JP2003322849A - Display device and method for manufacturing the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To reduce the number of manufacturing steps for forming a scattering and reflecting means for scattering and reflecting external light in a reflection type liquid crystal display device. <P>SOLUTION: A supporting layer 26 consisting of resin and having a flat surface is provided on the inner surface of the rear surface side substrate 23 of a liquid crystal cell 21. A number of particles 27 consisting of silica, resin and the like are buried in the supporting layer 26 so that a part of each particle is protruded from the surface of the supporting layer 26. The surface of the supporting layer 26 including the particles 27 is a rugged surface. A scattering and reflecting layer 28 having a rugged surface following the rugged surface of the supporting layer is provided on the rugged surface of the supporting layer. The scattering and reflecting means can be easily formed only by applying a resin layer for forming the supporting layer 26 on the inner surface of the rear surface side substrate 23, scattering a number of the particles 27 thereon, curing the resin layer to form the supporting layer and forming the scattering and reflecting layer 28 by a sputtering method or the like. Thus, the number of the manufacturing steps can be reduced. <P>COPYRIGHT: (C)2004,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a display device such as a liquid crystal display device and a manufacturing method thereof.

[0002]

2. Description of the Related Art FIG. 12 is a partial sectional view of an example of a conventional reflection type liquid crystal display device. This liquid crystal display device includes a simple matrix type liquid crystal cell 1. The liquid crystal cell 1 includes a display surface side substrate 2 and a back side substrate 3 which are made of a glass substrate, a film substrate or the like. A signal electrode 4 and an alignment film 5 are provided on the inner surface of the display surface side substrate 2.

On the inner surface of the rear substrate 3, there is provided a support layer 6 made of a photosensitive resin whose surface is made uneven by a photolithography method. On the support layer 6, a scattering reflection layer 7 made of aluminum or the like having an uneven surface that follows the uneven surface of the support layer 6 is provided. A flattening film 8, a scanning electrode 9 and an alignment film 10 are provided on the scattering reflection layer 7.

The display surface side substrate 2 and the back surface side substrate 3 are attached to each other with a substantially rectangular frame-shaped sealing material (not shown) interposed therebetween, and the alignment films 5 of the two substrates 2 and 3 inside the sealing material, A liquid crystal 11 is enclosed between the ten. The retardation plate 12 is attached to the outer surface of the display surface side substrate 2 via an adhesive layer (not shown), and the polarizing plate 13 is attached to the outer surface thereof via an adhesive layer (not shown). Has been.

In this liquid crystal display device, the polarizing plate 1
External light incident from the outer surface side of the polarizing plate 3 and the liquid crystal 11
Etc. are transmitted and are scattered and reflected by the scattering reflection layer 7, and this scattered reflection light is transmitted through the liquid crystal 11, the polarizing plate 13, etc., and the polarizing plate 1
3 is scattered and emitted to the outer surface side to display. In this case, external light is scattered and reflected by the scattering reflection layer 7 in order to prevent specular reflection and obtain a paper white color having excellent visibility.

[0006]

However, in the above-mentioned conventional liquid crystal display device, in order to obtain the scattering reflection layer 7 having an uneven surface, the inner surface of the rear substrate 3 is made of a photosensitive resin having an uneven surface. Since the supporting layer 6 is formed by a photolithography method, that is, a photosensitive resin layer for forming the supporting layer 6 is applied to the inner surface of the back substrate 3 and a resist pattern is formed on the photosensitive resin layer to expose it. , Development is carried out, the resist pattern is then peeled off, and the remaining photosensitive resin layer is baked and cured, thereby forming the supporting layer 6 having a roughened surface, so that there are many manufacturing steps. There was a problem. Therefore, it is an object of the present invention to provide a display device and a manufacturing method thereof, which can reduce the number of manufacturing steps for forming a scattering / reflecting means for scattering and reflecting external light.

