JP2005111362A - Method and apparatus for plasma arc decomposition of flons in liquid at normal temperature - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for detoxicating flons (chlorofluorocarbons) in liquid at a normal temperature by sufficiently evaporating recovered flons and analogous substances in liquid at normal temperature, supplying the flons and analogous substances to a decomposition apparatus, and decomposing the flons supplied in such a manner. <P>SOLUTION: The flons in liquid at a normal temperature are transported from a container and packed in a pressure vessel by using a compressed air, sufficiently evaporated by a heating apparatus 13 in the outside of a plasma arc generation means (PA), and then supplied to and decomposed by the plasma arc generation means (PA) for detoxification. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention belongs to a technical field relating to a plasma arc decomposition method and apparatus for decomposing and detoxifying chlorofluorocarbons that cause ozone layer destruction and global warming. In the technical field related to a plasma arc decomposition method and apparatus for decomposing and detoxifying chlorofluorocarbons, the present invention sufficiently vaporizes recovered chlorofluorocarbons and similar substances (hereinafter referred to as chlorofluorocarbons) at normal temperature and supplies them to a decomposing apparatus. However, this is a technique for decomposing liquid chlorofluorocarbons at room temperature supplied by this method.

[Prior art 1]
Prior art 1 is a technique using air arc plasma that thermally decomposes harmful substances by applying a high voltage to the air supplied into the cracking furnace and putting the harmful substances into the high-temperature plasma. (See Patent Document 1 “Publication Patent Publication No. 60-154200”)
However, as described in the prior art 1 in FIG. 1 of the publication and in the detailed description of the invention, “the plasma arc in the plasma burner 12 is caused by the annular electric field coils 36 and 38 that spin the arc. “Stabilized or in line” and “Organic liquid is fed to the plasma burner”. Therefore, in order to sufficiently bring the plasma into contact with the organic liquid, the annular electric field coil 36 and the annular electric field coil 38 that spin the arc are essential, and the apparatus is increased in size. In addition, since the organic liquid has a structure in which it directly contacts the electrode 26 and the electrode 28 of the plasma burner, the consumption of the electrode is extremely large.

[Prior Art 2]
In Prior Art 2, a mixed gas of argon and hydrogen is injected into a cracking furnace, a high voltage is applied between the electrodes to make the mixed gas into a plasma, and the plasma is rotated and vibrated by an AC magnetic field generator. This technology uses arc plasma, which expands the generation area and puts harmful substances into the furnace and dissociates the harmful substances into atoms, making it easier to contact and mix with the plasma. . (See Patent Document 2 “Publication Patent Publication No. 5-84324”)
Since this prior art 2 uses a mixed gas of argon and hydrogen, the temperature is very high, and the reaction can be simplified by decomposition in a strong reducing atmosphere. The effect is that the volume of the cracking furnace can be reduced as compared with the apparatus used.

[Prior Art 3]
Prior art 3 maintains the plasma torch and the pressure in the chamber (reactor) at a reduced pressure of atmospheric pressure or less, so that the plasma can be maintained stably, and the mixed gas of water vapor and organic halogen compound is contained in the plasma torch. Therefore, the organic halogen compound can be efficiently decomposed. (See Patent Document 3 “Publication Patent Publication No. 7-24081”)
Furthermore, this prior art 3 is a technique using high-frequency induction plasma that can suppress the generation of dioxins by quenching organic halogen compound exhaust gas decomposed by plasma with an alkaline aqueous solution.

  However, since all of these conventional techniques 1 to 3 use an alternating magnetic field or a high frequency coil in order to expand the plasma generation region, a large high frequency oscillator is required, and plasma, halogen compound, There is a problem that the reaction apparatus becomes larger and the equipment cost becomes expensive.

[Prior Art 4]
Prior art 4 is a technique using thermal argon plasma for the decomposition of specific CFCs. In the experimental apparatus used in this prior art 4, the argon plasma injection is caused by discharge between the anode of the copper nozzle and the tungsten rod under atmospheric pressure, and the reaction gas (Freon) enters the reaction part (plasma). It is injected from below the arc generating means PA. (See Non-Patent Document 1, “Plasma Chemistry and Plasma Processing Vol. 13, No. 3, 1993”)
However, since this conventional technique 4 also uses argon plasma injection, the arc voltage is low, the heat input is low, the reaction gas processing flow rate is low, and the expensive argon gas is used for plasma injection. There is a problem that the running cost increases.

