JP2003342633A - Method for adjusting heating depth in high-frequency induction heating - Google Patents

Method for adjusting heating depth in high-frequency induction heating

Info

Publication number
JP2003342633A
JP2003342633A JP2002154973A JP2002154973A JP2003342633A JP 2003342633 A JP2003342633 A JP 2003342633A JP 2002154973 A JP2002154973 A JP 2002154973A JP 2002154973 A JP2002154973 A JP 2002154973A JP 2003342633 A JP2003342633 A JP 2003342633A
Authority
JP
Japan
Prior art keywords
heating
frequency
heated
depth
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002154973A
Other languages
Japanese (ja)
Inventor
Seiichi Sawatsubashi
精一 沢津橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DKK Co Ltd
Original Assignee
Denki Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kogyo Co Ltd filed Critical Denki Kogyo Co Ltd
Priority to JP2002154973A priority Critical patent/JP2003342633A/en
Publication of JP2003342633A publication Critical patent/JP2003342633A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/25Process efficiency

Abstract

<P>PROBLEM TO BE SOLVED: To arbitrarily adjust a heating depth from the surface of a body to be heated, by simultaneously supplying two high-frequency heating electric powers of low and high frequencies, to one high-frequency heating coil. <P>SOLUTION: This method is to adjust the heating depth from the surface of the body to be heated 2, when induction-heating the body to be heated 2 with a high-frequency power. The method comprises induction-heating the above body to be heated 2 with the high-frequency power, by simultaneously supplying the two high-frequency heating electric powers of the low and high frequencies to the one high-frequency heating coil 3 used for heating the above body 2; and arbitrarily or continuously adjusting the heating depth from the surface of the above body 2, by changing an allotment of one high-frequency power and the other high-frequency power to an arbitrary allotment ratio or allotment proportion, or by independently and arbitrarily changing each heating time by each high-frequency power of the above two powers. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、金属材からなる被
加熱体を高周波誘導加熱するとき、前記被加熱体の表面
からの加熱深さを任意に、又は連続的に調整する方法に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for adjusting the heating depth from the surface of the object to be heated arbitrarily or continuously when the object to be heated made of a metal material is subjected to high frequency induction heating.

【0002】[0002]

【従来の技術】従来、この種の高周波誘導加熱における
加熱深さの調整方法にあっては、1台の高周波加熱コイ
ルにひとつの周波数の高周波電力を供給する誘導加熱方
法であるが、前記被加熱体の表面から、ある加熱深さを
得るためには、その加熱深さに相当する高周波電流浸透
深さとなる周波数を選定する必要があった。図8は、鋼
材のオーステナイト領域における、周波数と高周波電流
浸透深さ(以下、単に浸透深さという)の関係を示す。
2. Description of the Related Art Conventionally, a method of adjusting a heating depth in this type of high frequency induction heating is an induction heating method of supplying high frequency electric power of one frequency to one high frequency heating coil. In order to obtain a certain heating depth from the surface of the heating body, it was necessary to select a frequency that was a high frequency current penetration depth corresponding to the heating depth. FIG. 8 shows the relationship between the frequency and the high-frequency current penetration depth (hereinafter simply referred to as penetration depth) in the austenite region of the steel material.

【0003】図8において、例えば、必要とする加熱深
さが7.0mmの場合は、浸透深さが7.0mm程度の
周波数として5kHzを、必要とする加熱深さが3.5
mmの場合は、浸透深さが3.5mm程度の周波数とし
て20kHzを、また必要とする加熱深さが1.5mm
の場合は、125kHzを、さらに必要とする加熱深さ
が1.0mmの場合は、浸透深さが1.0mm程度の周
波数として200kHzを選定することになる。このた
め、必要な加熱深さに応じて専用の高周波発振機を用意
するか、1台で複数の周波数を切り替えて出力可能な高
周波発振機を使用し、必要な加熱深さに応じた周波数を
選択する方法が通例である。
In FIG. 8, for example, when the required heating depth is 7.0 mm, 5 kHz is set as the frequency at which the penetration depth is 7.0 mm, and the required heating depth is 3.5 mm.
In the case of mm, the penetration depth is about 3.5 mm and the frequency is 20 kHz, and the required heating depth is 1.5 mm.
In this case, 125 kHz is selected, and when the required heating depth is 1.0 mm, 200 kHz is selected as the frequency at which the penetration depth is about 1.0 mm. Therefore, prepare a dedicated high-frequency oscillator according to the required heating depth, or use a high-frequency oscillator that can switch and output multiple frequencies with a single unit, and adjust the frequency according to the required heating depth. The method of selection is customary.

【0004】また、加熱深さを深くする場合には、加熱
時間を延長し、被加熱体内での熱伝導を利用する方法を
とる場合もある。
When the heating depth is increased, the heating time may be extended to utilize heat conduction in the body to be heated.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、前記従
来の技術では、1台の高周波発振機で複数の周波数を切
り替えて出力させる場合、多くても3種類の周波数が限
度であり、得られる加熱深さが段階的になるという問題
点がある。
However, in the above-mentioned conventional technique, when a plurality of frequencies are switched and output by one high-frequency oscillator, at most three kinds of frequencies are limited, and the obtained heating depth is limited. There is a problem that it becomes gradual.

【0006】又は、必要な加熱深さの範囲が広い場合
(例えぱ、7.0mmから1.0mm)は、前記必要な
加熱深さの範囲に対応する周波数帯がかけ離れてしまい
(例えば、5kHzから200kHz)、1台の高周波
発振機で周波数を切り替える構造をとることが困難で、
それぞれの周波数に対して専用の発振機が必要になる
が、発振機の台数分、その設置スペースが必要となり現
実的ではない。
Alternatively, when the required heating depth range is wide (for example, 7.0 mm to 1.0 mm), the frequency bands corresponding to the required heating depth range are far apart (for example, 5 kHz). To 200 kHz), it is difficult to adopt a structure that switches the frequency with one high-frequency oscillator.
A dedicated oscillator is required for each frequency, but the installation space is required for the number of oscillators, which is not realistic.

【0007】また、必要な加熱深さに対して浸透深さの
小さい(浅い)高い周波数で加熱時間を延ばして加熱し
た場合、加熱深さを得ることができても、前記被加熱体
に流れる高周波誘導電流は、該被加熱体の表面に集中す
るため表面近傍は過熱されてしまうという問題点もあ
る。
Further, when heating is performed by extending the heating time at a high frequency with a small penetration depth (shallow depth) with respect to the required heating depth, even if the heating depth can be obtained, it flows to the object to be heated. Since the high frequency induction current is concentrated on the surface of the object to be heated, there is a problem that the vicinity of the surface is overheated.

【0008】他方、必要な加熱深さに対して浸透深さの
大きい(深い)低い周波数で加熱時問を短縮して加熱し
た場合は、被加熱領域が充分に昇温されず、例えば、焼
入の場合は必要硬さが得られないという問題点が生ず
る。
On the other hand, when heating is performed at a low frequency with a large (deep) penetration depth with respect to the required heating depth and the heating time is shortened, the region to be heated is not sufficiently heated, and In the case of inclusion, there is a problem that the required hardness cannot be obtained.

