JP2005234447A - Film having fine ruggedness on its surface, transparent antireflection film, manufacturing method thereof and optical member - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a transparent antireflection film capable of widely controlling the fine rugged structure on its surface and showing an excellent antireflection effect to visible light, and to provide its manufacturing method. <P>SOLUTION: The antireflection film is constituted by immersing a coating film formed by applying a solution containing a zinc compound in a water liquid whose temperature is ≥20°C and forming fine ruggedness principally composed of the zinc compound on the surface of the coating film. The film having the fine ruggedness contains at least one component selected from alumina, silica, titania and zirconia. The height of the fine ruggedness is 0.005 to 1μm, the center line average surface roughness Ra' value obtained by surface-extending the average roughness of the surface having the fine ruggedness is ≥5nm, and a surface area ratio Sr=S/S<SB>0</SB>(provided that S shows the surface area of a measurement surface and S<SB>0</SB>shows area when the measurement surface is plane) is ≥1.1. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a film having fine irregularities on its surface, a transparent antireflection film, and a method for producing them. Furthermore, the present invention relates to an antireflection film having fine irregularities on the surface and an optical member using the same. Specifically, the present invention relates to a film containing a zinc component having fine irregularities on the film surface, a method capable of producing the film at a low temperature, and an optical member using the film.

  Zinc is extremely low in price, has extremely large reserves and production, and has the advantage that there is no concern in terms of resource depletion and stable supply. Zinc oxide, which is a representative example of a material containing zinc, is a cosmetic or antistatic material as a powder, an optical material as a film, an antifogging material exhibiting hydrophilicity or water repellency, a gas sensor, a transparent conductive material used for solar cells, etc. It is used in a wide range of fields and is very useful. In particular, zinc oxide films used for optics, anti-fogging, and transparent conductive materials are attracting attention, and there are many examples having fine irregularities on the surface of the film.

  Conventionally known methods for forming fine irregularities on the film surface include mechanical roughening and chemical etching. For example, in the use of a transparent conductive film produced by a sputtering method, a method of forming irregularities on a surface by etching a zinc oxide film using an acid or an alkali solution is disclosed (for example, see Patent Document 1). ). In the chemical etching and mechanical roughening described in the above example, there is a limit to making the uneven size small, and it is difficult to control the uneven structure size.

  As another method for forming fine unevenness on the surface, for example, it is proposed to control the surface unevenness shape by introducing deuterium into a transparent conductive film mainly composed of zinc oxide prepared by CVD. (For example, refer to Patent Document 2). In addition, in a gas sensor application, a method for adjusting the surface unevenness size of a zinc oxide film produced by a sol-gel method by adjusting the amount of distilled water added during hydrolysis is disclosed (for example, Patent Document 3). reference). However, even in these methods, there is a problem in that the size control of the surface fine concavo-convex structure is not sufficient and excellent required performance cannot be obtained.

In addition, many proposals have been made for antireflection films using fine surface irregularities as optical applications, particularly as antireflection materials, but because the control of the uneven structure size is not sufficient, it still has sufficient antireflection performance. A film is not obtained. In particular, it has hardly been proposed for a film containing a zinc component.
JP-A-11-233800 Japanese Patent Laid-Open No. 7-94024 JP 2000-258379 A

  As described above, in the conventional technology, it cannot be said that the range in which the uneven structure size of the film containing a zinc component having fine unevenness on the surface can be controlled is sufficient, and for example, it is required for the uneven effect described in the antireflection performance. Performance is not fully expressed.

  Therefore, the present invention has been made in view of such conventional problems, a film having a fine concavo-convex structure on the surface, and a film containing a zinc component capable of widely controlling the formation of the fine concavo-convex, The manufacturing method is provided.

  Furthermore, the present invention provides an antireflection film having fine irregularities on the surface and showing an excellent antireflection effect for visible light, and an optical member using the same.

The present invention can be specified by the following items.
That is, the present invention provides a surface formed by immersing a film formed by applying a solution containing a zinc compound in a water-containing liquid at 20 ° C. or higher to form fine irregularities on the surface of the film. It is a film having fine irregularities.

The height of the fine irregularities is 0.005 to 1 μm.
The average surface roughness Ra ′ obtained by extending the center line average roughness of the film having fine irregularities is 5 nm or more and the surface area ratio Sr = S / S ₀ (where S ₀ is an ideally flat measurement surface) , S represents the actual surface area of the measurement surface.) Is 1.1 or more.

