JP2005158481A - Image display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an image display device by which better image display without defects such as a dark spot is obtained and a portion where an electrode layer to be connected by an ACF is formed is tough. <P>SOLUTION: The image display device includes a base material, a display layer formed on the base material, a gas barrier layer formed on the display layer and the electrode layer formed in a pattern-like form on the gas barrier layer, and the electrode layer is connected by the ACF, wherein the gas barrier layer includes a region in which an interlayer is formed and a region in which the interlayer is not formed. The gas barrier layer on a display portion in which the display layer is formed is in a region where the interlayer is formed, while the gas barrier layer which is arranged around the display portion and on the portion where the electrode layer is formed at a non-display portion where the display layer is not formed is in the region where the interlayer is not formed. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to an image display device such as an organic EL element.

  In recent years, with the diversification of information, display devices in the information field have high brightness, high contrast, high luminous efficiency, high resolution, wide viewing angle, miniaturization, colorization, lightness, thinness. Such excellent features as a display element are demanded, and active development is progressing toward low power consumption and high-speed response. Particularly, high-definition full-color display devices have been widely devised.

  What is important for practical application as such a color display device is that it has a fine color display function and has long-term stability. However, some display elements have a disadvantage that light emission characteristics such as current-luminance characteristics are remarkably lowered when driven for a certain period.

  A typical cause of the deterioration of the light emission characteristics is the growth of light emission defect points called dark spots. This dark spot is considered to be caused by oxidation or aggregation of the laminated constituent material of the display element due to oxygen or moisture in the display element. The growth of the dark spot proceeds not only during energization (during driving) but also during storage, and in an extreme case spreads over the entire light emitting surface. The growth is particularly accelerated by (1) oxygen or moisture present around the display element, (2) affected by oxygen or moisture present as an adsorbate in the organic laminated film, and (3) display element fabrication. It is considered that it is also affected by moisture adsorbed on parts used at times, or moisture intrusion during production.

As a method for preventing the moisture from entering the display element, for example, as an organic EL element manufacturing method, an insulating inorganic oxide film layer having a thickness of 0.01 to 200 μm is provided on the organic EL layer. (Patent Document 1). Further, it is disclosed that an overcoat layer and an insulating inorganic oxide film layer are provided on the organic EL layer (Patent Document 2). The inorganic oxide film layer is required to have high moisture resistance for maintaining the life of the organic EL layer, and the gas permeability coefficient of water vapor or oxygen in the inorganic oxide film layer is measured by the gas permeability test method of JIS K7126. Is preferably 10 ⁻¹³ cc · cm / cm ² · s · cmHg or less. Moreover, the said overcoat layer planarizes the unevenness | corrugation of the surface after application | coating, and reduces the disconnection of an electrode.

Further, as shown in Patent Document 3 and Patent Document 4, as a method for producing a color filter, there is a method of forming SiO _x and SiN _x by DC sputtering on a resin protective layer formed on the color filter layer. This method has the effect of improving the adhesion of the transparent conductive film. Further, a method of sintering low melting point glass is known (Patent Document 5). In addition, as a sealing method for blocking the organic EL element from the outside air, a method of forming a SiN _X film by a CVD method is known (Patent Document 6).

  However, in any of the inventions described in any of the above documents, it can be said that the moisture-proof property and gas barrier property for preventing the deterioration of the display device such as the organic EL device are not sufficient.

  Then, the method of sealing an organic EL element is disclosed by forming the barriering laminated body which laminated | stacked the inorganic oxide layer and the resin layer alternately on the organic EL layer (for example, refer patent document 7). . When such a barrier laminate is, for example, a laminate comprising three layers composed of an inorganic oxide layer, a resin layer, and an inorganic oxide layer, the first inorganic oxide layer on the organic EL layer The inside pinhole is filled by forming a resin layer thereon, and further, an inorganic oxide layer is formed on the resin layer, thereby preventing entry of oxygen, moisture, and the like. However, when the ACF is connected to the electrode layer forming portion of the display element, the inorganic oxide is used because the resin layer is thick and flexible when the resin layer is provided on the electrode layer forming portion. There was a problem that the layer and the electrode were broken.

JP-A-8-279394 JP 2002-318543 A Japanese Patent Laid-Open No. 7-146480 Japanese Patent Laid-Open No. 10-10518 JP 2000-214318 A JP 2000-223264 A JP 2002-134271 A

  The present invention has been made in view of the above problems, and provides an image display device capable of displaying a good image without defects such as dark spots and having a tough electrode layer forming portion connected to an ACF. This is the main purpose.

In order to achieve the above object, the present invention is formed in a pattern on a base material, a display layer formed on the base material, a gas barrier layer formed on the display layer, and the gas barrier layer. An image display device in which the electrode layer is ACF-connected,
The gas barrier layer has an intermediate layer forming region in which an intermediate layer is formed, and a non-intermediate layer forming region in which no intermediate layer is formed,
The gas barrier layer on the display portion where the display layer is provided is an intermediate layer forming region, and is an electrode in which an electrode layer of a non-display portion where the display layer is not formed is disposed around the display portion The gas barrier layer on the layer forming portion is a non-intermediate layer forming region.

  According to the present invention, the gas barrier layer on the electrode layer forming portion on which the electrode layer of the non-display portion on which no display layer is formed is formed is a non-intermediate layer forming region on which no intermediate layer is formed. When the ACF connection is made to this electrode layer forming portion, the gas barrier layer or the electrode layer can be connected without being broken. In addition, since the display portion in which the display layer is formed has a structure in which a gas barrier layer and an intermediate layer are laminated, it can have a high gas barrier property and can display an image without defects such as dark spots. Become.

  In the above invention, the non-intermediate layer forming region may be the entire region of the non-display portion. In this case as well, when the ACF connection is made to the electrode layer forming portion of the non-display portion, it is possible to prevent the electrode layer and the like from being cracked and to display an image without a defect such as a dark spot. .

  The present invention also provides an organic EL element characterized in that the display layer in the image display device described above is a color conversion layer.

  According to the present invention, the above-described electrode forming portion connected to the ACF is strong, and an organic EL layer or the like is formed on the electrode layer of the image display device having a high gas barrier property. It can be set as the high quality organic EL element which is not influenced by.

The present invention also includes a display layer forming step of forming a display layer on a substrate, a gas barrier layer forming step of forming a gas barrier layer on the display layer, and an electrode layer formed in a pattern on the gas barrier layer. And an electrode layer forming step, wherein the electrode layer is ACF-connected,
The gas barrier layer forming step includes
A first barrier layer forming step of forming a first barrier layer on the display portion where the display layer is formed and on the non-display portion where the display layer is not formed, which is disposed around the display portion;
An intermediate layer forming step of forming an intermediate layer in a pattern in another region so as not to form an intermediate layer on the electrode layer forming portion where at least the electrode layer of the non-display portion is formed;
And a second barrier layer forming step for forming a second barrier layer on the region where the first barrier layer is formed.

  The electrode layer forming portion in which the electrode layer of the non-display portion is formed is a portion that is strongly sandwiched when ACF connection is made. In the present invention, an intermediate layer is formed in the electrode layer forming portion that is ACF connected. By not having this, the problem that the electrode layer or the gas barrier layer breaks can be avoided. In the present invention, the display portion provided with at least the display layer has a structure in which the gas barrier layer and the intermediate layer are alternately stacked, and therefore it is possible to provide gas barrier properties. Therefore, in the present invention, it is possible to display a good image without defects such as dark spots, and to stably manufacture the image display device without breaking the electrode layer or the like when the ACF connection is made to the electrode layer forming portion. It can be done.

  In the said invention, it is preferable to form an intermediate | middle layer in a pattern shape so that an intermediate | middle layer may not be formed on the said non-display part at the said intermediate | middle layer formation process. In this case as well, good image display without defects such as dark spots is possible, and an image display device can be stably manufactured without cracking the electrode layer or the like when ACF is connected to the electrode layer forming portion. Because you can.

In the above invention, the intermediate layer forming step includes
A wettability changing layer forming step of forming a wettability changing layer on which the wettability is changed by the action of a photocatalyst on the first barrier layer;
Only the portion forming the intermediate layer, a wettability changing step for changing the wettability from lyophobic to lyophilic by the action of a photocatalyst accompanying energy irradiation,
It is preferable to have an intermediate layer forming coating solution applying step of applying the intermediate layer forming coating solution to the lyophilic region that has become lyophilic in the wettability changing step. In the intermediate layer forming step, the intermediate layer is formed in a pattern by using a pattern due to a difference in wettability caused by the action of the photocatalyst accompanying energy irradiation. Therefore, since a pattern due to a difference in wettability can be formed only by energy irradiation, this is a useful method in that the labor required for patterning the intermediate layer can be largely omitted.

  The present invention also provides a method for producing an organic EL element, wherein the display layer in the method for producing an image display device described above is a color conversion layer.

  According to the present invention, the above-described electrode forming portion connected to the ACF is strong, and an organic EL layer or the like is formed on the electrode layer of the image display device having a high gas barrier property. Therefore, it is possible to manufacture a high-quality organic EL element that is not affected by the above.

  According to the present invention, the gas barrier layer on the electrode layer forming portion on which the electrode layer of the non-display portion on which no display layer is formed is formed is a non-intermediate layer forming region on which no intermediate layer is formed. When the ACF connection is made to this electrode layer forming portion, the gas barrier layer or the electrode layer can be connected without being broken. In addition, since the display portion in which the display layer is formed has a structure in which a gas barrier layer and an intermediate layer are laminated, it can have a high gas barrier property and can display an image without defects such as dark spots. Become.

  The present invention includes an image display device, an organic EL element using the image display device, and a manufacturing method thereof. Hereinafter, each will be described in detail.

A. Image Display Device First, the image display device of the present invention will be described.

  The image display device of the present invention includes a base material, a display layer formed on the base material, a gas barrier layer formed on the display layer, and an electrode layer formed in a pattern on the gas barrier layer. The gas barrier layer includes: an intermediate layer forming region in which an intermediate layer is formed; and a non-intermediate layer forming region in which no intermediate layer is formed. The gas barrier layer on the display unit provided with the display layer is an intermediate layer forming region, and the electrode layer of the non-display unit that is disposed around the display unit and is not formed with the display layer is provided. The gas barrier layer on the formed electrode layer forming portion is a non-intermediate layer forming region.

  The image display apparatus of the present invention will be described with reference to the drawings. FIG. 1 is a schematic sectional view showing an example of the image display device of the present invention, and FIG. 2 is a schematic plan view showing an example of the image display device of the present invention. As shown in FIG. 1, the image display apparatus of the present invention includes a base material 1, a display layer 2 formed on the base material 1, a gas barrier layer 3 formed on the display layer 2, and the gas barrier. It has the intermediate | middle layer 4 formed in the layer 3, and the electrode layer 5 formed on the said gas barrier 3 layer. The gas barrier layer 3 has an intermediate layer forming region 11 where the intermediate layer 4 is formed, and a non-intermediate layer forming region 12 where the intermediate layer 4 is not formed. As shown, it is formed in a pattern on the gas barrier layer 3. Further, as shown in FIG. 2, the gas barrier layer 3 on the electrode layer forming portion where the electrode layer 5 of the non-display portion 14 where at least the display layer is not formed is formed is a non-intermediate layer forming region 12.

