most preferable.

As described above, the alkali developing solution uses a developer containing an alkali silicate or non-reducing sugar and a base, and Li ⁺ , Na ⁺ , K ⁺ , and NH ⁴⁺ are conventionally used as the cation component. In particular, a system containing a large number of cations having a small ionic radius has high penetrability into the image recording layer and excellent developability, but dissolves up to the image area and causes image defects. Therefore, there is a certain limit to increasing the alkali concentration, and in order to completely process the image recording layer (residual film) so as not to remain in the non-image area without causing defects in the image area, it is delicate. It was required to set a proper liquid condition.
However, by using a cation having a large ionic radius as the cation component, the penetrability of the developer into the image recording layer can be suppressed, and the image density can be reduced without reducing the alkali concentration, that is, the developability. The dissolution inhibiting effect of the part can also be improved.
As the cation component, in addition to the alkali metal cation and ammonium ion, other cations can be used.
The following additives can be added to the alkaline developing solution of the present invention for the purpose of further improving development performance.
For example, neutral salts such as NaCl, KCl and KBr described in JP-A-58-75152, chelating agents such as EDTA and NTA described in JP-A-58-190952, JP-A-59-121336 [Co (NH ₃ ) ₆ ] Cl ₃ , CoCl ₂ .6H ₂ O and other complexes described in JP-A-50-51324, sodium alkylnaphthalene sulfonate, n-tetradecyl-N, N-dihydroxy Anionic or amphoteric surfactants such as ethylbetaine, nonionic surfactants such as tetramethyldecynediol described in US Pat. No. 4,374,920, p described in JP-A-55-95946 -Cationic polymers such as methyl chloride quaternary compound of dimethylaminomethylpolystyrene, disclosed in JP-A-56-142528 Amphoteric polymer electrolytes such as a copolymer of vinylbenzyltrimethylammonium chloride and sodium acrylate described above, reducing inorganic salts such as sodium sulfite described in JP-A-57-192951, JP-A-58-59444 Inorganic lithium compounds such as lithium chloride described in JP-A No. 59-75255, organometallic surfactants including organic Si and Ti described in JP-A-59-75255, and organoboron compounds described in JP-A-59-84241 And quaternary ammonium salts such as tetraalkylammonium oxide described in EP101010. A lithographic printing plate developed using an alkali developing solution and a replenisher is post-treated with a rinsing solution containing washing water, a surfactant, and the like, and a desensitizing solution containing gum arabic and starch derivatives. In this post-treatment, these treatment liquids can be combined in various ways.

The heat-sensitive positive lithographic printing plate used in the plate making method of the present invention will be described below.
[Heat-sensitive positive lithographic printing plate]
The heat-sensitive positive lithographic printing plate used in the plate-making method of the present invention comprises an image recording layer containing an infrared absorbing dye as an essential component on a support and usually containing an alkali-soluble resin or the like.
The heat-sensitive positive lithographic printing plate (also referred to as a lithographic printing plate precursor) is described in detail below. First, the configuration of the image recording layer will be described.

[Infrared absorbing dye]
In the present invention, the infrared absorbing dye used in the image recording layer is not particularly limited as long as it is a dye that absorbs infrared rays and generates heat, and various dyes known as infrared absorbing dyes can be used.
As the infrared absorbing dye, commercially available dyes and known dyes described in the literature (for example, “Dye Handbook” edited by the Society of Synthetic Organic Chemistry, published in 1970) can be used. Specific examples include azo dyes, metal complex azo dyes, pyrazolone azo dyes, quinoneimine dyes, methine dyes, and cyanine dyes. In the present invention, among these dyes, those that absorb infrared light or near infrared light are particularly preferred because they are suitable for use in lasers that emit infrared light or near infrared light.
Examples of dyes that absorb such infrared light or near infrared light include, for example, JP-A-58-125246, JP-A-59-84356, JP-A-59-202829, and JP-A-60-78787. Methine dyes described in JP-A-58-173696, JP-A-58-181690, JP-A-58-194595, etc., JP-A-58-112793, Naphthoquinone dyes described in JP-A-58-224793, JP-A-59-48187, JP-A-59-73996, JP-A-60-59240, JP-A-60-63744, etc. Examples thereof include squarylium dyes described in JP-A-58-112792, and cyanine dyes described in British Patent 434,875.

Further, a near-infrared absorption sensitizer described in US Pat. No. 5,156,938 is also preferably used as the dye, and a substituted arylbenzo (thio) pyrylium salt described in US Pat. No. 3,881,924, Trimethine thiapyrylium salts described in JP-A-57-142645 (US Pat. No. 4,327,169), JP-A-58-181051, 58-220143, 59-41363, 59-84248 Nos. 59-84249, 59-146063, 59-146061, pyranlium compounds, cyanine dyes described in JP-A-59-216146, US Pat. No. 4,283,475 Pentamethine thiopyrylium salts described in No. 5 and pyrylium compounds disclosed in Japanese Patent Publication Nos. 5-13514 and 5-19702 But as the commercially available products, Epolight III-178 of Eporin Co., Epolight III-130, Epolight III-125 and the like are particularly preferably used.
Infrared absorbing dyes described as formulas (I) and (II) in US Pat. No. 4,756,993 are particularly preferred as infrared absorbing dyes used in the image recording layer. The dye exhibits a very strong interaction with the alkalinized soluble resin, and is excellent in the unexposed area alkaline development resistance of the image recording layer.

The amount of the infrared absorbing dye added to the image recording layer is 0.01 to 50% by mass, preferably 0.1 to 50% by mass, particularly from the viewpoint of sensitivity and uniformity of the image recording layer, with respect to the mass of the image recording layer. Preferably it is 0.1-30 mass%.
Specific examples of the infrared absorbing dye are shown below, but the present invention is not limited thereto.

[Alkali-soluble resin]
The alkali-soluble resin used in the image recording layer is a water-insoluble and alkali-water-soluble resin (hereinafter appropriately referred to as an alkali-soluble polymer), and has an acidic group on the main chain and / or side chain in the polymer. Containing homopolymers, copolymers thereof or mixtures thereof. Therefore, the image recording layer of the lithographic printing plate precursor has a property of dissolving when contacted with an alkaline developer.
The alkali-soluble polymer used in the image recording layer is not particularly limited as long as it is a conventionally known polymer, but any one of (1) phenolic hydroxyl group, (2) sulfonamide group, and (3) active imide group A polymer compound having a functional group in the molecule is preferable. For example, the following are exemplified, but not limited thereto.

  (1) Examples of the polymer compound having a phenolic hydroxyl group include phenol formaldehyde resin, m-cresol formaldehyde resin, p-cresol formaldehyde resin, m- / p-mixed cresol formaldehyde resin, phenol / cresol (m-, p Any of-and / or m- / p-mixing) may be mentioned, including novolak resins such as mixed formaldehyde resins and pyrogallol acetone resins. In addition to this, a polymer compound having a phenolic hydroxyl group in the side chain is preferably used as the polymer compound having a phenolic hydroxyl group. As a polymer compound having a phenolic hydroxyl group in the side chain, a polymerizable monomer comprising a low molecular compound having at least one unsaturated bond polymerizable with the phenolic hydroxyl group is homopolymerized, or other polymerizable property is added to the monomer. Examples thereof include a polymer compound obtained by copolymerizing monomers.

  Examples of the polymerizable monomer having a phenolic hydroxyl group include acrylamide, methacrylamide, acrylic acid ester, methacrylic acid ester, and hydroxystyrene having a phenolic hydroxyl group. Specifically, N- (2-hydroxyphenyl) acrylamide, N- (3-hydroxyphenyl) acrylamide, N- (4-hydroxyphenyl) acrylamide, N- (2-hydroxyphenyl) methacrylamide, N -(3-Hydroxyphenyl) methacrylamide, N- (4-Hydroxyphenyl) methacrylamide, o-Hydroxyphenyl acrylate, m-Hydroxyphenyl acrylate, p-Hydroxyphenyl acrylate, o-Hydroxyphenyl methacrylate , M-hydroxyphenyl methacrylate, p-hydroxyphenyl methacrylate, o-hydroxystyrene, m-hydroxystyrene, p-hydroxystyrene, 2- (2-hydroxyphenyl) ethyl acrylate, 2- (3-hydroxyphenyl) ethyl Acrylate, 2- 4-hydroxyphenyl) ethyl acrylate, 2- (2-hydroxyphenyl) ethyl methacrylate, 2- (3-hydroxyphenyl) ethyl methacrylate can be suitably used 2- (4-hydroxyphenyl) ethyl methacrylate. Such resins having a phenolic hydroxyl group may be used in combination of two or more. Furthermore, as described in US Pat. No. 4,123,279, phenol and formaldehyde having an alkyl group having 3 to 8 carbon atoms as a substituent, such as t-butylphenol formaldehyde resin and octylphenol formaldehyde resin, These copolymers may be used in combination.

(2) Examples of the alkali-soluble polymer compound having a sulfonamide group include a polymer compound obtained by homopolymerizing a polymerizable monomer having a sulfonamide group or copolymerizing the monomer with another polymerizable monomer. . The polymerizable monomer having a sulfonamide group includes one or more sulfonamide groups —NH—SO ₂ — in which at least one hydrogen atom is bonded to a nitrogen atom and one or more polymerizable unsaturated bonds in one molecule. And a polymerizable monomer comprising a low molecular weight compound. Among them, a low molecular compound having an acryloyl group, an allyl group, or a vinyloxy group, and a substituted or monosubstituted aminosulfonyl group or a substituted sulfonylimino group is preferable.

(3) The alkali-soluble polymer compound having an active imide group is preferably one having an active imide group in the molecule. Examples thereof include a polymer compound obtained by homopolymerizing a polymerizable monomer composed of one or more low-molecular compounds or by copolymerizing the polymerizable monomer with another polymerizable monomer.
As such a compound, specifically, N- (p-toluenesulfonyl) methacrylamide, N- (p-toluenesulfonyl) acrylamide and the like can be preferably used.

  Furthermore, as the alkali-soluble polymer compound, a polymer compound obtained by polymerizing two or more of the polymerizable monomer having a phenolic hydroxyl group, the polymerizable monomer having a sulfonamide group, and the polymerizable monomer having an active imide group is used. Alternatively, it is preferable to use a polymer compound obtained by copolymerizing these two or more polymerizable monomers with another polymerizable monomer. When a polymerizable monomer having a phenolic hydroxyl machine is copolymerized with a polymerizable monomer having a sulfonamide group and / or a polymerizable monomer having an active imide group, the compounding polymerization ratio (mass ratio) of these components is It is preferably in the range of 50:50 to 5:95, particularly preferably in the range of 40:60 to 10:90.

  When the alkali-soluble polymer is a copolymer of a polymerizable monomer having a phenolic hydroxyl group, a polymerizable monomer having a sulfonamide group, or a polymerizable monomer having an active imide group and another polymerizable monomer The monomer that imparts alkali solubility is preferably contained in an amount of 10 mol% or more, more preferably 20 mol% or more so that the alkali solubility becomes sufficient and the effect of improving the development latitude is sufficiently achieved.

Examples of the monomer component to be copolymerized with the polymerizable monomer having a phenolic hydroxyl group, the polymerizable monomer having a sulfonamide group, or the polymerizable monomer having an active imide group include the compounds listed in the following (m1) to (m12). However, the present invention is not limited to these.
(M1) Acrylic acid esters and methacrylic acid esters having an aliphatic hydroxyl group such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate.
(M2) Alkyl acrylates such as methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, benzyl acrylate, 2-chloroethyl acrylate, and glycidyl acrylate.
(M3) Alkyl methacrylates such as methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, 2-chloroethyl methacrylate, and glycidyl methacrylate.
(M4) Acrylamide, methacrylamide, N-methylol acrylamide, N-ethyl acrylamide, N-hexyl methacrylamide, N-cyclohexyl acrylamide, N-hydroxyethyl acrylamide, N-phenyl acrylamide, N-nitrophenyl acrylamide, N-ethyl- Acrylamide or methacrylamide such as N-phenylacrylamide.

(M5) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, and phenyl vinyl ether.
(M6) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate.
(M7) Styrenes such as styrene, α-methylstyrene, methylstyrene, and chloromethylstyrene.
(M8) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone.
(M9) Olefins such as ethylene, propylene, isobutylene, butadiene and isoprene.
(M10) N-vinylpyrrolidone, acrylonitrile, methacrylonitrile and the like.
(M11) Unsaturated imides such as maleimide, N-acryloylacrylamide, N-acetylmethacrylamide, N-propionylmethacrylamide, N- (p-chlorobenzoyl) methacrylamide.
(M12) Unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic anhydride and itaconic acid.

The alkali-soluble polymer compound preferably has a phenolic hydroxyl group in terms of excellent image-forming properties in exposure with an infrared laser or the like, such as phenol formaldehyde resin, m-cresol formaldehyde resin, p-cresol formaldehyde resin, Preferred examples include novolak resins and pyrogallol acetone resins such as m- / p-mixed cresol formaldehyde resin and phenol / cresol (which may be m-, p-, or m- / p-mixed) mixed formaldehyde resin.
Further, as an alkali-soluble polymer compound having a phenolic hydroxyl group, as described in US Pat. No. 4,123,279, carbon such as t-butylphenol formaldehyde resin and octylphenol formaldehyde resin is used. Examples include condensation polymers of phenol and formaldehyde having an alkyl group of 3 to 8 as a substituent.
As a copolymerization method of the alkali-soluble polymer compound, a conventionally known graft copolymerization, block copolymerization, random copolymerization method or the like can be used.

In the present invention, when the alkali-soluble polymer is a homopolymer or copolymer of a polymerizable monomer having a phenolic hydroxyl group, a polymerizable monomer having a sulfonamide group, or a polymerizable monomer having an active imide group, the weight average Those having a molecular weight of 2,000 or more and a number average molecular weight of 500 or more are preferred. More preferably, the weight average molecular weight is 5,000 to 300,000, the number average molecular weight is 800 to 250,000, and the dispersity (weight average molecular weight / number average molecular weight) is 1.1 to 10. .
In the present invention, when the alkali-soluble polymer is a resin such as phenol formaldehyde resin or cresol aldehyde resin, the weight average molecular weight is 500 to 20.000, and the number average molecular weight is 200 to 10,000. preferable.
These alkali-soluble polymer compounds may be used alone or in combination of two or more, and are 30 to 99% by mass, preferably 40 to 95% by mass, particularly preferably 50%, based on the total solid content of the image forming layer. Used in an addition amount of ˜90% by mass. From the viewpoint of durability and sensitivity of the image forming layer, the above content range is appropriate.