The film having fine irregularities contains at least one selected from alumina, silica, titania and zirconia.
The content of at least one selected from alumina, silica, titania and zirconia contained in the film having fine irregularities is 0.01 or more and less than 1.0 by weight with respect to the film weight. Features.

  Further, the present invention is characterized in that after a solution containing a zinc compound is applied on a substrate to form a film, the film surface is immersed in a water-containing liquid at 20 ° C. or higher to form fine irregularities on the surface of the film. The method for producing a film having fine irregularities as described above.

It is preferable to form a film by applying a solution containing a zinc compound on the substrate, followed by drying or heat treatment.
Further, the present invention provides a transparent reflection characterized in that a film formed by applying a solution containing a zinc compound is immersed in a water-containing liquid at 20 ° C. or more to form fine irregularities on the surface of the film. It is a prevention film.

The height of the fine irregularities is 0.005 to 1 μm.
The average surface roughness Ra ′ obtained by extending the center line average roughness of the film having fine irregularities is 5 nm or more and the surface area ratio Sr = S / S ₀ (where S ₀ is an ideally flat measurement surface) , S represents the actual surface area of the measurement surface.) Is 1.1 or more.

The film having fine irregularities contains at least one selected from alumina, silica, titania and zirconia.
The content of at least one selected from alumina, silica, titania and zirconia contained in the film having fine irregularities is 0.01 or more and less than 1.0 by weight with respect to the film weight. Features.

  Further, the present invention is characterized in that after a solution containing a zinc compound is applied on a substrate to form a film, the film surface is immersed in a water-containing liquid at 20 ° C. or higher to form fine irregularities on the surface of the film. The method for producing the transparent antireflection film as described above.

It is preferable to form a film by applying a solution containing a zinc compound on the substrate, followed by drying or heat treatment.
Moreover, this invention is an optical member which has said transparent antireflection film.

  The present invention is characterized in that fine irregularities are formed on the surface of the film by immersing the coating containing the zinc compound in a water-containing liquid at 20 ° C. or higher, and thereby the fine irregularities on the surface can be widely controlled. Thus, the optical member according to the present invention made it possible to achieve a significant effect over the prior art.

  The film of the present invention and the transparent antireflection film are formed by coating a solution having a zinc compound on a substrate to form a film, and then immersing the substrate with the film in a water-containing liquid at 20 ° C. or higher. In addition, the height of the fine unevenness is 0.005 to 1.0 μm, the average surface roughness Ra ′ value is 5 nm or more, and the surface area ratio Sr is 1.1 or more. It is characterized by being.

  In the present invention, by immersing in a water-containing liquid at 20 ° C. or higher, fine irregularities can be formed on the film surface containing the zinc component, and the fine irregularities can be widely controlled. Further, by combining the zinc compound and at least one of the subcomponents of alumina, silica, titania, and zirconia, it becomes possible to eutect with precipitates derived from the subcomponents. The refractive index can be controlled by the unevenness over a wider range compared to the film having a surface fine unevenness structure consisting only of the zinc component. Further, in the present invention, when at least one component selected from alumina, silica, titania, and zirconia is compounded, the content of these components can be controlled. The refractive index between the fine concavo-convex structure and the substrate can be continuously changed.

  From the above, the film of the present invention and the transparent antireflection film exhibit an excellent antireflection effect with a wide band and low reflectance in visible light with respect to the use of any substrate. Furthermore, since the film of the present invention and the transparent antireflection film are all composed of inorganic components and the entire manufacturing process can be performed at 100 ° C. or lower, the heat resistance of organic polymers and the like is excellent while being excellent in heat resistance. Applicable to base materials with poor properties.

  As described above, the film and the transparent antireflection film of the present invention can provide a transparent antireflection film and an optical member that exhibit an excellent antireflection effect for visible light and are excellent in mass productivity.

  The film of the present invention and the transparent antireflection film are formed by applying a solution containing a zinc compound on a base material to form a film, and then immersing the base material with the film in a hydrous liquid at 20 ° C. or higher. It is characterized in that fine irregularities are formed on the surface.

The coating solution containing the zinc compound used in the present invention is obtained by dissolving the zinc compound in an organic solvent.
Examples of the zinc compound include zinc acetate, zinc chloride, zinc nitrate, zinc stearate, zinc oleate, and zinc salicylate, with zinc acetate and zinc chloride being particularly preferred.

