JP2005173545A - Aligner - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an aligner which suppresses misalignment of an exposure position from a desired exposure pattern and which can form an exposure region with high accuracy according to a desired exposure pattern. <P>SOLUTION: A substrate 22 to be exposed is held by a holding base 26, and while the holding base 26 is moved in the Y-axis direction by a holding base driving means 29, the surface of the substrate 22 is irradiated with exposure laser light by an exposure irradiating means 27. During the process, displacement of the holding base 26 in the X-axis direction against a laser array unit 28 is detected by a holding base displacement detecting means 31. An objective lens driving means 30 is controlled by an X-axis positioning controller 35 so that the displacement of the irradiation position of the exposure light In the X-axis direction is suppressed by moving the objective lens 43 for exposure with respect to the laser array unit 28 based on the displacement of the holding base 26 detected by the holding base displacement detecting means 31. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to an exposure apparatus that irradiates the surface of a substrate with an exposure laser beam to expose the substrate, and more specifically, moves an irradiation position of the exposure laser beam to the surface of the substrate to obtain a desired The present invention relates to an exposure apparatus that exposes the substrate according to an exposure pattern.

Liquid crystal display device, IC (Integrated Circuit) and LSI (Large Scale)
As an exposure apparatus used in a manufacturing process such as Integration), an exposure apparatus that exposes the substrate by irradiating ultraviolet rays onto the surface of the substrate to be exposed through a photomask when performing photolithography There is. Such an exposure apparatus has a problem that a large and expensive mask is necessary because the exposure is performed by aligning the photomask and the substrate. Further, since the photomask and the substrate must be aligned with high accuracy, there is a problem that a highly accurate holding mechanism and alignment mechanism for the photomask and the substrate are required. In addition, there is a problem that a temperature stabilization mechanism is required to prevent a reduction in drawing accuracy due to thermal contraction of the photomask and the photosensitive material. An ultra-high pressure mercury lamp is used as an ultraviolet light source. However, since this ultra-high pressure mercury lamp has a short life, there is a problem that the replacement frequency of the ultra-high pressure mercury lamp is high. In addition, there is a problem that the power consumption of an ultra-high pressure mercury lamp used as an ultraviolet light source is large.

  High-mix low-volume production and immediate production (so-called on-demand production) are the current trend, but mask exposure by the exposure apparatus has a problem that it is not suitable for immediate production because it takes time to prepare a photomask. In addition, there is a problem that the yield decreases due to dust and mask defects. Furthermore, there is a problem that the cost of the ultra-high pressure mercury lamp and the mask is necessary and the running cost becomes high.

  As a technique for solving the above problems, there is an exposure apparatus that does not use a photomask. A typical conventional technique as an exposure apparatus that does not use a photomask is described in Patent Document 1. FIG. 22 is a perspective view of the exposure apparatus 1 disclosed in Patent Document 1. As shown in FIG. In the exposure apparatus 1 of Patent Document 1, a stage 3 on which a substrate 2 to be exposed is placed and an array unit 4 on which a plurality of laser modules each having a semiconductor laser chip are mounted in a row face each other in parallel. In this state, the stage 3 and the array unit 4 are moved relative to each other while irradiating the laser beams emitted from the semiconductor laser chips of the plurality of laser modules perpendicularly to the substrate surface. Scan.

JP 2000-214597 A

  In the exposure apparatus 1 of Patent Document 1, when the stage 3 is moved, the stage 3 is displaced and vibrated in a direction different from the desired moving direction. Such displacement and vibration cause a shift of the exposure position. The deviation of the exposure position tends to increase as the moving speed of the stage increases. There is a problem that this shift in exposure position hinders the speeding up of exposure.

  FIG. 23 is a diagram schematically showing an exposure result by the exposure apparatus 1 of Patent Document 1. In FIG. FIG. 23 shows an example of an exposure result when exposure is performed by moving the stage 3 at a high speed in the Y direction. In the exposure apparatus 1 of Patent Document 1, when the stage 3 is moved at high speed in the Y direction, blurring in the X direction occurs between the stage 3 and the array unit 4, so the portion 6 exposed by the laser module is desired. There is a problem that the linear exposure pattern shifts.

  An object of the present invention is to provide an exposure apparatus that can prevent the exposure position from being shifted from a desired exposure pattern and can form an exposure region with high accuracy according to the desired exposure pattern.

The present invention comprises a holding table for holding a substrate to be exposed;
An exposure irradiation means for irradiating the exposure laser beam perpendicularly to the surface of the substrate held by the holding table;
Mounting means for mounting the irradiation means for exposure;
Drive means for moving the holding base relative to the mounting means in a predetermined movement direction within a virtual plane parallel to the surface of the substrate;
Irradiation position moving means for moving the irradiation position of the exposure laser beam on the surface of the substrate by the exposure irradiation means relative to the holding base in an orthogonal direction orthogonal to the predetermined movement direction within the virtual one plane. When,
An exposure apparatus comprising: control means for controlling the irradiation position moving means so as to maintain the irradiation position of the exposure laser beam on the holding table at a predetermined position with respect to the orthogonal direction.

The present invention further includes holding table displacement amount detecting means for detecting a displacement amount of the holding table in the orthogonal direction with respect to the mounting means,
The control means controls the irradiation position moving means so as to suppress the displacement of the irradiation position of the exposure laser beam with respect to the holding table in the orthogonal direction based on the amount of displacement of the holding table by the holding table displacement detection means. It is characterized by controlling.

  The irradiation position moving means may move the irradiation position of the exposure laser light in the orthogonal direction with respect to the holding base by moving the holding base in the orthogonal direction relative to the mounting means. It is characterized by relatively moving.

  According to the present invention, the irradiation position moving means moves the exposure irradiation means relative to the mounting means in the orthogonal direction so that the irradiation position of the exposure laser beam is orthogonal to the holding table. It is characterized by relatively moving in the direction.

The present invention further includes an irradiation displacement amount detecting means for detecting a displacement amount in the orthogonal direction of the irradiation means for exposure with respect to the mounting means,
The control means is for exposure relative to the mounting means in the orthogonal direction based on the displacement amount of the holding base by the holding base displacement amount detection means and the displacement amount of the exposure irradiation means by the irradiation displacement amount detection means. By moving the irradiation means, the irradiation position moving means is controlled so as to suppress displacement in the orthogonal direction of the irradiation position of the exposure laser beam with respect to the holding table.

The present invention further includes an irradiation displacement amount detecting means for detecting a displacement amount in the orthogonal direction of the irradiation means for exposure with respect to the mounting means,
The control unit suppresses the displacement of the holding table in the orthogonal direction with respect to the mounting unit based on the amount of displacement of the holding table by the holding table displacement detection unit, and the displacement of the exposure irradiation unit by the irradiation displacement amount detection unit. Based on the quantity, the irradiation position moving means is controlled so as to suppress the displacement of the exposure irradiation means relative to the mounting means in the orthogonal direction.

The present invention also includes a holding table for holding a substrate to be exposed;
An exposure irradiation means for irradiating the exposure laser beam perpendicularly to the surface of the substrate held by the holding table;
Mounting means for mounting the irradiation means for exposure;
Drive means for moving the holding base relative to the mounting means in a predetermined movement direction within a virtual plane parallel to the surface of the substrate;
An irradiation displacement amount detection means for detecting a displacement amount in an orthogonal direction orthogonal to the predetermined movement direction on the virtual one plane of the exposure irradiation means relative to the mounting means;
An irradiation position moving means for moving the exposure irradiation means relative to the mounting means in the orthogonal direction;
Control means for controlling the irradiation position moving means so as to suppress the displacement of the exposure irradiation means relative to the mounting means in the orthogonal direction based on the displacement amount of the exposure irradiation means by the irradiation displacement amount detection means. An exposure apparatus characterized by the above.

According to the present invention, the exposure irradiating means is provided in the mounting means, and is provided with an exposure laser light generating element for generating an exposure laser beam, and is movably provided in the mounting means in the orthogonal direction. An exposure objective lens that condenses the exposure laser light generated by the generating element,
The irradiation position moving means moves the exposure objective lens relatively in the orthogonal direction with respect to the holding table by moving the exposure objective lens in the orthogonal direction relative to the mounting means. It is made to move.

The present invention further includes a lens displacement amount detecting means for detecting a displacement amount in the orthogonal direction of the objective lens for exposure with respect to the mounting means,
The control means is for exposure relative to the mounting means in the orthogonal direction based on the displacement amount of the holding base by the holding base displacement amount detection means and the displacement amount of the exposure objective lens by the lens displacement amount detection means. By moving the objective lens, the irradiation position moving means is controlled so as to suppress the displacement in the orthogonal direction of the irradiation position of the exposure laser beam with respect to the holding table.

  According to the present invention, the lens displacement amount detection means is provided in a lens displacement amount detection optical member whose optical characteristics change in the orthogonal direction and moves together with the exposure objective lens, and a mounting means. The lens displacement amount detecting means for irradiating the detection optical member with laser light, and the laser light from the lens displacement amount detecting means for receiving the laser light via the lens displacement amount detecting optical member, and depending on the amount of received light And a lens displacement amount detecting light-receiving means for outputting a received signal.

In the invention, it is preferable that the lens displacement detection optical member is a diffraction grating.
Further, according to the present invention, the holding table displacement amount detecting means is provided on the holding table or the mounting means, the holding table displacement amount detecting optical member whose optical characteristic changes in the orthogonal direction, the mounting means or the holding device. The holding table displacement amount detecting irradiation means for irradiating laser light toward the holding table displacement amount detecting optical member, and the laser beam from the holding table displacement amount detecting irradiation means for detecting the holding table displacement amount. And a light receiving means for detecting the amount of displacement of the holding base, which receives light through an optical member and outputs a signal corresponding to the amount of light received.

In the invention, it is preferable that the optical member for detecting the displacement of the holding table is a diffraction grating.
Further, according to the present invention, the holding table displacement amount detecting means is provided on the holding table or the mounting means, the holding table displacement amount detecting optical member whose optical characteristic changes in the orthogonal direction, the mounting means or the holding device. The holding table displacement amount detecting irradiation means for irradiating laser light toward the holding table displacement amount detecting optical member, and the laser beam from the holding table displacement amount detecting irradiation means for detecting the holding table displacement amount. A light receiving means for detecting the amount of displacement of the holding base that receives light through an optical member and outputs a signal corresponding to the amount of light received;
The holding table displacement amount detecting optical member is a diffraction grating having the same grating pitch as the lens displacement amount detecting optical member.

  The present invention is also characterized in that the wavelength of the laser beam by the lens displacement amount detection irradiation means and the wavelength of the laser light by the holding table displacement amount detection irradiation means are the same.

  Further, the present invention is characterized in that the wavelength of the laser beam by the lens displacement amount detecting irradiation unit and the wavelength of the laser beam by the holding table displacement amount detecting unit are different from the wavelength of the exposure laser beam by the exposure irradiation unit. And

  Further, the invention is characterized in that the holding table displacement amount detecting optical member is provided on a holding table.

  Further, the invention is characterized in that the place where the laser beam from the holding table displacement amount detection irradiating means is reflected on the holding table displacement amount detection optical member is substantially in the same plane as the surface of the substrate. .

  According to the present invention, the holding table displacement detection means is provided on the holding table or the mounting means, provided on the reflecting plate having a reflecting surface perpendicular to the orthogonal direction, the mounting means or the holding table, and laser light. The reflecting plate laser light generating element that emits the laser light in the orthogonal direction and the mounting means or the holding stand, the laser light generated by the reflecting plate laser light generating element is condensed and the reflection is performed. A reflecting plate objective lens guided to the plate, and a reflecting plate light receiving means for receiving laser light from the reflecting plate laser light generating element through the reflecting plate and outputting a signal corresponding to the amount of received light. Features.

  According to the present invention, the holding table displacement detection means is provided on the holding table or the mounting means, provided on the reflecting plate having a reflecting surface perpendicular to the orthogonal direction, the mounting means or the holding table, and laser light. And a laser beam generating element for a reflecting plate that emits the laser light in the orthogonal direction, and a laser beam generating element for the reflecting plate that is mounted on the mounting means or the holding base so as to be movable in the orthogonal direction. A reflecting plate objective lens for condensing laser light and guiding it to the reflecting plate; a reflecting plate objective lens driving means for moving the reflecting plate objective lens in the orthogonal direction with respect to the mounting means or the holding table; Based on the signal from the light receiving means for the reflecting plate that receives the laser light from the laser light generating element for the plate through the reflecting plate and outputs a signal corresponding to the amount of the received light, the light for the reflecting plate Objective A lens displacement amount control means for controlling the lens drive means so as to suppress a change in the distance between the reflector objective lens and the reflector, and the optical characteristic changes in the orthogonal direction, and the reflector objective lens A second holding stand displacement amount detecting optical member that moves together with the second holding stand provided on the mounting means or the holding stand and irradiating the second holding stand displacement amount detecting optical member with the laser beam. The laser light from the table displacement amount detection irradiating means and the second holding table displacement amount detection irradiating means is received via the second holding table displacement amount detection optical member, and a signal corresponding to the received light amount is received. And a second light receiving means for detecting the displacement amount of the holding table for output.

  According to the present invention, the second holding table displacement amount detecting optical member is a diffraction grating.