[0007]

A display device according to a first aspect of the present invention includes a display cell having a display surface side substrate and a rear surface side substrate, and a support layer provided on an inner surface of the rear surface side substrate. A large number of particles, each part of which is embedded in the supporting layer so as to protrude from the surface of the supporting layer, and provided on the supporting layer containing the particles, and follow the uneven surface of the supporting layer containing the particles. It is characterized in that it has a reflecting surface formed on the uneven surface and has a scattering reflection layer having both a light reflecting function and a light scattering function. A display device according to a second aspect of the present invention is the display device according to the first aspect, wherein a pixel electrode is provided on the scattering reflection layer via an insulating film. A display device according to a third aspect of the present invention is the display device according to the first aspect, wherein the scattering reflection layer also serves as a pixel electrode. A display device according to a fourth aspect of the present invention is the display device according to any one of the first to third aspects, wherein the scattering reflection layer is a scattering semi-transmission reflection layer that transmits a part of incident light. It is what The display device according to the invention of claim 5 is a display cell having a display surface side substrate and a back surface side substrate, a reflective layer provided on the inner surface of the back side substrate, and a support provided on the reflective layer. A layer and a large number of particles, each part of which is embedded in the support layer so as to protrude from the surface of the support layer, and a large number of particles having a light refractive index different from that of the support layer. It is a thing. The display device according to the invention described in claim 6 is the display device according to claim 5.
In the invention described in above, a pixel electrode is provided on the support layer containing the particles. The display device according to the invention described in claim 7 is the display device according to claim 5.
In the invention described in (3), the reflective layer also serves as a pixel electrode. An eighth aspect of the present invention is the display device according to any one of the fifth to seventh aspects, wherein the reflective layer is a semi-transmissive reflective layer that transmits a part of incident light. It is a thing. According to a ninth aspect of the present invention, in the display device according to any one of the first to eighth aspects, the particle size of the particles is larger than the thickness of the support layer.
A display device according to a tenth aspect of the present invention is the display device according to the ninth aspect, characterized in that the particle diameters of the particles are substantially the same. An eleventh aspect of the invention is a display device according to the ninth aspect, characterized in that the particles are composed of a plurality of types of particles having different particle sizes. A display device according to a twelfth aspect of the present invention is the display device according to any one of the ninth to eleventh aspects, wherein the particles are arranged at predetermined positions. A method of manufacturing a display device according to claim 13, wherein a display cell having a display surface side substrate and a back surface side substrate, a support layer provided on an inner surface of the back surface side substrate, and one each of the support layers are provided. A large number of particles embedded so as to project from the surface of the support layer, and provided on the support layer containing the particles, formed on the uneven surface that follows the uneven surface of the support layer containing the particles. A method of manufacturing a display device having a reflective surface and a scattering reflection layer having both a light reflection function and a light scattering function, the method for forming the support layer on the inner surface of the rear substrate. Forming a resin layer, spraying the large number of particles on the resin layer, curing the resin layer to form the support layer, and forming the scattering reflection layer on the support layer containing the particles. It is characterized by. A method of manufacturing a display device according to claim 14, wherein a display cell having a display surface side substrate and a back surface side substrate, a reflective layer provided on an inner surface of the back surface side substrate, and a reflective layer provided on the reflective layer are provided. And a large number of particles, each part of which is embedded in the support layer so as to protrude from the surface of the support layer, and a large number of particles having a light refractive index different from that of the support layer. In the manufacturing method of the above, the reflection layer is formed on the inner surface of the back side substrate, a resin layer for forming the support layer is formed on the reflection layer, and the large number of particles are formed on the resin layer. It is characterized by spraying and curing the resin layer to form the support layer. According to a fifteenth aspect of the present invention, in the display device manufacturing method according to the thirteenth or fourteenth aspect, the particle size of the particles is larger than the thickness of the support layer. A display device manufacturing method according to a sixteenth aspect of the present invention is characterized in that, in the fifteenth aspect of the invention, the particle diameters of the particles are substantially the same. According to a seventeenth aspect of the present invention, in the method for manufacturing a display device according to the sixteenth aspect, the particles are dispersed at predetermined positions on the resin layer by using a particle-dispersing hard mask having openings. It is characterized by doing. Claim 1
The method for manufacturing a display device according to the invention described in claim 8,
In the invention described in 5, the particles are composed of plural kinds of particles having different particle sizes. According to a nineteenth aspect of the present invention, in the method of manufacturing a display device according to the eighteenth aspect, the plurality of types of particles are different in particle size by using a particle-dispersing hard mask having openings. It is characterized by being sprayed at each predetermined position on the resin layer. Then, according to the invention described in claim 1 and claim 13, when a large number of particles are dispersed on the resin layer formed on the inner surface of the rear substrate to cure the resin layer, a large number of particles are formed in the support layer. Is formed so that each part thereof protrudes from the surface of the support layer,
Since a reflective layer is laminated on it to form a scattering reflective layer,
The number of manufacturing steps can be reduced as compared with the case of using the conventional photolithography method. Further, according to the invention described in claim 5 and claim 14, when a large number of particles are dispersed on the resin layer formed on the reflective layer formed on the inner surface of the rear substrate to cure the resin layer. , A large number of particles are embedded in the supporting layer so that each part of the particles protrudes from the surface of the supporting layer, and the optical refractive index of the supporting layer and the optical refractive index of the particles are different from each other. Since the light-scattering function is exhibited in the supporting layer portion including the layer and the light-reflecting function is exhibited in the reflective layer, the number of manufacturing steps can be reduced as compared with the case of the conventional photolithography method.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a sectional view of the essential parts of a reflection type liquid crystal display device as a first embodiment of the present invention. This liquid crystal display device includes a simple matrix type liquid crystal cell (display cell) 21. The liquid crystal cell 21 includes a display surface side substrate 22 and a back side substrate 23, which are made of a glass substrate, a film substrate, or the like. A signal electrode 24 and an alignment film 25 are provided on the inner surface of the display surface side substrate 22.

