JP2005089501A - Curable resin composition and protective film composed of the same composition - Google Patents
Curable resin composition and protective film composed of the same composition Download PDFInfo
- Publication number
- JP2005089501A JP2005089501A JP2003321011A JP2003321011A JP2005089501A JP 2005089501 A JP2005089501 A JP 2005089501A JP 2003321011 A JP2003321011 A JP 2003321011A JP 2003321011 A JP2003321011 A JP 2003321011A JP 2005089501 A JP2005089501 A JP 2005089501A
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- curable resin
- component
- monomer
- protective film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000011342 resin composition Substances 0.000 title claims abstract description 54
- 230000001681 protective effect Effects 0.000 title claims abstract description 38
- 239000000203 mixture Substances 0.000 title abstract description 12
- -1 aromatic oxetane compound Chemical class 0.000 claims abstract description 55
- 239000000178 monomer Substances 0.000 claims abstract description 47
- 239000003054 catalyst Substances 0.000 claims abstract description 27
- 229920000642 polymer Polymers 0.000 claims abstract description 24
- 150000004292 cyclic ethers Chemical group 0.000 claims abstract description 16
- 125000002091 cationic group Chemical group 0.000 claims abstract description 15
- 238000012644 addition polymerization Methods 0.000 claims abstract description 11
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 5
- 239000003963 antioxidant agent Substances 0.000 claims description 21
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 20
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 14
- 230000003078 antioxidant effect Effects 0.000 claims description 14
- 150000001768 cations Chemical class 0.000 claims description 12
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Chemical group CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 11
- 239000002530 phenolic antioxidant Substances 0.000 claims description 10
- 229920001187 thermosetting polymer Polymers 0.000 claims description 7
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 4
- 238000001723 curing Methods 0.000 abstract description 25
- 238000000576 coating method Methods 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 6
- 238000013007 heat curing Methods 0.000 abstract 1
- 238000004321 preservation Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 description 22
- 229920000647 polyepoxide Polymers 0.000 description 21
- 239000003822 epoxy resin Substances 0.000 description 20
- 235000006708 antioxidants Nutrition 0.000 description 19
- 239000003960 organic solvent Substances 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 16
- 239000004094 surface-active agent Substances 0.000 description 13
- 238000003860 storage Methods 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 239000007983 Tris buffer Substances 0.000 description 10
- 229920001296 polysiloxane Polymers 0.000 description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 9
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- 239000002253 acid Substances 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 8
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 8
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 7
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 7
- 229920003986 novolac Polymers 0.000 description 7
- 229910052698 phosphorus Inorganic materials 0.000 description 7
- 239000011574 phosphorus Substances 0.000 description 7
- 229920002554 vinyl polymer Polymers 0.000 description 7
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000012321 sodium triacetoxyborohydride Substances 0.000 description 6
- 239000011593 sulfur Substances 0.000 description 6
- 229910052717 sulfur Inorganic materials 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 150000005846 sugar alcohols Polymers 0.000 description 5
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- JKIJEFPNVSHHEI-UHFFFAOYSA-N Phenol, 2,4-bis(1,1-dimethylethyl)-, phosphite (3:1) Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C JKIJEFPNVSHHEI-UHFFFAOYSA-N 0.000 description 4
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 4
- 239000004480 active ingredient Substances 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- 239000004305 biphenyl Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- GVJHHUAWPYXKBD-UHFFFAOYSA-N d-alpha-tocopherol Natural products OC1=C(C)C(C)=C2OC(CCCC(C)CCCC(C)CCCC(C)C)(C)CCC2=C1C GVJHHUAWPYXKBD-UHFFFAOYSA-N 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 4
- XXRMWTWYBZRJCB-UHFFFAOYSA-N oxetane Chemical compound C1COC1.C1COC1 XXRMWTWYBZRJCB-UHFFFAOYSA-N 0.000 description 4
- 125000003566 oxetanyl group Chemical group 0.000 description 4
- 229920005862 polyol Polymers 0.000 description 4
- 150000003077 polyols Chemical class 0.000 description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
- 125000003003 spiro group Chemical group 0.000 description 4
- 238000013112 stability test Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- PZRWFKGUFWPFID-UHFFFAOYSA-N 3,9-dioctadecoxy-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound C1OP(OCCCCCCCCCCCCCCCCCC)OCC21COP(OCCCCCCCCCCCCCCCCCC)OC2 PZRWFKGUFWPFID-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 3
- 150000002009 diols Chemical class 0.000 description 3
- PWWSSIYVTQUJQQ-UHFFFAOYSA-N distearyl thiodipropionate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCCCCCC PWWSSIYVTQUJQQ-UHFFFAOYSA-N 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 3
- 229920001610 polycaprolactone Polymers 0.000 description 3
- 239000004632 polycaprolactone Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 239000002861 polymer material Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- RGASRBUYZODJTG-UHFFFAOYSA-N 1,1-bis(2,4-ditert-butylphenyl)-2,2-bis(hydroxymethyl)propane-1,3-diol dihydroxyphosphanyl dihydrogen phosphite Chemical compound OP(O)OP(O)O.C(C)(C)(C)C1=C(C=CC(=C1)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1)C(C)(C)C)C(C)(C)C RGASRBUYZODJTG-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- VNQNXQYZMPJLQX-UHFFFAOYSA-N 1,3,5-tris[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]-1,3,5-triazinane-2,4,6-trione Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CN2C(N(CC=3C=C(C(O)=C(C=3)C(C)(C)C)C(C)(C)C)C(=O)N(CC=3C=C(C(O)=C(C=3)C(C)(C)C)C(C)(C)C)C2=O)=O)=C1 VNQNXQYZMPJLQX-UHFFFAOYSA-N 0.000 description 2
- XYXJKPCGSGVSBO-UHFFFAOYSA-N 1,3,5-tris[(4-tert-butyl-3-hydroxy-2,6-dimethylphenyl)methyl]-1,3,5-triazinane-2,4,6-trione Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C)=C1CN1C(=O)N(CC=2C(=C(O)C(=CC=2C)C(C)(C)C)C)C(=O)N(CC=2C(=C(O)C(=CC=2C)C(C)(C)C)C)C1=O XYXJKPCGSGVSBO-UHFFFAOYSA-N 0.000 description 2
- YAGPRJYCDKGWJR-UHFFFAOYSA-N 2-(2,4,8,10-tetratert-butylbenzo[d][1,3,2]benzodioxaphosphepin-6-yl)oxy-n,n-bis[2-(2,4,8,10-tetratert-butylbenzo[d][1,3,2]benzodioxaphosphepin-6-yl)oxyethyl]ethanamine Chemical compound O1C2=C(C(C)(C)C)C=C(C(C)(C)C)C=C2C2=CC(C(C)(C)C)=CC(C(C)(C)C)=C2OP1OCCN(CCOP1OC2=C(C=C(C=C2C=2C=C(C=C(C=2O1)C(C)(C)C)C(C)(C)C)C(C)(C)C)C(C)(C)C)CCOP(OC1=C(C=C(C=C11)C(C)(C)C)C(C)(C)C)OC2=C1C=C(C(C)(C)C)C=C2C(C)(C)C YAGPRJYCDKGWJR-UHFFFAOYSA-N 0.000 description 2
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 2
- MSXXDBCLAKQJQT-UHFFFAOYSA-N 2-tert-butyl-6-methyl-4-[3-(2,4,8,10-tetratert-butylbenzo[d][1,3,2]benzodioxaphosphepin-6-yl)oxypropyl]phenol Chemical compound CC(C)(C)C1=C(O)C(C)=CC(CCCOP2OC3=C(C=C(C=C3C=3C=C(C=C(C=3O2)C(C)(C)C)C(C)(C)C)C(C)(C)C)C(C)(C)C)=C1 MSXXDBCLAKQJQT-UHFFFAOYSA-N 0.000 description 2
- LMIOYAVXLAOXJI-UHFFFAOYSA-N 3-ethyl-3-[[4-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane Chemical compound C=1C=C(COCC2(CC)COC2)C=CC=1COCC1(CC)COC1 LMIOYAVXLAOXJI-UHFFFAOYSA-N 0.000 description 2
- DPTGFYXXFXSRIR-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl prop-2-enoate Chemical compound C1C(COC(=O)C=C)CCC2OC21 DPTGFYXXFXSRIR-UHFFFAOYSA-N 0.000 description 2
- 229910017008 AsF 6 Inorganic materials 0.000 description 2
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000011627 DL-alpha-tocopherol Substances 0.000 description 2
- 235000001815 DL-alpha-tocopherol Nutrition 0.000 description 2
- GHKOFFNLGXMVNJ-UHFFFAOYSA-N Didodecyl thiobispropanoate Chemical compound CCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCC GHKOFFNLGXMVNJ-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000003508 Dilauryl thiodipropionate Substances 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- 239000002656 Distearyl thiodipropionate Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 229910018286 SbF 6 Inorganic materials 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- CGRTZESQZZGAAU-UHFFFAOYSA-N [2-[3-[1-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoyloxy]-2-methylpropan-2-yl]-2,4,8,10-tetraoxaspiro[5.5]undecan-9-yl]-2-methylpropyl] 3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C)=CC(CCC(=O)OCC(C)(C)C2OCC3(CO2)COC(OC3)C(C)(C)COC(=O)CCC=2C=C(C(O)=C(C)C=2)C(C)(C)C)=C1 CGRTZESQZZGAAU-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 239000004844 aliphatic epoxy resin Substances 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- XFUOBHWPTSIEOV-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) cyclohexane-1,2-dicarboxylate Chemical compound C1CCCC(C(=O)OCC2OC2)C1C(=O)OCC1CO1 XFUOBHWPTSIEOV-UHFFFAOYSA-N 0.000 description 2
- HEYYMASVKJXRDV-UHFFFAOYSA-N bis[(3-ethyloxetan-3-yl)methyl] benzene-1,4-dicarboxylate Chemical compound C=1C=C(C(=O)OCC2(CC)COC2)C=CC=1C(=O)OCC1(CC)COC1 HEYYMASVKJXRDV-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 235000019304 dilauryl thiodipropionate Nutrition 0.000 description 2
- 235000019305 distearyl thiodipropionate Nutrition 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 2
- 150000008301 phosphite esters Chemical class 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 229920001059 synthetic polymer Polymers 0.000 description 2
- LVEOKSIILWWVEO-UHFFFAOYSA-N tetradecyl 3-(3-oxo-3-tetradecoxypropyl)sulfanylpropanoate Chemical compound CCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCC LVEOKSIILWWVEO-UHFFFAOYSA-N 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
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Abstract
Description
本発明は、硬化性樹脂組成物及び保護膜に関する。詳しくは、本発明は、液晶表示用素子、固体撮像素子及びカラーフィルターにおける平坦化膜、保護膜、反射防止膜、絶縁材等に好適な硬化性樹脂組成物、並びに、該硬化性樹脂組成物を熱硬化して得られる保護膜に関する。 The present invention relates to a curable resin composition and a protective film. Specifically, the present invention relates to a curable resin composition suitable for a flattening film, a protective film, an antireflection film, an insulating material and the like in a liquid crystal display element, a solid-state imaging element, and a color filter, and the curable resin composition It is related with the protective film obtained by thermosetting this.
液晶表示装置用のカラーフィルターにおけるオーバーコート材等の絶縁用保護膜として、特許文献1には、ポリグリシジルメタクリレートを溶解した溶液(ア)と、芳香族カルボン酸無水物及びイミダゾール類を溶解した溶液(イ)を、それぞれ調製し、基体に塗工する直前に(ア)と(イ)の2液を混合し、塗工、熱硬化して保護膜を得たことが開示されている。 Patent Document 1 discloses a solution (a) in which polyglycidyl methacrylate is dissolved and a solution in which aromatic carboxylic acid anhydrides and imidazoles are dissolved as protective films for insulation such as overcoat materials in color filters for liquid crystal display devices. It is disclosed that (a) was prepared, and two liquids (a) and (b) were mixed, coated and heat-cured immediately before coating on a substrate to obtain a protective film.
本発明者らが、上記の保護膜用組成物として特許文献1に記載の組成物を検討したところ、上記の(ア)と(イ)の2液を混合して得た組成物を23℃で保存すると粘度が著しく増加し、保存安定性が十分ではないことが分かった。
本発明の目的は、優れた保存安定性を有する硬化性樹脂組成物、並びに優れた耐熱性を有する保護膜を提供することである。
When the present inventors examined the composition of patent document 1 as said composition for protective films, the composition obtained by mixing said 2 liquid of (A) and (I) was 23 degreeC. It was found that when stored at, the viscosity increased significantly and the storage stability was not sufficient.