According to the present invention, the holding table displacement detection means is provided on the holding table or the mounting means, provided on the reflecting plate having a reflecting surface perpendicular to the orthogonal direction, the mounting means or the holding table, and laser light. And a laser beam generating element for a reflecting plate that emits the laser light in the orthogonal direction, and a laser beam generating element for the reflecting plate that is mounted on the mounting means or the holding base so as to be movable in the orthogonal direction. A reflecting plate objective lens for condensing laser light and guiding it to the reflecting plate; a reflecting plate objective lens driving means for moving the reflecting plate objective lens in the orthogonal direction with respect to the mounting means or the holding table; Based on the signal from the light receiving means for the reflecting plate that receives the laser light from the laser light generating element for the plate through the reflecting plate and outputs a signal corresponding to the amount of the received light, the light for the reflecting plate Objective A lens displacement amount control means for controlling the lens drive means so as to suppress a change in the distance between the reflector objective lens and the reflector, and the optical characteristic changes in the orthogonal direction, and the reflector objective lens A second holding stand displacement amount detecting optical member that moves together with the second holding stand provided on the mounting means or the holding stand and irradiating the second holding stand displacement amount detecting optical member with the laser beam. The laser light from the table displacement amount detection irradiating means and the second holding table displacement amount detection irradiating means is received via the second holding table displacement amount detection optical member, and a signal corresponding to the received light amount is received. And a second light receiving means for detecting the displacement amount of the holding base for outputting,
The second holding table displacement amount detecting optical member is a diffraction grating having the same grating pitch as the lens displacement amount detecting optical member.

  In the present invention, the wavelength of the laser beam by the lens displacement amount detecting irradiation unit, the wavelength of the laser beam by the reflecting plate laser beam generating element, and the wavelength of the laser beam by the second holding table displacement amount detecting unit are as follows. Are the same.

  Further, in the present invention, the wavelength of the laser light by the lens displacement amount detecting irradiation means, the wavelength of the laser light by the reflecting plate laser light generating element, and the wavelength of the laser light by the second holding table displacement amount detecting irradiation means are: It is characterized by being different from the wavelength of the exposure laser beam by the exposure irradiation means.

In the invention, it is preferable that the reflection plate is provided on a holding table.
Further, the invention is characterized in that a place where the laser light from the laser light generating element for a reflecting plate is reflected on the reflecting plate is in a plane substantially the same as the surface of the substrate.

  Further, the present invention has a plurality of exposure irradiation means, and the exposure laser light from each exposure irradiation means is applied to any position in the orthogonal direction on the surface of the substrate independently of each other. It is characterized by that.

  According to the present invention, the exposure means is mounted on the mounting means. This exposure irradiation means irradiates the exposure laser beam perpendicularly to the surface of the substrate held by the holding table. While the substrate is held by the holding table, the exposure laser beam is applied to the surface of the substrate by the exposure irradiation unit while the driving unit moves the holding table relative to the mounting unit in a predetermined movement direction. Irradiate. At this time, the irradiation position of the exposure laser beam moves in a predetermined movement direction with respect to the surface of the substrate, whereby an exposed exposure region is formed on the substrate.

  The control means controls the irradiation position moving means so as to maintain the irradiation position of the exposure laser beam on the holding table at a predetermined position with respect to the orthogonal direction. Therefore, it is possible to suppress the irradiation position of the exposure laser light from being undesirably displaced in the orthogonal direction with respect to the holding table due to disturbance, and an exposure region can be formed with high accuracy. The predetermined position may be unchanged or changed.

  Further, according to the present invention, the displacement amount of the holding table in the direction orthogonal to the mounting means is detected by the holding table displacement amount detection means. The control means controls the irradiation position moving means so as to suppress the displacement in the orthogonal direction of the irradiation position of the exposure laser beam on the holding table based on the displacement amount of the holding table by the holding table displacement detection means. Therefore, it is possible to suppress the irradiation position of the exposure laser light from being undesirably displaced in the orthogonal direction with respect to the holding table due to disturbance, and an exposure region can be formed with high accuracy.

  According to the invention, the irradiation position moving means moves the holding table relative to the mounting means in the orthogonal direction. The control unit controls the irradiation position moving unit to suppress the displacement of the holding table in the orthogonal direction with respect to the mounting unit based on the amount of displacement of the holding table by the holding table displacement detection unit. In this way, by suppressing the displacement of the holding table in the orthogonal direction with respect to the mounting means, it is possible to suppress the irradiation position of the exposure laser light from being relatively displaced in the orthogonal direction with respect to the holding table. Thus, a desired exposure pattern can be drawn without moving the exposure irradiating means relative to the mounting means in the orthogonal direction.

  According to the invention, the irradiation position moving means moves the exposure irradiation means relative to the mounting means in the orthogonal direction. The control means controls the irradiation position moving means so as to suppress the displacement of the exposure irradiation means in the orthogonal direction with respect to the holding table based on the displacement amount of the holding table by the holding table displacement detection means. As a result, when the holding table is moved in a predetermined movement direction with respect to the mounting means, even if the position of the holding table in the orthogonal direction with respect to the mounting means changes due to vibration caused by the movement, the exposure laser beam is irradiated. The position can be moved in real time with respect to the holding table, and the change in the orthogonal direction of the irradiation position of the exposure laser beam can be suppressed. Therefore, it is possible to prevent the irradiation position of the exposure laser light from deviating from a desired exposure pattern, and it is possible to form an exposure region with high accuracy according to the desired exposure pattern.

  According to the invention, the irradiation displacement amount detection means detects the displacement amount in the orthogonal direction of the exposure irradiation means relative to the mounting means. The control means includes an exposure irradiation means relative to the mounting means in a direction orthogonal to the mounting means based on the displacement amount of the holding base by the holding base displacement amount detection means and the displacement amount of the exposure irradiation means by the irradiation displacement amount detection means. By moving the irradiation position, the irradiation position moving means is controlled so as to suppress the displacement in the orthogonal direction of the irradiation position of the exposure laser beam with respect to the holding table.

  Therefore, when the holding table is moved in a predetermined movement direction with respect to the mounting means, even if the position of the holding table in the orthogonal direction with respect to the mounting means changes due to vibrations accompanying the movement, the exposure irradiation means is displaced. It is possible to follow the displacement of the holding table. Thereby, it is possible to suppress the positional deviation of the exposure laser beam.

  According to the invention, the irradiation displacement amount detection means detects the displacement amount of the exposure irradiation means in the orthogonal direction with respect to the mounting means. The control means suppresses the displacement of the holding table in the orthogonal direction with respect to the mounting means based on the displacement amount of the holding table by the holding table displacement detection means, and controls the displacement of the exposure irradiation means by the irradiation displacement detection means. Based on this, the irradiation position moving means is controlled so as to suppress the displacement of the exposure irradiation means relative to the mounting means in the orthogonal direction. Thereby, the displacement of the irradiation position of the exposure laser beam on the holding table in the orthogonal direction is suppressed.

  Thus, since it is possible to suppress displacement of the exposure irradiation means in the orthogonal direction with respect to the mounting means, the mounting is performed during scanning exposure in which the holding table is moved in a predetermined movement direction with respect to the mounting means. There is no displacement in the orthogonal direction of the exposure irradiation means with respect to the means. Therefore, it is possible to suppress the positional deviation of the exposure laser beam due to the displacement in the orthogonal direction of the exposure irradiation means with respect to the mounting means.

  According to the invention, the irradiation means for exposure is mounted on the mounting means. This exposure irradiation means irradiates the exposure laser beam perpendicularly to the surface of the substrate held by the holding table. While the substrate is held by the holding table, the exposure laser beam is applied to the surface of the substrate by the exposure irradiation unit while the driving unit moves the holding table relative to the mounting unit in a predetermined movement direction. Irradiate. At this time, the irradiation position of the exposure laser beam moves in a predetermined movement direction with respect to the surface of the substrate, whereby an exposed exposure region is formed on the substrate.

  The exposure irradiation means is moved relative to the mounting means in the orthogonal direction by the irradiation position moving means. The displacement in the orthogonal direction of the exposure irradiation means relative to the mounting means is detected by the irradiation displacement amount detection means. The control means controls the irradiation position moving means so as to control the displacement of the exposure irradiation means relative to the mounting means in the orthogonal direction based on the displacement amount of the exposure irradiation means by the irradiation displacement amount detection means.

  Thus, since it is possible to suppress the displacement in the orthogonal direction of the irradiation means for exposure with respect to the mounting means, the mounting means during the scanning exposure in which the holding table is moved in a predetermined movement direction with respect to the mounting means. There is no displacement in the orthogonal direction of the exposure means for exposure. Therefore, it is possible to suppress the positional deviation of the exposure laser beam due to the displacement in the orthogonal direction of the exposure irradiation means with respect to the mounting means.

  Further, according to the present invention, the irradiation position of the exposure laser light is moved by the movement of the exposure objective lens with respect to the mounting means, so that the exposure is performed as compared with the case where the exposure laser light generating element is moved with respect to the mounting means. The irradiation position of the laser beam for use is easily moved. Since the exposure objective lens can be reduced in size, the exposure objective lens can be moved at high speed. Therefore, the irradiation position of the exposure laser beam can be changed at high speed, and the production efficiency can be improved.

  According to the invention, the displacement amount of the exposure objective lens in the orthogonal direction with respect to the mounting means is detected by the lens displacement amount detection means. The control means irradiates the irradiation position moving means with the exposure laser beam based on not only the displacement amount of the holding table by the holding table displacement detection means but also the displacement amount of the exposure objective lens by the lens displacement detection means. Control is performed to suppress displacement of the position in the orthogonal direction.

  Since the irradiation position of the exposure laser beam is controlled by the control means in this way, the temperature characteristics of the mechanism for moving the exposure objective lens and variations in displacement due to changes over time can be suppressed. In addition, the irradiation position of the exposure laser beam can be controlled by comparing the displacement amount of the holding table and the displacement amount of the exposure objective lens.

  According to the invention, the mounting means is provided with a lens displacement amount detecting irradiation means. This lens displacement amount detection irradiating means irradiates laser light toward the lens displacement amount detection optical member. The optical member for detecting the lens displacement amount changes in the orthogonal direction and moves together with the objective lens for exposure. The lens displacement amount detection light receiving means receives the laser beam from the lens displacement amount detection irradiation means via the lens displacement amount detection optical member, and outputs a signal corresponding to the received light amount. Since the lens displacement amount detection means is thus configured, a signal corresponding to the displacement amount of the exposure objective lens can be obtained with a simple structure.

  Further, according to the present invention, since the diffraction grating is used as the lens displacement amount detection optical member, the lens displacement amount detection means can be realized by the same configuration as the optical pickup device of the optical disk. Therefore, the parts of the optical pickup device can be used for the lens displacement detection means, and convenience is improved.

  According to the invention, the holding table or the mounting means is provided with the holding table displacement amount detecting optical member, and the mounting means or the holding table is provided with the holding table displacement amount detecting irradiation means. The optical characteristic of the holding table displacement amount detection member changes in the orthogonal direction. The holding table displacement amount detection irradiating means irradiates laser light toward the holding table displacement amount detection optical member. The holding table displacement amount detection light receiving means receives the laser beam from the holding table displacement amount detection irradiation means via the holding table displacement amount detection optical member, and outputs a signal corresponding to the received light amount. Since the holding table displacement amount detecting means is thus configured, a signal corresponding to the amount of displacement of the holding table in the orthogonal direction with respect to the mounting means can be obtained with a simple configuration.

  Further, according to the present invention, since the diffraction grating is used as the holding table displacement amount detecting optical member, the holding table displacement amount detecting means can be realized by the same configuration as the optical pickup device of the optical disk. Therefore, the parts of the optical pickup device can be used for the holding table displacement detection means, and convenience is improved.

  According to the invention, the holding table or the mounting means is provided with the holding table displacement amount detecting optical member, and the mounting means or the holding table is provided with the holding table displacement amount detecting irradiation means. The optical characteristic of the holding table displacement amount detection member changes in the orthogonal direction. The holding table displacement amount detection irradiating means irradiates laser light toward the holding table displacement amount detection optical member. The holding table displacement amount detection light receiving means receives the laser beam from the holding table displacement amount detection irradiation means via the holding table displacement amount detection optical member, and outputs a signal corresponding to the received light amount. Since the holding table displacement amount detecting means is thus configured, a signal corresponding to the amount of displacement of the holding table in the orthogonal direction with respect to the mounting means can be obtained with a simple configuration.

  Further, since the diffraction grating is used as the holding member displacement amount detecting optical member, the holding table displacement amount detecting means can be realized by the same configuration as the optical pickup device of the optical disk. Therefore, the parts of the optical pickup device can be used for the holding table displacement detection means, and convenience is improved. In addition, since the optical member for detecting the displacement of the holding table is a diffraction grating having the same grating pitch as the optical member for detecting the amount of lens displacement, it is easy to compare the amount of displacement of the holding table and the amount of displacement of the exposure objective lens. Therefore, it is easy to control the irradiation position of the exposure laser beam.

  Further, according to the present invention, the wavelength of the laser beam by the lens displacement amount detection irradiating means and the wavelength of the laser beam by the holding table displacement amount detection irradiating means are mutually the same, so the types of optical components can be reduced. it can. Further, since the wavelength of the laser beam by the lens displacement amount detecting means and the wavelength of the laser light by the holding table displacement amount detecting means are the same, the signal by the lens displacement amount detecting light receiving means and the light amount of the holding table displacement are received. The signals by the means can be made similar, and the types of control components can be reduced.

  Further, according to the present invention, the wavelength of the laser beam by the lens displacement amount detection irradiation unit and the wavelength of the laser beam by the holding table displacement amount detection irradiation unit are different from the wavelength of the exposure laser beam by the exposure irradiation unit. The wavelength of the laser beam used other than the exposure of the substrate can be set outside the photosensitive region of the substrate. Therefore, it is possible to reduce the influence on the exposure by the laser beam leaking to the substrate. Further, it is possible to reduce the configuration such that the laser beam from the lens displacement amount detection irradiating means and the laser light from the holding table displacement amount detection irradiating means do not enter the substrate, for example, a component such as a light shielding plate.

