JP2004314074A - Film forming method and film forming apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a film forming method and a film forming apparatus using a droplet material. <P>SOLUTION: A process of forming a droplet material spotting accuracy confirming pattern within an evaluation region in a droplet material spotting accuracy testing region 200 located outside a film forming region, a process of forming a droplet material spotting accuracy testing layer so as to cover at least the droplet material spotting accuracy confirming pattern in the droplet material spotting accuracy testing region, a process of forming a projection-shaped layer by ejecting the droplet material at a position corresponding to the position of the droplet material spotting accuracy confirming pattern on the droplet material spotting accuracy testing layer, and a process of evaluating droplet material spotting accuracy on the basis of a relative position between the droplet material spotting accuracy confirming pattern and the projection-shaped layer, are provided to the film forming apparatus. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a film forming method and a film forming apparatus.

  In recent years, with the progress of personal computers, especially portable personal computers, the demand for liquid crystal color displays has increased rapidly. In response, there is an urgent need to establish means for supplying beautiful displays at reasonable prices. In recent years, from the viewpoint of environmental protection, a shift to a process for reducing the environmental load and improvement have been required.

  Conventionally, the following method is known as one of the methods for manufacturing a color filter. In this method, first, a chromium thin film as a light shielding material is patterned by photolithography and etching to form a black matrix. Thereafter, red, green, and blue photosensitive resins are applied to the gaps between the black matrices for each color by a spin coating method or the like, and then patterned by photolithography. Thus, a color matrix in which red, green, and blue colored layers (dots) are arranged adjacent to each other can be formed. In this manufacturing method, the photolithography process must be repeated for each of the colors red, green, and blue. In addition, unnecessary portions are removed during patterning of each color, so that a photosensitive material is lost. It becomes a cost color filter.

  Therefore, as a method for solving such a problem of the manufacturing method, for example, Japanese Patent Application Laid-Open No. SHO 59-75205 proposes a method using an ink jet method. In this method, a partition is formed in a matrix on a transparent substrate so as to partition a region for forming a colored layer with a material having low wettability with respect to ink, and then a non-photosensitive color material is partitioned using an inkjet method. A colored layer is formed by coating the inside. According to this manufacturing method, the complexity of the photolithography process is reduced, and the loss of the coloring material can be further reduced. Since then, there have been proposed many methods of manufacturing a color filter by applying a non-photosensitive color material by a droplet material discharging method such as an ink jet method.

  An object of the present invention is to provide a film forming method and a film forming apparatus using a droplet material.

1. Color filter and method of measuring droplet material landing accuracy (A) The present invention relates to a color filter,
A pixel region having a light-blocking region and a transmission region defined by the light-blocking region;
A landing accuracy test area located outside the pixel area,
A first light shielding layer provided in the light shielding region;
A color element provided in the transmission area;
A second light-shielding layer provided in the landing accuracy test area,
A landing accuracy test layer provided in the landing accuracy test region so as to cover at least the second light shielding layer;
With
An evaluation area partitioned by the second light-shielding layer is provided in the landing accuracy test area, and is a color filter.

  In the color filter of the present invention, the pixel region refers to a region including a pixel used for the color filter. In addition, the landing accuracy test area refers to an area in the color filter that includes no pixels formed or pixels that are not used as pixels of the color filter. The evaluation area refers to an area to be evaluated for the landing accuracy of the droplet material in the landing accuracy test of the droplet material.

  According to the color filter of the present invention, since the landing accuracy test region is provided with the evaluation region, the landing accuracy test of the droplet material can be performed on the landing accuracy test layer. In the pixel region, the droplet material can be accurately applied to a predetermined region. For this reason, the color filter of the present invention is characterized in that it has a sufficient light-shielding property in the light-shielding area and has no color mixture in the transmission area, so that there is no pixel defect or uneven color tone and high contrast. The details will be described later in the section of the embodiment of the present invention.

(B) The present invention relates to a color filter,
A light-blocking region, and a pixel region having a transmission region surrounded by the light-blocking region;
A color element formed in the transmission region by discharging a droplet material,
A peripheral region disposed adjacent to the pixel region and having a light-blocking region;
An evaluation area that is included in the peripheral area and has a shape corresponding to the shape of the transmission area by being surrounded by the light-shielding area of the peripheral area,
It is characterized by having.

  According to the color filter of the present invention, since the evaluation area is provided, a landing accuracy test of the droplet material can be performed on the area. Can be applied well. For this reason, the color filter of the present invention is characterized in that it has a sufficient light-shielding property in the light-shielding area and has no color mixture in the transmission area, so that there is no pixel defect or uneven color tone and high contrast.

(C) The present invention relates to a color filter,
A light-blocking region, and a pixel region having a transmission region surrounded by the light-blocking region;
A color element formed in the transmission region by discharging a droplet material,
A peripheral region disposed adjacent to the pixel region and having a light-blocking region;
An evaluation area included in the peripheral area and surrounded by a light-shielding area of the peripheral area;
A layer provided in the peripheral region so as to cover a region surrounded by the evaluation region, and having a property of repelling the droplet material;
It is characterized by having.

  According to the color filter of the present invention, the layer is provided in the peripheral region so as to cover the evaluation region, and the layer having the property of repelling the droplet material is provided. Since the landing accuracy test can be performed, the droplet material can be accurately applied to the predetermined region in the pixel region. For this reason, the color filter of the present invention is characterized in that it has a sufficient light-shielding property in the light-shielding area and has no color mixture in the transmission area, so that there is no pixel defect or uneven color tone and high contrast.

(D) The present invention relates to a color filter,
A light-shielding region, and a pixel region having a plurality of transmission regions surrounded by the light-shielding region,
A color element formed in the transmission region by discharging a droplet material,
A peripheral region disposed adjacent to the pixel region and having a light-blocking region;
An evaluation area included in the peripheral area, and surrounded by a light-shielding area of the peripheral area,
The plurality of transmission areas and the evaluation area are arranged.

  According to the color filter of the present invention, since the plurality of transmission regions and the evaluation region are arranged, a landing accuracy test of the droplet material can be performed on the evaluation region. The droplet material can be accurately applied to a predetermined area. For this reason, the color filter of the present invention is characterized in that it has a sufficient light-shielding property in the light-shielding area and has no color mixture in the transmission area, so that there is no pixel defect or uneven color tone and high contrast.

  Further, in the measurement of the landing accuracy of the droplet material using the color filter of the present invention, the projecting layer is formed by landing the droplet material on the landing accuracy test layer in the landing accuracy test region. It is performed by According to this measurement method, in the color filter of the present invention, a convex layer is formed on the landing accuracy test layer provided in the landing accuracy test region.

  In the color filter of the present invention, the following aspects (1) to (3) can be adopted.

  (1) The light-shielding region constituting the pixel region may further include a bank layer, and the bank layer may be provided on the first light-shielding layer provided in the pixel region.

  According to this configuration, by providing the bank layer on the first light-shielding layer provided in the pixel region, the light-shielding function and the color element partitioning function can be set independently of each other, so that both functions can be reliably performed. Can be demonstrated. As a result, the color filter of the present invention is less likely to cause pixel defects due to insufficient light shielding properties and color mixing. Further, by dividing the functions in this manner, it is possible to select an optimal material for forming the first light-shielding layer and the bank layer provided in the pixel region from a wide range, which is advantageous in terms of production cost. is there. In particular, when the first light-shielding layer is formed of a metal layer, uniform and sufficient light-shielding properties can be obtained with a small film thickness.

  (2) The second light-shielding layer provided in the landing accuracy test area may have the same pattern as the first light-shielding layer provided in the pixel area. According to this configuration, when a droplet material landing test is performed on the landing accuracy test layer of the color filter of the present invention, a case where the droplet material lands on a region where a color element is formed in the pixel region is described. Assuming, the landing accuracy of the droplet material can be evaluated.

  (3) A vernier layer can be provided in the landing accuracy test area. According to this configuration, at the time of the droplet material landing test on the landing accuracy test layer, the droplet material is formed by the relative position between the droplet material layer formed on the landing accuracy test layer and the vernier layer. Can be clearly identified.

  In this case, the vernier layer can be provided at a predetermined position in the evaluation area.

  In this case, the vernier layer can be formed of the same material as the second light-shielding layer.

2. Droplet material landing accuracy test substrate for color filter and method for measuring droplet material landing accuracy The color filter droplet material landing accuracy test substrate of the present invention comprises a light-shielding layer and a landing formed so as to cover at least the light-shielding layer. An impact accuracy test area including an accuracy test layer,
An evaluation area partitioned by the light-shielding layer is provided in the landing accuracy test area.

  According to the present invention, before manufacturing a color filter, by performing a droplet material landing accuracy test on the landing accuracy test substrate for a color filter of the present invention, the landing accuracy of the droplet material is sufficiently confirmed, After the landing accuracy is increased, the color elements of the actually manufactured color filter can be formed. Thereby, in the production of the color filter, the droplet material can be accurately applied to the predetermined area, so that the light-shielding area has a sufficient light-shielding property, and there is no color mixture in the transmission area, and pixel defects and color tone unevenness are generated. And a color filter with high contrast can be manufactured.

  Further, the measurement of the landing accuracy of the droplet material using the droplet material landing accuracy test substrate for a color filter of the present invention is performed by causing the droplet material to land on the landing accuracy test layer in the landing accuracy test region. This is performed by forming a convex layer. According to this measuring method, a convex layer is formed on the landing accuracy test layer in the color filter droplet material landing accuracy test substrate of the present invention.

  Further, in the droplet material landing accuracy test substrate for a color filter of the present invention, a vernier layer can be provided.

  In this case, the vernier layer can be provided at a predetermined position in the evaluation area.

  In this case, the vernier layer can be formed of the same material as the light-shielding layer.

  According to the above configuration, the same operation and effect as those of the above-described color filter of the present invention can be obtained.

3. The present invention relates to a method for manufacturing a color filter,
(A) forming a first light-blocking layer having a predetermined matrix pattern in a pixel region to provide a light-blocking region including the first light-blocking layer;
Forming an evaluation area partitioned by the second light-shielding layer by forming a second light-shielding layer having a predetermined matrix pattern in a landing accuracy test area located outside the pixel area;
(B) forming a landing accuracy test layer in the landing accuracy test area so as to cover at least the second light-shielding layer; and (c) forming a color element in a color element formation area in the pixel area. A step of forming a transmissive area defined by the light-shielding area.

  In this specification, the color element formation region is a region where the color element is formed in the pixel region, and specifically, a region defined by the light shielding region in the pixel region. The light-shielding region mainly includes the first light-shielding layer and, if necessary, a bank layer (described later).

  ADVANTAGE OF THE INVENTION According to the manufacturing method of the color filter of this invention, the color filter which has no pixel defect and uneven color tone and has high contrast can be manufactured by a simple process.

  In the method for manufacturing a color filter of the present invention, the following aspects (1) to (6) can be adopted.

  (1) The step (b) is a step of forming the landing accuracy test layer in the landing accuracy test region and forming a bank layer on the first light shielding layer in the pixel region. There can be. According to this manufacturing method, the bank layer can apply, for example, a droplet material such as a colorant of each color of red, green, and blue to the color element forming region in a state of no color mixture. And a high-contrast color filter free from defects.

