JP2005169342A - Regenerator and regenerating method of organic coating washing liquid and washing device and washing method of organic coating - Google Patents

Regenerator and regenerating method of organic coating washing liquid and washing device and washing method of organic coating Download PDF

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JP2005169342A
JP2005169342A JP2003416378A JP2003416378A JP2005169342A JP 2005169342 A JP2005169342 A JP 2005169342A JP 2003416378 A JP2003416378 A JP 2003416378A JP 2003416378 A JP2003416378 A JP 2003416378A JP 2005169342 A JP2005169342 A JP 2005169342A
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cleaning
crystallization
cleaning liquid
ethylene carbonate
liquid
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JP4439898B2 (en
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Hiroyuki Shinozaki
広行 篠崎
Seiichi Inagaki
精一 稲垣
Mitsuhiro Ueda
光洋 上田
Makoto Hirano
誠 平野
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Nomura Micro Science Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a removing method and removing device of an organic coating which enable the regeneration of the solvency of the organic coating of a washing liquid containing ethylene carbonate as an active ingredient and uses the same for circulation as the washing liquid and is capable of regenerating the same without using ozone. <P>SOLUTION: A crystallization regenerator of the organic coating washing liquid which has a washing tank for receiving the washing liquid containing the ethylene carbonate as the active ingredient, a crystallization means for precipitating an ethylene carbonate crystal by cooling down the washing liquid dissolving the organic coating transferred from the washing tank, a heating means for liquefying the ethylene carbonate separated in the crystallization means by heating, a circulation means for transferring the ethylene carbonate liquefied by the heating means to the washing tank for circulation via the crystallization means and the heating means from the washing tank, and which is capable of recycling the ethylene carbonate as the washing liquid is provided. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、炭酸エチレンを有効成分とする洗浄液を用いた洗浄において、有機被膜が溶解することで汚染された洗浄液を浄化することができる有機被膜洗浄液の結晶化再生装置及び有機被膜洗浄液の結晶化再生方法に関する。さらに、それらを用いた有機被膜の洗浄装置、洗浄方法及び再生装置の結晶化手段として用いるのに適した炭酸エチレン結晶化装置に関する。   The present invention relates to an organic film cleaning liquid crystallization regeneration apparatus and a crystallization of an organic film cleaning liquid that can purify the contaminated cleaning liquid by dissolving the organic film in cleaning using a cleaning liquid containing ethylene carbonate as an active ingredient. It relates to a playback method. Furthermore, the present invention relates to an ethylene carbonate crystallization apparatus suitable for use as a crystallization means for an organic coating film cleaning apparatus, a cleaning method, and a regeneration apparatus using the same.

半導体ウェハの製造工程は、半導体ウェハ全面へのレジストの塗布等の様々な塗布工程を経て行われるものである。このとき、レジストの塗布は、スピンコーターによりウェハを回転しながらウェハ中央部に滴下されたレジストを遠心力により振り切って、所定の膜厚のレジスト膜をウェハ表面に形成することにより行われる。   The manufacturing process of a semiconductor wafer is performed through various application processes such as application of a resist to the entire surface of the semiconductor wafer. At this time, the application of the resist is performed by forming a resist film having a predetermined film thickness on the wafer surface by rotating the wafer by a spin coater while shaking off the resist dropped on the center of the wafer by centrifugal force.

スピンコート方式はレジスト塗布に限らず、SOG(Spin On Grass)膜を形成するSOG塗布等にも使用されている。すなわち、回転台に固定されたウェハを回転制御してウェハ中央部に滴下されたSOG液を振り切ることにより、レジスト塗布と同様に所定の膜厚のSOGを形成することができる。   The spin coating method is used not only for resist coating but also for SOG coating for forming an SOG (Spin On Glass) film. That is, by controlling the rotation of the wafer fixed to the turntable and shaking off the SOG liquid dropped on the center of the wafer, an SOG having a predetermined film thickness can be formed in the same manner as resist coating.

このようなスピンコート方式においては、振り切った塗布材は、ドレーン用のカップ(スピンコーターカップ)に落ちて回収され、ドレーンから排出され他の処理槽へと導かれる。   In such a spin coating method, the shaken coating material falls into a drain cup (spin coater cup) and is collected, discharged from the drain, and guided to another processing tank.

しかし、上記いずれの塗布処理においても、これが繰り返されることによって、スピンコーターカップにはドレーンから排出されずに残留したレジストの堆積物が徐々に蓄積されていく。この堆積物が多くなると、ウェハ工程におけるパーティクルの影響が懸念される。そこで、メンテナンス時において、スピンコーターカップを洗浄し、残留した堆積物を除去する必要が生じ、エチレングリコールやシンナー系等の有機溶剤やオゾン水の供給による洗浄が行われている(例えば、特許文献1参照。)。   However, in any of the above-described coating processes, by repeating this, the remaining resist deposit without being discharged from the drain is gradually accumulated in the spin coater cup. When this deposit increases, there is a concern about the influence of particles in the wafer process. Therefore, at the time of maintenance, it is necessary to clean the spin coater cup and remove the remaining deposits, and cleaning is performed by supplying an organic solvent such as ethylene glycol or thinner, or ozone water (for example, Patent Documents). 1).

また、スピンコーターカップではなくウェハの洗浄に用いるものではあるが、同様にレジスト塗膜の剥離、除去を行うものとして、4−メトキシ−1−ブタノール、3−メトキシ−1−ブタノール又は4−メトキシ−1−ブタノールと3−メトキシ−1−ブタノールとの混合物からなる溶剤と、炭酸プロピレンとから構成されるフォトレジスト用剥離液組成物(例えば、特許文献2参照。)、40〜50容量%の炭酸エチレン等の非プロトン性・環状炭酸エステル、並びにエチレンジアセテート、エチレンジブチレート等のプロトン性極性化合物、さらにN−メチル−2−ピロリドン及びトリエタノールアミンを含む溶剤の超音波撹拌浴中でフォトレジストを除去する方法(例えば、特許文献3参照。)及びオゾンガスを溶解した処理液を用いて有機被膜を除去する方法として、炭酸エチレンと気体中のオゾンとの分配係数が室温で0.6以上であり、かつ、オゾンによって分解され難い1種または複数種混合の有機溶剤とを含む溶液を用いる方法(例えば、特許文献4参照。)が知られている。   Further, although it is used for cleaning a wafer instead of a spin coater cup, 4-methoxy-1-butanol, 3-methoxy-1-butanol, or 4-methoxy is also used for removing and removing the resist coating film. A stripping composition for a photoresist composed of a solvent composed of a mixture of -1-butanol and 3-methoxy-1-butanol and propylene carbonate (see, for example, Patent Document 2), 40 to 50% by volume. Photo in an ultrasonic stirring bath of a solvent containing aprotic / cyclic carbonate such as ethylene carbonate and protic polar compounds such as ethylene diacetate and ethylene dibutyrate, and N-methyl-2-pyrrolidone and triethanolamine. A method for removing the resist (for example, see Patent Document 3) and a treatment liquid in which ozone gas is dissolved are used. As a method for removing the organic coating, a solution containing one or more organic solvents in which the partition coefficient between ethylene carbonate and ozone in the gas is 0.6 or more at room temperature and is difficult to be decomposed by ozone. There is known a method using (see, for example, Patent Document 4).

これに対して、出願人は、炭酸エチレン又は炭酸プロピレン単独でも十分にレジストの剥離、除去を行うことができることを見出し、炭酸エチレンにより有機被膜を除去した後、溶解した有機被膜をオゾンによって低分子量物質に分解して、処理液として再生し循環使用する有機被膜の除去方法の特許出願を既に行っている(特願2002−229394)。
特開2002−205021号公報 特許第2679618号公報 米国特許第5690747号明細書 特開2003−282518号公報
In contrast, the applicant found that ethylene carbonate or propylene carbonate alone can sufficiently remove and remove the resist, and after removing the organic film with ethylene carbonate, the dissolved organic film is reduced in molecular weight by ozone. A patent application has already been filed for a method of removing an organic coating that decomposes into a substance, regenerates it as a treatment liquid, and circulates it (Japanese Patent Application No. 2002-229394).
Japanese Patent Laid-Open No. 2002-205021 Japanese Patent No. 2679618 US Pat. No. 5,690,747 JP 2003-282518 A

そこで、本発明は、炭酸エチレンを有効成分とする洗浄液をレジスト剥離の溶剤として用いる際に、有機被膜を溶解することで汚染され低下した、炭酸エチレンの有機被膜を溶解する能力を再生し、炭酸エチレンを洗浄液として循環使用するものであって、オゾンを用いることなく行うことができる有機被膜洗浄液の結晶化再生方法及び有機被膜洗浄液の結晶化再生装置を提供することを目的とする。   Therefore, the present invention regenerates the ability to dissolve the organic film of ethylene carbonate, which is contaminated and reduced by dissolving the organic film when using a cleaning solution containing ethylene carbonate as an active ingredient as a solvent for resist stripping. An object of the present invention is to provide an organic film cleaning liquid crystallization regeneration method and an organic film cleaning liquid crystallization regeneration apparatus which can circulate and use ethylene as a cleaning liquid without using ozone.

本発明の有機被膜洗浄液の結晶化再生装置は、炭酸エチレンを有効成分とする洗浄液を収容する洗浄槽と、洗浄槽から移送された有機被膜を溶解した洗浄液を冷却して炭酸エチレン結晶を析出させる結晶化手段と、結晶化手段で得られた炭酸エチレンを加熱して液状にする加熱手段と、洗浄槽から結晶化手段及び加熱手段を経由して加熱手段により液化した炭酸エチレンを洗浄槽へ移送して循環させる循環手段とを有することを特徴とする。   The organic film cleaning liquid crystallization regeneration apparatus of the present invention cools a cleaning tank containing a cleaning liquid containing ethylene carbonate as an active ingredient and an organic film transferred from the cleaning tank to precipitate ethylene carbonate crystals. Crystallization means, heating means for heating ethylene carbonate obtained by the crystallization means to make it liquid, and transfer of ethylene carbonate liquefied by the heating means from the washing tank to the washing tank via the crystallization means and heating means And circulating means for circulating.

本発明の有機被膜の洗浄装置は、請求項1乃至5のいずれか1項記載の有機被膜洗浄液の結晶化再生装置と、有機被膜洗浄液の結晶化再生装置で有機被膜を除去した後に洗浄液をすすぐための純水洗浄槽と、純水洗浄槽で洗浄した後に、付着した純水を乾燥させるための乾燥手段とを有することを特徴とする。   The organic coating film cleaning apparatus of the present invention is an organic coating film cleaning liquid crystallization regeneration apparatus according to any one of claims 1 to 5 and an organic coating film cleaning liquid crystallization regeneration apparatus, after which the organic coating film is removed and rinsed with the cleaning liquid. And a drying means for drying the adhering pure water after washing in the pure water washing tank.

本発明の有機被膜洗浄液の結晶化再生方法は、炭酸エチレンを有効成分とする洗浄液で有機被膜を除去する洗浄工程と、洗浄工程により有機被膜を溶解した洗浄液を冷却することで炭酸エチレン結晶を析出させる結晶化工程と、結晶化工程で得られた炭酸エチレンを加熱して液状にする加熱工程と、洗浄工程で用いられ、結晶化工程及び加熱工程を経て、加熱工程により液化した炭酸エチレンを洗浄工程へと循環させる循環工程とを有することを特徴とする。   The organic film cleaning liquid crystallization regeneration method of the present invention includes a cleaning process of removing an organic film with a cleaning liquid containing ethylene carbonate as an active ingredient, and cooling the cleaning liquid in which the organic film has been dissolved in the cleaning process to precipitate ethylene carbonate crystals. The crystallization step, the heating step to heat the ethylene carbonate obtained in the crystallization step, and the washing step, and the washing step to wash the ethylene carbonate liquefied by the heating step through the crystallization step and the heating step And a circulation process for circulating the process.

