JP2004174319A - Apparatus for supplying nitrogen gas of super low temperature - Google Patents

Apparatus for supplying nitrogen gas of super low temperature Download PDF

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Publication number
JP2004174319A
JP2004174319A JP2002341095A JP2002341095A JP2004174319A JP 2004174319 A JP2004174319 A JP 2004174319A JP 2002341095 A JP2002341095 A JP 2002341095A JP 2002341095 A JP2002341095 A JP 2002341095A JP 2004174319 A JP2004174319 A JP 2004174319A
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Japan
Prior art keywords
nitrogen gas
liquid nitrogen
low temperature
nitrogen
storage container
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JP2002341095A
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JP4255269B2 (en
Inventor
Norimitsu Wakabayashi
憲光 若林
Yoichi Hayatsu
陽一 早津
Shusuke Miyake
秀典 三宅
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Showa Denko Gas Products Co Ltd
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Showa Tansan Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for supplying nitrogen gas of super low temperature, which can be used for supplying the nitrogen gas of super low temperature to a beverage container to keep the inside of the beverage container exactly in a predetermined, fixed and positive pressure when the beverage container is packed with a beverage and supplying the nitrogen gas of super low temperature when a semiconductor is polished or when a metal is cut or ground. <P>SOLUTION: This apparatus is composed of an airtight liquid nitrogen storage vessel which is filled with liquid nitrogen so that a space is left in the upper part, a nitrogen gas supplying unit for supplying nitrogen gas to the liquid nitrogen in the liquid nitrogen storage vessel from a nitrogen gas storage tank through a stop valve by using a pipe having openings at the positions near the bottom end of the liquid nitrogen storage vessel and a super low temperature nitrogen gas supplying pipe one end of which is fit to/communicated with the space left in the upper part of the liquid nitrogen storage vessel and the other end of which is connected to another stop valve for supplying the nitrogen gas of super low temperature to a user. <P>COPYRIGHT: (C)2004,JPO

Description

【０００１】
【発明の属する技術分野】
本発明はペットボトルやアルミボトル等の飲料容器の充填時に飲料容器内へ窒素ガスを供給して陽圧保持化をしたり、半導体の研磨や金属の切削加工や研磨等に使用することができる超低温窒素ガス供給装置に関する。
【０００２】
【従来の技術】
従来、自動販売機等で微炭酸飲料容器を５℃前後に冷却すると容器内空間の炭酸ガスが微炭酸飲料中に溶解することにより、内圧が低下し、強度面や容器の変形により、自動販売機から容器が出てこない等の対策として、飲料容器の充填時に直接液体窒素を飲料容器内に滴下して陽圧保持化している。
【０００３】
【発明が解決しようとする課題】
従来の飲料容器内へ直接液体窒素を滴下させる方法では、滴下させる液体窒素の量のコントロールが非常に困難で、飲料容器内の圧力がバラつくという欠点がある。
