JP2005148502A - Laser transfer film, and method for manufacturing color filter - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a laser transfer film obtained by successively forming a photothermal conversion layer and a transfer layer on base material, where a high-definition pattern excellent in contact property is transferred and formed on an image receiving element, and a conductive high-functional thin film having high film thickness accuracy is stably formed, and which is easily and exactly formed by transferring a vacuum thin film showing high functionality by using a laser irradiation device, and to provide a method for manufacturing a color filter using the laser transfer film. <P>SOLUTION: The laser transfer film 13 is provided with the base material 14, the photothermal conversion layer 15 and the transfer layer 16 being the vacuum thin film successively formed on the base material 14 or equipped with a heat seal layer melted by receiving heat through transfer on the transfer layer. Thus, the problem is solved. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to transfer of a vacuum thin film exhibiting high functionality, and more specifically, a vacuum thin film transfer film using a thermal imaging process using laser light, and a method for producing a color filter formed using the transfer film About. By using this transfer film, high-definition patterning of the functional thin film becomes possible. The thermal imaging process using a laser beam is generally called a laser photothermal transfer method or a LITI (Laser-Induced Thermal Imaging) method.

  When transferring a thin film for forming a color filter, a partition member such as a liquid crystal display device or an organic EL element, or a multi-color pixel of the color filter, a thermal transfer method is often used. For example, in Patent Document 1, a metal back film as a conductive film of a color cathode ray tube panel or a black film of a heat absorption film is transferred from the transfer film on which the film is formed to the panel by pressing a heating roll. Forming. However, the above method is insufficient to form a pattern with high definition and excellent adhesion, and the application range is narrow. Therefore, it has been proposed to obtain a functional vacuum thin film with high definition and high adhesion of several to several tens of μm by using a laser transfer method which is a thermal imaging process using laser light.

For example, Patent Document 2 discloses a technique for producing a separation rib of a color filter, a black matrix of a liquid crystal display device, and a partition wall of an organic EL element by a laser transfer method using a donor sheet. . This donor sheet is obtained by sequentially forming a photothermal conversion layer and a transfer layer on a substrate, and examples in which this transfer layer is formed by a die coating method are mentioned in the examples. Patent Document 3 relates to a transfer film for transferring a color filter used for a liquid crystal display device, a color solid-state imaging device, etc. to a substrate, and the transfer film is divided into a plurality of regions in the film width direction on a film base material. Describes that a heat-meltable color ink layer is provided. Further, the above heat-meltable color ink layer is applied onto a film substrate using a coating head having a nozzle.
JP 2001-328229 A JP 2001-130141 A JP 2003-21710 A

  With the heating roll method in the thermal transfer method of the above thin film transfer, it is difficult to form a pattern with high definition and excellent adhesion, and in the laser transfer method described above, the transfer layer provided on the substrate of the transfer film Is formed by using wet coating, that is, liquid ink, using a die coating or a head, and the film thickness in the thin film varies, maintaining sufficient film thickness accuracy as a component of electronic components. There is no problem. Also, in the above wet coating, it is necessary to hold the metal component as the main component with a binder and solvent in the state of the coating liquid, and it is difficult to increase the concentration of the metal component in the state of a thin film. There is a limit to the functions such as.

  Accordingly, the present invention has been made in view of the above problems, and in a laser transfer film in which a photothermal conversion layer and a transfer layer are sequentially formed on a substrate, a pattern having high definition and excellent adhesion can be transferred and formed on an image receiving element. In addition, a laser capable of stably forming a highly functional thin film with high film thickness accuracy, such as conductivity, and easily and accurately transferring a vacuum thin film exhibiting high functionality by using a laser irradiation apparatus. It is an object of the present invention to provide a transfer film and a method for producing a color filter using the laser transfer film.

  As a means for solving the above-mentioned problems, the present invention provides, as claim 1, a laser transfer film according to the present invention comprising a base material, a photothermal conversion layer and a transfer layer that is a vacuum thin film sequentially formed thereon. It is characterized by having. The transfer layer is heated and broken by the action of the photothermal conversion layer by a thermal imaging process using laser light, and is transferred to the image receiving element in a pattern. According to a second aspect of the present invention, the laser transfer film of the present invention comprises a substrate, a photothermal conversion layer, a transfer layer that is a vacuum thin film, and a heat seal layer, which are sequentially formed thereon. . In this configuration, a heat seal layer is provided on the transfer layer of the laser transfer film according to claim 1, and the heat seal layer is melted by receiving heat through transfer.

  As a third aspect, the transfer layer according to the first or second aspect is an insulating film. According to a fourth aspect of the present invention, the transfer layer according to the first or second aspect is a transparent conductive film. A fifth aspect is characterized in that the transfer layer according to the first or second aspect is a magnetic film. A sixth aspect is characterized in that the transfer layer according to the first or second aspect is a dielectric film.

  The present invention includes a transparent substrate, pixels of a plurality of colors arranged at predetermined positions on the substrate, and a partition pattern that separates adjacent pixels, and the substrate side with respect to the pixels 5. The laser transfer according to claim 1, wherein a partition pattern on the substrate is formed on the opposite side of the color filter having a conductive electrical wiring that maintains transparency on the opposite side. The film transfer layer or heat seal layer is in close contact with the surface of the substrate, and subsequently formed by transferring the vacuum thin film component of the transfer layer of the laser transfer film by a thermal imaging process using laser light. It is characterized by.