An object of the present invention is to provide a curable resin composition having excellent storage stability and a protective film having excellent heat resistance.
本発明者は、上記課題を解決すべく鋭意検討した結果、本発明を完成した。
すなわち、本発明は、下記(A)、(B)及び(C)成分を含有することを特徴とする硬化性樹脂組成物、並びに該硬化性樹脂組成物を被塗工物に塗工し、熱硬化してなる保護膜を提供するものである。
(A):環状エーテル基及びオレフィン二重結合を有する単量体を付加重合して得られる分子量2000以上の重合体
(B):分子量2000未満のオキセタン化合物
(C):カチオン硬化触媒
As a result of intensive studies to solve the above problems, the present inventors have completed the present invention.
That is, the present invention is a curable resin composition containing the following components (A), (B) and (C), and the curable resin composition applied to an article to be coated: A protective film formed by thermosetting is provided.
(A): a polymer having a molecular weight of 2000 or more obtained by addition polymerization of a monomer having a cyclic ether group and an olefin double bond (B): an oxetane compound having a molecular weight of less than 2000 (C): a cationic curing catalyst
本発明の硬化性樹脂組成物は優れた保存安定性を有する。また、本発明の硬化性樹脂組成物は耐熱性に優れた保護膜を与える。
本発明の組成物は、保存安定性に優れることから、大型の塗工を要する場合でも、操作性を損なうことがない。
The curable resin composition of the present invention has excellent storage stability. Moreover, the curable resin composition of this invention gives the protective film excellent in heat resistance.
Since the composition of the present invention is excellent in storage stability, it does not impair operability even when a large coating is required.
以下、本発明を詳細に説明する。
本発明の硬化性樹脂組成物における(A)成分は、環状エーテル基及びオレフィン二重結合を有する単量体を付加重合して得られる分子量2000以上の重合体である。
環状エーテル基及びオレフィン二重結合を有する単量体としては、例えば、下式(1)で表される単量体等が挙げられる。
[式中、R1は水素原子又はメチル基を表し、Yはカルボニルオキシ基又はメチレンオキシ基を表す。Aは単結合又は炭素数1〜12のアルキレン基を表す。但し、Aで表されるアルキレン基における炭素−炭素結合は酸素原子で中断されていてもよい。Eは、下記の群から選ばれる環状エーテル基を表す。
Hereinafter, the present invention will be described in detail.
The component (A) in the curable resin composition of the present invention is a polymer having a molecular weight of 2000 or more obtained by addition polymerization of a monomer having a cyclic ether group and an olefin double bond.
Examples of the monomer having a cyclic ether group and an olefin double bond include a monomer represented by the following formula (1).
[Wherein, R 1 represents a hydrogen atom or a methyl group, and Y represents a carbonyloxy group or a methyleneoxy group. A represents a single bond or an alkylene group having 1 to 12 carbon atoms. However, the carbon-carbon bond in the alkylene group represented by A may be interrupted by an oxygen atom. E represents a cyclic ether group selected from the following group.
(式中、R2〜R9は、それぞれ独立に水素原子又は炭素数1〜22の炭化水素基を表す。mは1〜4の整数を表す。)] (Wherein R 2 to R 9 each independently represents a hydrogen atom or a hydrocarbon group having 1 to 22 carbon atoms, m represents an integer of 1 to 4)]
式(1)で表される単量体としては、例えば、アリルグリシジルエーテル、2−メチルアリルグリシジルエーテル等の不飽和グリシジルエーテル;グリシジルアクリレート、グリシジルメタクリレート、イタコン酸グリシジルエステル等の不飽和グリシジルエステル;グリシドキシエチル(メタ)アクリレート、グリシドキシブチル(メタ)アクリレート等のグリシジルエーテル(メタ)アクリレート類;3,4−エポキシシクロヘキシルメチルアクリレート、3,4−エポキシシクロヘキシルメチルメタクリレート等の環状脂肪族エポキシ(メタ)アクリレート;オキセタニル(メタ)アクリレート、3−オキセタニルメチル(メタ)アクリレート、(3−メチル−3−オキセタニル)メチル(メタ)アクリレート、(3−エチル−3−オキセタニル)メチル(メタ)アクリレート等のオキセタニル(メタ)アクリレート等が挙げられる。 Examples of the monomer represented by the formula (1) include unsaturated glycidyl ethers such as allyl glycidyl ether and 2-methylallyl glycidyl ether; unsaturated glycidyl esters such as glycidyl acrylate, glycidyl methacrylate, and itaconic acid glycidyl ester; Glycidyl ether (meth) acrylates such as glycidoxyethyl (meth) acrylate and glycidoxybutyl (meth) acrylate; Cycloaliphatic epoxies such as 3,4-epoxycyclohexylmethyl acrylate and 3,4-epoxycyclohexylmethyl methacrylate (Meth) acrylate; oxetanyl (meth) acrylate, 3-oxetanylmethyl (meth) acrylate, (3-methyl-3-oxetanyl) methyl (meth) acrylate, (3-ethyl-3-o Setaniru) methyl (meth) oxetanyl (meth) acrylates such as acrylate.
環状エーテル基及びオレフィン二重結合を有する単量体としては、2種類以上の単量体を混合して用いてもよい。
環状エーテル基及びオレフィン二重結合を有する単量体としては、式(1)で表される単量体が好ましく、エポキシ基及びオレフィン二重結合を有する単量体がより好ましく、不飽和カルボン酸グリシジルエステルや環状脂肪族エポキシ(メタ)アクリレートがさらに好ましく、グリシジル(メタ)アクリレートや3,4−エポキシシクロヘキシルメチルアクリレートが特に好ましい。
As the monomer having a cyclic ether group and an olefin double bond, two or more kinds of monomers may be mixed and used.
The monomer having a cyclic ether group and an olefin double bond is preferably a monomer represented by the formula (1), more preferably a monomer having an epoxy group and an olefin double bond, and an unsaturated carboxylic acid. Glycidyl ester and cycloaliphatic epoxy (meth) acrylate are more preferable, and glycidyl (meth) acrylate and 3,4-epoxycyclohexylmethyl acrylate are particularly preferable.
(A)成分としては、環状エーテル基及びオレフィン二重結合を有する単量体以外に、さらに、(メタ)アクリル系単量体及び/又はスチレン系単量体を用いて付加重合して得られる重合体でもよい。
上記の(メタ)アクリル系単量体としては、例えば、アクリル酸メチル、メタクリル酸メチル、アクリル酸エチルやメタクリル酸エチル等の炭素数1〜20程度の直鎖状アルキル基を有する(メタ)アクリル酸アルキルエステル;アクリル酸t−ブチルやメタクリル酸t−ブチル等の炭素数3〜20程度の分枝状アルキル基を有する(メタ)アクリル酸アルキルエステル;アクリル酸シクロヘキシルやメタクリル酸シクロヘキシル等の炭素数5〜20程度の環状脂肪族アルキル基を有する(メタ)アクリル酸アルキルエステル等が挙げられる。
(メタ)アクリル系単量体として、2種類以上の(メタ)アクリル系単量体を用いてもよい。
(メタ)アクリル系単量体としては、(メタ)アクリル酸アルキルエステルが好ましい。
(メタ)アクリル系単量体としては、炭素数1〜4の直鎖状アルキル基を有する(メタ)アクリル酸アルキルエステル、炭素数1〜4の分枝状アルキル基を有する(メタ)アクリル酸アルキルエステルや飽和環状脂肪族アルキル基を有する(メタ)アクリル酸アルキルエステルが好ましい。
The component (A) is obtained by addition polymerization using a (meth) acrylic monomer and / or a styrene monomer in addition to a monomer having a cyclic ether group and an olefin double bond. It may be a polymer.
As said (meth) acrylic-type monomer, (meth) acryl which has C1-C20 linear alkyl groups, such as methyl acrylate, methyl methacrylate, ethyl acrylate, and ethyl methacrylate, for example. Acid alkyl ester; (meth) acrylic acid alkyl ester having a branched alkyl group having 3 to 20 carbon atoms such as t-butyl acrylate and t-butyl methacrylate; carbon number such as cyclohexyl acrylate and cyclohexyl methacrylate Examples include (meth) acrylic acid alkyl esters having about 5 to 20 cyclic aliphatic alkyl groups.
As the (meth) acrylic monomer, two or more kinds of (meth) acrylic monomers may be used.
As the (meth) acrylic monomer, (meth) acrylic acid alkyl ester is preferred.
As a (meth) acrylic monomer, (meth) acrylic acid alkyl ester having a linear alkyl group having 1 to 4 carbon atoms, (meth) acrylic acid having a branched alkyl group having 1 to 4 carbon atoms Alkyl esters and (meth) acrylic acid alkyl esters having saturated cyclic aliphatic alkyl groups are preferred.
スチレン系単量体としては、例えば、スチレン、α−メチルスチレン、ジビニルベンゼン等が挙げられる。スチレン系単量体として、2種類以上のスチレン系単量体を用いてもよい。
スチレン系単量体としては、特にスチレンが好適である。
Examples of the styrene monomer include styrene, α-methylstyrene, divinylbenzene, and the like. Two or more kinds of styrene monomers may be used as the styrene monomer.
As the styrenic monomer, styrene is particularly suitable.
(A)成分が、環状エーテル基及びオレフィン二重結合を有する単量体以外に、さらに、(メタ)アクリル系単量体及び/又はスチレン系単量体を用いて付加重合して得られる場合は、(メタ)アクリル系単量体及びスチレン系単量体に由来する構造単位の合計は、(A)成分を構成する全ての構造単位100mol%に対し、通常は5〜95mol%である。
上記の(メタ)アクリル系単量体及びスチレン系単量体に由来する構造単位の合計は、(A)成分を構成する全ての構造単位100mol%に対し、好ましくは10〜90mol%であり、特に好ましくは20〜80mol%である。
これらの各単量体を付加重合させて得られる重合体のうち、(メタ)アクリル系単量体及び/又はスチレン系単量体を5〜95mol%付加重合させて得た(A)成分は、得られる保護膜の脆化を抑制する傾向にある点で好ましい。
In the case where the component (A) is obtained by addition polymerization using a (meth) acrylic monomer and / or a styrene monomer in addition to the monomer having a cyclic ether group and an olefin double bond. The total of the structural units derived from the (meth) acrylic monomer and the styrene monomer is usually 5 to 95 mol% with respect to 100 mol% of all the structural units constituting the component (A).
The total of the structural units derived from the (meth) acrylic monomer and the styrene monomer is preferably 10 to 90 mol% with respect to 100 mol% of all the structural units constituting the component (A), Most preferably, it is 20-80 mol%.
Among the polymers obtained by addition polymerization of each of these monomers, the component (A) obtained by addition polymerization of 5 to 95 mol% of a (meth) acrylic monomer and / or a styrene monomer is: It is preferable in that it tends to suppress embrittlement of the protective film obtained.
(メタ)アクリル系単量体やスチレン系単量体以外の(A)成分の原料として用い得る単量体としては、分子内に付加重合し得る二重結合を少なくとも1個含有し、且つ、カルボン酸基やアミノ基等のようにエポキシ基と反応し得る官能基を含有しない脂肪族単量体等が挙げられる。
このような脂肪族単量体としては、例えば、酪酸ビニル、プロピオン酸ビニル、ピバリン酸ビニル、ラウリン酸ビニル、イソノナン酸ビニルやバーサチック酸ビニル等のアルカン酸ビニルエステル;塩化ビニルや臭化ビニル等のハロゲン化ビニル;塩化ビニリデン等のハロゲン化ビニリデン類等が例示される。
As a monomer that can be used as a raw material for the component (A) other than the (meth) acrylic monomer or the styrene monomer, it contains at least one double bond that can undergo addition polymerization in the molecule, and Examples include aliphatic monomers that do not contain a functional group capable of reacting with an epoxy group such as a carboxylic acid group and an amino group.
Examples of such aliphatic monomers include vinyl butyrate, vinyl propionate, vinyl pivalate, vinyl laurate, vinyl alkanoate such as vinyl isononanoate and vinyl versatate; vinyl chloride, vinyl bromide and the like. Examples of vinyl halides include vinylidene halides such as vinylidene chloride.