この飲料容器内の圧力のバラつきによって、飲料容器の薄肉化によるコストダウンができないという欠点があった。
【０００４】
本発明は以上のような従来の欠点に鑑み、飲料容器をあらかじめ設定された一定の圧力の陽圧に正確に保持できるように、飲料容器の充填時に超低温窒素ガスを供給したり、超低温窒素ガスを供給しながら半導体の研磨や金属の切削加工や研磨する場合等に使用することができる超低温窒素ガス供給装置を提供することを目的としている。
【０００５】
本発明の前記ならびにそのほかの目的と新規な特徴は次の説明を添付図面と照らし合わせて読むと、より完全に明らかになるであろう。
ただし、図面はもっぱら解説のためのものであって、本発明の技術的範囲を限定するものではない。
【０００６】
【課題を解決するための手段】
上記目的を達成するために、本発明は上部に空間を有するように液体窒素が充填された密封状態の液体窒素収納容器と、この液体窒素収納容器内の下端部寄りの部位に開口された、該液体窒素収納容器内の液体窒素中へ気体窒素収納タンクから気体窒素ガスを開閉弁を介して供給する気体窒素ガス供給装置と、前記液体窒素収納容器の上部の空間部に一端部が連通するように取付けられ、他端部が超低温窒素ガス使用部へ供給する開閉弁を備える超低温窒素ガス供給管とで超低温窒素ガス供給装置を構成している。
【０００７】
【発明の実施の形態】
以下、図面に示す実施の形態により、本発明を詳細に説明する。
【０００８】
図１ないし図３に示す本発明の第１の実施の形態において、１は上部に空間２を有するように約−１９０℃の液体窒素３が充填された密封状態の液体窒素収納容器で、この液体窒素収納容器１は液体窒素３の保温を図れるように断熱材４で覆われたものが使用されている。
【０００９】
５は前記液体窒素収納容器１内の下端部寄りの部位に開口された、該液体窒素収納容器１内の液体窒素３中に気体窒素収納タンク６からの、約２０℃の気体窒素ガス７を流量調整可能な開閉弁８を介したパイプ９を用いて供給する気体窒素ガス供給装置で、この気体窒素ガス供給装置５のパイプ９は前記液体窒素収納容器１の天板１ａに密閉状態で取付けられた下端部が液体窒素収納容器１内の下端部寄りの部位に開口する固定パイプ１０と、この固定パイプ１０の前記天板１ａ上に位置する部位と一端部が接続された、前記気体窒素収納タンク６に他端部が接続された開閉弁８が介装された接続パイプ１１とで構成されている。
【００１０】
１２は前記液体窒素収納容器１の上部の空間２部に一端部が連通するように取付けられ、他端部が超低温窒素ガス使用部１３へ供給する開閉弁１４を備える超低温窒素ガス供給管で、この超低温窒素ガス供給管１２は保温を図れるように断熱材１５で覆ったものが使用される。
また、超低温窒素ガス使用部１３は本発明の実施の形態では飲料容器１６としてペットボトルやアルミボトル等を用いた充填装置の陽圧保持化のために使用される。
【００１１】
１７は前記超低温窒素ガス供給管１２に接続された、該超低温窒素ガス供給管１２を流れる超低温窒素ガス１８中に気体窒素収納タンク６からの、約２０℃の気体窒素ガス７を供給して使用部１３へ供給される、超低温窒素ガス１８の温度を任意に調整する流量調整が可能な電磁弁等の開閉弁１９を介したパイプ２０を用いて供給する温度調整気体窒素ガス供給装置で、この温度調整気体窒素ガス供給装置１７の開閉弁２０を、前記超低温窒素ガス供給管１２に設置した温度センサー２１の設定により自動的に開閉するようにして、超低温窒素ガス供給管１２より排出される超低温窒素ガス１８を設定温度で排出できるように構成されている。
【００１２】
上記構成の超低温窒素ガス供給装置２２は、気体窒素ガス供給装置５の気体窒素収納タンク６からの気体窒素ガス７を接続パイプ１１、固定パイプ１０を通過させて液体窒素収納容器１内の下端部寄りの液体窒素３内へ供給する。
液体窒素３内へ供給された気体窒素ガス７は、液体窒素３内を通過して液体窒素収納容器１の上部空間２に位置する。この時、気体窒素ガス７は液体窒素３によって約−１５０℃〜−１８０℃に冷却される。
液体窒素収納容器１の上部の空間２部に位置する超低温窒素ガス１８は超低温窒素ガス供給管１２によって使用部１３へ供給される。
この時、使用部１３で使用する超低温窒素ガス１８の使用温度を温度センサー２１で設定することにより、温度調整気体窒素ガス供給装置１７より気体窒素ガス７を供給して、超低温窒素ガス供給管１２を流れる超低温窒素ガス１８を設定温度にして使用部１３へ供給できる。
したがって、飲料容器１６に設定された超低温窒素ガス１８を供給して密閉した場合、超低温窒素ガス１８が昇温し、体積膨脹し、飲料容器１６内をあらかじめ設定された一定の圧力の陽圧に保持することができる。
【００１３】
【発明の異なる実施の形態】
次に、図４ないし図１３に示す本発明の異なる実施の形態につき説明する。なお、これらの本発明の異なる実施の形態の説明に当って、前記本発明の第１の実施の形態と同一構成部分には同一符号を付して重複する説明を省略する。
【００１４】
図４および図５に示す本発明の第２の実施の形態において、前記本発明の第１の実施の形態と主に異なる点は、液体窒素収納容器１の内底部に多数個の小孔２３が形成されたノズル２４を固定パイプ１０の先端部に取付けた気体窒素ガス供給装置５Ａを用いた点で、このような気体窒素ガス供給装置５Ａを用いて構成した超低温窒素ガス供給装置２２Ａにしても、前記本発明の第１の実施の形態と同様な作用効果が得られる。
【００１５】
図６ないし図８に示す本発明の第３の実施の形態において、前記本発明の第１の実施の形態と主に異なる点は、液体窒素収納容器１内の下端部寄りの部位の液体窒素３中に供給された気体窒素ガス７を、左右方向に移動しながら上部の空間２へ移動できるように複数個の仕切壁２５、２５、２５を液体窒素収納容器１内に設置した点で、このように構成した超低温窒素ガス供給装置２２Ｂにしても、前記本発明の第１の実施の形態と同様な作用効果が得られる。
【００１６】