  According to the invention, the holding table displacement amount detection optical member is provided on the holding table. The holding table displacement amount detection optical member needs to have a length that is approximately the same as the length of the substrate to be exposed in the predetermined movement direction. Therefore, when this holding member displacement amount detection optical member is provided on the mounting means, the mounting means cannot be reduced in size, but as in the present invention, the holding table displacement amount detection optical member is provided on the holding table. As a result, the mounting means can be reduced in size.

  Further, according to the present invention, the place where the laser beam by the holding table displacement amount detection irradiating means is reflected on the holding table displacement amount detection optical member is substantially in the same plane as the surface of the substrate. The amount of displacement above can be detected accurately.

  According to the invention, the holding table or the mounting means is provided with a reflecting plate having a reflecting surface perpendicular to the orthogonal direction. The mounting means or the holding stand is provided with a laser beam generating element for the reflector and an objective lens for the reflector. The reflection plate laser light generating element generates laser light and emits the laser light in an orthogonal direction. The reflecting plate objective lens condenses laser light from the reflecting plate laser light generating element and guides it to the reflecting plate. The light receiving means for the reflecting plate receives the laser light from the laser light generating element for the reflecting plate through the reflecting plate, and outputs a signal corresponding to the amount of light received. Since the holding table displacement amount detecting means is thus configured, a signal corresponding to the amount of displacement of the holding table in the orthogonal direction with respect to the mounting means can be obtained with a simple configuration.

  According to the invention, the laser light generating element for the reflecting plate is provided on the holding table or the mounting means, and the objective lens for the reflecting plate is provided on the mounting means or the holding table so as to be movable in the orthogonal direction. The reflecting plate objective lens driving means moves the reflecting plate objective lens in the orthogonal direction with respect to the mounting means or the holding table. The light receiving means for the reflecting plate receives the laser light from the laser light generating element for the reflecting plate through the reflecting plate, and outputs a signal corresponding to the amount of light received. The lens displacement control unit controls the objective lens driving unit for the reflecting plate so as to suppress a change in the distance between the objective lens for the reflecting plate and the reflecting plate based on the signal from the light receiving unit for the reflecting plate.

  The second holding table displacement amount detecting optical member moves together with the reflector objective lens. The second holding table displacement amount detection irradiating means is provided on the mounting means or the holding table, and irradiates laser light toward the second holding table displacement amount detection optical member. The second holding table displacement amount detection light receiving means receives the laser beam from the second holding table displacement amount detection means via the second holding table displacement amount detection optical member, and according to the received light amount. Output the signal.

  As described above, the holding table displacement amount detection means is controlled by the second holding table displacement amount detection light-receiving means in a state where the change in the distance between the reflecting plate objective lens and the reflection plate is suppressed by the lens displacement amount control means. Since a signal corresponding to the amount of received light is output, it is possible to obtain a signal corresponding to the amount of displacement in the orthogonal direction of the holding base with respect to the mounting means with a simple configuration.

  Also, according to the present invention, since the diffraction grating is used as the second holding table displacement amount detecting optical member, the holding table displacement amount detecting means can be realized by the same configuration as the optical pickup device of the optical disk. Therefore, the parts of the optical pickup device can be used for the holding table displacement detection means, and convenience is improved.

  According to the invention, the laser light generating element for the reflecting plate is provided on the holding table or the mounting means, and the objective lens for the reflecting plate is provided on the mounting means or the holding table so as to be movable in the orthogonal direction. The reflecting plate objective lens driving means moves the reflecting plate objective lens in the orthogonal direction with respect to the mounting means or the holding table. The light receiving means for the reflecting plate receives the laser light from the laser light generating element for the reflecting plate through the reflecting plate, and outputs a signal corresponding to the amount of light received. The lens displacement control unit controls the objective lens driving unit for the reflecting plate so as to suppress a change in the distance between the objective lens for the reflecting plate and the reflecting plate based on the signal from the light receiving unit for the reflecting plate.

  The second holding table displacement amount detecting optical member moves together with the reflector objective lens. The second holding table displacement amount detection irradiating means is provided on the mounting means or the holding table, and irradiates laser light toward the second holding table displacement amount detection optical member. The second holding table displacement amount detection light receiving means receives the laser beam from the second holding table displacement amount detection means via the second holding table displacement amount detection optical member, and according to the received light amount. Output the signal.

  As described above, the holding table displacement amount detection means is controlled by the second holding table displacement amount detection light-receiving means in a state where the change in the distance between the reflecting plate objective lens and the reflection plate is suppressed by the lens displacement amount control means. Since a signal corresponding to the amount of received light is output, it is possible to obtain a signal corresponding to the amount of displacement in the orthogonal direction of the holding base with respect to the mounting means with a simple configuration.

  Further, since the diffraction grating is used as the second holding table displacement amount detecting optical member, the holding table displacement amount detecting means can be realized by the same configuration as the optical pickup device of the optical disk. Therefore, the parts of the optical pickup device can be used for the holding table displacement detection means, and convenience is improved. Moreover, since the second holding table displacement amount detection optical member is a diffraction grating having the same grating pitch as the lens displacement amount detection optical member, the displacement amount of the holding table and the displacement amount of the objective lens for exposure are compared. Therefore, it is easy to control the irradiation position of the exposure laser beam.

  Further, according to the present invention, the wavelength of the laser beam by the lens displacement amount detecting irradiation unit, the wavelength of the laser beam by the reflecting plate laser beam generating element, and the wavelength of the laser beam by the second holding base displacement amount detecting unit are as follows. Since they are the same as each other, the types of optical components can be reduced. Further, since the wavelength of the laser beam by the lens displacement amount detection irradiating means and the wavelength of the laser light by the second holding base displacement amount detection irradiating means are the same, the signal from the lens displacement amount detection light receiving means and the second The signal by the holding table displacement amount light receiving means can be made the same, and the types of control parts can be reduced.

  Further, according to the present invention, the wavelength of the laser light by the lens displacement amount detection irradiation means, the wavelength of the laser light by the reflection plate laser light generating element, and the wavelength of the laser light by the second holding table displacement amount detection irradiation means are: Since the wavelength of the exposure laser beam by the exposure irradiation means is different, the wavelength of the laser beam used other than the exposure of the substrate can be set outside the photosensitive region of the substrate. Therefore, it is possible to reduce the influence on the exposure by the laser beam leaking to the substrate. Further, a configuration in which the laser beam from the lens displacement amount detection means, the laser light from the reflection plate laser light generating element, and the laser light from the second holding table displacement amount detection means does not enter the substrate, for example, light shielding Parts such as plates can be reduced.

  Moreover, according to this invention, a reflecting plate is provided in a holding stand. The reflecting plate needs to have a length comparable to the length of the substrate to be exposed in the predetermined moving direction. Therefore, when this reflecting plate is provided on the mounting means, the mounting means cannot be reduced in size, but the mounting means can be reduced in size by providing the reflecting plate on the holding base as in the present invention. be able to.

  Further, according to the present invention, the location where the laser light from the laser light generating element for the reflecting plate is reflected on the reflecting plate is in substantially the same plane as the surface of the substrate, so that the amount of displacement on the exposure surface can be accurately determined. Can be detected.

  Further, according to the present invention, since a plurality of exposure irradiation means are provided, the entire surface of the substrate can be exposed with a small number of reciprocating operations. In addition, since the exposure laser beams from the respective exposure irradiation means are irradiated independently to each other in an orthogonal direction on the surface of the substrate, an arbitrary exposure region can be formed.

  FIG. 1 is a perspective view showing a simplified configuration of an exposure apparatus 21 according to the first embodiment of the present invention. The exposure apparatus 21 of the present embodiment is used in a photolithography process. The substrate 22 to be exposed by the exposure device 21 has a plate-like body 23 and a photoresist film 24 formed on one surface of the plate-like body 23.

  The exposure apparatus 21 of the present embodiment includes a holding table 26, a plurality of exposure irradiation means 27, a laser array unit 28 as a mounting means, a holding table driving means 29 as a driving means, and a plurality of irradiation position movements. A plurality of objective lens driving means 30, a holding table displacement amount detecting means 31, a plurality of lens displacement amount detecting means 32, a plurality of X axis positioning controllers 35 as a plurality of control means, and a plurality of Z axes A positioning controller 36, a plurality of switching means 37 to be described later, and a main controller 38 are included.

  The holding table 26 holds the substrate 22 to be exposed horizontally. The substrate 22 to be exposed is held by a holding table 26 with the surface of the photoresist film 24 facing upward. The holding table driving unit 29 moves the holding table 26 in the X axis direction, the Y axis direction, and the Z axis direction with respect to a laser array unit 28 described later. These holding table 26 and holding table driving means 29 constitute an XYZ stage.

  In the present embodiment, the X axis and the Y axis are orthogonal to each other in a virtual plane parallel to the surface of the substrate 22 held by the holding table 26, and thus in a horizontal plane. The Z axis is orthogonal to the X axis and the Y axis. The Y-axis direction corresponds to a predetermined movement direction, and the X-axis direction corresponds to an orthogonal direction orthogonal to the predetermined movement direction in the virtual one plane.

  The holding table driving means 29 moves the holding table 26 in the X-axis direction and the Y-axis direction, and exposes and scans the entire surface of the substrate 22 held by the holding table 26 from end to end. Configured to be able to. In addition, the holding table driving means 29 can move the holding table 26 in the Z-axis direction and adjust the distance between the substrate 22 held by the holding table 26 and a laser array unit 28 described later before exposure. Configured as follows.

  The laser array unit 28 is provided above the XYZ stage, and thus above the holding table 26. The laser array unit 28 is equipped with a plurality of exposure irradiation means 27, a plurality of objective lens driving means 30, and a plurality of lens displacement amount detection means 32. The plurality of exposure irradiation means 27 are arranged at a predetermined interval L1 in the X-axis direction. The predetermined interval L1 is selected from 0.5 mm to 50 mm. The objective lens driving unit 30 is provided for each exposure irradiation unit 27. The lens displacement amount detection means 32 is provided for each exposure irradiation means 27.

  FIG. 2 is an enlarged view showing the vicinity of the exposure irradiation means 27. The exposure irradiation means 27 irradiates the exposure laser beam perpendicularly to the surface of the substrate 22 held by the holding table 26. The exposure laser beam from the exposure irradiation means 27 exposes the photoresist film 24 on the substrate 22 held on the holding table 26.

  The exposure irradiation means 27 includes an exposure semiconductor laser element 41 that is an exposure laser light generating element, a collimator lens 42, an exposure objective lens 43, a focus detector 44, and an objective lens holder 45. The semiconductor laser element 41 for exposure, the collimator lens 42 and the focus detector 44 are provided in the laser array unit 28. The exposure objective lens 43 is held by an objective lens holder 45. The objective lens holder 45 is provided so as to be movable in the X axis direction and the Z axis direction with respect to the laser array unit 28 by the objective lens driving means 30. Therefore, the exposure objective lens 43 is provided so as to be movable in the X-axis direction and the Z-axis direction with respect to the laser array unit 28.

  The exposure semiconductor laser element 41 generates exposure laser light. The optical axis of the exposure laser beam from the exposure semiconductor laser element 41 extends in the Z-axis direction. The exposure laser light is guided to the substrate 22 held by the holding table 26 through the collimator lens 42 and the exposure objective lens 43. The exposure laser beam guided to the substrate 22 held by the holding table 26 is reflected by the surface of the substrate 22 and guided to the focus detector 44 via the exposure objective lens 43 and the collimator lens 42. It is burned.

  The wavelength λ1 of the exposure laser beam by the exposure semiconductor laser element 41 is selected to be 405 nm. The collimator lens 42 converts the exposure laser light guided from the exposure semiconductor laser element 41 into parallel light, guides it to the exposure objective lens 43, and condenses the exposure laser light guided from the exposure objective lens 43. To the focus detector 44. The exposure objective lens 43 condenses the exposure laser light guided from the collimator lens 42 and guides it to the substrate 22 held by the holding table 26 and guides it from the substrate 22 held by the holding table 26. The exposed laser beam for exposure is converted into parallel light and guided to the collimator lens 42. The numerical aperture NA1 of the exposure objective lens 43 is selected to be 0.65. The minimum spot diameter D1 of the beam spot on the surface of the substrate 22 of the laser beam for exposure is approximately from the relationship between the wavelength λ1 of the laser beam for exposure by the semiconductor laser element 41 for exposure and the numerical aperture NA1 of the objective lens 43 for exposure. 0.5 μm.

  The focus detector 44 receives the exposure laser beam through the substrate 22 held by the holding table 26 and outputs a signal corresponding to the amount of received light. The focus detector 44 is configured to output a signal corresponding to the distance between the exposure objective lens 43 and the substrate 22 by an astigmatism method used for detecting a focus signal in an optical pickup device or the like. Is done. A signal from the focus detector 44 is given to a Z-axis positioning controller 36 described later.

The objective lens driving means 30 is provided in the laser array unit 28. The objective lens driving unit 30 moves the objective lens holder 45 of the exposure irradiation unit 27, and thus the exposure objective lens 43 held by the objective lens holder 45, in the X-axis direction and the Z-axis direction. The objective lens driving unit 30 includes, for example, an electromagnetic coil. The objective lens driving unit 30 moves the exposure objective lens 43 in the X-axis direction so that the exposure laser beam irradiation position on the surface of the substrate 22 by the exposure irradiation unit 27 is directed to the laser array unit 28. And configured to be movable in the X-axis direction. Further, the objective lens driving unit 30 can change the spot diameter of the beam spot on the surface of the substrate 22 of the exposure laser beam by the exposure irradiation unit 27 by moving the exposure objective lens 43 in the Z-axis direction. Configured to be able to.