The image forming layer may also contain an alkali-soluble polymer compound having a carboxyl group (hereinafter sometimes referred to as component (B1)).
The polymer compound (B1) may be any alkali-soluble polymer compound having a carboxyl group, but polymer compounds (b1-1) and (b1-2) defined below are preferred.
(B1-1) An alkali-soluble polymer compound having a polymerizable monomer unit represented by the following general formula (i) (hereinafter also referred to as polymer compound (b1-1))

(In the formula, Xm represents a single bond or a divalent linking group, Y represents hydrogen or a carboxyl group, and Z represents hydrogen, an alkyl group or a carboxyl group.)
As a monomer constituting the polymerizable monomer unit represented by the general formula (i), there is a polymerizable monomer having at least one carboxyl group and one polymerizable unsaturated group in the molecule.
Specific examples of such polymerizable monomers include α, β-unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic acid, maleic anhydride, itaconic acid and itaconic anhydride.

Examples of the monomer to be copolymerized with the polymerizable monomer having a carboxyl group include the following (1) to (11), but are not limited thereto.
(1) Acrylic acid esters and methacrylic acid esters having an aliphatic hydroxyl group such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate.
(2) Methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, benzyl acrylate, 2-chloroethyl acrylate, glycidyl acrylate, N-dimethylaminoethyl Alkyl acrylates such as acrylates;
(3) Methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, 2-chloroethyl methacrylate, glycidyl methacrylate, N-dimethylaminoethyl Alkyl methacrylate such as methacrylate.

(4) Acrylamide, methacrylamide, N-methylolacrylamide, N-ethylacrylamide, N-hexylmethacrylamide, N-cyclohexylacrylamide, N-hydroxyethylacrylamide, N-phenylacrylamide, N-nitrophenylacrylamide, N-ethyl- Acrylamide or methacrylamide such as N-phenylacrylamide.
(5) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, and phenyl vinyl ether.
(6) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate.
(7) Styrenes such as styrene, α-methylstyrene, methylstyrene, chloromethylstyrene.

(8) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone.
(9) Olefins such as ethylene, propylene, isobutylene, butadiene and isoprene.
(10) N-vinylpyrrolidone, N-vinylcarbazole, 4-vinylpyridine, acrylonitrile, methacrylonitrile and the like.
(11) Unsaturated imides such as maleimide, N-acryloylacrylamide, N-acetylmethacrylamide, N-propionylmethacrylamide, N- (p-chlorobenzoyl) methacrylamide.

  Moreover, the monomer of the following general formula (ii) is also preferably used.

In the formula, X represents O, S, or N—R ¹² . R ^{10 to} R ¹² each independently represents a hydrogen atom or an alkyl group. m, n, and o each independently represents an integer of 2 to 5, and C _m H _2m , C _n H _2n , and CoH ₂₀ may each be linear or branched. p, q, and r each independently represent an integer of 0 to 3,000, and p + q + r ≧ 2.

The alkyl group in R ¹⁰ to R ^12, preferably one having 1 to 12 carbon atoms, specifically, methyl group, ethyl group, n- propyl group, an isopropyl group. p, q, and r preferably represent an integer of 0 to 500, and more preferably represent an integer of 0 to 100.
Examples of the monomer corresponding to the repeating unit represented by the general formula (ii) are listed below, but the present invention is not limited thereto.

The repeating unit represented by the general formula (ii) is a commercially available hydroxypoly (oxyalkylene) material, for example, trade name Pluronic (Pluronic (Asahi Denka Kogyo Co., Ltd.)), Adeka Polyether (Asahi Denka Kogyo Co., Ltd.) ), Carbowax (Carbowax (Glico Product)), Triton (Toriton (Rohm and Haas), and PEG (Daiichi Kogyo Seiyaku Co., Ltd.)) It can manufacture by making it react with acrylic acid, methacrylic acid, an acryl chloride, methacryl chloride, or acrylic acid anhydride by the method of this.
Separately, poly (oxyalkylene) diacrylate produced by a known method can also be used.

  Commercially available monomers include hydroxyl group-terminated polyalkylene glycol mono (meth) acrylate manufactured by Nippon Oil & Fats Co., Ltd. Blemmer PE-90, Blemmer PE-200, Blemmer PE-350, Blemmer AE-90, Blemmer AE-200, Blemmer AE-400, Blemmer PP-1000, Blemmer PP-500, Blemmer PP-800, Blemmer AP-150, Blemmer AP-400, Blemmer AP-550, Blemmer AP-800, Blemmer 50PEP-300, Blemmer 70PEP-350B, Blemmer AEP series, Blemmer 55PET-400, Blemmer 30PET-800, Blemmer 55PET-800, Blemmer AET series, Blemmer 30PPT-800, Blemmer 50PPT-800, Blemmer 70PPT-800, Blemmer APT series, Blemmer 10PPB-500B, Blemmer 10APB-500B Etc. Similarly, Blemmer PME-100, Blemmer PME-200, Blemmer PME-400, Blemmer PME-1000, Blemmer PME-4000, Blemmer AME-400, Blemmer as alkyl-terminated polyalkylene glycol mono (meth) acrylates manufactured by NOF Corporation 50POEP-800B, Blemmer 50AOEP-800B, Blemmer PLE-200, Blemmer ALE-200, Blemmer ALE-800, Blemmer PSE-400, Blemmer PSE-1300, Blemmer ASEP series, Blemmer PKEP series, Blemmer AKEP series, Blemmer ANE-300 , BLEMMER ANE-1300, BLEMMER PNEP series, BLEMMER PNPE series, BLEMMER 43ANEP-500, BLEMMER 70ANEP-550, etc., and Kyoeisha Chemical Co., Ltd. Light ester MC, Light ester 130MA, Light ester 041MA, Light acrylate BO-A Acrylate EC-A, Light acrylate MTG-A, Light acrylic Over DOO 130A, Light Acrylate DPM-A, Light Acrylate P-200A, Light Acrylate NP-4EA, like Light Acrylate NP-8EA.

The minimum constitutional unit having a polymerizable monomer component having at least one carboxyl group and at least one polymerizable unsaturated group in the polymer compound (b1-1) is not necessarily limited to one kind, and is the same. It is also possible to use a copolymer obtained by copolymerizing two or more kinds of minimum structural units having the above acidic group or two or more kinds of minimum structural units having different acidic groups.
As the copolymerization method, conventionally known graft copolymerization, block copolymerization, random copolymerization, and the like can be used.

  (B1-2) A reaction product of a diol compound represented by the following general formula (iii), (iv) or (v) having a carboxyl group and a diisocyanate compound represented by the following general formula (viii) as a basic skeleton And an alkali-soluble polymer compound having a carboxyl group (hereinafter, also referred to as polymer compound (b1-2)).

R ¹³ represents a hydrogen atom, a substituent (for example, alkyl, aryl, alkoxy, ester, urethane, amide, ureido, halogeno are preferable), alkyl, alkenyl, aralkyl, aryl, alkoxy, aryloxy Preferably a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, or an aryl group having 6 to 15 carbon atoms.
R ¹⁴ , R ¹⁵ and R ¹⁶ may have the same or different single bond and substituent (for example, alkyl, alkenyl, aralkyl, aryl, alkoxy and halogeno groups are preferred). Or a divalent aliphatic or aromatic hydrocarbon. Preferably an alkylene group having 1 to 20 carbon atoms, an arylene group having 6 to 15 carbon atoms, more preferably an alkylene group having 1 to 8 carbon atoms is shown.
If necessary, R ¹⁴ , R ¹⁵ and R ¹⁶ have other functional groups that do not react with isocyanate groups, such as ester groups, urethane groups, amide groups, ureido groups, and carbon-carbon unsaturated bonds. Also good. In addition, you may comprise a ring by 2 or 3 of R < ¹³ >, R <^14> , R <^15> , R < ¹⁶ >.
Ar represents a trivalent aromatic hydrocarbon which may have a substituent, and preferably an aromatic group having 6 to 15 carbon atoms.

OCN-R ¹⁸ -NCO (viii)
In the formula, R ¹⁸ represents a divalent aliphatic or aromatic hydrocarbon which may have a substituent (for example, alkyl, alkenyl, aralkyl, aryl, alkoxy and halogeno groups are preferable). If necessary, R ¹⁸ may have another functional group that does not react with an isocyanate group, such as an ester, urethane, amide, ureido group, or carbon-carbon unsaturated bond.

Specific examples of the diol compound having a carboxyl group represented by the general formula (iii), (iv) or (v) include those shown below.
3,5-dihydroxybenzoic acid, 2,2-bis (hydroxymethyl) propionic acid, 2,2-bis (2-hydroxyethyl) propionic acid, 2,2-bis (3-hydroxypropyl) propionic acid, Bis (hydroxymethyl) acetic acid, bis (4-hydroxyphenyl) acetic acid, 4,4-bis (4-hydroxyphenyl) pentanoic acid, tartaric acid, N, N-bis (2-hydroxyethyl) -3-carboxy-propionamide Etc.

  The alkali-soluble polymer compound having a carboxyl group (b1-2) is preferably a reaction product in which a diol represented by the following general formula (vi) or (vii) is combined.

In the formula, R ¹⁷ represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and n represents an integer of 2 or more. Examples of the alkyl group having 1 to 8 carbon atoms in R ¹⁷ include a methyl group, an ethyl group, an i-propyl group, an n-butyl group, and an i-butyl group.
Specific examples of the diol represented by the general formula (vi) or (vii) are shown below, but the present invention is not limited thereto.

Specific example of (vi)
HO-(-CH ₂ CH ₂ O-) ₃ -H
HO-(-CH ₂ CH ₂ O-) ₄ -H
HO-(-CH ₂ CH ₂ O-) ₅ -H
HO-(-CH ₂ CH ₂ O-) ₆ -H
HO-(-CH ₂ CH ₂ O-) ₇ -H
HO-(-CH ₂ CH ₂ O-) ₈ -H
HO-(-CH ₂ CH ₂ O-) ₁₀ -H
HO-(-CH ₂ CH ₂ O-) ₁₂ -H
Polyethylene glycol (average molecular weight 1000)
Polyethylene glycol (average molecular weight 2000)
Polyethylene glycol (average molecular weight 4000)
HO-(-CH ₂ CH (CH ₃ ) O-) ₃ -H
HO-(-CH ₂ CH (CH ₃ ) O-) ₄ -H
HO-(-CH ₂ CH (CH ₃ ) O-) ₆ -H
Polypropylene glycol (average molecular weight 1000)
Polypropylene glycol (average molecular weight 2000)
Polypropylene glycol (average molecular weight 4000)

Specific example of (vii)
HO-(-CH ₂ CH ₂ CH ₂ O-) ₃ -H
HO-(-CH ₂ CH ₂ CH ₂ O-) ₄ -H
HO-(-CH ₂ CH ₂ CH ₂ O-) ₈ -H
HO-(-CH ₂ CH ₂ CH (CH ₃ ) O-) ₁₂ -H

Specific examples of the diisocyanate compound represented by the general formula (viii) include the following compounds.
That is, 2,4-tolylene diisocyanate, dimer of 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, p-xylylene diisocyanate, m-xylylene diisocyanate, 4,4′-diphenylmethane diisocyanate, Aromatic diisocyanate compounds such as 1,5-naphthalene diisocyanate and 3,3′-dimethylbiphenyl-4,4′-diisocyanate; aliphatic diisocyanates such as hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, lysine diisocyanate and dimer diisocyanate Compound, isophorone diisocyanate, 4,4′-methylenebis (cyclohexyl isocyanate), methylcyclohexane-2,4 (or 2,6) -diisocyanate, 1 An aliphatic diisocyanate compound such as 1,3- (isocyanatomethyl) cyclohexane; a diisocyanate compound which is a reaction product of a diol and diisocyanate such as an adduct of 1 mol of 1,3-butylene glycol and 2 mol of tolylene diisocyanate, and the like. Can be mentioned.

  The molar ratio of the diisocyanate and the diol compound used for the synthesis of the polymer compound (b1-2) is preferably 0.8: 1 to 1.2-1, and when an isocyanate group remains at the polymer terminal, alcohols or By treating with amines or the like, it is finally synthesized in a form in which no isocyanate group remains.

As the component (B1), one type may be used alone from the above polymer compounds (b1-1) and (b1-2), or two or more types may be used in combination.
The content of the repeating unit having a carboxyl group contained in the component (B1) is 2 mol% or more based on the total amount of each monomer of the component (B1), preferably 2 to 70 mol%. Yes, more preferably in the range of 5 to 60 mol%.
The preferred weight average molecular weight of the component (B1) is preferably 3000 to 300,000, more preferably 6,000 to 100,000.

  Furthermore, the preferable addition amount of the component (B1) is in the range of 0.005 to 80% by mass, preferably in the range of 0.01 to 50% by mass, based on the total solid content mass of the image recording layer. Preferably it is the range of 1-20 mass%.

[Additive]
In forming the image recording layer, in addition to the above components, various additives can be further added as necessary as long as the effects of the present invention are not impaired.
-Solubility inhibiting compound-
The lithographic printing plate precursor can contain various inhibitors in the image recording layer for the purpose of enhancing its inhibition (solubility inhibition).
Although it does not specifically limit as this inhibitor, A quaternary ammonium salt, a polyethyleneglycol type compound, etc. are mentioned.

Although it does not specifically limit as a quaternary ammonium salt, A tetraalkyl ammonium salt, a trialkyl aryl ammonium salt, a dialkyl diaryl ammonium salt, an alkyl triaryl ammonium salt, a tetraaryl ammonium salt, a cyclic ammonium salt, and a bicyclic ammonium salt are mentioned. .
Specifically, tetrabutylammonium bromide, tetrapentylammonium bromide, tetrahexylammonium bromide, tetraoctylammonium bromide, tetralaurylammonium bromide, tetraphenylammonium bromide, tetranaphthylammonium bromide, tetrabutylammonium chloride, tetrabutylammonium iodide , Tetrastearyl ammonium bromide, lauryl trimethyl ammonium bromide, stearyl trimethyl ammonium bromide, behenyl trimethyl ammonium bromide, lauryl triethyl ammonium bromide, phenyl trimethyl ammonium bromide, 3-trifluoromethylphenyl trimethyl ammonium bromide, benzyl trimethyl ammonium bromide De, dibenzyl dimethyl ammonium bromide, distearyl dimethyl ammonium bromide, tristearyl methyl ammonium bromide, benzyl triethyl ammonium bromide, hydroxyphenyl trimethyl ammonium bromide, N- methyl pyridinium bromide, and the like. In particular, quaternary ammonium salts described in Japanese Patent Application Nos. 2001-226297, 2001-370059, and 2001-398047 are preferable.

  The addition amount of the quaternary ammonium salt is preferably 0.1 to 50% by mass, more preferably 1 to 30% by mass, based on the total solid content of the image recording layer. The range of the content is appropriate in that the solubility inhibiting effect is sufficiently exhibited and the film forming property of the binder is not deteriorated.

