JP2004309552A - Optical circuit member and its manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To manufacture an optical circuit member higly precisely and inexpensively by forming an alignment marker to a lens forming pattern substrate simultaneously with the formation of a diffraction grating for optical coupling in a waveguide. <P>SOLUTION: When the optical circuit member which is formed by laminating a 1st clad layer 111, a core layer 112, and a 2nd clad layer 113, forming a diffraction grating 115 in the core layer 112, and providing a lens 121 optically connected to the diffraction grating 115 outside the clad layer is manufactured, an alignment marker 130 for positioning the diffraction grating 115 and a pattern substrate 150 for forming the lens is formed as a different diffraction grating in a different area of the core layer 112 simultaneously with a process of forming the diffraction grating 115 in the core layer 1122, and positioning is carried out with the alignment marker 115 and the alignment marker 152 formed on the pattern substrate 150. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to an optical circuit member and a method of manufacturing the same, and more particularly, to an alignment mechanism in a manufacturing process of an optical circuit member provided with a microlens such as a Fresnel lens.
[0002]
[Prior art]
In recent years, with the rapid spread of the Internet, the amount of information on a network has increased dramatically, and communication information devices and information terminal devices supporting a high-speed network are required to have high-speed performance and economy.
[0003]
In order to achieve high-speed performance, it is important to increase the speed and function of the LSI, but a technique for mounting using these is also essential.
[0004]
However, if a high-speed LSI is mounted on a board and the device configuration is up to the cabinet level, there arises a problem that it is difficult to utilize the high-speed performance of the LSI due to the transmission distance between LSIs and the transmission speed limit of electric signals.
[0005]
For this reason, an attempt has been made to make a three-dimensional stacked LSI configuration in which the transmission distance between LSIs is as short as possible, and the development of an opto-electric hybrid mounting technology that uses light for signal transmission over a relatively short distance between LSIs within a board or between boards. Is underway.
[0006]
Regarding the opto-electric hybrid mounting technology, a method of optically connecting a surface emitting laser (VCSEL) and a light receiving element via an organic optical waveguide is being studied. Since the planar elements are connected to each other, the waveguide needs an optical path conversion function of bending light at a right angle, and a method of dicing the waveguide to 45 ° to form a mirror surface is used. Alternatively, a method of producing an optical pin having an optical fiber tip polished at 45 ° and inserting the optical pin into a through hole opened in a waveguide is also being studied. Further, in order to reduce optical connection loss, a method of forming a microlens between a waveguide and an optical element has been used.
[0007]
Regarding the above structure, techniques related to Non-Patent Document 1, Non-Patent Document 2, Patent Document 1, and the like are disclosed.
[0008]
As a method of inputting / outputting light to / from an optical waveguide from other than the end face and bending the optical path, there is a method of manufacturing a diffraction grating (grading) structure in an optical waveguide described in Patent Document 2 in addition to the 45 ° mirror. Are known. In addition, a method has been proposed in which a grating coupler is formed on a waveguide to convert the optical path and form the optical waveguide in a free arrangement only by processing the waveguide (Japanese Patent Application No. 2002-337078). As for a method of forming a microlens between a waveguide and an optical element, a method of producing a Fresnel lens on a waveguide clad by a photopolymerization method (2P method) has been proposed (Japanese Patent Application No. 2002-337078). .
[0009]
On the other hand, for relative positioning of an optical element, an optical element, a mask, and a mold substrate, a method using an alignment marker is generally used. As the alignment marker, a method of forming a pattern on a substrate, an optical element, an optical element using a metal film, and a method using a microlens or an array thereof are known. These techniques are described in, for example, Patent Literature 3, Patent Literature 4, Patent Literature 5, Patent Literature 6, Patent Literature 7, Patent Literature 8, and the like.
