JP2004058008A - Method of supplying exhaust gas and flashback prevention device - Google Patents
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Abstract
Description
【０００１】
【発明の属する技術分野】
本発明は、製造装置から排出される爆発範囲（通常は爆発下限界以上であり、以下、爆発下限界以上として説明するが、爆発上限以下の場合も含まれる。）の高濃度可燃性成分及び場合によっては粉塵を含有する爆発性排ガスの除害処理において使用される排ガス供給方法とその逆火防止装置に関する。
【０００２】
【従来の技術】
産業界にあっては様々なガスを使用して数々の製品の製造を行っており、その副産物として排ガスが発生し、これを無害化（例えば高温加熱分解）する処置を処理装置にて行い、大気放出している。その中のいくつかの製造設備において、製造装置から排出される排ガスにはＨ２を始め、ＳｉＨ４のような広い濃度範囲における爆発性を有する可燃性成分含有排ガスが排出されることがあり、不適切な処理のために時には爆発事故を起こすことがある。
【０００３】
そこで、これまでに取られた処置の第１は、これら爆発性を有する可燃性成分を高濃度に含む排ガスに多量の窒素を製造装置の排気口において直ちに混入し、前記可燃性成分を爆発下限界以下に薄め、然る後、排ガス処理を行っていた。この方法では可燃性成分が爆発下限界以下に薄められるので非常に安全であるが、処理風量が製造装置から排出される排ガス量の何倍にも膨れ上がるので、排ガス処理装置の規模がそれだけ大きくなり、コスト高になるという問題があった。
【０００４】
そのために取られた第２の処置は、製造装置（１）と排ガス処理用処理装置（３）の間にメッシュのような逆火防止材（５２）が充填された逆火防止装置（５１）を設置し、排ガス処理装置（３）で排ガス（２）の熱分解に使用されている火炎が何らかの原因により製造装置（１）と排ガス処理装置（３）との間に設置された排ガス供給配管（２ａ）を通って製造装置（１）に逆火しないようにしていた（図６参照）。なお、製造装置（１）に逆火すると内部に引火性ガスが溜まっている製造装置（１）が爆発して大事故を引き起こすことになる。
【０００５】
ただ、排ガス（２）が気体成分のみで構成されている場合は、このような従来の逆火防止装置（５１）も有効であるが、半導体製造装置のように排ガス（２）中に多量の粉塵を含むような場合には逆火防止材（５２）が目詰まりを生じ頻繁なメンテナンスを行わねばならないという問題があった。なお、このような爆発性を有する可燃性成分を含む排ガス供給配管（２ａ）のメンテナンスは非常な危険を伴うものであり、出来る限りメンテナンスフリーとなるようにすることが好ましい。
【０００６】
【発明が解決しようとする課題】
本発明は前述のような粉塵及び高濃度可燃性ガス含有排ガスの除害処理を行う場合において、メンテナンスフリーでしかも高濃度の可燃性ガスをそのまま安全に排ガス処理装置に供給することができ、逆火現象を生じない排ガスの供給方法と逆火防止装置を開発することをその解決課題とするものである。
【０００７】
【課題を解決するための手段】
「請求項１」に記載の排ガス供給方法は粉塵を含まない爆発性排ガスの除害処理に関し、「製造装置（１）から排出された可燃性成分を含む爆発範囲（一般的には爆発下限界以上）の濃度の排ガス（２）を処理装置（３）で除害する方法において、製造装置（１）と処理装置（３）との間に水蒸気が充満している水蒸気充満領域（４）を通過させた後、処理装置（３）に排ガス（２）を供給する」事を特徴とする。また、「請求項２」は粉塵を含む場合で、「粉塵を含み、製造装置（１）から排出された可燃性成分を含む爆発範囲（一般的には爆発下限界以上）の濃度の排ガス（２）を処理装置（３）で除害する方法において、製造装置（１）と処理装置（３）との間に水蒸気が充満している水蒸気充満領域（４）を通過させた後、処理装置（３）に排ガス（２）を供給する」事を特徴とする。
【０００８】
いずれの場合においても、水蒸気が充満している水蒸気充満領域（４）内に至ると、排ガス（２）を構成する成分分子と水蒸気充満領域（４）内の水蒸気（即ち、水蒸気充満領域（４）内を浮遊している水分子）とが均一に混ざり合い、何らかの原因により排ガス供給配管（２ａ）中の排ガス（２）中に空気（正確には酸素）が混入したとしても排ガス（２）中の可燃性成分と混入した酸素との結合が水蒸気によって阻害され、且つ水蒸気による温度上昇抑制効果も加わって製造装置（１）から排ガス処理装置（３）に至る排ガス供給配管（２ａ）内での逆火発生を効果的に防止することができる。なお、逆火防止に水蒸気を使用しているので、実際上、排ガス中に粉塵が含まれていたとしても目詰まりを生じるような事がない。換言すれば、本発明方法は粉塵含有排ガスの逆火防止に特に有効である。
