JP2004256912A - Dlc coating film - Google Patents
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- JP2004256912A JP2004256912A JP2004026553A JP2004026553A JP2004256912A JP 2004256912 A JP2004256912 A JP 2004256912A JP 2004026553 A JP2004026553 A JP 2004026553A JP 2004026553 A JP2004026553 A JP 2004026553A JP 2004256912 A JP2004256912 A JP 2004256912A
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- 239000011248 coating agent Substances 0.000 title claims abstract description 51
- 238000000576 coating method Methods 0.000 title claims abstract description 51
- 238000005498 polishing Methods 0.000 claims description 64
- 229910052751 metal Inorganic materials 0.000 claims description 26
- 239000002184 metal Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 13
- 230000007423 decrease Effects 0.000 claims description 9
- 229910003460 diamond Inorganic materials 0.000 claims description 9
- 239000010432 diamond Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 5
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- 239000000463 material Substances 0.000 description 37
- 238000004544 sputter deposition Methods 0.000 description 25
- 230000008020 evaporation Effects 0.000 description 17
- 238000001704 evaporation Methods 0.000 description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 14
- 230000013011 mating Effects 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
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- 239000000523 sample Substances 0.000 description 10
- 239000011651 chromium Substances 0.000 description 9
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- 229920001971 elastomer Polymers 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000005461 lubrication Methods 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
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- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
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- 238000010586 diagram Methods 0.000 description 3
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- 238000000089 atomic force micrograph Methods 0.000 description 2
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- 239000010936 titanium Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
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- 239000000314 lubricant Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
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- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
本発明は、耐摩耗性と低摩擦性が要求される機械部品等にオーバレイ層として施されるＤＬＣコーティング膜の改良に関するものである。 The present invention relates to an improvement in a DLC coating film to be applied as an overlay layer to a mechanical part or the like that requires abrasion resistance and low friction.
Ｄｉａｍｏｎｄ Ｌｉｋｅ Ｃａｒｂｏｎ（以下、「ＤＬＣ」と称する）は、ダイヤモンドに似た物性を持つアモルファス状の炭素膜であり、硬度が高く、耐摩耗性に優れ、さらに、低摩擦係数を有することから、近年、低摩擦性、耐摩耗性が要求される機械部品の摺動部へ利用されつつある。 Diamond Like Carbon (hereinafter referred to as "DLC") is an amorphous carbon film having physical properties similar to diamond, and has high hardness, excellent wear resistance, and low friction coefficient. It is being used for sliding parts of mechanical parts that require low friction and wear resistance.
こうしたＤＬＣコーティング膜を形成する方法としては、スパッタ法やアークイオンプレーティング法等の物理的蒸着法（ＰＶＤ法）、および化学的蒸着法（ＣＶＤ法）等が用いられる。
しかしながら、ＤＬＣコーティング膜に低摩擦性を発揮させるためには特別な工夫が必要である。油等による潤滑下の摩擦は荷重と速度によって境界潤滑、混合潤滑、流体潤滑などに変化する。ＤＬＣコーティング膜の低摩擦性が発揮される領域は個体間に接触が生じている境界潤滑領域や混合潤滑状態である。従来のＤＬＣコーティング膜は、摺動部品に用いた場合に、成膜中に生じる数十〜数百ナノメートルサイズの微小な突起が硬度の低い相手材との間でならされないことで、本来の低摩擦が得られないことがある。また、硬度の低い相手材を摩耗させやすくすることがある。摺動部品の動き出し時や往復運動時の摺動方向が切り替わる静摩擦域や低速域は速度が遅いため油膜が薄くなる。この場合、粘度一定として速度と荷重によって決定する油膜厚さに対して突起は物理的な引っ掛かりとなり、摩擦係数に悪影響を及ぼす。例えば自動車、二輪車のサスペンション部品等は、この突起から生じる摩擦が作動性（乗り心地）に大きく影響する。一般的なクロム（Cr)メッキなどの従来材料は摺動初期にこのような有害な突起が摺動により除去されて問題とならない。ＤＬＣコーティング膜に突起が存在しなければクロムメッキに対して約３０％〜６０％摩擦が小さくなる。またＤＬＣは硬く、耐磨耗性も良いことから、良好な表面状態を長期間維持することができる。 However, special contrivance is required for the DLC coating film to exhibit low friction. Friction under lubrication by oil or the like changes to boundary lubrication, mixed lubrication, fluid lubrication, etc. depending on the load and speed. The region where the low friction property of the DLC coating film is exhibited is a boundary lubrication region where a contact occurs between the solids and a mixed lubrication state. The conventional DLC coating film, when used for sliding parts, does not allow the fine projections of several tens to several hundreds of nanometers generated during film formation to be smoothed out with the counterpart material having low hardness. Low friction may not be obtained. In addition, there is a case where a partner material having low hardness is easily worn. The oil film becomes thin because the speed is slow in a static friction region or a low speed region in which the sliding direction changes when the sliding component starts moving or in a reciprocating motion. In this case, the protrusions are physically caught with respect to the oil film thickness determined by the speed and the load assuming that the viscosity is constant, which adversely affects the friction coefficient. For example, in the case of suspension parts of automobiles and motorcycles, friction generated from the projections greatly affects operability (ride comfort). Conventional materials such as general chromium (Cr) plating do not pose a problem because such harmful protrusions are removed by sliding in the initial stage of sliding. If there are no protrusions on the DLC coating film, the friction against chrome plating is reduced by about 30% to 60%. Further, DLC is hard and has good abrasion resistance, so that a good surface state can be maintained for a long time.
ＤＬＣコーティング膜は優れた耐磨耗性を有する反面このような有害な突起がならされにくい。特に相手材がゴムや樹脂のように柔らかい場合は上記の突起を除去しなければ返って摩擦係数が大きくなる。従って、ＤＬＣの低摩擦性を発揮するためには、ＤＬＣコーティング膜表面の突起を予め除去する必要がある。 Although the DLC coating film has excellent abrasion resistance, such harmful protrusions are not easily formed. In particular, when the mating material is soft such as rubber or resin, the friction coefficient is increased unless the above-mentioned protrusion is removed. Therefore, in order to exhibit low friction of DLC, it is necessary to remove protrusions on the surface of the DLC coating film in advance.
