JP2004209919A

JP2004209919A - インクジェット記録用シート

インクジェット記録用シート Download PDF

Info

Publication number: JP2004209919A
Authority: JP; Japan
Prior art keywords: acid; receiving layer; coating; recording sheet; fine particles
Prior art date: 2003-01-08
Legal status : Pending

Application number

JP2003002312A

Other languages

English (en)

Japanese (ja)

Other versions

JP2004209919A5 (enrdf_load_stackoverflow

Inventor

Toshiki Taguchi

敏樹田口

Manabu Ogawa

学小川

Yoshihisa Tsukada

芳久塚田

Masanobu Takashima

正伸高島

Current Assignee

Fujifilm Holdings Corp

Original Assignee

Fuji Photo Film Co Ltd

Priority date

2003-01-08

Filing date

2003-01-08

Publication date

2004-07-29

2003-01-08 Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd

2003-01-08 Priority to JP2003002312A priority Critical patent/JP2004209919A/ja

2004-01-08 Priority to US10/752,564 priority patent/US20040142122A1/en

2004-01-08 Priority to EP04000223A priority patent/EP1437229A3/en

2004-07-29 Publication of JP2004209919A publication Critical patent/JP2004209919A/ja

2006-06-29 Publication of JP2004209919A5 publication Critical patent/JP2004209919A5/ja

Status Pending legal-status Critical Current

Links

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WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
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PDKHNCYLMVRIFV-UHFFFAOYSA-H molybdenum;hexachloride Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Mo] PDKHNCYLMVRIFV-UHFFFAOYSA-H 0.000 description 1
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125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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YZMHQCWXYHARLS-UHFFFAOYSA-N naphthalene-1,2-disulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C21 YZMHQCWXYHARLS-UHFFFAOYSA-N 0.000 description 1
125000001624 naphthyl group Chemical group 0.000 description 1
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CFYGEIAZMVFFDE-UHFFFAOYSA-N neodymium(3+);trinitrate Chemical compound [Nd+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O CFYGEIAZMVFFDE-UHFFFAOYSA-N 0.000 description 1
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TXRHHNYLWVQULI-UHFFFAOYSA-L nickel(2+);disulfamate;tetrahydrate Chemical compound O.O.O.O.[Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O TXRHHNYLWVQULI-UHFFFAOYSA-L 0.000 description 1
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