JP2004253769A - Process and apparatus for manufacturing solder bump - Google Patents

Process and apparatus for manufacturing solder bump Download PDF

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JP2004253769A
JP2004253769A JP2003270721A JP2003270721A JP2004253769A JP 2004253769 A JP2004253769 A JP 2004253769A JP 2003270721 A JP2003270721 A JP 2003270721A JP 2003270721 A JP2003270721 A JP 2003270721A JP 2004253769 A JP2004253769 A JP 2004253769A
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solder
solder ball
substrate
electrode
fixed body
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JP4505783B2 (en
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Motomichi Ito
元通 伊藤
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Proterial Ltd
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Hitachi Metals Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a process and an apparatus for manufacturing a solder bump providing a semiconductor component or a substrate having high reliability in which a solder ball mounted on a semiconductor mounting face is prevented from being broken away, and the solder ball is prevented from being poorly disposed, in the semiconductor component or the substrate of a BGA type. <P>SOLUTION: The process for manufacturing the solder bump in which the solder ball is mounted on an electrode of the semiconductor component or the substrate, includes a process for forming a fixing body having the designated temporary fixing force on the electrode, and a process for mounting the solder ball on the electrode through the fixing body. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

本発明は、BGA(Ball Grid Array)型の半導体部品又は基板においてそれらの電極上に半田バンプを形成する技術分野に係わるものである。   The present invention relates to the technical field of forming solder bumps on electrodes of a BGA (Ball Grid Array) type semiconductor component or substrate.

近年、携帯端末機器やノート型パソコンの高速化と高機能化及び軽量化、小型化と薄型化が進むにつれ、それらに内蔵されるCPUを構成する半導体部品及び半導体部品を実装する基板に対しては、その小型化、薄型化と接続端子数の増加という相反する性能が要求されている。その要求に応ずるものとして、図10に示すBGA型の半導体部品或いは基板がある。図10は、基板7と、その基板7に実装された半導体部品8からなるCPUを示すものであって、図10(a)はCPUの部分拡大正面視、図10(b)は半導体部品8の一部を欠いた平面視、図10(c)は半導体部品8を基板7に実装する状態を示す図である。   2. Description of the Related Art In recent years, as mobile terminals and notebook personal computers have become faster, more sophisticated, lighter, smaller and thinner, semiconductor components constituting a CPU incorporated therein and substrates on which the semiconductor components are mounted have been developed. Are required to have contradictory performances such as miniaturization and thinning and an increase in the number of connection terminals. In response to the demand, there is a BGA type semiconductor component or substrate shown in FIG. 10A and 10B show a CPU including a substrate 7 and a semiconductor component 8 mounted on the substrate 7. FIG. 10A is a partially enlarged front view of the CPU, and FIG. FIG. 10C is a view showing a state where the semiconductor component 8 is mounted on the substrate 7.

基板7は、図10(a)に示すように、薄板状の基板本体71と、基板本体71の上面で、図10(b)に示すように、その中央部に設定した電極エリアFに所定の配列パターンで形成した電極72を有している。半導体部品8は、図10(a)に示すように、その下面に前記電極72の配列パターンと同一の配列パターンで形成した電極81を有しており、基板7の電極72と半導体部品8の電極81は、半田バンプ73を介して電気的に接続される。   As shown in FIG. 10 (a), the substrate 7 has a thin plate-shaped substrate main body 71 and, as shown in FIG. 10 (b), a predetermined area on an electrode area F set at the center thereof, as shown in FIG. 10 (b). Of electrodes 72 formed in the above-mentioned arrangement pattern. As shown in FIG. 10A, the semiconductor component 8 has electrodes 81 formed on the lower surface thereof in the same arrangement pattern as the arrangement pattern of the electrodes 72. The electrodes 81 are electrically connected via the solder bumps 73.

なお、BGA型の半導体部品8或いは基板7は、半導体部品8の電極81に半田バンプ73を形成した態様で市場に供給し、後に基板7と接続する場合と、図10(c)に示すように、基板7の電極72に半田バンプ73を形成した態様で市場に供給し、後に半導体部品8と接続する場合とがあるが、以下の説明では、後者の場合を例に説明する。   The BGA type semiconductor component 8 or the substrate 7 is supplied to the market in a form in which solder bumps 73 are formed on the electrodes 81 of the semiconductor component 8 and then connected to the substrate 7 later, as shown in FIG. In some cases, the solder bumps 73 are formed on the electrodes 72 of the substrate 7 and supplied to the market, and then connected to the semiconductor component 8 later. In the following description, the latter case will be described as an example.

その半田バンプ73の形成方法として、半田ペーストを電極72に印刷する半田ペースト方式、半田球を電極72に搭載する半田球方式、半田をメッキや蒸着する膜付け方式などがある。図10(b)に示すように、電極72の配列ピッチPは、上記した半導体部品8の接続端子数の増加及び小型化のため狭小化し、それに伴い半導体部品8の半田バンプ73の大きさも小型化する傾向にある。もって、小型の半田バンプ73を形成する場合には、電極72に半田球を直接搭載することで半田バンプ73を正確なピッチPで配列することができ、半田バンプ73の大きさに応じた半田球を採用することで所定の大きさの半田バンプ73を容易に得ることができ、加えて生産性の高い半田球方式が多用されている。   As a method of forming the solder bumps 73, there are a solder paste method in which a solder paste is printed on the electrodes 72, a solder ball method in which solder balls are mounted on the electrodes 72, and a film forming method in which solder is plated or vapor-deposited. As shown in FIG. 10B, the arrangement pitch P of the electrodes 72 is reduced due to the increase in the number of connection terminals of the semiconductor component 8 and the miniaturization, and accordingly, the size of the solder bump 73 of the semiconductor component 8 is also reduced. It tends to be. Therefore, when forming the small solder bumps 73, the solder bumps 73 can be arranged at an accurate pitch P by directly mounting the solder balls on the electrodes 72, and the solder bumps corresponding to the size of the solder bumps 73 can be formed. By using a ball, a solder bump 73 having a predetermined size can be easily obtained. In addition, a solder ball method having high productivity is often used.

従来、前記半田球方式によれば、半田バンプ73は、少なくとも、電極72の半導体部品8を実装する面(以下半導体実装面と称する。)721にソルダーペーストもしくはフラックスを印刷する工程と、ソルダーペーストもしくはフラックスが印刷された半導体実装面721に半田球を搭載する半田球搭載工程と、その半田球を加熱し、溶解して半導体実装面721に固定する半田球加熱工程を経て、製造されている。   Conventionally, according to the solder ball method, the solder bump 73 is formed by printing a solder paste or a flux on at least a surface 721 of the electrode 72 on which the semiconductor component 8 is mounted (hereinafter, referred to as a semiconductor mounting surface); Alternatively, it is manufactured through a solder ball mounting step of mounting solder balls on the semiconductor mounting surface 721 on which the flux is printed, and a solder ball heating step of heating, melting and fixing the solder balls to the semiconductor mounting surface 721. .

前記半田球搭載工程で半田球を半導体実装面721に搭載する方法の一例として、下記特許文献1に記載されているような負圧を利用した吸着ヘッドで半田球を吸着し半導体実装面721へ移送し、搭載する吸着方式がある。しかしながら吸着方式では、吸着ヘッドの吸着力で半田球が変形する問題がある一方で、吸着ヘッドと半田球の分離性に劣るため搭載不良が生じるという問題があった。さらに、吸着時の空気流により半田球が帯電して電磁気力を帯び、その電磁気力のために、団子状態となった半田球の集合体が半導体実装面721に搭載され、或いは余剰半田球(いわゆるエクストラボール)が基板7の表面に付着するという問題があり、その問題は特に半田球の小径化に伴い顕著をなってきている。   As an example of a method for mounting solder balls on the semiconductor mounting surface 721 in the solder ball mounting step, a solder ball is suctioned by a suction head using a negative pressure as described in Japanese Patent Application Laid-Open No. H11-150300 and the semiconductor balls are mounted on the semiconductor mounting surface 721. There is a suction method to transfer and load. However, in the suction method, there is a problem that the solder ball is deformed by the suction force of the suction head, but there is a problem that mounting failure occurs due to poor separability between the suction head and the solder ball. Further, the solder balls are charged by the air flow at the time of suction and take on an electromagnetic force, and due to the electromagnetic force, an aggregate of solder balls in a dumped state is mounted on the semiconductor mounting surface 721 or an excess solder ball ( There is a problem that extra balls (so-called extra balls) adhere to the surface of the substrate 7, and this problem has become remarkable especially as the diameter of the solder ball is reduced.