【０００９】
「請求項３」は「請求項１」に記載の無粉塵排ガスの除害処理を実施するための逆火防止装置（５）に関し「爆発範囲（一般的には爆発下限界以上）の濃度の可燃性成分を有する排ガス（２）を排出する製造装置（１）と前記排ガス（２）を除害する処理装置（３）との間に設けられ、排ガスが通過する逆火防止装置（５）であって、排ガス通過領域に、水蒸気が充満している水蒸気充満領域（４）を設けた」事を特徴とする。これに対して、「請求項３」は「請求項２」に記載の粉塵含有排ガスの除害処理を実施するための逆火防止装置（５）に関し「粉塵を含み、爆発範囲（一般的には爆発下限界以上）の濃度の可燃性成分を有する排ガス（２）を排出する製造装置（１）と前記排ガス（２）を除害する処理装置（３）との間に設けられ、排ガスが通過する逆火防止装置（５）であって、排ガス通過領域に、水蒸気が充満している水蒸気充満領域（４）を設けた」事を特徴とするものである。また、「請求項５」はその更なる改良で「水蒸気充満領域（４）内に多孔質板（６ｃ）又は螺旋板（６ａ）あるいは邪魔板（６ｂ）など抵抗増加用中間部材（６）が設置されている」ことを特徴とする。
【００１０】
このように水蒸気充満領域（４）［即ち、逆火防止装置（５）の内部空間］内に螺旋板（６ａ）あるいは邪魔板（６ｂ）などの抵抗増加用中間部材（６）が設置されていると、水蒸気充満領域（４）内で排ガス（２）と水蒸気とが攪拌されて十分に混ざり合うと共に水蒸気充満領域（４）内の通過時間が長くなって水蒸気による温度上昇抑制効果が向上し逆火防止効果を高めることができるという利点がある。
【００１１】
【発明の実施の形態】
以下、本発明を図１に示す実施例１を用いて説明する。製造装置（１）は例えばＣＶＤのような半導体製造装置（勿論、これに限られず爆発性の可燃性成分を含む排ガスを排ガスとして排出するような装置は全て含まれる）で、半導体製造プロセスの排ガス（２）として、Ｈ２やＳｉＨ４など広範囲な濃度において爆発性を有する可燃性成分及び、場合によっては細かい多量の粉塵を伴う排ガス（２）を排出する。
【００１２】
排ガス処理装置（３）は図１に示す実施例１の場合、大略、排ガス分解処理塔（８）、後部スクラバ（９）、配線系、計器類、排気ファン（１７）及び水槽（１８）で構成されており、それぞれが配管や配線で接続されており、１つのコンパクトなキャビネット内に収納されている。
【００１３】
この製造装置（１）と排ガス処理装置（３）とは排ガス供給配管（２ａ）にて接続されており、その途中に逆火防止装置（５）が設置されている。逆火防止装置（５）は図１に示すように、円筒状の本体（１０）、内部に収納された螺旋板（６ａ）、螺旋板（６ａ）の上方に設置され、本体（１０）の内側面の全周から熱水を供給する熱水供給配管（１２）、底部に設けられたタンク（１３）、タンク（１３）内の水を７０〜９０℃（勿論、１００℃の沸騰状態でもよい。）程度に加熱して水蒸気を形成するヒータ（１４）、熱水供給配管（１２）を介してタンク（１３）内の水を側面開口（１２ａ）まで揚水する揚水ポンプ（１５）とで構成されている。ここで、「排ガス通過領域」とは、具体的には製造装置（１）と排ガス処理装置（３）とを連結する排ガス供給配管（２ａ）を指し、「水蒸気充満領域（４）」とは逆火防止装置（５）の内部を指す。
【００１４】
しかして、製造装置（１）から排出された、粉塵を含まない爆発下限界以上の濃度の可燃性成分を含む排ガス（２）は、逆火防止装置（５）の底部から本体内部に導入される。逆火防止装置（５）は排ガス処理装置（３）に接続されているので、排ガス処理装置（３）方向、即ち、図１の場合には底側から天井部に向かって螺旋板（６ａ）に沿って気流が螺旋状に流れている。
【００１５】
底部のタンク（１３）内にはヒータ（１４）が浸漬されておりタンク（１３）内の水を例えば７０〜９０℃（或いは１００℃の沸騰状態）に加熱して逆火防止装置（５）内に大量の水蒸気を供給し、逆火防止装置（５）の内部空間である水蒸気充満領域（４）を水蒸気で満たしている。また、前記タンク（１３）内の熱水は揚水ポンプ（１５）により揚水されて、側面開口（１２ａ）から逆火防止装置（５）内を内側面及び螺旋板（６ａ）に沿って流下し、その間、大量の蒸気を逆火防止装置（５）内に供給する。その結果、逆火防止装置（５）内は全体にわたって十分な量の水蒸気で満たされる事になる。
