JP2004022492A - Exposure device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of improving the productivity of an image tube. <P>SOLUTION: In this exposure device of the image tube 6, an axially asymmetrical elliptic mirror 2 asymmetrical with respect to an optical axis is installed as a collection/reflection member 2 for collecting light emitted from a light source 1, and the light is condensed at the incident end of an optical integrator 3. At that time, the axially asymmetrical elliptic mirror is installed by making its direction having a larger NA coincide with the direction in which the virtual image shape of the light source viewed from the emission part of a projection lens group is required to be increased. <P>COPYRIGHT: (C)2004,JPO

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The invention of this application relates to an exposure apparatus. More specifically, the invention of this application relates to an exposure apparatus capable of sufficiently increasing the illuminance of a surface to be exposed and reducing the exposure time even when the horizontal size and the vertical size of the light source virtual image are significantly different. is there.
[0002]
[Prior art]
2. Description of the Related Art Conventionally, an image tube for displaying an image on a display wall, as represented by a CRT, scans an infinite number of phosphors disposed on the inner surface of the display wall for each pixel by irradiating vertically and horizontally deflected electron beams. While emitting light sequentially according to the video signal.
[0003]
The fluorescent material of the picture tube as described above is obtained by exposing the resin material of the photo-curing agent in the portion applied to the inner surface of the display wall in a predetermined pattern, thereby curing the exposed portion of the resin material to form the inner surface of the display wall. Then, the inner surface of the display wall is washed, and the unexposed portion of the resin material is washed away to develop and form.
[0004]
By the way, the phosphors of the color picture tube are provided for three colors of G, B and R for each pixel. In recent years, all the phosphors of G, B, and R for each pixel are partitioned by a black matrix formed in a predetermined pattern, that is, a so-called BM, so that a display image is sharpened.
[0005]
For each of the BM and each of the phosphors G, B, and R, a method is provided in which a corresponding photocurable resin is applied, and the exposed and cured photocurable resin is developed.
[0006]
Conventionally, in order to perform the above exposure, for example, an exposure apparatus shown in FIGS. 5 to 7 described in Japanese Patent Application No. 08-48995 is used.
[0007]
As shown in FIG. 5, the exposure apparatus as described above uses an extra-high pressure mercury lamp (1) as a light source, and receives light from the extra-high pressure mercury lamp (1) as an elliptical mirror which is a condensing and reflecting member. An illumination means (4) which reflects and condenses the light by (2) and integrates it by a rod-shaped optical integrator (3) as an optical integration member so as to irradiate a spot with a predetermined size, and an illumination means (4). And a lens system (7) for projecting the luminous flux (10) from the surface (6a) of the picture tube (6) to the exposed surface.
[0008]
The elliptical mirror (2) has a shape in which the reflection surface is part of an ellipse in the optical axis direction, and has an axially symmetrical shape such as a circle in the direction perpendicular to the optical axis.
[0009]
The light from the ultra-high pressure mercury lamp (1) condensed by the elliptical mirror (2) is received by one end of the rod-shaped optical integrator (3) and emitted from the other end. At this time, the optical integrator (3) integrates while repeating various reflections inside the side circumference until the light received from one end by the rod shape exits from the other end.
[0010]
The light received by the optical integrator (3) by such an integration function is emitted from the entire exit surface of the optical integrator (3) as a light beam having a uniform light intensity distribution c as shown in FIG. . Therefore, an outgoing light beam (10) suitable for uniformly irradiating a spot with a predetermined size can be obtained using only one small and simple optical member by the rod-shaped optical integrator (3), and this is used as a lens system ( By projecting the entire area of the exposed surface (6a) of the picture tube (6) by 7), predetermined local illumination for collectively exposing the exposed surface (6a) is achieved with high accuracy.
[0011]
In the case of the above exposure apparatus, the light collected by the elliptical mirror (2) is made incident on one end of the optical integrator (3) by the cold mirror (15) and the optical fiber (16). ) And the optical fiber (16) may be omitted or replaced with another part.
[0012]
Here, as shown in FIG. 7, the optical path (VP) in the vertical deflection direction and the optical path (HP) in the horizontal deflection direction are shown in FIG. A pseudo-refractive characteristic point (V) corresponding to a vertical deflection characteristic for vertically deflecting the electron beam at the time of actual image projection by a pseudo-refractive characteristic point (H) corresponding to a horizontal deflection characteristic for horizontally deflecting the electron beam, Astigmatism is given so as to have at the front-back distance (S) corresponding to the actual vertical deflection point and the horizontal deflection point.
