JP2004510306A5 - - Google Patents

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Publication number
JP2004510306A5
JP2004510306A5 JP2002531454A JP2002531454A JP2004510306A5 JP 2004510306 A5 JP2004510306 A5 JP 2004510306A5 JP 2002531454 A JP2002531454 A JP 2002531454A JP 2002531454 A JP2002531454 A JP 2002531454A JP 2004510306 A5 JP2004510306 A5 JP 2004510306A5
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JP
Japan
Prior art keywords
attachment portion
workpiece
sealing device
support member
attached
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002531454A
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English (en)
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JP2004510306A (ja
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Publication date
Priority claimed from US09/670,241 external-priority patent/US6583428B1/en
Application filed filed Critical
Publication of JP2004510306A publication Critical patent/JP2004510306A/ja
Publication of JP2004510306A5 publication Critical patent/JP2004510306A5/ja
Pending legal-status Critical Current

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【００５２】
シール装置５５０は、ワークピース取付部（例えば、取付部５０８）に取り付けることができるリング形状の支持部材５５２と、この支持部材５５２に取り付けられる第１シール部材５５４を含み、第１シール部材は、支持部材５５２に対して柔軟な第１部分５５６を有し、図８Ｄにおいて図示しかつ説明するように、ワークピースの裏面の一部分と係合するようになっている。シール装置５５０は、固定具（図示略）を用いる複数の取付タブ５６８に設けた穴５６６を介してワークピース取付部５０８上に取り付けることができる。これに関して、シール装置５５０は、ワークピース取付部５０８（例えば、取付固定具及び同等物を介して）から分離可能であり、その結果、取付部の修繕及び交換を容易にする。
JP2002531454A 2000-09-26 2001-08-23 バッチ型イオン注入システムにおいてウエハ裏面に冷却ガスを供給する装置 Pending JP2004510306A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/670,241 US6583428B1 (en) 2000-09-26 2000-09-26 Apparatus for the backside gas cooling of a wafer in a batch ion implantation system
PCT/GB2001/003795 WO2002027754A2 (en) 2000-09-26 2001-08-23 An apparatus for the backside gas cooling of a wafer in a batch ion implantation system

Publications (2)

Publication Number Publication Date
JP2004510306A JP2004510306A (ja) 2004-04-02
JP2004510306A5 true JP2004510306A5 (ja) 2005-04-07

Family

ID=24689580

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002531454A Pending JP2004510306A (ja) 2000-09-26 2001-08-23 バッチ型イオン注入システムにおいてウエハ裏面に冷却ガスを供給する装置

Country Status (8)