  Further, the present invention includes a transparent substrate, a plurality of color pixels arranged at predetermined positions on the substrate, and a partition pattern that separates adjacent pixels from each other, and the substrate is separated from the pixels. 3. The method for producing a color filter having an electrically conductive electrical wiring that maintains transparency on the side opposite to the side, wherein the electrical wiring is the transfer layer or heat seal layer of the laser transfer film according to claim 1. And the pixel and the pixel side of the substrate on which the partition pattern is formed are in close contact with each other, and subsequently, the vacuum thin film component of the transfer layer of the laser transfer film is transferred by a thermal imaging process using laser light. It is characterized by doing.

The present invention includes a transparent substrate, a plurality of color pixels arranged at predetermined positions on the substrate, and a partition pattern that separates adjacent pixels from each other. 5. The laser transfer according to claim 1, wherein a partition pattern on the substrate is formed on the opposite side of the color filter having a conductive electrical wiring that maintains transparency on the opposite side. The film transfer layer or heat seal layer and the surface of the substrate are brought into close contact with each other, and subsequently formed by transferring a vacuum thin film component of the transfer layer of the laser transfer film by a thermal imaging process using laser light, And the electrical wiring is the laser transfer film according to claim 1 or 2, provided that the laser transfer film for partition pattern formation is not the same, The transfer film or the heat seal layer and the pixel side of the substrate on which the partition pattern is formed are brought into close contact with each other under different coating layers, and then the laser transfer film is formed by a thermal imaging process using laser light. The transfer layer is formed by transferring a vacuum thin film component.
A tenth aspect is characterized in that the partition pattern according to any one of the seventh, eighth, and ninth aspects is a black matrix of a liquid crystal display device.

  The laser transfer film of the present invention includes a substrate and a light-to-heat conversion layer and a transfer layer that is a vacuum thin film sequentially formed thereon, or a heat seal layer on the transfer layer. . With such a configuration, the transfer layer or heat seal layer and the transfer target can be closely adhered to each other, and a laser beam can be irradiated to easily transfer and form a pattern with high definition and excellent adhesion, and the film thickness accuracy can be improved. High, highly functional thin films such as conductivity can be stably transferred and formed.

  The present invention includes a transparent substrate, a plurality of color pixels arranged at predetermined positions on the substrate, and a partition pattern that separates adjacent pixels from each other. In the method of manufacturing a color filter having a characteristic electric wiring, the partition pattern on the substrate is brought into close contact with the transfer layer or heat seal layer of the laser transfer film and the surface of the substrate, and then laser light is emitted. By the thermal imaging process used, it can be formed by transferring the vacuum thin film component of the transfer layer of the laser transfer film in a pattern corresponding to the electrical wiring pattern. This partition pattern can function as a black matrix of a liquid crystal display device, and has high utility value. Further, by using the laser transfer film of the present invention, it has become possible to shorten the process time in the production of a color filter.

  Embodiments of the present invention will be described with reference to the accompanying drawings. In the description with reference to the following drawings, different member names may be given for the same reference numbers for convenience of description. The laser transfer film according to the present invention is used as an image providing element for transferring an image pattern to an image receiving element by a thermal imaging process (LITI method) using laser light. FIG. 1 shows a typical structure of the laser transfer film of the present invention. As shown in the figure, the laser transfer film 13 is heated and melted by the action of the substrate 14, the photothermal conversion layer 15 and the photothermal conversion layer 15 sequentially formed thereon, and an image receiving element (not shown). And a transfer layer 16 transferred in a pattern. The laser transfer film of the present invention is provided with a heat seal layer, for example, on the transfer layer, if necessary, to improve the adhesion between the image receiving element and the transfer layer, or any other optional layer. You may have.

Next, each layer constituting the laser transfer film of the present invention will be described.
(Base material)
As the base material 14 used in the laser transfer film of the present invention, the same base material as that used in the conventional thermal transfer recording material can be used as it is, and other base materials can be used. Not. However, since the heating is performed by irradiating the laser beam for the transfer of the transfer layer, the laser beam permeability, heat resistance, etc. are used in close contact with the image receiving element, and are peeled off after use. Appropriate flexibility, lightness, handleability, mechanical strength, etc. are required. In particular, the transmittance of the wavelength of the laser beam used is preferably 60% or more.

  Specific examples of preferable substrates include, for example, polyester such as polyethylene terephthalate, polypropylene, cellophane, polycarbonate, cellulose acetate, triacetyl cellulose, polyethylene, polyvinyl chloride, polystyrene, nylon, polyimide, polyvinylidene chloride, polyvinyl alcohol, fluorine. There are relatively heat-resistant plastic films such as resin, chlorinated rubber, and ionomer, paper such as condenser paper and paraffin paper, non-woven fabric, and the like, and a composite material of these may be used. The thickness of the substrate can be appropriately changed depending on the material so that the strength and thermal conductivity are appropriate, but the thickness is preferably 2 to 180 μm, for example.

