JP2004191995A - Manufacturing method of pattern forming body - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a pattern-forming body in which a pattern can be formed with high accuracy, post-processing after exposure is unnecessary in manufacturing a pattern forming body, and the concern for the deterioration of the pattern-forming body itself is not needed, because photocatalyst is not contained in the pattern-forming body. <P>SOLUTION: In this manufacturing method of the pattern-forming body, a photocatalyst-containing layer side substrate containing at least a photocatalyst, having a layer and a substrate for a pattern-forming body which has having a characteristics-changing layer, whose characteristics change at least by the action of a photocatalyst in the layer having a photocatalyst are placed so that the photocatalyst-containing layer and the characteristics-changing layer are brought into contact each other. The characteristics of the characteristics-changing layer of the exposed part is changed by exposuring, and then a pattern-forming body, having a pattern whose characteristics are changed on the characteristics-changing layer, can be obtained by removing the photocatalyst-containing layer side substrate. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

  The present invention relates to a method for producing a novel pattern formed body that can be used for various applications including printing.

  2. Description of the Related Art Conventionally, as a method of manufacturing a pattern-formed body for forming various patterns such as designs, images, characters, and circuits on a base material, various methods have been manufactured.

  For example, taking printing as an example, a lithographic printing plate used for lithographic printing, which is a type of printing method, is a lithographic plate having a pattern consisting of a lipophilic portion that receives ink and a portion that does not receive printing ink. The lithographic printing plate is used to form an image of the ink to be printed on the lipophilic site, and the formed image is transferred to paper or the like for printing. In such printing, a pattern, such as a character or a figure, is formed on a printing plate precursor to produce a printing plate as a pattern forming body, and the printing plate is mounted on a printing machine for use. Many printing plate precursors for offset printing, which are typical lithographic printing plates, have been proposed.

  A printing plate for offset printing is manufactured by exposing and developing the printing plate precursor through a mask with a pattern, or by directly exposing the plate by electrophotography and making a plate on the printing plate precursor. can do. An electrophotographic offset printing plate precursor is provided with a photoconductive layer mainly composed of photoconductive particles such as zinc oxide and a binder resin on a conductive base material, and is exposed by an electrophotographic method as a photoconductor. An offset original plate, that is, a pattern-formed body is obtained by forming a highly lipophilic image on the surface of a photoreceptor, and subsequently treating the non-image portion with a desensitizing solution to make the non-image portion hydrophilic. The hydrophilic portion is immersed in water or the like to make it oleophobic, and the lipophilic image portion receives the printing ink and is transferred to paper or the like. However, various post-exposure treatments such as treatment with a desensitizing solution are required for pattern formation.

  In addition, a method has been proposed for producing a lithographic printing plate precursor using a heat mode recording material capable of forming a pattern composed of a portion having high acceptability for ink and a portion having ink repellency by laser irradiation. I have. The heat mode recording material has the characteristic that a printing plate can be manufactured simply by forming an image with a laser beam without the need for a process such as development, but the intensity of the laser is adjusted, and the quality is changed by the laser. There are problems in the treatment of residues such as solid materials and the printing durability.

  In addition, as a method of forming a high-definition pattern, a photoresist layer applied on a substrate is subjected to pattern exposure, and after exposure, the photoresist is developed and further etched, or a substance having a functional property in the photoresist. There has been known a method of manufacturing a pattern-formed body by photolithography, for example, by directly forming a target pattern by exposing a photoresist using a photoresist.

  The formation of high-definition patterns by photolithography includes forming colored patterns for color filters used in liquid crystal display devices, forming microlenses, manufacturing fine electric circuit boards, and manufacturing chrome masks used for pattern exposure. However, depending on these methods, it is necessary to use a photoresist, develop with a liquid developer after exposure, or perform etching, so that there is a problem that it is necessary to treat a waste liquid. In addition, when a functional material is used as a photoresist, there is a problem that the photoresist is deteriorated by an alkaline solution or the like used at the time of development.

  A high-definition pattern such as a color filter is also formed by printing or the like, but the pattern formed by printing has problems such as positional accuracy, and it is difficult to form a high-precision pattern. .

  On the other hand, in order to solve such a problem, the present inventors have studied a method of manufacturing a pattern-formed body that forms a pattern using a substance whose wettability changes by the action of a photocatalyst. However, the conventional method of manufacturing a pattern formed body by the action of a photocatalyst has a configuration in which a photocatalyst is included in the manufactured pattern formed body itself. Therefore, depending on the type of the pattern formed body, deterioration can occur due to the photocatalyst. In some cases, there is a problem that there is a possibility.

  The present invention has been made in view of the above-mentioned problems, and it is possible to form a pattern with high accuracy in the production of a pattern formed body, does not require post-processing after exposure, and forms a manufactured pattern. A main object of the present invention is to provide a method for producing a pattern-formed body which does not contain a photocatalyst in the body and therefore does not have to worry about deterioration of the pattern-formed body itself.

  In order to achieve the above object, according to the present invention, there is provided a pattern according to claim 1, comprising a photocatalyst-containing layer-side substrate having at least a photocatalyst-containing layer, and at least a characteristic change layer whose characteristics are changed by the action of a photocatalyst in the photocatalyst-containing layer. The substrate for the formed body, after arranging the photocatalyst containing layer and the property change layer so as to be in contact with each other, by exposing, change the properties of the property change layer of the exposed portion, and then the photocatalyst containing layer side substrate A method for manufacturing a pattern-formed body characterized in that a pattern-formed body having a pattern with changed characteristics on a characteristic-change layer is obtained by removing the pattern-formed body.

  Thus, in the present invention, a pattern is formed by arranging the photocatalyst containing layer and the property change layer so as to be in contact with each other, and then performing exposure to change the property of the property change layer in the exposed portion. Therefore, a pattern-formed body having a high-definition pattern can be manufactured without any need for post-processing after exposure. In addition, since the photocatalyst-containing layer-side substrate is removed from the pattern-formed body after exposure, the pattern-formed body itself does not include the photocatalyst-containing layer, and therefore, there is a concern about deterioration over time due to the action of the photocatalyst on the pattern-formed body. Absent.

  In the present invention, as described in claim 2, the photocatalyst-containing layer-side substrate may include at least a transparent substrate and a photocatalyst-containing layer, and may be formed separately from the pattern-forming body substrate. As described in the above, the photocatalyst-containing layer-side substrate may be formed by coating the photocatalyst-containing layer on the characteristic change layer of the pattern forming substrate.

  When the photocatalyst-containing layer-side substrate is formed separately from the pattern-forming body substrate, and at least comprises a photocatalyst-containing layer and a transparent substrate, this is added to the pattern-forming body substrate characteristic change layer. The photocatalyst-containing layer-side substrate can be used again by removing the photocatalyst-containing layer-side substrate after contacting and exposing the photocatalyst-containing layer-side substrate to form a pattern on the property changing layer by the action of the photocatalyst. . That is, by configuring the photocatalyst-containing layer-side substrate in this way, it is possible in principle to manufacture a pattern-formed body using the photocatalyst-containing layer-side substrate any number of times. Therefore, there is an advantage when a large number of pattern forming bodies are manufactured at one time.

  On the other hand, when the photocatalyst-containing layer-side substrate is formed by coating the photocatalyst-containing layer on the characteristic change layer of the pattern forming substrate, simply coating on the characteristic-change layer can easily cause the photocatalyst-containing layer side. A substrate can be formed, which is advantageous when the number of pattern forming bodies manufactured is small. When the photocatalyst-containing layer side substrate is formed by coating the photocatalyst-containing layer on the property change layer as described above, the photocatalyst-containing layer after the exposure is removed by a method of peeling off using an adhesive tape or the like. Be done.

In the method for producing a pattern-formed body according to the present invention, as described in claim 4, the photocatalyst contained in the photocatalyst-containing layer is titanium dioxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ). , Strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), bismuth oxide (Bi ₂ O ₃ ), and iron oxide (Fe ₂ O ₃ ). preferable. Among them, titanium dioxide (TiO ₂ ) is preferable as described in claim 5. This is because titanium dioxide has a high bandgap energy, is effective as a photocatalyst, is chemically stable, has no toxicity, and is easily available.

  In the present invention, as described in claim 6, it is preferable that the substrate for a pattern forming body is formed of at least a substrate and the characteristic change layer provided on the substrate. This is because the characteristic change layer usually has various characteristics, and is preferably formed as a thin film on the substrate in terms of strength, cost, and function.

  Further, as described in claim 7, the property change layer in the present invention is preferably a wettability change layer whose surface wettability changes by the action of the photocatalyst in the photocatalyst containing layer. There are various characteristics of the characteristic change layer. Among them, an important one is a change in wettability. By using the property change layer as the wettability change layer in this manner, it is possible to form a pattern having a change in wettability by the action of a photocatalyst on the pattern formed body, and the function of ink etc. This is because various functional elements, such as a color filter and a microlens, can be formed by attaching the composition for a sex part as described later.

  In the present invention, as described in claim 8, it is preferable that the wettability changing layer is a wettability changing layer whose wettability changes so that the contact angle of water decreases by exposure. As described above, if the wettability changing layer whose wettability changes so that the contact angle of water is reduced by exposure is formed, the wettability of this layer is easily changed by performing exposure or the like, and the water contact An ink-philic region having a small corner can be formed, and for example, only a portion to which the composition for a functional part is adhered can be easily formed as an ink-philic region. Therefore, a color filter, a micro lens, and the like can be manufactured efficiently, which is advantageous in cost.

  In the present invention, the contact angle with water on the wettability changing layer is preferably 90 ° or more in the unexposed portion and 30 ° or less in the exposed portion (claim 9). Since the unexposed portion is a portion requiring ink repellency, if the contact angle of water is smaller than 90 degrees, the ink repellency is not sufficient, and the composition for a functional part such as ink cannot be used. It is not preferable because it may remain. Further, the reason why the contact angle of water at the exposed portion is 30 degrees or less is that if the contact angle exceeds 30 degrees, the spread of the functional part composition such as ink in this portion may be inferior. This is because, when the characteristic portion is a pixel portion of a color filter, there is a possibility that inconvenience such as occurrence of color omission may occur.

  Further, as described in claim 10, the wettability changing layer is preferably a layer containing an organopolysiloxane. In the present invention, the property required for the wettability changing layer is that it is ink-repellent when light is not irradiated, and the ink-repellent layer is contacted by light when exposed to light. It is a characteristic that it becomes sexual. This is because organopolysiloxane is firstly mentioned as a material for imparting such properties to the wettability changing layer.