(A)成分の重合体としては、通常は、(A)成分の重合体を構成する単量体に由来する構造単位の1〜99mol%がCH2=CH−基を有する単量体に由来するものであり、上記重合体を形成する単量体に由来する構造単位の1〜95モル%がCH2=CH−基を有する単量体に由来する構造単位の重合体が好ましい。
(A)成分の重合体を形成する単量体に由来する構造単位の5〜80モル%がCH2=CH−基を有する単量体であると、耐熱性が向上する傾向にあり、特に好ましい。CH2=CH−基を有する単量体の具体例としては、上記(メタ)アクリル系単量体のうち、α位に置換基を有しないアクリル系単量体、α位に置換基を有しないスチレン系単量体、アルカン酸ビニル類やハロゲン化ビニル類、アリルグリシジルエーテル、グリシジルアクリレート等が挙げられる。
As the polymer of component (A), usually 1 to 99 mol% of the structural units derived from the monomer constituting the polymer of component (A) are derived from a monomer having a CH 2 ═CH— group. is intended to, polymers of structural units 1 to 95 mol% of structural units derived from a monomer forming the polymer derived from a monomer having a CH 2 = CH- group.
When the structural unit derived from the monomer that forms the polymer of the component (A) is a monomer having a CH 2 ═CH— group, the heat resistance tends to be improved. preferable. As specific examples of the monomer having a CH 2 ═CH— group, among the above (meth) acrylic monomers, an acrylic monomer having no substituent at the α-position, and having a substituent at the α-position Styrene monomers, vinyl alkanoates and vinyl halides, allyl glycidyl ether, glycidyl acrylate and the like.
(A)成分の重合体の製造方法としては、例えば、以下の方法が挙げられる。
(1)J. Polym. Sci., Polym.Chem.(1968), 6(2), 257-267に記載の如く、単量体及びラジカル発生剤を有機溶媒に混合せしめ、さらに必要に応じて、連鎖移動剤を混合せしめて、60〜300℃程度で溶液重合する方法;
(2)J. Polym. Sci., Polym.Chem.(1983), 21(10), 2949-2960に記載の如く、モノマーが溶解しない溶媒を用いて、60〜300℃程度で懸濁重合又は乳化重合する方法;
(3)特開平6−80735号報に記載の如く、60〜200℃で塊状重合する方法;
(4)特開平10−195111に記載の如く、使用する単量体等を連続的に重合器に供給して、重合器内で重合開始剤の存在下又は非存在下に180〜300℃で5〜60分間加熱し、得られる反応生成物を連続的に重合器外に取出す方法。
(A) As a manufacturing method of the polymer of a component, the following method is mentioned, for example.
(1) As described in J. Polym. Sci., Polym. Chem. (1968), 6 (2), 257-267, a monomer and a radical generator are mixed in an organic solvent, and further if necessary. , A method in which a chain transfer agent is mixed and solution polymerization is performed at about 60 to 300 ° C .;
(2) As described in J. Polym. Sci., Polym. Chem. (1983), 21 (10), 2949-2960, using a solvent that does not dissolve the monomer, A method of emulsion polymerization;
(3) a method of bulk polymerization at 60 to 200 ° C. as described in JP-A-6-80735;
(4) As described in JP-A No. 10-195111, the monomers to be used are continuously supplied to the polymerization vessel, and in the polymerization vessel at 180 to 300 ° C. in the presence or absence of the polymerization initiator. A method of heating for 5 to 60 minutes and continuously removing the resulting reaction product from the polymerization vessel.
硬化性樹脂組成物の溶媒として使用される有機溶媒を、上記重合体(A)成分の製造時に反応溶媒として使用すると、硬化性樹脂組成物を調合する後の工程において重合体を溶解する工程が省略できるので、好ましい。 When an organic solvent used as a solvent for the curable resin composition is used as a reaction solvent during the production of the polymer (A) component, there is a step of dissolving the polymer in the subsequent step of preparing the curable resin composition. This is preferable because it can be omitted.
上記の有機溶媒としては、例えば、メタノール、エタノール、プロパノール、ブタノール、ペンタノール、ヘキサノールやシクロヘキサノール等のアルコール類;アセトン、メチルエチルケトン、メチルイソブチルケトン、ジイソブチルケトン、シクロペンタノンやシクロヘキサノン等のケトン類;エチレングリコールジメチルエーテル、ジエチレングリコールジメチルエーテル、エチレングリコールモノエチルエーテル、ジエチレングリコールモノエチルエーテル、エチレングリコールジエチルエーテル、ジエチレングリコールジエチルエーテル、エチレングリコールモノブチルエーテル、ジエチレングリコールモノブチルエーテル、ジエチレングリコールジブチルエーテル、トリエチレングリコールジメチルエーテル、テトラエチレングリコールジメチルエーテル、プロピレングリコールモノメチルエーテル、3−メトキシ−1−ブタノールや3−メチル−3−メトキシ−1−ブタノール等のエーテル類;酢酸エチル、酢酸ブチル、酢酸アミル、乳酸メチル、乳酸エチル、乳酸ブチル、3−メトキシブチルアセテート、3−メチル−3−メトキシ−1−ブチルアセテート、エチレングリコールモノアセテート、エチレングリコールジアセテート、エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノアセテート、ジエチレングリコールジアセテート、ジエチレングリコールモノブチルエーテルアセテート、プロピレングリコールモノアセテート、プロピレングリコールジアセテート、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、エチレンカーボネート、プロピレンカーボネートやブチロラクトン等のエステル類;トルエンやキシレン等の芳香族炭化水素類等が挙げられる。
有機溶媒としては、2種類以上の有機溶媒を使用してもよい。
有機溶媒の中でも、遊離カルボキシル基やアミノ基等のような環状エーテル基と反応し得る官能基を含有しないものが好ましい。
Examples of the organic solvent include alcohols such as methanol, ethanol, propanol, butanol, pentanol, hexanol and cyclohexanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclopentanone and cyclohexanone; Ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, ethylene glycol monoethyl ether, diethylene glycol monoethyl ether, ethylene glycol diethyl ether, diethylene glycol diethyl ether, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, diethylene glycol dibutyl ether, triethylene glycol dimethyl ether, tetraethylene group Ethers such as coal dimethyl ether, propylene glycol monomethyl ether, 3-methoxy-1-butanol and 3-methyl-3-methoxy-1-butanol; ethyl acetate, butyl acetate, amyl acetate, methyl lactate, ethyl lactate, butyl lactate, 3-methoxybutyl acetate, 3-methyl-3-methoxy-1-butyl acetate, ethylene glycol monoacetate, ethylene glycol diacetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoacetate, diethylene glycol diacetate, Diethylene glycol monobutyl ether acetate, propylene glycol monoacetate, propylene glycol diacetate, propylene group Glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, ethylene carbonate, esters such as propylene carbonate and butyrolactone; aromatic hydrocarbons such as toluene and xylene, and the like.
As the organic solvent, two or more kinds of organic solvents may be used.
Among organic solvents, those not containing a functional group capable of reacting with a cyclic ether group such as a free carboxyl group or an amino group are preferred.
また、重合体(A)成分の官能基当りの分子量は、エポキシ当量を例にすると、通常は128g/当量以上であり、好ましくは150〜4000g/当量であり、より好ましくは150〜1000g/当量である。官能基当りの分子量が128g/当量よりも大きいと、得られる保護膜の脆化を抑制する傾向がある点で好ましく、官能基当りの分子量が4000g/当量より小さいと、耐薬品性に優れる傾向があるため、好ましい。
ここで、耐薬品性に優れるとは、本発明の保護膜を酸性水溶液、アルカリ性水溶液又は非プロトン性極性溶媒にそれぞれ数十分程度浸漬しても、保護膜の表面が侵されないことを意味し、具体的には、保護膜が薬品を吸収して膨潤又は粒状に分解される状態を抑制する傾向に優れることである。
重合体(A)成分の重量平均分子量としては、通常は2,000〜1,000,000であり、好ましくは3,000〜500,000であり、より好ましくは5,000〜200,000である。
重合体(A)成分としては、例えば、ブレンマーCP−50M(登録商標、グリシジルメタクリレート・メチルメタクリレート共重合体、日本油脂(株)製)、ブレンマーCP−50S(登録商標、グリシジルメタクリレート・スチレン共重合体、日本油脂(株)製)等の市販品を使用してもよい。
Further, the molecular weight per functional group of the polymer (A) component is usually 128 g / equivalent or more, preferably 150 to 4000 g / equivalent, more preferably 150 to 1000 g / equivalent, taking epoxy equivalent as an example. It is. When the molecular weight per functional group is larger than 128 g / equivalent, it is preferable from the viewpoint of suppressing embrittlement of the resulting protective film, and when the molecular weight per functional group is smaller than 4000 g / equivalent, the chemical resistance tends to be excellent. This is preferable.
Here, excellent chemical resistance means that the surface of the protective film is not affected even if the protective film of the present invention is immersed in an acidic aqueous solution, an alkaline aqueous solution or an aprotic polar solvent for about several tens of minutes. Specifically, the protective film is excellent in a tendency to suppress a state where the protective film absorbs the chemical and swells or is decomposed into particles.
The weight average molecular weight of the polymer (A) component is usually 2,000 to 1,000,000, preferably 3,000 to 500,000, more preferably 5,000 to 200,000. is there.
Examples of the polymer (A) component include Blenmer CP-50M (registered trademark, glycidyl methacrylate / methyl methacrylate copolymer, manufactured by NOF Corporation), Blemmer CP-50S (registered trademark, glycidyl methacrylate / styrene copolymer). Commercial products such as coalescence, manufactured by NOF Corporation may be used.
本発明の硬化性樹脂組成物に用いる上記の(B)成分は、分子中に1個以上のオキセタニル基を有する分子量2000未満のオキセタン化合物である。
分子量2000未満のオキセタン化合物としては、例えば、3−エチル−3−ヒドロキシメチルオキセタン、3−エチル−3−(フェノキシメチル)オキセタン、3−エチル−3−(2−エチルヘキシロキシメチル)オキセタン、1,4−ビス{[(3−エチル−3−オキセタニル)メトキシ]メチル}ベンゼン、1,4−ビス{(3−エチル−3−オキセタニル)メチル}テレフタレート、ジ[1−エチル(3−オキセタニル)]メチルエーテル、1,3−ビス{(1−エチル−3−オキセタニル)メトキシ}ベンゼン、4,4’−[(3−エチル−3−オキセタニル)メトキシ]ビフェニル、ビスフェノールノボラックオキセタン等が挙げられる。
中でも、1,4−ビス{[(3−エチル−3−オキセタニル)メトキシ]メチル}ベンゼン、1,4−ビス{(3−エチル−3−オキセタニル)メチル}テレフタレート、ジ[1−エチル(3−オキセタニル)]メチルエーテル、1,3−ビス{(1−エチル−3−オキセタニル)メトキシ}ベンゼン、4,4’−[(3−エチル−3−オキセタニル)メトキシ]ビフェニル、ビスフェノールノボラックオキセタンのように分子中に2個以上のオキセタニル基を有するオキセタン化合物が好ましい。また、1,3−ビス{(1−エチル−3−オキセタニル)メトキシ}ベンゼン、4,4’−[(3−エチル−3−オキセタニル)メトキシ]ビフェニル、ビスフェノールノボラックオキセタンのように芳香族フェノール系オキセタン化合物が耐熱性の面で好ましい。
本発明の硬化性樹脂組成物中の(B)成分の分子量は2000未満であるが、好ましくは1500以下、さらに好ましくは1000以下である。
本発明の硬化性樹脂組成物におけるオキセタン化合物(B)の比率としては、重合体(A)とオキセタン化合物(B)の合計に対して、通常1〜50%程度、好ましくは5〜25%程度である。
The component (B) used in the curable resin composition of the present invention is an oxetane compound having a molecular weight of less than 2000 and having one or more oxetanyl groups in the molecule.
Examples of the oxetane compound having a molecular weight of less than 2000 include 3-ethyl-3-hydroxymethyloxetane, 3-ethyl-3- (phenoxymethyl) oxetane, 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane, 1 , 4-bis {[(3-ethyl-3-oxetanyl) methoxy] methyl} benzene, 1,4-bis {(3-ethyl-3-oxetanyl) methyl} terephthalate, di [1-ethyl (3-oxetanyl) ] Methyl ether, 1,3-bis {(1-ethyl-3-oxetanyl) methoxy} benzene, 4,4 ′-[(3-ethyl-3-oxetanyl) methoxy] biphenyl, bisphenol novolac oxetane and the like.