  Examples of the organic solvent include alcohols such as methanol, ethanol, 2-propanol, butanol, 2-methoxyethanol, 2-ethoxyethanol, ethylene glycol or ethylene glycol mono-n-propyl ether; n-hexane, n-octane Various aliphatic or alicyclic hydrocarbons such as cyclohexane, cyclopentane and cyclooctane; various aromatic hydrocarbons such as toluene, xylene and ethylbenzene; ethyl formate, ethyl acetate, n-acetate Various esters such as butyl, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate; acetone, methyl ethyl ketone, methyl isobutyl ketone Various ketones such as cyclohexanone; various ethers such as dimethoxyethane, tetrahydrofuran, dioxane and diisopropyl ether; various chlorinated hydrocarbons such as chloroform, methylene chloride, carbon tetrachloride and tetrachloroethane; N-methyl Examples include aprotic polar solvents such as pyrrolidone, dimethylformamide, dimethylacetamide, and ethylene carbonate.

  In preparing the coating solution used in the present invention, it is preferable to use alcohols, particularly methanol, 2-propanol, and 2-methoxyethanol, among the various organic solvents described above from the viewpoint of solution stability. The amount of the organic solvent added to the zinc compound is preferably about 10 to 20 in molar ratio with respect to the zinc compound.

  In addition, in this invention, the addition amount of A is 10 in molar ratio with respect to B, It means that the molar amount of A to add is 10 times with respect to the molar amount of B.

  In addition, since the zinc compound may be difficult to dissolve only with an organic solvent or the stability of the solution may be low, a stabilizer may be added, or water with a catalyst added may be added. Examples of stabilizers include alkanolamines such as monoethanolamine, diethanolamine, and triethanolamine; β-diketone compounds such as acetylacetone, dipyrobaylmethane, trifluoroacetylacetone, hexafluoroacetylacetone, benzoylacetone, and dibenzoylmethane; Methyl acetoacetate, ethyl acetoacetate, allyl acetoacetate, benzyl acetoacetate, acetoacetate-iso-propyl, acetoacetate-tert-butyl, acetoacetate-iso-butyl, acetoacetate-2-methoxyethyl, 3-keto-n -Β-ketoester compounds such as methyl valeric acid can be mentioned. The addition amount of the stabilizer is preferably about 1 in terms of molar ratio to the alkoxide. Moreover, when using the water which added the catalyst, a nitric acid, hydrochloric acid, a sulfuric acid, phosphoric acid, an acetic acid, ammonia etc. can be illustrated as a catalyst, for example.

  Furthermore, as a solution coating method for forming a film, known coating means such as a dipping method, a spin coating method, a spray method, a printing method, a flow coating method, and a combination thereof can be appropriately employed. The film thickness can be controlled by changing the pulling speed in the dipping method, the substrate rotation speed in the spin coating method, and the like, and changing the concentration of the coating solution. In particular, the pulling speed in the dipping method may be appropriately selected depending on the required film thickness, but it is preferable to pull up at a quiet uniform speed of about 0.1 to 3.0 mm / second after immersion.

  The film produced by the above method may be dried at room temperature for about 30 minutes. Moreover, it is also possible to dry or heat-process at higher temperature as needed, and a higher uniform heat treatment temperature can form a more uniform and large uneven structure.

  Next, the film containing the zinc compound is immersed in a water-containing liquid at 20 ° C. or higher to form fine irregularities derived from zinc oxide or hydroxide or hydrates thereof. By immersing in warm water, the surface layer of the film is subjected to peptization and the like, and rearrangement of the structure occurs, and zinc oxide or hydroxide or their hydrates precipitate and grow on the surface of the film To do. The water-containing liquid refers to water or a mixture of water and other solvents, and other solvents are water-soluble solvents such as alcohols. The temperature of the water-containing liquid is preferably 40 ° C to 100 ° C. The treatment time with the aqueous solution is about 5 minutes to 24 hours.

  The film having the fine irregularities and the transparent antireflection film of the present invention are characterized in that the height of the fine irregularities on the surface of the film is 0.005 to 1 μm. The height of the fine concavo-convex structure is preferably 0.01 to 1.0 μm, more preferably 0.1 to 0.8 μm. Here, the “height of the surface irregularities” refers to the difference in height between the apex of the convex portion and the bottom point of the concave portion formed on the coating surface. In other words, the height of the surface irregularities of the film of 0.005 to 1.0 μm means the difference in height between the peak and the valley defined in “Definition and display of surface roughness” of JIS-B-061. This corresponds to the maximum roughness (Rmax). When the height of the unevenness is 0.005 to 1 μm, the effect due to the fine unevenness, in particular, the antireflection performance is exhibited, and the mechanical strength of the unevenness is not lost, and the manufacturing cost of the uneven structure is advantageous. .

