JP2004334119A - Method and apparatus for polishing electrophotographic photoreceptor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To polish an electrophotographic photoreceptor in a reduced time while preventing production of polish stripes or polish scratches. <P>SOLUTION: A polishing tape is disposed to be in contact with the surface of an electrophotographic photoreceptor under pressure by using an elastic roller. The length A of the tape in the traveling direction and in contact with the elastic roller when the tape is not in contact with the photoreceptor, the length B of the tape in the traveling direction in the contact region with the elastic roller when the tape is in contact with the photoreceptor, the length C of the tape in the traveling direction in contact with the photoreceptor when the tape is in contact with the photoreceptor, and the perimeter D in the rotation direction of the elastic roller satisfy the relation of A≤B, C≤B×1.2 and A≤D×0.1. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

次のような基準で評価を行った結果を表２に示す。
（処理時間）
表面微細形状がほぼＲａ＝２５ｎｍになるまでの研磨処理時間を計測し、比較例２を１００％として評価した。
【００４５】
◎：９５％未満
○：９５％以上１０５％未満
△：１０５％以上１１５％未満
×：１１５％以上
（研磨スジ、キズの有無）
処理後に感光体の光学顕微鏡表面を観察し、研磨スジの有無を評価し、更に電子写真装置に装着してハーフトーン画像を出力し、研磨キズの発生があるかどうかを評価した。
【００４６】
◎：研磨スジ、研磨キズの発生が全くない
○：研磨スジが僅かに認められるが、研磨キズの発生はない
△：研磨スジが認められ、１０万枚画像出力後に僅かに研磨キズが発生している
×：研磨キズが発生している
（研磨均一性）
処理後に原子間力顕微鏡を用いて、感光体の微細表面形状としてＪＩＳ Ｂ ０６０１（２００１）に準じて測定される、該感光体表面の１０μｍ×１０μｍ視野における算術平均粗さ（Ｒａ）を測定した。その際、感光体母線方向１０点×周方向４点の計４０箇所を測定した。Ｒａの４０点の標準偏差を計算して均一性を評価した。
【００４７】
◎：非常に良好（標準偏差０以上２．０未満）
○：良好（標準偏差２．０以上３．５未満）
△：実用上問題なし（標準偏差３．５以上５．０未満）
×：実用上難あり（標準偏差５．０以上）
【００４８】
【表２】

＜比較例１＞
図６に従来の電子写真用感光体の製造工程において、表面加工に際して利用される表面研磨装置を示す。図６に示す表面研磨装置の構成例において、加工対象物（円筒状基体上の堆積膜表面）６００は、その表面にａ−Ｓｉ光導電層又は中間層が堆積された円筒状基体であり、弾性支持機構６２０に取り付けられる。
【００４９】
図６に示す装置において、弾性支持機構６２０は、例えば、空気圧ホルダーが利用され、具体的には、ブリジストン社製空気圧式ホルダー（商品名：エアーピック、型番：ＰＯ４５ＴＣＡ＊８２０）が用いられている。加圧弾性ローラ６３０は、研磨テープ６３１を巻回して、加工対象物６００のａ−Ｓｉ光導電層又は中間層表面に押圧させる。研磨テープ６３１は、送り出しロール６３２から供給され、巻き取りロール６３３に回収される。その送り出し速度は、定量送り出しロール６３４とキャプスタンローラ６３５により調整され、又、その張力も調整されている。研磨テープ６３１は、富士フィルム社製ラッピングテープＬＴ−Ｃ２０００を用いた。
【００５０】
図６の研磨装置を用いて、加圧ローラーのＪＩＳゴム硬度は４０、端部の直径に対する中央の直径の比が１０１％のものを用い、表１に示す条件で、図８のＡ，Ｂ，Ｃ，Ｄを表３のようにＲ１−１〜Ｒ１−３の３つの条件で変化させて研磨処理した。このとき、電子写真感光体には、実施例１と同様のアモルファスシリコン系光導電層にａ−ＳｉＣ系表面層を堆積させた感光体を用いた。この感光体の初期の表面微細形状はＲａ＝６５ｎｍであった。
【００５１】
実施例１と同様の基準で評価した結果を表３に示す。
【００５２】
【表３】

＜比較例２＞
図６の研磨装置を用いて、加圧ローラーのＪＩＳゴム硬度は４０、端部の直径に対する中央の直径の比が１０１％のものを用い、表１に示す条件で、図９のＡ，Ｂ，Ｃ，Ｄを表４の様にＲ２−１〜Ｒ２−２の２つの条件で変化させて研磨処理した。このとき、電子写真感光体には、実施例１と同様のアモルファスシリコン系光導電層にａ−ＳｉＣ系表面層を堆積させた感光体を用いた。この感光体の初期の表面微細形状はＲａ＝６５ｎｍであった。
【００５３】
実施例１と同様の基準で評価した結果を表４に示す。
【００５４】
【表４】