【0009】本発明はかかる点を鑑みなされたもので、
その目的は前記問題点を解消し、使用されるひとつの高
周波加熱コイルに供給する、低い周波数と高い周波数と
の2周波の高周波加熱電力を同時に供給し、又は供給し
ながら、被加熱体の表面からの加熱深さを任意に、又は
連続的に、かつ容易に調整することができる高周波誘導
加熱における加熱深さ調整方法を提案することにある。
The present invention has been made in view of the above points,
The purpose is to solve the above-mentioned problems, and to supply one high-frequency heating coil to be used, simultaneously supplying or supplying two-frequency high-frequency heating power of a low frequency and a high frequency, while the surface of the object to be heated. Another object of the present invention is to propose a heating depth adjusting method in high-frequency induction heating, which can easily and arbitrarily adjust the heating depth from the above.

【0010】本発明の他の目的は、高周波電源設備のコ
ストを低減するとともに、その設置スペースが小さくで
きる高周波誘導加熱における加熱深さ調整方法を提案す
ることにある。
Another object of the present invention is to propose a heating depth adjusting method in high frequency induction heating which can reduce the cost of the high frequency power supply equipment and reduce the installation space.

【0011】[0011]

【課題を解決するための手段】前記目的を達成するため
の本発明の構成は、被加熱体を高周波誘導加熱するに際
し、前記被加熱体の表面からの加熱深さを調整する方法
において、次のようである。
The structure of the present invention for achieving the above-mentioned object is a method for adjusting the heating depth from the surface of the object to be heated when the object to be heated is subjected to high frequency induction heating. Is like.

【0012】前記被加熱体に使用されるひとつの高周波
加熱コイルに、低い周波数と高い周波数との2周波の高
周波加熱電力を同時に供給して前記被加熱体を高周波誘
導加熱するとともに、一方の周波数の高周波電力と他方
の周波数の高周波電力との配分を、任意の配分比又は配
分比率に変えることにより、前記被加熱体の表面からの
加熱深さを任意に、又は連続的に調整する方法である。
[0012] A high-frequency heating power of two frequencies, a low frequency and a high frequency, is simultaneously supplied to one high-frequency heating coil used for the object to be heated for high-frequency induction heating of the object to be heated, and one frequency By changing the distribution of the high frequency power and the high frequency power of the other frequency to an arbitrary distribution ratio or distribution ratio, the heating depth from the surface of the object to be heated can be adjusted arbitrarily or continuously. is there.

【0013】前記被加熱体に使用されるひとつの高周波
加熱コイルに、低い周波数と高い周波数との2周波の高
周波加熱電力を同時に供給して前記被加熱体を高周波誘
導加熱するとともに、前記2周波のそれぞれの高周波電
力による加熱時間をそれぞれ独立して任意に変えること
により、前記被加熱体の表面からの加熱深さを任意に、
又は連続的に調整する方法である。
A high frequency heating power of two frequencies, a low frequency and a high frequency, is simultaneously supplied to one high frequency heating coil used for the object to be heated for high frequency induction heating of the object to be heated, By independently and independently changing the heating time by each high-frequency power, the heating depth from the surface of the heated object is arbitrarily set,
Alternatively, it is a method of continuously adjusting.

【0014】前記被加熱体に使用されるひとつの高周波
加熱コイルに、低い周波数と高い周波数との2周波の高
周波加熱電力を同時に供給して前記被加熱体を高周波誘
導加熱するとともに、一方の周波数の高周波電力と他方
の周波数の高周波電力との配分を、任意の配分比又は配
分比率に変え、かつ前記2周波のそれぞれの高周波電力
による加熱時間をそれぞれ独立して任意に変えることに
より、前記被加熱体の表面からの加熱深さを任意に、又
は連続的に調整する方法である。
A high-frequency heating coil having a low frequency and a high frequency is simultaneously supplied to one high-frequency heating coil used for the object to be heated so that the object to be heated is subjected to high-frequency induction heating. By changing the distribution of the high frequency power of the above and the high frequency power of the other frequency to an arbitrary distribution ratio or distribution ratio, and independently changing the heating time by the high frequency power of each of the two frequencies independently, This is a method of adjusting the heating depth from the surface of the heating body arbitrarily or continuously.

【0015】前記2周波のうち、前記低い周波数が0.
5kHz〜50kHz未満であり、前記高い周波数が5
0kHz〜800kHzである方法である。
Of the two frequencies, the low frequency is 0.
5 kHz to less than 50 kHz, and the high frequency is 5
The method is 0 kHz to 800 kHz.

【0016】前記方法に使用される装置が、前記被加熱
体に使用されるひとつの高周波加熱ゴイルに、低い周波
数と高い周波数の2周波の高周波電力のうち、いずれか
一方の周波数の高周波電力により前記被加熱体を高周波
誘導加熱中、任意の時間、他方の周波数の高周波電力を
前記一方の周波数の高周波電力と同時に供給して、前記
被加熱体を加熱できる装置である方法である。
In the apparatus used in the above method, one high-frequency heating goyle used for the object to be heated is supplied with high-frequency power having either one of low-frequency and high-frequency two-frequency power. The method is an apparatus capable of heating the object to be heated by supplying the high frequency power of the other frequency at the same time as the high frequency power of the one frequency for an arbitrary time during the high frequency induction heating of the object to be heated.

【0017】前記被加熱体に使用されるひとつの高周波
加熱コイルに、低い周波数と高い周波数とを含む3周波
以上の高周波加熱電力を同時に供給して前記被加熱体を
高周波誘導加熱するとともに、前記3周波以上のそれぞ
れの周波数の高周波電力の配分を、任意の配分比又は配
分比率に変えることにより、前記被加熱体の表面からの
加熱深さを任意に、又は連続的に調整する方法である。
A high-frequency heating coil used in the object to be heated is simultaneously supplied with high-frequency heating power of three or more frequencies including a low frequency and a high frequency to heat the object to be heated by high-frequency induction. It is a method of adjusting the heating depth from the surface of the object to be heated arbitrarily or continuously by changing the distribution of the high frequency power of each of the three or more frequencies to an arbitrary distribution ratio or distribution ratio. .

【0018】前記被加熱体に使用されるひとつの高周波
加熱コイルに、低い周波数と高い周波数とを含む3周波
以上の高周波加熱電力を同時に供給して前記被加熱体を
高周波誘導加熱するとともに、前記3周波以上のそれぞ
れの周波数の高周波電力による加熱時間をそれぞれ独立
して任意に変えることにより、前記被加熱体の表面から
の加熱深さを任意に、又は連続的に調整する方法であ
る。
A high-frequency heating power of three or more frequencies including a low frequency and a high frequency is simultaneously supplied to one high-frequency heating coil used for the object to be heated for high-frequency induction heating of the object to be heated, and This is a method of arbitrarily or continuously adjusting the heating depth from the surface of the object to be heated by independently and arbitrarily changing the heating time by the high frequency power of each frequency of 3 frequencies or more.