【００１６】
底部に導入された排ガス（２）は、前記大量の水蒸気と共に螺旋板（６ａ）に沿って螺旋状に上昇し且つこの間に十分に混合される。この状態で天井部から導出され、水蒸気と共に排ガス処理装置（３）の排ガス分解処理塔（８）に供給され、ここで熱分解される。
【００１７】
排ガス分解処理塔（８）内部の燃焼部分（８ａ）は、燃焼ヒータ（８ｂ）により７００〜１３００℃程度の高温に保たれている（例えば、シラン；ＳｉＨ４の場合、７００〜９００℃、ＮＦ３の場合、９００〜１１００℃、ＷＦ６の場合、７００〜９００℃）。そして、必要に応じて外部から排ガス分解処理塔（８）内に供給された酸素を含む外気にてこの部分（８ａ）に導入された排ガス（２）は確実に熱分解され、後部スクラバ（９）に送り出され、後部スクラバ（９）でスプレー（１６）による温度低下（前記熱分解により粉塵が発生した場合には同時にその除去）が行われた後、排気ファン（１７）により大気放出される。前記スプレー（１６）への揚水は、底部の水をスプレー（１６）へ供給する揚水ポンプ（１９）によって行われる。
【００１８】
さて、前述のように排ガス分解処理塔（８）において、排ガス（２）は完全に熱分解されるのであるが、時には何らかの原因により空気（正確には酸素）が排ガス供給配管（２ａ）内に混入して逆火現象を発生するような状態になることがある。この時、逆火防止装置（５）を装備していないような場合、製造装置（１）と排ガス処理装置（３）を結ぶ排ガス供給配管（２ａ）を通じて排ガス処理装置（３）の燃焼部分（８ａ）の火炎が製造装置（１）内に流れ、内部に溜まっている可燃性ガスに引火して製造装置（１）内で爆発を起こす（特に、水素のように広い範囲で爆発範囲を有するものの場合には顕著である。）ことがあったが、本発明の逆火防止装置（５）ではたとえこのような状態になったとしても、前述のように水蒸気が可燃性成分分子と助燃性成分分子との間に入り込み、たとえ可燃性成分の濃度が爆発範囲内に踏み込んでいたとしても逆火現象を防止することが出来る。
【００１９】
なお、前記の場合、排ガス（２）は逆火防止装置（５）の底部から導入した場合を示したが、勿論、これに限られず、明細書記載の実施例において、排ガス（２）を逆火防止装置（５）の天井部から導入し、底部から導出するようにしてもよく、図１の場合には配管を（２ａ’）で、排ガスを（２’）で示した。
【００２０】
また、図１の実施例は粉塵を含まない排ガス（２）に適用する場合であるので、前部スクラバ（２０）を省略し、機能的に類似する逆火防止装置（５）をその代用として使用した。このことは、前部スクラバ（２０）に水蒸気を充填することで逆火防止装置（５）としての働きをさせることができることを意味している。いずれにせよ、排ガス分解処理塔（８）に供給される前に水蒸気が充填している水蒸気充満領域（４）を設置することが重要である。
【００２１】
これにより爆発下限界以上の高濃度の爆発性可燃性成分を含む排ガス（２）が逆火防止装置（５）に導入されると、前述のように本体（１０）内部において完全に分子レベルで水蒸気と混ざり合い、たとえ排ガス（２）中に何らかの原因により酸素が混入したとしても酸素と可燃性成分との急激な酸化結合が妨げられ、爆発的燃焼現象を引き起こすことがない。換言すれば、このような状態になり、排ガス処理装置（３）と逆火防止装置（５）の出口との間で逆火現象が発生したとしても、この火炎は逆火防止装置（５）内で消し止められ、逆火防止装置（５）の入口に達することはない。
【００２２】
次に図２であるが、この場合は粉塵を大量に含む可燃性排ガス（２）の処理を行う点で図１の場合と相違する。この場合も基本的には図１と同一の装置で処理することができるが、ここでは逆火防止装置（５）と排ガス分解処理塔（８）との間に前部スクラバ（２０）を設置している。前部スクラバ（２０）内にはスプレー（２２）が設置されており、底部の水を揚水してスプレー（２２）に供給する揚水ポンプ（２１）が設置されている。本実施例では逆火防止装置（５）である程度、排ガス（２）内の粉塵が除去されるが、なおその一部は排ガス（２）および水蒸気と共に前部スクラバ（２０）内に入り、ここでスプレー（２２）のシャワー水に接して捕集されることになる。それ以降の処理は実施例１と同じである。
【００２３】