A support layer 26 made of a photosensitive resin or a thermosetting resin and having a flat surface is provided on the inner surface of the rear substrate 23. In the support layer 26, a large number of particles 27 made of silica, resin or the like having a predetermined particle size are partially contained in the support layer 2.
It is embedded so as to project from the surface of 6. Therefore, the surface of the support layer 26 containing the particles 27 is uneven. On this uneven surface, a scattering reflection layer 28 made of aluminum, silver, or the like having an uneven surface that follows the uneven surface is provided. A flattening film 29, a scanning electrode (pixel electrode) 30, and an alignment film 31 are provided on the scattering reflection layer 28.

The display side substrate 22 and the back side substrate 2
3 is bonded to each other via a sealing material (not shown) having a substantially rectangular frame shape, and both substrates 22 and 23 inside the sealing material are attached.
A liquid crystal 32 is sealed between the alignment films 25 and 31 of the above.
A retardation plate 33 is attached to the outer surface of the display surface side substrate 22 via an adhesive layer (not shown), and a polarizing plate 34 is attached to the outer surface thereof via an adhesive layer (not shown). Has been.

In this liquid crystal display device, the polarizing plate 3
The external light incident from the outer surface side of the polarizing plate 34 and the liquid crystal 32
Etc. are transmitted and are scattered and reflected by the scattering reflection layer 28, and this scattered reflection light is transmitted through the liquid crystal 32, the polarizing plate 34, etc. and scattered and emitted to the outer surface side of the polarizing plate 34, thereby displaying.
Also in this case, external light is scattered and reflected by the scattering reflection layer 28 in order to prevent specular reflection and obtain a paper white color excellent in visibility.

Next, a method of manufacturing a part of this liquid crystal display device, that is, a method of forming the scattering reflection layer 28 will be described with reference to FIG. First, as shown in FIG. 2A, a resin layer 26a made of a photosensitive resin or a thermosetting resin for forming the support layer 26 is formed on the upper surface of the rear substrate 23 by a spin coating method, a printing method, or the like. The coating is applied so that the surface becomes flat.

Next, as shown in FIG. 2B, the resin layer 2
A large number of particles 27 made of silica, resin or the like having a predetermined particle size are dispersed on 6a by a method similar to the spacer dispersion method (wet method or dry method). In this case, since the resin layer 26a is uncured and soft, the dispersed particles 27 are not dispersed in the resin layer 26a.
It is properly buried inside.

Here, if the particle diameter of the particles 27 is set to be larger than the thickness of the resin layer 26a, the particles 27 will be dispersed in the resin layer 26a.
Even if it is buried maximally inside, a part of the particles 27 remains in the resin layer 26.
projected from the surface of a. So in this state,
The surface of the resin layer 26a containing the particles 27 becomes uneven. Next, the resin layer 26a is cured by ultraviolet irradiation or heat treatment to form the support layer 26.

Next, as shown in FIG.
A scattering reflection layer 28 is formed by depositing a reflection layer made of aluminum, silver, or the like on the resin layer 26a containing P by a sputtering method, a vacuum deposition method, or the like. In this case, the scattering reflection layer 28
Since the film thickness of is relatively thin at about 1000-1500Å,
The scattering reflection layer 28 is formed along the uneven surface of the support layer 26 containing the particles 27, and the surface thereof has an uneven surface having substantially the same size as that of the uneven surface of the support layer 26 containing the particles 27. Become. Then, on the scattering reflection layer 28,
As shown in FIG. 1, the flattening film 29, the scanning electrodes 30, and the alignment film 31 are formed.