Among them, 1,4-bis {[(3-ethyl-3-oxetanyl) methoxy] methyl} benzene, 1,4-bis {(3-ethyl-3-oxetanyl) methyl} terephthalate, di [1-ethyl (3 -Oxetanyl)] methyl ether, 1,3-bis {(1-ethyl-3-oxetanyl) methoxy} benzene, 4,4 '-[(3-ethyl-3-oxetanyl) methoxy] biphenyl, bisphenol novolac oxetane An oxetane compound having two or more oxetanyl groups in the molecule is preferred. In addition, aromatic phenolic compounds such as 1,3-bis {(1-ethyl-3-oxetanyl) methoxy} benzene, 4,4 ′-[(3-ethyl-3-oxetanyl) methoxy] biphenyl, and bisphenol novolac oxetane Oxetane compounds are preferred in terms of heat resistance.
The molecular weight of the component (B) in the curable resin composition of the present invention is less than 2000, preferably 1500 or less, more preferably 1000 or less.
The ratio of the oxetane compound (B) in the curable resin composition of the present invention is usually about 1 to 50%, preferably about 5 to 25% with respect to the total of the polymer (A) and the oxetane compound (B). It is.
本発明の硬化性樹脂組成物に用いるカチオン硬化触媒(C)は環状エーテル基を酸の作用によってカチオン重合させることができる硬化触媒である。該硬化触媒が加熱あるいは放射線等により酸を発生する潜在性カチオン触媒であると、保存安定性が良好な傾向であるため好ましく、特に加熱によって酸を発生する熱カチオン触媒(C1)が良好である。 The cationic curing catalyst (C) used in the curable resin composition of the present invention is a curing catalyst capable of cationic polymerization of a cyclic ether group by the action of an acid. It is preferable that the curing catalyst is a latent cation catalyst that generates an acid by heating or radiation, since the storage stability tends to be good, and the thermal cation catalyst (C1) that generates an acid by heating is particularly good. .
カチオン硬化触媒(C)としては、通常はカチオン成分とアニオン成分とが対になった有機オニウム塩化合物が用いられる。
上記の熱カチオン硬化触媒(C)のカチオン成分としては、有機スルホニウム、有機オキソニウム、有機アンモニウム、有機ホスホニウム又は有機ヨードニウム等の有機カチオンが例示される。また、前記の硬化触媒(C)のアニオン成分としては、B(C6F5)4 −、SbF6 −、AsF6 −、PF6 −又はBF4 −等が例示される。
本発明の硬化性樹脂組成物に用いられるカチオン硬化触媒(C)のカチオン成分としては、有機スルホニウムが好ましく、有機スルホニウムの中でも芳香族スルホニウムが特に好ましい。また、硬化触媒(C)のアニオン成分としては、SbF6 −、AsF6 −やPF6 −が好ましく、中でもPF6 −が特に好ましい。
As the cation curing catalyst (C), an organic onium salt compound in which a cation component and an anion component are paired is usually used.
Examples of the cation component of the thermal cation curing catalyst (C) include organic cations such as organic sulfonium, organic oxonium, organic ammonium, organic phosphonium, and organic iodonium. As the anionic component of the curing catalyst (C) of the, B (C 6 F 5) 4 -, SbF 6 -, AsF 6 -, PF 6 - or BF 4 -, and the like.
As a cation component of the cation curing catalyst (C) used in the curable resin composition of the present invention, organic sulfonium is preferable, and aromatic sulfonium is particularly preferable among organic sulfoniums. As the anionic component of the curing catalyst (C), SbF 6 -, AsF 6 - or PF 6 - is preferred, PF 6 - are particularly preferred.
上記熱カチオン硬化触媒(C1)としては、反応開始温度が90℃以上、特に105℃以上であると、硬化性樹脂組成物の保存安定性が一層向上する傾向があり好ましい。また、反応開始温度が200℃以下、特に150℃以下であると、酸やN−メチルピロリドンに曝されても侵されないという耐酸性および耐薬品性(耐NMP性等)に優れる傾向があり好ましい。
熱カチオン硬化触媒(C1)の反応開始温度とは、液状エポキシ樹脂AK−601(日本化薬(株)製のヘキサヒドロフタル酸ジグリシジルエステル)100重量部に対し、熱カチオン硬化触媒(C1)における溶媒を除いた有効成分3重量部を添加した試料について、昇温速度10℃/分の昇温速度で示差走査熱量分析(DSC)した際に、最も低温側に検出される発熱ピークの発熱開始温度である。
The thermal cation curing catalyst (C1) preferably has a reaction start temperature of 90 ° C. or higher, particularly 105 ° C. or higher because the storage stability of the curable resin composition tends to be further improved. Moreover, when the reaction start temperature is 200 ° C. or lower, particularly 150 ° C. or lower, there is a tendency to be excellent in acid resistance and chemical resistance (NMP resistance, etc.) that it is not attacked by exposure to an acid or N-methylpyrrolidone. .
The reaction start temperature of the thermal cation curing catalyst (C1) is the thermal cation curing catalyst (C1) with respect to 100 parts by weight of the liquid epoxy resin AK-601 (hexahydrophthalic acid diglycidyl ester manufactured by Nippon Kayaku Co., Ltd.). Exotherm of the exothermic peak detected at the lowest temperature when differential scanning calorimetry (DSC) was performed on the sample to which 3 parts by weight of the active ingredient excluding the solvent was added at a rate of temperature increase of 10 ° C./min. This is the starting temperature.
本発明の硬化性樹脂組成物におけるカチオン硬化触媒(C)の比率としては、この触媒(C)中の溶媒を除いた有効成分量で表すと、重合体(A)の100重量部当り、通常は0.2〜20重量部であり、好ましくは1〜10重量部である。 The ratio of the cationic curing catalyst (C) in the curable resin composition of the present invention is usually represented by the amount of the active ingredient excluding the solvent in the catalyst (C) per 100 parts by weight of the polymer (A). Is 0.2 to 20 parts by weight, preferably 1 to 10 parts by weight.
また、本発明の硬化性樹脂組成物には、酸化防止剤(D)を含有させることが好ましい。酸化防止剤としては、フェノール系酸化防止剤、リン系酸化防止剤及びイオウ系酸化防止剤の群から選ばれる少なくとも1種類の酸化防止剤であることが好ましく、フェノール系酸化防止剤の1種以上を含有することが特に好ましい。
本発明の硬化性樹脂組成物における酸化防止剤(D)の比率としては、分子量2000以上の重合体(A)と分子量2000未満のオキセタン化合物(B)の合計の100重量部当り、通常は0.001〜10重量部であり、好ましくは0.01〜1重量部である。
The curable resin composition of the present invention preferably contains an antioxidant (D). The antioxidant is preferably at least one antioxidant selected from the group consisting of phenolic antioxidants, phosphorus antioxidants, and sulfur antioxidants, and one or more phenolic antioxidants. It is particularly preferable to contain
The ratio of the antioxidant (D) in the curable resin composition of the present invention is usually 0 per 100 parts by weight of the total of the polymer (A) having a molecular weight of 2000 or more and the oxetane compound (B) having a molecular weight of less than 2000. 0.001 to 10 parts by weight, preferably 0.01 to 1 part by weight.
本発明におけるフェノール系酸化防止剤としては、例えば、2,6−ジ−t−ブチル−4−メチルフェノール、2,6−ジ−t−ブチル−4−エチルフェノール、2,6−ジシクロヘキシル−4−メチルフェノール、2,6−ジ−t−アミル−4−メチルフェノール、2,6−ジ−t−オクチル−4−n−プロピルフェノール、2,6−ジシクロヘキシル−4−n−オクチルフェノール、2−イソプロピル−4−メチル−6−t−ブチルフェノール、2−t−ブチル−2−エチル−6−t−オクチルフェノール、2−イソブチル−4−エチル−6−t−ヘキシルフェノール、2−シクロヘキシル−4−n−ブチル−6−イソプロピルフェノール、dl−α−トコフェロール、t−ブチルヒドロキノン、2,2’−メチレンビス(4−メチル−6−t−ブチルフェノール)、4,4’−ブチリデンビス(3−メチル−6−t−ブチルフェノール)、4,4’−チオビス(3−メチル−6−t−ブチルフェノール)、2,2’−チオビス(4−メチル−6−t−ブチルフェノール)、4,4’−メチレンビス(2,6−ジ−t−ブチルフェノール)、2,2’−メチレンビス[6−(1−メチルシクロヘキシル)−p−クレゾール]、2,2’−エチリデンビス(4,6−ジ−t−ブチルフェノール)、2,2’−ブチリデンビス(2−t−ブチル−4−メチルフェノール)、2−t−ブチル−6−(3−t−ブチル−2−ヒドロキシ−5−メチルベンジル)−4−メチルフェニルアクリレート、2−[1−(2−ヒドロキシ−3,5−ジ−t−ペンチルフェニル)エチル]−4,6−ジ−t−ペンチルフェニルアクリレート、1,1,3−トリス(2−メチル−4−ヒドロキシ−5−t−ブチルフェニル)ブタン、トリエチレングリコールビス[3−(3−t−ブチル−5−メチル−4−ヒドロキシフェニル)プロピオネート]、1,6−ヘキサンジオールビス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、2,2−チオジエチレンビス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、N,N’−ヘキサメチレンビス(3,5−ジ−t−ブチル−4−ヒドロキシ−ヒドロシンナミド)、3,5−ジ−t−ブチル−4−ヒドロキシベンジルホスホネートジエチルエステル、トリス(2,6−ジメチル−3−ヒドロキシ−4−t−ブチルベンジル)イソシアヌレート、トリス(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)イソシアヌレート、トリス[(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオニルオキシエチル]イソシアヌレート、トリス(4−t−ブチル−2,6−ジメチル−3−ヒドロキシベンジル)イソシアヌレート、2,4−ビス(n−オクチルチオ)−6−(4−ヒドロキシ−3,5−ジ−t−ブチルアニリノ)−1,3,5−トリアジン、テトラキス[メチレン−3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]メタン、2,2’−メチレンビス(4−メチル−6−t−ブチルフェノール)テレフタレート、1,3,5−トリメチル−2,4,6−トリス(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)ベンゼン、3,9−ビス[1,1−ジメチル−2−{β−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロピオニルオキシ}エチル]−2,4,8,10−テトラオキサスピロ[5,5]ウンデカン、2,2−ビス[4−(2−(3,5−ジ−t−ブチル−4−ヒドロキシヒドロシンナモイルオキシ))エトキシフェニル]プロパンやβ−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオン酸ステアリルエステルなどが挙げられる。 Examples of the phenolic antioxidant in the present invention include 2,6-di-t-butyl-4-methylphenol, 2,6-di-t-butyl-4-ethylphenol, and 2,6-dicyclohexyl-4. -Methylphenol, 2,6-di-t-amyl-4-methylphenol, 2,6-di-t-octyl-4-n-propylphenol, 2,6-dicyclohexyl-4-n-octylphenol, 2- Isopropyl-4-methyl-6-t-butylphenol, 2-t-butyl-2-ethyl-6-t-octylphenol, 2-isobutyl-4-ethyl-6-t-hexylphenol, 2-cyclohexyl-4-n -Butyl-6-isopropylphenol, dl-α-tocopherol, t-butylhydroquinone, 2,2'-methylenebis (4-methyl- -T-butylphenol), 4,4'-butylidenebis (3-methyl-6-t-butylphenol), 4,4'-thiobis (3-methyl-6-t-butylphenol), 2,2'-thiobis (4 -Methyl-6-t-butylphenol), 4,4'-methylenebis (2,6-di-t-butylphenol), 2,2'-methylenebis [6- (1-methylcyclohexyl) -p-cresol], 2 2,2'-ethylidenebis (4,6-di-t-butylphenol), 2,2'-butylidenebis (2-t-butyl-4-methylphenol), 2-t-butyl-6- (3-t- Butyl-2-hydroxy-5-methylbenzyl) -4-methylphenyl acrylate, 2- [1- (2-hydroxy-3,5-di-t-pentylphenyl) ethyl] -4,6-di -T-pentylphenyl acrylate, 1,1,3-tris (2-methyl-4-hydroxy-5-t-butylphenyl) butane, triethylene glycol bis [3- (3-t-butyl-5-methyl- 4-hydroxyphenyl) propionate], 1,6-hexanediol bis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], 2,2-thiodiethylenebis [3- (3 5-di-t-butyl-4-hydroxyphenyl) propionate], N, N′-hexamethylenebis (3,5-di-t-butyl-4-hydroxy-hydrocinnamide), 3,5-di-t- Butyl-4-hydroxybenzylphosphonate diethyl ester, tris (2,6-dimethyl-3-hydroxy-4-tert-butylbenzyl) isocyanurate Tris (3,5-di-t-butyl-4-hydroxybenzyl) isocyanurate, tris [(3,5-di-t-butyl-4-hydroxyphenyl) propionyloxyethyl] isocyanurate, tris (4 -T-butyl-2,6-dimethyl-3-hydroxybenzyl) isocyanurate, 2,4-bis (n-octylthio) -6- (4-hydroxy-3,5-di-t-butylanilino) -1, 3,5-triazine, tetrakis [methylene-3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate] methane, 2,2'-methylenebis (4-methyl-6-tert-butylphenol) terephthalate 1,3,5-trimethyl-2,4,6-tris (3,5-di-tert-butyl-4-hydroxybenzyl) benzene, 3,9 Bis [1,1-dimethyl-2- {β- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionyloxy} ethyl] -2,4,8,10-tetraoxaspiro [5,5 ] Undecane, 2,2-bis [4- (2- (3,5-di-t-butyl-4-hydroxyhydrocinnamoyloxy)) ethoxyphenyl] propane and β- (3,5-di-t- Butyl-4-hydroxyphenyl) propionic acid stearyl ester and the like.
