JP2005207901A - Microreactor and its manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a microreactor, easy to be observed from the exterior in an infinitesimal microspace, less liable to cause liquids to mix with each other between adjacent containers, and also formed to have a high aspect ratio. <P>SOLUTION: This microreactor 1 developed is equipped with a substrate 2 and hollow-columnar containers 3 stood/formed so as to be inserted through the substrate 2. Even if a specimen liquid overflows the containers when the specimen liquid flows thereinto, the specimen liquid flows downward since the containers 3 are stood upward from the substrate 2. Accordingly, there is no danger of the liquids mixing with each other between containers 3 although the containers 3 are situated next to each other. Further, the containers 3 are made of silicon oxide. Accordingly, the containers 3, being transparent, allow optical observation, fluorometric analysis, and spectroscopic analysis, and further allow the use of laser, etc. Furthermore, since the containers 3 are equipped with high hydrophilicity, the interior of the containers can be easily filled with liquids by using a capillary phenomenon, and it is also possible to form them by bringing a resistive heating-type heater into contact therewith since they are equipped with insulativeness. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a microreactor having a minute volume container and a manufacturing method thereof.

  In recent years, so-called nanotechnology targeting reactions in the micro space has attracted attention in the development of new drugs in the chemical technology field and DNA analysis in the biotechnology field.

  The reason for this is that by micronizing the container, the reaction surface area per unit volume increases, the reaction time can be greatly shortened and high throughput can be realized, the flow rate can be precisely controlled, and the amount of liquid is very small. Therefore, many effects can be obtained, such as being easy to keep the temperature of the liquid uniform, and the amount of reagent used and the amount of waste liquid can be greatly reduced.

  Another reason is that the chemical reaction in the micro space is different from the so-called beaker level macro space, and therefore the reaction in the micro space may need to be verified.

Conventionally, as a microreactor for analyzing a reaction in such a microspace, a microreactor provided with a hole through which a test solution or the like flows is provided in a plate material. These holes are formed, for example, by sticking a thin layer member in which a plurality of apertures are provided by laser processing or the like on a substrate (see, for example, Patent Document 1).
JP 2002-27984 A

  However, the microreactor formed by providing holes in the plate material may cause liquid to overflow or spill from one hole and enter the other hole when the test solution is allowed to flow into the microreactor, so that the liquid is easy to mix. There's a problem. It is also difficult to observe the inside of the hole from the side and bottom. Further, in a micro space, it is difficult to form a hole in a straight line deeply even if a laser is used, so it is difficult to increase the aspect ratio of the hole.

  The present invention has been made to solve such a problem. In a micro space, it is easy to observe from the outside, it is difficult to mix test solutions between adjacent containers, and a container having a high aspect ratio is further provided. It is an object of the present invention to provide a microreactor having the same and a manufacturing method thereof.

  In order to achieve these objects, the microreactor according to claim 1 of the present invention includes a substrate, and a hollow columnar container that is vertically formed with respect to the substrate through the substrate. It is characterized by.

  According to this, a micron-order reactor suitable for verifying a chemical reaction in a micro space is provided because it includes a substrate and a hollow columnar container that is vertically formed with respect to the substrate through the substrate. can do. Further, since the container portion other than the portion inserted through the substrate and fixedly held stands from the substrate, the openings of the containers are separated from each other. Therefore, even if the reagent solution overflows or spills when the reagent solution flows in, the reagent solution flows downward and the liquid does not mix between adjacent containers. Similarly, since the containers are separated from each other, they are not easily affected by adjacent containers such as temperature.

  A macroreactor according to claim 2 is the microreactor according to claim 1, wherein the container is made of silicon oxide.

  According to this, since the container becomes transparent, optical observation, fluorescence analysis, and spectroscopic analysis are possible, and a laser or the like can also be used. Moreover, since silicon oxide has high hydrophilicity, the inside of the container can be easily filled with a liquid by capillary action. Furthermore, since silicon oxide has high insulating properties, it can be used in contact with a resistance heater.

