JP2004052082A5 - - Google Patents

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Publication number
JP2004052082A5
JP2004052082A5 JP2002214426A JP2002214426A JP2004052082A5 JP 2004052082 A5 JP2004052082 A5 JP 2004052082A5 JP 2002214426 A JP2002214426 A JP 2002214426A JP 2002214426 A JP2002214426 A JP 2002214426A JP 2004052082 A5 JP2004052082 A5 JP 2004052082A5
Authority
JP
Japan
Prior art keywords
erosion region
target
target material
sputtering
backing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002214426A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004052082A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002214426A priority Critical patent/JP2004052082A/ja
Priority claimed from JP2002214426A external-priority patent/JP2004052082A/ja
Publication of JP2004052082A publication Critical patent/JP2004052082A/ja
Publication of JP2004052082A5 publication Critical patent/JP2004052082A5/ja
Pending legal-status Critical Current

Links

JP2002214426A 2002-07-23 2002-07-23 スパッタリングターゲット組立体 Pending JP2004052082A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002214426A JP2004052082A (ja) 2002-07-23 2002-07-23 スパッタリングターゲット組立体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002214426A JP2004052082A (ja) 2002-07-23 2002-07-23 スパッタリングターゲット組立体

Publications (2)

Publication Number Publication Date
JP2004052082A JP2004052082A (ja) 2004-02-19
JP2004052082A5 true JP2004052082A5 (enrdf_load_html_response) 2005-09-02

Family

ID=31936754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002214426A Pending JP2004052082A (ja) 2002-07-23 2002-07-23 スパッタリングターゲット組立体

Country Status (1)

Country Link
JP (1) JP2004052082A (enrdf_load_html_response)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010144194A (ja) * 2008-12-16 2010-07-01 Ulvac Japan Ltd スパッタ装置
JP5995419B2 (ja) * 2011-09-01 2016-09-21 株式会社東芝 スパッタリングターゲット及びそれを用いた磁気メモリの製造方法
JP6716863B2 (ja) * 2015-05-29 2020-07-01 住友金属鉱山株式会社 スパッタリングターゲット及びこれを用いたスパッタリング成膜方法
CN112144034B (zh) * 2019-06-27 2022-12-30 昆山世高新材料科技有限公司 一种冷却背板
KR102470438B1 (ko) * 2020-09-28 2022-11-25 파인원 주식회사 개조된 일체형 백킹 플레이트 제조 방법

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