JP2005042184A5 - - Google Patents

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JP2005042184A5
JP2005042184A5 JP2003279931A JP2003279931A JP2005042184A5 JP 2005042184 A5 JP2005042184 A5 JP 2005042184A5 JP 2003279931 A JP2003279931 A JP 2003279931A JP 2003279931 A JP2003279931 A JP 2003279931A JP 2005042184 A5 JP2005042184 A5 JP 2005042184A5
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本発明によれば、ターゲット上に複数のピークが現出しかつ内周側のピーク値が外周側のピーク値よりも大であるような磁界分布(半径方向の漏洩磁場の水平成分)が得られるので、ターゲットのエロージョン領域が拡大されるマグネトロンスパッタリング装置を実現することができる。特に本発明によれば、小口径(直径が200mm以下)の磁性ターゲットに適用した場合にも、より内周側にターゲットを飽和させ得るだけのピーク値をもった漏洩磁場を容易に発生できるので、ターゲットのエロージョン領域が拡大されることにより、基板上に均一な膜厚分布を有する薄膜を形成することができる。 According to the present invention, a magnetic field distribution (a horizontal component of a leakage magnetic field in the radial direction) in which a plurality of peaks appear on the target and the inner peripheral peak value is larger than the outer peripheral peak value is obtained. Therefore, it is possible to realize a magnetron sputtering apparatus in which the erosion region of the target is enlarged. In particular, according to the present invention, even when applied to a magnetic target having a small diameter (diameter of 200 mm or less), it is possible to easily generate a leakage magnetic field having a peak value that can saturate the target on the inner peripheral side. By expanding the erosion region of the target, a thin film having a uniform film thickness distribution can be formed on the substrate.

以下本発明の詳細を添付図面により説明する。図1は本発明の実施の形態に係わる磁石ユニットの平面図、図2は図1のA−A線断面図、図3は図2をB方向からみた矢視図、図4は図1の磁石ユニットの漏洩磁場分布を示す図、図5はターゲット表面Y軸上での漏洩磁場水平成分の分布を示す図、図6は従来の磁石ユニットの漏洩磁場分布を示す図である。 Details of the present invention will be described below with reference to the accompanying drawings. Figure 1 is a plan view of a magnet unit according to an embodiment of the present invention, FIG. 2 is a sectional view along line A-A of FIG. 1, FIG. 3 arrow view of the FIG. 2 from direction B, Fig. 4 in FIG. 1 FIG. 5 is a diagram showing a leakage magnetic field distribution of a magnet unit, FIG. 5 is a diagram showing a distribution of a leakage magnetic field horizontal component on the target surface Y axis, and FIG. 6 is a diagram showing a leakage magnetic field distribution of a conventional magnet unit.

図1〜3において、1はマグネトロンスパッタリング用磁石ユニットであり、3/4円周(円弧角270°)を占める円弧状の主磁石部材2と、1/4円周(円弧角90°)を占める円弧状の副磁石部材3と、これらの表面に保持された強磁性体からなる円板状のヨーク4と、これらの外周を取り囲む非磁性体からなる円筒状のベース5と、副磁石部材の外周に装着された非磁性体からなる円弧状のバランスウエイト6と、ヨーク4の表面に締結部材(例えばボルト)8で固定されたスペーサ7とを有する。主磁石部材2は、軸方向に磁化した複数の台形状の第1永久磁石片21aを円弧状に配置した第1磁石体21と、半径方向に磁化した複数の台形状の第2永久磁石片22aを円弧状に配置して形成した第2磁石体22と、軸方向に磁化した複数の台形状の第3永久磁石片23aを円弧状に配置して形成した第3磁石体23と、半径方向に磁化した複数の台形状の第4永久磁石片24aを円弧状に配置して形成した第4磁石体24と、軸方向に磁化した複数の台形状の第5永久磁石片25aを円弧状に配置した第5磁石体25を内周から外周に向って配置した磁石組立体である。この主磁石部材2では、各永久磁石片はその円弧角は30°に形成され、円周方向に9個接続することにより、円弧角(θ)が270°に形成された第1〜第5磁石体21〜25が形成され、各磁石体は同心円状に配置されている。 1 to 3, reference numeral 1 denotes a magnetron sputtering magnet unit having an arc-shaped main magnet member 2 occupying a 3/4 circumference (arc angle 270 °) and a 1/4 circumference (arc angle 90 °). Occupied arcuate submagnet member 3, disk-shaped yoke 4 made of a ferromagnetic material held on the surfaces thereof, cylindrical base 5 made of a nonmagnetic material surrounding the outer periphery thereof, and submagnet member 3 has an arc-shaped balance weight 6 made of a non-magnetic material mounted on the outer periphery of 3 , and a spacer 7 fixed to the surface of the yoke 4 with a fastening member (for example, a bolt) 8. The main magnet member 2 includes a first magnet body 21 in which a plurality of trapezoidal first permanent magnet pieces 21a magnetized in the axial direction are arranged in an arc shape, and a plurality of trapezoidal second permanent magnet pieces magnetized in the radial direction. A second magnet body 22 formed by arranging 22a in an arc, a third magnet body 23 formed by arranging a plurality of trapezoidal third permanent magnet pieces 23a magnetized in the axial direction, and a radius A fourth magnet body 24 formed by arranging a plurality of trapezoidal fourth permanent magnet pieces 24a magnetized in the direction in an arc shape, and a plurality of trapezoidal fifth permanent magnet pieces 25a magnetized in the axial direction in an arc shape This is a magnet assembly in which the fifth magnet body 25 arranged in the above is arranged from the inner periphery toward the outer periphery. In the main magnet member 2, each permanent magnet piece has an arc angle of 30 °, and by connecting nine pieces in the circumferential direction, the arc angle (θ 1 ) is formed to be 270 °. Five magnet bodies 21 to 25 are formed, and each magnet body is arranged concentrically.