表２〜４から分かるように、本発明の研磨装置を用いて、且つ、本発明の研磨方法で研磨処理することで、研磨スジ、研磨キズの発生を抑え、均一な研磨が可能であることが分かる。
【００５５】
Ａ≦Ｂ、Ｂ＝Ｃ、Ａ≦Ｄ×０． １の関係を満たすことが好ましいことが分かる。
【００５６】
［実施例２］
図４の研磨装置を用いて、加圧ローラーのＪＩＳゴム硬度は６０、端部の直径に対する中央の直径の比が１０１％のものを用い、表１に示す条件で、図１０のＡ，Ｂ，Ｃを表５のようにＪ２−１〜Ｊ２−２の２つの条件で変化させて研磨処理した。このとき、電子写真感光体には、実施例１と同様のアモルファスシリコン系光導電層にａ−ＳｉＣ系表面層を堆積させた感光体を用いた。この感光体の初期の表面微細形状はＲａ＝６５ｎｍであった。
【００５７】
実施例１と同様の基準で評価した結果を表５に示す。
【００５８】
【表５】

＜比較例３＞
図６の研磨装置を用いて、加圧ローラーのＪＩＳゴム硬度は４０、端部の直径に対する中央の直径の比が１０１％のものを用い、表１に示す条件で、図１１のＡ，Ｂ，Ｃ，Ｄを表６のようにＲ３−１〜Ｒ３−２の２つの条件で変化させて研磨処理した。このとき、電子写真感光体には、実施例１と同様のアモルファスシリコン系光導電層にａ−ＳｉＣ系表面層を堆積させた感光体を用いた。この感光体の初期の表面微細形状はＲａ＝６５ｎｍであった。
【００５９】
実施例１と同様の基準で評価した結果を表６に示す。
【００６０】
【表６】

表５〜６から分かるように、本発明の研磨装置を用いて、且つ、本発明の研磨方法で研磨処理することで、研磨スジ、研磨キズの発生を抑え、均一な研磨が可能であることが分かる。
【００６１】
Ａ＝０、Ａ＜Ｂ＜Ｃ、Ｃ≦Ｂ×１． ２の関係を満たすことが好ましいことが分かる。
【００６２】
［実施例３］
図４の研磨装置に、感光体を円周方向の回転と同時に、回転方向とは直交する方向に交互運動するようにして、表１に示す条件で図７のＡ，Ｂ，Ｃ，Ｄを表７のようにＪ３−１〜Ｊ３−２の２つの条件で変化させて研磨処理した。交互運動のストロークは１ｃｍで毎分１０往復とした。
【００６３】
このとき、電子写真感光体には、実施例１と同様のアモルファスシリコン系光導電層にａ−ＳｉＣ系表面層を堆積させた感光体を用いた。この感光体の初期の表面微細形状はＲａ＝６５ｎｍであった。
【００６４】
実施例１と同様の基準で評価した結果を表７に示す。
【００６５】
【表７】