[0013]
The lens system (7) of this conventional example is a diaphragm lens group (7a) for narrowing a parallel light beam from the illumination means (4) to an appropriate size and shape suitable for exposing the surface to be exposed (6a). And a projection lens group (7b) for projecting the light converged by the diaphragm lens group (7a) onto the front surface of the surface to be exposed (6a), and has a pseudo refraction characteristic point (V ) Is realized by, for example, a combination of two anamorphic lenses (11) and (12) in the projection lens group (7b), and a quasi-refractive characteristic for obtaining a quasi-refractive characteristic point (H) corresponding to horizontal deflection. The characteristics are realized by, for example, two anamorphic lenses (13) and (14) in the aperture lens group (7a).
[0014]
The lens system (7) vertically deflects the electron beam at the time of actual image projection in the picture tube (6) by astigmatism given so as to have pseudo refraction characteristics (V) and (H) in its own virtual image area. The pseudo refraction characteristic corresponding to the vertical deflection characteristic to be deflected and the pseudo refraction characteristic corresponding to the horizontal deflection characteristic for horizontally deflecting the electron beam have a front-back interval (S) corresponding to the actual vertical deflection point and the horizontal deflection point. At two points, these are present in the virtual image area without affecting the projection on the surface to be exposed (6a), so that they are the same as the electron beam reaching each part when displaying the actual image on the picture tube (6). Each part is properly exposed to light from the direction, and each phosphor dot of BM, G, B, and R deflects an electron beam in an actual screen display to perform scanning and an image signal for each pixel. Correctly synchronize the scanning position for each pixel Rukoto can.
[0015]
Note that the aperture lens group (7a) employs a telecentric optical system, and as shown in FIG. 8, emits light from each point on the emission surface (3a) of the optical integrator (3) within a certain angle. The light is emitted as a parallel light beam.
[0016]
FIG. 9 shows an intensity distribution G on a surface (6a) to be exposed to light emitted from a point G on the same axis on the emission surface (3a) of the optical integrator (3) and points F and H near the point G, F and H are shown. Further, the intensity distribution J on the exposed surface (6a) obtained by integrating the emitted light from each point on the exit surface (3a) of the optical integrator (3) including the above G, F, and H is shown at the right end of FIG. . FIG. 8 is a diagram for explaining a light beam emitted from the optical integrator (3), and FIG. 9 is a diagram for explaining an intensity distribution on the surface to be exposed (6a). The shape and arrangement of each lens shown in FIG. 9 do not match the shape and arrangement of each lens shown in FIG.
[0017]
As described above, according to the conventional exposure apparatus as described above, as is clear from FIG. 9, an exposure optical system having a smooth distribution without local unevenness in light intensity is achieved over the entire surface to be exposed (6a). Is done.
[0018]
As shown in FIG. 5, various correction optical means (20) are provided between the lens system (7) and the surface to be exposed (6a). These are conventionally provided. In the correction optical means (20) of FIG. 5, a cylinder lens (21), a ΔP lens (22), an X-axis filter (23), a ΔS lens (24), A correction filter (25), main filters (26), (27) and the like are arranged.
[0019]
[Problems to be solved by the invention]
However, in the conventional exposure apparatus as described above, a spherical lens is used in the lens system except for using an anamorphic lens in order to have the pseudo refraction characteristic point, and the light source viewed from the projection lens group emission unit is used. With regard to the virtual image described above, the size in the horizontal direction and the size in the vertical direction when the actual image is projected on the picture tube do not greatly differ.
[0020]
Therefore, as in a TV picture tube exposure apparatus, regarding a virtual image of a light source viewed from a projection lens group emission unit, when the size in the horizontal direction at the time of actual image projection by the picture tube is significantly different from the size in the vertical direction. As a method, a method is conceivable in which an aperture is installed in or near the projection lens group to block a light beam so that the corresponding light source virtual image has a horizontal size and a vertical size.
[0021]
In this case, a large amount of exposure light loss occurs in the minor axis direction of the aperture opening, and the illuminance of the surface to be exposed cannot be sufficiently obtained. Therefore, the exposure time is prolonged, resulting in poor productivity.
[0022]
Therefore, the invention of this application has been made in view of the above circumstances, and solves the problems of the prior art, and as in a TV tube exposure apparatus, the horizontal size and the vertical size of a virtual image of a light source are enlarged. It is an object of the present invention to provide an exposure apparatus in which the illuminance of the surface to be exposed is sufficiently large even when the exposure time greatly differs, and the exposure time can be reduced.