本発明の有機被膜の洗浄方法は、請求項8乃至13のいずれか1項記載の有機被膜洗浄液の結晶化再生方法における洗浄工程により有機被膜が除去された洗浄対象物を純水ですすぐことによって、付着した洗浄液を洗い流す純水洗浄工程と、純水洗浄工程で付着した水を蒸発、乾燥させる乾燥工程とを有することを特徴とする。   The organic film cleaning method of the present invention comprises rinsing an object to be cleaned, from which the organic film has been removed by the cleaning step in the method for crystallizing and regenerating an organic film cleaning liquid according to any one of claims 8 to 13, with pure water. And a pure water cleaning step for washing away the adhering cleaning liquid, and a drying step for evaporating and drying the water adhering in the pure water cleaning step.

本発明の有機被膜洗浄液の結晶化再生装置及び結晶化再生方法によれば、洗浄対象物に付着している有機被膜を効率良く剥離、溶解することができ、この有機被膜を溶解して汚染された炭酸エチレンを結晶化して精製することで、炭酸エチレンの有機被膜を溶解する能力を再生することができる。これにより、洗浄作業を洗浄液の交換をせずに長時間連続的に行うことができる。   According to the crystallization regeneration apparatus and the crystallization regeneration method of the organic coating film cleaning liquid of the present invention, the organic coating adhered to the object to be cleaned can be efficiently peeled and dissolved, and the organic coating is dissolved and contaminated. By recrystallizing and purifying the ethylene carbonate, the ability to dissolve the organic film of ethylene carbonate can be regenerated. Thus, the cleaning operation can be continuously performed for a long time without replacing the cleaning liquid.

また、本発明の有機被膜の洗浄装置及び洗浄方法によれば、本発明の有機被膜の洗浄装置及び洗浄方法と同様の効果が得られると共に、洗浄液のすすぎ、乾燥までを一連の作業で行うことができる。   Further, according to the organic coating film cleaning apparatus and cleaning method of the present invention, the same effects as the organic coating film cleaning apparatus and cleaning method of the present invention can be obtained, and the cleaning liquid can be rinsed and dried in a series of operations. Can do.

以下、本発明に係る有機被膜洗浄液の結晶化再生装置及び有機被膜洗浄液の結晶化再生方法について図面を参照しながら説明する。   The organic film cleaning liquid crystallization regeneration apparatus and organic film cleaning liquid crystallization regeneration method according to the present invention will be described below with reference to the drawings.

[有機被膜洗浄液の結晶化再生装置及び結晶化再生方法]
(第1の実施形態)
図1は、本発明に係る有機被膜洗浄液の結晶化再生装置における第1の実施形態を示した概略図である。
[Organic film cleaning liquid crystallization regeneration apparatus and crystallization regeneration method]
(First embodiment)
FIG. 1 is a schematic view showing a first embodiment of an apparatus for crystallizing and regenerating an organic coating film cleaning liquid according to the present invention.

本発明の有機被膜洗浄液の結晶化再生装置1は、炭酸エチレンを有効成分とする洗浄液2を収容する洗浄槽3と、洗浄槽3から移送された有機被膜を溶解した洗浄液2を冷却する結晶化手段4と、結晶化手段4から結晶として取り出された炭酸エチレンを加熱して液状にする加熱手段5と、洗浄槽3から結晶化手段4及び加熱手段5を経由し加熱手段5により液化した炭酸エチレンを洗浄槽3へ移送して循環させる循環手段6とから構成されるものである。なお、結晶化手段4によりレジスト含有残液のレジストが高濃度になった場合の残液を貯留するためのレジスト濃縮槽7が設けられている。   The organic film cleaning liquid crystallization regenerating apparatus 1 of the present invention is a crystallization system for cooling a cleaning tank 3 containing a cleaning liquid 2 containing ethylene carbonate as an active ingredient and a cleaning liquid 2 in which the organic film transferred from the cleaning tank 3 is dissolved. Means 4; heating means 5 for heating ethylene carbonate taken out as crystals from crystallization means 4 to make it liquid; and carbonic acid liquefied by heating means 5 from washing tank 3 via crystallization means 4 and heating means 5 It comprises a circulating means 6 for transferring ethylene to the washing tank 3 for circulation. In addition, a resist concentration tank 7 is provided for storing the residual liquid when the resist-containing residual liquid becomes a high concentration by the crystallization means 4.

この有機被膜洗浄液の結晶化再生装置1に用いる洗浄槽3は、炭酸エチレンを有効成分とする洗浄液2を収容するものであり、この洗浄槽3に収容された洗浄液中に洗浄対象物を浸漬することによって洗浄対象物に付着している有機被膜の剥離・除去を行うものである。   The cleaning tank 3 used in the organic film cleaning liquid crystallization regeneration apparatus 1 contains a cleaning liquid 2 containing ethylene carbonate as an active ingredient, and the object to be cleaned is immersed in the cleaning liquid stored in the cleaning tank 3. In this way, the organic film adhering to the object to be cleaned is peeled off and removed.

また、このとき有機被膜の除去をより効率的に行うためには、洗浄対象物を洗浄液に浸漬しながら揺動したり、超音波を洗浄対象物に照射したりすることが好ましい。   At this time, in order to remove the organic film more efficiently, it is preferable to swing the object to be cleaned while immersing it in the cleaning liquid or to irradiate the object to be cleaned with ultrasonic waves.

図2は、洗浄対象物を入れる洗浄カゴを揺動する揺動装置の概念図を示したものである。揺動装置21は、図2に記載したように、洗浄液中に洗浄対象物を浸漬するための洗浄用カゴ22を保持する保持部23と、この保持部23と接続しており回転させることで洗浄用カゴ22を揺動することができるカム24とで構成されている。   FIG. 2 is a conceptual diagram of a swinging device that swings a cleaning basket into which an object to be cleaned is placed. As shown in FIG. 2, the oscillating device 21 is connected to the holding unit 23 for holding the cleaning basket 22 for immersing the object to be cleaned in the cleaning liquid, and is rotated by being connected to the holding unit 23. The cleaning basket 22 is composed of a cam 24 that can swing.

また、超音波を照射する場合には、洗浄槽3の底面及び/又は側面に超音波振動子を配置し、洗浄槽3中の洗浄対象物に超音波を照射することが可能な構成とすればよい。   In the case of irradiating ultrasonic waves, an ultrasonic vibrator is disposed on the bottom surface and / or side surface of the cleaning tank 3 so that the object to be cleaned in the cleaning tank 3 can be irradiated with ultrasonic waves. That's fine.

この有機被膜洗浄液の結晶化再生装置1に用いる結晶化手段4は、有機物を溶解した炭酸エチレンから炭酸エチレンを分離するために部分的に冷却を行うことができる結晶化手段であればよく、この結晶化手段をより具体的に示すと、例えば、図3及び図4のようにドラムにより洗浄液を冷却することでドラム表面に炭酸エチレンの結晶化を行うことができる結晶化手段が挙げられる。   The crystallization means 4 used in the organic film cleaning liquid crystallization regenerating apparatus 1 may be any crystallization means capable of performing partial cooling in order to separate ethylene carbonate from ethylene carbonate in which organic matter is dissolved. More specifically, the crystallization means includes, for example, a crystallization means capable of crystallizing ethylene carbonate on the drum surface by cooling the cleaning liquid with a drum as shown in FIGS.

図3は、本発明に用いる結晶化手段の構成の概要をより具体化して示した斜視図であり、図4は、そのドラムの軸方向から見た断面図である。   FIG. 3 is a perspective view showing a more specific outline of the structure of the crystallization means used in the present invention, and FIG. 4 is a sectional view of the drum as viewed from the axial direction.

図3及び図4に示した結晶化手段41は、有機被膜の洗浄に使用した洗浄液を収容する洗浄液貯留槽411と、洗浄液貯留槽411に収容された洗浄液に一部が浸漬されるように配置され、それ自身を冷却することができる横型円筒形の回転可能なドラム412と、ドラム412の表面に接しておりドラム412表面に付着した炭酸エチレン結晶をかきとることができるスクレーパー413とで構成されている。また、このとき、洗浄液を液状に保つために洗浄液貯留槽411の底部を加熱するための加熱部を設けてもよい。   The crystallization means 41 shown in FIGS. 3 and 4 is disposed so that a cleaning liquid storage tank 411 that stores the cleaning liquid used for cleaning the organic coating and a part of the cleaning liquid stored in the cleaning liquid storage tank 411 are immersed in the crystallization means 41. And a horizontal cylindrical rotatable drum 412 that can cool itself, and a scraper 413 that is in contact with the surface of the drum 412 and can scrape off the ethylene carbonate crystals attached to the surface of the drum 412. ing. At this time, in order to keep the cleaning liquid in a liquid state, a heating unit for heating the bottom of the cleaning liquid storage tank 411 may be provided.

洗浄液貯留槽411は、有機被膜の洗浄に用いられ、洗浄槽3から移送された洗浄液を収容することができ、横型円筒形のドラム412と収容している洗浄液とを接触させることができるものであればどのような形状でもよいが、効果的にドラム412と洗浄液とを接触させることができる点から、ドラム412よりも一回り大きい横型円筒形をその円筒形の軸方向に半分に切断した、断面が半円形の容器であることが好ましく、これをドラム412に沿って配置すればよい。   The cleaning liquid storage tank 411 is used for cleaning the organic coating, can store the cleaning liquid transferred from the cleaning tank 3, and can contact the horizontal cylindrical drum 412 with the cleaning liquid stored therein. Any shape may be used as long as the drum 412 can be effectively brought into contact with the cleaning liquid, but a horizontal cylinder that is slightly larger than the drum 412 is cut in half in the axial direction of the cylinder. The container is preferably a semicircular container, and this may be disposed along the drum 412.

ドラム412は、横型円筒形の外形をなし、その内部には冷却媒を有しており、ドラム自身が冷却される構成となっている。冷却媒はドラム内部を満たすものであれば限定されないが、液体であることが冷却効率や取扱いの容易さから好ましいものである。例えば、冷却水を冷却水導入口414から導入し、余分な冷却水は冷却水排出口415から排出して、冷却水を流しつづけることによって洗浄液を充分に冷却することが可能である。   The drum 412 has a horizontal cylindrical outer shape, and has a cooling medium therein, so that the drum itself is cooled. The cooling medium is not limited as long as it satisfies the inside of the drum, but a liquid is preferable from the viewpoint of cooling efficiency and ease of handling. For example, it is possible to sufficiently cool the cleaning liquid by introducing cooling water from the cooling water inlet 414 and discharging excess cooling water from the cooling water outlet 415 and continuing to flow the cooling water.

スクレーパー413は、ドラム412が冷却されることによって、その表面に付着した炭酸エチレンの結晶をかきとるものであって、その一辺がドラムの表面に接するように、そしてドラムに接する辺から対向する辺に向かって低くなるように傾斜が設けられて配置される。このスクレーパー413でかきとられた結晶は、スクレーパー413の表面を傾斜に沿って転がり落ち、スクレーパーの端から落下する。落下した炭酸エチレン結晶は、液状の炭酸エチレンとされるべく加熱手段へと導入される。   The scraper 413 scrapes off the ethylene carbonate crystals adhering to the surface of the drum 412 when the drum 412 is cooled, so that one side of the scraper 413 is in contact with the surface of the drum and the side opposite to the side in contact with the drum. It is provided with an inclination so as to become lower toward the center. The crystal scraped by the scraper 413 rolls down the surface of the scraper 413 along the inclination and falls from the end of the scraper. The fallen ethylene carbonate crystals are introduced into the heating means to be liquid ethylene carbonate.

結晶化手段4で得られた炭酸エチレン結晶は、これを融解するための加熱手段5により加熱されることにより液状の炭酸エチレンとなり、精製されて有機被膜の溶解能力が再生した炭酸エチレンとして、これを洗浄液に再利用することができるものである。   The ethylene carbonate crystals obtained by the crystallization means 4 become liquid ethylene carbonate by being heated by the heating means 5 for melting them, and the purified ethylene carbonate is regenerated to regenerate the ability to dissolve the organic film. Can be reused in the cleaning liquid.