(Photothermal conversion layer)
The photothermal conversion layer 15 is mainly composed of a dye (such as a pigment) capable of absorbing laser light and a binder. Examples of dyes that can be used include black pigments such as carbon black, macrocyclic compound pigments having absorption in the visible to near infrared region such as phthalocyanine and naphthalocyanine, and high density laser recording such as optical disks. Examples thereof include organic dyes (cyanine dyes such as indolenine dyes, anthraquinone dyes, azulene dyes, and phthalocyanine dyes) used as laser absorbing materials and organometallic compound dyes such as dithiol nickel complexes. Among these, carbon black, which is a particulate material, is particularly preferable because moderate foil holding and high printing sensitivity can be achieved.

  The binder material for the photothermal conversion layer is not particularly limited, and examples thereof include a polymer obtained by polymerizing and crosslinking a monomer having an unsaturated bond and an oligomer photopolymerizable or thermopolymerizable compound. Specific examples include homopolymers or copolymers of acrylic monomers such as acrylic acid, methacrylic acid, acrylic esters, and methacrylic esters, cellulose polymers such as methyl cellulose, ethyl cellulose, and cellulose acetate, polystyrene, and vinyl chloride. -Vinyl acetate copolymers, polyvinyl pyrrolidone, polyvinyl butyral, vinyl polymers such as polyvinyl alcohol and copolymers of vinyl compounds, condensation polymers such as polyester and polyamide, rubber systems such as butadiene-styrene copolymers. Examples thereof include a polymer obtained by polymerizing and crosslinking a photopolymerizable or thermopolymerizable compound such as a thermoplastic polymer and an epoxy compound. Moreover, the reaction hardened | cured material of the thermoplastic resin and polyisocyanate which have a reactive group in resin can also be used. The method for crosslinking and curing the binder resin is not particularly limited, and means such as heating or irradiation with ionizing radiation is not particularly limited.

  When a photopolymerizable monomer or oligomer is used as the binder material, it is preferable to add a photopolymerization initiator to the photothermal conversion layer. As photopolymerization initiators, aromatic ketones such as benzophenone, Michler ketone, thioxanthone, thioacridone, 2-ethylanthraquinone, phenanthrene, benzoin ethers such as benzoin methyl ether, benzoin ethyl ether, benzoin phenyl ether, methyl benzoin, ethyl benzoin, etc. Benzoin, halomethylthiazole compounds and the like. These photopolymerization initiators can be used alone or in combination of two or more in order to increase the photocuring reaction rate. The addition amount of such a photopolymerization initiator is preferably in the range of 0.1 to 10% by mass with respect to the total solid content of the photothermal conversion layer.

  The photothermal conversion layer is formed by adding an additive such as a laser-absorbing dye and a binder resin as described above, and a photopolymerization initiator as necessary, and further adding a solvent component such as water or an organic solvent as necessary. The coating solution for forming a photothermal conversion layer, which has been adjusted, can be applied and dried by conventionally known methods such as gravure direct coating, gravure reverse coating, knife coating, air coating, roll coating, and die coating. The film thickness of the photothermal conversion layer is 0.05 to 3 μm, preferably 0.1 to 1 μm when dried. Moreover, it is preferable that a photothermal conversion layer shows 70% or more as a light absorptance in the wavelength of the laser beam used for the transfer of a vacuum thin film.

(Transfer layer)
The transfer layer 16 of the laser transfer film in the present invention is a vacuum thin film that is heated and broken by the action of the light-to-heat conversion layer and is transferred in a pattern to the image receiving element. Any of the functions of a magnetic film or a dielectric film can be exhibited. The transfer layer in the present invention is a vacuum thin film, and is heated and broken by the action of the light-to-heat conversion layer by irradiation with laser light, and is transferred to the image receiving element in a pattern.

  The transfer layer is a vacuum film formation method such as a thermal CVD (chemical vapor deposition) method, a Cat-CVD method, an RS-CVD (radical shower CVD) method, a plasma CVD method, a sputtering method, a physical vapor deposition method, or an ion plating method. Can be formed. Among these, the plasma CVD method and the ion plating method in particular do not cause thermal damage to the base material, so the range of base material selection is widened, and a thin film with high film thickness accuracy is stabilized. And a thin film of submicron unit can be stably formed and can be preferably used. The transfer layer of the vacuum thin film produced by such a manufacturing method can be obtained with a very high content of the metal component of the main component constituting the transfer layer and a very high density of the thin film. The transfer layer has a very excellent function. The transfer layer in the present invention has a thickness of about 10 to 200 nm.

Of the above-described transfer layer manufacturing methods, the film forming method will be described with reference to FIG. 3 taking the plasma CVD method as an example. First, the web-shaped plastic film 1 is unwound from the substrate unwinding section 2 and introduced into the plasma CVD reaction chamber 4 in the vacuum vessel 3. The entire reaction vessel 3 is evacuated by a vacuum pump 5. At the same time, the reaction chamber 4 is supplied with an organic titanium compound gas and oxygen gas at a predetermined flow rate from the raw material gas inlet 6, and the interior of the reaction chamber 4 is always filled with these gases at a constant pressure. Here, the organic titanium compound is Ti (i-OC ₃ H ₇ ) ₄ (titanium tetra i-propoxide), Ti (OCH ₃ ) ₄ (titanium tetramethoxide), Ti (OC ₂ H ₅ ) ₄ ( titanium _{tetraethoxide), Ti (n-OC 3} H 7) 4 ( titanium tetra n- _{propoxide), Ti (n-OC 4} H 9) 4 ( titanium tetra n- _{butoxide), Ti (t-OC 4} H ₉ ) ₄ (titanium tetra-t-butoxide) titanium alkoxide, and titanium tetrachloride is also included here. Among them, titanium tetrachloride, Ti (i-OC ₃ H ₇ ) ₄ (titanium tetra i-propoxide), and Ti (t-OC ₄ H ₉ ) ₄ (titanium tetra t-butoxide) have high vapor pressure. It is preferable for the reason.

