JP2004196643A - Silicon - Google Patents
Silicon Download PDFInfo
- Publication number
- JP2004196643A JP2004196643A JP2002383377A JP2002383377A JP2004196643A JP 2004196643 A JP2004196643 A JP 2004196643A JP 2002383377 A JP2002383377 A JP 2002383377A JP 2002383377 A JP2002383377 A JP 2002383377A JP 2004196643 A JP2004196643 A JP 2004196643A
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- purity
- silicon tetrachloride
- zinc
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Abstract
Description
【0001】
【発明の属する技術分野】
本発明は、高純度亜鉛ガス及び高純度四塩化珪素ガスを反応させる四塩化珪素の亜鉛ガス化還元法により生成された高純度シリコンに関する。
【0002】
【従来の技術】
従来の方式は、TCS(三塩化シラン)を水素ガスにより還元反応を行い高純度シリコンを生成させているが、反応効率が悪く且つ大電力を消費するために、高純度多結晶シリコンで約5,000円/kgと高価となり、太陽電池用としては不適格品が一部使用されているに過ぎない。
【0003】
【発明が解決しようとする課題】
本発明は、高純度亜鉛ガス及び高純度四塩化珪素ガスを、900℃〜1100℃のガス化雰囲気において反応させることにより、高純度シリコン結晶を生成させるものである。
【0004】
【課題を解決するための手段】
上記課題を解決するため、金属亜鉛及び四塩化珪素をそれぞれ加熱蒸発する蒸発器と、蒸発した四塩化珪素及び金属亜鉛を不活性ガスをキャリアとして温度制御、流量制御を行いつつ所定の量を反応器に導入して還元反応を行わせると、請求項1記載の高純度シリコンが生成する。尚、樹枝状結晶もしくは鱗状結晶等の生成割合は、運転条件により変動する。
【0005】
上記で生成した高純度シリコンは大部分が樹枝状結晶や鱗状結晶よりなるが、形状が一定ではなく微粒子や粉体も含む。尚、キャステイング等の後工程での取り扱いの便の為に、難溶解の粉体は篩等で除去後、加熱・融解し固化した塊状の多結晶シリコンとする。
【0006】
【実施例1】
上記0004項により製造した製品の品質を下記に示す。
(1)測定条件:CZキャロットX’tal 4P測定。
(2)抵抗値:N240Ωcm(Top−5%)、Nl60Ωcm(Top−60%)
(3)Bレベル:P1,020Ωcm(Top−5%)、P990Ωcm(Top−60%)
(4)LT:130μ−sec
【0007】
【実施例2】
上記0005項により製造した製品の品質を下記に示す。
(1)測定条件:CZキャロットX’tal 4P測定。
(2)抵抗値:N270Ωcm(Top−5%)、N400Ωcm(Top−60%)
(3)Bレベル:P240Ωcm(Top−5%)、P280Ωcm(Top−60%)
(4)LT:80μ−sec
【実施例3】
上記0004項により製造した製品のサイズにより分別した1例を下記に示す。
(1)測定条件:16メッシュのスクリーンによる。
(2)同スクリーンを通過するものの割合:37%
(3)同スクリーンを通過しないもの割合:63%[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to high-purity silicon produced by a zinc gasification reduction method of silicon tetrachloride in which high-purity zinc gas and high-purity silicon tetrachloride gas are reacted.
[0002]
[Prior art]
In the conventional method, TCS (silane trichloride) is reduced with hydrogen gas to produce high-purity silicon. However, since the reaction efficiency is low and large power is consumed, about 5% of high-purity polycrystalline silicon is used. It is expensive at 2,000 yen / kg, and only some of the unqualified products are used for solar cells.
[0003]
[Problems to be solved by the invention]
The present invention is to produce high-purity silicon crystals by reacting high-purity zinc gas and high-purity silicon tetrachloride gas in a gasification atmosphere at 900 ° C to 1100 ° C.
