JP2005238044A - System for treating basic gas - Google Patents

System for treating basic gas Download PDF

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JP2005238044A
JP2005238044A JP2004049064A JP2004049064A JP2005238044A JP 2005238044 A JP2005238044 A JP 2005238044A JP 2004049064 A JP2004049064 A JP 2004049064A JP 2004049064 A JP2004049064 A JP 2004049064A JP 2005238044 A JP2005238044 A JP 2005238044A
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gas
basic
treatment system
gas treatment
fiber
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Tsutomu Sugiura
勉 杉浦
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Toyobo Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a system for efficiently treating a basic substance in basic material-containing gas which is capable of stably reducing the diffusion of the basic gas to environment. <P>SOLUTION: A washing apparatus in which the basic substance in the basic material-containing gas is brought into contact with water, acid or oxide and is treated is combined with a backup apparatus having a mechanism which receives the gas subjected to adsorption treatment discharged from the washing apparatus, permits the adsorption treatment and desorption treatment of the basic gas leaking in the treated gas and permits the conveyance of the treated gas to the washing apparatus. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、例えば空気中に含まれるアンモニアやトリメチルアミン等の塩基性ガスを処理するシステムに関し、特に排気ガスの塩基性ガス濃度を低減するための処理システムに関する。   The present invention relates to a system for processing a basic gas such as ammonia or trimethylamine contained in air, and more particularly to a processing system for reducing the basic gas concentration of exhaust gas.

近年、塩基性物質に対する排出濃度規制が強化されてきており、特にアンモニアやトリメチルアミン等の特定悪臭物質の排ガス濃度を低減するための処理技術の確立が望まれている。特許文献1には、アンモニアを含有する排気ガスを、吸着材に接触させ、該吸着材にアンモニアを吸着させた後に脱着させる工程を含む事を特徴とするアンモニア含有排気ガスの処理方法が記載されている。   In recent years, emission concentration regulations for basic substances have been strengthened, and in particular, establishment of a treatment technique for reducing the exhaust gas concentration of specific malodorous substances such as ammonia and trimethylamine is desired. Patent Document 1 describes a method for treating ammonia-containing exhaust gas, which includes a step of bringing exhaust gas containing ammonia into contact with an adsorbent and desorbing ammonia after adsorbing the adsorbent onto the adsorbent. ing.

また、多量の塩基性ガスを含有する排ガスの処理方法としては、図1に示す水洗浄や中和による薬液洗浄が用いられてきた。すなわち、被処理ガスは送付機1による水洗浄塔下部から供給され、一方洗浄用水は、水貯蓄層3から水補給ポンプ4により、循環ポンプ5によって循環する水循環経路に送られ、該洗浄塔上部に設けられたスプレーノズル6から散布される。該洗浄塔下部から供給された被処理ガスは、かかる散布水によって洗浄された後、ミストセパレーター2によりガスとミストが分離され、ガスは該洗浄塔上部から排出され、ミスト及び水は該洗浄塔下部から排出され、一部の水は循環利用される装置が提案されている。   Further, as a method for treating exhaust gas containing a large amount of basic gas, chemical cleaning by water cleaning or neutralization shown in FIG. 1 has been used. That is, the gas to be treated is supplied from the lower part of the water washing tower by the transmitter 1, while the washing water is sent from the water storage layer 3 to the water circulation path circulated by the circulation pump 5 by the water supply pump 4, and the upper part of the washing tower. It sprays from the spray nozzle 6 provided in the. The gas to be treated supplied from the lower part of the washing tower is washed with the spray water, and then the gas and mist are separated by the mist separator 2, the gas is discharged from the upper part of the washing tower, and the mist and water are removed from the washing tower. An apparatus has been proposed in which a part of water discharged from the lower part is recycled.

しかし、これら洗浄装置は塩基性ガスを処理するのに簡便な方法であるが、原理的にその除去率をある限界以上に高くすることは困難であり、かつ低濃度の臭気の場合にはその除去率がとくに低下するので、これだけは高い除去率を得られない場合が多い。   However, these cleaning devices are simple methods for treating basic gas, but in principle, it is difficult to increase the removal rate beyond a certain limit, and in the case of low-concentration odor, Since the removal rate is particularly lowered, it is often impossible to obtain a high removal rate.