  The lens displacement detection means 32 detects the displacement of the exposure objective lens 43 relative to the laser array unit 28 in the X-axis direction. The lens displacement amount detection means 32 includes a semiconductor laser element 48, an objective lens 49, a lens displacement amount detection optical member 50, and a detector 51 that is a lens displacement amount detection light receiving means. The semiconductor laser element 48 and the objective lens 49 constitute a lens displacement amount detection irradiation means. The semiconductor laser element 48, the objective lens 49 and the detector 51 are provided in the laser array unit 28. The lens displacement detection optical member 50 is provided in the objective lens holder 45 of the exposure irradiation means 27.

  The optical axis of the laser beam generated by the semiconductor laser element 48 extends in the Y-axis direction. This laser light is guided to the lens displacement detection optical member 50 through the objective lens 49. The laser beam guided to the lens displacement detection optical member 50 is reflected by the lens displacement detection optical member 50 and guided to the detector 51 through the objective lens 49.

  The wavelength λ2 of the laser light from the semiconductor laser element 48 is selected to be 635 nm. The objective lens 49 condenses the laser light guided from the semiconductor laser element 48 and guides it to the lens displacement detection optical member 50, and condenses the laser light guided from the lens displacement detection optical member 50. To the detector 51. The numerical aperture NA2 of the objective lens 49 is selected to be 0.6.

  The lens displacement detection optical member 50 is a plate-like member, and a plurality of grooves parallel to each other are formed on the surface portion thereof with a predetermined lattice pitch P1. The predetermined grating pitch P1 is selected to be 0.74 μm. The width W1 of the groove is the same as the width W2 of a portion between adjacent grooves (hereinafter referred to as a convex portion). Such a lens displacement detection optical member 50 is realized by a diffraction grating. The lens displacement detection optical member 50 is fixed to the objective lens holder 45 of the exposure irradiation means 27 and moves together with the objective lens holder 45.

  The objective lens holder 45 is formed with one side surface that is perpendicular to the optical axis of the laser beam from the semiconductor laser element 48 and thus perpendicular to the Y-axis direction. The lens displacement amount detecting optical member 50 is provided along the one side surface of the objective lens holder 45. In the state where the lens displacement amount detection optical member 50 is provided in the objective lens holder 45, the plurality of grooves extend in the Z-axis direction. The semiconductor laser element 48, the objective lens 49, and the lens displacement amount detection optical member 50 are respectively configured so that the laser light from the semiconductor laser element 48 can be condensed on the lens displacement amount detection optical member 50 by the objective lens 49. Be placed.

  The detector 51 receives laser light via the lens displacement amount detection optical member 50 and outputs a signal corresponding to the amount of received light. The detector 51 outputs a signal corresponding to the irradiation position on the lens displacement amount detection optical member 50 of the laser beam by the semiconductor laser element 48 by a method used for detecting a tracking signal in an optical pickup device or the like. Configured to be able to. The signal from the detector 51 changes according to the position of the objective lens holder 45 with respect to the laser array unit 28. A signal from the detector 51 is given to an X-axis positioning controller 35 described later.

  Referring again to FIG. 1, the holding table displacement detection means 31 detects the amount of displacement of the holding table 26 in the X-axis direction with respect to the laser array unit 28. The holding table displacement amount detection means 31 includes a semiconductor laser element 54, a collimator lens 55, an objective lens 56, a holding table displacement amount detection optical member 57, and a detector 58 which is a holding table displacement amount detection light receiving means. Including. The semiconductor laser element 54, the collimator lens 55, and the objective lens 56 constitute an irradiating means for detecting the holding table displacement. The semiconductor laser element 54, the collimator lens 55, the objective lens 56 and the detector 58 are provided in the laser array unit 28. The holding table displacement amount detecting optical member 57 is provided on the holding table 26.

  The optical axis of the laser beam generated by the semiconductor laser element 54 extends in the Z-axis direction. The laser light is guided to the holding table displacement amount detecting optical member 57 through the collimator lens 55 and the objective lens 56. The laser beam guided to the holding table displacement amount detection optical member 57 is reflected by the holding table displacement amount detection optical member 57 and guided to the detector 58 through the objective lens 56 and the collimator lens 55. .

  The wavelength λ3 of the laser light from the semiconductor laser element 54 is selected to be 635 nm. The collimator lens 55 converts the laser light guided from the semiconductor laser element 54 into parallel light and guides it to the objective lens 56, and condenses the laser light guided from the objective lens 56 and guides it to the detector 58. The objective lens 56 condenses the laser beam guided from the collimator lens 55 and guides it to the holding table displacement amount detecting optical member 57, and parallelizes the laser beam guided from the holding table displacement amount detection optical member 57. The light is led to the collimator lens 55. The numerical aperture NA3 of the objective lens 56 is selected to be 0.6.

  The holding base displacement amount detecting optical member 57 is a plate-like member, and a plurality of grooves parallel to each other are formed on the surface portion thereof with a predetermined lattice pitch P2. The predetermined lattice pitch P2 of the holding table displacement amount detecting optical member 57 is the same as the predetermined lattice pitch P1 of the lens displacement amount detecting optical member 50. That is, the predetermined lattice pitch P2 of the holding table displacement amount detection optical member 57 is selected to be 0.74 μm. The width W3 of the groove is the same as the width W4 of a portion between adjacent grooves (hereinafter referred to as a convex portion). Such an optical member 57 for detecting the displacement of the holding table is realized by a diffraction grating.

  The holding table displacement amount detection optical member 57 is fixed to the holding table 26 and moves together with the holding table 26. The place where the laser beam from the holding table displacement amount detection irradiating means is reflected on the holding table displacement amount detection optical member 57 lies in substantially the same plane as the surface of the substrate 22.

  In a state where the holding table displacement amount detecting optical member 57 is provided on the holding table 26, the plurality of grooves extend in the Y-axis direction. The semiconductor laser element 54, the collimator lens 55, the objective lens 56, and the holding table displacement amount detecting optical member 57 are arranged such that laser light from the semiconductor laser element 54 is transferred to the holding table displacement amount detecting optical member 57 by the objective lens 56 during scanning exposure. Each is arranged so that it can be condensed.

  The detector 58 receives the laser beam via the holding table displacement amount detection optical member 57 and outputs a signal corresponding to the received light amount. The detector 58 outputs a signal corresponding to the irradiation position of the laser beam to the holding table displacement amount detection optical member 57 by the semiconductor laser element 54 by a method used for detecting a tracking signal in an optical pickup device or the like. Configured to be able to. The signal from the detector 58 changes according to the position of the holding table 26 with respect to the laser array unit 28. A signal from the detector 58 is given to an X-axis positioning controller 35 described later.

  FIG. 3 is a graph showing the relationship between the irradiation position of the laser beam on the holding table displacement amount detection optical member 57 by the holding table displacement amount detection irradiation means and the signal from the detector 58 of the holding table displacement amount detection means 31. is there. In FIG. 3, the horizontal axis indicates the irradiation position in the X-axis direction on the holding table displacement amount detection optical member 57 of the laser beam by the holding table displacement amount detection irradiation means. With respect to the horizontal axis of the graph shown in FIG. 3, the center in the X-axis direction of one of the plurality of grooves formed in the holding table displacement amount detection optical member 57 is selected as the origin. The vertical axis indicates the value of the signal by the detector 58 of the holding table displacement amount detection means 31.

  As shown in FIG. 3, at the center of the groove, the value of the signal by the detector 58 is zero. The value of the signal is negative from the center of the groove to the center of the convex portion adjacent to one of the grooves in the X-axis direction. In addition, as the irradiation position moves from the center of the groove to one side in the X-axis direction, the absolute value of the signal gradually increases, and the holding member displacement amount detection optical member 57 moves from the center of the groove to one side in the X-axis direction. When the irradiation position moves by a distance corresponding to ¼ times the grating pitch P2, the signal value takes a minimum value. When the irradiation position further moves in one of the X-axis directions, the absolute value of the signal gradually decreases and becomes 0 again at the center of the convex portion.

  The signal value is positive from the center of the groove to the center of the convex portion adjacent to the other of the groove in the X-axis direction. Moreover, as the irradiation position moves from the center of the groove to the other side in the X-axis direction, the absolute value of the signal gradually increases, and the holding member displacement amount detecting optical member 57 moves from the center of the groove to the other side in the X-axis direction. When the irradiation position moves by a distance corresponding to 1/4 times the grating pitch P2, the signal value takes a maximum value. When the irradiation position further moves to the other side in the X-axis direction, the absolute value of the signal gradually decreases and becomes 0 again at the center of the convex portion.

  FIG. 3 shows the relationship between the irradiation position of the laser beam on the holding table displacement amount detection optical member 57 by the holding table displacement amount detection irradiation means and the signal by the detector 58 of the holding table displacement amount detection means 31. The relationship between the irradiation position of the laser light on the lens displacement detection optical member 50 by the displacement detection irradiation means and the signal from the detector 51 of the lens displacement detection means 32 is also as shown in FIG.

  4 is a block diagram showing the electrical configuration of the exposure apparatus 21, and FIG. 5 is a block diagram showing in detail the electrical configuration for controlling the position of the exposure objective lens 43 in the X-axis direction. FIG. 3 is a block diagram showing in detail an electrical configuration for controlling the position of the exposure objective lens 43 in the Z-axis direction. The main controller 38 controls the plurality of X-axis positioning controllers 35 and also controls the plurality of Z-axis positioning controllers 36. The main controller 38 controls the plurality of switching units 37 and controls the holding table driving unit 29.

  The switching means 37 is provided for each exposure semiconductor laser element 41. The main controller 38 can switch the switching modes of the respective switching means 37 independently of each other, and can control the respective on-off semiconductor laser elements 41 independently of each other. The X-axis positioning controller 35 is provided for each objective lens driving unit 30. The X-axis positioning controller 35 is used for exposure by the exposure irradiation unit 27 based on the displacement amount of the holding table 26 by the holding table displacement amount detection unit 31 and the displacement amount of the exposure objective lens 43 by the lens displacement amount detection unit 32. The objective lens driving unit 30 is controlled so as to suppress the change in the X-axis direction of the irradiation position of the laser beam. The Z-axis positioning controller 36 is provided for each objective lens driving unit 30. Based on the signal from the focus detector 44, the Z-axis positioning controller 36 controls the objective lens driving means 30 so that the spot diameter of the beam spot on the surface of the substrate 22 of the exposure laser beam becomes a desired size. To do.

  In the present embodiment, the change in the X-axis direction of the holding table 26 with respect to the laser array unit 28 is detected by the change in the amount of light received by the detector 58 of the holding table displacement detection means 31, and the change in position is detected with high accuracy. The exposure objective lens 43 is controlled so as to cancel out the change amount based on the change amount. Thereby, a change in the X-axis direction of the irradiation position of the exposure laser beam can be suppressed with high accuracy.

  Next, the exposure method by the exposure apparatus 21 of this Embodiment is demonstrated. FIG. 7 is a view showing a state in which the exposure apparatus 21 exposes the substrate 22. FIG. 8 is a plan view of the substrate 22 after the first scanning exposure, and FIG. 9 is a plan view of the substrate 22 during the second scanning exposure. 7-9, the black area | region on the surface of the board | substrate 22 is an exposure area | region exposed with the laser beam for exposure.

  When the holding base 26 is moved in the Y-axis direction by the holding base driving means 29, the substrate 22 is irradiated by the exposure irradiation means 27, thereby exposing the substrate 22. Thus, when the holding table 26 is moved in the Y-axis direction by the holding table driving means 29, when the substrate 22 is irradiated by the exposure irradiation means 27, the exposure laser light of the substrate 22 of the exposure laser light by the exposure irradiation means 27 is irradiated. The locus of the irradiation position on the surface extends in the Y-axis direction, and an exposure region 61 extending in the Y-axis direction is formed as shown in FIG. In FIG. 8, the exposure area 61 extends in the Y-axis direction. However, when the holding table 26 moves, an arbitrary area can be exposed by turning on and off the exposure semiconductor laser element 41 by the switching means 37. is there.

  Thereafter, each objective lens holder 45 is moved to a desired position in the X-axis direction by each objective lens driving means 30. After each objective lens holder 45 is moved, the holding table 26 is moved in the Y-axis direction by the holding table driving means 29 and the substrate 22 is irradiated by each exposure irradiation means 27. As a result, as shown in FIG. 9, another exposure region 62 is formed in a part of the unexposed region other than the exposure region 61 in FIG.

  The above-described operation is repeated within the range in which the objective lens holder 45 is movable in the X-axis direction. When exposing outside the movable range of the objective lens holder 45 in the X-axis direction, the holding table driving means 29 moves the holding table 26 and thus the substrate 22 held by the holding table 26 in the X-axis direction. Let Thereafter, the above-described operation is repeated. By repeating such an operation, scanning exposure is performed on the entire surface of the substrate 22.

  Next, positioning of the exposure objective lens 43 will be described. First, positioning of the exposure objective lens 43 in the Z-axis direction, that is, in the focus direction will be described. The exposure laser beam reflected by the surface of the substrate 22 is received by the focus detector 44. A signal from the focus detector 44 is given to the Z-axis positioning controller 36. The Z-axis positioning controller 36 controls the objective lens driving unit 30 by a control signal based on a signal from the focus detector 44. Since the position of the exposure objective lens 43 in the Z-axis direction is controlled by the Z-axis positioning controller 36 in this way, the exposure objective lens 43 can be positioned at a desired position in the Z-axis direction. Accordingly, it is possible to suppress a change in the distance between the exposure objective lens 43 and the surface of the substrate 22 caused by thickness variation, warpage, and undulation of the substrate 22 that occurs until the main exposure process, even during scanning exposure. As a result, the fluctuation of the spot diameter of the beam spot on the surface of the substrate 22 of the exposure laser beam is reduced, and high-accuracy and stable exposure is possible.