[0023]
[Means for Solving the Problems]
In order to solve the above-described problems, the invention of this application firstly provides a light source, a light-collecting / reflecting member that collects light emitted from the light source, and receiving light passing through the light-collecting / reflecting member from one end. Integrating and illuminating means having an optical integrator that emits light from the other end, and a lens group that receives light emitted from the optical integrator and stops the light to an appropriate size and shape to expose the surface to be exposed. A projection lens group for projecting the light converged by the diaphragm lens group onto the entire surface of the surface to be exposed, and a vertical lens for vertically deflecting the electron beam during image projection in the virtual image area by the two lens groups. The quasi-refractive characteristic point corresponding to the deflection characteristic and the quasi-refractive characteristic point corresponding to the horizontal deflection characteristic for horizontally deflecting the electron beam are set in front and rear intervals corresponding to the actual vertical deflection point and the horizontal deflection point. In an exposure device for providing astigmatism like having to provide an exposure apparatus, wherein the light collecting reflector member is an asymmetrical axisymmetric ellipsoidal mirror to the optical axis.
[0024]
Secondly, the invention of the present application is the invention according to the first invention, in which, before the entrance end of the optical integrator, the NA of the axially asymmetric elliptical mirror is increased in a direction in which the virtual image shape of the light source viewed from the projection lens group emission unit is lengthened. An axially asymmetric elliptical mirror, an optical integrator, and a lens system are installed so as to combine a large direction and combine a direction with a small NA of the axially asymmetric elliptical mirror in a direction to shorten the virtual image shape of the light source viewed from the projection lens group emission unit. An exposure apparatus is provided.
[0025]
BEST MODE FOR CARRYING OUT THE INVENTION
An embodiment of the exposure apparatus of the present invention will be described below with reference to the drawings. In addition, in each drawing, the same reference numerals are given to components that perform the same or similar functions.
[0026]
FIGS. 1A and 1B are a horizontal sectional view and a vertical sectional view, respectively, of an embodiment of the exposure apparatus of the present invention. As shown in FIGS. 1A and 1B, the exposure apparatus (101) in this embodiment includes an illumination unit (4) and a lens system (7). For example, in the illuminating means (4), an ultra-high pressure mercury lamp (1) is used as a light source, and light emitted from the ultra-high pressure mercury lamp (1) is reflected and reflected by an axially asymmetric elliptical mirror (2) which is a condensing and reflecting member. The light is condensed, and the collected light is incident on a rod-shaped optical integrator (3) as an optical integration member so as to be irradiated with a spot of a predetermined size, and is integrated. The lens system (7) projects the luminous flux (10) emitted from the illuminating means (4) onto the entire area of the exposed surface (6a) of the picture tube (6).
[0027]
Here, this exposure apparatus (101) is different from the conventional exposure apparatus in that an axially asymmetric elliptical mirror (2) is used as an elliptical mirror used as a condensing and reflecting member, and the optical integrator (3) is located just before the entrance end. The virtual image shape of the light source viewed from the projection lens group emission unit is combined with a direction in which the NA (numerical aperture) of the axially asymmetric elliptical mirror (2) is increased in the vertical direction to lengthen the virtual image shape of the light source viewed from the projection lens group emission unit. The shorter horizontal direction is combined with the direction in which the NA of the axially asymmetric elliptical mirror (2) is smaller to install them.
[0028]
FIG. 2 is an enlarged view of the axially asymmetric elliptical mirror (2) and the optical integrator (3), where (a) shows a horizontal sectional view and (b) shows a vertical sectional view.
[0029]
In the horizontal direction shown in FIG. 2A, the side with smaller NA of the axially asymmetric elliptical mirror (2) is used. In this case, the light incident on one end of the rod-shaped optical integrator (3) is emitted from the emission end while repeating various reflections on the inner side of the circumference until the light is emitted from the other end. Emission angle theta ₂ is equal to the incident angle theta ₁ of the optical integrator (3). As an example, when NA = 0.1, θ ₁ = θ ₂ = about 6 °.
[0030]
As shown in FIG. 2B, in the vertical direction, the side with the larger NA of the axially asymmetric elliptical mirror (2) is used. In this case, similarly to the horizontal direction, the light incident on one end of the rod-shaped optical integrator (3) is emitted from the emission end while repeating various reflections on the inner side of the circumference until the light is emitted from the other end. Emission angle theta ₂ is equal to the incident angle theta ₁ of the optical integrator (3). As an example, when NA = 0.3, θ ₁ = θ ₂ = about 18 °.