また、ＤＬＣコーティング膜は硬く研磨が困難であるため、量産時には短時間で再現性よくなじみ面が得られる特徴を備えるＤＬＣコーティング膜やその研磨方法を提供することも重要である。 In addition, since the DLC coating film is hard and difficult to polish, it is also important to provide a DLC coating film having a feature that a reproducible surface can be obtained in a short time during mass production and a polishing method thereof.
本発明は上記の問題点に鑑みてなされたものであり、高硬度と高い表面平滑度を併せ持ったＤＬＣコーティング膜、及び短時間で研磨可能なＤＬＣコーティング膜とその研磨方法を提供することを目的とする。 The present invention has been made in view of the above problems, and has as its object to provide a DLC coating film having both high hardness and high surface smoothness, a DLC coating film that can be polished in a short time, and a polishing method thereof. And
第１の発明は、硬度が厚み方向に略一定であるトップ層を有するＤＬＣコーティング膜において、トップ層上に設けたオーバレイ層を備え、オーバレイ層の硬度がトップ層より低下していることを特徴とする。 The first invention is characterized in that a DLC coating film having a top layer whose hardness is substantially constant in the thickness direction includes an overlay layer provided on the top layer, and the hardness of the overlay layer is lower than that of the top layer. And
第２の発明は、第１の発明において、オーバレイ層の硬度が、ＤＬＣコーティング膜の最表面に向かって厚み方向に減少することを特徴とする。 The second invention is characterized in that, in the first invention, the hardness of the overlay layer decreases in the thickness direction toward the outermost surface of the DLC coating film.
第３の発明は、第２の発明において、オーバレイ層を研磨した後の研磨表面において、微小突起の高さが206nm以下であることを特徴とする。 A third invention is characterized in that in the second invention, the height of the fine projections is 206 nm or less on the polished surface after polishing the overlay layer.
第４の発明は、第２の発明において、オーバレイ層を研磨した後の研磨表面において、高さ10〜30nmの微小突起の数が高さ30nm以上の微小突起の数より大きいことを特徴とする。 A fourth invention is characterized in that, in the second invention, the number of microprojections having a height of 10 to 30 nm is larger than the number of microprojections having a height of 30 nm or more on the polished surface after polishing the overlay layer. .
第５の発明は、第２の発明において、オーバレイ層を研磨した後の研磨表面において、30nm以上の微小突起の密度が多くとも0.71×105/mm2、または40nm以上の微小突起の密度が多くとも0.14×105/mm2、または80nm以上の微小突起の密度が多くとも6.9×103/mm2であることことを特徴とする。 According to a fifth aspect, in the second aspect, on the polished surface after polishing the overlay layer, the density of the fine projections of 30 nm or more is at most 0.71 × 10 5 / mm 2 or the density of the fine projections of 40 nm or more is reduced. The density of microprojections having a size of at most 0.14 × 10 5 / mm 2 or 80 nm or more is at most 6.9 × 10 3 / mm 2 .
第６の発明は、ＤＬＣコーティング膜の作製方法において、金属製ワークに印加するバイアス電圧を一定に保って、硬度が厚み方向に略一定であるトップ層を形成する工程と、バイアス電圧をトップ層形成時よりも低下させることにより、硬度がトップ層より低下しているオーバレイ層をトップ層上に形成する工程と、を備えることを特徴とする。 According to a sixth aspect of the present invention, in the method for producing a DLC coating film, a step of forming a top layer whose hardness is substantially constant in the thickness direction while maintaining a constant bias voltage applied to the metal work; Forming an overlay layer having a lower hardness than the top layer on the top layer by lowering the hardness than at the time of formation.
第７の発明は、第６の発明において、硬度がトップ層より低下しているオーバレイ層をトップ層上に形成する工程が、バイアス電圧を所定の減少率で低下させる工程を含むことを特徴とする。 A seventh invention is characterized in that, in the sixth invention, the step of forming an overlay layer having a lower hardness than the top layer on the top layer includes a step of reducing a bias voltage at a predetermined reduction rate. I do.
第８の発明は、第６又は第７の発明において、さらに、ダイヤモンド砥粒を用いてオーバレイ層を研磨する工程を含むことを特徴とする。 The eighth invention is characterized in that, in the sixth or seventh invention, a step of polishing the overlay layer using diamond abrasive grains is further included.
第１の発明によると、トップ層上に設けたオーバレイ層の硬度がトップ層より低下しているため、ＤＬＣコーティング膜に対して研磨が短時間で良好に行える。 According to the first aspect, since the hardness of the overlay layer provided on the top layer is lower than that of the top layer, the DLC coating film can be polished well in a short time.
第２の発明によると、オーバレイ層の硬度が、ＤＬＣコーティング膜の最表面に向かって厚み方向に減少するため、最表面からの深さに応じて硬度が増加し、トップ層に達するまでに研磨が進まなくなる。このため、成膜条件など様々なばらつきの中でオーバレイ層の性質がばらついても、現実的な短時間の研磨により、高い平滑度を有するなじみ面（ならし面）を再現よく作製できる。こうして、高硬度と高い表面平滑度を併せ持ったＤＬＣコーティング膜を提供することができる。このような研磨処理により予めなじみ面を作製したＤＬＣコーティング膜は、極低硬度材料（ゴム、樹脂材料等）を相手材にしても摺動部材として使用可能である。 According to the second aspect, since the hardness of the overlay layer decreases in the thickness direction toward the outermost surface of the DLC coating film, the hardness increases according to the depth from the outermost surface, and is polished before reaching the top layer. Will not progress. For this reason, even if the properties of the overlay layer vary in various variations such as film forming conditions, a smooth surface (having surface) having high smoothness can be produced with good reproducibility by realistic short-time polishing. Thus, a DLC coating film having both high hardness and high surface smoothness can be provided. A DLC coating film having a familiar surface formed in advance by such a polishing process can be used as a sliding member even when an extremely low-hardness material (rubber, resin material, or the like) is used as a mating material.