  Next, the plastic film 1 unwound from the substrate unwinding section 2 and introduced into the reaction chamber 4 is wound around the film-forming drum 8 through the reverse roll 7 and is synchronized with the rotation of the film-forming drum 8. However, it is sent in the direction of the reversing roll 7 '. At this time, the temperature of the film forming drum 8 can be controlled. At this time, the surface temperature of the plastic film 1 and the surface temperature of the film forming drum 8 are substantially equal. Therefore, the surface temperature of the plastic film 1 on which titanium oxide is deposited during plasma CVD, that is, the film formation temperature of plasma CVD can be arbitrarily controlled. In this example, the film forming temperature when the titanium oxide film 12 is formed on the plastic film 1 by plasma CVD is displayed by the surface temperature of the film forming drum 8 at that time.

  An RF voltage is applied between the electrode 9 and the film forming drum 8 by a power source 10. At this time, the frequency of the power source is not limited to a radio wave, and an appropriate frequency from a direct current to a microwave can be used. Then, by applying an RF voltage between the electrode 9 and the film forming drum 8, plasma 11 is generated around these electrodes. The organic titanium compound gas and oxygen gas react in the plasma 11 to generate titanium oxide, which is deposited on the plastic film 1 wound around the film forming drum 8 to form a titanium oxide film 12. Thereafter, the plastic film 1 having the titanium oxide film 12 formed on the surface thereof is wound up by the substrate winding portion 2 ′ through the reverse roll 7 ′.

  As described above, the titanium oxide produced by the chemical reaction of the organic titanium compound gas and the oxygen gas by the plasma 11 is deposited on the plastic film 1 cooled to an appropriate temperature by the film-forming drum 8, and the titanium oxide is deposited. Since the film is formed, the plastic film 1 is exposed to a high temperature, and the titanium oxide film 12 can be formed without stretching, deformation, curling and the like. Furthermore, in the plasma CVD method, the refractive index and film thickness of the titanium oxide film 12 to be formed can be controlled over a wide range by controlling the material gas flow rate / pressure, discharge conditions, and the feeding speed of the plastic film 1. A desired film can be obtained without changing the value.

  In the example of film formation by the above plasma CVD method, a titanium oxide film is formed as a vacuum thin film. However, the present invention is not limited to this, and by appropriately changing the source gas, an insulating film, a transparent conductive film, a magnetic film, or a dielectric A thin film having any function of the film can be formed. For example, an insulating film formed with a thin film such as silica or titanium oxide, a thin film such as titanium oxide, ITO (indium / tin oxide), IZO (indium / zinc oxide), or ZAO (zinc / aluminum oxide) was formed. Transparent conductive film, ferromagnetic metal such as iron, cobalt, nickel or their alloys, magnetic thin film such as oxide, aluminum dioxide, zirconium dioxide, magnesium fluoride, barium titanate, strontium titanate, PZT (titanium) Examples thereof include a dielectric film made of a thin film such as lead acid / zirconia.

  Among the above thin films, for example, when a silica thin film is formed by a plasma CVD method, source gases include silane, disilane, hexamethyldisiloxane (HMDSO), tetramethyldisiloxane (TMDSO), and methyltrimethoxysilane (MTMOS). Si-based compounds such as methylsilane, dimethylsilane, trimethylsilane, diethylsilane, propylsilane, phenylsilane, tetramethoxysilane, octamethylcyclotetrasiloxane, and tetraethoxysilane can be used. In particular, a higher reactivity with water vapor is preferable.

(Heat seal layer)
The laser transfer film of the present invention can sequentially form a photothermal conversion layer, a transfer layer, and a heat seal layer on a substrate. By providing a heat seal layer on the outermost surface of the laser transfer film, the adhesion between the image receiving element and the transferred transfer layer can be improved. Heat sealing layer prevents blocking when the thermoplastic resin and / or the laser transfer film obtained is softened by heating with laser light irradiation means and / or the resulting laser transfer film is rolled up or stacked in sheet form In order to achieve this, it is possible to contain an anti-blocking agent such as waxes, higher fatty acid amides, esters and salts, fluororesin and inorganic powders.

  Examples of the thermoplastic resin include ethylene-vinyl acetate copolymer, ethylene-acrylic acid ester copolymer, polyester resin, polyethylene, polystyrene, polypropylene, polybudene, petroleum resin, vinyl chloride resin, vinyl chloride-vinyl acetate copolymer. , Vinylidene chloride resin, methacrylic resin, polyamide, polycarbonate, polyvinyl formal, polyvinyl butyral, polyvinyl acetate, polyisobutylene, polyacetal, natural rubber, acrylate rubber, butyl rubber, nitrile rubber, butadiene rubber, isoprene rubber, styrene-butadiene rubber , Chloroprene rubber, urethane rubber, silicone rubber, acrylic rubber, fluorine rubber, neoprene rubber, chlorosulfonated polyethylene, epichlorohydrin, ethylene propylene di Ngomu, elastomers such as urethane elastomer and the like, a relatively low softening point, which is used particularly as a conventional heat-sensitive adhesive, for example, preferably has a softening point of 50 to 150 ° C..