  (2) The method may further include (d) forming a convex layer by landing a droplet material on the landing accuracy test layer in the landing accuracy test region.

  According to this manufacturing method, in the landing accuracy test area, the landing accuracy of the droplet material is evaluated by landing a convex droplet material layer on the landing accuracy test layer, and then the pixel area is evaluated. In the above, a color material that is actually used as a pixel can be formed by landing a droplet material on the color element formation region. Accordingly, the color element can be applied to the predetermined region with high accuracy, so that a color filter having a sufficient light-shielding property in the light-shielding area, no color mixing in the transmission area, and a high contrast without pixel defects or uneven color tone. Can be manufactured in a simple process.

  (3) In the step (a), the first and second light-shielding layers can be formed by forming a metal layer on a substrate and then patterning the metal layer by photolithography and etching. According to this configuration, by using a metal layer as the first and second light-shielding layers, a sufficient and uniform light-shielding property can be obtained with a small film thickness. This metal layer can be formed by a method such as a vapor deposition method, a sputtering method, and a chemical vapor deposition method.

  (4) The step (a) may be a step of forming the second light-blocking layer in the landing accuracy test area and forming a vernier layer at a predetermined position in the evaluation area.

  (5) The step (b) may be a step of forming a photosensitive resin layer on the first light-shielding layer in the pixel region, and thereafter patterning the photosensitive resin layer by photolithography to form the bank layer. it can. Since the bank layer is not required to have a light-shielding property, it does not need to be black, and can be widely selected from commonly available photosensitive resin compositions.

  (6) The step (c) may be a step of forming a color element by applying a droplet material to the color element formation region using a droplet material discharge head. According to this method, the color filter of the present invention can be formed easily and with a small number of steps. That is, by forming the color elements by applying a droplet material using a droplet material discharge head, the number of patterning steps using photolithography can be reduced, and the steps can be simplified. In addition, since the droplet material is attached to the color element forming region using the droplet material discharge head, the droplet material can be applied only to a necessary region. Therefore, unlike the patterning by photolithography, there is no loss of the coloring material due to the removal of the unnecessary portion, and the cost of the color filter can be reduced. In the present invention, the droplet material can be provided as minute droplets of 6 to 30 picoliters. By controlling the number of such fine droplets, a desired amount of droplet material can be accurately applied to a fine region of, for example, 40 to 100 μm square.

4. The present invention relates to a method for manufacturing a droplet material landing accuracy test substrate for a color filter.
(A) forming a light-shielding layer having a predetermined matrix pattern to form an evaluation region defined by the light-shielding layer; and (b) forming a landing accuracy test layer so as to cover at least the light-shielding layer. A step of forming a landing accuracy test region by performing the method.

  According to the method for manufacturing a droplet material landing accuracy test substrate for a color filter of the present invention, substantially the same operations and effects as those of the above-described method for manufacturing a color filter of the present invention are obtained.

  In the method of manufacturing a droplet material landing accuracy test substrate for a color filter of the present invention, the following aspects (1) to (3) can be adopted.

  (1) The method may further include (c) forming a convex layer by landing a droplet material on the landing accuracy test layer in the landing accuracy test region.

  (2) In the step (a), the light-shielding layer can be formed by forming a metal layer on a substrate and then patterning the metal layer by photolithography and etching.

  (3) The step (a) may be a step of forming the light-shielding layer and forming a vernier layer at a predetermined position in the evaluation region.

  According to the manufacturing method described in the above (1) to (3), the operation and effects are substantially the same as those of the above-described method for manufacturing a color filter of the present invention. Further, by performing the method shown in the above (1) before the production of the color filter to be actually produced, the droplet material landing accuracy test substrate of the color filter of the present invention can sufficiently improve the landing accuracy of the droplet material. After confirming and increasing the landing accuracy, the color elements of the actually manufactured color filter can be formed. This makes it possible to accurately apply the droplet material to the color elements, thereby producing a color filter with high contrast without pixel defects or uneven color tone.

5. Light Emitting Substrate (A) The present invention relates to a light emitting substrate,
A pixel region having a bank region and a light emitting region defined by the bank region;
A landing accuracy test area located outside the pixel area,
A functional layer provided in the light emitting region;
A landing accuracy test layer provided in the landing accuracy test region,
A light emitting substrate comprising:

  In the light emitting substrate of the present invention, a pixel region refers to a region including a pixel used for the light emitting substrate. In addition, in the light emitting substrate, the landing accuracy test region refers to a region including pixels that are not formed with pixels or are not used as pixels of the light emitting substrate. Further, the functional layer refers to a layer including a light emitting layer and, if necessary, a hole transport / injection layer.

  According to the light emitting substrate of the present invention, since the landing accuracy test layer provided in the landing accuracy test region is provided, the landing accuracy test of the droplet material can be performed on the landing accuracy test layer. In the pixel region, the droplet material can be accurately applied to a predetermined region. Therefore, the light-emitting substrate of the present invention is characterized in that it has a sufficient light-shielding property in the bank region and no color mixing in the light-emitting region, so that there is no pixel defect or uneven color tone and high contrast. The details will be described later in the section of the embodiment of the present invention.

(B) The present invention relates to a light emitting substrate,
A pixel region having a defined area and a light emitting area surrounded by the defined area;
A functional layer formed in the light emitting region by discharging a droplet material,
A peripheral region arranged adjacent to the pixel region;
An evaluation area included in the peripheral area and having a shape corresponding to the shape of the light emitting area;
A layer provided in the peripheral region to cover the evaluation region, and having a property of repelling the droplet material;
It is characterized by having.

  In the light emitting substrate of the present invention, the evaluation area refers to an area in which a landing accuracy test of the droplet material is performed.

  According to the light-emitting substrate of the present invention, the layer provided on the peripheral region so as to cover the evaluation region, and having a layer having a property of repelling the droplet material, is provided on the layer. Since the landing accuracy test can be performed, the droplet material can be accurately applied to the predetermined region in the pixel region. Therefore, the light-emitting substrate of the present invention is characterized in that it has a sufficient light-shielding property in the partitioned area and no color mixing in the light-emitting area, so that there is no pixel defect or uneven color tone and high contrast.

(C) The present invention relates to a light emitting substrate,
A pixel region having a divided region and a plurality of light emitting regions surrounded by the divided region;
A functional layer formed in the light emitting region by discharging a droplet material,
A peripheral region disposed adjacent to the pixel region and having a light-blocking region;
An evaluation area included in the peripheral area and having a shape corresponding to the shape of the light emitting area;
With
The plurality of light emitting regions and the evaluation region are arranged.

  According to the light emitting substrate of the present invention, since the evaluation region is provided, and the plurality of light emitting regions and the evaluation region are arranged, a landing accuracy test of the droplet material can be performed on the region. In the pixel region, the droplet material can be accurately applied to a predetermined region. Therefore, the light-emitting substrate of the present invention is characterized in that it has a sufficient light-shielding property in the partitioned area and no color mixing in the light-emitting area, so that there is no pixel defect or uneven color tone and high contrast.

  Further, in the measurement of the landing accuracy of the droplet material using the light emitting substrate of the present invention, the convex layer is formed by landing the droplet material on the landing accuracy test layer in the landing accuracy test region. It is done by doing. According to this measurement method, in the light emitting substrate of the present invention, a convex layer is formed on the landing accuracy test layer provided in the landing accuracy test region.

  The light-emitting substrate of the present invention can have the following aspects (1) to (5).

  (1) The functional layer can be formed between a pair of electrode layers.

  (2) The bank region can be configured by sequentially stacking a first insulating layer and a resin layer.

In this case, the landing accuracy test area includes a second insulating layer,
The second insulating layer forming the landing accuracy test region is formed at the same height from the base as the first insulating layer forming the bank region in the pixel region, and has the same pattern. be able to.

(3) each of the pixel region and the landing accuracy test region includes a switching element;
The switching element formed in the landing accuracy test area and the switching element formed in the pixel area may have the same structure.

  (4) A vernier layer may be provided in the landing accuracy test area.

In this case, the switching element formed in the pixel region includes a metal wiring layer,
The vernier layer can be formed at the same height from the base as the metal wiring layer.

  (5) A convex layer may be formed on the landing accuracy test layer provided in the landing accuracy test region.

  According to the above-described aspects (1) to (5), the same functions and effects as those of the above-described color filter of the present invention are obtained.

6. Droplet material landing accuracy test substrate for light emitting substrate The droplet material landing accuracy test substrate for light emitting substrate of the present invention includes a switching element formed on the substrate, an electrode layer connected to the switching element, and a predetermined pattern. And a landing accuracy test layer formed on the electrode layer.

  According to the droplet material landing accuracy test substrate for a light emitting substrate of the present invention, it has substantially the same function and effect as the above-described color filter droplet material landing accuracy test substrate of the present invention.

  Further, the measurement of the landing accuracy of the droplet material using the droplet material landing accuracy test substrate for the light emitting substrate of the present invention is performed by forming the convex layer by landing the droplet material on the landing accuracy test layer. It is done by doing. By this measuring method, a convex layer is formed on the landing accuracy test layer in the droplet material landing accuracy test substrate for a light emitting substrate of the present invention.

  Further, in the droplet material landing accuracy test substrate for a light emitting substrate of the present invention, a vernier layer can be provided on the substrate.

  In this case, the vernier layer can be formed from a metal layer.

  According to the above configuration, the same operation and effect as in the case of the above-described color filter droplet material landing accuracy test substrate of the present invention are obtained.

7. The present invention relates to a method for manufacturing a substrate for light emission,
(A) forming a bank region having a predetermined pattern in the pixel region;
(B) forming a landing accuracy test layer in a landing accuracy test region located other than in the pixel region; and (c) forming a functional layer in a region defined by the bank region in the pixel region. Forming a light emitting region defined by the bank region.

  ADVANTAGE OF THE INVENTION According to the manufacturing method of the light emitting substrate of this invention, a light emitting substrate with high contrast without a pixel defect or color tone unevenness can be manufactured by a simple process.

  In the method for manufacturing a light emitting substrate of the present invention, the following aspects (1) to (6) can be adopted.

  (1) Further, (d) a step of forming a pair of electrode layers for adding a charge to the functional layer in the pixel region may be included.

  (2) In the step (a), the bank region can be formed by laminating a resin layer on the first insulating layer.

In this case, the step (a) includes forming a first insulating layer in the pixel region and forming a second insulating layer in the landing accuracy test region.
The first insulating layer and the second insulating layer can be formed at the same height from the same base and in the same pattern.

  In this case, in the step (a), the resin layer can be formed by forming a photosensitive resin layer in the pixel region and then patterning the same by photolithography.

  Further, in this case, the step of forming the resin layer in the step (a) and the step of forming the landing precision test layer in the step (b) can be performed in the same step.

  (3) The method may further include (e) forming a switching element having the same structure in each of the pixel region and the landing accuracy test region.

  (4) Further, the method may include a step of (f) landing a droplet containing a droplet material on the landing accuracy test layer in the landing accuracy test region to form a convex layer.

  (5) The step (a) may include a step of forming a vernier layer on the substrate in the landing accuracy test area.