  In the present invention, the surface density of fine irregularities is also important, and the average surface roughness Ra ′ value obtained by expanding the corresponding centerline average roughness is 5 nm or more, more preferably 10 nm or more, further 10 nm or more and 80 nm or less, The surface area ratio Sr is 1.1 or more, more preferably 1.3 or more, and further preferably 1.5 or more and 2.8 or less.

  One of the evaluation methods of the obtained fine uneven structure is observation of the surface of the fine uneven structure with a scanning probe microscope, and average surface roughness Ra ′ obtained by extending the center line average roughness Ra of the film by the observation. The value and the surface area ratio Sr are determined. That is, the average surface roughness Ra ′ value (nm) is obtained by applying the centerline average roughness Ra defined in JIS B 0601 to the measurement surface and extending it three-dimensionally. The absolute value of the deviation up to the average value ”is expressed by the following equation (1).

Ra ′: average surface roughness value (nm),
S ₀ : Area when the measurement surface is ideally flat, | X _R −X _L | × | Y _T −Y _B |,
F (X, Y): height at the measurement point (X, Y), X is the X coordinate, Y is the Y coordinate,
X _{L to} X _R : X coordinate range of the measurement surface,
Y _{B to} Y _T : Y coordinate range of the measurement surface,
Z ₀ : Average height in the measurement surface The surface area ratio (Sr) is Sr = S / S ₀ [S ₀ : Area when the measurement surface is ideally flat. S: Surface area of the actual measurement surface. ]. The actual surface area of the measurement surface is obtained as follows. First, it is divided into minute triangles composed of the three closest data points (A, B, C), and then the area ΔS of each minute triangle is obtained using a vector product. ΔS (ΔABC) = | AB × AC | / 2 (where AB and AC are the lengths of the respective sides), and the sum of ΔS is the surface area S to be obtained.
When Ra ′ is 5 nm or more and Sr is 1.1 or more, there is no possibility that the effect due to the fine unevenness is lowered due to the above reason.

  The film having fine irregularities and the transparent antireflection film of the present invention are characterized by containing at least one subcomponent selected from alumina, silica, titania, and zirconia. As raw materials for alumina, silica, titania and zirconia, which are accessory components, respective metal alkoxides and salt compounds such as chlorides and nitrates can be used. From the viewpoint of film formability, it is preferable to use a metal alkoxide.

  Examples of the aluminum alkoxide include aluminum ethoxide, aluminum isopropoxide, aluminum-n-butoxide, aluminum-sec-butoxide, aluminum-tert-butoxide, and aluminum acetylacetonate.

As the silicon alkoxide, various compounds represented by the general formula Si (OR) ₄ are used, and R is the same or different lower group such as methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, etc. An alkyl group is mentioned.

  Examples of the titanium alkoxide include tetramethoxy titanium, tetraethoxy titanium, tetra n-propoxy titanium, tetraisopropoxy titanium, tetra n-butoxy titanium, and tetraisobutoxy titanium.

  Specific examples of the zirconium alkoxide include zirconium tetramethoxide, zirconium tetraethoxide, zirconium tetra n-propoxide, zirconium tetraisopropoxide, zirconium tetra n-butoxide, zirconium tetra t-butoxide and the like. The solution preparation is performed using an organic solvent and a stabilizer as in the preparation of the zinc compound.

  In the treatment with a water-containing liquid at 20 ° C. or higher of the film having a zinc component added with such a subcomponent, crystallization is performed using the difference in solubility of each component with respect to the heated water-containing liquid. Compared with the treatment of the film having the above, the size of the deposited zinc oxide or hydroxide or hydrate thereof can be controlled over a wider range by changing the composition of the inorganic component. In addition, since it is possible to eutect with precipitates derived from subcomponents, the refractive index can be controlled over a wide range by the fine irregularities formed by the eutectoid, and excellent antireflection performance can be realized.

  In the film containing a zinc component having fine irregularities and the transparent antireflection film of the present invention, the content of alumina, silica, titania, zirconia is 0.01 or more and less than 1.0 by weight with respect to the film weight. More preferably, it is 0.1 or more and 0.8 or less. When the content of alumina, silica, titania, zirconia is 0.01 or more and less than 1.0 by weight, precipitation is mainly composed of zinc oxide or hydroxide or hydrates on the surface. The size of the object and the distance between crystals change, and the height of fine irregularities or the centerline average surface roughness Ra ′ can be controlled within the above range, and consistency with the refractive index of the substrate can be obtained. As a result, the interface reflection with the substrate can be eliminated to the limit.

  The film thickness of the film of the present invention and the transparent antireflection film is 0.05 μm to 1.5 μm, preferably 0.1 μm to 1 μm. The film thickness represents the thickness of the film including fine irregularities on the surface.

  Examples of the substrate used in the optical member of the present invention include glass, a plastic substrate, a glass mirror, and a plastic mirror. Typical plastic substrates include thermoplastics such as polyester, triacetyl cellulose, cellulose acetate, polyethylene terephthalate, polypropylene, polystyrene, polycarbonate, polymethyl methacrylate, ABS resin, polyphenylene oxide, polyurethane, polyethylene, and polyvinyl chloride. Resin films and molded articles; crosslinked polyester films, crosslinked molded articles obtained from various thermosetting resins such as unsaturated polyester resins, phenolic resins, crosslinked polyurethanes, crosslinked acrylic resins, crosslinked saturated polyester resins, etc. Can be mentioned. Specific examples of the glass include alkali-free glass and alumina silicate glass. The transparent substrate used in the present invention is not particularly limited as long as it can be finally shaped according to the purpose of use, and a flat plate, a film or a sheet is used and has a two-dimensional or three-dimensional curved surface. May be. The thickness can be appropriately determined and is generally 5 mm or less, but is not limited thereto.

  The film and antireflection film of the present invention can further be provided with layers for imparting various functions in addition to the layers described above. For example, a hard coat layer can be provided in order to improve the film hardness, or an adhesive layer or a primer layer can be provided in order to improve the adhesion between the transparent substrate and the hard coat layer. As described above, the refractive index of the other layer provided between the transparent substrate and the hard coat layer is preferably an intermediate value between the refractive index of the transparent substrate film and the refractive index of the hard coat layer.

Hereinafter, the present invention will be described specifically by way of examples. However, the present invention is not limited to such examples.
The transparent film having fine irregularities on the surface obtained in each Example and Comparative Example was evaluated by the following method.
(1) Film shape observation Photograph observation (acceleration voltage: 5.0 kV, magnification: 30,000 times (surface)) of the surface layer of the film was performed using a scanning electron microscope (FE-SEM, Hitachi S5000). .
Using a scanning probe microscope (SPM, DFM mode, Seiko Electronics Industries SPI3800), the average surface roughness Ra ′ and the surface area ratio Sr obtained by extending the centerline average roughness defined in JISB0601 were determined. .

(2) X-ray diffraction measurement Using an X-ray diffraction apparatus (RINT2100 manufactured by Rigaku Corporation), measurement was performed using CuKα rays.
(3) Transmittance measurement An automatic optical element measuring device (ART-25GD, manufactured by JASCO) was used. A disk-shaped glass plate was used. The incident angle of light in the transmittance measurement was 0 °.

Example 1
A clear float glass substrate (composition is a soda lime silicate system) having a size of about 100 mm × 100 mm and a thickness of about 2 mm was ultrasonically washed with isopropyl alcohol and dried to obtain a glass substrate for coating.

Anhydrous zinc acetate [Zn (CH ₃ COO) ₂ ] is dissolved in methanol [MeOH], and 1M diluted hydrochloric acid [HClaq. And stirred at room temperature for about 1 hour. Here, the weight ratio of the solution was Zn (CH ₃ COO) ₂ : MeOH: HClaq. = The ratio was 7:50:20. As described above, a coating solution that was a zinc compound-containing solution was prepared.

  Subsequently, after the glass substrate for coating was immersed in the coating solution, a coating film was formed on the surface of the glass substrate by a dipping method (2 mm / sec pulling rate, 20 ° C., 56% RH). . After drying, heat treatment was performed at 100 ° C. for 1 hour to obtain a transparent film. Next, after being immersed in pure water at 60 ° C. for 5 minutes, it was dried at 100 ° C. for 10 minutes.

  The obtained film surface was observed with a scanning electron microscope (FE-SEM) and a scanning probe microscope (SPM). An FE-SEM image is shown in FIG. From the FE-SEM image in FIG. 1, it can be seen that many fine irregularities made of granular precipitates of about 10 to 300 nm are formed on the entire surface layer of the film. In the SPM image, fine unevenness of the same scale was observed, and the obtained average surface roughness Ra ′ value (nm) and surface area ratio Sr were Ra ′ = 30 nm and Sr = 1.7. The height of the fine irregularities was about 0.3 μm, and the thickness of the film was about 350 nm.

