JP2004004576A5 - - Google Patents

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Publication number
JP2004004576A5
JP2004004576A5 JP2003049203A JP2003049203A JP2004004576A5 JP 2004004576 A5 JP2004004576 A5 JP 2004004576A5 JP 2003049203 A JP2003049203 A JP 2003049203A JP 2003049203 A JP2003049203 A JP 2003049203A JP 2004004576 A5 JP2004004576 A5 JP 2004004576A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2003049203A
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Japanese (ja)
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JP4073337B2 (ja
JP2004004576A (ja
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Priority to JP2003049203A priority Critical patent/JP4073337B2/ja
Priority claimed from JP2003049203A external-priority patent/JP4073337B2/ja
Publication of JP2004004576A publication Critical patent/JP2004004576A/ja
Publication of JP2004004576A5 publication Critical patent/JP2004004576A5/ja
Application granted granted Critical
Publication of JP4073337B2 publication Critical patent/JP4073337B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003049203A 2002-02-26 2003-02-26 感光性樹脂組成物 Expired - Fee Related JP4073337B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003049203A JP4073337B2 (ja) 2002-02-26 2003-02-26 感光性樹脂組成物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002050031 2002-02-26
JP2003049203A JP4073337B2 (ja) 2002-02-26 2003-02-26 感光性樹脂組成物

Publications (3)

Publication Number Publication Date
JP2004004576A JP2004004576A (ja) 2004-01-08
JP2004004576A5 true JP2004004576A5 (cg-RX-API-DMAC7.html) 2005-12-02
JP4073337B2 JP4073337B2 (ja) 2008-04-09

Family

ID=30445731

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003049203A Expired - Fee Related JP4073337B2 (ja) 2002-02-26 2003-02-26 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JP4073337B2 (cg-RX-API-DMAC7.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4079893B2 (ja) * 2004-02-20 2008-04-23 セントラル硝子株式会社 含フッ素環状化合物、含フッ素高分子化合物、それを用いたレジスト材料及びパターン形成方法
JP4551701B2 (ja) * 2004-06-14 2010-09-29 富士フイルム株式会社 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法
JP4551704B2 (ja) * 2004-07-08 2010-09-29 富士フイルム株式会社 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法
JP4551706B2 (ja) * 2004-07-16 2010-09-29 富士フイルム株式会社 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法
WO2010095746A1 (ja) * 2009-02-23 2010-08-26 Jsr株式会社 化合物、フッ素原子含有重合体、及び感放射線性樹脂組成物
JP6225044B2 (ja) * 2014-02-21 2017-11-01 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク

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