In this case, in the step (e), the switching element provided in the pixel region includes a metal wiring layer,
The vernier layer may be formed at the same height from the base as the metal wiring layer.

  (6) The step (c) may be a step of forming a functional layer by applying a droplet material to a region defined by the bank region using a droplet material discharge head.

  According to the above aspects (1) to (6), the operation and effects are substantially the same as those of the above-described color filter manufacturing method of the present invention.

8. The present invention relates to a method for manufacturing a droplet material landing accuracy test substrate for a light emitting substrate.
(A) forming a switching element, an electrode layer, and a bank insulating layer having a predetermined pattern on a substrate; and (b) forming a landing accuracy test layer on the electrode layer. This is a method for producing a droplet material landing accuracy test substrate for a light emitting substrate.

  According to the method of manufacturing a droplet material landing accuracy test substrate for a light emitting substrate of the present invention, it has substantially the same operation and effect as the above-described method of manufacturing a color filter droplet material landing accuracy test substrate of the present invention. .

  In the method for manufacturing a droplet material landing accuracy test substrate for a color filter of the present invention, the following aspects (1) to (4) can be adopted.

  (1) The step (b) may be a step of forming the landing accuracy test layer on the electrode layer and the bank insulating layer.

  (2) The method may further include (c) a step of landing a droplet containing a droplet material on the landing accuracy test layer to form a convex layer.

  (3) The step (b) can be a step of forming the photosensitive resin layer and then patterning by photolithography to form the landing accuracy test layer.

  (4) The step (a) may include a step of forming a vernier layer on the substrate.

  According to the manufacturing method described in the above (1) to (4), the operation and effects are substantially the same as those of the above-described method for manufacturing a droplet material landing accuracy test substrate for a color filter of the present invention.

9. Electro-optical device and electronic apparatus (1) The electro-optical device according to the present invention includes the above-described color filter of the present invention,
A counter substrate disposed at a predetermined interval from the color filter;
An electro-optic material layer disposed between the color filter and the counter substrate.

  In this case, if a liquid crystal material layer is used as the electro-optical material layer, a liquid crystal display device that can display high contrast without pixel defects such as uneven color tone can be configured.

(2) An electro-optical device according to the present invention includes the above-described light emitting substrate of the present invention,
The functional layer constituting the light emitting substrate can emit light by electroluminescence.

  (3) An electronic apparatus according to the present invention can include the electro-optical device of the present invention described in (1) or (2).

  According to the electro-optical device and the electronic apparatus of the present invention, the effects of the color filter or the light emitting substrate of the present invention described above are reflected, cost is reduced, and high contrast without pixel defects such as uneven color tone is obtained. Can be displayed.

10. Film forming method (1) The present invention relates to a film forming method,
Forming a landing accuracy check pattern in a landing accuracy test region located outside the film formation region;
In the landing accuracy test area, a step of forming a landing accuracy test layer so as to cover at least the landing accuracy confirmation pattern,
Forming a convex layer by discharging a droplet material at a position corresponding to the landing accuracy check pattern position on the landing accuracy test layer,
A step of evaluating the landing accuracy based on the landing accuracy confirmation pattern and the relative position of the convex layer,
It is characterized by having.

  According to the film forming method of the present invention, the step of evaluating the landing accuracy based on the relative position of the landing accuracy confirmation pattern and the convex layer is provided, thereby accurately evaluating the landing accuracy of the droplet material. be able to. As a result, accurate film formation can be achieved.

(2) Further, the present invention relates to a film forming method,
Forming a landing accuracy check pattern in a landing accuracy test region located outside the film formation region;
In the landing accuracy test area, a step of forming a landing accuracy test layer so as to cover at least the landing accuracy confirmation pattern,
Forming a plurality of convex layers by discharging a droplet material at a position corresponding to the landing accuracy check pattern position on the landing accuracy test layer,
A step of evaluating landing accuracy based on the relative positions of the plurality of convex layers,
It is characterized by having.

  According to the film forming method of the present invention, by including the step of evaluating the landing accuracy based on the relative positions of the plurality of convex layers, the landing accuracy of the droplet material can be accurately evaluated. As a result, accurate film formation can be achieved.

  In the film forming method according to the above (1) or (2), the landing accuracy test layer may have a property of repelling the droplet material.

11. Film forming apparatus (1) The present invention relates to a film forming apparatus,
Equipped with a nozzle for discharging droplet material,
In the landing accuracy test region located outside the film formation region, a landing accuracy confirmation pattern is formed,
In the landing accuracy test area, a landing accuracy test layer is formed so as to cover at least the landing accuracy confirmation pattern,
A convex layer is formed by discharging a droplet material from the nozzle at a position corresponding to the landing accuracy checking pattern position on the landing accuracy testing layer formed so as to cover at least the landing accuracy checking pattern. Forming
The landing accuracy is evaluated based on the relative position of the landing accuracy confirmation pattern and the convex layer.

  According to the film forming apparatus of the present invention, it is possible to accurately evaluate the landing accuracy of the droplet material by evaluating the landing accuracy based on the relative position of the landing accuracy confirmation pattern and the convex layer. . As a result, accurate film formation can be achieved.

(2) Further, according to the present invention, in a film forming apparatus,
Equipped with a nozzle for discharging droplet material,
In the landing accuracy test region located outside the film formation region, a landing accuracy confirmation pattern is formed,
In the landing accuracy test area, a landing accuracy test layer is formed so as to cover at least the landing accuracy confirmation pattern,
By discharging the droplet material from the nozzle at a position corresponding to the landing accuracy check pattern position on the landing accuracy test layer formed so as to cover at least the landing accuracy check pattern, a plurality of convex shapes are formed. Form a layer,
The landing accuracy is evaluated based on the relative positions of the plurality of convex layers.

  According to the film forming apparatus of the present invention, the landing accuracy of the droplet material can be accurately evaluated by evaluating the landing accuracy based on the relative positions of the plurality of convex layers. As a result, accurate film formation can be achieved.

  In the film forming apparatus according to (1) or (2), the landing accuracy test layer may have a property of repelling the droplet material.

  Next, a color filter according to an embodiment of the present invention, a method for manufacturing the same, a method for measuring the landing accuracy of a droplet material using the color filter, an electro-optical device, and an electronic apparatus will be described with reference to the drawings.

[First Embodiment]
(Color filter)
FIG. 1 is a partial plan view schematically illustrating a color filter according to a first embodiment of the present invention, and FIG. 2 is a partial cross-sectional view schematically illustrating a portion taken along line AA in FIG. FIG.

  The color filter 1000 according to the present embodiment includes a transparent substrate 10, a pixel region 100 and a peripheral region formed on the substrate 10, respectively. Here, the peripheral region refers to a region that is arranged adjacent to the pixel region 100 and includes a light-shielding region. This peripheral region includes the landing accuracy test region 200. That is, the landing accuracy test area 200 is located outside the pixel area 100. In the present embodiment, the example in which the landing accuracy test area 200 is formed on the outer peripheral edge of the pixel area 100 has been described. However, the formation position of the landing accuracy test area 200 is not limited to this location. Not.

(1) Pixel Region As shown in FIGS. 1 and 2, the pixel region 100 includes a light-shielding region 20 and a transmission region 30 defined by the light-shielding region 20. The light shielding region 20 is a region through which light (visible light) is not substantially transmitted, and the transmission region 30 is a region through which light can be transmitted. In the pixel region 100, as shown in FIG. 1, light-shielding regions 20 and transmission regions 30 are arranged in a predetermined matrix pattern.

  The light shielding region 20 includes a first light shielding layer 22 and a bank layer 24 formed on the first light shielding layer 22. The color element 32 is provided in the transmission area 30. The color elements 32 are formed, for example, on the substrate 10.

  First, the light shielding region 20 will be described.

  The first light-shielding layer 22 constituting the light-shielding region 20 is formed on the substrate 10 in a predetermined matrix pattern. The first light-blocking layer 22 may have sufficient light-blocking properties and function as a black matrix. The material and the like are not particularly limited, and a metal, a resin, or the like can be used. As the material of the first light-shielding layer 22, it is desirable to use a metal in that a sufficient and uniform light-shielding property can be obtained with a small film thickness. The metal used as the first light-shielding layer 22 is not particularly limited, and can be selected in consideration of the efficiency of all steps including film formation and photoetching. As such a metal, a metal such as chromium, nickel, and aluminum used in an electronic device processing process can be preferably used. When the first light-shielding layer 22 is made of a metal, if the film thickness is 0.1 μm or more, a sufficient light-shielding property can be obtained. Preferably, the thickness is 0.5 μm or less.

  The bank layer 24 is formed on the first light shielding layer 22 and has a predetermined matrix pattern. The bank layer 24 partitions a region where a color element is formed, and prevents mixing of colors of adjacent color elements (color mixture). Therefore, the film thickness of the bank layer 24 is set in relation to the height of the droplet material layer and the like so that the droplet material as a color material injected when forming the color element does not overflow. From such a viewpoint, the bank layer 24 is preferably formed, for example, in a thickness range of 1 to 5 μm.

  The bank layer 24 is formed of a resin layer capable of performing photolithography. Such a photosensitive resin does not necessarily need to be a resin having a large contact angle with water and excellent in water repellency, or a resin having a light-shielding property, and can be selected in a wide range. As the resin constituting the bank layer 24, for example, a photosensitive resin composition containing a urethane resin, an acrylic resin, a novolak resin, a cardo resin, a polyimide resin, polyhydroxystyrene, polyvinyl alcohol, or the like can be used. .

  Next, the transmission region 30 will be described. The transmissive area 30 is an area defined by the light blocking area 20. The color element 32 is provided in the transmission area 30.

  The color element 32 includes a plurality of color elements 32r, 32g, and 32b having red, green, and blue colors that constitute the three primary colors of light. These color elements 32 are arranged in a predetermined arrangement, for example, in an arrangement pattern such as a stripe arrangement, a delta arrangement, or a mosaic arrangement, and one pixel is constituted by three consecutive color elements. The color element 32 is formed of a colored layer containing, for example, a pigment or a dye.

(2) Impact Accuracy Test Area The impact accuracy test area 200 is included in the peripheral area. The landing accuracy test area 200 is included in the peripheral area, and is surrounded by a light-shielding area (here, the second light-shielding layer 122) of the peripheral area, thereby having a shape corresponding to the shape of the transmission area 30. including. The area surrounded by the light-shielding area in the peripheral area is arranged. Specifically, the landing accuracy test area 200 includes a second light shielding layer 122 (light shielding area) and the landing accuracy test layer 26, as shown in FIG.

  The second light-shielding layer 122 constituting the landing accuracy test area 200 is formed on the substrate 10 in a predetermined matrix pattern. The second light-blocking layer 122 can have the same pattern as the first light-blocking layer 22 forming the pixel region 100. In the present embodiment, the second light shielding layer 122 has the same pattern as the first light shielding layer 22 and is formed in the same step. That is, the second light-shielding layer 122 has sufficient light-shielding properties like the first light-shielding layer 22 and may function as a black matrix. The material and the like are not particularly limited, and a metal, a resin, or the like is used. be able to.