  A microreactor according to a third aspect is the microreactor according to the second aspect, wherein the container penetrates the substrate.

  According to this, since the container penetrates the substrate, that is, the bottom of the container protrudes from the substrate, optical observation, fluorescence analysis, and spectroscopic analysis can be performed from the bottom, and a laser or the like can be used.

  The microreactor according to claim 4 is the microreactor according to any one of claims 1 to 3, further characterized in that the substrate is a silicon substrate and the crystal orientations of the upper surface and the lower surface are (100). .

  According to this, since the upper and lower surfaces of the substrate are silicon (100) surfaces with high etching selectivity, anisotropic etching can be used in the process of forming the microreactor, and as a result, it has a high aspect ratio. The container can be easily formed.

  A microreactor according to claim 5 is the microreactor according to any one of claims 1 to 4, wherein the container has an aspect ratio of 1 or more.

  According to this, since the aspect ratio is high, a high-capacity reactor can be formed even in the same area.

  A microreactor according to claim 6 is the microreactor according to any one of claims 1 to 5, wherein a plurality of the containers are provided, each of the containers has a substantially square cross section, and the plurality of containers are arrayed. It is characterized by being aligned.

  According to this, since the plurality of containers are aligned in an array, a large number of reaction systems can be handled in a minute space.

  The microreactor according to claim 7 is the microreactor according to any one of claims 1 to 5, further comprising a plurality of the containers, wherein each of the containers has a substantially rectangular horizontal section, and the length of the rectangle The directional axes are parallel to each other at a fixed distance.

  According to this, the macro reactor can be used as a diffraction grating or the like.

Further, claim 8 is a method of manufacturing a microreactor comprising a substrate and a hollow columnar container that is vertically formed with respect to the substrate through the substrate,
a) forming a mask layer having an opening in a portion where the container is to be formed on one surface of the substrate;
b) etching the substrate from the opening to form holes in the substrate;
c) Anodizing while irradiating the substrate with light from the other surface, and digging down the holes;
d) thermally oxidizing the substrate to form an oxide layer in the hole and on the other surface of the substrate; and e) removing the mask layer to expose the one surface;
and f) selectively etching the exposed portion of the one surface to form a hollow columnar container that is erected with respect to the substrate through the substrate.

  According to this, it is possible to manufacture a microreactor including a hollow columnar container erected vertically in the order of microns. The container of the microreactor is held on the substrate at the insertion portion, and the other portions are erected from the substrate, so that the opening portions of the containers are separated from each other. Therefore, even if the reagent solution overflows when the reagent solution flows in, the reagent solution flows downward and the liquid is not mixed between adjacent containers. In addition, it is not easily affected by, for example, temperature from adjacent containers.

  In addition, since the holes are formed by an electrochemical process called anodization, cost performance and productivity are high compared to a dry process such as RIE (reactive ion etching).

  Further, since the container is made of silicon oxide formed by thermal oxidation, it is transparent, can be optically observed, fluorescently analyzed, and spectroscopically analyzed, and a laser or the like can also be used. In addition, since silicon oxide has high hydrophilicity, the inside of the container can be easily filled with a liquid by capillary action. Furthermore, since silicon oxide has an insulating property, the microreactor can be heated by forming a resistance heater so as to contact the silicon oxide.

  The manufacturing method according to claim 9 further removes the oxide layer formed on the other surface of the substrate in step e) according to claim 8, and further selects an exposed portion of the other surface in step f). It is characterized by etching.

  According to this, it is possible to form a microreactor in which the container penetrates the substrate, that is, the bottom of the container protrudes from the substrate, optical observation, fluorescence analysis, spectroscopic analysis can be performed from the bottom, and a laser or the like can be used. It can also be used.