そのような吸着方式の問題を解決する方法として、電極72の配列パターンに対応した位置決め開口部を備えたメタルマスクを用い、その位置決め開口部に半田球を振り込んで半田球を半導体実装面721に搭載する振込み方式がある。ここで、振込みとは、筆、ブラシ又はスキージなどでメタルマスク上に供給した半田球を移動させて位置決め開口部に半田球を挿入する動作や、メタルマスク上に供給した半田球を揺動して位置決め開口部に半田球を挿入する動作を含んでいる。   As a method for solving such a problem of the suction method, a metal mask having a positioning opening corresponding to the arrangement pattern of the electrodes 72 is used, and solder balls are transferred to the positioning opening to place the solder balls on the semiconductor mounting surface 721. There is a transfer method to be mounted. Here, the transfer is an operation of inserting the solder ball into the positioning opening by moving the solder ball supplied on the metal mask with a brush, a brush or a squeegee, or swinging the solder ball supplied on the metal mask. And inserting a solder ball into the positioning opening.

振込み方式により半田球74を半導体実装面721に搭載し、半田バンプ73を形成する半田バンプ73の製造方法の一例が、下記特許文献2に開示されている。下記特許文献2に記載された半田バンプ73の製造方法は、図11に示すように、半導体実装面721にフラックス79を塗布する工程(図11(a))と、半導体実装面721と位置決め開口部923を平面方向に位置合わせして基板7の上にメタルマスク92を載せる工程(図11(b))と、メタルマスク92の位置決め開口部923を通して半田球74を搭載する工程(図11(c))と、メタルマスク92を外す工程(図11(d))と、半導体実装面721に半田球74を加熱して固定する工程(図11(e))とからなるものである。   Patent Document 2 below discloses an example of a method of manufacturing the solder bump 73 in which the solder ball 74 is mounted on the semiconductor mounting surface 721 by a transfer method and the solder bump 73 is formed. As shown in FIG. 11, a method of manufacturing a solder bump 73 described in Patent Document 2 below includes a step of applying a flux 79 to a semiconductor mounting surface 721 (FIG. 11A), a process of applying a flux to the semiconductor mounting surface 721 and a positioning opening. The step of aligning the portion 923 in the plane direction and placing the metal mask 92 on the substrate 7 (FIG. 11B) and the step of mounting the solder balls 74 through the positioning openings 923 of the metal mask 92 (FIG. 11 ( c)), a step of removing the metal mask 92 (FIG. 11D), and a step of heating and fixing the solder balls 74 to the semiconductor mounting surface 721 (FIG. 11E).

かかる振込み方式によれば、上記した吸着方式の問題を防止することができる。すなわち、振込み方式では、半田球74に過大な力を作用させないので半田球74の変形を防止でき、半田球74の搭載は重力の作用で行われるので前記吸着にともなう搭載不良を解消できる。更に、振込みにより半田球74が帯電した場合でも、位置決め開口部923の大きさの規制により団子状態となった半田球74の集合体は半導体実装面721に搭載されず、加えて半導体実装面721の基板7の表面はメタルマスク92で遮蔽しているので余剰半田球は付着しない。
特開2001−223234号公報 特開2001−156092号公報
According to such a transfer method, it is possible to prevent the above-described problem of the suction method. That is, in the transfer method, since an excessive force is not applied to the solder ball 74, the deformation of the solder ball 74 can be prevented. Since the mounting of the solder ball 74 is performed by the action of gravity, the mounting failure due to the suction can be eliminated. Further, even when the solder balls 74 are charged by the transfer, the aggregate of the solder balls 74 in the dumped state due to the restriction of the size of the positioning opening 923 is not mounted on the semiconductor mounting surface 721, and in addition, the semiconductor mounting surface 721 is not mounted. Since the surface of the substrate 7 is shielded by the metal mask 92, no surplus solder balls adhere.
JP 2001-223234 A JP 2001-156092 A

しかしながら、上記振込み方式によれば、図11(c)を参照して説明した半田球74の搭載後の状態を図6(a)に示すように、半導体実装面721に搭載された半田球74はフラックス79の粘性により仮に固定されている状態にある。フラックス79の粘性による半田球74の固定力は小さいため、位置決め開口部923の側面に当接した半田球74が、メタルマスク93を外す際に半導体実装面721から離脱することがあった。また、製造工程中に作用する外力により半田球74が半導体実装面721から離脱することがあった。そのため、図11(d)において符号Aで示すように、半導体実装面721に半田球74が搭載されない、いわゆる搭載不良が生じ、基板7の信頼性を低下させる問題があった。さらに、小型の半田球74を搭載する場合には、帯電による電磁気力のために位置決め開口部923の側面に半田球74が付着し易く、上記搭載不良の問題が顕著であった。   However, according to the transfer method described above, the state after the solder balls 74 described with reference to FIG. 11C are mounted, as shown in FIG. 6A, the solder balls 74 mounted on the semiconductor mounting surface 721. Is temporarily fixed by the viscosity of the flux 79. Since the fixing force of the solder ball 74 due to the viscosity of the flux 79 is small, the solder ball 74 in contact with the side surface of the positioning opening 923 may come off the semiconductor mounting surface 721 when the metal mask 93 is removed. Further, the solder balls 74 may be detached from the semiconductor mounting surface 721 by an external force acting during the manufacturing process. Therefore, as shown by a symbol A in FIG. 11D, the solder balls 74 are not mounted on the semiconductor mounting surface 721, that is, a so-called mounting failure occurs, and there is a problem that the reliability of the substrate 7 is reduced. Furthermore, when the small solder balls 74 are mounted, the solder balls 74 easily adhere to the side surfaces of the positioning openings 923 due to the electromagnetic force due to charging, and the above-described problem of the mounting failure is remarkable.

もって、本発明の目的は、BGA型の半導体部品8或いは基板7において、半導体実装面721に搭載した半田球74の離脱を防止して半田球74の搭載不良の発生が少ない信頼性の高い半導体部品8又は基板7を提供できる半田バンプの製造方法及び製造装置を提供することにある。   Accordingly, an object of the present invention is to prevent the solder balls 74 mounted on the semiconductor mounting surface 721 from being detached in the BGA type semiconductor component 8 or the substrate 7 and to reduce the occurrence of defective mounting of the solder balls 74 and to provide a highly reliable semiconductor. An object of the present invention is to provide a method and an apparatus for manufacturing a solder bump which can provide the component 8 or the substrate 7.

本願発明者らは、上記目的を解決するために鋭意研究を行い、所定の仮固定力、具体的には表面張力或いは粘着力などを有する液状又はゲル状の固着体を半導体実装面721に形成し、その固着体に半田球74を載置すれば、固着体を介して半田球74は半導体実装面721に強固に固着されることを見出した。すなわち、図6(b)に示すように、例えば所定の表面張力を有する固着体75を半導体実装面721に塗布すれば、固着体75はその濡れ性により、半導体実装面721を一様に濡らす状態となる。そのような状態となると、固着体75と半導体実装面721の接触面積が大となり、固着体75の滑水性が低下する。もって、固着体75に外力が作用しても固着体75は、半導体実装面721における位置が保持される。   The present inventors have conducted intensive research to solve the above-mentioned object, and formed a liquid or gel-like fixed body having a predetermined temporary fixing force, specifically, a surface tension or an adhesive force on the semiconductor mounting surface 721. However, it has been found that when the solder ball 74 is placed on the fixed body, the solder ball 74 is firmly fixed to the semiconductor mounting surface 721 via the fixed body. That is, as shown in FIG. 6B, for example, when the fixing body 75 having a predetermined surface tension is applied to the semiconductor mounting surface 721, the fixing body 75 uniformly wets the semiconductor mounting surface 721 due to its wettability. State. In such a state, the contact area between the fixed body 75 and the semiconductor mounting surface 721 becomes large, and the slipperiness of the fixed body 75 decreases. Thus, even if an external force acts on the fixed body 75, the position of the fixed body 75 on the semiconductor mounting surface 721 is maintained.

そのように半導体実装面721に塗布された固着体75に半田球74を載置すると、図6(c)に示すように、固着体75はその濡れ性により、半田球74の底部を一様に濡らし、固着体75の周部が半田球74の底部に密に接し包囲する状態となり、半田球74と固着体75の接触面積が大となる。半田球74の表面に密接した固着体75は、半田球74の表面の微小な凹凸に楔状に入込んで半田球74を仮固定する。もって、上記のように半導体実装面721で位置保持するとともに、半田球74を固定する固着体75を介して、半田球74は半導体実装面721に強固に仮固定されることとなる。   When the solder balls 74 are placed on the fixing body 75 applied to the semiconductor mounting surface 721 in this way, as shown in FIG. 6 (c), the fixing body 75 makes the bottom of the solder balls 74 uniform due to its wettability. Then, the periphery of the fixing body 75 comes into close contact with and surrounds the bottom of the solder ball 74, and the contact area between the solder ball 74 and the fixing body 75 increases. The fixed body 75 that is in close contact with the surface of the solder ball 74 enters the minute unevenness on the surface of the solder ball 74 in a wedge shape to temporarily fix the solder ball 74. Accordingly, the solder balls 74 are temporarily fixed firmly to the semiconductor mounting surface 721 via the fixing body 75 for fixing the solder balls 74 while holding the position on the semiconductor mounting surface 721 as described above.