実施例１と比較すると、交互運動することにより均一性が向上することが分かった。
【００６６】
【発明の効果】
以上の説明で明らかなように、本発明に係る電子写真感光体の研磨方法によれば、感光体表面の異常成長突起を他の良好な部分を傷付けることなく、その他良好な部分とほぼ平坦にまで研磨し、更にアモルファスシリコン感光体表面を均一に精密研磨し、１０μｍ×１０μｍの視野でＪＩＳ Ｂ ０６０１に準拠して計測される算術平均粗さ（Ｒａ）が２５ｎｍ以下となるまで研磨処理することができる。本発明の研磨方法を採用した研磨装置を用いることで、研磨処理時間を短縮することができる。
【００６７】
この研磨方法と研磨装置を用いることにより、長期に亘って安定して高品位の画像を形成できる感光体を供給することが可能となる。
【００６８】
具体的には、第１に成膜欠陥によるクリーニングブレード等の損傷を防止でき、第２に長期に亘る使用中においても感光体の滑りが変化しないために、クリーニング不良の発生や黒スジ状の画像欠陥の発生を抑制できる感光体を得ることができる。
【図面の簡単な説明】
【図１】ＡＦＭによる感光体表面の測定結果を示す図である。
【図２】感光体の層構成の断面図と異常成長突起を説明する模式図である。
【図３】不良画像の一例を示す図である。
【図４】本発明に係る研磨装置を説明するための模式的断面図である。
【図５】本発明に係る研磨装置を説明するための模式的断面図である。
【図６】従来の研磨装置を説明するための模式的断面図である。
【図７】本発明の実施形態を説明するための模式的断面図である。
【図８】本発明の比較例を説明するための模式的断面図である。
【図９】本発明の比較例を説明するための模式的断面図である。
【図１０】本発明の実施形態を説明するための模式的断面図である。
【図１１】本発明の比較例を説明するための模式的断面図である。
【符号の説明】
２００ アモルファスシリコン感光体
２０１ 導電性基板
２０２ 基点
２０３ 異常成長突起
２０４ 光導電層
２０５ 表面層
４００，５００ アモルファスシリコン感光体
４２０，５２０ 弾性支持機構
４３０，５３０ 加圧弾性ローラー
４３１，５３１ 研磨テープ
４３２，５３１ 送り出しロール
４３３，５３３ 巻き取りロール
４３４，５３４ 定量送りだしロール
４３５，５３５ キャプスタンローラ
４３６，５３６ ガイドローラ
４３７，５３７ 加圧機構
６００ 加工対象物（円筒状基体上の光導電層堆積膜表面）
６２０ 弾性支持機構
６３０ 加圧弾性ローラ
６３１ 研磨テープ
６３２ 送り出しロール
６３３ 巻き取りロール
６３４ 定量送りだしロール
６３５ キャプスタンローラ[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a polishing process for a surface layer of an electrophotographic photoreceptor (also simply referred to as a “photoreceptor”), and more particularly, to a polishing method and a polishing apparatus for precisely and uniformly polishing a surface.
[0002]
[Prior art]
In recent years, amorphous silicon-based photoconductors (hereinafter abbreviated as a-Si photoconductors) have been put into practical use, and after more than 10 years, their excellent wear resistance, heat resistance, photosensitivity characteristics, and pollution-free properties have been increasingly increased. Has improved.
[0003]
However, the a-Si photoreceptor formed on the conductive substrate by the plasma CVD method has a spherical abnormal growth protrusion that grows from a small amount of dust, defects, pits, and inclusions (a funnel-like shape when viewed from the cross-sectional direction). Or fan-shaped). FIG. 2 is a sectional view showing the shape of the abnormal growth projection of the a-Si photosensitive member. According to FIG. 2, the a-Si photosensitive member 200 has a thickness of 20 to 80 μm on a conductive substrate 201 made of a cylindrical or plate-like aluminum alloy or the like by a PCVD method such as a glow discharge decomposition method. Is formed, and a surface layer 205 made of, for example, amorphous silicon carbide (a-SiC), amorphous carbon (a-C), or the like having a thickness of 0.1 to 1 μm is laminated thereon. Is what it is.
[0004]
The a-Si photoreceptor is adjusted and selected according to the application such as an analog copying machine or a digital copying machine depending on the layer configuration. Furthermore, by adjusting the electrophotographic characteristics, the charging ability, residual potential, photosensitivity and surface hardness, environmental resistance and the like are improved to desired characteristics by selecting various dopant elements and film forming parameters.
[0005]
[Problems to be solved by the invention]
However, on the a-Si photoreceptor, as shown in FIG. 2, some abnormal growth projections 203 are generated on the basis of the dust 202 attached during the film formation, and the projections are formed on the surface of the photoreceptor layer. . This abnormal growth defect has a problem that the withstand voltage is lower than that of the normal photoreceptor layer portion and appears as a black or white dot image defect in an electrophotographic image, thereby deteriorating the image quality. Further, there is a problem that the projection-like defect damages the cleaning blade or causes fusion to occur and grows from the cleaning blade. Initially, the cleaning efficiency of the conductive substrate is improved, and the cleaning efficiency of the production site is improved. We have tried to solve the problem by improving accuracy and taking measures against dust.
[0006]
Although such measures had a certain effect, they did not completely eliminate the occurrence of chipping and fusion of the blade.
[0007]
As a countermeasure against the above-described problem, a method of removing a projection-like defect on the surface of the photoconductor by polishing with a polishing member, specifically, a polishing tape has been conventionally proposed and implemented.
[0008]
A method of polishing a surface layer of an a-Si photoreceptor with a polishing tape is disclosed (for example, see Patent Document 1).
[0009]
There is a disclosure of polishing a projection on an a-Si photoreceptor to planarize the projection and removing the surface protective layer of the polished projection to remove the photoconductive layer. Patent Document 2).
[0010]
Further, regarding the polishing of the protruding portion, in order to polish and flatten the protruding portion on the surface of the a-Si photoreceptor, a method of rotating the photoreceptor and abutting the polishing tape with an elastic roller to polish, or a polishing tape There has been disclosed a method of polishing by changing the feed amount and the penetration amount of the elastic roller (for example, see Patent Documents 3 and 4).
[0011]
It is possible to some extent to polish and flatten the surface projections of the photoreceptor by these methods, and a certain effect can be obtained for the above-mentioned problem.
[0012]
[Patent Document 1]
Japanese Patent Publication No. 7-77702 [Patent Document 2]
JP-A-7-64312 [Patent Document 3]
JP 2001-318479 A [Patent Document 4]
JP, 2001-318480, A However, even if it is a photoreceptor on which a high-hardness a-SiC-based surface layer or an a-C-based surface layer is laminated, the photoreceptor is worn out during the repetition of the electrophotographic process, and the protrusions are formed. Not only that, the fine shape of the surface will also change.
[0013]
The mechanism of the relationship between wear and friction and the fine shape of the surface has not been elucidated. However, when the fine shape changes, the friction with the cleaning blade changes, which may result in poor cleaning or blade damage.
[0014]
The present inventors have studied in detail the correlation with the fine shape of the photoreceptor surface for such a problem, and found that by keeping the surface fine shape at the initial stage of use of the photoreceptor below a certain level, wear and friction were reduced. It has been found that the degree of change in is small.
[0015]
The present invention is directed to a polishing method for not only polishing protrusions but also precisely and uniformly including a fine shape of a drum surface to keep a fine shape below a certain level.
[0016]
In the case of polishing including the surface shape, a long polishing step is required. In addition, in order to shorten the polishing time, it is desirable to increase the pressing pressure of the polishing tape.However, since scratches due to polishing are likely to occur, it is necessary to minimize polishing debris and foreign matter from being mixed into the polishing surface. No. Further, since the projection portion is an abnormally grown portion, in the polishing step, particularly when the pressing pressure is increased, the projection portion may peel off, which also causes scratches due to polishing.
[0017]
Furthermore, in order to reduce the fine shape to a certain level or less, the pressing pressure on the polished surface must have no distribution. Otherwise, uneven wear will be caused, and the yield will be reduced. When the pressing pressure is increased, the distribution width of the pressure is widened, so that uneven wear is apt to occur, and the adjustment is very difficult.
[0018]
In view of the above problems, the present inventors have arrived at a method capable of uniformly polishing a fine shape.
[0019]
That is, an object of the present invention is to polish abnormally grown projections generated on the surface of an a-Si photoreceptor to almost flat portions without damaging other good portions, and to further flatten the surface of the good portions. An object of the present invention is to provide a polishing method and a polishing apparatus for an electrophotographic photoreceptor capable of precisely and uniformly polishing even a fine shape.
[0020]
[Means for Solving the Problems]
In order to achieve the above object, a method for polishing an electrophotographic photoreceptor according to the present invention is characterized in that a photoconductive layer containing amorphous silicon and a surface protective layer made of an amorphous material are sequentially laminated on a cylindrical conductive substrate. A method of polishing the surface by pressing a polishing tape against the surface of an electrophotographic photoreceptor formed with an elastic roller under pressure, wherein the elastic roller does not contact the photoreceptor. The length in the running direction of the tape in which the polishing tape comes into contact with the elastic roller in the running direction was A, and the length of the contact portion in the running direction of the tape when it was in contact with the photoconductor was B, and the polishing tape was in contact with the photoconductor. When the length of the tape in contact with the photoconductor in the running direction at the time is C, and the circumferential length of the elastic roller in the rotation direction is D,