  The landing accuracy test layer 26 is provided in the peripheral region so as to cover the region surrounded by the light shielding region (the second light shielding layer 122) in the peripheral region, and has a property of repelling a droplet material. The landing accuracy test layer 26 is provided so as to cover at least the second light shielding layer 122 in the landing accuracy test region 200. In the color filter 1000 of the present embodiment, the landing accuracy test layer 26 is formed on the substrate 10 so as to cover the second light shielding layer 122.

  The landing accuracy test layer 26 is used for landing a droplet material on the surface thereof and measuring the landing accuracy of the droplet material. An area (evaluation area) partitioned by the second light shielding layer 122 is provided in the landing accuracy test area 200. In the present embodiment, the area defined by the first light shielding layer 22 and the area (evaluation area) defined by the second light shielding layer 122 have the same pattern.

  Further, in order to reliably measure the landing accuracy of the droplet material, the surface of the landing accuracy test layer 26 needs to have water repellency to the droplet material. Here, having water repellency with respect to the droplet material means having low wettability with respect to the droplet material. In order for the surface of the landing accuracy test layer 26 to have water repellency with respect to the droplet material, the landing accuracy test layer 26 itself is formed of a material having water repellency with respect to the droplet material. The surface of the application layer 26 may be subjected to a surface treatment for imparting water repellency to the droplet material, for example, surface fluorination by plasma treatment or the like. In the present embodiment, the landing accuracy test layer 26 can be formed from the same material as the bank layer 24 forming the pixel region 10.

  The landing accuracy test layer 26 does not necessarily need to be formed over the entire area of the landing accuracy test region 200. In the landing accuracy test region 200, at least a region for performing the landing test of the droplet material, In other words, it is only necessary to form the droplet material in a region where the droplet material lands.

(Color filter manufacturing method)
Next, a method of manufacturing the color filter according to the present embodiment will be described with reference to FIGS. 3 and 4 are cross-sectional views schematically showing a layer structure of a portion corresponding to line BB of FIG. 1 in each step. FIG. 5 is a partial plan view schematically showing a color filter obtained by the steps shown in FIGS. 3 and 4, and is an enlarged view of the vicinity of line AA in FIG.

(1) Formation of Light-Shielding Layer First, as shown in FIG. 3A, in the pixel region 100 and the landing accuracy test region 200, a dry plating method such as a sputtering method, a vapor deposition method, a chemical A metal layer 220 is deposited to a thickness of 0.1 to 0.5 μm by a vapor deposition method. As described above, various metals such as chromium, nickel, and aluminum can be used as the material of the metal layer 220. Next, a resist layer R1 having a predetermined pattern is formed on the surface of the metal layer 220 by photolithography. Here, a photolithography process is performed using a mask having the same pattern in the pixel region 100 and the landing accuracy test region 200. Thereafter, etching is performed using the resist layer R1 as a mask, and the metal layer 220 is patterned. In this manner, as shown in FIG. 3B, in the pixel region 100 and the landing accuracy test region 200, the first and second light-shielding layers 22 and 122 having a predetermined matrix pattern are formed on the substrate 10 respectively. It is formed. Here, the first and second light shielding layers 22 and 122 have the same pattern.

(2) Formation of Bank Layer Next, as shown in FIG. 3C, in the pixel region 100 and the landing accuracy test region 200, the substrate 10 on which the first and second light shielding layers 22 and 122 are formed is formed. Next, a resin layer 240 is formed. This resin layer can be formed by a negative or positive resist. The resin layer 240 is made of, for example, a photocurable (negative type) photosensitive resin such as urethane or acrylic. Then, exposure is performed using the photomask M1, and further development is performed, so that the resin layer 240 is patterned. Thus, as shown in FIG. 3D, the bank layer 24 is formed in the pixel region 100, the light-shielding region 20 is formed, and the landing accuracy test layer 26 is formed in the landing accuracy test region 200. You. The configurations of the bank layer 24 and the landing accuracy test layer 26 have already been described, and thus description thereof is omitted. In this step, in the pixel region 100, the color element forming region 330 partitioned by the light shielding region 20 is formed in a predetermined matrix pattern.

  Next, if necessary, a surface treatment of the exposed surface of the substrate 10 is performed before a color element forming step performed later. As such a surface treatment, a method such as ultraviolet irradiation, plasma irradiation, or laser irradiation can be used. By performing such a surface treatment, contaminants and the like adhering to the exposed surface 10a of the substrate 10 are removed, and the contact angle of the surface 10a with water can be reduced to improve the wettability of the droplet material. . More specifically, it is desirable that the difference in contact angle of water between the exposed surface 10a of the substrate 10 and the surface of the bank layer 24 be 15 ° or more. As described above, by controlling the contact angle of the exposed surface 10a of the substrate 10 and the surface of the bank layer 24 with water, the droplet material can be applied to the exposed surface 10a of the color element forming region 330 with good adhesion. At the same time, the droplet material repelling property of the bank layer 24 prevents the droplet material from overflowing beyond the bank layer 24. In addition, during drying of the droplet material, unevenness in film thickness caused by the droplet material being pulled by the bank layer is suppressed.

  As a surface treatment method, it is preferable to use a surface treatment method using an in-line plasma irradiation method in that the method is suitable for making a process into a line.

(3) Drop Material Impact Accuracy Test Next, before the color element 32 is formed in the pixel region 100, the droplet material used for forming the color element 32 is used in the impact accuracy test area 200 for the impact accuracy test. The droplet material is landed on the layer 26, and the landing accuracy of the droplet material is measured.

  In this embodiment mode, a droplet material discharging method using a droplet material discharging head is applied as a method for applying the droplet material. In the pixel region 100, in order to accurately land droplets on the fine color element forming region 330 of, for example, 50 μm square, droplet material discharge that can be miniaturized and the number of droplets discharged can be controlled. The method is optimal.

  When the droplet material is applied by the droplet material discharge method, the reason why the droplet material is not landed at an assumed position is that the droplet material discharge head is bent and installed, when discharging the droplet material. It is conceivable that the nozzle used is bent, the droplet material is bent and discharged from the nozzle, and the relative position between the substrate and the droplet material discharge head is shifted. The impact accuracy of the droplet material can be improved by evaluating the impact accuracy of the droplet material by the method described below and investigating these causes.

  First, as shown in FIG. 4A, in the landing accuracy test area 200, a droplet material is applied onto the landing accuracy test layer 26 to form a convex droplet material layer 320. The convex layer 320 lands on a portion of the landing accuracy test layer 26 that is not formed on the second light shielding layer 122. That is, the convex layer 320 is landed on the landing accuracy test layer 26 in a region surrounded by the edge 122a of the second light shielding layer 122 (see FIG. 5). As shown in FIG. 5, the landing accuracy of the droplet material may be, for example, the relative position between the convex layer 320 and the edge 122 a of the second light shielding layer 122 and / or the relative position between the landed convex layers 320. To evaluate. When the evaluation is made based on the relative positions of the convex layers 320, as shown in FIG. 5, a plurality of convex layers 320 are formed on the landing accuracy test layer 26, and the landing accuracy is determined by the relative positions between the convex layers 320. evaluate.

In the present embodiment, the first and second light shielding layers 22 and 122 are formed in the same pattern in each of the pixel region 100 and the landing accuracy test region 200. That is, the regions defined by the first and second light shielding layers 22 and 122 have the same pattern. Specifically, as shown in FIG. 4 (A), the width h _a between the first light-shielding layer 22 adjacent _(width of a color element forming region 330), the width between the second light-shielding layer 122 adjacent and a h _b are formed to be substantially equal. Therefore, in the landing accuracy test area 200, the convex layer 320 is landed in the area surrounded by the edge 122 a of the second light-shielding layer 122 on the landing accuracy test layer 26, so that the pixel area The landing accuracy of the droplet material can be evaluated on the assumption that the droplet material lands on the 100 color element formation regions 330.

  As a result of the above-described landing accuracy test of the droplet material, if the landing accuracy is not preferable, an adjustment for improving the landing accuracy is performed as necessary.

(4) Formation of Color Element Next, the color element 32 which actually becomes a pixel is formed. First, as shown in FIG. 4B, in the pixel region 100, a droplet material is applied to the color element forming region 330 defined by the first light shielding layer 22 and the bank layer 24 to form a droplet material layer. By doing so, the color elements 32 (32g, 32r, 32b) are formed. In the present embodiment, as a method of applying a droplet material, the droplet discharge method used in the droplet material landing accuracy test described above is applied.

  In order to accurately apply the micronized droplet to a target position (the exposed surface 10a of the substrate 10), first, the size of the droplet is adjusted to the size of the exposed surface 10a of the color element formation region 330 as a target. Control. It is preferable that the size of the droplet is controlled to 6 to 30 picoliters for the color element forming region 330 of, for example, 50 μm square. Further, considering the throughput, the size of the droplet is more preferably 12 to 20 picoliter. In addition, in order for the droplet to fly from the droplet material discharge head and to accurately reach the target, it is desirable to control the conditions so that the droplet does not split during the flight and flies straight.

  In the present invention, it is desirable to include the following means for improving the leveling property during drying so that the layer of the applied droplet material becomes uniform in film thickness after adhesion, drying, and curing.

  One means is to add a high-boiling solvent to the applied droplet material to reduce the drying speed of the droplet material. As the high boiling solvent, at least one selected from butyl carbitol acetate, methoxy butyl acetate, ethoxyethyl propionate and methoxy-2-propyl acetate can be used. Such a solvent can be widely selected in consideration of the dispersibility of the pigment or the solubility of the dye, as long as the solvent has a boiling point of 150 to 300 ° C.

  Another means is to control the drying rate of the applied droplet material. After being applied, the droplet material evaporates from the low-boiling-point solvent component, leveling increases the viscosity while raising, and the resin component containing a pigment or dye is crosslinked and cured by heat. The drying conditions can be combined with at least one of setting in a natural atmosphere and prebaking at 40 to 100 ° C., and final baking at 150 to 300 ° C., depending on the characteristics of the droplet material. Each droplet material has its own viscosity, surface tension, and flow characteristics. Therefore, in order to obtain a uniform film thickness after drying, the range and combination of the above-mentioned drying conditions are selected according to the characteristics unique to the droplet material. If the drying and curing conditions do not match the characteristics of the droplet material, the thickness of the color element tends to be non-uniform, which causes a variation in pixel color tone.

  In the present embodiment, the color elements 32 are sequentially formed for each of red, green, and blue. The order of forming these color elements 32 is not particularly limited. For example, first, a green color element 32g is formed, then either a red color element 32r or a blue color element 32b is formed, and finally, the remaining color elements are formed.

  The color components of red, green, and blue can be simultaneously formed by selecting a color head of a droplet material discharge system or a plurality of heads.

(5) Formation of Overcoat Layer and the Like Next, as shown in FIG. 4C, after forming the color elements 32, an overcoat layer 40 for obtaining a smooth surface is formed as necessary. Further, as shown in FIG. 4D, a color filter 1000 is obtained by forming a common electrode 50 on the surface of the overcoat layer 40 as necessary. The overcoat layer 40 and the common electrode 50 can be provided according to the configuration of the electro-optical device to which the color filter is applied.

(Effect)
Hereinafter, main functions and effects of the color filter of the present embodiment will be described.