本願発明者らは、上記見出した固着体に基づいて半導体実装面に搭載された半田球を半導体実装面に強固に固着する方法について鋭意検討し、本発明を完成したものである。すなわち、本発明の半田バンプの製造方法は、半導体部品または基板の電極に半田球を搭載して半田バンプを形成する半田バンプの製造方法において、所定の仮固定力を有する固着体を前記電極に形成する固着体形成工程と、前記固着体を介して前記電極に半田球を搭載する半田球搭載工程を有することを特徴としている。ここで仮固定力とは、具体的には固着体の有する粘着力や表面張力など半田球を離別可能に一時的に固定する力のことを言う。なお、前記半田球搭載工程の後に、半田球を押圧し、加熱し、又は振動する固着工程をしていれば望ましい。さらに望ましくは、前記固着体塗布工程の前に、前記電極を洗浄する電極洗浄工程を有していれば好適である。   The present inventors have diligently studied a method of firmly fixing a solder ball mounted on a semiconductor mounting surface to a semiconductor mounting surface based on the above-described fixing body, and have completed the present invention. That is, in the method of manufacturing a solder bump of the present invention, in the method of manufacturing a solder bump in which a solder ball is formed by mounting a solder ball on an electrode of a semiconductor component or a substrate, a fixed body having a predetermined temporary fixing force is attached to the electrode. The method is characterized in that the method includes a step of forming a fixed body to be formed and a step of mounting a solder ball on the electrode via the fixed body. Here, the term “temporary fixing force” specifically refers to a force for temporarily fixing the solder balls such that the solder balls can be separated, such as the adhesive force and surface tension of the fixed body. Preferably, after the solder ball mounting step, a fixing step of pressing, heating, or vibrating the solder balls is performed. More preferably, it is preferable that the method further includes an electrode cleaning step of cleaning the electrode before the fixed body applying step.

また、本発明の半田バンプの製造装置は、半導体部品または基板の電極に半田球を搭載して半田バンプを形成する半田バンプの製造装置において、所定の仮固定力を有する固着体を前記電極に形成する固着体形成手段を備えた固着体形成部と、前記電極に前記半田球を搭載する半田球搭載部を有することを特徴としている。さらに、前記半田球搭載部は、前記電極に搭載された半田球を押圧する押圧手段、加熱する加熱手段又は加振する加振手段の少なくとも一つを備えた押圧部を有していれば望ましい。さらに望ましくは、前記電極を洗浄する洗浄手段を備えた基板前処理部を有していれば好適である。   Also, the solder bump manufacturing apparatus of the present invention is a solder bump manufacturing apparatus for forming a solder bump by mounting a solder ball on an electrode of a semiconductor component or a substrate, wherein a fixed body having a predetermined temporary fixing force is attached to the electrode. It is characterized by having a fixed body forming portion provided with a fixed body forming means to be formed, and a solder ball mounting portion for mounting the solder ball on the electrode. Further, it is desirable that the solder ball mounting portion has a pressing portion provided with at least one of a pressing unit for pressing the solder ball mounted on the electrode, a heating unit for heating, or a vibration unit for exciting. . More desirably, it is preferable to have a substrate pretreatment unit provided with a cleaning unit for cleaning the electrodes.

本発明の半田バンプの製造方法によれば、所定の仮固定力を有する固着体を基板の電極に形成し、前記固着体を介して前記電極に半田球を搭載するので、電極と半田球表面への固着体の濡れの作用により、半田球は電極に強固に固着される。もって、振込み方式の半田球搭載方法において半田マスクを取外す際、或いは製造工程中に作用する外力により半田球が電極から離脱することを防止して、半田バンプを電極に確実に形成することができ、信頼性の高い基板或いは半導体部品を得ることが可能となる。   According to the method of manufacturing a solder bump of the present invention, a fixed body having a predetermined temporary fixing force is formed on an electrode of a substrate, and a solder ball is mounted on the electrode via the fixed body. The solder ball is firmly fixed to the electrode by the action of the wetting of the fixed body to the electrode. Therefore, when the solder mask is removed in the solder ball mounting method of the transfer method, or the solder ball is prevented from separating from the electrode due to an external force acting during the manufacturing process, the solder bump can be reliably formed on the electrode. Thus, a highly reliable substrate or semiconductor component can be obtained.

本発明の半田バンプの製造方法及び製造装置について以下図面を参照して説明する。ここで参照する図1は、半田バンプ製造装置5の一態様を示す構成図である。図2は、図1の半田バンプ製造装置の半田球搭載部の概略構成図である。図3は、図2の要部を説明する図であって、図2のB矢視である図3(a)は半田球搭載部のマスクの部分拡大平面視、図3(a)のC−C断面である図3(b)はマスクの拡大断面視である。図4は、図1の半田バンプ製造装置5の動作を含む、半田バンプの製造方法を説明する図である。図5は、図1の半田バンプ製造装置の詳細な構成を説明する図である。なお、下記で説明する実施態様で対象とする基板は、上記説明した基板7と同一のものである。また、以下の実施態様で用いられる固着体は、仮固定力として液体或いはゲルの表面張力を応用したものを例に説明する。   The method and apparatus for manufacturing a solder bump according to the present invention will be described below with reference to the drawings. FIG. 1 referred to here is a configuration diagram showing one embodiment of a solder bump manufacturing apparatus 5. FIG. 2 is a schematic configuration diagram of a solder ball mounting portion of the solder bump manufacturing apparatus of FIG. FIG. 3 is a view for explaining a main part of FIG. 2; FIG. 3A, which is a view taken in the direction of arrow B in FIG. FIG. 3B, which is a cross section of FIG. 3C, is an enlarged cross sectional view of the mask. FIG. 4 is a diagram illustrating a method of manufacturing solder bumps, including the operation of the solder bump manufacturing apparatus 5 of FIG. FIG. 5 is a diagram illustrating a detailed configuration of the solder bump manufacturing apparatus of FIG. The target substrate in the embodiment described below is the same as the substrate 7 described above. Further, the fixed body used in the following embodiment will be described as an example in which the surface tension of a liquid or gel is applied as a temporary fixing force.

[実施態様1]
本発明の半田バンプ製造装置5は、上記固着体75と、図1(a)に示すように、電極72の少なくとも半導体実装面721に前記固着体を形成する固着体形成部2と、半導体実装面721に半田球74を搭載する半田球搭載部1とを有している。なお、固着体形成部2と半田球搭載部1は、基板7を搬送する基板搬送部で互いに連結されている。その基板搬送部には、例えばベルトコンベヤやロボットなど周知の搬送手段を用いることができる。以下、上記固着体形成部2、半田球搭載部1について詳述する。
[Embodiment 1]
As shown in FIG. 1A, the solder bump manufacturing apparatus 5 of the present invention includes the fixed body 75, the fixed body forming section 2 for forming the fixed body on at least the semiconductor mounting surface 721 of the electrode 72, and the semiconductor mounting section. And a solder ball mounting portion 1 for mounting the solder balls 74 on the surface 721. Note that the fixed body forming section 2 and the solder ball mounting section 1 are connected to each other by a board transport section that transports the board 7. For the substrate transfer unit, a well-known transfer unit such as a belt conveyor or a robot can be used. Hereinafter, the fixed body forming section 2 and the solder ball mounting section 1 will be described in detail.

[固着体形成部]
固着体形成部2は、図5(a)に示すように、基板7の上方を平面方向に移動自在とし、下部に備えたニードル211の先端から、液状の固着体75を注出するディッピング装置21を有している。固着体形成部2によれば、ディッピング装置21を半導体実装面721に位置決めし、固着体75を塗布し、半導体実装面721に液滴状の固着体75を形成することができる。なお、固着体75の形態は、上記に限定されることなく、例えば層状又は膜状としてもよい。もって、固着体75の塗布は、例えば周知の成膜手段であるスクリーン印刷装置、蒸着装置或いは吹付装置などを用い行うこともできる。
[Fixed body forming part]
As shown in FIG. 5 (a), the fixed body forming unit 2 is movable above the substrate 7 in a planar direction, and a dipping device for discharging a liquid fixed body 75 from the tip of a needle 211 provided below. 21. According to the fixed body forming unit 2, the dipping device 21 can be positioned on the semiconductor mounting surface 721, the fixed body 75 can be applied, and the liquid-shaped fixed body 75 can be formed on the semiconductor mounting surface 721. The form of the fixing body 75 is not limited to the above, and may be, for example, a layer or a film. Accordingly, the application of the fixing body 75 can be performed using, for example, a screen printing apparatus, a vapor deposition apparatus, or a spraying apparatus, which is a well-known film forming means.