A ≦ B (1)
C ≦ B × 1.
2 ... (2)
A ≦ D × 0.
1 ... (3)
Are satisfied at the same time.
[0021]
The polishing apparatus for an electrophotographic photoreceptor according to the present invention is formed by sequentially laminating a photoconductive layer containing amorphous silicon and a surface protective layer made of an amorphous material on a cylindrical conductive substrate. A polishing apparatus for polishing a surface by arranging a polishing tape against the surface of an electrophotographic photosensitive member by pressing with an elastic roller and polishing the surface, wherein the elastic roller does not contact the photosensitive member. A is the length of the polishing tape in the running direction of the tape in contact with the elastic roller, B is the length of the abutting portion in the running direction of the tape when it is in contact with the photoconductor, and B is the length of the tape when it is in contact with the photoconductor. When the length of the tape in contact with the photoreceptor in the running direction is C, and the circumferential length of the elastic roller in the rotation direction is D,
A ≦ B (1)
C ≦ B × 1.
2 ... (2)
A ≦ D × 0.
1 ... (3)
Are satisfied at the same time.
[0022]
By this polishing process, it is possible to prevent the initial toner from slipping off from the cleaning blade of the electrophotographic apparatus, and to supply a photosensitive member capable of forming a high-quality image stably over a long period of time. The performance is improved.
[0023]
Specifically, firstly, it is possible to prevent damage to the cleaning blade and the like due to film formation defects, and secondly, since the slip of the photoconductor does not change even during use for a long period of time, occurrence of cleaning failure and black streak-like A photoreceptor capable of suppressing the occurrence of image defects (FIG. 3) can be obtained.
[0024]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.
[Polishing device]
An example of the polishing apparatus of the present invention will be described with reference to FIGS.
[0025]
Reference numeral 400 denotes an a-Si photoconductor, and 420 denotes a support mechanism, which is fixed at a predetermined position in a movement range 441 on the movement stage 440.
[0026]
The support mechanism 420 is specifically a pneumatic holder. For example, a pneumatic holder (trade name: air pick, model number: PO45TCA * 820) manufactured by Bridgestone Corporation can be used.
[0027]
430 is a pressing elastic roller for pressing the polishing tape against the a-Si photosensitive member 400, 431 is a polishing tape, 432 is a delivery roll, 433 is a take-up roll, 434 is a fixed delivery roll, 435 is a capstan roller, and 436 is a tape. The guide roller 437 is a pressing mechanism that presses the pressing elastic roller 430.
[0028]
As shown in FIG. 5, when the polishing tape 431 does not contact the a-Si photoreceptor 400, the length in the tape running direction where the polishing tape 431 contacts the elastic roller 430 is A, and the polishing tape 431 is a-Si The length in the tape running direction of the contact portion when contacting the photoconductor 400 is B, and the tape running direction in which the polishing tape 431 contacts the a-Si photoconductor 400 when the polishing tape 431 contacts the a-Si photoconductor 400 Assuming that the length is C and the circumferential length of the elastic roller 430 in the rotation direction is D, A ≦ B, C ≦ B × 1. 2, A ≦ D × 0. Must be 1.
[0029]
The polishing process is performed by rotating the a-Si photoconductor 400 and sending the polishing tape 431 at a speed different from the linear speed. At this time, when the linear velocity of the a-Si photoreceptor is in the range of 10 to 40 cm / sec and the feeding speed of the polishing tape is in the range of 1 to 20 cm / min, the relationship between the consumption of the polishing tape, the polishing processing time, and the polishing scratch Is determined comprehensively from
[0030]
Since the frictional resistance of the polishing tape tends to cause entrainment with the a-Si photoreceptor, it is desirable to send the polishing tape in a direction opposite to the rotation direction of the photoreceptor to perform the polishing process. In this case, the take-up roll 433, the fixed-rate delivery roll 434, and the capstan roller 435 adjust the speed of the polishing tape 431, and the delivery roll 432 adjusts the tape tension.
[0031]
On the other hand, by appropriately maintaining the pressure and the tape tension, polishing in the same direction is also effective.
[0032]
In the initial stage of polishing, in order to prevent polishing scratches due to polishing debris, polishing may be performed by sending a polishing tape at a speed greater than the rotational linear speed of the electrophotographic photosensitive member, but usually at a speed lower than the linear speed. A polishing tape is fed to perform a polishing process.
[0033]
Further, the electrophotographic photosensitive member is installed so as to alternately move in a direction orthogonal to the rotation direction at the same time as the rotation in the circumferential direction. As a result, the generation of polishing streaks (polishing traces generated due to polishing in only a certain direction) is suppressed, and the uniformity of polishing is improved.
[0034]
The polishing tape 431 is preferably usually called a wrapping tape, and the abrasive grains are C (diamond), SiO2
SiC, Al2O3, Fe2
O3, Cr2O3 or the like is used. The average grain size of the abrasive grains is 3 μm to 15 μm, and the standard Ra of the polished surface is 0.4 μm to 2.0 μm. It is preferable to select an appropriate value within a range that does not cause scratches. For example, a wrapping tape LT-C2000 manufactured by Fuji Film Co., Ltd. can be used as the polishing tape.
[0035]
As a support method, the photoconductor is inserted into a pneumatic holder in a contracted state, and then air of 100 kPa to 1000 kPa is sent in, supported, and the entire unit is rotated to rotate the photoconductor. A guide flange which is loosely fitted, rich in lubricity, and has elasticity may be provided as a guide. As a material, resins such as polyacetal (POM), polyamide (PA), and polycarbonate (PC) are preferable. The elasticity of the photoreceptor is controlled by the air pressure applied to the pneumatic holder, and minute vibrations such as chatter and rush shock are absorbed and reduced by the rubber of the pneumatic holder.
[0036]
The pressure roller used for pressing is usually an elastic body, is made of a material such as neoprene rubber, silicon rubber, and the like, and has a hardness of 20 to 80 as measured according to JIS K6253-1997, more preferably It is comprehensively determined within the range of JIS rubber hardness 30 to 40.
[0037]
In addition, the shape of the roller portion is preferably such that the diameter of the central portion is slightly larger than the diameter of both ends in the longitudinal direction. For example, the diameter of the central portion is 0.5 to 3.0% larger than the diameter of both ends. Shapes that are in the range, more preferably 0.7 to 1.5% larger are preferred.
[0038]
The pressure is in the range of 9.8 to 980 kPa, which is comprehensively determined from the relationship between the fine surface shape of the surface of the photoreceptor to be polished, the polishing processing time and the polishing flaw.
[0039]
In order to control the pressurization, it is also effective to provide a cylinder on the support portion of the elastic roller and control the air pressure or hydraulic pressure.
[0040]
Observation of the fine surface shape of the a-Si photosensitive member surface can be performed using, for example, an atomic force microscope (AFM) [Q-Scope 250 manufactured by Questant Co.].
[0041]
Furthermore, the arithmetic mean roughness (Ra) of the photoreceptor surface in a 10 μm × 10 μm visual field, which is measured according to JIS B 0601 (2001), is measured as the fine surface shape, and the polishing conditions for the desired fine surface shape are measured. It is desirable to determine FIG. 1 shows an example of an observation image of a fine surface shape.
[0042]
[Example]
Hereinafter, the present invention will be specifically described with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples.
[0043]
[Example 1]
Using the polishing apparatus shown in FIG. 4, a pressure roller having a JIS rubber hardness of 40 and a ratio of the center diameter to the end diameter of 101% was used, and under the conditions shown in Table 1, A and B in FIG. , C, and D were changed under four conditions of J1-1 to J1-4 as shown in Table 2, and the polishing treatment was performed. At this time, a photoconductor in which an a-SiC-based surface layer was deposited on an amorphous silicon-based photoconductive layer was used as the electrophotographic photoconductor. The initial surface fine shape of this photoreceptor was Ra = 65 nm.
[0044]
[Table 1]