また、本実施例の逆火防止装置（５）にあっては、前述同様、底部に導入された排ガス（２）は前記大量の水蒸気と共に螺旋板（６ａ）に沿って螺旋状に上昇し且つこの間に十分に混合され、この状態で天井部から導出され、排ガス処理装置（３）の排ガス分解処理塔（８）に供給されるのであるが、製造装置（１）から供給された排ガス（２）中には多量の粉塵が含まれているが、その一部は水蒸気に捕集されて螺旋板（６ａ）や逆火防止装置（５）の内面に付着する。粉塵が螺旋板（６ａ）や逆火防止装置（５）の内面に堆積して通気が悪くなると、揚水ポンプ（１５）を作動させて側面開口（１２ａ）から熱水「この熱水は水蒸気の供給源にもなる。」を流出させ内部を洗浄する。これにより内部に堆積した粉塵は洗い落とされ底部のタンク（１３）に収納される。タンク（１３）はオーバーフローと給水により常時一定の水質に保たれている。
【００２４】
図３は邪魔板（６ｂ）を複数段使用した例であり、図４は内部に金網やパンチングメタルのような多孔質板（６ｃ）を複数段設けた場合で、図１〜３の螺旋板（６ａ）や邪魔板（６ｂ）の場合は、内部の排ガス通過路を長くして水蒸気との十分の混合図ることを目的としているのに対し、図４の多孔質板（６ｃ）の場合は、多孔質板（６ｃ）全体に水分が付着し、水分とガスとの接触を良好にさせることができる。それ故、粉塵の捕集効果が大きい。加えて、多孔質板（６ｃ）そのものが逆火防止効果も有するので、前記水蒸気の逆火防止効果を協働してより優れた逆火防止効果を奏する。なお、粉塵による多孔質板（６ｃ）の目詰まりも懸念されるが、側面開口（１２ａ）から流下している熱水によって必要時に洗浄されるので、目詰まりしない。
【００２５】
図５は図４の実施例を使用して行った実験に基づく結果で、テストガスとして水素、空気および窒素を用いた。破線で示す最外側の三角形の範囲が従来の爆発範囲（イ）を示す。これに対して、供給する熱水の温度を４５℃とした場合、爆発範囲は１段内側の三角形で示される範囲（ロ）に縮小する。供給する熱水の温度を７５℃とした場合、爆発範囲は更に内側の三角形で示される範囲（ハ）に縮小する。供給する熱水の温度を９５℃とした場合、爆発範囲は最内側の三角形で示される範囲（ニ）に縮小する。これにより熱水の温度が上昇し、発生する水蒸気量が増加することにより、防爆＝逆火防止効果が向上する。
【００２６】
なお、明細書全体を通じていることであるが、水蒸気の供給は熱水によらず、ボイラーのような蒸気発生装置から直接供給するようにしてもよいことはいうまでもない。
【００２７】
【発明の効果】
本発明は、製造装置と処理装置との間に排ガスが通過する水蒸気充満領域を設けているので、水蒸気充満領域内に至ると、排ガスを構成する成分分子と水蒸気とが均一に混ざり合い、可燃性成分分子と何らかの原因によって排ガス中に混入した酸素との結合が水蒸気によって阻害され、且つ水蒸気による温度上昇抑制効果により、排ガス中の可燃性成分の濃度が爆発下限界以上であっても、製造装置から排ガス処理装置に至る排ガス供給配管内での逆火発生を効果的に防止することができる。
【００２８】
加えて、水蒸気充満領域内に螺旋板あるいは邪魔板を設置する事で、排ガスと水蒸気とが攪拌されて十分に混ざり合うと共に排ガス通過領域の通過時間が長くなり、逆火防止効果を高めることができるという利点がある。
【図面の簡単な説明】
【図１】本発明に係る逆火防止装置の第１実施例を含むフロー図
【図２】本発明に係る逆火防止装置の第２実施例を含むフロー図
【図３】本発明に係る逆火防止装置の第３実施例を含むフロー図
【図４】本発明に係る逆火防止装置の第４実施例を含むフロー図
【図５】本発明に係る逆火防止効果を示す三元グラフ
【図６】従来の逆火防止装置を含むフロー図
【符号の説明】
（１）製造装置
（２）排ガス
（３）処理装置
（４）水蒸気充満領域[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a high-concentration combustible component in an explosion range (usually higher than the lower explosion limit, hereinafter described as being equal to or higher than the lower explosion limit, but including below the upper explosion limit) discharged from the manufacturing apparatus. In some cases, the present invention relates to an exhaust gas supply method used in abatement treatment of explosive exhaust gas containing dust and a flashback prevention device therefor.
[0002]
[Prior art]
In the industry, various products are manufactured using various gases, and as a by-product, exhaust gas is generated, and a treatment to detoxify the waste gas (for example, high-temperature thermal decomposition) is performed by a processing device. Released to the atmosphere. In some manufacturing facilities therein, beginning with H 2 in the exhaust gas discharged from the manufacturing apparatus, may combustible components containing exhaust gas having explosive in a wide concentration range, such as SiH 4 is discharged, Explosion can sometimes occur due to improper disposal.
[0003]
Therefore, the first of the measures taken so far is that a large amount of nitrogen is immediately mixed into the exhaust gas containing these explosive flammable components in a high concentration at the exhaust port of the production apparatus, and the flammable components are exploded. It was thinned below the limit, after which exhaust gas treatment was performed. This method is very safe because the flammable components are diluted below the lower explosion limit, but it is very safe.However, since the processing air volume expands to many times the amount of exhaust gas discharged from the manufacturing equipment, the size of the exhaust gas processing equipment is correspondingly large. Therefore, there is a problem that the cost increases.
[0004]
The second measure taken for this is a flashback prevention device (51) in which a flashback prevention material (52) such as a mesh is filled between the manufacturing device (1) and the exhaust gas treatment device (3). And an exhaust gas supply pipe installed between the manufacturing device (1) and the exhaust gas treatment device (3) due to a flame used for the thermal decomposition of the exhaust gas (2) in the exhaust gas treatment device (3) (2a) to prevent the production apparatus (1) from flashback (see FIG. 6). In addition, when the manufacturing apparatus (1) flashes back, the manufacturing apparatus (1) in which the flammable gas is stored explodes, causing a major accident.
[0005]
However, when the exhaust gas (2) is composed only of a gas component, such a conventional flashback prevention device (51) is effective, but a large amount of the exhaust gas (2) is contained in the exhaust gas (2) as in a semiconductor manufacturing apparatus. In the case where dust is included, there is a problem that the flashback prevention member (52) is clogged and frequent maintenance must be performed. The maintenance of the exhaust gas supply pipe (2a) containing such a combustible component having an explosive property involves a great danger, and it is preferable that the maintenance is as free as possible.
[0006]
[Problems to be solved by the invention]
The present invention is capable of safely supplying maintenance-free and high-concentration flammable gas directly to an exhaust-gas treatment device when performing abatement of dust and exhaust gas containing high-concentration flammable gas as described above. An object of the present invention is to develop a method of supplying exhaust gas that does not cause a fire phenomenon and a device for preventing flashback.
[0007]
[Means for Solving the Problems]
The method for supplying exhaust gas according to
[0008]
In any case, when it reaches the steam-filled area (4) filled with steam, the component molecules constituting the exhaust gas (2) and the steam in the steam-filled area (4) (that is, the steam-filled area (4)). ) Are uniformly mixed with water (water molecules floating in the air), and even if air (accurately, oxygen) is mixed into the exhaust gas (2) in the exhaust gas supply pipe (2a) for some reason, the exhaust gas (2) In the exhaust gas supply pipe (2a) from the manufacturing device (1) to the exhaust gas treatment device (3), the bond between the combustible component in the gas and the mixed oxygen is inhibited by the steam, and the effect of suppressing the temperature rise by the steam is added. The occurrence of flashback can be effectively prevented. In addition, since steam is used for flashback prevention, clogging does not actually occur even if dust is contained in exhaust gas. In other words, the method of the present invention is particularly effective in preventing flashback of dust-containing exhaust gas.