[Prior art 5]
Furthermore, the prior art 5 is a technique for decomposing chlorofluorocarbon using a plasma arc. Nitrogen separated and concentrated from the air is used as the plasma gas, and a mixed gas composed of chlorofluorocarbon, water vapor, and air is put into a reaction tube installed under the anode. (See Non-Patent Document 2, “The Chemical Society of Japan 73rd Autumn Pension (1997) Preliminary Proceedings p. 236”)
[Prior Art 6]
Prior Art 6 has a plasma constraining nozzle that passes a plasma arc on the outer periphery of the electrode and a length of a portion that forms a plasma arc at a pole by passing a gas that forms a plasma jet from the outer periphery to the lower part of the plasma constraining nozzle. An anode nozzle with a through-hole and a reaction nozzle with a through-hole passing through the plasma jet and alternative chlorofluorocarbon under the anode nozzle are arranged to generate a plasma arc between the electrode and the pole of the anode nozzle. A gas that forms a plasma jet having an arc voltage higher than that of argon gas is supplied from above, and water or water vapor is supplied together with alternative chlorofluorocarbon from an injection hole that penetrates the reaction nozzle in the center direction. Acid generated by the decomposition reaction and carbon monoxide generated from the bottom of the reaction nozzle Gas and allowed to oxidation reaction is a technology for carbon dioxide. (See Patent Document 4 “Publication Patent Publication No. 2000-334294”)
However, the compressed amount of air required to supply oxygen 0 ₂ needed to detoxify CFC becomes excessive as compared with CFC substitute amount, it is difficult to supply HCFC into the reaction tube . In addition, there is a problem that the amount of compressed air becomes large and the arc length for decomposing alternative chlorofluorocarbons is insufficient, and in these arc plasma methods, chlorofluorocarbons that are liquid at room temperature cannot be decomposed. there were.

  The present invention has been made in view of such problems, and the object of the present invention is to first transfer and fill chlorofluorocarbons, which are liquid at room temperature, from a container to a pressure vessel using compressed air. Secondly, after that, chlorofluorocarbons, which are liquid at room temperature, are sufficiently vaporized by a heating device outside the plasma arc generating means, and then supplied to the plasma arc generating means. Third, it is decomposed and detoxified by the arc plasma generating means. An object of the present invention is to provide a plasma arc decomposition method and a decomposition apparatus having the configurations of these first to third apparatuses and methods, and any one or two or more of these configurations are integrated.

The patent documents are as follows.
Japanese Patent Publication No. 60-154200 Published Patent Publication No. 5-84324 Published Patent Publication No. 7-24081 Non-patent documents are as follows. Plasma Chemistry and Plasma Processing Vol. 13, No. 3, 1993 The Chemical Society of Japan 73rd Autumn Pension (1997) Preliminary Proceedings p. 236

HCFC amount of compressed air required to supply oxygen 0 ₂ needed to detoxify becomes excessive as compared with CFC substitute amount, we are difficult to supply HCFC into the reaction tube. In addition, there is a problem that the amount of compressed air becomes large and the arc length for decomposing alternative chlorofluorocarbons is insufficient, and in these arc plasma methods, chlorofluorocarbons that are liquid at room temperature cannot be decomposed. there were.

  Means for solving the problems include the following three means, and the plasma arc decomposition method and the decomposition apparatus are implemented by any one or two or more of these means integrated.

  First, the present invention has a configuration in which chlorofluorocarbons which are liquid at room temperature are transferred and filled from a container to a pressure vessel using compressed air. In the embodiment described later, this first configuration corresponds to a chlorofluorocarbon pressure vessel transfer / filling means MF for transferring and filling chlorofluorocarbons into the pressure vessel at room temperature as shown in FIG.