  Although it does not specifically limit as a polyethyleneglycol type compound, The thing of the following structure is mentioned.

^{R 1 - {- O- (R} 3 -O-) m-R 2} n
(R ¹ is a polyhydric alcohol residue or polyhydric phenol residue, R ² is a hydrogen atom, an alkyl group, alkenyl group, alkynyl group, alkyloyl group, aryl which may have a substituent of 1 to 25 carbon atoms, aryl Group or aryloyl group, R ³ represents an alkylene residue which may have a substituent, m is an average of 10 or more, and n is an integer of 1 to 4.

  Examples of polyethylene glycol compounds having the above structure include polyethylene glycols, polypropylene glycols, polyethylene glycol alkyl ethers, polypropylene glycol alkyl ethers, polyethylene glycol aryl ethers, polypropylene glycol aryl ethers, polyethylene glycol alkyl aryl ethers. , Polypropylene glycol alkyl aryl ethers, polyethylene glycol glycerin esters, polypropylene glycol glycerin esters, polyethylene sorbitol esters, polypropylene glycol sorbitol esters, polyethylene glycol fatty acid esters, polypropylene glycol fatty acid esters, polyethylene glycolated ethylene Diamines, polypropylene glycolated ethylenediamines, polyethylene glycolated diethylenetriamine, and polypropylene glycol diethylenetriamines.

  Specific examples thereof include polyethylene glycol 1000, polyethylene glycol 2000, polyethylene glycol 4000, polyethylene glycol 10000, polyethylene glycol 20000, polyethylene glycol 5000, polyethylene glycol 100000, polyethylene glycol 200000, polyethylene glycol 500000, polypropylene glycol 1500, polypropylene glycol. 3000, polypropylene glycol 4000, polyethylene glycol methyl ether, polyethylene glycol ethyl ether, polyethylene glycol phenyl ether, polyethylene glycol dimethyl ether, polyethylene glycol diethyl ether, polyethylene glycol diphenyl ether Polyethylene glycol lauryl ether, polyethylene glycol dilauryl ether, polyethylene glycol nonyl ether, polyethylene glycol cetyl ether, polyethylene glycol stearyl ether, polyethylene glycol distearyl ether, polyethylene glycol behenyl ether, polyethylene glycol dibehenyl ether, polypropylene glycol methyl ether, polypropylene glycol Ethyl ether, polypropylene glycol phenyl ether, polypropylene glycol dimethyl ether, polypropylene glycol diethyl ether, polypropylene glycol diphenyl ether, polypropylene glycol lauryl ether, polypropylene glycol dilauryl ether, polyethylene glycol Propylene glycol nonyl ether, polyethylene glycol acetyl ester, polyethylene glycol diacetyl ester, polyethylene glycol benzoate, polyethylene glycol lauryl ester, polyethylene glycol dilauryl ester, polyethylene glycol nonyl ester, polyethylene glycol cetylate, polyethylene glycol stearoyl ester, polyethylene Glycol distearoyl ester, polyethylene glycol behenate ester, polyethylene glycol dibehenate ester, polypropylene glycol acetyl ester, polypropylene glycol diacetyl ester, polypropylene glycol benzoate ester, polypropylene glycol dibenzoate ester, Ripropylene glycol laurate, polypropylene glycol dilaurate, polypropylene glycol nonyl ester, polyethylene glycol glycerol ether, polypropylene glycol glycerol ether, polyethylene glycol sorbitol ether, polypropylene glycol sorbitol ether, polyethylene glycolated ethylenediamine, polypropylene glycolated ethylenediamine, Examples thereof include polyethylene glycolized diethylenetriamine, polypropylene glycolated diethylenetriamine, and polyethylene glycolated pentamethylenehexamine.

  The addition amount of the polyethylene glycol compound is 0.1 to 50% by mass in terms of solid content with respect to the total solid content of the image recording layer from the viewpoint of exhibiting sufficient solubility inhibiting effect and maintaining good image formability. It is suitable that it is 1-30 mass%.

Further, when the above-described measures for improving the inhibition (solubility inhibition) are performed, the sensitivity is lowered. In this case, it is effective to add a lactone compound. This lactone compound is considered to be that when the developer penetrates into the exposed area, the developer and the lactone compound react to generate a new carboxylic acid compound, contributing to dissolution of the exposed area and improving sensitivity.
Although it does not specifically limit as a lactone compound, The compound represented by the following general formula (LI) and general formula (L-II) is mentioned.

In general formula (LI) and general formula (L-II), X ¹ , X ² , X ³ and X ⁴ are ring constituent atoms or atomic groups, which may be the same or different, and are independent of each other. And may have a substituent, and at least one of X ¹ , X ² and X ^{3 in} the general formula (LI) and X ¹ , X ² , X ³ and X in the general formula (L-II) ^At least one of ⁴ has an electron-withdrawing substituent or a substituent substituted with an electron-withdrawing group.
The constituent atoms or atomic groups of the ring represented by X ¹ , X ² , X ³ and X ⁴ are nonmetallic atoms having two single bonds for forming a ring or atomic groups containing the nonmetallic atoms.
A preferred nonmetallic atom or nonmetallic atomic group is an atom or atomic group selected from a methylene group, a sulfinyl group, a carbonyl group, a thiocarbonyl group, a sulfonyl group, a sulfur atom, an oxygen atom, and a selenium atom, and more preferably, It is an atomic group selected from a methylene group, a carbonyl group and a sulfonyl group.

At least one of X ¹ , X ² and X ^{3 in} the general formula (LI) or at least one of X ¹ , X ² , X ³ and X ^{4 in} the general formula (L-II) is an electron withdrawing group Have In the present specification, an electron-withdrawing substituent refers to a group in which Hammett's substituent constant σ _p takes a positive value. Regarding the Hammett's substituent constant, Journal of Medicinal Chemistry, 1973, Vol. 16, No. 11, 1207-1216, etc. can be referred to. Examples of electron-withdrawing groups in which Hammett's substituent constant σ _p takes a positive valence include halogen atoms (fluorine atoms (σ _p value: 0.06), chlorine atoms (σ _p value: 0.23), bromine atoms (Σ _p value: 0.23), iodine atom (σ _p value: 0.18)), trihaloalkyl group (tribromomethyl (σ _p value: 0.29)), trichloromethyl (σ _p value: 0.33) ), Trifluoromethyl (σ _p value: 0.54)), cyano group (σ _p value: 0.66), nitro group (σ _p value: 0.78), aliphatic / aryl or heterocyclic sulfonyl group ( For example, methanesulfonyl (.sigma.p value: 0.72)), aliphatic aryl or heterocyclic acyl group (e.g., acetyl (sigma _p value: 0.50), benzoyl (sigma _p value: 0.43)), alkynyl group (e.g., C≡CH (sigma _p value: 0.23)), fat Aryl or heterocyclic oxycarbonyl group (e.g., methoxycarbonyl (sigma _p value: 0.45), phenoxycarbonyl (sigma _p value: 0.44)), carbamoyl group (sigma _p value: 0.36), a sulfamoyl group (Σ _p value: 0.57), sulfoxide group, heterocyclic group, oxo group, phosphoryl group and the like.
Preferred electron withdrawing groups are amide groups, azo groups, nitro groups, fluoroalkyl groups having 1 to 5 carbon atoms, nitrile groups, alkoxycarbonyl groups having 1 to 5 carbon atoms, acyl groups having 1 to 5 carbon atoms, and carbon numbers. An alkylsulfonyl group having 1 to 9 carbon atoms, an arylsulfonyl group having 6 to 9 carbon atoms, an alkylsulfinyl group having 1 to 9 carbon atoms, an arylsulfinyl group having 6 to 9 carbon atoms, an arylcarbonyl group having 6 to 9 carbon atoms, and thiocarbonyl A group selected from a group, a fluorine-containing alkyl group having 1 to 9 carbon atoms, a fluorine-containing aryl group having 6 to 9 carbon atoms, a fluorine-containing allyl group having 3 to 9 carbon atoms, an oxo group, and a halogen element.
More preferably, a nitro group, a fluoroalkyl group having 1 to 5 carbon atoms, a nitrile group, an alkoxycarbonyl group having 1 to 5 carbon atoms, an acyl group having 1 to 5 carbon atoms, an arylsulfonyl group having 6 to 9 carbon atoms, carbon It is a group selected from an arylcarbonyl group of formulas 9 to 9, an oxo group and a halogen element.
Specific examples of the compounds represented by formulas (LI) and (L-II) are shown below, but the present invention is not limited to these compounds.

The addition amount of the compounds represented by the general formula (LI) and the general formula (L-II) is preferably 0.1 to 50% by mass in terms of the solid content with respect to the total solid content of the image recording layer. 1-30 mass% is more preferable. In addition, since this compound reacts with a developing solution, it is desirable to contact a developing solution selectively.
These lactone compounds may be used alone or in combination. Two or more compounds of the general formula (LI) or two or more compounds of the general formula (L-II) may be used in an arbitrary ratio within the above range.

  In addition, a substance that is thermally decomposable, such as an onium salt, an o-quinonediazide compound, an aromatic sulfone compound, and an aromatic sulfonic acid ester compound, and that substantially reduces the solubility of the alkaline water-soluble polymer compound without being decomposed. Use in combination is preferable in terms of improving the dissolution inhibition of the image area in the developer. Examples of onium salts include diazonium salts, ammonium salts, phosphonium salts, iodonium salts, sulfonium salts, selenonium salts, and arsonium salts.

Suitable onium salts for use in the present invention include, for example, SI Schlesinger, Photogr. Sci. Eng., 18, 387 (1974), TS Balet al, Polymer, 21, 423 (1980), No. 158230, diazonium salt, U.S. Pat.Nos. 4,069,055, 4,069,056, ammonium salt described in JP-A-3-140140, DC Necker et al, Macromolecules, 17, 2468 (1984), CS Wen et al, Teh, Proc. Conf. Rad. Curing ASIA, p478 Tokyo, Oct (1988), U.S. Pat.Nos. 4,069,055 and 4,069,056, JVCrivello et al, Macromorecules, 10 (6), 1307 ( 1977), Chem. & Eng. News, Nov. 28, p31 (1988), European Patent No. 104,143, U.S. Pat.Nos. 339,049, 410,201, JP-A-2-150848, JP-A-2-96514 Iodonium salts described, JVCrivello et al, Polymer J. 17, 73 (1985), JV Crivelloet al. J. Org. Chem., 43, 3055 (1978), WR Watt et al, J. Polymer Sci., Polymer Chem .Ed., 22, 17 89 (1984), JV Crivello et al, Polymer Bull., 14, 279 (1985), JV Crivello et al, Macromorecules, 14 (5), 1141 (1981), JV Crivello et al, J. Polymer Sci., Polymer Chem. Ed., 17, 2877 (1979), European Patents 370,693, 233,567, 297,443, 297,442, U.S. Patents 4,933,377, 3,902,114, 410,201, 339,049, 4,760,013 No. 4,734,444, No. 2,833,827, German Patent Nos. 2,904,626, 3,604,580, 3,604,581, sulfonium salts, JV Crivello et al, Macromorecules, 10 (6), 1307 (1977), JV Crivello et al, J. Polymer Sci., Polymer Chem. Ed., 17, 1047 (1979), CS Wen et al, Teh, Proc. Conf. Rad. Curing ASIA, p478 Tokyo, Oct (1988). And the arsonium salts described.
Of the onium salts, diazonium salts are particularly preferred. Particularly suitable diazonium salts include those described in JP-A-5-158230.

  The counter ion of the onium salt includes tetrafluoroboric acid, hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, 5-nitro-o-toluenesulfonic acid, 5-sulfosalicylic acid, 2,5-dimethylbenzenesulfonic acid, 2,4,6-trimethylbenzenesulfonic acid, 2-nitrobenzenesulfonic acid, 3-chlorobenzenesulfonic acid, 3-bromobenzenesulfonic acid, 2-fluorocaprylnaphthalenesulfonic acid, dodecylbenzenesulfonic acid, 1-naphthol-5-sulfone Examples include acid, 2-methoxy-4-hydroxy-5-benzoyl-benzenesulfonic acid, and paratoluenesulfonic acid. Of these, particularly preferred are alkyl aromatic sulfonic acids such as hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid and 2,5-dimethylbenzenesulfonic acid.

  Suitable quinonediazides include o-quinonediazide compounds. The o-quinonediazide compound used in the present invention is a compound having at least one o-quinonediazide group, which increases alkali solubility by thermal decomposition, and compounds having various structures can be used. That is, o-quinonediazide assists the solubility of the sensitive material system by both the effect of losing the inhibition of dissolution of the binder by thermal decomposition and the change of o-quinonediazide itself into an alkali-soluble substance. Examples of the o-quinonediazide compound used in the present invention include J. Although compounds described in pages 339 to 352 of “Light-Sensitive Systems” by Korser can be used, they are particularly reacted with various aromatic polyhydroxy compounds or aromatic amino compounds. -Sulfonic acid esters or sulfonic acid amides of quinonediazides are preferred. Further, benzoquinone (1,2) -diazide sulfonic acid chloride or naphthoquinone- (1,2) -diazide-5-sulfonic acid chloride and pyrogallol-acetone resin as described in JP-B-43-28403 Esters, benzoquinone- (1,2-diazide sulfonic acid chloride or naphthoquinone- (1,2) -diazido-5 sulfonic acid chloride and phenol-formaldehyde resins described in US Pat. Nos. 3,046,120 and 3,188,210 Esters are also preferably used.

  Further, an ester of naphthoquinone- (1,2) -diazide-4-sulfonic acid chloride and phenol formaldehyde resin or cresol formaldehyde resin, naphthoquinone- (1,2) -diazido-4-sulfonic acid chloride and pyrogallol-acetone resin Esters are preferably used as well. Other useful o-quinonediazide compounds are reported and known in numerous patents. For example, JP-A-47-5303, JP-A-48-63802, JP-A-48-63803, JP-A-48-96575, JP-A-49-38701, JP-A-48-13354, No. 41-11222, No. 45-9610, No. 49-17481, U.S. Pat.No. 2,797,213, No. 3,454,400, No. 3,544,323, No. 3,573,917, No. 3,674,495, No. 3,785,825 And British Patents 1,227,602, 1,251,345, 1,267,005, 1,329,888, 1,330,932, German Patent 854,890, and the like.

The addition amount of the o-quinonediazide compound is preferably in the range of 1 to 50% by mass, more preferably 5 to 30% by mass, and particularly preferably 10 to 30% by mass with respect to the total solid content in the image recording layer. These compounds can be used alone, but may be used as a mixture of several kinds.
Further, an alkali-soluble resin at least partially esterified as described in JP-A-11-288089 may be included.