図９ないし図１１に示す本発明の第４の実施の形態において、前記本発明の第１の実施の形態と主に異なる点は、液体窒素収納容器１内にＵ字状、螺旋あるいは渦巻き状の固定パイプ１０Ａを超低温窒素ガス供給管１２に接続するように取付けた点で、このように構成した超低温窒素ガス供給装置２２Ｃにしても、前記本発明の第１の実施の形態と同様な作用効果が得られる。
【００１７】
図１２および図１３に示す本発明の第５の実施の形態において、前記本発明の第１の実施の形態と主に異なる点は、温度調整気体窒素ガス供給装置を用いないで構成した点で、このように構成した超低温窒素ガス供給装置２２Ｄは使用部として半導体の研磨や金属の切削加工や研磨部分等へ供給して使用することができる。
【００１８】
【発明の効果】
以上の説明から明らかなように、本発明にあっては次に列挙する効果が得られる。
【００１９】
（１）上部に空間を有するように液体窒素が充填された密封状態の液体窒素収納容器と、この液体窒素収納容器内の下端部寄りの部位に開口された、該液体窒素収納容器内の液体窒素中へ気体窒素収納タンクから気体窒素ガスを開閉弁を介して供給する気体窒素ガス供給装置と、前記液体窒素収納容器の上部の空間部に一端部が連通するように取付けられ、他端部が超低温窒素ガス使用部へ供給する開閉弁を備える超低温窒素ガス供給管とで構成されているので、超低温窒素ガスとして使用部へ供給することができる。
したがって、飲料容器の陽圧保持化をする場合や半導体の研磨や金属の切削加工や研磨等に使用することができる。
【００２０】
（２）前記（１）によって、気体窒素ガスを液体窒素中を通過させるだけでよいので、容易に超低温窒素ガスを作ることができる。
したがって、低コストで超低温窒素ガスを製造することができる。
【００２１】
（３）前記（１）によって、構造が簡単であるので、容易で安価に設置することができる。
【００２２】
（４）請求項２も前記（１）〜（３）と同様な効果が得られるとともに、供給する超低温窒素ガスの温度を一定温度に設定することができる。
したがって、均一な温度の超低温窒素ガスを供給でき、飲料容器の容器内圧力をほぼ均一にでき、飲料容器を薄肉の材料を使用して、コストの低減を図ることができる。
【図面の簡単な説明】
【図１】本発明の第１の実施の形態の概略説明図。
【図２】本発明の第１の実施の形態の液体窒素収納容器の説明図。
【図３】図２の３−３線に沿う断面図。
【図４】本発明の第２の実施の形態の概略説明図。
【図５】本発明の第２の実施の形態の液体窒素収納容器の説明図。
【図６】本発明の第３の実施の形態の概略説明図。
【図７】本発明の第３の実施の形態の液体窒素収納容器の縦断面図。
【図８】本発明の第３の実施の形態の液体窒素収納容器の横断面図。
【図９】本発明の第４の実施の形態の概略説明図。
【図１０】本発明の第４の実施の形態の液体窒素収納容器の縦断面図。
【図１１】本発明の第４の実施の形態の液体窒素収納容器の横断面図。
【図１２】本発明の第５の実施の形態の概略説明図。
【図１３】本発明の第５の実施の形態超低温窒素ガス使用部の説明図。
【符号の説明】
１：液体窒素収納容器、 ２：空間、
３：液体窒素、 ４：断熱材、
５、５Ａ：液体窒素ガス供給装置、
６：気体窒素ガス収納タンク、
７：気体窒素ガス、 ８：開閉弁、
９：パイプ、 １０、１０Ａ：固定パイプ、
１１：接続パイプ、
１２：超低温窒素ガス供給管、
１３：超低温窒素ガス使用部、
１４：開閉弁、 １５：断熱材、
１６：飲料容器、
１７：温度調整気体窒素ガス供給装置、
１８：超低温窒素ガス、 １９：開閉弁、
２０：パイプ、 ２１：温度センサー、
２２、２２Ａ、２２Ｂ、２２Ｃ、２２Ｄ：超低温窒素ガス供給装置、
２３：小孔、 ２４：ノズル、
２５：仕切壁。[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention can be used for supplying a nitrogen gas into a beverage container to maintain a positive pressure when filling a beverage container such as a PET bottle or an aluminum bottle, or for polishing a semiconductor or cutting or polishing a metal. The present invention relates to an ultra-low temperature nitrogen gas supply device.
[0002]
[Prior art]
Conventionally, when a slightly carbonated beverage container is cooled to about 5 ° C. by a vending machine or the like, carbon dioxide in the container space dissolves in the slightly carbonated beverage, thereby lowering the internal pressure. In order to prevent the container from coming out of the machine, liquid nitrogen is dropped directly into the beverage container during filling of the beverage container to maintain the positive pressure.
[0003]
[Problems to be solved by the invention]
