JP2004251915A5 - - Google Patents
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- JP2004251915A5 JP2004251915A5 JP2004155475A JP2004155475A JP2004251915A5 JP 2004251915 A5 JP2004251915 A5 JP 2004251915A5 JP 2004155475 A JP2004155475 A JP 2004155475A JP 2004155475 A JP2004155475 A JP 2004155475A JP 2004251915 A5 JP2004251915 A5 JP 2004251915A5
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- sample
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Claims (12)
荷電粒子ビームの照射光学系と、
前記試料に前記荷電粒子ビームを照射して分離された微小試料を載置する試料ホルダと、
前記微小試料を摘出し、前記試料ホルダへ移送する移送手段と、
前記試料または／及び前記移送手段に前記荷電粒子ビームを照射して発生した二次粒子を検出する検出器と、
前記検出器から得られた前記二次粒子の信号を画像化する演算手段と、
前記画像化された二次粒子像を少なくとも表示する表示手段とを備え、
前記演算手段に対し、前記表示手段に表示される前記二次粒子像の表示領域の指定及び前記移動手段の該表示領域内における目標移動位置の指定が可能な入力手段とを備え、
前記演算手段は前記入力手段の入力に基づいて前記移送手段を移動させることを特徴とする試料作製装置。 A sample stage on which the sample is placed;
A charged particle beam irradiation optical system;
A sample holder for placing a micro sample separated by irradiating the charged particle beam to the sample;
A transfer means for extracting the micro sample and transferring it to the sample holder;
A detector for detecting secondary particles generated by irradiating the charged particle beam to the sample or / and the transfer means;
Computing means for imaging the secondary particle signal obtained from the detector;
Display means for displaying at least the imaged secondary particle image,
An input means capable of designating a display area of the secondary particle image displayed on the display means and a target movement position in the display area of the moving means for the computing means,
The sample preparation apparatus characterized in that the calculation means moves the transfer means based on an input of the input means.
前記移送手段と前記微小試料との接触を検知する接触検知手段を備えることを特徴とする試料作製装置。 In the sample preparation device according to claim 1,
A sample preparation apparatus comprising contact detection means for detecting contact between the transfer means and the micro sample.
前記接触検知手段は、前記移送手段により移送された前記微小試料と前記試料ホルダとの接触をさらに検知することを特徴とする試料作製装置。 In the sample preparation device according to claim 2,
The sample preparation apparatus, wherein the contact detection means further detects contact between the micro sample transferred by the transfer means and the sample holder.
前記表示手段は、前記二次粒子像を表示する第一の画面領域と前記入力手段を介して入力可能な前記移送手段の動作を指定する第二の画面領域を備えることを特徴とする試料作製装置。 In the sample preparation device according to claim 1,
The sample preparation is characterized in that the display means includes a first screen area for displaying the secondary particle image and a second screen area for designating an operation of the transfer means that can be input via the input means. apparatus.
前記荷電粒子ビームによる前記微小試料の分離及び前記移送手段による前記微小試料の摘出及び前記試料ホルダへの移送動作を前記表示手段に表示することを特徴とする試料作製装置。 In the sample preparation device according to claim 1,
The sample preparation apparatus characterized in that the display unit displays the separation of the micro sample by the charged particle beam, the extraction of the micro sample by the transfer unit, and the transfer operation to the sample holder.
荷電粒子ビームの照射光学系と、
前記試料に前記荷電粒子ビームを照射して形成された微小試料を載置する試料ホルダと、
前記微小試料を摘出し、前記試料ホルダへ移送するプローブと、
該プローブの移動を制御するプローブ制御部と、
前記試料または／及び前記プローブに前記荷電粒子ビームを照射して発生した二次粒子を検出する検出器と、
前記検出器から得られた前記二次粒子の信号を画像化する二次粒子検出制御部と、
前記画像化された二次粒子像を少なくとも表示する表示部と、
前記プローブ制御部及び前記二次粒子検出制御部を制御する計算処理部とを備え、
前記計算処理部に対し、前記表示部に表示される前記二次粒子像の表示領域の指定及び前記移動手段の該表示領域内における目標移動位置の指定が可能な入力手段とを備え、
前記計算処理部は前記入力手段の入力に基づいて前記プローブ制御部を制御することにより前記プローブを移動させることを特徴とする試料作製装置。 A sample stage on which the sample is placed;
A charged particle beam irradiation optical system;
A sample holder for placing a micro sample formed by irradiating the sample with the charged particle beam;
A probe for extracting the micro sample and transferring it to the sample holder;
A probe controller for controlling movement of the probe;
A detector for detecting secondary particles generated by irradiating the sample or / and the probe with the charged particle beam;
A secondary particle detection controller that images the secondary particle signal obtained from the detector;
A display unit for displaying at least the imaged secondary particle image;
A calculation processing unit for controlling the probe control unit and the secondary particle detection control unit,
An input means capable of designating a display area of the secondary particle image displayed on the display section and a target movement position of the moving means in the display area for the calculation processing section,
The sample processing apparatus, wherein the calculation processing unit moves the probe by controlling the probe control unit based on an input of the input means.