【0019】前記被加熱体に使用されるひとつの高周波
加熱コイルに、低い周波数と高い周波数とを含む3周波
以上の高周波加熱電力を同時に供給して前記被加熱体を
高周波誘導加熱するとともに、前記3周波以上のそれぞ
れの周波数の高周波電力の配分を、任意の配分比又は配
分比率に変え、かつ前記3周波以上のそれぞれの周波数
の高周波電力による加熱時間をそれぞれ独立して任意に
変えることにより、前記被加熱体の表面からの加熱深さ
を任意に、又は連続的に調整する方法である。
[0019] A high-frequency heating coil used for the object to be heated is simultaneously supplied with high-frequency heating power of three or more frequencies including a low frequency and a high frequency to heat the object to be heated by high-frequency induction. By changing the distribution of the high frequency power of each frequency of 3 frequencies or more into an arbitrary distribution ratio or distribution ratio, and independently changing the heating time by the high frequency power of each frequency of 3 frequencies or more independently, It is a method of adjusting the heating depth from the surface of the object to be heated arbitrarily or continuously.

【0020】本発明の高周波誘導加熱における加熱深さ
調整方法は、以上のように構成されているので、前記2
周波の低い周波数の高周波電力と高い周波数の高周波電
力の配分を、任意の配分比に変えたり、又は前記2周波
のそれぞれの高周波電力による加熱時間をそれぞれ独立
して任意に変えたり、また、本方法に使用される2周波
による高周波加熱装置装置(本出願人により、既に特願
2001−161820号にて提案)により、前記2周
波のうち、低い周波数の加熱電力と高い周波数の加熱電
力のうち、いずれか一方の周波数の加熱電力により前記
被加熱体を高周波加熱中、任意の時間、他方の周波数の
加熱電力を前記一方の周波数の加熱電力と同時に供給、
又は前記一方の周波数の加熱電力に重畳して、前記被加
熱体を高周波誘導加熱を行うことにより、前記被加熱体
表面からの加熱深さを任意に、又は連続的に調整するこ
とができる。
Since the heating depth adjusting method in the high frequency induction heating of the present invention is configured as described above, the above-mentioned 2
The distribution of the high frequency power of the low frequency and the high frequency power of the high frequency can be changed to an arbitrary distribution ratio, or the heating time by the high frequency power of each of the two frequencies can be changed independently and arbitrarily. Of the two frequencies, the low-frequency heating power and the high-frequency heating power of the two-frequency high-frequency heating device apparatus (proposed by the applicant of the present application in Japanese Patent Application No. 2001-161820) are used. While heating the object to be heated by the heating power of either one of the frequencies, the heating power of the other frequency is supplied at the same time as the heating power of the one frequency at any time.
Alternatively, the heating depth from the surface of the object to be heated can be adjusted arbitrarily or continuously by superposing the heating power of one of the frequencies and performing high-frequency induction heating on the object to be heated.

【0021】また、前記被加熱体表面からの加熱深さ
は、前記高い周波数の高周波電流浸透深さと加熱時間の
長さに応じた熱伝導分の深さの和と、前記低い周波数の
高周波電流浸透深さと加熱時間の長さに応じた熱伝導分
との深さの和との範囲内で任意に、又は連続的に変化さ
せ、調整することができる。
The heating depth from the surface of the object to be heated is the sum of the penetration depth of the high frequency high frequency current and the depth of the heat conduction component according to the length of the heating time, and the high frequency current of the low frequency. The permeation depth can be adjusted arbitrarily or continuously within the range of the sum of the depth of the heat conduction component and the depth according to the length of heating time.

【0022】本発明の加熱深さ調整方法は前述のとおり
であるので、高周波誘導加熱を利用する広範な分野に採
用可能で、応用の範囲が広い。特に、前記2周波のうち
高い周波数の加熱電力と低い周波数の加熱電力との配分
や、前記2周波の加熱電力のそれぞれの加熱時間を適宜
調整することで、加熱深さを連続的に変化させ、又は調
整できるので、加熱部分の過熱又は温度不足を伴うこと
なく、必要とする加熱深さを加熱することができる。ま
た、高周波電源として、2周波共用の加熱用高周波発振
機が1台ですむため、設備コストを低く抑えることがで
き、設置スペースも前記発振機1台分ですむというメリ
ットがある。
Since the heating depth adjusting method of the present invention is as described above, it can be applied to a wide range of fields utilizing high frequency induction heating and has a wide range of applications. In particular, the heating depth is continuously changed by appropriately distributing the heating power of the high frequency and the heating power of the low frequency among the two frequencies and appropriately adjusting the heating time of each of the heating power of the two frequencies. Or, since it can be adjusted, the required heating depth can be heated without overheating or insufficient temperature of the heating portion. Further, since only one heating high-frequency oscillator for two frequencies is required as a high-frequency power source, the facility cost can be kept low, and the installation space can be reduced to one oscillator.

【0023】[0023]

【発明の実施の形態】以下、図面に基づいて本発明の好
適な実施の形態を例示的に詳しく説明する。図1は、本
発明の高周波誘導加熱における加熱深さ調整方法の一実
施の形態を示す図で、前記加熱深さ調整方法の実施に用
いられる高周波誘導加熱装置の説明構成図である。
BEST MODE FOR CARRYING OUT THE INVENTION Preferred embodiments of the present invention will now be exemplarily described in detail with reference to the drawings. FIG. 1 is a diagram showing an embodiment of a heating depth adjusting method in high frequency induction heating according to the present invention, and is an explanatory configuration diagram of a high frequency induction heating apparatus used for carrying out the heating depth adjusting method.

【0024】図1において、前記加熱深さ調整方法を行
うために使用される高周波誘導加熱装置1は、金属材、
例えば鋼系材からなる円柱形状の被加熱体2に装着され
るひとつの高周波加熱ゴイル3に対して、2周波高周波
電源としての2周波発振機4から2周波の高周波加熱電
力を供給する。そして前記被加熱体2の外周部をある所
定の焼入温度まで加熱した直後に、図示しない冷却液噴
射部から、加熱された前記外周面に向けて冷却液、例え
ば冷却水を噴射して、前記外周部の高周波焼入を行う。
In FIG. 1, a high frequency induction heating apparatus 1 used for performing the heating depth adjusting method is a metal material,
For example, a two-frequency high-frequency heating power is supplied from a two-frequency oscillator 4 as a two-frequency high-frequency power source to one high-frequency heating goyle 3 mounted on a columnar object 2 made of steel material. Immediately after heating the outer peripheral portion of the object to be heated 2 to a predetermined quenching temperature, a cooling liquid injection unit (not shown) injects a cooling liquid, for example, cooling water toward the heated outer peripheral surface, Induction hardening of the outer peripheral portion is performed.