In the conventional method of directly dropping liquid nitrogen into a beverage container, it is very difficult to control the amount of liquid nitrogen to be dropped, and there is a disadvantage that the pressure in the beverage container varies.
Due to the variation in the pressure inside the beverage container, there is a disadvantage that the cost cannot be reduced by reducing the thickness of the beverage container.
[0004]
In view of the above-mentioned conventional drawbacks, the present invention supplies an ultra-low temperature nitrogen gas at the time of filling a beverage container or an ultra-low temperature nitrogen gas so that the beverage container can be accurately maintained at a predetermined positive pressure of a predetermined pressure. It is an object of the present invention to provide an ultra-low temperature nitrogen gas supply device that can be used for polishing semiconductors or cutting or polishing metals while supplying nitrogen gas.
[0005]
The above and other objects and novel features of the present invention will become more completely apparent when the following description is read in conjunction with the accompanying drawings.
However, the drawings are merely for explanation and do not limit the technical scope of the present invention.
[0006]
[Means for Solving the Problems]
In order to achieve the above object, the present invention has a liquid nitrogen storage container in a sealed state filled with liquid nitrogen so as to have a space on the upper part, and the liquid nitrogen storage container is opened at a position near the lower end portion, One end communicates with a gas nitrogen gas supply device that supplies gas nitrogen gas from a gas nitrogen storage tank into liquid nitrogen in the liquid nitrogen storage container via an on-off valve, and a space above the liquid nitrogen storage container. The ultra-low-temperature nitrogen gas supply device is provided with an ultra-low-temperature nitrogen gas supply pipe provided with an open / close valve for supplying the ultra-low-temperature nitrogen gas to the section using the ultra-low temperature nitrogen gas.
[0007]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, the present invention will be described in detail with reference to the embodiments shown in the drawings.
[0008]
In the first embodiment of the present invention shown in FIGS. 1 to 3, reference numeral 1 denotes a sealed liquid nitrogen storage container filled with liquid nitrogen 3 at about −190 ° C. so as to have a space 2 at an upper part thereof. The liquid nitrogen storage container 1 is covered with a heat insulating material 4 so that the liquid nitrogen 3 can be kept warm.