Among such organopolysiloxanes, as described in claim _{11, Y n SiX (4-} n) ( where, Y is an alkyl group, fluoroalkyl group, vinyl group, amino group, phenyl group or epoxy group And X represents an alkoxyl group or a halogen, and n is an integer from 0 to 3.) One or more hydrolytic condensates or cohydrolytic condensates of organosilicon compounds represented by the following formula: Preferably, it is a polysiloxane. This is because such an organopolysiloxane satisfies the above characteristics well.

  In the present invention, the characteristic change layer may be a decomposition removal layer which is decomposed and removed by the action of the photocatalyst in the photocatalyst containing layer. Thus, by making the characteristic change layer a decomposition removal layer which is decomposed and removed by the action of the photocatalyst in the photocatalyst containing layer, the exposed portion is decomposed and removed by the action of the photocatalyst. Since the portion exposed to light in this manner can be completely decomposed and removed without the need for a post-treatment, for example, the decomposition-removed layer is made of a photoresist, and the photocatalyst-containing layer-side substrate is brought into contact with the photoresist. This is because, by exposing, there are various uses such as forming a pattern on a photoresist without having to perform a conventional developing step.

  In this case, it is preferable that the contact angle of water between the decomposed and removed layer and the exposed member exposed when the decomposed and removed layer is decomposed and removed is different.

  Since the contact angle of water between the decomposition removal layer and the exposed member exposed when the decomposition removal layer is decomposed and removed is different, the exposed portion is decomposed and removed by the action of the photocatalyst. Then, the exposed member is exposed on the surface. On the other hand, the unexposed portion has the decomposition removal layer remaining. Here, when the contact angle of water is different between the decomposition removal layer and the exposed exposed member, for example, when the decomposition removal layer is formed of an ink-repellent material and the exposed member is formed of an ink-philic material In etc., the decomposition removal layer of the portion can be removed by irradiating light to the portion where the functional portion is to be formed in advance to act on the photocatalyst, the exposed portion is a concave portion and an ink-philic region, Unexposed portions are convex portions and ink-repellent regions. As a result, the functional part composition can be accurately and easily adhered to the concave part where the functional part is provided and the ink-philic area. Therefore, a functional portion can be formed more accurately than when the above-described property change layer is a wettability change layer, and there is no need to perform post-exposure post-processing such as a development step or a cleaning step. Therefore, the steps can be easily simplified, and a functional element having an inexpensive and accurate functional part can be obtained.

  Further, the contact angle of water on the decomposition removal layer is preferably 60 degrees or more, and the contact angle of water on the surface of the exposed member exposed when the decomposition removal layer is decomposed and removed is preferably 30 degrees or less (claim). Item 14).

  In the present invention, a portion that is not exposed has a decomposition removal layer remaining. Here, the portion that is not exposed is a portion that normally requires ink repellency. Therefore, when the contact angle of water on the decomposition removal layer is smaller than 60 degrees, the ink repellency is not sufficient, and It is not preferable because the composition for use may remain.

  On the other hand, the exposed portion is decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer in contact with the decomposition and removal layer. Therefore, in the exposed portion, the exposed member formed below the decomposition removal layer is exposed on the surface. Since this portion is a portion where ink affinity is usually required, if the contact angle of water on the exposed member exceeds 30 degrees, the spread of the functional part composition in this portion may be inferior. This is because there is a possibility that the composition for a functional part may come off in the functional part.

  As described above, since the decomposition removal layer is preferably decomposed and removed by the photocatalyst in the photocatalyst-containing layer in contact and has ink repellency, as described in claim 15, the decomposition removal layer is a hydrocarbon-based layer. It is preferably a fluorine-based or silicone-based nonionic surfactant.

  The method of pattern exposure according to the present invention may be a method using a photomask as described in claim 16 or may be a method using light drawing irradiation as described in claim 17 and is obtained. It is appropriately selected according to the properties, use, and the like of the pattern formed body. The exposure is preferably performed while heating the photocatalyst-containing layer. By exposing the photocatalyst-containing layer while heating the photocatalyst-containing layer in this manner, the photocatalyst in the photocatalyst-containing layer acts on the characteristic change layer with high sensitivity.

  In order to further solve the above-mentioned problems, the present invention provides a photocatalyst-containing layer-side substrate comprising at least a transparent substrate and a photocatalyst-containing layer, the characteristics of which change on the surface due to the action of the photocatalyst. A photocatalyst-containing layer-side substrate for producing a pattern-formed body, wherein a pattern-formed body is formed by contacting and exposing the property-change layer of the pattern-forming substrate having the property-change layer to the photocatalyst-containing layer to form a pattern-formed body. provide.

As described above, the photocatalyst-containing layer-side substrate for producing a pattern-formed body of the present invention, the photocatalyst-containing layer is brought into contact with the characteristic change layer of the substrate for the pattern-formed body, and is exposed to light to form a pattern on the pattern-formed body. Can be formed. Therefore, by removing the layer from the characteristic change layer after exposure, it has an advantage that it can be used repeatedly as many times as possible in principle. In this case, as described in claim 20, the photocatalyst contained in the photocatalyst containing layer is preferably titanium dioxide.
This is because titanium dioxide has a high bandgap energy, is effective as a photocatalyst, is chemically stable, has no toxicity, and is easily available.

  Further, in order to solve the above-mentioned problems, the present invention provides, as described in claim 21, at least a substrate and a characteristic change layer formed on the substrate and having a pattern whose characteristics are changed by the action of a photocatalyst. A pattern forming body characterized by having no photocatalyst containing layer.

  The pattern forming body of the present invention has at least the substrate and the characteristic change layer having the pattern whose characteristics are changed by the action of the photocatalyst. Therefore, for example, when the change in the property is a change in wettability, the pattern formed body can be used as various printing original plates utilizing the difference in receptivity to ink. It is possible to obtain various low-cost printing original plates that do not need to be performed. Further, since this pattern forming body does not have the photocatalyst containing layer, there is an advantage that the pattern forming body is not likely to deteriorate with time due to the action of the photocatalyst.

  In the present invention, as described in claim 22, the property change layer is preferably a wettability change layer in which the wettability is changed by the action of a photocatalyst such that the contact angle of water is reduced by exposure.

  In this way, the property change layer is a wettability change layer in which the wettability changes so that the contact angle of water is reduced by the action of the photocatalyst at the time of exposure, so that the wettability easily changes by performing the exposure. Thus, a pattern formed body having a pattern of an ink-philic region having a small contact angle with water can be obtained. Therefore, by attaching the composition for a functional part to the pattern of the ink-philic region of such a pattern formed body, it is possible to efficiently produce a functional element such as a color filter or a microlens, which is advantageous in cost. Because it becomes.

  Further, according to the present invention, as described in claim 23, the characteristic change layer is a decomposition removal layer that is decomposed and removed by the action of a photocatalyst, and is exposed when the decomposition removal layer and the decomposition removal layer are decomposed and removed. It is preferable that the contact angle of water with the exposing member is different.

  Thus, as described above, the characteristic change layer is a decomposition removal layer, and the pattern forming body is different in the contact angle of water with an exposed member exposed when the decomposition removal layer is decomposed and removed. In addition, it is possible to obtain a pattern formed body in which the wettability of the portion where the functional portion is provided in advance is an ink-philic region having a small contact angle with water, and the other portion is an ink-repellent region with a large contact angle of water. By adhering the functional part composition to the ink-philic area pattern of such a pattern formed body, the functional part composition can be easily adhered only to the ink-philic area having a small water contact angle. it can. Therefore, similarly to the case where the property change layer is the wettability change layer, the functional element can be easily formed from the pattern formed body without performing post-exposure post-processing such as a developing step or a washing step. Therefore, the steps can be easily simplified, and a functional element having a functional portion can be obtained at low cost.

  In the present invention, as described in claim 24, a functional element can be obtained by arranging a functional portion on a portion corresponding to the pattern formed on the pattern forming body. As described above, by using the pattern forming body of the present invention, a functional element can be easily obtained.

  In this case, as described in claim 25, the pattern is a pattern formed by portions having different water contact angles, and in this pattern, a functional portion is formed on a portion where the water contact angle is small. It is preferably an element. This is because, as described above, the functional element can be easily obtained by attaching the functional part composition to the ink-philic region having a small contact angle with water, and thus such a functional element is cost-effective. This is because it is economically advantageous.

  The functional element of the present invention can be a color filter in which the functional part is a pixel part as described in claim 26, and the functional part is a lens as described in claim 27. Thus, a micro lens can be obtained. This is because the advantages of the present invention can be fully utilized by using a color filter or a micro lens.

  In the present invention, since the photocatalyst-containing layer and the property change layer are arranged so as to be in contact with each other, and then exposed, the pattern is formed by changing the property of the property change layer in the exposed portion. A post-exposure post-treatment is not required, and a pattern formed body having a high-definition pattern can be manufactured. In addition, since the photocatalyst-containing layer-side substrate is removed from the pattern-formed body after exposure, the pattern-formed body itself does not include the photocatalyst-containing layer, and therefore, there is a concern about deterioration over time due to the action of the photocatalyst on the pattern-formed body. There is an effect that there is no.

  Hereinafter, the manufacturing method of the pattern forming body of the present invention will be described in detail. The method for producing a pattern-formed body of the present invention includes a photocatalyst-containing layer-side substrate having at least a photocatalyst-containing layer, and a pattern-formed body substrate having at least a property-changing layer whose properties are changed by the action of a photocatalyst in the photocatalyst-containing layer. After arranging the photocatalyst containing layer and the property change layer so as to be in contact with each other, by performing exposure, the property of the property change layer of the exposed portion is changed, and then the photocatalyst containing layer side substrate is removed to remove the property. It is characterized in that a pattern formed body having a pattern with changed characteristics formed on a variable layer is obtained.

  Thus, in the method for producing a pattern-formed body of the present invention, after arranging the photocatalyst-containing layer and the property-changing layer so as to be in contact with each other, and then exposing, the portion of the photocatalyst-containing layer exposed by the action of the photocatalyst is exposed. The characteristics of the characteristic change layer change, and a pattern is formed by an exposed portion on the characteristic change layer, that is, a portion where the characteristic has changed. This eliminates the need for post-processing such as development and cleaning after exposure when forming the pattern, so that the pattern can be formed with fewer steps and at lower cost than in the conventional case. Therefore, by forming the functional portion along the pattern of the pattern forming body, a functional element such as a color filter can be easily and inexpensively formed.