[0004]
[Means for Solving the Problems]
In order to solve the above problems, an evaporator for heating and evaporating metal zinc and silicon tetrachloride respectively, and reacting a predetermined amount of the evaporated silicon tetrachloride and metal zinc while performing temperature control and flow rate control using an inert gas as a carrier. The high-purity silicon according to claim 1 is produced when the reaction product is introduced into a vessel to perform a reduction reaction. The rate of formation of dendritic crystals or scale-like crystals varies depending on operating conditions.
[0005]
Most of the high-purity silicon produced above consists of dendritic crystals or scale-like crystals, but the shape is not constant and includes fine particles and powder. In addition, for the convenience of handling in a post-process such as casting, the hardly-dissolved powder is removed by a sieve or the like, and then heated and melted to form a solid polycrystalline silicon.
[0006]
Embodiment 1
The quality of the product manufactured according to the above item 0004 is shown below.
(1) Measurement conditions: CZ carrot X'tal 4P measurement.
(2) Resistance: N240Ωcm (Top-5%), N160Ωcm (Top-60%)
(3) B level: P1,020 Ωcm (Top-5%), P990 Ωcm (Top-60%)
(4) LT: 130 μ-sec
[0007]
Embodiment 2
The quality of the product manufactured according to the above item 0005 is shown below.
(1) Measurement conditions: CZ carrot X'tal 4P measurement.
(2) Resistance value: N270Ωcm (Top-5%), N400Ωcm (Top-60%)
(3) B level: P240Ωcm (Top-5%), P280Ωcm (Top-60%)
(4) LT: 80 μ-sec
Embodiment 3
An example of sorting according to the size of the product manufactured according to the above item 0004 is shown below.
(1) Measurement conditions: 16 mesh screen.
(2) Percentage of those passing through the screen: 37%
(3) Proportion not passing through the screen: 63%
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002383377A JP5087195B2 (en) | 2002-12-19 | 2002-12-19 | Method for producing silicon |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002383377A JP5087195B2 (en) | 2002-12-19 | 2002-12-19 | Method for producing silicon |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004196643A true JP2004196643A (en) | 2004-07-15 |
JP5087195B2 JP5087195B2 (en) | 2012-11-28 |
Family
ID=32767124
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002383377A Expired - Lifetime JP5087195B2 (en) | 2002-12-19 | 2002-12-19 | Method for producing silicon |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5087195B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006056767A (en) * | 2004-08-17 | 2006-03-02 | Yutaka Kamaike | Apparatus and method for producing silicon |
JPWO2008153181A1 (en) * | 2007-06-15 | 2010-08-26 | ソーラーシリコンテクノロジー株式会社 | Reactor for producing silicon raw materials for solar cells |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2773745A (en) * | 1954-07-20 | 1956-12-11 | Du Pont | Process for the production of pure silicon in a coarse crystalline form |
JP2002234719A (en) * | 2001-01-31 | 2002-08-23 | Yutaka Kamaike | Apparatus for producing silicon material and method therefor |
JP2004059416A (en) * | 2002-07-31 | 2004-02-26 | Yutaka Kamaike | Manufacturing method of silicon |
-
2002
- 2002-12-19 JP JP2002383377A patent/JP5087195B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2773745A (en) * | 1954-07-20 | 1956-12-11 | Du Pont | Process for the production of pure silicon in a coarse crystalline form |
JP2002234719A (en) * | 2001-01-31 | 2002-08-23 | Yutaka Kamaike | Apparatus for producing silicon material and method therefor |
JP2004059416A (en) * | 2002-07-31 | 2004-02-26 | Yutaka Kamaike | Manufacturing method of silicon |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006056767A (en) * | 2004-08-17 | 2006-03-02 | Yutaka Kamaike | Apparatus and method for producing silicon |
JPWO2008153181A1 (en) * | 2007-06-15 | 2010-08-26 | ソーラーシリコンテクノロジー株式会社 | Reactor for producing silicon raw materials for solar cells |
Also Published As
Publication number | Publication date |
---|---|
JP5087195B2 (en) | 2012-11-28 |
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