また、第２の発明のＤＬＣコーティング膜は、低硬度材料（銅合金、アルミニウム合金、マグネシウム合金等）が相手材である場合には、相手材との摩擦によりなじみ面が迅速に得られるため、使用前の研磨処理を行うことなく好適に摺動部材として使用可能である。さらに、高硬度材料（鋼等）が相手材である場合には、低荷重下でも相手材との摩擦により迅速になじみ面が得られ、使用前の研磨処理を行うことなく好適に摺動部材として使用可能である。 Further, the DLC coating film according to the second aspect of the invention can quickly obtain a conformable surface by friction with a counterpart material when a low-hardness material (copper alloy, aluminum alloy, magnesium alloy, or the like) is a counterpart material. It can be suitably used as a sliding member without performing polishing before use. Furthermore, when a high-hardness material (steel or the like) is a mating material, a sliding surface can be quickly obtained by friction with the mating material even under a low load, and the sliding member can be suitably used without polishing before use. It can be used as
第３の発明によると、ＤＬＣコーティング膜は、オーバレイ層を研磨した後の研磨表面において微小突起の高さが206nm以下であり、良好なならし面を有する。このＤＬＣコーティング膜は、摺動部品に使用され、予めならし面が得られているので極低硬度材料（ゴム、樹脂材料等）を相手にする場合でも摩擦が小さい。 According to the third invention, the DLC coating film has fine projections of 206 nm or less on the polished surface after polishing the overlay layer, and has a good leveled surface. This DLC coating film is used for sliding parts, and has a smooth surface even beforehand, so that it has a small friction even when it is made of very low hardness material (rubber, resin material, etc.).
第４の発明によると、ＤＬＣコーティング膜は、オーバレイ層を研磨した後の研磨表面において、高さ10〜30nmの微小突起の数が高さ30nm以上の微小突起の数より大きくなっており、良好なならし面を有する。このＤＬＣコーティング膜は、予めならし面が得られているので極低硬度材料（ゴム、樹脂材料等）を相手にする場合でも摩擦が小さい。 According to the fourth invention, in the DLC coating film, on the polished surface after polishing the overlay layer, the number of microprojections having a height of 10 to 30 nm is larger than the number of microprojections having a height of 30 nm or more. It has a smooth surface. Since the DLC coating film has a pre-conditioned surface, the friction is small even when using a material having an extremely low hardness (rubber, resin material, etc.).
第５の発明によると、オーバレイ層を研磨した後の研磨表面において、30nm以上の微小突起の密度が多くとも0.71×105/mm2、40nm以上の微小突起の密度が多くとも0.14×105/mm2、80nm以上の微小突起の密度が多くとも6.9×103/mm2であり、良好なならし面を有する。このＤＬＣコーティング膜は、予めならし面が得られているので極低硬度材料（ゴム、樹脂材料等）を相手にする場合でも摩擦が小さい。 According to the fifth invention, on the polished surface after polishing the overlay layer, the density of microprojections of 30 nm or more is at most 0.71 × 10 5 / mm 2 , and the density of microprojections of 40 nm or more is at most 0.14 × 10 5 The density of the microprojections having a diameter of at least 6.9 × 10 3 / mm 2 , 80 nm or more, is 6.9 × 10 3 / mm 2 , and has a good leveled surface. Since the DLC coating film has a pre-conditioned surface, friction is small even when it is made of a material having extremely low hardness (rubber, resin material, etc.).
第６の発明によると、ＤＬＣコーティング膜の作製方法において、バイアス電圧をトップ層形成時よりも低下させることにより、硬度がトップ層より低下しているオーバレイ層をトップ層上に形成するため、ＤＬＣコーティング膜に対して研磨が短時間で良好に行える。 According to the sixth aspect, in the method for manufacturing a DLC coating film, the bias voltage is reduced from that at the time of forming the top layer, so that the overlay layer having a lower hardness than the top layer is formed on the top layer. Polishing of the coating film can be performed satisfactorily in a short time.
第７の発明によると、硬度がトップ層より低下しているオーバレイ層をトップ層上に形成する工程が、バイアス電圧を所定の減少率で低下させる工程を含むため、オーバレイ層の硬度が、ＤＬＣコーティング膜の最表面に向かって厚み方向に減少するような短時間で再現性のある研磨を行えるオーバレイ層を形成できる。このような研磨処理により予めなじみ面を作製したＤＬＣコーティング膜は、極低硬度材料（ゴム、樹脂材料等）を相手材にしても摺動部材として使用可能である。 According to the seventh aspect, the step of forming an overlay layer having a lower hardness than the top layer on the top layer includes a step of reducing the bias voltage at a predetermined reduction rate. It is possible to form an overlay layer capable of performing reproducible polishing in a short time so as to decrease in the thickness direction toward the outermost surface of the coating film. A DLC coating film having a familiar surface formed in advance by such a polishing process can be used as a sliding member even when an extremely low-hardness material (rubber, resin material, or the like) is used as a mating material.
また、第７の発明により作製されたＤＬＣコーティング膜は、低硬度材料（銅合金、アルミニウム合金、マグネシウム合金等）が相手材である場合には、相手材との摩擦によりなじみ面が迅速に得られるため、使用前の研磨処理を行うことなく好適に摺動部材として使用可能である。さらに、高硬度材料（鋼等）が相手材である場合には、低荷重下でも相手材との摩擦により迅速になじみ面が得られ、使用前の研磨処理を行うことなく好適に摺動部材として使用可能である。 In the case where a low-hardness material (a copper alloy, an aluminum alloy, a magnesium alloy, or the like) is a mating material, the DLC coating film produced according to the seventh invention can quickly obtain a conforming surface due to friction with the mating material. Therefore, it can be suitably used as a sliding member without performing polishing before use. Furthermore, when a high-hardness material (steel or the like) is a mating material, a sliding surface can be quickly obtained by friction with the mating material even under a low load, and the sliding member can be suitably used without polishing before use. It can be used as
第８の発明によると、第６又は第７の発明において作製されたＤＬＣコーティング膜をダイヤモンド砥粒を用いて研磨することにより、このＤＬＣコーティング膜は、摺動部品に使用され、低硬度材料を相手にする場合や、低荷重で使われる場合でも、摩擦が小さくなる。 According to the eighth invention, the DLC coating film produced in the sixth or seventh invention is polished using diamond abrasives, so that this DLC coating film is used for sliding parts, and a low-hardness material is used. Friction is reduced even when used against other people or when used with a low load.