[半田球搭載部]
半田球搭載部1は、図2(a)に示すように、半導体実装面を上方に向け水平に基板7の姿勢を保持するホルダ11と、ホルダ11を昇降自在とし、所定の高さに基板7を位置決めする昇降テーブル19と、電極の配置パターンに応じて形成した位置決め開口部を有し、所定の高さに位置決めされた前記基板7と空隙tを介して対向する薄板状のマスク12と、マスク12の右側端を支持する一方で、基板7に対しマスク12を水平方向に離合自在としたマスク移動手段13と、マスク12の右側端の上方に配置する供給口141を有しマスク12の上面に半田球74を供給する供給手段14と、マスク12の上面と接触しつつ水平方向に移動自在な振込手段15と、マスク12の左側端の上方に配置する吸引口161を有しマスク12の上面の半田球74を吸引する除去手段16と、ホルダ11と移動手段13を配設するコモンベース10と、基板7をハンドリングするロボット(図示せず)を備えている。
[Solder ball mounting section]
As shown in FIG. 2 (a), the solder ball mounting unit 1 has a holder 11 for holding the posture of the substrate 7 horizontally with the semiconductor mounting surface facing upward, a holder 11 capable of moving up and down, and And a thin plate-shaped mask 12 having a positioning opening formed in accordance with an electrode arrangement pattern and facing the substrate 7 positioned at a predetermined height via a gap t. A mask moving means 13 for supporting the right end of the mask 12 while allowing the mask 12 to be separated from the substrate 7 in the horizontal direction, and a supply port 141 disposed above the right end of the mask 12. Supply means 14 for supplying solder balls 74 to the upper surface of the mask, transfer means 15 movable in the horizontal direction while being in contact with the upper surface of the mask 12, and a suction port 161 arranged above the left end of the mask 12 Above 12 And removal means 16 for sucking the solder balls 74, and the common base 10 to dispose the holder 11 and the moving means 13, and a robot for handling the substrate 7 (not shown).

前記ホルダ11は、図においてホルダ11の左方に立設した壁部113と、図に示すように基板7の厚みに所定寸法tを加えた深さを有し基板7が装着自在な基板挿着凹部112と、前記基板挿着凹部112の底面に開口した開口部111aと外部に開口した開口部111bと、前記開口部111aと111bを連通する流体通路111と、前記開口部111bにおいて流体通路111に連結し負圧を発生する負圧発生手段を備えている。このホルダ11によれば、基板7を基板挿着凹部112に装着し、負圧発生手段で負圧を発生すれば、基板挿着凹部112の底面に所定の強度で基板7を固定するので、基板7の姿勢を水平に保持することが可能となる。   The holder 11 has a wall portion 113 erected to the left of the holder 11 in the figure, and a substrate insertion plate having a depth obtained by adding a predetermined dimension t to the thickness of the substrate 7 as shown in the figure, to which the substrate 7 can be mounted. A mounting recess 112, an opening 111a opened on the bottom surface of the substrate mounting recess 112, an opening 111b opening to the outside, a fluid passage 111 communicating the openings 111a and 111b, and a fluid passage in the opening 111b. There is provided a negative pressure generating means which is connected to 111 and generates a negative pressure. According to the holder 11, when the substrate 7 is mounted in the substrate insertion recess 112 and a negative pressure is generated by the negative pressure generating means, the substrate 7 is fixed to the bottom surface of the substrate insertion recess 112 with a predetermined strength. The posture of the substrate 7 can be held horizontally.

ホルダ11の初期位置は図2(b)に示す下方位置とし、昇降テーブル19により初期位置からホルダ11を上昇すれば、図2(a)に示すように、基板挿着凹部112に挿着された基板7は所定の高さに位置決めされる。   The initial position of the holder 11 is the lower position shown in FIG. 2B, and when the holder 11 is raised from the initial position by the elevating table 19, the holder 11 is inserted into the substrate insertion concave portion 112 as shown in FIG. The substrate 7 is positioned at a predetermined height.

前記マスク12は、図3(a)に示すように、電極72の配置パターンに応じ形成された位置決め開口部123を有するマスク本体121と、マスク本体121を張設する枠部122を備えており、図2(a)に示すように、その枠部122を介してホルダ11の上面との接触を維持している。   As shown in FIG. 3A, the mask 12 includes a mask body 121 having a positioning opening 123 formed in accordance with the arrangement pattern of the electrodes 72, and a frame 122 on which the mask body 121 is stretched. 2 (a), the contact with the upper surface of the holder 11 is maintained through the frame portion 122.

なお、前記位置決め開口部123は、図3(b)に示すように、半田球74の直径よりやや大きい円形状の上部開口と、上部開口より大きい円形状の下部開口と、上部開口と下部開口を連結する傾斜側面からなるテーパ孔状とすれば望ましい。位置決め開口部123をテーパ孔状とすれば、その傾斜側面と半田球74との間により大きな空隙を形成することができ、マスク12を取外す際の半田球74の離脱を防止できる。   As shown in FIG. 3B, the positioning opening 123 has a circular upper opening slightly larger than the diameter of the solder ball 74, a circular lower opening larger than the upper opening, an upper opening and a lower opening. Is desirably formed into a tapered hole shape having inclined side surfaces connecting the two. If the positioning opening 123 is formed in a tapered shape, a larger gap can be formed between the inclined side surface and the solder ball 74, and the detachment of the solder ball 74 when removing the mask 12 can be prevented.

図2(b)に示す右方位置をマスク12の初期位置とし、マスク移動手段13によりマスク12を左方に移動させれば、図2(a)に示すように、マスク12の左側端面がホルダ11の壁部113の右側面に当接し、マスク12が位置決めされ、図3(a)に示すように、半導体実装面721とマスク12の位置決め開口部123が一致することとなる。さらに、基板装着凹部112に装着した基板7の上面とホルダ11の上面は所定寸法tで離間しているので、図2(a)に示すように、マスク12の下面と基板7の上面の間には一定の空隙tが形成されることとなる。   By setting the right position shown in FIG. 2B as the initial position of the mask 12 and moving the mask 12 to the left by the mask moving means 13, the left end face of the mask 12 becomes as shown in FIG. The mask 12 is positioned in contact with the right side surface of the wall portion 113 of the holder 11, and the semiconductor mounting surface 721 and the positioning opening 123 of the mask 12 coincide with each other as shown in FIG. Further, since the upper surface of the substrate 7 mounted in the substrate mounting recess 112 and the upper surface of the holder 11 are separated by a predetermined distance t, as shown in FIG. , A constant gap t is formed.

なお、マスク12は、例えばポリエチレン、ポリプロピレン、ポリ塩化ビニル、ポリスチレン、ポリアミド、酢酸セルロース、ポリエステル系の少なくともいずれか一種から選択される樹脂からなることが望ましい。樹脂製のマスク12とすれば、帯電した半田球74は位置決め開口部123の側面に付着し難く、もって半田球74の離脱による搭載不良を防止できる。さらに、高コストなメタルマスクの場合は、使用後のメタルマスクを再利用するための洗浄など再生の手間が掛かるが、樹脂マスクは低コストであるので使い捨てすることができ、更に加えて、樹脂マスクの位置決め開口部123はレーザ加工やパンチングなどの機械的、熱的加工で容易に形成することができるので、工業生産上極めて効率的である。   The mask 12 is preferably made of, for example, a resin selected from at least one of polyethylene, polypropylene, polyvinyl chloride, polystyrene, polyamide, cellulose acetate, and polyester. If the mask 12 is made of resin, the charged solder balls 74 are less likely to adhere to the side surfaces of the positioning openings 123, so that mounting failure due to detachment of the solder balls 74 can be prevented. Furthermore, in the case of a high-cost metal mask, it takes time and effort to recycle the metal mask after use, such as cleaning for reuse, but the resin mask is inexpensive and can be disposable. Since the positioning opening 123 of the mask can be easily formed by mechanical or thermal processing such as laser processing or punching, it is extremely efficient in industrial production.

前記振込手段15は、図2(a)に示すように、スキージ、ブラシ或いは筆状のものを用いて、供給口141からマスク12の右側端の上面に供給された半田球74を左側端へ移動して、マスク12の位置決め開口部123へ挿入するものである。なお、振込手段15は上記説明の構成に限られることなく、たとえば、マスク12を水平方向に揺動する、或いは紙面に垂直な軸廻りにマスク12を揺動して位置決め開口部123へ半田球74を挿入するものとしてもよい。   As shown in FIG. 2A, the transfer means 15 uses a squeegee, a brush or a brush to transfer the solder balls 74 supplied from the supply port 141 to the upper surface of the right end of the mask 12 to the left end. It is moved and inserted into the positioning opening 123 of the mask 12. The transfer means 15 is not limited to the configuration described above. For example, the mask 12 may be swung in the horizontal direction, or the mask 12 may be swung about an axis perpendicular to the paper surface to move the solder ball to the positioning opening 123. 74 may be inserted.

上記構成の半田バンプ製造装置5は、半導体実装面721に固着体75を形成し、固着体75を介して半導体実装面721に半田球74を搭載するものである。以下、半田バンプ製造装置5の動作について、図2、図4、図5を参照して詳述する。   In the solder bump manufacturing apparatus 5 having the above configuration, the fixing body 75 is formed on the semiconductor mounting surface 721, and the solder balls 74 are mounted on the semiconductor mounting surface 721 via the fixing body 75. Hereinafter, the operation of the solder bump manufacturing apparatus 5 will be described in detail with reference to FIG. 2, FIG. 4, and FIG.

[固着体塗布工程]
固着体形成部2は、図5(a)に示すように、ディスペンス手段21を半導体実装面721に位置決めし、図4(a)に示すように、電極72の少なくとも半導体実装面721に固着体75を塗布する。その後、基板搬送手段は、固着体75が形成された基板7を半田球搭載部1へ搬送する。
[マスク装着工程]
半田球搭載部1は、図2(b)に示すように、ホルダ11とマスク12が初期位置にあり基板装着凹部112が露出した状態で、半導体実装面721を上方に向け水平な状態とした基板7を基板挿着凹部112にロボットで挿着し、負圧発生手段で負圧を発生させて基板挿着凹部112に基板7を固定する。その後、図2(a)に示すように、半田球搭載部1は、ホルダ11を所定位置まで上昇させ、マスク12を左方に移動させ、図4(b)に示すように、基板7の上方にマスク12を装着する。
[Fixed body coating step]
The fixed body forming part 2 positions the dispensing means 21 on the semiconductor mounting surface 721 as shown in FIG. 5A, and fixes the fixed body to at least the semiconductor mounting surface 721 of the electrode 72 as shown in FIG. Apply 75. Thereafter, the substrate transporting unit transports the substrate 7 on which the fixed body 75 is formed to the solder ball mounting unit 1.
[Mask mounting process]
As shown in FIG. 2 (b), the solder ball mounting portion 1 has the semiconductor mounting surface 721 oriented horizontally upward with the holder 11 and the mask 12 at the initial position and the substrate mounting recess 112 exposed. The substrate 7 is inserted into the substrate insertion concave portion 112 by a robot, and a negative pressure is generated by a negative pressure generating means to fix the substrate 7 in the substrate insertion concave portion 112. Thereafter, as shown in FIG. 2A, the solder ball mounting unit 1 raises the holder 11 to a predetermined position, moves the mask 12 to the left, and as shown in FIG. The mask 12 is mounted above.

[半田球搭載工程]
図2(a)に示すように、半田球搭載部1は、供給手段14でマスク12の右側端の上面に半田球74を供給し、供給した半田球74を振込手段15で左側端部へ移動し、図4(c)に示すように、位置決め開口部123を通して半田球74を挿入し、固着体75を介して半導体実装面721に半田球74を搭載する。その一方で、半田球搭載部1は、位置決め開口部123に挿入されない残余の半田球74を、図2(a)に示すように、マスク12の左側端部に振込手段15で集積し、除去手段16で除去する。
[基板取外工程]
図2(b)に示すように、半田球搭載部1は、ホルダ11を初期位置に復帰させ、マスク12を初期位置に復帰させ、半田球74が搭載された基板7を露出した状態とする。その後、半田球搭載部1は、負圧発生手段の負圧を切り、ロボットで基板挿着凹部112から基板7を取り外す。
[Solder ball mounting process]
As shown in FIG. 2A, the solder ball mounting section 1 supplies the solder balls 74 to the upper surface of the right end of the mask 12 by the supply means 14, and transfers the supplied solder balls 74 to the left end by the transfer means 15. 4C, the solder ball 74 is inserted through the positioning opening 123, and the solder ball 74 is mounted on the semiconductor mounting surface 721 via the fixing body 75. On the other hand, the solder ball mounting section 1 collects the remaining solder balls 74 that are not inserted into the positioning openings 123 at the left end of the mask 12 by the transfer means 15 as shown in FIG. It is removed by means 16.
[Substrate removal process]
As shown in FIG. 2B, the solder ball mounting unit 1 returns the holder 11 to the initial position, returns the mask 12 to the initial position, and exposes the substrate 7 on which the solder balls 74 are mounted. . Thereafter, the solder ball mounting unit 1 turns off the negative pressure of the negative pressure generating means, and removes the substrate 7 from the substrate insertion recess 112 by a robot.

その後、例えば固着体75を加熱し或いは減圧雰囲気中で蒸発させ、半導体実装面721に搭載した半田球74を加熱し、溶融し、溶融した半田球74を冷却し、図4(e)に示すように、半導体実装面721に半田バンプ73を形成する。   Thereafter, for example, the fixing body 75 is heated or evaporated in a reduced-pressure atmosphere, and the solder ball 74 mounted on the semiconductor mounting surface 721 is heated and melted, and the melted solder ball 74 is cooled, as shown in FIG. Thus, the solder bump 73 is formed on the semiconductor mounting surface 721.

上記のように、所定の仮固定力を有する固着体75を半導体実装面721に形成して、その固着体75に半田球74を載置すれば、固着体75を介して半田球74は半導体実装面721に強固に固着されるので、マスク12を取外す際或いは製造工程中に作用する外力により半田球74が半導体実装面721から離脱することを防止でき、半導体実装面721に半田バンプ73を確実に形成することが可能となる。   As described above, if the fixed body 75 having a predetermined temporary fixing force is formed on the semiconductor mounting surface 721 and the solder ball 74 is placed on the fixed body 75, the solder ball 74 is connected to the semiconductor ball via the fixed body 75. Since the solder balls 74 are firmly fixed to the mounting surface 721, the solder balls 74 can be prevented from detaching from the semiconductor mounting surface 721 due to an external force acting when the mask 12 is removed or during a manufacturing process. It is possible to form it reliably.

[実施態様2]
本発明の別の態様について、図1、3、6、7及び8を参照して説明する。ここで参照する図7は、本実施態様の半田バンプ製造装置5´の半田球搭載部の構成図である。図8は、図1の半田バンプ製造装置5´の動作を含む、半田バンプの製造方法を説明する図である。なお、図7及び8において、上記実施態様と同一の構成については、同一の符号を付し詳細な説明を省略する。
[Embodiment 2]
Another embodiment of the present invention will be described with reference to FIGS. 1, 3, 6, 7 and 8. FIG. 7 referred to here is a configuration diagram of a solder ball mounting portion of the solder bump manufacturing apparatus 5 'of the present embodiment. FIG. 8 is a diagram illustrating a method of manufacturing solder bumps, including the operation of the solder bump manufacturing apparatus 5 ′ of FIG. 7 and 8, the same components as those of the above embodiment are denoted by the same reference numerals, and detailed description thereof will be omitted.

本実施態様の半田バンプ製造装置5´は、図1に示すように、前記半田バンプ製造装置5と基本的には同様な固着体形成部2及び半田球搭載部1´を備えており、半導体実装面721と半田球74の固定をさらに強固にするために半田球搭載部1´を工夫したものである。その半田球搭載部1´の構成について、以下詳述する。   As shown in FIG. 1, a solder bump manufacturing apparatus 5 'of the present embodiment includes a fixed body forming section 2 and a solder ball mounting section 1' which are basically the same as the solder bump manufacturing apparatus 5, and includes a semiconductor device. The solder ball mounting portion 1 'is devised to further firmly fix the mounting surface 721 and the solder balls 74. The configuration of the solder ball mounting portion 1 'will be described in detail below.