加熱手段5はヒーターを用いることにより達成することができ、加熱手段の温度は40〜80℃であることが好ましい。   The heating means 5 can be achieved by using a heater, and the temperature of the heating means is preferably 40 to 80 ° C.

また、結晶化手段4及び加熱手段5により一度結晶化して得られた炭酸エチレン液を、さらに結晶化手段4及び加熱手段5により結晶化、融解を行うことができるように構成すること、すなわち、結晶化手段及び加熱手段の組合せを複数組設けて連続的に結晶化、融解を繰返し行うことが、純度の高い結晶を得ることができる点で好ましい。   Further, the ethylene carbonate liquid obtained by crystallization once by the crystallization means 4 and the heating means 5 is further configured to be crystallized and melted by the crystallization means 4 and the heating means 5, that is, It is preferable that a plurality of combinations of crystallization means and heating means are provided and crystallization and melting are continuously repeated to obtain a crystal with high purity.

また、このときの結晶化手段により炭酸エチレンの結晶化は連続式でもバッチ式でもどちらで行っても良いが、炭酸エチレン結晶が取り除かれていくと、洗浄液は濃縮されて有機物の濃度が高くなっていくこととなるため洗浄液を連続的に供給して行うようにすることが好ましい。   In addition, crystallization of the ethylene carbonate may be carried out either continuously or batchwise by the crystallization means at this time, but as the ethylene carbonate crystals are removed, the cleaning liquid is concentrated and the concentration of organic matter increases. Therefore, it is preferable to continuously supply the cleaning liquid.

本発明に用いる循環手段6は、洗浄槽3から結晶化手段4及び加熱手段5を経由して、加熱手段5により液化した炭酸エチレンを洗浄槽3へ移送して循環させるものであり、これにより洗浄槽3の洗浄液中に存在する炭酸エチレンは清浄されて洗浄槽3へ循環されることとなる。   The circulation means 6 used in the present invention is for transferring the ethylene carbonate liquefied by the heating means 5 from the washing tank 3 via the crystallization means 4 and the heating means 5 to the washing tank 3 for circulation. The ethylene carbonate present in the cleaning liquid in the cleaning tank 3 is cleaned and circulated to the cleaning tank 3.

この循環手段6は、洗浄槽3、結晶化手段4、加熱手段5、洗浄槽3の順番に炭酸エチレンが循環することができるように流れを作ることができるものであれば、循環経路のどの位置に配置されていてもよく、この循環を円滑に行うために複数設けても良い。   As long as this circulation means 6 can make a flow so that ethylene carbonate can circulate in order of the washing tank 3, the crystallization means 4, the heating means 5, and the washing tank 3, any of the circulation paths It may be arranged at a position, and a plurality may be provided in order to smoothly perform this circulation.

この液状の炭酸エチレンの流れを作る循環手段6としては、例えば、ポンプ等を挙げることができ、この循環手段6の作用により、加熱手段5により液化、再生された炭酸エチレンは、洗浄槽3に送り込まれて再び有機被膜の洗浄に用いられることとなる。   Examples of the circulating means 6 for producing the liquid ethylene carbonate flow include a pump. The ethylene carbonate liquefied and regenerated by the heating means 5 by the action of the circulating means 6 is supplied to the washing tank 3. It is sent and used again for cleaning the organic coating.

次に、この有機被膜洗浄液の結晶化再生装置を使用した有機被膜洗浄液の結晶化再生方法について説明する。   Next, a method for crystallizing and regenerating an organic coating film cleaning liquid using this organic coating film cleaning liquid crystallization regeneration apparatus will be described.

本発明の有機被膜洗浄液の結晶化再生方法においては、まず、炭酸エチレンを有効成分とする洗浄液2を収容した洗浄槽3に、洗浄対象物を浸漬し、該洗浄対象物に付着している有機被膜を除去する洗浄工程を行うものである。   In the method for crystallizing and regenerating an organic coating film cleaning liquid of the present invention, first, an organic substance adhering to the cleaning object is immersed in a cleaning tank 3 containing a cleaning liquid 2 containing ethylene carbonate as an active ingredient. A cleaning process for removing the film is performed.

本発明に用いる洗浄液2は、炭酸エチレンを有効成分とするものであり、炭酸エチレン単独で用いることが好ましく、レジストが溶解することにより炭酸エチレンの溶解能力が落ちていくため、炭酸エチレンを80質量%以上、レジスト成分を20質量%以下含有する範囲まで洗浄に用いることができる。   The cleaning liquid 2 used in the present invention contains ethylene carbonate as an active ingredient, and it is preferable to use ethylene carbonate alone. Since the dissolution ability of ethylene carbonate decreases as the resist dissolves, 80 mass of ethylene carbonate is used. % To a range containing 20% by mass or less of a resist component.

炭酸エチレンは、融点 36.4℃、沸点 238℃、引火点 160℃であり、易水溶性で、室温では無色無臭の比較的安定な固体であるが、加温により液状の非プロトン性極性溶媒として用いることができる物質である。沸点・引火点が高く、毒性が小さいこと、さらに消防法における危険物には指定されていないことから好ましいものである。   Ethylene carbonate has a melting point of 36.4 ° C., a boiling point of 238 ° C., a flash point of 160 ° C., is easily soluble in water, is a colorless and odorless and relatively stable solid at room temperature, but is heated to a liquid aprotic polar solvent. It can be used as a substance. It is preferable because it has a high boiling point / flash point, low toxicity, and is not designated as a dangerous substance in the Fire Service Act.

ここで用いる炭酸エチレン液は、芳香族炭化水素に対する溶解力が強いが、分子凝集エネルギー密度に関わる溶解パラメーター(SP値)が約14と大きく、理論上はSP値が揃うほど溶解しやすいとされているため、レジスト材料の高分子のSP値は10前後のものが多く、剥離用溶剤も似た値のもの、例えば、SP値11のNMPが使用されてきた。   The ethylene carbonate liquid used here has a strong solubility in aromatic hydrocarbons, but the solubility parameter (SP value) related to the molecular cohesive energy density is as large as about 14, and theoretically, the solution is more likely to dissolve as the SP value is even. Therefore, the SP value of the polymer of the resist material is often around 10 and the stripping solvent has a similar value, for example, NMP having an SP value of 11 has been used.

しかし、本発明者らは、炭酸エチレン液が単独でも従来の剥離用溶剤と同程度又はそれ以上の剥離ができることを見出した。炭酸エチレン液の有機被膜に対する溶解作用は高温になるほど強くなり、引火点以下の温度であれば、安全に操作することができるし、不活性ガス中であれば、200℃程度の湿式処理でも何ら問題はなく、他の有機溶剤系レジスト除去剤に比し、70℃程度での蒸気圧は約1/10で、加熱処理での蒸発による液損失が少ないという利点がある。高温状態では、蒸発量がやや多くなるが、蒸気の毒性は非常に低いので特に問題とはならない。   However, the present inventors have found that an ethylene carbonate solution can be peeled off at the same level or higher than that of a conventional peeling solvent. The dissolving action of the ethylene carbonate liquid on the organic coating becomes stronger as the temperature becomes higher, and can be safely operated at a temperature below the flash point. In an inert gas, even wet processing at about 200 ° C. There is no problem, and the vapor pressure at about 70 ° C. is about 1/10 compared with other organic solvent resist removers, and there is an advantage that liquid loss due to evaporation in heat treatment is small. At high temperatures, the amount of evaporation is slightly higher, but the toxicity of vapor is so low that it is not a problem.

例えば、代表的なポジ型フォトレジストであるノボラック系レジストは、クレゾールの重合体と多環芳香族で構成されているため、本発明の洗浄液を適用すれば、加熱によって溶解性を高めることができる。   For example, since a novolak resist, which is a typical positive photoresist, is composed of a cresol polymer and a polycyclic aromatic, the solubility can be increased by heating if the cleaning liquid of the present invention is applied. .

加熱による有効な温度範囲は40〜200℃で、好ましくは引火点以下の60〜150℃である。処理条件が適当であれば20μm/分以上の剥離速度を容易に得ることができる。   The effective temperature range by heating is 40 to 200 ° C., preferably 60 to 150 ° C. below the flash point. If the processing conditions are appropriate, a peeling rate of 20 μm / min or more can be easily obtained.

湿式の剥離法では、従来その剥離処理が非常に難しかったBの1×1015/cmイオン注入で変質したノボラックレジスト膜すら、高温の炭酸エチレン液の浸漬処理によればかなり短時間で剥離することができる。例えば、1.5μmの厚さの膜が、120℃で70秒の炭酸エチレンの浸漬処理で剥離され、ドライエッチングで変質層を生じたレジストの場合も同様である。 Even a novolac resist film that has been altered by 1 + 10 15 / cm 2 ion implantation of B + , which has been very difficult to remove by conventional wet stripping methods, can be achieved in a considerably short time by immersion treatment with a high-temperature ethylene carbonate solution. Can be peeled off. For example, the same applies to a resist in which a film having a thickness of 1.5 μm is peeled off by immersion in ethylene carbonate at 120 ° C. for 70 seconds and an altered layer is formed by dry etching.

また、処理温度が高い程、表面張力や粘度が下がり、超微細パターンデバイスでのレジスト剥離に適している。   In addition, the higher the processing temperature, the lower the surface tension and viscosity, which is suitable for resist stripping in an ultrafine pattern device.

の1×1014/cmイオン注入の膜では、厚さ15μmの剥離が、120℃の炭酸エチレン液への浸漬で5秒(剥離速度:18μm/分)、100℃浸漬で10秒(剥離速度:9μm/分)と極めて速い。強く変質したレジストの高温処理では、特に変質の激しい表層部以外の成分が容易に洗浄液に溶解し、溶解し難い変質成分は微小粒となって液に分散するという剥離機構が働く。分散した微小粒は炭酸エチレン液をオゾンガス通気処理することで完全に溶解できる。 In the case of a B + 1 × 10 14 / cm 2 ion-implanted film, the 15 μm-thick peeling is 5 seconds when immersed in an ethylene carbonate solution at 120 ° C. (peeling speed: 18 μm / min), and 10 seconds when immersed at 100 ° C. (Peeling speed: 9 μm / min) and extremely fast. In the high-temperature treatment of a strongly altered resist, a peeling mechanism works in which components other than the surface layer portion that is particularly severely altered are easily dissolved in the cleaning liquid, and the altered components that are difficult to dissolve become fine particles and are dispersed in the liquid. The dispersed fine particles can be completely dissolved by subjecting the ethylene carbonate liquid to ozone gas ventilation treatment.

この高温での溶解力は極めて大きいので、有機被膜を有する洗浄対象物を洗浄液に接触させるだけで溶解が直ちに始まる。溶解は一種の拡散現象で濃度差が大きいほどに速くなることから、洗浄槽中の洗浄液の対流によって、有機被膜を連続的に溶解し、溶解効果を高い状態で維持することができる。   Since the dissolving power at this high temperature is extremely large, the dissolution starts immediately by simply bringing the cleaning object having the organic film into contact with the cleaning liquid. Since the dissolution is a kind of diffusion phenomenon and becomes faster as the concentration difference is larger, the organic coating can be continuously dissolved by the convection of the cleaning liquid in the cleaning tank, and the dissolution effect can be maintained in a high state.

上述の通り、液状炭酸エチレン液を用いると、レジスト膜等の有機被膜を有効に剥離・除去することができ、該処理後の洗浄液には、有機被膜由来の成分が溶解(及び分散)して含有されることとなる。   As described above, when a liquid ethylene carbonate solution is used, an organic coating such as a resist film can be effectively peeled and removed, and the components derived from the organic coating are dissolved (and dispersed) in the cleaning solution after the treatment. It will be contained.