[0009]
"
[0010]
As described above, the resistance increasing intermediate member (6) such as the spiral plate (6a) or the baffle plate (6b) is installed in the steam-filled area (4) [that is, the internal space of the flashback prevention device (5)]. In this case, the exhaust gas (2) and the steam are agitated and sufficiently mixed in the steam-filled area (4), and the passage time in the steam-filled area (4) becomes longer, so that the effect of suppressing the temperature rise due to the steam is improved. There is an advantage that the effect of preventing flashback can be enhanced.
[0011]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, the present invention will be described using a first embodiment shown in FIG. The manufacturing apparatus (1) is, for example, a semiconductor manufacturing apparatus such as CVD (of course, not limited thereto, includes any apparatus that discharges exhaust gas containing explosive combustible components as exhaust gas), and includes exhaust gas of a semiconductor manufacturing process. As (2), a combustible component having explosive properties in a wide range of concentrations such as H 2 and SiH 4 and, in some cases, exhaust gas (2) with a large amount of fine dust are emitted.
[0012]
In the case of the first embodiment shown in FIG. 1, the exhaust gas treatment device (3) generally includes an exhaust gas decomposition treatment tower (8), a rear scrubber (9), a wiring system, instruments, an exhaust fan (17), and a water tank (18). Each is connected by piping or wiring, and housed in one compact cabinet.
[0013]
The production device (1) and the exhaust gas treatment device (3) are connected by an exhaust gas supply pipe (2a), and a flashback prevention device (5) is provided in the middle of the connection. As shown in FIG. 1, the flashback prevention device (5) is installed above the cylindrical main body (10), the spiral plate (6a) housed therein, and the spiral plate (6a). A hot water supply pipe (12) for supplying hot water from the entire circumference of the inner surface, a tank (13) provided at the bottom, and water in the tank (13) are heated to 70 to 90 ° C (of course, even at a boiling state of 100 ° C). And a pump (15) for pumping water in the tank (13) to the side opening (12a) via a hot water supply pipe (12). It is configured. Here, the “exhaust gas passage area” specifically refers to an exhaust gas supply pipe (2a) connecting the production apparatus (1) and the exhaust gas treatment apparatus (3), and the “steam-filled area (4)”. Refers to the inside of the flashback prevention device (5).
[0014]
Thus, the exhaust gas (2) discharged from the manufacturing apparatus (1) and containing a flammable component having a concentration equal to or higher than the lower explosive limit containing no dust is introduced into the main body from the bottom of the flashback prevention device (5). You. Since the flashback prevention device (5) is connected to the exhaust gas treatment device (3), the spiral plate (6a) is directed toward the exhaust gas treatment device (3), that is, from the bottom to the ceiling in FIG. Is flowing spirally along.
[0015]
A heater (14) is immersed in the bottom tank (13), and heats the water in the tank (13) to, for example, 70 to 90 ° C (or a boiling state of 100 ° C) to prevent a flashback (5). A large amount of steam is supplied into the inside, and the steam filling area (4), which is the internal space of the flashback prevention device (5), is filled with steam. The hot water in the tank (13) is pumped by a pump (15) and flows down through the side opening (12a) in the flashback prevention device (5) along the inner surface and the spiral plate (6a). Meanwhile, a large amount of steam is supplied into the flashback prevention device (5). As a result, the inside of the flashback prevention device (5) is completely filled with a sufficient amount of water vapor.
[0016]
The exhaust gas (2) introduced into the bottom rises spirally along the spiral plate (6a) with the large amount of water vapor and is well mixed during this. In this state, it is led out of the ceiling and supplied to the exhaust gas decomposition treatment tower (8) of the exhaust gas treatment device (3) together with the steam, where it is thermally decomposed.
[0017]
Exhaust gas decomposing tower (8) inside the combustion portion (8a) is kept at a high temperature of about 700-1300 ° C. by combustion heater (8b) (for example, a silane; for SiH 4, 700 to 900 ° C., NF in the case of 3, 900~1100 ℃, the case of WF 6, 700~900 ℃). If necessary, the exhaust gas (2) introduced into this portion (8a) by the outside air containing oxygen supplied from the outside into the exhaust gas decomposition treatment tower (8) is surely thermally decomposed, and the rear scrubber (9) ), The temperature is reduced by a spray (16) in a rear scrubber (9) (and dust is generated at the same time by the thermal decomposition), and then discharged to the atmosphere by an exhaust fan (17). . Pumping to the spray (16) is performed by a pump (19) that supplies bottom water to the spray (16).