[0009]
Reference numeral 5 denotes a gaseous nitrogen gas 7 at about 20 ° C. from a gaseous nitrogen storage tank 6 into the liquid nitrogen 3 in the liquid nitrogen storage container 1 which is opened at a position near the lower end in the liquid nitrogen storage container 1. A gaseous nitrogen gas supply device which is supplied by using a pipe 9 via an on-off valve 8 capable of adjusting the flow rate. The pipe 9 of the gaseous nitrogen gas supply device 5 is attached to the top plate 1a of the liquid nitrogen container 1 in a sealed state. A fixed pipe 10 whose lower end is opened at a position near the lower end in the liquid nitrogen container 1, and the gaseous nitrogen having one end connected to a part of the fixed pipe 10 located on the top plate 1a. A connection pipe 11 provided with an on-off valve 8 having the other end connected to the storage tank 6 is provided.
[0010]
Reference numeral 12 denotes an ultra-low temperature nitrogen gas supply pipe which is mounted so that one end thereof communicates with the upper space 2 of the liquid nitrogen storage container 1 and has an open / close valve 14 which supplies the other end to the ultra-low temperature nitrogen gas use section 13. The ultra-low temperature nitrogen gas supply pipe 12 is covered with a heat insulating material 15 so as to keep the temperature.
In the embodiment of the present invention, the ultra-low-temperature nitrogen gas use section 13 is used for maintaining a positive pressure of a filling device using a PET bottle, an aluminum bottle, or the like as the beverage container 16.
[0011]
Reference numeral 17 denotes the supply of the gaseous nitrogen gas 7 at about 20 ° C. from the gaseous nitrogen storage tank 6 to the ultralow temperature nitrogen gas 18 connected to the ultralow temperature nitrogen gas supply tube 12 and flowing through the ultralow temperature nitrogen gas supply tube 12. A temperature-regulated gas nitrogen gas supply device that supplies the temperature of the ultra-low temperature nitrogen gas 18 supplied to the section 13 using a pipe 20 through an on-off valve 19 such as a solenoid valve that can adjust the flow rate arbitrarily. The on-off valve 20 of the temperature control gas nitrogen gas supply device 17 is automatically opened and closed by the setting of the temperature sensor 21 installed on the ultra-low temperature nitrogen gas supply pipe 12, so that the ultra-low temperature gas discharged from the ultra-low temperature nitrogen gas supply pipe 12 is opened. The nitrogen gas 18 can be discharged at a set temperature.
[0012]
The ultra-low-temperature nitrogen gas supply device 22 having the above-described configuration allows the gaseous nitrogen gas 7 from the gaseous nitrogen storage tank 6 of the gaseous nitrogen gas supply device 5 to pass through the connection pipe 11 and the fixed pipe 10 so as to pass through the lower end of the liquid nitrogen storage container 1. The liquid is supplied to the nearby liquid nitrogen 3.
The gaseous nitrogen gas 7 supplied into the liquid nitrogen 3 passes through the liquid nitrogen 3 and is located in the upper space 2 of the liquid nitrogen storage container 1. At this time, the gaseous nitrogen gas 7 is cooled to about -150C to -180C by the liquid nitrogen 3.
The ultra-low temperature nitrogen gas 18 located in the upper space 2 of the liquid nitrogen storage container 1 is supplied to the use section 13 by the ultra-low temperature nitrogen gas supply pipe 12.
At this time, by setting the use temperature of the ultra-low temperature nitrogen gas 18 used in the use unit 13 by the temperature sensor 21, the gas nitrogen gas 7 is supplied from the temperature adjusting gas nitrogen gas supply device 17, and the ultra-low temperature nitrogen gas supply pipe 12 is supplied. Can be supplied to the use section 13 at a set temperature.
Therefore, when the ultra-low temperature nitrogen gas 18 set in the beverage container 16 is supplied and sealed, the ultra-low temperature nitrogen gas 18 rises in temperature and expands in volume, and the inside of the beverage container 16 is set to a predetermined positive pressure at a predetermined positive pressure. Can be held.
[0013]
Different Embodiments of the Invention
Next, different embodiments of the present invention shown in FIGS. 4 to 13 will be described. In the description of the different embodiments of the present invention, the same components as those in the first embodiment of the present invention are denoted by the same reference numerals, and redundant description will be omitted.