以下、本発明の実施の形態を添付図面に基づいて説明する。 Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.
図１に示すＤＬＣコーティング膜９は、アンバランスマグネトロンスパッタ（UBM）法（以下、「ＵＢＭスパッタ法」と称する）によって形成される。 The DLC coating film 9 shown in FIG. 1 is formed by an unbalanced magnetron sputtering (UBM) method (hereinafter, referred to as “UBM sputtering method”).
スパッタの原理は、図２に示すように、アルゴン（Ar）等のスパッタガスを導入した真空中でターゲット１１を陰極として陽極の間でグロー放電させてプラズマを形成し、このプラズマ中のイオンをターゲット１１に衝突させてターゲット１１の原子を弾き飛ばし、この原子をターゲット１１と対向して配置された金属製ワーク１上に堆積させて皮膜を形成するようになっている。なお、ＤＬＣ成膜時には、ＤＬＣ中への水素量を制御するため、メタン（ＣＨ4）等の炭化水素ガス或いは水素ガスがスパッタガスとともに使用されることもある。 As shown in FIG. 2, the principle of sputtering is to form a plasma by performing glow discharge between anodes using a target 11 as a cathode in a vacuum in which a sputtering gas such as argon (Ar) is introduced, and forming ions in the plasma. The target 11 is made to collide with the target 11 so that the atoms of the target 11 are repelled, and the atoms are deposited on the metal work 1 disposed to face the target 11 to form a film. At the time of DLC film formation, a hydrocarbon gas such as methane (CH 4 ) or a hydrogen gas may be used together with a sputtering gas in order to control the amount of hydrogen in the DLC.
ＵＢＭスパッタ法において、スパッタ蒸発源１０にターゲット１１の中心部と周辺部で異なる磁気特性を有する磁石１２，１３が配置されて、プラズマを形成しつつ強力な磁石１２により発生する磁力線の一部がワーク１の近傍に達し、チャンバ内のＡｒをイオン化させ、イオンアシスト効果が生じる。また、ワーク１にバイアス電圧を印加することによって、イオンアシスト効果を調整し、ＤＬＣ膜の硬度を制御することができる（例えば、特開２００２-２５６４１５号参照）。これは、スパッタガスイオンのワーク表面上への衝突の強さ（バイアス電圧により調整される）が硬度に影響するためである。 In the UBM sputtering method, magnets 12 and 13 having different magnetic properties at the central portion and the peripheral portion of the target 11 are arranged in the sputter evaporation source 10, and a part of the lines of magnetic force generated by the strong magnet 12 while forming plasma is generated. Arriving in the vicinity of the work 1, Ar in the chamber is ionized, and an ion assist effect is generated. Further, by applying a bias voltage to the work 1, the ion assist effect can be adjusted and the hardness of the DLC film can be controlled (see, for example, JP-A-2002-256415). This is because the strength of the impact of sputtering gas ions on the work surface (adjusted by the bias voltage) affects the hardness.
図３は、ＵＢＭスパッタ装置２０の基本構成を示す。真空チャンバ２１に４つのスパッタ蒸発源１０ａ〜１０ｄが設けられ、その中央に配置された自公転式ワークテーブル２６上にワーク１が置かれ、ワーク１に外周からコーティングが行われる。スパッタ蒸発源１０ａ〜１０ｄには皮膜材料となる平板状ターゲットが取り付けられる。真空チャンバ２１にはアルゴン等のスパッタガスとメタンガス等の炭化水素ガスが所定量充填される。 FIG. 3 shows a basic configuration of the UBM sputtering apparatus 20. The vacuum chamber 21 is provided with four sputter evaporation sources 10a to 10d, the work 1 is placed on a self-revolving work table 26 arranged at the center thereof, and the work 1 is coated from the outer periphery. A flat target serving as a film material is attached to the sputter evaporation sources 10a to 10d. The vacuum chamber 21 is filled with a predetermined amount of a sputtering gas such as argon and a hydrocarbon gas such as methane gas.
スパッタ蒸発源１０ａ，１０ｃにはターゲットとしてグラファイトを使用し、スパッタ蒸発源１０ｂ，１０ｄにはターゲットとして金属を使用する。金属として、例えばクロム（Cr）、タングステン（W）、チタン（Ti）、シリコン（Si）、タングステンカーバイト（WC）が用いられる。 For the sputtering evaporation sources 10a and 10c, graphite is used as a target, and for the sputtering evaporation sources 10b and 10d, a metal is used as a target. As the metal, for example, chromium (Cr), tungsten (W), titanium (Ti), silicon (Si), and tungsten carbide (WC) are used.
ＤＬＣコーティング膜９は、図１に示すように、ワーク（母材）１の表面にボンド層２、中間層３、トップ層４、オーバレイ層５が順に積層して形成される。そして、オーバレイ層５が表面研磨機により研磨され、所定の平滑度を持つ構成とする。 As shown in FIG. 1, the DLC coating film 9 is formed by sequentially laminating a bond layer 2, an intermediate layer 3, a top layer 4, and an overlay layer 5 on the surface of a work (base material) 1. Then, the overlay layer 5 is polished by a surface polisher so as to have a predetermined smoothness.
図４は、上記ＤＬＣコーティング膜９を形成するのにあたって、ターゲット出力（スパッタ電源の電力）が時間変化する様子を示している。なお、金属の蒸着量及び炭素の蒸着量はターゲット出力に比例するため、図４の縦軸は膜中での金属と炭素の比率とみることもでき、一方、膜厚は堆積時間に比例するため、図４の横軸は膜厚とみることもできる。なお、便宜上、金属ターゲット出力は、後述のボンド層２における値を１００％とし、グラファイトターゲット出力は後述のトップ層４の値を１００％として表現することとする。 FIG. 4 shows how the target output (power of the sputtering power supply) changes with time when the DLC coating film 9 is formed. In addition, since the metal deposition amount and the carbon deposition amount are proportional to the target output, the vertical axis of FIG. 4 can be regarded as the ratio of metal to carbon in the film, while the film thickness is proportional to the deposition time. Therefore, the horizontal axis in FIG. 4 can be regarded as the film thickness. For convenience, the output of the metal target is expressed as a value in the bond layer 2 described below as 100%, and the output of the graphite target is expressed as the value of the top layer 4 described later as 100%.