Table 2 shows the results of the evaluation based on the following criteria.
(processing time)
The polishing treatment time until the surface fine shape became approximately Ra = 25 nm was measured, and Comparative Example 2 was evaluated as 100%.
[0045]
◎: less than 95% ○: 95% or more and less than 105% Δ: 105% or more and less than 115% ×: 115% or more (presence or absence of polishing streaks or scratches)
After the processing, the surface of the photoreceptor was observed by an optical microscope to evaluate the presence or absence of a polishing streak. Further, the photoreceptor was mounted on an electrophotographic apparatus and a halftone image was output to evaluate whether or not polishing flaws occurred.
[0046]
：: No polishing streaks and no polishing scratches ○: Slight polishing streaks but no polishing scratches 研磨: Polishing streaks recognized and slight polishing scratches after 100,000 sheet image output X: Polishing scratches are generated (polishing uniformity)
After the treatment, using an atomic force microscope, the arithmetic average roughness (Ra) of the photoreceptor surface in a 10 μm × 10 μm visual field was measured as the fine surface shape of the photoreceptor according to JIS B 0601 (2001). . At that time, a total of 40 points of 10 points in the photoconductor bus direction × 4 points in the circumferential direction were measured. The uniformity was evaluated by calculating the standard deviation of 40 points of Ra.
[0047]
◎: very good (standard deviation 0 or more and less than 2.0)
：: good (standard deviation 2.0 or more and less than 3.5)
Δ: No problem in practical use (standard deviation 3.5 or more and less than 5.0)
X: practically difficult (standard deviation 5.0 or more)
[0048]
[Table 2]