As described above, in the method of forming the scattering / reflecting layer, the resin layer 26a is formed by a spin coating method or a printing method, the particles 27 are dispersed, the support layer 26 is formed by curing the resin layer 26a, the sputtering method or the like. Since the scattering reflection layer 28 having an uneven surface can be formed by forming the reflection layer by the vacuum deposition method or the like, it is possible to form the scattering reflection layer 7 on the support layer 6 formed by the conventional photolithography method. By comparison, the number of manufacturing steps can be reduced.

Further, in the conventional case, since the support layer 6 is formed by the photolithography method, the resin for forming the support layer 6 is limited to photosensitivity. In the case of this embodiment, the photosensitivity is Besides, since it may be thermosetting, it is possible to increase the choice of resins for forming the support layer 26.

Next, FIG. 3 is a sectional view of the main part of a liquid crystal display device as a second embodiment of the present invention.
In this liquid crystal display device, a reflective layer 35 made of aluminum, silver, or the like is formed on the inner surface of the rear substrate 23 by a sputtering method or a vacuum evaporation method. On the reflective layer 35,
By the same method as in the case of the first embodiment, the support layer 2
6 and particles 27 are formed. Therefore, also in this case, the surface of the support layer 26 containing the particles 27 is uneven.

In this case, however, the support layer 26 is made of transparent resin, and the particles 27 are also made of transparent silica or resin. Further, the optical refractive index of the support layer 26 and the optical refractive index of the particles 27 are different. Then, the flattening film 29 and the scanning electrode 3 are formed on the support layer 26 including the particles 27.
0 and the alignment film 31 are formed.

In this case, since the reflection layer 35 provided on the inner surface of the back substrate 23 is flat, it literally has only a light reflection function. However, since the optical refractive index of the support layer 26 and the optical refractive index of the particles 27 are different,
The light-scattering function is exhibited in the portion of the support layer 26 containing the particles 27. Therefore, as a whole, external light can be scattered and reflected.

Further, in this case, the reflective layer 35 is formed by a sputtering method or a vacuum deposition method, a resin layer is formed by a spin coating method or a printing method, particles 27 are dispersed, and the support layer 26 is formed by curing the resin layer. The formation of
Since a scattering / reflecting means for scattering / reflecting external light can be formed, the number of manufacturing steps can be reduced as compared with the case where the scattering / reflecting layer 7 is formed on the support layer 6 formed by the conventional photolithography method. Can be reduced. Also,
A desired light scattering function can be obtained by appropriately selecting each material of the support layer 26 and the particles 27 and each light refractive index thereof.

In the first and second embodiments described above, FIG.
3 and FIG. 3, the case where the scattering reflection layer 28 and the reflection layer 35 are provided separately from the scanning electrode 30 has been described, but the present invention is not limited to this. For example, the flattening film 29 and the scanning electrode 30 shown in FIG. 1 are omitted, the scattering reflection layer 28 shown in FIG. 1 is patterned, and the particles 27 are included as in the third embodiment of the present invention shown in FIG. The scanning electrode 30A having a light scattering reflection function may be formed on the uneven surface of the support layer 27. In this case, it is substantially unnecessary to form the scattering reflection layer 28 and the flattening film 29 shown in FIG. 1, and the number of manufacturing steps can be reduced accordingly.

Further, the flattening film 29 and the scanning electrode 30 shown in FIG. 3 are omitted, and the reflection layer 35 shown in FIG. 3 is patterned to obtain the pattern as in the fourth embodiment of the present invention shown in FIG.
The scanning electrodes 30B having a light reflecting function may be formed on the inner surface of the rear substrate 23. In this case, it is substantially unnecessary to form the reflection layer 35 and the planarization film 29 shown in FIG. 3, and the number of manufacturing steps can be reduced accordingly.

In each of the above embodiments, the case where the particles 27 having substantially the same particle size are used has been described, but the present invention is not limited to this. For example, instead of the particles 27 shown in FIG. 1, a plurality of kinds of particles 27a, 27b, 27c having a plurality of different particle sizes, for example, may be used as in the fifth embodiment of the present invention shown in FIG. Good. However, also in this case, even the smallest particle 27c having a particle diameter larger than the thickness of the support layer 26 is used. Then, in this case, three types of particles 27a,
Since the unevenness of the surface of the support layer 26 including 27b and 27c is not uniform, it is possible to obtain an anisotropic light scattering reflection function.