  The manufacturing method according to claim 10 is the manufacturing method according to claim 8 or 9, wherein the substrate is an n-type silicon substrate having a crystal orientation of (100) on the upper surface and the lower surface, and the step b). The etching is anisotropic etching.

  According to this, in the etching of step b), the silicon substrate is selectively etched, and an inverted pyramid-shaped hole can be formed. The tip of the pyramidal hole becomes an etch pit for the anodizing treatment in the next step c), and the hole can be easily extended vertically downward in the anodizing treatment, thereby providing a container having a high aspect ratio. it can.

  The manufacturing method according to claim 11 is the step a) in the manufacturing method according to any one of claims 8 to 10, further comprising a plurality of the opening portions, each opening portion being a square. They are arranged in an array.

  This makes it possible to form a microreactor having hollow columnar containers that are substantially square in horizontal cross section and arranged in an array, and can handle a large number of reaction systems in a minute space.

  The manufacturing method according to claim 12 is the step a) in the manufacturing method according to any one of claims 8 to 10, further comprising a plurality of the opening portions, each opening portion being rectangular. The longitudinal axes of the opening portions are arranged in parallel at a regular interval.

  According to this, it is possible to manufacture a microreactor including a plurality of containers whose horizontal cross sections are substantially rectangular and whose longitudinal axes are arranged in parallel with each other at a fixed distance, and can be used as a diffraction grating or the like. .

  According to the microreactor according to the first aspect, since a high-performance test tube having a minute capacity is provided, experiments in the nanotechnology field can be performed with high accuracy.

  Since the container is transparent, the microreactor described in claim 2 can be observed in various ways and can be applied to various uses. In addition, since the wettability of the inner surface of the container is good, the range of liquids that can be filled is wide, and the liquid filling time can be shortened, so that the experiment time can be shortened. In addition, the resistance heater can be integrally formed.

  According to the microreactor according to the third aspect, since the bottom portion protrudes and observation from the bottom portion is possible, more data can be collected.

  Since the microreactor according to claims 4 and 5 includes a container with a high aspect ratio, high integration is possible, and many experiments can be performed in a small area.

  In the microreactor according to the sixth aspect, since the containers are arranged in an array, further integration is possible.

  The microreactor according to claim 7 can be used as one of optical components such as a diffraction grating.

  According to the manufacturing method of the eighth aspect, a microreactor including a container that can be used for various experiments in nanotechnology can be easily manufactured as a high-performance test tube having a small capacity. In addition, since the container is transparent, it can be observed from various directions and can be applied to various uses. In addition, because the wettability of the inner surface of the container is good, the range of liquids that can be filled is wide and can be applied to a variety of uses as well, and the liquid filling time can be shortened, thereby shortening the experiment time. it can. In addition, the resistance heater can be integrally formed.

  According to the manufacturing method of the ninth aspect, since it is possible to provide a microreactor that can be observed from the bottom, it is possible to collect more data.

  According to the manufacturing method of the tenth aspect, a microreactor including a container with a high aspect ratio can be provided. Therefore, high integration is possible, and many experiments can be performed in a small area.

  According to the manufacturing method of the eleventh aspect, since the microreactor in which the containers are arranged in an array can be provided, further integration can be achieved.

  According to the manufacturing method of the twelfth aspect, since a microreactor that can be used as a diffraction grating can be provided, the microreactor can be used as an optical component.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. In this specification, the microreactor includes all reactors having a structure characterized by its extremely small size, in which important features cannot be completely distinguished unless an optical microscope is used, The reactor is not limited to this. The horizontal direction refers to a direction parallel to the substrate, and the vertical direction refers to a direction perpendicular to the substrate (wafer). “Up and down” means up and down when the opening of the container is on the top and the bottom is on the bottom. The aspect ratio refers to the ratio of the depth of the container to the length of one side of the square (the side in the short direction in the third embodiment) formed on the inner periphery of the horizontal cross section of the container.

