JP2004006849A5 - - Google Patents
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- Publication number
- JP2004006849A5 JP2004006849A5 JP2003123500A JP2003123500A JP2004006849A5 JP 2004006849 A5 JP2004006849 A5 JP 2004006849A5 JP 2003123500 A JP2003123500 A JP 2003123500A JP 2003123500 A JP2003123500 A JP 2003123500A JP 2004006849 A5 JP2004006849 A5 JP 2004006849A5
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- JP
- Japan
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003123500A JP5122057B2 (en) | 2000-07-24 | 2003-04-28 | Thin film transistor manufacturing method |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000222275 | 2000-07-24 | ||
| JP2000222275 | 2000-07-24 | ||
| JP2000322301 | 2000-10-23 | ||
| JP2000322301 | 2000-10-23 | ||
| JP2003123500A JP5122057B2 (en) | 2000-07-24 | 2003-04-28 | Thin film transistor manufacturing method |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001221823A Division JP3448685B2 (en) | 2000-07-24 | 2001-07-23 | Semiconductor device, liquid crystal display device and EL display device |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004006849A JP2004006849A (en) | 2004-01-08 |
| JP2004006849A5 true JP2004006849A5 (en) | 2008-07-31 |
| JP5122057B2 JP5122057B2 (en) | 2013-01-16 |
Family
ID=30448982
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003123500A Expired - Lifetime JP5122057B2 (en) | 2000-07-24 | 2003-04-28 | Thin film transistor manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5122057B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101347552B1 (en) * | 2011-07-21 | 2014-01-10 | 주식회사 엘지화학 | Mask and apparatus for manufacturing optical filter including the same |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0740542B2 (en) * | 1986-09-25 | 1995-05-01 | 富士通株式会社 | Projection exposure method |
| JPH01116526A (en) * | 1987-10-29 | 1989-05-09 | Toshiba Corp | Manufacture of thin film transistor array for liquid crystal display |
| JPH03250620A (en) * | 1990-02-27 | 1991-11-08 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
| JPH03292721A (en) * | 1990-04-10 | 1991-12-24 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
| JP3180481B2 (en) * | 1992-11-24 | 2001-06-25 | 日新電機株式会社 | Method for forming single crystal silicon layer for thin film transistor |
| JP3339894B2 (en) * | 1992-12-18 | 2002-10-28 | オリンパス光学工業株式会社 | How to make a fine pattern |
| JP3048829B2 (en) * | 1994-03-31 | 2000-06-05 | シャープ株式会社 | Method for manufacturing semiconductor device |
| JP3477969B2 (en) * | 1996-01-12 | 2003-12-10 | セイコーエプソン株式会社 | Active matrix substrate manufacturing method and liquid crystal display device |
| JP3346145B2 (en) * | 1996-01-12 | 2002-11-18 | セイコーエプソン株式会社 | Semiconductor film crystallization method, thin film transistor manufacturing method, active matrix substrate, active matrix substrate manufacturing method, liquid crystal display device, and annealing device |
| JPH1050999A (en) * | 1996-07-30 | 1998-02-20 | Matsushita Electric Works Ltd | Semiconductor device and fabrication thereof |
| JP3090113B2 (en) * | 1998-02-13 | 2000-09-18 | 日本電気株式会社 | Method for manufacturing semiconductor device |
| JP4278013B2 (en) * | 1999-03-19 | 2009-06-10 | シャープ株式会社 | Thin film element manufacturing method |
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2003
- 2003-04-28 JP JP2003123500A patent/JP5122057B2/en not_active Expired - Lifetime