本洗浄工程においては、このように炭酸エチレン液の有機被膜を溶解する力が大きいため、洗浄対象物を浸漬したのみでも有機被膜を剥離・除去することが容易である。また、より効率的に有機被膜の剥離・除去を行うためには洗浄対象物を揺動したり、超音波を照射したりすればよい。   In this cleaning process, since the power to dissolve the organic film of the ethylene carbonate liquid is large as described above, it is easy to peel and remove the organic film only by immersing the object to be cleaned. Further, in order to peel and remove the organic film more efficiently, the object to be cleaned may be rocked or irradiated with ultrasonic waves.

図2の揺動装置21の構成は既に説明したが、その動作は、カム24が回転することによって、保持手段23も円運動をはじめ、この保持手段23に接続している洗浄カゴ22もそれに伴い上下左右へと円を描きながら運動を行い、洗浄液2の中で洗浄カゴ22は揺動されて、洗浄カゴ22を浸漬するのみよりも効率的に有機被膜の剥離を行うことができるものである。   Although the configuration of the swing device 21 in FIG. 2 has already been described, the operation of the oscillating device 21 is that the holding means 23 also starts circular movement as the cam 24 rotates, and the washing basket 22 connected to the holding means 23 is also moved to it. Accordingly, the movement is performed while drawing a circle in the vertical and horizontal directions, and the cleaning basket 22 is swung in the cleaning liquid 2 so that the organic coating can be peeled off more efficiently than just immersing the cleaning basket 22. is there.

また、超音波を照射する場合には、超音波振動子、例えば、28kHz、300Wの超音波振動子を洗浄槽3の底面及び/又は側面に設けて、これにより超音波を洗浄対象物に照射することによって、洗浄対象物に付着している有機被膜に振動が与えられ、有機被膜の剥離を促進することができる。この有機被膜由来の成分が溶解した洗浄液2は、洗浄槽3から結晶化手段4へ移送され結晶化工程へ付される。   Further, when irradiating ultrasonic waves, an ultrasonic vibrator, for example, an ultrasonic vibrator of 28 kHz, 300 W is provided on the bottom surface and / or the side surface of the cleaning tank 3, thereby irradiating the ultrasonic wave to the object to be cleaned. By doing so, vibration is given to the organic film adhering to the object to be cleaned, and peeling of the organic film can be promoted. The cleaning liquid 2 in which the component derived from the organic coating is dissolved is transferred from the cleaning tank 3 to the crystallization means 4 and subjected to the crystallization process.

ここでの結晶化工程としては、図3及び図4に示した結晶化手段41を用いた場合について説明を行う。   As a crystallization process here, the case where the crystallization means 41 shown in FIG.3 and FIG.4 is used is demonstrated.

結晶化工程における冷却は、洗浄槽3から洗浄液貯留槽411に移送された洗浄液2にドラム412の一部が浸漬されることで、その接触した部分から冷却されたドラム412が洗浄液2の熱を奪い、この熱がドラム内部の冷却媒に伝わることにより行われる。そのため、ドラム内を密閉したのでは冷却媒の温度が上昇して、時間が経つにつれて冷却機能が損なわれてしまうため、ドラムを常に冷却状態に保つ必要がある。   Cooling in the crystallization step is performed by immersing a part of the drum 412 in the cleaning liquid 2 transferred from the cleaning tank 3 to the cleaning liquid storage tank 411, so that the drum 412 cooled from the contacted part can heat the cleaning liquid 2. This is done by transferring this heat to the cooling medium inside the drum. Therefore, if the inside of the drum is sealed, the temperature of the cooling medium rises and the cooling function is impaired as time passes. Therefore, it is necessary to always keep the drum in a cooled state.

そこで、この結晶化手段では、回転軸の一端から冷却媒である液体を導入し、回転軸の他端から導入した液体を排出することにより常にドラム412自体が冷却されるように構成されている。洗浄液はレジストの汚染状態でその凝固温度が異なり、このドラム412を洗浄液の凝固温度よりも低い温度に保つことができるものであれば良いため、冷却用として凝固しない温度から30℃程度の冷却水を用いることにより洗浄液の冷却機能を充分に達成することができる。   Therefore, this crystallization means is configured such that the drum 412 itself is always cooled by introducing a liquid as a cooling medium from one end of the rotating shaft and discharging the liquid introduced from the other end of the rotating shaft. . The cleaning liquid may have any solidification temperature depending on the contamination of the resist, and any drum can be used as long as it can maintain the drum 412 at a temperature lower than the solidification temperature of the cleaning liquid. By using this, the cooling function of the cleaning liquid can be sufficiently achieved.

このドラムとしては、例えば、直径170mm、長さ300mm、表面積1600cmの円筒であった場合には、冷却水の流量は60L/時間であれば十分にドラムを一定の冷却温度に維持することができる。 For example, in the case of a drum having a diameter of 170 mm, a length of 300 mm, and a surface area of 1600 cm 2 , the drum can be sufficiently maintained at a constant cooling temperature if the flow rate of cooling water is 60 L / hour. it can.

この冷却されたドラム412と接することで、洗浄液貯留槽411に収容された洗浄液の熱は奪われ、洗浄液中の炭酸エチレンは結晶化する。結晶化した炭酸エチレンはドラム表面に付着し、付着した炭酸エチレン結晶は、そのままドラム412の回転に合わせて運ばれ、洗浄液と分離される。なお、洗浄液貯留槽411に貯留された洗浄液は循環ポンプ416により槽内の液濃度が均質になるように常時循環している。   By contacting with the cooled drum 412, the heat of the cleaning liquid stored in the cleaning liquid storage tank 411 is removed, and the ethylene carbonate in the cleaning liquid is crystallized. The crystallized ethylene carbonate adheres to the drum surface, and the adhering ethylene carbonate crystal is carried along with the rotation of the drum 412 and separated from the cleaning liquid. The cleaning liquid stored in the cleaning liquid storage tank 411 is constantly circulated by the circulation pump 416 so that the liquid concentration in the tank becomes uniform.

このとき、ドラム表面に結晶が付着するためには、充分に冷却してドラムの表面に結晶の核を生じさせ、さらに結晶を成長させなければならないため、ドラムの回転は5〜50rphというゆっくりとした回転で行うことが好ましい。また、ドラム表面の素材としては、結晶が付着するものでなければならず、例えば、伝熱性の良い鏡面仕上げSUS材、ガラス材等が挙げられる。   At this time, in order for crystals to adhere to the drum surface, the drum must be sufficiently cooled to generate crystal nuclei on the drum surface, and further to grow crystals, so the drum rotates slowly at 5 to 50 rph. It is preferable that the rotation be performed. Further, the material of the drum surface must be attached with crystals, and examples thereof include a mirror-finished SUS material and a glass material having good heat conductivity.

洗浄液と分離された炭酸エチレン結晶は、ドラム412の回転によりスクレーパー413まで達し、スクレーパー413によりドラム表面からかきとられる。スクレーパー413はその一辺がドラム表面に接しており、ドラム表面に付着した炭酸エチレン結晶をドラム表面からきれいにかきとることができ、ドラム表面を傷つけることがないように、硬質ゴム、エラストマー、硬質プラスチック等で作られている。   The ethylene carbonate crystals separated from the cleaning liquid reach the scraper 413 by the rotation of the drum 412 and are scraped off from the drum surface by the scraper 413. The scraper 413 is in contact with the drum surface on one side, so that the ethylene carbonate crystals adhering to the drum surface can be scraped cleanly from the drum surface, and hard rubber, elastomer, hard plastic, etc. so as not to damage the drum surface. It is made with.

ここで掻き取られた炭酸エチレン結晶は、スクレーパー413の上側表面にのるが、スクレーパー413の傾斜により、掻き取りに用いられた辺とは逆側に転がり落ちる。転がり落ちた炭酸エチレン結晶は加熱手段5へと導入され加熱工程へ付されることとなり、加熱手段5により加熱されることで結晶が融解して液状の炭酸エチレンとなる。また、スクレーパー413より転がり落ちない場合には、スクレーパー自体を加熱手段として用いることもできる。その際には、スクレーパー413から炭酸エチレン液が流れ落ちることとなる。ここで、加熱手段における温度は、40〜80℃であることが好ましい。   The ethylene carbonate crystal scraped off is placed on the upper surface of the scraper 413, but rolls down to the side opposite to the side used for scraping due to the inclination of the scraper 413. The rolled ethylene carbonate crystal is introduced into the heating means 5 and is subjected to a heating process. When heated by the heating means 5, the crystal melts to form liquid ethylene carbonate. In addition, when the scraper 413 does not roll off, the scraper itself can be used as a heating means. At that time, the ethylene carbonate liquid flows down from the scraper 413. Here, it is preferable that the temperature in a heating means is 40-80 degreeC.

本工程において液状となった炭酸エチレンは、次いで循環工程に付されることとなるが、その前に、さらに結晶化工程及び加熱工程を経由するように構成すること、すなわち、結晶化工程及び加熱工程の組合わせを複数組設けて連続的に結晶化、融解を繰返し行うことが、純度の高い結晶を得ることができる点で好ましい。   The ethylene carbonate liquefied in this step is then subjected to a circulation step, but before that, it is further configured to pass through a crystallization step and a heating step, that is, the crystallization step and heating. It is preferable to provide a plurality of combinations of steps and continuously perform crystallization and melting repeatedly in order to obtain crystals with high purity.

洗浄液は、有機被膜を構成する有機物を最大で20質量%程度含有するまで溶解に用いることができ、これを1回の結晶化、融解により精製する場合には、炭酸エチレンの純度90%、回収率75%程度であり、結晶化を2回行った場合には、純度95%、回収率55%程度となる。さらに、結晶化を繰返す毎に純度は高純度になるが、回収率が低下するため、純度と回収率を考慮した際に再利用のコストの観点から結晶化及び融解は2回行うことが好ましい。   The cleaning liquid can be used for dissolution until it contains up to about 20% by mass of organic substances constituting the organic coating. When this is purified by crystallization and melting once, the purity of ethylene carbonate is 90% and recovered. The rate is about 75%, and when crystallization is performed twice, the purity is 95% and the recovery rate is about 55%. In addition, the purity becomes higher each time the crystallization is repeated, but the recovery rate decreases. Therefore, it is preferable to perform crystallization and melting twice from the viewpoint of the cost of reuse when considering the purity and the recovery rate. .

また、スクレーパーで炭酸エチレン結晶を掻き落とした後、図示表示は略したが、高純度な炭酸エチレン溶液を得るために、固液分離手段により炭酸エチレン結晶に微量付着した洗浄液を分離することが好ましく、この固液分離手段としては、ろ布内臓型回転式遠心分離機等が挙げられる。なお、固液分離を行う場合にはスクレーパーを加熱手段により加熱しない。   Although the illustration is omitted after scraping off the ethylene carbonate crystals with a scraper, in order to obtain a high purity ethylene carbonate solution, it is preferable to separate the cleaning solution adhering to the ethylene carbonate crystals in a small amount by solid-liquid separation means. Examples of the solid-liquid separation means include a filter cloth built-in rotary centrifuge. In addition, when performing solid-liquid separation, a scraper is not heated with a heating means.

循環工程は、洗浄工程で用いられ、結晶化工程及び加熱工程を経て、加熱工程により液化した炭酸エチレンを洗浄工程へと循環させるものであり、これにより洗浄槽3の洗浄液中に存在する炭酸エチレンは清浄されて洗浄槽3へ循環される。   The circulation step is used in the washing step, and circulates the ethylene carbonate liquefied by the heating step through the crystallization step and the heating step to the washing step, whereby the ethylene carbonate present in the washing liquid of the washing tank 3 Is cleaned and circulated to the washing tank 3.