副磁石部材3は、軸方向に磁化した複数の台形状の第6永久磁石片31aを円弧状に配置した第6磁石体31と、半径方向に磁化した複数の台形状の第7永久磁石片32aを円弧状に配置して形成した第7磁石体32と、軸方向に磁化した複数の台形状の第8永久磁石片33aを円弧状に配置して形成した第8磁石体33と、半径方向に磁化した複数の台形状の第9永久磁石片34aを円弧状に配置して形成した第9磁石体34と、軸方向に磁化した複数の台形状の第10永久磁石片35aを円弧状に配置した第10磁石体35を内周から外周に向って同心円上に配置した磁石組立体である。この副磁石部材3では、各永久磁石片はその円弧角度は30°に形成され、円周方向に3個接続することにより、円弧角度(θ)が90°に形成された第6〜第10磁石体31〜35が形成されている。このように主磁石部材2及び副磁石部材3は、いずれも軸方向に磁化した3重の円弧状の磁石体と各磁石体の間に各々配置された半径方向に磁化された円弧状磁石体とを組合せることにより形成されている。但し、副磁石部材3は、全体として主磁石部材2よりも中心軸Cに近づいて配置され、これにより、第6磁石体31の両側面は第1磁石体21の一部と接し、第7磁石体32の両側面は第1磁石体21と第2磁石体22に接し、第8磁石体33の両側面は第2磁石体22と接し、第9磁石体34の両側面は第3、4磁石体23、24と接し、第10磁石体35の両側面は第4磁石体24の両側面と接するように構成されている。 The sub magnet member 3 includes a sixth magnet body 31 in which a plurality of trapezoidal sixth permanent magnet pieces 31a magnetized in the axial direction are arranged in an arc shape, and a plurality of trapezoidal seventh permanent magnet pieces magnetized in the radial direction. A seventh magnet body 32 formed by arranging 32a in an arc shape, an eighth magnet body 33 formed by arranging a plurality of trapezoidal eighth permanent magnet pieces 33a magnetized in the axial direction, and a radius; A plurality of trapezoidal ninth permanent magnet pieces 34a magnetized in the direction are arranged in an arc shape, and a plurality of trapezoidal tenth permanent magnet pieces 35a magnetized in the axial direction are arcuately formed. 10 is a magnet assembly in which the tenth magnet body 35 arranged concentrically is arranged concentrically from the inner periphery toward the outer periphery. In this secondary magnet member 3, each permanent magnet piece has an arc angle of 30 °, and by connecting three pieces in the circumferential direction, the arc angle (θ 2 ) is formed at 90 °. Ten magnet bodies 31 to 35 are formed. As described above, the main magnet member 2 and the sub magnet member 3 are each a triple arc-shaped magnet body magnetized in the axial direction and a radially magnetized arc-shaped magnet body arranged between the magnet bodies. Are combined. However, the sub-magnet member 3 is disposed closer to the central axis C than the main magnet member 2 as a whole, whereby both side surfaces of the sixth magnet body 31 are in contact with part of the first magnet body 21 , Both side surfaces of the magnet body 32 are in contact with the first magnet body 21 and the second magnet body 22, both side surfaces of the eighth magnet body 33 are in contact with the second magnet body 22, and both side surfaces of the ninth magnet body 34 are third, The four magnet bodies 23 and 24 are in contact with each other, and both side surfaces of the tenth magnet body 35 are in contact with both side surfaces of the fourth magnet body 24 .