  FIG. 1 is a partial cross-sectional perspective view of a microreactor 1 according to a first embodiment of the present invention. As shown in the figure, the microreactor 1 is formed upright by being arranged in an array through a substrate 2 and the substrate 2. A plurality of containers 3.

  The substrate 2 is a Si substrate having an upper and lower crystal orientation of (100) and a thickness T of several μm to several hundreds of μm, and a plurality of through holes 4 are provided in an array.

Each container 3 is a hollow columnar container made of SiO ₂ , its thickness t is several hundred nm to several tens of μm, the horizontal cross-sectional shape is substantially square, and the length w of one side of the square is several μm to several hundred μm. is there. The height h of the container 3 is on the order of several μm to several hundreds of μm, similar to the length w described above, but is larger than the length w and the aspect ratio of the container is high. Each container 3 has substantially the same shape, and its bottom portion 5 has a substantially inverted pyramid shape that is slightly rounded downward, and is inserted through the through-hole 4 of the substrate 2 from the peripheral edge of the bottom portion 5. Side 6 extends to open upward.

Next, one manufacturing method of the microreactor 1 according to the first embodiment shown in FIG. 1 will be described with reference to FIG. 2 (a) First, the crystal orientation of the upper and lower surfaces is (100), and the thickness is about 625 μm. The Si wafer 7 is used as a constituent member of the substrate 2, and a Si ₃ N ₄ layer 9 of about 140 nm is formed as a mask layer on the upper surface 8a and the lower surface 8b of the wafer 7 by LPCVD (Low Pressure Chemical Vapor Deposition) method. To form. Next, the Si ₃ N ₄ layer 9 of the container 3 forming portion 10 on the upper surface 8a of the Si wafer 7 is etched by photolithography and RIE (Reactive Ion Etching) method, and the array is arranged. A square hole with an interval of 10 μm is patterned to expose the Si wafer 7 of the portion 10 where the container 3 is to be formed (FIG. 2A).
(B) Next, this Si wafer 7 is immersed in a KOH solution at about 20 wt% and 90 ° C. to perform anisotropic etching. This anisotropic etching uses the characteristics that silicon single crystals have different dissolution rates depending on the crystal orientation, the (100) plane has a high dissolution rate, and the (111) plane has a low dissolution rate. An inverted pyramid-shaped minute concave structure 11 is formed in the portion 10 where 7 is exposed. After the formation of the concave structure 11, the Si ₃ N ₄ layer 9 on the lower surface 8b is removed (FIG. 2B).
(C) Next, a series of anodization treatments i) to iii) described below is performed on the Si wafer 7 on which the minute concave structure 11 is formed (FIG. 2C). The processing conditions are shown in Table 1 below.

  i) A conductive Au / Cr layer 12 is vapor-deposited on the lower surface of the Si wafer 7, and an irradiation light window 13 is formed at a position opposite to the etch pit 16 by micropatterning. By patterning in this way, it is possible to irradiate excitation light only to a specific position of the Si wafer 7, and it is possible to perform highly accurate drilling while suppressing side etching.

ii) A reaction vessel containing an Si wafer 7 and a Pt electrode (not shown) as a cathode containing an aqueous solution 14 containing 1.25 wt% HF (hydrofluoric acid aqueous solution) and 8.15 wt% C ₂ H ₅ OH. Immerse in.

iii) Visible excitation light is irradiated from the lower surface of the Si wafer 7 by a halogen lamp. Then, the Si wafer 7 is photoexcited through the irradiation light window 13 to generate holes 15, and the holes 15 generated in the vicinity of the etch pit 16 are concentrated. Then, F ⁻ and holes react with each other, and the Si wafer 7 is drilled substantially vertically downward from the tip of the etch pit 16 to form a hole 17 having a high aspect ratio. The conducting Au / Cr layer 12 is removed after the holes 17 are formed.