  FIG. 10 is a plan view showing an example of the exposure result when the substrate 22 is exposed by changing the spot diameter of the beam spot on the surface of the substrate 22 of the exposure laser beam during scanning exposure. In FIG. 10, among the black regions 63 on the surface of the substrate 22, a region 64 having a width in the X-axis direction is obtained when the distance between the exposure objective lens 43 and the surface of the substrate 22 is increased or decreased. This is the exposure area.

The exposure laser beam reflected by the surface of the substrate 22 is received by the focus detector 44. A signal from the focus detector 44 is given to the Z-axis positioning controller 36. Further, an offset signal can be given to the Z-axis positioning controller 36 from the main controller 38. The Z-axis positioning controller 36 controls the objective lens driving unit 30 by a control signal based on the signal from the focus detector 44 and the offset signal. Since the position of the exposure objective lens 43 in the Z-axis direction is controlled by the Z-axis positioning controller 36, the spot diameter of the beam spot on the surface of the substrate 22 of the exposure laser light is changed to an arbitrary size. Can be. As a result, the area of the region exposed by the exposure laser beam can be arbitrarily set.

  Also, since each Z-axis positioning controller 36 is provided for each objective lens driving means 30, the position of each exposure objective lens 43 in the Z-axis direction is controlled independently by each Z-axis positioning controller 36. The Therefore, during scanning exposure, the exposure area by each objective lens 43 for exposure can be made larger or smaller independently of each other.

  Next, the initial positioning of the irradiation position of the exposure laser beam in the X-axis direction will be described. First, the holding table 26 is moved in the X-axis direction with respect to the laser array unit 28 by the holding table driving unit 29 so that the signal from the detector 58 of the holding table displacement detecting unit 31 becomes zero. That is, the holding table 26 is placed on the laser array unit 28 so that the irradiation position of the laser beam by the holding table displacement amount detecting irradiation means is positioned at the center of the groove or the convex portion of the holding table displacement amount detection optical member 57. Deploy.

  FIG. 11 is a diagram schematically illustrating the lens displacement amount detection optical member 50. The initial positioning of the exposure objective lens 43 will be described with reference to FIG. FIG. 11 is a schematic view of the lens displacement detection optical member 50 as viewed from the Y-axis direction. FIG. 11 shows a target exposure position 66 on the substrate 22.

  The irradiation position of the exposure laser beam is closest to the target exposure position 66, and the laser beam from the lens displacement amount detection irradiation means is irradiated to the center of the groove or the convex portion of the lens displacement amount detection optical member 50. The objective lens holder 45 is moved by the objective lens driving means 30. When the objective lens holder 45 is placed in this arrangement, the output signal obtained from the detector 51 of the lens displacement amount detection means 32 is zero. At this time, the position error between the irradiation position of the exposure laser beam and the target exposure position 66 is ¼ or less of the grating pitch P1 of the lens displacement detection optical member 50. That is, the error is 0.185 μm or less, which is 1/4 of 0.74 μm.

  FIG. 12 is a graph showing signals by the detector 58 of the holding table displacement amount detection means 31. FIG. 13 is a view showing a beam spot 73 on the holding member displacement detection optical member 57 of the laser beam by the holding table displacement detection irradiating means, and FIG. 13 (1) shows that the holding table 26 is shifted in the X-axis direction. FIG. 13 (2) shows the previous state, and FIG. 13 (2) shows the state when the holding base 26 is shifted to one side in the X-axis direction, and FIG. 13 (3) is the state when the holding base 26 further shifts to one side in the X-axis direction. Shows the state. The positioning of the exposure laser beam in the X-axis direction during scanning exposure will be described with reference to FIGS. First, a signal obtained from the detector 58 of the holding table displacement amount detection means 31 when the holding table 26 is moved in the Y-axis direction for scanning exposure will be described.

  Before the scanning exposure, the holding table 26 and the laser array unit 28 are arranged so that the beam spot 73 is positioned at the center of the groove 75 of the holding table displacement amount detecting optical member 57 as shown in FIG. Has been. At this time, the signal from the detector 58 of the holding table displacement amount detection means 31 is the value at point 81 in FIG.

  When the holding table 26 is moved in the Y-axis direction by the holding table driving means 29, the holding table 26 is shaken in the X-axis direction. When the beam spot 73 by the irradiation means for detecting the displacement of the holding table shifts to the center of the convex portion 76 adjacent to the groove 75 as shown in FIG. The signal from 31 detectors 58 is the value at point 82 in FIG. When the beam spot 73 by the holding table displacement amount detection irradiating means is displaced to the center of the groove 77 adjacent to the convex portion 76 as shown in FIG. The signal from the detector 58 of the means 31 is the value at the point 83 in FIG.

  Next, a method for controlling the position of the exposure objective lens 43 in the X-axis direction by the X-axis positioning controller 35 will be described with reference to FIGS. During scanning exposure, when the signal from the detector 58 of the holding table displacement amount detection means 31 is between the point 86 and the point 87 in FIG. 12, the X-axis positioning controller 35 detects the lens displacement amount shown in FIG. The objective lens driving unit 30 is controlled so that the beam spot 90 by the irradiation unit is arranged at the center of the groove 68 of the lens displacement amount detection optical member 50.

  During scanning exposure, when the signal from the detector 58 of the holding table displacement amount detection means 31 is between the point 87 and the point 88 in FIG. 12, the beam spot 90 by the lens displacement amount detection irradiation means becomes the lens displacement. The X-axis positioning controller 35 gives a control signal to the objective lens driving means 30 so as to be arranged at the center of the convex portion 69 adjacent to one of the grooves 68 of the optical member 50 for detecting the amount. Thereafter, the X-axis positioning controller 35 controls the objective lens driving unit 30 so that the beam spot 90 by the lens displacement amount detecting irradiation unit is arranged at the center of the convex portion 69.

  During scanning exposure, when the signal from the detector 58 of the holding table displacement amount detection means 31 is between the point 88 and the point 89 in FIG. 12, the beam spot 90 by the lens displacement amount detection irradiation means becomes the lens displacement. The X-axis positioning controller 35 gives a control signal to the objective lens driving means 30 so as to be disposed in the center of the groove 70 adjacent to one of the convex portions 69. Thereafter, the X-axis positioning controller 35 controls the objective lens driving unit 30 so that the beam spot 90 by the lens displacement amount detecting irradiation unit is arranged at the center of the groove 70.

  Since the position of the exposure objective lens 43 is controlled by the X-axis positioning controller 35 in this way, the positioning accuracy of the irradiation position of the exposure laser light can be reduced to about 0.37 μm. In the present embodiment, the positioning accuracy of the irradiation position of the exposure laser beam is about 0.37 μm, but the predetermined grating pitch P1 of the lens displacement amount detection optical member 50 and the holding table displacement amount detection optical member 57 Positioning accuracy can be further improved by reducing the predetermined grating pitch P2 and changing the optical systems of the holding table displacement amount detection means 31 and the lens displacement amount detection means 32.

  As described above, according to the present embodiment, in the state where the substrate 22 is held by the holding table 26, the holding table 26 is relative to the laser array unit 28 in the Y-axis direction by the holding table driving unit 29. The surface of the substrate 22 is irradiated with the exposure laser beam by the exposure irradiation means 27 while being moved. At this time, the irradiation position of the exposure laser beam on the surface of the substrate 22 by the exposure irradiation means 27 moves in the Y-axis direction with respect to the surface of the substrate 22, whereby the substrate 22 is exposed. An exposure area is formed.

  The holding table displacement detection means 31 detects the amount of displacement of the holding table 26 in the X-axis direction relative to the laser array unit 28. The X-axis positioning controller 35 controls the objective so as to suppress the displacement of the irradiation position of the exposure laser beam on the holding table 26 in the X-axis direction based on the displacement amount of the holding table 26 by the holding table displacement detection means 31. The lens driving means 30 is controlled. Therefore, it is possible to suppress the irradiation position of the exposure laser light from being undesirably displaced in the X-axis direction relative to the holding table 26 due to disturbance, and an exposure region can be formed with high accuracy.

  Since the irradiation position of the exposure laser beam by the exposure irradiation means 27 is controlled by the X-axis positioning controller 35, the movement occurs when the holding table 26 is moved in the Y-axis direction with respect to the laser array unit 28. Even if the position of the holding base 26 in the X-axis direction with respect to the laser array unit 28 changes due to vibration or the like, the irradiation position of the exposure laser light is moved in real time with respect to the laser array unit 28, and this exposure laser A change in the X-axis direction of the light irradiation position can be suppressed. Therefore, it is possible to prevent the irradiation position of the exposure laser light from deviating from the desired exposure pattern, and it is possible to form the exposure region with high accuracy according to the desired exposure pattern.

  Further, according to the present embodiment, the irradiation position of the exposure laser beam by the exposure irradiation means 27 is moved by the movement of the exposure objective lens 43 with respect to the laser array unit 28, so that the exposure for the laser array unit 28 is performed. Compared with the case where the semiconductor laser element 41 is moved, the irradiation position of the exposure laser beam is easily moved. Further, since the exposure objective lens 43 can be reduced in size, the exposure objective lens 43 can be moved at high speed. Therefore, the irradiation position of the exposure laser beam can be changed at high speed, and the production efficiency can be improved.

  Further, according to the present embodiment, the displacement amount in the X-axis direction of the exposure objective lens 43 relative to the laser array unit 28 is detected by the lens displacement amount detection means 32. The X-axis positioning controller 35 is not only based on the displacement amount of the holding table 26 by the holding table displacement amount detection means 31 but also based on the displacement amount of the exposure objective lens 43 by the lens displacement amount detection means 32. The objective lens driving unit 30 is controlled so as to suppress the displacement of the irradiation position of the exposure laser beam 27 in the X-axis direction.

  In this way, the irradiation position of the exposure laser beam by the exposure irradiation means 27 is controlled by the X-axis positioning controller 35. Therefore, the temperature characteristics of the mechanism for moving the exposure objective lens 43, and the displacement due to changes over time. Variations can be suppressed. Further, by comparing the displacement amount of the holding table 26 and the displacement amount of the exposure objective lens 43, the irradiation position of the exposure laser beam can be controlled.

  Further, according to the present embodiment, the laser array unit 28 is provided with the lens displacement amount detection irradiation means. This lens displacement amount detection irradiating means irradiates laser light toward the lens displacement amount detection optical member 50. The lens displacement detection optical member 50 changes its optical characteristics in the X-axis direction and moves together with the exposure objective lens 43. The detector 51 of the lens displacement amount detection means 32 receives the laser beam from the lens displacement amount detection irradiation means via the lens displacement amount detection optical member 50 and outputs a signal corresponding to the received light amount. Since the lens displacement amount detection means 32 is thus configured, a signal corresponding to the displacement amount of the exposure objective lens 43 by the lens displacement amount detection means 32 can be obtained with a simple structure.

  Further, according to the present embodiment, since the diffraction grating is used as the lens displacement amount detection optical member 50, the lens displacement amount detection means 32 can be realized by the same configuration as the optical pickup device of the optical disk. Therefore, components of the optical pickup device can be used for the lens displacement amount detection means 32, and convenience is improved.

Further, according to the present embodiment, the holding table 26 is provided with the holding table displacement amount detection optical member 57, and the laser array unit 28 is provided with the holding table displacement amount detection irradiation means. The optical characteristics of the holding base displacement amount detecting optical member 57 change in the X-axis direction. The holding table displacement amount detection irradiation unit irradiates the holding table displacement amount detection optical member 57 with laser light. The detector 58 of the holding table displacement amount detection means 31 receives the laser beam from the holding table displacement amount detection irradiation means via the holding table displacement amount detection optical member 57 and outputs a signal corresponding to the received light amount. . Since the holding table displacement amount detecting means 31 is thus configured, a signal corresponding to the amount of displacement of the holding table 26 in the X-axis direction relative to the laser array unit 28 can be obtained with a simple configuration.

  Further, according to the present embodiment, since the diffraction grating is used as the holding table displacement amount detecting optical member 57, the holding table displacement amount detecting means 31 can be realized by the same configuration as the optical pickup device of the optical disk. . Therefore, the parts of the optical pickup device can be used for the holding table displacement amount detecting means 31, and convenience is improved.

  In addition, according to the present embodiment, the holding table displacement amount detection optical member 57 is a diffraction grating having the same grating pitch as the lens displacement amount detection optical member 50. Comparison with the displacement amount of the objective lens 43 is easy, and therefore the irradiation position of the exposure laser beam can be easily controlled.

  Further, according to the present embodiment, the wavelength λ2 of the laser beam by the lens displacement amount detection irradiating means and the wavelength λ3 of the laser beam by the holding table displacement amount detection irradiating means are the same, so the type of optical component is changed. Can be reduced. Further, since the wavelength λ2 of the laser light by the lens displacement amount detection irradiating means and the wavelength λ3 of the laser light by the holding table displacement amount detection irradiating means are the same, the signal from the detector 51 of the lens displacement amount detection means 32 and The signal by the detector 58 of the holding table displacement amount detection means 31 can be made the same, and the types of control parts can be reduced.

  Further, according to the present embodiment, the wavelength λ2 of the laser beam by the lens displacement amount detection irradiation unit and the wavelength λ3 of the laser beam by the holding table displacement amount detection irradiation unit are the wavelengths of the exposure laser beam by the exposure irradiation unit 27. Since it is different from λ 1, the wavelength of the laser beam used other than the exposure of the substrate 22 can be set outside the photosensitive region of the substrate 22. Therefore, it is possible to reduce the influence on the exposure due to the light leaking to the substrate 22. In addition, it is possible to reduce a configuration in which the laser beam from the lens displacement amount detection irradiating unit and the laser beam from the holding table displacement amount detection irradiating unit do not enter the substrate 22, for example, a component such as a light shielding plate.