By the way, three kinds of particles 27a, 27b,
When 27c is sprayed at once, three types of particles 27a, 27
Since the scattering positions of b and 27c vary, the unevenness of the surface of the support layer 26 including the three types of particles 27a, 27b and 27c varies from product to product, and the light scattering reflection function has anisotropy for each product. Will vary. Therefore, next, a method by which the three types of particles 27a, 27b, and 27c can be surely dispersed at each predetermined position will be described.

As an example, first, as shown in FIG. 7A, a resin layer 2 made of a photosensitive resin or a thermosetting resin for forming the support layer 26 on the upper surface of the rear substrate 23.
6a is applied by spin coating or printing. Next, a particle-dispersing hard mask 42 having a plurality of openings 41a corresponding to the large-diameter particles 27a at a first predetermined position.
By using a, a large number of large-diameter particles 27a are scattered on the first predetermined position on the resin layer 26a. In this case, the opening 41
a may be a circle, a square, a slit, or the like.

Next, as shown in FIG. 7B, a particle-dispersing hard mask 42b having a plurality of openings 41b corresponding to medium-diameter particles 27b at a second predetermined position is used.
A large number of medium-sized particles 27b are scattered on the second predetermined position on the resin layer 26a. Also in this case, the opening 41b may be circular, square, slit, or the like.

Next, as shown in FIG. 7C, a particle-dispersing hard mask 42c having a plurality of openings 41c corresponding to the small-diameter particles 27c at a third predetermined position is used.
A large number of small-diameter particles 27c are scattered on the third predetermined position on the resin layer 26a. Also in this case, the opening 41c may be circular, square, slit, or the like. Thus, the three types of particles 27a, 27b and 27c are applied to the resin layer 2
It is possible to surely spray at each predetermined position on 6a.

Next, as another example of particle dispersion, a schematic description will be given. As shown in FIG. 8A, for particle dispersion having a plurality of slits 43 formed in parallel at regular intervals. A hard mask 44 is prepared. In this case, the width of the slit 43 is somewhat larger than the particle diameter of the large diameter particle 27a. Then, first, the particle-dispersing hard mask 44 is arranged at a predetermined position on the resin layer 26a, and then, as shown in FIG.
As shown in (B), a large number of large-diameter particles 27a are dispersed at a first predetermined position on the resin layer 26a.

Next, the particle-dispersing hard mask 44 is arranged on the resin layer 26a at a position moved to the right side in FIG. 8 (B) by a predetermined distance, and as shown in FIG. 8 (B).
A large number of medium-sized particles 27b are scattered on the second predetermined position on the resin layer 26a. Next, a particle-dispersion hard mask 44.
8B is arranged on the resin layer 26a at a position further moved to the right side in FIG. 8B by a predetermined distance, and as shown in FIG. 8B, a large number of small particles 27c are formed on the resin layer 26a. Spray on the third predetermined position. Thus, the three types of particles 27a, 27b, and 27c can be reliably sprayed to each predetermined position on the resin layer 26a.

In each of the above embodiments, the case where the present invention is applied to a simple matrix type liquid crystal display device has been described, but the present invention is not limited to this. For example,
As in the sixth embodiment of the present invention shown in FIG. 9, it can be applied to an active matrix type liquid crystal display device. Next, the active matrix type liquid crystal display device will be described.

This liquid crystal display device is provided with an active matrix type liquid crystal cell (display cell) 51. The liquid crystal cell 51 includes a display surface side substrate 52 and a rear surface side substrate 53 which are formed of a glass substrate, a film substrate or the like. A common electrode 54 and an alignment film 55 are provided on the inner surface of the display surface side substrate 52.

A support layer 56 made of a photosensitive resin or a thermosetting resin and having a flat surface is provided on the inner surface of the rear substrate 53. In the support layer 56, a large number of particles 57 made of silica, resin or the like having a predetermined particle size are partially formed in the support layer 5.
It is embedded so as to project from the surface of 6. Particle 57
On the uneven surface of the support layer 56 including, the scattering reflection layer 58 having an uneven surface that follows the uneven surface is provided. A flattening film 59, a thin film transistor 60, an insulating film 61, a pixel electrode 62, and an alignment film 63 are provided on the scattering reflection layer 58. In this case, the pixel electrode 63 is I
It is made of a transparent conductive film such as TO and is connected to the thin film transistor 60 through a contact hole formed in the insulating film 61.