[0010]
[Patent Document 1]
JP 11-248953 A
[0011]
[Patent Document 2]
JP 2000-89186 A
[0012]
[Patent Document 3]
JP 2001-318256 A
[0013]
[Patent Document 4]
JP 2001-297996 A
[0014]
[Patent Document 5]
JP-A-2002-331532
[0015]
[Patent Document 6]
JP 2000-284135 A
[0016]
[Patent Document 7]
JP-A-8-136704
[0017]
[Patent Document 8]
JP-A-2002-122708
[0018]
[Non-patent document 1]
IEICE Transactions Vol. J84-C, No. 9, pp. 715-726 (2001)
[0019]
[Non-patent document 2]
IEICE Transactions Vol. J84-C, No. 9, pp. 736-748 (2001)
[0020]
[Problems to be solved by the invention]
When aligning a mold substrate on which a Fresnel lens is formed on a grating coupler of a waveguide, for example, when an alignment marker is formed with a thin metal film or the like on the substrate of the waveguide, the upper part of the layer on which the waveguide is formed (the lens is formed) Difference) between the substrate surface of the waveguide and the substrate surface of the waveguide, the focus may be blurred. In addition, since the positional deviation between the waveguide and the alignment marker of the substrate is accumulated, the relative positional deviation between the waveguide (grating coupler) and the lens may increase. Therefore, it is desirable that the alignment marker is formed near the upper part of the layer on which the waveguide is formed (the surface on which the lens is formed) at the same time as the formation of the waveguide.
[0021]
Further, when it is not necessary to form a metal thin film such as an electrode pattern on a substrate of a waveguide, forming a metal thin film for an alignment marker leads to an increase in cost. Therefore, it is desirable that the alignment marker is formed at the same time when the element is formed, such as when forming a waveguide.
[0022]
The present invention has been made to solve such a problem of the prior art, and an object thereof is to form an alignment marker with a mold substrate for forming a lens at the same time as forming a grating coupler on a waveguide. An object of the present invention is to enable an optical circuit member to be manufactured with high precision at a low number of steps and at low cost.
[0023]
[Means for Solving the Problems]
The optical circuit member of the present invention that achieves the above object includes a first cladding layer, a core layer having a higher refractive index than the first cladding layer, and a second cladding layer having a lower refractive index than the core layer. In this order, a relief type or refractive index modulation type diffraction grating is formed in the core layer, and the diffraction grating is optically provided outside the first cladding layer or the second cladding layer. In an optical circuit member provided with a lens connected to
An alignment marker for performing relative alignment between the diffraction grating and the mold substrate forming the lens is provided as another diffraction grating in a region different from the diffraction grating of the core layer and outside the waveguide region. It is characterized by the following.
[0024]
In this case, it is desirable that another diffraction grating is provided as the same relief type or refractive index modulation type diffraction grating as the diffraction grating.
[0025]
Further, another diffraction grating can be formed as a volume type diffraction grating inclined with respect to the plane of the core layer.
[0026]
Further, the method of manufacturing an optical circuit member according to the present invention includes the step of forming a first clad layer, a core layer having a higher refractive index than the first clad layer, and a second clad layer having a lower refractive index than the core layer. In this order, a relief type or refractive index modulation type diffraction grating is formed in the core layer, and the diffraction grating is optically provided outside the first cladding layer or the second cladding layer. In a method of manufacturing an optical circuit member provided with a lens connected to
An alignment marker for performing relative alignment between the diffraction grating and the mold substrate forming the lens, at the same time as the step of forming the diffraction grating in the core layer, in an area different from the diffraction grating in the core layer. Forming a separate diffraction grating outside the waveguide region and forming the lens by aligning the alignment marker with an alignment marker formed on a mold substrate on which the lens is formed. It is.
[0027]
In this case, the alignment marker formed on the mold substrate on which the lens is formed can be composed of a diffractive optical element.
[0028]
Further, an alignment marker formed as a different diffraction grating in a region different from the diffraction grating of the core layer can be formed as a volume type diffraction grating inclined with respect to the surface of the core layer.
[0029]
Further, a diffraction grating different from the diffraction grating can be formed as a relief type or a refractive index modulation type diffraction grating.
[0030]
In the present invention, the diffraction grating for optical coupling formed on the core layer and the alignment marker for relative positioning with the mold substrate forming the lens are formed on the core layer at the same time. The positional accuracy between the diffraction grating and the alignment marker is improved, and the height difference between the upper part of the layer on which the waveguide is formed (the surface on which the lens is formed) and the surface of the mold substrate on which the lens is formed is determined by the Since the thickness can be reduced to about the thickness, blurring of the focus can be reduced. Therefore, an optical circuit member can be manufactured with high precision, a small number of steps, and low cost.