  Further, according to the present embodiment, the holding table displacement amount detecting optical member 57 is provided on the holding table 26. The holding table displacement amount detecting optical member 57 needs to have a length comparable to the length of the substrate 22 to be exposed in the Y-axis direction. Therefore, when this holding table displacement amount detection optical member 57 is provided in the laser array unit 28, the laser array unit 28 cannot be reduced in size. By providing the optical member 57 on the holding table 26, the laser array unit 28 can be reduced in size.

  Further, according to the present embodiment, the place where the laser beam from the holding table displacement amount detection irradiating means is reflected on the holding table displacement amount detection optical member 57 is substantially in the same plane as the surface of the substrate 22. Therefore, the displacement amount on the exposure surface can be accurately detected.

  Further, according to the present embodiment, since a plurality of exposure irradiation means 27 are provided, the entire surface of the substrate 22 can be exposed with a small number of reciprocating operations. In addition, since the exposure laser beams from the respective exposure irradiation means 27 are irradiated independently to each other in the X-axis direction on the surface of the substrate 22, an arbitrary exposure region can be formed. .

  In the present embodiment, the X-axis positioning controller 35 controls the objective lens driving unit 30 so that the beam spot 90 by the lens displacement amount detection irradiation unit is arranged at the center of the grooves 68 and 70 or the convex portion 69. However, by using the offset signal, the objective lens driving unit 30 is controlled so that the beam spot 90 by the lens displacement amount detection irradiating unit is arranged at a position other than the center of the grooves 68 and 70 or the convex portion 69. It is also possible.

More specifically, the X-axis positioning controller 35 is given a signal from the detector 58 of the holding table displacement amount detection means 31. Further, an offset signal can be given to the X-axis positioning controller 35 from the main controller 38. The X-axis positioning controller 35 controls the objective lens driving unit 30 with a control signal based on the signal from the detector 58 of the holding table displacement amount detecting unit 31 and the offset signal, so that the beam by the lens displacement amount detecting irradiation unit is obtained. The spot 90 can be arranged at a position corresponding to the offset signal. Since the position of the exposure objective lens 43 in the X-axis direction is controlled by the X-axis positioning controller 35, the positioning accuracy of the irradiation position of the exposure laser beam can be further improved.

  In the present embodiment, the holding table displacement amount detection irradiating means is provided in the laser array unit 28, and the holding table displacement amount detecting optical member 57 is provided in the holding table 26. May be provided on the holding table 26, and the holding table displacement detection optical member 57 may be provided on the laser array unit 28. In the present embodiment, a plurality of exposure irradiation means 27 are provided, but the number of exposure irradiation means 27 may be one.

  FIG. 14 is a perspective view showing a simplified configuration of the exposure apparatus 201 according to the second embodiment of the present invention. Since exposure apparatus 201 of the present embodiment is similar to exposure apparatus 21 of the first embodiment described above, the same parts are denoted by the same reference numerals and description thereof is omitted.

  The exposure apparatus 201 of the present embodiment is configured by adding a holding base X-axis positioning controller 59 to the exposure apparatus 21 of the first embodiment described above. In the first embodiment described above, the signal from the detector 58 of the holding table displacement amount detection means 31 is given to the X-axis positioning controller 35. However, in this embodiment, the signal from the detector 58 is supplied to the holding table X. It is given to the axis positioning controller 59. In the present embodiment, the irradiation position moving means is realized by the holding table driving means 29 and the objective lens driving means 30, and the control means is realized by the holding table X-axis positioning controller 59 and the X-axis positioning controller 35.

  15 is a block diagram showing an electrical configuration of the exposure apparatus 201, FIG. 16 is a block diagram showing in detail an electrical configuration for controlling the position of the holding base 26 in the X-axis direction, and FIG. It is a block diagram which shows in detail the electrical structure for controlling the position of the X-axis direction of the objective lens 43 for exposure.

  The main controller 38 controls the plurality of X-axis positioning controllers 35 and also controls the plurality of Z-axis positioning controllers 36. The main controller 38 controls the plurality of switching units 37 and controls the holding table driving unit 29. Further, the main controller 38 controls the holding base X-axis positioning controller 59.

  The holding table X-axis positioning controller 59 causes the holding table driving means 29 to shift the holding table 26 in the X-axis direction relative to the laser array unit 28 based on the displacement amount of the holding table 26 by the holding table displacement amount detection means 31. Control to suppress.

  The X-axis positioning controller 35 controls the objective so as to suppress the displacement of the exposure objective lens 43 relative to the laser array unit 28 in the X-axis direction based on the displacement amount of the exposure objective lens 43 by the lens displacement amount detection means 32. The lens driving means 30 is controlled.

  In the present embodiment, the change in the X-axis direction of the holding table 26 relative to the laser array unit 28 is detected based on the change in the amount of light received by the detector 58 of the holding table displacement detection means 31, and the change in position is detected with high accuracy. And the holding table 26 is controlled based on the change amount so as to cancel the change amount. Further, the displacement of the exposure objective lens 43 relative to the laser array unit 28 is detected by the change in the amount of light received by the detector 51 of the lens displacement amount detection means 32, and the change in position is tracked with high accuracy. Based on the amount of change, the exposure objective lens 43 is controlled to cancel the amount of change. Thereby, a change in the X-axis direction of the irradiation position of the exposure laser beam can be suppressed with high accuracy.

  Since the exposure method by the exposure apparatus 201 of the present embodiment is the same as the exposure method by the exposure apparatus 21 of the first embodiment described above, description thereof is omitted.

  When the holding table 26 is moved in the Y-axis direction by the holding table driving means 29, the holding table 26 is shaken in the X-axis direction. Due to this shaking, the output of the holding table displacement amount detection means 31 changes. The holding table X-axis positioning controller 59 controls the holding table driving means 29 so that the output of the holding table displacement amount detecting means 31 is constant, for example, always zero. As a result, the displacement of the holding base 26 relative to the laser array unit 28 in the X-axis direction can be suppressed.

  When the holding base 26 is moved in the Y-axis direction by the holding base driving means 29, the X-axis positioning controller 35 controls the output of the lens displacement amount detecting means 32 to be constant, for example, always zero. Thereby, displacement of the exposure objective lens 43 with respect to the laser array unit 28 in the X-axis direction can be suppressed.

  Therefore, the displacement of the irradiation position of the exposure laser beam on the holding table 26 in the X-axis direction can be suppressed, and the positional deviation of the exposure laser beam due to the vibration of the exposure apparatus 201 can be suppressed. According to this embodiment, when the holding table 26 is moved in the Y-axis direction by the holding table driving unit 29, the exposure irradiation unit 27 is relatively moved in the X-axis direction with respect to the laser array unit 28. A desired exposure pattern can be drawn without being moved.

  FIG. 18 is a perspective view showing a simplified configuration of an exposure apparatus 101 according to the third embodiment of the present invention. Since exposure apparatus 101 of the present embodiment is similar to exposure apparatus 21 of the first embodiment described above, the same parts are denoted by the same reference numerals and description thereof is omitted. In the present embodiment, instead of the holding table displacement amount detection means 31 of the first embodiment described above, the following holding table displacement amount detection means 102 is used.

  FIG. 19 is an enlarged view showing the vicinity of the holding table displacement amount detection means 102. The holding table displacement detection means 102 detects the amount of displacement in the X-axis direction of the holding table 26 with respect to the laser array unit 28. The holding table displacement amount detecting means 102 includes a reflecting plate 105, a reflecting plate semiconductor laser element 106 that is a reflecting plate laser light generating element, a collimator lens 107, a reflecting plate objective lens 108, and a reflecting plate objective. A lens driving unit 109, a reflecting plate detector 110 as a reflecting plate light receiving unit, a reflecting plate X-axis positioning controller 111 as a lens displacement control unit, and a second holding table displacement detecting optical member 112. A second holding table displacement amount detecting irradiation unit 113, a second holding table displacement amount detecting detector 114 serving as a second holding table displacement amount detecting light receiving unit, and an objective lens holder 116. .

  The reflector semiconductor laser element 106, the collimator lens 107, and the reflector detector 110 are provided in the laser array unit 28. The reflector objective lens 108 is held by an objective lens holder 116. The objective lens holder 116 is provided so as to be movable in the X-axis direction with respect to the laser array unit 28 by the reflector objective lens driving means 109. Therefore, the reflector objective lens 108 is movable in the X-axis direction with respect to the laser array unit 28. The second holding table displacement amount detection irradiation means 113 and the second holding table displacement amount detection detector 114 are provided in the laser array unit 28. The reflection plate 105 has a reflection surface perpendicular to the X-axis direction and moves together with the holding table 26.

  The optical axis of the laser beam from the semiconductor laser element for reflecting plate 106 extends in the X-axis direction. This laser light is guided to the reflecting plate 105 through the collimator lens 107 and the reflecting plate objective lens 108. The laser light guided to the reflecting plate 105 is reflected by the reflecting plate 105 and guided to the reflecting plate detector 110 through the reflecting plate objective lens 108 and the collimator lens 107. The place where the laser light from the semiconductor laser element 106 for a reflecting plate is reflected on the reflecting plate 105 is in the same plane as the surface of the substrate 22.

  The wavelength λ4 of the laser light from the semiconductor laser element 106 for reflecting plate is selected to be 635 nm. The collimator lens 107 converts the laser light guided from the semiconductor laser element 106 for the reflecting plate into parallel light and guides it to the reflecting plate objective lens 108, and condenses the laser light guided from the reflecting plate objective lens 108. It guides to the detector 110 for reflecting plates. The reflector objective lens 108 collects the laser beam guided from the collimator lens 107 and guides it to the reflector plate 105, and guides the laser beam guided from the reflector plate 105 to the collimator lens 107 as parallel light. The reflector 105 is realized by a mirror. The reflection plate detector 110 receives the laser light via the reflection plate 105 and outputs a signal corresponding to the amount of light received. The reflector detector 110 can output a signal corresponding to the distance between the reflector objective lens 108 and the reflector 105 by an astigmatism method used for detecting a focus signal in an optical pickup device or the like. it can. The signal from the reflector detector 110 is given to the reflector X-axis positioning controller 111 described later.

  The reflector objective lens driving means 109 is provided in the laser array unit 28. The reflector objective lens driving means 109 moves the objective lens holder 116, and thus the reflector objective lens 108 held by the objective lens holder 116, in the X-axis direction.

  The reflection plate X-axis positioning controller 111 generates a control signal based on a signal from the reflection plate detector 110 and supplies the control signal to the reflection plate objective lens driving means 109. The reflector objective lens driving unit 109 moves the reflector objective lens 108 based on a control signal from the reflector X-axis positioning controller 111. In this way, the reflection plate X-axis positioning controller 111 controls the distance between the reflection plate objective lens 108 and the reflection plate 105 to be constant.

  The second holding table displacement amount detection irradiation means 113 includes a second holding table displacement amount detection semiconductor laser element 121 and a second holding table displacement amount detection objective lens 122. The optical axis of the laser beam generated by the second holding table displacement amount detection semiconductor laser element 121 extends in the Y-axis direction. The laser light is guided to the second holding table displacement amount detecting optical member 112 via the second holding table displacement amount detection objective lens 122. The laser beam guided to the second holding table displacement amount detection optical member 112 is reflected by the second holding table displacement amount detection optical member 112, and the second holding table displacement amount detection objective lens 122. To the second holding table displacement amount detector 114.

  The wavelength λ5 of the laser beam emitted from the second holding table displacement detection semiconductor laser element 121 is selected to be 635 nm. The second holding table displacement amount detection objective lens 122 condenses the laser light guided from the second holding table displacement amount detection semiconductor laser element 121 and the second holding table displacement amount detection optical member 112. The laser beam guided from the second holding table displacement amount detecting optical member 112 is condensed and guided to the second holding table displacement amount detector 114. The numerical aperture NA4 of the second holding table displacement amount detection objective lens 122 is selected to be 0.6.

  The second holding table displacement amount detection optical member 112 is a plate-like member, and a plurality of grooves parallel to each other are formed on the surface portion thereof with a predetermined lattice pitch P3. The predetermined grating pitch P3 of the second holding table displacement amount detecting optical member 112 is the same as the predetermined grating pitch P1 of the lens displacement amount detecting optical member 50. That is, the predetermined lattice pitch P3 of the second holding table displacement amount detecting optical member 112 is selected to be 0.74 μm. The width W5 of the groove is the same as the width W6 of a portion between adjacent grooves (hereinafter referred to as a convex portion). Such a second holding table displacement amount detection optical member 112 is realized by a diffraction grating. The second holding table displacement amount detection optical member 112 is fixed to the objective lens holder 116 and moves together with the objective lens holder 116.

  The objective lens holder 116 is formed with one side surface perpendicular to the optical axis of the laser beam emitted from the second holding table displacement amount detecting semiconductor laser element 121 and thus perpendicular to the Y-axis direction. The second holding table displacement amount detection optical member 112 is provided along the one side surface of the objective lens holder 116. Further, in a state where the second holding table displacement amount detection optical member 112 is provided in the objective lens holder 116, the plurality of grooves extend in the Z-axis direction. The second holding table displacement amount detection semiconductor laser element 121, the second holding table displacement amount detection objective lens 122, and the second holding table displacement amount detection optical member 112 are used for detecting the second holding table displacement amount. The laser beams from the semiconductor laser elements 121 are respectively arranged so as to be condensed on the second holding table displacement amount detection optical member 112 by the second holding table displacement amount detection objective lens 122.