  Normally, when an ACF connection is made to an electrode layer, it is connected to an electrode layer forming portion where a non-display portion electrode layer in which no display layer is formed is formed. Therefore, in the case where a flexible layer such as a resin layer is provided in the electrode forming portion, there is a problem that the electrode layer is broken. On the other hand, in the present invention, since the intermediate layer is not formed in the gas barrier layer on the electrode layer forming portion where the electrode layer of the non-display portion where at least the display layer is not formed is formed, this electrode layer forming portion When the ACF connection is made, the gas barrier layer or the electrode layer can be connected without being broken. In addition, since the display portion in which the display layer is formed has a three-layer structure in which the gas barrier layer, the intermediate layer, and the gas barrier layer are sequentially stacked, the gas barrier property can be improved. That is, even when there is a defect part such as a pinhole in the gas barrier layer, the pinhole of the gas barrier layer is blocked by forming an intermediate layer between the two gas barrier layers, and the pin penetrates above and below the gas barrier layer. It is possible to prevent generation of holes and the like. Thereby, it is possible to display an image without a defect such as a dark spot.

  Hereinafter, each configuration of such an image display apparatus will be described.

1. Base material First, the base material used for this invention is demonstrated. In this invention, the base material may be comprised only from the board | substrate and may be comprised from the board | substrate and the functional layer. Hereinafter, each structure of such a base material is demonstrated.
(1) Substrate The substrate used in the present invention is preferably transparent when extracting light from the substrate side or when irradiating energy from the substrate side when forming an intermediate layer described later. Further, when light is extracted from the opposite side of the substrate, that is, the electrode layer side, transparency is not particularly required. Further, the substrate preferably has solvent resistance and heat resistance and is excellent in dimensional stability. This is because it is possible to stabilize the functional layer, the display layer, the first barrier layer, and the like on the substrate.

  As such a transparent substrate, for example, a glass plate or a film or sheet formed of an organic material can be used.

  In the present invention, when a glass plate is used as the transparent substrate, it is not particularly limited as long as it is highly permeable to visible light. For example, an unprocessed glass plate may be used. Moreover, the processed glass plate etc. may be sufficient. As such a glass plate, both alkali glass and non-alkali glass can be used. However, when impurities are a problem in the present invention, for example, non-alkali glass such as Pyrex (registered trademark) glass. Is preferably used. Further, the type of the processed glass plate is appropriately selected according to the use of the image display device of the present invention, for example, a transparent glass substrate coated or stepped processed Can be mentioned.

  The film thickness of such a glass plate is preferably in the range of 30 μm to 2 mm. In particular, when used as a flexible substrate, it is preferably in the range of 30 μm to 200 μm, and used as a rigid substrate. In some cases, it is preferably within a range of 200 μm to 2 mm.

  Organic materials used as transparent substrates include polyarylate resin, polycarbonate resin, crystallized polyethylene terephthalate resin, polyethylene terephthalate resin, polyethylene naphthalate resin, UV curable methacrylic resin, polyether sulfone resin, polyether ether ketone. Examples thereof include resins, polyetherimide resins, polyphenylene sulfide resins, polyimide resins and the like.

  Further, as the transparent substrate, for example, the above-described organic material, for example, cyclic polyolefin resin, polystyrene resin, acrylonitrile-styrene copolymer (AS resin), acrylonitrile-butadiene-styrene copolymer (ABS resin), poly (Meth) acrylic resins, polycarbonate resins, polyester resins such as polyethylene terephthalate and polyethylene naphthalate, polyamide resins such as various nylons, polyurethane resins, fluorine resins, acetal resins, cellulose resins, polyethers Two or more types can be used in combination with a sulfone resin or the like.

  In the present invention, when a transparent substrate is formed using the organic material as described above, the thickness is within the range of 10 μm to 500 μm, especially within the range of 50 to 400 μm, and particularly within the range of 100 to 300 μm. Is preferred. If it is thicker than the above range, the impact resistance will be inferior when producing the image display device of the present invention, it will be difficult to wind up during winding, and deterioration of gas barrier properties such as water vapor and oxygen will be seen, etc. Because there is. Further, when the thickness is less than the above range, the mechanical suitability is poor, and the gas barrier property against water vapor, oxygen and the like is lowered.

  Moreover, as a board | substrate which does not have transparency, metals, such as aluminum and its alloy, a plastics, a textile fabric, a nonwoven fabric, etc. can be mentioned, for example.

  In the present invention, it is preferable to clean and use the substrate. As the cleaning method, it is preferable to perform ultraviolet light irradiation treatment with oxygen, ozone, etc., plasma treatment, argon sputtering treatment, or the like. This is because moisture and oxygen are not adsorbed, and dark spots can be reduced and the life of the image display device can be extended.

(2) Functional layer Next, the functional layer used for this invention is demonstrated. In the present invention, a functional layer may be formed on the substrate. The functional layer is not particularly limited as long as it can be used for an image display device, and examples thereof include a light emitting layer, a color filter layer, and a counter electrode. The layer configuration of such a functional layer is not particularly limited, and is appropriately selected according to the use of the image display device of the present invention.

  Hereinafter, a light emitting layer, a color filter layer, and a counter electrode will be described as examples of such a functional layer.

(I) Light-Emitting Layer The light-emitting layer used in the present invention is not particularly limited as long as it contains a fluorescent material and emits light.

  Examples of the material used for such a light emitting layer include a dye material, a metal complex material, and a polymer material.

  Examples of the dye material include cyclopentamine derivatives, tetraphenylbutadiene derivatives, triphenylamine derivatives, oxadiazole derivatives, pyrazoloquinoline derivatives, distyrylbenzene derivatives, distyrylarylene derivatives, silole derivatives, thiophene ring compounds, pyridine Examples thereof include a ring compound, a perinone derivative, a perylene derivative, an oligothiophene derivative, a trifumanylamine derivative, an oxadiazole dimer, and a pyrazoline dimer.

  Examples of the metal complex materials include aluminum quinolinol complex, benzoquinolinol beryllium complex, benzoxazole zinc complex, benzothiazole zinc complex, azomethyl zinc complex, porphyrin zinc complex, europium complex, etc. Or a metal complex having a rare earth metal such as Tb, Eu, or Dy and having a ligand such as oxadiazole, thiadiazole, phenylpyridine, phenylbenzimidazole, or quinoline structure.

  Furthermore, the polymer materials include polyparaphenylene vinylene derivatives, polythiophene derivatives, polyparaphenylene derivatives, polysilane derivatives, polyacetylene derivatives, etc., polyfluorene derivatives, polyvinylcarbazole derivatives, the above dye bodies, and metal complex light emitting materials. A polymerized product can be exemplified.

(Ii) Color filter layer In this invention, the color filter layer may be formed on the said light emitting layer as needed. This is because an image display device with high color reproducibility can be obtained.

  The color filter layer used in the present invention is a layer that further adjusts the color tone of light emitted from the light emitting layer described above or transmitted through the color conversion layer, and corresponds to each color of the light emitting layer or the color conversion layer described later. Blue, red, and green color filter layers are formed at the positions. By forming such a color filter layer, it is possible to achieve high-purity color development and high color reproducibility.

  As a material for forming the color filter layer, pigments and resins that can be used for color filters can be used. Further, a black matrix may be formed between the colors.

(Iii) Counter electrode The counter electrode used in the present invention is an electrode facing an electrode layer described later, and is appropriately selected according to the application of the image display device. Moreover, it is preferable to select the material of a counter electrode according to the electrode layer mentioned later.

2. Display Layer Next, the display layer used in the present invention will be described. In the present invention, the display layer is formed on the substrate, and a gas barrier layer is formed on the display layer. For example, as shown in FIG. 1, the display layer 2 is formed in a pattern on the substrate 1, and the display unit 13 provided with the display layer 2 and the display layer 2 are not formed on the substrate 1. There are two areas of the non-display portion 14. Further, the gas barrier layer 3 on the display unit 13 on which the display layer 2 is formed is an intermediate layer forming region 11 on which the intermediate layer 4 is formed. In the present invention, since the gas barrier layer on the display portion on which the display layer is formed has a structure in which the gas barrier layer and the intermediate layer are laminated, the gas barrier property can be high and dark spots can be obtained. It is possible to display an image without any defects such as.

  The display layer used in the image display device of the present invention is not particularly limited as long as it is usually used in an image display device, and examples thereof include a color conversion layer and a color filter layer. Hereinafter, a color conversion layer and a color filter layer will be described as examples of such a display layer.

(1) Color Conversion Layer First, the color conversion layer used in the present invention will be described. The color conversion layer is a layer that contains a fluorescent material that absorbs light emitted from the light emitter and emits fluorescence in the visible light range, and the light from the light emitter can be blue, red, and green. If there is, it will not be specifically limited. For example, a color conversion layer that emits light of each of three fluorescent layers of blue, red, and green may be formed, and a transparent resin layer is formed instead of the blue color conversion layer using a blue light emitter. May be.

  The color conversion layer usually contains an organic fluorescent dye that absorbs light from a light emitter and emits fluorescence and a matrix resin.

  The organic fluorescent dye used in the color conversion layer absorbs light in the near ultraviolet region or visible region emitted from a light emitter, particularly light in the blue or blue-green region, and emits visible light having a different wavelength as fluorescence. . Usually, since a blue illuminant is used as the illuminant, it is preferable to use at least one fluorescent dye that emits fluorescence in the red region, which is combined with one or more fluorescent dyes that emit fluorescence in the green region. It is preferable.

  That is, when a light emitter that emits light in the blue or blue-green region is used as a light source, if light from the light emitter is passed through a simple red color filter layer to obtain light in the red region, the wavelength of the red region is originally Because there is little light, it becomes very dark output light. Therefore, the light in the red region having sufficient intensity can be output by converting the light in the blue or blue-green region from the light emitter into the light in the red region by the fluorescent dye.

  On the other hand, the light in the green region may be output by converting the light from the illuminant into the light in the green region by another organic fluorescent dye, similarly to the light in the red region. Alternatively, if the light emission of the light emitter sufficiently includes light in the green region, the light from the light emitter may simply be output through the green color filter layer. Furthermore, regarding the light in the blue region, the light emitted from the illuminant may be converted and output using a fluorescent dye, but it is preferable to output the light from the illuminant through a simple blue color filter layer.

  Examples of fluorescent dyes that absorb light in the blue to blue-green region emitted from the light emitter and emit fluorescence in the red region include rhodamine B, rhodamine 6G, rhodamine 3B, rhodamine 101, rhodamine 110, sulforhodamine, basic violet 11, Rhodamine dyes such as Basic Red 2, cyanine dyes, pyridine dyes such as 1-ethyl-2- [4- (p-dimethylaminophenyl) -1,3-butadienyl] -pyridinium perchlorate (pyridine 1), Or an oxazine pigment | dye etc. are mentioned. Furthermore, various dyes (direct dyes, acid dyes, basic dyes, disperse dyes, etc.) can be used if they are fluorescent.

