JP2005243776A - Substrate conveyance equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate conveyance equipment which shortens the cycle time of a substrate production line. <P>SOLUTION: The substrate conveyance equipment 1 is provided with a control unit 10, a buffer 11, and a conveying robot 12. The control unit 10 classifies conveyance operations of the conveying robot 12 at the time of conveying a substrate 90 between a coater developer device 20 and an exposure device 30 into one operation (first operation) which conveys the substrate 90 from the coater developer device 20 to the buffer 11, and the other operation (second operation). The control unit 10 receives an operational request every first operation and second operation, after determining the operation order in the first operation and the second operation of the conveying robot 12 according to the processing order for the substrate 90. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a technique for suppressing tact time when a substrate is transported between a plurality of processing units having different processing speeds.

  In the manufacturing process of a glass substrate for a liquid crystal panel, a mask substrate for a photoresist, or a semiconductor substrate (hereinafter simply referred to as “substrate”), for example, a coater / developer apparatus and an exposure apparatus are connected in-line. A technique for configuring a substrate production line and performing a series of processing on a substrate is proposed in Patent Document 1. Since the exposure apparatus requires more time for substrate processing than the coater / developer apparatus, the number of substrates that can be processed per unit time in normal times is small. That is, when constructing a substrate production line for connecting a plurality of devices in-line, the processing time for each device may differ. Therefore, in the case of the above-described example, a substrate storage device (buffer) is provided between the coater / developer apparatus having a high processing speed and the exposure apparatus having a low processing speed, and the substrate after the processing in the coater / developer apparatus is completed. By temporarily accumulating and waiting, the difference in tact time between devices is absorbed.

  When constructing such an inline-type substrate production line, it is common for a substrate transfer device to transfer a substrate between the devices. Then, in order to minimize the waiting time of the substrate transfer apparatus, conventionally, the transfer operation corresponding to the request is performed in the order in which the operation requests (substrate load request and unload request) from each apparatus are generated. (Hereinafter, such control is referred to as “event-driven control”). By executing such event-driven control, the response time of the substrate transfer device is shortened, and the dead time (standby time) due to idle play of the substrate transfer device is minimized.

Japanese Patent Laid-Open No. 11-145246

  However, in the substrate manufacturing line constructed by the in-line method, since the processing time of the substrate in each apparatus is different, an operation request for the substrate transport apparatus is randomly generated. In such a case, in the event-driven control, the waiting time of the substrate transfer device is minimized, but the movement amount of the substrate transfer device increases. If the amount of movement of the substrate transfer device increases, the time required for movement (time during which other requests cannot be answered) increases, and as a result, there is a problem that the operation time until the series of operations ends is increased.

  Further, since the processing time in each apparatus is different, even if there is a substrate loading request at a certain timing, if the substrate to be loaded is not prepared in the upstream apparatus, the substrate transfer apparatus naturally satisfies the request. I can't. In that case, the substrate transfer device waits until the substrate is prepared, but at the time when the substrate is prepared, there is a problem that responding to the carry-in request is not the most efficient operation. there were.

  From the above, there has been a problem that shortening the waiting time of the substrate transfer apparatus does not necessarily improve the operation efficiency of the substrate production line.

  The present invention has been made in view of the above problems, and provides a substrate transport apparatus that shortens the tact time of a substrate production line when the substrate is transported between apparatuses having different processing times in the substrate production line. Objective.

  In order to solve the above-mentioned problems, the invention of claim 1 is characterized in that the first processing unit that executes a predetermined process on a substrate and the number of processed sheets per unit time in a normal time are smaller than that of the first processing unit. A substrate transfer apparatus for transferring a substrate to and from a second processing unit, the transfer means for transferring the substrate between the first processing unit and the second processing unit, the first processing unit and the first processing unit The substrate storage means for temporarily storing the substrate transported by the transport means with respect to the second processing unit, and the operation of transporting the substrate by the transport means, the substrate is stored from the first processing section to the substrate. An operation to be transported to the means is a first operation, an operation other than the first operation is a second operation, an operation request for each of the first operation and the second operation is accepted, and the transport means is in response to the operation request And control means for controlling

  The invention according to claim 2 is the substrate transfer apparatus according to claim 1 or 2, wherein the second operation includes an operation of transferring a substrate from the substrate storage means to the second processing unit, and a substrate. The control means includes a plurality of operations including an operation of transporting the first processing unit from the second processing unit to the first processing unit, and the control unit performs the plurality of operations according to a processing order performed on the substrate. The conveying means is controlled to be executed in order.

  The invention of claim 3 is the substrate transfer apparatus according to the invention of claim 2, further comprising a third processing section in which the number of processed sheets per unit time in a normal time is larger than that of the second processing section. It is characterized by.

  The invention according to claim 4 is the substrate transfer apparatus according to any one of claims 1 to 3, wherein the transfer means includes a first arm and a second arm that hold the substrate, respectively. The second operation includes the operation of unloading the substrate from the second processing unit by the one of the first arm and the second arm that does not hold the substrate, and the loading of the substrate held by the other to the second processing unit. The operation | movement which performs continuously the operation | movement which performs is characterized by the above-mentioned.

  According to a fifth aspect of the present invention, there is provided a first processing unit that performs predetermined processing on a substrate, and a second processing unit that has a smaller number of processings per unit time in a normal time than the first processing unit. A substrate transfer apparatus for transferring a substrate between the first processing unit and the second processing unit, a substrate storage means for temporarily storing the substrate, a stage for holding the substrate, A first transport unit configured to transport a substrate between the first processing unit and the stage; a second transport unit configured to transport the substrate between the stage and the second processing unit; and Among the operations for transporting the substrate from the first processing unit to the substrate storage means, the first operation and the second operation are defined as operations other than the first operation. Accepting an operation request for each operation and responding to the operation request And a controlling means for controlling the serial first transfer means.

  The invention of claim 6 is the substrate transfer apparatus according to the invention of claim 5, wherein the second operation includes an operation of transferring a substrate from the substrate storage means to the stage, and a substrate from the stage. The control means includes a plurality of operations including an operation of transporting to the first processing unit, and the control unit performs the plurality of operations in a predetermined order according to a processing order performed on the substrate. The first conveying means is controlled.

  The invention according to claim 7 is the substrate transfer apparatus according to claim 5 or 6, wherein the first transfer means and the second transfer means are respectively a first arm and a second arm for holding a substrate. The second operation includes the operation of unloading the substrate from the second processing unit by the one of the first arm and the second arm that does not hold the substrate, and the substrate held by the other of the second arm. It is characterized by including the operation | movement which performs continuously the operation | movement carried in to a process part.

  According to the first to seventh aspects of the present invention, among the operations for transporting the substrate by the transport unit, the operation for transporting the substrate from the first processing unit to the substrate storage unit is the first operation, and the operations other than the first operation are the first operations. As the two operations, the operation request for each of the first operation and the second operation is accepted, and the conveying means is controlled according to the operation request, so that the operation request to be responded can be narrowed down, and the operation request is efficient. Can give a good response. Therefore, efficient conveyance processing can be realized.

  According to the second and sixth aspects of the present invention, more efficient transport can be achieved by controlling the transport means so that a plurality of operations are executed in a predetermined order according to the processing order performed on the substrate. Processing can be realized.