  Secondly, the present invention includes a configuration in which chlorofluorocarbons, which are liquid at room temperature, are sufficiently vaporized by a heating device outside the plasma arc generating means and then supplied to the plasma arc generating means. In the second embodiment, as shown in FIG. 2, in the embodiment described later, the chlorofluorocarbon vaporizing supply for filling the pressure resistant container and evaporating liquid chlorofluorocarbon at normal temperature and supplying it to the plasma arc generating means PA. Means VF corresponds.

  Thirdly, the present invention has a configuration in which the arc plasma generating means decomposes and renders it harmless. In the third embodiment, as shown in FIG. 3, in the embodiment described later, the fluorocarbons that are liquid at normal temperature are vaporized by the heating device 13 outside the plasma arc generating means PA, and then decomposed by plasma arc. This corresponds to plasma arc generating means PA for detoxifying treatment.

  It is not necessary to have all the effects of the present invention described below at the same time, as long as they have one or more effects of the present invention.

  When using the plasma arc decomposition method and apparatus for chlorofluorocarbons which are liquid at room temperature according to the present invention, chlorofluorocarbons which are liquid at room temperature are transferred from the liquid chlorofluorocarbon containers 3 to the pressure vessel (10-a) using compressed air. The chlorofluorocarbons that are liquid at room temperature can be sufficiently vaporized by the heating device 13 outside the plasma arc generating means PA and then supplied to the plasma arc generating means PA. Liquid chlorofluorocarbons can be decomposed and detoxified by the plasma arc generating means PA.

  In the best mode for carrying out the invention, chlorofluorocarbons which are liquid at room temperature can be transferred and filled from the liquid chlorofluorocarbon containers 3 to the pressure vessel (10-a) using compressed air. The chlorofluorocarbons can be supplied to the plasma arc generating means PA after being sufficiently vaporized by the heating device 13 outside the plasma arc generating means PA. The liquid chlorofluorocarbons can be supplied to the plasma arc generating means PA at the supplied normal temperature. It is a plasma arc decomposition method and apparatus for chlorofluorocarbons that are decomposed and detoxified by the use of the above.

[Embodiments other than the best mode]
In the following, in addition to the best mode for carrying out the invention described above, embodiments capable of carrying out the invention of the present application are listed. Since the embodiments will be described with reference to the drawings, the drawings described in the embodiments will be described.

[Description of Drawings in Embodiment]
FIG. 1 is a schematic view of chlorofluorocarbon pressure vessel transfer and filling means for transferring and filling chlorofluorocarbons at room temperature into a pressure vessel.

  FIG. 2 is a schematic view of chlorofluorocarbon vaporizing and supplying means for evaporating liquid chlorofluorocarbons filled in a pressure vessel and supplying them to the plasma arc generating means.

  FIG. 3 is a schematic diagram of plasma arc generating means for decomposing and detoxifying with plasma arc after vaporizing supplied fluorocarbons at room temperature by a heating device outside the plasma arc generating means.

[Exemplary Embodiment]
Hereinafter, embodiments will be described with reference to the drawings. First, a decomposition processing method in the CFC decomposition apparatus according to the present invention will be described.

  In the first embodiment, as shown in FIG. 1, chlorofluorocarbon pressure vessel transfer and filling means MF for transferring and filling chlorofluorocarbons at room temperature from the liquid chlorofluorocarbon vessel 3 to the pressure vessel 10-a using compressed air. Is a decomposition / detoxification treatment method including

  In the second embodiment, as shown in FIG. 2, the chlorofluorocarbon vaporization supply that supplies liquid chlorofluorocarbons at room temperature to the plasma arc generation means PA after being sufficiently vaporized by the heating device 13 outside the plasma arc generation means PA. A plasma arc decomposition method including means VF.

  In the third embodiment, as shown in FIG. 3, generation of a plasma arc for decomposing and detoxifying the chlorofluorocarbons supplied at normal temperature after being vaporized by the heating device 13 outside the plasma arc generating means PA. This is a decomposition / detoxification processing method including means PA.

  In the fourth embodiment, as shown in FIG. 1, chlorofluorocarbon pressure vessel transfer and filling means MF for transferring and filling chlorofluorocarbons at room temperature from the liquid chlorofluorocarbon vessel 3 to the pressure vessel 10-a using compressed air. It is a disassembly / detoxification processing device including

  In the fifth embodiment, as shown in FIG. 2, the chlorofluorocarbon vaporization supply is performed in which chlorofluorocarbons which are liquid at room temperature are sufficiently vaporized by the heating device 13 outside the plasma arc generation means PA and then supplied to the plasma arc generation means PA. A plasma arc decomposition apparatus including means VF.