半田球搭載部1´は、図7(a)に示すように、前記半田球搭載部1と同様なホルダ11と、昇降テーブル19と、マスク12´と、マスク移動手段13と、供給手段14と、振込手段15と、除去手段16と、コモンベース10と、ロボット(図示せず)とを有するとともに、更に、マスク12´に相対する一面171aを有しマスク12´の上方に配設した押圧体171と、押圧体171を保持するとともに、マスク12´の上面に対して17の一面171aを垂直方向に離合自在とする昇降押圧手段172と備えた固着部17を有している。   As shown in FIG. 7A, the solder ball mounting unit 1 'includes a holder 11, a lifting table 19, a mask 12', a mask moving unit 13, and a supplying unit 14 similar to the solder ball mounting unit 1. , A transfer means 15, a removing means 16, a common base 10, and a robot (not shown), and further has a surface 171a facing the mask 12 'and is disposed above the mask 12'. The fixing portion 17 includes a pressing body 171 and lifting / lowering pressing means 172 that holds the pressing body 171 and allows one surface 171a of the 17 to be vertically detachable with respect to the upper surface of the mask 12 ′.

押圧体171のマスク12´に相対する一面(以下当接面と称する。)171aは、図7(b)に示すように、基板7の電極エリアFを少なくとも包含する大きさを有している。押圧体171は、基板挿着凹部112に挿着された基板7の電極エリアFの上方にマスク12´を介して配設する。   One surface (hereinafter, referred to as a contact surface) 171a of the pressing body 171 facing the mask 12 'has a size including at least the electrode area F of the substrate 7, as shown in FIG. 7B. . The pressing body 171 is disposed above the electrode area F of the substrate 7 inserted into the substrate insertion recess 112 via a mask 12 ′.

ここで、前記マスク12´のマスク本体121´の厚みstは、図3(c)に示すように、マスク12´の上面から半田球74の頂部を覗かせるため、数1に示すように設定する。   Here, the thickness st of the mask body 121 ′ of the mask 12 ′ is set as shown in Expression 1 so that the top of the solder ball 74 can be seen from the upper surface of the mask 12 ′ as shown in FIG. I do.

Figure 2004253769
ここで d:半田球の直径
Figure 2004253769
Where d: diameter of solder ball

押圧体171の初期位置を図7(b)に示す上方位置とし、初期位置から押圧体171を昇降押圧手段172で下降すれば、図8(d)に示すように、その当接面171aは、マスク12´の上面から露出した半田球74の頂部に当接する。ここで、昇降押圧手段172で半田球74を適宜な押圧力で押圧すれば、図6(c)に示すように、電極72の半導体実装面721に損傷を与えることなく、半田球74は固着体75に更に深く埋設され、半田球74と固着体75の接触面積はより増加する。もって、固着体75を介して半導体実装面721に半田球74を、さらに強固に固着することが可能となる。   When the initial position of the pressing body 171 is set to the upper position shown in FIG. 7B and the pressing body 171 is lowered from the initial position by the lifting / lowering pressing means 172, as shown in FIG. 8D, the contact surface 171a becomes Abuts on the top of the solder ball 74 exposed from the upper surface of the mask 12 '. Here, when the solder balls 74 are pressed by the vertical pressing means 172 with an appropriate pressing force, the solder balls 74 are fixed without damaging the semiconductor mounting surface 721 of the electrode 72 as shown in FIG. The contact area between the solder ball 74 and the fixed body 75 is further increased by being buried deeper in the body 75. Thus, the solder balls 74 can be more firmly fixed to the semiconductor mounting surface 721 via the fixing body 75.

また、固着部17は、半田球74を加熱する加熱手段を備えていてもよい。加熱手段は、例えば金属ヒータやセラミックヒータなど周知の加熱部材を押圧体171に適宜配設して構成することができる。押圧体171を半田球74に当接しつつ、固着体75の沸点以下かつ半田球74の融点以下の適宜な温度で半田球74を加熱すれば、半田球74を通じて伝導した熱により固着体75が活性化して濡れ性が高まり、半田球74と固着体75の接触面積が増大し、固着体75を介して半導体実装面721に半田球74を強固に固着することができる。   Further, the fixing portion 17 may include a heating means for heating the solder balls 74. The heating unit can be configured by appropriately disposing a well-known heating member such as a metal heater or a ceramic heater on the pressing body 171. By heating the solder ball 74 at an appropriate temperature not higher than the boiling point of the fixing member 75 and not higher than the melting point of the solder ball 74 while the pressing member 171 is in contact with the solder ball 74, the fixing member 75 is heated by the heat transmitted through the solder ball 74. When activated, the wettability increases, the contact area between the solder ball 74 and the fixing body 75 increases, and the solder ball 74 can be firmly fixed to the semiconductor mounting surface 721 via the fixing body 75.

さらに、固着部17は、半田球74を加振する加振手段を備えていてもよい。加振手段は、例えばバイブレータや超音波発生器など周知の加振部材を押圧体171に適宜配設して構成することができる。押圧体171を半田球74に当接しつつ、半田球74に振動を与えれば、半田球74を通じて伝播した振動により固着体75の濡れ性が高まり半田球74と固着体75の接触面積が増大し、その固着体75を介して半導体実装面721に半田球74を強固に固着することができる。   Further, the fixing portion 17 may include a vibrating means for vibrating the solder balls 74. The vibrating means can be configured by appropriately arranging a well-known vibrating member such as a vibrator or an ultrasonic generator on the pressing body 171. When vibration is applied to the solder ball 74 while the pressing body 171 is in contact with the solder ball 74, the wettability of the fixed body 75 is increased by the vibration propagated through the solder ball 74, and the contact area between the solder ball 74 and the fixed body 75 increases. The solder balls 74 can be firmly fixed to the semiconductor mounting surface 721 via the fixing body 75.

なお、図8(d)の一部に示すように、マスク12´の板厚が半田球74の直径より大きい場合には、位置決め開口部123に対応し位置決め開口部123に挿入可能に形成されるとともに半田球74の頂部に当接可能な突起171bを押圧体171に設け、位置決め開口部123に挿入された半田球74に突起171bが選択的に当接できるようにすればよい。   8D, when the thickness of the mask 12 'is larger than the diameter of the solder ball 74, the mask 12' is formed so as to correspond to the positioning opening 123 and be insertable into the positioning opening 123. As shown in FIG. In addition, a protrusion 171b that can contact the top of the solder ball 74 may be provided on the pressing body 171 so that the protrusion 171b can selectively contact the solder ball 74 inserted into the positioning opening 123.

その突起付きの押圧体171は、例えば押圧体171のベースとなる金属板の表面に電気鋳造法で突起171bを形成することにより得ることができる。また、少なくとも異種の金属が2層以上積層された、例えばTiと42%Ni合金を2層積層した薄板を用い、いずれか一方の金属をエッチング加工し突起171bを形成することにより得ることができる。さらに、少なくとも表面と裏面に金属層を有するとともにエッチングストッパーとして金属層の間に形成されたバリア層を有する薄板を用い、表面或いは裏面のいずれか一方をエッチング加工し突起171bを形成すれば、上記突起付き押圧体171を得ることができる。   The pressing body 171 with the projection can be obtained, for example, by forming the projection 171b on the surface of a metal plate serving as a base of the pressing body 171 by an electroforming method. Further, it can be obtained by using a thin plate in which at least two different metals are stacked in two or more layers, for example, two layers of Ti and a 42% Ni alloy, and etching either one of the metals to form the projections 171b. . Furthermore, if a thin plate having a metal layer on at least the front surface and the back surface and having a barrier layer formed between the metal layers as an etching stopper is used, and either the front surface or the back surface is etched to form the projection 171b, The pressing body 171 with a projection can be obtained.

上記構成の半田バンプ製造装置5´は、半導体実装面721に固着体75を形成し、固着体75に半田球74を搭載し、さらに、その半田球74を押圧し、加熱し、又は振動するものである。以下、半田バンプ製造装置5´の動作について詳述する。   The solder bump manufacturing apparatus 5 ′ having the above configuration forms the fixed body 75 on the semiconductor mounting surface 721, mounts the solder ball 74 on the fixed body 75, and further presses, heats, or vibrates the solder ball 74. Things. Hereinafter, the operation of the solder bump manufacturing apparatus 5 'will be described in detail.