[0031]
When the alignment marker on the mold substrate side for forming the lens is formed of a diffractive optical element, a duplicate image of the alignment marker remains on the optical circuit member at the same time as forming the lens, so the optical circuit substrate is mounted on another substrate. The duplicated image can be used as an alignment marker at this time. Further, since the present invention can be applied to a mold substrate on which a lens made of a resin material, which cannot use a metal thin film as an alignment marker, manufacturing costs can be reduced.
[0032]
Further, when the alignment marker formed on the core layer is formed as a volume-type diffraction grating inclined with respect to the surface of the core layer, the contrast of light and shade between the alignment marker and the surrounding light transmitting portion can be increased. And alignment accuracy can be improved.
[0033]
The period of the diffraction grating of the alignment marker is the same as that of the diffraction grating for optical coupling, and is determined according to the wavelength to be used. The contrast can be increased by using light near the wavelength as the observation light.
[0034]
When the propagation vectors of the guided light and the observation light are βa and βb, respectively, in order to couple two waves, K is defined as a lattice vector, and
βb = βa + qK, where q = 0, ± 1, ± 2
May be formed by using a thick refractive index modulation type diffraction grating. Here, Λ is the period of the diffraction grating, K = 2π / Λ, and q takes a value corresponding to the order of the emitted light.
[0035]
BEST MODE FOR CARRYING OUT THE INVENTION
An optical circuit member and a method of manufacturing the same according to the present invention will be described based on embodiments with reference to the drawings.
[0036]
FIG. 1A is a schematic view of one embodiment of an optical circuit member of the present invention, and FIG. 1B is a cross-sectional view of the entire optical circuit member and a mold substrate in the A1-A2 direction of FIG. 1 (c) is an enlarged view of an alignment marker portion on the mold substrate side of FIG. 1 (b), FIG. 2 is a schematic diagram of an apparatus for observing the alignment marker, and FIG. FIG. 4 is an infrared observation image of the mold substrate and the optical circuit member as viewed from above using the apparatus, and FIG. 4 is a schematic view showing a manufacturing process of the optical circuit member shown in FIG. FIG. 5 is a schematic view of an example of an opto-electric hybrid board using the optical circuit member according to the present invention.
[0037]
FIG. 1A is a diagram showing the alignment markers 130 and 131, the waveguide 110, and the Fresnel lenses 121 and 122 in a simplified and easy-to-understand state in a partially cut-away and transparent state.
[0038]
1 to 5, reference numeral 100 denotes an optical circuit member, 110 denotes an (optical) waveguide, 111 denotes a first cladding layer, 112 denotes a core layer, 113 denotes a second cladding layer, and 115 and 116 denote diffraction gratings ( 120 is a Fresnel lens layer (also called a Fresnel lens forming layer), 121 and 122 are Fresnel lenses, 130 and 131 are optical circuit member side alignment markers, 140 is a substrate, 150 is a Fresnel lens type substrate, 151 is a Fresnel lens forming part, 152 and 153 are mold substrate side alignment markers (molds), 152 'and 153' are mold substrate side alignment markers (molds) edges, 200 is an optical circuit member, and 205 is a Fresnel lens forming material. , 206 is a diffraction grating, 207 is an alignment marker on the optical circuit member side, 210 is a Fresnel lens type substrate, 220 is an objective lens 230 is a microscope, 240 is an infrared camera, 250 is a monitor, 260 is an interference filter, 270 is infrared light, 300 is an entire infrared transmission image, 310 is a transmission image of a waveguide diffraction grating portion, 320 is a transmission image of a Fresnel lens portion, 330 Numeral 331 is a transmission image of the alignment marker on the optical circuit member side, 340 and 341 are transmission images of the alignment marker on the mold substrate side, 410 is a substrate, 421 is a first cladding layer forming material, 422 is a core layer forming material, and 422A is ultraviolet light. 422 'is a waveguide, 423 is a second cladding material, 430 and 435 are photomasks, 435' is a diffraction grating, 440, 445 and 447 are ultraviolet rays, and 450 is diffraction. The lattice, 460 is a Fresnel lens type substrate, 470 is a Fresnel lens forming material, and 475 is a Fresnel lens.
[0039]
First, one embodiment of the optical circuit member of the present invention will be described with reference to FIG.
[0040]
The optical circuit member of the present example has a first clad layer 111, a core layer 112 having a higher refractive index than the first clad layer 111, and a refractive index higher than the core layer 112 on the substrate 140. In the organic optical waveguide member 100 in which the second cladding layer 113 having a lower thickness is laminated in this order, the size of the core layer 112 is, for example, 50 μm square, and a refractive index modulation type diffraction grating is provided on the core layer 112 as an alignment marker. 130 and 131 and grating couplers 115 and 116 are formed.
[0041]
Wavelength 1. Assuming that a light source in the 3 μm band is used, the inclination angles of the diffraction gratings of the grating couplers 115 and 116 are 34 °, and the period of the diffraction grating is 0.1 mm. It is set to 50 μm. The effective refractive index of the waveguide 110 is 1. 58. This satisfies the Bragg condition and radiates into the air at an angle of about 12 °. As an example, it goes without saying that the period of the diffraction gratings 115 and 116 may be set according to the wavelength to be used, the refractive index of the waveguide, and the inclination angle.
[0042]
Fresnel lenses 121 and 122 for optically connecting to grating couplers (diffraction gratings) 115 and 116 are provided above the second cladding layer 113, and the Fresnel lenses 121 and 122 are connected to the waveguide 110. It has an elliptical concentric annular shape with a long axis along the direction. Although the mold substrate 150 for forming the Fresnel lenses 121 and 122 is illustrated, a Fresnel lens forming portion 151 and mold substrate side alignment markers (molds) 152 and 153 are formed on both sides thereof (Fresnel lens). Only the side 121 is shown.) The mold substrate-side alignment markers (molds) 152 and 153 are formed by etching a plurality of times into markers 152 and 153, and edges 152 'and 153' as shown in a cross-sectional view in FIG. As such, it is made by a multi-stage step forming technique. In the present embodiment, linear markers are used as the mold substrate side alignment markers (molds) 152 and 153, but the shapes may be selected according to the requirements of alignment accuracy, such as a cross shape or an L shape. . With the cross shape or the L-shape, the alignment accuracy of the optical waveguide 110 in the axial direction is also improved. The alignment markers (molds) 152 and 153 on the mold substrate side use the multi-stage step-shaped diffractive optical element as described above, but may also use a directional reflection plate, a random dot, or the like. Good. Of course, an alignment marker obtained by patterning a metal thin film may be used.
[0043]
In such a configuration, light incident on the optical circuit member 100 is directed onto the diffraction grating 115 by the Fresnel lens 121, and the light diffracted by the diffraction grating 115 is efficiently coupled to the waveguide 110, and The light reaching the other end is diffracted by the diffraction grating 116 and emitted from the end of the waveguide 110, and the light can be efficiently incident on an optical element such as a photodiode by the Fresnel lens 122. .
[0044]
Next, a configuration example for alignment of such an optical circuit member will be described with reference to FIG. A Fresnel lens forming material 205, for example, an ultraviolet curable photopolymer is applied on the upper part of the optical circuit member 200 (100), and a Fresnel lens forming mold substrate 210 (150) is placed on the upper part thereof with a gap of about several μm. Is done. These members are held by a movable holder (not shown). The infrared light 270 is irradiated from below the optical circuit member 200 and the substrate of the optical circuit member 200 is irradiated with the infrared light 270 via a band-pass filter such as an interference filter 260 that transmits 1300 nm (1.3 μm). As described above, the optical circuit member 200 of the present example assumes a wavelength in the 1.3 μm band, and according to the wavelength to be used, the light source of light to be applied to the substrate of the optical circuit member 200 and the transmission wavelength of the interference filter 260. Needless to say, a band can be set.
[0045]
The infrared light 270 applied to the diffraction grating 206 (115, 116) and the alignment marker 207 (130, 131) of the optical circuit member 200 is coupled to the waveguide layer (core layer 112) and hardly transmits. On the other hand, other portions of the waveguide layer are transmitted, so that light density (contrast) occurs. The light transmitted through the optical circuit member 200 irradiates the mold substrate 210. In the alignment marker portions (mold substrate side alignment markers (molds) 152 and 153) of the Fresnel lens forming mold substrate 210 (150), a multi-stage step-shaped diffractive optical element is used. The light transmitted through the light is diffracted, and light and shade (contrast) occur. By observing the light with the infrared camera 240 via the optical system of the objective lens 220 and the microscope 230, a light and shade image of the light can be detected.
[0046]
FIG. 3 shows an example of the detected image. In FIG. 3, a transmission image 310 of the diffraction grating 206 portion of the waveguide, a transmission image 320 of the Fresnel lens portion of the mold substrate 210, transmission images 330 and 331 of the alignment marker 207 on the optical circuit member 200 side, and an alignment marker on the mold substrate 210 side Transmission images 340 and 341 of 152 and 153 (FIG. 1) are observed in a superimposed manner.
[0047]
The image captured by the infrared camera 240 reads the amount of change with respect to the position of the gray value, and measures the position by recognizing the position with the large amount of change as the edge of the marker, thereby performing the optical circuit member 200 and the mold for forming the Fresnel lens. The relative position of the substrate 210 can be recognized. By feeding back the position information obtained in this step to the movable holder (mold substrate movable holder) holding the Fresnel lens forming mold substrate 210, accurate positioning of both can be performed. After the alignment, as shown in FIG. 4 (f), the entire surface is irradiated with ultraviolet rays to cure the Fresnel lens forming material 205 made of an ultraviolet curable photopolymer, and the Fresnel lens forming mold substrate 210 is cured. Is formed.
[0048]
Next, a method of manufacturing the optical circuit member 100 of the example shown in FIG. 1 will be described with reference to the process chart of FIG. 4 (a) to 4 (c) are diagrams viewed from a direction perpendicular to A1-A2 in FIG. 1 (a), and FIGS. 4 (d) to 4 (g) are diagrams in FIG. It is the figure seen from the direction along A1-A2 of a).
[0049]
First, as shown in FIG. 4A, a first cladding layer forming material 421 and a core layer forming material 422 are sequentially applied on a substrate 410 by spin coating and formed by baking.
[0050]
Next, as shown in FIG. 4B, a patterned photomask 430 is placed on the substrate 410 on which the first cladding layer forming material 421 and the core layer forming material 422 are formed, and A portion other than the portion where the waveguide 422 ′ is formed in the layer of the core layer forming material 422 is irradiated with ultraviolet rays 440 via the mask 430 to form a waveguide.
[0051]
Since the refractive index of the photobleaching material of the core layer forming material 422 is reduced by the irradiation of ultraviolet rays, if the parts other than the part where the waveguide is formed are irradiated with ultraviolet rays, as shown in FIG. A waveguide 422 'having a higher refractive index is formed.
[0052]
Next, as shown in FIG. 4D, another patterned photomask 435 is placed on the core layer forming material layer 422A on which the waveguide 422 ′ is formed, and the photomask 435 is interposed therebetween. UV light 445 is incident from a direction inclined by about 60 ° to form a refractive index modulation type diffraction grating 450 in the waveguide 422 ′ of the layer 422 A of the core layer forming material and other portions. . The diffraction grating 450 corresponds to the diffraction gratings 115 and 116 and the alignment markers 130 and 131 in FIG. At this time, the diffraction grating 450 is formed in the layer 422A of the material for forming a core layer by interference between the primary light diffracted by the diffraction grating 435 'formed on the photomask 435 and the zero-order light transmitted without being diffracted. However, it may be formed by a generally used two-beam interference method.
[0053]
Next, as shown in FIG. 4E, after the above-described diffraction grating 450 is formed, a second cladding layer 423 is formed on the layer 422A of the core layer forming material by spin coating, and the waveguide is formed. The structure is completed.
[0054]
Note that if the diffraction grating 450 is not a volume-type diffraction grating inclined in the layer 422A, it may be formed as a relief-type diffraction grating using a method such as a phase mask method.
[0055]
Thereafter, Fresnel lenses (121, 122) are formed on the second cladding layer 423 by a photopolymerization method (2P method). As shown in FIG. 4F, an ultraviolet curable photopolymer, which is a Fresnel lens forming material 470, is applied on the second cladding layer 423 by spin coating. Then, in order to accurately arrange the Fresnel lens type substrate 460 (150, 210) on the second clad 423 of the optical waveguide, as described with reference to FIGS. Alignment is performed using (130, 131) and the diffraction grating 450 (115, 116) of the grating coupler. After the completion of such alignment, the Fresnel lens type substrate 460 is pressed down, the entire surface is irradiated with ultraviolet rays 447 to cure the photopolymer of the Fresnel lens forming material 470, and the Fresnel lens 475 corresponding to the Fresnel lens type substrate 460 ( 121, 122) (FIG. 4 (g)). Thus, the optical circuit member 100 shown in FIG. 1 is obtained.
[0056]
In addition, the method for manufacturing an optical circuit member according to the present invention has good mass productivity. That is, since the Fresnel lens is formed as a condensing lens or a collimating lens by collective molding by the 2P method, the Fresnel lens can be formed in a free arrangement at a time, and the mass productivity is excellent, and as a result, the cost is reduced. Can be expected.
[0057]
By the way, as a material of the core layer 112 on which the refractive index modulation type diffraction gratings 115, 116, 130, 131 are formed, a photopolymer which causes a change in the refractive index by irradiation with light such as ultraviolet rays (photobleaching) is used. Polysilane, PMPN (polymethyl methacrylate) containing DMAPN {(4-N, N-dimethylaminophenyl) -N-phenylnitrone}, or the like can be used.
[0058]
As the first cladding layer 111 and the second cladding layer 113, a polysilane-based resin, an acrylic-based resin, a polyimide-based resin, a polyurethane-based resin, or an epoxy-based resin having a smaller refractive index than the core layer 112 by several percent is used.
[0059]
Further, as the substrate 140, any material may be used as long as it transmits infrared rays, and a polyimide material, silicon, or the like for a wiring substrate is used.
[0060]
As the Fresnel lens layer 120 including the Fresnel lenses 121 and 122, an ultraviolet curable photopolymer which can be applied to manufacture the Fresnel lenses 121 and 122 by a photopolymerization method is used. Examples of the material include an acrylate resin, a siloxane resin, a polyimide resin, and a cyclobutene resin.
[0061]
Next, an embodiment of an opto-electric hybrid board using an optical circuit member according to the present invention will be described with reference to FIG.
[0062]
In this example, the optical circuit member 500 (100) of the embodiment shown in FIG. 1 is used, and a wiring substrate 550 is laminated on the Fresnel lens 521, 522 (121, 122) formation side. Are provided with through holes 551 and 552 in regions corresponding to the Fresnel lenses 521 and 522.
[0063]
Then, a surface emitting laser 561 is mounted on the wiring substrate 550 so that the laser light is emitted toward the Fresnel lens 521 through the through-hole 551. The driver IC 565 is connected to the surface emitting laser 561. Further, a photodiode 571 is mounted to receive light from the Fresnel lens 522 through the through hole 552. The receiving IC 575 is connected to the photodiode 571.
[0064]
The laser light emitted from the surface emitting laser 561 is directed by the Fresnel lens 521 to the grating coupler 515 (115) in the waveguide region of the optical circuit member 500, and the light diffracted by the grating coupler 515 is guided by the waveguide. The light guided through the region and reaching the other end is diffracted by the grating coupler 516 (116) and emitted from the end of the guided region, and the light is focused on the photodiode 571 by the Fresnel lens 522. It is.
[0065]
Actually, since the laser light emitted from the surface emitting laser 561 has a spread and the region where the photodiode 571 receives light is also limited, the laser light emitted from the surface emitting laser 561 efficiently emits the Fresnel lens 521. The components are designed and arranged such that the light is collimated or condensed by the light source and enters the grating 515, and the light incident on the Fresnel lens 522 from the grating 516 is efficiently received by the photodiode 571.
[0066]
Although the optical circuit member and the method of manufacturing the same according to the present invention have been described based on the embodiments, the present invention is not limited to these embodiments, and various modifications are possible.
[0067]
【The invention's effect】
As is clear from the above description, according to the optical circuit member and the method of manufacturing the same of the present invention, it is possible to improve the positional accuracy between the optical circuit member on which the waveguide is formed and the lens forming mold substrate, and as a result, Thus, it is possible to provide an optical circuit member having high light-collecting efficiency. At the same time, it is possible to provide an opto-electric hybrid board and an optical transmission module which are inexpensive and can be used at a practical level and are used for opto-electric composite mounting using such an optical circuit member.
[Brief description of the drawings]
FIG. 1 is a diagram for explaining a configuration of an embodiment of an optical circuit member of the present invention.
FIG. 2 is a schematic view of an apparatus for observing an alignment marker.
FIG. 3 is an infrared observation image of the mold substrate and the optical circuit member viewed from above with the observation device of FIG. 2;
FIG. 4 is a schematic view showing a manufacturing process of the optical circuit member shown in FIG.
FIG. 5 is a schematic view of an example of an opto-electric hybrid board using an optical circuit member according to the present invention.
[Explanation of symbols]
100 optical circuit member (organic optical waveguide member)
110 ... (optical) waveguide
111: first cladding layer
112 ... core layer
113: second cladding layer
115, 116: Diffraction grating (grating coupler)
120: Fresnel lens layer (Fresnel lens forming layer)
121, 122 ... Fresnel lens
130, 131: Alignment marker (optical circuit member side)
140 ... substrate
150 ... Fresnel lens type substrate
151: Fresnel lens forming part
152, 153 ... mold substrate side alignment marker (mold)
152 ', 153' ... edge of alignment marker (mold) on mold substrate
200 ... Optical circuit member
205: Fresnel lens forming material
206 ... diffraction grating
207: Optical circuit member side alignment marker
210 ... Fresnel lens type substrate
220 ... Objective lens
230 ... Microscope
240… Infrared camera
250 ... monitor
260 ... interference filter
270 ... Infrared light
300: whole infrared transmission image
310: transmission image of waveguide diffraction grating
320: Fresnel lens transmission image
330, 331: transmitted image of alignment marker on optical circuit member side
340, 341 ... transmission image of the alignment marker on the mold substrate side
410 ... substrate
421: Material for forming the first cladding layer
422: Core layer forming material
422A: Core layer forming material after UV exposure
422 '... waveguide
423: Material for forming second clad layer
430, 435: Photomask
435 ': Diffraction grating
440, 445, 447 ... UV light
450 ... Diffraction grating
460: Fresnel lens type substrate
470 ... Fresnel lens forming material
475… Fresnel lens
500 ... Optical circuit member
521, 522 ... Fresnel lens
550 ... wiring board
551, 552 ... through-hole
561 Surface emitting laser
565: Driver IC
571 ... photodiode
575 ... Reception IC
515, 516 ... Grating coupler

Claims (7)

A first clad layer, a core layer having a higher refractive index than the first clad layer, and a second clad layer having a lower refractive index than the core layer are laminated in this order, and a relief type is formed on the core layer. Alternatively, an optical circuit member in which a refractive index modulation type diffraction grating is formed and a lens optically connected to the diffraction grating is provided outside the first cladding layer or the second cladding layer. ,
An alignment marker for performing relative alignment between the diffraction grating and the mold substrate forming the lens is provided as another diffraction grating in a region different from the diffraction grating of the core layer and outside the waveguide region. An optical circuit member characterized by the above-mentioned. 2. The optical circuit member according to claim 1, wherein said another diffraction grating is provided as the same relief type or refractive index modulation type diffraction grating as said diffraction grating. The optical circuit member according to claim 1, wherein the another diffraction grating is formed as a volume-type diffraction grating inclined with respect to a surface of the core layer. A first clad layer, a core layer having a higher refractive index than the first clad layer, and a second clad layer having a lower refractive index than the core layer are laminated in this order, and a relief type is formed on the core layer. Alternatively, an optical circuit member having a refractive index modulation type diffraction grating formed thereon, wherein a lens optically connected to the diffraction grating is provided outside the first cladding layer or the second cladding layer. In the manufacturing method,
An alignment marker for performing relative alignment between the diffraction grating and the mold substrate forming the lens, at the same time as the step of forming the diffraction grating in the core layer, in an area different from the diffraction grating in the core layer. The light is formed as another diffraction grating outside the waveguide region, and the lens is formed by positioning the alignment marker with an alignment marker formed on a mold substrate on which the lens is formed. A method for manufacturing a circuit member. 5. The method for manufacturing an optical circuit member according to claim 4, wherein the alignment marker formed on the mold substrate forming the lens comprises a diffractive optical element. The alignment marker formed as another diffraction grating in a region of the core layer different from the diffraction grating is formed as a volume diffraction grating inclined with respect to the surface of the core layer. 6. The method for manufacturing an optical circuit member according to 4 or 5. 7. The method according to claim 4, wherein the diffraction grating and the another diffraction grating are formed as a relief type or a refractive index modulation type diffraction grating.

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