上記の磁石ユニット1において、磁性ターゲット表面(Y軸上)に発生する半径方向の漏洩磁場の水平成分をシミュレーションで算出した結果を図5に示す。図5に示す磁束密度分布は、各永久磁石片として18mmの厚さを有するNd−Fe−B系焼結磁石(日立金属社製HS50AH)を使用し、外径が138mmの磁石ユニットを組立て、磁石表面から軸方向に所定距離L(=15mm)(図2参照)だけ離間した位置における漏洩磁束密度の水平成分の測定値である。図5から、主磁石部材2では、図中実線で示すように外周側に第1のピーク値が現出し、内周側に第1のピーク値よりも大なる第2のピーク値が現出するような磁束密度分布が得られ、また副磁石部材3でも、図中破線で示すように外周側に第1のピーク値が現出し、内周側に第1のピーク値よりも大なる第2のピーク値が現出するような磁束密度分布が得られることがわかる。両ピーク値は、ターゲット材の材質やその飽和磁化の値に応じて最適な数値が定まるが、一般に、第2のピーク値は第1のピーク値よりも5%以上高いことが好ましい。但し本発明は、磁性ターゲットが極めて小さい(例えば外径150mm未満である)場合は、内周側にターゲットを飽和させ得るピーク磁場を発生することが困難なので、特に外径が150mm以上、200mm以下の磁性ターゲットを使用したマグネトロンスパッタリング装置に組み込むことが望ましい。 FIG. 5 shows the result of calculating the horizontal component of the radial leakage magnetic field generated on the magnetic target surface (on the Y axis) by simulation in the magnet unit 1. The magnetic flux density distribution shown in FIG. 5 uses an Nd—Fe—B based sintered magnet (HS50AH manufactured by Hitachi Metals) having a thickness of 18 mm as each permanent magnet piece, and assembles a magnet unit having an outer diameter of 138 mm. This is a measured value of the horizontal component of the leakage magnetic flux density at a position separated from the magnet surface by a predetermined distance L (= 15 mm) (see FIG. 2) in the axial direction. From FIG. 5, in the main magnet member 2, the first peak value appears on the outer peripheral side and the second peak value larger than the first peak value appears on the inner peripheral side as shown by the solid line in the figure. In the secondary magnet member 3, the first peak value appears on the outer peripheral side as shown by the broken line in the figure, and the first peak value is larger than the first peak value on the inner peripheral side. It can be seen that a magnetic flux density distribution in which a peak value of 2 appears is obtained. Both peak values are determined in accordance with the material of the target material and the saturation magnetization value. In general, the second peak value is preferably 5% or more higher than the first peak value. However, in the present invention, when the magnetic target is extremely small (for example, the outer diameter is less than 150 mm), it is difficult to generate a peak magnetic field that can saturate the target on the inner peripheral side. It is desirable to incorporate in a magnetron sputtering apparatus using a magnetic target.

1:マグネトロンスパッタリング用磁石ユニット、2:主磁石部材、3:副磁石部材、
4:ヨーク、5:ベース、6:バランスウエイト、7:スペーサ、8:締結部材
21:第1磁石体、21a:第1永久磁石片、22:第2磁石体、
22a:第2永久磁石片、23:第3磁石体、23a:第3永久磁石片、
24:第4磁石体、24a:第4永久磁石片、25:第5磁石体、
25a:第5永久磁石片、31:第6磁石体、31a:第6永久磁石片、
32:第7磁石体、32a:第7永久磁石片、33:第8磁石体、
33a:第8永久磁石片、34:第9磁石体、34a:第9永久磁石片、
35:第10磁石体、35a:第10永久磁石片
1: Magnet unit for magnetron sputtering, 2: Main magnet member, 3: Sub magnet member,
4: yoke, 5: base, 6: balance weight, 7: spacer, 8: fastening member 21: first magnet body, 21a: first permanent magnet piece, 22: second magnet body,
22a: second permanent magnet piece, 23: third magnet body , 23a: third permanent magnet piece,
24: 4th magnet body , 24a: 4th permanent magnet piece , 25: 5th magnet body,
25a: fifth permanent magnet piece, 31: sixth magnet body, 31a: sixth permanent magnet piece,
32: seventh magnet body, 32a: seventh permanent magnet piece, 33: eighth magnet body,
33a: eighth permanent magnet piece, 34: ninth magnet body, 34a: ninth permanent magnet piece,
35: 10th magnet body, 35a: 10th permanent magnet piece

Claims (4)

