JP2005133865A - Vacuum gate valve - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To prevent the leakage from a seal part around a valve opening part when the valve opening part is closed, by preventing the attachment of a treated material and the like passed through the valve opening part, to the seal part around the valve opening part, when the valve opening part is opened. <P>SOLUTION: Annular hollow seal members 13a, 13b are mounted around the valve opening part 10c on each inner surface at a clearance part 10d side of an upper main body 10a and a lower main body 10b, and the seal members 13a, 13b are expanded by introducing the compressed air in valve opening and closing motion, to seal between the circumference of the valve opening part 10c at each inner face of the clearance part 10d side of the upper main body 10a and the lower main body 10b, and both surfaces of a valve element 11, whereby the attachment of the treated material and the like passing through the valve opening part 10c to the seal part around the valve opening part 10c can be prevented, and the leakage from the seal part around the valve opening part 10c can be prevented when the valve opening part 10c is closed. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a work transfer path between chambers of a vacuum processing apparatus used in manufacturing processes of semiconductors, FPDs (flat panel displays), etc., a supply / distribution path of processing materials to the vacuum processing apparatus, or a pressure fluid The present invention relates to a vacuum gate valve for opening and closing a flow passage for gas and the like.

  For work transfer passages between chambers of vacuum processing equipment used in manufacturing processes of semiconductors, FPDs, etc., supply flow passages for processing materials to vacuum processing equipment, flow passages for pressure fluid, gas, etc. A vacuum gate valve capable of opening and closing these passages is provided (see, for example, Patent Document 1).

In the conventional vacuum gate valve as described above, for example, a movable valve element is pressed against an O-ring provided around the supply flow passage of the processing material, or an O-ring incorporated around the movable valve element is treated. By pressing the material around the supply flow passage, the supply flow passage for the processing material is closed and sealed.
JP-A-9-32966

  By the way, when the conventional vacuum gate valve as described above is provided in the supply flow passage of the processing material to the vacuum processing apparatus, the valve opening of the vacuum gate valve is open when the processing material is supplied. A part of the processing material adheres to and accumulates on a shield portion such as an O-ring that is provided around the supply flow passage and is exposed. For this reason, when the supply flow passage is closed by the vacuum gate valve, the processing material deposited on the seal portion around the vacuum gate valve cannot completely close the valve opening of the vacuum gate valve. There was a risk of leakage from the seal part around the part.

  In addition, as a vacuum processing apparatus, for example, in a vacuum film forming apparatus having a configuration in which a substrate is arranged via a vacuum gate valve on an upper part of a vacuum processing chamber having an evaporation source inside, a processing material supplied into the vacuum processing chamber is evaporated. Film processing material that is heated and sublimated by a source and taken into a substrate transfer chamber in which the substrate is set through a vacuum gate valve with the valve opening opened to form a film (coating) on the substrate surface At the time of processing, a part of the vaporized processing material that has not been formed on the substrate surface wraps around and adheres to the seal portion around the valve opening of the vacuum gate valve, and is deposited as a thin film. For this reason, when the valve opening of the vacuum gate valve is closed after the film forming process, the valve opening of the vacuum gate valve is completely covered by the thin film that has been deposited around the seal around the valve opening. There was a possibility that leakage could occur from the seal portion around the valve opening.

  Therefore, the present invention prevents adhesion of processing material or thinned processing material to the surrounding seal portion when the valve opening is open, and when the valve opening is closed, It is an object of the present invention to provide a vacuum gate valve that can prevent a leak from the seal portion and seal well.

  In order to achieve the above object, the present invention provides a plate-like valve body that is movably supported in a gap having a predetermined width formed in the valve body, and penetrates both sides of the valve body when the valve is opened. The opening hole formed in the valve body is moved to the valve opening formed as described above, and the valve body is moved so that the sealing surface of the valve body is located in the valve opening during the valve closing operation. A vacuum gate valve that seals with a seal portion around the valve opening, the valve body surrounding the valve opening on each of the opposing inner surfaces where the gap is formed, or an opening hole in the valve body A hollow sealing material that can be expanded and contracted by introducing and discharging a high-pressure fluid is installed on both sides of the periphery and the seal surface, and the high-pressure fluid is introduced into the sealing material and expanded when the valve is opened and closed. The bal It is characterized in that for sealing between the two sides of the valve opening surround and the valve body of the inner surface of the body.