これらのフェノール系酸化防止剤のうち、β−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオン酸ステアリルエステル、テトラキス[メチレン−3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]メタン、トリス(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)イソシアヌレート、1,3,5−トリメチル−2,4,6−トリス(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)ベンゼン、dl−α−トコフェロール、トリス(2,6−ジメチル−3−ヒドロキシ−4−t−ブチルベンジル)イソシアヌレート、トリス[(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオニルオキシエチル]イソシアヌレートや3,9−ビス[1,1−ジメチル−2−{β−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロピオニルオキシ}エチル]−2,4,8,10−テトラオキサスピロ[5,5]ウンデカンが好ましい。 Among these phenolic antioxidants, β- (3,5-di-t-butyl-4-hydroxyphenyl) propionic acid stearyl ester, tetrakis [methylene-3- (3,5-di-t-butyl- 4-hydroxyphenyl) propionate] methane, tris (3,5-di-t-butyl-4-hydroxybenzyl) isocyanurate, 1,3,5-trimethyl-2,4,6-tris (3,5-di) -T-butyl-4-hydroxybenzyl) benzene, dl-α-tocopherol, tris (2,6-dimethyl-3-hydroxy-4-t-butylbenzyl) isocyanurate, tris [(3,5-di-t -Butyl-4-hydroxyphenyl) propionyloxyethyl] isocyanurate and 3,9-bis [1,1-dimethyl-2- {β- (3-t-butyl) 4-hydroxy-5-methylphenyl) propionyloxy} ethyl] -2,4,8,10-spiro [5,5] undecane is preferred.
フェノール系酸化防止剤としては、市販品を使用してもよい。
このような市販されているフェノール系酸化防止剤としては、例えば、イルガノックス1010(Irganox 1010、チバ・スペシャルティー・ケミカルズ製)、イルガノックス1076(Irganox 1076、チバ・スペシャルティー・ケミカルズ製)、イルガノックス1330(Irganox 1330、チバ・スペシャルティー・ケミカルズ製)、イルガノックス3114(Irganox 3114、チバ・スペシャルティー・ケミカルズ製)、イルガノックス3125(Irganox 3125、チバ・スペシャルティー・ケミカルズ製)、スミライザーBHT(Sumilizer BHT、住友化学製)、シアノックス1790(Cyanox 1790、サイテック製)、スミライザーGA−80(Sumilizer GA−80、住友化学製)やビタミンE(エーザイ製)などが挙げられる。
フェノール系酸化防止剤は、2種類以上のフェノール系酸化防止剤を併用してもよい。
A commercially available product may be used as the phenolic antioxidant.
Examples of such commercially available phenolic antioxidants include Irganox 1010 (Irganox 1010, manufactured by Ciba Specialty Chemicals), Irganox 1076 (Irganox 1076, manufactured by Ciba Specialty Chemicals), Irga Knox 1330 (Irganox 1330, manufactured by Ciba Specialty Chemicals), Irganox 3114 (Irganox 3114, manufactured by Ciba Specialty Chemicals), Irganox 3125 (Irganox 3125, manufactured by Ciba Specialty Chemicals), Smither BHT ( Sumilizer BHT (manufactured by Sumitomo Chemical), Cyanox 1790 (Cyanox 1790, manufactured by Cytec), Sumilizer GA-80 (Sumiliz) er GA-80, manufactured by Sumitomo Chemical Co., Ltd.) and vitamin E (manufactured by Eisai).
A phenolic antioxidant may use together 2 or more types of phenolic antioxidants.
本発明におけるリン系酸化防止剤としては、例えば、トリオクチルホスファイト、トリラウリルホスファイト、トリデシルホスファイト、(オクチル)ジフェニルホスファイト、トリス(2,4−ジ−t−ブチルフェニル)ホスファイト、トリフェニルホスファイト、トリス(ブトキシエチル)ホスファイト、トリス(ノニルフェニル)ホスファイト、ジステアリルペンタエリスリトールジホスファイト、テトラ(トリデシル)−1,1,3−トリス(2−メチル−5−t−ブチル−4−ヒドロキシフエニル)ブタンジホスファイト、テトラ(C12〜C15混合アルキル)−4,4’−イソプロピリデンジフェニルジホスファイト、テトラ(トリデシル)−4,4’−ブチリデンビス(3−メチル−6−t−ブチルフェノール)ジホスファイト、トリス(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)ホスファイト、トリス(モノ・ジ混合ノニルフェニル)ホスファイト、水素化−4,4’−イソプロピリデンジフェノールポリホスファイト、ビス(オクチルフェニル)ビス[4,4’−ブチリデンビス(3−メチル−6−t−ブチルフェノール)]−1,6−ヘキサンジオールジホスファイト、フェニル(4,4’−イソプロピリデンジフェノール)ペンタエリスリトールジホスファイト、ジステアリルペンタエリスリトールジホスファイト、トリス[4,4’−イソプロピリデンビス(2−t−ブチルフェノール)]ホスファイト、ジ(イソデシル)フェニルホスファイト、4,4’−イソプロピリデンビス(2−t−ブチルフェノール)ビス(ノニルフェニル)ホスファイト、9,10−ジヒドロ−9−オキサ−10−ホスファフェナンスレン−10−オキサイド、ビス(2,4−ジ−t−ブチル−6−メチルフェニル)エチルフォスファイト、2−[{2,4,8,10−テトラ−t−ブチルジベンズ[d,f][1.3.2]−ジオキサホスフェピン−6−イル}オキシ]−N,N−ビス〔2−[{2,4,8,10−テトラ−t−ブチルジベンズ[d,f][1.3.2]−ジオキサホスフェピン−6−イル}オキシ]エチル〕エタンアミンや6−[3−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロポキシ]−2,4,8,10−テトラ−t−ブチルジベンズ[d,f][1.3.2]−ジオキサホスフェピンなどが挙げられる。 Examples of the phosphorus antioxidant in the present invention include trioctyl phosphite, trilauryl phosphite, tridecyl phosphite, (octyl) diphenyl phosphite, and tris (2,4-di-t-butylphenyl) phosphite. , Triphenyl phosphite, tris (butoxyethyl) phosphite, tris (nonylphenyl) phosphite, distearyl pentaerythritol diphosphite, tetra (tridecyl) -1,1,3-tris (2-methyl-5-t -Butyl-4-hydroxyphenyl) butanediphosphite, tetra (C12-C15 mixed alkyl) -4,4'-isopropylidene diphenyldiphosphite, tetra (tridecyl) -4,4'-butylidenebis (3-methyl) -6-tert-butylphenol) diphospha Tris (3,5-di-t-butyl-4-hydroxyphenyl) phosphite, tris (mono-dimixed nonylphenyl) phosphite, hydrogenated-4,4′-isopropylidenediphenol polyphosphite, Bis (octylphenyl) bis [4,4′-butylidenebis (3-methyl-6-tert-butylphenol)]-1,6-hexanediol diphosphite, phenyl (4,4′-isopropylidenediphenol) pentaerythritol Diphosphite, distearyl pentaerythritol diphosphite, tris [4,4′-isopropylidenebis (2-t-butylphenol)] phosphite, di (isodecyl) phenyl phosphite, 4,4′-isopropylidenebis ( 2-t-butylphenol) bis (nonylphenyl) phos 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, bis (2,4-di-t-butyl-6-methylphenyl) ethyl phosphite, 2-[{2 , 4,8,10-tetra-t-butyldibenz [d, f] [1.3.2] -dioxaphosphin-6-yl} oxy] -N, N-bis [2-[{2, 4,8,10-tetra-t-butyldibenz [d, f] [1.3.2] -dioxaphosphin-6-yl} oxy] ethyl] ethanamine or 6- [3- (3-t- Butyl-4-hydroxy-5-methylphenyl) propoxy] -2,4,8,10-tetra-t-butyldibenz [d, f] [1.3.2] -dioxaphosphine.
また、ビス(ジアルキルフェニル)ペンタエリスリトールジホスファイトエステルとしては、下記式(2)
(式中、R1、R2、およびR3は、それぞれ独立に、水素原子又は炭素数1〜9のアルキル基を表す。)
で示されるスピロ型のもの、又は、下記式(3)
(式中、R4、R5及びR6は、それぞれ独立に水素原子又は炭素数1〜9のアルキル基を表す。)
で示されるケージ形のものなどが挙げられる。
このようなホスファイトエステルは、通常、上記式(2)の化合物と式(3)の化合物との混合物が使用される。
ここで、R1〜R6がアルキル基である場合は、分枝状のアルキル基が好ましく、t−ブチル基が特に好ましい。また、ベンゼン環におけるR1〜R6の置換位置は、2位、4位又は6位が好ましい。
Moreover, as bis (dialkylphenyl) pentaerythritol diphosphite ester, following formula (2)
(Wherein, R 1, R 2, and R 3 each independently represent a hydrogen atom or an alkyl group having 1 to 9 carbon atoms.)
Spiro type represented by the following formula (3)
(In formula, R < 4 >, R < 5 > and R < 6 > represent a hydrogen atom or a C1-C9 alkyl group each independently.)
The cage type shown by is mentioned.
As such a phosphite ester, a mixture of the compound of the above formula (2) and the compound of the formula (3) is usually used.
Here, when R 1 to R 6 are alkyl groups, a branched alkyl group is preferable, and a t-butyl group is particularly preferable. Further, the substitution positions of R 1 to R 6 in the benzene ring are preferably the 2-position, 4-position or 6-position.
ホスファイトエステルの具体例としては、ビス(2,4−ジ−t−ブチルフェニル)ペンタエリスリトールジホスファイト、ビス(2,6−ジ−t−ブチル−4−メチルフェニル)ペンタエリスリトールジホスファイトやビス(ノニルフェニル)ペンタエリスリトールジホスファイト等が挙げられる。
また、炭素とリンとが直接結合した構造を持つホスフォナイトとしては、例えば、テトラキス(2,4−ジ−t−ブチルフェニル)−4,4’−ビフェニレンジホスフォナイト等が挙げられる。
Specific examples of phosphite esters include bis (2,4-di-t-butylphenyl) pentaerythritol diphosphite and bis (2,6-di-t-butyl-4-methylphenyl) pentaerythritol diphosphite. And bis (nonylphenyl) pentaerythritol diphosphite.
Examples of the phosphonite having a structure in which carbon and phosphorus are directly bonded include tetrakis (2,4-di-t-butylphenyl) -4,4′-biphenylenediphosphonite.
リン系酸化防止剤としては、市販品を使用することもできる。
このような市販されているリン系酸化防止剤としては、例えば、イルガフォス168(Irgafos 168、チバ・スペシャルティー・ケミカルズ製)、イルガフォス12(Irgafos 12、チバ・スペシャルティー・ケミカルズ製)、イルガフォス38(Irgafos 38、チバ・スペシャルティー・ケミカルズ製)、アデカスタブ329K(ADK STAB 329K、旭電化製)、アデカスタブPEP36(ADK STAB PEP36、旭電化製)、アデカスタブPEP−8(ADK STAB PEP−8、旭電化製)、Sandstab P−EPQ(クラリアント製)、ウェストン618(Weston 618、GE製)、ウェストン619G(Weston 619G、GE製)、ウルトラノックス626(Ultranox 626、GE製)やスミライザーGP(Sumilizer GP、住友化学製)などが挙げられる。
リン系酸化防止剤は、2種類以上のリン系酸化防止剤を併用してもよい。
A commercial item can also be used as a phosphorus antioxidant.