  Further, in the present invention, after changing the properties on the property changing layer by the action of the photocatalyst in the photocatalyst containing layer, the photocatalyst containing layer side substrate is removed and the pattern forming body side substrate becomes a pattern forming body. The photo-catalyst containing layer is not contained in the obtained pattern forming body. Therefore, when a functional part is formed on the obtained pattern formed body to form a functional element, the functional element does not include the photocatalyst-containing layer inside the functional element. It is possible to completely eliminate the possibility of deterioration.

  The method for manufacturing the pattern forming body of the present invention will be described with reference to the drawings. The pattern in the present invention indicates various patterns such as designs, images, circuits, and characters, and is not particularly limited.

  FIG. 1 shows an example of a method for manufacturing a pattern forming body of the present invention. In this manufacturing method, first, a photocatalyst-containing layer-side substrate 3 including a transparent substrate 1 and a photocatalyst-containing layer 2 formed on the transparent substrate 1, a substrate 4, and a characteristic change layer 5 provided on the substrate 4. Is prepared (see FIG. 1A).

  Next, the photocatalyst-containing layer 2 of the photocatalyst-containing layer-side substrate 3 is brought into close contact with the characteristic change layer 5 of the pattern forming substrate 6, and is exposed through a photomask 7 by, for example, UV light. . As a result, the characteristics of the exposed portion on the characteristic change layer 5 change to become the characteristic change portion 8 (see FIG. 1B).

  Next, by removing (separating) the photocatalyst-containing layer-side substrate 3 from the substrate for a pattern forming body, a pattern forming body 9 in which the pattern of the property changing portion 8 is drawn on the property changing layer 5 is formed (FIG. 1C). )reference).

  FIG. 2 shows another example of the method for manufacturing a pattern forming body of the present invention. In this example, first, a substrate 6 for a pattern forming body in which the characteristic change layer 5 is formed on the substrate 4 is prepared (see FIG. 2A). Next, a photocatalyst-containing layer 2 is formed on the characteristic change layer by coating or the like (see FIG. 2B). In this example, the photocatalyst containing layer 2 formed by coating or the like becomes the photocatalyst containing layer side substrate 3 in the present invention. Then, similarly to the first example, exposure is performed through the photomask 7 to form the characteristic change portion 8 on the characteristic change layer 5 (see FIG. 2C). Finally, by removing the photocatalyst containing layer 2, a pattern forming body 9 in which the pattern of the characteristic change portion 8 is formed on the characteristic change layer 5 is obtained (see FIG. 2D).

  Hereinafter, the method for producing a pattern-formed body of the present invention will be described in detail by taking the above-described two production methods as examples.

(Photocatalyst containing layer side substrate)
The photocatalyst-containing layer-side substrate in the present invention includes any substrate having at least a photocatalyst-containing layer. For example, as in the example shown in FIG. 1, a transparent substrate 1 may be included in addition to the photocatalyst-containing layer 2, or as shown in the example in FIG. You may. Further, another layer may be formed as necessary.

  The photocatalyst-containing layer-side substrate is obtained by forming a photocatalyst-containing layer 2 on a transparent substrate 1 as shown in the example of FIG. 1, and is formed separately from the pattern-forming body substrate in advance. It may be formed integrally with the pattern-forming body substrate, such as one formed by being applied on the pattern-forming body substrate 6 as in the example shown in FIG. May be.

  As shown in FIG. 1, when the photocatalyst-containing layer-side substrate 3 is formed separately from the pattern-forming body substrate 6, as shown in FIGS. The substrate 3 is brought into contact with the photocatalyst-containing layer 3 and exposed to light. After a pattern is formed on the characteristic change layer 5 by the action of a photocatalyst, the photocatalyst-containing layer-side substrate 3 is removed to remove the photocatalyst-containing layer. Substrate 3 can be used. That is, by configuring the photocatalyst-containing layer-side substrate in this way, it is possible in principle to use the photocatalyst-containing layer-side substrate any number of times, which is advantageous when a large number of pattern forming bodies are manufactured.

  When the photocatalyst-containing layer-side substrate is formed separately from the pattern forming substrate, it is preferable to have at least a transparent substrate in addition to the photocatalyst-containing layer in view of strength, cost, and the like. That is, as shown in FIG. 1, the photocatalyst-containing layer 2 is formed on the transparent substrate 1 so that the photocatalyst-containing layer 2 can withstand the strength when used repeatedly, and can be formed separately using only the photocatalyst-containing layer 2. This is more cost-effective than doing this.

  Such a photocatalyst-containing layer-side substrate may have any configuration as long as it has at least a photocatalyst-containing layer and a transparent substrate, and has a portion where the photocatalyst-containing layer is exposed on one side. For example, a photomask may be integrally formed, or a protective layer or the like may be formed around the photomask. In FIG. 1B, a contact inhibition layer is formed in a mask pattern on the photocatalyst-containing layer so that a characteristic change portion can be formed in a pattern on the characteristic change layer even when the entire surface is exposed. The contact portion may be limited to a pattern, or the photocatalyst-containing layer itself may be formed in a pattern.

  On the other hand, when the photocatalyst-containing layer-side substrate is integrally formed by applying a photocatalyst-containing layer on the pattern forming substrate 6 as shown in FIG. This eliminates the need for a layer for maintaining strength, which is advantageous in obtaining a small number of pattern-formed bodies.

  In this case, any other layer may be formed as long as at least the photocatalyst-containing layer is included.For example, an adhesive layer or the like may be provided in advance to facilitate removal of the photocatalyst-containing layer-side substrate. . Further, the photocatalyst-containing layer may be formed in a pattern.

(Photocatalyst containing layer)
As described above, the photocatalyst containing layer-side substrate 3 includes at least the photocatalyst containing layer 2.
The photocatalyst-containing layer is not particularly limited as long as it changes the characteristics of the characteristic-change layer with which the photocatalyst in the photocatalyst-containing layer contacts, and is composed of a photocatalyst and a binder. Alternatively, a film formed of a single photocatalyst may be used. In addition, the wettability of the surface may be ink-philic or ink-repellent.

  The mechanism of action of a photocatalyst represented by titanium dioxide as described later in this photocatalyst-containing layer is not necessarily clear, but the carrier generated by light irradiation may be a direct reaction with a nearby compound or oxygen. It is considered that active oxygen species generated in the presence of water change the chemical structure of organic matter. In the present invention, it is considered that this carrier acts on the compound in the property change layer that comes into contact with the photocatalyst containing layer.

Examples of the photocatalyst used in the present invention include titanium dioxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), and tungsten oxide (WO ₃ ) which are known as optical semiconductors. Bismuth oxide (Bi ₂ O ₃ ) and iron oxide (Fe ₂ O ₃ ) can be given, and one or a mixture of two or more thereof can be used.

  In the present invention, titanium dioxide is particularly preferably used because it has a high band gap energy, is chemically stable, has no toxicity, and is easily available. Titanium dioxide includes anatase type and rutile type, and any of them can be used in the present invention, but anatase type titanium dioxide is preferable. Anatase type titanium dioxide has an excitation wavelength of 380 nm or less.

  Examples of such anatase-type titanium dioxide include, for example, anatase-type titania sol of peptized hydrochloric acid (STS-02 (average particle size: 7 nm) manufactured by Ishihara Sangyo Co., Ltd .; ST-K01 manufactured by Ishihara Sangyo Co., Ltd.); Glue-type anatase titania sol (TA-15 (average particle diameter: 12 nm) manufactured by Nissan Chemical Industries, Ltd.) and the like can be mentioned.

  The smaller the particle size of the photocatalyst is, the more effective the photocatalytic reaction takes place. The average particle size is preferably 50 nm or less, more preferably 20 nm or less.

  The photocatalyst containing layer in the present invention may be formed by using only the photocatalyst as described above, or may be formed by mixing with a binder.

  In the case of forming a photocatalyst alone, for example, in the case of titanium dioxide, a method of forming amorphous titania on a transparent substrate or a property changing layer, and then performing a phase change to crystalline titania by firing may be mentioned. As the amorphous titania used here, for example, titanium tetrachloride, hydrolysis and dehydration condensation of inorganic salts of titanium such as titanium sulfate, tetraethoxytitanium, tetraisopropoxytitanium, tetra-n-propoxytitanium, tetrabutoxytitanium, An organic titanium compound such as tetramethoxytitanium can be obtained by hydrolysis and dehydration condensation in the presence of an acid. Next, it can be denatured to anatase type titania by baking at 400 ° C. to 500 ° C., and can be denatured to rutile type titania by baking at 600 ° C. to 700 ° C.

  When a binder is used, it is preferable that the main skeleton of the binder has such a high binding energy that the main skeleton is not decomposed by the photoexcitation of the photocatalyst. For example, such a binder is described in the description of the wettability changing layer described later. An organopolysiloxane described in detail can be mentioned.

  When the organopolysiloxane is used as a binder in this manner, the photocatalyst-containing layer is prepared by dispersing a photocatalyst and an organopolysiloxane as a binder in a solvent together with other additives as necessary, to prepare a coating solution. It can be formed by applying this coating solution on a transparent substrate or on a property changing layer. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating, and bead coating. When an ultraviolet-curable component is contained as a binder, the photocatalyst-containing layer can be formed by performing a curing treatment by irradiating ultraviolet rays.

Further, an amorphous silica precursor can be used as a binder. This amorphous silica precursor is represented by the general formula SiX _4, X is a halogen, a methoxy group, an ethoxy group or a silicon compound an acetyl group or the like, and silanol or average molecular weight of 3,000 or less, their hydrolysates Polysiloxanes are preferred.

  Specific examples include tetraethoxysilane, tetraisopropoxysilane, tetra-n-propoxysilane, tetrabutoxysilane, tetramethoxysilane and the like. In this case, the precursor of the amorphous silica and the particles of the photocatalyst are uniformly dispersed in a non-aqueous solvent, and hydrolyzed by moisture in the air on a transparent substrate to form silanol. To form a photocatalyst-containing layer. If the dehydration-condensation polymerization of silanol is performed at 100 ° C. or higher, the degree of polymerization of silanol increases and the strength of the film surface can be improved. These binders can be used alone or in combination of two or more.