ボンド層２は、金属ターゲット１０ｂ，１０ｄのみをスパッタして、金属膜として形成される。このボンド層２を形成するのにあたって、図４に示すように、スパッタ蒸発源１０ｂ，１０ｄの金属ターゲット出力を１００％とし、スパッタ蒸発源１０ａ，１０ｃのグラファイトターゲット出力を０％と一定にして、所定時間だけスパッタが行われる。 The bond layer 2 is formed as a metal film by sputtering only the metal targets 10b and 10d. In forming the bond layer 2, as shown in FIG. 4, the output of the metal target of the sputter evaporation sources 10b and 10d is set to 100%, and the output of the graphite target of the sputter evaporation sources 10a and 10c is fixed to 0%. Sputtering is performed for a predetermined time.
中間層３は、スパッタ蒸発源１０ｂ，１０ｄの金属ターゲットとスパッタ蒸発源１０ａ，１０ｃのグラファイトターゲットを同時にスパッタし、ターゲット出力を次第に変化させて金属と炭素の傾斜組成膜として形成される。この中間層３を形成するのにあたって、図４に示すように、スパッタ蒸発源１０ｂ，１０ｄの金属ターゲット出力を１００％から時間に対して比例的に減少させる一方、スパッタ蒸発源１０ａ，１０ｃのグラファイトターゲット出力を０％から時間に対して比例的に増加させて、所定時間だけスパッタが行われる。 The intermediate layer 3 is formed as a gradient composition film of metal and carbon by simultaneously sputtering the metal targets of the sputter evaporation sources 10b and 10d and the graphite targets of the sputter evaporation sources 10a and 10c, and gradually changing the target output. In forming the intermediate layer 3, as shown in FIG. 4, while the output of the metal target of the sputter evaporation sources 10b and 10d is reduced from 100% in proportion to time, the graphite of the sputter evaporation sources 10a and 10c is reduced. The target output is increased in proportion to time from 0%, and sputtering is performed for a predetermined time.
図４に示すように、トップ層４は、通常、スパッタ蒸発源の金属組成比を０％（金属ターゲット出力を０％）とし、スパッタ蒸発源のグラファイト組成比を１００％（グラファイトターゲット出力１００％）と略一定にして所定時間だけスパッタが行われる。この場合、トップ層の硬度は、厚みによらず略一定であり、通常のDLC膜の硬度となる。 As shown in FIG. 4, the top layer 4 usually has a sputter evaporation source metal composition ratio of 0% (metal target output 0%) and a sputter evaporation source graphite composition ratio of 100% (graphite target output 100%). ), And the sputtering is performed for a predetermined time. In this case, the hardness of the top layer is substantially constant irrespective of the thickness, and is the hardness of a normal DLC film.
なお、場合によっては、トップ層４の靱性を高めるために、金属ターゲットもスパッタして、トップ層の金属の比率を０〜１８％の範囲に設定することにより、トップ層４の密着性や靱性を高め、高荷重によってワーク１が変形するような場合、割れや、剥離が生じることを防止することも可能である。図５に示すように、トップ層４に含まれる金属の比率と靱性及び硬度の関係ように、金属の比率を０〜１８％の範囲に設定することにより、トップ層４の靱性と硬度を好ましい範囲に設定できる。 In some cases, in order to increase the toughness of the top layer 4, a metal target is also sputtered, and the metal ratio of the top layer is set in the range of 0 to 18%, so that the adhesion and toughness of the top layer 4 are increased. In the case where the work 1 is deformed by a high load, it is possible to prevent cracking or peeling. As shown in FIG. 5, the toughness and hardness of the top layer 4 are preferably set by setting the metal ratio in the range of 0 to 18%, such as the relationship between the ratio of the metal contained in the top layer 4 and the toughness and hardness. Can be set to a range.
オーバレイ層５は、通常、スパッタ蒸発源１０ａ，１０ｃのグラファイトターゲットのみをスパッタし、ＤＬＣ膜として形成される。なお、トップ層とオーバレイ層の構成元素比率は同じであり、例外的に、トップ層に金属を含有させる場合はオーバレイ層５の形成時にも金属ターゲットがスパッタされる。このオーバレイ層５を形成するのにあたって、図４に示すように、スパッタ蒸発源１０ｂ，１０ｄの金属ターゲット出力を０％とし、スパッタ蒸発源１０ａ，１０ｃのグラファイトターゲット出力を１００％と一定にして、所定時間だけスパッタが行われる。 The overlay layer 5 is usually formed as a DLC film by sputtering only the graphite targets of the sputter evaporation sources 10a and 10c. Note that the constituent elements in the top layer and the overlay layer have the same element ratio. In exceptional cases, when a metal is contained in the top layer, a metal target is sputtered even when the overlay layer 5 is formed. In forming the overlay layer 5, as shown in FIG. 4, the output of the metal target of the sputter evaporation sources 10b and 10d is set to 0%, and the output of the graphite target of the sputter evaporation sources 10a and 10c is fixed to 100%. Sputtering is performed for a predetermined time.