  Further, for the purpose of enhancing the dissolution inhibiting property on the surface of the image recording layer and enhancing the resistance to scratches on the surface, it is possible to improve the resistance against scratches on the surface as described in JP-A No. 2000-187318. It is preferable to use a polymer having a polymerization component of a (meth) acrylate monomer having 2 or 3 fluoroalkyl groups. The addition amount is preferably 0.1 to 10% by mass, more preferably 0.5 to 5% by mass, based on the total solid content in the image recording layer.

-Development accelerator-
For the purpose of further improving sensitivity, acid anhydrides, phenols and organic acids can be used in combination.
As the acid anhydrides, cyclic acid anhydrides are preferable, and specific examples of the cyclic acid anhydrides include phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride described in US Pat. No. 4,115,128, 3, 6-Endoxy-tetrahydrophthalic anhydride, tetrachlorophthalic anhydride, maleic anhydride, chloromaleic anhydride, α-phenylmaleic anhydride, succinic anhydride, pyromellitic anhydride and the like can be used. Examples of the non-cyclic acid anhydride include acetic anhydride.
Examples of phenols include bisphenol A, 2,2′-bishydroxysulfone, p-nitrophenol, p-ethoxyphenol, 2,4,4′-trihydroxybenzophenone, 2,3,4-trihydroxybenzophenone, 4- Hydroxybenzophenone, 4,4 ', 4 "-trihydroxytriphenylmethane, 4,4', 3", 4 "-tetrahydroxy-3,5,3 ', 5'-tetramethyltriphenylmethane .

Further, examples of organic acids include sulfonic acids, sulfinic acids, alkyl sulfates, phosphonic acids, phosphoric esters, carboxylic acids and the like described in JP-A-60-88942 and JP-A-2-96755. Specifically, p-toluenesulfonic acid, dodecylbenzenesulfonic acid, p-toluenesulfinic acid, ethyl sulfate, phenylphosphonic acid, phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophthalic acid, Examples include adipic acid, p-toluic acid, 3,4-dimethoxybenzoic acid, phthalic acid, terephthalic acid, 4-cyclohexene-1,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid, ascorbic acid and the like. .
The proportion of the acid anhydride, phenols and organic acids in the image recording layer is preferably 0.05 to 20% by mass, more preferably 0.1 to 15% by mass, and particularly preferably 0.1 to 10%. % By mass.

-Surfactant-
In the image recording layer, as described in Japanese Patent Application Laid-Open Nos. 62-251740 and 3-208514, in order to improve the coating property and to expand the stability of the processing with respect to the development conditions. Nonionic surfactants, amphoteric surfactants as described in JP-A-59-121044, JP-A-4-13149, siloxane-based compounds as described in EP950517, JP A fluorine-containing monomer copolymer as described in JP-A-62-170950, JP-A-11-288093, and Japanese Patent Application No. 2001-247351 can be added.
Specific examples of the nonionic surfactant include sorbitan tristearate, sorbitan monopalmitate, sorbitan trioleate, stearic acid monoglyceride, polyoxyethylene nonylphenyl ether and the like. Specific examples of amphoteric activators include alkyldi (aminoethyl) glycine, alkylpolyaminoethylglycine hydrochloride, 2-alkyl-N-carboxyethyl-N-hydroxyethylimidazolinium betaine and N-tetradecyl-N, N-betaine. Type (for example, trade name “Amorgen K” manufactured by Daiichi Kogyo Co., Ltd.).
The siloxane compound is preferably a block copolymer of dimethylsiloxane and polyalkylene oxide. Specific examples include DBE-224, DBE-621, DBE-712, DBP-732, DBP-534, manufactured by Chisso Corporation. And polyalkylene oxide-modified silicones such as Tego Glide 100 manufactured by Tego, Germany.
The proportion of the nonionic surfactant and amphoteric surfactant in the total solid content in the image forming layer is preferably from 0.01 to 15% by mass, more preferably from 0.1 to 5% by mass, and even more preferably 0. 0.05 to 0.5 mass%.

-Bakeout agent / colorant-
In the image recording layer, a print-out agent for obtaining a visible image immediately after heating by exposure, or a dye or pigment as an image colorant can be added.
A representative example of the printing-out agent is a combination of a compound that releases an acid by heating by exposure (photoacid releasing agent) and an organic dye that can form a salt. Specifically, combinations of o-naphthoquinonediazide 4-sulfonic acid halides and salt-forming organic dyes described in JP-A-50-36209 and JP-A-53-8128, 36223, 54-74728, 60-3626, 61-143748, 61-151644, and 63-58440, which are trihalomethyl compounds and salt-forming organic dyes. Combinations can be mentioned. Such trihalomethyl compounds include oxazole-based compounds and triazine-based compounds, both of which have excellent temporal stability and give clear printout images.

As the image colorant, other dyes can be used in addition to the above-mentioned salt-forming organic dyes. Examples of suitable dyes including salt-forming organic dyes include oil-soluble dyes and basic dyes. Specifically, Oil Yellow # 101, Oil Yellow # 103, Oil Pink # 312, Oil Green BG, Oil Blue BOS, Oil Blue # 603, Oil Black BY, Oil Black BS, Oil Black T-505 (above Orient Chemical Industry) Co., Ltd.), Victoria Pure Blue, Crystal Violet Lactone, Crystal Violet (CI42555), Methyl Violet (CI42535), Ethyl Violet, Rhodamine B (CI145170B), Malachite Green (CI42000), Methylene Blue (CI522015), and the like. it can. The dyes described in JP-A-62-293247 are particularly preferred.
These dyes can be added in a proportion of 0.01 to 10% by mass, preferably 0.1 to 3% by mass, based on the total solid content in the image recording layer.

-Plasticizer-
Further, a plasticizer is added to the image recording layer as needed to impart flexibility of the coating film. For example, butylphthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate, acrylic acid or methacrylic acid These oligomers and polymers are used.

-Wax agent-
In the image recording layer of the lithographic printing plate precursor, for the purpose of imparting scratch resistance, a compound that lowers the static friction coefficient of the surface can also be added. Specifically, esters of long chain alkyl carboxylic acids as used in US Pat. No. 6,117,913, Japanese Patent Application No. 2001-261627, Japanese Patent Application No. 2002-032904, Japanese Patent Application No. 2002-165584 And the like. The amount added is preferably 0.1 to 10% by mass, more preferably 0.5 to 5% by mass in the total solid content forming the layer.

A lithographic printing plate precursor can usually be produced by dissolving a heat-sensitive composition containing the above-described components in a solvent and coating the solution on a suitable support.
[Coating solvent]
Solvents used here include ethylene dichloride, cyclohexanone, methyl ethyl ketone, methanol, ethanol, propanol, ethylene glycol monomethyl ether, 1-methoxy-2-propanol, 2-methoxyethyl acetate, 1-methoxy-2-propyl acetate, dimethoxy Ethane, methyl lactate, ethyl lactate, N, N-dimethylacetamide, N, N-dimethylformamide, N-methylpyrrolidone, tetramethylurea, N-methylpyrrolidone, dimethyl sulfoxide, sulfolane, γ-butyrolactone, toluene, water, etc. However, the present invention is not limited to this. These solvents are used alone or in combination.
When selecting the coating solvent, the coating solvent for the upper recording layer is used in order to prevent compatibility at the interface between the two layers of the upper recording layer and the lower recording layer when they are provided adjacent to each other. Is preferably selected so as not to substantially dissolve the lower recording layer. The concentration of the above components (total solid content including additives) in the solvent is preferably 1 to 50% by mass.
When using an acid anhydride, the water in the coating solution is preferably 0.5% or less.

[Amount of application]
Further, the coating amount (solid content) of the heat-sensitive composition varies depending on the application, but it can be provided at a coating amount of 0.3 to 3.0 g / m ² from the viewpoint of film properties and printing durability. Preferably it is 0.5-2.5 g / m < ² >, More preferably, it is 0.8-1.6 g / m < ² >.

[Multilayer structure]
The lithographic printing plate precursor used in the present invention has an image recording layer containing the above-described components provided on a support, but these image recording layers may have a multilayer structure of at least two layers. Good (for the sake of convenience, the case of two layers consisting of an upper layer and a lower layer will be described below).
In this case, the alkali-soluble resin constituting the upper layer and the lower layer can be the alkali-soluble resin described above, but the upper layer has a lower solubility in alkali than the lower layer. Is preferred.
The infrared absorbing dye may be an infrared absorbing dye different in each layer, or an infrared absorbing dye composed of a plurality of compounds may be used in each layer. The amount to be contained is 0.01 to 50% by mass, preferably 0.1 to 50% by mass, and particularly preferably 0.1% to 50% by mass, based on the total solid content of the layer to be added, as described above, when used in any layer. It can add in the ratio of 0.1-30 mass%. When adding to a several layer, it is preferable to add so that the total of addition amount may become the said range.

In the state of being thermally decomposable and not thermally decomposable, the substance that substantially lowers the solubility of the alkali-soluble resin may be partially decomposed over time, so when the image recording layer has a multilayer structure, Although it is effective to contain it in the lower layer, it may be any layer or both layers. The amount to be contained is as described above. When adding to a several layer, it is preferable to add so that the total of addition amount may become the said range.
In the case of a multilayer structure, the lactone compound is effective to be contained in the upper layer, but it may be any layer or both layers.

[Support]
Examples of the hydrophilic support used in the lithographic printing plate precursor include a dimensionally stable plate having necessary strength and durability, such as paper, plastic (for example, polyethylene, polypropylene, polystyrene). Etc.) laminated paper, metal plate (eg, aluminum, zinc, copper, etc.), plastic film (eg, cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate, cellulose nitrate, polyethylene terephthalate) , Polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc.), paper laminated with a metal as described above, or vapor-deposited paper, or a plastic film.

  As the support, a polyester film or an aluminum plate is preferable. Among them, an aluminum plate that has good dimensional stability and is relatively inexpensive is particularly preferable. A suitable aluminum plate is a pure aluminum plate or an alloy plate containing aluminum as a main component and containing a trace amount of foreign elements, and may be a plastic film on which aluminum is laminated or vapor-deposited. Examples of foreign elements contained in the aluminum alloy include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel, and titanium. The content of foreign elements in the alloy is at most 10% by mass.

  A particularly suitable aluminum is pure aluminum, but completely pure aluminum is difficult to manufacture in terms of refining technology, and may contain slightly foreign elements. Thus, the composition of the aluminum plate is not specified, and an aluminum plate made of a publicly known material can be used as appropriate. The thickness of the aluminum plate used in the present invention is about 0.1 mm to 0.6 mm, preferably 0.15 mm to 0.4 mm, and particularly preferably 0.2 mm to 0.3 mm.

Prior to roughening the aluminum plate, a degreasing treatment with, for example, a surfactant, an organic solvent, or an alkaline aqueous solution for removing rolling oil on the surface is performed as desired. The surface roughening treatment of the aluminum plate is performed by various methods. For example, a method of mechanically roughening, a method of electrochemically dissolving and roughening a surface, and a method of selectively dissolving a surface chemically. This is done by the method of As the mechanical method, a known method such as a ball polishing method, a brush polishing method, a blast polishing method, or a buff polishing method can be used. Further, as an electrochemical surface roughening method, there is a method of performing alternating current or direct current in hydrochloric acid or nitric acid electrolyte. Further, as disclosed in JP-A-54-63902, a method in which both are combined can also be used.
The roughened aluminum plate is subjected to an alkali etching treatment and neutralization treatment as necessary, and then subjected to an anodization treatment to enhance the water retention and wear resistance of the surface as desired. As the electrolyte used for the anodizing treatment of the aluminum plate, various electrolytes that form a porous oxide film can be used. In general, sulfuric acid, phosphoric acid, oxalic acid, chromic acid, or a mixed acid thereof is used. The concentration of these electrolytes is appropriately determined depending on the type of electrolyte.

The treatment conditions for anodization vary depending on the electrolyte used, and thus cannot be specified in general. In general, however, the electrolyte concentration is 1 to 80% by mass solution, the liquid temperature is 5 to 70 ° C., and the current density is 5 to 60 A / dm ^2. A voltage of 1 to 100 V and an electrolysis time of 10 seconds to 5 minutes are suitable. The amount of the anodized film is preferably 1.0 g / m ² or more in terms of printing durability. After the anodizing treatment, the aluminum surface is subjected to a hydrophilic treatment if necessary. Examples of the hydrophilic treatment include alkali metal silicates as disclosed in US Pat. Nos. 2,714,066, 3,181,461, 3,280,734 and 3,902,734. (For example, sodium silicate aqueous solution) method. In this method, the support is immersed in an aqueous sodium silicate solution or electrolytically treated. In addition, it is disclosed in potassium fluoride zirconate disclosed in Japanese Patent Publication No. 36-22063 and US Pat. Nos. 3,276,868, 4,153,461, and 4,689,272. A method of treating with polyvinylphosphonic acid is used.

The lithographic printing plate precursor used in the present invention has at least the above-mentioned image recording layer provided on a support, and an undercoat layer may be provided between the support and the image recording layer as necessary. it can.
Various organic compounds are used as the primer layer component. For example, phosphonic acids having an amino group such as carboxymethylcellulose, dextrin, gum arabic, 2-aminoethylphosphonic acid, and phenylphosphonic acid which may have a substituent Organic phosphonic acids such as naphthyl phosphonic acid, alkyl phosphonic acid, glycero phosphonic acid, methylene diphosphonic acid and ethylene diphosphonic acid, phenyl phosphoric acid, naphthyl phosphoric acid, alkyl phosphoric acid and glycerophosphoric acid which may have a substituent Organic phosphoric acid, optionally substituted phenylphosphinic acid, naphthylphosphinic acid, alkylphosphinic acid, glycerophosphinic acid and other organic phosphinic acids, glycine and β-alanine amino acids, and triethanolamine hydrochloric acid Has a hydroxy group such as salt -Alanine, and hydrochlorides of amines that may be used in combination of two or more.

  Furthermore, an undercoat layer containing at least one compound selected from the group of organic polymer compounds having a structural unit represented by the following formula is also preferred.

R ¹¹ represents a hydrogen atom, a halogen atom or an alkyl group, and R ¹² and R ¹³ each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, —OR ^14. , -COOR ¹⁵ , -CONHR ¹⁶ , -COR ¹⁷ or -CN, or R ¹² and R ¹³ may be bonded to form a ring, and R ^{14 to} R ¹⁷ are each independently an alkyl group or Represents an aryl group, X represents a hydrogen atom, a metal atom, or NR ¹⁸ R ¹⁹ R ²⁰ R ²¹ , and R ^{18 to} R ²¹ each independently represent a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, or a substituted aryl. Represents a group, or R ¹⁸ and R ¹⁹ may combine to form a ring, and m represents an integer of 1 to 3.

This undercoat layer can be provided by the following method. That is, a method in which water or an organic solvent such as methanol, ethanol, methyl ethyl ketone, or a mixed solvent thereof is dissolved and applied on an aluminum plate and dried, and water, methanol, ethanol, methyl ethyl ketone, etc. In this method, an aluminum plate is immersed in a solution in which the above organic compound is dissolved in the above organic solvent or a mixed solvent thereof to adsorb the above compound, then washed with water or the like and dried to provide an undercoat layer. In the former method, a solution having a concentration of 0.005 to 10% by mass of the organic compound can be applied by various methods. In the latter method, the concentration of the solution is 0.01 to 20% by mass, preferably 0.05 to 5% by mass, the immersion temperature is 20 to 90 ° C., preferably 25 to 50 ° C., and the immersion time is 0.1 second to 20 minutes, preferably 2 seconds to 1 minute. The solution used for this can be adjusted to a pH range of 1 to 12 with basic substances such as ammonia, triethylamine, potassium hydroxide, and acidic substances such as hydrochloric acid and phosphoric acid.
From the viewpoint of printing durability, the coating amount of the undercoat layer is suitably ² to 200 mg / m ² , preferably 5 to 100 mg / m ² .

The lithographic printing plate precursor prepared as described above is imagewise exposed, and then subjected to development using the alkali developing solution detailed above.
Examples of the active light source used for image exposure include a mercury lamp, a metal halide lamp, a xenon lamp, a chemical lamp, and a carbon arc lamp. Examples of radiation include electron beams, X-rays, ion beams, and far infrared rays. Also, g-line, i-line, deep-UV light, and high-density energy beam (laser beam) are used. Examples of the laser beam include a helium / neon laser, an argon laser, a krypton laser, a helium / cadmium laser, and a KrF excimer laser. In the present invention, a light source having an emission wavelength in the near infrared to infrared region is preferable, and a solid laser or a semiconductor laser is particularly preferable.

  If the lithographic printing plate obtained by image exposure, development, washing and / or rinsing and / or gumming has an unnecessary image area, the unnecessary image area is erased. . Such erasing is preferably performed by applying an erasing solution as described in, for example, Japanese Patent Publication No. 2-13293 to an unnecessary image portion, leaving it for a predetermined time, and then washing with water. As described in JP-A-59-174842, a method of developing after irradiating an unnecessary image portion with an actinic ray guided by an optical fiber can also be used.

The lithographic printing plate obtained by the plate making method of the present invention as described above can be subjected to a printing process after applying a desensitized gum if desired. If it is desired to burn, a burning process is performed. In the case of burning a lithographic printing plate, before burning, the preparations described in JP-B-61-2518, JP-A-55-28062, JP-A-1-31859, and JP-A-61-159655 are prepared. It is preferable to treat with a surface liquid.
As the method, it is possible to apply a lithographic printing plate with a sponge or absorbent cotton soaked with the surface-adjusting liquid, or immerse the printing plate in a vat filled with the surface-adjusting liquid, or apply an automatic coater. Application by, for example, is applied. Further, it is more preferable to make the coating amount uniform with a squeegee or a squeegee roller after coating.

In general, the amount of surface-adjusting solution applied is suitably from 0.03 to 0.8 g / m ² (dry weight). The lithographic printing plate coated with the surface-adjusting liquid is dried if necessary, and then heated to a high temperature with a burning processor (for example, burning processor “BP-1300” sold by Fuji Photo Film Co., Ltd.). . In this case, the heating temperature and time are in the range of 180 to 300 ° C. and preferably in the range of 1 to 20 minutes, although depending on the type of components forming the image.
The lithographic printing plate subjected to burning treatment can be subjected to conventional treatments such as washing with water and gumming as needed, but a surface-conditioning solution containing a water-soluble polymer compound is used. In such a case, a so-called desensitizing treatment such as gumming can be omitted. The lithographic printing plate obtained by such treatment is applied to an offset printing machine and used for printing a large number of sheets.

<Embodiments of treatment agent, printing plate, etc.>

  FIG. 1 is a block diagram of a first embodiment of an automatic developing machine for carrying out the development replenishing method according to the present invention. As shown in FIG. 1, the automatic processor 2 includes a developing unit 6 for developing a photosensitive lithographic printing plate (hereinafter referred to as “PS plate”) 4 and a development adhered to the PS plate 4 after development. A post-processing unit 8 for washing out the liquid and applying the gum solution and a drying unit 10 for drying the PS plate after the gum solution application are provided.

  In the case of processing a PS plate that needs to be heated before the development processing, a preheating unit (not shown in FIG. 1) can be provided. The preheating unit is installed upstream of the developing unit 6 in the transport direction, and has a function of maintaining the specified PS plate surface temperature for a specified time while transporting the PS plate. The PS plate inserted in the preheating unit is automatically conveyed to the next process while being heated. Furthermore, it is possible to provide a pre-water washing section (not shown in FIG. 1). The pre-washing unit is installed on the upstream side in the transport direction of the developing unit 6 and on the downstream side in the transport direction of the pre-heating unit, and has a function of cleaning and cooling the surface of the PS plate with washing water while transporting the PS plate. The PS plate inserted in the pre-water washing unit is automatically conveyed to the developing unit 6 which is the next process.

  An insertion port 14 is formed in the side plate 12 of the automatic developing machine 2, and the PS plate 4 inserted from the insertion port 14 is conveyed to the developing unit 6 by the conveyance roller 16. The insertion port 14 is provided with a rubber blade 18, and the insertion port 14 is closed by the rubber blade 18 when the PS plate 4 is not inserted.

  In the developing tank 20 of the developing unit 6, a conveyance roller 22, a brush roller 24, and a squeeze roller 26 are sequentially provided from the upstream side in the conveyance direction, and a backup roller 28 is provided at an appropriate position therebetween. The PS plate 4 is developed by being immersed in the developer while being conveyed by the conveying roller 22.

  The post-processing unit 8 connected to the developing unit 6 includes a water washing unit 8a and a finisher unit 8b. The washing unit 8 a is provided with rollers 30 a ′ and 30 a for conveying the PS plate 4 and jet members 34 a for spraying the washing solution in the washing tanks 32 a and 32 a onto the PS plate 4. And the flush water supply pump 78a which supplies flush water to the flush tank 32a is provided. Each of the finisher sections 8b is provided with a roller 30b for conveying the PS plate 4 and an injection member 34b for spraying the finisher liquid in the finisher tanks 32b and 32b to the PS plate 4, and supplying gum liquid to the finisher tank 32b. A liquid supply pump 77 and a gum liquid diluent supply pump 78b for supplying the gum liquid diluent are provided. Then, the PS plate 4 after the development processing is washed with water by spraying a washing solution by the discharge member 34a while being conveyed by the conveyance roller 30a. Further, the PS plate 4 is applied by spraying the finisher liquid by the discharge member 34b while being conveyed by the conveyance roller 30b.

  At this time, the washing tank 32a is replenished with the dilution liquid 57 in the replenishment dilution liquid tank 53 by the washing water supply pump 78a, and the finisher tank 32b is replenished with the gum liquid in the gum liquid tank 56 by the pump 77. The dilution liquid 57 in the dilution liquid storage tank 53 is replenished by a replenishment dilution liquid supply pump 78b. Here, the replenishment ratio of the gum solution and the diluent is, for example, 1: 1. Along with the replenishment, the washing liquid overflowed from the washing tank 32a and the gum waste liquid overflowed from the finisher tank 32b are collected in the waste liquid tank 54 in the same manner as the development waste liquid.

  Further, it is also effective to provide the washing unit 8a with a washing brush roller (not shown in FIG. 1). The washing brush roller is installed on the upper surface or upper and lower surfaces of the PS plate 4 between the spray member 34a and the PS plate 4, and rubs and rinses the surface of the PS plate 4 being conveyed while rotating.

  On the other hand, a structure in which the water washing portion 8a is the first finisher portion 8a and the finisher portion 8b is the second finisher portion 8b is also effective. The first finisher portion 8a and the second finisher portion 8b are provided with transport rollers 30a and 30b for transporting the PS plate 4, and jet members 34a and 34b for spraying the gum solution in the finisher tanks 32a and 32b to the PS plate 4, The PS plate 4 after the development processing is applied by spraying a gum solution by the spray members 34a and 34b while being transported by the transport rollers 30a and 30b. At this time, the gum solution in the finisher tank 32b of the second finisher section 8b on the downstream side is supplied by overflowing into the finisher tank 32a of the first finisher section 8a on the upstream side. Instead of this, it may be similarly supplied by a pump or the like. In this case, the flush water supply pump 78a is not used.

  At this time, the gum liquid in the gum liquid tank 56 is replenished to the second finisher tank 32 b by the pump 77 and the dilution liquid 57 in the replenishment dilution liquid storage tank 53 is replenished by the replenishment dilution liquid supply pump 78. Here, the replenishment ratio of the gum solution and the diluent is, for example, 1: 1. With this replenishment, the gum waste liquid overflowed from the first finisher tank 32a is collected in the waste liquid tank 54 in the same manner as the development waste liquid.

  The drying unit 10 connected to the finisher unit 8 is provided with a guide roller 36 and a pair of skewer rollers 38 in order from the upstream side in the transport direction. The drying unit 10 is provided with drying means such as hot air supply means and heat generation means (not shown). The drying unit 10 is provided with a discharge port 40, and the PS plate 4 dried by the drying means is discharged from the discharge port 40. In addition, a shutter 44 is provided in a path between the drying unit 10 and the finisher unit 8, and the path 46 is closed by the shutter 44 when the PS plate 4 does not pass through the path 46.

  The developing tank 20 is provided with a box-shaped shielding lid 60 integrally with the tank wall. The bottom wall of the shielding lid 60 is continuously curved in an arc shape so as not to come into contact with the upper outer peripheral surfaces of the transport roller 22, the brush roller 24, and the backup roller 28, and does not interfere with the roller or the like. Since the shielding lid 60 is box-shaped, an airtight space is defined in the upper part of the developing tank 20, and the amount of air in the developing unit 6 is reduced as much as possible. Further, since the shielding lid 60 is provided, the contact area between the developer and air is reduced as much as possible.

  In the automatic processor 2 having the above-described configuration, the rubber blade 62 is provided at a proper position, and the developing unit 6 to the finisher unit 8b are substantially airtight with respect to the external atmosphere, so that the outside air does not flow in. ing. Further, a space between the developing unit 6 and the water washing unit 8a is substantially airtight by the rubber blade 62 so that air in the water washing unit 8a does not flow into the developing unit 6. Therefore, the developing unit 6 has a hermetically sealed structure in which air flows in slightly when the PS plate 4 passes, but is substantially airtight and hardly receives air.

  Next, the developing unit 6 will be described in detail. A developing solution circulation pipe 80 is connected to the developing tank 20. In the circulation pipe 80, a developer circulation pump 71, an electrical conductivity sensor 73, and a filter (not shown) are provided. The developer circulation pump 71 sucks the developer in the developer tank 20 from the suction hole at the bottom of the developer tank 20 into the circulation pipe 80 and circulates in the circulation pipe 80, and again into the developer tank 20. Discharge. The filter filters the developer flowing in the circulation pipe 80. The conductivity sensor 73 measures the conductivity of the developer flowing in the circulation pipe 80.

  In addition, the developing unit 6 includes replenishment pipes 90 and 91, a replenishment stock solution storage tank 55 connected to the replenishment pipe 90, and a replenishment stock solution interposed in the replenishment pipe 90. A pump 74, a replenishment diluent storage tank 53 connected to the replenishment piping 91, and a replenishment dilution supply pump 76 interposed in the replenishment piping 91 are provided, and these function as a replenishment liquid feeding means. Further, the developing waste liquid overflowed from the developing tank 20 is collected in the waste liquid tank 54.

  More specifically, a pair of development replenisher replenishment pipes 90 and 91 obtained by diluting the development replenishment stock solution 58 with the replenishment diluent 57 is provided in the vicinity of the developing tank 20. The other end (lower end in FIG. 1) of the replenishment piping 90 for the development replenishing stock solution 58 is connected to the replenishing stock solution storage tank 55, and a replenishing stock solution supply pump 74 is provided in the piping. The replenishment stock solution supply pump 74 supplies the development replenishment stock solution 58 from the replenishment stock solution storage tank 55 to the developing tank 20. The replenishment pipe 91 for the replenishment diluent 57 has the other end (lower end in FIG. 1) connected to the replenishment diluent storage tank 53, and a replenishment diluent supply pump 76 is provided in the pipe. The replenishment diluent supply pump 76 supplies the replenishment diluent (water) 57 from the replenishment diluent storage tank 53 to the developing tank 20. That is, the replenishment pipe 91, the replenishment diluent supply pump 76, and the replenishment diluent storage tank 53 constitute a dilution water replenishment device.

  The replenishment stock solution supply pump 74 and the replenishment dilution solution supply pump 76 are provided with a control ROM 51a or control RAM 51b, which is a condition storage means, and a time measurement unit 52 based on signals from the conductivity sensor 73 and the time measurement unit 52. It is controlled by a device (control means) 50. Further, the control device 50 drives the transport roller 22, the brush roller 24, the squeeze roller 26, and the like at appropriate timing based on the signal from the plate detection sensor 27, and transports the PS plate.

  Further, the control device 50 uses the time measuring unit 52 to measure the elapsed time from the previous time of replenishment integration time, the elapsed time from the previous conductivity measurement time, and the elapsed time since the previous replenishment. The area of the plate is calculated on the basis of the signal from, and the developer conductivity is measured by the conductivity sensor 73. Then, if necessary using the values, the control device 50 supplies the developer replenisher (development replenisher stock 58 + replenisher diluent 57) at a replenishment amount / replenisher dilution rate determined in advance, and the replenishment stock solution storage tank 55. And supplied from the replenishment diluent storage tank 53 to the developing tank 20.

  Next, control by the control device 50 will be described. 2, 3, 4, and 5 are examples of flowcharts showing a control method by the control device 50.

First, a basic control process for replenishing the development replenisher will be described with reference to FIG.
In step 1 (hereinafter abbreviated as S1), a developer conductivity value at which the developer obtained experimentally in advance has an appropriate activity is set as a conductivity target value. Next, in S2, replenishment over time corresponding to the stop time of the automatic developing machine, that is, the elapsed time from the previous stop to the current start, is performed unless it is the first start-up time when the developer is newly replaced.
In S3, if a predetermined time interval elapses, the time-dependent replenishment liquid amount calculated from the time-dependent replenishment amount set value and the elapsed time is replenished. Next, in S4, if a plate for each predetermined fixed area has been processed, the amount of processing replenisher calculated from the processing replenishment amount set value and the processing area is replenished. Next, in S5, it is determined whether the elapsed time from the time of starting or measuring the previous developer conductivity has reached a predetermined time, and if it has reached, the process proceeds to S6, and if not, the process proceeds to S9.
In S6, the conductivity of the developer is measured. Next, in S7, the measured conductivity value is compared with the target conductivity value, and if the measured conductivity value is large, the process proceeds to S8, and if the measured conductivity value is small, the process proceeds to S9. In S8, a predetermined amount of diluent (water) is added to the developer in the developer tank.
In S9, the state of the operation switch of the automatic developing machine is investigated. If the operation switch is turned on, the process returns to S3, and if the operation switch is turned off, the process is terminated by stopping the apparatus.