  The content of the photocatalyst in the photocatalyst containing layer can be set in the range of 5 to 60% by weight, preferably 20 to 40% by weight. Further, the thickness of the photocatalyst containing layer is preferably in the range of 0.05 to 10 μm.

  The photocatalyst-containing layer may contain a surfactant in addition to the photocatalyst and the binder. Specifically, hydrocarbons such as NIKKOL BL, BC, BO, and BB series manufactured by Nikko Chemicals Co., Ltd .; ZONYL FSN and FSO manufactured by DuPont; Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd .; Megafac F-141 and 144 manufactured by Ink Chemical Industry Co., Ltd., Futagent F-200 and F251 manufactured by Neos Co., Ltd., Unidyne DS-401 and 402 manufactured by Daikin Industries, Ltd., and Florad FC-170 manufactured by 3M Corporation. 176 and the like, and a fluorine-based or silicone-based nonionic surfactant can be mentioned, and a cationic surfactant, an anionic surfactant, and an amphoteric surfactant can also be used.

  Further, in addition to the above surfactant, the photocatalyst-containing layer, polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate, Oligomers, polymers such as polyvinyl chloride, polyamide, polyimide, styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, polyisoprene, etc. It can be contained.

(Transparent substrate)
In the present invention, as shown in FIG. 1, the photocatalyst-containing layer-side substrate 3 preferably includes a transparent substrate 1 and a photocatalyst-containing layer 2 formed on the transparent substrate 1.

  As shown in FIG. 1B, the transparent substrate transmits light such as UV light so that it can be exposed from the side where the photocatalyst containing layer 2 of the photocatalyst containing layer 2 is not formed. The material is not particularly limited as long as the material is used. Preferred materials include, for example, a transparent rigid material having no flexibility such as quartz glass, Pyrex glass, and a synthetic quartz plate, or a transparent flexible material having flexibility such as a transparent resin film and an optical resin plate. be able to.

(Substrate for pattern forming body)
In the method of manufacturing a pattern-formed body according to the present invention, the photocatalyst-containing layer-side substrate 3 and the pattern-formed body substrate 6 are first prepared as shown in FIGS.
The pattern forming substrate is not particularly limited as long as it has at least a characteristic change layer, but it is preferable that the characteristic change layer is formed on the substrate in view of strength and the like. Further, if necessary, another protective layer or the like may be formed, but it is necessary that the characteristic change layer is exposed on at least one entire surface or partially.

  In the present invention, the pattern-forming substrate refers to a substrate in which a pattern is not yet formed on the characteristic-change layer by the characteristic-change portion, and the pattern-forming substrate is exposed to light, A pattern-formed body in which the pattern of the characteristic change portion is formed is referred to as a pattern formed body.

(Characteristic change layer)
The property changing layer in the present invention may be any layer as long as the property changes by the action of a photocatalyst, for example, a photochromic material such as spiropyran or an organic dye decomposed by the action of a photocatalyst in the property changing layer. And the like may be mixed with the property change layer, and the property change layer may be a layer colored by the action of the photocatalyst.

  In addition, for example, by using a polymer material such as polyolefin such as polyethylene and polypropylene, the exposed portion is subjected to the action of a photocatalyst, a polar group is introduced, or the surface state becomes rough, and various substances are obtained. A layer whose adhesiveness with the layer is improved may be used as the characteristic change layer. By using the property change layer as the adhesive property change layer in which the adhesive property changes, it becomes possible to form a pattern having good adhesive property by pattern exposure. A pattern forming body having such a pattern of a portion having good adhesiveness may be formed, for example, by depositing a metal component on such a pattern forming body, forming a metal thin film, and then utilizing the difference in adhesiveness to form a metal. By peeling the thin film with, for example, an adhesive or a chemical, a metal thin film pattern can be formed. According to this method, it is possible to form a pattern of a metal thin film without forming a pattern of a resist, and it is possible to form a printed circuit board, an electronic circuit element, or the like having a pattern with higher definition than that obtained by a printing method. it can.

  As described above, the property change layer is not particularly limited as long as it is a layer having various properties that change by the action of the photocatalyst. In the present invention, however, the property change layer is changed in wettability by the action of the photocatalyst. The two functions are particularly obtained when the wettability changing layer is formed by a pattern due to the property and when the characteristic change layer is a decomposition removal layer formed by decomposing and removing the pattern by the action of a photocatalyst. It is preferable because the effect of the present invention is derived more from the relationship of the sex elements and the like.

(Wetting change layer)
The wettability changing layer referred to in the present invention is a layer whose surface wettability changes due to the action of a photocatalyst at the time of exposure, and in which a pattern can be formed by a portion where the wettability has changed. Although the wettability changing layer is not particularly limited, it is preferable that the wettability changing layer is a wettability changing layer whose wettability changes so that the contact angle of water decreases by exposure.

  In this way, by making the wettability changing layer such that the wettability changes so that the contact angle of water is reduced by exposure, the wettability is easily changed by performing pattern exposure or the like, and the contact angle of water is small. The pattern of the ink-philic region can be formed. Therefore, for example, by exposing only the portion where the functional portion on the wettability changing layer is formed, it becomes possible to easily form the ink-philic region, and by attaching the functional portion composition to this portion, A functional element can be easily formed. Therefore, a functional element can be manufactured efficiently, which is advantageous in cost.

  Here, the ink-philic region is a region where the contact angle of water is small, and refers to a region having good wettability with a functional part composition such as a coloring ink or a microlens forming composition. And Further, the ink-repellent region is a region where the contact angle of water is large, and is a region having poor wettability with a coloring ink, a composition for forming a microlens, and the like.

  It is preferable that the contact angle of water of the wettability changing layer is 90 ° or more, preferably 140 ° or more in a portion which is not exposed. This is because the unexposed portion is a portion where ink repellency is required in the present invention. Therefore, when the contact angle of water is smaller than 90 degrees, the ink repellency is not sufficient, and This is because there is a possibility that the functional part composition such as ink remains, which is not preferable.

  Further, it is preferable that the wettability changing layer is a layer in which the contact angle of water is reduced by exposure to 30 degrees or less, more preferably 20 degrees or less. The reason why the contact angle of water at the exposed portion is 30 degrees or less is that when the contact angle exceeds 30 degrees, the spread of the composition for a functional part such as a coloring ink in this portion may be inferior. This is because there is a possibility that chipping of the part may occur.

  Note that the contact angle of water here refers to a value measured using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) 30 seconds after a water drop is dropped from a micro syringe.

  As a material used for such a wettability changing layer, the property of the wettability changing layer described above, that is, a material whose wettability changes due to a photocatalyst in a photocatalyst containing layer that comes into contact with exposure, and deteriorated by the action of the photocatalyst, There is no particular limitation as long as it has a main chain that is difficult to decompose. For example, (1) an organopoly which exerts a large strength by hydrolyzing or polycondensing chloro or alkoxysilane by a sol-gel reaction or the like. Siloxane and (2) organopolysiloxanes such as organopolysiloxane crosslinked with reactive silicone having excellent water repellency and oil repellency can be mentioned.

In the case of the above (1), the general formula:
Y _n SiX _(4-n)
(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group, an acetyl group or a halogen. N is an integer of 0 to 3. )
Is preferably an organopolysiloxane which is one or more hydrolytic condensates or cohydrolytic condensates of the silicon compound represented by Here, the carbon number of the group represented by Y is preferably in the range of 1 to 20, and the alkoxy group represented by X is preferably a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. preferable.

  Specifically, methyltrichlorosilane, methyltribromosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-t-butoxysilane; ethyltrichlorosilane, ethyltribromosilane, ethyltrimethoxysilane, Ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltri-t-butoxysilane; n-propyltrichlorosilane, n-propyltribromosilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, n-propyltriisopropoxy Silane, n-propyltri-t-butoxysilane; n-hexyltrichlorosilane, n-hexyltribromosilane, n-hexyltrimethoxysilane, n-hexyltriethoxysilane, n-hexyl N-hexyltri-t-butoxysilane; n-decyltrichlorosilane, n-decyltribromosilane, n-decyltrimethoxysilane, n-decyltriethoxysilane, n-decyltriisopropoxysilane, n -Decyltri-t-butoxysilane; n-octadecyltrichlorosilane, n-octadecyltribromosilane, n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane, n-octadecyltriisopropoxysilane, n-octadecyltrit-butoxysilane Phenyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriisopropoxysilane, phenyltri-t-butoxysilane; tetrachlorosilane Tetrabromosilane, tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane; dimethyldichlorosilane, dimethyldibromosilane, dimethyldimethoxysilane, dimethyldiethoxysilane; diphenyldichlorosilane, diphenyldibromosilane, Diphenyldimethoxysilane, diphenyldiethoxysilane; phenylmethyldichlorosilane, phenylmethyldibromosilane, phenylmethyldimethoxysilane, phenylmethyldiethoxysilane; trichlorohydrosilane, tribromohydrosilane, trimethoxyhydrosilane, triethoxyhydrosilane, triisopropoxy Hydrosilane, tri-t-butoxyhydrosilane; vinyltrichlorosilane, vinyltribromosilane, vinyltri Methoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane, vinyltri-t-butoxysilane; trifluoropropyltrichlorosilane, trifluoropropyltribromosilane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, trifluoropropyl Triisopropoxysilane, trifluoropropyltri-t-butoxysilane; γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxy Propyltriethoxysilane, γ-glycidoxypropyltriisopropoxysilane, γ-glycidoxypropyltri-t-butoxysilane; γ-methacryloxypropylmethyldimethyl Xysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-methacryloxypropyltriisopropoxysilane, γ-methacryloxypropyl Tri-t-butoxysilane; γ-aminopropylmethyldimethoxysilane, γ-aminopropylmethyldiethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltriisopropoxysilane, γ- Aminopropyltri-t-butoxysilane; γ-mercaptopropylmethyldimethoxysilane, γ-mercaptopropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriet Xysilane, γ-mercaptopropyltriisopropoxysilane, γ-mercaptopropyltri-t-butoxysilane; β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane And their partial hydrolysates; and mixtures thereof.

  Further, in particular, a polysiloxane containing a fluoroalkyl group can be preferably used, and specific examples thereof include one or more hydrolytic condensates and co-hydrolytic condensates of the following fluoroalkylsilanes, What is generally known as a fluorine-based silane coupling agent can be used.

CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
(CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
(CF ₃ ) ₂ CF (CF ₂ ) ₆ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
(CF ₃ ) ₂ CF (CF ₂ ) ₈ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
CF ₃ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₃ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₅ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₇ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;
(CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;
(CF ₃ ) ₂ CF (CF ₂ ) ₆ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si CH 3 (OCH 3) 2;
CF ₃ (C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₃ (C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₅ (C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₇ (C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 2 CH 3) 3; and _{CF 3 (CF 2) 7 SO} 2 N (C 2 H 5) C 2 H 4 CH 2 Si (OCH 3) 3.

  By using a polysiloxane containing a fluoroalkyl group as described above as a binder, the ink repellency of the non-exposed portion of the wettability changing layer is greatly improved, and the adhesion of a functional portion composition such as a coloring ink is performed. Express a function that prevents

  Examples of the reactive silicone of the above (2) include compounds having a skeleton represented by the following general formula.

However, n is an integer of 2 or more, and R ¹ and R ² are a substituted or unsubstituted alkyl, alkenyl, aryl or cyanoalkyl group having 1 to 10 carbon atoms, respectively. Vinyl, phenyl and halogenated phenyl. Further, those in which R ¹ and R ² are methyl groups are preferred because the surface energy is minimized, and the molar ratio of the methyl groups is preferably 60% or more. Further, the chain terminal or the side chain has at least one or more reactive group such as a hydroxyl group in the molecular chain.

  Further, a stable organosilicone compound which does not undergo a cross-linking reaction, such as dimethylpolysiloxane, may be mixed with the above-mentioned organopolysiloxane.

  The wettability changing layer in the present invention may further contain a surfactant. Specifically, hydrocarbons such as NIKKOL BL, BC, BO, and BB series manufactured by Nikko Chemicals Co., Ltd .; ZONYL FSN and FSO manufactured by DuPont; Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd .; Megafac F-141 and 144 manufactured by Ink Chemical Industry Co., Ltd., Futagent F-200 and F251 manufactured by Neos Co., Ltd., Unidyne DS-401 and 402 manufactured by Daikin Industries, Ltd., and Florad FC-170 manufactured by 3M Corporation. 176 and the like, and a fluorine-based or silicone-based nonionic surfactant can be mentioned, and a cationic surfactant, an anionic surfactant, and an amphoteric surfactant can also be used.

  Further, in addition to the above surfactant, the wettability changing layer, polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate , Polyvinyl chloride, polyamide, polyimide, styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, oligomers such as epichlorohydrin, polysulfide, polyisoprene, polymers, etc. Can be contained.

  Such a wettability changing layer can be formed by dispersing the above-described components in a solvent together with other additives as necessary to prepare a coating solution, and applying the coating solution on a substrate. . As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating, and bead coating. When the composition contains an ultraviolet-curable component, a wettability changing layer can be formed by performing a curing treatment by irradiating ultraviolet rays.

  In the present invention, the thickness of the wettability changing layer is preferably from 0.001 μm to 1 μm, particularly preferably from 0.01 to 0.1 μm, in view of the change rate of the wettability by the photocatalyst. is there.

  In the present invention, by using the wettability changing layer of the above-mentioned components, by the action of the photocatalyst in the photocatalyst containing layer that comes into contact, the action of oxidation, decomposition and the like of the organic groups and additives which are a part of the above components is used. By changing the wettability of the exposed portion to make it ink-philic, a large difference in wettability with the non-exposed portion can be caused. Therefore, by improving the receptivity (ink-affinity) and repellency (ink-repellency) with a functional part composition, for example, a coloring ink or the like, a color filter of good quality and advantageous in cost can be obtained. And the like.

(Decomposition removal layer)
Next, the decomposition removal layer will be described. The decomposed and removed layer is a layer from which the exposed and removed portion of the decomposed and removed layer is decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer when exposed. For example, in FIG. 1, when the characteristic change layer 5 is a decomposition removal layer, the characteristic change portion in FIG. 1C is decomposed and removed by the action of the photocatalyst, as shown in FIG. Then, the pattern of the decomposition removal layer 10, in other words, the decomposition removal layer 10 is removed, and a pattern formed body on which a pattern of concavities and convexities exposing the lower substrate 4 can be obtained. Also, in FIG. 2, similarly, a pattern formed body in which the decomposition removal layer 10 is removed from the substrate 4 and an uneven pattern in which the substrate 4 is exposed can be obtained (see FIG. 2D ').

  As described above, since the exposed portion is decomposed and removed by the action of the photocatalyst, the decomposed / removed layer is composed of a portion having the decomposed / removed layer and a portion having no decomposed / removed layer without performing a developing step or a washing step, that is, a pattern having irregularities. Can be formed. Therefore, a member requiring a pattern of concavities and convexities such as various printing plate precursors can be easily formed by this method. Also, by applying this decomposition removal layer on the screen and contacting the photocatalyst containing layer side substrate with pattern exposure, the decomposition removal layer in the exposed part is decomposed and removed, so the original plate for screen printing is developed. -Can be formed without a cleaning step. Further, when the decomposition removal layer is formed of a material having resist properties, the pattern of the resist can be easily formed by pattern exposure in contact with the substrate on the photocatalyst containing layer side. Therefore, it can be used in a semiconductor manufacturing process or the like as a photoresist without a developing / cleaning process.

  The decomposed and removed layer is oxidized and decomposed by the action of a photocatalyst by exposure and is vaporized. Therefore, the decomposed and removed layer is removed without a special post-treatment such as a developing and washing step. Depending on the case, a cleaning step or the like may be performed.

  When this decomposition removal layer is used, it is possible not only to form irregularities, but also to form a pattern due to the difference in characteristics between the exposed member that is exposed after being decomposed and removed and the decomposition removal layer. Examples of such properties include various properties such as adhesiveness and color developing property. Among them, in the present invention, wettability can be mentioned. This is preferable from the viewpoint of the effectiveness when the element is formed in a specific manner.

  That is, in the present invention, it is preferable that the contact angle of water between the decomposition removal layer and the exposed member exposed by the decomposition removal layer being decomposed and removed is different, and in particular, the contact angle of water of the exposure member is preferable. It is preferable that the contact angle of water on the decomposition removal layer is larger, and it is particularly preferable that the contact angle of the decomposition removal layer with water is 60 degrees or more.

  This is because, in the present invention, the unexposed portion is a portion where the decomposed / removed layer remains, that is, a convex portion. Therefore, the decomposed / removed layer is removed and the exposed member is exposed rather than attaching the functional portion composition to the convex portion. It is preferable that the composition for a functional part is adhered to the recessed portion. For this reason, it is preferable that the decomposition removal layer exhibit ink repellency so that the functional part composition is not easily adhered, and the contact angle of water on the decomposition removal layer is preferably larger than the contact angle of water of the exposed member. It becomes. If the contact angle of water on the decomposition removal layer is smaller than 60 degrees, the ink repellency is not sufficient, and for example, there is a possibility that a functional part composition such as a coloring ink may remain, which is not preferable.

  The material used for such a decomposition removal layer is a material which is decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer which is brought into contact with the light by exposure, and preferably has a contact angle with water. Is a material whose angle is 60 degrees or more.

  Examples of such a material include hydrocarbon-based, fluorine-based, and silicone-based nonionic surfactants. Specific examples of such a material include polyoxyethylene alkyl ether, polyoxyethylene alkyl phenyl ether, perfluoroalkyl ethylene oxide adduct, and perfluoroalkyl amine oxide.

  Such a material may be a hydrocarbon-based nonionic surfactant such as NIKKOL BL, BC, BO, or BB series (trade name, manufactured by Nippon Surfactant Industries, Ltd.), or a fluorine-based or silicon-based nonionic surfactant. ZONYL FSN, FSO (trade name, manufactured by DuPont), Surflon S-141, 145 (trade name, manufactured by Asahi Glass Co.), Megafac F-141, 144 (trade name, Dainippon Ink) F200, F251 (trade name, manufactured by Neos), Unidyne DS-401, 402 (trade name, manufactured by Daikin Industries), and Florard FC-170, 176 (trade name, manufactured by 3M) can do.

  As the material for the decomposition removal layer, other cationic, anionic and amphoteric surfactants can be used. Specifically, sodium alkylbenzene sulfonate, alkyltrimethylammonium salt, perfluoroalkylcarboxylate And perfluoroalkyl betaine.

  Further, as a material of the decomposition removal layer, various polymers or oligomers can be used in addition to the surfactant. Examples of such a polymer or oligomer include polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate, polyvinyl chloride, polyamide, and polyimide. Styrene, butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, nylon, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, polyisoprene, and the like. In the present invention, it is preferable to use an ink-repellent polymer having a high contact angle with water, such as polyethylene, polypropylene, polystyrene and polyvinyl chloride.

  Such a decomposition-removed layer is prepared by dispersing the above-mentioned components in a solvent together with other additives as necessary to prepare a coating solution, and applying the coating solution to a substrate or an exposed member (the substrate and the exposed member are commonly used). It can be formed by applying on the surface. The coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating, and bead coating.

  In the present invention, the thickness of the decomposition removal layer is preferably from 0.001 μm to 1 μm, and particularly preferably from 0.01 to 0.1 μm, in view of the decomposition rate by the photocatalyst.

(substrate)
In the method of manufacturing a pattern-formed body according to the present invention, the characteristic change layer is preferably formed on the substrate 4 as shown in FIGS. 1 and 2 from the relationship with the strength and the relationship with the final functional element. . Examples of such a substrate include metals such as glass, aluminum, and alloys thereof, plastics, woven fabrics, and nonwoven fabrics, depending on the use of the patterned body or the functional element formed by the patterned body.

  When the characteristic change layer is a decomposition removal layer as described above, an exposed member may be provided between the substrate and the decomposition removal layer. The exposed member is a member that is exposed when the decomposition removal layer is decomposed and removed by the action of the photocatalyst by exposure as described above, and is preferably formed of a material having different characteristics from the decomposition removal layer. In particular, as described above, when the property is wettability, the contact angle with water is preferably 30 degrees or less. Examples of such a material include an inorganic material such as glass ceramics, and a polymer material whose surface has been subjected to a hydrophilizing treatment with plasma or a coupling agent.

  In the present invention, when the substrate has a function as the exposed member, it is not necessary to separately provide an exposed member.