また、塩基性ガスの除去率を向上させようとすると新鮮な補給水量を増加させる必要があり、また補給水量の増加は塩基性ガスを除去後、系外に排出される廃水量の増加となり、その結果、工場や事業場の排水処理設備の水処理負荷を増大させる問題点を有する。また、酸または酸化剤による薬液洗浄法を用いる場合があるが、その場合も同様に除去率を向上させようとすると薬液および酸化剤の量を多くする必要があり、また生成した塩の用後処理負荷を増大させる問題点を有する。
特開2002−66255号公報
In addition, in order to improve the removal rate of the basic gas, it is necessary to increase the amount of fresh makeup water, and the increase in the amount of makeup water increases the amount of waste water discharged outside the system after removing the basic gas. As a result, there is a problem of increasing the water treatment load of the wastewater treatment facility in the factory or business site. In addition, a chemical cleaning method using an acid or an oxidizing agent may be used. In this case as well, in order to improve the removal rate, it is necessary to increase the amount of the chemical and the oxidizing agent, and after using the generated salt. There is a problem of increasing the processing load.
JP 2002-66255 A

塩基性物質含有ガスから塩基性物質を除去するのに簡便な方法である洗浄装置を単独で使用しても、高い除去率を効率よく得ることが出来ない。本発明は、かかる事情に着目してなされたものであって、環境への塩基性物質の拡散を安定的であり、効率良く低減することができる塩基性ガス処理システムを提供することを目的とする。   Even if a cleaning apparatus, which is a simple method for removing the basic substance from the basic substance-containing gas, is used alone, a high removal rate cannot be obtained efficiently. The present invention has been made paying attention to such circumstances, and an object of the present invention is to provide a basic gas treatment system that can stably and efficiently reduce the diffusion of a basic substance into the environment. To do.

即ち、本発明は、塩基性物質含有ガス中の塩基性物質を水、酸性物質または酸化物と気液接触させて処理する洗浄装置と前記洗浄装置で処理済ガス中にリークした塩基性物質を連続的に吸着・脱着処理を行うことができ、該脱着処理された塩基性物質は前記洗浄装置の入口に戻されるように構成されているバックアップ処理装置とを有することを特徴とする塩基性ガス処理システムを提供するものである。   That is, the present invention relates to a cleaning apparatus for treating a basic substance in a basic substance-containing gas by bringing it into gas-liquid contact with water, an acidic substance or an oxide, and a basic substance leaked into a gas treated by the cleaning apparatus. A basic gas comprising: a backup processing device configured to continuously perform adsorption / desorption processing, and wherein the desorbed basic substance is returned to the inlet of the cleaning device. A processing system is provided.

また、本発明は、前記バッククアップ処理装置が、円柱状又は円筒状に形成されたハニカム状吸着体が吸着領域、再生領域を巡回し連続的に塩基性物質の吸着・脱着処理を行うように構成されている連続式吸・脱着装置であること特徴とする塩基性ガス処理システムを提供するものである。   Further, in the present invention, the back-up treatment apparatus is configured such that a honeycomb-like adsorbent formed in a columnar shape or a cylindrical shape circulates the adsorption region and the regeneration region and continuously performs the adsorption / desorption treatment of the basic substance. The present invention provides a basic gas treatment system which is a continuous suction / desorption device constructed.

また、本発明は、前記バックアップ処理装置のハニカム状吸着体が、イオン交換繊維を含有している事が好ましい。   In the present invention, it is preferable that the honeycomb adsorbent of the backup processing apparatus contains an ion exchange fiber.

また、本発明は、イオン交換繊維が水酸基、カルボキシル基、スルホン酸基からなる郡より選ばれた少なくとも1つの官能基を繊維母体に結合してなる陽イオン交換繊維であることが好ましい。   In the present invention, it is preferable that the ion exchange fiber is a cation exchange fiber in which at least one functional group selected from the group consisting of a hydroxyl group, a carboxyl group, and a sulfonic acid group is bonded to the fiber matrix.

また、本発明は、前記塩基性ガスがアンモニアであることが好ましい。   In the present invention, the basic gas is preferably ammonia.