[0031]
That is, in the above structure, the exposure light is emitted from the emission end of the optical integrator (3) at different horizontal and vertical directions, for example, NA = 0.1 and NA = 0.3. Becomes possible.
[0032]
Similarly to the conventional exposure apparatus shown in FIG. 7, the lens system (7) has a pseudo refraction characteristic point (V) corresponding to a vertical deflection characteristic for vertically deflecting the electron beam when an actual image is projected on the picture tube (6). ) And a pseudo refraction characteristic point (H) corresponding to a horizontal deflection characteristic for horizontally deflecting the electron beam at an interval (S) before and after the actual vertical deflection point and the horizontal deflection point. Aberrations are given.
[0033]
Then, at the time of actual screen display in the picture tube (6), each part is appropriately exposed by light traveling from the same direction as the electron beam reaching each part, and each phosphor dot of BM, G, B, R is converted to the actual screen. An image signal for each pixel when scanning by deflecting an electron beam in display and a scanning position for each pixel can be correctly synchronized.
[0034]
An aperture lens group (7a) for narrowing the parallel light beam from the illumination means (4) to an appropriate size and shape suitable for exposing the surface to be exposed (6a) is provided with a telecentric optical system like a conventional exposure apparatus. The light emitted from each point on the emission surface (3a) of the optical integrator (3) within a certain angle is emitted as a substantially parallel light beam.
[0035]
The aperture lens group (7a), which is the telecentric optical system, narrows the light emitted from the optical integrator (3) to a size and shape suitable for exposing the exposed surface (6a). At this time, the exposure light beam is narrowed substantially in proportion to the focal length of the aperture lens group (7a) and the emission NA from the optical integrator (3).
[0036]
FIG. 3 shows a state in which the exposure light beam is stopped down by the stop lens group (7a) when the output NA from the optical integrator (3) is NA = 0.1 in the horizontal direction and NA = 0.3 in the vertical direction as described above. Is shown. 3A shows the horizontal direction, and FIG. 3B shows the vertical direction.
[0037]
As shown in FIG. 3, when the exposure light is stopped down, the exposure light in the vertical direction can be made about three times larger than that in the horizontal direction.
[0038]
Then, by making the focal length of the aperture lens group (7a) 2/3 times the conventional one, the exposure light is condensed to the same diameter in the vertical direction and 1/3 times in the horizontal direction as compared with the conventional case. It becomes possible.
[0039]
FIG. 4 shows a case in which the vertical size of the virtual image of the light source viewed from the projection lens group emission unit is larger than the horizontal size of the actual image projected by the video tube, as in a TV picture tube exposure apparatus. An aperture (32) is installed inside or near the projection lens, and the light beam (33) is shielded, so that the aperture (32) and the exposure light beam when the size of the corresponding light source virtual image is made in the horizontal and vertical directions. Shows the relationship. The vertical direction is the vertical direction and the horizontal direction is the horizontal direction.
[0040]
FIG. 4A shows the case of a conventional exposure apparatus, and FIG. 4B shows the case of an embodiment of the exposure apparatus of the present invention. In (b), as compared with (a), the number of light beam shielding portions in the aperture (32) is small, the exposure light loss is small, and the illuminance of the surface to be exposed is sufficiently obtained. Therefore, the exposure time is short, and the productivity of the picture tube can be improved.
[0041]
Here, an example is described in which the axially asymmetric elliptical mirror (2) having a large NA in the vertical direction is installed just before the entrance end of the optical integrator (3). Accordingly, it is possible to form various flat light source virtual image shapes in arbitrary directions, and it is possible to form phosphors corresponding to various flat light source virtual image shapes in arbitrary directions. In this case, the exposure light loss at the aperture is small and the illuminance of the exposed surface is sufficiently obtained.
[0042]
Thus, even when it is necessary to greatly change the horizontal and vertical sizes of the light source virtual image as in the case of the exposure apparatus for a television picture tube, according to the exposure apparatus of the present invention, the exposure surface The illuminance can be made sufficiently large, the exposure time can be shortened, and the productivity of the picture tube can be improved.