オーバレイ層５において、バイアス電圧は、オーバレイ層５の最表面に向かって単調に減少させており、例えば、トップ層形成時の値から所定の減少率をもって低下させている（図４のA）。或いは、バイアス電圧は、中間層及びトップ層形成時の値から所定値だけ減少させてもよい（図４のB）。オーバレイ層５は、バイアス電圧を低下させることにより硬度が低下することが知られており、オーバレイ層５は、トップ層４から硬度の低下したＤＬＣ膜となる。非常に高い硬度を有するトップ層４の研磨は既存の方法では困難であるが、トップ層４より硬度の低いオーバレイ層５を研磨することにより、高い表面平滑度を有する研磨表面（ならし面）が得られる。なお、ワークに印加するバイアス電圧が小さくなると、イオンアシスト効果が弱まるため、硬度が低下する。 In the overlay layer 5, the bias voltage monotonously decreases toward the outermost surface of the overlay layer 5, for example, decreases at a predetermined rate from the value when the top layer was formed (A in FIG. 4). Alternatively, the bias voltage may be reduced by a predetermined value from the value when the intermediate layer and the top layer are formed (B in FIG. 4). It is known that the hardness of the overlay layer 5 is reduced by lowering the bias voltage, and the overlay layer 5 is a DLC film having a lower hardness than the top layer 4. The polishing of the top layer 4 having a very high hardness is difficult by the existing method. However, by polishing the overlay layer 5 having a lower hardness than the top layer 4, a polished surface (a smooth surface) having a high surface smoothness is obtained. Is obtained. When the bias voltage applied to the work decreases, the hardness decreases because the ion assist effect is weakened.
特に、工業的に量産可能な形で再現性よく、研磨により高い平滑度を有するならし面を作製するために、オーバレイ層５において、バイアス電圧は、トップ層形成時の値から単調に低下させることが好ましい（図４のA）。つまり、オーバレイ層５において、硬度をトップ層４とオーバレイ層５の境界からオーバレイ層５の最表面に向かって単調に低下している。この場合、重要なことは、最表面からの深さに応じて硬度が増加するため、トップ層４に達するまでに研磨が不可能となり、オーバレイ層５の厚さの範囲で研磨が進まなくなることである。通常の非常に高い硬度を有するDCL膜の研磨は、研磨に適したオーバレイ層を有さないため良好に行えないが、硬度を低下させたオーバレイ層５では良好な研磨が可能となる。成膜条件など様々なばらつきの中でオーバレイ層５の性質がばらついても、上記のオーバレイ層５を設けるだけで量産に適した現実的な短時間の研磨により、高い平滑度を有するならし面を有するＤＬＣ膜を再現よく作製できる。 In particular, in order to produce a smoothed surface having high reproducibility and high smoothness by polishing in a form that can be mass-produced industrially, the bias voltage in the overlay layer 5 is monotonously reduced from the value when the top layer was formed. Preferably (A in FIG. 4). That is, the hardness of the overlay layer 5 monotonously decreases from the boundary between the top layer 4 and the overlay layer 5 toward the outermost surface of the overlay layer 5. In this case, it is important that the hardness increases in accordance with the depth from the outermost surface, so that polishing becomes impossible before reaching the top layer 4 and polishing does not progress within the thickness range of the overlay layer 5. It is. Polishing of a normal DCL film having a very high hardness cannot be performed well because there is no overlay layer suitable for polishing, but good polishing is possible with the overlay layer 5 having reduced hardness. Even if the properties of the overlay layer 5 vary due to various variations such as film formation conditions, the smooth surface suitable for mass production can be obtained by simply providing the above-described overlay layer 5 and having a high smoothness. Can be produced with good reproducibility.
なお、オーバレイ層５は、製膜時のバイアス電圧を所定値以下に下げるとともに、炭化水素ガスや水素ガスからの水素の含有量を増やすことにより、その硬度を減少させることもできる。 The hardness of the overlay layer 5 can be reduced by lowering the bias voltage during film formation to a predetermined value or less and increasing the content of hydrogen from the hydrocarbon gas or the hydrogen gas.
オーバレイ層５は、テープ研磨機等の表面研磨機により研磨され、所定の平滑度を持つ。研磨にはダイヤモンド砥粒（粒径１〜３０μｍ）を用いることが好ましいが、オーバレイ層５の硬度を著しく小さくすれば、シリカ（SiO2）、アルミナ（Al2O3）も使用可能である。ダイヤモンド砥粒を用いテープ研磨機で研磨する場合は、５〜２０ｍｍ／秒のテープスピード、テープの押付け力２０〜８０ｋｇで研磨がなされ、良好なならし面が得られる。研磨時間を長くすると研磨表面の微小突起の高さはより減少する。オーバレイ層５は、研磨加工が施されることにより、高硬度と高い表面平滑度を併せ持ち、例えば二輪車のフロントフォーク等に用いられた場合、樹脂製シール及び樹脂製軸受との間の摩擦を下げることができ、樹脂製シール及び樹脂製軸受の十分な耐久性が確保される。 The overlay layer 5 is polished by a surface polisher such as a tape polisher and has a predetermined smoothness. It is preferable to use diamond abrasive grains (particle diameter: 1 to 30 μm) for polishing, but silica (SiO 2 ) and alumina (Al 2 O 3 ) can also be used if the hardness of the overlay layer 5 is significantly reduced. In the case of polishing by a tape polishing machine using diamond abrasive grains, polishing is performed at a tape speed of 5 to 20 mm / sec and a pressing force of the tape of 20 to 80 kg, and a good leveled surface is obtained. As the polishing time is lengthened, the height of the microprojections on the polished surface is further reduced. The overlay layer 5 has both high hardness and high surface smoothness by being polished, and reduces friction between a resin seal and a resin bearing when used for a front fork of a motorcycle, for example. Therefore, sufficient durability of the resin seal and the resin bearing is ensured.
なお、相手材が金属である場合など、ならし効果が期待できる摺動条件下では、オーバレイ層５の研磨加工を省くことも可能である。オーバレイ層５は、硬度が低く、好ましくは硬度を傾斜させており、相手材が金属である場合、摺動初期において迅速に良好な表面を形成する特性を有するからである。つまり、相手材が軟らかい場合には、研磨加工を行えばよいし、金属等の硬い相手材の場合、研磨加工は不要となる。 Note that the polishing of the overlay layer 5 can be omitted under sliding conditions where a leveling effect can be expected, such as when the mating material is a metal. This is because the overlay layer 5 has a low hardness, and preferably has a reduced hardness, and has a property of quickly forming a good surface at the initial stage of sliding when the mating material is a metal. In other words, if the mating material is soft, polishing may be performed, and if the mating material is a hard material such as metal, polishing is not required.