  In the sixth embodiment, as shown in FIG. 3, plasma for decomposing and detoxifying the chlorofluorocarbons supplied at room temperature after being sufficiently vaporized by the heating device 13 outside the plasma arc generating means PA. This is a decomposition / detoxification processing apparatus including an arc generating means PA.

  In the seventh embodiment, as shown in FIG. 3, the plasma arc generating means PA uses the discharge portion as the plasma torch 17 to improve the operability and workability of the fluorocarbon transfer / filling means MF or the fluorocarbon vaporization supply means. This is a decomposition / detoxification treatment supply method including one or both of VFs.

  In the eighth embodiment, as shown in FIG. 3, the chlorofluorocarbons that are liquid at normal temperature are sufficiently vaporized by the heating device 13 outside the plasma arc generating means PA, and water or steam is supplied to remove the chlorofluorocarbons. This is a plasma arc decomposition method in which decomposition and detoxification are performed by a plasma jet decomposition reaction.

  In the ninth embodiment, as shown in FIG. 3, the chlorofluorocarbons that are liquid at normal temperature are sufficiently vaporized by the heating device 13 outside the plasma arc generating means PA to generate a plasma arc. This is a plasma arc decomposition method in which a gas that forms a plasma jet having a high arc voltage is supplied, water or water vapor is supplied together with chlorofluorocarbons, and chlorofluorocarbons are decomposed and detoxified by the plasma jet.

  In the tenth embodiment, as shown in FIG. 3, the chlorofluorocarbons, which are liquid at normal temperature, are sufficiently vaporized by the heating device 13 outside the plasma arc generating means PA, and the plasma arc is passed through the outer periphery of the electrode. Of the anode nozzle 22 and the anode nozzle 22 having a through-hole having a length of a portion where a plasma arc is formed at the extreme point by passing a gas forming a plasma jet from the outer periphery to the lower side of the plasma restricting nozzle 25 having a hole. A reaction nozzle 24 having a through-hole through which a plasma jet and fluorocarbons pass is disposed below, a plasma arc is generated between the electrode and the pole of the anode nozzle 22, and from the upper periphery of the plasma constraining nozzle 25 more than argon gas. A gas that forms a plasma jet with a high arc voltage is supplied, and the reaction nozzle 24 is centered above the reaction nozzle 24. With fluorocarbons from threaded allowed the filling hole, a plasma arc decomposition apparatus for decomposing and detoxifying a plasma arc generating means PA for supplying water or water vapor.

  In the eleventh embodiment, as shown in FIG. 1, chlorofluorocarbon pressure vessel transfer and filling means MF for transferring and filling chlorofluorocarbons at normal temperature from the liquid chlorofluorocarbon vessel 3 to the pressure vessel 10-a using compressed air. And a plasma arc generating means PA for decomposing and detoxifying the liquid chlorofluorocarbons supplied at normal temperature after being vaporized by the heating device 13 outside the plasma arc generating means PA, as shown in FIG. It is a decomposition and detoxification treatment method.

  In the twelfth embodiment, as shown in FIG. 2, the chlorofluorocarbon vaporization supply is performed in which chlorofluorocarbons which are liquid at room temperature are sufficiently vaporized by the heating device 13 outside the plasma arc generation means PA and then supplied to the plasma arc generation means PA. Means VF and plasma arc generating means PA for decomposing and detoxifying the chlorofluorocarbons supplied at normal temperature after being vaporized by the heating device 13 outside the plasma arc generating means PA, as shown in FIG. Is a decomposition / detoxification treatment method.

  In the thirteenth embodiment, as shown in FIG. 1, chlorofluorocarbon pressure vessel transfer and filling means MF for transferring and filling chlorofluorocarbons at room temperature from the liquid chlorofluorocarbon vessel 3 to the pressure vessel 10-a using compressed air. As shown in FIG. 2, the chlorofluorocarbon vaporizing supply means VF for supplying the chlorofluorocarbons, which are liquid at room temperature, to the plasma arc generating means PA after being sufficiently vaporized by the heating device 13 outside the plasma arc generating means PA; As shown in FIG. 3, it is a decomposition / detoxification treatment method including plasma arc generating means PA for decomposing / detoxifying liquid chlorofluorocarbons at a supplied normal temperature.