The heat seal layer is formed by hot melt coating or a coating solution for forming a heat seal layer obtained by dissolving or dispersing the above-described materials and additives in an appropriate organic solvent or water. A thickness of 0.10 to 5 g / m ² is provided in a dry state by a method such as gravure direct coating, gravure reverse coating, knife coating, air coating, roll coating, or die coating. When the thickness of the dried coating film is less than 0.10 g / m ² , the adhesiveness between the image receiving element and the transfer layer is poor, resulting in transfer failure upon laser light irradiation. On the other hand, when the thickness exceeds 5 g / m ² , the transfer sensitivity at the time of laser light irradiation is lowered, and satisfactory print quality cannot be obtained.

(Primer layer)
When the adhesion between the substrate and the light-to-heat conversion layer is weak, the laser transfer film of the present invention provides a primer layer between the substrate and the light-to-heat conversion layer to enhance the adhesion between the light-to-heat conversion layer and the substrate. be able to. Examples of the resin used for the primer layer include alkyd resin, polyester resin, polyvinyl acetate resin, vinyl chloride-vinyl acetate copolymer resin, NBR resin, SBR resin, polyurethane resin, acrylic resin, and polyamide. Used as a polymer, a mixture, or a modified product. The modified product is, for example, a product obtained by copolymerizing or grafting a hydroxyl group, a carboxylic acid, or a quaternary ammonium salt-containing monomer to improve adhesion and hydrophilicity.

Moreover, in order to improve the adhesiveness and coating film strength of the primer layer, the above resin may be cross-linked with various curing agents such as epoxy resin, melamine resin, isocyanate and the like. The method of forming the primer layer, choose formation method similar to the method of the light-to-heat conversion layer of the above, the thickness of the primer layer 0.01 to 50 g / m ² in dry, preferably a 0.1 to 10 g / m ² Good to do.

(Cushion layer)
In the laser transfer film of the present invention, a cushion layer can be provided between the base material and the photothermal conversion layer, and the adhesion between the laser transfer film and the image receiving element can be improved during transfer by laser light irradiation. . In order to impart this cushioning property, a material having a low elastic modulus or a material having rubber elasticity may be used. Specifically, natural rubber, acrylate rubber, butyl rubber, nitrile rubber, butadiene rubber, isoprene rubber, styrene-butadiene rubber, chloroprene rubber, urethane rubber, silicone rubber, acrylic rubber, fluorine rubber, neoprene rubber, chlorosulfonated polyethylene, Epichlorohydrin, elastomers such as ethylene / propylene / diene rubber, urethane elastomer, polyethylene, polypropylene, polybutadiene, polybutene, impact-resistant ABS resin, polyurethane, ABS resin, acetate, cellulose acetate, amide resin, polytetrafluoroethylene, nitrocellulose, polystyrene , Epoxy resin, phenol-formaldehyde resin, polyester, impact-resistant acrylic resin, styrene-butadiene copolymer, ethylene Elastic modulus of vinyl acetate copolymer, acrylonitrile-butadiene copolymer, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate, plasticized vinyl chloride resin, vinylidene chloride resin, polyvinyl chloride, polyvinylidene chloride, etc. Small resin.

Examples of the shape memory resin that can be used as the cushion layer include polynorbornene, a styrene hybrid polymer in which a polybutadiene unit and a polystyrene unit are combined. Moreover, these materials can be applied to a base material to give the base material itself cushioning properties. The thickness of the cushion layer varies depending on various factors such as the type of resin or elastomer to be used, the adhesion between the laser transfer film and the image receiving element, and the use of a mat material. It is the range of 5-100 g / m < ² > by the coating amount at the time of drying. As a method for forming the cushion layer, a material in which the above materials are dissolved in a solvent or dispersed in a latex form, a coating method such as a blade coater, a roll coater, a bar coater, a curtain coater, a gravure coater, an extrusion lamination method using hot melt, Cushion layer film laminating method can be applied.

(Color filter manufacturing method)
The manufacturing method of the color filter in the present invention will be described below.
A transparent substrate, a plurality of color pixels arranged at predetermined positions on the substrate, and a partition pattern that separates adjacent pixels from each other; In the method of manufacturing a color filter having electrically conductive electrical wiring that retains electrical properties, the partition pattern on the substrate is brought into close contact with the transfer layer or heat seal layer of the laser transfer film and the surface of the substrate, Subsequently, the laser transfer film is transferred by a thermal imaging process using laser light, that is, by irradiating the laser light according to the pattern (image) to which the thin film component is to be transferred and transferring the thin film to the substrate surface. It is formed by transferring the vacuum thin film component of the layer.