The display-side substrate 52 and the back-side substrate 5
3 is attached via a substantially rectangular frame-shaped sealing material (not shown), and both substrates 52, 53 inside the sealing material.
A liquid crystal 64 is sealed between the alignment films 55 and 63.
A retardation plate 65 is attached to the outer surface of the display surface side substrate 52 via an adhesive layer (not shown), and a polarizing plate 66 is attached to the outer surface thereof via an adhesive layer (not shown). Has been.

In this liquid crystal display device, the polarizing plate 6
External light incident from the outer surface side of the polarizing plate 66, the liquid crystal 6
4, the pixel electrode 62 and the like are transmitted and scattered and reflected by the scattering reflection layer 58, and the scattered reflection light is reflected by the pixel electrode 62, the liquid crystal 64,
The light is transmitted through the polarizing plate 66 or the like and scattered and emitted to the outer surface side of the polarizing plate 66, thereby displaying.

As in the seventh embodiment of the present invention shown in FIG. 10, the thin film transistor 60, the insulating film 61, the support layer 56, the particles 57, and the pixel electrode 62 which also serves as a scattering reflection layer are formed on the inner surface of the rear substrate 53. Alternatively, the alignment film 63 may be provided. In this case, the pixel electrode 62 is connected to the thin film transistor 60 via a contact hole formed in the support layer 56 and the insulating film 61. Also, particles 5
7 is arranged at a position avoiding the contact hole.

Further, as in the eighth embodiment of the present invention shown in FIG. 11, the thin film transistor 60, the insulating film 61, the pixel electrode 62 also serving as a reflective layer, the support layer 56, the particles 57 and the inner surface of the rear substrate 53 are formed. The alignment film 63 may be provided. In this case, the pixel electrode 62 has the thin film transistor 60 through the contact hole formed in the insulating film 61.
It is connected to the.

Furthermore, in each of the above-described embodiments, the case where the present invention is applied to the reflection type liquid crystal display device has been described, but the present invention is not limited to this and can be applied to a semi-transmissive reflection type liquid crystal display device. That is, a structure having a necessary light scattering reflection function (or reflection function) and a light transmission function by reducing the thickness of the scattering reflection layer (or the reflection layer) to about 300 to 700Å or forming a slit or the like. It is assumed that

[0039]

As described above, according to the inventions of claims 1 and 13, a large number of particles are dispersed on the resin layer formed on the inner surface of the rear substrate to cure the resin layer. Then, a large number of particles are embedded in the support layer so that each part of the particles protrudes from the surface of the support layer, and a scattering layer is formed by laminating a reflection layer on the support layer. The number of manufacturing steps can be reduced as compared with the case of using the photolithography method. Further, according to the invention described in claim 5 and claim 14, when a large number of particles are dispersed on the resin layer formed on the reflective layer formed on the inner surface of the rear substrate to cure the resin layer. , A large number of particles are embedded in the supporting layer so that each part of the particles protrudes from the surface of the supporting layer, and the optical refractive index of the supporting layer and the optical refractive index of the particles are different from each other. Since the light-scattering function is exhibited in the supporting layer portion including the layer and the light-reflecting function is exhibited in the reflective layer, the number of manufacturing steps can be reduced as compared with the case of the conventional photolithography method.

[Brief description of drawings]

FIG. 1 is a sectional view of an essential part of a liquid crystal display device as a first embodiment of the present invention.

2A to 2C are cross-sectional views for explaining a method for forming the scattering reflection layer shown in FIG.

FIG. 3 is a sectional view of a main part of a liquid crystal display device as a second embodiment of the invention.

FIG. 4 is a sectional view of a main part of a liquid crystal display device as a third embodiment of the present invention.

FIG. 5 is a sectional view of a main part of a liquid crystal display device as a fourth embodiment of the present invention.

FIG. 6 is a sectional view of a main part of a liquid crystal display device as a fifth embodiment of the present invention.

7A to 7C are cross-sectional views shown for explaining an example of a method for spraying particles shown in FIG.

FIGS. 8A and 8B are cross-sectional views shown for explaining another example of a method for spraying particles.

FIG. 9 is a sectional view of a main portion of a liquid crystal display device as a sixth embodiment of the present invention.