Next, the first control process that specifically shows the basic control process will be described with reference to FIGS. 3 and 4. FIG.
In S10, when the developer is started for the first time when the developer is newly replaced, the time-dependent replenishment integrated value: I _H , the processing replenishment integrated value: I _V , and the replenisher replacement rate: X, which are variables used during the control, are initially set. Substituting 0. Next, in S11, if the first time at startup was newly swapped developer, stop time of the automatic developing solution: time lapse replenishment amount corresponding to T _F: supplemented with V _F, variable: integrating the I _H. It is desirable to perform the calculation at this time as follows.
V _F = V _CF × _TF : Formula 1
I _H + V _F → I _H : Calculation formula 2
(V _CF is the amount of replenishment over time per unit time when the automatic processor is stopped experimentally obtained in advance)

Next, in S12, updates the X using a V _F and expression. The arithmetic expression used at this time is preferably the following expression.
(V _T × X + V _F ) ÷ (V _T + V _F ) → X: Calculation formula 3
(V _T is the developer volume in the developer tank)

In S13, the elapsed time from the time supplemented with startup or previous time replenisher, predetermined time: determining whether reached T _K, to S14 if elapsed, the process proceeds to S16 when not reached . In S14, the automatic developing machine the elapsed time during operation: T _K required by time lapse replenishment amount: The V _C replenished in the developer in the developing tank, further integrates the V _C to I _H. For example, the calculation is performed as follows.
V _C = V _CN × T _K : Formula 4
I _H + V _C → I _H : Calculation formula 5
(V _CN is the amount of replenishment over time per unit time when the automatic processor is operated experimentally obtained in advance)

In S15, X is updated using V _C and the arithmetic expression. The arithmetic expression used at this time is preferably the following expression.
(V _T × X + V _C ) ÷ (V _T + V _C ) → X: Equation 6

In S16, it is determined whether the processing area at the time of start-up or the replenishment of the processing replenisher last time has reached a predetermined processing area: S. If it is processed, the process proceeds to S17. . In S17, the processing area: processing replenishment amount required by the S: supplemented with V _B in the developer in the developing tank, further integrates the V _B to I _H. For example, the calculation is performed as follows.
V _B = V _BN × S: Formula 7
I _H + V _B → I _H : Calculation formula 8
(V _BN is the amount of processing replenishment per unit area determined experimentally beforehand)

In S18, X is updated using V _B and the arithmetic expression. The arithmetic expression used at this time is preferably the following expression.
(V _T × X + V _B ) ÷ (V _T + V _B ) → X: Equation 9

Next, in S19, the time elapsed from the time or the time of measuring the last electric conductivity of developer starts, predetermined time: it is determined whether or not reached T _D, to S20 if passed, when not reached Proceed to S26.
Step S20 electric conductivity of the developer is measured, the value assigned to a variable: d _M. In the next _{S21, I H, I W,} X, and electric conductivity target value using the arithmetic expression: calculates a d _T. The following equation is desirable as the arithmetic expression.
y = I _H ÷ (I _H + I _W ) − I _W ÷ (I _H + I _W ) × C _R
: Formula 10
d _T = (1 − X) × D _M + X × {(1 − y) × D _W + y × D _L }
: Calculation formula 11
(C _R , D _M , D _W , D _L are constants obtained experimentally in advance)

In S22, to compare the d _M and d _T. If d _M is large, the process proceeds to S23, and if d _M is small, the process proceeds to S26. In S23, a dilute solution (water) of a predetermined amount: V _W is added to the developer in the developing tank, and in the next S24, V _W is added to the variable: I _W. At this time, it is desirable to use the following arithmetic expression.
I _W + V _W → I _W : Calculation formula 12
In the next S25, X is updated using V _W and an arithmetic expression. At this time, it is desirable to use the following arithmetic expression.
(V _T × X + V _W ) ÷ (V _T + V _W ) → X: Equation 13

  In S26, the state of the operation switch of the automatic developer is checked, and if the operation switch is turned on, the process returns to S13, and if the operation switch is turned off, the process is terminated by stopping the apparatus.

  In this way, by using the replenisher replacement rate, which is the ratio of the developer replenisher replenished to the developer in the developer tank, the conductivity target value is sequentially calculated each time the developer replenisher is replenished. The development part of the automatic developing machine has a simple and inexpensive configuration, and it can minimize the fluctuation of the developer sensitivity to the change of the development processing condition with the developer containing electrolyte and dreg dispersant, and replenish Generation of waste can be prevented by increasing the concentration of the waste dispersant in the solution higher than that of the developer.

Next, the second control process will be described with reference to FIGS.
In S27, at the first start-up time when the developer is newly replaced, the replenishment integrated value: I _H , the processing replenishment integrated value: I _V , the replenisher replacement rate: X, and the replenishment over time, which are variables used during control. Ratio: F is initialized, that is, I _H = 0, I _V = 0, X = 0, F = C _F is substituted (C _F is a constant obtained experimentally in advance). Next, in S28, if the first time at startup was newly swapped developer, stop time of the automatic developing solution: time lapse replenishment amount corresponding to T _F: supplemented with V _F, variable: integrating the I _H. It is desirable to perform the calculation at this time as follows.
V _F = V _CF × _TF : Formula 14
I _H + V _F → I _H : Formula 15
(V _CF is the amount of replenishment over time per unit time when the automatic processor is stopped experimentally obtained in advance)

Next, in S29, updates the X and F using V _F and expression. The arithmetic expression used at this time is preferably the following expression.
(V _T × X + V _F ) ÷ (V _T + V _F ) → X: Calculation formula 16
(VT × X × F + V _F ) ÷ (V _T × X + V _F ) → F
: Calculation formula 17
(V _T is the developer volume in the developer tank)

In S30, the elapsed time from the time supplemented with startup or previous time replenisher, predetermined time: determining whether reached T _K, to S31 if elapsed, the process proceeds to S33 when not reached . In S31, the replenishment amount required over time: V _C required for the elapsed time T _K when the automatic processor is in operation is replenished to the developer in the developing tank, and V _C is added to I _H. For example, the calculation is performed as follows.
V _C = V _CN × T _K : Formula 18
I _H + V _C → I _H : Formula 19
(V _CN is the amount of replenishment over time per unit time when the automatic processor is operated experimentally obtained in advance)

In S32, X and F are updated using V _C and the arithmetic expression. The arithmetic expression used at this time is preferably the following expression.
(V _T × X + V _C ) ÷ (V _T + V _C ) → X: Formula 20
(V _T × X × F + V _C ) ÷ (V _T × X + V _C ) → F
: Formula 21

In S33, it is determined whether the processing area at the time of start-up or the replenishment of the processing replenisher last time has reached a predetermined processing area: S. If it is processed, the process proceeds to S34. . In S34, the processing area: processing replenishment amount required by the S: supplemented with V _B in the developer in the developing tank, further integrates the V _B to I _H. For example, the calculation is performed as follows.
V _B = V _BN × S: Formula 22
I _H + V _B → I _H : Formula 23
(V _BN is the amount of processing replenishment per unit area determined experimentally beforehand)

In S35, X and F are updated using V _B and the arithmetic expression. The arithmetic expression used at this time is preferably the following expression.
(V _T × X + V _B ) ÷ (V _T + V _B ) → X: Calculation formula 24
(V _T × X × F) ÷ (V _T × X + V _B ) → F: Formula 25

Next, in S36, the time elapsed from the time or the time of measuring the last electric conductivity of developer starts, predetermined time: it is determined whether or not reached T _D, in S37 if the elapsed when not reached Proceed to S43.
In S37 electric conductivity of the developer is measured, the value assigned to a variable: d _M. In the next _{S38, I H, I W,} X, F, and electric conductivity target value using the arithmetic expression: calculates a d _T. The following equation is desirable as the arithmetic expression.
y = I _H ÷ (I _H + I _W ) − I _W ÷ (I _H + I _W ) × C _R
: Formula 26
d _T = (1−X) × D _M + X × {(1−y) × D _W + y × ((1−F) × D _B + F × D _C )}
: Calculation formula 27
(C _R , D _M , D _W , D _B , D _C are constants obtained experimentally in advance)

In S39, to compare the d _M and d _T. If d _M is large, the process proceeds to S40, and if d _M is small, the process proceeds to S43. In S40, a predetermined amount: V _W diluting solution (water) is added to the developing solution in the developing tank, and in the next S41, V _W is added to the variable: I _W. At this time, it is desirable to use the following arithmetic expression.
I _W + V _W → I _W : Calculation formula 28
In the next S42, X is updated using V _W and the arithmetic expression. At this time, it is desirable to use the following arithmetic expression.
(V _T × X + V _W ) ÷ (V _T + V _W ) → X: Equation 29

  In S43, the state of the operation switch of the automatic developer is investigated, and if the operation switch is turned on, the process returns to S30, and if the operation switch is turned off, the process is terminated by stopping the apparatus.

  In this way, the replenishment ratio with time, which is the ratio of the developer replenisher replenished based on the operation time and / or stop time of the automatic developing machine to the total replenisher replenishment amount replenished to the developer in the developer tank, and replenishment Using the liquid replacement rate, the target value of conductivity is calculated each time the developer replenisher or diluent is replenished, so that development processing conditions (the ratio between the replenishment amount and the replenishment amount with time) and environment It is possible to cope with fluctuations in the appropriate value of conductivity due to changes in conditions (humidity), high sensitivity stability, and automatic development processing that does not generate debris.

Next, the third control process will be described with reference to FIGS.
In S44, if it is the first time when the developer is newly replaced, the replenisher replacement rate: X, the temporal replenishment rate: F, and the developer dilution rate: Z, which are variables used during control, are initialized, that is, X = 0, F = C _F , Z = C _Z (C _F and C _Z are constants obtained experimentally in advance). Next, at S45, if the first time at startup was newly swapped developer, stop time of the automatic developing solution: T corresponds to _F time lapse replenishment amount: the V _F replenishing the developer in the developing tank. It is desirable to perform the calculation at this time as follows.
V _F = V _CF × _TF : Formula 30
(V _CF is the amount of replenishment over time per unit time when the automatic processor is stopped experimentally obtained in advance)

Next, in S46, updates the X and F using V _F and expression. The arithmetic expression used at this time is preferably the following expression.
(V _T × X + V _F ) ÷ (V _T + V _F ) → X: Calculation formula 31
(V _T × X × F + V _F ) ÷ (V _T × X + V _F ) → F
: Calculation formula 32
{V _T × X × Z ÷ (Z + 1) + V _F × C _ZH ÷ (C _ZH +1)} ÷ {V _T × X ÷ (Z + 1) + V _F ÷ (C _ZH +1)} → Z
: Calculation formula 33
(V _T is the developer volume in the developer tank, C _ZH is a predetermined constant)

In S47, the elapsed time from the time supplemented with startup or previous time replenisher, predetermined time: determining whether reached T _K, in S48 if passed, the process proceeds to step S50 when not reached . In S48, the developer in the developing tank is replenished with the replenishment amount V _C required for the elapsed time T _K when the automatic processor is in operation. For example, V _C is calculated as follows.
V _C = V _CN × T _K : Calculation formula 34
(V _CN is the amount of replenishment over time per unit time when the automatic processor is operated experimentally obtained in advance)

In S49, X, F, and Z are updated using V _C and the arithmetic expression. The arithmetic expression used at this time is preferably the following expression.
(V _T × X + V _C ) ÷ (V _T + V _C ) → X: Calculation formula 35
(V _T × X × F + V _C ) ÷ (V _T × X + V _C ) → F
: Calculation formula 36
{V _T × X × Z ÷ (Z + 1) + V _C × C _ZH ÷ (C _ZH +1)} ÷ {V _T × X ÷ (Z + 1) + V _C ÷ (C _ZH +1)} → Z
: Calculation formula 37

In S50, it is determined whether the processing area at the time of start-up or the replenishment of the processing replenisher last time has reached a predetermined processing area: S. If it is processed, the process proceeds to S51. If not, the process proceeds to S53. . In S51, the processing area: processing replenishment amount required in S: the V _B for replenishing the developer in the developing tank. For example, V _B is calculated as follows.
V _B = V _BN × S: Formula 38
(V _BN is the amount of processing replenishment per unit area determined experimentally beforehand)

In S52, X, F, and Z are updated using V _B and the arithmetic expression. The arithmetic expression used at this time is preferably the following expression.
(V _T × X + V _B ) ÷ (V _T + V _B ) → X: Formula 39
(V _T × X × F) ÷ (V _T × X + V _B ) → F: Formula 40
{V _T × X × Z ÷ (Z + 1) + V _B × C _ZH ÷ (C _ZH +1)} ÷ {V _T × X ÷ (Z + 1) + V _B ÷ (C _ZH +1)} → Z
: Formula 41

Next, in S53, the time elapsed from the time or the time of measuring the last electric conductivity of developer starts, predetermined time: it is determined whether or not reached T _D, to S54 if passed, when not reached Proceed to S59.
Step S54 electric conductivity of the developer is measured, the value assigned to a variable: d _M. In the next S55, X, F, Z and operation expression by using the electric conductivity target value: calculating a d _T. The following equation is desirable as the arithmetic expression.
y = (1-C _ZR ) × {(C _ZW +1) ÷ (Z + 1) ÷ (C _ZW −C _ZR ) −1 ÷ (C _ZW −C _ZR )}
: Calculation formula 42
d _T = (1−X) × D _M + X × {(1−y) × D _W + y × ((1−F) × D _B + F × D _C )}
: Calculation formula 43
(C _ZR , C _ZW are predetermined constants, D _M , D _W , D _B , D _C are constants obtained experimentally in advance)

In S56, to compare the d _M and d _T. If d _M is large, the process proceeds to S57, and if d _M is small, the process proceeds to S59. In S57, a dilute solution (water) of a predetermined amount: V _W is added to the developer in the developing tank. In the next S58, X and Z are updated using V _W and an arithmetic expression. At this time, it is desirable to use the following arithmetic expression.
(V _T × X + V _W ) ÷ (V _T + V _W ) → X: Calculation formula 44
{V _T × X × Z ÷ (Z + 1) + V _W } ÷ {V _T × X ÷ (Z + 1)} → Z: Formula 45

  In S59, the state of the operation switch of the automatic developer is checked. If the operation switch is turned on, the process returns to S47, and if the operation switch is turned off, the process is terminated by stopping the apparatus.