本発明により、塩基性物質含有ガスから塩基性物質を安定的で、効率良く処理することができる塩基性ガス処理システムを提供することが可能となり、環境への塩基性ガスの拡散を安定的に、効率よく低減することができる。   According to the present invention, it becomes possible to provide a basic gas treatment system capable of stably and efficiently treating a basic substance from a basic substance-containing gas, and stably diffusing the basic gas into the environment. Can be reduced efficiently.

図2は本発明の好ましい実施の一形態の例を示す塩基性ガス処理システムのフロー図である。本発明の塩基性ガス処理システムは、大きく分けて塩基性物質含有ガスを導入することができ、塩基性物質を水、酸性物質または酸化物により気液接触させて処理することができる洗浄装置と該洗浄装置から排出される吸着処理済ガスを受け入れ、該処理済ガス中にリークしている塩基性物質の吸着処理及び脱着処理ができ、且つ脱着ガスを前記洗浄装置へ搬送することができるバックアップ処理装置とから構成される。   FIG. 2 is a flow diagram of a basic gas processing system showing an example of a preferred embodiment of the present invention. The basic gas treatment system of the present invention can be broadly divided into a basic substance-containing gas, and a cleaning apparatus capable of treating a basic substance in gas-liquid contact with water, an acidic substance or an oxide, and Back-up that accepts the adsorption-treated gas discharged from the cleaning device, can adsorb and desorb the basic substance leaking in the treated gas, and can transport the desorption gas to the washing device And a processing device.

図2において工場や作業場等から排出される塩基性物質含有ガスは、送風機21により水洗浄塔下部から供給され、一方洗浄用水は、水貯蓄層23から水補給ポンプ24により、循環ポンプ25によって循環する水循環経路に送られ、該洗浄塔上部に設けられたスプレーノズル26から散布される。該洗浄塔下部から供給された塩基性物質含有ガスは、かかる散布水によって洗浄された後、ミストセパレーター22によりガスとミストが分離され、ガスは該洗浄塔上部から排出され、ミスト及び水は該洗浄塔下部から排出され、一部の水は循環利用される。   In FIG. 2, the basic substance-containing gas discharged from a factory, work place, or the like is supplied from the lower part of the water washing tower by the blower 21, while the washing water is circulated from the water storage layer 23 by the water supply pump 24 by the circulation pump 25. And is sprayed from a spray nozzle 26 provided in the upper part of the washing tower. The basic substance-containing gas supplied from the lower part of the washing tower is washed with the spray water, and then the gas and mist are separated by the mist separator 22, the gas is discharged from the upper part of the washing tower, and the mist and water are It is discharged from the lower part of the washing tower and part of the water is recycled.

前記洗浄装置は、塩基性物質を吸収液に吸収させるために、塩基性物質含有ガスと吸収液を接触させる方法により充填塔、流動式吸収塔、スプレー塔等の液分散型洗浄塔や気泡塔等のガス分散型洗浄塔が存在するが、水、酸性物質または酸化剤をガスに気液接触させて処理する方式の装置であれば良く、特に限定されるものではない。   In order to absorb the basic substance in the absorption liquid, the cleaning device is a liquid dispersion type cleaning tower such as a packed tower, a fluid absorption tower, a spray tower or a bubble tower by a method in which the basic substance-containing gas and the absorption liquid are brought into contact with each other. However, it is not particularly limited as long as it is an apparatus of a system in which water, an acidic substance or an oxidizing agent is brought into gas-liquid contact with gas for treatment.

前記洗浄装置から排出される処理済ガスは、処理済ガス導入ライン27を通じて、図3の様な円柱状又は図4の様な円筒状に形成されたハニカム状吸着体が吸着領域、再生領域を巡回し連続的に塩基性物質を吸着・脱着処理を行うできるバックアップ装置28に導入され、該処理済ガス中にリークしている塩基性物質は吸着され、同時に該バックアップ処理装置28で処理されたガスは清浄ガスとして排出される。   The treated gas discharged from the cleaning device passes through the treated gas introduction line 27, and the honeycomb adsorbent formed in a columnar shape as shown in FIG. 3 or a cylindrical shape as shown in FIG. The basic substance leaking in the treated gas was adsorbed and simultaneously processed by the backup processing apparatus 28. The gas is discharged as clean gas.

