JP2005208465A5

JP2005208465A5 -

Info

Publication number: JP2005208465A5
Application number: JP2004016730A
Authority: JP
Filing date: 2004-01-26
Publication date: 2009-04-02
Anticipated expiration: 2024-01-26

Description

市販されている化合物としては、酸化スズ−酸化チタン複合粒子の”オプトレイクＴＲ−５０２”、”オプトレイクＴＲ−５０４”、酸化ケイ素−酸化チタン複合粒子の”オプトレイクＴＲ−５０３”、”オプトレイクＴＲ−５１２”、”オプトレイクＴＲ−５１３”、”オプトレイクＴＲ−５１４”、”オプトレイクＴＲ−５１５”、酸化チタン粒子の”オプトレイクＴＲ−５０５”（以上、商品名、触媒化成工業（株）製）、酸化ジルコニウム粒子（（株）高純度化学研究所製）、酸化スズ−酸化ジルコニウム複合粒子（触媒化成工業（株）製）、酸化スズ粒子（（株）高純度化学研究所製）等が挙げられる。 Commercially available compounds include “Op-Trake TR-502” and “Op-trake TR-504” of tin oxide-titanium oxide composite particles, “Op-trake TR-503 ” of “silicon oxide-titanium oxide composite particles ”, “Opto” Lake TR-512 ”,“ Optlake TR-513 ”,“ Optlake TR-514 ”,“ Optlake TR-515 ” ,“ Oplake TR-505 ”of titanium oxide particles Zirconium oxide particles (manufactured by Kosei Chemical Laboratory Co., Ltd.), tin oxide-zirconium oxide composite particles (manufactured by Catalyst Chemical Industry Co., Ltd.), tin oxide particles (manufactured by Kojundo Chemical Laboratory Co., Ltd.) Manufactured) and the like.

Claims

(A) the general formula (1) a polymer composed mainly of structural units represented, (B) a thioether group, a fluorene group, possess on 1 or more kinds of group selected from a sulfonyl group, and phenolic hydroxyl group and / Or a compound containing a thiophenol group, (C) an esterified quinonediazide compound, (D) an inorganic particle having a particle diameter of 1 nm to 30 nm selected from at least one selected from an aluminum compound, a silicon compound, a tin compound, a titanium compound, and a zirconium compound. A positive photosensitive resin composition to be contained.

(Wherein R ¹ is a divalent to octavalent organic group having 2 or more carbon atoms, R ² is a divalent to hexavalent organic group having 2 or more carbon atoms, and R ³ is hydrogen or carbon. And represents an organic group having a number of 1 to 20. n represents a range of 10 to 100,000, m represents an integer of 0 to 2, and p and q represent an integer of 0 to 4.

The positive photosensitive resin composition according to claim 1, wherein R ¹ (COOR ³ ) m (OH) p in the general formula (1) is represented by the general formula (2).

(R ⁴ and R ⁶ represent a divalent to tetravalent organic group selected from 2 to 20 carbon atoms, and R ⁵ represents 3 carbon atoms.
Shows the selected Ru trivalent to hexavalent organic group than to ^20, R 7, ^{R 8} represents an organic group having hydrogen or up to 20 carbon atoms. o and s are integers from 0 to 2, and r is an integer from 1 to 4. )

The positive photosensitive resin composition according to claim 1, wherein R ² (OH) q in the general formula (1) is at least one kind represented by the general formulas (3) to (5).

^{^(R 9,} ^R ¹¹ is a trivalent to tetravalent organic group Ru selected from 2 to 20 carbon ^{atoms, R 10} represents a divalent organic group selected from C2-30 .t, u is 1 or ^.R 12 showing a second ^{integer, R 14} represents a divalent organic group of up to 20 carbon ^{atoms, R 13} is trivalent to hexavalent organic group Ru selected from 3 to 20 carbon atoms shown .v represents an integer of 1 to 4 ^{.R 15} represents a divalent organic group selected from 2 to 20 carbon ^{atoms, R 16} is trivalent 6 which Ru is selected from 3 to 20 carbon atoms (W represents an integer of 1 to 4.)

A relief pattern of a heat resistant resin formed by irradiating the positive photosensitive resin composition according to claim 1 with ultraviolet rays and then heating.