【0025】前記2周波発振機4は、低い周波数、例え
ば5.5kHzの高周波加熱電力を出力する第1の高周
波電源部11と、前記第1の高周波電源部11から高周
波電力を出力調整するとともに、該高周波電力を出力す
る加熱時間を任意に制御する(オン、オフする)制御部
12と、高い周波数、例えば200kHzの高周波加熱
電力を出力する第2の高周波電源部12と、前記第2の
高周波電源部12から高周波電力を出力調整するととも
に、該高周波電力を出力する加熱時間を任意に制御する
(オン、オフする)制御部22とからなっている。
The two-frequency oscillator 4 adjusts the output of the first high-frequency power supply 11 and the first high-frequency power supply 11 that outputs high-frequency heating power of a low frequency, for example, 5.5 kHz. A control unit 12 that arbitrarily controls (turns on and off) the heating time for outputting the high-frequency power; a second high-frequency power supply unit 12 that outputs high-frequency heating power with a high frequency, for example, 200 kHz; The control unit 22 adjusts the output of the high frequency power from the high frequency power supply unit 12 and arbitrarily controls (turns on and off) the heating time for outputting the high frequency power.

【0026】そして、前記被加熱体2に装着される前記
高周波加熱ゴイル3に対して、前記2周波発振機4の前
記第1の高周波電源部11から出力される前記低いの周
波数の高周波電力と、前記第2の高周波電源部21から
出力される前記高いの周波数の高周波電力との配分を、
それぞれの前記制御部12,22により任意の配分比又
は配分比率(加熱に要する全体高周波電力の、例えば%
による配分)に変えたり、又は、前記2周波のそれぞれ
の高周波電力による加熱時間を、それぞれの前記制御部
21,22により、それぞれ独立して任意に変えること
により、前記被加熱体2の表面からの加熱深さを任意に
調整したり、又は連続的に調整することができる。
Then, with respect to the high-frequency heating goyle 3 mounted on the object to be heated 2, the low-frequency high-frequency power output from the first high-frequency power supply unit 11 of the dual-frequency oscillator 4 is applied. , The distribution of the high frequency high frequency power output from the second high frequency power supply unit 21,
An arbitrary distribution ratio or distribution ratio (for example,% of the total high-frequency power required for heating is controlled by the control units 12 and 22).
Distribution) or by changing the heating time by the high frequency power of each of the two frequencies independently and independently by the control units 21 and 22, respectively, from the surface of the object 2 to be heated. The heating depth of can be arbitrarily adjusted or can be continuously adjusted.

【0027】また、前記高周波加熱ゴイル3に対して、
前記2周波発振機4から出力される前記低いの周波数の
高周波電力と前記高いの周波数の高周波電力との配分
を、それぞれの前記制御部21,22により任意の配分
比又は配分比率に変えるとともに、前記2周波のそれぞ
れの高周波電力による加熱時間を、それぞれの前記制御
部21,22により、それぞれ独立して任意に変えるこ
とにより、前記被加熱体1の表面からの加熱深さを任意
に調整したり、又は連続的に調整することもできる。
Further, with respect to the high frequency heating goyle 3,
While changing the distribution of the low-frequency high-frequency power and the high-frequency high-frequency power output from the dual-frequency oscillator 4 to any distribution ratio or distribution ratio by the control units 21 and 22, respectively, The heating time by the high frequency power of each of the two frequencies is independently and arbitrarily changed by each of the control units 21 and 22 to arbitrarily adjust the heating depth from the surface of the heated body 1. Or, it can be adjusted continuously.

【0028】以下に具体例を示す。前記2周波発振機4
より低い周波数5.5kHzの加熱用高周波電力の出力
と、高い周波数200kHzの加熱用高周波電力の出力
とのそれぞれ配分された出力と、前記それぞれの周波数
における加熱時間とを、前記それぞれの制御部21,2
2により、適宜調整して前記高周波加熱コイル3に供給
し、前記被加熱体2を焼入温度まで加熱する。その直後
に該被加熱体2を冷却水により冷却して、焼入を施工
し、該被加熱体2の表面からの硬化層深さを加熱深さと
した。このとき、鋼材からなる前記被加熱体2の表面か
らの加熱深さとして、約1.0mm〜約7.0mmが得
られた。
Specific examples are shown below. The dual frequency oscillator 4
The respective distributed outputs of the heating high-frequency power having a lower frequency of 5.5 kHz and the heating high-frequency power having a higher frequency of 200 kHz, and the heating time at each of the frequencies are set to the respective control units 21. , 2
2, the material is appropriately adjusted and supplied to the high-frequency heating coil 3, and the object to be heated 2 is heated to the quenching temperature. Immediately after that, the body to be heated 2 was cooled with cooling water and quenched, and the depth of the hardened layer from the surface of the body to be heated 2 was taken as the heating depth. At this time, about 1.0 mm to about 7.0 mm was obtained as the heating depth from the surface of the heated body 2 made of steel.

【0029】本具体例において、前記被加熱体2と前記
2周波発振機4は、下記のとおりである。 金属製被加熱体…材質:S45C焼準品 寸法:直径φ76mm×高さ50mm 2周波発振機 …出力:80kW 周波数:5.5kHz 200kHz
In this specific example, the heated body 2 and the dual-frequency oscillator 4 are as follows. Metal heated object ... Material: S45C Normalized product Dimension: Diameter φ76 mm x Height 50 mm Dual frequency oscillator Output: 80 kW Frequency: 5.5 kHz 200 kHz

【0030】図2は、低い周波数5.5kHzの加熱出
力を80kW(100%)、高い周波数200kHzの
加熱出力を0kW(0%)の配分とし、7.70秒間加
熱したときの焼入硬化層を示す。この時の硬化層深さは
6.8mmである。
FIG. 2 shows that the heating output at a low frequency of 5.5 kHz is 80 kW (100%) and the heating output at a high frequency of 200 kHz is 0 kW (0%), and the quench hardening layer is heated for 7.70 seconds. Indicates. The depth of the hardened layer at this time is 6.8 mm.

【0031】図3は、低い周波数5.5kHzの加熱出
力を40kW(50%)、高い周波数200kHzの加
熱出力を40kW(50%)の配分とし、同時に5.6
0秒間加熱したときの焼入硬化層を示す。この時の硬化
層深さは3.9mmである。
In FIG. 3, the heating output of the low frequency 5.5 kHz is 40 kW (50%), and the heating output of the high frequency 200 kHz is 40 kW (50%), and at the same time 5.6.
The quench hardening layer when heated for 0 seconds is shown. The depth of the hardened layer at this time is 3.9 mm.

【0032】図4は、低い周波数5.5kHzの加熱出
力を0kW(0%)、高い周波数200kHzの加熱出
力を80kW(100%)の配分とし、1.98秒間加
熱したときの焼入硬化層を示す。この時の硬化層深さは
1.2mmである。
FIG. 4 shows that the heating output at a low frequency of 5.5 kHz is 0 kW (0%) and the heating output at a high frequency of 200 kHz is 80 kW (100%), and the quench hardening layer is heated for 1.98 seconds. Indicates. At this time, the depth of the hardened layer is 1.2 mm.