Further, it was found from the X-ray analysis measurement that the granular precipitate was a zinc oxide crystal. The surface layer of the film before being immersed in pure water at 60 ° C. has an almost smooth structure in which flat ones overlap, and the X-ray diffraction peak of this film is attributed to zinc acetate as a raw material. From the results, it was found that by immersing in pure water at 60 ° C., precipitates of zinc oxide crystals appeared on the surface layer of the film, and fine irregularities were formed. Furthermore, it was found that since the zinc oxide crystal grows as the heating temperature rises and the immersion time increases, the particle diameter increases and the Ra ′ value (nm) and the surface area ratio Sr increase.
The transmittance of the film having fine unevenness on the surface obtained in Example 1 was about 96%, and the antireflection performance was excellent due to the fine unevenness formed on the surface. Here, the transmittance represents the transmittance of a glass substrate on which a film having fine irregularities is formed on the surface.

Example 2
A similar glass substrate that had been washed in the same manner as in Example 1 using a coating solution that was the same zinc compound-containing solution as in Example 1 was dipped in the coating solution, and then dipped (increase of 2 mm / second). The coating film was formed on the surface of the glass substrate at a speed of 20 ° C. and 56% RH (under). After drying, heat treatment was performed at 100 ° C. for 1 hour to obtain a transparent film. Next, it was immersed in a mixed solution (50/50 wt%) of pure water and ethanol at 60 ° C. for 5 minutes and then dried at 100 ° C. for 10 minutes.

The obtained film surface was subjected to FE-SEM observation and SPM observation. An FE-SEM image is shown in FIG. As can be seen from the FE-SEM image shown in FIG. 2, fine irregularities of about 5 to 200 nm composed of precipitates having a shape different from that in Example 1 were observed over the entire surface layer. The average surface roughness Ra ′ value (nm) and surface area ratio Sr obtained from the SPM measurement were Ra ′ = 10 nm and Sr = 1.2. Further, the height of the fine irregularities was about 0.2 μm, and the thickness of the film was about 250 nm.
The transmittance of the film having fine irregularities on the surface obtained in Example 2 was about 95%, indicating excellent antireflection performance.

Example 3
Zinc acetate dihydrate [Zn (CH ₃ COO) ₂ · 2H ₂ O] is dissolved in 2-methoxyethanol [2ME], and monoethanolamine [MEA] is added as a stabilizer for about 3 hours. Stir at room temperature. Here, the weight ratio of the solution was Zn (CH ₃ COO) ₂ .2H ₂ O: 2ME: MEA = 14: 80: 4. As described above, a coating solution that was a zinc compound-containing solution was prepared.

  Next, the same glass substrate that had been cleaned in the same manner as in Example 1 was immersed in the coating solution, and then dipped (with a pulling rate of 1 mm / second, 20 ° C., 56% RH). A coating film was formed on the surface of the substrate. After drying, heat treatment was performed at 100 ° C. for 1 hour to obtain a transparent film. Next, after being immersed in pure water at 60 ° C. for 20 minutes, it was dried at 100 ° C. for 10 minutes.

When FE-SEM observation and SPM observation were performed on the obtained film surface, fine irregularities of about 50 to 500 nm consisting of precipitates having a shape similar to that of Example 1 were observed over the entire surface of the film. The average surface roughness Ra ′ value (nm) and the surface area ratio Sr obtained from the SPM measurement were Ra ′ = 40 nm and Sr = 1.8. Further, the height of the fine irregularities was about 0.4 μm, and the thickness of the film was about 500 nm.
Further, from the X-ray analysis measurement, it was found that the fine irregularities were zinc oxide crystals.
The transmittance of the film having fine irregularities on the surface obtained in Example 3 was about 96%, indicating excellent antireflection performance.

Example 4
A solution in which an aluminum compound and a zirconium compound were added to a zinc compound-containing solution was prepared. A zinc compound-containing solution was prepared in the same manner as in Example 3.

A solution containing an aluminum compound and a zirconium compound was prepared as follows. Aluminum-sec-butoxide [Al (O-sec-Bu) ₃ ] is dissolved in 2-propanol [IPA], ethyl acetoacetate [EAcAc] is added as a stabilizer, and the mixture is stirred for about 3 hours at room temperature. Thus, an Al ₂ O ₃ sol solution was prepared. Here, the molar ratio of the solution is a ratio of Al (O-secBu) ₃ : IPA: EAcAc = 1: 20: 1.