<Comparative Example 1>
FIG. 6 shows a surface polishing apparatus used for surface processing in a conventional electrophotographic photoreceptor manufacturing process. In the configuration example of the surface polishing apparatus shown in FIG. 6, the object to be processed (the surface of the deposited film on the cylindrical substrate) 600 is a cylindrical substrate having an a-Si photoconductive layer or an intermediate layer deposited on the surface thereof. It is attached to the elastic support mechanism 620.
[0049]
In the apparatus shown in FIG. 6, for example, a pneumatic holder is used as the elastic support mechanism 620, and specifically, a pneumatic holder (trade name: air pick, model number: PO45TCA * 820) manufactured by Bridgestone Corporation is used. . The pressing elastic roller 630 winds the polishing tape 631 and presses the polishing tape 631 against the surface of the a-Si photoconductive layer or the intermediate layer of the object 600 to be processed. The polishing tape 631 is supplied from the delivery roll 632 and collected by the take-up roll 633. The feeding speed is adjusted by the fixed amount feeding roll 634 and the capstan roller 635, and the tension thereof is also adjusted. As the polishing tape 631, a wrapping tape LT-C2000 manufactured by Fuji Film Co., Ltd. was used.
[0050]
Using the polishing apparatus shown in FIG. 6, a pressure roller having a JIS rubber hardness of 40 and a ratio of the center diameter to the end diameter of 101% was used, and under the conditions shown in Table 1, A and B in FIG. , C, and D were changed under three conditions of R1-1 to R1-3 as shown in Table 3, and the polishing treatment was performed. At this time, as the electrophotographic photoreceptor, a photoreceptor obtained by depositing an a-SiC-based surface layer on an amorphous silicon-based photoconductive layer as in Example 1 was used. The initial surface fine shape of this photoreceptor was Ra = 65 nm.
[0051]
Table 3 shows the results of the evaluation based on the same criteria as in Example 1.
[0052]
[Table 3]