【0033】図5は、図2から図4の結果をグラフ化し
たものである。図8の周波数と高周波電流浸透深さの関
係を示す図と比較すると、本発明による加熱深さ調整方
法によれぱ、周波数5.5kHzから200kHzの範
囲の電流浸透深さ、すなわち前記金属製被加熱体2の表
面からの加熱深さを連続的に任意に調整可能であること
が確認できる。
FIG. 5 is a graph of the results of FIGS. 2 to 4. Compared to the graph of FIG. 8 showing the relationship between the frequency and the high frequency current penetration depth, according to the heating depth adjusting method of the present invention, the current penetration depth in the frequency range of 5.5 kHz to 200 kHz, that is, the metal coating. It can be confirmed that the heating depth from the surface of the heating element 2 can be continuously and arbitrarily adjusted.

【0034】図6は、図5において、加熱時間を7.0
0秒に一定にして、図2〜図4の場合と同様に、前記低
い周波数5.5kHzの加熱出力と高い周波数200k
Hzの加熱出力の配分のみを変化させて、同時に加熱し
た場合における、前記金属製被加熱体2の表面からの加
熱深さの変化を示す図である。このように、2周波のそ
れぞれの加熱高周波出力の配分による加熱深さ調整方法
によれぱ、周波数5.5kHzから200kHzの範囲
の電流浸透深さ、すなわち前記金属製被加熱体2の表面
からの加熱深さを連続的に任意に調整可能であることが
確認できる。
In FIG. 6, the heating time in FIG. 5 is 7.0.
As in the case of FIG. 2 to FIG. 4, the heating output of the low frequency of 5.5 kHz and the high frequency of 200 k are kept constant for 0 seconds.
It is a figure which shows the change of the heating depth from the surface of the said metal-made to-be-heated body 2 at the time of simultaneously heating, changing only the distribution of the heating output of Hz. As described above, according to the heating depth adjusting method by distributing the heating high-frequency outputs of the two frequencies, the current penetration depth in the frequency range of 5.5 kHz to 200 kHz, that is, from the surface of the metal heated body 2 It can be confirmed that the heating depth can be continuously and arbitrarily adjusted.

【0035】以上の実施の形態の2周波としては、前記
低い周波数が0.5kHz〜50kHz未満であり、前
記高い周波数が、50kHz〜800kHzであるが、
特に、前記高い周波数では、50kHz〜400kHz
が好ましく、さらには、50kHz〜300kHzが最
も好ましい。
As the two frequencies in the above embodiment, the low frequency is 0.5 kHz to less than 50 kHz, and the high frequency is 50 kHz to 800 kHz.
Particularly, at the high frequency, 50 kHz to 400 kHz
Is more preferable, and 50 kHz to 300 kHz is most preferable.

【0036】なお、前記実施の形態では、前記被加熱体
2に使用されるひとつの高周波加熱コイル3に、低い周
波数と高い周波数との2周波の高周波加熱電力を同時に
供給する場合を示したが、前記2周波に限らずに、必要
により、前記低い周波数と高い周波数に含めて、3、又
は4,又は5以上の周波の高周波加熱電力を同時に供給
可能であるため、前記3、又は4,又は5以上の周波に
も適用される。この場合、前記被加熱体2を高周波加熱
する高周波発振機4として、3以上の複数の周波の高周
波電力を出力できる発振機を使用するか、又は前記高周
波発振機4に併設して、他の1又は2周波の高周波電力
を出力できる発振機を所要台数使用ればよい。
In the above-mentioned embodiment, the case where two high frequency heating powers of low frequency and high frequency are simultaneously supplied to one high frequency heating coil 3 used for the object to be heated 2 has been described. Not limited to the two frequencies, if necessary, it is possible to simultaneously supply high-frequency heating power of three, four, or five or more frequencies included in the low frequency and the high frequency. Alternatively, it is applied to frequencies of 5 or more. In this case, as the high-frequency oscillator 4 that heats the object to be heated 2 at a high frequency, an oscillator that can output high-frequency power of three or more frequencies is used, or the high-frequency oscillator 4 is provided side by side with another oscillator. A required number of oscillators capable of outputting high frequency power of 1 or 2 frequencies may be used.

【0037】次いで、前記高周波誘導加熱における加熱
深さ調整方法に使用される2周波高周波電源としての2
周波発振機4の一例について、説明する。(この装置に
ついては、本出願人により既に特願2001−1618
20号にて提案されている。) 図7は、前記2周波発振機4の回路図を含む構成図を示
す。
Next, a 2-frequency high-frequency power source used in the heating depth adjusting method in the high-frequency induction heating is used.
An example of the frequency oscillator 4 will be described. (As for this device, the present applicant has already filed Japanese Patent Application No. 2001-1618.
Proposed in No. 20. ) FIG. 7 shows a configuration diagram including a circuit diagram of the dual-frequency oscillator 4.

【0038】図7において、前記高周波誘導加熱装置1
は、前記被加熱体2を、ひとつの高周波加熱コイル3を
使用して、前記2周波発振機4から出力される、周波数
の異なる2周波、例えば、5.5kHzと200kHz
の高周波電力により高周波誘導加熱する装置である。
In FIG. 7, the high frequency induction heating device 1 is used.
Uses one high-frequency heating coil 3 to heat the body 2 to be heated, and outputs two frequencies having different frequencies, for example, 5.5 kHz and 200 kHz.
This is a device for high-frequency induction heating with the high-frequency power of.

【0039】前記2周波発振機4は、前記2周波のう
ち、前記5.5kHzの低い周波数の加熱電力を出力す
る第1の高周波電源部11と、該第1の高周波電源部1
1の出力端子間に並列に接続される共振コンデンサC1
と、前記第1の高周波電源部11からの出力を、前記高
周波加熱コイル3に供給するための第1の変成器T1
と、前記200kHzの高い周波数の加熱電力を出力す
る第2の高周波電源部21と、該第2の高周波電源部2
1からの出力を、直列に接続される共振コンデンサC2
を介して、前記高周波加熱コイル3に供給するための第
2の変成器T2と、前記第1、及び第2の高周波電源部
11,21内にそれぞれ設けられ、前記電源部11,2
1の出力の配分をそれぞれ調整するとともに、それぞれ
の加熱時間を制御する(オン、オフする)制御部12,
22とからなる。
The two-frequency oscillator 4 includes a first high-frequency power supply section 11 for outputting heating power having a low frequency of 5.5 kHz among the two frequencies, and the first high-frequency power supply section 1.
Resonant capacitor C1 connected in parallel between the output terminals of 1
And a first transformer T1 for supplying the output from the first high frequency power supply unit 11 to the high frequency heating coil 3.
A second high frequency power supply section 21 for outputting the high frequency heating power of 200 kHz, and the second high frequency power supply section 2
The output from 1 is the resonance capacitor C2 connected in series.
A second transformer T2 for supplying the high-frequency heating coil 3 via the power supply unit 11 and the second high-frequency power supply units 11 and 21, respectively.
The controller 12 that adjusts the distribution of the output of 1 and controls (turns on and off) each heating time,
And 22.

