JP2004018831A5 - - Google Patents

Download PDF

Info

Publication number
JP2004018831A5
JP2004018831A5 JP2002180375A JP2002180375A JP2004018831A5 JP 2004018831 A5 JP2004018831 A5 JP 2004018831A5 JP 2002180375 A JP2002180375 A JP 2002180375A JP 2002180375 A JP2002180375 A JP 2002180375A JP 2004018831 A5 JP2004018831 A5 JP 2004018831A5
Authority
JP
Japan
Prior art keywords
substituted
producing
group
unsubstituted
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002180375A
Other languages
Japanese (ja)
Other versions
JP4056044B2 (en
JP2004018831A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2002180375A priority Critical patent/JP4056044B2/en
Priority claimed from JP2002180375A external-priority patent/JP4056044B2/en
Publication of JP2004018831A publication Critical patent/JP2004018831A/en
Publication of JP2004018831A5 publication Critical patent/JP2004018831A5/ja
Application granted granted Critical
Publication of JP4056044B2 publication Critical patent/JP4056044B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Claims (7)

下記一般式（Ｉ）で表わされるカルボニル化合物
Figure 2004018831
［一般式（Ｉ）中、Ａ１、Ａ２はそれぞれ置換または無置換の単環または多環式のアリレン基またはヘテロアリレン基を表わす。Ｒ１は水素、置換または無置換のアルキル基、置換または無置換のアリール基を表わす。Ｖは−Ｏ−、−Ｓ−、−ＮＲ２−（Ｒ２は置換または無置換の単環または多環式のアリレン基、もしくは置換または無置換の単環または多環式のヘテロアリレン基を表わす）を表わし、ｎは≧０を表わす］及び、下記一般式（II）で表わされるリン化合物
Figure 2004018831
［一般式（II）中、Ａ３、Ａ４はそれぞれ置換または無置換の単環または多環式のアリレン基またはヘテロアリレン基を表わす。Ｒ３は水素、置換または無置換のアルキルまたはアリールまたはヘテロアリール基を表わす。Ｗは−Ｏ−、−Ｓ−、−ＮＲ４−（Ｒ４は置換または無置換の単環または多環式のアリレン基、もしくは置換または無置換の単環または多環式のヘテロアリレン基を表わす。ｍは≧０を表わす。ＸはＰＯ（ＯＲ５）２（Ｒ５は低級アルキル基）またはＰ（Ｒ６）３ ＋Ｙ―（Ｒ６は置換または無置換のアリール基、もしくは置換または無置換のアルキル基を表わし、Ｙはハロゲン原子を表わす）を表わす］を反応させ、炭素−炭素二重結合を含有する下記一般式（III）
Figure 2004018831
の繰り返し単位をもつ重合体を製造する方法であって、用いる塩基が均一に溶解された溶液であることを特徴とする一般式（III）で表わされる重合体の製造方法。Carbonyl compounds represented by the following general formula (I)
Figure 2004018831
 [In General Formula (I), A 1 and A 2 each represent a substituted or unsubstituted monocyclic or polycyclic arylene group or heteroarylene group. R 1 represents hydrogen, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group. V represents —O—, —S—, —NR 2 — (R 2 represents a substituted or unsubstituted monocyclic or polycyclic arylene group, or a substituted or unsubstituted monocyclic or polycyclic heteroarylene group. And n represents ≧ 0] and a phosphorus compound represented by the following general formula (II)
Figure 2004018831
 [In General Formula (II), A 3 and A 4 each represent a substituted or unsubstituted monocyclic or polycyclic arylene group or heteroarylene group. R 3 represents hydrogen, a substituted or unsubstituted alkyl or aryl or heteroaryl group. W represents —O—, —S—, —NR 4 — (R 4 represents a substituted or unsubstituted monocyclic or polycyclic arylene group, or a substituted or unsubstituted monocyclic or polycyclic heteroarylene group. M represents ≧ 0, X is PO (OR 5 ) 2 (R 5 is a lower alkyl group) or P (R 6 ) 3 + Y − (R 6 is a substituted or unsubstituted aryl group, or substituted or unsubstituted Represents a substituted alkyl group, and Y represents a halogen atom)], and the following general formula (III) containing a carbon-carbon double bond:
Figure 2004018831
 A method for producing a polymer represented by the general formula (III), which is a method for producing a polymer having a repeating unit of: 前記塩基が金属アルコキシドであることを特徴とする、請求項１に記載の重合体の製造方法。 The method for producing a polymer according to claim 1, wherein the base is a metal alkoxide. 前記塩基がアルカリ金属ブトキシドであることを特徴とする、請求項１又は２に記載の重合体の製造方法。 The method for producing a polymer according to claim 1 or 2, wherein the base is alkali metal butoxide. 前記塩基がカリウムブトキシドであることを特徴とする、請求項１乃至３の何れかに記載の重合体の製造方法。 The method for producing a polymer according to any one of claims 1 to 3, wherein the base is potassium butoxide. 前記塩基が均一に溶解した溶液の溶媒がエーテル系溶媒であることを特徴とする、請求項１乃至４の何れかに記載の重合体の製造方法。 The method for producing a polymer according to any one of claims 1 to 4, wherein the solvent of the solution in which the base is uniformly dissolved is an ether solvent. 前記塩基が均一に溶解した溶液の溶媒がテトラヒドロフラン誘導体であることを特徴とする、請求項１乃至５の何れかに記載の重合体の製造方法。 The method for producing a polymer according to any one of claims 1 to 5, wherein the solvent of the solution in which the base is uniformly dissolved is a tetrahydrofuran derivative. 請求項１乃至６の何れかに記載の重合体の製造方法により製造した重合体の薄膜。  A polymer thin film produced by the method for producing a polymer according to claim 1.
JP2002180375A 2002-06-20 2002-06-20 Method for producing polymer and thin film molded body Expired - Fee Related JP4056044B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002180375A JP4056044B2 (en) 2002-06-20 2002-06-20 Method for producing polymer and thin film molded body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002180375A JP4056044B2 (en) 2002-06-20 2002-06-20 Method for producing polymer and thin film molded body