  In addition, the inside of the seal surface is recessed in a concave shape.

  According to the present invention, the introduction and discharge of the high-pressure fluid are performed on the valve openings around the inner surfaces facing each other where gaps between the valve bodies are formed, or on both the circumference of the opening hole of the valve body and the circumference where the seal surface is located. By installing a hollow sealing material that can be expanded and contracted, when opening and closing the valve, a high-pressure fluid is introduced into the sealing material to expand it, and the valve opening on each inner surface on the gap side of the valve body By sealing between the periphery and both sides of the valve body, it is possible to prevent the processing material that passes through the valve opening from adhering to the seal around the valve opening during the valve opening operation. Sometimes, when the valve opening is closed, leakage from the seal portion around the valve opening can be prevented, and a good sealing state can be maintained for a long time.

  Hereinafter, the present invention will be described based on the illustrated embodiments.

  FIG. 1 is a schematic configuration diagram showing a vacuum film forming apparatus including a vacuum gate valve according to an embodiment of the present invention. This vacuum film forming apparatus supplies a processing material connected to an upper portion of the vacuum processing chamber 2 through a vacuum processing chamber 2 having an EB gun 1 as an evaporation source and a supply pipe 4 provided with a first vacuum gate valve 3. A substrate transfer unit 7 connected to the upper part of the vacuum processing chamber 2 through a tank 5 and a second vacuum gate valve 6 is provided.

  A processing material (MgO in this embodiment) 8 is stored in the processing material supply tank 5, and the supply amount of the processing material 8 to the vacuum processing chamber 2 is adjusted by opening and closing the first vacuum gate valve 3. The The substrate transfer unit 7 is configured such that a plurality of substrates 9 are transferred from the left side to the right side of the drawing, and the substrate 9 stops above the second vacuum gate valve 6 during the film forming process. The second vacuum gate valve 6 is located above the EB gun 1. Individual vacuum exhaust devices (not shown) are connected to the vacuum processing chamber 2 and the substrate transfer unit 7 so that the inside of the vacuum processing chamber 2 and the substrate transfer unit 7 has a predetermined pressure (degree of vacuum). Exhaust. The details of the first and second vacuum gate valves 3 and 6 which are features of the present invention will be described later.

  When the film forming process is performed by this vacuum film forming apparatus, the first vacuum gate valve 3 is opened, and the processing material (MgO) 8 in the processing material supply tank 5 is supplied from above the vacuum processing chamber 2 through the supply pipe 4. It supplies in the vacuum processing chamber 2 evacuated. The processing material (MgO) 8 supplied into the vacuum processing chamber 2 is heated and sublimated by the EB gun (evaporation source) 1, and the processing material turned into a gas passes through the opened second vacuum gate valve 6 to the upper side thereof. It adheres to the surface of the substrate 9 in the substrate transport section 7 set in (1) and is formed (coated).

  At this time, the supply amount of the processing material (MgO) 8 supplied from the processing material supply tank 5 to the vacuum processing chamber 2 is adjusted by the opening / closing operation of the first vacuum gate valve 3. The second vacuum gate valve 6 is open during the film formation process described above, but at the end of the film formation process operation or during regular maintenance of the EB gun (evaporation source) 1 in the vacuum processing chamber 2. Is trying to close.

  Next, the first and second vacuum gate valves 3 and 6 according to the embodiment of the present invention will be described with reference to FIGS. FIG. 2 is a plan view of the first and second vacuum gate valves 3 and 6 in a partially broken state, and FIG. 3 is a sectional view taken along the line AA.