この循環工程は、洗浄槽3、結晶化手段4、加熱手段5、洗浄槽3の順番に炭酸エチレンが循環することができるように流れを作る工程であり、特に加熱手段5により液化した炭酸エチレンを洗浄槽3へ移送する循環の最終工程を含むものである。   This circulation step is a step of making a flow so that ethylene carbonate can circulate in the order of the washing tank 3, the crystallization means 4, the heating means 5, and the washing tank 3, and in particular, the ethylene carbonate liquefied by the heating means 5 The final step of the circulation for transferring the water to the washing tank 3 is included.

この液状の炭酸エチレンの流れは、例えば、ポンプを用いることにより作ることができ、この循環工程により、加熱手段5により液化、再生された炭酸エチレンは、洗浄槽3に送り込まれて再び有機被膜の除去に用いられることとなる。   This liquid ethylene carbonate flow can be produced, for example, by using a pump. Through this circulation process, the ethylene carbonate liquefied and regenerated by the heating means 5 is fed into the washing tank 3 and is again formed of the organic coating. It will be used for removal.

この有機被膜洗浄液の結晶化再生方法において、洗浄工程、循環工程及び再生液貯留工程を洗浄液が凝固しない温度に保持して行うことが好ましく、この温度を保持する保温手段としてヒーターを用いることにより達成することができる。このときの温度は、40℃程度であることが好ましい。   In this organic film cleaning liquid crystallization regeneration method, the cleaning process, the circulation process, and the regeneration liquid storage process are preferably performed at a temperature at which the cleaning liquid does not solidify, and achieved by using a heater as a heat retaining means for maintaining this temperature. can do. The temperature at this time is preferably about 40 ° C.

なお、以上説明した操作を繰返し行うと、洗浄液貯留槽411における洗浄液中の有機物の濃度が高くなっていくため、結晶化したときに有機物の混入する割合が高まり精製の精度が低くなるため、所定の濃度に達した際に、洗浄液をレジスト濃縮槽7へ移送する必要がある。   If the above-described operation is repeated, the concentration of the organic substance in the cleaning liquid in the cleaning liquid storage tank 411 increases. Therefore, the proportion of the organic substance mixed in when crystallization increases and the purification accuracy decreases. When this concentration is reached, the cleaning liquid needs to be transferred to the resist concentration tank 7.

(第2の実施形態)
また、本発明に係る有機被膜洗浄液の結晶化再生装置における第2の実施形態は、洗浄液結晶化再生装置1の結晶化手段及び加熱手段が異なるだけで、その他の構成は第1の実施形態と同一である。図5は、本実施形態に用いる結晶化手段及び加熱手段について、その構成の概要をより具体化して示した図である。
(Second Embodiment)
Further, the second embodiment of the organic film cleaning liquid crystallization regeneration apparatus according to the present invention is different from the first embodiment except that the crystallization means and the heating means of the cleaning liquid crystallization regeneration apparatus 1 are different. Are the same. FIG. 5 is a diagram showing a more specific outline of the configuration of the crystallization means and the heating means used in the present embodiment.

この実施形態における結晶化手段42は、洗浄槽から移送された洗浄液を冷却する冷却塔421と、冷却塔の周囲を覆う加熱手段51と、さらにその加熱手段を覆う冷却部422とからなり、固体壁を通して間接的に熱交換を行うことができ、この冷却塔421は、その塔内を冷却部422により冷却し、一旦冷却を止めた後に、加熱手段51により加熱することができるように構成されており、結晶化手段と加熱手段とが一体として構成されている。   The crystallization means 42 in this embodiment includes a cooling tower 421 that cools the cleaning liquid transferred from the cleaning tank, a heating means 51 that covers the periphery of the cooling tower, and a cooling unit 422 that covers the heating means, Heat exchange can be performed indirectly through the wall, and the cooling tower 421 is configured so that the inside of the tower can be cooled by the cooling unit 422 and can be heated by the heating means 51 after the cooling is stopped. The crystallization means and the heating means are integrally formed.

この冷却塔421は、細長い円筒状に形成され、その塔頂からは洗浄槽から移送された洗浄液が供給され、底部からは冷却された洗浄液を排出することができるようになっており、その周囲は塔内を冷却して塔の内壁面に炭酸エチレンの結晶が付着することができるようになっている。また、結晶が付着した後、次いで塔内を加熱することができるため、塔の内壁面に付着した炭酸エチレン結晶を融解して塔の底部から精製した炭酸エチレン液を排出することができるようになっている。   The cooling tower 421 is formed in an elongated cylindrical shape, and the cleaning liquid transferred from the cleaning tank is supplied from the top of the tower, and the cooled cleaning liquid can be discharged from the bottom. In the column, the inside of the tower is cooled so that ethylene carbonate crystals can adhere to the inner wall surface of the tower. In addition, since the inside of the tower can be heated after the crystals are attached, the purified ethylene carbonate liquid can be discharged from the bottom of the tower by melting the ethylene carbonate crystals attached to the inner wall surface of the tower. It has become.

この結晶化手段42を用いて結晶化工程及び加熱工程を行う場合には、まず、洗浄槽3から冷却塔421内に洗浄液が移送され、洗浄液が塔内を通過する。このとき、洗浄液が充分に冷却されるだけの充分な時間をかけるようにゆっくりと塔内を通過するように流量を調整する。   When performing the crystallization process and the heating process using the crystallization means 42, first, the cleaning liquid is transferred from the cleaning tank 3 into the cooling tower 421, and the cleaning liquid passes through the tower. At this time, the flow rate is adjusted so as to pass slowly through the tower so that a sufficient time is allowed for the cleaning liquid to be sufficiently cooled.

例えば、この冷却塔421が、水平断面が円形をした円柱形状をしている場合であって、その断面の直径が10cm、長さが50cm、容積が4Lである場合には、この塔内を通過するのにかける時間が10分程度であり、そのときの洗浄液の塔内での循環量は、線速(LV)で1cm/秒、洗浄液の処理能力は7.5L/時間となる。   For example, when the cooling tower 421 has a cylindrical shape with a circular horizontal cross section, the diameter of the cross section is 10 cm, the length is 50 cm, and the volume is 4 L. The time taken to pass is about 10 minutes, and the circulation rate of the cleaning liquid in the tower at that time is 1 cm / second at the linear velocity (LV), and the processing capacity of the cleaning liquid is 7.5 L / hour.

ここで洗浄液が充分に冷却されると、炭酸エチレン結晶が冷却塔421の内壁に付着し、堆積する。冷却塔421内を通過した洗浄液は、一旦循環槽423に貯留される。循環移送ポンプ424により循環槽423から設定された所定の線速(LV)で冷却塔421の塔頂まで持ち上げられ、再度冷却塔421を通過させることができ、炭酸エチレン結晶を得るのに支障が出ない限りは何度も冷却塔421を通過するように循環することが好ましい。また、冷却塔421内の液濃度を均一にするために循環ポンプ425で液循環を行うことが好ましい。このとき、洗浄槽から新たな洗浄液の供給を同時に行っても良い。   Here, when the cleaning liquid is sufficiently cooled, ethylene carbonate crystals adhere to the inner wall of the cooling tower 421 and are deposited. The cleaning liquid that has passed through the cooling tower 421 is temporarily stored in the circulation tank 423. The circulation transfer pump 424 lifts the cooling tower 421 to the top of the cooling tower 421 at a predetermined linear velocity (LV) set from the circulation tank 423, and can pass through the cooling tower 421 again. As long as it does not come out, it is preferable to circulate through the cooling tower 421 many times. In order to make the liquid concentration in the cooling tower 421 uniform, liquid circulation is preferably performed by the circulation pump 425. At this time, a new cleaning liquid may be simultaneously supplied from the cleaning tank.

冷却塔421の内壁に炭酸エチレン結晶が充分に堆積したところで、塔内から洗浄液を循環槽423へ排出し、冷却塔421の内部には内壁に付着した炭酸エチレン結晶だけを残して、冷却を止める。次いで、塔内を加熱手段51により加熱することにより塔の内壁に付着した結晶は融解して液状となり、精製した炭酸エチレン液を貯留槽426に貯留する。これを循環手段6により洗浄槽へ移送することができる。   When the ethylene carbonate crystals are sufficiently deposited on the inner wall of the cooling tower 421, the cleaning liquid is discharged from the tower to the circulation tank 423, and only the ethylene carbonate crystals adhering to the inner wall are left inside the cooling tower 421 to stop the cooling. . Next, when the inside of the tower is heated by the heating means 51, the crystals attached to the inner wall of the tower are melted to become a liquid, and the purified ethylene carbonate liquid is stored in the storage tank 426. This can be transferred to the washing tank by the circulation means 6.

[有機被膜の洗浄装置及び洗浄方法]
次に、本発明の有機被膜の洗浄装置及び洗浄方法について図面を参照しながら説明する。
[Organic coating cleaning apparatus and cleaning method]
Next, an organic coating film cleaning apparatus and cleaning method of the present invention will be described with reference to the drawings.

図6は、本発明の有機被膜の洗浄装置を示した図である。   FIG. 6 is a view showing an organic coating film cleaning apparatus of the present invention.

この有機被膜の洗浄装置71は、有機被膜洗浄液の結晶化再生装置11と、有機被膜を除去した洗浄対象物に付着した洗浄液をすすぐための純水洗浄槽72と、純水洗浄槽72で付着した純水を乾燥させる乾燥手段74と、洗浄カゴ昇降機73と、炭酸エチレン排気口75とから構成されるものである。   The organic coating film cleaning device 71 is attached to the organic coating film cleaning liquid crystallization regeneration device 11, a pure water cleaning tank 72 for rinsing the cleaning liquid attached to the object to be cleaned from which the organic coating has been removed, and a pure water cleaning tank 72. It comprises a drying means 74 for drying the pure water, a washing basket elevator 73, and an ethylene carbonate exhaust port 75.

このような構成とした場合には、有機被膜の除去から乾燥までを一台の装置で連続的に行うことができ、さらに、洗浄液を再生して循環しながら有機被膜の洗浄を行うことができる。   In the case of such a configuration, the removal from the organic film to the drying can be continuously performed with one apparatus, and further, the organic film can be cleaned while regenerating and circulating the cleaning liquid. .

ここで用いた結晶化再生装置61に関しては、加熱手段5の後に、精製された炭酸エチレン液を貯留することができる再生液貯留手段17を有するものとしたが、その前段の冷却には時間がかかるため、一旦、この再生液貯留手段17へ精製した炭酸エチレンを貯留して洗浄液を循環させることが循環を効率的に行うことができる点で好ましい。   The crystallization regenerator 61 used here has the regenerant liquid storage means 17 that can store the purified ethylene carbonate liquid after the heating means 5, but it takes time to cool the preceding stage. For this reason, once the purified ethylene carbonate is stored in the regenerating solution storage means 17 and the cleaning solution is circulated, it is preferable in terms of efficient circulation.

この場合、最初に使った洗浄液は結晶化手段4へ移送し、洗浄槽には新たに洗浄液を加え、この新たに加えた洗浄液により洗浄を行っている間に、最初の洗浄液の冷却を終了させることが好ましい。よって、本実施の形態においては、冷却をバッチ式で行うことが好ましい。また、この結晶化再生装置として第2の実施形態の再生装置を適用することも可能である。   In this case, the cleaning liquid used first is transferred to the crystallization means 4, and a new cleaning liquid is added to the cleaning tank, and the cooling of the first cleaning liquid is terminated while cleaning is performed with the newly added cleaning liquid. It is preferable. Therefore, in the present embodiment, it is preferable to perform cooling in a batch manner. In addition, the reproducing apparatus of the second embodiment can be applied as the crystallization reproducing apparatus.