  In the invention according to claims 4 and 7, the second operation includes the operation of unloading the substrate from the second processing unit by the one of the first arm and the second arm that does not hold the substrate, and the substrate held by the other. Including the operation of continuously carrying in the second processing section into the second processing section, the substrate replacement operation can be performed, and there is no need for the transport means to move between the unloading and loading of the substrate. The time required for operation can be reduced.

  According to a fifth aspect of the present invention, the apparatus includes a first transport unit that transports the substrate between the first processing unit and the stage, and a second transport unit that transports the substrate between the stage and the second processing unit. As a result, the processing for carrying the substrate into the second processing unit having a low processing speed is not waited for another transport operation, and the processing capability of the second processing unit can be utilized to the maximum.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments of the invention will be described in detail with reference to the accompanying drawings.

<1. First Embodiment>
<1.1 Description of function and configuration>
FIG. 1 is a plan view showing an arrangement of a substrate transfer apparatus 1 according to the present invention and other apparatuses in a substrate production line. The substrate manufacturing line includes a substrate transfer device 1, a coater / developer device 20, an exposure device 30, and a peripheral device 40, and has a function of executing a series of processes related to resist coating, exposure, and development in the substrate manufacturing process. Have.

  The substrate transfer apparatus 1 includes a control unit 10, a buffer 11, and a transfer robot 12. The control unit 10 is a general computer composed of an arithmetic element such as a CPU and a storage element such as a RAM and a ROM, and operates according to a program stored in the storage element, whereby Control each configuration. In particular, the control unit 10 controls the transfer operation of the substrate 90 by the transfer robot 12 by controlling the transfer robot 12. Each device constituting the board production line is also connected in a communicable state with a cable (not shown) or the like, and receives predetermined information (board identification information, information on an operation request, etc.) from these apparatuses.

  The buffer 11 is a device having a structure in which support members forming a plurality of shelves are arranged in the vertical direction, and holds one substrate 90 on each shelf. That is, the buffer 11 temporarily accumulates the substrate 90 transported by the transport robot 12 between the coater / developer apparatus 20 and the exposure apparatus 30.

  FIG. 2 is a perspective view showing details of the transfer robot 12. The transfer robot 12 includes two transfer arms 121, an arm base 122, and an elevating unit 123.

  Each transfer arm 121 can move forward and backward with respect to the axis P and each holds one substrate 90. Thereby, the transfer robot 12 can hold up to two substrates 90 at the same time.

  The arm base 122 supports the transfer arm 121 and includes a mechanism that rotates about the axis P. That is, the forward / backward direction of the transfer arm 121 is defined by the rotational position of the arm base 122.

  The lifting / lowering unit 123 that supports the arm base 122 is composed of a plurality of members that form a telescopic structure, and has a function of lifting and lowering the transport arm 121 and the arm base 122 integrally. That is, the height position of the transfer arm 121 is defined by the lift position of the lift 123.

  With such a configuration, the transport robot 12 transports the substrate 90 between the coater / developer apparatus 20 and the exposure apparatus 30 while holding the substrate 90.

  The coater / developer apparatus 20 is an apparatus composed of a coating apparatus (coater) for applying a resist solution to the substrate 90 and a developing apparatus (developer) for developing the exposed substrate 90, and is the first in the present invention. It corresponds to a processing unit. FIG. 1 shows only the receiving unit that transfers the substrate 90 to / from the substrate transfer apparatus 1 among the configurations of the coater / developer apparatus 20. Further, the coater (coating device) in the coater / developer apparatus 20 is an apparatus that requires processing such as nozzle cleaning every time a predetermined number of substrates 90 are processed, and cannot process the substrate 90 during that time.

  The exposure apparatus 30 is an apparatus that exposes a circuit pattern or the like to the substrate 90 coated with a resist solution of a photosensitive material, for example. The number of processing per unit time of the exposure apparatus 30 in a normal time is smaller than that of the coater / developer apparatus 20. That is, the exposure apparatus 30 corresponds to the second processing unit in the present invention.

  In addition, the exposure apparatus 30 is an apparatus that requires the longest processing time among the apparatuses constituting the substrate production line in the present embodiment. Therefore, it is important to control the transfer robot 12 so that the exposure apparatus 30 can maximize its processing capability in order to shorten the tact time in the substrate production line.

  The peripheral device 40 is, for example, a titler that prints identification information on the substrate 90, a peripheral exposure device, or the like, and performs processing with a shorter processing time for the substrate than the exposure processing in the exposure device 30. That is, the peripheral device 40 corresponds to the third processing unit in the present invention.

  The above is description of the function and structure of the board | substrate conveyance apparatus 1 in this Embodiment, and the apparatus which comprises a board | substrate manufacturing line.

<1.2 Control explanation>
Next, how the control unit 10 controls the transfer robot 12 will be described. The controller 10 of the substrate transfer apparatus 1 is mainly requested by the coater / developer apparatus 20, the exposure apparatus 30, and the peripheral apparatus 40 for the transfer operation of the transfer robot 12 as follows.

Operation A: Operation for receiving the substrate 90 from the coater / developer apparatus 20 This operation is required when the substrate 90 that has been subjected to the coating process is prepared in the coater / developer apparatus 20. When this operation is executed, the rotation position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the coater / developer apparatus 20.

Operation B: Operation of loading the substrate 90 into the buffer 11 This operation is necessary for temporarily storing the substrate 90 received from the coater / developer apparatus 20. When this operation is executed, the rotational position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the buffer 11.

Operation C: Operation for receiving the substrate 90 from the buffer 11 This operation is necessary for taking out the substrate 90 accumulated in the buffer 11. When this operation is executed, the rotational position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the buffer 11.

Operation D: Operation for receiving the substrate 90 from the exposure apparatus 30 This operation is necessary for taking out the substrate 90 for which the exposure processing in the exposure apparatus 30 has been completed. When this operation is executed, the rotation position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the exposure apparatus 30.

Operation E: Operation for loading the substrate 90 into the exposure apparatus 30 This operation is required when the exposure apparatus 30 can perform an exposure process on a new substrate 90. When this operation is executed, the rotation position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the exposure apparatus 30.

Operation F: Operation for receiving the substrate 90 from the peripheral device 40 This operation is required when the processing on the substrate 90 is completed in the peripheral device 40. When this operation is executed, the rotation position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the peripheral device 40.

Operation G: Operation for loading the substrate 90 into the peripheral device 40 This operation is required when the peripheral device 40 is ready to process a new substrate 90. When this operation is executed, the rotation position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the peripheral device 40.

Operation H: Operation for loading the substrate 90 into the coater / developer apparatus 20 This operation is required when the coater / developer apparatus 20 can accept a new substrate 90 to be developed. When this operation is executed, the rotation position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the coater / developer apparatus 20.

  The eight operations described in the operations A to H are operations mainly realized when one of the transfer arms 121 moves back and forth in a predetermined direction. This is a necessary operation.

  In addition, in the transfer robot 12, an operation of rotating the arm base 122 and an operation of extending and lowering the vertical part 123 in the vertical direction are performed as appropriate in association with these eight operations A to H. These operations are operations in which the transfer robot 12 moves to positions required to execute the operations A to H. The rotation position of the arm base 122 and the lifting unit before the movement starts. The required time varies depending on the lift position of 123. However, since the lifting / lowering operation of the lifting / lowering unit 123 is an operation that is completed in a time sufficiently shorter than the time required for other transport operations and processing, hereinafter, the “movement of the transport robot 12” is mainly referred to as the transport robot. 12 refers to an operation of adjusting the advancing / retreating direction of the transfer arm 121 by rotating the arm base 122.