  (A) The color filter of the present embodiment evaluates the landing accuracy of a droplet material by landing a convex droplet material layer 320 on the landing accuracy test layer 26 in the landing accuracy test region 200. After that, in the pixel region 100, a droplet material is landed on the color element forming region 330 to form the color element 32 actually used as a pixel. Thereby, the color element 32 can be accurately applied to the predetermined area.

  In particular, in the color filter of the present embodiment, a region (evaluation region) partitioned by the second light-shielding layer 122 is provided in the landing accuracy test region 200. According to this configuration, when the droplet material layer 320 lands (see FIG. 4A), the landing accuracy of the droplet material layer 320 can be reliably measured. As a result, since the color elements 32 can be formed with high accuracy, the light-shielding region 20 has a sufficient light-shielding property, and there is no color mixture in the transmission region 30. Therefore, there is no pixel defect or uneven color tone, and the contrast is high.

  (B) By providing the first light-shielding layer 22 and the bank layer 24, the light-shielding function and the color element partitioning function can be set independently of each other, so that both functions can be reliably exhibited. As a result, in the color filter according to the present embodiment, pixel defects due to insufficient light-shielding properties and color mixing hardly occur. Further, by dividing the functions in this manner, it is possible to select an optimum material for forming the first light shielding layer 22 and the bank layer 24 from a wide range, which is advantageous in terms of production cost. In particular, when the first light shielding layer 22 is formed of a metal layer, uniform and sufficient light shielding properties can be obtained with a small film thickness.

  Further, according to the method for manufacturing a color filter of the present embodiment, the following effects are mainly obtained.

  (A) According to the color filter manufacturing method of the present embodiment, in the landing accuracy test region 200, the convex droplet material layer (convex layer) 320 is landed on the landing accuracy test layer 26. After the evaluation of the droplet material landing accuracy, the droplet material is landed on the color element forming region 330 in the pixel region 100 to form the color element 32 actually used as a pixel. That is, the droplet material landing accuracy can be evaluated by a simple method, and the droplet material landing accuracy can be improved by adjusting the apparatus as necessary based on the evaluation result. Thus, since the color element 32 is formed in the pixel area 100, the color element 32 can be accurately applied to a desired area. Accordingly, since the light-shielding region 20 has a sufficient light-shielding property and there is no color mixture in the transmission region 30, a color filter having high contrast without pixel defects or uneven color tone can be created.

  (B) Further, by forming the color elements 32 by a droplet material discharging method, the number of patterning steps using photolithography can be reduced, and the steps can be simplified. Therefore, the color filter of this embodiment can be formed with a small number of steps. Further, since the color element 32 is formed by attaching the droplet material by the droplet material discharge method, the droplet material can be applied only to the necessary color element formation region. Therefore, unlike the patterning by photolithography, there is no loss of the coloring material due to the removal of the unnecessary portion, and the cost of the color filter can be reduced.

[Second embodiment]
(Color filter)
FIG. 6 is a partial plan view schematically illustrating a color filter according to a second embodiment of the present invention, and FIG. 7 is a partial cross-sectional view schematically illustrating a portion along line AA in FIG. FIG.

  The color filter 1001 according to the present embodiment has a structure similar to the color filter 1000 shown in FIGS. 1 to 5 except that the vernier layer 28 is formed on the substrate 10 in the landing accuracy test area 200. Having. In the color filter 1001, portions having substantially the same functions as those of the color filter 1000 according to the first embodiment are denoted by the same reference numerals, and detailed description thereof will be omitted.

  The vernier layer 28 is formed in a region (evaluation region) defined by the second light shielding layer 122 in the landing accuracy test region 200, as shown in FIGS. FIG. 6 shows a case where the planar shape of the vernier layer 28 is a cross shape, but the planar shape of the vernier layer 28 is not limited to this, and takes various forms such as a round shape, a triangular shape, and a quadrangular shape. be able to. A landing accuracy test layer 26 is formed on the vernier layer 28.

  The material and the like of the vernier layer 28 are not particularly limited as long as the vernier layer 28 can be identified from the installation surface side of the convex layer 320 when the landing accuracy test layer 26 and the convex layer 320 are formed on the vernier layer 28. Instead, metal, resin, or the like can be used. When the vernier layer 28 is formed in the same step as the first and second light shielding layers 22 and 122, the vernier layer 28 is formed of the same material as the first and second light shielding layers 22 and 122.

(Color filter manufacturing method)
Next, a method for manufacturing the color filter 1001 of the present embodiment will be described with reference to FIGS. 8 and 9 are cross-sectional views schematically showing a layer structure of a portion corresponding to line BB in FIG. 6 in each step. FIG. 10 is a partial plan view schematically showing a color filter obtained by the steps shown in FIGS. 8 and 9, and is an enlarged view of the vicinity of line AA in FIG. Note that, in each manufacturing process, detailed description of portions substantially the same as those of the manufacturing process of the color filter 1000 according to the first embodiment is omitted.

(1) Formation of Light-Shielding Layer and Vernier Layer In the present embodiment, the first and second light-shielding layers 22 and 122 and the vernier layer 28 are formed in the same step. First, as shown in FIG. 8A, in the pixel region 100 and the landing accuracy test region 200, after depositing the metal layer 220 on the transparent substrate 10, a predetermined pattern is formed on the surface of the metal layer 220. Is formed by photolithography. Thereafter, etching is performed using the resist layer R2 as a mask to pattern the metal layer 220. As shown in FIG. 8B, a first light-shielding layer having a predetermined matrix pattern on the substrate 10 in the pixel region 100 is formed. 22 and the second light-shielding layer 122 and the vernier layer 28 in the landing accuracy test area 200. In this step, the vernier layer 28 is formed in a region (evaluation region) partitioned by the second light shielding layer 122.

(2) Formation of Bank Layer The steps described below are the same as the steps of manufacturing the color filter of the first embodiment. That is, as shown in FIG. 8C, in the pixel region 100 and the landing accuracy test region 200, the resin layer 240 is formed on the substrate 10 on which the first and second light shielding layers 22 and 122 are formed. Thereafter, exposure is performed using a photomask M1, and further development is performed, whereby the resin layer 240 is patterned to form the bank layer 24 in the pixel region 100 as shown in FIG. The region 20 is formed, and the landing accuracy test layer 26 is formed in the landing accuracy test region 200. Further, in this step, the color element forming region 330 partitioned by the light shielding region 20 is formed in a predetermined matrix pattern. Then, if necessary, the surface of the substrate is subjected to a surface treatment before the color element forming step performed later.

(3) Drop Material Impact Accuracy Test Next, before the color element 32 is formed in the pixel region 100, the droplet material used for forming the color element 32 is used in the impact accuracy test area 200 for the impact accuracy test. The droplet material is landed on the layer 26, and the landing accuracy of the droplet material is measured. Also in the present embodiment, the color elements 32 are formed by applying the droplet material discharge method as in the first embodiment. That is, in the present embodiment, the droplet material landing accuracy is measured in the landing accuracy test area 200 by the same method as in the first embodiment.

  First, as shown in FIG. 9A, in the landing accuracy test area 200, a droplet material is applied onto the landing accuracy test layer 26 to form a convex droplet material layer 320. As described above, the landing accuracy of the droplet material depends on the relative position between the convex layer 320 and the edge 122a (see FIG. 10) of the second light shielding layer 122, and the relative position between the landed convex layers 320. Evaluate by position etc. Furthermore, in the color filter 1001 of the present embodiment, since the vernier layer 28 is formed on the substrate 10, as shown in FIG. The displacement of the impact position of the material can be clearly identified.

  As a result of the above-described droplet material landing accuracy test, if the landing accuracy is not favorable, after adjusting as needed to improve the landing accuracy, the results are shown in FIGS. 9B to 9D. As shown, the same process as the process of manufacturing the color filter of the first embodiment is performed to manufacture the color filter 1001.

  The color filter 1001 according to the second embodiment has the vernier layer 28 formed on the substrate 10 in addition to the functions and effects of the color filter 1000 according to the first embodiment. The deviation of the landing position of the droplet material from the position relative to the layer 28 can be more clearly identified.

[Third Embodiment]
(Drop material landing accuracy test board for color filter)
FIG. 11 is a partial plan view schematically showing a droplet material landing accuracy test substrate for a color filter according to a third embodiment of the present invention, and FIG. 12 is taken along line AA in FIG. It is a fragmentary sectional view showing a part typically.

  The droplet material landing accuracy test substrate 1002 for a color filter according to the present embodiment has a structure similar to the landing accuracy test region 200 constituting the color filter 1001 of the second embodiment described above. That is, the pixel region 100 shown in FIG. 6 is not provided on the droplet material landing accuracy test substrate 1002, and the landing accuracy test region 200 shown in FIG. 6 is formed over the entire surface. In the color filter droplet material landing accuracy test substrate 1002, portions having substantially the same functions as those of the color filter 1001 according to the second embodiment are denoted by the same reference numerals, and detailed description thereof is omitted. I do.

  The droplet material landing accuracy test substrate 1002 for a color filter includes a landing accuracy test area 200. The landing accuracy test area 200 includes the light-shielding layer 122 and the landing test layer 26 formed so as to cover the light-shielding layer 122. The droplet material landing accuracy test substrate 1002 is created for performing a landing accuracy test of the droplet material. The landing accuracy test region 200 provided on the landing accuracy test substrate 1002 is partitioned by the light shielding layer 122 similarly to the landing accuracy test region 200 (see FIG. 2) of the color filter 1000 according to the first embodiment. An area (evaluation area) is provided. In the manufacturing process of the color filter, before actually manufacturing the color filter, a landing accuracy test of the droplet material at the time of forming the color element is performed using the droplet material landing accuracy test substrate 1002.

  The droplet material landing accuracy test substrate 1002 has the same structure as a color filter actually manufactured except that no pixel region is formed. That is, the droplet material landing accuracy test substrate 1002 is formed using the same substrate as the actually manufactured color filter, and has the light shielding layer 122 of the same pattern as the light shielding layer formed on the actually manufactured color filter. . Further, a vernier layer 28 is formed in a region surrounded by the light shielding layer 122 on the substrate 10, and a landing accuracy test layer 26 is formed on the substrate 10.

(Method of manufacturing droplet material landing accuracy test board for color filter)
The color filter droplet material landing accuracy test substrate 1002 can be manufactured by the same process as the process of forming the landing accuracy test region 200 in the color filter 1001 of the second embodiment. Further, in this embodiment, the landing accuracy test of the droplet material can be performed in the same step as the step shown in FIG. 9 in the second embodiment. In this case, as described above, the landing accuracy test of the droplet material on the droplet material landing accuracy test substrate 1002 is performed before the color filter to be actually manufactured.

  FIG. 13 is a partial plan view schematically showing the droplet material landing accuracy test substrate 1002 after the droplet material landing accuracy test, and is an enlarged view of the vicinity of line AA in FIG.

  Since the droplet material landing accuracy test substrate 1002 has the same structure as the actually manufactured color filter, the landing accuracy test can be performed in the same manner as the test for the actually manufactured color filter. Further, according to the present embodiment, before manufacturing a color filter, a droplet material landing accuracy test is performed on the droplet material landing accuracy test substrate 1002, which is a test dedicated substrate. Since the second light-shielding layer 122 having the same pattern as that of a color filter to be actually manufactured is formed on the droplet material landing accuracy test substrate 1002, a test is performed on the droplet material landing accuracy test substrate 1002 in advance. After that, the landing accuracy of the droplet material is sufficiently confirmed, and the landing accuracy is increased, the color elements of the actually manufactured color filter can be formed. This makes it possible to manufacture a color filter having high contrast without pixel defects or uneven color tone.