【0040】また、前記第1の変成器T1と前記高周波
加熱コイル3との間に、前記第2の変成器T2の2次巻
線が直列に接続されるように、接続されるとともに、該
第1の変成器T1の2次側には、前記第2の高周波電源
部21からの高周波成分をバイパスするための高周波バ
イパスコンデンサC3が、並列に接続されている。
Further, the secondary winding of the second transformer T2 is connected between the first transformer T1 and the high frequency heating coil 3 so as to be connected in series, and A high-frequency bypass capacitor C3 for bypassing the high-frequency component from the second high-frequency power supply unit 21 is connected in parallel to the secondary side of the first transformer T1.

【0041】図7の回路の主たる機能は、低い周波数の
前記第1の高周波電源部11からの電力を、高い周波数
の前記第2の高周波電源部21へ漏洩するのを防ぎなが
ら、前記高周波加熱コイル3に加熱電力を供給するとと
もに、高い周波数の前記第2の高周波電源部21がらの
電力を、低い周波数の前記第1の高周波電源部11へ漏
洩するのを防ぎながら、前記高周波加熱コイル3に加熱
電力を供給することにある。
The main function of the circuit of FIG. 7 is to prevent the electric power from the low frequency first high frequency power supply section 11 from leaking to the high frequency second high frequency power supply section 21 while preventing the high frequency heating. The high-frequency heating coil 3 is provided while supplying heating power to the coil 3 and preventing the power from the second high-frequency power supply unit 21 having a high frequency from leaking to the first high-frequency power supply unit 11 having a low frequency. To supply the heating power to.

【0042】前記共振コンデンサC1は、前記第1の高
周波電源部11の出力端子間に並列に接続され、前記第
1の変成器T1、前記高周波加熱コイル3及び被加熱体
2を含めたインダクタンス成分と共振する静電容量値が
選ぱれる。
The resonance capacitor C1 is connected in parallel between the output terminals of the first high frequency power supply section 11 and has an inductance component including the first transformer T1, the high frequency heating coil 3 and the body 2 to be heated. A capacitance value that resonates with is selected.

【0043】前記共振コンデンサC2は、前記第2の高
周波電源部21の出力側から直列に接続され、前記第2
の変成器T2、前記高周波加熱コイル3及び前記被加熱
体2を含めたインダクタンス成分と共振する静電容量値
が選ぱれる。
The resonance capacitor C2 is connected in series from the output side of the second high frequency power supply unit 21, and
The capacitance value that resonates with the inductance component including the transformer T2, the high frequency heating coil 3 and the object to be heated 2 is selected.

【0044】前記高周波バイパスコンデンサC3は、高
い周波数の前記第2の高周波電源部21からの高周波電
流成分を、低い周波数の前記第1の高周波電源部11の
前記共振コンデンサC1に流さないようにバイパスさせ
るもので、該共振コンデンサC1の周波数特性が、高い
周波数で損失が大きい場合に取り付ける。
The high-frequency bypass capacitor C3 bypasses the high-frequency current component from the second high-frequency power supply unit 21 having a high frequency so as not to flow into the resonance capacitor C1 of the first high-frequency power supply unit 11 having a low frequency. The resonant capacitor C1 is attached when the frequency characteristic of the resonant capacitor C1 is large and the loss is large.

【0045】次に前記高周波加熱装置1の作用を説明す
る。前記第1、又は第2の高周波電源部11,21のう
ち、いずれか一方の前記高周波電源部11(又は21、
以下、この段落番号中の記載は、括弧内同順)からの加
熱電力により、前記高周波加熱コイル3を介して、前記
被加熱体2を高周波加熱中、任意の時間、他方の前記高
周波電源部21(又は11)からの加熱電力が、他方の
前記制御部22(又は12)により、前記一方の高周波
電源部11(又は21)から出力される加熱電力と同時
に供給し、又は前記一方の高周波電源部11(又は2
1)から出力される加熱電力に重畳して、該高周波加熱
コイル3を介して、前記被加熱体2を高周波加熱するの
である。
Next, the operation of the high frequency heating device 1 will be described. One of the first or second high-frequency power supply units 11 and 21 is the high-frequency power supply unit 11 (or 21,
Hereinafter, the description in this paragraph number is the same order in the parentheses), during the high-frequency heating of the object 2 to be heated through the high-frequency heating coil 3 through the high-frequency heating coil 3, at any time, the other high-frequency power supply unit The heating power from 21 (or 11) is supplied by the other control unit 22 (or 12) at the same time as the heating power output from the one high frequency power supply unit 11 (or 21), or the one high frequency power. Power supply unit 11 (or 2
1) The heating target 2 is superposed on the heating power output from 1), and the object 2 to be heated is subjected to high frequency heating via the high frequency heating coil 3.

【0046】以上、本発明の一実施の形態について述べ
たが、本発明は、この実施の形態に限定されるものでは
なく、本発明の技術的思想に基づいて各種の変形及び変
更が可能である。
Although one embodiment of the present invention has been described above, the present invention is not limited to this embodiment, and various modifications and changes can be made based on the technical idea of the present invention. is there.

【0047】[0047]

【発明の効果】以上の説明から明らかなように本発明の
高周波誘導加熱における加熱深さ調整方法によれば、被
加熱体に使用されるひとつの高周波加熱コイルに、低い
周波数と高い周波数との2周波の高周波加熱電力を同時
に供給して前記被加熱体を高周波誘導加熱するととも
に、一方の周波数の高周波電力と他方の周波数の高周波
電力との配分を、任意の配分比に変えることにより、前
記被加熱体の表面からの加熱深さを任意に、又は連続的
に調整するので、使用される1台の高周波加熱コイルに
供給する、低い周波数と高い周波数との2周波の高周波
加熱電力を同時に供給し、又は供給しながら、被加熱体
の表面からの加熱深さを広範にわたり、任意に、又は連
続的に、かつ容易に調整することができるとともに、過
熱又は温度不足を伴うことなく、必要加熱深さに加熱す
ることができ作業性をよくすることができるという優れ
た効果を奏する。
As is apparent from the above description, according to the heating depth adjusting method in the high frequency induction heating of the present invention, one high frequency heating coil used for the object to be heated has a low frequency and a high frequency. By simultaneously supplying two-frequency high-frequency heating power to perform high-frequency induction heating on the object to be heated, and changing the distribution of the high-frequency power of one frequency and the high-frequency power of the other frequency to an arbitrary distribution ratio, Since the heating depth from the surface of the object to be heated is adjusted arbitrarily or continuously, high-frequency heating power of two frequencies of low frequency and high frequency supplied to one used high-frequency heating coil at the same time is simultaneously supplied. The heating depth from the surface of the object to be heated can be adjusted over a wide range, arbitrarily or continuously while being supplied or while supplying, and it is possible to prevent overheating or insufficient temperature. It without an excellent effect that it is possible to improve the workability can be heated to the required heating depth.

