JP2004529378A5 - - Google Patents
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- Publication number
- JP2004529378A5 JP2004529378A5 JP2002572505A JP2002572505A JP2004529378A5 JP 2004529378 A5 JP2004529378 A5 JP 2004529378A5 JP 2002572505 A JP2002572505 A JP 2002572505A JP 2002572505 A JP2002572505 A JP 2002572505A JP 2004529378 A5 JP2004529378 A5 JP 2004529378A5
- Authority
- JP
- Japan
- Prior art keywords
- phase shift
- modeling
- layout
- class
- width
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000010363 phase shift Effects 0.000 claims 53
- 238000000034 method Methods 0.000 claims 13
- 238000007493 shaping process Methods 0.000 claims 8
- 230000000295 complement effect Effects 0.000 claims 7
- 238000004891 communication Methods 0.000 claims 4
- 238000001459 lithography Methods 0.000 claims 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 2
- 229920005591 polysilicon Polymers 0.000 claims 2
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US2001/007413 WO2002073312A1 (en) | 2001-03-08 | 2001-03-08 | Alternating phase shift masking for multiple levels of masking resolution |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009114914A Division JP2009175764A (ja) | 2009-05-11 | 2009-05-11 | 多重レベルのマスキング解像度用の交番位相偏移マスキング |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004529378A JP2004529378A (ja) | 2004-09-24 |
| JP2004529378A5 true JP2004529378A5 (https=) | 2005-12-22 |
Family
ID=21742383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002572505A Pending JP2004529378A (ja) | 2001-03-08 | 2001-03-08 | 多重レベルのマスキング解像度用の交番位相偏移マスキング |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP1370909A1 (https=) |
| JP (1) | JP2004529378A (https=) |
| WO (1) | WO2002073312A1 (https=) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6787271B2 (en) | 2000-07-05 | 2004-09-07 | Numerical Technologies, Inc. | Design and layout of phase shifting photolithographic masks |
| US7083879B2 (en) | 2001-06-08 | 2006-08-01 | Synopsys, Inc. | Phase conflict resolution for photolithographic masks |
| US6866971B2 (en) | 2000-09-26 | 2005-03-15 | Synopsys, Inc. | Full phase shifting mask in damascene process |
| US6846596B2 (en) | 2001-03-08 | 2005-01-25 | Numerical Technologies, Inc. | Alternating phase shift masking for multiple levels of masking resolution |
| US6635393B2 (en) | 2001-03-23 | 2003-10-21 | Numerical Technologies, Inc. | Blank for alternating PSM photomask with charge dissipation layer |
| US6553560B2 (en) | 2001-04-03 | 2003-04-22 | Numerical Technologies, Inc. | Alleviating line end shortening in transistor endcaps by extending phase shifters |
| US6573010B2 (en) | 2001-04-03 | 2003-06-03 | Numerical Technologies, Inc. | Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator |
| US6566019B2 (en) | 2001-04-03 | 2003-05-20 | Numerical Technologies, Inc. | Using double exposure effects during phase shifting to control line end shortening |
| US6593038B2 (en) | 2001-05-04 | 2003-07-15 | Numerical Technologies, Inc. | Method and apparatus for reducing color conflicts during trim generation for phase shifters |
| US6569583B2 (en) | 2001-05-04 | 2003-05-27 | Numerical Technologies, Inc. | Method and apparatus for using phase shifter cutbacks to resolve phase shifter conflicts |
| US6852471B2 (en) | 2001-06-08 | 2005-02-08 | Numerical Technologies, Inc. | Exposure control for phase shifting photolithographic masks |
| US7178128B2 (en) | 2001-07-13 | 2007-02-13 | Synopsys Inc. | Alternating phase shift mask design conflict resolution |
| US6664009B2 (en) | 2001-07-27 | 2003-12-16 | Numerical Technologies, Inc. | Method and apparatus for allowing phase conflicts in phase shifting mask and chromeless phase edges |
| US6738958B2 (en) | 2001-09-10 | 2004-05-18 | Numerical Technologies, Inc. | Modifying a hierarchical representation of a circuit to process composite gates |
| US6698007B2 (en) | 2001-10-09 | 2004-02-24 | Numerical Technologies, Inc. | Method and apparatus for resolving coloring conflicts between phase shifters |
| US7122281B2 (en) | 2002-02-26 | 2006-10-17 | Synopsys, Inc. | Critical dimension control using full phase and trim masks |
| US6605481B1 (en) | 2002-03-08 | 2003-08-12 | Numerical Technologies, Inc. | Facilitating an adjustable level of phase shifting during an optical lithography process for manufacturing an integrated circuit |
| US6704921B2 (en) | 2002-04-03 | 2004-03-09 | Numerical Technologies, Inc. | Automated flow in PSM phase assignment |
| US6785879B2 (en) | 2002-06-11 | 2004-08-31 | Numerical Technologies, Inc. | Model-based data conversion |
| US6821689B2 (en) | 2002-09-16 | 2004-11-23 | Numerical Technologies | Using second exposure to assist a PSM exposure in printing a tight space adjacent to large feature |
| US20050271949A1 (en) * | 2002-12-09 | 2005-12-08 | Scott Corboy | Reticle manipulations |
| EP2763061A1 (en) * | 2013-02-01 | 2014-08-06 | Dassault Systèmes | Computer-implemented method for designing an assembly of objects in a three-dimensional scene of a system of computer-aided design |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5567553A (en) * | 1994-07-12 | 1996-10-22 | International Business Machines Corporation | Method to suppress subthreshold leakage due to sharp isolation corners in submicron FET structures |
| US5858580A (en) * | 1997-09-17 | 1999-01-12 | Numerical Technologies, Inc. | Phase shifting circuit manufacture method and apparatus |
| JP3307313B2 (ja) * | 1998-01-23 | 2002-07-24 | ソニー株式会社 | パターン生成方法及びその装置 |
-
2001
- 2001-03-08 WO PCT/US2001/007413 patent/WO2002073312A1/en not_active Ceased
- 2001-03-08 JP JP2002572505A patent/JP2004529378A/ja active Pending
- 2001-03-08 EP EP01914759A patent/EP1370909A1/en not_active Withdrawn
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