さらに、バックアップ処理装置28は、濃縮された塩基性含有脱着ガスを洗浄装置の入口に戻す機能を有する(図1のア)。このシステムによって装置からの塩基性ガス濃度を低減できる。   Further, the backup processing device 28 has a function of returning the concentrated basic-containing desorption gas to the inlet of the cleaning device (a in FIG. 1). With this system, the concentration of basic gas from the apparatus can be reduced.

前記塩基性ガス処理システムはバックアップ処理のコストパフォーマンスを考えると被処理ガス風量が中〜大風量(数十〜数千m3/min)の場合が好適であるが、特に限定されるもではない。 In consideration of the cost performance of the backup processing, the basic gas processing system preferably has a medium to large gas flow rate (several tens to several thousand m 3 / min), but is not particularly limited. .

前記バックアップ装置に使用されるハニカム状吸着体が、イオン交換繊維を含有していることが好ましい。イオン交換繊維であるが故に、例えばアンモニア等の塩基性物質に対して極めて高い吸着性能を発現するからである。   The honeycomb adsorbent used in the backup device preferably contains ion exchange fibers. This is because it is an ion-exchange fiber, and thus exhibits extremely high adsorption performance for basic substances such as ammonia.

ここで、イオン交換繊維は、水酸基、カルボキシル基、スルホン酸基からなる郡より選ばれた少なくとも1つの官能基を繊維母体に結合してなる陽イオン交換繊維である事が好ましい。また2.0mmmol以上、好ましくは4.0mmmol以上の官能基を繊維母体に結合していることが好ましい。   Here, the ion exchange fiber is preferably a cation exchange fiber in which at least one functional group selected from the group consisting of a hydroxyl group, a carboxyl group, and a sulfonic acid group is bonded to the fiber matrix. Further, it is preferable that a functional group of 2.0 mmol or more, preferably 4.0 mmol or more is bonded to the fiber matrix.

上記のイオン交換繊維としては、ポリビニルアルコール系、ポリスチレン系、フェノール系、アクリロニトリル系などの繊維や織布、不織布を放射線グラフト重合法や化学処理によるイオン交換能を付与したものが利用可能であり、カルボキシル基を有する陽イオン交換繊維としては、アクリロニトリル系共重合体(アクリロニトリルを60%以上含む共重合体)を紡糸し、ヒドラジンで架橋処理し、乾燥後、硝酸→苛政ソーダー→塩酸処理した架橋アクリル系繊維が、溶剤に対する耐久性と高イオン交換性を同時に満足しており利用可能である。また、スルホン酸基を有する繊維としては、ポリオレフィン系樹脂/ポリスチレン樹脂を複合紡糸した繊維を、スルホン化剤(硫酸,発煙硫酸等)でスルホン化した繊維等が、溶剤に対する耐久性と高イオン交換性を同時に満足しており同様に利用可能である。   As the above-mentioned ion exchange fiber, polyvinyl alcohol-based, polystyrene-based, phenol-based, acrylonitrile-based fibers, woven fabrics, and non-woven fabrics that have been given ion exchange capability by radiation graft polymerization or chemical treatment can be used. As a cation exchange fiber having a carboxyl group, a acrylonitrile-based copolymer (a copolymer containing 60% or more of acrylonitrile) is spun, cross-linked with hydrazine, dried, nitric acid → caustic soda → hydrochloric acid-treated cross-linked acrylic The system fibers satisfy the durability against solvents and the high ion exchange properties at the same time and can be used. In addition, as the fiber having a sulfonic acid group, a fiber obtained by sulfonating a polyolefin resin / polystyrene resin composite spun with a sulfonating agent (sulfuric acid, fuming sulfuric acid, etc.) has high durability against solvents and high ion exchange. It is satisfying at the same time and can be used in the same way.