半田バンプ製造装置5´は、上記説明と同様に、半導体実装面721に固着体75を塗布し(図8(a)、固着体塗布工程)、基板7の上方にマスク12´を装着し(図8(b)、マスク装着工程)、マスク12´の位置決め開口部123に半田球74を挿入し(図8(c)、半田球搭載工程)、半田球74が固着体75に載置された状態とする。
[固着工程]
半田球搭載部1´は、図7(b)に示す初期位置から、図7(a)に示すように昇降押圧手段172で押圧体171を下降させ、図8(d)に示すように、当接面171aを半田球74の頂部に当接させるとともに、所定の押圧力で半田球74を押圧する。その後、半田球搭載部1´は、押圧体171を上昇させ、初期位置へ復帰させる。
The solder bump manufacturing apparatus 5 ′ applies the fixing body 75 to the semiconductor mounting surface 721 in the same manner as described above (FIG. 8A, fixing body applying step), and mounts the mask 12 ′ above the substrate 7 ( 8B, the mask mounting step), the solder ball 74 is inserted into the positioning opening 123 of the mask 12 ′ (FIG. 8C, the solder ball mounting step), and the solder ball 74 is placed on the fixed body 75. State.
[Fixing step]
The solder ball mounting unit 1 'lowers the pressing body 171 from the initial position shown in FIG. 7B by the lifting / lowering pressing means 172 as shown in FIG. 7A, and as shown in FIG. The contact surface 171a is brought into contact with the top of the solder ball 74, and the solder ball 74 is pressed with a predetermined pressing force. Thereafter, the solder ball mounting section 1 'raises the pressing body 171 and returns it to the initial position.

半田バンプ製造装置5´は、上記説明と同様に基板7を取外す(図8(e)、基板取外工程)。その後、固着体75を加熱し或いは減圧雰囲気中で蒸発させ、半田球74を加熱し、溶融し、溶融した半田球74を冷却すれば、図8(f)に示すように、電極72上に半田バンプ73が形成されることとなる。   The solder bump manufacturing apparatus 5 'removes the substrate 7 in the same manner as described above (FIG. 8E, substrate removing step). Thereafter, the fixing body 75 is heated or evaporated in a reduced-pressure atmosphere, the solder ball 74 is heated and melted, and the melted solder ball 74 is cooled, as shown in FIG. The solder bump 73 will be formed.

上記説明のように、固着体75に載置した半田球74を押圧し、加熱し或いは振動することにより、半田球74と固着体75はより密接した状態となり、さらに半田球74は半導体実装面721に強固に固着されることとなる。   As described above, by pressing, heating, or vibrating the solder ball 74 placed on the fixing body 75, the solder ball 74 and the fixing body 75 are brought into a closer state, and further, the solder ball 74 is placed on the semiconductor mounting surface. 721 will be firmly fixed.

本発明の半田バンプ製造装置のさらに別の態様について、図5及び9を参照して説明する。
半田バンプ製造装置は、図9(a)に示すように、基板7を載置するテーブルと、テーブルの外周に配設した固着体塗布部2及び半田球搭載部1とを備えていてもよい。その半田バンプ製造装置5aによれば、基板7をテーブルに載置し、固着体塗布部2がテーブル方向へ移動して固着体75を塗布し、半田球搭載部1がテーブル方向へ移動して固着体75に半田球74を搭載することとなる。
Still another embodiment of the solder bump manufacturing apparatus of the present invention will be described with reference to FIGS.
As shown in FIG. 9A, the solder bump manufacturing apparatus may include a table on which the substrate 7 is placed, and a fixed body applying section 2 and a solder ball mounting section 1 disposed on the outer periphery of the table. . According to the solder bump manufacturing apparatus 5a, the substrate 7 is placed on the table, the fixed body applying unit 2 moves in the table direction to apply the fixed body 75, and the solder ball mounting unit 1 moves in the table direction. The solder balls 74 are mounted on the fixed body 75.

さらに、図9(b)に示すように、半田バンプ製造装置5bは、前記固着体形成部2の上流に配設し、電極72の半導体実装面721を洗浄する基板前処理部3を備えていれば望ましい。基板前処理部3は、図5(b)に示すように、基板7の上方を平面方向に移動自在とし、液体512に混合した微小粒511を下方に照射する湿式ブラスト装置からなる洗浄手段51を有している。その基板前処理部3によれば、前記固着体塗布工程の前の電極洗浄工程において、半導体実装面721に微小粒511を照射して、半導体実装面721に生じた酸化物や汚れを除去し、半導体実装面721を清浄にすることができる。半導体実装面721を清浄にすれば、さらに半導体実装面721に対する固着体75の濡れ性を高まり、固着体75は半導体実装面721を一様に流動し、半導体実装面721に広く分布することとなる。もって、固着体75と半導体実装面721の密着力が向上し、さらに半田球74は半導体実装面721に強固に固着される。   Further, as shown in FIG. 9 (b), the solder bump manufacturing apparatus 5b includes a substrate pre-processing unit 3 disposed upstream of the fixing body forming unit 2 and cleaning the semiconductor mounting surface 721 of the electrode 72. Is desirable. As shown in FIG. 5 (b), the substrate pretreatment unit 3 is a cleaning unit 51 composed of a wet blasting device that makes the upper part of the substrate 7 movable in a planar direction and irradiates the fine particles 511 mixed with the liquid 512 downward. have. According to the substrate pretreatment unit 3, in the electrode cleaning step before the fixing body applying step, the semiconductor mounting surface 721 is irradiated with the fine particles 511 to remove oxides and dirt generated on the semiconductor mounting surface 721. In addition, the semiconductor mounting surface 721 can be cleaned. If the semiconductor mounting surface 721 is cleaned, the wettability of the fixing body 75 with respect to the semiconductor mounting surface 721 is further increased, and the fixing body 75 flows uniformly on the semiconductor mounting surface 721 and is widely distributed on the semiconductor mounting surface 721. Become. Thus, the adhesion between the fixing body 75 and the semiconductor mounting surface 721 is improved, and the solder balls 74 are firmly fixed to the semiconductor mounting surface 721.

また、半導体実装面721を清浄にすれば、加熱し、溶融した半田球74の半導体実装面721に対する濡れ性が高まり、溶融した半田球74は半導体実装面721上を一様に流動し、半導体実装面721に一様に分布することとなる。もって、ブリッジやボイドなどの欠陥の少ない半田バンプ73を形成することが可能となる。なお、洗浄手段51は、上記説明に限定されることなく、例えばイオン、プラズマ、UV又は高エネルギービームを照射して半導体実装面721を洗浄する、イオン照射装置、プラズマ照射装置、UV照射装置又は高エネルギービーム照射装置などを用いて構成してもよい。   Also, if the semiconductor mounting surface 721 is cleaned, the wettability of the heated and melted solder balls 74 to the semiconductor mounting surface 721 increases, and the molten solder balls 74 flow uniformly on the semiconductor mounting surface 721, It will be uniformly distributed on the mounting surface 721. Accordingly, it is possible to form the solder bump 73 with few defects such as bridges and voids. The cleaning unit 51 is not limited to the above description, and may be, for example, an ion irradiator, a plasma irradiator, a UV irradiator, or an ion irradiator, a plasma irradiator, or a UV irradiator that irradiates ions, plasma, UV, or a high energy beam to clean the semiconductor mounting surface 721. You may comprise using a high energy beam irradiation apparatus etc.

また、図9(c)に示すように、半田バンプ製造装置5cは、半田球搭載手段1の下流に配設した、半田球74を加熱し、溶解する半田球加熱部4を有していれば望ましい。半田球加熱部4は、図5(c)に示すように、基板7の上方に配設した、赤外線411を下方に照射する赤外線加熱装置からなる加熱手段41を有しており、半導体実装面721に搭載した半田球74に赤外線411を照射して、半田球74を加熱し、溶解するものである。なお、加熱手段41は、上記説明に限定されることなく、熱風や高エネルギービームを半田球74に照射する熱風照射装置や高エネルギービーム照射装置を用いて構成することもできる。   Further, as shown in FIG. 9C, the solder bump manufacturing apparatus 5c may have a solder ball heating unit 4 disposed downstream of the solder ball mounting means 1 for heating and melting the solder balls 74. Is desirable. As shown in FIG. 5C, the solder ball heating unit 4 has a heating means 41 which is provided above the substrate 7 and is composed of an infrared heating device for irradiating infrared rays 411 downward. The solder ball 74 mounted on the 721 is irradiated with infrared rays 411 to heat and melt the solder ball 74. The heating unit 41 is not limited to the above description, and may be configured using a hot air irradiation device or a high energy beam irradiation device that irradiates the solder balls 74 with hot air or a high energy beam.

さらに、図9(d)に示すように、半田バンプ製造装置5dは、上記基板前処理部3、固着体塗布部2、半田球搭載部1及び半田球加熱部4を備えていれば、電極72に半田バンプ73を形成する一連の処理を連続して行うことができるので、工業生産上能率的で望ましい。   Further, as shown in FIG. 9 (d), if the solder bump manufacturing apparatus 5d includes the substrate pre-processing unit 3, the fixed body applying unit 2, the solder ball mounting unit 1, and the solder ball heating unit 4, the electrode A series of processes for forming the solder bumps 73 on 72 can be performed continuously, which is efficient and desirable in industrial production.