[0018]
As described above, in the exhaust gas decomposition treatment tower (8), the exhaust gas (2) is completely thermally decomposed, but sometimes air (exactly, oxygen) is introduced into the exhaust gas supply pipe (2a) for some reason. In some cases, it may be mixed to cause a flashback phenomenon. At this time, when the flashback prevention device (5) is not equipped, the combustion part (3) of the exhaust gas treatment device (3) is passed through an exhaust gas supply pipe (2a) connecting the production device (1) and the exhaust gas treatment device (3). The flame of 8a) flows into the manufacturing apparatus (1), ignites the flammable gas stored therein and causes an explosion in the manufacturing apparatus (1) (particularly, it has a wide explosion range such as hydrogen. However, in the case of the flashback prevention device (5) of the present invention, even in such a state, as described above, the water vapor forms the flammable component molecules and the auxiliary Even if the concentration of the flammable component falls within the explosion range, the flashback phenomenon can be prevented.
[0019]
In the above case, the case where the exhaust gas (2) is introduced from the bottom of the flashback prevention device (5) is shown. However, the present invention is not limited to this, and in the embodiment described in the specification, the exhaust gas (2) is inverted. It may be introduced from the ceiling of the fire prevention device (5) and led out from the bottom. In the case of FIG. 1, the pipe is indicated by (2a ') and the exhaust gas is indicated by (2').
[0020]
Further, since the embodiment of FIG. 1 is applied to the exhaust gas (2) containing no dust, the front scrubber (20) is omitted, and a functionally similar flashback prevention device (5) is used instead. used. This means that the front scrubber (20) can function as a flashback prevention device (5) by filling with steam. In any case, it is important to provide a steam filled area (4) filled with steam before being supplied to the exhaust gas decomposition treatment tower (8).
[0021]
As a result, when the exhaust gas (2) containing a high concentration of explosive combustible components higher than the lower explosion limit is introduced into the flashback prevention device (5), the exhaust gas (2) is completely converted to a molecular level inside the main body (10) as described above. It mixes with water vapor, and even if oxygen is mixed into the exhaust gas (2) for some reason, the rapid oxidative bond between oxygen and the flammable component is prevented, so that an explosive combustion phenomenon does not occur. In other words, even if such a state occurs and a flashback phenomenon occurs between the exhaust gas treatment device (3) and the outlet of the flashback prevention device (5), the flame is not emitted from the flashback prevention device (5). And is not extinguished, and does not reach the entrance of the flashback device (5).
[0022]
Next, FIG. 2 is different from the case of FIG. 1 in that the combustible exhaust gas (2) containing a large amount of dust is processed in this case. Also in this case, the treatment can be basically performed by the same apparatus as in FIG. 1, but here, a front scrubber (20) is installed between the flashback prevention device (5) and the exhaust gas decomposition treatment tower (8). are doing. A spray (22) is provided in the front scrubber (20), and a water pump (21) is provided for pumping water at the bottom and supplying the water to the spray (22). In this embodiment, the dust in the exhaust gas (2) is removed to some extent by the flashback prevention device (5), but part of the dust enters the front scrubber (20) together with the exhaust gas (2) and water vapor. Then, the water is collected in contact with the shower water of the spray (22). Subsequent processing is the same as in the first embodiment.
[0023]
Further, in the flashback prevention device (5) of this embodiment, the exhaust gas (2) introduced into the bottom rises spirally along the spiral plate (6a) together with the large amount of water vapor, as described above, and During this time, the mixture is sufficiently mixed, is discharged from the ceiling in this state, and is supplied to the exhaust gas decomposition treatment tower (8) of the exhaust gas treatment device (3). The exhaust gas (2) supplied from the production device (1) is used. ) Contains a large amount of dust, but a part of the dust is collected by water vapor and adheres to the spiral plate (6a) and the inner surface of the flashback prevention device (5). When dust accumulates on the inner surface of the spiral plate (6a) or the flashback prevention device (5) and ventilation is deteriorated, the water pump (15) is operated to supply hot water from the side opening (12a). It will also be a supply source. " As a result, the dust accumulated inside is washed off and stored in the tank (13) at the bottom. The tank (13) is always maintained at a constant water quality by overflow and water supply.
[0024]
FIG. 3 shows an example in which a plurality of baffle plates (6b) are used, and FIG. 4 shows a case where a plurality of porous plates (6c) such as a wire mesh or punched metal are provided therein. In the case of (6a) and the baffle plate (6b), the purpose is to lengthen the internal exhaust gas passage and achieve sufficient mixing with water vapor, whereas in the case of the porous plate (6c) in FIG. In addition, moisture adheres to the entire porous plate (6c), and the contact between the moisture and the gas can be improved. Therefore, the dust collecting effect is large. In addition, since the porous plate (6c) itself also has a flashback prevention effect, a more excellent flashback prevention effect is achieved by cooperating with the steam flashback prevention effect. Although the porous plate (6c) may be clogged by dust, the porous plate (6c) is not clogged because it is washed when necessary by hot water flowing down from the side opening (12a).