On the other hand, zirconium-iso-propoxide [Zr (O-iso-Pr) ₄ ] was also dissolved in IPA, EAcAc was added, and the mixture was stirred at room temperature for about 3 hours to prepare a ZrO ₂ sol solution. The molar ratio of the solution is a ratio of Zr (O-iso-Pr) ₄ : IPA: EAcAc = 1: 20: 1.

The ZrO ₂ sol solution was added to the Al ₂ O ₃ sol solution in a weight ratio of Al ₂ O ₃ : ZrO ₂ = 0.9: 0.1 and stirred for about 30 minutes. 01M dilute hydrochloric acid [HClaq. And stirred at room temperature for about 3 hours. Here, HClaq. The addition amount of A was a total amount of Al (O-sec-Bu) ₃ and Zr (O-iso-Pr) ₄ each in a molar ratio. As described above, an Al ₂ O ₃ —ZrO ₂ mixed solution was prepared.

This Al ₂ O ₃ —ZrO ₂ mixed solution was added to the solution containing the zinc compound at a weight ratio of Zn: Al: Zr = 30: 18: 1 and stirred for about 30 minutes. As described above, a coating solution that was a zinc compound-containing solution containing an aluminum compound and a zirconium compound was prepared.

  Next, the same glass substrate that had been cleaned in the same manner as in Example 1 was immersed in the coating solution, and then dipped (with a pulling rate of 1 mm / second, 20 ° C., 56% RH). A coating film was formed on the surface of the substrate. After drying, heat treatment was performed at 100 ° C. for 1 hour to obtain a transparent film. Next, after being immersed in pure water at 60 ° C. for 30 minutes, it was dried at 100 ° C. for 10 minutes.

When FE-SEM observation and SPM observation were performed on the obtained film surface, fine irregularities of about 50 to 500 nm composed of precipitates different from the shapes seen in Examples 1 to 3 were observed over the entire film surface layer. It was. The average surface roughness Ra ′ value (nm) and the surface area ratio Sr obtained from the SPM measurement were Ra ′ = 60 nm and Sr = 2.0. The height of the fine irregularities was about 0.5 μm, and the thickness of the film was about 550 nm.
The transmittance of the film having fine irregularities on the surface obtained in Example 4 was about 97%, indicating excellent antireflection performance.

Example 5
A solution was prepared by adding an aluminum compound, a silicon compound, and a titanium compound to a zinc compound-containing solution. A zinc compound-containing solution was prepared in the same manner as in Example 3.

The solution containing the aluminum compound, silicon compound and titanium compound was prepared as follows. Al (O-sec-Bu) ₃ was dissolved in IPA, EAcAc was added as a stabilizer, and stirred at room temperature for about 3 hours to prepare an Al ₂ O ₃ sol solution. Here, the molar ratio of the solution was Al (O-secBu) ₃ : IPA: EAcAc = 1: 20: 1.

On the other hand, tetraethoxysilane [TEOS], IPA, 0.01M [HClaq. ] Was mixed and stirred at room temperature for about 3 hours to prepare a SiO ₂ sol solution. The molar ratio of the solution was TEOS: IPA: HClaq. = 1: 20: 2.

Titanium-n-butoxide [Ti (On-Bu) ₄ ] was also dissolved in IPA, EAcAc was added, and stirred at room temperature for about 3 hours to prepare a TiO ₂ sol solution. The molar ratio of the solution was Ti (On-Bu) ₄ : IPA: EAcAc = 1: 20: 1.

These Al ₂ O ₃ sol, SiO ₂ sol, and TiO ₂ sol solutions are mixed so that the weight ratio is Al ₂ O ₃ : SiO ₂ : TiO ₂ = 0.7: 0.2: 0.1. By stirring for a minute, an Al ₂ O ₃ —SiO ₂ —TiO ₂ mixed solution was prepared. This Al ₂ O ₃ —SiO ₂ —TiO ₂ mixed solution was added to the zinc compound-containing solution in a weight ratio of Zn: Al: Si: Ti = 30: 14: 2: 1, and about 30 Stir for minutes. As described above, a coating solution that was a zinc compound-containing solution containing an aluminum compound, a silicon compound, and a titanium compound was prepared.

  Next, the same glass substrate that had been cleaned in the same manner as in Example 1 was immersed in the coating solution, and then dipped (with a pulling rate of 1 mm / second, 20 ° C., 56% RH). A coating film was formed on the surface of the substrate. After drying, heat treatment was performed at 100 ° C. for 1 hour to obtain a transparent film. Next, after being immersed in pure water at 60 ° C. for 30 minutes, it was dried at 100 ° C. for 10 minutes.