純水洗浄槽72は、純水を収容するものであり、有機被膜洗浄液の結晶化再生装置61で有機被膜が除去された洗浄対象物を、この純水洗浄槽72に浸漬することで洗浄対象物に付着している洗浄液を純水で洗い流すものである。ここで、純水洗浄槽72においても、純水でのすすぎを効率良く行うために、有機被膜の洗浄槽3と同様に揺動手段や超音波手段を用いることができる。   The pure water cleaning tank 72 contains pure water, and the object to be cleaned is immersed in the pure water cleaning tank 72 by immersing the cleaning object from which the organic film has been removed by the crystallization regenerating apparatus 61 of the organic film cleaning liquid. The cleaning liquid adhering to the object is washed away with pure water. Here, also in the pure water cleaning tank 72, a swinging means and an ultrasonic means can be used in the same manner as the organic coating cleaning tank 3 in order to efficiently rinse with pure water.

乾燥手段74は、純水洗浄槽72で洗浄した洗浄対象物に対して送風することにより純水を乾燥させるものであり、送風口から乾燥空気を洗浄カゴに向けて吹き付ける方式で洗浄対象物に付着している純水を吹き飛ばし、同時に、純水の蒸発、乾燥を行うことで洗浄対象物を乾燥することができる。   The drying means 74 dries pure water by blowing air to the object to be cleaned that has been cleaned in the pure water cleaning tank 72, and applies it to the object to be cleaned by a method in which dry air is blown from the air blowing port toward the cleaning basket. The object to be cleaned can be dried by blowing off the adhering pure water and simultaneously evaporating and drying the pure water.

洗浄カゴ昇降機73は、洗浄対象物が純水で洗浄された後、純水洗浄槽72の上部に配置された乾燥手段74の送風口まで洗浄対象物が入った洗浄カゴの昇降を行うことができるものである。これは純水洗浄の際に、洗浄を効率的に行うために昇降させてもよい。   The cleaning basket elevator 73 can lift and lower the cleaning basket containing the cleaning object up to the air outlet of the drying means 74 disposed at the top of the pure water cleaning tank 72 after the cleaning object is cleaned with pure water. It can be done. This may be raised and lowered in order to perform cleaning efficiently during pure water cleaning.

炭酸エチレン排気口75は、装置内に拡散する炭酸エチレンの蒸気を排気するものであり、排気ダクトから外部環境へガスが排出される。   The ethylene carbonate exhaust port 75 exhausts vapor of ethylene carbonate that diffuses into the apparatus, and gas is discharged from the exhaust duct to the external environment.

この工程において、洗浄カゴを有機被膜洗浄液の結晶化再生装置61から純水洗浄槽72への移動を搬送手段を用いて自動で行うこととすれば、人の手を煩わさず、効率的に洗浄作業を行うことができる。   In this process, if the cleaning basket is automatically moved from the crystallization regenerating apparatus 61 of the organic film cleaning liquid to the pure water cleaning tank 72 by using the conveying means, the cleaning is efficiently performed without bothering human hands. Work can be done.

また、有機被膜洗浄液の結晶化再生装置61、純水洗浄槽72及び洗浄カゴを移動する搬送手段には、保温手段を有することが好ましい。これは、洗浄液として炭酸エチレンを用いた場合には、平均的に炭酸エチレンの凝固温度36.4℃以下で凝固してしまうため、室温での洗浄作業では洗浄対象物に炭酸エチレンの膜ができてしまうためである。この保温手段を用いることにより炭酸エチレンの固化を防ぎ、洗浄対象物を清浄に保つことができる。   Further, it is preferable that the organic film cleaning liquid crystallization regenerating apparatus 61, the pure water cleaning tank 72, and the transport means for moving the cleaning basket have a heat retaining means. This is because, when ethylene carbonate is used as the cleaning liquid, it solidifies on average at a solidification temperature of ethylene carbonate of 36.4 ° C. or lower, so that a film of ethylene carbonate is formed on the object to be cleaned in the cleaning operation at room temperature. It is because it ends up. By using this heat retaining means, solidification of ethylene carbonate can be prevented and the object to be cleaned can be kept clean.

次に、この装置を用いた有機被膜洗浄液の結晶化再生方法について説明する。   Next, an organic film cleaning liquid crystallization regeneration method using this apparatus will be described.

まず、有機被膜除去工程では、洗浄対象物を洗浄カゴ22に入れ、この洗浄カゴを結晶化再生装置の洗浄槽3の洗浄液中に浸漬して、有機被膜を溶解・除去するのに十分な時間、浸漬して洗浄対象物の有機被膜を除去する。このとき、有機被膜の除去を効率的に行うために、洗浄カゴを洗浄槽中で揺動することが好ましい。   First, in the organic film removal step, the object to be cleaned is put in the cleaning basket 22, and the cleaning basket is immersed in the cleaning solution of the cleaning tank 3 of the crystallization regenerator so that the organic film is sufficiently dissolved and removed. The organic film of the object to be cleaned is removed by dipping. At this time, in order to efficiently remove the organic coating, it is preferable to swing the cleaning basket in the cleaning tank.

この浸漬する時間は、除去する有機被膜の厚さ、量、有機被膜の洗浄液への溶解度等を考慮して適宜決定すればよく、例えば、ノボラック型レジストの1mm厚程度の被膜であれば、20分間の浸漬で有機被膜を完全に除去することができる。   The immersion time may be appropriately determined in consideration of the thickness and amount of the organic film to be removed, the solubility of the organic film in the cleaning solution, and the like. For example, if the film is about 1 mm thick of a novolak resist, 20 The organic coating can be completely removed by immersion for a minute.

有機被膜の除去が終わったら洗浄カゴを洗浄槽3から引き上げ、次に、これを純水洗浄槽72まで移動し、今度は純水洗浄槽72の純水中に浸漬して、有機被膜除去工程で付着した洗浄液を洗い流す。   When the removal of the organic film is finished, the washing basket is lifted from the washing tank 3, then moved to the pure water washing tank 72, and then immersed in the pure water of the pure water washing tank 72 to remove the organic film. Rinse away the cleaning solution adhering to.

このとき、有機被膜洗浄液の結晶化再生装置61での洗浄と同様に揺動、超音波振動により洗浄を行ってもよく、洗浄カゴ昇降機73を用いて洗浄カゴを昇降させることにより行ってもよい。   At this time, the cleaning may be performed by swinging or ultrasonic vibration similarly to the cleaning in the crystallization regeneration device 61 of the organic coating film cleaning liquid, or may be performed by raising and lowering the cleaning basket using the cleaning basket elevator 73. .

洗浄対象物の純水での洗浄が終わったら、次に洗浄カゴ昇降機73により洗浄カゴを純水洗浄槽72から引き上げ、乾燥手段74の送風口まで移動して保持する。次に、乾燥手段の送風口からエアーを洗浄対象物に吹き付けて、純水洗浄槽72で付着した純水を蒸発・乾燥させる。   After the cleaning of the object to be cleaned with pure water is completed, the cleaning basket is then lifted from the pure water cleaning tank 72 by the cleaning basket elevator 73 and moved to the air outlet of the drying means 74 and held. Next, air is blown onto the object to be cleaned from the air outlet of the drying means, and the pure water adhering in the pure water cleaning tank 72 is evaporated and dried.

また、純水洗浄槽72への純水の供給は、純水供給管76から純水洗浄槽72が満水となるまで行えばよく、洗浄対象物のすすぎに用いられた純水は、このすすぎの操作により溢れて、純水洗浄槽72の外側に設けられた槽から純水排水管77を通して排水される。このすすぎに用いられた純水は一度使用されると少なからず汚染されるため、次のすすぎを行う前に、純水排水管77を通して全て排水され、空になった純水洗浄槽72には純水供給管76を通して再度純水が満たされる。このとき、純水洗浄槽自体を清浄に保つために純水の供給、排水を行ってすすいでもよい。   The pure water is supplied to the pure water cleaning tank 72 from the pure water supply pipe 76 until the pure water cleaning tank 72 becomes full. The pure water used for rinsing the object to be cleaned is the rinse. Overflowing by the above operation, the water is drained through a pure water drain pipe 77 from a tank provided outside the pure water cleaning tank 72. Since the pure water used for this rinsing is not a little contaminated once it is used, all the water is drained through the pure water drain pipe 77 and emptied before the next rinsing. The pure water is filled again through the pure water supply pipe 76. At this time, in order to keep the pure water washing tank itself clean, it may be rinsed by supplying and draining pure water.

本実施の形態において、有機被膜の除去、純水洗浄、洗浄槽から純水洗浄槽への搬送を行う際には、ヒーター等による保温手段を用いることが好ましい。洗浄液が炭酸エチレンであった場合には、平均的に炭酸エチレンの凝固温度36.4℃以下になると凝固してしまうため、加温手段を用いることにより洗浄対象物に炭酸エチレンの固体が付着するのを防止し、洗浄対象物を清浄に保つことができる。このときの加温温度は、40〜80℃であることが好ましい。   In the present embodiment, it is preferable to use a heat retaining means such as a heater when removing the organic coating, cleaning with pure water, or transporting from the cleaning tank to the pure water cleaning tank. When the cleaning liquid is ethylene carbonate, it solidifies when the solidification temperature of ethylene carbonate becomes 36.4 ° C. or lower on average, so that the solid of ethylene carbonate adheres to the object to be cleaned by using the heating means. And the object to be cleaned can be kept clean. It is preferable that the heating temperature at this time is 40-80 degreeC.

なお、本実施形態においては、加熱手段5の後に再生液貯留手段17が設けられており、これは、使用済みの洗浄液結晶化再生装置61で再生された液のみでなく、炭酸エチレン洗浄液原液及び洗浄液をオゾン処理した洗浄液の調合も可能であり、均質な洗浄を行うにはこの再生液貯留手段17が必要である。   In the present embodiment, the regenerating liquid storage means 17 is provided after the heating means 5, and this is not only the liquid regenerated by the used cleaning liquid crystallization regenerating apparatus 61 but also the ethylene carbonate cleaning liquid stock solution and It is possible to prepare a cleaning liquid obtained by subjecting the cleaning liquid to ozone treatment, and this regenerating liquid storage means 17 is necessary to perform uniform cleaning.

以下、実施例に基づいて本発明を詳細に説明する。   Hereinafter, the present invention will be described in detail based on examples.

(実施例1)
この実施例においては、図3及び図4に示した構成であり、再生装置の外形寸法が奥行600mm×幅600mm×高さ1000mmでキャスター上に配置された洗浄液結晶化再生装置を用いた。
(Example 1)
In this example, a cleaning liquid crystallization regenerating apparatus having the configuration shown in FIGS. 3 and 4 and having an external dimension of 600 mm in depth × 600 mm in width × 1000 mm in height arranged on a caster was used.

この装置を構成する部品は鏡面仕上げのSUS−316材の円筒形ドラム412(径170mmφ×長さ300mm)で両端中央に25mmφの冷却水導入管414及び冷却水排出管415が各々溶接され、円筒内部に半円筒内容積を占める冷媒体が内蔵されている。本ドラムの外周下方に半円筒の洗浄液貯留槽411(半円筒径300mmφ×長さ350mm)に使用済み洗浄液2(炭酸エチレン80%+レジスト成分20%質量比)を貯留する。ドラム412は30rphのゆっくりした回転をしながら、ドラム表面が約15℃になるようドラム内部の冷水で温度を保持して、ドラム表面に炭酸エチレン結晶を析出させた。ドラム外周に接して50℃に保温されたエラストマー製掻き取り用スクレーバー413で析出結晶を掻き落とし、液状になった炭酸エチレンを50℃に保温された貯留槽に取り出したところ、炭酸エチレンの純度90%、回収率75%であった。   The components constituting this apparatus are a cylindrical drum 412 (diameter: 170 mmφ × length: 300 mm) of SUS-316 material with a mirror finish, and a 25 mmφ cooling water introduction pipe 414 and a cooling water discharge pipe 415 are welded to the centers of both ends, respectively. A refrigerant body occupying the inner volume of the semi-cylindrical body is built in. The used cleaning liquid 2 (ethylene carbonate 80% + resist component 20% mass ratio) is stored in a semi-cylindrical cleaning liquid storage tank 411 (semi-cylindrical diameter 300 mmφ × length 350 mm) below the outer periphery of the drum. While the drum 412 was rotating slowly at 30 rph, the temperature was maintained with cold water inside the drum so that the drum surface was about 15 ° C., and ethylene carbonate crystals were deposited on the drum surface. The deposited crystals were scraped off with an elastomer scraping scraper 413 that was in contact with the outer periphery of the drum and kept at 50 ° C., and the liquefied ethylene carbonate was taken out into a storage tank kept at 50 ° C. %, And the recovery rate was 75%.