  In this way, using the developer dilution ratio, which is the ratio of the diluent replenished to the developer with respect to the developer replenisher stock solution replenished to the developer in the developing tank, the replenishment ratio with time, and the replenisher replacement rate, Conductivity due to changes in development processing conditions (ratio of processing replenishment amount and replenishment amount over time) and environmental conditions (humidity) by sequentially calculating the conductivity target value each time either the development replenisher or diluent is replenished It is possible to cope with fluctuations in the appropriate value, and to achieve automatic development processing with high sensitivity stability and no generation of residue.

  According to the above-described control of the automatic developing machine, the ratio of the replenishment amount with time and the replenishment amount with processing is automatically corrected, so that the change in processing conditions, that is, the size of the photosensitive material and the processing frequency Even with a change, it is possible to always set an appropriate target conductivity value of the developing solution, and it is possible to perform development processing with stable and constant sensitivity. Accordingly, it is possible to minimize the variation in the developer sensitivity with respect to the change in the development processing conditions while making the developing unit of the automatic developing machine simple and inexpensive.

  Next, a second embodiment of the present invention will be described. FIG. 9 is a block diagram of an automatic processor according to the second embodiment of the present invention. As shown in FIG. 9, in the automatic processor 100 of the present embodiment, the internal processing unit is covered with an outer panel 114. Inside the outer panel 114, a developing tank 118 for developing the PS plate 112, a developing section 122 having an overflow pipe 120 for collecting the developer overflowed from the developing tank 118, and the PS plate 112 were attached. A water washing part 124 for washing the developer with water and a finisher part 126 for applying a gum solution to the PS plate 112 after washing with water and desensitizing it are disposed. The flushing section 124 is provided with a flushing tank 128, and the finisher section 126 is provided with a gum solution tank 130.

  The outer panel 114 is provided with a slit-like insertion port 202 and a discharge port 204, respectively. A reentry insertion port (sub-insertion port) 250 for inserting the PS plate 112 is provided between the developing unit 122 and the water washing unit 124 on the upper surface of the outer panel 114. The sub-insertion opening 250 serves as an insertion opening for the PS plate 112 for performing processing excluding development processing.

  A blade 252 is disposed in the sub insertion port 250. The blade 252 is in contact with the outer panel 114 whose tip is used as a guide support surface of the sub insertion port 250, and the base is fixed to the back side of the outer panel 114 via a bracket 254. For this reason, the sub insertion port 250 is closed by the blade 252.

  The drying unit (not shown) is configured to blow hot air on both sides of the PS plate 112 while drying the PS plate 112 fed from the finisher unit 126 by a plurality of rollers (not shown). Yes.

  A pair of conveying rollers 132 is disposed on the side of the developing unit 122 where the PS plate 112 is inserted into the developing tank 118, and the PS plate 112 is inserted between the pair of conveying rollers 132 from the insertion port 202. It is like that.

  A rubber blade 206 is attached in the vicinity of the downstream side of the conveying roller 132. The tip of the blade 206 is in contact with the side wall of the developing tank 118 of the developing unit 122, and the base is attached to the outer panel 114 via a bracket 256. The bracket 256 includes a fixed portion 256A and a slide portion 256B attached to the fixed portion with a thumbscrew 258, and the blade 206 is fixed to the slide portion 256B. For this reason, the blade 206 is configured such that the tip end portion can be separated from the side wall of the developing tank 118 by loosening the thumbscrew 258 and sliding the slide portion 256B relative to the fixed portion 256A.

  In addition, a plate detection sensor 208 capable of measuring the presence or absence of the PS plate 12 and the plate area of the transported plate is attached in the vicinity of the insertion slot 102.

  The developing tank 118 has a substantially inverted mountain shape with the upper part opened and the bottom center part protruding downward. A pump 260 is provided in the developing tank 118, and the developer in the developing tank 118 is sucked out by the pump 260 and ejected from spray pipes 144 and 272 described later. Thereby, the developer stored in the developing tank 118 is circulated. During this circulation, it passes through a conductivity sensor 262 that measures the conductivity of the developer. The developing tank 118 is supplied with a replenishing stock solution from a development replenishing stock solution tank 266 via a replenishing stock solution supply pump 264. As will be described later, the developing tank 118 is supplied with dilution water from a washing tank 128 via a pump 286.

  The pump 264 and the pump 286 are controlled by a control device 50 including a control ROM 51a or a control RAM 51b, which is a condition storage unit, and a time measurement unit 52 based on signals from the conductivity sensor 262 and the time measurement unit 52. In addition, since the effect of the control apparatus 50 is the same as that of 1st Embodiment, the description is abbreviate | omitted.

  In the developing tank 118, a guide plate 268 is disposed on the upstream side, and a number of guide rollers 134 and a rotating brush roller 270 are disposed on the downstream side. The guide roller 134 and the rotating brush roller 270 are rotatably spanned between a pair of side plates of the developing tank 118.

  A guide roller 136 having a relatively large diameter is disposed above the guide plate 268, and rotating brush rollers 138 and 270 and a guide roller 140 are disposed above the guide roller 134. In addition, a pair of squeezing rollers 142 having a function of squeezing the surface of the PS plate 112 are disposed in the center of the developing tank 118.

  The overflow pipe 120 is disposed on the most downstream side of the developing tank 118. When the level of the developer exceeds a predetermined level, the developer is guided to the waste tank 284 and discarded.

  A liquid level lid 150 is disposed on the surface of the developer in the developing tank 118. The liquid level cover 150 has a portion corresponding to the rotating brush roller 138 and the guide roller 140 adjacent thereto protruding in a substantially arc shape, and is in close contact with the developer surface in order to minimize the contact between the developer surface and air, Both ends of the liquid surface lid 150 in the transport direction of the PS plate 112 are attached to a side plate (not shown) so as to move up and down according to the increase / decrease of the developer.

  The tip of the blade 274 is in contact with the downstream end of the liquid level lid 150 in the transport direction. The blade 274 is fixed to the outer panel 114 via a bracket 276. The blade 274 partitions the liquid level of the developer exposed from the downstream end in the transport direction of the liquid level cover 150 from the upper side of the liquid level cover 150, and the blade 206 (the developing tank 118 of the developing tank 118) in the vicinity of the insertion port 202. The state in contact with the side wall) completely separates the upper portion of the liquid level cover 150 from the outside air, and can suppress evaporation of the developer.

  A pair of rollers 154 that sandwich and transport the PS plate 112 and squeeze the developer from the surface of the PS plate 112 are disposed on the most downstream side in the transport direction of the developing tank 118.

  On the other hand, in the automatic developing machine 100, a water washing tank 128 of a water washing unit 124 is disposed downstream of the developing unit 122. Two pairs of transport rollers 152 and 153 are disposed above the water washing tank 128.

  The rinsing tank 128 stores rinsing water after the developer is washed out from the PS plate 112 sent out from the developing tank 118. A spray pipe 156 is disposed on the upstream side of the transport roller 153 and on the upper side of the transport path, and a plurality of discharge ports communicating with the inside are provided on the outer periphery of the spray pipe 156. From the spray pipe 156, the washing water pumped up from the washing water tank 278 by the pump 280 is dropped onto the roller on the upper side of the conveying roller 153, and the conveying roller 153 rotates, so that the washing water quickly flows onto the surface of the PS plate 112. And the surface of the PS plate 112 is washed with water.

  The lower part of the lower roller of the transport rollers 152 and 153 is accommodated in the tray 162. Washing water is stored in the tray 162 and is pumped up by the lower roller to clean the back surface of the PS plate 112 and to prevent the upper transport rollers 152 and 153 from drying.

  Further, the washing water diffused in the width direction on the surface of the PS plate 112 falls from the both ends in the width direction of the PS plate 112 to the receiving tray 162 below, and the back surface of the PS plate 112 is washed away by the washing water pumped up from the receiving plate 162. It is configured to be processed. The flush water overflowing from the tray 162 is guided to the flush tank 128. The flush tank 128 is provided with an overflow pipe 282, which is discarded into a waste liquid tank 284 when a predetermined liquid level is exceeded.

  The washing tank 128 and the developing tank 118 are communicated with each other via a pump 286, and the washing water in the washing tank 128 is guided to the developing tank 118 by driving the pump 286, and the replenishing stock solution is supplied to the developing tank 118. It can be used as a diluting solution when supplying.

  A pair of transport rollers 178 are provided above the gum solution tank 130 of the finisher portion 126. The PS plate 112 sent out by the transport roller 153 is guided to the transport roller 178.

  In addition, spray pipes 182 and 288 are arranged on the upstream side of the conveyance roller 178 in the vertical direction of the conveyance path. From the spray pipes 182 and 288, the gum solution pumped up from the gum solution tank 290 by the pump 292 is discharged and supplied to the front and back surfaces of the PS plate 112.

  The conveyance roller 178 nips and conveys the PS plate 112 and squeezes the gum solution supplied by the spray pipe 182 to desensitize the surface of the PS plate 112. The gum solution squeezed from the surface of the PS plate 112 is collected in the gum solution tank 130. The gum solution in the gum solution tank 130 is circulated by a pump 294. The gum solution tank 130 is provided with an overflow pipe 296 so that when the gum solution exceeds a predetermined level, it is guided to the waste solution tank 284 and discarded.

  Further, the lower part of the lower conveyance roller 178 is immersed in the gum liquid stored in the gum liquid tank 130, and the lower conveyance roller 178 is connected to the gum liquid tank 130 from the gum liquid tank 130 on the back side of the PS plate 112. The coating process is performed by pumping up. As a result, the conveying roller 178 takes out the gum solution to perform the desensitization process on the back surface of the PS plate 112 and suppresses the drying of the upper conveying roller 178 so that the components of the processing liquid do not deposit on the surface of the conveying roller 178. It has become.

  The PS plate 112 that has been processed by the finisher unit 126 passes through the discharge port 204 of the casing 200 and is sent to a drying unit (not shown).

  Here, the discharge port 204 is provided with a lid 210 as a partition plate. The lid 210 is fixed to the shaft 212. The shaft 212 can be rotated by driving means (not shown) (for example, a solenoid). The rotation of the shaft 212 is performed based on the detection of the PS plate 112 by the plate detection sensor 208 provided in the vicinity of the insertion port 202. In other words, the lid 210 is substantially horizontal (after the detection of the discharge port 204) while the plate detection sensor 208 is detecting the PS plate 112 and after it is no longer detected (after the rear end is detected) until a predetermined time elapses. It is held in an open state, and the others are vertical (the discharge port 204 is closed).

  The operation of this embodiment will be described below. First, processing tanks such as the developing tank 118, the water washing tank 128, and the gum solution tank 130 are covered with a casing 200 such as an outer plate panel 114 and a main body 108 as an upper lid. When the PS plate 112 is not developed by the automatic developing machine 100, the insertion port 202 is closed because the blade 206 is in contact with the side wall of the developing tank 118. On the other hand, since the discharge plate 204 does not detect the PS plate 112 by the plate detection sensor 208, the lid 210 is in a vertical state, and the discharge port 204 is also closed. Further, the sub insertion port 250 is also closed by the blade 252, and the liquid level cover 150 of the developing unit 122 is also closed by the blades 206 and 122. For this reason, the developing solution in the developing tank 118, the washing water in the washing unit 124, and the gum solution in the finisher unit 126 are not exposed to the outside air, and there is almost no carbon dioxide fatigue. For this reason, since it is possible to suppress a decrease in developing ability due to deterioration over time, for example, the replenishing amount of the replenishing stock solution in the developing unit 122 can be drastically reduced. In particular, since the surface of the developer in the developing tank 118 is covered with the liquid level lid 150, the effect of preventing contact between the developer and the outside air is great.

  In order to minimize the contact between the developing solution and the outside air, it is preferable to shorten the opening time of the lid 210 as much as possible. Therefore, a structure in which the PS plate 112 is open only while it passes and is closed during the other time is preferable.

  The control by the control device 50 is the same as the content of the flowchart of the replenishing method of the developing replenisher in FIGS. 2, 3, 4, 4, 5, 6, 7 and 8 described in the first embodiment. Since there is, explanation is omitted here.

EXAMPLES Hereinafter, although this invention is demonstrated according to an Example, the scope of the present invention is not limited to these Examples. In the examples, “%” represents “% by mass”.
[Preparation of alkali developer / developer replenisher containing SiO ₂ ]
The amount of various scum dispersants listed in Tables 1 and 2 below was added to 1 L of a potassium silicate 4.0% aqueous solution having a mixing ratio SiO ₂ / K ₂ O of 1.1 of silicon oxide SiO ₂ and potassium oxide K ₂ O. Nos. Alkaline developers (1) to (30) and a comparative developer (1) to which no waste dispersant was added were prepared. Further, various scum dispersants are added to 1 L of a potassium silicate 6.0% aqueous solution having a mixing ratio SiO ₂ / K ₂ O of 1.1 of silicon oxide SiO ₂ and potassium oxide K ₂ O as shown in Tables 1 and 2 below. The alkaline development replenishers (1) to (30) of the invention and the comparative development replenisher (1) to which no residue dispersant was added were prepared.

[Adjustment of non-reducing sugar-containing alkaline developer / developer replenisher]
Various amounts of scum dispersant are added to 1 liter of a 5.0% aqueous solution of D-sorbite potassium salt composed of D-sorbite / potassium oxide K ₂ O, which is a combination of non-reducing sugar and base, as shown in Tables 1 and 2 below. Nos. Alkaline developers (31) to (60) and a comparative developer (2) to which no residue dispersant was added were prepared. In addition, various cas dispersants are added to 1 L of a 6.5% aqueous solution of D-sorbite potassium salt composed of D-sorbite / potassium oxide K ₂ O, which is a combination of a non-reducing sugar and a base, in the amounts shown in Tables 1 and 2 below. The alkaline development replenishers (31) to (60) of the present invention and the comparative development replenisher (2) to which no residue dispersant was added were prepared.