  Examples of fluorescent dyes that absorb blue to blue-green light emitted from a light emitter and emit green light include 3- (2′-benzothiazolyl) -7-diethylaminocoumarin (coumarin 6), 3- (2'-Benzimidazolyl) -7-N, N-diethylaminocoumarin (coumarin 7), 3- (2'-N-methylbenzimidazolyl) -7-N, N-diethylaminocoumarin (coumarin 30), 2, 3, 5 , 6-1H, 4H-tetrahydro-8-trifluoromethylquinolidine (9,9a, 1-gh) coumarin (coumarin 153), or the like, or basic yellow 51 which is a coumarin dye-based dye, and solvent Examples thereof include naphthalimide dyes such as yellow 11 and solvent yellow 116. Furthermore, various dyes (direct dyes, acid dyes, basic dyes, disperse dyes, etc.) can be used if they are fluorescent.

  In addition, the organic fluorescent dye is previously added to polymethacrylic acid ester, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer resin, alkyd resin, aromatic sulfonamide resin, urea resin, melamine resin, benzoguanamine resin, and a mixture of these resins. It may be kneaded into a pigment to obtain an organic fluorescent pigment. Further, these organic fluorescent dyes and organic fluorescent pigments (hereinafter collectively referred to as organic fluorescent dyes together) may be used alone or in combination of two or more in order to adjust the hue of fluorescence. May be.

  The organic fluorescent dye is contained in the color conversion layer in an amount of 0.01 to 5% by weight, more preferably 0.1 to 2% by weight, based on the weight of the color conversion layer. When the content of the organic fluorescent dye is less than 0.01% by weight, sufficient wavelength conversion cannot be performed, and when the content exceeds 5% by weight, color quenching is caused by effects such as concentration quenching. This is because the conversion efficiency decreases.

  In addition, the matrix resin is a photocurable or photothermal combination curable resin (resist) that is subjected to light and / or heat treatment to generate radical species or ionic species to be polymerized or crosslinked to be insoluble and infusible. In order to perform patterning of the color conversion layer, it is desirable that the photocurable or photothermal combination type curable resin is soluble in an organic solvent or an alkaline solution in an unexposed state.

  Such a photocurable or photothermal combination type curable resin comprises (i) a composition comprising an acrylic polyfunctional monomer and oligomer having a plurality of acryloyl groups and methacryloyl groups, and a photo or thermal polymerization initiator, (ii) A composition comprising a polyvinylcinnamic acid ester and a sensitizer, (iii) a composition comprising a chain or cyclic olefin and bisazide, and (iv) a composition comprising an epoxy group-containing monomer and an acid generator, etc. Including. In particular, the composition comprising the acrylic polyfunctional monomer and oligomer (i) and photo or thermal polymerization initiator is capable of high-definition patterning and has high reliability such as solvent resistance and heat resistance. To preferred. As described above, the matrix resin is formed by applying light and / or heat to the photocurable or photothermal combination type curable resin.

  The photopolymerization initiator, sensitizer and acid generator that can be used in the color conversion layer are preferably those that initiate polymerization by light having a wavelength that is not absorbed by the fluorescent conversion dye contained therein. In the color conversion layer, when the resin itself in the photocurable or photothermal combination type curable resin can be polymerized by light or heat, it is possible to add no photopolymerization initiator and thermal polymerization initiator. It is.

  The film thickness of the color conversion layer is preferably 5 μm or more, and more preferably in the range of 8 μm to 20 μm. The shape of the color conversion layer is appropriately selected depending on the target image display device. For example, a rectangular or circular area of red, blue, and green is formed on the substrate as a set. Alternatively, it may be formed in a stripe shape. It is also possible to form more specific color conversion layers than other color conversion layers.

(2) Color filter layer Next, the color filter layer will be described. In the present invention, if necessary, a color filter layer may be formed on the color conversion layer. This is because an image display device with high color reproducibility can be obtained.

  The color filter layer used in the present invention is a layer for adjusting the color tone of transmitted light, and blue, red, and green color filter layers are formed, respectively. By forming such a color filter layer, it is possible to achieve high-purity color development and high color reproducibility.

  For the color filter layer, pigments and resins that can be generally used for color filters can be used.

3. Next, the gas barrier layer used in the present invention will be described. In the present invention, the gas barrier layer has gas barrier properties, is formed on the display layer, and an electrode layer is formed on the gas barrier layer. Further, the gas barrier layer has an intermediate layer forming region in which an intermediate layer is formed and a non-intermediate layer forming region in which no intermediate layer is formed.

  For example, as shown in FIG. 1, the gas barrier layer used in the present invention includes an intermediate layer 4 formed in the gas barrier layer 3 in the display unit 13 provided with the display layer 2, and the intermediate layer forming region 11. It has become. On the other hand, in the non-display portion 14 where the display layer 2 is not formed, the intermediate layer 4 is not formed in the gas barrier layer 3 but is a non-intermediate layer forming region. As described above, in the present invention, at least the display portion provided with the display layer has a three-layer structure in which the gas barrier layer, the intermediate layer, and the gas barrier layer are sequentially laminated, thereby providing high gas barrier properties. Is possible. That is, even when there are defects such as pinholes in the gas barrier layer, since the intermediate layer is formed between the two gas barrier layers, the pinholes in the gas barrier layer are blocked and the gas barrier layer is moved up and down. Generation of a penetrating pinhole or the like can be prevented. Therefore, in the present invention, an image display device free from defects such as dark spots can be manufactured.

  Further, as shown in FIG. 2, the gas barrier layer 3 on the electrode layer forming portion where the electrode layer 5 of the non-display portion 14 where the display layer is not formed is formed in the non-intermediate layer formation where the intermediate layer is not formed. Part 12. The electrode layer forming portion on which the electrode layer of the non-display portion is formed is a portion that is strongly sandwiched when ACF connection is made. In the present invention, no intermediate layer is provided in this electrode layer forming portion. Therefore, the electrode layer or the gas barrier layer is not broken at the time of connection, and a high-quality image display device can be stably manufactured.

  Hereinafter, the gas barrier layer and the intermediate layer will be described separately.

(1) Gas Barrier Layer The gas barrier layer used in the present invention preferably has electrical insulation and resistance to organic solvents, and has a transmittance of 50% or more for visible light, especially 85. % Or more is preferable. This is because when the image display device is obtained, the brightness can be increased. Here, the transmittance | permeability with respect to visible light is the value measured using the Suga Test Co., Ltd. total light transmittance apparatus (COLOUR S & M COMPUTER MODEL SM-C: model number).

  The material of the gas barrier layer used in the present invention is not particularly limited as long as it has the properties described above. For example, an inorganic oxide film, an inorganic oxynitride film, an inorganic nitride film, or a metal film that is a combination of one or more can be used. Examples of the inorganic oxide film include a silicon oxide film, a silicon oxynitride film, an aluminum oxide film, a magnesium oxide film, a titanium oxide film, a tin oxide film, and an indium oxide alloy film. Examples of the inorganic nitride film include a silicon nitride film, an aluminum nitride film, and a titanium nitride film. Furthermore, examples of the metal film include an aluminum film, a silver film, a tin film, a chromium film, a nickel film, and a titanium film.

  Among the above materials, a silicon oxide film or a silicon oxynitride film is preferable. This is because these materials have good adhesion to the display layer. Such a silicon oxide thin film can be formed using an organosilicon compound as a raw material. Specific examples of the organosilicon compound include 1,1,3,3-tetramethyldisiloxane, hexamethyldisiloxane, vinyltrimethylsilane, hexamethyldisilane, methylsilane, dimethylsilane, trimethylsilane, diethylsilane, and propylsilane. , Phenylsilane, vinyltriethoxysilane, tetramethoxysilane, phenyltriethoxysilane, methyltriethoxysilane, octamethylcyclotetrasiloxane and the like. Among the organosilicon compounds, tetramethoxysilane (TMOS) and hexamethyldisiloxane (HMDSO) are preferably used. This is because these are excellent in handleability and vapor deposition film characteristics.

  Moreover, in this invention, in order to improve gas barrier property, you may laminate | stack two or more said gas barrier films, and the combination does not ask | require the same kind or a different kind.

  Here, in the present invention, the film thickness of the gas barrier layer as described above is appropriately selected depending on the material, but is usually in the range of 30 nm to 5000 nm, and in particular in the range of 30 nm to 500 nm. It is preferable. In particular, in the case of the aluminum oxide film or the silicon oxide film, the thickness is preferably in the range of 50 nm to 300 nm. This is because if the thickness is smaller than the above range, the gas barrier property against water vapor, oxygen and the like is lowered. If the thickness is larger than the above range, for example, when the image display device of the present invention is manufactured, cracks or the like may occur, and this causes deterioration of gas barrier properties against water vapor, oxygen gas, and the like. Because it is.

(2) Intermediate layer Next, the intermediate layer used in the present invention will be described. In the present invention, the intermediate layer is formed on the gas barrier layer, and a gas barrier layer is further formed on the intermediate layer. Further, the intermediate layer is formed in a pattern on the gas barrier layer so as to be formed at least in the display portion where the display layer is provided. Further, the gas barrier layer on the electrode layer forming portion where the electrode layer of the non-display portion where the display layer is not formed is a non-intermediate layer forming region where the intermediate layer is not formed.

  For example, as shown in FIG. 1, the intermediate layer 4 is formed in a pattern between the gas barrier layers 3 so as to be formed at least in the display unit 13 in which the display layer 2 is formed. As described above, in the present invention, the display portion provided with at least the display layer has a structure in which the gas barrier layer, the intermediate layer, and the gas barrier layer are sequentially laminated, and thus it is possible to provide gas barrier properties. Become. In other words, even when there are defects such as pinholes in the gas barrier layer, the intermediate layer is formed in the two gas barrier layers, so the pinholes in the gas barrier layer are blocked, and the gas barrier layer penetrates vertically. It is possible to prevent the generation of a pinhole or the like.

  Further, as shown in FIG. 2, the gas barrier layer 3 on the electrode layer forming portion where the electrode layer 5 of the non-display portion 14 where the display layer is not formed is formed in the non-intermediate layer formation where the intermediate layer is not formed. Part 12. The electrode layer forming portion in which the electrode layer of the non-display portion is formed is a portion that is strongly sandwiched when ACF connection is made, and since no intermediate layer is provided in this electrode layer forming portion, In this case, the electrode layer or the gas barrier layer does not break.

  Therefore, in the present invention, it is possible to produce an image display device capable of displaying a good image without defects such as dark spots and having a tough electrode layer forming portion connected to the ACF.

  The intermediate layer is formed between the gas barrier layers and formed on at least the display portion provided with the display layer, and the electrode layer forming portion in which the non-display portion electrode layer is formed. Any material that is not formed on the gas barrier layer may be used. Further, the intermediate layer may not be formed on the electrode layer forming portion where the electrode layer of the non-display portion is formed and the gas barrier layer around it. This is because when the intermediate layer is formed on the gas barrier layer around the electrode layer forming portion for ACF connection, the electrode layer or the like may be broken when ACF connection is made. Here, the periphery of the electrode layer forming portion refers to a region having a width of 1 μm to 5 μm from the electrode layer forming portion where the electrode layer of the non-display portion is formed. Further, the intermediate layer may be formed on the gas barrier layer of the display portion and may not be formed on the gas barrier layer of the entire non-display portion.