FIG. 10 is a sectional view of a main portion of a liquid crystal display device as a seventh embodiment of the present invention.

FIG. 11 is a sectional view of a main portion of a liquid crystal display device as an eighth embodiment of the present invention.

FIG. 12 is a partial cross-sectional view of an example of a conventional liquid crystal display device.

[Explanation of symbols]

21 Liquid crystal cell 22 Display side substrate 23 Back side substrate 24 signal electrodes 25 Alignment film 26 Support layer 27 particles 28 Scatter reflection layer 29 Flattening film 30 scanning electrodes 31 Alignment film 32 liquid crystal 33 Phase plate 34 Polarizing plate

Claims (19)

[Claims] 1. A display cell having a display-side substrate and a back-side substrate, a support layer provided on the inner surface of the back-side substrate, and a part of each of the support layers protruding from the surface of the support layer. Provided with a large number of particles embedded in the support layer containing the particles, the reflection surface formed on the uneven surface that follows the uneven surface of the support layer containing the particles, a light reflection function and light. A display device comprising: a scattering reflection layer having both scattering functions. 2. The display device according to claim 1, wherein a pixel electrode is provided on the scattering reflection layer via an insulating film. 3. The display device according to claim 1, wherein the scattering reflection layer also serves as a pixel electrode. 4. The display device according to claim 1, wherein the scattering reflection layer is a scattering semi-transmission reflection layer that transmits a part of incident light. 5. A display cell having a display-side substrate and a back-side substrate, a reflective layer provided on the inner surface of the back-side substrate, a support layer provided on the reflective layer, and each of the support layers. A display device, comprising: a plurality of particles, a part of which is embedded so as to project from the surface of the support layer, and the light refractive index of which is different from that of the support layer. 6. The display device according to claim 5, wherein a pixel electrode is provided on the support layer containing the particles. 7. The display device according to claim 5, wherein the reflective layer also serves as a pixel electrode. 8. The display device according to claim 5, wherein the reflective layer is a semi-transmissive reflective layer that transmits a part of incident light. 9. The display device according to claim 1, wherein the particle size of the particles is larger than the thickness of the support layer. 10. The display device according to claim 9, wherein the particles have substantially the same particle size. 11. The display device according to claim 9, wherein the particles are composed of a plurality of types of particles having different particle sizes. 12. The display device according to any one of claims 9 to 11, wherein the particles are arranged at predetermined positions. 13. A display cell having a display-side substrate and a back-side substrate, a support layer provided on the inner surface of the back-side substrate, and a part of each of the support layers protruding from the surface of the support layer. Provided with a large number of particles embedded in the support layer containing the particles, the reflection surface formed on the uneven surface that follows the uneven surface of the support layer containing the particles, a light reflection function and light. A method of manufacturing a display device comprising a scattering reflection layer having both functions of a scattering function, wherein a resin layer for forming the support layer is formed on the inner surface of the back side substrate,
A display device comprising: scattering the large number of particles on the resin layer, curing the resin layer to form the support layer, and forming the scattering reflection layer on the support layer containing the particles. Manufacturing method. 14. A display cell having a display-side substrate and a back-side substrate, a reflective layer provided on the inner surface of the back-side substrate, a support layer provided on the reflective layer, and each of the support layers. A method for manufacturing a display device, comprising: a plurality of particles, a part of which is embedded so as to protrude from the surface of the support layer, the light refractive index of which is different from the light refractive index of the support layer, wherein the backside substrate Forming the reflective layer on the inner surface of the resin layer, forming a resin layer for forming the support layer on the reflective layer, spraying the large number of particles on the resin layer, and curing the resin layer A method for manufacturing a display device, which comprises forming a support layer. 15. The method of manufacturing a display device according to claim 13, wherein the particle size of the particles is larger than the thickness of the support layer. 16. The method for manufacturing a display device according to claim 15, wherein the particles have substantially the same particle size. 17. The method of manufacturing a display device according to claim 16, wherein the particles are dispersed at predetermined positions on the resin layer using a particle-dispersing hard mask having openings. . 18. The method of manufacturing a display device according to claim 15, wherein the particles are composed of plural kinds of particles having different particle sizes. 19. The invention according to claim 18, wherein the plurality of types of particles are dispersed at predetermined positions on the resin layer by using a particle-dispersion hard mask having openings, each having a different particle size. A method of manufacturing a display device, comprising: