JP2003291211A - Embossing apparatus and its product - Google Patents

Embossing apparatus and its product

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Publication number
JP2003291211A
JP2003291211A JP2002132082A JP2002132082A JP2003291211A JP 2003291211 A JP2003291211 A JP 2003291211A JP 2002132082 A JP2002132082 A JP 2002132082A JP 2002132082 A JP2002132082 A JP 2002132082A JP 2003291211 A JP2003291211 A JP 2003291211A
Authority
JP
Japan
Prior art keywords
resin plate
embossing
stamper
roller
product
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002132082A
Other languages
Japanese (ja)
Other versions
JP4035840B2 (en
Inventor
Kazuo Kobayashi
一雄 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP2002132082A priority Critical patent/JP4035840B2/en
Publication of JP2003291211A publication Critical patent/JP2003291211A/en
Application granted granted Critical
Publication of JP4035840B2 publication Critical patent/JP4035840B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an embossing apparatus which has a low cost, high reliabil ity and productivity by improving a rotary hot pressing technique and to provide its product. <P>SOLUTION: The embossing apparatus heats to work the surface of a resin plate 5 via a stamper 1 by heater rollers 2, then continuously cools the plate to a glass transition temperature or lower, and then separates the stamper from the plate 5 via peeling rollers 3. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は大量生産が可能な樹
脂板に用途に応じた表面加工を施して、液晶表示装置の
背面照射装置に用いられる導光板や、光多重通信用回折
格子,マイクロケミストリーによる血液分析装置、CD
ディスク、レコード板など、従来は主に射出成型によっ
て製造されていた、外観は単純な平板状で表面の目的に
応じた凹凸模様形状により機能を発揮する樹脂部品の加
工に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light guide plate used for a back irradiation device of a liquid crystal display device, a diffraction grating for optical multiplex communication, and a micro-panel by subjecting a resin plate that can be mass-produced to a surface treatment according to the application. Chemistry blood analyzer, CD
The present invention relates to processing of resin parts such as discs and record boards, which have been produced mainly by injection molding in the past, and which have a simple flat appearance and exert a function by a concavo-convex pattern shape according to the purpose of the surface.

【0002】[0002]

【従来の技術】四角形の板状体である透明板の側面(光
入射面)から光を入射し、入射した光を表面(光出射
面)から均一に出射するようにした、いわゆるエッジラ
イト方式の導光板が液晶表示装置などの背面照明装置に
用いられている。このような背面照明装置は、導光板の
少なくとも1つの側面に管状光源を配置し、光を出射す
る光出射面に対向する面(光反射面)に、導光板を透過
する光の角度または導光板で反射される光の角度を変え
るための表面凹凸模様が設けられて構成されている。
2. Description of the Related Art A so-called edge light system in which light is incident from a side surface (light incident surface) of a transparent plate which is a quadrangular plate, and the incident light is uniformly emitted from a surface (light emission surface). Is used in a back lighting device such as a liquid crystal display device. In such a back lighting device, a tubular light source is arranged on at least one side surface of the light guide plate, and an angle or a direction of light passing through the light guide plate is guided to a surface (light reflecting surface) facing a light emitting surface for emitting light. The surface unevenness pattern for changing the angle of the light reflected by the light plate is provided.

【0003】近年、導光板は主に射出成型によって作ら
れているが、基本的な形状は単なる平板である。今後の
20インチクラス以上の大型化の際には極めて大型の射
出成型機を必要とし、新たな製造方法が求められてい
る。
In recent years, the light guide plate is mainly manufactured by injection molding, but the basic shape is a simple flat plate. An extremely large injection molding machine will be required in the future to increase the size to 20 inches or more, and a new manufacturing method is required.

【0004】他方、硬質樹脂へのエンボス加工方法とし
ては、所謂ホットプレスが用いられてきたがバッチ処理
のため生産性が低いことの他に真空中で加工しないと空
気が逃げ切れず気泡を巻き込んでしまうといった問題が
あった。
On the other hand, as a method for embossing a hard resin, so-called hot pressing has been used, but since it is a batch process, it has low productivity, and unless it is processed in a vacuum, air cannot escape and air bubbles are trapped. There was a problem of being lost.