  Such an intermediate layer is not particularly limited as long as it is a material capable of filling a pinhole or the like of the gas barrier layer. For example, polyamic acid, polyethylene resin, melamine resin, polyurethane resin, polyester resin, polyol resin Resin materials such as polyurea resin, polyazomethine resin, polycarbonate resin, polyacrylate resin, polystyrene resin, polyacrylonitrile resin, polyethylene naphthalate resin, high molecular weight epoxy which is a polymer of bifunctional epoxy resin and bifunctional phenols A curable epoxy resin containing a polymer and a resin material that can be used as a material for forming the above-described base material can be used. Also, organic titanium resins such as alkyl titanates, isocyanate resins, polyethyleneimine resins, polybutadiene resins, polyamide resins, epoxy resins, polyacrylic resins, polyvinyl acetate resins, polyolefin resins, casein, waxes , Polybutadiene resin, low density polyethylene, medium density polyethylene, high density polyethylene, linear (linear) low density polyethylene, polypropylene, ethylene-vinyl acetate copolymer, ionomer resin, ethylene-acrylic acid copolymer, ethylene -Polyolefin resins such as methyl methacrylate copolymer, ethylene-propylene copolymer, methyl pentene polymer, polybutene polymer, polyethylene, or polypropylene are treated with acrylic acid, methacrylic acid, maleic acid, maleic anhydride Can fumaric acid, acid-modified polyolefin resin modified with an unsaturated carboxylic acid such as itaconic acid, polyvinyl acetate resin, polyacrylic resin, also resin material such as polyvinyl chloride resin used.

  Among the above resins, it is preferable to use a thermosetting resin in the present invention.

  Further, a metal alkoxide can also be used as a material for forming the intermediate layer. Examples of the metal element of the metal alkoxide include Si, Al, Sr, Ba, Pb, Ti, Zr, La, and Na. Specifically, alkoxysilane compounds such as tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, tetrabutoxysilane, dimethyldimethoxysilane, trimethoxymethylsilane, dimethyldiethoxysilane; tetramethoxyzirconium, tetraethoxyzirconium, tetra Examples thereof include zirconium alkoxide compounds such as isopropoxyzirconium and tetrabutoxyzirconium; titanium alkoxide compounds such as tetramethoxytitanium, tetraethoxytitanium, tetraisopropoxytitanium and tetrabutoxytitanium. These metal alkoxides can be used alone or in combination of two or more. As said metal alkoxide, it is preferable to use an alkoxysilane compound from points, such as the handleability, hardening reactivity, economical efficiency, etc.

  Furthermore, a silane coupling agent can be added to the metal alkoxide as a crosslinking agent or the like. Examples of the silane coupling agent include γ-chloropropyltrimethoxysilane, vinyltrichlorosilane, vinyltriethoxysilane, vinyl-tris (β-methoxyethoxy) silane, γ-methacryloxypropyltrimethoxysilane, β- (3 , 4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, vinyltriacetoxysilane, γ-mercaptopropyltrimethoxysilane, N-β- (aminoethyl) -γ-aminopropyltrimethoxysilane N-β- (aminoethyl) -γ-aminopropylmethyldimethoxysilane, γ-ureidopropyltriethoxysilane, bis (β-hydroxyethyl) -γ-aminopropyltriethoxysilane, γ-aminopropyl silicone Also Can be used in combination of two or more. As the amount of use, it is only necessary to add a trace amount.

  Such metal alkoxides undergo hydrolysis and polycondensation reactions in the presence of water or alcohol, or by adding an organic substance or catalyst after the reaction process or completion of the reaction, polymerizing it, and heating. An amorphous ceramic transparent film can be formed. A film formed using this metal alkoxide is useful as an intermediate layer because of its high gas barrier property.

  The thickness of the intermediate layer is preferably set as appropriate depending on the material to be used, but is preferably in the range of 300 nm to 5000 nm, particularly 350 nm to 1000 nm.

(3) Others In the present invention, as described above, the display portion provided with at least the display layer has a three-layer structure in which the gas barrier layer, the intermediate layer, and the gas barrier layer are sequentially laminated. Is given. As the gas barrier property of the laminate in which these three layers are laminated, the water permeability is 0.01 g / m ² · day or less, particularly 10 ⁻⁶ g / m ² · day or less, and the oxygen permeability is 0. .1cc ^/ m 2 · day or less, and preferably less of these ^{10 -3 cc / m 2 · day} .

  Here, the oxygen permeability is a value measured using an oxygen gas permeability measuring device (manufactured by MOCON, OX-TRAN 2/20: trade name) under the conditions of a measurement temperature of 23 ° C. and a humidity of 90% Rh. Yes, the water vapor transmission rate is a value measured using a water vapor transmission rate measuring device (manufactured by MOCON, PERMATRAN-W 3/31: trade name) under the conditions of a measurement temperature of 37.8 ° C. and a humidity of 100% Rh. is there.

4). Next, the electrode layer used in the present invention will be described. The electrode layer used in the present invention is formed in a pattern on the gas barrier layer, and is ACF-connected to the electrode layer forming portion where the electrode layer is formed.

  In the present invention, for example, as shown in FIG. 2, the electrode layer 5 is formed in a pattern on the gas barrier layer 3. Further, since the ACF connection is made to a part of the region (region 12 in FIG. 2) in which the electrode layer 5 of the non-display portion 14 where the display layer is not provided is formed, this region has no intermediate layer formed. This is an intermediate layer forming region 12. The electrode layer forming portion in which the electrode layer of the non-display portion is formed is a portion that is strongly sandwiched when ACF connection is made. In the present invention, an intermediate layer is formed in the electrode layer forming portion that is ACF connected. As a result, a high-quality image display device can be stably manufactured without breaking the electrode layer or the gas barrier layer.

In the present invention, since the display unit is an area where an image is displayed, the electrode layer needs to be a transparent electrode in the display unit. Examples of such transparent electrodes include a SnO ₂ film, an ITO film, and an IZO film.

  Moreover, you may use an auxiliary electrode in addition to the said transparent electrode as needed.

  On the other hand, since the non-display portion is a region that does not affect image display, the electrode layer need not be transparent in the non-display portion. For example, a metal electrode can be used, and specific examples include Ti, Mo, Al, Cr, and W. Moreover, as an electrode layer of the area | region connected by ACF, it may be comprised only from the said metal electrode by design, and the said metal electrode and the said transparent electrode may be laminated | stacked and comprised.

  The film thickness of such an electrode layer is preferably in the range of 150 nm to 200 nm in the case of a transparent electrode, and is preferably in the range of 100 nm to 300 nm in the case of a metal electrode. Moreover, when the transparent electrode and the metal electrode are laminated | stacked, the inside of the range of about 250 nm-500 nm is preferable. If the thickness of the electrode layer is thinner than the above range, a decrease in conductivity is observed, and if the thickness of the electrode layer exceeds the above range, it becomes conductive due to cracks or the like as the post-processing step proceeds. This is because it is not preferable since deterioration of the property is observed.

5). Image display apparatus The image display apparatus of the present invention includes a non-light-emitting display, such as a liquid crystal display apparatus, which performs display with gradation by shuttering the brightness of a backlight, a plasma display (PDP), and field emission. Examples thereof include self-luminous displays such as a display (FED) and an electroluminescence display (EL) that perform display by illuminating a phosphor with some energy. The image display apparatus of the present invention is preferably used as an organic EL element.

6). Others In the present invention, for example, as shown in FIG. 3, the planarizing layer 6 may be formed on the display unit 13 between the display layer 2 and the gas barrier layer 3 and on which the display layer 2 is formed. . The display layer has a relatively high film thickness. When a gas barrier layer or the like is formed on the display layer, it is difficult to form a flat layer, and the display layer is eroded when the gas barrier layer is formed. There are problems such as. In the present invention, by forming the flattening layer on the display layer, the display layer can be protected, and at the same time, unevenness due to the display layer can be eliminated and the surface can be flattened. In addition, this makes it possible to form the gas barrier layer densely and flatly and to have a high gas barrier property.

  As the flatness of such a flattened layer, the surface average roughness (Ra) is preferably 6 nm or less, particularly preferably 2 nm or less, and the maximum height difference (P-V) is 60 nm or less, particularly 20 nm or less. It is preferable. This is because when the gas barrier layer is formed on the flattening layer, the surface roughness and the maximum height difference are within the above ranges, so that it can be formed densely and flatly. Here, the surface roughness and the maximum height difference are values measured with an atomic microscope (Nanopics: trade name, manufactured by Seiko Instruments Inc.) under the conditions of a scanning range of 20 μm and a scanning speed of 90 sec / frame.

  The planarization layer preferably has a high transmittance with respect to visible light. Specifically, the transmittance of visible light (within a range of 400 nm to 700 nm) is 50% or more, and in particular, 85%. The above is preferable. This is because when the image display device is obtained, the brightness can be increased. Here, the visible light transmittance is a value measured with a spectrophotometer (model number: UV-3100PC, manufactured by Shimadzu Corporation).

  Further, the material of the planarizing layer is not particularly limited as long as it has a flatness as described above, but it is preferable to use an organic material. Thereby, it is easy to form a layer having the above flatness, and a flattening layer having good adhesion to the display layer and the gas barrier layer can be obtained. Specifically, an epoxy resin derived from a bisphenol compound having a fluorene skeleton and epichlorohydrin, or an epoxy (meth) acrylate derived from this epoxy resin and (meth) acrylic acid, and further this epoxy (meth) acrylate And epoxy (meth) acrylate acid adducts derived from acid anhydrides.

  Moreover, it is preferable that the film thickness of the said planarization layer exists in the range of 5 micrometers-10 micrometers. This is because the surface of the display layer can be flattened and the display layer can be prevented from being eroded when the gas barrier layer is formed.

B. Organic EL Element Next, the organic EL element of the present invention will be described. The organic EL element of the present invention is characterized in that the display layer in the image display device is a color conversion layer.

  The organic EL element of the present invention has a base material, a color conversion layer, a gas barrier layer, an intermediate layer, and an electrode layer as described in the above-mentioned column of the image display device, and further includes an organic EL layer and an organic layer thereof. The layer structure is not particularly limited as long as it has a counter electrode formed on the EL layer and opposed to the electrode layer, and is appropriately selected according to the use of the organic EL element. is there. In this invention, as above-mentioned, the base material may be comprised only from the board | substrate, and may be comprised from the board | substrate and the functional layer. Therefore, when the substrate is composed only of the substrate, the organic EL layer and the counter electrode are formed on the electrode layer. When the substrate is composed of the substrate and the functional layer, the organic EL layer and the counter electrode are opposed. The electrode may be formed as a functional layer, and an organic EL layer and a counter electrode may be formed on the electrode layer.

  According to the present invention, since the above-described electrode forming portion connected to the ACF is strong and the organic EL layer or the like is formed on the electrode layer having a high gas barrier property, it is affected by oxygen, water vapor, etc. even with time. Thus, a high-quality organic EL element can be obtained.

  The organic EL element of the present invention is one in which an organic EL layer is formed between the electrode layer and a counter electrode formed so as to be opposed to the electrode layer. Here, the organic EL layer referred to in the present invention can be one normally used for an organic EL element, and is formed from one or a plurality of organic layers including at least a light emitting layer. That is, the organic EL layer is a layer including at least a light emitting layer, and the layer configuration is a layer having one or more organic layers. Usually, when an organic EL layer is formed by a wet method by coating, it is often difficult to stack a large number of layers in relation to a solvent, so that it is often formed of one or two organic layers. However, it is possible to further increase the number of layers by devising organic materials or combining vacuum deposition methods.