<Comparative Example 2>
Using the polishing apparatus shown in FIG. 6, a pressure roller having a JIS rubber hardness of 40 and a ratio of the center diameter to the end diameter of 101% was used, and under the conditions shown in Table 1, A and B in FIG. , C, and D were changed under the two conditions of R2-1 to R2-2 as shown in Table 4, and the polishing treatment was performed. At this time, as the electrophotographic photoreceptor, a photoreceptor obtained by depositing an a-SiC-based surface layer on an amorphous silicon-based photoconductive layer as in Example 1 was used. The initial surface fine shape of this photoreceptor was Ra = 65 nm.
[0053]
Table 4 shows the results of evaluation based on the same criteria as in Example 1.
[0054]
[Table 4]

As can be seen from Tables 2 to 4, by using the polishing apparatus of the present invention and performing the polishing treatment by the polishing method of the present invention, the occurrence of polishing streaks and polishing scratches can be suppressed, and uniform polishing can be performed. I understand.
[0055]
A ≦ B, B = C, A ≦ D × 0. It is understood that it is preferable to satisfy the relationship of 1.
[0056]
[Example 2]
Using the polishing apparatus shown in FIG. 4, a pressure roller having a JIS rubber hardness of 60 and a ratio of the center diameter to the end diameter of 101% was used, and under the conditions shown in Table 1, A and B in FIG. , And C were changed under the two conditions J2-1 to J2-2 as shown in Table 5, and the polishing treatment was performed. At this time, as the electrophotographic photoreceptor, a photoreceptor obtained by depositing an a-SiC-based surface layer on an amorphous silicon-based photoconductive layer as in Example 1 was used. The initial surface fine shape of this photoreceptor was Ra = 65 nm.
[0057]
Table 5 shows the results of the evaluation based on the same criteria as in Example 1.
[0058]
[Table 5]

<Comparative Example 3>
Using the polishing apparatus shown in FIG. 6, a pressure roller having a JIS rubber hardness of 40 and a ratio of the center diameter to the end diameter of 101% was used, and under the conditions shown in Table 1, A and B in FIG. , C, and D were changed under the two conditions of R3-1 to R3-2 as shown in Table 6, and the polishing treatment was performed. At this time, as the electrophotographic photoreceptor, a photoreceptor obtained by depositing an a-SiC-based surface layer on an amorphous silicon-based photoconductive layer as in Example 1 was used. The initial surface fine shape of this photoreceptor was Ra = 65 nm.
[0059]
Table 6 shows the results of evaluation based on the same criteria as in Example 1.
[0060]
[Table 6]

As can be seen from Tables 5 and 6, by using the polishing apparatus of the present invention and performing the polishing treatment by the polishing method of the present invention, the generation of polishing streaks and polishing scratches can be suppressed, and uniform polishing can be performed. I understand.
[0061]
A = 0, A <B <C, C ≦ B × 1. It is understood that it is preferable to satisfy the relationship of 2.
[0062]
[Example 3]
The photoreceptor is rotated in the direction perpendicular to the rotation direction simultaneously with the rotation in the circumferential direction by the polishing apparatus shown in FIG. As shown in Table 7, the polishing treatment was performed under two conditions of J3-1 to J3-2. The stroke of the alternating motion was 1 cm and 10 reciprocations per minute.
[0063]
At this time, as the electrophotographic photoreceptor, a photoreceptor obtained by depositing an a-SiC-based surface layer on an amorphous silicon-based photoconductive layer as in Example 1 was used. The initial surface fine shape of this photoreceptor was Ra = 65 nm.
[0064]
Table 7 shows the results of the evaluation based on the same criteria as in Example 1.
[0065]
[Table 7]

Compared to Example 1, it was found that the uniformity was improved by the alternating movement.
[0066]
【The invention's effect】
As is clear from the above description, according to the method of polishing an electrophotographic photoreceptor according to the present invention, the abnormal growth projections on the photoreceptor surface are substantially flat with other good portions without damaging other good portions. Polishing, and then uniformly and precisely polishing the surface of the amorphous silicon photoreceptor, and polishing until the arithmetic average roughness (Ra) measured in accordance with JIS B 0601 in a visual field of 10 μm × 10 μm becomes 25 nm or less. Can be. By using the polishing apparatus employing the polishing method of the present invention, the polishing processing time can be reduced.
[0067]
By using the polishing method and the polishing apparatus, it becomes possible to supply a photoconductor capable of forming a high-quality image stably over a long period of time.
[0068]
Specifically, firstly, it is possible to prevent damage to the cleaning blade and the like due to film formation defects, and secondly, since the slip of the photoconductor does not change even during use for a long period of time, occurrence of cleaning failure and black streak-like A photoreceptor capable of suppressing the occurrence of image defects can be obtained.
[Brief description of the drawings]
FIG. 1 is a diagram showing a measurement result of a photoconductor surface by AFM.
FIG. 2 is a cross-sectional view of a layer configuration of a photoreceptor and a schematic diagram illustrating abnormal growth protrusions.
FIG. 3 is a diagram illustrating an example of a defective image.
FIG. 4 is a schematic cross-sectional view for explaining a polishing apparatus according to the present invention.
FIG. 5 is a schematic sectional view for explaining a polishing apparatus according to the present invention.
FIG. 6 is a schematic sectional view for explaining a conventional polishing apparatus.
FIG. 7 is a schematic cross-sectional view for explaining an embodiment of the present invention.
FIG. 8 is a schematic sectional view for explaining a comparative example of the present invention.
FIG. 9 is a schematic cross-sectional view for explaining a comparative example of the present invention.
FIG. 10 is a schematic cross-sectional view for explaining an embodiment of the present invention.
FIG. 11 is a schematic cross-sectional view for explaining a comparative example of the present invention.
[Explanation of symbols]
Reference Signs List 200 amorphous silicon photoconductor 201 conductive substrate 202 base point 203 abnormal growth projection 204 photoconductive layer 205 surface layer 400, 500 amorphous silicon photoconductor 420, 520 elastic support mechanism 430, 530 pressure elastic roller 431, 531 polishing tape 432, 531 Feed rolls 433, 533 Take-up rolls 434, 534 Fixed feed rolls 435, 535 Capstan rollers 436, 536 Guide rollers 437, 537 Pressing mechanism 600 Workpiece (photoconductive layer deposited film surface on cylindrical substrate)
620 elastic support mechanism 630 pressure elastic roller 631 polishing tape 632 feed roll 633 take-up roll 634 fixed-rate feed roll 635 capstan roller