  Hereinafter, the apparatus of the present invention will be described with reference to FIGS.

  In FIG. 1, after the filter 1 and the sampling tube 2 are connected and attached to the sampling tube connection port 4-c, the cap assembly 4 is attached to the liquid chlorofluorocarbon container 3. Furthermore, the opening / closing cock 6 is attached to the air injection port 4-b, and the air regulator 5-a and the compressed air introduction hose 7-a are connected to the opening / closing cock 6 and attached. One end of the liquid chlorofluorocarbon transfer hose 8-a is connected to the chlorofluorocarbon discharge port 4-a, and the other end of the liquid chlorofluorocarbon transfer hose 8-a is connected to the liquid boat 9-a.

By supplying air from the compressed air introduction hose 7-a, the liquid inside fluorocarbons liquid Freon container 3 (e.g. CFC-11; _CCl 3 F) is, the filter 1 and sampling tube 2, CFCs discharge port 4 -A, The pressure vessel 10-a is filled from the liquid boat 9-a through the liquid chlorofluorocarbon transfer hose 8-a. Unnecessary air is discharged through the gas port 11-a.

  In FIG. 2, after attaching the air regulator 5-b, the compressed air introduction hose 7-c, the temperature controllable heating device 13, the temperature controller 14 and the chlorofluorocarbon supply pipe 16 to which the heat retaining measures are applied to the metal stand 12. The liquid port 9-b and the heating device 13 are connected by a liquid chlorofluorocarbon transfer hose 8-b.

  The temperature controller 14 is set to a predetermined temperature (for example, 12 [° C.]), the compressed air introduction hose 7-b and the compressed air introduction hose 7-c are connected to the air regulator 5-b, and the compressed air introduction hose 7-c is connected. Is connected to the gas port 11-b. Compressed air is supplied from the compressed air introduction hose 7-c to the pressure vessel 10-b through the air regulator 5-b, the compressed air introduction hose 7-b, and the gas port 11-b.

Liquid chlorofluorocarbons (for example, CFCTL; CCl ₃ F) in the pressure vessel 10-b are supplied to the heating device 13 through the liquid port 9-b and the liquid chlorofluorocarbon transfer hose 8-b by compressed air. The liquid chlorofluorocarbons (for example, CFC-11) vaporized by the heating device 13 are supplied to the plasma generating means PA through the vaporized chlorofluorocarbon discharge port 15 and the chlorofluorocarbon supply pipe 16 subjected to heat insulation.

  In FIG. 3, the plasma torch 17 is attached to the plasma torch support 20. An anode nozzle (plus electrode) 22 is attached to the plasma torch support 20, and a reaction nozzle 24 is attached to the tip of the anode nozzle (plus electrode) 22. A torch handle 18 and a torch attaching / detaching handle 19 are attached to the plasma torch support 20. The torch handle 18 is attached to the upper part of the cooling bracket 23 with screws.

  When the torch attaching / detaching handle 19 is rotated and lifted, the plasma torch 17, the plasma torch support body 20, the torch handle 18, the anode nozzle (plus electrode) 22, and the reaction nozzle 24 can be pulled out from the cooling bracket 23 together. In addition, inspection, replacement, etc. of the anode nozzle (plus electrode) 22 and the reaction nozzle 24 can be facilitated.

  Cooling water is supplied from the cooling bracket cooling water inlet 23-b to the cooling bracket 23, the anode nozzle (plus electrode) 22 and the reaction nozzle 24 are cooled, and discharged from the cooling bracket cooling water outlet 23-a. In the figure, the plasma restraining nozzle 25, the gas supply flange 28, and the plasma flame observation window 30 are shown.

Plasma jet forming gas (plasma jet forming compressed air) having a high arc voltage is supplied from a plasma jet forming gas (plasma jet forming compressed air) supply port 21. Fluorocarbons (for example, CFC-11; CCl ₃ F) and water supplied through the discharge port 15 of chlorofluorocarbons vaporized from the chlorofluorocarbon and water or water vapor supply port 26 and the chlorofluorocarbon supply pipe 16 subjected to heat insulation Supply steam.