  In addition, it includes a transparent substrate, a plurality of color pixels arranged at predetermined positions on the substrate, and a partition pattern that separates adjacent pixels from each other, on the side opposite to the substrate side with respect to the pixels In the method of manufacturing a color filter having electrically conductive electrical wiring that maintains transparency, the electrical wiring is formed with a transfer layer or a heat seal layer of the previous laser transfer film, and a partition pattern formed with the pixels. The substrate is adhered to the pixel side, and subsequently the vacuum thin film component of the transfer layer of the laser transfer film is transferred by a thermal imaging process using laser light.

  Further, both the partition pattern and the wiring pattern are formed by transferring using separate laser transfer films, that is, a transparent substrate and a plurality of colors arranged at predetermined positions on the substrate. And a partition pattern that separates adjacent pixels from each other, and a method for producing a color filter having electrically conductive electrical wiring that maintains transparency on the side opposite to the substrate side with respect to the pixels In the above, the partition pattern on the substrate is brought into close contact with the transfer layer or heat seal layer of the laser transfer film and the surface of the substrate, and subsequently, the thermal transfer process of the laser transfer film is performed by a thermal imaging process using laser light. It is formed by transferring the vacuum thin film component of the transfer layer, and the electrical wiring is made of the above laser transfer film, provided that the partition It is not the same as the laser transfer film for forming the turn, and the transfer layer or the heat seal layer and the pixel side of the substrate on which the partition pattern is formed are brought into close contact with each other under different conditions of the transfer layer. It is formed by transferring the vacuum thin film component of the transfer layer of the laser transfer film by a thermal imaging process using light.

  The mechanism of the transfer of the vacuum thin film in the laser transfer film of the present invention can be easily understood from FIG. FIG. 2 is a cross-sectional view illustrating the transfer mechanism of the vacuum thin film 16 to the image receiving element in the laser transfer film 13 in order. As shown in FIG. 2 (A), a laser transfer film 13 is prepared, and is superposed so that the transfer layer 16 is in close contact with the substrate 18 of the image receiving element via the heat seal layer 17. Next, laser light L is irradiated in a predetermined pattern from the base material 14 side to the laser transfer film 13 of the obtained laminate. Here, the pattern of the laser beam L corresponds to the image pattern to be transferred to the image receiving element.

  As a result of the laser beam pattern irradiation, light energy is converted into heat energy by the action of the photothermal conversion layer 15 adjacent to the base material 14 of the laser transfer film 13, and this heat energy is further diffused into the transfer layer 16 for heat sealing. Since the heat is transferred to the layer 17 and melted, it adheres to the substrate 18. In the light absorbing material (part of it) represented by the carbon component of the light-to-heat conversion layer 15, only the portion that has received light energy is vaporized, and the transfer layer 16 is locally broken and transferred onto the substrate 18. Is done. And the part which is not irradiated with the laser beam is not transferred from the laser transfer film 13 but separated from the substrate 18 in the original state where the base material 14 to the heat seal layer 17 are stacked. (See Fig. 2 (B))

  A partition pattern that functions as a black stripe is formed using the transfer mechanism described in FIG. 2, or a partition pattern that separates pixels of multiple colors and adjacent pixels is formed on the substrate 19 in advance. On the other hand, the transparent conductive layer can be formed by transferring a vacuum thin film. Similarly, using the above transfer mechanism, a transfer layer designed to change the irradiation pattern of the laser beam as appropriate and to perform a predetermined function on the insulating film, magnetic film, dielectric film, etc. of the electronic component It can be formed by transferring to a electronic component in a predetermined pattern using a laser transfer film having In the present invention, the method for producing a color filter has been described by way of example. However, the present invention is a technique that is generally used in the field where a highly functional thin film having high definition and excellent adhesion is required. It is not limited to the manufacturing method.

Hereinafter, the present invention will be described with reference to examples. It should be understood that the present invention is not limited to the following examples.
(1) Production of Laser Transfer Film A laser transfer film comprising a base material and a photothermal conversion layer, a transfer layer, and a heat seal layer sequentially formed thereon was produced according to the following procedure.

  After preparing a polyethylene terephthalate (PET) film having a thickness of 75 μm as a base material, a photothermal conversion layer (LTHC layer), a transfer layer, and a heat seal layer having the following composition and film thickness are respectively described thereon. Formed with. After the LTHC layer is applied by a die coating method and cured by ultraviolet irradiation, a transfer layer is further formed thereon by a vacuum film formation method, and a heat seal layer is formed by a die coating method in the same manner as the photothermal conversion layer. The laser transfer film of Example 1 was produced. .

<Photothermal conversion layer>
Carbon black (trade name "Raben 760", manufactured by Colombian Carbon)
100.0% by mass
Dispersant (BYK-Chiemie, trade name “Disperbyk 161”)
8.9% by mass
Vinyl butyral resin (trade name “Burvar B-98” manufactured by Monsanto, Japan)
17.9% by mass
Carboxyl group-containing acrylic resin (trade name “Joncryi 67” manufactured by Johnson Polymer Co., Ltd.) 53.5% by mass
Acrylic oligomer (trade name “Evecryl EB629” manufactured by UCB Radcure) 834.0% by mass
Carboxyl group-containing acrylic resin (trade name “Elvacite 2669” manufactured by ICI) 556.0% by mass
Photopolymerization initiator (trade name “Irgacure 369” manufactured by Ciba Geigy)
45.2% by mass
Photopolymerization initiator (trade name “Irgacure 184” manufactured by Ciba Geigy)
6.7% by mass
Total 1622.3% by mass
It was diluted with a solvent having a solid content concentration of 30% and PMA / MEK = 60/40.
Film thickness: 5μm (when dry)

(2) Vacuum Thin Film Formation A SiOxCy film was formed on the photothermal conversion layer as a transfer layer on the photothermal conversion layer using the plasma CVD method on the substrate after the photothermal conversion layer was applied. The plasma CVD apparatus used this time is as shown in FIG. Moreover, the feeding speed of the plastic film used as the base material during continuous film formation is 5 m / min. Other conditions are described below.