【0048】また、本発明によれば、高周波誘導加熱用
の高周波電源設備としての高周波発振機が1台ですむた
め、そのコストを低減できるとともに、その設置スペー
スも小さくできる。このため、産業上有益でな方法とい
う優れた効果もあるということができる。
Further, according to the present invention, since only one high-frequency oscillator is required as a high-frequency power supply facility for high-frequency induction heating, the cost can be reduced and the installation space can be reduced. Therefore, it can be said that there is an excellent effect that the method is industrially useful.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の高周波誘導加熱における加熱深さ調整
方法の一実施の形態を示す図で、前記加熱深さ調整方法
の実施に用いられる高周波誘導加熱装置の説明構成図で
ある。
FIG. 1 is a diagram showing an embodiment of a heating depth adjusting method in high frequency induction heating according to the present invention, and is an explanatory configuration diagram of a high frequency induction heating apparatus used for carrying out the heating depth adjusting method.

【図2】低い周波数の加熱出力を100%、高い周波数
の加熱出力を0%としたときの焼入硬化層を示す金属製
被加熱体の断面図である。
FIG. 2 is a cross-sectional view of a metal heating target object showing a quench-hardened layer when a low-frequency heating output is 100% and a high-frequency heating output is 0%.

【図3】低い周波数の加熱出力を50%、高い周波数の
加熱出力を50%としたときの焼入硬化層を示す金属製
被加熱体の断面図である。
FIG. 3 is a cross-sectional view of a metal heating target object showing a quench-hardened layer when a low-frequency heating output is 50% and a high-frequency heating output is 50%.

【図4】低い周波数の加熱出力を0%、高い周波数の加
熱出力を100%としたときの焼入硬化層を示す金属製
被加熱体の断面図である。
FIG. 4 is a cross-sectional view of a metal heated object showing a quench-hardened layer when the low frequency heating output is 0% and the high frequency heating output is 100%.

【図5】低い周波数の加熱出力と高い周波数の加熱出力
の配分と加熱時間の両方を変化させた場合の加熱深さの
変化を示す図である。
FIG. 5 is a diagram showing changes in the heating depth when both the distribution of the low-frequency heating output and the high-frequency heating output and the heating time are changed.

【図6】加熱時間を一定にして、低い周波数の加熱出力
と高い周波数の加熱出力の配分のみを変化させた場合の
加熱深さの変化を示す図である。
FIG. 6 is a diagram showing a change in heating depth when only the distribution of low-frequency heating output and high-frequency heating output is changed while the heating time is kept constant.

【図7】本発明の前記方法に使用される高周波誘導加熱
装置の2周波高周波電源として、2周波の高周波加熱電
力を同時に出力する2周波発振機4の回路図を含む構成
図である。
FIG. 7 is a configuration diagram including a circuit diagram of a two-frequency oscillator 4 that simultaneously outputs two-frequency high-frequency heating power as a two-frequency high-frequency power source of the high-frequency induction heating device used in the method of the present invention.

【図8】鋼材のオーステナイト領域における周波数と高
周波電流浸透深さの関係を示す図である。
FIG. 8 is a diagram showing a relationship between a frequency and a high frequency current penetration depth in an austenite region of a steel material.

【符号の説明】[Explanation of symbols]

1 高周波誘導加熱装置 2 被加熱体 3 高周波加熱コイル 4 2周波発振機(2周波高周波電源) 11 第1の高周波電源部 12,22 制御部 21 第2の高周波電源部 1 High frequency induction heating device 2 heated object 3 high frequency heating coil 4 2 frequency oscillator (2 frequency high frequency power supply) 11 First high frequency power supply 12,22 Control unit 21 Second high frequency power supply section