[Fourth Embodiment]
(Electro-optical device)
FIG. 14 is a cross-sectional view of a color liquid crystal display device as an example of an electro-optical device incorporating the color filter 1000 according to the first embodiment. FIG. 14 shows only the pixel region 100 in the color filter 1000.

  The color liquid crystal display device 1100 is generally configured by combining a color filter 1000 and a counter substrate 80 and sealing a liquid crystal composition 70 between them. On the inner surface of one substrate 80 of the liquid crystal display device 1000, a TFT (thin film transistor) element (not shown) and pixel electrodes 52 are formed in a matrix. Further, as another substrate, a color filter 1000 is provided so that red, green, and blue color elements 32 are arranged at positions facing the pixel electrodes 52. Alignment films 60 and 62 are formed on each of the opposing surfaces of the substrate 80 and the color filter 1000. These alignment films 60 and 62 have been rubbed, and can arrange liquid crystal molecules in a certain direction. Polarizing plates 90 and 92 are adhered to the outer surfaces of the substrate 10 and the color filter 1000, respectively. As a backlight, a combination of a fluorescent lamp (not shown) and a scattering plate is generally used, and display is performed by causing the liquid crystal composition to function as an optical shutter that changes the transmittance of backlight. .

  In the present embodiment, an example is shown in which the color filter 1000 of the first embodiment is incorporated in a liquid crystal display device. However, instead of the color filter 1000, the color filter 1001 of the second embodiment is used. And a liquid crystal display device can be produced by incorporating the same.

[Fifth Embodiment]
(Light emitting substrate and electro-optical device)
FIG. 15 is a cross-sectional view of a color EL display device 1200 as an example of a light emitting substrate 1003 and an electro-optical device incorporating the light emitting substrate 1003. FIG. 16 is a plan view schematically showing the light emitting substrate 1003 shown in FIG. In this embodiment mode, a case where the light emitting substrate 1003 is a color light emitting substrate will be described. Note that portions having the same structure as the color filter 1000 according to the first embodiment and having the same operation and effect are denoted by the same reference numerals and description thereof will be omitted.

  As shown in FIG. 15, the color EL display device 1200 includes a base 112 and a light emitting substrate 1003 provided on the base 112.

  First, the outline of the light emitting substrate 1003 will be described. As shown in FIGS. 15 and 16, the light emitting substrate 1003 includes a pixel region 110 and a peripheral region. Here, the peripheral region refers to a region arranged adjacent to the pixel region 110. This peripheral region includes a landing accuracy test region 210. That is, the landing accuracy test area 210 is located outside the pixel area 110. The landing accuracy test area 210 includes an evaluation area included in the peripheral area and having a shape corresponding to the shape of the light emitting area 230. First, the pixel region 110 will be described.

(1) Pixel Region As shown in FIGS. 15 and 16, the pixel region 110 includes a bank region (partition region) 220 and a light emitting region 230. The bank region 220 and the light emitting region 230 are formed on the base 111. Further, the light emitting area 230 is partitioned by the bank area 220. Specifically, as shown in FIG. 16, in the pixel region 110, the light emitting region 230 is partitioned by the bank region 220.

  Further, the pixel region 110 further includes a switching element 202 formed on the base 111.

  The substrate 111 functions as a support and a surface from which light is extracted at the same time. Therefore, the substrate 111 is selected in consideration of light transmission characteristics and thermal stability. Examples of the transparent substrate material used for the substrate 111 include a glass substrate and a transparent plastic.

  The switching element 202 includes, for example, a TFT element. Adjacent switching elements 202 are separated by an insulating layer 221.

  The light emitting region 230 includes a functional layer and a pair of electrode layers including first and second electrode layers 227 and 229. The functional layer includes a light emitting layer and, if necessary, a hole transport / injection layer. In the light emitting substrate 1003 of the present embodiment, the functional layer includes the light emitting layer 42 (42g, 42r, 42b) and the hole transport / injection layer 204.

  The light emitting layers 42 are arranged in a predetermined matrix pattern on the substrate 111 and are partitioned by the bank regions 220. The light emitting layer 42 is formed between the first electrode layer 227 and the second electrode layer 229, as shown in FIG. In the present embodiment, the light-emitting layer 42 includes a plurality of light-emitting layers 42r, 42g, and 42b having red, green, and blue colors constituting the three primary colors of light. These light emitting layers 42 are arranged in a predetermined arrangement, for example, in an arrangement pattern such as a stripe arrangement, a delta arrangement, or a mosaic arrangement, and one pixel is constituted by three consecutive color elements. In the present embodiment, the light emitting layer 42 is formed of a material that can emit light by electroluminescence.

  In the light-emitting substrate 1003 of this embodiment, a hole transport / injection layer 204 can be formed between the first electrode layer 227 and the light-emitting layer 42 as shown in FIG. Here, the hole transport / injection layer is a layer that can transport holes or effectively inject holes from the anode to the light emitting layer.

  The bank region 220 is mainly formed to partition the light emitting layer 42. As the bank region 220, a stacked body including a bank insulating layer (first insulating layer) 222 and a resin layer 224 can be used. The bank insulating layer 222 is made of, for example, a silicon oxide layer. The resin layer 224 is made of, for example, polyimide. The bank insulating layer 222 is stacked on the insulating layer 221, and the resin layer 224 is formed on the bank insulating layer 222. The bank insulating layer 222 has a function of partitioning the light emitting region 230 as a component of the bank region 220 and separating adjacent first electrode layers 227 from each other.

The first and second electrode layers 227 and 229 are provided for giving a charge to the light emitting layer 42. In this embodiment mode, a case where the first electrode layer 227 is an anode and the second electrode layer 229 is a cathode is described. For the first electrode layer 227, a metal, an alloy, an electrically conductive compound, or a mixture thereof having a high work function (for example, 4 eV or more) can be used. For example, the first electrode layer 227 is made of a transparent conductive material such as ITO, CuI, SnO ₂ , and ZnO. Further, as the second electrode layer 229, an electron injecting metal, an alloy electrically conductive compound, and a mixture thereof can be used.

(2) Impact Accuracy Test Area The impact accuracy test area 210 is included in the peripheral area. The landing accuracy test area 210 includes an area included in the peripheral area and having a shape corresponding to the shape of the light emitting area 230. Regions having a shape corresponding to the shape of the light emitting region 230 are arranged. Specifically, a landing accuracy test layer 226 is formed in the landing accuracy test region 210 as shown in FIG. Similarly to the pixel region 110, the landing accuracy test region 210 includes a switching element 202 formed on the substrate 111, a bank insulating layer (second insulating layer) 222 for separating the adjacent switching element 202, The first electrode layer 227 formed on the bank insulating layer 222 and connected to the switching element 202 and the bank insulating layer 222 separating the adjacent first electrode layer 227 are formed.

  The landing accuracy test layer 226 is provided in the peripheral region so as to cover a region having a shape corresponding to the shape of the light emitting region 230, and has a property of repelling a droplet material. The landing accuracy test layer 226 can be formed from the same material as the resin layer 224 of the bank region 220 constituting the pixel region 110. For example, when the resin layer 224 is formed of a polyimide resin, the landing accuracy test layer 226 can be similarly formed of a polyimide resin.

  The bank insulating layer (second insulating layer) 222 forming the landing accuracy test area 210 is formed in the same step as the bank insulating layer (first insulating layer) 222 forming the bank area 220 in the pixel area 110. Can be formed. That is, the first bank insulating layer 222 forming the landing accuracy test region 210 is formed in the pixel region 110 at the same height as the second bank insulating layer 222 forming the bank region 220 in the pixel region 110, And it can have the same pattern.

  Further, the switching element 202 formed in the landing accuracy test area 210 can be formed in the same step as the switching element 202 formed in the pixel area 110, and can have the same structure.

  In the light emitting substrate 1003 of the present embodiment, the vernier layer 228 is formed on the substrate 111 in the landing accuracy test area 210 as shown in FIG. The vernier layer 228 has the same operation and effect as the vernier layer forming the color filter in the above-described second embodiment. In the light emitting substrate 1003 of the present embodiment, the vernier layer 228 is formed at the same height as the metal wiring layer (not shown) forming the switching element 202 from the base 112. In this case, the vernier layer 228 can be formed from the same material as the metal wiring layer. For example, when the metal wiring layer is made of chromium or aluminum, the vernier layer 228 can also be formed of chromium or aluminum.

(Device operation)
Next, an operation and an operation of the color EL display device 1200 in which the light emitting substrate 1003 shown in FIG. 15 is formed will be described.

  By applying a predetermined voltage to the first electrode layer (anode) 227 and the second electrode layer (cathode) 229, electrons are injected from the cathode 229 and holes are injected from the anode 227 into the light emitting layer 42, respectively. . In the light emitting layer 42, the electrons and holes are recombined to generate excitons, and when the excitons are deactivated, light such as fluorescence or phosphorescence is generated.

(Production method of light emitting substrate)
Next, a method for manufacturing the light emitting substrate 1003 of the present embodiment will be described with reference to FIGS. 17 (A) to 17 (C) and FIGS. 18 (A) to 18 (C) are partial cross-sectional views schematically showing a manufacturing process of the light emitting substrate 1003 shown in FIG. It is a figure showing the section cut along C side.

(1) Formation of Light-Shielding Layer First, as shown in FIG. 17A, in the pixel region 110 and the landing accuracy test region 210, the switching element 202 on the substrate 111 and the insulating layer 221 for separating the adjacent switching element 202 are formed. , A first electrode layer 227 and a bank insulating layer (first and second insulating layers) 222 having a predetermined pattern are sequentially formed by a known method. Here, as shown in FIG. 17A, before forming the first electrode layer 227, an opening is formed in a predetermined region (region located on the switching element 202) of the insulating layer 221, and then the insulating layer 221 is formed. By forming the first electrode layer 227 over the layer 221, the switching element 202 and the first electrode layer 227 are electrically connected. In a step described later, as shown in FIG. 16, a light emitting region 230 is formed in a portion where the bank insulating layer 222 is not formed.

  Subsequently, after a photosensitive resin layer (not shown) is formed on the entire surface, patterning is performed by photolithography, so that a resin layer 224 is formed on the bank insulating layer 222 in the pixel region 110, so that the bank region 220 is formed. And a landing precision test layer 226 is formed on the bank insulating layer 222 and the first electrode layer 227 in the landing precision test area 210. Further, by forming the bank region 220, an opening is formed in a region where the light emitting region 230 is formed in a step described later. That is, this opening becomes the functional layer formation region 430. That is, the functional layer formation region 430 is a region defined by the bank region 220, and is a region where a functional layer (the light emitting layer 42 and the hole transport / injection layer 204) is formed in a step described later.