<Film formation conditions>
Applied power 2.0kW
Deposition pressure 40Pa
HMDSO flow rate 0.2 slm
Oxygen gas flow rate 0.6 slm
Helium gas flow rate 0.6 slm
Deposition drum surface temperature (deposition temperature) 30 ° C
The gas flow rate unit slm is a standard small per minute.

<Heat seal layer>
30 parts of polyester resin (product name: Byron 700, manufactured by Toyobo Co., Ltd.)
Toluene 35 parts Methyl ethyl ketone 35 parts Film thickness: 0.5 μm (when dry)

The measurement results of the silica thin film formed on the polyethylene terephthalate film through the photothermal conversion layer under the above conditions are shown below.
<Results of SiOxCy film measurement>
Film thickness 20nm
Composition x = 1.60, y = 0.60
Surface wettability 32 dynes

<Apparatus used for SiOxCy film measurement>
Film thickness measurement Ellipsometer Model number UVISELTM Manufacturer JOBIN YVON
Composition analysis Photoelectron spectroscopy Model number ESCALAB220i-XL Manufacturer VG Scientific
Surface wettability Wetting reagent

  As shown in the result of producing the silica thin film described above, a film having the composition SiOxCy (x = 1.60, y = 0.6) was formed on the polyethylene terephthalate film at a film forming temperature of 30 ° C. The polyethylene terephthalate film after the formation of the silica thin film was in a good state with little elongation and no deformation.

  Using the photothermal conversion layer coating liquid used in Example 1 on a polyethylene terephthalate (PET) film having a thickness of 23 μm, which is a plastic film of the base material, the photothermal conversion layer (LTHC) is produced in the same manner as in Example 1. Then, using the apparatus of FIG. 3, a silica thin film transfer layer was formed on the photothermal conversion layer of a polyethylene terephthalate (PET) film having a thickness of 23 μm, which was a base plastic film. Moreover, the feeding speed of the plastic film used as the base material during continuous film formation is 10 m / min. Other conditions are described below. A heat seal layer was formed on the transfer layer under the same conditions as in Example 1 to produce a laser transfer film of Example 2.

<Film formation conditions>
Applied power 2.0kW
Deposition pressure 100Pa
HMDSO flow rate 1.0 slm
Oxygen gas flow rate 1.0 slm
Deposition drum surface temperature (deposition temperature) 30 ° C

The measurement results of the silica thin film formed on the polyethylene terephthalate film under the above conditions are shown below.
<Results of SiOxCy film measurement>
Film thickness 150nm
Composition x = 1.40, y = 1.00
Surface wettability 33 dynes

<Apparatus used for SiOxCy film measurement>
Film thickness measurement Ellipsometer Model number UVISELTM Manufacturer JOBIN YVON
Composition analysis Photoelectron spectroscopy Model number ESCALAB220i-XL Manufacturer VG Scientific
Surface wettability Wetting reagent

  As shown in the above-described results of producing the SiOxCy film, the polyethylene terephthalate film was in a good state with little elongation and deformation at a film forming temperature of 30 ° C.

(Example 3)
Using the photothermal conversion layer coating liquid used in Example 1 on a polyethylene terephthalate (PET) film having a thickness of 23 μm, which is a plastic film of the base material, the photothermal conversion layer (LTHC) is produced in the same manner as in Example 1. Next, using the apparatus of FIG. 4, using a roll-shaped polyethylene terephthalate film as the base material 19 and mounting it in the chamber 21 of the winding-type holocathode ion plating apparatus 20, Next, ITO (indium / tin oxide) was prepared as an evaporation source and mounted on the anode (hearth) 22. Next, the inside of the chamber 21 was depressurized to an ultimate vacuum of 1 × 10 ⁻⁵ Torr by an oil rotary pump and an oil diffusion pump.

Next, by controlling the degree of opening and closing of the valve 25 between the vacuum pump 24 and the chamber 21, the substrate is caused to travel while maintaining the chamber pressure during film formation at 5 × 10 ⁻⁴ Torr, and the argon gas is 20 sccm. The holocathode type plasma gun 23 introduced with 5 kW is charged with 5 kW of power for plasma generation, and the evaporation source is evaporated by converging and irradiating the evaporation flow on the anode 22 with the high density plasma. The evaporated molecules were ionized to form an ITO thin film transfer layer on the substrate 19 (strictly, on the photothermal conversion layer). The traveling speed of the base material 19 was set so that the film thickness of the formed ITO thin film was 50 nm.

  Next, a heat seal layer was formed on the ITO thin film of the transfer layer under the same conditions as in Example 1 to produce a laser transfer film of Example 3.