  The second holding table displacement amount detection detector 114 receives the laser beam via the second holding table displacement amount detection optical member 112 and outputs a signal corresponding to the received light amount. The second holding table displacement amount detector 114 detects the second laser beam emitted from the second holding table displacement amount detection semiconductor laser element 121 by a method used for detecting a tracking signal in an optical pickup device or the like. A signal corresponding to the irradiation position on the holding table displacement amount detection optical member 112 can be output. The signal from the second holding table displacement amount detection detector 114 depends on the position of the objective lens holder 116 with respect to the laser array unit 28, and thus the position of the reflector objective lens 108 held by the objective lens holder 116. Change. A signal from the second holding table displacement amount detector 114 is given to the X-axis positioning controller 35. When the reflector objective lens 108 moves in the X-axis direction with respect to the laser array unit 28, the output signal obtained from the second holding table displacement amount detector 114 is as shown in FIG.

  FIG. 20 is a view showing a state in which the exposure apparatus 101 exposes the substrate 22. The exposure apparatus 101 of the present embodiment exposes the substrate 22 by the same exposure method as that of the exposure apparatus 21 of the above-described embodiment, and thus the description of the exposure method is omitted.

  As described above, according to the present embodiment, the semiconductor laser element 106 for reflector is provided in the laser array unit 28, and the objective lens 108 for reflector is movable in the X-axis direction with respect to the laser array unit 28. Provided. The reflector objective lens driving means 109 moves the reflector objective lens 108 in the X-axis direction with respect to the laser array unit 28. The reflector detector 110 receives the laser light from the reflector semiconductor laser element 106 via the reflector 105 and outputs a signal corresponding to the amount of received light. The reflection plate X-axis positioning controller 111 suppresses the change in the distance between the reflection plate objective lens 108 and the reflection plate 105 by using the reflection plate objective lens driving unit 109 based on the signal from the reflection plate detector 110. To control.

  The second holding table displacement amount detection optical member 112 moves together with the reflector objective lens 108. The second holding table displacement amount detection irradiation means 113 is provided in the laser array unit 28 and irradiates the second holding table displacement amount detection optical member 112 with laser light. The second holding table displacement amount detection detector 114 receives the laser beam from the second holding table displacement amount detection irradiation means 113 via the second holding table displacement amount detection optical member 112 and receives the light. A signal corresponding to the amount is output.

  As described above, the holding table displacement amount detecting means 102 is the second holding table in a state where the change in the distance between the reflecting plate objective lens 108 and the reflecting plate 105 is suppressed by the reflecting plate X-axis positioning controller 111. Since a signal corresponding to the amount of received light is output by the displacement detection detector 114, a signal corresponding to the amount of displacement of the holding base 26 in the X-axis direction relative to the laser array unit 28 can be obtained with a simple configuration.

  Further, according to the present embodiment, since the diffraction grating is used as the second holding table displacement amount detection optical member 112, the holding table displacement amount detection means 102 is realized by the same configuration as the optical pickup device of the optical disk. be able to. Therefore, parts of the optical pickup device can be used for the holding table displacement amount detection means 102, and convenience is improved.

  Further, according to the present embodiment, the second holding table displacement amount detection optical member 112 is a diffraction grating having the same grating pitch as the lens displacement amount detection optical member 50, and therefore the displacement amount of the holding table 26. And the amount of displacement of the exposure objective lens 43 can be easily compared, and the irradiation position of the exposure laser beam can be easily controlled.

  Further, according to the present embodiment, the wavelength λ2 of the laser beam by the lens displacement amount detection irradiating means, the wavelength λ4 of the laser light by the semiconductor laser element 106 for the reflector, and the second holding table displacement amount detecting irradiating means 113 are used. Since the wavelengths λ5 of the laser beams are the same, the types of optical components can be reduced. Further, since the wavelength λ2 of the laser light by the lens displacement amount detection irradiating means and the wavelength λ5 of the laser light by the second holding stand displacement amount detection irradiating means 113 are the same, the detector of the lens displacement amount detection means 32 The signal by 51 and the signal by the second holding stand displacement detection detector 114 can be made similar, and the types of control components can be reduced.

  Further, according to the present embodiment, the wavelength λ2 of the laser beam by the lens displacement amount detection irradiating means, the wavelength λ4 of the laser light by the semiconductor laser element 106 for the reflector, and the second holding table displacement amount detecting irradiating means 113 are used. Since the wavelength λ 5 of the laser beam is different from the wavelength λ 1 of the exposure laser beam by the exposure irradiation means 27, the wavelength of the laser beam used other than the exposure of the substrate 22 can be outside the photosensitive region of the substrate 22. Therefore, it is possible to reduce the influence on the exposure due to the light leaking to the substrate 22. Also, a configuration in which the laser light from the lens displacement amount detection irradiation means, the laser light from the reflector semiconductor laser element 106, and the laser light from the second holding table displacement amount detection irradiation means 113 are not applied to the substrate 22, For example, parts such as a light shielding plate can be reduced.

  Further, according to the present embodiment, the reflecting plate 105 is provided on the holding table 26. The reflecting plate 105 needs to have a length comparable to the length of the substrate 22 to be exposed in the Y-axis direction. Therefore, when the reflecting plate 105 is provided in the laser array unit 28, the laser array unit 28 cannot be reduced in size, but when the reflecting plate 105 is provided in the holding base 26 as in the present embodiment, Miniaturization of the laser array unit 28 can be realized.

  Further, according to the present embodiment, the location where the laser beam from the semiconductor laser element 106 for reflecting plate is reflected on the reflecting plate 105 is in the same plane as the surface of the substrate 22, so the displacement on the exposure surface The amount can be detected accurately.

  In the present embodiment, the remaining part of the holding table displacement amount detection means 102 excluding the reflecting plate 105 is provided in the laser array unit 28 and the reflecting plate 105 is provided in the holding table 26. However, the reflecting plate 105 is provided in the laser array unit. The remaining part of the holding table displacement amount detecting means 102 except for the reflection plate 105 may be provided on the holding table 26.

  The exposure apparatus according to the fourth embodiment of the present invention is similar to the exposure apparatus 101 according to the third embodiment described above, and only different points will be described, and description of similar configurations will be omitted. The holding table displacement amount detecting means in the exposure apparatus of the present embodiment includes the reflecting plate objective lens driving means 109 and the reflecting plate X axis from the holding table displacement amount detecting means 102 in the exposure apparatus 101 of the above-described embodiment. The configuration excluding the positioning controller 111, the second holding table displacement amount detection optical member 112, the second holding table displacement amount detection irradiation means 113, and the second holding table displacement amount detection detector 114. It has become.

  In the exposure apparatus of the present embodiment, the objective lens holder 116 of the holding table displacement detection means is fixedly provided on the laser array unit 28, and a signal from the reflector detector 110 is given to the X-axis positioning controller 35. According to the present embodiment, a signal corresponding to the amount of displacement of the holding base 26 in the X-axis direction with respect to the laser array unit 28 can be obtained with a simple configuration, and the same as in the previous embodiment. The effect can be achieved.

  FIG. 21 is a perspective view showing a simplified configuration of an exposure apparatus 301 according to the fifth embodiment of the present invention. Since exposure apparatus 301 of the present embodiment is similar to exposure apparatus 101 of the third and fourth embodiments described above, the same parts are denoted by the same reference numerals and description thereof is omitted.

  The exposure apparatus 301 of the present embodiment is configured by adding a holding base X-axis positioning controller 59 to the exposure apparatus of the fourth embodiment described above. In the fourth embodiment, the signal from the reflector detector 110 is given to the X-axis positioning controller 35. However, in this embodiment, the signal from the reflector detector 110 is sent to the holding base X-axis positioning controller 59. Given. In the present embodiment, the irradiation position moving means is realized by the holding table driving means 29 and the objective lens driving means 30, and the control means is realized by the holding table X-axis positioning controller 59 and the X-axis positioning controller 35.

  The main controller 38 controls the plurality of X-axis positioning controllers 35 and also controls the plurality of Z-axis positioning controllers 36. The main controller 38 controls the plurality of switching units 37 and controls the holding table driving unit 29. Further, the main controller 38 controls the holding base X-axis positioning controller 59.

  The holding table X-axis positioning controller 59 moves the holding table driving means 29 in the X-axis direction relative to the laser array unit 28 of the holding table 26 based on the displacement amount of the holding table 26 by the holding table displacement detection means 102. Control to suppress.

  The X-axis positioning controller 35 controls the objective so as to suppress the displacement of the exposure objective lens 43 relative to the laser array unit 28 in the X-axis direction based on the displacement amount of the exposure objective lens 43 by the lens displacement amount detection means 32. The lens driving means 30 is controlled.

  In the present embodiment, the displacement of the holding table 26 in the X-axis direction with respect to the laser array unit 28 is detected by the change in the amount of light received by the reflector detector 110 of the holding table displacement detection means 102, and the position changes. Is tracked with high accuracy, and the holding table 26 is controlled based on the change amount so as to cancel the change amount. Further, the displacement of the exposure objective lens 43 relative to the laser array unit 28 is detected by the change in the amount of light received by the detector 51 of the lens displacement amount detection means 32, and the change in position is tracked with high accuracy. Based on the amount of change, the exposure objective lens 43 is controlled to cancel the amount of change. Thereby, a change in the X-axis direction of the irradiation position of the exposure laser beam can be suppressed with high accuracy.

  Since the exposure method by the exposure apparatus 301 of the present embodiment is the same as the exposure method by the exposure apparatus 21 of the first embodiment described above, description thereof is omitted.

  When the holding table 26 is moved in the Y-axis direction by the holding table driving means 29, the holding table 26 is shaken in the X-axis direction. Due to this shaking, the output of the holding table displacement amount detection means 102 changes. The holding table X-axis positioning controller 59 controls the holding table driving means 29 so that the output of the holding table displacement amount detecting means 102 is constant and always zero. As a result, the displacement of the holding base 26 relative to the laser array unit 28 in the X-axis direction can be suppressed.

  When the holding base 26 is moved in the Y-axis direction by the holding base driving means 29, the X-axis positioning controller 35 controls the output of the lens displacement amount detecting means 32 to be constant, for example, always zero. Thereby, displacement of the exposure objective lens 43 with respect to the laser array unit 28 in the X-axis direction can be suppressed.

  Therefore, the displacement of the irradiation position of the exposure laser beam on the holding table 26 in the X-axis direction can be suppressed, and the positional deviation of the exposure laser beam due to the vibration of the exposure apparatus 201 can be suppressed. According to this embodiment, when the holding table 26 is moved in the Y-axis direction by the holding table driving unit 29, the exposure irradiation unit 27 is relatively moved in the X-axis direction with respect to the laser array unit 28. A desired exposure pattern can be drawn without being moved.

  In each of the above-described embodiments, although the displacement of the irradiation position of the exposure laser beam on the holding base 26 in the X-axis direction is suppressed, the irradiation position of the exposure laser light on the holding base 26 is predetermined with respect to the X-axis direction. It only has to be maintained in position. The predetermined position may be unchanged as in the above-described embodiments, or may be changed. Specifically, when the holding table 26 is moved in the Y-axis direction with respect to the laser array unit 28, the irradiation position of the exposure laser beam on the holding table 26 may be changed with respect to the X-axis direction. The irradiation position of the exposure laser beam on the holding table 26 may be moved at a predetermined speed in the X-axis direction.

  In each of the above-described embodiments, the objective lens driving unit 30 which is the irradiation position moving unit moves the exposure objective lens 43 of the exposure irradiation unit 27 in the X-axis direction with respect to the laser array unit 28. It is only necessary that the irradiation position of the exposure laser beam can be moved relative to the holding table 26 in the X-axis direction. For example, the entire exposure irradiation unit 27 may be moved in the X-axis direction with respect to the laser array unit 28 by the irradiation position moving unit. In this case, instead of the lens displacement amount detection means 32, an irradiation displacement amount detection means for detecting the displacement amount in the X-axis direction of the exposure irradiation means 27 with respect to the laser array unit 28 is used.

  The embodiment disclosed this time should be considered as illustrative in all points and not restrictive. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

It is a perspective view which simplifies and shows the structure of the exposure apparatus 21 of Embodiment 1 of this invention. It is a figure which expands and shows the vicinity of the irradiation means 27 for exposure. 6 is a graph showing a relationship between an irradiation position of laser light on a holding table displacement amount detection optical member 57 by a holding table displacement amount detection irradiation unit and a signal from a detector 58 of the holding table displacement amount detection unit 31; 2 is a block diagram showing an electrical configuration of an exposure apparatus 21. FIG. It is a block diagram which shows in detail the electrical structure for controlling the position of the X-axis direction of the objective lens 43 for exposure. It is a block diagram which shows in detail the electrical structure for controlling the position of the Z-axis direction of the objective lens 43 for exposure. It is a figure which shows the state which the exposure apparatus 21 has exposed the board | substrate 22. FIG. It is a top view of the board | substrate 22 after the 1st scanning exposure. It is a top view of the board | substrate 22 in 2nd scanning exposure. It is a top view which shows an example of the exposure result when changing the spot diameter of the beam spot in the surface of the board | substrate 22 of the laser beam for exposure during scanning exposure, and exposing the board | substrate 22. FIG. It is a figure which shows typically the optical member 50 for lens displacement amount detection. It is a graph which shows the signal by the detector 58 of the holding stand displacement amount detection means 31. It is a figure which shows the beam spot 73 in the optical member 57 for holding stand displacement amount detection of the laser beam by the irradiation means for holding stand displacement amount detection. It is a perspective view which simplifies and shows the structure of the exposure apparatus 201 of the 2nd Embodiment of this invention. 2 is a block diagram showing an electrical configuration of an exposure apparatus 201. FIG. It is a block diagram which shows in detail the electrical structure for controlling the position of the X-axis direction of the holding stand 26. FIG. It is a block diagram which shows in detail the electrical structure for controlling the position of the X-axis direction of the objective lens 43 for exposure. It is a perspective view which simplifies and shows the structure of the exposure apparatus 101 of the 3rd Embodiment of this invention. It is a figure which expands and shows the holding stand displacement amount detection means 102 vicinity. It is a figure which shows the state which the exposure apparatus 101 is exposing the board | substrate 22. FIG.