(Contact between the photocatalyst containing layer and the property change layer)
In the present invention, as shown in FIGS. 1 (B) and 2 (C), the photocatalyst-containing layer 2 of the photocatalyst-containing layer-side substrate 3 and the characteristic change layer 5 of the pattern forming substrate 6 come into contact during exposure. Need to be arranged to be.

  Here, the term “contact” as used in the present invention means a state in which the action of the photocatalyst substantially extends to the property change layer, and as shown in FIG. 1B includes a state in which it is applied and formed and is in close contact with it, and a state in which it is in physical contact as shown in FIG. This also includes a case where the photocatalyst in the photocatalyst-containing layer is arranged so that the action of the photocatalyst reaches the characteristic change layer. In the present invention, such a contact state only needs to be maintained at least during the exposure.

(exposure)
In the present invention, after the photocatalyst containing layer 2 of the photocatalyst containing layer side substrate 3 and the property changing layer 5 of the pattern forming substrate 6 are arranged so as to be in contact with each other, FIG. 1 (B) and FIG. Exposure is performed as shown in FIG.

  The pattern formation by exposure in the present invention may be performed by exposure through a photomask 7 as shown in FIGS. 1B and 2C, or by optical drawing irradiation using a laser beam or the like. It may be.

  When the photomask is used, a fine pattern can be formed by using a reduction projection exposure method for reducing an image of a mask pattern by a reduction optical system. As such a photomask, a photomask formed on a metal plate like a vapor deposition mask, a glass plate formed of metal chromium, and the like, and a plate making film or the like for printing use can be used.

  On the other hand, in the case of light drawing irradiation using laser light or the like, a predetermined pattern can be drawn directly using a predetermined drawing irradiation system without using a photomask.

  Usually, the wavelength of light used for such exposure is set within a range of 400 nm or less, preferably 380 nm or less, but is not limited thereto. For example, doping of metal ions such as chromium, platinum, and palladium is performed. It is also possible to make it sensitive to visible and other wavelengths by adding a fluorescent substance or a photosensitive dye. Examples of such dyes include cyanine dyes such as cyanine dyes, carbocyanine dyes, dicarbocyanine dyes, and hemicyanine dyes.Other useful dyes include crystal violet and triphenylmethane such as basic fuchsin. Examples include diphenylmethane dyes such as dyes, xanthene dyes such as rhodamine B, Victoria blue, brilliant green, malachite green, methylene blue, pyrylium salts, benzopyrylium salts, trimethine benzopyrylium salts, triallylcarbonium salts, and the like.

  Examples of the light source that can be used for such exposure include a mercury lamp, a metal halide lamp, a xenon lamp, an excimer lamp, an excimer laser, a YAG laser, and various other light sources.

  The irradiation amount of light at the time of exposure is an irradiation amount necessary for the characteristic change layer to change characteristics by the action of a photocatalyst. At this time, the sensitivity can be increased by exposing the photocatalyst-containing layer while heating. This is particularly important when using optical drawing irradiation.

  In FIGS. 1B and 2C, it can be said that the exposure is performed from the photocatalyst containing layer side substrate 3 side. However, in the present invention, the direction of the exposure is not limited to this, and the exposure direction is not limited to this. If the variable layer 5 transmits light, the exposure may be performed from the pattern forming substrate 4 side.

  By performing the exposure in this manner, the exposed characteristic change layer 5 becomes a characteristic change portion 8 in a pattern as shown in FIGS. 1B and 2C. This property changing portion is, for example, a wettability changing portion if the property changing layer changes the wettability by exposure, and if the property changing layer is an adhesiveness changing layer whose adhesiveness changes, the adhesiveness differs. If it is a decomposed and removed layer that is further decomposed and removed, it will be a part where a concave portion is formed.

(Removal of photocatalyst containing layer side substrate)
In the present invention, as shown in FIGS. 1 (C) and 2 (D), after exposure is performed, the photocatalyst-containing layer-side substrate 3 is removed, so that the characteristic change portion 8 is formed on the characteristic change layer 5. A pattern forming body 9 on which a pattern is formed is obtained.

  The removal of the photocatalyst-containing layer-side substrate in the present invention is performed, for example, by simply removing the photocatalyst-containing layer-side substrate 3 from the pattern forming body 9 if the photocatalyst-containing layer-side substrate is simply in contact as shown in FIG. When the photocatalyst-containing layer-side substrate 3 is in close contact with the pattern forming body, as shown in FIG. 2, for example, it is necessary to peel it off using, for example, an adhesive tape. .

(Patterned body)
The pattern formed body thus obtained has a pattern of a characteristic change portion formed on the characteristic change layer. Therefore, when the property of the property changing layer is wettability, the portion where the wettability changes has changed the acceptability of the printing ink, and thus can be used as a printing plate. When the pattern forming body of the present invention is used as a printing plate precursor, there is no need for wet development or the like, and there is an effect that the preparation of the printing plate is completed simultaneously with exposure.

  Further, when the characteristic change layer is a decomposition removal layer, the exposed portion is decomposed and removed by the action of the photocatalyst, so that the pattern formed body has a pattern having irregularities. Therefore, the pattern formed body having the irregularities can be used as various printing plate precursors and the like. Further, when the substrate is a screen and a decomposition removal layer is formed as a characteristic change layer on the screen, the exposed portion is decomposed and removed and removed, so that the screen is clogged with the clogged portion. Thus, a pattern-formed body composed of portions can be obtained, and can be used as an original plate for screen printing.

(Functional element)
Furthermore, various functional elements can be obtained by arranging the functional portions on the portions corresponding to the pattern on which the pattern forming body is formed.

  Here, the functionalities include optical (light selective absorption, reflectivity, polarization, light selective transmittance, nonlinear optical properties, luminescence such as fluorescence or phosphorescence, photochromic properties, etc.) and magnetic (hard magnetic, soft magnetic) , Non-magnetic, magnetic permeability, etc., electric / electronic (conductive, insulating, piezoelectric, pyroelectric, dielectric, etc.), chemical (adsorbing, desorbing, catalytic, water absorbing, ionic conductivity) , Redox properties, electrochemical properties, electrochromic properties, etc.), mechanical properties (abrasion resistance properties, etc.), thermal properties (thermal conductivity, thermal insulation properties, infrared radiation properties, etc.), biofunctional properties (biocompatibility, antithrombotic properties, etc.) ) Means various functions.

  There are various methods for arranging such a functional portion in a portion corresponding to the pattern of the pattern forming body depending on the characteristics of the characteristic change layer. For example, when the property change layer is an adhesive property change layer that changes the adhesive property, since the pattern with the change in the adhesive property is formed on the pattern forming body, the function of the metal or the like is entirely over the property change layer. By vapor-depositing the composition for a functional part and then peeling it off with a pressure-sensitive adhesive or the like, a metal pattern as a functional part is formed only in a part having good adhesiveness. Thereby, a circuit or the like can be easily formed.

  When the characteristic change layer is a decomposition removal layer, a pattern in which the irregularities are changed is formed. Therefore, by inserting and attaching the composition for a functional portion to the concave portion, the functional portion can be easily arranged at a portion corresponding to the pattern. In this case, when there is a difference in wettability between the concave portion and the convex portion, that is, when the concave portion is an ink-philic region having good wettability and the convex portion is an ink-repellent region having poor wettability, Insertion and adhesion of the composition for a functional part are facilitated.

  In addition, when the property change layer is a wettability change layer, since the pattern with the changed wettability is formed, the wettability is improved by applying the functional part composition onto the pattern forming body. The functional part composition adheres only to the ink-friendly area, and the functional part can be easily arranged at a part corresponding to the pattern of the pattern forming body. In this case, it is desirable that the unexposed portion of the pattern formed body has a critical surface tension of 50 mN / m or less, preferably 30 mN / m or less.

  The composition for a functional part used in the present invention, as described above, greatly differs depending on the function of the functional element, the method of forming the functional element, and the like, for example, forming a metal pattern by a difference in adhesiveness. In such a case, the composition for a functional part becomes a metal, and when using a pattern formed body having a different wettability or a pattern formed body having a different unevenness, the composition is diluted with a solvent represented by an ultraviolet curable monomer or the like. A composition that has not been prepared, a liquid composition diluted with a solvent, or the like can be used. In the case of a liquid composition diluted with a solvent, the solvent preferably has a high surface tension, such as water or ethylene glycol. Further, as the composition for the functional part, the pattern can be formed in a shorter time as the viscosity is lower. Therefore, it is particularly preferable when the property change layer is a wettability change layer. However, in the case of a liquid composition diluted with a solvent, it is desirable that the solvent has low volatility, because the viscosity increases and the surface tension changes due to evaporation of the solvent during pattern formation.

  The functional part composition used in the present invention may be a functional part by being arranged by being attached to a pattern formed body or the like, or after being arranged on the pattern formed body, It may be a functional part after being treated with a chemical or treated with ultraviolet rays, heat, or the like. In this case, when a component effective for ultraviolet rays, heat, electron beams and the like is contained as a binder of the functional part composition, it is preferable because the functional part can be quickly formed by performing a curing treatment. .

  When the method for forming such a functional element is specifically described, for example, when the property change layer is a wettability change layer, the functional part composition is applied by dip coating, roll coating, blade coating, spin coating, or the like. The functional portion is formed on the pattern of the ink-philic region formed on the pattern forming body by using a unit, a nozzle discharge unit including an ink-jet unit or the like. For example, as shown in FIG. 3, a characteristic change layer 5 is provided on a substrate 4, and the characteristic change layer 5 is formed by contacting with a photocatalyst-containing layer and pattern-exposing (characteristics of ink affinity). A method of applying the functional part composition 11 on the pattern formed body 9 on which the (region) 8 is formed by using a blade coater 10 or a functional part formed on a similar pattern formed body 9 as shown in FIG. For example, a method of dropping the composition 11 for application and applying the composition by a spin coater 12. By applying the composition 11 for a functional part in this way, the composition for a functional part is changed only on the property-changed portion 8 where the wettability changes and becomes an ink-philic region as shown in FIG. Adhere to. A functional element can be formed by curing the composition for a functional part to form the functional part 13.