（ｄ） 陽極酸化処理の後、孔17が形成されたＳｉウェハ７に対して１１００℃で約３時間の熱酸化を行い、孔17の内部及びＳｉウェハ７の下面８ｂに約１μｍの厚さのＳｉＯ₂層18を形成する（図２（ｄ））。
（ｅ） Ｓｉウェハ７上面のＳｉ₃Ｎ₄層９、及び下面のＳｉＯ₂層18を、精密研磨処理によって除去する（図２（ｅ））。なお、この場合これらの層の除去は、精密研磨処理に限定されず、化学的溶剤を使った除去であってもよい。
（ｆ） Ｓｉに対する選択性の高いＴＭＡＨ(水酸化テトラメチルアンモニウム)２５ｗｔ％溶液を使用して、０．４μｍ／ｍｉｎのエッチング速度でアルカリエッチングを行い、Ｓｉウェハ７を所望の厚さＴまでエッチングする。このとき、ＳｉＯ₂層18はＴＭＡＨ溶液によってエッチングされないため、孔の内部のＳｉＯ₂層18が残り、上部及び底部５が基板２から突き出した形の複数の容器３が形成される（図２（ｆ））。

(D) After the anodic oxidation treatment, the Si wafer 7 with the holes 17 formed thereon is thermally oxidized at 1100 ° C. for about 3 hours, and the thickness of the inside of the holes 17 and the lower surface 8b of the Si wafer 7 is about 1 μm. The SiO ₂ layer 18 is formed (FIG. 2D).
(E) The Si ₃ N ₄ layer 9 on the upper surface of the Si wafer 7 and the SiO ₂ layer 18 on the lower surface are removed by precision polishing (FIG. 2E). In this case, the removal of these layers is not limited to the precision polishing treatment, and may be removal using a chemical solvent.
(F) Using a TMAH (tetramethylammonium hydroxide) 25 wt% solution with high selectivity to Si, alkali etching is performed at an etching rate of 0.4 μm / min, and the Si wafer 7 is etched to a desired thickness T. To do. At this time, since the SiO ₂ layer 18 is not etched by the TMAH solution, the SiO ₂ layer 18 inside the hole remains, and a plurality of containers 3 in which the upper part and the bottom part 5 protrude from the substrate 2 are formed (FIG. 2 ( f)).

  3 and 4 are SEM (scanning electron microscope) photographs of the microreactor 1 actually formed under the above conditions. FIG. 3A is an SEM photograph of a portion on the Si wafer 7 where the microreactor 1 is formed. A partial region 19 of the Si wafer 7 is etched, and the microreactor 1 is formed in the central region 20 of the etched region 19. FIG. 3B is an SEM photograph of a part of the microreactor 1 shown in FIG. 3A taken from the upper oblique direction. A plurality of containers 3 each having a square opening 3a each having a side of about 10 μm are arrayed. Are aligned. FIG. 4 is an SEM photograph in which a part of the microreactor 1 is copied from the lower oblique side. As shown in the photograph, the bottom 5 has a rounded inverted pyramid shape (downward quadrangular pyramid shape) and protrudes downward from the substrate 2 by about 10 μm.

  As described above, according to the present embodiment, since the substrate 2 and the hollow columnar container 3 that is vertically formed with respect to the substrate 2 through the substrate 2 are provided, the chemical reaction in the micro space can be verified. A suitable micron-order reactor 1 can be provided. The container 3 of the microreactor 1 is erected from the substrate 2 except for the portion inserted and fixedly held by the substrate 2, and the openings 3a of the containers are separated from each other. Even if the liquid overflows or spills, the reagent does not flow downward and the liquid is not mixed between the adjacent containers 3. Similarly, since the containers 3 are separated from each other, they are not easily affected by the adjacent containers 3, such as temperature.