Using a heat-sensitive positive lithographic printing plate, development processing was performed with the above-described various alkali processing solutions.
[Production of heat-sensitive positive lithographic printing plate]
A 0.3 mm thick aluminum plate (material 1050) was washed with trichlorethylene and degreased, and then a nylon brush and 400 mesh pumice-water suspension were used to make the surface grainy and washed thoroughly with water. After washing, this aluminum plate was etched by immersing it in a 25% aqueous sodium hydroxide solution at 45 ° C. for 9 seconds, washed with water, further immersed in a 20% nitric acid aqueous solution for 20 seconds, and washed again with water. At this time, the etching amount of the grained surface was about 3 g / m ² .
Next, the aluminum plate was provided with an anodized film of 3 g / m ² with a direct current of 15 A / dm ² using 7% sulfuric acid as an electrolytic solution, and then washed and dried. This was treated with a 2.5% aqueous solution of sodium silicate at 30 ° C. for 10 seconds, the following undercoat layer coating solution was applied, and dried at 80 ° C. for 15 seconds to obtain a support. The dry coating amount of the undercoat layer after drying was 15 mg / m ² .
<Coating liquid for undercoat layer>
The following copolymer P (molecular weight 28000) 0.3 g
Methanol 100g
1g of water
Copolymer P

Synthesis Example 1 (Synthesis of alkali-soluble polymer compound (copolymer) having a carboxyl group)
In a 20 ml three-necked flask equipped with a stirrer, a condenser and a dropping funnel, 6.39 g (0.045 mol) of n-propyl methacrylate, 1.29 g (0.015 mol) of methacrylic acid and 1-methoxy-2- 20 g of propanol was added, and the mixture was stirred while being heated to 65 ° C. with a hot water bath. To this mixture, 0.15 g of “V-601” (manufactured by Wako Pure Chemical Industries, Ltd.) was added, and the mixture was stirred for 2 hours under a nitrogen stream while maintaining at 70 ° C. To this reaction mixture, 6.39 g (0.045 mol) of n-propyl methacrylate, 1.29 g (0.015 mol) of methacrylic acid, 20 g of 1-methoxy-2-propanol and 0.15 g of “V-601” The mixture was added dropwise via a dropping funnel over 2 hours. After completion of the dropwise addition, the resulting mixture was further stirred at 90 ° C. for 2 hours. After completion of the reaction, 40 g of methanol is added to the mixture, the mixture is cooled, and the resulting mixture is poured into 2 liters of water while stirring the water. After stirring the mixture for 30 minutes, the precipitate is removed by filtration and dried. Gave 15 g of a white solid. When the weight average molecular weight (polystyrene standard) of this copolymer was measured by gel permeation chromatography, it was 53,000.

Synthesis Example 2 (Synthesis of alkali-soluble polymer compound having a carboxyl group (copolymer))
By the same operation as in Synthesis Example 1, a copolymer was synthesized using ethyl methacrylate / isobutyl methacrylate / methacrylic acid (mol%: 35/35/30). The weight average molecular weight (polystyrene standard) was measured and found to be 50,000.

Synthesis Example 3 (Synthesis of polyurethane resin having a carboxyl group)
Into a 500 ml three-necked round bottom flask equipped with a condenser and a stirrer was added 14.6 g (0.109 mol) of 2,2-bis (hydroxymethyl) propionic acid and 13.3 g (0.0686 mol) of tetraethylene glycol. ) And 2.05 g (0.0228 mol) of 1,4-butanediol were added and dissolved in 118 g of N, N-dimethylacetamide. To this, 30.8 g (0.123 mol) of 4,4′-diphenylmethane diisocyanate, 13.8 g (0.0819 mol) of hexamethylene diisocyanate and 0.1 g of di-n-butyltin dilaurate as a catalyst were added and stirred. Under heating at 90 ° C. for 7 hours. N, N-dimethylacetamide (100 ml), methanol (50 ml) and acetic acid (50 ml) were added to the reaction solution, and the mixture was stirred and then added to 4 liters of water with stirring to precipitate a white polymer. The polymer was separated by filtration, washed with water, and dried under reduced pressure to obtain 60 g of polymer.
When the molecular weight was measured by permeation chromatography (GPC), the weight average (polystyrene standard) was 70,000. The carboxyl group content measured by titration was 1.43 meq / g.

Synthesis Example 4 (Synthesis of polyurethane resin having a carboxyl group)
The following diisocyanate compounds (mol%)

And the following diol compounds (mol%)

Was used in the same manner as in Synthesis Example 3 to synthesize a copolymer. The acid content of the obtained copolymer by titration was 1.72 meq / g, and the weight average molecular weight (polystyrene standard) was 80,000.

Synthesis example 5
A 500 ml three-necked flask equipped with a stirrer, a condenser and a dropping funnel is charged with 31.0 g (0.36 mol) of methacrylic acid, 39.1 g (0.36 mol) of ethyl chloroformate and 200 ml of acetonitrile and cooled in an ice-water bath The mixture was stirred while. To this mixture, 36.4 g (0.36 mol) of triethylamine was dropped with a dropping funnel over about 1 hour. After completion of the dropwise addition, the ice-water bath was removed, and the mixture was stirred at room temperature for 30 minutes. To this reaction mixture, 51.7 g (0.30 mol) of p-aminobenzenesulfonamide was added, and the mixture was stirred for 1 hour while warming to 70 ° C. in an oil bath. After completion of the reaction, this mixture was added to 1 liter of water with stirring, and the resulting mixture was stirred for 30 minutes. The mixture was filtered to take out a precipitate, which was slurried with 500 ml of water, and then the slurry was filtered, and the resulting solid was dried to give white N- (p-aminosulfonylphenyl) methacrylamide. A solid was obtained (yield 46.9 g). Next, 4.61 g of N- (p-aminosulfonylphenyl) methacrylamide (0.0192 mol) was added to a 20 ml three-necked flask equipped with a stirrer, condenser and dropping funnel. Then, 2.94 g (0.0258 mol) of ethyl methacrylate, 0.80 g (0.015 mol) of acrylonitrile and 20 g of N, N-dimethylacetamide were added, and the mixture was stirred while heating to 65 ° C. with a hot water bath. To this mixture, 0.15 g of “V-65” (manufactured by Wako Pure Chemical Industries, Ltd.) was added, and the mixture was stirred for 2 hours under a nitrogen stream while being kept at 65 ° C. A further mixture of 4.61 g of N- (p-aminosulfonylphenyl) methacrylamide, 2.94 g of ethyl methacrylate, 0.80 g of acrylonitrile, N, N-dimethylacetamide and 0.15 g of “V-65” was added to this reaction mixture. It dropped by the dropping funnel over 2 hours. After completion of the dropwise addition, the resulting mixture was further stirred at 65 ° C. for 2 hours. After completion of the reaction, 40 g of methanol is added to the mixture, the mixture is cooled, and the resulting mixture is poured into 2 liters of water while stirring the water. After stirring the mixture for 30 minutes, the precipitate is removed by filtration and dried. Gave 15 g of a white solid. It was 53,000 when the weight average molecular weight (polystyrene standard) of this specific copolymer was measured by the gel permeation chromatography. The following image recording layer coating solution was applied onto the obtained support and dried at 150 ° C. for 30 seconds to obtain a dry lithographic printing plate precursor A having a dry coating amount of 1.8 g / m ² .

<Coating liquid for image recording layer>
Copolymer of Synthesis Example 2 0.050g
Copolymer of Synthesis Example 4 0.050 g
0.4 g of copolymer of Synthesis Example 5
0.6 g of m, p-cresol novolak
(M / p ratio = 6/4, weight average molecular weight 8000,
0.5% unreacted cresol)
Cyanine dye A 0.1g
Phthalic anhydride 0.05g
0.002 g of p-toluenesulfonic acid
Ethyl violet 0.02g
(Counterion: 6-hydroxy-β-naphthalenesulfonic acid)
0.01 g of esterified product of naphthoquinone 1,2-diazide-5-sulfonyl chloride and pyrogallol-acetone resin
Fluorosurfactant 0.05g
(Product name: Megafuck F-177, manufactured by Dainippon Ink & Chemicals, Inc.)
Methyl ethyl ketone 8g
1-methoxy-2-propanol 4g
The following image recording layer coating solution 1 was applied to an aluminum support treated in the same manner as described above with a wire bar so that the coating amount was 0.85 g / m ^2, and then PERFECT manufactured by TABAI. Wind control was set to 7 with OVER PH200 and dried at 140 ° C for 50 seconds. Furthermore, after coating the image recording layer coating solution 2 with a wire bar so that the coating amount becomes 0.22 g / m ² , WindControl is set to 7 on the PERFECT OVER PH200 manufactured by TABAI, and the temperature is set to 120 ° C. The plate was dried in 60 seconds to obtain a lithographic printing plate precursor B having a two-layer image forming layer.

<Coating liquid 1 for image recording layer>
Copolymer of Synthesis Example 2 0.050g
Copolymer of Synthesis Example 4 0.050 g
N- (4-aminosulfonylphenyl) methacrylamide /
Acrylonitrile / methyl methacrylate (36/34/30 weight average molecular weight 50000) 1.896 g
Cresol novolak (m / p = 6/4 weight average molecular weight 4500,
Residual monomer 0.8wt%) 0.237g
Cyanine dye A 0.109g
4,4'-Bishydroxyphenylsulfone 0.063g
Tetrahydrophthalic anhydride 0.190g
p-Toluenesulfonic acid 0.008g
Ethyl violet counter ion
0.05g changed to 6-hydroxynaphthalene sulfone
Fluorosurfactant (F176, manufactured by Dainippon Ink Industries, Ltd.)
0.035g
Methyl ethyl ketone 26.6g
13.6 g of 1-methoxy-2-propanol
γ-butyrolactone 13.8 g

<Image recording layer coating solution 2>
Copolymer of Synthesis Example 2 0.050g
Copolymer of Synthesis Example 4 0.050 g
Cresol novolak (m / p = 6/4 weight average molecular weight 4500,
Residual monomer 0.8wt%) 0.237g
Cyanine dye A 0.047g
0.060 g dodecyl stearate
3-methoxy-4-diazodiphenylamine hexafluorophosphate
0.030g
Fluorosurfactant (F176 (20% solution), manufactured by Dainippon Ink & Chemicals, Inc.)
0.110 g
Fluorosurfactant (MCF312F (30% solution), manufactured by Dainippon Ink Industries, Ltd.)
0.12g
Methyl ethyl ketone 15.1g
7.7 g of 1-methoxy-2-propanol
The lithographic printing plate precursors A and B obtained above are exposed at a main scanning speed of 5 m / sec using a semiconductor laser having an output of 500 mW, a wavelength of 830 nm, and a beam diameter of 17 μm (1 / e ² ), and maintained at 25 ° C. did. For this lithographic printing plate, when the development replenisher replenishment method and the conventional development replenisher replenishment method in the above-described embodiment were applied, the variation range of the developer sensitivity was experimentally determined.

[Processing of Examples 1 to 61]
As shown in Tables 3 to 5 and Table 6, the replenishing method of the present invention was used for continuous processing to evaluate developer sensitivity stability. Evaluation of development sensitivity stability depends on how much the image density of an image having a gradation density of 50% exposed by halftoning (AM screening, number of screen lines = 175 lpi) on the photosensitive material changes after development processing. went. The results are shown in Tables 7-9.

[Processing of Comparative Examples 1 to 6]
As shown in Tables 3 to 5 and Table 6, continuous processing was performed using the area aging reference replenishment method to evaluate developer sensitivity stability. Evaluation of development sensitivity stability depends on how much the image density of an image having a gradation density of 50% exposed by halftoning (AM screening, number of screen lines = 175 lpi) on the photosensitive material changes after development processing. went. The results are shown in Table 9.

  As a result of the above evaluations, Examples using the method of the present invention were used for Comparative Examples 1 and 2 in which the change in 50% gradation density exceeded the allowable range of −2.0% to + 2.0%. In 1 to 12, it was confirmed that the change in the 50% gradation density was within the allowable range.

1 is a configuration diagram of a first embodiment of an automatic developing machine that performs a developing replenisher replenishing method according to the present invention. FIG. It is a flowchart explaining the basic control processing which replenishes development replenisher. FIG. 3 is a flowchart (part 1) illustrating a first control process specifically showing the basic control process of FIG. 2; FIG. It is a flowchart (the 2) explaining a 1st control process. It is a flowchart (the 1) explaining a 2nd control process. It is a flowchart (the 2) explaining a 2nd control process. It is a flowchart (the 1) explaining a 3rd control process. It is a flowchart (the 2) explaining a 3rd control process. It is a block diagram of the automatic processor which concerns on the 2nd Embodiment of this invention.

Explanation of symbols

2,100 automatic developing machine 4,112 PS plate 6,122 developing unit 20,118 developing tank 50 control device 51a control ROM
51b Control RAM
52 Time measuring unit 53 Replenishment diluent storage tank 55,266 Replenishment stock solution storage tank 73,262 Conductivity sensor 74,264 Replenishment stock solution supply pump 76 Replenishment dilution solution supply pump 90,91 Replenishment piping

Claims (5)

Development of a photosensitive lithographic printing plate automatic developing machine that develops a large number of exposed photosensitive lithographic printing plates with a developer containing an electrolyte and a residue dispersant and maintains the developer activity of the developer at a constant level A replenisher replenishment method comprising:
The developer conductivity value at which the developer activity of the developer is appropriate is experimentally determined in advance and set as a conductivity target value,
A developer replenisher having a dregs dispersant concentration higher than that of the developer to compensate for a decrease in the developing activity of the developer when the automatic processor is operated and / or stopped based on preset replenishment conditions. Replenish,
Replenishing the developer replenisher to compensate for a decrease in developer activity of the developer due to the processing of the photosensitive lithographic printing plate based on preset replenishment conditions;
After measuring the conductivity of the developer replenished with a developer replenisher whose residue dispersant concentration is higher than that of the developer at predetermined time intervals,
A photosensitive lithographic printing plate, wherein when the measured conductivity value exceeds the target conductivity value, the developer is replenished with a diluent until the measured conductivity value falls below the target conductivity value. Development replenisher replenishment method for automatic processor.   The conductivity target value is sequentially calculated every time the developer replenisher is replenished, using a replenisher replacement rate that is a ratio of the developer replenisher replenished to the developer in the developer tank. 2. The method of replenishing a developing replenisher for a photosensitive lithographic printing plate automatic developing machine according to claim 1, wherein A replenishment ratio with time, which is a ratio of the development replenisher replenished based on the operation time and / or stop time of the automatic developer with respect to the total replenisher replenishment amount replenished to the developer in the developing tank;
Using the replenisher replacement rate, which is the ratio of the developer replenisher replenished to the developer in the developer tank, the conductivity target value is replenished with either the developer replenisher or the diluent. 2. The developing replenisher replenishing method for a photosensitive lithographic printing plate automatic developing machine according to claim 1, wherein the replenishing solution is calculated every time. A developer dilution ratio that is a ratio of a diluent replenished to the developer with respect to a developer replenisher stock solution replenished to the developer in a developer tank;
A replenishment ratio with time, which is a ratio of the development replenisher replenished based on the operation time and / or stop time of the automatic developer with respect to the total replenisher replenishment amount replenished to the developer in the developing tank;
Using the replenisher replacement rate, which is the ratio of the developer replenisher replenished to the developer in the developer tank, the conductivity target value is replenished with either the developer replenisher or the diluent. 2. The developing replenisher replenishing method for a photosensitive lithographic printing plate automatic developing machine according to claim 1, wherein the replenishing solution is calculated every time.   The photosensitive lithographic printing plate according to any one of claims 1 to 4, wherein the concentration of the scum dispersant in the developer replenisher is 1.01 to 50 times that of the developer. Development replenisher replenishment method for automatic processor.

Images