  Furthermore, by using the pattern forming body of the present invention in the method of forming a metal film by electroless plating, a functional element having a metal film pattern as a functional part can be obtained. This is also an effective method when the property change layer is a wettability change layer, and the treatment is performed with the pretreatment liquid of the chemical plating only on the ink-philic region of the pattern formed body having the pattern with the changed wettability, Then, the functional element having a desired metal pattern on the characteristic change layer can be obtained by immersing the treated pattern formed body in a chemical plating solution. According to this method, since a metal pattern can be formed without forming a resist pattern, a printed circuit board or an electronic circuit element can be manufactured as a functional element.

  Also, after disposing the functional part composition on the entire surface as described above, the functional part is removed along the pattern by removing unnecessary parts by utilizing the difference in characteristics between the exposed part and the unexposed part. It may be formed. This is a particularly effective method when the property change layer is an adhesive property change layer, for example, post-treatment such as peeling by sticking the pressure-sensitive adhesive tape and then peeling off the pressure-sensitive adhesive tape, blowing of air, treatment with a solvent, and the like. Thus, the unnecessary portion can be removed to obtain a pattern of the functional portion. As a method of arranging the functional portion on the entire surface, for example, a vacuum film forming means such as PVD or CVD can be used. That is, by using the film forming means 14 utilizing a vacuum such as CVD as shown in FIG. 6A, the pattern forming body in which the characteristic change layer 5 having the pattern of the characteristic change portion 8 is provided on the substrate 4 is formed. The functional part composition 11 is formed on the entire surface of the substrate 9. As a method of removing the unnecessary portion of the functional part composition 11 formed on the entire surface in this manner, as shown in FIG. 6B, the adhesive surface of the adhesive tape 15 is adhered to the adhesive tape 15 and then peeled off. A method of forming the functional portion 13 by removing the functional portion composition 11 on the exposed portion, or by injecting air from an air injection nozzle 16 as shown in FIG. A method of forming the functional part 13 by removing the functional part composition 11 and the like can be given.

  Further, FIG. 7 shows a method of forming a functional element particularly effective when the property change layer is an adhesive property change layer or a wettability change layer. First, as shown in FIG. A heat transfer body 19 in which a heat-fusible composition layer 18 is laminated on one side of a sheet 17 is formed on a pattern-formed body 9 in which a characteristic change layer 5 having a pattern is provided on a substrate 4. Are brought into close contact with the characteristic change layer 5. Next, as shown in FIG. 7B, the heating plate 20 is pressed against the sheet 17 side of the thermal transfer body 19 and heated. Then, as shown in FIG. 7 (C), after cooling, the thermal transfer member 19 is peeled off, so that the functional portion 13 is formed along the pattern of the characteristic change portion 8 formed on the characteristic change layer 5. Thus, a conductive element can be obtained (FIG. 7D).

  Specific examples of the functional element obtained in this manner include a color filter and a microlens.

  The color filter is used for a liquid crystal display device or the like, and has a plurality of pixel portions such as red, green, and blue formed in a high-definition pattern on a glass substrate or the like. By using the pattern forming body of the present invention for manufacturing this color filter, a low-cost, high-definition color filter can be obtained. That is, for example, the characteristic change layer is used as a wettability change layer, and pattern exposure is performed on the wettability change layer to obtain a pattern formed body having a pattern with a changed wettability. Then, by attaching and curing ink (composition for a functional part) to, for example, an ink jet device or the like on the portion where the wettability has changed (the portion that has become an ink-philic region by exposure), the pixel portion ( The functional part) can be formed, whereby a high-definition color filter can be obtained with a small number of steps.

  When the functional element is a microlens, a pattern formed body having a circular pattern with changed wettability on the wettability changing layer is manufactured. Next, when the composition for forming a lens (composition for a functional part) is dropped on the portion where the wettability has changed, the composition spreads only to the ink-philic region where the wettability has changed, and the contact angle of the droplet is further dropped. Can be changed. By curing this lens-forming composition, it becomes possible to obtain various shapes or focal lengths, and a high-definition microlens can be obtained. A method for manufacturing such a microlens will be described with reference to FIG. 8. A pattern forming body in which a circular pattern of a characteristic change portion (ink-philic region) 8 is formed on a characteristic change layer (wetting change layer) 5. 9 is prepared, and then the composition for a functional part (ultraviolet curable resin composition) is ejected by the ejection device 21 toward the pattern of the circular characteristic change portion (ink-philic region) 8 (FIG. A)). The functional part composition (ultraviolet curable resin composition) 11 swells due to the difference in wettability between the ink-affinity area, which is the property-changed area 8, and the ink-repellent area, which is not exposed (FIG. 8). (B)). The microlenses 23 are formed by curing the resin using the ultraviolet rays 22 for resin curing (FIG. 8C).

  Hereinafter, the present invention will be described in more detail through examples.

[Example 1]
1. Formation of Photocatalyst-Containing Layer Side Substrate 0.4 g of MF-160E (trade name, manufactured by Tochem Products Co., Ltd.) containing 30 g of isopropyl alcohol and fluoroalkylsilane as main components and trimethoxymethylsilane (manufactured by Toshiba Silicone Co., Ltd.) 3 g of trade name: TSL8113) and 20 g of ST-K01 (trade name, manufactured by Ishihara Sangyo Co., Ltd.), which is an aqueous dispersion of titanium dioxide as a photocatalyst, were stirred at 100 ° C. for 20 minutes. This was diluted three times with isopropyl alcohol to obtain a photocatalyst-containing layer composition.

  The above composition was applied on a transparent substrate made of soda glass by a spin coater and dried at 150 ° C. for 30 minutes to form a transparent photocatalyst containing layer (thickness 0.2 μm). Was formed.

2. Formation of Pattern Forming Substrate First, a composition for a wettability changing layer having the following composition was prepared.
(Composition of composition for wettability changing layer)
・ Silicone coating agent (trade name: YSR3022, manufactured by Toshiba Silicone Co., Ltd., composition: 30% by weight of polyalkylsiloxane and polyalkylhydrogensiloxane, 10% by weight of methyl ethyl ketone, 60% by weight of toluene) ... 100 parts by weight ・ Catalyst (Toshiba Silicone) (Trade name: YC6831; composition; organic tin compound 40% by weight, toluene 60% by weight) 4 parts by weight Toluene 400 parts by weight

  The composition for a wettability changing layer was applied on a substrate made of soda glass by a spin coater and heated at 100 ° C. for 10 minutes to form a wettability changing layer having a thickness of 3 μm, thereby obtaining a substrate for a pattern forming body.

3. Exposure On the wettability changing layer of the pattern forming substrate, the photocatalyst containing layer side substrate is placed so that the photocatalyst containing layer of the photocatalyst containing layer side substrate contacts the wettability changing layer, and from the photocatalyst containing layer side. Exposure was performed with a mercury lamp (wavelength 365 nm) at an illuminance of 70 mW / cm ² for 60 seconds to form a characteristic change portion (ink-philic region). As a result of measuring the contact angle with water before and after the exposure of the wettability changing layer using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) (30 seconds after dropping a water drop from a micro syringe), The contact angle of water before exposure is 110 degrees, while the contact angle of water after exposure is 7 degrees, and the exposed property change portion becomes the ink-philic region, and the exposed portion and the non-exposed portion It was confirmed that it was possible to form a pattern due to the difference in wettability.

4. Formation of Pattern Exposure was carried out through a 100 μm line & space photomask in the same manner as in the above exposure to obtain a pattern formed body. A red colorant having the following composition was applied on the pattern formed body by a dip coater and UV-cured. As a result, a 100 μm line & space red pattern was formed.

(Red colorant composition)
UV curing resin (ester acrylate resin: Arakawa Chemical Industries, trade name: AQ-11) ... 10 parts by weight Curing initiator (1-hydroxycyclohexyl phenyl ketone, Ciba Specialty Chemicals, trade name: Irgacure 184) 0.5 parts by weight ・ Red dye (trade name: Rose Bengal, manufactured by Tokyo Chemical Industry Co., Ltd.) 0.5 parts by weight

5. Preparation of Color Filter A wettability changing layer was formed on a transparent substrate made of non-alkali glass in the same manner as described above to obtain a substrate for a pattern formed body. Next, exposure was performed in the same manner as the above-described exposure through a negative photomask in which lines having openings of 280 μm were arranged at a pitch of 300 μm to obtain a pattern formed body.

  A composition for each color pixel portion having the following composition is discharged to an exposed portion (characteristic change portion, ink-philic region) of the pattern formed body by a liquid precision discharge device (dispenser manufactured by EED, trade name: 1500XL-15). And a heat treatment at 100 ° C. for 45 minutes to form a pixel portion having a red pattern, a blue pattern, and a green pattern. As a protective layer, a two-component mixed type thermosetting agent (trade name: SS7265, manufactured by JSR Corporation) is applied on the pixel portion by a spin coater, and cured at 200 ° C. for 30 minutes to form a protective layer. A color filter was obtained.

(Composition of composition for pixel portion)
-Pigment (Pigment Red 168, Pigment Green 36, or Pigment Blue 60) ... 3 parts by weight-Nonionic surfactant (Nikko Chemicals Co., Ltd., trade name: NIKKOL BO-10TX) ... 0.05 parts by weight-Polyvinyl Alcohol (Shin-Etsu Chemical Co., Ltd., trade name; Shin-Etsu Poval AT)… 0.6 parts by weight ・ Water… 97 parts by weight

[Example 2]
1. Preparation of Photocatalyst-Containing Layer-Side Substrate and Pattern Forming Substrate In the same manner as in Example 1, a pattern forming substrate was prepared, and then on the wettability changing layer of this pattern forming substrate, as in Example 1. Was applied by a spin coater and heated at 150 ° C. for 30 minutes to form a 0.2 μm-thick photocatalyst-containing layer, which was used as a photocatalyst-containing layer-side substrate.

2. Exposure Exposure was performed from the photocatalyst containing layer side in the same manner as in Example 1. Then, after pressure-sensitive adhesive tape (manufactured by Sumitomo 3M, trade name: Scotch tape) was pressed on the photocatalyst-containing layer, 1 mm / sec. The photocatalyst-containing layer was peeled off at a speed of. Then, in the same manner as in Example 1, the contact angle of water was measured on the wettability changing layer before and after exposure. The contact angle of water before exposure was 95 degrees, while the contact angle of water after exposure was 7 degrees. It was confirmed that it was possible to form a pattern due to the difference in wettability.