なお、スクレーパーで掻き落とした炭酸エチレン結晶をスクレーパー上では加熱せずに、結晶のままSUS304材円筒型300mmφでろ布内臓回転子を持つ回転式遠心分離機にかけ、回転数3000rpmで固液分離して得た炭酸エチレン結晶を40℃で溶液にした場合には、回収再生液は純度が98%、回収率70%であり、非常に高純度な炭酸エチレン溶液を得ることができた。   The ethylene carbonate crystals scraped off by the scraper are not heated on the scraper, but are subjected to solid-liquid separation at a rotational speed of 3000 rpm by using a SUS304 material cylindrical type 300 mmφ and a rotary centrifuge with a filter cloth built-in rotor. When the obtained ethylene carbonate crystals were made into a solution at 40 ° C., the recovered regenerated solution had a purity of 98% and a recovery rate of 70%, and an extremely high purity ethylene carbonate solution could be obtained.

なお、本洗浄液2をオゾンで処理して、レジスト成分を一部有機酸に分解した洗浄液を同様の方法で結晶化再生処理をした場合も同様の再生処理結果が得られた。   In addition, when the cleaning liquid 2 was treated with ozone and the cleaning liquid in which the resist component was partially decomposed into an organic acid was subjected to crystallization regeneration processing by the same method, the same regeneration processing result was obtained.

(実施例2)
この実施例においては、図5に示した構成であり、再生装置の外形寸法が奥行600mm×幅400mm×高さ1000mmでキャスター上に配置された洗浄液結晶化再生装置を用いた。この装置の結晶化手段42は円筒形で構成され、内部が冷却塔421(直径100mm×長さ500mm)でその外側に10mm幅の加熱部51とさらにその外側に10mm幅の冷却部422で構成され、各材料は鏡面仕上げでSUS−316材の上下両端密閉の円筒形ドラムで作製されている。循環槽423は同じく内部鏡面仕上げSUS−316材で内容積10Lの筒型容器で、循環移送ポンプ424は10L/時間で供給できる小型マグネットポンプを選定した。循環ポンプは冷却塔内の液濃度を均質化するためのもので循環移送ポンプと同種のものを使用した。実施例1同様、冷却塔外周表面温度は15℃程度に保持して、冷却塔内循環液は最低温度40℃以上に保つようにすればよく、本実施例では約55℃になるように循環槽423で温度制御した。冷却塔421外周部から析出する結晶量はあらかじめ時間当たりの析出量を実験しておき、洗浄液供給量、循環量、析出時間を算出して、冷却・循環を停止して、まず残液を循環槽に抜き取り、加熱手段51を稼動して50℃程度で結晶を溶解して、SUS316材鏡面仕上げ円筒形移送用貯留槽内容積20Lに移送して貯留したところ、実施例1同様、炭酸エチレンの純度90%、回収率75%であった。
(Example 2)
In this embodiment, a cleaning liquid crystallization regenerating apparatus having the configuration shown in FIG. 5 and having an external dimension of 600 mm in depth × 400 mm in width × 1000 mm in height arranged on a caster was used. The crystallizing means 42 of this apparatus is formed in a cylindrical shape, the inside is a cooling tower 421 (diameter 100 mm × length 500 mm), a heating unit 51 having a width of 10 mm on the outside, and a cooling unit 422 having a width of 10 mm on the outside. Each material is made of a cylindrical drum of SUS-316 material that is mirror-finished and sealed at both upper and lower ends. The circulation tank 423 is a cylindrical container with an internal mirror finish SUS-316 material and an internal volume of 10 L, and the circulation transfer pump 424 is a small magnet pump that can be supplied at 10 L / hour. The circulation pump is for homogenizing the liquid concentration in the cooling tower, and the same type as the circulation transfer pump was used. As in Example 1, the outer surface temperature of the cooling tower may be maintained at about 15 ° C., and the circulating liquid in the cooling tower may be maintained at a minimum temperature of 40 ° C. or more. In this example, the circulating temperature is about 55 ° C. The temperature was controlled in the tank 423. The amount of crystals deposited from the outer periphery of the cooling tower 421 is preliminarily experimented with the amount of precipitation per hour, the cleaning liquid supply amount, the circulation amount, and the precipitation time are calculated, the cooling / circulation is stopped, and the residual liquid is circulated first. The sample was extracted into a tank, the heating means 51 was operated, the crystals were dissolved at about 50 ° C., transferred to a SUS316 mirror-finished cylindrical transfer storage tank internal volume 20 L, and stored in the same manner as in Example 1. The purity was 90% and the recovery rate was 75%.

(実施例3)
この実施例においては、図6に示した如く洗浄装置71と洗浄液結晶化再生装置1で構成され、さらに、洗浄液結晶化再生装置1の加熱手段5の後に、精製された炭酸エチレン液を貯留することができる再生液貯留手段17を有する装置で構成される。洗浄装置71の外形寸法は、奥行1000mm×幅1640mm×高さ1800mm寸法でキャスター上に配置された装置である。また、ここで用いた洗浄槽3は450mm×450mm×420mm寸法で内容積が80Lで、洗浄のための揺動手段21は、洗浄対象物を入れる洗浄カゴ22(320mm×320mm×320mm寸法)を保持することができる保持部23と、この保持部と接続されたカムとから構成され、カム24を回転させることにより洗浄カゴ22を揺動(揺動幅6cm、上下運動、15回/分)させることができる。また、純水洗浄槽72(450mm×450mm×420mm寸法)は内容積80Lで、揺動条件(揺動幅6cm、上下運動)が前記揺動手段21と同様な洗浄カゴ昇降機73で構成されている。
(Example 3)
In this embodiment, as shown in FIG. 6, the cleaning apparatus 71 and the cleaning liquid crystallization regenerating apparatus 1 are configured. Further, after the heating means 5 of the cleaning liquid crystallization regenerating apparatus 1, a purified ethylene carbonate liquid is stored. It is comprised with the apparatus which has the regeneration liquid storage means 17 which can be performed. The external dimensions of the cleaning device 71 are devices arranged on a caster with a depth of 1000 mm × width of 1640 mm × height of 1800 mm. Further, the cleaning tank 3 used here has a size of 450 mm × 450 mm × 420 mm and an internal volume of 80 L, and the swinging means 21 for cleaning has a cleaning basket 22 (320 mm × 320 mm × 320 mm size) into which an object to be cleaned is placed. The holding portion 23 that can be held and a cam connected to the holding portion are configured to swing the cleaning basket 22 by rotating the cam 24 (swing width 6 cm, vertical movement, 15 times / minute). Can be made. Further, the pure water cleaning tank 72 (450 mm × 450 mm × 420 mm size) has an internal volume of 80 L, and a swinging condition (swinging width 6 cm, vertical motion) is constituted by a cleaning basket elevator 73 similar to the swinging means 21. Yes.

まず、洗浄槽内に60Lの炭酸エチレン溶液を注入し、純水洗浄槽には純水供給管76より純水を満杯状態にして、洗浄槽にスピンコーターカップ(200mmφシリコンウエハー用レジスト付着カップ、厚さ1mm程度のレジスト膜が付着)を入れた洗浄カゴ22(320mm×320mm×320mm寸法)を浸漬した。この洗浄カゴを揺動手段により揺動しながら20分間洗浄した。   First, 60 L of an ethylene carbonate solution is poured into the cleaning tank, and the pure water cleaning tank is filled with pure water from the pure water supply pipe 76, and the spin coater cup (resist adhesion cup for 200 mmφ silicon wafer, A cleaning basket 22 (320 mm × 320 mm × 320 mm size) containing a resist film having a thickness of about 1 mm was immersed. The washing basket was washed for 20 minutes while being rocked by the rocking means.

炭酸エチレン洗浄液による洗浄後、直ちに純水が満水状態となっている純水洗浄槽に浸漬し、洗浄カゴ昇降機73により洗浄カゴを揺動しながら3分間洗浄した。このとき、純水洗浄槽から溢れたすすぎに用いられた純水はその外側に配置された槽の底から純水排水管77を通って排水される。   Immediately after the cleaning with the ethylene carbonate cleaning solution, it was immersed in a pure water cleaning tank in which pure water was full, and the cleaning basket was swung by the cleaning basket elevator 73 for 3 minutes. At this time, the pure water used for rinsing overflowing from the pure water washing tank is drained through the pure water drain pipe 77 from the bottom of the tank arranged outside the pure water.

純水によるすすぎが終了した洗浄カゴは、洗浄カゴ昇降機で所定位置まで持ち上げられ、左右にある乾燥手段から噴出される乾燥空気でスピンコーターカップに付着している純水を吹き飛ばし、同時に純水を蒸発させて乾燥した。この乾燥空気による乾燥を15分間行って取り出し、目視で洗浄状態を確認したところ、スピンコーターカップに付着していたレジスト膜は全て除去され、充分に洗浄が行われていることが確認できた。なお、以上の操作は、有機被膜除去・洗浄装置内の温度を40℃近傍に保持して行った。   The washing basket that has been rinsed with pure water is lifted up to a predetermined position by a washing basket elevator, and the pure water adhering to the spin coater cup is blown off by the dry air blown from the drying means on the left and right, and at the same time pure water is discharged. Evaporated to dryness. This drying with dry air was carried out for 15 minutes and taken out, and the cleaning state was visually confirmed. As a result, it was confirmed that the resist film adhering to the spin coater cup was all removed and that the cleaning was sufficiently performed. The above operation was performed while maintaining the temperature in the organic film removing / cleaning apparatus at around 40 ° C.

この洗浄操作の終了後、純水洗浄槽は直ちに洗浄水全量をドレインして、新しい純水を流量160L/分、30秒で注入満水状態として待機する。   After this cleaning operation is completed, the pure water cleaning tank immediately drains the entire amount of cleaning water, and waits for fresh pure water to be filled at a flow rate of 160 L / min for 30 seconds.

レジスト付着洗浄物を洗浄槽で繰り返し洗浄すると、最初は無色透明の炭酸エチレン洗浄液は、剥離洗浄されたレジストを含む洗浄液となり透明茶褐色を呈するようになる。次にこのレジスト汚染された洗浄液を実施例1で示した洗浄液結晶化再生装置1で再生処理して、再生液貯留手段17へ移送して、炭酸エチレン洗浄液原液などの添加調合して洗浄槽3へ供給する。洗浄回数を重ねると完全に無色透明となることがなくなり透明茶褐色の色調が濃くなり、有機被膜の溶解能力が低下するため、洗浄液の交換又は炭酸エチレン原液での調合を行う。洗浄液の交換時期及び原液調合などの管理は洗浄操作状況と透明茶褐色への色調の変化度合いとを色度計で測定することで判断すればよい。   When the resist-adhered cleaning product is repeatedly cleaned in the cleaning tank, the colorless and transparent ethylene carbonate cleaning solution initially becomes a cleaning solution containing the resist that has been stripped and cleaned, and becomes transparent brown. Next, the resist-contaminated cleaning liquid is regenerated by the cleaning liquid crystallization regenerating apparatus 1 shown in the first embodiment, transferred to the regenerating liquid storing means 17, and added with an ethylene carbonate cleaning liquid stock solution to prepare the cleaning tank 3. To supply. If the number of washings is repeated, it will not be completely colorless and transparent, and the color tone of transparent brown will become dark and the dissolving ability of the organic coating will decrease. Therefore, the washing solution will be exchanged or formulated with an ethylene carbonate stock solution. The management of cleaning liquid replacement time and stock preparation preparation may be determined by measuring the cleaning operation status and the degree of color tone change to transparent brown with a chromaticity meter.