Country Link
US (1) US6583428B1 (ja)
EP (1) EP1320866A2 (ja)
JP (1) JP2004510306A (ja)
KR (1) KR20040005822A (ja)
CN (1) CN1466770A (ja)
AU (1) AU2001282326A1 (ja)
TW (1) TW504740B (ja)
WO (1) WO2002027754A2 (ja)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002032588A1 (en) 2000-10-17 2002-04-25 Neophotonics Corporation Coating formation by reactive deposition
US7064491B2 (en) * 2000-11-30 2006-06-20 Semequip, Inc. Ion implantation system and control method
US6734439B2 (en) * 2001-10-25 2004-05-11 Allan Weed Wafer pedestal tilt mechanism and cooling system
US6695270B1 (en) * 2002-08-15 2004-02-24 Ole Falk Smed Flat panel display system
JP2006179613A (ja) * 2004-12-21 2006-07-06 Rigaku Corp 半導体ウエハ縦型熱処理装置用磁性流体シールユニット
US7867403B2 (en) * 2006-06-05 2011-01-11 Jason Plumhoff Temperature control method for photolithographic substrate
US7629597B2 (en) * 2006-08-18 2009-12-08 Axcelis Technologies, Inc. Deposition reduction system for an ion implanter
US20080121821A1 (en) * 2006-11-27 2008-05-29 Varian Semiconductor Equipment Associates Inc. Techniques for low-temperature ion implantation
US7528392B2 (en) * 2006-11-27 2009-05-05 Varian Semiconductor Equipment Associates, Inc. Techniques for low-temperature ion implantation
US7528391B2 (en) * 2006-12-22 2009-05-05 Varian Semiconductor Equipment Associates, Inc. Techniques for reducing contamination during ion implantation
US7559557B2 (en) * 2007-08-22 2009-07-14 Varian Semiconductor Equipment Associates, Inc. Sealing between vacuum chambers
US8149256B2 (en) * 2008-06-04 2012-04-03 Varian Semiconductor Equipment Associates, Inc. Techniques for changing temperature of a platen
US20100084117A1 (en) * 2008-10-02 2010-04-08 Fish Roger B Platen cooling mechanism for cryogenic ion implanting
US20100155026A1 (en) * 2008-12-19 2010-06-24 Walther Steven R Condensible gas cooling system
US7977652B2 (en) * 2009-09-29 2011-07-12 Varian Semiconductor Equipment Associates, Inc. Optical heater for cryogenic ion implanter surface regeneration
CN103594553B (zh) * 2013-10-23 2015-10-28 中国电子科技集团公司第四十八研究所 一种阵列式硅片装载靶盘
CN107154346B (zh) * 2017-05-19 2021-03-16 京东方科技集团股份有限公司 一种膜层的掺杂方法、薄膜晶体管及其制作方法
CN109243954B (zh) * 2018-10-12 2023-11-03 江苏晋誉达半导体股份有限公司 一种离子注入机
AU2019400946A1 (en) * 2018-12-21 2021-08-12 Ozone 1 Pty Ltd Improvements in plasma reactors
US10971327B1 (en) 2019-12-06 2021-04-06 Applied Materials, Inc. Cryogenic heat transfer system
US12002649B2 (en) 2021-12-10 2024-06-04 Applied Materials, Inc. Spinning disk with electrostatic clamped platens for ion implantation

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4514636A (en) * 1979-09-14 1985-04-30 Eaton Corporation Ion treatment apparatus
US4419584A (en) 1981-07-14 1983-12-06 Eaton Semi-Conductor Implantation Corporation Treating workpiece with beams
JPS5950275A (ja) 1982-09-16 1984-03-23 Rigaku Keisoku Kk 磁性流体軸封装置
US5389793A (en) 1983-08-15 1995-02-14 Applied Materials, Inc. Apparatus and methods for ion implantation
US4567938A (en) * 1984-05-02 1986-02-04 Varian Associates, Inc. Method and apparatus for controlling thermal transfer in a cyclic vacuum processing system
US4733091A (en) * 1984-09-19 1988-03-22 Applied Materials, Inc. Systems and methods for ion implantation of semiconductor wafers
JPS61264649A (ja) * 1985-05-20 1986-11-22 Ulvac Corp 基板冷却装置
US4965862A (en) 1988-05-18 1990-10-23 Varian Associates, Inc. Disk scanning apparatus for batch ion implanters
US4899059A (en) 1988-05-18 1990-02-06 Varian Associates, Inc. Disk scanning apparatus for batch ion implanters
US5238499A (en) 1990-07-16 1993-08-24 Novellus Systems, Inc. Gas-based substrate protection during processing
US5641969A (en) * 1996-03-28 1997-06-24 Applied Materials, Inc. Ion implantation apparatus
US5954342A (en) 1997-04-25 1999-09-21 Mfs Technology Ltd Magnetic fluid seal apparatus for a rotary shaft
US6222196B1 (en) * 1998-11-19 2001-04-24 Axcelis Technologies, Inc. Rotatable workpiece support including cyclindrical workpiece support surfaces for an ion beam implanter
US6412289B1 (en) 2001-05-15 2002-07-02 General Electric Company Synchronous machine having cryogenic gas transfer coupling to rotor with super-conducting coils

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