[Example 3]
1. Formation of Photocatalyst-Containing Layer Side Substrate 15 g of ethanol, 15 g of isopropyl alcohol, and 30 g of ST-K03 (trade name, manufactured by Ishihara Sangyo Co., Ltd.), which is an aqueous dispersion of titanium dioxide as a photocatalyst, were mixed at 100 ° C. for 20 minutes. The mixture was stirred for minutes to obtain a composition for a photocatalyst-containing layer. This composition was applied on a transparent substrate made of soda lime glass by a dip coater and subjected to a heat treatment at 150 ° C. for 10 minutes to form a transparent photocatalyst-containing film (thickness 0.2 μm). A side substrate was formed.

2. Formation of Pattern Forming Substrate ZONYL FSN (trade name, manufactured by DuPont), which is a fluorine-based nonionic surfactant, was mixed with isopropanol at 2% by weight to prepare a composition for a decomposition removal layer. The composition for a decomposition removal layer was applied on a transparent substrate made of soda lime glass by a spin coater and heated at 50 ° C. for 10 minutes to form a decomposition removal layer having a thickness of 0.1 μm, which was used as a substrate for a pattern forming body. .

3. Exposure The photocatalyst-containing layer-side substrate is placed on the decomposition-removal layer of the pattern forming substrate so that the photocatalyst-containing layer of the photocatalyst-containing layer-side substrate contacts the decomposition-removal layer. Exposure was performed for 2 minutes at an illuminance of 70 mW / cm ² (wavelength: 365 nm) to decompose and remove the decomposition removal layer, exposing the glass substrate. The contact angle of water before and after exposure, that is, the surface of the decomposition-removed layer and the surface of the glass exposed after exposure was measured in the same manner as in Example 1. As a result, the surface of the decomposition-removed layer was 71 degrees, whereas the glass exposed after exposure was 71 degrees. The surface was 9 degrees, and it was confirmed that it was possible to form a pattern due to the difference in wettability between the exposed part and the non-exposed part.

4. Formation of Microlens Exposure was performed in the same manner as the above-mentioned exposure through a negative photomask in which a plurality of 200 μm circular openings were arranged at intervals of 100 μm to obtain a pattern formed body. A microlens composition having the following composition was applied to the exposed portion of the pattern formed body by a liquid precision ejection apparatus (dispenser manufactured by EED, trade name: 1500XL-15) by a 0.0001 ml ejection method, and was cured by UV. As a result, a microlens array having a diameter of 200 μm and a focal length of 500 μm was obtained.

(Composition of composition for microlens)
-UV curable resin (ester acrylate resin, manufactured by Arakawa Chemical Industry Co., Ltd., trade name; AQ-11) ... 10 parts by weight-Curing initiator (1-hydroxycyclohexyl phenyl ketone, manufactured by Ciba Specialty Chemicals, trade name: Irgacure 184) )… 0.5 parts by weight

  Note that the present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and has substantially the same configuration as the technical idea described in the claims of the present invention, and any device having the same operation and effect can be realized by the present invention. It is included in the technical scope of the invention.

  For example, in the above description, an example is described in which all the functional elements are provided on the pattern forming body, but the present invention is not limited to this. That is, as shown in FIG. 9, for example, first, the characteristic change layer 5 is formed on the substrate 4 by the same method as described above, and the functional portion 13 is formed along the pattern of the characteristic change portion of the characteristic change layer 5. (FIG. 9A). Next, the element forming base material 24 is brought into close contact with the functional portion 13 (FIG. 9B). Then, there is a method of transferring the functional portion 13 to the element forming base material 24 to obtain a functional element. Thus, the functional element is not limited to being formed on the pattern forming body.

(A)-(C) and (C ') are schematic sectional views showing an example of the method for producing a pattern-formed body of the present invention. (A)-(D) and (D ') are schematic sectional drawings which show another example of the manufacturing method of the pattern formation body of this invention. It is a schematic sectional view for explaining the manufacturing method of the functional element in the present invention. It is a schematic sectional view for explaining the manufacturing method of the functional element in the present invention. It is a schematic sectional view for explaining the manufacturing method of the functional element in the present invention. (A) to (C) are schematic cross-sectional views for explaining a method for manufacturing a functional element of the present invention. (A) to (D) are schematic cross-sectional views for explaining a method for manufacturing a functional element of the present invention. (A) to (C) are schematic cross-sectional views illustrating an example of a method for manufacturing a microlens according to the present invention. (A) to (C) are schematic cross-sectional views for explaining a method for manufacturing a functional element included in the present invention.

Explanation of reference numerals

1: transparent substrate, 2: photocatalyst containing layer, 3: photocatalyst containing layer side substrate,
4 ... substrate, 5 ... characteristic change layer, 6 ... patterned substrate,
7: Photomask, 8: Characteristic change site, 9: Pattern formed body,
10: blade coater, 11: composition for functional part, 12: spin coater,
13: functional part, 14: film forming means, 15: adhesive tape,
16 ... air injection nozzle, 17 ... sheet, 18 ... heat-fusible composition layer,
19: thermal transfer member, 20: heating plate, 21: discharge device,
22 ... ultraviolet rays for resin curing, 23 ... microlens, 24 ... substrate for element formation.

Claims (27)

  A photocatalyst-containing layer-side substrate having at least a photocatalyst-containing layer, and a pattern-forming body substrate having at least a characteristic-change layer whose characteristics are changed by the action of a photocatalyst in the photocatalyst-containing layer, the photocatalyst-containing layer and the characteristic-change layer After being arranged so as to be in contact with each other, by exposing, the characteristics of the characteristic change layer in the exposed portion are changed, and then by removing the photocatalyst containing layer side substrate, the pattern with the characteristics changed on the characteristic change layer A method for producing a pattern formed body, comprising obtaining a pattern formed body.   2. The method according to claim 1, wherein the photocatalyst-containing layer-side substrate comprises at least a transparent substrate and a photocatalyst-containing layer, and is formed separately from the pattern-forming substrate.   2. The method according to claim 1, wherein the photocatalyst-containing layer-side substrate is formed by coating a photocatalyst-containing layer on a characteristic change layer of the pattern-formed body substrate. 3. The photocatalyst contained in the photocatalyst-containing layer is titanium dioxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), bismuth oxide (Bi). ₂ O ₃ ) and one or two or more substances selected from iron oxide (Fe ₂ O ₃ ). The method according to any one of claims 1 to 3, wherein A method for manufacturing a pattern formed body. Method for manufacturing a patterned member according to claim 4, wherein the photocatalyst is titanium dioxide (TiO _2).   The substrate according to any one of claims 1 to 5, wherein the substrate for a pattern forming body is formed of at least a substrate and the characteristic change layer provided on the substrate. A method for manufacturing a pattern formed body.   The said property change layer is a wettability change layer whose surface wettability changes by the action of the photocatalyst in the said photocatalyst containing layer, The Claims any one of Claim 1 to 6 characterized by the above-mentioned. A method for producing a pattern formed body.   The pattern according to claim 7, wherein the wettability changing layer is a wettability changing layer in which the wettability changes so that the contact angle of water is reduced by exposure due to the action of the photocatalyst in the photocatalyst-containing layer. A method for producing a formed body.   9. The method according to claim 8, wherein a contact angle of water on the wettability changing layer is not less than 90 degrees in an unexposed portion and not more than 30 degrees in an exposed portion. Method.   The method according to claim 8, wherein the wettability changing layer is a layer containing an organopolysiloxane. The _{organopolysiloxane, Y n SiX (4-n} ) ( wherein, Y represents an alkyl group, fluoroalkyl group, vinyl group, amino group, phenyl group or epoxy group, X represents an alkoxyl group or a halogen. n is an integer from 0 to 3), and is an organopolysiloxane which is one or more hydrolytic condensates or co-hydrolytic condensates of the silicon compound represented by the formula: A method for producing the pattern-formed body according to the above.   The pattern forming body according to claim 1, wherein the characteristic change layer is a decomposition removal layer that is decomposed and removed by the action of a photocatalyst in the photocatalyst containing layer. Production method.   13. The method according to claim 12, wherein a contact angle of water between the decomposition removal layer and an exposed member exposed when the decomposition removal layer is decomposed and removed is different.   The contact angle of water on the decomposition removal layer is 60 degrees or more, and the contact angle of water of an exposed member exposed when the decomposition removal layer is decomposed and removed is 30 degrees or less. 14. The method for producing a pattern formed body according to item 13.   15. The method according to claim 13, wherein the decomposition removal layer is a hydrocarbon-based, fluorine-based, or silicone-based nonionic surfactant.   The method according to any one of claims 1 to 15, wherein the exposure is exposure through a photomask.   The method according to any one of claims 1 to 15, wherein the exposure is performed by light drawing irradiation.   The method according to any one of claims 1 to 17, wherein the exposure is performed while heating the photocatalyst-containing layer.   A photocatalyst-containing layer side substrate comprising at least a transparent substrate and a photocatalyst-containing layer, wherein the photocatalyst-containing layer is in contact with the characteristic-change layer of a pattern-forming substrate having a characteristic-change layer on the surface whose characteristics change by the action of a photocatalyst. A photocatalyst-containing layer-side substrate for producing a pattern-formed body, wherein the substrate is exposed to light and exposed to light.   20. The photocatalyst-containing layer-side substrate according to claim 19, wherein the photocatalyst contained in the photocatalyst-containing layer is titanium dioxide.   A pattern forming body comprising at least a substrate and a characteristic change layer formed on the substrate and having a pattern whose characteristics are changed by the action of a photocatalyst, and not having a photocatalyst containing layer.   22. The pattern forming body according to claim 21, wherein the property change layer is a wettability change layer whose wettability changes so that a contact angle of water is reduced by exposure to light by the action of a photocatalyst.   The property change layer is a decomposition removal layer that is decomposed and removed by the action of a photocatalyst, and the contact angle of water between the decomposition removal layer and an exposed member that is exposed when the decomposition removal layer is decomposed and removed is different. The pattern forming body according to claim 21, characterized in that:   A functional element, wherein a functional part is arranged on a part corresponding to a pattern formed on the pattern forming body according to claim 21.   The functionality according to claim 24, wherein the pattern is a pattern formed by portions having different contact angles of water, and a functional portion is formed on a portion having a small contact angle of water in the pattern. element.   26. A color filter, wherein the functional part of the functional element according to claim 25 is a pixel part. A microlens, wherein the functional part of the functional element according to claim 25 is a lens.

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