Examples of such commercially available phosphorous antioxidants include Irgafos 168 (Irgafos 168, manufactured by Ciba Specialty Chemicals), Irgafos 12 (Irgafos 12, manufactured by Ciba Specialty Chemicals), Irgafos 38 ( Irgafos 38, manufactured by Ciba Specialty Chemicals), ADK STAB 329K (ADK STAB 329K, manufactured by Asahi Denka), ADK STAB PEP36 (ADK STAB PEP36, manufactured by Asahi Denka), ADK STAB PEP-8 (ADK STAB PEP-8, manufactured by Asahi Denka) ), Sandstab P-EPQ (Clariant), Weston 618 (Weston 618, manufactured by GE), Weston 619G (Weston 619G, manufactured by GE), Ultranox 626 (Ultra) ox 626, manufactured by GE) and Sumilizer GP (Sumilizer GP, manufactured by Sumitomo Chemical Co., Ltd.) and the like.
Two or more phosphorus antioxidants may be used in combination as the phosphorus antioxidant.
リン系酸化防止剤の中では、トリス(2,4−ジ−t−ブチルフェニル)ホスファイト、テトラキス(2,4−ジ−t−ブチルフェニル)−4,4’−ビフェニレンジホスフォナイト、ジステアリルペンタエリスリトールジホスファイト、ビス(2,4−ジ−t−ブチルフェニル)ペンタエリスリトールジホスファイト、2−[{2,4,8,10−テトラ−t−ブチルジベンズ[d,f][1.3.2]−ジオキサホスフェピン−6−イル}オキシ]−N,N−ビス〔2−[{2,4,8,10−テトラ−t−ブチルジベンズ[d,f][1.3.2]−ジオキサホスフェピン−6−イル}オキシ]エチル〕エタンアミンや6−[3−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロポキシ]−2,4,8,10−テトラ−t−ブチルジベンズ[d,f][1.3.2]−ジオキサホスフェピンが好ましい。 Among phosphorus antioxidants, tris (2,4-di-t-butylphenyl) phosphite, tetrakis (2,4-di-t-butylphenyl) -4,4′-biphenylene diphosphonite, Distearyl pentaerythritol diphosphite, bis (2,4-di-t-butylphenyl) pentaerythritol diphosphite, 2-[{2,4,8,10-tetra-t-butyldibenz [d, f] [ 1.3.2] -Dioxaphosphin-6-yl} oxy] -N, N-bis [2-[{2,4,8,10-tetra-t-butyldibenz [d, f] [1 3.2] -Dioxaphosphin-6-yl} oxy] ethyl] ethanamine and 6- [3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propoxy] -2,4, 8,10-tetra- - butyldibenz [d, f] [1.3.2] - dioxaphosphepin are preferred.
本発明におけるイオウ系酸化防止剤としては、例えば、ジラウリルチオジプロピオネート、ジミリスチルチオジプロピオネートやジステアリルチオジプロピオネートなどのジアルキルチオジプロピオネート;ブチルチオプロピオン酸の多価アルコールエステル、オクチルチオプロピオン酸の多価アルコールエステル、ラウリルチオプロピオン酸の多価アルコールエステル、ステアリルチオプロピオン酸の多価アルコールエステル(上記の多価アルコールとしては、例えばグリセリン、トリメチロールエタン、トリメチロールプロパン、ペンタエリスリトールやトリスヒドロキシエチルイソシアヌレート等が挙げられる)や、ペンタエリスリルテトラキス−3−ラウリルチオプロピオネート等のアルキルチオプロピオン酸の多価アルコールエステルが挙げられる。 Examples of the sulfur-based antioxidant in the present invention include dialkylthiodipropionates such as dilauryl thiodipropionate, dimyristyl thiodipropionate and distearyl thiodipropionate; polyhydric alcohol ester of butylthiopropionic acid , Polyhydric alcohol ester of octylthiopropionic acid, polyhydric alcohol ester of lauryl thiopropionic acid, polyhydric alcohol ester of stearyl thiopropionic acid (for example, glycerin, trimethylolethane, trimethylolpropane, Such as pentaerythritol and trishydroxyethyl isocyanurate) and polyhydric alcohols of alkylthiopropionic acid such as pentaerythryltetrakis-3-laurylthiopropionate. Le, and the like.
上記のイオウ系酸化防止剤としては、例えば、ジラウリルチオジプロピオネート、ジミリスチルチオジプロピオネート、ジステアリルチオジプロピオネート、ラウリルステアリルチオジプロピオネート、ジステアリルチオジブチレートやペンタエリスリルテトラキス−3−ラウリルチオプロピオネート等が好ましい。
これらの中では、ペンタエリスリルテトラキス−3−ラウリルチオプロピオネートが特に好ましい。
Examples of the sulfur antioxidant include dilauryl thiodipropionate, dimyristyl thiodipropionate, distearyl thiodipropionate, lauryl stearyl thiodipropionate, distearyl thiodibutyrate and pentaerythryl tetrakis. -3-Laurylthiopropionate is preferred.
Of these, pentaerythryltetrakis-3-laurylthiopropionate is particularly preferred.
市販のイオウ系酸化防止剤としては、例えば、スミライザーTPS(Sumilizer TPS、住友化学製)、スミライザーTPL−R(Sumilizer TPL−R、住友化学製)、スミライザーTPM(Sumilizer TPM、住友化学製)やスミライザーTP−D(Sumilizer TP−D、住友化学製)等が挙げられる。
イオウ系酸化防止剤としては、2種類以上のイオウ系酸化防止剤を併用してもよい。
Examples of commercially available sulfur-based antioxidants include Sumitizer TPS (Sumilizer TPS, manufactured by Sumitomo Chemical), Sumitizer TPL-R (Sumizer TPL-R, manufactured by Sumitomo Chemical), Sumitizer TPM (Sumizer TPM, manufactured by Sumitomo Chemical) and Sumitizer. TP-D (Sumilizer TP-D, manufactured by Sumitomo Chemical Co., Ltd.) and the like can be mentioned.
As the sulfur-based antioxidant, two or more kinds of sulfur-based antioxidants may be used in combination.
本発明の硬化性樹脂組成物は、通常は有機溶媒に溶解されて使用される。本発明の硬化性樹脂組成物で使用される有機溶媒としては、前述した有機溶媒が挙げられる。有機溶媒は2種類以上の有機溶媒を混合して使用してもよい。
上記の有機溶媒の中でも、遊離カルボキシル基やアミノ基等のような環状エーテル基と反応し得る官能基を有しない溶媒が好ましい。
The curable resin composition of the present invention is usually used after being dissolved in an organic solvent. Examples of the organic solvent used in the curable resin composition of the present invention include the organic solvents described above. Two or more organic solvents may be mixed and used as the organic solvent.
Among the above organic solvents, a solvent having no functional group capable of reacting with a cyclic ether group such as a free carboxyl group or an amino group is preferable.
また、本発明の硬化性樹脂組成物には、シリコーン系界面活性剤、フッ素系界面活性剤及びフッ素原子を有するシリコーン系界面活性剤からなる群から選ばれる少なくとも1種の界面活性剤を含有させることが好ましい。
上記のシリコーン系界面活性剤としては、商品名トーレシリコーンDC3PA、同SH7PA、同DC11PA、同SH21PA、同SH28PA、同29SHPAや同SH30PA(トーレシリコーン(株)製);商品名ポリエーテル変性シリコンオイルSH8400(トーレシリコーン(株)製);商品名KP321、KP322、KP323、KP324、KP326、KP340やKP341(信越シリコーン(株)製);商品名TSF400、TSF401、TSF410、TSF4300、TSF4440、TSF4445、TSF−4446、TSF4452やTSF4460(ジーイー東芝シリコーン(株)製)等が挙げられる。
Moreover, the curable resin composition of the present invention contains at least one surfactant selected from the group consisting of silicone surfactants, fluorine surfactants, and silicone surfactants having fluorine atoms. It is preferable.
As the above-mentioned silicone surfactant, trade names: Tore Silicone DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, 29SHPA and SH30PA (manufactured by Torresilicone); trade name: polyether-modified silicone oil SH8400 (Made by Torre Silicone Co., Ltd.); trade names KP321, KP322, KP323, KP324, KP326, KP340 and KP341 (made by Shin-Etsu Silicone); trade names TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF-4446 , TSF4452 and TSF4460 (manufactured by GE Toshiba Silicone Co., Ltd.).
上記のフッ素系界面活性剤としては、フロリナート(登録商標)FC430や同FC431(住友スリーエム(株)製);メガファック(登録商標)F142D、同F171、同F172、同F173、同F177、同F183や同R30(大日本インキ化学工業(株)製);エフトップ(登録商標)EF301、同EF303、同EF351や同EF352(新秋田化成(株)製);サーフロン(登録商標)S381、同S382、同SC101や同SC105(旭硝子(株)製);商品名E5844((株)ダイキンファインケミカル研究所製);商品名BM−1000やBM−1100(BM Chemie社製)等が挙げられる。
フッ素原子を有するシリコーン系界面活性剤としては、メガファック(登録商標)R08、同BL20、同F475、同F477や同F443(大日本インキ化学工業(株)製)等が挙げられる。
これらの界面活性剤は、単独で、又は2種類以上を組合せて用いることができる。
Examples of the fluorosurfactant include Fluorinert (registered trademark) FC430 and FC431 (manufactured by Sumitomo 3M Limited); MegaFac (registered trademark) F142D, F171, F172, F173, F177, F183 R30 (Dainippon Ink Chemical Co., Ltd.); Ftop (registered trademark) EF301, EF303, EF351 and EF352 (manufactured by Shin-Akita Kasei); Surflon (registered trademark) S381, S382 SC101 and SC105 (manufactured by Asahi Glass Co., Ltd.); trade name E5844 (manufactured by Daikin Fine Chemical Laboratory); trade names BM-1000 and BM-1100 (manufactured by BM Chemie).
Examples of the silicone surfactant having a fluorine atom include Megafac (registered trademark) R08, BL20, F475, F477 and F443 (Dainippon Ink & Chemicals, Inc.).
These surfactants can be used alone or in combination of two or more.
さらに、本発明の硬化性樹脂組成物には、アクリル重合物系界面活性剤やビニル重合物系界面活性剤等の他の界面活性剤を併用してもよい。
アクリル重合物系界面活性剤としては、ディスパロン(登録商標)OX−880、同OX−881、同OX−883、同OX−70、同OX−77、同OX−77HF、同OX−60、同OX−710、同OX−720、同OX−740、同OX−750、同OX−8040、同1970、同230、同L−1980−50、同L−1982−50、同L−1983−50、同L−1984−50、同L−1985−50、同LAP−10、同LAP−20、同LAP−30や同LHP−95(楠本化成(株)製);商品名BYK−352、BYK−354、BYK−355、BYK−356、BYK−357、BYK−358、BYK−359、BYK−361やBYK−390(ビックケミー・ジャパン社製);エフカー(登録商標)LP3778(Efka Chemicals社製)等が挙げられる。
Furthermore, you may use together other surfactants, such as an acrylic polymer type surfactant and a vinyl polymer type surfactant, in the curable resin composition of this invention.
As the acrylic polymer surfactant, Disparon (registered trademark) OX-880, OX-881, OX-883, OX-70, OX-77, OX-77HF, OX-60, OX-710, OX-720, OX-740, OX-750, OX-8040, 1970, 230, L-1980-50, L-1982-50, L-1983-50 L-1984-50, L-1985-50, LAP-10, LAP-20, LAP-30 and LHP-95 (manufactured by Enomoto Kasei Co., Ltd.); trade names BYK-352, BYK -354, BYK-355, BYK-356, BYK-357, BYK-358, BYK-359, BYK-361 and BYK-390 (manufactured by BYK Chemie Japan); EFKER (registered trademark) L 3778 (Efka Chemicals Co., Ltd.), and the like.
ビニル重合物系界面活性剤としては、ディスパロン(登録商標)1922、同1927、同1950、同1951、同P−410、同P−410HF、同P−420、同P−425、同PD−7や同LHP−90(楠本化成(株)製)等が挙げられる。 Examples of the vinyl polymer surfactant include Disparon (registered trademark) 1922, 1927, 1950, 1951, P-410, P-410HF, P-420, P-425, and PD-7. And LHP-90 (manufactured by Enomoto Kasei Co., Ltd.).
