JP2005067118A - Antistatic and low reflective film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an antistatic film which prevents reflection of light from outside and shows excellent dustproofness. <P>SOLUTION: The antistatic and low reflective film is obtained by sequentially laminating a transparent conductive layer, a hard coat layer and a low refractive layer having lower reflection than the hard coat layer on a transparent base material. The hard coat layer is composed of a conductive and light-diffusing transparent resin layer in which zirconium oxide fine particles and silica fine particles are dispersed in the transparent resin. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a film excellent in dust resistance, scratch resistance, antireflection, and transparency. More specifically, the present invention relates to various displays such as word processors, computers, and televisions, in particular, dirt prevention and scratch resistance on the surface of a liquid crystal television. The present invention relates to an antistatic low-reflection film that has excellent properties and prevents reflection of the surface by external light and transparency.

  Transparent substrates such as glass and plastic are used in displays for electronic devices such as word processors, computers, televisions, and other various commercial displays. Plastic substrates are lighter and harder to break than glass substrates, but they are less resistant to scratches due to static dust and low hardness, and transparency due to scratches and scratches is impaired. There is a problem, and as a problem common to transparent base materials, when observing visual information such as objects, letters, figures, etc. through the transparent substrate, the surface of the transparent substrate is reflected by external light, and it is difficult to see the internal visual information There was a problem.

  As a method for preventing the deterioration of transparency due to dust adhesion or scratches on the plastic substrate, which is one of the above problems, there is a technique of applying an antistatic paint or a hard coat layer to the surface of the plastic substrate. It was. However, a hard coat layer in which a conductive material such as an antistatic agent is dispersed to the extent that foreign matter adhesion is prevented is not only transparent, but also the hardness of the hard coat layer is hindered and has sufficient hardness to satisfy scratch resistance. It was something that could not be obtained. In addition, although a conductive thin film having high transparency can be formed on a plastic substrate by vapor deposition of metal oxide or the like, the vapor deposition process has a problem that productivity is inferior and cost is high, and scratch resistance is not sufficient. It was. Another method of preventing reflection of the transparent substrate surface, which is one of the above problems, is to provide a low refractive index layer on the hard coat layer, which is effective for preventing reflection of the surface, but is antistatic. The effect was not expected.

Therefore, the applicant first laminated a transparent conductive layer, a hard coat layer, and a low refractive index layer in this order on the transparent substrate film, and changed the refractive index of the low refractive index layer to the refractive index of the hard coat layer. A low-reflection antistatic hard coat film constituted lower than the above has been proposed (see Patent Document 1). The low reflection antistatic hard coat film of the invention described in Patent Document 1 is excellent in preventing dirt due to dust and scratch resistance, preventing reflection by external light, and does not hinder the recognition of images seen through this film. Although it was possible to have a degree of transparency, there was still room for improvement for liquid crystal televisions, particularly in the prevention of reflection by external light.
JP-A-11-326602

  Accordingly, the present invention is to provide an antistatic low-reflection film that is prevented from being reflected by external light and that is excellent in dust resistance.

  The present inventor has found that the above-mentioned problems can be achieved by using an antistatic low-reflection film having the structure described below, and has completed the present invention.

  That is, the antistatic low-reflection film of the present invention according to claim 1 is a low refractive index having a lower refractive index than the transparent conductive layer, the hard coat layer, and the hard coat layer on the transparent base film. The hard coat layer is a transparent resin layer having conductivity and light diffusibility in which zirconium oxide fine particles and silica fine particles are dispersed in a translucent resin. It is.

  The present invention according to claim 2 is the antistatic low-reflection film according to claim 1, wherein the hard coat layer contains 50 to 250 parts by mass of zirconium oxide fine particles with respect to 100 parts by mass of the translucent resin. It is a layer in which silica fine particles are dispersed at a ratio of 7 to 30 parts by mass.

  The present invention according to claim 3 is the antistatic low-reflection film according to any one of claims 1 and 2, wherein the silica fine particles are fine particles having an average particle diameter of 1.0 μm and fine particles having a size of 1.5 μm. It is the mixture characterized by the above-mentioned.

Further, the present invention described in claim 4 is characterized in that in the antistatic low-reflection film according to claim 1, it has a surface resistivity not exceeding 1 × 10 ¹² Ω / □.

  Further, the present invention according to claim 5 is the antistatic low reflection film according to any one of claims 1 to 4, wherein the specular reflectance by 5 ° regular reflection is less than 1.3%, and the total light reflection The rate is 2.0 to 2.8%.

  By using the structure according to any one of claims 1 to 5, reflection by external light is prevented, and an antistatic low-reflection film having excellent transparency, scratch resistance, and dust resistance can be obtained. it can.

The antistatic low-reflection film of the present invention prevents reflection by external light and can clearly see visual information, and exhibits a surface resistivity not exceeding 1 × 10 ¹² Ω / □, thus being dustproof. This also has an excellent effect.

The present invention will be described in detail below with reference to the drawings.
FIG. 1 is a schematic view showing a layer structure of an embodiment of the antistatic low-reflection film according to the present invention. The antistatic low-reflection film 1 shown in FIG. In this example, a conductive layer 3, a hard coat layer 4, and a low refractive index layer 5 having a lower refractive index than the hard coat layer 4 are sequentially laminated. The hard coat layer 4 has fine particles dispersed in the hard coat layer 4 in order to provide light diffusibility, conductivity and the like, and the low refractive index layer 5 of the hard coat layer 4 is formed by the fine particles. The surface that comes into contact with each other has six fine irregularities. Further, since the low refractive index layer 5 formed on the hard coat layer 4 is extremely thin compared to the hard coat layer 4, the low refractive index layer 5 is formed almost exactly along the fine irregularities 6 of the hard coat layer 4. Yes.

  In the present invention, the transparent base film 2 is not particularly limited as long as it is a plastic film having transparency. For example, cellulose di or triacetate, cellulose acetate butyrate, polyamide, polyimide, polyethersulfone, polysulfone Is a film of thermoplastic resin such as polypropylene, polymethylpentene, polyvinyl chloride, polyvinyl acetal, polyether ketone, polymethyl methacrylate, polyurethane, cyclic polyolefin, or polyester such as polyethylene terephthalate, polycarbonate, etc., unstretched, Alternatively, any film uniaxially or biaxially stretched can be used, and among these, a polyester film or ring stretched uniaxially or biaxially. Polyolefin film excellent in transparency and heat resistance, cellulose triacetate film can be suitably used in terms no transparency and optically anisotropic. The thickness of the transparent base film 2 is suitably about 8 to 1000 μm.

  Next, the transparent conductive layer 3 includes a method of forming a conductive thin film by vapor deposition or sputtering of a metal or metal oxide that forms a transparent film, or a conductive fine particle and a reactive curable resin. It can form by well-known methods, such as the method of apply | coating a conductive coating liquid and forming a conductive coating film. When the transparent conductive layer 3 is formed of a deposited film, examples of the metal or metal oxide constituting the transparent conductive layer 3 include gold, nickel, and antimony-doped indium / tin oxide (hereinafter referred to as ATO). Indium / tin oxide (hereinafter referred to as ITO), zinc oxide / aluminum oxide, etc., and the thickness of the deposited film is preferably about 40 to 100 nm.

  Moreover, when forming the said transparent conductive layer 3 with a coating film, as conductive fine particles used for formation of the said transparent conductive layer 3, ATO, ITO, etc. can be mentioned, for example. The reactive curable resin that disperses the conductive fine particles is a translucent resin, has good adhesion to the transparent base film 2, and has light resistance and moisture resistance. Further, there is no particular limitation as long as the adhesiveness with the hard coat layer 4 formed on the transparent conductive layer 3 is good, but the crosslinking polymerization reaction is caused by irradiation with ultraviolet rays or electron beams. Resin that changes to a high-dimensional polymer structure, that is, an ionization mixture of a reactive prepolymer, oligomer, and / or monomer having a polymerizable unsaturated bond or epoxy group in the molecule as appropriate. Radiation curable resins or thermoplastic resins such as urethane, polyester, acrylic, butyral, vinyl, etc., may be mixed with the ionizing radiation curable resin as required in consideration of coating suitability. Mention may be made of those was. As a method for forming the transparent conductive layer 3, a roll coating method, a bar coating method, a gravure coating method, or the like using a liquid composition of the resin in which conductive fine particles are dispersed to form a liquid is used. It can be formed by coating, drying and curing by the coating method. In addition, as an ultraviolet ray source used for hardening, the light source of an ultra high pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc lamp, a black light fluorescent lamp, and a metal halide lamp lamp can be used. As a wavelength of ultraviolet rays, a wavelength range of 190 to 380 nm can be used, and as an electron beam source, a cockcroft-wald type, a bandegraft type, a resonant transformer type, an insulated core transformer type, or a straight line Various electron beam accelerators such as a type, a dynamitron type and a high frequency type can be used. In addition, the surface which forms the said transparent conductive layer 3 of the said transparent base film 2 may give an appropriate | suitable easy adhesion process, such as a corona discharge process and a primer process, as needed.

  As the ionizing radiation curable resin, specifically, those having an acrylate-based functional group are suitable, and a structure having a high cross-linking density in consideration of the hardness, heat resistance, solvent resistance, and scratch resistance of the coating film. Preferably, it is a bifunctional or higher acrylate monomer such as ethylene glycol di (meth) acrylate, 1,6-hexanediol diacrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, di Examples thereof include pentaerythritol penta (meth) (meth) acrylate and dipentaerythritol hexa (meth) acrylate. In the above, acrylate and / or methacrylate are described as (meth) acrylate.