  As the organic layer formed in the organic EL layer other than the light emitting layer, a layer usually used for the organic EL layer can be used, and examples thereof include a charge injection layer such as a hole injection layer and an electron injection layer. it can. Furthermore, examples of the other organic layers include a charge transport layer such as a hole transport layer that transports holes to the light-emitting layer and an electron transport layer that transports electrons to the light-emitting layer. In many cases, it is formed integrally with the charge injection layer by imparting a charge transporting function. In addition, examples of the organic layer formed in the organic EL layer include a layer for preventing the penetration of holes or electrons, such as a carrier block layer, and improving the recombination efficiency.

  The base material, color conversion layer, gas barrier layer, intermediate layer, and electrode layer used in the present invention are the same as those described in the above-mentioned “A. Image display device”, and thus description thereof is omitted here. To do.

C. Next, a method for manufacturing an image display device according to the present invention will be described.

  In the present invention, the method for producing an image display device includes a display layer forming step of forming a display layer on a substrate, a gas barrier layer forming step of forming a gas barrier layer on the display layer, and an electrode layer on the gas barrier layer. An electrode layer forming step of forming the electrode layer in a pattern, wherein the electrode layer is ACF-connected, and the gas barrier layer forming step is performed on the display portion on which the display layer is formed and on the display A first barrier layer forming step of forming a first barrier layer on a non-display portion on which the display layer is not formed, and an electrode layer in which at least the electrode layer of the non-display portion is formed An intermediate layer forming step of forming an intermediate layer in a pattern in another region so that no intermediate layer is formed on the formation portion; and a second barrier layer formed on the region where the first barrier layer is formed 2 Barrier layer formation process It is characterized in that it has a.

  A method for manufacturing an image display device of the present invention will be described with reference to the drawings. 4 and 5 are process diagrams showing an example of a method for manufacturing an image display device of the present invention. First, the display layer formation process which forms the display layer 2 on the base material 1 is performed (FIGS. 4A and 5A). Next, a first barrier layer 3a is formed on the display layer 2 (FIGS. 4B and 5B), and an intermediate layer 4 is formed on the first barrier layer 3a (FIG. 4C). 5), the second barrier layer 3b is formed on the intermediate layer 4 (FIG. 4D, FIG. 5D), and the gas barrier layer forming step is performed. Further, an electrode layer forming step for forming the electrode layer 5 on the second barrier layer 3b is performed (FIGS. 4E and 5E).

  In the electrode layer forming step, for example, as shown in FIG. 5E, the electrode layer 5 is formed in a pattern on the second barrier layer 3b. Further, in the gas barrier layer forming step, for example, an intermediate layer is formed in the electrode layer forming portion in which the electrode layer 5 of the non-display portion 14 in which the display layer is not provided as shown in FIG. As shown in FIG. 5C, the intermediate layer 4 is formed in a pattern on the first barrier layer 3a.

  The electrode layer forming portion in which the electrode layer of the non-display portion is formed is a portion that is strongly sandwiched when ACF connection is made. In the present invention, an intermediate layer is formed in the electrode layer forming portion that is ACF connected. By not having this, the problem that the electrode layer or the gas barrier layer breaks can be avoided. In the present invention, the display portion provided with at least the display layer has a structure in which the gas barrier layer and the intermediate layer are alternately stacked, and therefore it is possible to provide gas barrier properties. That is, even when there is a defect portion such as a pinhole in the gas barrier layer, the pinhole of the gas barrier layer is blocked because the intermediate layer is formed in the gas barrier layer, and the pinhole penetrates the gas barrier layer vertically. Etc. can be prevented. Therefore, in the present invention, it is possible to produce an image display device capable of displaying a good image without defects such as dark spots and having a tough electrode layer forming portion connected to the ACF.

  Hereafter, each process in the manufacturing method of such an image display apparatus is demonstrated.

1. Display layer forming step First, in the present invention, a display layer forming step of forming a display layer on a substrate is performed. For example, as shown in FIGS. 4A and 5A, the display layer 2 is formed in a pattern on the substrate 1, and the display unit 13 in which the display layer 2 is formed on the substrate 1 and the display are displayed. There are two regions of the non-display portion 14 where the layer 2 is not formed.

  The display layer used in the present invention is not particularly limited as long as it is usually used in an image display device, and examples thereof include a color conversion layer and a color filter layer.

  The base material and the display layer used in this step are the same as those described in “A. Image display device” described above, and thus the description thereof is omitted here.

  Such a display layer can be formed by applying a display layer forming coating solution on a substrate and patterning it. The patterning can be performed by a general method.

2. Gas barrier layer forming step Next, in the present invention, a gas barrier layer forming step of forming a gas barrier layer on the display layer is performed. In the gas barrier layer forming step, a first barrier layer is formed on the display portion where the display layer is formed and on the non-display portion where the display layer is not formed and which is disposed around the display portion. A layer forming step, an intermediate layer forming step of forming an intermediate layer in a pattern in another region so that no intermediate layer is formed on the electrode layer forming portion where the electrode layer of the non-display portion is formed, and And a second barrier layer forming step of forming the second barrier layer on the region where the one barrier layer is formed.

  For example, as shown in FIG. 4, a first barrier layer 3a is formed on the display layer 2 (FIG. 4B), and an intermediate layer 4 is formed on the first barrier layer 3a (FIG. 4C). ), The second barrier layer 3b is formed on the intermediate layer 4 (FIG. 4D). At this time, for example, the intermediate layer is not formed in the electrode layer forming portion where the electrode layer 5 of the non-display portion 14 where the display layer is not provided as shown in FIG. As shown in (c), the intermediate layer 4 is formed in a pattern on the first barrier layer 3a. The electrode layer forming portion in which the electrode layer of the non-display portion is formed is a portion that is strongly sandwiched when ACF connection is made. In the present invention, an intermediate layer is formed in the electrode layer forming portion that is ACF connected. By not having this, the problem that the electrode layer or the gas barrier layer breaks can be avoided. Further, in the present invention, since at least the display portion provided with the display layer has a structure in which the gas barrier layer and the intermediate layer are alternately laminated, even when the gas barrier layer has a defect portion such as a pinhole. Since the intermediate layer is formed in the gas barrier layer, pinholes and the like of the gas barrier layer are blocked, and pinholes and the like penetrating the gas barrier layer can be prevented from being generated, thereby providing gas barrier properties. It becomes possible to do. Therefore, in the present invention, it is possible to produce an image display device capable of displaying a good image without defects such as dark spots and having a tough electrode layer forming portion connected to the ACF.

  Hereinafter, each process in such a gas barrier layer forming process will be described.

(1) First Barrier Layer Forming Step First, in the gas barrier layer forming step, a first barrier layer forming step for forming a first barrier layer on the display layer is performed. The first barrier layer is formed on the display portion where the display layer is formed and on the non-display portion which is disposed around the display portion and where the display layer is not formed.

  In the present invention, the formation of the first barrier layer is not particularly limited as long as it is performed by a vapor deposition method. For example, an inorganic oxide, an inorganic nitride, an inorganic oxynitride, a metal or the like is used as a raw material by using a vacuum deposition method in which a metal is heated and deposited on a substrate, an inorganic oxide, an inorganic nitride, an inorganic oxynitride, or a metal Oxidation reaction deposition method that oxidizes by introducing oxygen gas and deposits on substrate, inorganic oxide, inorganic nitride, inorganic oxynitride, or metal is used as target raw material, argon gas and oxygen gas are introduced Then, sputtering is performed on the substrate by sputtering, inorganic oxide, inorganic nitride, inorganic oxynitride, or metal is heated by a plasma beam generated by a plasma gun and deposited on the substrate. In the case of forming an ion plating method or a vapor deposition film of silicon oxide, a plasma CVD method using an organosilicon compound as a raw material may be used.

  The materials used for the first barrier layer are the same as those described in the column of the gas barrier layer of “A. Image display device” described above, and thus the description thereof is omitted here.

(2) Intermediate layer forming step Next, in the gas barrier layer forming step, an intermediate layer forming step of forming an intermediate layer on the first barrier layer is performed. The intermediate layer is formed in a pattern in another region so as not to be formed at least on the electrode layer forming portion where the electrode layer of the non-display portion is formed.

  For example, as shown in FIG. 5C, an intermediate layer is not formed in the electrode layer forming portion where the electrode layer 5 of the non-display portion 14 where the display layer is not provided as shown in FIG. As shown, the intermediate layer 4 is formed in a pattern on the first barrier layer 3a.

  In the invention, the intermediate layer may be formed in a pattern so as not to be formed not only over the electrode layer forming portion where the electrode layer of the non-display portion is formed but over the entire non-display portion. That is, in this case, the intermediate layer is formed only on the display portion.

  The materials used for the intermediate layer are the same as those described in “A. Image display device” described above, and thus the description thereof is omitted here.

  Such an intermediate layer can be formed by applying an intermediate layer forming coating solution on the first barrier layer and patterning it. As the coating method of the intermediate layer forming coating liquid, roll coating, gravure coating, knife coating, dip coating, spray coating, etc. can be used, and then wet forming to dry and remove the solvent, diluent, etc. The intermediate layer can be formed by the method. Moreover, the said patterning can use a general method, for example, can be performed by the photolithographic method, the inkjet method, the screen printing method, the method using a photocatalyst, etc.

  In the present invention, among the methods for forming the intermediate layer, it is preferable to use a method using a photocatalyst as a patterning method. This patterning method using a photocatalyst utilizes the fact that the wettability changes due to the action of the photocatalyst accompanying the irradiation of energy. That is, the intermediate layer is formed in a pattern by using a pattern resulting from the difference in wettability. As described above, the method for forming an intermediate layer using a photocatalyst is useful in that it can form a pattern due to a difference in wettability only by energy irradiation, so that the labor required for patterning the intermediate layer can be greatly reduced. It is a simple method.

  Hereinafter, the intermediate layer forming step using such a photocatalyst will be described.

(Interlayer formation process using photocatalyst)
In the present invention, the intermediate layer forming step using the photocatalyst includes a wettability changing layer forming step of forming a wettability changing layer in which the wettability changes by the action of the photocatalyst on the first barrier layer, and a portion for forming the intermediate layer Only for wettability changing process that changes wettability from liquid repellency to lyophilic by the action of photocatalyst accompanying energy irradiation, and for forming intermediate layer in lyophilic area that became lyophilic in the above wettability changing process And an intermediate layer forming coating liquid coating step for coating the coating liquid.

  Further, in the present invention, when changing the wettability of the wettability changing layer, a method of irradiating energy to the wettability changing layer containing the photocatalyst (first aspect), the wettability changing layer and the photocatalyst are contained. There are two modes of a method (second mode) in which the photocatalyst-containing layer is disposed with a predetermined gap and irradiated with energy. Hereinafter, the description will be made separately for each aspect.