It is a perspective view which simplifies and shows the structure of the exposure apparatus 301 of Embodiment 5 of this invention. 2 is a perspective view of an exposure apparatus 1 disclosed in Patent Document 1. FIG. It is a figure which shows typically the exposure result by the exposure apparatus 1 of patent document 1. FIG.

Explanation of symbols

21, 101, 201, 301 Exposure apparatus 22 Substrate 26 Holding stand 27 Exposure irradiation means 28 Laser array unit 29 Driving means 30 Objective lens driving means 31, 102 Holding stand displacement detection means 32 Lens displacement detection means 35 X-axis positioning Controller 36 Z-axis positioning controller 41 Semiconductor laser element for exposure 42 Collimator lens 43 Objective lens for exposure 44 Focus detector 45 Objective lens holder 48 Semiconductor laser element 49 Objective lens 50 Lens displacement detection optical member 51 Detector 54 Semiconductor laser element 55 collimator lens 56 objective lens 57 optical member for detecting displacement of holding table 58 detector 59 holding table X-axis positioning controller 105 reflector 106 semiconductor laser element for reflector 107 collimator lens 108 reflector Objective lens 109 Reflective plate objective lens driving means 110 Reflective plate detector 111 Reflective plate X-axis positioning controller 112 Second holding stand displacement amount detecting optical member 113 Second holding stand displacement amount detecting irradiation means 114 First Reference numeral 2 denotes a detector for detecting the displacement of the holding table 121 Semiconductor laser element for detecting the amount of displacement of the second holding table 122 Objective lens for detecting the amount of displacement of the second holding table

Claims (27)

A holding table for holding a substrate to be exposed;
An exposure irradiation means for irradiating the exposure laser beam perpendicularly to the surface of the substrate held by the holding table;
Mounting means for mounting the irradiation means for exposure;
Drive means for moving the holding base relative to the mounting means in a predetermined movement direction within a virtual plane parallel to the surface of the substrate;
Irradiation position moving means for moving the irradiation position of the exposure laser beam on the surface of the substrate by the exposure irradiation means relative to the holding base in an orthogonal direction orthogonal to the predetermined movement direction within the virtual one plane. When,
An exposure apparatus comprising: control means for controlling the irradiation position moving means so as to maintain the irradiation position of the exposure laser beam on the holding table at a predetermined position with respect to the orthogonal direction. A holding table displacement amount detecting means for detecting a displacement amount of the holding table in the orthogonal direction with respect to the mounting means;
The control means controls the irradiation position moving means so as to suppress the displacement of the irradiation position of the exposure laser beam with respect to the holding table in the orthogonal direction based on the amount of displacement of the holding table by the holding table displacement detection means. 2. The exposure apparatus according to claim 1, wherein the exposure apparatus is controlled.   The irradiation position moving means moves the irradiation position of the exposure laser light relative to the holding base in the orthogonal direction by moving the holding base relative to the mounting means in the orthogonal direction. 3. An exposure apparatus according to claim 2, wherein   The irradiation position moving means moves the exposure irradiation means relative to the mounting means relative to the orthogonal direction, thereby moving the exposure laser light irradiation position relative to the holding table relative to the orthogonal direction. The exposure apparatus according to claim 2, wherein the exposure apparatus is moved. An irradiation displacement amount detecting means for detecting a displacement amount in the orthogonal direction of the irradiation means for exposure with respect to the mounting means;
The control means is for exposure relative to the mounting means in the orthogonal direction based on the displacement amount of the holding base by the holding base displacement amount detection means and the displacement amount of the exposure irradiation means by the irradiation displacement amount detection means. 3. The exposure according to claim 2, wherein the irradiation position moving means is controlled so as to suppress a displacement of the irradiation position of the exposure laser beam with respect to the holding table in the orthogonal direction by moving the irradiation means. apparatus. An irradiation displacement amount detecting means for detecting a displacement amount in the orthogonal direction of the irradiation means for exposure with respect to the mounting means;
The control unit suppresses the displacement of the holding table in the orthogonal direction with respect to the mounting unit based on the amount of displacement of the holding table by the holding table displacement detection unit, and the displacement of the exposure irradiation unit by the irradiation displacement amount detection unit. 3. An exposure apparatus according to claim 2, wherein the irradiation position moving means is controlled so as to suppress displacement of the exposure irradiation means relative to the mounting means in the orthogonal direction based on the amount. A holding table for holding a substrate to be exposed;
An exposure irradiation means for irradiating the exposure laser beam perpendicularly to the surface of the substrate held by the holding table;
Mounting means for mounting the irradiation means for exposure;
Drive means for moving the holding base relative to the mounting means in a predetermined movement direction within a virtual plane parallel to the surface of the substrate;
An irradiation displacement amount detection means for detecting a displacement amount in an orthogonal direction orthogonal to the predetermined movement direction on the virtual one plane of the exposure irradiation means relative to the mounting means;
An irradiation position moving means for moving the exposure irradiation means relative to the mounting means in the orthogonal direction;
Control means for controlling the irradiation position moving means so as to suppress the displacement of the exposure irradiation means relative to the mounting means in the orthogonal direction based on the displacement amount of the exposure irradiation means by the irradiation displacement amount detection means. An exposure apparatus characterized by the above. The exposure irradiation means is provided in the mounting means, and the exposure laser light generating element for generating the exposure laser light and the mounting means is provided movably in the orthogonal direction, and the exposure laser light generating element is generated. An exposure objective lens for condensing the exposure laser beam,
The irradiation position moving means moves the exposure objective lens relatively in the orthogonal direction with respect to the holding table by moving the exposure objective lens in the orthogonal direction relative to the mounting means. The exposure apparatus according to claim 2, wherein the exposure apparatus is moved. A lens displacement amount detecting means for detecting a displacement amount in the orthogonal direction of the objective lens for exposure with respect to the mounting means;
The control means is for exposure relative to the mounting means in the orthogonal direction based on the displacement amount of the holding base by the holding base displacement amount detection means and the displacement amount of the exposure objective lens by the lens displacement amount detection means. 9. The exposure according to claim 8, wherein the irradiation position moving means is controlled so as to suppress a displacement of the irradiation position of the exposure laser beam with respect to the holding table in the orthogonal direction by moving the objective lens. apparatus.   The lens displacement amount detecting means is provided in a lens displacement amount detecting optical member whose optical characteristics change in the orthogonal direction and moves together with the exposure objective lens, and a mounting means. The lens displacement detection irradiating means for irradiating the laser beam toward the laser beam and the laser light from the lens displacement detection irradiating means are received through the lens displacement detection optical member and a signal corresponding to the received light amount is output. The exposure apparatus according to claim 9, further comprising a light receiving unit for detecting a lens displacement amount.   The exposure apparatus according to claim 10, wherein the lens displacement detection optical member is a diffraction grating.   The holding table displacement amount detecting means is provided on the holding table or mounting means, provided on the holding table displacement amount detecting optical member whose optical characteristics change in the orthogonal direction, and provided on the mounting means or holding table, The holding table displacement amount detecting irradiation means for irradiating laser light toward the holding table displacement amount detecting optical member, and the laser beam from the holding table displacement amount detecting irradiation means via the holding table displacement amount detecting optical member. 12. The exposure apparatus according to claim 10, further comprising: a holding base displacement amount detecting light receiving unit that receives light and outputs a signal corresponding to the received light amount.   13. The exposure apparatus according to claim 12, wherein the holding table displacement amount detection optical member is a diffraction grating. The holding table displacement amount detecting means is provided on the holding table or mounting means, provided on the holding table displacement amount detecting optical member whose optical characteristics change in the orthogonal direction, and provided on the mounting means or holding table, The holding table displacement amount detecting irradiation means for irradiating laser light toward the holding table displacement amount detecting optical member, and the laser beam from the holding table displacement amount detecting irradiation means via the holding table displacement amount detecting optical member. Light receiving means for detecting the amount of displacement of the holding base that receives light and outputs a signal corresponding to the amount of light received,
12. The exposure apparatus according to claim 11, wherein the holding table displacement detection optical member is a diffraction grating having the same grating pitch as the lens displacement detection optical member.   The wavelength of the laser beam by the irradiation means for detecting the amount of lens displacement and the wavelength of the laser beam by the irradiation means for detecting the amount of displacement of the holding base are the same as each other. Exposure equipment.   13. The wavelength of the laser beam by the lens displacement amount detection irradiation means and the wavelength of the laser light by the holding table displacement amount detection irradiation means are different from the wavelength of the exposure laser light by the exposure irradiation means. The exposure apparatus according to any one of -15.   The exposure apparatus according to claim 12, wherein the holding table displacement amount detection optical member is provided on a holding table.   18. The place where the laser beam from the holding table displacement amount detection irradiating means is reflected on the holding table displacement amount detection optical member is substantially in the same plane as the surface of the substrate. Exposure device.   The holding table displacement amount detecting means is provided on the holding table or mounting means, and is provided on a reflecting plate having a reflecting surface perpendicular to the orthogonal direction, and on the mounting means or holding table, and generates laser light. A reflection plate laser light generating element that emits laser light in the orthogonal direction, and a reflection plate that is provided on the mounting means or the holding stand and condenses the laser light by the reflection plate laser light generation element and guides it to the reflection plate And a reflecting plate light receiving unit configured to receive laser light from the reflecting plate laser light generating element through the reflecting plate and output a signal corresponding to the amount of received light. The exposure apparatus according to 10 or 11.   The holding table displacement amount detecting means is provided on the holding table or mounting means, and is provided on a reflecting plate having a reflecting surface perpendicular to the orthogonal direction, and on the mounting means or holding table, and generates laser light. A reflecting plate laser light generating element that emits laser light in the orthogonal direction and a laser beam generated by the reflecting plate laser light generating element, which is provided on the mounting means or the holding base so as to be movable in the orthogonal direction. A reflecting plate objective lens that guides the reflecting plate to the reflecting plate, a reflecting plate objective lens driving unit that moves the reflecting plate objective lens in the orthogonal direction with respect to the mounting means or the holding base, and a reflecting plate laser beam generation Reflecting plate light receiving means for receiving laser light from the element through the reflecting plate and outputting a signal corresponding to the amount of received light, and reflecting plate objective lens driving means based on the signal from the reflecting plate light receiving means. Lens displacement control means for controlling to suppress a change in the distance between the reflector objective lens and the reflector, and a second optical property that changes in the orthogonal direction and moves together with the reflector objective lens. The holding table displacement amount detection optical member, and the second holding table displacement amount detection device that is provided on the mounting means or the holding table and irradiates a laser beam toward the second holding table displacement amount detection optical member. Laser light from the irradiation means and the second holding table displacement amount detection irradiation means is received via the second holding table displacement amount detection optical member, and a signal corresponding to the received light amount is output. 12. The exposure apparatus according to claim 10, further comprising a light receiving means for detecting a displacement of the holding table.   21. The exposure apparatus according to claim 20, wherein the second holding table displacement detection optical member is a diffraction grating. The holding table displacement amount detecting means is provided on the holding table or mounting means, and is provided on a reflecting plate having a reflecting surface perpendicular to the orthogonal direction, and on the mounting means or holding table, and generates laser light. A reflecting plate laser light generating element that emits laser light in the orthogonal direction and a laser beam generated by the reflecting plate laser light generating element, which is provided on the mounting means or the holding base so as to be movable in the orthogonal direction. A reflecting plate objective lens that guides the reflecting plate to the reflecting plate, a reflecting plate objective lens driving unit that moves the reflecting plate objective lens in the orthogonal direction with respect to the mounting means or the holding base, and a reflecting plate laser beam generation Reflecting plate light receiving means for receiving laser light from the element through the reflecting plate and outputting a signal corresponding to the amount of received light, and reflecting plate objective lens driving means based on the signal from the reflecting plate light receiving means. Lens displacement control means for controlling to suppress a change in the distance between the reflector objective lens and the reflector, and a second optical property that changes in the orthogonal direction and moves together with the reflector objective lens. The holding table displacement amount detection optical member, and the second holding table displacement amount detection device that is provided on the mounting means or the holding table and irradiates a laser beam toward the second holding table displacement amount detection optical member. Laser light from the irradiation means and the second holding table displacement amount detection irradiation means is received via the second holding table displacement amount detection optical member, and a signal corresponding to the received light amount is output. And a light receiving means for detecting the displacement of the holding table,
12. The exposure apparatus according to claim 11, wherein the second holding table displacement detection optical member is a diffraction grating having the same grating pitch as the lens displacement detection optical member.   The wavelength of the laser beam by the lens displacement amount detecting means, the wavelength of the laser light by the reflecting plate laser light generating element, and the wavelength of the laser light by the second holding table displacement amount detecting means are the same. The exposure apparatus according to any one of claims 19 to 22.   The wavelength of the laser beam by the lens displacement amount detecting means, the wavelength of the laser light by the reflecting plate laser light generating element, and the wavelength of the laser light by the second holding table displacement amount detecting means are determined by the exposure means. The exposure apparatus according to any one of claims 19 to 23, wherein the exposure apparatus has a wavelength different from that of the exposure laser beam.   The exposure apparatus according to claim 19, wherein the reflecting plate is provided on a holding table.   26. The place where the laser beam generated by the laser light generating element for the reflecting plate is reflected on the reflecting plate is in substantially the same plane as the surface of the substrate. Exposure equipment.   A plurality of exposure irradiating means is provided, and the exposure laser light from each exposure irradiating means is irradiated independently to each other in the orthogonal direction on the surface of the substrate. The exposure apparatus according to any one of claims 1 to 26.

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