[0043]
【The invention's effect】
As described in detail above, according to the exposure apparatus of the present invention, a light source such as a television tube exposure apparatus is provided by setting an asymmetrical axis-asymmetrical elliptical mirror with respect to the optical axis as a condensing and reflecting member in the illuminating means. Even if it is necessary to greatly change the horizontal and vertical dimensions of the image, the illuminance of the surface to be exposed can be sufficiently increased, so that the exposure time can be shortened and the productivity of the picture tube can be improved. it can.
[Brief description of the drawings]
FIG. 1A is a horizontal configuration diagram of a main part of an exposure apparatus according to an embodiment of the present invention.
FIG. 2B is a vertical configuration diagram of a main part of the exposure apparatus according to the embodiment of the present invention.
FIG. 2 (a) Combining a vertical direction of an optical integrator with a direction in which the NA of an axially asymmetric elliptical mirror is large to collect light, so that the vertical direction of the output NA from the optical integrator is larger than the horizontal direction. It is a horizontal view for explaining.
(B) To explain that the vertical direction of the optical integrator is combined with the direction in which the NA of the axially asymmetric elliptical mirror is large to condense light, so that the vertical direction of the NA emitted from the optical integrator is larger than the horizontal direction. FIG.
FIG. 3A is a view for explaining that when the emission NA from the optical integrator is largely different between the horizontal direction and the vertical direction, the exposure light beam narrowed by the aperture lens system is also greatly different between the horizontal direction and the vertical direction. FIG.
FIG. 4B is a vertical direction diagram for explaining that when the emission NA from the optical integrator is largely different between the horizontal direction and the vertical direction, the exposure light beam narrowed by the aperture lens system is also greatly different between the horizontal direction and the vertical direction.
FIG. 4A is a cross-sectional view showing an exposure light loss at an aperture of a light source virtual image forming unit in a conventional exposure apparatus.
FIG. 2A is a cross-sectional view illustrating exposure light loss at an aperture of a light source virtual image forming unit in an embodiment of the exposure apparatus of the present invention.
FIG. 5 is a plan view showing an entire conventional exposure apparatus.
6 is a diagram showing a relationship between a cross-sectional view of a parallel light beam obtained by the exposure apparatus shown in FIG. 5 and a light intensity distribution.
FIG. 7 is a configuration diagram showing a main part of the exposure apparatus shown in FIG.
FIG. 8 is a diagram showing a light beam emitted from an optical integrator.
FIG. 9 is a diagram showing a light intensity distribution on a surface to be exposed obtained by integrating light emitted from each point on the light emitting surface from each point on the light emitting surface from the optical integrator.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Ultra-high pressure mercury lamp 2 Axis asymmetrical elliptical mirror 3 Optical integrator 4 Illumination means 6 Image tube 6a Exposure surface 7 Lens system 7a Aperture lens group 7b Projection lens group 10 Outgoing light flux 11, 12, 13, 14 Anamorphic lens 15 Cold mirror 16 Optical fiber 20 Correcting optical means 21 Cylinder lens 22 ΔP lens 23 X-axis filter 24 ΔS lens 25 S correction filter 26 Main filter

Claims (2)

A light source, a condensing and reflecting member that collects light emitted by the light source, an illumination unit having an optical integrator that receives and integrates light passing through the condensing and reflecting member from one end, and emits light from the other end,
The light emitted from the optical integrator is incident, and an aperture lens group that narrows the light to an appropriate size and shape to expose the surface to be exposed, and the light focused by the aperture lens group is applied to the entire surface of the surface to be exposed. A lens system having a projection lens group for projecting,
By the two lens groups, in the virtual image area, a pseudo-refractive characteristic point corresponding to a vertical deflection characteristic of vertically deflecting the electron beam during image projection, and a pseudo-refractive characteristic point corresponding to a horizontal deflection characteristic of horizontally deflecting the electron beam, In an exposure apparatus that provides astigmatism such as having a front-back distance corresponding to an actual vertical deflection point and a horizontal deflection point,
An exposure apparatus, wherein the condensing and reflecting member is an axially asymmetric elliptical mirror that is asymmetric with respect to an optical axis. Before the entrance end of the optical integrator, the direction in which the virtual image shape of the light source viewed from the projection lens group emission unit is elongated is combined with the direction in which the NA of the axially asymmetric elliptical mirror is large, and the virtual image shape of the light source viewed from the projection lens group emission unit 2. The exposure apparatus according to claim 1, wherein the axis asymmetric elliptical mirror, the optical integrator, and the lens system are provided so as to combine a direction in which the NA of the axis asymmetric elliptical mirror is small in a direction in which the length is reduced.

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