  The control unit 10 of the substrate transport apparatus 1 according to the present embodiment performs an operation of transporting the substrate 90 from the coater / developer apparatus 20 to the buffer 11 among a plurality of operations performed by the transport robot 12 to transport the substrate 90. One operation is assumed. Further, the other transport operation is defined as a second operation.

  Thus, the first operation of the transfer robot 12 includes the operation of moving to the position where the operation A is performed, the operation A, the operation of moving from the position where the operation A is performed to the position where the operation B is performed, and the operation B. It becomes the operation including. Then, the control unit 10 controls the transfer robot 12 to sequentially execute the operations of the transfer robot 12 constituting the first operation in the predetermined order shown here according to the processing order for the substrate 90. That is, the first operation is a series of operations that are rate-controlled by the takt time of the coater / developer apparatus 20.

  In addition, the second operation of the transfer robot 12 includes an operation of moving to the position where the operation C is performed, an operation C, an operation of moving from the position where the operation C is performed to a position where the operation D and the operation E are performed, and an operation D. And the movement E from the position where the movement E is performed to the position where the movement F and the movement G are performed, the movement F, the movement G, and the position where the movement G is performed to the position where the movement H is performed. The operation includes the operation and the operation H. Then, the control unit 10 controls the transfer robot 12 to sequentially execute the operations of the transfer robot 12 constituting the second operation in the predetermined order shown here according to the processing order for the substrate 90. Here, since the tact time of the exposure apparatus 30 is longer than the tact time of the peripheral apparatus 40, the second operation is a series of operations that are rate-controlled by the tact time of the exposure apparatus 30.

  As described above, the control unit 10 classifies the operation related to the transfer of the transfer robot 12 into two operations that are controlled by different tact times, and receives an operation request for each of the two operations. That is, the control unit 10 controls the transport robot 12 so as to start the first operation when there is an operation request for the operation A and to start the second operation when there is an operation request for the operation E. On the other hand, the control unit 10 ignores an operation request for other operations (operations B, C, D, F, G, and H) without receiving it.

  This is equivalent to the control unit 10 performing event-driven control on the transport robot 12 for two types of operation requests. The request for the operation A is an operation request issued from the coater / developer apparatus 20, and requests the substrate transport apparatus 1 to carry out the substrate 90 after the coating process. The request for the operation E is an operation request issued from the exposure apparatus 30 and requests the substrate transport apparatus 1 to supply the substrate 90 for performing the exposure process.

  Each operation constituting the first operation and the second operation is executed in a predetermined order determined by the control unit 10, and once the first operation or the second operation is started, these operations are performed during the series of operations. The order of operations will not be changed. However, other operations may interrupt between these operations.

  The above is the description of the method in which the control unit 10 controls the transfer robot 12 in the substrate transfer apparatus 1 according to the present embodiment.

<1.3 Explanation of operation>
Next, the operation of the substrate transfer apparatus 1 for transferring the substrate in the substrate production line will be described. 3 to 5 are flowcharts showing the operation of the substrate transfer apparatus 1 realized by the control unit 10 controlling the transfer robot 12 in the present embodiment.

  First, the control unit 10 waits for the transfer robot 12 while monitoring whether or not an operation request for the operation E or the operation A is made (steps S11 and S12).

  When the control unit 10 detects an operation request for the operation E (Yes in Step S11), the second operation is started by causing the transfer robot 12 to perform the operation after Step S31. The second operation will be described later.

  On the other hand, when the control unit 10 detects an operation request for the operation A (Yes in step S12), the control unit 10 causes the transfer robot 12 to start the first operation. First, the control unit 10 moves the transport robot 12 to a position where the transport arm 121 can be advanced and retracted toward the coater / developer device 20 (step S13). When the movement in step S13 is completed, the transfer robot 12 executes the operation A (step S14). Accordingly, one of the transfer arms 121 receives the substrate 90 from the coater / developer apparatus 20.

  When the operation A of the transfer robot 12 in step S14 ends, the control unit 10 determines whether or not there is an operation request for the operation E (step S15). Thereby, the substrate transfer apparatus 1 in the present embodiment determines whether or not there is an operation request for the second operation during the first operation.

  When the operation request for the operation E is not detected, the transfer robot 12 moves to a position where the transfer arm 121 can be moved forward and backward with respect to the buffer 11 while holding the substrate 90 received from the coater / developer apparatus 20 ( Step S16). When the movement in step S16 is completed, the transfer robot 12 executes the operation B (step S17). That is, the transfer robot 12 advances the transfer arm 121 holding the substrate 90 toward the buffer 11, loads the substrate 90 received from the coater / developer apparatus 20 into the buffer 11, and ends the first operation. If step S17 is performed, the control part 10 will return to the process of step S11, and will make the conveyance robot 12 wait until a new operation request | requirement is made.

  On the other hand, if there is an operation request for the operation E while the transfer robot 12 is executing the first operation (until step S15 is executed), and the control unit 10 determines Yes in step S15, the transfer robot 12 Works as follows.

  The buffer 11 of the substrate transport apparatus 1 can store a plurality of substrates 90. Therefore, the transfer robot 12 first carries the substrate 90 into the empty shelf of the buffer 11 (operation B), thereby completing the first operation and subsequently holding the substrate 90 to be supplied to the exposure apparatus 30. It is also possible to execute an operation of receiving the substrate 90 from the shelf being operated (operation C which is the second operation). However, since the substrate 90 cannot be loaded first into the shelf holding the substrate 90 received by the transfer robot 12, when the operation B is performed first, the shelf that performs the operation B and the shelf that performs the operation C. And shelves must be different from each other. If it does so, the conveyance robot 12 needs to perform the raising / lowering operation for shelf selection between the operation | movement B and the operation | movement C. FIG. In addition, there is a restriction that a shelf that is not used for the buffer 11 must exist.

  Therefore, in the substrate transfer apparatus 1 according to the present embodiment, when the second operation is requested while the transfer robot 12 is executing the first operation (Yes in step S15), the control unit 10 first transfers the transfer operation. The robot 12 is controlled to face the buffer 11. In accordance with this control, the transfer robot 12 moves to a position where the transfer arm 121 moves forward and backward with respect to the buffer 11 while holding the substrate 90 received from the coater / developer apparatus 20 (step S18). At this time, the shelf that is the movement target of the transport robot 12 is the shelf that holds the substrate 90 to be transported to the exposure apparatus 30.

  When the movement of the transfer robot 12 in step S18 is completed, the transfer robot 12 executes the operation C (step S19). That is, the transport arm 121 that does not hold the substrate 90 is advanced to the buffer 11 to receive the substrate 90 prepared in the buffer 11 (the substrate 90 transported to the exposure apparatus 30). Subsequently, the transfer robot 12 executes the operation B and ends the first operation (step S20). In other words, the transfer arm 121 that has received the substrate 90 from the coater / developer apparatus 20 is advanced to the shelf from which the substrate 90 was taken out in step S 19, and the held substrate 90 is loaded into the buffer 11.

  Here, the movement of the transfer robot 12 in step S18 is a movement for performing the operation C. However, since the transfer robot 12 performs the operation B after the operation C is performed, the movement of the transfer robot 12 in step S18 is the same as the movement of the transfer robot 12 in step S16. Can also be considered.

