JP2003501702A5 - - Google Patents

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Publication number
JP2003501702A5
JP2003501702A5 JP2001502205A JP2001502205A JP2003501702A5 JP 2003501702 A5 JP2003501702 A5 JP 2003501702A5 JP 2001502205 A JP2001502205 A JP 2001502205A JP 2001502205 A JP2001502205 A JP 2001502205A JP 2003501702 A5 JP2003501702 A5 JP 2003501702A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2001502205A
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JP4149704B2 (ja
JP2003501702A (ja
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Priority claimed from US09/507,529 external-priority patent/US6157660A/en
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Publication of JP2003501702A publication Critical patent/JP2003501702A/ja
Publication of JP2003501702A5 publication Critical patent/JP2003501702A5/ja
Application granted granted Critical
Publication of JP4149704B2 publication Critical patent/JP4149704B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2001502205A 1999-06-04 2000-05-02 直交に直線偏光した光ビームを発生させるための装置 Expired - Lifetime JP4149704B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US13768599P 1999-06-04 1999-06-04
US60/137,685 1999-06-04
US09/507,529 2000-02-18
US09/507,529 US6157660A (en) 1999-06-04 2000-02-18 Apparatus for generating linearly-orthogonally polarized light beams
PCT/US2000/011858 WO2000076036A1 (en) 1999-06-04 2000-05-02 Apparatus for generating linearly-orthogonally polarized light beams

Publications (3)

Publication Number Publication Date
JP2003501702A JP2003501702A (ja) 2003-01-14
JP2003501702A5 true JP2003501702A5 (ja) 2006-10-26
JP4149704B2 JP4149704B2 (ja) 2008-09-17

Family

ID=26835495

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001502205A Expired - Lifetime JP4149704B2 (ja) 1999-06-04 2000-05-02 直交に直線偏光した光ビームを発生させるための装置

Country Status (5)

Country Link
US (1) US6157660A (ja)
EP (1) EP1192688B1 (ja)
JP (1) JP4149704B2 (ja)
TW (1) TW469681B (ja)
WO (1) WO2000076036A1 (ja)

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US6778280B2 (en) * 2001-07-06 2004-08-17 Zygo Corporation Interferometry system and method employing an angular difference in propagation between orthogonally polarized input beam components
DE10137155B4 (de) * 2001-07-30 2006-11-30 Leica Microsystems Cms Gmbh Optische Anordnung und Scanmikroskop
US6847455B1 (en) 2002-01-25 2005-01-25 The United States Of America As Represented By The Department Of Energy Heterodyne interferometer with angstrom-level periodic nonlinearity
WO2003069264A2 (en) * 2002-02-12 2003-08-21 Zygo Corporation Characterization and compensation of non-cyclic errors in interferometry systems
WO2004053425A1 (en) * 2002-12-12 2004-06-24 Zygo Corporation In-process correction of stage mirror deformations during a photolithography exposure cycle
US6930819B2 (en) * 2003-05-03 2005-08-16 Acceeze, Inc. Miniaturized external cavity laser (ECL) implemented with acoustic optical tunable filter
US6961129B2 (en) * 2003-05-15 2005-11-01 Agilent Technologies, Inc. Active control of two orthogonal polarizations for heterodyne interferometry
DE102004022654A1 (de) * 2003-05-15 2004-12-23 Agilent Technologies, Inc. (n.d.Ges.d.Staates Delaware), Palo Alto Heterodynstrahl-Bereitstellung mit Aktivsteuerung zweier orthogonaler Polarisierungen
US7286240B2 (en) * 2003-06-19 2007-10-23 Zygo Corporation Compensation for geometric effects of beam misalignments in plane mirror interferometer metrology systems
US7327465B2 (en) * 2003-06-19 2008-02-05 Zygo Corporation Compensation for effects of beam misalignments in interferometer metrology systems
US7379190B2 (en) * 2004-01-05 2008-05-27 Zygo Corporation Stage alignment in lithography tools
US7283248B2 (en) * 2004-01-06 2007-10-16 Zygo Corporation Multi-axis interferometers and methods and systems using multi-axis interferometers
WO2005106383A2 (en) * 2004-04-22 2005-11-10 Zygo Corporation Interferometry systems and methods of using interferometry systems
US7375823B2 (en) * 2004-04-22 2008-05-20 Zygo Corporation Interferometry systems and methods of using interferometry systems
US7489407B2 (en) * 2004-10-06 2009-02-10 Zygo Corporation Error correction in interferometry systems
WO2006102234A2 (en) * 2005-03-18 2006-09-28 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
US7372576B2 (en) * 2005-11-01 2008-05-13 Agilent Technologies, Inc. System and method for generating beams of light using an anisotropic acousto-optic modulator
US7375819B2 (en) * 2005-11-01 2008-05-20 Agilent Technologies, Inc. System and method for generating beams of light using an anisotropic acousto-optic modulator
US7564568B2 (en) * 2006-03-02 2009-07-21 Zygo Corporation Phase shifting interferometry with multiple accumulation
US7697195B2 (en) 2006-05-25 2010-04-13 Zygo Corporation Apparatus for reducing wavefront errors in output beams of acousto-optic devices
JP4635102B2 (ja) * 2007-06-12 2011-02-16 パナソニック株式会社 投写型画像表示装置
US7764415B2 (en) * 2008-04-18 2010-07-27 Buican Tudor N High retardation-amplitude photoelastic modulator
JP5525919B2 (ja) * 2010-05-28 2014-06-18 株式会社東芝 欠陥検査方法および欠陥検査装置
US10615562B2 (en) 2014-03-03 2020-04-07 Pranalytica, Inc. Acousto-optic tuning of lasers
US10230210B2 (en) * 2014-03-03 2019-03-12 Pranalytica, Inc. Acousto-optic tuning of lasers
CN109739028B (zh) * 2019-03-11 2021-08-10 中国电子科技集团公司第二十六研究所 大孔径双色声光可调滤光器

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US5970077A (en) * 1997-04-25 1999-10-19 Zygo Corporation Apparatus for efficiently transforming a single frequency, linearly polarized laser beam into principally two orthogonally polarized beams having different frequencies
US5917844A (en) * 1997-04-25 1999-06-29 Zygo Corporation Apparatus for generating orthogonally polarized beams having different frequencies

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