The container 3 is transparent because it is made of SiO ₂ , that is, silicon oxide, optical observation, fluorescence analysis, and spectroscopic analysis are possible, and a laser or the like can be used. Further, since SiO ₂ has high hydrophilicity, the inside of the container 3 can be easily filled with a liquid by capillary action. Furthermore, since SiO ₂ has high insulating properties, it can be used in contact with a resistance heater.

  Furthermore, in the microreactor of this embodiment, since the container 3 penetrates the substrate 2 and the bottom 5 of the container 3 protrudes from the substrate 2, optical observation, fluorescence analysis, and spectroscopic analysis can be performed from the bottom 2. Further, a laser or the like can also be used.

  Since the substrate 2 is an n-type silicon substrate, and the crystal orientations of the upper and lower surfaces are (100) planes, an inverted pyramid-shaped hole is formed by anisotropic etching by alkali etching in the etching of step b). be able to. The tip of the pyramidal hole becomes an etch pit for the anodizing treatment in the next step c), and the hole can be easily extended vertically downward in the anodizing treatment, thereby providing a container having a high aspect ratio. it can.

  Further, the microreactor 1 of the present embodiment can provide the containers 3 arranged in an array having a square cross section since the opening portions 10 are arranged in a square array in step a). Therefore, the microreactor 1 can be highly integrated, and a large number of reaction systems can be handled simultaneously in a minute space. For example, the reactions in all containers can be collectively observed with a CCD camera.

  Furthermore, since the holes are formed using an electrochemical process called anodization, the holes are formed with higher cost performance and higher productivity than dry processes such as RIE (reactive ion etching). can do.

Next, the microreactor 101 and the manufacturing method thereof according to the second embodiment of the present embodiment will be described with reference to FIGS. As shown in FIG. 5, the microreactor 101 of this embodiment includes a substrate 102 having a SiO ₂ layer 118 on the lower surface, and a plurality of hollow columnar containers 103 that are erected vertically from the upper surface of the substrate 102. The difference from the microreactor 1 of the first embodiment is that the substrate 102 is thick, the lower surface thereof has the SiO ₂ layer 118, and the bottom portion 105 of the container 103 does not protrude from the lower surface of the substrate 102.

Since the manufacturing method of the microreactor 101 is the same as the manufacturing method described in the first embodiment and steps (a) to (d) are the same, description of these steps is omitted. FIG. 6 shows the different steps (e ′) and (f ′). After the thermal oxide film formation step (d) described in the first embodiment, the microreactor 101 of the second embodiment is formed through the following steps.
(E ′) The Si ₃ N ₄ layer is removed from the upper surface of the Si wafer 107 by precision polishing. However, unlike the step (e) of the first embodiment, the SiO ₂ layer 118 on the lower surface is not removed (FIG. 6 (e ′)).
(F ′) Alkaline etching at an etching rate of 0.4 μm / min is performed with a 25 wt% TMAH solution having high selectivity for Si, and the formation region of the microreactor 1 of the Si wafer 107 is etched to a desired thickness T. (FIG. 6 (f ′)).

  As described above, according to the microreactor 101 of the present embodiment, in addition to the effects of the first embodiment, since the bottom portion 105 does not protrude from the substrate 102, the strength of the microreactor 101 can be improved. Therefore, although optical observation or the like from the bottom portion 105 cannot be performed, the microreactor 101 according to the present embodiment can be used in applications where a certain level of strength is required.

  FIG. 7 is a cross-sectional view of a part of the microreactor 201 showing the third embodiment of the present embodiment. As shown in the figure, the microreactor 201 of this embodiment includes a substrate 202 and a plurality of hollow columnar containers 203 that are vertically formed through the substrate 202, and these points are the same as in the first embodiment. It is. However, the difference is that the container 203 is long in one horizontal side and has a substantially rectangular horizontal cross section, and the longitudinal axes of the cross section are arranged in a certain parallel spacing relationship. In the manufacturing method, the pattern formed on the mask layer in step (a) of the first embodiment is not a square but a rectangle, its short side is about 10 μm, and its long side is considerably longer than that. Although different, other steps are the same and will not be described.