[0014]
The second embodiment of the present invention shown in FIGS. 4 and 5 is different from the first embodiment of the present invention mainly in that a large number of small holes 23 are formed in the inner bottom of the liquid nitrogen storage container 1. In the point that the gas nitrogen gas supply device 5A in which the nozzle 24 in which is formed is attached to the tip of the fixed pipe 10 is used, an ultra-low temperature nitrogen gas supply device 22A configured using such a gas nitrogen gas supply device 5A is used. Also, the same operation and effect as in the first embodiment of the present invention can be obtained.
[0015]
The third embodiment of the present invention shown in FIG. 6 to FIG. 8 is mainly different from the first embodiment of the present invention in that the liquid nitrogen in the liquid nitrogen storage container 1 is located at a position near the lower end. A plurality of partition walls 25, 25, 25 are installed in the liquid nitrogen storage container 1 so that the gaseous nitrogen gas 7 supplied in 3 can move to the upper space 2 while moving in the left-right direction. With the ultra-low temperature nitrogen gas supply device 22B configured as described above, the same operation and effect as those of the first embodiment of the present invention can be obtained.
[0016]
The fourth embodiment of the present invention shown in FIGS. 9 to 11 is different from the first embodiment of the present invention mainly in that the liquid nitrogen storage container 1 has a U-shaped, spiral or spiral shape. In the point that the fixed pipe 10A is attached so as to be connected to the ultra-low temperature nitrogen gas supply pipe 12, the ultra-low temperature nitrogen gas supply device 22C thus configured also has the same operation as the first embodiment of the present invention. The effect is obtained.
[0017]
The fifth embodiment of the present invention shown in FIGS. 12 and 13 is mainly different from the first embodiment of the present invention in that the fifth embodiment is configured without using a temperature adjusting gas nitrogen gas supply device. The ultra-low temperature nitrogen gas supply device 22D configured as described above can be used as a part to be used for polishing a semiconductor, cutting a metal, or supplying a polished portion.
[0018]
【The invention's effect】
As is clear from the above description, the following effects can be obtained in the present invention.
[0019]
(1) A sealed liquid nitrogen storage container filled with liquid nitrogen so as to have a space above, and a liquid in the liquid nitrogen storage container which is opened at a position near a lower end portion in the liquid nitrogen storage container. A gaseous nitrogen gas supply device for supplying gaseous nitrogen gas from a gaseous nitrogen storage tank into the nitrogen through an on-off valve; and a gaseous nitrogen gas supply device, one end of which is connected to a space above the liquid nitrogen storage container and the other end of which is connected. Is provided with an ultra-low temperature nitrogen gas supply pipe having an on-off valve for supplying to the ultra-low temperature nitrogen gas use section, so that it can be supplied to the use section as ultra-low temperature nitrogen gas.
Therefore, the present invention can be used for the case where the beverage container is maintained at a positive pressure, for polishing semiconductors, for cutting or polishing metals, and the like.
[0020]
(2) According to the above (1), it is only necessary to pass gaseous nitrogen gas through liquid nitrogen, so that ultra-low temperature nitrogen gas can be easily produced.
Therefore, ultra-low temperature nitrogen gas can be produced at low cost.
[0021]
(3) According to (1), since the structure is simple, it can be installed easily and inexpensively.
[0022]
(4) In the second aspect, the same effects as in the above (1) to (3) can be obtained, and the temperature of the ultra-low temperature nitrogen gas to be supplied can be set to a constant temperature.
Therefore, an ultra-low temperature nitrogen gas at a uniform temperature can be supplied, the pressure in the beverage container can be made substantially uniform, and the cost can be reduced by using a thin material for the beverage container.
[Brief description of the drawings]
FIG. 1 is a schematic explanatory diagram of a first embodiment of the present invention.
FIG. 2 is an explanatory view of a liquid nitrogen storage container according to the first embodiment of the present invention.
FIG. 3 is a sectional view taken along the line 3-3 in FIG. 2;
FIG. 4 is a schematic explanatory view of a second embodiment of the present invention.