[0025]
FIG. 5 is a result based on an experiment performed using the example of FIG. 4, and hydrogen, air, and nitrogen were used as test gases. The range of the outermost triangle indicated by the broken line indicates the conventional explosion range (a). On the other hand, when the temperature of the supplied hot water is 45 ° C., the explosion range is reduced to a range (b) indicated by a triangle inside one step. When the temperature of the supplied hot water is 75 ° C., the explosion range is further reduced to the range (c) indicated by the inner triangle. When the temperature of the supplied hot water is 95 ° C., the explosion range is reduced to the range (d) indicated by the innermost triangle. As a result, the temperature of the hot water rises, and the amount of generated steam increases, so that the explosion-proof = flashback prevention effect is improved.
[0026]
It is to be noted that, throughout the specification, it is needless to say that steam may be supplied directly from a steam generator such as a boiler instead of hot water.
[0027]
【The invention's effect】
According to the present invention, since the steam-filled area through which the exhaust gas passes is provided between the manufacturing apparatus and the processing apparatus, when the steam-filled area is reached, the component molecules constituting the exhaust gas and the steam are uniformly mixed, and the flammable gas is combustible. Even if the concentration of flammable components in the exhaust gas is higher than the lower explosion limit due to the steam inhibiting the bond between the volatile component molecules and oxygen mixed into the exhaust gas for some reason, The occurrence of flashback in the exhaust gas supply pipe from the device to the exhaust gas treatment device can be effectively prevented.
[0028]
In addition, by installing a spiral plate or baffle plate in the steam-filled area, the exhaust gas and steam are agitated and mixed sufficiently, and the passage time in the exhaust gas passage area becomes longer, which can enhance the effect of preventing flashback. There is an advantage that you can.
[Brief description of the drawings]
FIG. 1 is a flowchart including a first embodiment of a flashback prevention device according to the present invention; FIG. 2 is a flowchart including a second embodiment of a flashback prevention device according to the present invention; FIG. FIG. 4 is a flowchart including a third embodiment of a flashback prevention device according to the present invention. FIG. 5 is a flowchart illustrating a flashback prevention effect according to the present invention. Graph [Figure 6] Flow diagram including conventional flashback prevention device [Explanation of reference numerals]
(1) Production equipment (2) Exhaust gas (3) Treatment equipment (4) Steam filled area
Claims (5)
製造装置と処理装置との間に水蒸気が充満している水蒸気充満領域を通過させた後、水蒸気と共に処理装置に前記排ガスを供給する事を特徴とする排ガス供給方法。In a method for removing exhaust gas having a concentration in an explosive range including flammable components discharged from a manufacturing device by a treatment device,
An exhaust gas supply method, comprising: passing an exhaust gas together with steam to a processing device after passing through a steam-filled region filled with steam between a production device and a processing device.
製造装置と処理装置との間に水蒸気が充満している水蒸気充満領域を通過させた後、水蒸気と共に処理装置に前記排ガスを供給する事を特徴とする排ガス供給方法。In the method of removing flammable components having a concentration in the explosion range discharged from the production equipment and exhaust gas containing dust with the treatment equipment,
An exhaust gas supply method, comprising: passing an exhaust gas together with steam to a processing device after passing through a steam-filled region filled with steam between a production device and a processing device.
内部の排ガス通過領域に水蒸気が充満している水蒸気充満領域を設けた事を特徴とする逆火防止装置。A flashback prevention device is provided between a manufacturing apparatus that discharges an exhaust gas having a flammable component having an explosive range concentration and a processing apparatus that removes the exhaust gas, and the exhaust gas passes therethrough.
A flashback prevention device characterized in that a steam-filled area filled with steam is provided in an internal exhaust gas passage area.
内部の排ガス通過領域に水蒸気が充満している水蒸気充満領域を設けた事を特徴とする逆火防止装置。Including a dust, is provided between a manufacturing apparatus that discharges an exhaust gas having a combustible component having a concentration in an explosion range and a processing apparatus that removes the exhaust gas, in a flashback prevention device through which the exhaust gas passes,
A flashback prevention device characterized in that a steam-filled area filled with steam is provided in an internal exhaust gas passage area.
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