(I) 1st aspect In this invention, the 1st aspect of an intermediate | middle layer formation process is a wettability change layer containing a photocatalyst. The wettability changing layer containing the photocatalyst is irradiated with energy to change the wettability, and the intermediate layer forming coating solution is applied to the lyophilic region where the wettability has changed from lyophobic to lyophilic. Thus, the intermediate layer can be formed in a pattern.

  FIG. 6 is a process diagram showing an example of an intermediate layer forming process in the method for manufacturing an image display device of the present invention. In the intermediate layer forming step using the photocatalyst, first, a wettability changing layer forming step is performed in which the wettability changing layer 21 whose wettability is changed by the action of the photocatalyst is formed on the first barrier layer 3a (FIG. 6A). ). Next, energy 23 is irradiated through the photomask 22 (FIG. 6B), and the wettability is changed from lyophobic to lyophilic to form a lyophilic region 21 ′ (FIG. 6C). )), A wettability changing step is performed. Further, an intermediate layer forming coating solution application step is performed in which the intermediate layer forming coating solution 24 is applied to the lyophilic region 21 ′ that has become lyophilic in the wettability changing step (FIG. 6D). . The intermediate layer is formed in a pattern on the first barrier layer by the series of steps described above.

  Such a wettability changing layer is only required to contain a photocatalyst. Even a layer having a photocatalyst and a material whose wettability is changed by the action of the photocatalyst may be formed by laminating a layer having a material whose wettability is changed by the photocatalyst and a layer having a photocatalyst.

  The material used for the wettability changing layer is particularly limited as long as it is a material whose wettability is changed by the action of the photocatalyst accompanying energy irradiation and has a main chain that is difficult to be degraded or decomposed by the action of the photocatalyst. Specifically, organopolysiloxane and the like can be mentioned. In this embodiment, the organopolysiloxane is preferably an organopolysiloxane containing a fluoroalkyl group.

  Examples of such an organopolysiloxane include (1) an organopolysiloxane that exerts great strength by hydrolyzing and polycondensing chloro or alkoxysilane by sol-gel reaction or the like, and (2) water repellency and oil repellency. Mention may be made of organopolysiloxanes such as organopolysiloxanes crosslinked with excellent reactive silicones.

In the case of (1) above, the general formula:
Y _n SiX _(4-n)
(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group, an acetyl group or a halogen. N is an integer from 0 to 3. )
It is preferable that it is the organopolysiloxane which is a 1 type, or 2 or more types of hydrolysis condensate or cohydrolysis condensate of the silicon compound shown by these. Here, the number of carbon atoms of the group represented by Y is preferably in the range of 1 to 20, and the alkoxy group represented by X is a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. preferable.

  In particular, an organopolysiloxane containing a fluoroalkyl group can be preferably used, and specific examples thereof include one or two or more hydrolytic condensates and cohydrolytic condensates of the following fluoroalkylsilanes. In general, those known as fluorine-based silane coupling agents can be used.

_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 5 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 7 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 3) 3;
(CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
_{(CF 3) 2 CF (CF} 2) 6 CH 2 CH 2 Si (OCH 3) 3;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si (OCH 3) 3;
_{CF 3 (C 6 H 4)} C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 3 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 5 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 7 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 3 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 5 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 7 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 9 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 4 CH 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 6 CH 2 CH 2 Si CH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si CH 3 (OCH 3) 2;
_{CF 3 (C 6 H 4)} C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 3 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 5 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 7 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 5 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 7 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 2 CH 3) 3; and _{CF 3 (CF 2) 7 SO} 2 N (C 2 H 5) C 2 H 4 CH 2 Si (OCH 3) 3.

  By using polysiloxane containing a fluoroalkyl group as described above as a binder, the liquid repellency of the non-irradiated part of the wettability changing layer is greatly improved, and the intermediate layer forming coating liquid is applied to the entire surface. The intermediate layer forming coating solution can be prevented from adhering, and the intermediate layer forming coating solution can be attached only to the lyophilic region that is the energy irradiation part.

  Examples of the reactive silicone (2) include compounds having a skeleton represented by the following general formula.

However, n is an integer of 2 or more, R ^1, R ² are each a substituted or unsubstituted alkyl having 1 to 10 carbon atoms, alkenyl, aryl or cyanoalkyl group, the total molar ratio of 40% or less Vinyl, phenyl and phenyl halide. Further, those in which R ¹ and R ² are methyl groups are preferable because the surface energy becomes the smallest, and the methyl groups are preferably 60% or more by molar ratio. In addition, the chain end or side chain has at least one reactive group such as a hydroxyl group in the molecular chain.

  Moreover, you may mix the stable organosilicone compound which does not carry out a crosslinking reaction like dimethylpolysiloxane with said organopolysiloxane.

  In this embodiment, various materials such as organopolysiloxane can be used in the wettability changing layer as described above. However, as described above, adding fluorine to the wettability changing layer can improve the wettability. It is effective for pattern formation. Therefore, it can be said that it is preferable that fluorine be contained in a material that is not easily deteriorated or decomposed by the action of the photocatalyst, specifically, that the organopolysiloxane material contains fluorine to form a wettability changing layer.

  In the wettability changing layer in this embodiment, a surfactant having a function of decomposing by the action of the photocatalyst and changing the wettability by being decomposed can be contained. Specifically, hydrocarbons such as NIKKOL BL, BC, BO, BB series manufactured by Nikko Chemicals Co., Ltd., ZONYL FSN, FSO manufactured by DuPont, Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd., Dainippon Megafac F-141, 144 manufactured by Ink Chemical Industry Co., Ltd., Footgent F-200, F251 manufactured by Neos Co., Ltd., Unidyne DS-401, 402 manufactured by Daikin Industries, Ltd., Fluorard FC-170 manufactured by 3M Co., Ltd. Fluorine-based or silicone-based nonionic surfactants such as 176, and cationic surfactants, anionic surfactants, and amphoteric surfactants can also be used.

  In addition to the above surfactants, the wettability changing layer includes polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate. Polyvinyl chloride, polyamide, polyimide, styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, polyisoprene, oligomers, polymers, etc. Can be contained.

When the degradation substance having the function of changing the wettability by the action of the photocatalyst as described above is included in the wettability changing layer, the binder used in the wettability changing layer is particularly suitable on the wettability changing layer by the action of the photocatalyst. It is not necessary to have a function of changing the wettability of the. Such a binder is not particularly limited as long as it has a high binding energy such that the main skeleton of the binder is not decomposed by photoexcitation of the photocatalyst. For example, an amorphous silica precursor can be used. This amorphous silica precursor is represented by the general formula SiX _4, X is a halogen, a methoxy group, an ethoxy group or a silicon compound an acetyl group or the like, and silanol or average molecular weight of 3,000 or less, their hydrolysates Polysiloxane is preferred. Specific examples include tetraethoxysilane, tetraisopropoxysilane, tetra-n-propoxysilane, tetrabutoxysilane, and tetramethoxysilane. In this case, after the amorphous silica precursor and the photocatalyst particles are uniformly dispersed in a non-aqueous solvent and hydrolyzed with moisture in the air on the first barrier layer, silanol is formed. The wettability changing layer can be formed by dehydration condensation polymerization at room temperature. If dehydration condensation polymerization of silanol is carried out at 100 ° C. or higher, the degree of polymerization of silanol increases and the strength of the film surface can be improved. Moreover, these binders can be used individually or in mixture of 2 or more types.

  Such a wettability changing layer is formed by preparing a coating liquid by dispersing the above-described components in a solvent together with other additives as necessary, and coating the coating liquid on the first barrier layer. be able to. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The application can be performed by a general application method such as spin coating, spray coating, dip coating, roll coating, or bead coating. In the case where an ultraviolet curable component is contained, the wettability changing layer can be formed by performing a curing treatment by irradiating ultraviolet rays.

  In this embodiment, the thickness of the wettability changing layer is preferably 0.001 μm to 1 μm, particularly preferably in the range of 0.01 to 0.1 μm, from the relationship of the wettability change rate by the photocatalyst. is there.

Examples of the photocatalyst include titanium dioxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), and bismuth oxide known as optical semiconductors. (Bi ₂ O ₃ ) and iron oxide (Fe ₂ O ₃ ) can be mentioned, and one or a mixture of two or more selected from these can be used.

  In this embodiment, titanium dioxide is particularly preferably used because it has a high band gap energy, is chemically stable, has no toxicity, and is easily available. Titanium dioxide includes an anatase type and a rutile type, and both can be used in the present invention, but anatase type titanium dioxide is preferred. Anatase type titanium dioxide has an excitation wavelength of 380 nm or less.

  Examples of such anatase type titanium dioxide include hydrochloric acid peptizer type anatase type titania sol (STS-02 manufactured by Ishihara Sangyo Co., Ltd. (average particle size 7 nm), ST-K01 manufactured by Ishihara Sangyo Co., Ltd.), nitric acid solution An anatase type titania sol (TA-15 manufactured by Nissan Chemical Co., Ltd. (average particle size 12 nm)) and the like can be mentioned.

  The smaller the particle size of the photocatalyst, the more effective the photocatalytic reaction occurs. The average particle size is preferably 50 nm or less, and it is particularly preferable to use a photocatalyst of 20 nm or less.

  The content of the photocatalyst in the wettability changing layer can be set in the range of 5 to 60% by weight, preferably 20 to 40% by weight.

  The energy irradiation referred to in this embodiment is a concept including irradiation of any energy beam capable of changing the wettability of the wettability changing layer by the photocatalyst, and is not limited to visible light irradiation.

  Usually, the wavelength of light used for such energy irradiation is set in the range of 400 nm or less, preferably in the range of 380 nm or less. This is because, as described above, the preferred photocatalyst used in the wettability changing layer is titanium dioxide, and light having the above-described wavelength is preferable as energy for activating the photocatalytic action by the titanium dioxide.

  Examples of light sources that can be used for such energy irradiation include mercury lamps, metal halide lamps, xenon lamps, excimer lamps, and various other light sources.

  In addition to the method of performing pattern irradiation through a photomask using the light source as described above, it is also possible to use a method of drawing and irradiating in a pattern using a laser such as excimer or YAG.

  Further, the energy irradiation amount at the time of energy irradiation is an irradiation amount necessary for the surface of the wettability changing layer surface to change the characteristics of the wettability changing layer surface by the action of the photocatalyst in the photocatalyst containing layer.

  In this aspect, the lyophilic region is not particularly limited as long as the contact angle with water is smaller than that of the lyophobic region, and even if the wettability in the lyophilic region is uniform, It may be non-uniform.

(Ii) Second Aspect In the present invention, the second aspect of the intermediate layer forming step is that the wettability changing layer whose wettability changes by the action of the photocatalyst and the photocatalyst containing layer containing the photocatalyst are provided with a predetermined gap. It is arranged and irradiated with energy. As a result, the wettability is changed by the action of the photocatalyst accompanying energy irradiation, the photocatalyst containing layer is removed, and the intermediate layer forming coating solution is applied to the lyophilic region where the wettability has changed from lyophobic to lyophilic. By doing so, the intermediate layer can be formed in a pattern.

