JP2004103578A5 - - Google Patents

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Publication number
JP2004103578A5
JP2004103578A5 JP2003299045A JP2003299045A JP2004103578A5 JP 2004103578 A5 JP2004103578 A5 JP 2004103578A5 JP 2003299045 A JP2003299045 A JP 2003299045A JP 2003299045 A JP2003299045 A JP 2003299045A JP 2004103578 A5 JP2004103578 A5 JP 2004103578A5
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JP
Japan
Prior art keywords
electrode
plasma processing
processing method
plasma
discharge
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Pending
Application number
JP2003299045A
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English (en)
Japanese (ja)
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JP2004103578A (ja
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Publication date
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Priority to JP2003299045A priority Critical patent/JP2004103578A/ja
Priority claimed from JP2003299045A external-priority patent/JP2004103578A/ja
Publication of JP2004103578A publication Critical patent/JP2004103578A/ja
Publication of JP2004103578A5 publication Critical patent/JP2004103578A5/ja
Pending legal-status Critical Current

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JP2003299045A 2002-08-23 2003-08-22 プラズマ処理方法 Pending JP2004103578A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003299045A JP2004103578A (ja) 2002-08-23 2003-08-22 プラズマ処理方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002244202 2002-08-23
JP2003299045A JP2004103578A (ja) 2002-08-23 2003-08-22 プラズマ処理方法

Publications (2)

Publication Number Publication Date
JP2004103578A JP2004103578A (ja) 2004-04-02
JP2004103578A5 true JP2004103578A5 (cg-RX-API-DMAC7.html) 2005-07-14

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ID=32301161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003299045A Pending JP2004103578A (ja) 2002-08-23 2003-08-22 プラズマ処理方法

Country Status (1)

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JP (1) JP2004103578A (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100541867B1 (ko) * 2005-08-22 2006-01-11 (주)케이.씨.텍 상압 플라즈마 발생용 전극 제조방법 및 전극구조와 이를이용한 상압 플라즈마 발생장치
US10892158B2 (en) 2019-04-01 2021-01-12 Hitachi High-Tech Corporation Manufacturing method of a semiconductor device and a plasma processing apparatus

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