【0005】そこで新たな製造方法として、特開−20
00−167926号公報に開示されているようにヒー
トローラによって熱転写し、十分放冷したのちにスタン
パーを樹脂からはがす方法が提案されている。確かに気
泡の巻き込みは無いがこのような製造方法では、樹脂板
が熱応力により反り変形してしまうので適用は可撓性の
材料に限定されて剛性の平板には向かない、また、生産
性が極めて低いという問題があった。
Then, as a new manufacturing method, Japanese Patent Laid-Open No. -20
As disclosed in Japanese Unexamined Patent Publication No. 00-167926, a method has been proposed in which heat transfer is performed by a heat roller, and after allowing to cool sufficiently, the stamper is removed from the resin. Certainly, there is no bubble entrapment, but in such a manufacturing method, the resin plate is warped and deformed by thermal stress, so its application is limited to flexible materials and not suitable for rigid flat plates. There was a problem that was extremely low.

【0006】[0006]

【発明が解決しようとする課題】本発明は上述した従来
技術の課題を解決し、安価で信頼性、生産性の高いエン
ボス加工装置とその製品を提供しようとするものであ
る。
SUMMARY OF THE INVENTION The present invention is intended to solve the above-mentioned problems of the prior art and to provide an embossing apparatus which is inexpensive, has high reliability and high productivity, and a product thereof.

【0007】[0007]

【課題を解決するための手段】上記課題を解決するため
に本願の請求項1の発明は温度制御されて回転するヒー
タローラによりエンボスパターンをほどこしたスタンパ
ーを樹脂板に押圧加工した後にヒータローラの回転に従
いスタンパと樹脂板は接触したまま進行させた後にはが
しローラによりスタンパを樹脂板から連続的に分離させ
ることを特徴とする。
In order to solve the above-mentioned problems, the invention of claim 1 of the present application follows the rotation of the heater roller after pressing a stamper having an embossed pattern by a heater roller rotating under temperature control on a resin plate. The present invention is characterized in that the stamper and the resin plate are moved in contact with each other, and then the stamper is continuously separated from the resin plate by the peeling roller.

【0008】本願の請求項2記載の発明ははがしローラ
とヒータローラの距離は変更可能とし冷却の進行具合を
制御可能にたことを特徴とする。
The invention according to claim 2 of the present application is characterized in that the distance between the peeling roller and the heater roller can be changed and the progress of cooling can be controlled.

【0009】本願の請求項3の発明はスタンパはエンド
レスベルト状となっていてローラコンベア左側で次々と
装入し、ローラコンベア右側で次々と排出する連続的な
処理を可能とすることを特徴とする。
The invention according to claim 3 of the present application is characterized in that the stamper is in the form of an endless belt, which enables continuous processing in which the stamper is loaded on the left side of the roller conveyor one after another and discharged on the right side of the roller conveyor one after another. To do.

【0010】本発明の請求項4の発明はスタンパおよび
ヒータローラは樹脂板の両側にあり、両面を同時に加工
することを特徴とする。
According to a fourth aspect of the present invention, the stamper and the heater roller are provided on both sides of the resin plate, and both sides are processed simultaneously.

【0011】本発明の請求項5の発明は樹脂板の非エン
ボス加工面には、平板状の樹脂板を収納するカートリッ
ジを設けて樹脂板の位置決め、エンボス加工時の反力支
持、樹脂板の搬送を行うことを特徴とする。
According to a fifth aspect of the present invention, a cartridge for accommodating a flat resin plate is provided on the non-embossed surface of the resin plate to position the resin plate, support reaction force during embossing, It is characterized by carrying.

【0012】本発明の請求項6項の発明はカートリッジ
は加熱温度制御されて、偏熱による樹脂板の反り防止を
行うことを特徴とする。
The invention according to claim 6 of the present invention is characterized in that the heating temperature of the cartridge is controlled to prevent warping of the resin plate due to uneven heat.