  The ionizing radiation curable resin is sufficiently cured when irradiated with an electron beam. However, when it is cured by irradiating with ultraviolet rays, as a photopolymerization initiator, acetophenones, benzophenones, thioxanthones, benzoin, benzoin methyl Ether, Michler benzoyl benzoate, Michler ketone, diphenyl sulfide, dibenzyl disulfide, diethyl oxide, triphenylbiimidazole, isopropyl-N, N-dimethylaminobenzoate, and the like, n-butylamine, triethylamine, Poly-n-butylphosphine and the like can be used alone or as a mixture. The addition amount of the photopolymerization initiator and the photosensitizer is generally about 0.1 to 10 parts by weight with respect to 100 parts by weight of the ionizing radiation curable resin.

In addition, as the film thickness when the transparent conductive layer 3 is formed as a coating film, the surface resistivity of the transparent conductive layer 3 is preferably 1 × 10 ¹² Ω / □ or less. The thickness of the transparent conductive layer 3 is usually 0.3 to 3.5 μm, preferably 0.7 to 2.8 μm. If the thickness is less than 0.3 μm, it is difficult to reduce the surface resistivity of the transparent conductive layer 3 to 1 × 10 ¹² Ω / □ or less, and if it exceeds 3.5 μm, the transparent conductive layer 3 is transparent. There is a risk of loss of sex.

  Moreover, as a formation method of the said transparent conductive layer 3, you may form using conductive polymers, such as a polypyrrole and a polyaniline other than the above-mentioned conductive thin film and a conductive coating film, for example.

Next, the hard coat layer 4 will be described. The hard coat layer 4 is a layer having hardness, conductivity and light diffusibility having scratch resistance, and is formed by the same resin and the same coating method as the ionizing radiation curable resin described in the transparent conductive layer 3. can do. The hard coat layer 4 can further prevent reflection by external light by setting its refractive index higher than that of the low refractive index layer 5 described later. By forming a layer in which fine particles having a specific refractive index and particle size are dispersed in a specific ratio in an ionizing radiation curable resin, the refractive index is higher than that of the low refractive index layer 5 described later, and transparency or light The layer is excellent in diffusibility and has conductivity. Generally, the refractive index of a hard coat layer made of an ionizing radiation curable resin is 1.48 to 1.52, which is the same as that of glass (refractive index: 1.50). The preferred refractive index of the coat layer is 1.60 to 1.70. In order to achieve this refractive index, the hard coat layer 4 is made to be a layer having excellent transparency and light diffusibility and also having conductivity. As fine particles dispersed in the mixture, zirconium oxide [ZrO ₂ (refractive index: 2.05)] having an average particle diameter of 1 to 50 nm and a mixture of silica having an average particle diameter of 1.0 μm and 1.5 μm (mass ratio is 1) : 1). The mixing ratio is 50 to 250 parts by mass of zirconium oxide and 7 to 30 parts by mass of a mixture of silica with respect to 100 parts by mass of the ionizing radiation curable resin. If the mixing ratio of zirconium oxide is less than 50 parts by mass, it is difficult to develop low reflection performance because the refractive index of the hard coat layer is low, and if it exceeds 250 parts by mass, the strength of the cured film of the hard coat layer is weak. Further, even when the zirconium oxide content is increased, the refractive index of the hard coat layer does not increase, and a whitening phenomenon is observed in the cured film itself due to the aggregate of zirconium oxide. Further, when the silica mixture is less than 7 parts by mass, the antiglare property is insufficient and the function as an antiglare film is not achieved. When the silica mixture exceeds 30 parts by mass, the surface is markedly whitened. Do not do.

  The reason why silica having an average particle size of 1.0 μm and 1.5 μm is used is that, in the case of silica having an average particle size of less than 1.0 μm, the antiglare property cannot be expressed, and the average particle size of more than 1.5 μm. In the case of silica having a diameter, the unevenness becomes large, the visibility of the display body as a low reflection film is greatly impaired, and the glare feeling becomes remarkable, which is not practical. In addition, when only one of the particles having an average particle diameter of 1.0 μm or 1.5 μm is used, the above problem is improved, but the reflection characteristics when viewed from an oblique direction are deteriorated. By mixing silica with an average particle size of 1.0 μm and 1.5 μm, random fine irregularities can be formed in the uniform irregularities, so the reflection characteristics when viewed obliquely are good. By adjusting the blending ratio of silica with an average particle diameter of 1.0 μm and 1.5 μm, various resolutions can be achieved. Thus, it is possible to provide an antistatic low-reflection film that can satisfy both the antiglare property and the visibility of the liquid crystal display. Moreover, as thickness of the said hard-coat layer 4, 1-10 micrometers is suitable, Preferably, it is 3-7 micrometers.