軸方向に磁化した複数の円弧状磁石体と半径方向に磁化した複数の円弧状磁石体が交互に半径方向に積層された主磁石部材と、軸方向に磁化した複数の円弧状磁石体と半径方向に磁化した複数の円弧状磁石体が交互に半径方向に積層された前記主磁石部材より円弧角の小さい少なくとも一つの副磁石部材とが円筒状に結合され、前記副磁石部材は前記主磁石部材よりも円弧の中心よりに配置されると共に、半径方向の漏洩磁界の水平方向成分は、2重円状のピーク値を有しかつ内周側のピーク値は外周側のピーク値よりも大となる磁界分布を有することを特徴とするマグネトロンスパッタリング用磁石ユニット。 A main magnet member in which a plurality of arc-shaped magnet bodies magnetized in the axial direction and a plurality of arc-shaped magnet bodies magnetized in the radial direction are alternately laminated in the radial direction, and a plurality of arc-shaped magnet bodies magnetized in the axial direction and the radius A plurality of arc-shaped magnet bodies magnetized in the direction are coupled in a cylindrical shape with at least one sub-magnet member having an arc angle smaller than that of the main magnet member in which the main magnet members are alternately stacked in the radial direction. The horizontal component of the leakage magnetic field in the radial direction has a double circle peak value and the peak value on the inner peripheral side is higher than the peak value on the outer peripheral side. A magnetron sputtering magnet unit characterized by having a large magnetic field distribution. 前記主磁石部材は、軸方向に磁化した2個の円弧状磁石体と半径方向に磁化した2個の円弧状磁石体とが交互に半径方向に積層され、前記副磁石部材は軸方向に磁化した2個の円弧状磁石体と半径方向に磁化した2個の円弧状磁石体とが交互に半径方向に積層されていることを特徴とする請求項1記載のマグネトロンスパッタリング用磁石ユニット。 In the main magnet member, two arc-shaped magnet bodies magnetized in the axial direction and two arc-shaped magnet bodies magnetized in the radial direction are alternately stacked in the radial direction, and the sub-magnet member is magnetized in the axial direction. 2. The magnetron sputtering magnet unit according to claim 1, wherein the two arc-shaped magnet bodies and the two arc-shaped magnet bodies magnetized in the radial direction are alternately laminated in the radial direction. 前記主磁石部材は30〜270°の範囲にある円弧角を有し、残りの円弧状空間に前記副磁石部材が挿入されていることを特徴とする請求項2記載のマグネトロンスパッタリング用磁石ユニット。 3. The magnetron sputtering magnet unit according to claim 2, wherein the main magnet member has an arc angle in a range of 30 to 270 [deg.], And the sub magnet member is inserted into the remaining arc space. 前記主磁石部材は、軸方向に磁化した複数の第1永久磁石片を含む第1磁石体と半径方向に磁化した複数の第2永久磁石片を含む第2磁石体と軸方向に磁化した複数の第3永久磁石片を含む第3磁石体と半径方向に磁化した複数の第4永久磁石片を含む第4磁石体と軸方向に磁化した複数の第5永久磁石片を含む第5磁石体を内側から外側に向って略円弧状に並べて形成され、前記副磁石部材は、軸方向に磁化した複数の第6永久磁石片を含む第6磁石体と半径方向に磁化した複数の第7永久磁石片を含む第7磁石体と軸方向に磁化した複数の第8永久磁石片を含む第8磁石体と半径方向に磁化した複数の第9永久磁石片を含む第9磁石体と軸方向に磁化した複数の第10永久磁石片を含む第10磁石体を内側から外側に向って略円弧状に並べて形成されていることを特徴とする請求項3記載のマグネトロンスパッタリング用磁石ユニット。 The main magnet member includes a first magnet body including a plurality of first permanent magnet pieces magnetized in the axial direction, a second magnet body including a plurality of second permanent magnet pieces magnetized in the radial direction, and a plurality of magnets magnetized in the axial direction. A third magnet body including the third permanent magnet piece, a fourth magnet body including a plurality of fourth permanent magnet pieces magnetized in the radial direction, and a fifth magnet body including a plurality of fifth permanent magnet pieces magnetized in the axial direction. Are arranged in a substantially arc shape from the inside to the outside, and the sub-magnet member includes a sixth magnet body including a plurality of sixth permanent magnet pieces magnetized in the axial direction and a plurality of seventh permanent magnets magnetized in the radial direction. A seventh magnet body including magnet pieces, an eighth magnet body including a plurality of eighth permanent magnet pieces magnetized in the axial direction, a ninth magnet body including a plurality of ninth permanent magnet pieces magnetized in the radial direction, and an axial direction A tenth magnet body including a plurality of magnetized tenth permanent magnet pieces is arranged in a substantially arc shape from the inside to the outside. Magnetron sputtering magnet unit according to claim 3, characterized in that it is formed Te.
JP2003279931A 2003-07-25 2003-07-25 Magnet unit for magnetron sputtering Expired - Lifetime JP4304662B2 (en)

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