さらに本発明の硬化性樹脂組成物の保存安定性や、該組成物を熱硬化して得られる保護膜の耐薬品性を損なわない限り、本発明の硬化性樹脂組成物に、他のカチオン硬化性化合物を混合してもよい。混合するカチオン硬化性化合物としては、例えば、芳香族エポキシ樹脂、水添型芳香族エポキシ樹脂、脂肪族エポキシ樹脂、カルボン酸のグリシジルエステル、スピロ環含有エポキシ樹脂又は脂環式エポキシ樹脂等のエポキシ樹脂類;環状ラクトン類、環状カーボナート類;スピロオルトエステル類;スピロオルトカーボナート類;ビニルエーテル類;ポリオール類等が挙げられる。 Furthermore, as long as the storage stability of the curable resin composition of the present invention and the chemical resistance of the protective film obtained by thermosetting the composition are not impaired, the curable resin composition of the present invention may have other cationic curing. Sexual compounds may be mixed. Examples of the cationic curable compound to be mixed include epoxy resins such as aromatic epoxy resins, hydrogenated aromatic epoxy resins, aliphatic epoxy resins, glycidyl esters of carboxylic acids, spiro ring-containing epoxy resins, and alicyclic epoxy resins. Cyclic lactones, cyclic carbonates; spiro orthoesters; spiro ortho carbonates; vinyl ethers; polyols and the like.
上記の芳香族エポキシ樹脂としては、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂またはビフェニル型エポキシ樹脂等が挙げられる。 Examples of the aromatic epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, and biphenyl type epoxy resin.
上記の水添型芳香族エポキシ樹脂としては、例えば、水添ビスフェノールA型エポキシ樹脂、水添ビスフェノールF型エポキシ樹脂、水添フェノールノボラック型エポキシ樹脂、水添クレゾールノボラック型エポキシ樹脂または水添ビフェニル型エポキシ樹脂等が挙げられる。 Examples of the hydrogenated aromatic epoxy resin include hydrogenated bisphenol A type epoxy resin, hydrogenated bisphenol F type epoxy resin, hydrogenated phenol novolac type epoxy resin, hydrogenated cresol novolak type epoxy resin, or hydrogenated biphenyl type. An epoxy resin etc. are mentioned.
上記の脂肪族エポキシ樹脂としては、例えば、ブチルグリシジルエーテル、1,6−ヘキサンジオールジグリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、シクロヘキサンジメタノールジグリシジルエーテル、ポリプロピレングリコールジグリシジルエーテルまたはトリメチロールプロパントリグリシジルエーテル等が挙げられる。
上記のカルボン酸のグリシジルエステルとしては、例えば、ネオデカン酸グリシジルエステルまたはヘキサヒドロフタル酸ジグリシジルエステルなどが挙げられる。
Examples of the aliphatic epoxy resin include butyl glycidyl ether, 1,6-hexanediol diglycidyl ether, neopentyl glycol diglycidyl ether, cyclohexane dimethanol diglycidyl ether, polypropylene glycol diglycidyl ether, or trimethylolpropane triglycidyl. Examples include ether.
Examples of the glycidyl ester of the carboxylic acid include neodecanoic acid glycidyl ester and hexahydrophthalic acid diglycidyl ester.
上記のスピロ環含有エポキシ樹脂又は脂環式エポキシ樹脂としては、例えば、3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート、ε−カプロラクトン変性3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキレート、ビス(3,4−エポキシシクロヘキシル)アジペートまたは1,2:8,9−ジエポキシリモネン等が挙げられる。 Examples of the spiro ring-containing epoxy resin or alicyclic epoxy resin include 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, ε-caprolactone-modified 3,4-epoxycyclohexylmethyl-3,4. -Epoxycyclohexanecarbochelate, bis (3,4-epoxycyclohexyl) adipate, 1,2: 8,9-diepoxy limonene and the like.
上記のポリオール類としては、例えば、ポリカプロラクトンジオール、ポリカプロラクトントリオール、ポリカプロラクトンポリオール、ポリエステルジオール、ポリエステルトリオール、ポリエステルポリオール、ポリカーボネートジオール、ポリカーボネートトリオール、ポリカーボネートポリオール等が挙げられる。 Examples of the polyols include polycaprolactone diol, polycaprolactone triol, polycaprolactone polyol, polyester diol, polyester triol, polyester polyol, polycarbonate diol, polycarbonate triol, and polycarbonate polyol.
本発明の硬化性樹脂組成物に混合し得るカチオン硬化触媒の比率としては、通常、分子量2000以上の重合体(A)と分子量2000未満のオキセタン化合物(B)の合計100重量部に対し、混合し得るカチオン硬化触媒が20重量部程度以下である。好ましくは、分子量2000以上の重合体(A)と分子量2000未満のオキセタン化合物(B)の合計100重量部に対し、混合し得るカチオン硬化触媒(C)が10重量部以下である。
本発明の硬化性樹脂組成物においては、2種類以上のカチオン硬化触媒を使用してもよい。
The ratio of the cationic curing catalyst that can be mixed with the curable resin composition of the present invention is usually mixed with respect to a total of 100 parts by weight of the polymer (A) having a molecular weight of 2000 or more and the oxetane compound (B) having a molecular weight of less than 2000. The possible cationic curing catalyst is about 20 parts by weight or less. Preferably, the cationic curing catalyst (C) that can be mixed is 10 parts by weight or less with respect to a total of 100 parts by weight of the polymer (A) having a molecular weight of 2000 or more and the oxetane compound (B) having a molecular weight of less than 2000.
In the curable resin composition of the present invention, two or more kinds of cationic curing catalysts may be used.
本発明の硬化性樹脂組成物には、該組成物の保存安定性や本発明の保護膜の耐薬品性等を損なわない範囲で、上記の有機溶媒や界面活性剤以外に、例えば、シランカップリング剤、消泡剤、チキソトロピー性付与剤、染料や紫外線吸収剤等の添加剤を含有せしめてもよい。 The curable resin composition of the present invention includes, for example, a silane cup, in addition to the organic solvent and the surfactant, as long as the storage stability of the composition and the chemical resistance of the protective film of the present invention are not impaired. You may contain additives, such as a ring agent, an antifoamer, a thixotropy imparting agent, a dye, and an ultraviolet absorber.
本発明の硬化性樹脂組成物は、例えば有機溶媒中で(A)成分を製造した後、分子量2000未満のオキセタン化合物(B)、カチオン硬化触媒(C)やその他の成分を適宜添加する方法;有機溶媒中で(A)成分を製造した後に一旦有機溶媒を除去し、次に分子量2000未満のオキセタン化合物(B)、カチオン硬化触媒(C)やその他の成分を有機溶媒に溶解して混合する方法等により、製造される。 In the curable resin composition of the present invention, for example, after the component (A) is produced in an organic solvent, an oxetane compound (B) having a molecular weight of less than 2000, a cationic curing catalyst (C) and other components are appropriately added; After producing the component (A) in the organic solvent, the organic solvent is once removed, and then the oxetane compound (B) having a molecular weight of less than 2000, the cationic curing catalyst (C) and other components are dissolved and mixed in the organic solvent. Manufactured by a method or the like.
かくして得られた硬化性樹脂組成物を、例えば、ガラス基板、カラーフィルター基板等の保護する必要のある基体に塗工し、続いて加熱することにより、本発明の保護膜を得ることができる。
ここで、塗工方法としては、例えば、スピンコーター、スリットコーター、バーコーター、スプレーコーター、ロールコーター、フレキソ印刷、オフセット印刷等を用いる方法や、スリット アンド スピンコーター、バー アンド スピンコーター等の二種類以上の塗工方法を組合せた方法等が挙げられる。
The protective film of the present invention can be obtained by applying the curable resin composition thus obtained to a substrate that needs to be protected, such as a glass substrate or a color filter substrate, followed by heating.
Here, as the coating method, for example, there are two types such as a method using a spin coater, a slit coater, a bar coater, a spray coater, a roll coater, a flexographic printing, an offset printing, a slit and spin coater, a bar and spin coater, etc. The method etc. which combined the above coating method are mentioned.
加熱方法としては、例えば、ホットプレート、クリーンオーブンや赤外線加熱装置等を用い、通常は150℃以上、好ましくは190〜260℃、さらに好ましくは220〜250℃で、10〜120分間加熱する方法等が挙げられる。
加熱温度が150℃以上であれば、耐熱性が向上する傾向にあり好ましい。
また、加熱温度が260℃以下であれば硬化物が着色しにくいので好ましい。
室温〜150℃、好ましくは50〜120℃程度の温度で、常圧又は減圧下に0.5〜5分程度加熱して溶媒を除去した後、上記のホットプレート、クリーンオーブン又は赤外線加熱装置等を用いて加熱する方法も好ましい。
また、得られる保護膜の厚みとしては、通常0.07〜20μm程度であり、この範囲であると、保護膜の物性、特に平坦化および表面強度が優れる傾向にある。
As a heating method, for example, a hot plate, a clean oven, an infrared heating device or the like is used, and a method of heating at 150 ° C. or higher, preferably 190 to 260 ° C., more preferably 220 to 250 ° C. for 10 to 120 minutes, etc. Is mentioned.
A heating temperature of 150 ° C. or higher is preferred because the heat resistance tends to be improved.
Moreover, since the hardened | cured material is hard to color if heating temperature is 260 degrees C or less, it is preferable.
After removing the solvent by heating at room temperature to 150 ° C., preferably about 50 to 120 ° C. under normal or reduced pressure for about 0.5 to 5 minutes, the above hot plate, clean oven, infrared heating device, etc. A method of heating using is also preferred.
Further, the thickness of the protective film to be obtained is usually about 0.07 to 20 μm, and when it is within this range, the physical properties of the protective film, in particular, flattening and surface strength tend to be excellent.
また、本発明の硬化性樹脂組成物を、例えば、4−メチル−1−ペンテン共重合体からなるフィルム等のポリオレフィン系フィルム、酢酸セルロースフィルム、硬化性樹脂組成物からなる層に接する面にシリコーン系離型剤又はフッ素系離型剤が塗布された離型紙、及び離型ポリエチレンテレフタレート(PET)フィルム等に塗工し、有機溶媒を除去して、接着性を有するフィルムを作製し、この接着性フィルムを保護する必要のある基体に貼り合せた後、熱硬化して、本発明の保護膜とすることもできる。
上記のフィルムや離型紙は、保護する必要のある基体に貼り合せ、熱硬化する前又は熱硬化した後に剥離してもよい。
また、熱硬化する前の保護膜に、さらに必要に応じて、他の樹脂や基体を積層してもよい。
In addition, the curable resin composition of the present invention is silicone-coated on the surface in contact with a layer made of, for example, a polyolefin film such as a film made of 4-methyl-1-pentene copolymer, a cellulose acetate film, or a curable resin composition. This is applied to release paper coated with release agent or fluorine release agent, release polyethylene terephthalate (PET) film, etc., and the organic solvent is removed to produce an adhesive film. The protective film may be bonded to a substrate that needs to be protected and then thermally cured to form the protective film of the present invention.
The above film or release paper may be bonded to a substrate that needs to be protected and peeled before thermosetting or after thermosetting.
Moreover, you may laminate | stack another resin and a base | substrate further as needed to the protective film before thermosetting.
基体の材料は、通常は本発明の保護膜と接着し得る材料である。
基体の材料として具体的には、金、銀、銅、鉄、錫、鉛、アルミニウムやシリコーン等の金属;ガラスやセラミックス等の無機材料;紙や布等のセルロース系高分子材料;メラミン系樹脂、アクリル・ウレタン系樹脂、ウレタン系樹脂、(メタ)アクリル系樹脂、スチレン・アクリロニトリル系共重合体、ポリカーボネート系樹脂、フェノール樹脂、アルキッド樹脂、エポキシ樹脂やシリコーン樹脂等の合成高分子材料等が挙げられる。
The material of the substrate is usually a material that can adhere to the protective film of the present invention.
Specific examples of the base material include gold, silver, copper, iron, tin, lead, metals such as aluminum and silicone; inorganic materials such as glass and ceramics; cellulosic polymer materials such as paper and cloth; melamine resins , Acrylic / urethane resins, urethane resins, (meth) acrylic resins, styrene / acrylonitrile copolymers, polycarbonate resins, phenol resins, alkyd resins, synthetic polymer materials such as epoxy resins and silicone resins It is done.