  That is, when the second operation is requested while the transfer robot 12 is executing the first operation (Yes in step S15), the control unit 10 performs the operation of exchanging the substrate 90 with respect to the buffer 11 (unloading / loading). The transport robot 12 is controlled to perform (operation). Thereby, the operation | movement which moves in order to perform the operation | movement B among the 1st operation | movement which the conveyance robot 12 performs becomes substantially unnecessary, and the time which the conveyance robot 12 requires can be reduced. That is, the substrate transfer apparatus 1 according to the present embodiment can reduce the time required to move the transfer robot 12 by the control unit 10 controlling the transfer robot 12 according to the detected operation request.

  In the substrate transfer apparatus 1, since the transfer robot 12 includes the two transfer arms 121, the substrate 90 to be transferred from the buffer 11 can be received while holding the substrate 90 to be transferred to the buffer 11. 90 exchange operations can be realized. Therefore, even when there is no empty shelf in the buffer 11, the first operation can be completed if the second operation is scheduled after the first operation.

  Note that the operation B is substantially waited for the time for executing the operation C. However, the operation C is an operation for merely moving the transfer arm 121 forward and backward with respect to the buffer 11, and the required time is sufficiently shorter than the time required for other operations and processing (for example, about several seconds). Therefore, even if the operation B is waited by executing the operation C first, the tact time of the first operation of the transfer robot 12 is hardly affected.

  Since the operation C is an operation included in the second operation, it is next scheduled that the transfer robot 12 performs the operation C before the transfer robot 12 executes the operation B while the transfer robot 12 is executing the first operation. This corresponds to starting the second operation in advance (the second operation interrupts the first operation). Thus, even when the second operation interrupts the first operation, the operation order of the first operation determined in advance by the control unit 10 is not changed. Moreover, after step S20 is performed, the conveyance robot 12 continues the 2nd operation | movement started by returning to the process of step S33 continuously. The second operation will be described later.

  Next, a case where the transfer robot 12 performs the second operation will be described. The second operation is an operation started when there is an operation request for the operation E. Therefore, as described above, the second operation is started when the control unit 10 determines Yes in step S11 or step S15.

  When the control unit 10 determines Yes in step S11, the control unit 10 moves the transfer robot 12 to a position where the transfer arm 121 can be advanced and retracted toward the buffer 11 (step S31). When the movement in step S31 is completed, the transfer robot 12 executes the operation C (step S32). As a result, one of the transfer arms 121 receives the substrate 90 from the buffer 11.

  Next, the transfer robot 12 moves to a position where the transfer arm 121 can be advanced and retracted toward the exposure apparatus 30 while holding the substrate 90 received from the buffer 11 (step S33). When the movement in step S33 is completed, the transfer robot 12 executes operation D (step S34). As a result, the transport arm that does not hold the substrate 90 receives the substrate 90 that has undergone the exposure process from the exposure apparatus 30.

  When the second operation is started by determining Yes in step S15, the second operation is started by executing the operation C in steps S18 and S19 as described above. In this case, after the process of step S20 is executed, the processes after step S33 are performed. Even in this case, the execution order of the actions constituting the second action is executed in a predetermined order. The

  When receiving the substrate 90 after the exposure processing, the transfer robot 12 carries out the operation E (step S35), and carries the substrate 90 received from the buffer 11 into the exposure apparatus 30. That is, the transfer robot 12 performs the operation of exchanging the substrate 90 with respect to the exposure apparatus 30 by continuously executing the operation D and the operation E.

  Next, the transport robot 12 moves to a position where the transport arm 121 can be advanced and retracted toward the peripheral device 40 while holding the substrate 90 received from the exposure apparatus 30 (step S36). When the movement in step S36 is completed, the transfer robot 12 executes the operation F (step S37). As a result, the transfer robot 12 receives the processed substrate 90 from the peripheral device 40.

  When the processed substrate 90 is received from the peripheral device 40, the transfer robot 12 carries out the operation G (step S38), thereby carrying the substrate 90 received from the exposure device 30 into the peripheral device 40. That is, the transfer robot 12 performs the operation of exchanging the substrate 90 with respect to the peripheral device 40 by continuously executing the operations F and G.

  When the operation G of the transfer robot 12 in step S38 ends, the control unit 10 determines whether or not there is an operation request for the operation A (step S41). If an operation request for the operation A is not detected, the transport robot 12 is moved to a position where the transport arm 121 can be advanced and retracted with respect to the coater / developer apparatus 20 (step S42). When the movement in step S42 is completed, the transfer robot 12 executes the operation H (step S43), thereby carrying the substrate 90 received from the peripheral device 40 into the coater / developer device 20, and ending the second operation. The process returns to step S11.

  As described above, in the substrate transfer apparatus 1 according to the present embodiment, the execution order of the operations constituting the second operation is determined according to the processing order of the substrates 90. Therefore, as shown in steps S34 and S35 and steps S37 and S38, in the second operation of the transfer robot 12, the operation order is determined so that the replacement operation of the substrate 90 is performed. That is, since the substrate 90 is always carried out and carried in continuously with respect to the exposure apparatus 30 and the peripheral apparatus 40, the moving time of the transfer robot 12 can be shortened.

  The substrate transfer apparatus 1 cannot respond to other operation requests while the transfer robot 12 is moving. Therefore, shortening the movement time of the transfer robot 12 corresponds to increasing the probability that the substrate transfer apparatus 1 is in a responsive state, and shortening the response time of the transfer robot 12 to the operation requests for the operations A and E. It corresponds to doing.

  In other words, the substrate transfer apparatus 1 according to the present embodiment can reduce the response time to the substrate supply request (operation request for the operation E) from the exposure apparatus 30 by reducing the movement time of the transfer robot 12. . Therefore, it is possible to effectively prevent the processing capability of the entire substrate production line from being lowered by further exposing the exposure apparatus 30 having the longest tact time to a processing waiting state.

  In the peripheral device 40 having a higher processing speed than the exposure device 30, even when the processing on the substrate 90 is completed before the exposure device 30, the transfer robot 12 carries out the substrate 90 before the exposure device 30. (The operation request for the operation F is ignored). Therefore, the peripheral device 40 operates in accordance with the tact time of the exposure device 30. If the exposure apparatus 30 does not prepare the substrate 90 for which the exposure process has been completed, the peripheral device 40 cannot perform the process on the next substrate 90, and even if the substrate 90 is unloaded first, the exposure apparatus It can only operate with a tact time of 30. Therefore, the response of the peripheral device 40 to the substrate carry-out request is awaited, so that the efficiency of the substrate production line is hardly lowered compared to the conventional case.

  Returning to FIG. 5, there is an operation request for the operation A while the transfer robot 12 is executing the second operation (until step S41 is executed), and the control unit 10 determines Yes in step S41. The transfer robot 12 operates as follows. The case where there is an operation request for the operation A is a case where the substrate 90 to be transferred to the buffer 11 is already prepared in the transfer unit of the coater / developer apparatus 20.

  The transfer unit of the coater / developer apparatus 20 can usually only hold one substrate 90. Accordingly, the transfer robot 12 cannot carry the substrate 90 into the coater / developer apparatus 20 in a state where the substrate 90 is prepared in the transfer section of the coater / developer apparatus 20. That is, in a state where an operation request for the operation A is made, the operation H cannot be executed, and the transfer robot 12 cannot complete the second operation.