前記洗浄装置はガス冷却効果があり、処理済ガスの温度を低下させ、また相対湿度を向上させる効果を有する。前記バックアップ処理装置は、処理済ガスの温度が低くなることで除去率が著しく向上できることから、この組み合わせは除去率向上の面に置いて非常に良い組み合わせとなる。また、一般的には吸着材による物理吸着除去では、相対湿度が高くなると除去率は低下するが、本発明ではイオン交換繊維を含有した吸着材を使用することで、酸・塩基反応が塩基性ガス吸着除去に関与するため、処理ガスの相対湿度が高くても大幅な性能低下が起こらない特徴があり、被処理ガスの温度を低減し、湿度を向上させる洗浄装置の特性を有効に利用できるバックアップ装置となる。   The cleaning device has a gas cooling effect, and has the effects of lowering the temperature of the treated gas and improving the relative humidity. Since the removal rate of the backup processing apparatus can be remarkably improved by lowering the temperature of the treated gas, this combination is a very good combination in terms of improving the removal rate. In general, in the physical adsorption removal with an adsorbent, the removal rate decreases as the relative humidity increases. However, in the present invention, by using an adsorbent containing ion-exchange fibers, the acid-base reaction is basic. Because it is involved in gas adsorption and removal, there is a feature that does not cause significant performance degradation even if the relative humidity of the processing gas is high, and the characteristics of the cleaning device that reduces the temperature of the gas to be processed and improves the humidity can be used effectively. It becomes a backup device.

図2に示される塩基性ガス処理システムにおいて、以下に示す条件での被処理ガスを清浄化処理した。   In the basic gas treatment system shown in FIG. 2, the gas to be treated was cleaned under the following conditions.

〔実施例〕
アンモニア濃度600ppmを含む温度28℃、相対湿度60%、被処理ガス100Nm3/minで水洗浄装置に導入し、液/ガス比を1〜3L/m3として水洗浄を行ったところ、アンモニアの除去率は90%であり、洗浄装置出口の処理済ガスのアンモニア濃度は60ppmであった。
〔Example〕
It was introduced into a water washing apparatus at a temperature of 28 ° C. containing an ammonia concentration of 600 ppm, a relative humidity of 60% and a gas to be treated of 100 Nm 3 / min, and water washing was performed with a liquid / gas ratio of 1 to 3 L / m 3 . The removal rate was 90%, and the ammonia concentration of the treated gas at the outlet of the cleaning device was 60 ppm.

この処理済ガスを継続的にバックアップ処理装置に導入した。バックアップ処理装置は、後述のイオン交換繊維を70wt%含有した直径1450mm、厚み450mmのディスク型塩基性ガス濃縮装置を使用し、脱着処理は吸着風量/脱着風量で求められる濃縮倍率が10倍となるように110℃の加熱空気をコントロールした。バックアップ処理装置において脱着され濃縮されたガスを洗浄装置入口へ戻した。本実施例のシステムにより洗浄化されたガス(バックアップ処理装置での処理後のガス)中のアンモニア濃度は検出限界の2ppm以下までに低減された。アンモニアの濃度は(株)ガステック社製のアンモニアガス検知管No.3M、No.3Hを使用して測定した。   This treated gas was continuously introduced into the backup processing apparatus. The backup processing apparatus uses a disk-type basic gas concentrator having a diameter of 1450 mm and a thickness of 450 mm containing 70 wt% of ion exchange fibers, which will be described later. In the desorption process, the concentration ratio obtained by the adsorption air amount / desorption air amount is 10 times. The heated air at 110 ° C. was controlled as described above. The gas desorbed and concentrated in the backup processing apparatus was returned to the cleaning apparatus inlet. The ammonia concentration in the gas cleaned by the system of this example (the gas after the treatment in the backup processing apparatus) was reduced to 2 ppm or less, which is the detection limit. The ammonia concentration was measured using an ammonia gas detector tube No. 3M, no. Measured using 3H.