  As shown in both drawings, the first and second vacuum gate valves 3 and 6 include a semicircular valve body 10 and a fan-shaped valve body 11 that is rotatably supported. The valve body 10 is formed by an upper body 10a and a lower body 10b formed so as to face each other, and a valve opening 10c is formed so as to communicate the upper body 10a and the lower body 10b. Yes.

  A valve body 11 is installed in a gap 10d having a predetermined width (about several mm) formed between the upper body 10a and the lower body 10b. The valve body 11 is sealed by the upper body 10a and is rotatable. It is rotatably supported by a rotating shaft 12 supported on the shaft. A rotation drive device (not shown) for rotating the valve body 11 is connected to the rotation shaft 12 and is integrated with the rotation shaft 12 by a rotation drive force (for example, compressed air) from the rotation drive device (not shown). The valve body 11 rotates within a predetermined angle.

  The valve body 11 has an opening hole 11a having substantially the same diameter as the valve opening 10c formed in the upper body 10a and the lower body 10b, and a diameter slightly larger than the diameter of the valve opening 10c on the surface on the upper body 10a side. The circular sealing surface 11b is provided, and the valve body 11 is rotated by a rotational driving force from a rotational driving device (not shown) so that the opening hole 11a or the sealing surface 11b is positioned in the valve opening 10c. Is done. The seal surface 11b provided on the valve body 11 is formed in a concave shape (see FIG. 4).

  Around the valve opening 10c on each inner surface of the upper body 10a and the lower body 10b on the gap portion 10d side, sealing members 13a and 13b each made of an annular rubber material and having a hollow interior are attached. . Air supply / exhaust ports 14a and 14b that are switched to an air supply port and an exhaust port by a switching operation are attached to the sealing materials 13a and 13b, respectively.

  The seal members 13a and 13b expand from a bent state when compressed air is supplied from a compressed air supply device (not shown) through the air supply / exhaust ports 14a and 14b, and the valve is formed at the seal portion around the valve opening 10c. The body 11 is in close contact with both surfaces and is in a sealed state. Further, when exhaust is performed by an exhaust device (not shown) through the air supply / exhaust ports 14a and 14b, the original bent state is restored and the sealed state is released.

  The first and second vacuum gate valves 3 and 6 according to the embodiment of the present invention are configured as described above, and when the first and second vacuum gate valves 3 and 6 are opened (the vacuum processing chamber for the processing material 8). 2 or when the film is formed on the substrate 9), the valve body 11 is rotated about the rotation shaft 12 by a rotational driving force from a rotational driving device (not shown), and the opening hole 11a is rotated. Is adjusted to the position of the valve opening 10c. During this operation, the inside of the sealing materials 13a and 13b is exhausted and the seal material is in a released state, and the sealing materials 13a and 13b are not in contact with both surfaces of the valve body 11.

  When the opening hole 11a of the valve body 11 is rotationally moved to the position of the valve opening 10c, the compressed air is supplied from the compressed air supply device (not shown) into the sealing materials 13a and 13b through the air supply / exhaust ports 14a and 14b. It is supplied and inflated, and the seal part around the valve opening 10c is brought into close contact with both surfaces of the valve body 11 (the upper body 10a side is around the opening hole 11a) and sealed.

  In addition, when the first and second vacuum gate valves 3 and 6 are closed (when supply of the processing material 8 to the vacuum processing chamber 2 is stopped, when the film forming processing operation is completed, or when the EB in the vacuum processing chamber 2 is periodically removed). During maintenance of the gun 1, etc., the valve body 11 is rotated about the rotation shaft 12 by the rotational drive force from a rotational drive device (not shown), and the seal surface 11b is brought to the position of the valve opening 10c. Match. During this operation, the inside of the sealing materials 13a and 13b is exhausted and the seal material is in a released state, and the sealing materials 13a and 13b are not in contact with both surfaces of the valve body 11.

  As shown in FIG. 4, when the seal surface 11b of the valve body 11 is rotationally moved to the position of the valve opening 10c, compressed air is supplied from a compressed air supply device (not shown) through the air supply / exhaust ports 14a and 14b. It is supplied into the sealing materials 13a and 13b and inflated, and in a sealing portion around the valve opening 10c, the both sides of the valve element 11 (the upper body 10a side is around the sealing surface 11b) are sealed.

