JP2004006283A5 - - Google Patents
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- Publication number
- JP2004006283A5 JP2004006283A5 JP2003087725A JP2003087725A JP2004006283A5 JP 2004006283 A5 JP2004006283 A5 JP 2004006283A5 JP 2003087725 A JP2003087725 A JP 2003087725A JP 2003087725 A JP2003087725 A JP 2003087725A JP 2004006283 A5 JP2004006283 A5 JP 2004006283A5
- Authority
- JP
- Japan
- Prior art keywords
- carbon nanotubes
- plasma
- cathode electrode
- protecting
- anode electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 15
- 239000002041 carbon nanotube Substances 0.000 claims 14
- 229910021393 carbon nanotube Inorganic materials 0.000 claims 14
- 230000005684 electric field Effects 0.000 claims 3
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000002134 carbon nanofiber Substances 0.000 claims 1
- 239000004020 conductor Substances 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 239000011152 fibreglass Substances 0.000 claims 1
- 239000011810 insulating material Substances 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000002048 multi walled nanotube Substances 0.000 claims 1
- 239000002116 nanohorn Substances 0.000 claims 1
- 239000002109 single walled nanotube Substances 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 238000001947 vapour-phase growth Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003087725A JP4076890B2 (ja) | 2003-03-27 | 2003-03-27 | プラズマ生成装置、エッチング装置、スパッタ装置及び成膜装置。 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003087725A JP4076890B2 (ja) | 2003-03-27 | 2003-03-27 | プラズマ生成装置、エッチング装置、スパッタ装置及び成膜装置。 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002087233A Division JP3842159B2 (ja) | 2002-03-26 | 2002-03-26 | ドーピング装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004006283A JP2004006283A (ja) | 2004-01-08 |
| JP2004006283A5 true JP2004006283A5 (enExample) | 2005-09-15 |
| JP4076890B2 JP4076890B2 (ja) | 2008-04-16 |
Family
ID=30437921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003087725A Expired - Fee Related JP4076890B2 (ja) | 2003-03-27 | 2003-03-27 | プラズマ生成装置、エッチング装置、スパッタ装置及び成膜装置。 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4076890B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4784977B2 (ja) * | 2005-09-29 | 2011-10-05 | 国立大学法人名古屋大学 | ラジカル発生装置 |
| KR100760991B1 (ko) | 2006-01-05 | 2007-09-21 | 세메스 주식회사 | 기판 이송 장치 및 이를 구비하는 탄소 나노 튜브 생산 장치 |
| KR100833879B1 (ko) | 2006-12-27 | 2008-06-02 | 세메스 주식회사 | 기판의 이송 방법 및 장치 그리고 이를 포함하는탄소나노튜브의 합성 장치 |
| CN107845559A (zh) * | 2017-12-07 | 2018-03-27 | 上海睿筑环境科技有限公司 | 等离子体发生器电极及其制造方法 |
-
2003
- 2003-03-27 JP JP2003087725A patent/JP4076890B2/ja not_active Expired - Fee Related
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