(2) Formation of Hole Transport / Injection Layer Next, as shown in FIGS. 17B and 17C, droplet material discharge by the droplet material discharge head 500 used in the droplet material discharge method. The hole transport / injection layer 204 is formed in the functional layer formation region 430 by applying a method. As the material 502 for forming the hole transport / injection layer 204, for example, a mixture of polyethylene dioxythiophene and polystyrene sulfonate can be used. In this embodiment, the hole transport / injection layer of the same material is formed for each color dot. However, depending on the case, the hole transport / injection material suitable for the light emitting layer may be used for each light emitting layer. A hole transport / injection layer may be formed.

(3) Drop Material Impact Accuracy Test Next, before the light emitting layer 42 is formed in the pixel region 110, in the impact accuracy test region 210, the droplet material used for forming these light emitting layers 42 is ejected with the landing accuracy. The droplet material is landed on the test layer 226, and the landing accuracy of the droplet material is measured.

  In this embodiment mode, the light-emitting layer 42 is formed by applying a droplet material discharge method, similarly to the method used in forming the hole transport / injection layer 204 described above.

  When the droplet material is applied by the droplet material discharge method, as described above, the reason why the droplet material does not land at an assumed position is that the droplet material discharge head is bent and installed, It can be considered that the nozzle itself used for discharging the ink is bent, the droplet material is bent and discharged from the nozzle, and the relative position between the substrate and the droplet material discharge head is shifted. The impact accuracy of the droplet material can be improved by evaluating the impact accuracy of the droplet material by the method described below and investigating these causes.

  First, as shown in FIG. 18A, a droplet material is applied onto the landing accuracy test layer 226 in the landing accuracy test region 210 to form a convex droplet material layer 420. Here, the convex layer 420 lands the convex layer 420 in a region of the landing accuracy test layer 226 that is located above the bank region 222, that is, a region that is located inside the edge 222 a of the bank region 222 ( See FIG. 16). As shown in FIG. 16, the landing accuracy of the droplet material is evaluated based on a relative position between the convex layer 420 and the edge 222a of the bank region 222 and / or a relative position between the landed convex layers 420. . When evaluating the relative positions of the convex layers 420, as shown in FIG. 16, a plurality of convex layers 420 are formed on the landing accuracy test layer 226, and the landing accuracy is determined by the relative positions between the convex layers 420. evaluate.

  In the present embodiment, in each of the pixel region 110 and the landing accuracy test region 210, the bank insulating layer 222 is formed in the same pattern. Therefore, in the landing accuracy test region 210, the function of the pixel region 110 is achieved by landing the convex layer 420 on the landing accuracy test layer 226 in the region surrounded by the edge 222a of the bank region 222. The landing accuracy of the droplet material can be evaluated on the assumption that the droplet material lands on the layer formation region 430.

  If the landing accuracy is not favorable as a result of the above-described droplet material landing accuracy test, adjustment is made as needed to improve the landing accuracy.

(4) Formation of Light Emitting Layer Subsequently, the light emitting layer 42 (42g, 42r, 42b) that actually becomes a pixel is formed. First, as shown in FIG. 18B, a droplet material for a red light emitting layer, a droplet material for a green light emitting layer, and a droplet material for a blue light emitting layer are transported / injected by a droplet material discharging method. Each is applied on the layer 204. After that, the solvent is removed, heat treatment is continuously performed in a nitrogen atmosphere, and the droplet material composition is cured or conjugated. As shown in FIG. 18C, the three primary colors of red, green, and blue are used. The light emitting layer 42r, the green light emitting layer 42g, and the blue light emitting layer 42b are formed. The light emitting layer conjugated by the heat treatment is insoluble in the solvent. Through the above steps, the light emitting region 230 shown in FIG. 15 is formed.

  According to such a droplet material discharging method, fine patterning can be performed easily and in a short time. Further, the film thickness can be changed by changing the solid content concentration and the ejection amount of the droplet material.

  Further, before forming the light-emitting layer 42, the hole transport / injection layer 204 may be subjected to continuous plasma processing using oxygen gas and fluorocarbon plasma. Thus, a fluorinated layer is formed on the hole transport / injection layer 204 and the ionization potential is increased, so that an organic EL substrate having excellent hole injection efficiency can be provided.

  Note that, depending on the type of the light emitting material, one or two colors of the organic light emitting layer can be formed by a droplet material discharge method, and the other two or one color can be formed by a conventional coating method. According to this method, a full-color organic EL substrate can be formed by combining a light emitting material that is not very suitable for the droplet material discharging method with another organic light emitting material used for the droplet material discharging method. Therefore, the degree of freedom in element design increases. In addition, as a coating method other than the droplet material discharging method, a printing method, a transfer method, a dipping method, a spin coating method, a casting method, a capillary method, a roll coating method, a bar code method, and the like can be mentioned.

(5) Formation of Second Electrode Layer Next, as shown in FIG. 15, a second electrode layer 229 is formed as a cathode. As the second electrode layer 229, a metal thin film can be used. Examples of the metal forming the second electrode layer 229 include magnesium, silver, aluminum, and lithium. In addition to these, a material having a small work function can be used. For example, an alkali metal, an alkaline earth metal such as potassium, and an alloy containing these can be used. Further, a fluorinated metal can also be used. Such a second electrode layer 229 can be formed by an evaporation method, a sputtering method, or the like.

  Further, a protective film may be formed on the second electrode layer 229. By forming the protective film, the second electrode layer 229 and each light emitting layer 42 can be prevented from being deteriorated, damaged, peeled off, and the like.

  Examples of a constituent material of such a protective film include an epoxy resin, an acrylic resin, and liquid glass. Examples of the method for forming the protective film include a spin coating method, a casting method, a dipping method, a bar code method, a roll coating method, and a capillary method.

  The second electrode layer 229 can be provided depending on the configuration of the electro-optical device to which the light-emitting body is applied. After that, the light emitting substrate 1003 is cut at a predetermined position to form a plurality of light emitting bodies.

  In the above-described manufacturing method, a known substance can be used as a material of each layer. As materials for the hole transport / injection layer, the light emitting layer, and the like, those described in Japanese Patent Application Nos. 11-134320 and 11-250486 by the present applicant can be used.

  In the above-described manufacturing method, the example in which the hole transport / injection layer and the light emitting layer constituting the color dot are formed by the droplet material discharge method has been described, but only the light emitting layer may be used. Alternatively, an electron transport / injection layer may be further provided.

  Further, like the droplet material landing accuracy test substrate for a color filter according to the third embodiment, a droplet material landing accuracy test substrate in which the pixel region 110 is not formed in the light emitting substrate 1003 according to the present embodiment is formed. (See a seventh embodiment described later). According to the droplet material landing accuracy test substrate for the light emitting substrate, the droplet material landing accuracy test substrate including the first electrode layer 227 and the bank insulating layer 222 having the same pattern as the actually manufactured light emitting substrate is used. By performing the droplet material landing accuracy test, the landing accuracy of the droplet material can be sufficiently confirmed, the landing accuracy can be increased, and then the light emitting layer of the light emitting substrate actually manufactured can be formed. This makes it possible to manufacture a light emitting substrate having high contrast without pixel defects or uneven color tone.

[Sixth Embodiment]
(Electronics)
Hereinafter, examples of electronic devices using a liquid crystal display device as an electro-optical device according to the invention will be described.

(1) Digital Still Camera A digital still camera using a liquid crystal display device 1100 according to a fourth embodiment of the present invention as a finder will be described. FIG. 19 is a perspective view showing the configuration of the digital still camera, and also simply shows the connection with an external device.

  While an ordinary camera exposes a film with an optical image of a subject, a digital still camera 2000 generates an image signal by photoelectrically converting an optical image of the subject by an image sensor such as a CCD (Charge Coupled Device). It is. Here, the liquid crystal panel of the liquid crystal display device 1100 described above is provided on the back surface (the front surface side in FIG. 19) of the case 2202 in the digital still camera 2000, and the display is performed based on the image pickup signal by the CCD. ing. Therefore, the liquid crystal display device 1100 functions as a finder that displays a subject. A light receiving unit 2204 including an optical lens, a CCD, and the like is provided on the front side (the rear side in FIG. 19) of the case 2202.

  Here, when the photographer checks the subject image displayed on the liquid crystal display device 1100 and presses the shutter button 2206, the imaging signal of the CCD at that time is transferred and stored in the memory of the circuit board 2208. In the digital still camera 2000, a video signal output terminal 2212 and an input / output terminal 2214 for data communication are provided on the side surface of the case 2202. As shown in FIG. 19, a television monitor 2300 is connected to the video signal output terminal 2212, and a personal computer 2400 is connected to the input / output terminal 2214 for data communication, as necessary. You. Further, the imaging signal stored in the memory of the circuit board 2208 is output to the television monitor 2300 and the personal computer 2400 by a predetermined operation.

(2) Cellular Phone and Other Electronic Devices FIGS. 20A, 20B, and 20C show an example of another electronic device using a liquid crystal display device as the electro-optical device according to the present invention. FIG. FIG. 20A illustrates a mobile phone 3000, which includes a liquid crystal display device 1100 above the front surface thereof. FIG. 20B illustrates a wristwatch 4000 in which a display portion using a liquid crystal display device 1100 is provided at the center of the front of the main body. FIG. 20C illustrates a portable information device 5000 including a display portion including a liquid crystal display device 1100 and an input portion 5100.

  These electronic devices include various circuits such as a display information output source, a display information processing circuit, a clock generation circuit, and a power supply circuit that supplies power to those circuits, which are not shown, in addition to the liquid crystal display device 1100. And a display signal generation unit. For example, in the case of the portable information device 5000, a display image is formed by supplying a display signal generated by the display signal generation unit based on information input from the input unit 5100 to the display unit.

  Electronic devices into which the liquid crystal display device 1100 according to the present invention is incorporated are not limited to digital still cameras, mobile phones, watches, and portable information devices, but also electronic notebooks, pagers, POS terminals, IC cards, minidisc players, and liquid crystal projectors. , Multimedia compatible personal computer (PC) and engineering workstation (EWS), notebook personal computer, word processor, television, viewfinder or monitor direct view type video tape recorder, electronic notebook, electronic desk calculator, car navigation system Various electronic devices such as a device equipped with a touch panel and a clock can be considered.

  In terms of the driving method, a liquid crystal display panel is a simple matrix liquid crystal display panel or a static drive liquid crystal display panel that does not use a switching element in the panel itself, a three-terminal switching element represented by a TFT (thin film transistor), or a TFD (thin film). Active matrix liquid crystal display panel using a two-terminal switching element represented by a diode), and various types of liquid crystal such as TN type, STN type, guest host type, phase transition type, and ferroelectric type in terms of electro-optical characteristics. Panels can be used.

  Although the device according to the invention has been described in accordance with some specific embodiments thereof, the invention is capable of various modifications within the spirit and scope of the invention. For example, in the above-described embodiment, the case where the liquid crystal display device 1100 according to the fourth embodiment of the present invention is used as the image display means (electro-optical display unit) of the electro-optical device has been described. However, the present invention is not limited to this. For example, the EL display device 1200 according to the fifth embodiment of the present invention can be used. In addition, the electro-optical device of the present invention can be applied to various types of electric devices such as a thin television, a small television using a liquid crystal shutter, an electroluminescence, a plasma display, a CRT display, a FED (Field Emission Display) panel, an electrophoretic display device, etc. It can be applied to optical means.

[Seventh Embodiment]
(Drop material landing accuracy test substrate for light emitting substrate)
FIG. 21 is a partial plan view schematically showing a droplet material landing accuracy test substrate 1004 for a light emitting substrate according to a seventh embodiment of the present invention.

  A droplet material landing accuracy test substrate 1004 for a light emitting substrate according to the present embodiment is similar to the landing accuracy test region 210 (see FIG. 15) constituting the light emitting substrate 1003 of the fifth embodiment described above. Having a structure. That is, the droplet material landing accuracy test substrate 1004 shown in FIG. 21 is not provided with the pixel region 100 shown in FIG. 15, and the landing accuracy test region 210 shown in FIG. 15 is formed over the entire surface. In the droplet material landing accuracy test board 1004 for the light emitting substrate, portions having substantially the same functions as those of the light emitting substrate 1003 according to the fifth embodiment are denoted by the same reference numerals, and detailed description thereof will be given. Is omitted.

  The droplet material landing accuracy test substrate 1004 for the light emitting substrate includes the switching element 202, the electrode 227, the bank insulating layer 222, and the landing accuracy test layer 226 formed on the substrate 111. The electrode 227 is connected to the switching element 202, and the landing test layer 226 is formed on the electrode 227. The bank insulating layer 226 has a predetermined pattern and has a function of separating adjacent electrodes 227.

  The droplet material landing accuracy test substrate 1004 is created for performing a landing accuracy test of the droplet material. That is, in the manufacturing process of the light emitting substrate, before actually manufacturing the light emitting substrate, a landing accuracy test of the droplet material at the time of forming the functional layer is performed using the droplet material impact accuracy test substrate 1004.

  The droplet material landing accuracy test substrate 1004 has a structure similar to that of an actually manufactured light emitting substrate, except that no pixel region is formed. That is, the droplet material landing accuracy test substrate 1004 is created using the same substrate as the light emitting substrate actually manufactured. The bank insulating layer 226 and the electrode 227 have the same pattern as the bank insulating layer 226 and the electrode 227 of the light emitting substrate 1003 shown in FIG. A vernier layer 228 made of a metal layer is formed on the substrate 111. The vernier layer 228 can be formed at the same height as the metal wiring layer (not shown) constituting the switching element 202 from the base 112, similarly to the light emitting substrate 1003 shown in FIG.

(Manufacturing method for droplet material landing accuracy test substrate for light emitting substrate)
The droplet material landing accuracy test substrate 1004 for the light emitting substrate can be manufactured by the same process as the process of forming the landing accuracy test region 210 in the light emitting substrate 1003 of the fifth embodiment. Further, in this embodiment, the landing accuracy test of the droplet material can be performed in the same step as the step shown in FIG. 18A in the fifth embodiment. In this case, as described above, the landing accuracy test of the droplet material on the droplet material landing accuracy test substrate 1004 is performed before actually manufacturing the light emitting substrate to be manufactured.

  Since the droplet material landing accuracy test substrate 1004 has a structure similar to that of an actually manufactured light emitting substrate, it is possible to perform a landing accuracy test in the same manner as a test for an actually manufactured light emitting substrate. it can. Further, according to the present embodiment, before manufacturing a light emitting substrate, a droplet material landing accuracy test is performed on a droplet material landing accuracy test substrate 1004 which is a test dedicated substrate. As a result of the test, a convex layer (not shown in FIG. 21) is formed on the landing accuracy test layer 226, similarly to the light emitting substrate 1003 shown in FIG.

  The droplet material landing accuracy test substrate 1004 is formed with the bank insulating layer 222 and the electrode layer 227 having the same pattern as the light emitting substrate actually manufactured. After performing a test in advance and sufficiently confirming the landing accuracy of the droplet material and increasing the landing accuracy, the functional layer of the light emitting substrate to be actually manufactured can be formed. This makes it possible to manufacture a light emitting substrate having high contrast without pixel defects or uneven color tone.

FIG. 2 is a partial plan view schematically showing the color filter according to the first embodiment of the present invention. FIG. 2 is a partial cross-sectional view schematically illustrating a portion along line AA in FIG. 1. FIGS. 3A to 3D are partial cross-sectional views schematically showing steps of manufacturing the color filter shown in FIGS. FIGS. 3A to 3D are partial cross-sectional views schematically showing steps of manufacturing the color filter shown in FIGS. FIG. 5 is a partial plan view schematically showing a color filter obtained by the steps shown in FIGS. 3 and 4, and is an enlarged view of the vicinity of line AA in FIG. 1. FIG. 9 is a partial plan view schematically illustrating a color filter according to a second embodiment of the present invention. FIG. 7 is a partial cross-sectional view schematically illustrating a portion along the line AA in FIG. 6. FIGS. 8A to 8D are partial cross-sectional views schematically showing steps of manufacturing the color filter shown in FIGS. 6 and 7. FIGS. 8A to 8D are partial cross-sectional views schematically showing steps of manufacturing the color filter shown in FIGS. 6 and 7. FIG. 10 is a partial plan view schematically showing a color filter obtained by the steps shown in FIGS. 8 and 9, and is an enlarged view of the vicinity of line AA in FIG. 6. FIG. 11 is a partial plan view schematically showing a droplet material landing accuracy test substrate for a color filter according to a third embodiment of the present invention. FIG. 12 is a partial cross-sectional view schematically illustrating a portion along the line AA in FIG. 11. FIG. 12 is a partial plan view schematically illustrating a color filter obtained by a manufacturing process of a droplet material landing accuracy test substrate for a color filter according to a third embodiment, in which the vicinity of line AA in FIG. 11 is enlarged. FIG. FIG. 14 is a cross-sectional view schematically illustrating a liquid crystal display device as an example of an electro-optical device according to a fourth embodiment of the invention. FIG. 15 is a cross-sectional view schematically illustrating an EL display device as an example of an electro-optical device according to a fifth embodiment of the invention. It is sectional drawing which shows the board | substrate for light emission shown in FIG. 15 typically. FIGS. 17A to 17C are partial cross-sectional views schematically showing the steps of manufacturing the light emitting substrate shown in FIG. FIGS. 17A to 17C are partial cross-sectional views schematically showing the steps of manufacturing the light emitting substrate shown in FIG. It is a perspective view showing a digital still camera as an example of electronic equipment concerning a 6th embodiment of the present invention. (A) to (C) show application examples of an electronic device according to a sixth embodiment of the present invention, wherein (A) is a mobile phone, (B) is a wristwatch, and (C) is a mobile phone. Information equipment. FIG. 14 is a partial plan view schematically showing a droplet material landing accuracy test substrate for a light emitting substrate according to a seventh embodiment of the present invention.

Explanation of reference numerals

Reference Signs List 10 substrate, 10a exposed surface of substrate 10, 20 light shielding area, 22 first light shielding layer,
24 bank layers, 26 landing accuracy test layers, 28 vernier layers, 30 transmission areas,
32, 32r, 32g, 32b color element, 40 overcoat layer,
42, 42r, 42g, 42b light emitting layer, 50 common electrode, 52 pixel electrode,
60,62 alignment film, 70 liquid crystal layer, 80 substrate, 90,92 polarizing plate,
100,110 pixel areas, 108a layer, 111 substrate, 112 base,
113 second electrode layer, 122 light shielding layer (second light shielding layer), 122a second light shielding layer,
122 edge, 200, 210 landing test area, 202 switching element,
204 hole transport / injection layer, 220 bank region, 221 insulating layer,
222 bank insulating layer, 222a edge of insulating layer 222, 224 resin layer,
226 landing accuracy test layer, 227 first electrode layer, 228 vernier layer,
229 second electrode layer, 230 light emitting region, 240 resin layer,
320, 420 convex layer, 330 color element forming area, 430 functional layer forming area,
500,600 droplet material discharge head, 502 hole transport / injection layer forming material,
602, 604, 606 droplet material, 1000, 1001 color filter,
1002 Drop material landing accuracy test board for color filter, 1003 Light emitting board,
1004 droplet material landing accuracy test substrate for light emitting substrate, 1100 liquid crystal display device,
1200 EL display device, 2000 digital still camera,
2002 case, 2204 optical unit, 2206 shutter button,
2208 circuit board, 2212 video signal output terminal,
2214 Input / output terminal for data communication, 2300 TV monitor,
2400 personal computer, 3000 mobile phone, 4000 wristwatch,
5000 portable information equipment, 5100 input unit, M1, M2 mask,
R1, R2, R3 resist layer

Claims (8)

In a film forming method using a droplet material,
A step of forming a landing accuracy confirmation pattern in an evaluation region in a landing accuracy test region located outside the film formation region,
In the landing accuracy test area, a step of forming a landing accuracy test layer so as to cover at least the landing accuracy confirmation pattern,
Forming a convex layer by discharging a droplet material at a position corresponding to the landing accuracy check pattern position on the landing accuracy test layer,
A step of evaluating the landing accuracy based on the landing accuracy confirmation pattern and the relative position of the convex layer,
A film forming method comprising:   2. The film forming method according to claim 1, wherein the landing accuracy test layer has a property of repelling the droplet material. In a film forming method using a droplet material,
A step of forming a landing accuracy confirmation pattern in an evaluation region in a landing accuracy test region located outside the film formation region,
In the landing accuracy test area, a step of forming a landing accuracy test layer so as to cover at least the landing accuracy confirmation pattern,
Forming a plurality of convex layers by discharging a droplet material at a position corresponding to the landing accuracy check pattern position on the landing accuracy test layer,
A step of evaluating landing accuracy based on the relative positions of the plurality of convex layers,
A film forming method comprising:   4. The film forming method according to claim 3, wherein the landing accuracy test layer has a property of repelling the droplet material. In the film forming equipment,
Equipped with a nozzle for discharging droplet material,
Forming a landing accuracy confirmation pattern in the evaluation region in the landing accuracy test region located outside the film formation region,
In the landing accuracy test area, a landing accuracy test layer is formed so as to cover at least the landing accuracy confirmation pattern,
A convex layer is formed by discharging a droplet material from the nozzle at a position corresponding to the landing accuracy checking pattern position on the landing accuracy testing layer formed so as to cover at least the landing accuracy checking pattern. Forming
A film forming apparatus for evaluating landing accuracy based on a relative position between the landing accuracy checking pattern and the convex layer.   6. The film forming apparatus according to claim 5, wherein the landing accuracy test layer has a property of repelling the droplet material. In the film forming equipment,
Equipped with a nozzle for discharging droplet material,
Forming a landing accuracy confirmation pattern in the evaluation region in the landing accuracy test region located outside the film formation region,
In the landing accuracy test area, a landing accuracy test layer is formed so as to cover at least the landing accuracy confirmation pattern,
The landing accuracy test layer formed so as to cover at least the landing accuracy checking pattern, and the landing accuracy checking pattern position on the landing accuracy test layer formed so as to cover at least the landing accuracy checking pattern. At a corresponding position, a plurality of convex layers are formed by discharging a droplet material from the nozzle,
A deposition apparatus for evaluating landing accuracy based on the relative positions of the plurality of convex layers.   The film forming apparatus according to claim 7, wherein the landing accuracy test layer has a property of repelling the droplet material.

Images