ＵＢＭスパッタ装置内に、洗浄後のワーク（アルミニウム合金製、円筒形状）を配置し、アルゴン（Ar）プラズマによるUBMスパッタを行った。ターゲットの印加電圧（スパッタ電源電圧）とワークに印加されるバイアス電圧は直流（マイナス）である。ワーク表面とターゲットとの最近距離は１５cmとしスパッタにより成膜を行った。ワーク上に、クロム（Cr）のボンド層（膜厚０．１μｍ）、炭素とタングステンカーバイト（WC）の組成比率を変化させた中間層（膜厚０．５μｍ）、DLC（１００％）のトップ層（膜厚１．０μｍ）、DLC（１００％）のオーバレイ層（膜厚０．２μｍ）を順に成膜した。バイアス電圧は、成膜開始時からトップ層成膜終了時まで２００Vに維持されるが、オーバレイ層の成膜中には一定速度で降下され、オーバレイ層の成膜終了時に５０Vに達するようにした（サンプル１）。 The cleaned work (made of aluminum alloy, cylindrical shape) was placed in a UBM sputtering apparatus, and UBM sputtering was performed using argon (Ar) plasma. The applied voltage of the target (sputter power supply voltage) and the bias voltage applied to the work are DC (minus). The closest distance between the work surface and the target was 15 cm, and the film was formed by sputtering. On the work, a chromium (Cr) bond layer (thickness 0.1 μm), an intermediate layer (0.5 μm thickness) in which the composition ratio of carbon and tungsten carbide (WC) was changed, and a DLC (100%) A top layer (1.0 μm in thickness) and an overlay layer (0.2 μm in thickness) of DLC (100%) were sequentially formed. The bias voltage is maintained at 200 V from the start of the film formation to the end of the top layer film formation, but is lowered at a constant speed during the formation of the overlay layer so as to reach 50 V at the end of the formation of the overlay layer. (Sample 1).
別に、オーバレイ層だけを設けない、すなわちバイアス電圧２００Vで作製したトップ層が最外に位置するＤＬＣ膜（サンプル２）と、オーバレイ層の成膜時に５０Vに達した後バイアス電圧５０Vを保って１μｍ程度成膜したＤＬＣ膜（サンプル３）を作製しておき、ナノインデンター（商品名：エリオニクス社製ＥＮＴ-１１００）により表面の硬度を測定すると、サンプル３は、サンプル２より硬度が約７２％減少した。この結果は、オーバレイ層の成膜中にバイアス電圧を２００Vから５０Vへ降下させることにより、オーバレイ層内で最表面に向かって硬度が約７２％減少することを示す。 Separately, a DLC film (sample 2) in which only an overlay layer is not provided, that is, a top layer formed at a bias voltage of 200 V is located at the outermost position, and a bias voltage of 50 V is maintained after forming the overlay layer at 50 V and 1 μm A DLC film (Sample 3) formed to a certain degree was prepared, and the surface hardness was measured with a nanoindenter (trade name: ENT-1100 manufactured by Elionix Inc.). The hardness of Sample 3 was about 72% higher than that of Sample 2. Diminished. The results show that decreasing the bias voltage from 200 V to 50 V during the formation of the overlay layer reduces the hardness in the overlay layer toward the outermost surface by about 72%.
成膜後のサンプル１のオーバレイ層に対して、ダイヤモンドフィルム（粒径５μｍ程度）によりテープ研磨を行った。研磨は、テープの押付け力６０ｋｇ、テープスピード１０ｍｍ／秒で、テープ幅４インチ（１０１ｍｍ）のテープを幅方向に移動させることにより行われた。図７に示すように、研磨は、ゴムによりテープを押した状態で、ワークの軸方向にテープを送ることによりなされた。 Tape polishing was performed on the overlay layer of Sample 1 after film formation using a diamond film (particle diameter: about 5 μm). Polishing was performed by moving a tape having a tape width of 4 inches (101 mm) in the width direction at a tape pressing force of 60 kg and a tape speed of 10 mm / sec. As shown in FIG. 7, the polishing was performed by feeding the tape in the axial direction of the work while the tape was pressed by rubber.
図６（ａ）のＡＦＭ（原子間力顕微鏡）画像に示すように、研磨前のサンプル１の表面には、高さ８０〜１５０ｎｍの突起（突起の根元の幅は典型的に３００ｎｍ程度）が多数存在する。図６（ａ）はまた典型的なＤＬＣ膜の表面を示めしており、従来のＤＬＣ膜は研磨が困難であったため、このように表面に顕著な突起がある状態で使用されてきた。 As shown in an AFM (Atomic Force Microscope) image of FIG. 6A, a protrusion having a height of 80 to 150 nm (the width of the base of the protrusion is typically about 300 nm) is formed on the surface of Sample 1 before polishing. There are many. FIG. 6 (a) also shows the surface of a typical DLC film, and the conventional DLC film has been used with such prominent projections because the polishing is difficult.
一方、図６（ｂ）のＡＦＭ画像に示すように、サンプル１のＤＬＣ膜の研磨後の表面には、高さ８０〜１５０ｎｍの突起はほとんどなくなっており、研磨が良好に行われたことを示している。 On the other hand, as shown in the AFM image in FIG. 6B, the surface of the DLC film of Sample 1 after polishing had almost no protrusions having a height of 80 to 150 nm, indicating that the polishing was successfully performed. Is shown.
なお、極最表面の平滑性を評価する場合、先端直径が小さくとも２μｍであるＪＩＳ規格のダイヤモンド球を用いる触針式の粗さ計では計測できない。ＡＦＭ（原子間力顕微鏡）を用いて１２０×１２０μｍ2程度の領域で得た表面プロファイルデータを平滑化処理して表面解析を実施することで評価が可能になる。 When the smoothness of the outermost surface is evaluated, it cannot be measured by a stylus-type roughness meter using a diamond ball of JIS standard whose tip diameter is at least 2 μm. The evaluation can be performed by performing a surface analysis by performing a smoothing process on the surface profile data obtained in an area of about 120 × 120 μm 2 using an AFM (atomic force microscope).