FIG. 5 is an explanatory view of a liquid nitrogen storage container according to a second embodiment of the present invention.
FIG. 6 is a schematic explanatory view of a third embodiment of the present invention.
FIG. 7 is a longitudinal sectional view of a liquid nitrogen storage container according to a third embodiment of the present invention.
FIG. 8 is a cross-sectional view of a liquid nitrogen storage container according to a third embodiment of the present invention.
FIG. 9 is a schematic explanatory view of a fourth embodiment of the present invention.
FIG. 10 is a longitudinal sectional view of a liquid nitrogen storage container according to a fourth embodiment of the present invention.
FIG. 11 is a cross-sectional view of a liquid nitrogen storage container according to a fourth embodiment of the present invention.
FIG. 12 is a schematic explanatory view of a fifth embodiment of the present invention.
FIG. 13 is an explanatory diagram of an ultra-low temperature nitrogen gas using section according to a fifth embodiment of the present invention.
[Explanation of symbols]
1: liquid nitrogen storage container, 2: space,
3: liquid nitrogen 4: thermal insulation
5, 5A: liquid nitrogen gas supply device,
6: gas nitrogen gas storage tank,
7: Gaseous nitrogen gas, 8: On-off valve,
9: pipe, 10, 10A: fixed pipe,
11: connecting pipe,
12: Ultra low temperature nitrogen gas supply pipe,
13: Ultra-low temperature nitrogen gas use part,
14: open / close valve, 15: heat insulating material,
16: beverage container,
17: temperature control gas nitrogen gas supply device,
18: Ultra low temperature nitrogen gas, 19: On-off valve,
20: pipe, 21: temperature sensor,
22, 22A, 22B, 22C, 22D: ultra-low temperature nitrogen gas supply device,
23: small hole, 24: nozzle,
25: Partition wall.

Claims (3)

上部に空間を有するように液体窒素が充填された密封状態の液体窒素収納容器と、この液体窒素収納容器内の下端部寄りの部位に開口された、該液体窒素収納容器内の液体窒素中へ気体窒素収納タンクから気体窒素ガスを開閉弁を介して供給する気体窒素ガス供給装置と、前記液体窒素収納容器の上部の空間部に一端部が連通するように取付けられ、他端部が超低温窒素ガス使用部へ供給する開閉弁を備える超低温窒素ガス供給管とからなることを特徴とする超低温窒素ガス供給装置。Into a liquid nitrogen storage container in a sealed state filled with liquid nitrogen so as to have a space above, and into the liquid nitrogen storage container opened at a position near the lower end in the liquid nitrogen storage container A gaseous nitrogen gas supply device for supplying gaseous nitrogen gas from a gaseous nitrogen storage tank via an on-off valve, and one end connected to a space above the liquid nitrogen storage container, and the other end connected to ultra-low temperature nitrogen. An ultra-low temperature nitrogen gas supply device comprising an ultra-low temperature nitrogen gas supply pipe provided with an on-off valve for supplying to a gas use section. 上部に空間を有するように液体窒素が充填された密封状態の液体窒素収納容器と、この液体窒素収納容器内の下端部寄りの部位に開口された、該液体窒素収納容器内の液体窒素中へ気体窒素収納タンクからの気体窒素ガスを流量調整可能な開閉弁を介して供給する気体窒素ガス供給装置と、前記液体窒素収納容器の上部の空間部に一端部が連通するように取付けられ、他端部が超低温窒素ガス使用部へ供給する開閉弁を備える超低温窒素ガス供給管と、この超低温窒素ガス供給管に接続された、該超低温窒素ガス供給管を流れる超低温窒素ガス中に気体窒素収納タンクからの気体窒素ガスを供給して使用部へ供給される超低温窒素ガスの温度を任意に調整する開閉弁を備えた温度調整気体窒素ガス供給装置とからなることを特徴とする超低温窒素ガス供給装置。Into a liquid nitrogen storage container in a sealed state filled with liquid nitrogen so as to have a space above, and into the liquid nitrogen storage container opened at a position near the lower end in the liquid nitrogen storage container A gas nitrogen gas supply device for supplying a gas nitrogen gas from a gas nitrogen storage tank through an on-off valve capable of adjusting a flow rate, and a gas nitrogen gas supply device, which is mounted so that one end thereof communicates with a space portion above the liquid nitrogen storage container, A cryogenic nitrogen gas supply pipe having an on-off valve for supplying an cryogenic nitrogen gas to an end of the cryogenic nitrogen gas use part; A temperature-controlled gas nitrogen gas supply device having an on-off valve for arbitrarily controlling the temperature of the ultra-low temperature nitrogen gas supplied to the use section by supplying gaseous nitrogen gas from Hydrogen gas supply device. 