  FIG. 7 is a process diagram showing an example of an intermediate layer forming process in the method for manufacturing an image display device of the present invention. In the intermediate layer forming step using the photocatalyst, first, the wettability changing layer forming step of forming the wettability changing layer 21 whose wettability is changed by the action of the photocatalyst on the first barrier layer 3a is performed (FIG. 7A). ). Next, the photocatalyst-containing layer side substrate 25 is placed on the wettability changing layer 21 with a predetermined gap, and irradiated with energy 23 through the photomask 22 (FIG. 7B). The lyophilic region 21 'is formed by changing the wettability to the liquid (FIG. 7C), and the wettability changing step is performed. At this time, the photocatalyst containing layer side substrate 25 is removed from the wettability changing layer 21. Further, an intermediate layer forming coating solution application step is performed in which the intermediate layer forming coating solution 24 is applied to the lyophilic region 21 ′ that has become lyophilic in the wettability changing step (FIG. 7D). . The intermediate layer is formed in a pattern on the first barrier layer by the series of steps described above.

  The photocatalyst containing layer used in this embodiment is not particularly limited as long as the photocatalyst in the photocatalyst containing layer changes the wettability of the wettability changing layer arranged with a predetermined gap. Absent. The wettability of the surface may be particularly hydrophilic or water repellent.

  The photocatalyst-containing layer used in this embodiment may be formed on the substrate, or may be formed in a pattern on the substrate. By forming the photocatalyst-containing layer in a pattern in this way, it is necessary to irradiate the pattern using a photomask or the like when the photocatalyst-containing layer is disposed with a predetermined gap from the wettability changing layer and irradiated with energy. By irradiating the entire surface, a wettability pattern composed of a hydrophilic region and a water repellent region can be formed on the wettability changing layer.

  The method for patterning the photocatalyst-containing layer is not particularly limited, but can be performed by, for example, a photolithography method.

  In addition, when energy irradiation is performed with the photocatalyst-containing layer and the wettability changing layer facing each other, the wettability of only the portion where the photocatalyst-containing layer is actually changed, so the energy irradiation direction is As long as energy is irradiated to the portion where the photocatalyst-containing layer and the wettability changing layer face each other, irradiation may be performed from any direction, and the irradiated energy is also particularly parallel, such as parallel light. It has the advantage that it is not limited to.

  Further, the photocatalyst containing layer and the wettability changing layer are arranged such that the photocatalyst containing layer and the wettability changing layer are arranged with a predetermined gap so that the photocatalyst acts. The term “arrangement” as used herein refers to a state where the action of the photocatalyst substantially reaches the surface of the wettability changing layer. In addition to the actual physical contact, a predetermined gap The photocatalyst-containing layer and the wettability changing layer are disposed with a gap therebetween.

  In this embodiment, the gap is preferably 200 μm or less. Among them, in consideration of the fact that the pattern accuracy is very good and the photocatalyst sensitivity is high, and therefore the efficiency of wettability change of the wettability changing layer is good, it is particularly within the range of 0.2 μm to 10 μm, preferably 1 μm to It is preferable to be within the range of 5 μm. Such a gap range is particularly effective for a small-area wettability changing layer capable of controlling the gap with high accuracy.

  On the other hand, when the treatment is performed on a wettability changing layer having a large area of, for example, 300 mm × 300 mm or more, there is no contact between the photocatalyst-containing layer and the wettability changing layer with a fine gap as described above. It is extremely difficult to form. Therefore, when the wettability changing layer has a relatively large area, the gap is preferably in the range of 10 to 100 μm, particularly in the range of 50 to 75 μm. By setting the gap within such a range, there is no problem of pattern accuracy deterioration such as blurring of the pattern, or problems such as deterioration of the photocatalyst sensitivity and deterioration of wettability change efficiency. This is because there is an effect that unevenness does not occur in the wettability change on the property change layer.

  When the wettability changing layer having a relatively large area is irradiated with energy in this manner, the setting of the gap in the positioning device between the photocatalyst containing layer and the wettability changing layer in the energy irradiation device is set within a range of 10 μm to 200 μm, In particular, it is preferable to set within a range of 25 μm to 75 μm. By setting the set value within such a range, it is possible to arrange the photocatalyst containing layer and the wettability changing layer without contact with each other without causing a significant decrease in pattern accuracy or a significant deterioration in the sensitivity of the photocatalyst. This is because it becomes possible.

  Thus, by disposing the photocatalyst-containing layer and the wettability changing layer surface at a predetermined interval, oxygen, water, and active oxygen species generated by the photocatalytic action are easily desorbed. That is, when the interval between the photocatalyst containing layer and the wettability changing layer is narrower than the above range, it is difficult to desorb the active oxygen species, and as a result, the wettability change rate may be slowed down. Is not preferable. In addition, when it is arranged at a distance from the above range, the generated active oxygen species are difficult to reach the wettability changing layer, which is not preferable because the rate of wettability change may be slowed in this case as well. .

  Moreover, as a method of forming such a very narrow gap uniformly and arranging the photocatalyst containing layer and the wettability changing layer, for example, a method using a spacer can be mentioned. By using the spacer in this way, a uniform gap can be formed, and the portion in contact with the spacer does not reach the surface of the wettability changing layer because the photocatalytic action does not reach the surface of the wettability changing layer. A predetermined wettability change pattern can be formed on the wettability change layer by having the same pattern as the wettability change pattern. In addition, by using such a spacer, the active oxygen species generated by the action of the photocatalyst reaches the wettability changing layer surface at a high concentration without diffusing, so that an efficient and fine wettability change pattern can be formed. Can be formed.

  In this embodiment, the arrangement state of the photocatalyst containing layer and the wettability changing layer only needs to be maintained at least during the energy irradiation.

  Moreover, the wettability change layer used for this aspect should just change a wettability by the effect | action of a photocatalyst, and can use the material described in the said 1st aspect.

  Further, the photocatalyst-containing layer in this embodiment may be formed of a photocatalyst alone or may be formed by mixing with a binder. In the case of a photocatalyst-containing layer comprising only a photocatalyst, the efficiency with respect to the change in wettability on the wettability changing layer is improved, which is advantageous in terms of cost such as shortening of the processing time. On the other hand, in the case of a photocatalyst-containing layer comprising a photocatalyst and a binder, there is an advantage that the formation of the photocatalyst-containing layer is easy. As the material used for the photocatalyst-containing layer, the same materials as those used for the wettability changing layer can be used.

  Moreover, as a board | substrate with which the said photocatalyst content layer is formed, what has flexibility, for example, a resin film, etc. may be sufficient, for example, what does not have flexibility, for example, a glass substrate etc. Good. Thus, in this embodiment, the substrate used for the photocatalyst-containing layer side substrate is not particularly limited in its material, but since this photocatalyst-containing layer side substrate is used repeatedly, a predetermined substrate is used. A material having strength and having a surface with good adhesion to the photocatalyst-containing layer is preferably used. Specific examples include glass, ceramic, metal, and plastic.

  A primer layer may be formed on the substrate in order to improve the adhesion between the substrate surface and the photocatalyst containing layer. Examples of such a primer layer include silane-based and titanium-based coupling agents.

  The material, photocatalyst, energy irradiation, and the like used for the wettability changing layer used in this embodiment are the same as those described in the first embodiment described above, and thus the description thereof is omitted here.

  In the present invention, the wettability changing layer and the photocatalyst-containing layer are arranged with a predetermined gap, and the intermediate layer is formed by the intermediate layer forming step of this embodiment in which the wettability is changed by irradiating energy. Is preferred. In the first aspect, since the wettability changing layer containing the photocatalyst is included in the configuration of the image display device, the image display device may be influenced by the photocatalyst due to the semipermanent action of the photocatalyst contained therein. However, in this embodiment, the photocatalyst-containing layer containing the photocatalyst is removed after the energy irradiation, so that it is possible to manufacture an image display device with little influence of the photocatalyst.

(3) Second Barrier Layer Formation Step Next, in the gas barrier layer formation step, a second barrier layer formation step for forming a second barrier layer on the intermediate layer is performed. The second barrier layer is formed on a region where the first barrier layer is formed so as to cover the intermediate layer. In the present invention, the intermediate layer is formed on at least a display portion provided with a display layer, and the display portion includes a three-layer structure in which a first barrier layer, an intermediate layer, and a second barrier layer are stacked. Become. Therefore, even when there is a defect site such as a pinhole in the first barrier layer or the second barrier layer, an intermediate layer is formed between the first barrier layer and the second barrier layer. It is possible to prevent pinholes and the like of the second barrier layer from being blocked and to generate pinholes and the like penetrating from the first barrier layer to the second barrier layer, thereby providing gas barrier properties. Therefore, in the present invention, it is possible to manufacture an image display device capable of displaying a good image without defects such as dark spots.

  The material used for the second barrier layer is the same as that described in the column of the gas barrier layer in “A. Image display device” described above, and the method for forming the second barrier layer is described above. Since it is the same as that described in the column of the first barrier layer forming step, the description here is omitted.

3. Electrode Layer Forming Step Next, in the gas barrier layer forming step, an electrode layer forming step for forming an electrode layer on the second barrier layer is performed. For example, as shown in FIG. 4E, the electrode layer 5 is formed in a pattern on the second barrier layer 3b. In addition, ACF connection is made to the electrode layer forming portion where the electrode layer of the non-display portion where the display layer is not formed is formed. In the present invention, since the intermediate layer is not formed in the electrode layer forming portion to be ACF-connected, the electrode layer or the gas barrier layer is broken even when the electrode layer forming portion is strongly sandwiched during ACF connection. Can be avoided.

  The electrode layer used in the present invention can be formed by a PVD method such as a vacuum deposition method, a sputtering method, or an ion plating method. Moreover, a general method can be used for patterning of the electrode layer.

  Since the electrode layer is the same as that described in the column of the electrode layer of “A. Image display device” described above, description thereof is omitted here.

4). Others In the present invention, for example, as shown in FIG. 3, the planarizing layer 6 may be formed on the display unit 13 between the display layer 2 and the gas barrier layer 3 and on which the display layer 2 is formed. . The display layer has a relatively high film thickness. When a gas barrier layer or the like is formed on the display layer, it is difficult to form a flat layer, and the display layer is eroded when the gas barrier layer is formed. There are problems such as. In the present invention, by forming the flattening layer on the display layer, the display layer can be protected, and at the same time, unevenness due to the display layer can be eliminated and the surface can be flattened. In addition, this makes it possible to form the gas barrier layer densely and flatly and to have a high gas barrier property.

  As a method for forming such a flattening layer, a resin or the like, which is a flattening layer forming material, is applied on the display layer, for example, a spin coating method, a spray method, a blade coating method, a dipping method, a roller coater, a land coater. A planarization layer can be formed by a wet coating method using a machine or the like.

  The material used for the planarization layer is the same as that described in “A. Image display device” described above, and thus the description thereof is omitted here.

D. Next, a method for manufacturing the organic EL element of the present invention will be described. The method for producing an organic EL element of the present invention is characterized in that the display layer in the method for producing an image display device is a color conversion layer. Moreover, the manufacturing method of the organic EL element of this invention is the manufacturing method of the said image display apparatus. WHEREIN: The organic EL layer formation process which forms an organic EL layer, The counter electrode formation process which forms a counter electrode on this organic EL layer It has.

  According to the present invention, the above-described electrode forming portion connected to the ACF is strong, and an organic EL layer or the like is formed on the electrode layer of the image display device having a high gas barrier property. Therefore, it is possible to manufacture a high-quality organic EL element that is not affected by the above.