本発明に係る有機被膜洗浄液の結晶化再生装置における第1の実施形態を示した概念図である。It is the conceptual diagram which showed 1st Embodiment in the crystallization reproduction | regeneration apparatus of the organic film washing | cleaning liquid which concerns on this invention. 洗浄対象物を揺動するための揺動装置の概念図である。It is a conceptual diagram of the rocking | swiveling apparatus for rocking | fluctuating a cleaning target object. 第1の実施形態における結晶化手段を示した図である。It is the figure which showed the crystallization means in 1st Embodiment. 図3で示した結晶化手段の断面図である。It is sectional drawing of the crystallization means shown in FIG. 本発明に係る有機被膜洗浄液の結晶化再生装置における第2の実施形態に用いた結晶化手段を示した図である。It is the figure which showed the crystallization means used for 2nd Embodiment in the crystallization reproduction | regeneration apparatus of the organic film washing | cleaning liquid which concerns on this invention. 本発明に係る有機被膜の洗浄装置における実施形態を示した図である。It is the figure which showed embodiment in the washing | cleaning apparatus of the organic film which concerns on this invention.

符号の説明Explanation of symbols

1,11,61…洗浄液結晶化再生装置、2…洗浄液、3…洗浄槽、4,41,42…結晶化手段、5,51…加熱手段、6…循環手段、7…レジスト濃縮槽、17…再生液貯留手段、21…揺動装置、22…洗浄カゴ、23…保持手段、24…カム、71…有機被膜の洗浄装置、72…純水洗浄槽、76…純水給水管、77…純水排水管、411…洗浄液貯留槽、412…ドラム、413…スクレーパー、414…冷却水導入口、415…冷却水排出口、421…冷却塔、422…冷却部、423…循環槽、424…循環移送ポンプ、425…循環ポンプ、426…移送用貯留槽   DESCRIPTION OF SYMBOLS 1,11,61 ... Cleaning liquid crystallization reproduction | regeneration apparatus, 2 ... Cleaning liquid, 3 ... Cleaning tank, 4, 41, 42 ... Crystallizing means, 5, 51 ... Heating means, 6 ... Circulation means, 7 ... Resist concentration tank, 17 ... regenerating liquid storage means, 21 ... oscillating device, 22 ... cleaning basket, 23 ... holding means, 24 ... cam, 71 ... cleaning device for organic coating, 72 ... pure water cleaning tank, 76 ... pure water supply pipe, 77 ... Pure water drain pipe, 411 ... cleaning liquid storage tank, 412 ... drum, 413 ... scraper, 414 ... cooling water inlet, 415 ... cooling water outlet, 421 ... cooling tower, 422 ... cooling section, 423 ... circulation tank, 424 ... Circulation transfer pump, 425 ... circulation pump, 426 ... transfer reservoir

Claims (15)

炭酸エチレンを有効成分とする洗浄液を収容する洗浄槽と、
前記洗浄槽から移送された有機被膜を溶解した洗浄液を冷却して炭酸エチレン結晶を析出させる結晶化手段と、
前記結晶化手段で得られた炭酸エチレンを加熱して液状にする加熱手段と、
前記洗浄槽から前記結晶化手段及び前記加熱手段を経由して前記加熱手段により液化した炭酸エチレンを前記洗浄槽へ移送して循環させる循環手段と
を有する有機被膜洗浄液の結晶化再生装置。
A cleaning tank containing a cleaning liquid containing ethylene carbonate as an active ingredient;
Crystallization means for precipitating ethylene carbonate crystals by cooling the cleaning solution dissolving the organic coating transferred from the cleaning tank;
Heating means for heating the ethylene carbonate obtained by the crystallization means to a liquid state;
An apparatus for crystallizing and regenerating an organic coating film cleaning liquid, comprising: circulating means for transferring and circulating ethylene carbonate liquefied by the heating means from the cleaning tank via the crystallization means and the heating means to the cleaning tank.
前記結晶化手段及び前記加熱手段の組合せが、複数組設けられていることを特徴とする請求項1記載の有機被膜洗浄液の結晶化再生装置。   2. The organic film cleaning liquid crystallization regeneration apparatus according to claim 1, wherein a plurality of combinations of the crystallization means and the heating means are provided. 前記結晶化手段で得られた炭酸エチレン結晶に付着した洗浄液を固液分離する固液分離手段を有することを特徴とする請求項1又は2記載の有機被膜洗浄液の結晶化再生装置。   The apparatus for crystallization regeneration of an organic coating film cleaning liquid according to claim 1 or 2, further comprising solid-liquid separation means for solid-liquid separation of the cleaning liquid attached to the ethylene carbonate crystals obtained by the crystallization means. 前記加熱手段により液状となった炭酸エチレンを貯留する再生液貯留手段を有することを特徴とする請求項1乃至3のいずれか1項記載の有機被膜洗浄液の結晶化再生装置。   4. The apparatus for recrystallizing an organic coating film cleaning liquid according to any one of claims 1 to 3, further comprising a regenerating liquid storing means for storing ethylene carbonate that has been liquefied by the heating means. 前記洗浄槽、前記循環手段及び前記再生液貯留手段において、洗浄液が凝固しない温度に保持する保温手段を有することを特徴とする請求項1乃至4のいずれか1項記載の有機被膜洗浄液の結晶化再生装置。   5. The crystallization of the organic coating film cleaning liquid according to claim 1, wherein the cleaning tank, the circulation unit, and the regenerated liquid storage unit include a heat retaining unit that maintains a temperature at which the cleaning liquid does not solidify. Playback device. 請求項1乃至5のいずれか1項記載の有機被膜洗浄液の結晶化再生装置と、
前記有機被膜洗浄液の結晶化再生装置で有機被膜を除去した後に洗浄液をすすぐための純水洗浄槽と、
前記純水洗浄槽で洗浄した後に、付着した純水を乾燥させるための乾燥手段と、
を有することを特徴とする有機被膜の洗浄装置。
An apparatus for crystallizing and regenerating an organic coating film cleaning liquid according to any one of claims 1 to 5,
A pure water cleaning tank for rinsing the cleaning liquid after removing the organic film with the organic film cleaning liquid crystallization regeneration device;
A drying means for drying the adhering pure water after washing in the pure water washing tank;
An organic coating film cleaning apparatus comprising:
前記有機被膜の洗浄装置内を洗浄液が凝固しない温度に保持する保温手段を有することを特徴とする有機被膜の洗浄装置。   An organic coating film cleaning apparatus, comprising: a heat retaining unit that maintains a temperature at which the cleaning liquid does not solidify in the organic coating film cleaning apparatus. 炭酸エチレンを有効成分とする洗浄液で有機被膜を溶解・除去する洗浄工程と、
前記洗浄工程により有機被膜を溶解した洗浄液を冷却することで炭酸エチレン結晶を析出させる結晶化工程と、
前記結晶化工程で析出した炭酸エチレン結晶を加熱して液状にする加熱工程と、
前記洗浄工程で用いられ、前記結晶化工程及び前記加熱工程を経て、前記加熱工程により得られた炭酸エチレン液を前記洗浄工程へと循環させる循環工程と
を含有する有機被膜洗浄液の結晶化再生方法。
A cleaning process for dissolving and removing the organic film with a cleaning liquid containing ethylene carbonate as an active ingredient;
A crystallization step of precipitating ethylene carbonate crystals by cooling the cleaning solution in which the organic coating is dissolved by the cleaning step;
A heating step of heating the ethylene carbonate crystals precipitated in the crystallization step into a liquid state;
A method for recrystallizing an organic coating film cleaning solution, comprising: a circulating step for circulating the ethylene carbonate liquid obtained in the heating step through the crystallization step and the heating step to the cleaning step. .
前記結晶化工程及び前記加熱工程の組合せを、複数回行うことを特徴とする請求項7記載の有機被膜洗浄液の結晶化再生方法。   8. The organic film cleaning liquid crystallization regeneration method according to claim 7, wherein the combination of the crystallization step and the heating step is performed a plurality of times. 前記結晶化工程で得られた炭酸エチレン結晶に付着した洗浄液を固液分離する固液分離工程を含有することを特徴とする請求項8又は9記載の有機被膜洗浄液の結晶化再生方法。   10. The method for recrystallization of an organic coating film cleaning liquid according to claim 8 or 9, further comprising a solid-liquid separation process for solid-liquid separation of the cleaning liquid adhered to the ethylene carbonate crystals obtained in the crystallization process. 前記結晶化工程で、洗浄液が凝固しない温度から30℃の冷却水で冷却することを特徴とする請求項8乃至10のいずれか1項記載の有機被膜洗浄液の結晶化再生方法。   The method for recrystallization of an organic coating film cleaning liquid according to any one of claims 8 to 10, wherein in the crystallization step, the cleaning liquid is cooled with cooling water at 30 ° C from a temperature at which the cleaning liquid does not solidify. 前記加熱工程により液状となった炭酸エチレンを貯留する再生液貯留工程を有することを特徴とする請求項8乃至11のいずれか1項記載の有機被膜洗浄液の結晶化再生方法。   The method for crystallizing and regenerating an organic coating film cleaning liquid according to any one of claims 8 to 11, further comprising a regenerating liquid storing step of storing ethylene carbonate that has become liquid by the heating step. 前記洗浄工程、前記循環工程及び前記再生液貯留工程を洗浄液が凝固しない温度に保持して行うことを特徴とする請求項8乃至12のいずれか1項記載の有機被膜洗浄液の結晶化再生方法。   The method for crystallizing and regenerating an organic coating film cleaning liquid according to any one of claims 8 to 12, wherein the cleaning step, the circulation step, and the regeneration solution storage step are performed while maintaining a temperature at which the cleaning solution does not solidify. 請求項8乃至13のいずれか1項記載の有機被膜洗浄液の結晶化再生方法における洗浄工程により有機被膜が除去された洗浄対象物を純水ですすぐことによって、付着した洗浄液を洗い流す純水洗浄工程と、
前記純水洗浄工程で付着した水を蒸発、乾燥させる乾燥工程と、
を有することを特徴とする有機被膜の洗浄方法。
A pure water cleaning step of rinsing the cleaning liquid adhering to the object to be cleaned from which the organic coating has been removed by the cleaning step in the method for crystallizing and regenerating an organic coating film cleaning liquid according to any one of claims 8 to 13. When,
A drying step of evaporating and drying the water adhering in the pure water cleaning step;
A method for cleaning an organic coating, comprising:
前記洗浄工程、前記洗浄液循環工程及び前記純水洗浄工程を、洗浄液が凝固しない温度に保持して行うことを特徴とする請求項14記載の有機被膜の洗浄方法。   The organic film cleaning method according to claim 14, wherein the cleaning step, the cleaning liquid circulation step, and the pure water cleaning step are performed while maintaining a temperature at which the cleaning liquid does not solidify.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006241088A (en) * 2005-03-04 2006-09-14 Nomura Micro Sci Co Ltd Method for recycling ethylene carbonate and installation for recycling ethylene carbonate
KR100771188B1 (en) 2006-03-31 2007-10-29 신도플라텍 주식회사 Plating device and plating method
CN114534300A (en) * 2022-02-14 2022-05-27 安徽晨翔瑞达机械有限公司 Multifunctional crystallizing tank

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006241088A (en) * 2005-03-04 2006-09-14 Nomura Micro Sci Co Ltd Method for recycling ethylene carbonate and installation for recycling ethylene carbonate
KR100771188B1 (en) 2006-03-31 2007-10-29 신도플라텍 주식회사 Plating device and plating method
CN114534300A (en) * 2022-02-14 2022-05-27 安徽晨翔瑞达机械有限公司 Multifunctional crystallizing tank
CN114534300B (en) * 2022-02-14 2023-10-31 安徽晨翔瑞达机械有限公司 Multifunctional crystallization tank

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