液体窒素が充填された密封状態の液体窒素収納容器と、この液体窒素収納容器内の液体窒素で超低温窒素ガスとなるように該液体窒素収納容器内に設置された固定パイプ中へ気体窒素収納タンクから気体窒素ガスを開閉弁を介して供給する気体窒素ガス供給装置と、この気体窒素ガス供給装置の固定パイプに一端部が連通するように取付けられ、他端部が超低温窒素ガス使用部へ供給する開閉弁を備える超低温窒素ガス供給管とからなることを特徴とする超低温窒素ガス供給装置。A liquid nitrogen storage container filled with liquid nitrogen and a gas nitrogen storage tank placed in a fixed pipe installed in the liquid nitrogen storage container so that the liquid nitrogen in the liquid nitrogen storage container becomes ultra-low temperature nitrogen gas. Gas nitrogen gas supply device for supplying gaseous nitrogen gas through an open / close valve, and one end of the gas nitrogen gas supply device is attached to a fixed pipe of the gas nitrogen gas supply device, and the other end is supplied to the ultra-low temperature nitrogen gas use part. An ultra-low temperature nitrogen gas supply pipe provided with an open / close valve that performs the operation.
JP2002341095A 2002-11-25 2002-11-25 Ultra-low temperature nitrogen gas supply device Expired - Fee Related JP4255269B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103322411A (en) * 2013-07-16 2013-09-25 兖矿集团有限公司 Chemical system stoppage protective device
CN106826390A (en) * 2017-02-23 2017-06-13 华中科技大学 A kind of difficult-to-machine material deep cooling system of processing for automating liquid nitrogen flow control

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JPS6115729A (en) * 1984-06-29 1986-01-23 Dainippon Screen Mfg Co Ltd Method and apparatus for supplying chemical solution
JPH04302404A (en) * 1991-03-29 1992-10-26 Toshiba Corp Injecting device for extremely low temperature liquid
JPH0847630A (en) * 1993-05-06 1996-02-20 I T Keisoku Seigyo Kk Coolant feeder
JPH0884919A (en) * 1994-09-14 1996-04-02 Toshiba Corp Method of injecting cryogenic liquid
JPH1043575A (en) * 1996-02-23 1998-02-17 L'air Liquide Bulk transportation of ultrahigh purity gas at high flow velocity
JP2000337597A (en) * 1999-04-20 2000-12-05 Gaz De France Method and device for maintaining low temperature of liquefied gas string and conveying chamber

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6115729A (en) * 1984-06-29 1986-01-23 Dainippon Screen Mfg Co Ltd Method and apparatus for supplying chemical solution
JPH04302404A (en) * 1991-03-29 1992-10-26 Toshiba Corp Injecting device for extremely low temperature liquid
JPH0847630A (en) * 1993-05-06 1996-02-20 I T Keisoku Seigyo Kk Coolant feeder
JPH0884919A (en) * 1994-09-14 1996-04-02 Toshiba Corp Method of injecting cryogenic liquid
JPH1043575A (en) * 1996-02-23 1998-02-17 L'air Liquide Bulk transportation of ultrahigh purity gas at high flow velocity
JP2000337597A (en) * 1999-04-20 2000-12-05 Gaz De France Method and device for maintaining low temperature of liquefied gas string and conveying chamber

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103322411A (en) * 2013-07-16 2013-09-25 兖矿集团有限公司 Chemical system stoppage protective device
CN106826390A (en) * 2017-02-23 2017-06-13 华中科技大学 A kind of difficult-to-machine material deep cooling system of processing for automating liquid nitrogen flow control

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