The heat transfer layer of the laser transfer film of Examples 1 to 3 obtained above and the surface of the glass substrate were brought into close contact with each other, and subsequently, the vacuum of the transfer layer of the laser transfer film was performed by a thermal imaging process using laser light. The thin film component was transferred.
<Result>
In all of Examples 1 to 3, when the laser output was 800 mA, the SiOxCy film was transferred with a transfer accuracy of ± 1 μm at a rib diameter of 20 μm as a transfer portion, and had excellent transferability. . That is, good transfer accuracy was shown. Furthermore, it includes a transparent substrate, pixels of a plurality of colors arranged at predetermined positions on the substrate, and a partition pattern that separates adjacent pixels from each other on the side opposite to the substrate side. In the color filter having electrically conductive electrical wiring that maintains transparency, the partition pattern on the substrate is brought into close contact with the heat seal layer of the laser transfer film of Example 3 and the surface of the substrate. It was formed by transferring the vacuum thin film component of the transfer layer of the laser transfer film by a thermal imaging process using laser light. The color filter confirmed visually that a high-definition pattern could be formed.

The typical structure of the laser transfer film of this invention is shown. It is sectional drawing which showed the mechanism of the transfer to the image receiving element of the vacuum thin film in a laser transfer film later on. In order to show an example of the manufacturing method of the transfer layer of the vacuum thin film of a laser transfer film, it is a schematic explanatory drawing using a plasma CVD apparatus. It is a schematic explanatory drawing using the ion plating apparatus which shows an example of the manufacturing method of the transfer layer of the vacuum thin film of a laser transfer film.

Explanation of symbols

1 Plastic film substrate (transferred material)
DESCRIPTION OF SYMBOLS 2 Substrate unwinding part 2 'Substrate winding part 3 Vacuum container 4 Reaction chamber 5 Vacuum pump 6 Raw material gas introduction port 7 Reversing roll 7' Reversing roll 8 Film forming drum 9 Electrode 10 Power supply 11 Plasma 12 Titanium oxide film ( Vacuum thin film)
DESCRIPTION OF SYMBOLS 13 Laser transfer film 14 Base material 15 Photothermal conversion layer 16 Transfer layer 17 Heat seal layer 18 Substrate 19 Base material 20 Ion plating apparatus 21 Chamber 22 Anode (hearth)
23 Plasma gun 24 Vacuum pump 25 Valve

Claims (10)

  A laser transfer film comprising: a base material; and a light-to-heat conversion layer and a transfer layer that is a vacuum thin film sequentially formed thereon.   A laser transfer film comprising a substrate, a photothermal conversion layer, a transfer layer that is a vacuum thin film, and a heat seal layer, which are sequentially formed thereon.   3. A laser transfer film, wherein the transfer layer according to claim 1 is an insulating film.   The laser transfer film, wherein the transfer layer according to claim 1 or 2 is a transparent conductive film.   3. A laser transfer film, wherein the transfer layer according to claim 1 is a magnetic film.   3. A laser transfer film, wherein the transfer layer according to claim 1 is a dielectric film.   A transparent substrate, a plurality of color pixels arranged at predetermined positions on the substrate, and a partition pattern that separates adjacent pixels from each other; In the manufacturing method of the color filter which has the electrical wiring which has electrical conductivity which keeps nature, the partition pattern on the substrate is a transfer layer of the laser transfer film according to any one of claims 1, 2, and 4, or A color formed by bringing a heat seal layer and a surface of the substrate into close contact with each other, and subsequently transferring a vacuum thin film component of a transfer layer of the laser transfer film by a thermal imaging process using a laser beam. The manufacturing method of the filter.   A transparent substrate, a plurality of color pixels arranged at predetermined positions on the substrate, and a partition pattern that separates adjacent pixels from each other; 3. A method of manufacturing a color filter having electrically conductive electrical wiring that retains electrical properties, wherein the electrical wiring comprises a transfer layer or a heat seal layer of the laser transfer film according to claim 1, the pixels, and a partition pattern. A color film formed by transferring the vacuum thin film component of the transfer layer of the laser transfer film by a thermal imaging process using laser light; The manufacturing method of the filter.   A transparent substrate, a plurality of color pixels arranged at predetermined positions on the substrate, and a partition pattern that separates adjacent pixels from each other; In the manufacturing method of the color filter which has the electrical wiring which has electrical conductivity which keeps nature, the partition pattern on the substrate is a transfer layer of the laser transfer film according to any one of claims 1, 2, and 4, or A heat seal layer and the surface of the substrate are brought into close contact with each other, and subsequently formed by transferring a vacuum thin film component of a transfer layer of the laser transfer film by a thermal imaging process using laser light, and the electric wiring is formed. The laser transfer film according to claim 1 or 2, wherein the transfer film is not the same as the laser transfer film for forming the partition pattern, but the transfer layer is different. Then, the transfer layer or the heat seal layer and the pixel and the pixel side of the substrate on which the partition pattern is formed are brought into close contact with each other, and subsequently, the vacuum of the transfer layer of the laser transfer film is performed by a thermal imaging process using laser light. A method for producing a color filter, wherein the thin film component is formed by transferring a thin film component. A method for manufacturing a color filter, wherein the partition pattern according to any one of claims 7, 8, and 9 is a black matrix of a liquid crystal display device.

Images