Publications (3)

Publication Number Publication Date
JP2004018831A JP2004018831A (en) 2004-01-22
JP2004018831A5 true JP2004018831A5 (en) 2005-09-02
JP4056044B2 JP4056044B2 (en) 2008-03-05

Family

ID=31177523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002180375A Expired - Fee Related JP4056044B2 (en) 2002-06-20 2002-06-20 Method for producing polymer and thin film molded body

Country Status (1)

Country Link
JP (1) JP4056044B2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101278894B1 (en) * 2001-04-27 2013-06-26 스미또모 가가꾸 가부시키가이샤 Block copolymer and polymeric luminescent element
JP5062945B2 (en) * 2003-06-27 2012-10-31 株式会社リコー Polymer
JP2006228935A (en) * 2005-02-17 2006-08-31 Ricoh Co Ltd Organic thin film transistor
JP4891552B2 (en) * 2005-02-24 2012-03-07 株式会社リコー Organic thin film transistor and manufacturing method thereof
US7598518B2 (en) 2005-03-07 2009-10-06 Ricoh Company, Ltd. Organic transistor with light emission, organic transistor unit and display device incorporating the organic transistor
JP4942943B2 (en) * 2005-03-15 2012-05-30 株式会社リコー Organic semiconductor material, field effect transistor using the same, and manufacturing method thereof
JP2006261507A (en) * 2005-03-18 2006-09-28 Ricoh Co Ltd Organic thin film transistor and display comprising it
JP5063053B2 (en) * 2006-03-09 2012-10-31 株式会社リコー Organic thin film transistor
JP5200637B2 (en) * 2008-04-08 2013-06-05 株式会社リコー Device, organic semiconductor nanofiber, discharge liquid, device manufacturing method and photoreceptor manufacturing method

Similar Documents

Publication Publication Date Title
JP2012149045A5 (en) Benzo [b] naphtho [1,2-d] furan compounds
JP2006512410A5 (en)
JP2004117688A5 (en)
JP2003176417A5 (en)
JP2004018831A5 (en)
JP2001312055A5 (en)
JP2003107710A5 (en)
RU2004126448A (en) METHOD FOR PRODUCING ORGANIC COMPOUNDS
JP2012528811A5 (en)
JP2001233915A5 (en)
JP2003043690A5 (en)
JP2004361629A5 (en)
JP2004126013A5 (en)
JP2004536153A5 (en)
JP2002506844A5 (en)
JP2008247919A5 (en)
JP2001290272A5 (en)
JP2021503522A5 (en)
JP2004053822A5 (en)
JP2004233661A5 (en)
JP4186311B2 (en) Fluorene derivative with oxetane ring
JP2003316007A5 (en)
JP2004517891A5 (en)
JP2002174904A5 (en)
JP2003015297A5 (en)