Carbon monoxide oxidizing gas (carbon monoxide oxidizing compressed air) is supplied from a carbon monoxide oxidizing gas (carbon monoxide oxidizing compressed air) supply port 27 to a plasma flame observation window protective gas (for plasma flame observation window protection). Compressed air) A plasma flame observation window protecting gas (for example, compressed air for protecting a plasma flame observation window) is supplied from a supply port 31. Fluorocarbons and chlorofluorocarbons (for example, CFC-ll; CCl ₃ F) supplied from the water or water vapor supply port 26 are sufficiently decomposed by the reaction nozzle 24 and the combustion cylinder 29 by the generated high-temperature plasma arc jet.

  (A) As shown in FIG. 1, the first means is a chlorofluorocarbon pressure vessel transfer / filling means MF for transferring and filling chlorofluorocarbons at room temperature into the pressure vessel.

  (B) The second means, as shown in FIG. 2, is a fluorocarbon vaporization supply means VF that is filled in a pressure vessel and vaporizes liquid fluorocarbons at room temperature and supplies them to the plasma arc generation means PA. .

  (C) The third means, as shown in FIG. 3, performs the plasma arc decomposition / detoxification treatment after vaporizing the supplied chlorofluorocarbons at the normal temperature by the heating device 13 outside the plasma arc generating means PA. This is a plasma arc generating means PA. The third means may be a plasma arc system (means) that is normally put into practical use when the first means or the second means or both are included. It may be a state-of-the-art plasma arc method (means) in which a kind is decomposed by a plasma jet.

  In the chlorofluorocarbon pressure vessel transfer and filling means MF for filling the first chlorofluorocarbon into the pressure vessel, as shown in FIG. 1, chlorofluorocarbons which are liquid at room temperature are usually recovered in the pressure vessel (10-a). Therefore, the sampling tube 2 with the filter 1 at the tip is attached to the discharge port side of the cap assembly 4, and the air regulator (5-a) and the open / close cock 6 are attached to the air injection port side. The liquid chlorofluorocarbons are transferred to the pressure vessel (10-a) through the liquid port (9-a) of the pressure vessel (10-a) by the discharge port (4-a).

  In the fluorocarbon vaporization supply means VF for supplying the second fluorocarbons, as shown in FIG. 2, liquid is supplied to the liquid port (9-b) of the pressure resistant container (10-b) filled with liquid fluorocarbons. One of the chlorofluorocarbon supply pipes is connected, and the other is connected to the fluorocarbon discharge port 15 vaporized by the heating device 13 fixed to the stand 12.

  One end of the chlorofluorocarbon supply pipe 16 subjected to heat insulation is connected to the chlorofluorocarbon discharge port 15 of the heating device 13, and the other is connected to the chlorofluorocarbon discharge port 15 of the plasma arc generating means PA. Freon sufficiently vaporized by the heating device 13 by sending air into the pressure vessel (10-b) through the air regulator (5-b) to the gas port (11-b) of the pressure vessel (10-b). Can be supplied to the plasma arc generating means PA in a predetermined amount.

  The embodiments disclosed herein are illustrative in all respects and do not limit the scope of the claims. The technical scope of the claims is determined not by the description described in the above embodiment, but by the configuration described in the claims, and all the configurations equivalent to the configurations described in the claims. Is included in the technical scope of the claims.

  The present invention has utility with utility for each of the following embodiments, thus supporting industrial applicability.

  In the present invention, first, chlorofluorocarbons which are liquid at room temperature are transferred and filled from a container to a pressure vessel using compressed air. Secondly, after that, chlorofluorocarbons, which are liquid at room temperature, are sufficiently vaporized by a heating device outside the plasma arc generating means, and then supplied to the plasma arc generating means. Third, it is decomposed and detoxified by the arc plasma generating means. The plasma arc decomposition method and decomposition apparatus having the configurations of the first to third apparatuses and methods, and any one or more of these configurations integrated can be put into practical use.