前記プローブの状態または／及び前記試料の状態を表示する第一画面領域と、
前記プローブの操作を指定する手段を有する第二画面領域とを有する表示部と、
前記プローブの操作を指定する手段を介して前記プローブの操作を指示する入力手段とを備え、
前記入力手段の入力に基づいて前記プローブを動作させる制御手段とを備えることを特徴とする試料作製装置。 In a sample preparation device for irradiating a sample with a charged particle beam to cut out a micro sample and extracting the cut out micro sample with a probe
A first screen area for displaying the state of the probe or / and the state of the sample;
A display unit having a second screen area having means for designating the operation of the probe;
Input means for instructing the operation of the probe through means for specifying the operation of the probe;
And a control means for operating the probe based on an input from the input means.
前記第一画面領域に前記試料の所望領域を表示することを特徴とする試料作製装置。 In the sample preparation device according to claim 7,
A sample preparation apparatus, wherein a desired region of the sample is displayed on the first screen region.
前記表示部は前記試料の所望領域の表示状態を指定する手段を有し、
前記入力手段は前記試料の所望領域の表示状態を指定する手段を介して前記表示状態を指示し、当該入力手段の入力に基づいて前記試料の所望領域の表示状態を制御する手段を備えることを特徴とする試料作製装置。 In the sample preparation device according to claim 7 or 8,
The display unit has means for designating a display state of a desired region of the sample,
The input means includes means for instructing the display state via means for designating the display state of the desired area of the sample, and for controlling the display state of the desired area of the sample based on the input of the input means. Characteristic sample preparation device.
前記表示部は前記試料の所望領域の表示状態を指定する手段を有する第三画面領域を備え、
前記入力手段は前記試料の所望領域の表示状態を指定する手段を介して前記表示状態を指示し、当該入力手段の入力に基づいて前記試料の所望領域の表示状態を制御する手段を備えることを特徴とする試料作製装置。 In the sample preparation device according to claim 7,
The display unit includes a third screen area having means for designating a display state of a desired area of the sample,
The input means includes means for instructing the display state via means for designating the display state of the desired area of the sample, and for controlling the display state of the desired area of the sample based on the input of the input means. Characteristic sample preparation device.
前記プローブの状態は前記プローブの移動状態及び前記微小試料を摘出した後の移動状態を含むことを特徴とする試料作製装置。 In the sample preparation device according to claim 7,
The state of the probe includes a moving state of the probe and a moving state after extracting the micro sample.
前記荷電粒子ビームはイオンビームであることを特徴とする試料作製装置。 In the sample preparation device according to claims 1 to 11,
The sample preparation apparatus, wherein the charged particle beam is an ion beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004155475A JP4604554B2 (en) | 2004-05-26 | 2004-05-26 | Probe device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004155475A JP4604554B2 (en) | 2004-05-26 | 2004-05-26 | Probe device |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32632898A Division JP3624721B2 (en) | 1998-11-17 | 1998-11-17 | Probe device |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004251915A JP2004251915A (en) | 2004-09-09 |
| JP2004251915A5 true JP2004251915A5 (en) | 2006-01-05 |
| JP4604554B2 JP4604554B2 (en) | 2011-01-05 |
Family
ID=33028698
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004155475A Expired - Lifetime JP4604554B2 (en) | 2004-05-26 | 2004-05-26 | Probe device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4604554B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007018935A (en) * | 2005-07-08 | 2007-01-25 | Hitachi High-Technologies Corp | Microscope with probe, and probe contact method |
| KR20110008017A (en) * | 2008-02-25 | 2011-01-25 | 더 유니버시티 오브 멜버른 | A method of fabricating a single photon source |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2774884B2 (en) * | 1991-08-22 | 1998-07-09 | 株式会社日立製作所 | Method for separating sample and method for analyzing separated sample obtained by this separation method |
| JPH0580853A (en) * | 1991-09-18 | 1993-04-02 | Fujitsu Ltd | Stage system and stage control method |
| JPH063417A (en) * | 1992-06-23 | 1994-01-11 | Graphtec Corp | Circuit board inspection device |
| JP2506304B2 (en) * | 1993-03-01 | 1996-06-12 | エキスパートマグネティックス株式会社 | Circuit board test equipment |
| JP3401316B2 (en) * | 1994-01-21 | 2003-04-28 | 日置電機株式会社 | Probe position adjustment device corresponding to the height of mounted parts of XY type in-circuit tester |
| JPH0997585A (en) * | 1995-10-02 | 1997-04-08 | Hitachi Ltd | Image reading method and device, and semiconductor manufacturing device using them |
| JP3577839B2 (en) * | 1996-06-04 | 2004-10-20 | 株式会社日立製作所 | Defect inspection method and apparatus |
-
2004
- 2004-05-26 JP JP2004155475A patent/JP4604554B2/en not_active Expired - Lifetime
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