上記イオン交換繊維は、下記手法により製造した。アクリロニトリル90質量%と酢酸ビニル10質量%とからなるアクリロニトリル系共重合体(30℃のジメチルホルムアミード中での極限粘度[n]=1.2)10質量部を、50質量%ロダンソーダ水溶液90質量部に溶解した紡糸原液を使用し、常法に従って紡糸、延伸(全延伸倍率:10倍)した後、乾球/湿球=120℃/60℃の雰囲気下で乾燥及び湿熱処理を施して原料繊維(単繊維繊度0.9dtex、繊維長50mm)を得た。この原料繊維を水加ヒドラジン20質量%水溶液中で、架橋導入処理(98℃、6時問)してから純水で洗浄した.洗浄後、乾燥させてから硝酸3質量%水溶液中で酸処理(90℃、2時問)し、引き続き苛性ソ−ダ3質量%水溶液中で加水分解処理90℃、2時間)し、さらに1重量%の塩酸溶液で酸変換してから純水で洗浄した。得られた繊維には、繊維分子中にカルボキシル基6.1mmol/g導入されていた。(0.1モル/L水酸化ナトリウム規定液,フェノールフタレイン指示薬使用による中和点測定による。)   The ion exchange fiber was produced by the following method. 10 parts by mass of an acrylonitrile copolymer consisting of 90% by mass of acrylonitrile and 10% by mass of vinyl acetate (intrinsic viscosity [n] = 1.2 in dimethylformamide at 30 ° C.) is 90 parts by mass of a 50% by mass aqueous rhodium soda solution. Spinning and drawing according to a conventional method using a spinning stock solution dissolved in the part (total draw ratio: 10 times), followed by drying and wet heat treatment in an atmosphere of dry bulb / wet bulb = 120 ° C./60° C. A fiber (single fiber fineness 0.9 dtex, fiber length 50 mm) was obtained. This raw fiber was subjected to a crosslinking introduction treatment (98 ° C., 6 hours) in a 20% by weight aqueous solution of hydrazine hydrate and washed with pure water. After washing and drying, acid treatment (90 ° C., 2 hours) in a 3% by weight nitric acid aqueous solution, followed by hydrolysis treatment in a 3% by weight aqueous caustic soda solution at 90 ° C. for 2 hours, further 1 After acid conversion with a weight% hydrochloric acid solution, it was washed with pure water. The obtained fiber had 6.1 mmol / g carboxyl group introduced into the fiber molecule. (Based on neutralization point measurement using 0.1 mol / L sodium hydroxide normal solution and phenolphthalein indicator)

本願は、塩基性ガスの処理に関する発明であり、「イオン交換繊維を含有した吸着材を使用したバックアップ処理装置を使用することで経済的に極めて高い除去率を発現させたものである。」 同時に洗浄装置の後に吸着・脱着を連続的に処理するバックアップ処理装置を設置するシステムを考案したものであり、塩基性ガス処理に限らず酸性ガスや有機溶剤等の排ガス処理に関する広い分野に寄与する事が可能となる。   The present application is an invention relating to the treatment of basic gas, and “is an economically extremely high removal rate expressed by using a backup treatment apparatus using an adsorbent containing ion exchange fibers.” A system that installs a backup processing device that continuously processes adsorption and desorption after a cleaning device has been devised. It contributes to a wide range of fields related to exhaust gas treatment of acid gases and organic solvents, as well as basic gas treatment. Is possible.

洗浄装置の一形態の図Figure of one form of washing device バックアップ処理装置としてディスク型塩基性ガス濃縮装置を用いた例。An example in which a disk-type basic gas concentrator is used as a backup processing device. 円柱状ハニカム装置の例Example of cylindrical honeycomb device 円筒状ハニカム装置の例Example of cylindrical honeycomb device

符号の説明Explanation of symbols

1 送風機
2 ミストセパレーター
3 水貯蓄槽
4 水供給ポンプ
5 循環ポンプ
6 スプレーノズル
21 送風機
22 ミストセパレーター
23 水貯蓄槽
24 水供給ポンプ
25 循環ポンプ
26 スプレーノズル
27 処理ガス導入ライン
28 バックアップ処理装置
31 濃縮ガス
32 脱着用加熱ガス
33 水分含有比処理ガス
34 処理ガス
35 円柱状ハニカム
36 回転方向
37 脱着ゾーン
38 吸着ゾーン
39 濃縮ガス
40 脱着用加熱ガス
41 水分含有被処理ガス
42 処理ガス
43 円筒状ハニカム
44 回転方向
45 通流配管
46 ハニカム搭載用金属箱
DESCRIPTION OF SYMBOLS 1 Blower 2 Mist separator 3 Water storage tank 4 Water supply pump 5 Circulation pump 6 Spray nozzle 21 Blower 22 Mist separator 23 Water storage tank 24 Water supply pump 25 Circulation pump 26 Spray nozzle 27 Processing gas introduction line 28 Backup processing device 31 Concentrated gas 32 Desorption heating gas 33 Moisture content processing gas 34 Processing gas 35 Cylindrical honeycomb 36 Rotating direction 37 Desorption zone 38 Adsorption zone 39 Concentrated gas 40 Desorption heating gas 41 Moisture containing gas to be treated 42 Processing gas 43 Cylindrical honeycomb 44 Rotation Direction 45 Flow pipe 46 Metal box for mounting honeycomb