表１に、サンプル１表面の突起の高さ（負荷曲線谷低面より１％基準）の分布を示す。突起の個数と高さは、走査型プローブ顕微鏡（商品名：島津製作所製ＳＰＭ-９５００Ｊ３）により観察した表面プロファイルを面積０．２μｍ2以上の単位で凹凸を抽出して解析することにより求めた。表１に示すように、研磨前に３０ｎｍ以上の突起が１２０×１２０μｍ2の領域内で６０４５個（密度：4.20×105/mm2）存在するのに対して、研磨後は１０１６個（密度：0.71×105/mm2）に減少している。研磨前に４０ｎｍ以上の突起が１２０×１２０μｍ2の領域内で３８５１個（密度：2.67×105/mm2）存在するのに対して、研磨後は１９９個（密度：0.14×105/mm2）に減少している。さらに、研磨後に８０ｎｍ以上の突起が１２０×１２０μｍ2の領域内で１００個（密度：6.9×103/mm2）になった。さらに、研磨前は、高さ１０〜３０nmの突起より高さ３０nm以上の突起の方が数多く存在するが、研磨後は、高さ１０〜３０nmの突起の方が、高さ３０nm以上の突起より多くなっており、良好な研磨が行えたことを示している。 Table 1 shows the distribution of the heights of the protrusions on the surface of the sample 1 (based on 1% from the lower surface of the load curve valley). The number and height of the projections were determined by extracting and analyzing the surface profile observed with a scanning probe microscope (trade name: SPM-9500J3 manufactured by Shimadzu Corporation) in units of an area of 0.2 μm 2 or more. As shown in Table 1, before polishing, there were 6045 protrusions (density: 4.20 × 10 5 / mm 2 ) in the region of 120 × 120 μm 2 before polishing, while 1016 protrusions (density: : 0.71 × 10 5 / mm 2 ). Before the polishing, 3851 projections (density: 2.67 × 10 5 / mm 2 ) in the region of 120 × 120 μm 2 existed before polishing, whereas after the polishing, 199 projections (density: 0.14 × 10 5 / mm 2 ) 2 ) has decreased. Further, after polishing, 100 protrusions (density: 6.9 × 10 3 / mm 2 ) of 80 nm or more in the region of 120 × 120 μm 2 were obtained. Furthermore, before polishing, there are more protrusions with a height of 30 nm or more than protrusions with a height of 10 to 30 nm, but after polishing, protrusions with a height of 10 to 30 nm are greater than those with a height of 30 nm or more. This indicates that good polishing was performed.
研磨後のＤＬＣ膜の摩擦係数は、Ｃｒめっき膜、ＴｉＮ膜、研磨前のＤＬＣ膜に対して１／２〜１／３の値となり、本実施例のＤＬＣ膜を研磨加工で表面をならすことにより硬度の極めて低い樹脂に対しても良好な摩擦係数が得られる。 The coefficient of friction of the DLC film after polishing is 1/2 to 1/3 of that of the Cr plating film, TiN film, and DLC film before polishing. Thereby, a good friction coefficient can be obtained even for a resin having extremely low hardness.
本発明のDLCコーティング膜は、摺動部品の表面コーティングに利用できる。 The DLC coating film of the present invention can be used for surface coating of sliding parts.
１ ワーク
２ ボンド層
３ 中間層
４ トップ層
５ オーバレイ層
９ ＤＬＣコーティング膜
１０ａ〜１０ｄ スパッタ蒸発源
２０ ＵＢＭスパッタ装置
DESCRIPTION OF SYMBOLS 1 Work 2 Bond layer 3 Intermediate layer 4 Top layer 5 Overlay layer 9 DLC coating film 10a-10d Sputter evaporation source 20 UBM sputtering apparatus
Claims (8)
トップ層上に設けたオーバレイ層を備え、オーバレイ層の硬度がトップ層より低下していることを特徴とするＤＬＣコーティング膜。 In a DLC coating film having a top layer whose hardness is substantially constant in the thickness direction,
A DLC coating film comprising an overlay layer provided on the top layer, wherein the hardness of the overlay layer is lower than that of the top layer.
バイアス電圧をトップ層形成時よりも低下させることにより、硬度がトップ層より低下しているオーバレイ層をトップ層上に形成する工程と、を備えることを特徴とするＤＬＣコーティング膜の作製方法。 A step of forming a top layer whose hardness is substantially constant in the thickness direction while maintaining a constant bias voltage applied to the metal work;
Forming a bias voltage lower than that at the time of forming the top layer, thereby forming an overlay layer having a lower hardness than the top layer on the top layer.
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| JP2006266285A (en) * | 2005-03-22 | 2006-10-05 | Kayaba Ind Co Ltd | Mechanical seal |
| JP2006303136A (en) * | 2005-04-20 | 2006-11-02 | Shin Etsu Handotai Co Ltd | Double-side polishing apparatus and carrier therefor and double-side polishing method |
| JP2012505353A (en) * | 2008-10-10 | 2012-03-01 | フェデラル−モーグル ブルシャイド ゲーエムベーハー | Sliding members for internal combustion engines, especially piston rings |
| JP2014517150A (en) * | 2011-05-19 | 2014-07-17 | アッシュ・ウー・エフ | Parts having a DLC coating and method for applying a DLC coating |
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| JP2003026414A (en) * | 2001-07-17 | 2003-01-29 | Sumitomo Electric Ind Ltd | Amorphous carbon coating film, method of producing the same, and member coated with the amorphous carbon coating film |
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| JP2006266285A (en) * | 2005-03-22 | 2006-10-05 | Kayaba Ind Co Ltd | Mechanical seal |
| JP2006303136A (en) * | 2005-04-20 | 2006-11-02 | Shin Etsu Handotai Co Ltd | Double-side polishing apparatus and carrier therefor and double-side polishing method |
| JP2012505353A (en) * | 2008-10-10 | 2012-03-01 | フェデラル−モーグル ブルシャイド ゲーエムベーハー | Sliding members for internal combustion engines, especially piston rings |
| JP2014517150A (en) * | 2011-05-19 | 2014-07-17 | アッシュ・ウー・エフ | Parts having a DLC coating and method for applying a DLC coating |
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