基体としては、異なる2種類以上の材料を混合又は複合してもよい。
基体には、必要に応じて、離型剤、メッキ等の被膜や本発明以外の樹脂組成物からなる塗料による塗膜処理を施してもよく、また、プラズマやレーザー等による表面改質、表面酸化、エッチング等の表面処理等を施してもよい。
基体としては、合成高分子材料及び金属の複合材料である集積回路、プリント配線板、液晶表示用素子、固体撮像素子、カラーフィルター等の電子・電気部品等が好ましく用いられる。
As the substrate, two or more different materials may be mixed or combined.
If necessary, the substrate may be subjected to a coating treatment such as a release agent, a coating such as plating, or a coating made of a resin composition other than the present invention. Surface treatment such as oxidation and etching may be performed.
As the substrate, an integrated circuit which is a composite material of a synthetic polymer material and a metal, a printed wiring board, a liquid crystal display element, a solid-state imaging element, a color filter, or other electronic / electrical parts are preferably used.
以下、実施例等により本発明をさらに詳細に説明するが、本発明はこれらによって限定されるものではない。例中、「部」は、特に断らないかぎり重量部を意味する。 EXAMPLES Hereinafter, although an Example etc. demonstrate this invention further in detail, this invention is not limited by these. In the examples, “parts” means parts by weight unless otherwise specified.
次の例では、環状エーテル基とオレフィン二重結合を有する単量体を付加重合して得られる分子量2000以上の重合体(A)として、日本油脂(株)製の登録商標ブレンマー CP−50S(グリシジルメタクリレート−スチレン共重合体;エポキシ当量は292、Mwは19000)を用いた。 In the following example, as a polymer (A) having a molecular weight of 2000 or more obtained by addition polymerization of a monomer having a cyclic ether group and an olefin double bond, a registered trademark Blemmer CP-50S (manufactured by NOF Corporation) Glycidyl methacrylate-styrene copolymer; epoxy equivalent was 292, Mw was 19000).
また、分子量2000未満のオキセタン化合物(B)としては、東亞合成(株)製のアロンオキセタン RSOX(1,3−ビス{(1−エチル−3−オキセタニル)メトキシ}ベンゼン)を用いた。 As the oxetane compound (B) having a molecular weight of less than 2000, Aron Oxetane RSOX (1,3-bis {(1-ethyl-3-oxetanyl) methoxy} benzene) manufactured by Toagosei Co., Ltd. was used.
さらに、(C1)成分の熱カチオン硬化触媒としては、三新化学(株)製のサンエイド SI−110L(芳香族スルホニウム PF6 −塩の49%γブチロラクトン溶液であり、反応開始温度は120℃)を用いた。 Further, (C1) as the thermal cationic curing catalyst component, Sanshin Chemical Co., Ltd. of San-Aid SI-110L (aromatic sulfonium PF 6 - was 49% gamma-butyrolactone solution of the salt, the reaction starting temperature is 120 ° C.) Was used.
さらに、(D)成分の酸化防止剤としては、チバ・スペシャルティー・ケミカルズ製のIrganox 1010(フェノール系酸化防止剤)を用いた。 Further, Irganox 1010 (phenolic antioxidant) manufactured by Ciba Specialty Chemicals was used as the antioxidant of component (D).
実施例1〜2
<硬化性樹脂組成物の製造例>
表2に記載の(A)成分80部と、(B)成分20部と、(C1)成分における溶媒を除く有効成分が3部になる量とを、プロピレングリコールモノメチルエーテルアセテート(以下、PGMEAという)480部に溶解した。さらに(D)成分の酸化防止剤を添加して硬化性樹脂組成物を得た。
Examples 1-2
<Example of production of curable resin composition>
The amount of 80 parts of the component (A), 20 parts of the component (B) and 3 parts of the active ingredient excluding the solvent in the component (C1) described in Table 2 is propylene glycol monomethyl ether acetate (hereinafter referred to as PGMEA). ) Dissolved in 480 parts. Furthermore, the antioxidant of (D) component was added and the curable resin composition was obtained.
比較例1
表2に記載の(A)成分100部と、(C1)成分の溶媒を除く有効成分が3部になる量とを、PGMEAの480部に溶解した。
硬化性樹脂組成物の一部は、以下の保存安定性試験に供した。
Comparative Example 1
100 parts of the component (A) shown in Table 2 and an amount of 3 parts of the active ingredient excluding the solvent of the component (C1) were dissolved in 480 parts of PGMEA.
A part of the curable resin composition was subjected to the following storage stability test.
比較例2
上記(A)の100部、(E)の無水トリメリット酸(硬化剤)33部、及び、(F)のキュアゾール1B2MZ(四国化成(株)製の硬化促進剤で、1−ベンジル−2−メチルイミダゾール)2部をPGMEAの450部に溶解して、硬化性樹脂組成物を得た。
この硬化性樹脂組成物を保存安定性試験に供したが、10日後にはゲル化していた。
Comparative Example 2
100 parts of the above (A), 33 parts of trimellitic anhydride (curing agent) of (E), and Curazole 1B2MZ (F) of Shikoku Kasei Co., Ltd. 2 parts of methylimidazole) was dissolved in 450 parts of PGMEA to obtain a curable resin composition.
This curable resin composition was subjected to a storage stability test, but gelled after 10 days.
<保存安定性試験>
前項の製造例で得た硬化性樹脂組成物を23℃のインキュベーターに10日間密閉保管後、粘度変化率(%)が、±10%未満の変化である組成物については○、±10〜20%の変化を示した組成物については△、±20%よりも大きい変化を示した組成物を×として評価した。
結果を表2にまとめた
<Storage stability test>
After the curable resin composition obtained in the production example of the preceding paragraph is hermetically stored in an incubator at 23 ° C. for 10 days, the composition whose viscosity change rate (%) is less than ± 10% is changed to ○, ± 10 to 20 For compositions showing% changes, compositions showing changes greater than Δ and ± 20% were evaluated as x.
The results are summarized in Table 2.
<保護膜の製造例>
保存安定性試験に供する前の硬化性樹脂組成物をスライドグラスにスピンコートし、85℃の加熱乾燥炉で2分間ベークして溶媒を除去後、230℃の加熱硬化炉で40分間加熱して保護膜を得た。この保護膜の膜厚を、接触式膜厚計を用いて測定したところ、1.5〜2.0μmであった。
<Example of production of protective film>
The curable resin composition before being subjected to the storage stability test was spin-coated on a slide glass, baked for 2 minutes in a heating and drying furnace at 85 ° C to remove the solvent, and then heated in a heating and curing furnace at 230 ° C for 40 minutes. A protective film was obtained. When the thickness of this protective film was measured using a contact-type film thickness meter, it was 1.5 to 2.0 μm.
<耐薬品性試験>
前項で得た保護膜の3つをそれぞれ、表1記載の浸漬液に表1に記載の時間浸漬した。次いで保護膜の膜厚を測定し、下記数式(2)により残膜率を求めて、耐酸性、耐アルカリ性及び耐NMP性(耐N−メチル−2−ピロリドン性)を評価した。
残膜率=[浸漬後の膜厚/浸漬前の膜厚]×100 (2)
判定は、耐薬性試験の残膜率が±5%以下の変化のものを○、±5%を超えて変化したものを×とした。
結果を表2にまとめた。
<Chemical resistance test>
Three of the protective films obtained in the previous section were immersed in the immersion liquid described in Table 1 for the time described in Table 1. Next, the thickness of the protective film was measured, and the remaining film ratio was determined by the following mathematical formula (2) to evaluate acid resistance, alkali resistance and NMP resistance (N-methyl-2-pyrrolidone resistance).
Residual film rate = [film thickness after immersion / film thickness before immersion] × 100 (2)
In the judgment, the change in the residual film rate in the chemical resistance test was ± 5% or less, and the change was more than ± 5%, and the change was ×.
The results are summarized in Table 2.
<耐熱性試験>
前項で得た保護膜を250℃で1時間加熱処理後、保護膜の膜厚を測定し、下記数式(3)で表される残膜率を求めて、耐熱性を評価した。
結果を表2にまとめた。
残膜率=[加熱後の膜厚/加熱前の膜厚]×100 (3)
なお、表2においては、上記耐熱性は「耐熱残膜率」と表記した。
<Heat resistance test>
After heat-treating the protective film obtained in the previous item at 250 ° C. for 1 hour, the film thickness of the protective film was measured, and the remaining film ratio represented by the following mathematical formula (3) was obtained to evaluate the heat resistance.
The results are summarized in Table 2.
Residual film ratio = [film thickness after heating / film thickness before heating] × 100 (3)
In Table 2, the heat resistance is expressed as “heat resistant residual film ratio”.
<耐熱透明性試験>
前項の耐熱性試験と同条件で加熱処理した保護膜を用いて、日本分光(株)製のV−560型分光光度計により400〜700nmにおける透過率の最低値を求めた。結果を表2にまとめた。
なお、表2においては、上記透過率は「耐熱透過率」と表記した。
<Heat resistance transparency test>
Using the protective film heat-treated under the same conditions as in the heat resistance test of the previous paragraph, a minimum value of transmittance at 400 to 700 nm was obtained with a V-560 spectrophotometer manufactured by JASCO Corporation. The results are summarized in Table 2.
In Table 2, the transmittance is expressed as “heat-resistant transmittance”.
本発明の保護膜は、その優れた特性から、例えば、液晶表示用素子、固体撮像素子及びカラーフィルターにおける平坦化膜、保護膜、反射防止膜;絶縁材、ソルダーレジスト等の電子部品;塗料;接着剤等に好適に用いられる。
The protective film of the present invention has, for example, a flattening film, a protective film, and an antireflection film in liquid crystal display elements, solid-state imaging elements and color filters; electronic parts such as insulating materials and solder resists; It is suitably used for adhesives and the like.
Claims (9)
(A):環状エーテル基及びオレフィン二重結合を有する単量体を付加重合して得られる分子量2000以上の重合体
(B):分子量2000未満のオキセタン化合物
(C):カチオン硬化触媒 A curable resin composition comprising the following components (A), (B), and (C):
(A): a polymer having a molecular weight of 2000 or more obtained by addition polymerization of a monomer having a cyclic ether group and an olefin double bond (B): an oxetane compound having a molecular weight of less than 2000 (C): a cationic curing catalyst
The protective film formed by applying the curable resin composition in any one of Claims 1-8 to a to-be-coated article, and thermosetting.
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JP2005307101A (en) * | 2004-04-26 | 2005-11-04 | Taiyo Ink Mfg Ltd | Thermosetting resin composition |
Citations (5)
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JPH10212343A (en) * | 1997-01-30 | 1998-08-11 | Kansai Paint Co Ltd | Ultraviolet-curable can coating composition |
JPH115816A (en) * | 1997-06-19 | 1999-01-12 | Takeda Chem Ind Ltd | Composition for color filter surface-protecting material |
JPH1161034A (en) * | 1997-08-15 | 1999-03-05 | Kansai Paint Co Ltd | Coating composition and application method thereof |
JP2001115006A (en) * | 1999-10-22 | 2001-04-24 | Ube Ind Ltd | Thermosetting composition |
JP2002092957A (en) * | 2000-09-19 | 2002-03-29 | Mitsui Chemicals Inc | Material of surface protecting layer for optical recording medium |
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2003
- 2003-09-12 JP JP2003321011A patent/JP4492070B2/en not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH10212343A (en) * | 1997-01-30 | 1998-08-11 | Kansai Paint Co Ltd | Ultraviolet-curable can coating composition |
JPH115816A (en) * | 1997-06-19 | 1999-01-12 | Takeda Chem Ind Ltd | Composition for color filter surface-protecting material |
JPH1161034A (en) * | 1997-08-15 | 1999-03-05 | Kansai Paint Co Ltd | Coating composition and application method thereof |
JP2001115006A (en) * | 1999-10-22 | 2001-04-24 | Ube Ind Ltd | Thermosetting composition |
JP2002092957A (en) * | 2000-09-19 | 2002-03-29 | Mitsui Chemicals Inc | Material of surface protecting layer for optical recording medium |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2005307101A (en) * | 2004-04-26 | 2005-11-04 | Taiyo Ink Mfg Ltd | Thermosetting resin composition |
JP4620967B2 (en) * | 2004-04-26 | 2011-01-26 | 太陽ホールディングス株式会社 | Thermosetting resin composition for permanent hole filling |
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