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 被加熱体を高周波誘導加熱するに際し、
前記被加熱体の表面からの加熱深さを調整する方法にお
いて、 前記被加熱体に使用されるひとつの高周波加熱コイル
に、低い周波数と高い周波数との2周波の高周波加熱電
力を同時に供給して前記被加熱体を高周波誘導加熱する
とともに、一方の周波数の高周波電力と他方の周波数の
高周波電力との配分を、任意の配分比に変えることによ
り、前記被加熱体の表面からの加熱深さを任意に、又は
連続的に調整することを特徴とする高周波誘導加熱にお
ける加熱深さ調整方法。
1. When high-frequency induction heating of an object to be heated,
In the method for adjusting the heating depth from the surface of the object to be heated, high-frequency heating power of two frequencies of low frequency and high frequency is simultaneously supplied to one high-frequency heating coil used for the object to be heated. While heating the object to be heated by high frequency induction, by changing the distribution of the high frequency power of one frequency and the high frequency power of the other frequency to an arbitrary distribution ratio, the heating depth from the surface of the object to be heated is A heating depth adjusting method in high-frequency induction heating, which is adjusted arbitrarily or continuously.
【請求項2】 被加熱体を高周波誘導加熱するに際し、
前記被加熱体の表面からの加熱深さを調整する方法にお
いて、 前記被加熱体に使用されるひとつの高周波加熱コイル
に、低い周波数と高い周波数との2周波の高周波加熱電
力を同時に供給して前記被加熱体を高周波誘導加熱する
とともに、前記2周波のそれぞれの高周波電力による加
熱時間をそれぞれ独立して任意に変えることにより、前
記被加熱体の表面からの加熱深さを任意に、又は連続的
に調整することを特徴とする高周波誘導加熱における加
熱深さ調整方法。
2. When heating an object to be heated by high frequency induction heating,
In the method for adjusting the heating depth from the surface of the object to be heated, high-frequency heating power of two frequencies of low frequency and high frequency is simultaneously supplied to one high-frequency heating coil used for the object to be heated. The heating depth from the surface of the object to be heated is arbitrarily, or continuously, by heating the object to be heated by high frequency induction and independently changing the heating time by the high frequency power of each of the two frequencies. The method for adjusting the heating depth in high-frequency induction heating is characterized in that the heating depth is adjusted.
【請求項3】 被加熱体を高周波誘導加熱するに際し、
前記被加熱体の表面からの加熱深さを調整する方法にお
いて、 前記被加熱体に使用されるひとつの高周波加熱コイル
に、低い周波数と高い周波数との2周波の高周波加熱電
力を同時に供給して前記被加熱体を高周波誘導加熱する
とともに、一方の周波数の高周波電力と他方の周波数の
高周波電力との配分を、任意の配分比に変え、かつ前記
2周波のそれぞれの高周波電力による加熱時間をそれぞ
れ独立して任意に変えることにより、前記被加熱体の表
面からの加熱深さを任意に、又は連続的に調整すること
を特徴とする高周波誘導加熱における加熱深さ調整方
法。
3. When heating the object to be heated by high frequency induction heating,
In the method for adjusting the heating depth from the surface of the object to be heated, high-frequency heating power of two frequencies of low frequency and high frequency is simultaneously supplied to one high-frequency heating coil used for the object to be heated. The object to be heated is subjected to high frequency induction heating, the distribution of the high frequency power of one frequency and the high frequency power of the other frequency is changed to an arbitrary distribution ratio, and the heating time by each high frequency power of the two frequencies is respectively set. A heating depth adjusting method in high frequency induction heating, wherein the heating depth from the surface of the object to be heated is adjusted arbitrarily or continuously by independently changing the heating depth.
【請求項4】 前記2周波のうち、前記低い周波数が
0.5kHz〜50kHz未満であり、前記高い周波数
が50kHz〜800kHzであることを特徴とする請
求項1ないし請求項3のいずれかに記載の高周波誘導加
熱における加熱深さ調整方法。
4. The method according to claim 1, wherein the low frequency is 0.5 kHz to less than 50 kHz and the high frequency is 50 kHz to 800 kHz among the two frequencies. Method for adjusting the heating depth in high frequency induction heating.
【請求項5】 前記方法に使用される装置が、前記被加
熱体に使用されるひとつの高周波加熱ゴイルに、低い周
波数と高い周波数の2周波の高周波電力のうち、いずれ
か一方の周波数の高周波電力により前記被加熱体を高周
波誘導加熱中、任意の時間、他方の周波数の高周波電力
を前記一方の周波数の高周波電力と同時に供給して、前
記被加熱体を加熱できる装置であることを特徴とする請
求項1ないし請求項3のいずれかに記載の高周波誘導加
熱における加熱深さ調整方法。
5. The apparatus used in the method comprises a high-frequency heating goyle used for the object to be heated, a high-frequency power of one of two frequencies of low frequency and high frequency. An apparatus capable of heating the object to be heated by supplying the high frequency power of the other frequency at the same time as the high frequency power of the one frequency during the high frequency induction heating of the object to be heated by the electric power. The heating depth adjusting method in the high frequency induction heating according to any one of claims 1 to 3.
【請求項6】 被加熱体を高周波誘導加熱するに際し、
前記被加熱体の表面からの加熱深さを調整する方法にお
いて、 前記被加熱体に使用されるひとつの高周波加熱コイル
に、低い周波数と高い周波数とを含む3周波以上の高周
波加熱電力を同時に供給して前記被加熱体を高周波誘導
加熱するとともに、前記3周波以上のそれぞれの周波数
の高周波電力の配分を、任意の配分比に変えることによ
り、前記被加熱体の表面からの加熱深さを任意に、又は
連続的に調整することを特徴とする高周波誘導加熱にお
ける加熱深さ調整方法。
6. When heating an object to be heated by high frequency induction heating,
In the method of adjusting the heating depth from the surface of the object to be heated, one high frequency heating coil used for the object to be heated is simultaneously supplied with high-frequency heating power of three or more frequencies including a low frequency and a high frequency. Then, the object to be heated is subjected to high-frequency induction heating, and the distribution of the high-frequency power of each of the three or more frequencies is changed to an arbitrary distribution ratio, whereby the heating depth from the surface of the object to be heated is arbitrarily set. The method for adjusting the heating depth in high-frequency induction heating is characterized by performing continuous or continuous adjustment.
【請求項7】 被加熱体を高周波誘導加熱するに際し、
前記被加熱体の表面からの加熱深さを調整する方法にお
いて、 前記被加熱体に使用されるひとつの高周波加熱コイル
に、低い周波数と高い周波数とを含む3周波以上の高周
波加熱電力を同時に供給して前記被加熱体を高周波誘導
加熱するとともに、前記3周波以上のそれぞれの周波数
の高周波電力による加熱時間をそれぞれ独立して任意に
変えることにより、前記被加熱体の表面からの加熱深さ
を任意に、又は連続的に調整することを特徴とする高周
波誘導加熱における加熱深さ調整方法。
7. When heating an object to be heated by high frequency induction heating,
In the method of adjusting the heating depth from the surface of the object to be heated, one high frequency heating coil used for the object to be heated is simultaneously supplied with high frequency heating power of three or more frequencies including a low frequency and a high frequency. And heating the object to be heated by high frequency induction, and independently changing the heating time by the high frequency power of each of the three or more frequencies, the heating depth from the surface of the object to be heated is changed. A heating depth adjusting method in high-frequency induction heating, which is adjusted arbitrarily or continuously.
【請求項8】 被加熱体を高周波誘導加熱するに際し、
前記被加熱体の表面からの加熱深さを調整する方法にお
いて、 前記被加熱体に使用されるひとつの高周波加熱コイル
に、低い周波数と高い周波数とを含む3周波以上の高周
波加熱電力を同時に供給して前記被加熱体を高周波誘導
加熱するとともに、前記3周波以上のそれぞれの周波数
の高周波電力の配分を、任意の配分比に変え、かつ前記
3周波以上のそれぞれの周波数の高周波電力による加熱
時間をそれぞれ独立して任意に変えることにより、前記
被加熱体の表面からの加熱深さを任意に、又は連続的に
調整することを特徴とする高周波誘導加熱における加熱
深さ調整方法。
8. When the object to be heated is subjected to high frequency induction heating,
In the method of adjusting the heating depth from the surface of the object to be heated, one high frequency heating coil used for the object to be heated is simultaneously supplied with high-frequency heating power of three or more frequencies including a low frequency and a high frequency. Then, the object to be heated is subjected to high-frequency induction heating, and the distribution of the high-frequency power of each of the three or more frequencies is changed to an arbitrary distribution ratio, and the heating time by the high-frequency power of each of the three or more frequencies is used. The heating depth adjustment method in high-frequency induction heating is characterized in that the heating depth from the surface of the object to be heated is adjusted arbitrarily or continuously by independently changing the above.
JP2002154973A 2002-05-29 2002-05-29 Method for adjusting heating depth in high-frequency induction heating Pending JP2003342633A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
JP2003342633A true JP2003342633A (en) 2003-12-03

Family

ID=29771601

Family Applications (1)

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Country Link
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JP2006045636A (en) * 2004-08-06 2006-02-16 Denki Kogyo Co Ltd Successive hardening and tempering method with high frequency direct electric-conductive hardening apparatus
JP2006344386A (en) * 2005-06-07 2006-12-21 High Frequency Heattreat Co Ltd Induction heating device, induction heating method, and heating device
JP2008519401A (en) * 2004-10-30 2008-06-05 インダクトサーム・コーポレイション Scan induction heating
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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005323485A (en) * 2004-04-09 2005-11-17 High Frequency Heattreat Co Ltd Power supplying device
JP4541049B2 (en) * 2004-04-09 2010-09-08 高周波熱錬株式会社 Power supply
JP2006034061A (en) * 2004-07-21 2006-02-02 High Frequency Heattreat Co Ltd Power supply device
JP4577760B2 (en) * 2004-07-21 2010-11-10 高周波熱錬株式会社 Power supply
JP2006045636A (en) * 2004-08-06 2006-02-16 Denki Kogyo Co Ltd Successive hardening and tempering method with high frequency direct electric-conductive hardening apparatus
JP4551154B2 (en) * 2004-08-06 2010-09-22 電気興業株式会社 Continuous quenching and tempering method using high frequency direct current quenching equipment
JP2008519401A (en) * 2004-10-30 2008-06-05 インダクトサーム・コーポレイション Scan induction heating
JP2006344386A (en) * 2005-06-07 2006-12-21 High Frequency Heattreat Co Ltd Induction heating device, induction heating method, and heating device
JP4700416B2 (en) * 2005-06-07 2011-06-15 高周波熱錬株式会社 Induction heating apparatus, method thereof, and heating apparatus
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