FIG. 2 is a schematic view of a chlorofluorocarbon pressure vessel transfer filling means for transferring and filling liquid chlorofluorocarbons into a pressure vessel at room temperature. FIG. 3 is a schematic view of chlorofluorocarbon vaporization supply means for evaporating liquid chlorofluorocarbons filled in a pressure-resistant container and supplying them to plasma arc generation means. FIG. 3 is a schematic diagram of plasma arc generating means for decomposing and detoxifying with plasma arc after vaporizing supplied fluorocarbons at room temperature by a heating device outside the plasma arc generating means.

Explanation of symbols

MF chlorofluorocarbon pressure-resistant container transfer filling means VF chlorofluorocarbon vaporization supply means PA plasma arc generating means 1 filter 2 sampling tube 3 liquid chlorofluorocarbon containers 4 cap assembly 4-a chlorofluorocarbons discharge port 4-b air injection port 4-c sampling Pipe connection port 5-a Air regulator 5-b Air regulator 6 Open / close cock 7-a Compressed air introduction hose 7-b Compressed air introduction hose 7-c Compressed air introduction hose 8-a Liquid chlorofluorocarbon transfer hose 8-b Liquid chlorofluorocarbon Liquid transfer hose 9-a Liquid port 9-b Liquid port 10-a Pressure vessel 10-b Pressure vessel 11-a Gas port 11-b Gas port 12 Metal stand 13 Heating device 14 Temperature controller 15 Vaporized fluorocarbon discharge Port 16 Fluorocarbon supply pipe 17 with heat insulation measures 17 Plasma torch 18 Torch handle 19 Torch attaching / detaching handle 20 Plasma torch support 21 Plasma jet forming gas (compressed air for forming plasma jet) supply port 22 Anode nozzle (plus electrode)
23 Cooling bracket 23-a Cooling bracket cooling water outlet 23-b Cooling bracket cooling water inlet 24 Reaction nozzle 25 Plasma restraint nozzle 26 CFCs and water or water vapor supply port 27 Carbon monoxide oxidizing gas (compressed air for carbon monoxide oxidation) Supply port 28 Gas supply flange 29 Combustion cylinder 30 Plasma flame observation window 31 Plasma flame observation window protective gas (compressed air for plasma flame observation window protection) supply port.

Claims (6)

  A plasma arc decomposition method in which liquid chlorofluorocarbons are transferred and filled from a container to a pressure vessel using compressed air at room temperature.     A plasma arc decomposition method in which chlorofluorocarbons which are liquid at room temperature are sufficiently vaporized by a heating device outside the plasma arc generating means and then supplied to the plasma arc generating means.     The supplied chlorofluorocarbons at room temperature are sufficiently vaporized by a heating device outside the plasma arc generating means to generate a plasma arc, and supply a gas that forms a plasma jet having an arc voltage higher than that of argon gas. Arc decomposition method in which chlorofluorocarbons are decomposed and reacted with a plasma jet by supplying water or water vapor together with the above.   Plasma arc decomposition equipment that transfers and fills fluorocarbons at room temperature from a container to a pressure vessel using compressed air.     A plasma arc decomposition apparatus that supplies liquid fluorocarbons at room temperature to a plasma arc generating means after they are sufficiently vaporized by a heating device outside the plasma arc generating means.   The supplied fluorocarbons at room temperature are sufficiently vaporized by a heating device outside the plasma arc generating means, and the plasma arc is passed through the outer periphery of the electrode, from the outer periphery of the plasma constraining nozzle and the plasma constraining nozzle to the lower part. An anode nozzle having a through-hole having a length that allows a gas to form a plasma jet to pass and a plasma arc to be formed at a pole point, and a reaction nozzle having a through-hole through which the plasma jet and chlorofluorocarbons pass are arranged below the anode nozzle Then, a plasma arc is generated between the electrode and the pole of the anode nozzle, a gas that forms a plasma jet having an arc voltage higher than that of the argon gas is supplied from above the outer periphery of the plasma constraining nozzle, and in the center direction above the reaction nozzle. Plasma arc that supplies water or water vapor together with chlorofluorocarbons from a through-hole inserted Plasma arc decomposition apparatus for decomposing and detoxifying the raw unit PA.

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