  As a solution method in this case, the control unit 10 notifies the coater / developer device 20 in advance that the second operation has been started by the transport robot 12, and the second operation is completed (until the operation H is completed). It is also possible to perform an interlock control requesting not to prepare the substrate 90 at the transfer unit. By such control, an operation request for the operation A is not made while the transfer robot 12 is executing the second operation.

  However, when such interlock control is executed, the coater / developer apparatus 20 that originally has a high processing speed must operate in accordance with the tact time of the exposure apparatus 30. In this case, since the processing speeds of the coater / developer apparatus 20 and the exposure apparatus 30 are substantially equal, the substrate 90 is not stored in the buffer 11. Then, even when the coating process of the coater / developer apparatus 20 is temporarily stopped due to nozzle cleaning in the coater, there is no substrate 90 to be supplied to the exposure apparatus 30, and the exposure apparatus 30 is also stopped. That is, since the processing capability of the exposure apparatus 30 cannot be maximized, the efficiency of the entire substrate production line is reduced.

  Therefore, in the substrate transfer apparatus 1 according to the present embodiment, when the first operation is requested while the transfer robot 12 is executing the second operation (Yes in step S41), the control unit 10 first transfers the transfer operation. The robot 12 is controlled to face the coater / developer device 20. In accordance with this control, the transfer robot 12 moves to a position where the transfer arm 121 moves forward and backward with respect to the coater / developer apparatus 20 while holding the substrate 90 received from the peripheral device 40 (step S44).

  When the movement of the transfer robot 12 in step S44 is completed, the transfer robot 12 executes the operation A (step S15). That is, the transport arm that does not hold the substrate 90 is advanced to the coater / developer apparatus 20 to receive the substrate 90 prepared in the coater / developer apparatus 20. Subsequently, the transfer robot 12 executes the operation H and ends the second operation (step S46). That is, the transfer arm 121 that receives the substrate 90 from the peripheral device 40 is advanced to the coater / developer device 20, and the held substrate 90 is carried into the coater / developer device 20.

  The movement of the transfer robot 12 in step S44 is a movement for performing the operation A. Since the operation H is performed on the coater / developer apparatus 20 after the operation A is performed, the transfer robot in step S42 is performed. Similarly to the movement of 12, it can be regarded as a movement for performing the operation H. That is, by such control, the movement of the second robot to the position where the transfer robot 12 performs the movement H becomes substantially unnecessary.

  As described above, in the substrate transfer apparatus 1 according to the present embodiment, the transfer robot 12 includes the two transfer arms 121, whereby the substrate 90 can be exchanged with respect to the coater / developer apparatus 20. Therefore, since the substrate 90 can be transported without performing the interlock control as described above, the efficiency of the substrate production line is not lowered.

  When the first operation is requested while the transfer robot 12 is executing the second operation (Yes in step S41), the control unit 10 performs the operation of replacing the substrate 90 with respect to the coater / developer apparatus 20. The transfer robot 12 is controlled to perform. That is, the substrate transfer apparatus 1 according to the present embodiment controls the transfer robot 12 according to the operation request detected during the execution of the second operation, so that the time required for the transfer of the transfer robot 12 is reduced. Can be reduced.

  Note that the operation H is substantially waited for the time for executing the operation A. However, the operation A is an operation for simply moving the transfer arm 121 forward and backward with respect to the coater / developer apparatus 20, and the required time is sufficiently shorter than the time required for other operations and processing (for example, about several seconds). Therefore, even if the operation H is waited by the operation A, the tact time of the second operation of the transfer robot 12 is hardly affected.

  Since the operation A is an operation included in the first operation, execution of the operation A before the transfer robot 12 executes the operation H is next scheduled while the transfer robot 12 is executing the second operation. This corresponds to starting the first operation in advance (the first operation interrupts the second operation). In this manner, even when the first operation interrupts the second operation, the operation order of the second operation determined in advance by the control unit 10 is not changed. Moreover, after step S46 is performed, the transfer robot 12 continues the first operation started by returning to the process of step S15.

  As described above, the substrate transfer apparatus 1 according to the present embodiment classifies the substrate transfer operation by the transfer robot 12 into the first operation having a relatively short tact time and the second operation having a relatively long tact time. The operation request for each of the first operation and the second operation is accepted. In other words, by narrowing down the operation requests for the transfer robot 12, it is possible to easily predict the generation status of the operation requests. Therefore, it is possible to efficiently respond to the operation request, and it is possible to realize efficient transport processing.

  In addition, since each operation of the transfer robot 12 constituting the first operation and the second operation is determined in advance in a predetermined order according to the processing order of the substrate 90, for example, the transfer robot 12 The operation order can be set so as to perform the replacement operation of the substrate 90. Therefore, the movement time of the transfer robot 12 can be reduced.

  In addition, since the transfer robot 12 includes the two transfer arms 121, the transfer robot 12 can perform the unloading / loading operation (exchange operation) of the substrate 90 without moving on the way. Therefore, since the movement time of the transfer robot 12 can be reduced, an efficient transfer process can be realized.

  Note that the control unit 10 of the substrate transfer apparatus 1 in the present embodiment controls the transfer robot 12 so that the second operation is executed with priority when the operation requests for the operation A and the operation E are detected at the same time. . Thus, by giving priority to the processing of the exposure apparatus 30 with inferior processing capability, it is possible to improve the processing efficiency of the substrate production line.

  In the substrate transfer apparatus 1, when there is an operation request for the operation E, the operation C and the operation D are always executed before the operation E. Therefore, the exposure apparatus 30 may be configured to issue an operation request for the operation E early in anticipation of the time required for the operations C and D. As a result, the probability that the exposure apparatus 30 waits until the operation request for the operation A is detected first and the transfer robot 12 completes the first operation can be reduced.

  Further, the exposure apparatus 30 has been described assuming an apparatus that issues an operation request for the operation E when the exposure processing for the substrate 90 is completed and the substrate 90 to be unloaded is prepared. However, only one substrate 90 can be transferred between the exposure apparatus 30 and the transfer robot 12. Therefore, as long as the transfer robot 12 does not carry out the substrate 90 for which the exposure process has been completed (unless the operation D is executed), the exposure apparatus 30 will not be able to receive a new substrate 90. The request cannot be made. That is, when the exposure apparatus constituting the substrate production line does not make an operation request for the operation E unless the operation request for the operation D is ignored, the operation request for the operation D is changed to the operation request in the present embodiment. The above-described control may be performed by regarding the operation request for E. In that case, the control unit 10 causes the transfer robot 12 to wait until there is an operation request for the operation E after causing the transfer robot 12 to execute the operation D. In this way, the operation order of the second operation of the transfer robot 12 is controlled to be a predetermined order determined in advance by the control unit 10. The same applies to the peripheral device 40.

<2. Second Embodiment>
In the first embodiment, the description has been given of the substrate transfer apparatus 1 having one transfer robot. However, the number of transfer robots is not limited to this, and more transfer robots may be provided.

  FIG. 6 is a plan view showing the substrate transport apparatus 2 according to the second embodiment configured based on such a principle together with a substrate production line.

  The substrate transport apparatus 2 in the second embodiment includes a standby stage 13 and a transport robot 14 in addition to the configuration of the substrate transport apparatus 1 in the first embodiment. Note that in the substrate transfer apparatus 2 in the present embodiment, the same reference numerals are given to configurations having substantially the same functions as those of the substrate transfer apparatus 1 in the first embodiment, and description thereof will be omitted as appropriate.

  The standby stage 13 is a stage for holding one substrate 90 at a predetermined position, and the substrate 90 can be transferred from either of the transfer robots 12 and 14.

  The transfer robot 14 has substantially the same function as the transfer robot 12 and transfers the substrate 90 between the standby stage 13 and the exposure apparatus 30.

  The control unit 10 of the substrate transfer apparatus 1 according to the second embodiment is mainly requested by the coater / developer apparatus 20 and the peripheral apparatus 40 for the following transfer operation of the transfer robot 12.

Operation A: Operation for receiving the substrate 90 from the coater / developer apparatus 20 This operation is requested from the coater / developer apparatus 20 when the coated substrate 90 is prepared in the coater / developer apparatus 20. When this operation is executed, the rotation position of the arm base 122 of the transfer robot 12 needs to be a position where the transfer arm 121 advances and retreats toward the coater / developer device 20.

Operation B: Operation of loading the substrate 90 into the buffer 11 This operation is necessary for temporarily storing the substrate 90 received from the coater / developer apparatus 20. When this operation is executed, the rotation position of the arm base 122 of the transfer robot 12 needs to be a position where the transfer arm 121 moves forward and backward toward the buffer 11.

Operation C: Operation for receiving the substrate 90 from the buffer 11 This operation is necessary for taking out the substrate 90 accumulated in the buffer 11. When this operation is executed, the rotation position of the arm base 122 of the transfer robot 12 needs to be a position where the transfer arm 121 moves forward and backward toward the buffer 11.

Operation D: Operation for receiving the substrate 90 from the standby stage 13 This operation is necessary for taking out the substrate 90 for which the exposure processing has been completed from the standby stage 13. When this operation is executed, the rotation position of the arm base 122 of the transfer robot 12 needs to be a position where the transfer arm 121 moves forward and backward toward the standby stage 13.

Operation E: Operation for loading the substrate 90 into the standby stage 13 This operation is necessary for supplying the substrate 90 to be transferred to the exposure apparatus 30 to the standby stage 13. When this operation is executed, the rotation position of the arm base 122 of the transfer robot 12 needs to be a position where the transfer arm 121 moves forward and backward toward the standby stage 13.

Operation F: Operation for receiving the substrate 90 from the peripheral device 40 This operation is requested from the peripheral device 40 when the processing on the substrate 90 is completed in the peripheral device 40. When this operation is executed, the rotation position of the arm base 122 of the transfer robot 12 needs to be a position where the transfer arm 121 moves forward and backward toward the peripheral device 40.

Operation G: Operation of loading the substrate 90 into the peripheral device 40 This operation is required when the peripheral device 40 can accept a new substrate 90. When this operation is executed, the rotation position of the arm base 122 of the transfer robot 12 needs to be a position where the transfer arm 121 moves forward and backward toward the peripheral device 40.

Operation H: Operation for loading a substrate into the coater / developer apparatus 20 This operation is required when the coater / developer apparatus 20 can accept a substrate 90 to be newly developed. When this operation is executed, the rotation position of the arm base 122 of the transfer robot 12 needs to be a position where the transfer arm 121 advances and retreats toward the coater / developer device 20.

  Further, the control unit 10 is mainly requested by the exposure apparatus 30 and the like for the following transport operation of the transport robot 14.

Operation I: Operation for receiving the substrate 90 from the standby stage 13 This operation is required when the substrate 90 to be transported to the exposure apparatus 30 is prepared on the standby stage 13. When this operation is executed, the rotation position of the arm base 122 of the transfer robot 14 needs to be a position where the transfer arm 121 moves forward and backward toward the standby stage 13.

Operation J: Operation for receiving the substrate 90 from the exposure apparatus 30 This operation is necessary for taking out the substrate 90 for which the exposure processing has been completed in the exposure apparatus 30. When this operation is executed, the rotation position of the arm base 122 of the transfer robot 14 needs to be a position where the transfer arm 121 advances and retreats toward the exposure apparatus 30.

Operation K: Operation for loading the substrate 90 into the exposure apparatus 30 This operation is necessary for loading the substrate 90 received from the standby stage 13 into the exposure apparatus 30. When this operation is executed, the rotation position of the arm base 122 of the transfer robot 14 needs to be a position where the transfer arm 121 advances and retreats toward the exposure apparatus 30.

Operation L: Operation for loading the substrate 90 into the standby stage 13 This operation is necessary for loading the substrate 90 after the exposure process into the standby stage 13. When this operation is executed, the rotation position of the arm base 122 of the transfer robot 14 needs to be a position where the transfer arm 121 moves forward and backward toward the standby stage 13.

  The 12 operations described in the operations A to L are mainly realized by moving one of the transfer arms 121 of the transfer robots 12 and 14 in the predetermined direction. This operation requires a similar amount of time. Of the eight operations of the transfer robot 12 in the present embodiment, operations other than the operations D and E are the same as the operations A to C and F to H in the first embodiment. The standby stage 13 makes an operation request for the operation I when holding the substrate 90 to be transported to the exposure apparatus 30, and makes an operation request for the operation E in other cases.

  As described in the first embodiment, the control unit 10 of the substrate transport apparatus 2 according to the present embodiment is configured to apply the substrate 90 to the coater / out of a plurality of operations that the transport robot 12 performs to transport the substrate 90. The operation of conveying from the developer device 20 to the buffer 11 is a first operation, and the other conveying operation is a second operation.

  That is, the first operation of the transfer robot 12 in the second embodiment is the same as the first operation of the transfer robot 12 in the first embodiment. Then, the control unit 10 controls the transfer robot 12 to sequentially execute the operations of the transfer robot 12 constituting the first operation in the predetermined order shown here according to the processing order for the substrate 90.

  In addition, the second operation of the transfer robot 12 includes an operation of moving to the position where the operation C is performed, an operation C, an operation of moving from the position where the operation C is performed to a position where the operation D and the operation E are performed, and an operation D. And the movement E from the position where the movement E is performed to the position where the movement F and the movement G are performed, the movement F, the movement G, and the position where the movement G is performed to the position where the movement H is performed. The operation includes the operation and the operation H. Then, the control unit 10 controls the transfer robot 12 to sequentially execute the operations of the transfer robot 12 constituting the second operation in the predetermined order shown here according to the processing order for the substrate 90.

  Next, operations of the transfer robots 12 and 14 in the substrate transfer apparatus 2 according to the second embodiment will be described. First, the transfer robot 12 is controlled in the same manner as the transfer robot 12 in the first embodiment shown in FIGS.

  7 to 8 are flowcharts showing the operation of the transfer robot 14 of the substrate transfer apparatus 2 in the second embodiment. First, the control unit 10 causes the transfer robot 14 to wait while monitoring whether or not there is an operation request for the operation K and the operation I (steps S51 and S52).

  When the control unit 10 detects an operation request for the operation K (Yes in step S51), the processing from step S61 is executed to start the second operation, which will be described later.

  When the control unit 10 detects an operation request for the operation I (Yes in step S52), first, the transport robot 14 is controlled to face the standby stage 13. In accordance with this control, the transfer robot 14 moves to a position for moving the transfer arm 121 forward and backward with respect to the standby stage 13 (step S53).

  Next, the transfer robot 14 advances the transfer arm 121 that does not hold the substrate 90 to the standby stage 13 and receives the substrate 90 from the standby stage 13, thereby executing the operation I (step S54). Further, when the transfer robot 14 holds the substrate 90 carried out from the exposure apparatus 30, the transfer arm 121 holding the substrate 90 is advanced to the standby stage 13 and moved to the standby stage 13. By delivering the substrate 90, the operation L is executed (step S55). As a result, the transfer robot 14 performs the operation of replacing the substrate 90 with respect to the standby stage 13.

  In step S54, when the transfer robot 14 receives the substrate 90 to be transferred to the exposure apparatus 30, the control unit 10 waits for the transfer robot 14 while monitoring the operation request for the operation K (step S56). In step S56, the operation request for the operation I is ignored during this period. Since the transfer robot 14 already holds the substrate 90 to be transferred to the exposure apparatus 30 when step S56 is executed (step S54), it cannot respond to an operation request for the operation I. is there.

  When the control unit 10 detects an operation request for the operation K (Yes in any of steps S51 and S56), the control unit 10 controls the transport robot 14 to face the exposure apparatus 30. In accordance with this control, the transfer robot 14 moves to a position for moving the transfer arm 121 forward and backward with respect to the exposure apparatus 30 (step S61).

  Next, when the substrate 90 after the exposure processing is prepared in the exposure apparatus 30, the transfer robot 14 advances the transfer arm 121 that does not hold the substrate 90 to the exposure apparatus 30 to perform exposure. The operation J is executed by receiving the substrate 90 from the apparatus 30 (step S62). Further, the transfer arm 121 holding the substrate 90 received from the standby stage 13 is advanced to the exposure apparatus 30, and the substrate 90 is delivered to the exposure apparatus 30 to execute the operation K (step S63). . Thereby, the transfer robot 14 performs the operation of exchanging the substrate 90 with respect to the exposure apparatus 30.

  When the transfer robot 14 receives the substrate 90 from the exposure apparatus 30, the control unit 10 determines whether or not there is an operation request for the operation I (step S64). When there is an operation request for the operation I, that is, when the substrate 90 to be transported to the exposure apparatus 30 is prepared on the standby stage 13, the transport robot 14 returns to the processing from step S53 and operates.

  On the other hand, when the operation request for the operation I is not made (No in step S64) and the substrate 90 received from the exposure apparatus 30 is held, the control unit 10 transfers the transfer robot 14 Is controlled to face the standby stage 13. In accordance with this control, the transfer robot 14 moves to a position for moving the transfer arm 121 forward and backward with respect to the standby stage 13 (step S65). Further, the transfer robot 14 carries out the operation L by carrying the held substrate 90 into the standby stage 13 (step S66), returns to step S51, and enters a standby state.

  As described above, also in the substrate transfer apparatus 2 in the second embodiment, the same effect as that of the substrate transfer apparatus 1 in the first embodiment can be obtained.

  In addition, since the substrate transfer apparatus 2 includes the two transfer robots 12 and 14, the single transfer robot 14 can be used as a dedicated robot for accessing the exposure apparatus 30 having a low processing speed. That is, in the substrate transfer apparatus 1 in the first embodiment, when the transfer robot 12 starts the first operation, the supply operation of the substrate 90 to the exposure apparatus 30 is in a waiting state during that time. I couldn't make the most of my ability. However, in the substrate transfer apparatus 2 in the second embodiment, since the transfer robot 14 can supply the substrate 90 to the exposure apparatus 30 even when the transfer robot 12 starts the first operation, the exposure apparatus 30 waiting states can be avoided, and the processing capability of the exposure apparatus 30 can be effectively utilized to the maximum extent. Therefore, it is possible to improve the manufacturing efficiency of the substrate manufacturing line.

  The transport robot 12 is not aware that the processing in the exposure apparatus 30 is slower than the coater / developer apparatus 20, except that the second operation is skipped every predetermined cycle. Operates with a tact time of 20.

<3. Third Embodiment>
In the above embodiment, the example in which the processing in the peripheral device 40 is executed after the exposure processing in the exposure device 30 has been described. However, the processing in the peripheral device 40 is executed before the exposure processing in the exposure device 30. It may be a process.

  FIG. 9 is a plan view showing a substrate transfer device 3 and a substrate production line according to the third embodiment configured based on such a principle. As shown in FIG. 9, the substrate production line in the present embodiment is different from the substrate production line described in the first embodiment in that the peripheral device 40 is provided on the upstream side of the exposure apparatus 30. .

  The control unit 10 of the substrate transfer apparatus 3 in the present embodiment is mainly requested to perform the following transfer operation of the transfer robot 12 from the coater / developer apparatus 20, the peripheral apparatus 40, the exposure apparatus 30, and the like.

Operation A: Operation for receiving the substrate 90 from the coater / developer apparatus 20 This operation is requested from the coater / developer apparatus 20 when the coated substrate 90 is prepared in the coater / developer apparatus 20. When this operation is executed, the rotation position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the coater / developer apparatus 20.

Operation B: Operation of loading the substrate 90 into the buffer 11 This operation is necessary for temporarily storing the substrate 90 received from the coater / developer apparatus 20. When this operation is executed, the rotational position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the buffer 11.

Operation C: Operation for receiving the substrate 90 from the buffer 11 This operation is necessary for taking out the substrate 90 accumulated in the buffer 11. When this operation is executed, the rotational position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the buffer 11.

Operation D: Operation for receiving the substrate 90 from the peripheral device 40 This operation is requested from the peripheral device 40 when the processing on the substrate 90 is completed in the peripheral device 40. When this operation is executed, the rotation position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the peripheral device 40.

Operation E: Operation for loading the substrate 90 into the peripheral device 40 This operation is required when the peripheral device 40 can accept a new substrate 90. When this operation is executed, the rotation position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the peripheral device 40.

Operation F: Operation for receiving the substrate 90 from the exposure apparatus 30 This operation is necessary for taking out the substrate 90 after the exposure processing in the exposure apparatus 30 is completed. When this operation is executed, the rotation position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the exposure apparatus 30.

Operation G: Operation for loading the substrate 90 into the exposure apparatus 30 This operation is required when the exposure apparatus 30 can perform exposure processing on a new substrate 90. When this operation is executed, the rotation position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the exposure apparatus 30.

Operation H: Operation for loading the substrate 90 into the coater / developer apparatus 20 This operation is required when the coater / developer apparatus 20 can accept a new substrate 90 to be developed. When this operation is executed, the rotation position of the arm base 122 needs to be a position where the transfer arm 121 advances and retreats toward the coater / developer apparatus 20.

  That is, the operation D and the operation E in the third embodiment are the same as the operation F and the operation G in the first embodiment, and the operation F and the operation G in the third embodiment are the same as those in the first embodiment. The operation is the same as the operation D and the operation E in the form.

  The control unit 10 of the substrate transfer apparatus 3 in the third embodiment is similar to the control unit 10 in the first embodiment, among the plurality of operations that the transfer robot 12 performs to transfer the substrate 90, the substrate The operation of transporting 90 from the coater / developer apparatus 20 to the buffer 11 is defined as a first operation. Further, the other transport operation is defined as a second operation.

  That is, the content and sequence of the first operation of the transfer robot 12 in the third embodiment are the same as the first operation of the transfer robot 12 in the first embodiment.

  Further, the second operation of the transfer robot 12 in the third embodiment includes an operation of moving to a position where the operation C is performed, an operation C, and a position where the operation D and the operation E are performed from the position where the operation C is performed. The movement, the movement D, the movement E, the movement from the position where the movement E is performed to the position where the movement F and the movement G are performed, the movement F, the movement G, and the movement from the position where the movement G is performed The operation includes an operation of moving to a position where H is performed and an operation H. Then, the control unit 10 determines the operation of the transport robot 12 constituting these second operations according to the processing order for the substrate 90 (the processing in the peripheral device 40 precedes the processing in the exposure device 30). The transfer robot 12 is controlled so as to be sequentially executed in the following order.

  Then, the control unit 10 starts the first operation when there is an operation request for the operation A, as in the first embodiment, while the second operation starts when there is an operation request for the operation G. The transfer robot 12 is controlled to do so. That is, the substrate transfer apparatus 3 is the same as the substrate transfer apparatus 1 in the first embodiment in that the second operation is started when the exposure apparatus 30 requests supply of the substrate 90. Further, the control unit 10 ignores an operation request for other operations (operations B, C, D, E, F, and H) without accepting the operation request.

  Similarly to the above-described embodiment, in the substrate transfer apparatus 3 according to the third embodiment, the operations constituting the first operation and the second operation are executed in a predetermined order determined by the control unit 10. Once the first operation or the second operation is started, the order of these operations is changed during the series of operations even though other operations may interrupt during these operations. There is no.

  The operation of the substrate transfer apparatus 3 in the third embodiment is the same as that in the first embodiment except that in step S11 and step S15 shown in FIG. Since it is almost the same as the substrate transfer apparatus 1, the description is omitted.

  As described above, also in the substrate transport apparatus 3 in the third embodiment, the same effects as those of the substrate transport apparatuses 1 and 2 in the above embodiment can be obtained.

<4. Modification>
Although the embodiments of the present invention have been described above, the present invention is not limited to the above embodiments, and various modifications can be made.

  Further, the processing in the first to third processing units is not limited to the above processing, and other processing may be performed.

  In the above embodiment, the substrate manufacturing line including the peripheral device 40 has been described. However, a substrate manufacturing line without a device corresponding to the peripheral device 40 may be used. FIG. 10 is a plan view showing the substrate transport apparatus 4 and the substrate production line configured based on such a principle. The transfer robot 12 of the substrate transfer apparatus 4 shown in FIG. 10 is controlled as having no operations corresponding to the operations F and G among the transfer operations of the transfer robot 12 in the first embodiment. Therefore, the second operation of the substrate transfer apparatus 4 is an operation in which steps S36 to S38 are not executed after the operation E is executed in step S35 shown in FIG. Even if it is such a structure, the effect similar to the said embodiment can be acquired.

It is a top view which shows the board | substrate conveyance apparatus which concerns on this invention with a board | substrate manufacturing line. It is a perspective view which shows the detail of a conveyance robot. It is a flowchart which shows operation | movement of the conveyance robot in 1st Embodiment. It is a flowchart which shows operation | movement of the conveyance robot in 1st Embodiment. It is a flowchart which shows operation | movement of the conveyance robot in 1st Embodiment. It is a top view which shows the board | substrate conveyance apparatus in 2nd Embodiment with a board | substrate manufacturing line. It is a flowchart which shows operation | movement of the conveyance robot in 2nd Embodiment. It is a flowchart which shows operation | movement of the conveyance robot in 2nd Embodiment. It is a top view which shows the board | substrate conveyance apparatus in 3rd Embodiment with a board | substrate manufacturing line. It is a top view which shows the board | substrate conveying apparatus in a modification with a board | substrate manufacturing line.

Explanation of symbols

1, 2, 3, 4 Substrate transfer device 10 Control unit 11 Buffer 12, 14 Transfer robot 121 Transfer arm 122 Arm base 123 Lifting unit 13 Standby stage 20 Coater / developer device (first processing unit)
30 exposure apparatus (second processing unit)
40 Peripheral device (third processing unit)
90 Substrate A, B, C, D, E, F, G, H, I, J, K, L

Claims (7)

Substrate transport apparatus for transporting a substrate between a first processing unit that performs a predetermined process on a substrate and a second processing unit that has a smaller number of processings per unit time in a normal time than the first processing unit Because
Transport means for transporting the substrate between the first processing section and the second processing section;
A substrate accumulating unit for temporarily accumulating the substrate conveyed by the conveying unit between the first processing unit and the second processing unit;
Of the operations for transporting the substrate by the transport means, the operation for transporting the substrate from the first processing unit to the substrate storage means is a first operation, and the operation other than the first operation is a second operation. A control unit that receives an operation request for each operation and the second operation, and controls the transport unit according to the operation request;
The board | substrate conveyance apparatus characterized by the above-mentioned. The substrate transfer apparatus according to claim 1,
The second operation includes a plurality of operations including an operation of transporting a substrate from the substrate storage unit to the second processing unit and an operation of transporting a substrate from the second processing unit to the first processing unit. ,
The substrate transport apparatus, wherein the control unit controls the transport unit so that the plurality of operations are executed in a predetermined order according to a processing order performed on the substrate. It is a board | substrate conveyance apparatus of Claim 1 or 2, Comprising:
A substrate transfer apparatus, further comprising a third processing unit that has a larger number of processing sheets per unit time in a normal time than the second processing unit. The substrate transfer apparatus according to any one of claims 1 to 3,
The transport means includes a first arm and a second arm that hold the substrate, respectively.
The second operation includes the operation of unloading the substrate from the second processing unit by the one of the first arm and the second arm that does not hold the substrate, and the substrate held by the other to the second processing unit. A substrate transfer apparatus including an operation of continuously performing an operation of carrying in. Substrate transport apparatus for transporting a substrate between a first processing unit that performs a predetermined process on a substrate and a second processing unit that has a smaller number of processings per unit time in a normal time than the first processing unit Because
Substrate storage means for temporarily storing a substrate transported between the first processing unit and the second processing unit;
A stage for holding a substrate;
First transport means for transporting a substrate between the first processing section and the stage;
Second transport means for transporting a substrate between the stage and the second processing unit;
Of the operations in which the first transport unit transports the substrate, the operation of transporting the substrate from the first processing unit to the substrate storage unit is a first operation, and the operation other than the first operation is a second operation. A control unit that receives an operation request for each of the first operation and the second operation, and controls the first transport unit in response to the operation request;
The board | substrate conveyance apparatus characterized by the above-mentioned. It is a board | substrate conveyance apparatus of Claim 5, Comprising:
The second operation includes a plurality of operations including an operation of transporting a substrate from the substrate storage unit to the stage and an operation of transporting a substrate from the stage to the first processing unit.
The substrate transport apparatus, wherein the control unit controls the first transport unit so that the plurality of operations are executed in a predetermined order according to a processing order performed on the substrate. It is a board | substrate conveyance apparatus of Claim 5 or 6, Comprising:
The first transport unit and the second transport unit each include a first arm and a second arm for holding a substrate,
The second operation includes the operation of unloading the substrate from the second processing unit by the one of the first arm and the second arm that does not hold the substrate, and the substrate held by the other to the second processing unit. A substrate transfer apparatus including an operation of continuously performing an operation of carrying in.

Images