When FE-SEM observation and SPM observation were performed on the surface of the obtained film, fine irregularities of about 50 to 700 nm composed of precipitates similar to the shape obtained in Example 4 were observed over the entire film surface layer. The average surface roughness Ra ′ value (nm) and the surface area ratio Sr obtained from the SPM measurement were Ra ′ = 80 nm and Sr = 2.2. Further, the height of the fine unevenness was about 0.6 μm, and the thickness of the film was about 700 μm.
The transmittance of the film having fine irregularities on the surface obtained in Example 5 was about 96%, indicating excellent antireflection performance.

  The film of the present invention and the transparent antireflection film can be applied to any transparent substrate and exhibit an excellent antireflection effect on visible light. Therefore, various displays such as word processors, computers, televisions, plasma display panels, and liquid crystal displays It can be used for optical members such as polarizing plates used in the apparatus, optical lenses such as sunglasses lenses made of transparent plastics, prescription eyeglass lenses, camera finder lenses, covers for various instruments, window glass for automobiles, trains, etc. .

It is a photograph (magnification: 30,000 times) which shows the observation result from the upper surface by FE-SEM of the thin film which has the fine unevenness | corrugation on the surface formed in the glass substrate in Example 1. FIG. It is a photograph (magnification: 30,000 times) which shows the observation result from the upper surface by the FE-SEM of the thin film which has the fine unevenness | corrugation on the surface formed in the glass substrate in Example 2. FIG.

Claims (15)

  A film having fine irregularities on the surface, wherein a film formed by applying a solution containing a zinc compound is immersed in a water-containing liquid at 20 ° C. or higher to form fine irregularities on the surface of the film. .   The film having fine irregularities according to claim 1, wherein the height of the fine irregularities is 0.005 to 1 µm. The average surface roughness Ra ′ obtained by extending the center line average roughness of the film having fine irregularities is 5 nm or more and the surface area ratio Sr = S / S ₀ (where S ₀ is an ideally flat measurement surface) 3. The film having fine irregularities according to claim 1 or 2, wherein S is an actual surface area of the measurement surface and S is 1.1 or more.   The film having fine unevenness according to any one of claims 1 to 3, wherein the film having fine unevenness contains at least one selected from alumina, silica, titania, and zirconia. .   The content of at least one selected from alumina, silica, titania and zirconia contained in the film having fine irregularities is 0.01 or more and less than 1.0 by weight with respect to the film weight. The film having fine irregularities according to claim 4, wherein the film has fine irregularities.   2. A coating comprising a zinc compound-containing solution on a substrate to form a film, and then immersed in a water-containing liquid at 20 ° C. or higher to form fine irregularities on the surface of the film. 6. A method for producing a film having fine irregularities according to any one of 5 above.   7. The method for producing a film having fine irregularities according to claim 6, wherein a coating film is formed by applying a solution containing a zinc compound on a substrate, followed by drying or heat treatment.   A transparent antireflection film, wherein a film formed by applying a solution containing a zinc compound is immersed in a water-containing liquid at 20 ° C. or more to form fine irregularities on the surface of the film.   The transparent antireflection film according to claim 8, wherein the height of the fine irregularities is 0.005 to 1 μm. The average surface roughness Ra ′ obtained by extending the center line average roughness of the film having fine irregularities is 5 nm or more and the surface area ratio Sr = S / S ₀ (where S ₀ is an ideally flat measurement surface) 10. The transparent antireflection film according to claim 8, wherein S is an area where S is an actual surface area of the measurement surface.   The transparent antireflection film according to claim 8, wherein the film having fine irregularities contains at least one selected from alumina, silica, titania, and zirconia.   The content of at least one selected from alumina, silica, titania and zirconia contained in the film having fine irregularities is 0.01 or more and less than 1.0 by weight with respect to the film weight. The transparent antireflection film according to claim 11.   9. A coating containing a zinc compound on a substrate to form a film, and then immersed in a water-containing liquid at 20 ° C. or higher to form fine irregularities on the surface of the film. 12. A method for producing a transparent antireflection film as set forth in any one of 12 above.   14. The method for producing a transparent antireflection film according to claim 13, wherein a coating film is formed by applying a solution containing a zinc compound on a substrate, followed by drying or heat treatment.   An optical member having the transparent antireflection film according to claim 8.