Claims (6)

下記(1),(2)及び(3)を備えたことを特徴とする、塩基性物質含有ガス中の塩基性物質除去可能な塩基性ガス処理システム
(1)水、酸性物質または酸化物と気液接触させて処理する洗浄装置
(2)上記洗浄装置で処理済みガス中にリークした塩基性物質を連続的に吸着・脱着処
理する装置
(3)該脱着処理された塩基性物質は前記洗浄装置の入口に戻されるように構成されて
いるバックアップ処理
A basic gas treatment system capable of removing a basic substance in a basic substance-containing gas comprising the following (1), (2) and (3): (1) water, an acidic substance or an oxide; Cleaning device for processing by gas-liquid contact (2) Device for continuously adsorbing / desorbing the basic substance leaked in the gas processed by the cleaning device (3) The desorbed basic material is washed Backup process configured to be returned to the device entrance
バックアップ処理装置が、円柱状又は円筒状に形成されたハニカム状吸着体が吸着領域、再生領域を有し、連続的に塩基性物質の吸着・脱着処理を行うように構成されている、請求項1記載の塩基性ガス処理システム。 The backup processing apparatus is configured such that a honeycomb-shaped adsorbent formed in a columnar shape or a cylindrical shape has an adsorption region and a regeneration region, and continuously performs adsorption / desorption processing of a basic substance. 2. The basic gas treatment system according to 1. バックアップ処理装置のハニカム状吸着体に使用される吸着材が、イオン交換繊維を含有していることを特徴とする、請求項1乃至2に記載の塩基性ガス処理システム。 The basic gas treatment system according to claim 1 or 2, wherein the adsorbent used for the honeycomb-like adsorbent of the backup treatment apparatus contains ion exchange fibers. イオン交換繊維が、水酸基、カルボキシル基、スルホン酸基からなる郡のより選ばれた少なくとも一つの官能基を繊維母体に結合してなる陽イオン交換繊維である事を特徴とする請求項1乃至3に記載の塩基性ガス処理システム。 The ion exchange fiber is a cation exchange fiber formed by binding at least one functional group selected from a group consisting of a hydroxyl group, a carboxyl group, and a sulfonic acid group to a fiber matrix. A basic gas treatment system according to 1. イオン交換繊維が、架橋アクリル系繊維である事を特徴とする請求項1乃至3に記載の塩基性ガス処理システム。 4. The basic gas treatment system according to claim 1, wherein the ion exchange fiber is a crosslinked acrylic fiber. 塩基性ガスがアンモニアであることを特徴とする請求項1乃至5いづれかに記載の塩基性ガス処理システム。 The basic gas treatment system according to any one of claims 1 to 5, wherein the basic gas is ammonia.
JP2004049064A 2004-02-25 2004-02-25 System for treating basic gas Withdrawn JP2005238044A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110479059A (en) * 2019-09-06 2019-11-22 江苏南大华兴环保科技股份公司 Trimethylamine exhaust gas recovery system and method in a kind of Parylene production process

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5565125U (en) * 1978-10-28 1980-05-06
JPS6171229U (en) * 1984-10-15 1986-05-15
JP2000140654A (en) * 1998-08-31 2000-05-23 Toyobo Co Ltd Treatment of gas or water to be treated, and treating device
JP2000233117A (en) * 1998-12-14 2000-08-29 Japan Pionics Co Ltd Method and apparatus for purification of exhaust gas
JP2003095644A (en) * 2001-09-27 2003-04-03 Nippon Shokubai Co Ltd Recovering method for ammonia

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5565125U (en) * 1978-10-28 1980-05-06
JPS6171229U (en) * 1984-10-15 1986-05-15
JP2000140654A (en) * 1998-08-31 2000-05-23 Toyobo Co Ltd Treatment of gas or water to be treated, and treating device
JP2000233117A (en) * 1998-12-14 2000-08-29 Japan Pionics Co Ltd Method and apparatus for purification of exhaust gas
JP2003095644A (en) * 2001-09-27 2003-04-03 Nippon Shokubai Co Ltd Recovering method for ammonia

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110479059A (en) * 2019-09-06 2019-11-22 江苏南大华兴环保科技股份公司 Trimethylamine exhaust gas recovery system and method in a kind of Parylene production process

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