JP2005031483A - 露光用原版及び露光用原版の検査方法並びに露光方法 - Google Patents
露光用原版及び露光用原版の検査方法並びに露光方法 Download PDFInfo
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- JP2005031483A JP2005031483A JP2003271787A JP2003271787A JP2005031483A JP 2005031483 A JP2005031483 A JP 2005031483A JP 2003271787 A JP2003271787 A JP 2003271787A JP 2003271787 A JP2003271787 A JP 2003271787A JP 2005031483 A JP2005031483 A JP 2005031483A
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- exposure
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
【解決手段】フォトマスクまたはレチクル等のマスクとペリクル膜付きペリクル枠(以下、ペリクルと称す)を貼り合わせた露光用原版において、前記露光用原版のペリクル枠内とペリクル枠外のパターン露光に影響しない領域に検査部を設け、前記検査部が透過検査部、反射検査部及び透過・反射検査部とからなる露光用原版であって、露光用原版の検査部を分光光学的に検査することを特徴とする露光用原版の検査方法。
【選択図】図1
Description
次に、露光用原版の検査部を例えば、マッピングステージを備えた分光計測器にて、透過率、反射率を計測し、検査部の清浄度を判定する(図5S3参照)。
10c、10d……位相シフトマスク
11……透明基板
12……遮光層
13……パターン領域
14……位相シフト層
20……ペリクル
21……ペリクル枠
22……ペリクル膜
31a、33a……ペリクル枠内反射検査部
31b、33b……ペリクル枠外反射検査部
32a、35a……ペリクル枠内透過検査部
32b、35b……ペリクル枠外透過検査部
34a……ペリクル枠内透過・反射検査部
34b……ペリクル枠外透過・反射検査部
50a、50b、50c、50d……露光用原版
Claims (4)
- フォトマスクまたはレチクル等のマスクにペリクル膜付きペリクル枠を貼り合わせ、かつペリクル枠内とペリクル枠外のパターン露光に影響しない領域に検査部を設けたことを特徴とする露光用原版。
- 前記検査部が透過検査部、反射検査部及び透過・反射検査部のいずれか1種または2種以上組み合わせてなることを特徴とする請求項1に記載の露光用原版。
- 請求項1または2に記載の露光用原版の検査部を分光光学的に検査することを特徴とする露光用原版の検査方法。
- 請求項1または2に記載の露光用原版を用いて、レーザー波長(157nm)に感度を有する感光層にパターン露光し、レジストパターンを形成することを特徴とする露光方法。
Priority Applications (1)
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JP2003271787A JP4321163B2 (ja) | 2003-07-08 | 2003-07-08 | 露光用原版及び露光用原版の検査方法並びに露光方法 |
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JP2003271787A JP4321163B2 (ja) | 2003-07-08 | 2003-07-08 | 露光用原版及び露光用原版の検査方法並びに露光方法 |
Publications (2)
Publication Number | Publication Date |
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JP2005031483A true JP2005031483A (ja) | 2005-02-03 |
JP4321163B2 JP4321163B2 (ja) | 2009-08-26 |
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JP2003271787A Expired - Fee Related JP4321163B2 (ja) | 2003-07-08 | 2003-07-08 | 露光用原版及び露光用原版の検査方法並びに露光方法 |
Country Status (1)
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JP (1) | JP4321163B2 (ja) |
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2003
- 2003-07-08 JP JP2003271787A patent/JP4321163B2/ja not_active Expired - Fee Related
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JP4321163B2 (ja) | 2009-08-26 |
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