Next, the low refractive index layer 5 will be described. As the low refractive index layer 5, SiO _x such as MgF ₂ or SiO ₂ having a film thickness of about 0.08 to 0.2 μm is formed on the hard coat layer 4. A well-known method of forming a thin film such as (1 ≦ X ≦ 2) by a vapor deposition method such as vacuum deposition, sputtering, or plasma CVD, or a method of forming a SiO ₂ gel film from a sol solution containing SiO ₂ sol Etc. can be formed. Further, a film of a low refractive index resin such as a fluorine-based resin such as a copolymer of vinylidene fluoride and hexafluoropropylene or a silicon-containing vinylidene fluoride copolymer may be formed. The refractive index of the low refractive index layer 5 must be smaller than the refractive index of the hard coat layer 4 in order to prevent reflection by external light, and is suitably 1.47 or less, preferably Is 1.40 to 1.45.

Next, the present invention will be described in more detail with reference to the following examples.
First, a transparent conductive layer forming composition having the composition shown in Table 1 is applied to one side of an 80 μm-thick cellulose triacetate film and dried with a Miya bar so that the film thickness after drying is 1.0 μm. Later, ionizing radiation was applied (integrated light amount: 100 mj) to produce an intermediate film on which a transparent conductive layer was formed.

  Next, on the transparent conductive layer of the intermediate film, a hard coat layer forming composition having the composition shown in A to H of Table 2 was applied with a Miya bar so that the film thickness after drying was 3.0 μm. After drying, irradiation with ionizing radiation (integrated light quantity: 100 mj) is performed to form hard coat layers A to H, and further, a composition for forming a low refractive index layer having the composition shown in Table 3 is formed on the hard coat layers A to H. Are coated and dried so that the film thickness after drying is 98 nm (nanometer) and then irradiated with ionizing radiation (integrated light amount: 200 mj) to form a low refractive index layer A to hard coat layer forming composition A to Antistatic low-reflection films of Examples 1 to 8 corresponding to H were prepared.

  On the other hand, a hard coat layer forming composition having the composition shown in I in Table 2 was applied to one side of an 80 μm-thick cellulose triacetate film with a Miya bar so that the film thickness after drying was 3.0 μm. After drying and irradiating with ionizing radiation (integrated light quantity: 100 mj) to form the hard coat layer I, and further drying the low refractive index layer forming composition having the composition shown in Table 3 on the hard coat layer I The antistatic low-reflection film of Example 9 in which a low refractive index layer was formed by coating and drying each so that the film thickness was 98 nm (nanometer) and then irradiating with ionizing radiation (integrated light amount: 200 mj). Produced.

Table 2

  The antistatic low-reflection films of Examples 1 to 9 prepared above were evaluated for antiglare properties, antireflection properties, antistatic properties, and antiglare properties, and the results are summarized in Table 4.

  As is apparent from Table 4, Examples 4 to 6 are particularly inferior in antiglare properties from a direction deviated by 60 degrees, Example 7 is inferior in glare prevention, and Example 8 is in antireflection (reflected light). Inferior to black), Example 9 resulted in inferior antistatic properties, but Examples 1 to 3 were in antiglare properties, antireflection properties, antistatic properties, and antiglare properties. It was able to be excellent.

It is a layer block diagram which shows one Example of the antistatic low-reflection film concerning this invention schematically.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Antistatic low reflection film 2 Transparent base film 3 Transparent electroconductive layer 4 Hard-coat layer 5 Low refractive index layer 6 Fine unevenness

Claims (5)

A transparent conductive film, a hard coat layer, and a low refractive index layer having a lower refractive index than the hard coat layer are sequentially laminated on the transparent base film, and the hard coat layer is in a translucent resin. An antistatic low-reflection film, which is a transparent resin layer having conductivity and light diffusibility in which zirconium oxide fine particles and silica fine particles are dispersed. The hard coat layer is a layer in which 50 to 250 parts by mass of zirconium oxide fine particles and 7 to 30 parts by mass of silica fine particles are dispersed with respect to 100 parts by mass of a translucent resin. 1. An antistatic low-reflection film according to 1. The antistatic low-reflection film according to claim 1, wherein the silica fine particles are a mixture of fine particles having an average particle diameter of 1.0 μm and fine particles having a diameter of 1.5 μm. The antistatic low-reflection film according to claim 1, which has a surface resistivity not exceeding 1 × 10 ¹² Ω / □. The antistatic according to any one of claims 1 to 4, wherein a specular reflectance by 5 ° regular reflection is less than 1.3% and a total light reflectance is 2.0 to 2.8%. Low reflection film.