  As described above, when the first and second vacuum gate valves 3 and 6 having the valve opening 10c open are opened, the seal portions around the valve opening 10c are sealed by the sealing materials 13a and 13b. Therefore, when the processing material 8 is supplied to the vacuum processing chamber 2 or when the film is formed, the floating processing material 8 is prevented from adhering to the seal portion around the valve opening 10c or the thin film is deposited. When the valve opening 10c is closed by the sealing surface 11b of the valve body 11, no leakage occurs, and the valve can be reliably sealed over a long period of time.

  Further, since the sealing surface 11b is formed in a concave shape, even if the floating processing material 8 adheres to the sealing surface 11b or a thin film is deposited, the sealing surface 11b is lower than the surface of the valve body 11. Therefore, when the valve body 11 is rotated, it does not adhere to the sealing materials 13a, 13b and the like.

  Further, by sealing both surfaces of the valve body 11 with the sealing materials 13a and 13b at the seal portion around the valve opening 10c, the first and 2 Even if there is a difference in pressure (vacuum degree) on both sides of the valve opening 10c across the valve element 11 of the vacuum gate valves 3 and 6, the sealed state can be reliably maintained without being affected by the difference.

  Further, the shapes of the valve main body 10 and the valve body 11 of the first and second vacuum gate valves 3 and 6 are not limited to the above-described embodiment, and may be, for example, a circular shape or a rectangular shape.

  In the above embodiment, the first and second vacuum gate valves 3 and 6 each have one valve opening 10c. However, the present invention is similarly applied to a vacuum gate valve having a plurality of valve openings. can do.

  In the above-described embodiment, the sealing members 13a and 13b that seal both surfaces of the valve body 11 at the seal portion around the valve opening 10c are used as the gap portion 10d between the upper body 10a and the lower body 10b of the valve body 10. However, the sealing materials 13a and 13b may be provided around both surfaces where the opening hole 11a and the sealing surface 11b of the valve body 11 are located.

  In the above embodiment, the vacuum gate valve according to the present invention is used in a vacuum film forming apparatus. However, the vacuum gate valve can be similarly used in various vacuum apparatuses other than the vacuum film forming apparatus.

The schematic block diagram which shows the vacuum film-forming apparatus provided with the vacuum gate valve which concerns on embodiment of this invention. The top view of the partially broken state which shows the vacuum gate valve which concerns on embodiment of this invention. FIG. 3 is a cross-sectional view taken along line AA in FIG. 2. Sectional drawing which shows the state which rotationally moved the sealing surface of the valve body to the valve opening part.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 EB gun 2 Vacuum processing chamber 3 First vacuum gate valve 5 Processing material supply tank 6 Second vacuum gate valve 7 Substrate transport unit 8 Processing material 9 Substrate 10 Valve body 10a Upper body 10b Lower body 10c Valve opening 10d Gap 11 Valve body 11a Opening hole 11b Seal surface 12 Rotating shaft 13a, 13b Sealing material

Claims (2)

A plate-like valve body supported in a movable manner is installed in a gap of a predetermined width formed in the valve body, and when the valve is opened, the valve opening formed so as to penetrate both sides of the valve body. The opening formed in the valve body is moved, and when the valve is closed, the valve body is moved so that the sealing surface of the valve body is located at the valve opening, and the seal portion around the valve opening is moved. A vacuum gate valve that seals with
Expansion and contraction can be achieved by introducing and discharging high-pressure fluid around the valve opening on each facing inner surface where the gap of the valve body is formed, or around both the opening hole and the sealing surface of the valve body. Install a hollow seal material,
When the valve is opened and closed, a high-pressure fluid is introduced into the sealing material to expand the sealing material, and the periphery of the valve opening on each inner surface of the valve body and the both surfaces of the valve body are sealed.
A vacuum gate valve characterized by that. The inside of the sealing surface is recessed in a concave shape,
The vacuum gate valve according to claim 1.

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