  The microreactor 201 of the third embodiment includes a plurality of containers 203, each of which has a substantially rectangular horizontal cross section, and the longitudinal axes of the rectangles are arranged in parallel with each other at a constant distance, In addition to the advantages of the first embodiment, for example, liquid can be introduced into these containers and light can be incident to be used as a diffraction grating, or used for measuring a photonic band gap. Can be provided.

  In addition, although preferable embodiment of this invention was described above, this invention is not limited to this. For example, the thickness, material and shape of the substrate and the container, the solution used and the etching conditions can be appropriately changed within the scope of the present invention.

1 is a cross-sectional perspective view of a microreactor according to a first embodiment of the present invention. It is the schematic diagram which showed each process of the manufacturing method of the micro reactor of 1st Embodiment of this invention. (A) is the SEM photograph which image | photographed the whole upper part of the microreactor by 1st Embodiment of this invention, (b) is the SEM photograph which expanded a part of (a). It is the SEM photograph which looked at the microreactor by a 1st embodiment of the present invention diagonally from the lower part. It is a section perspective view of the micro reactor of a 2nd embodiment of the present invention. It is the schematic diagram which showed a part of process of the manufacturing method of the micro reactor of 2nd Embodiment of this invention. It is a section perspective view of the micro reactor of a 3rd embodiment of the present invention.

Explanation of symbols

1, 101, 201 Microreactor 2, 102, 202 Substrate 3, 103, 203 Container 4 Through hole 7 Si wafer 9 Si ₃ N ₄ layer (mask layer)
18 SiO ₂ layer

Claims (12)

A substrate,
A hollow columnar container that is vertically formed with respect to the substrate through the substrate;
A microreactor comprising:   The microreactor according to claim 1, wherein the container is formed of silicon oxide.   The microreactor according to claim 1 or 2, wherein the container penetrates the substrate.   The microreactor according to any one of claims 1 to 3, wherein the substrate is a silicon substrate and the crystal orientation of the upper surface and the lower surface is (100).   The microreactor according to any one of claims 1 to 4, wherein the container has an aspect ratio of 1 or more.   The microreactor according to any one of claims 1 to 5, wherein a plurality of the containers are provided, each container has a substantially square horizontal section, and the plurality of containers are arranged in an array. .   A plurality of the containers are provided, the horizontal cross section of each container is substantially rectangular, and the longitudinal axes of the rectangles are arranged in parallel with each other at a fixed distance. The microreactor according to item. A substrate, and a hollow columnar container that is vertically formed with respect to the substrate through the substrate,
A method of manufacturing a microreactor comprising:
a) forming a mask layer having an opening in a portion where the container is formed on one surface of the substrate;
b) etching the substrate from the opening to form holes in the substrate;
c) performing anodizing treatment while irradiating light from the other surface of the substrate, and digging down the holes;
d) thermally oxidizing the substrate to form an oxide layer inside the hole and on the other surface of the substrate; and e) removing the mask layer to expose the one surface;
and f) a step of selectively etching the exposed portion of the one surface, and forming a hollow columnar container erected with respect to the substrate through the substrate.   In step e), the oxide layer formed on the other surface is removed to expose the other surface, and in step f), the exposed portion of the other surface is also selectively etched. The manufacturing method according to claim 8.   The manufacturing method according to claim 8 or 9, wherein the substrate is an n-type silicon substrate having a top and bottom crystal orientation of (100), and the etching in the step b) is anisotropic etching. Method.   The said step a) is provided with two or more said opening parts, and each opening part is a square and is arranged in the shape of an array, The one of Claims 8-10 characterized by the above-mentioned. Production method. 9. The step a) is characterized in that a plurality of the opening portions are provided, each opening portion is rectangular, and the longitudinal axes of the opening portions are juxtaposed with a fixed spacing. The manufacturing method of any one of 10-10.

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