  As a method for forming such an organic EL layer and a counter electrode, a commonly used method can be used.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.

[Example 1]
(Formation of display layer)
A color filter layer was formed as a display layer on the glass substrate as follows.

  First, a chromium oxide thin film was formed on a substrate by sputtering. A photosensitive resist was applied on the chromium oxide thin film, and mask exposure, development, and etching of the chromium oxide thin film were sequentially performed to form a black matrix arranged in a matrix.

  Next, a photosensitive coating composition for forming each color filter layer of red, green and blue is prepared, applied on the substrate on which the black matrix is formed, dried, and then exposed using a photomask. Then, development was performed to form a color filter layer in which patterns of three colors were arranged.

  A transparent photosensitive resin composition in which a blue conversion phosphor is dispersed is applied on a black matrix and a color filter layer, patterning is performed by a photolithography method, and a blue conversion phosphor layer is formed on the blue color filter layer. Formed. Subsequently, the green conversion fluorescent layer was formed on the green color filter layer by the same procedure as described above, and the color conversion layer was formed by forming the red conversion fluorescent layer on the red color filter layer.

  Next, a protective layer-forming coating solution obtained by diluting an acrylate-based ultraviolet curable resin (V-259PA / PH5 manufactured by Nippon Steel Chemical Co., Ltd.) with propylene glycol monomethyl ether acetate on the color conversion layer is formed. Used, applied by spin coating, pre-baked at a temperature of 120 ° C. for 5 minutes, then exposed to ultraviolet rays so that the irradiation dose becomes 300 mJ, and after the exposure, post-baked at a temperature of 200 ° C. for 60 minutes. A transparent protective layer having a thickness of 5 μm was formed so as to cover the entire color conversion layer.

(Formation of the first barrier layer)
Next, a silicon oxynitride (SiON) film was formed on the entire surface of the color conversion layer by the sputtering method under the following film formation conditions.
Target material: SiN
Ar / N ₂ : 400 sccm / 10 sccm (40: 1)
Deposition pressure: 5 mTorr
Applied power: 4.3 kW
Deposition temperature: Non-heated (about 110 ° C)
Film thickness: 3000mm

(Formation of intermediate layer pattern)
Next, an intermediate layer pattern was formed on the barrier layer of the SiON film produced as described above by the following method.

First, 1.5 g of fluoroalkylsilane (manufactured by TSL8223 GE Toshiba Silicone), 5.0 g of tetramethoxysilane (manufactured by TSL8114 GE Toshiba Silicone), and 3.0 g of 0.1N hydrochloric acid were stirred at room temperature for 24 hours to be liquid repellent. An imparting agent was prepared. Next, titania sol (STS-01 manufactured by Ishihara Sangyo) was diluted with a mixed solution of water and isopropanol (weight ratio 1: 1) so that the TiO ₂ concentration became 0.5 wt%. To 45 g of this liquid, 0.3 g of the liquid repellency-imparting agent and 5.0 g of water were added and stirred for 10 minutes to obtain a pattern-forming coating liquid.

This pattern-forming coating solution was applied to the SiON film by a spin coater to a thickness of 0.1 μm and dried at 150 ° C. for 10 minutes to form a wettability changing layer (TiO ₂ film). The contact angle of the wettability changing layer with water was measured and found to be 97 °. Next, when exposed for 45 seconds through a photomask using an ultra high pressure mercury lamp (365 nm, 30 mW / cm ² ), the exposed portion had a contact angle with water of 10 ° or less. For this photomask, a pattern in which a portion corresponding to the display portion provided with the display layer was transmitted was used.

  Furthermore, an intermediate-layer-forming coating solution prepared by diluting an epoxy-based thermosetting resin (V-259EH / 210X6 manufactured by Nippon Steel Chemical Co., Ltd.) with propylene glycol monomethyl ether acetate is prepared and the wettability changing step is performed. The lyophilic region that became lyophilic by coating was applied by a spin coating method, and an intermediate layer pattern having a thickness of 5 μm was formed only in the lyophilic region. Next, after prebaking at a temperature of 120 ° C. for 5 minutes, a post-baking at a temperature of 200 ° C. for 60 minutes was performed, and an intermediate layer pattern could be formed only in the lyophilic region.

(Formation of second barrier layer)
A silicon oxynitride (SiON) film was formed on the entire surface under the same conditions as those for forming the first barrier layer.

Thereby, the structure of the gas barrier layer in the display part is an inorganic / organic / inorganic composite film of SiON film, TiO ₂ film, intermediate layer, and SiON film, while the non-display part is composed of SiON film, TiO ₂ film, SiON film All of the films were formed of inorganic films. The gas barrier substrate 1 was produced by the series of operations described above.

(Production of image display device)
After forming an electrode layer on the above gas barrier substrate 1, an organic EL layer was formed, and a counter electrode was formed on the organic EL layer to produce an image display device.

[Example 2]
As a confirmation of whether or not the wettability changing layer of the non-display portion in the gas barrier base material 1 of Example 1 adversely affects the ACF connection, the gas barrier base material 2 from which the wettability changing layer of the non-display portion is removed is prepared. did. The wettability changing layer was removed by the following method.

  In the same manner as in Example 1, an intermediate layer was formed only in the lyophilic region of the wettability changing layer, post-baked and cured, then immersed in a 20% aqueous solution of KOH, and subjected to ultrasonic cleaning for 3 minutes. The wettability changing layer was removed from the non-display portion by performing ultrasonic cleaning with 2 minutes. Thereafter, a SiON film was formed in the same manner as in Example 1 to obtain a gas barrier substrate 2.

  Further, an image display device was produced in the same manner as in Example 1 using the gas barrier substrate 2.

[Example 3]
Gas barrier substrate 3 in the same manner as in Example 1 except that an intermediate layer is formed using an ultraviolet curable resin and a gas barrier layer of SiON film (inorganic) / intermediate layer (organic) / SiON film (inorganic) is formed. Was made. The SiON film was formed under the same conditions as in Example 1, and the intermediate layer was formed by photolithography without using the wettability changing layer. The method for forming the intermediate layer is shown below.

  On the SiON film, an acrylate UV curable resin (V-259PA / PH5 manufactured by Nippon Steel Chemical Co., Ltd.) is applied by spin coating using an intermediate layer forming coating solution diluted with propylene glycol monomethyl ether acetate. Then, after pre-baking at 120 ° C. for 5 minutes, the whole surface is exposed so that the irradiation dose becomes 300 mJ with ultraviolet rays. After the exposure, post-baking is performed at 200 ° C. for 60 minutes to form an intermediate layer having a thickness of 5 μm. Formed.

  Further, an image display device was produced in the same manner as in Example 1 using the gas barrier substrate 3.

[Comparative Example 1]
A gas barrier substrate 4 was produced in the same manner as in Example 1 except that the intermediate layer was not patterned, and an image display device was produced.

  Here, the gas barrier substrate 1 is obtained by patterning the intermediate layer and considering ACF connection, while the gas barrier substrate 4 is not obtained by patterning the intermediate layer and does not consider ACF connection.

[Evaluation]
In the image display devices of Examples 1 to 3 and Comparative Example 1, the gas barrier properties of all the gas barrier substrates were good with PM driving of 150 cd / m ² 10000 h or more. In particular, the image display devices of Examples 1 and 2 in which the intermediate layer is formed using a thermosetting resin have good product durability and clear high-temperature PM driving 85 ° / 150 cd / m ² luminance half or more 1000 h or more. There were no dark spots.

  However, the image display device of Comparative Example 1 that does not consider the ACF connection has a portion where the ACF connection is unstable and a display defect occurs from the beginning.

  In addition, the image display device of Example 2 having the wettability changing layer in the display unit and not in the electrode extraction unit of the non-display unit did not cause any problem in the ACF connection. Furthermore, since the image display devices of Examples 1 and 2 using the gas barrier base material including the wettability changing layer showed good results, the wettability changing layer should not affect the ACF connection. I understood.

It is a schematic sectional drawing which shows an example of the image display apparatus of this invention. It is a schematic plan view which shows an example of the image display apparatus of this invention. It is a schematic sectional drawing which shows the other example of the image display apparatus of this invention. It is process drawing which shows an example of the manufacturing method of the image display apparatus of this invention. It is process drawing which shows the other example of the manufacturing method of the image display apparatus of this invention. It is process drawing which shows an example of the intermediate | middle layer formation process in the manufacturing method of the image display apparatus of this invention. It is process drawing which shows the other example of the intermediate | middle layer formation process in the manufacturing method of the image display apparatus of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Base material 2 ... Display layer 3 ... Gas barrier layer 3a ... 1st barrier layer 3b ... 2nd barrier layer 4 ... Intermediate | middle layer 5 ... Electrode layer 11 ... Intermediate | middle layer formation area 12 ... Non-intermediate layer formation area 13 ... Display part 14 ... hidden part

Claims (7)

A substrate, a display layer formed on the substrate, a gas barrier layer formed on the display layer, and an electrode layer formed in a pattern on the gas barrier layer, wherein the electrode layer is An image display device connected to an ACF,
The gas barrier layer has an intermediate layer forming region in which an intermediate layer is formed, and a non-intermediate layer forming region in which no intermediate layer is formed,
The gas barrier layer on the display portion where the display layer is provided is an intermediate layer forming region, and is an electrode on which an electrode layer of a non-display portion where the display layer is not formed is disposed around the display portion An image display device, wherein the gas barrier layer on the layer forming portion is a non-intermediate layer forming region. The image display device according to claim 1, wherein the non-intermediate layer formation region is the entire region of the non-display portion. The organic EL element, wherein the display layer in the image display device according to claim 1 or 2 is a color conversion layer. A display layer forming step of forming a display layer on the substrate;
A gas barrier layer forming step of forming a gas barrier layer on the display layer;
An electrode layer forming step of forming an electrode layer in a pattern on the gas barrier layer,
A method of manufacturing an image display device in which the electrode layer is ACF-connected,
The gas barrier layer forming step includes
A first barrier layer forming step of forming a first barrier layer on the display portion where the display layer is formed and on the non-display portion where the display layer is not formed, which is disposed around the display portion;
An intermediate layer forming step of forming an intermediate layer in a pattern in another region so that no intermediate layer is formed on the electrode layer forming portion where the electrode layer of the non-display portion is formed;
And a second barrier layer forming step of forming a second barrier layer on the region where the first barrier layer is formed. 5. The method for manufacturing an image display device according to claim 4, wherein in the intermediate layer forming step, the intermediate layer is formed in a pattern so that the intermediate layer is not formed on the non-display portion. The intermediate layer forming step includes
A wettability changing layer forming step of forming a wettability changing layer in which the wettability is changed by the action of a photocatalyst on the first barrier layer;
Only the portion that forms the intermediate layer, a wettability changing step of changing the wettability from lyophobic to lyophilic by the action of a photocatalyst accompanying energy irradiation,
5. The intermediate layer forming coating solution applying step of applying the intermediate layer forming coating solution to the lyophilic region that has become lyophilic in the wettability changing step. 6. A method for manufacturing the image display device according to 5. The method for producing an organic EL element, wherein the display layer in the method for producing an image display device according to any one of claims 4 to 6 is a color conversion layer.

Images