Claims (17)

A polishing tape is applied by an elastic roller to the surface of an electrophotographic photosensitive member formed by sequentially laminating a photoconductive layer containing amorphous silicon and a surface protective layer made of an amorphous material on a cylindrical conductive substrate. A method of polishing the surface by contacting with pressure, wherein when the elastic roller does not contact the photoreceptor, the length of the polishing tape in contact with the elastic roller in the running direction is A. B is the length of the abutting portion in the tape running direction when contacting the photoreceptor, C is the length in the running direction of the tape that contacts the photoreceptor when it is in contact with the photoreceptor, When the circumferential length of the roller in the rotation direction is D,
A ≦ B (1)
C ≦ B × 1.
2 ... (2)
A ≦ D × 0.
1 ... (3)
A polishing method for an electrophotographic photoreceptor, characterized by simultaneously satisfying the following relational expressions: 2. The method according to claim 1, wherein a running direction of the polishing tape and a rotation direction of the photoconductor are opposite to each other at a contact surface thereof. 3. The method according to claim 1, wherein the photoconductor rotates alternately in a direction perpendicular to the rotation direction simultaneously with the rotation in the circumferential direction. The method according to any one of claims 1 to 3, wherein a shape of the pressure roller is such that a diameter of a central portion in a longitudinal direction is larger than a diameter of an end portion. The diameter at the center in the longitudinal direction is 0. 5-3. 5. The method for polishing an electrophotographic photosensitive member according to claim 4, wherein the value is larger by 0%. The method according to claim 1, wherein the pressure roller has a hardness of 20 to 80 degrees as measured according to JIS K6253-1997. The polishing tape has a standard Ra of the polishing surface of 0. 4-2. The method for polishing an electrophotographic photosensitive member according to any one of claims 1 to 6, wherein 0 µm and the average particle size of the abrasive grains are 3 to 15 µm. The surface protective layer of the photoreceptor has an arithmetic mean roughness (Ra) in a 10 μm × 10 μm visual field measured according to JIS B 0601 (2001) of 25 nm or less. The method for polishing an electrophotographic photoreceptor according to any one of the above. 9. The pressure roller according to claim 1, wherein the pressure of the pressure roller is adjusted by an air cylinder, and the pressure of the pressure roller becomes a predetermined value by bringing the photoconductor into contact with the pressure roller. The polishing method of the electrophotographic photosensitive member according to the above. A polishing tape is applied by an elastic roller to the surface of an electrophotographic photosensitive member formed by sequentially laminating a photoconductive layer containing amorphous silicon and a surface protective layer made of an amorphous material on a cylindrical conductive substrate. A polishing apparatus arranged to abut against the surface to polish the surface, wherein when the elastic roller is not in contact with the photoconductor, the polishing tape is in contact with the elastic roller in a running direction of the tape. A, the length in the tape running direction of the abutting portion when contacting the photosensitive member is B, and the length in the running direction of the tape that contacts the photosensitive member when contacting the photosensitive member is C, When the rotation direction circumference of the elastic roller is D,
A ≦ B (1)
C ≦ B × 1.
2 ... (2)
A ≦ D × 0.
1 ... (3)
A polishing apparatus for an electrophotographic photoreceptor, which satisfies the following relational expressions simultaneously: The polishing apparatus for an electrophotographic photoreceptor according to claim 10, wherein a running direction of the polishing tape and a rotation direction of the photoreceptor are opposite in a contact surface thereof. 12. The electrophotographic photoreceptor polishing apparatus according to claim 10, wherein the photoreceptor has a mechanism capable of simultaneously rotating in a circumferential direction and alternately moving in a direction orthogonal to the rotation direction. 13. The apparatus according to claim 10, wherein the shape of the pressure roller is such that a diameter at a central portion in a longitudinal direction is larger than a diameter at an end portion. The diameter at the center in the longitudinal direction is 0. 5-3. The polishing apparatus for an electrophotographic photosensitive member according to claim 13, wherein the polishing apparatus is larger by 0%. The polishing apparatus for an electrophotographic photoreceptor according to any one of claims 10 to 14, wherein the hardness of the pressure roller is 20 to 80 degrees as measured in accordance with JIS K6253-1997. The polishing tape has a standard Ra of the polishing surface of 0. 4-2. The electrophotographic photoreceptor polishing apparatus according to any one of claims 10 to 15, wherein the polishing grain has an average particle diameter of 3 to 15 µm. 11. The pressure roller is configured to be pressure-adjusted by an air cylinder so that the pressure of the pressure roller becomes a predetermined value by bringing the photosensitive member into contact with the pressure roller. 17. The polishing apparatus for an electrophotographic photoreceptor according to any one of claims 16 to 16.

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