なお、上記半田バンプ製造装置5〜5cは、上記基板前処理部3、固着体形成部2、半田球搭載部1又は半田球加熱部4を内部空間に配設する筐体(図示せず)と、前記筐体に連結し、筐体の内部空間を真空状態とする真空発生手段(図示せず)或いはN、Ar、Heなどの不活性ガスを発生するガス発生手段を有していれば望ましい。そのような半田バンプ製造装置5〜5cとすれば、基板7や半田球74の周囲を真空或いは不活性雰囲気として、半導体実装面721及び半田球74の表面の酸化や汚れを防止でき、半導体実装面721及び半田球74の表面を清浄に保持することが可能となる。   In addition, the solder bump manufacturing apparatuses 5 to 5c are provided with a housing (not shown) in which the substrate pretreatment unit 3, the fixed body forming unit 2, the solder ball mounting unit 1, or the solder ball heating unit 4 is disposed in an internal space. And a vacuum generating means (not shown) connected to the housing to make the internal space of the housing a vacuum or a gas generating means for generating an inert gas such as N, Ar, or He. desirable. With such solder bump manufacturing apparatuses 5 to 5c, the surroundings of the substrate 7 and the solder balls 74 can be made vacuum or an inert atmosphere to prevent oxidation and dirt on the surfaces of the semiconductor mounting surface 721 and the solder balls 74. The surface 721 and the surfaces of the solder balls 74 can be kept clean.

本発明で使用する固着体75の表面張力に基づいた選択方法例を説明する。固着体75は、表面張力が低く、半田球74と半導体実装面721に対する濡れ性の高いものを選択する。固着体75としては、イソプロピルアルコール、2−オクタノールなど多数のアルコール系の液体や、その液体に例えば、陽イオン性、陰イオン性、両性又は非イオン系の活性成分を含有させたもの、フラックス、無洗浄フラックス、ロジン(松脂)を含有しない無洗浄フラックス、或いはゲルが選択される。   An example of a selection method based on the surface tension of the fixed body 75 used in the present invention will be described. As the fixing body 75, one having a low surface tension and a high wettability to the solder balls 74 and the semiconductor mounting surface 721 is selected. Examples of the fixed body 75 include isopropyl alcohol, a large number of alcohol-based liquids such as 2-octanol, and liquids containing, for example, a cationic, anionic, amphoteric or nonionic active ingredient, flux, A non-cleaning flux, a non-cleaning flux containing no rosin (pine resin), or a gel is selected.

なお、固着体75は、半田球74の融点以下の沸点を有するものを選択することが望ましい。そのような固着体75を選択すれば、半田球74を加熱する熱により同時に固着体75は蒸発するので、固着体75を除去する手間がなく能率的に半田バンプ73を形成することが可能となる。   Note that it is desirable to select the fixing body 75 having a boiling point equal to or lower than the melting point of the solder ball 74. If such a fixed body 75 is selected, the fixed body 75 is evaporated at the same time by the heat for heating the solder balls 74, so that it is possible to efficiently form the solder bumps 73 without the trouble of removing the fixed body 75. Become.

本発明は、導電性ボールのような球状体のみならず、例えば粉体や粒体など不定形状のものを所定のパターンでワークに配列する場合にも適用することが可能である。   The present invention can be applied not only to a spherical body such as a conductive ball, but also to a case where irregular shapes such as powders and granules are arranged on a work in a predetermined pattern.

本発明の半田バンプの製造装置の一例を示す概略構成図である。It is a schematic structure figure showing an example of the manufacturing device of the solder bump of the present invention. 図1の半田球搭載部の構成を示す図である。FIG. 2 is a diagram illustrating a configuration of a solder ball mounting unit in FIG. 1. 図9の半田球搭載部の詳細を示す図である。FIG. 10 is a diagram illustrating details of a solder ball mounting unit in FIG. 9. 図1の搭載装置の動作を説明する工程図である。FIG. 2 is a process diagram illustrating an operation of the mounting device of FIG. 1. 図1の固着体塗布部、図9の基板前処理部及び半田球加熱部の構成を説明する図である。FIG. 10 is a diagram illustrating a configuration of a fixed body application unit in FIG. 1, a substrate pretreatment unit and a solder ball heating unit in FIG. 電極に搭載された半田球の状態を説明する図である。FIG. 4 is a diagram illustrating a state of a solder ball mounted on an electrode. 図1の半田球搭載部の別の態様を示す構成図である。FIG. 2 is a configuration diagram illustrating another embodiment of the solder ball mounting unit of FIG. 1. 図7の半田球搭載部の動作を説明する工程図である。FIG. 8 is a process chart for explaining the operation of the solder ball mounting unit in FIG. 7. 本発明の半田バンプの製造装置の他の例を示す概略構成図である。It is a schematic structure figure showing other examples of a manufacturing device of a solder bump of the present invention. 半田球を搭載する基板の構成を説明する図である。FIG. 3 is a diagram illustrating a configuration of a substrate on which solder balls are mounted. 従来の半田球の搭載方法を説明する図である。It is a figure explaining the mounting method of the conventional solder ball.

符号の説明Explanation of reference numerals

1:半田球搭載部、11:ホルダ、12:マスク、13:マスク移動手段
14:供給手段、15:振込手段、16:除去手段
17:固着部、19:昇降テーブル
2:固着体塗布部
3:基板前処理部
4:半田球加熱部
5:半田バンプ製造装置
7:基板、71:基板本体、72:電極、73:接続端子、74:半田球
75:固着体
8:半導体部品、81:電極
1: Solder ball mounting part, 11: Holder, 12: Mask, 13: Mask moving means 14: Supply means, 15: Transfer means, 16: Removal means 17: Fixing section, 19: Elevating table 2: Fixing body application section 3 : Board pre-processing unit 4: solder ball heating unit 5: solder bump manufacturing device 7: board, 71: board body, 72: electrode, 73: connection terminal, 74: solder ball
75: fixed body 8: semiconductor component, 81: electrode

Claims (6)

半導体部品または基板の電極に半田球を搭載して半田バンプを形成する半田バンプの製造方法において、所定の仮固定力を有する固着体を前記電極に形成する固着体形成工程と、前記固着体を介して前記電極に半田球を搭載する半田球搭載工程を有することを特徴とする半田バンプの製造方法。   In a method for manufacturing a solder bump in which a solder ball is formed by mounting a solder ball on an electrode of a semiconductor component or a substrate, a fixed body forming step of forming a fixed body having a predetermined temporary fixing force on the electrode; A solder ball mounting step of mounting a solder ball on the electrode via a solder ball. 請求項1に記載の半田バンプの製造方法であって、前記半田球搭載工程の後に、半田球を押圧し、加熱し、又は振動する固着工程を有することを特徴とする半田バンプの製造方法。   2. The method according to claim 1, further comprising, after the solder ball mounting step, a fixing step of pressing, heating, or vibrating the solder balls. 請求項1又は2に記載の半田バンプの製造方法であって、前記固着体形成工程の前に、前記電極を洗浄する電極洗浄工程を有することを特徴とする半田バンプの製造方法。   3. The method of manufacturing a solder bump according to claim 1, further comprising an electrode cleaning step of cleaning the electrode before the fixed body forming step. 4. 半導体部品または基板の電極に半田球を搭載して半田バンプを形成する半田バンプの製造装置において、所定の仮固定力を有する固着体を前記電極に形成する固着体形成手段を備えた固着体形成部と、前記電極に前記半田球を搭載する半田球搭載部を有することを特徴とする半田バンプの製造装置。   In a solder bump manufacturing apparatus for forming a solder bump by mounting a solder ball on an electrode of a semiconductor component or a substrate, a fixed body forming means provided with a fixed body forming means for forming a fixed body having a predetermined temporary fixing force on the electrode And a solder ball mounting portion for mounting the solder ball on the electrode. 請求項4に記載の半田バンプの製造装置であって、前記半田球搭載部は、前記電極に搭載された半田球を押圧する押圧手段、加熱する加熱手段又は加振する加振手段の少なくともいずれか一つを備えた固着部を有していることを特徴とする半田バンプの製造装置。   5. The solder bump manufacturing apparatus according to claim 4, wherein the solder ball mounting unit is at least one of a pressing unit that presses a solder ball mounted on the electrode, a heating unit that heats, and a vibration unit that vibrates. An apparatus for manufacturing a solder bump, comprising: a fixing portion having one of them. 請求項4又は5に記載の半田バンプの製造装置であって、前記電極を洗浄する洗浄手段を備えた基板前処理部を有していることを特徴とする半田バンプの製造装置。   The solder bump manufacturing apparatus according to claim 4, further comprising a substrate pre-processing unit including a cleaning unit that cleans the electrodes.
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