【0013】本発明の請求項7の発明は樹脂板の非エン
ボス加工面には、加熱され温度制御された対向ローラを
設けて偏熱による樹脂板の反り防止を可能とすることを
特徴とする。本発明の請求項8の発明は表裏面の温度の
均一性を改善するために樹脂板を垂直に搬送しながらエ
ンボス加工を行うことを特徴とする。
The invention of claim 7 of the present invention is characterized in that the non-embossed surface of the resin plate is provided with an opposed roller which is heated and temperature-controlled to prevent the resin plate from warping due to uneven heat. . The invention of claim 8 of the present invention is characterized in that the embossing is performed while the resin plate is conveyed vertically in order to improve the temperature uniformity of the front and back surfaces.

【0014】[0014]

【発明の実施の形態】以下、図面に基づいて本発明の詳
細を説明する。まず、図1から図6を用いて、本発明の
エンボス加工装置の一実施例の構成を説明する。図1
は、本発明によるエンボス加工装置の一実施例の側断面
の構成を示す模式図である。図2は、図1のII部の詳
細を示す模式図である。図3は、本発明のエンボス加工
装置の他の一実施例の構成を示す模式図である。図4、
図5、図6、は、それぞれ本発明のエンボス加工装置の
更に他の一実施例を示す模式図である。図7は垂直搬送
の場合の板厚断面から見た他の一実施例を示す模式図で
ある。
DETAILED DESCRIPTION OF THE INVENTION The present invention will be described in detail below with reference to the drawings. First, the configuration of an embodiment of the embossing apparatus of the present invention will be described with reference to FIGS. 1 to 6. Figure 1
FIG. 3 is a schematic diagram showing a configuration of a side section of an embossing apparatus according to an embodiment of the present invention. FIG. 2 is a schematic diagram showing details of the II portion of FIG. FIG. 3 is a schematic diagram showing the configuration of another embodiment of the embossing device of the present invention. Figure 4,
5 and 6 are schematic views showing still another embodiment of the embossing apparatus of the present invention. FIG. 7 is a schematic diagram showing another embodiment as seen from the plate thickness cross section in the case of vertical conveyance.

【0015】図中、1はスタンパ、2はヒータローラ、
3ははがしローラ、4はテンションローラ、5は樹脂
板、6は対向ローラ、7はロープ、8はカートリッジ、
9はコンタクトローラである。
In the figure, 1 is a stamper, 2 is a heater roller,
3 is a peeling roller, 4 is a tension roller, 5 is a resin plate, 6 is a facing roller, 7 is a rope, 8 is a cartridge,
Reference numeral 9 is a contact roller.

【0016】一般的にスタンパ1は、厚さが0.1から
0.5mm程度であり、多くはフォトレジスト技術によ
り所要のパターンが形成されたガラス原盤の表面にニッ
ケルの電気鋳造を行うことにより作製される。スタンパ
1は、適宜の張力を負荷されてヒータローラ2に密着し
て走行される。ヒータローラ2は、内部に電気ヒータと
熱電対等を内蔵しており、ヒータローラ2の表面が所定
の温度になるように制御されている。
Generally, the stamper 1 has a thickness of about 0.1 to 0.5 mm, and in most cases, nickel is electroformed on the surface of a glass master having a required pattern formed by a photoresist technique. It is made. The stamper 1 is loaded with an appropriate tension and runs in close contact with the heater roller 2. The heater roller 2 has an electric heater, a thermocouple, and the like built therein, and is controlled so that the surface of the heater roller 2 reaches a predetermined temperature.

【0017】図1に示すように、スタンパ1は、何枚か
を溶接によりエンドレスのフープ状になっており、ヒー
タローラ2、テンションローラ4、はがしローラ2を囲
んで転動している。スタンパ1にはテンションローラ4
により適度な張力が付与され蛇行防止、破断防止がはか
られている。ヒータローラ2、テンションローラ4はが
しローラ2は加工部の幾何学的形状を保ったまま昇降可
能なようフレーム構造がなされている。
As shown in FIG. 1, a stamper 1 is formed into an endless hoop shape by welding several sheets, and rolls around the heater roller 2, the tension roller 4, and the peeling roller 2. Tension roller 4 on stamper 1
With this, an appropriate tension is applied to prevent meandering and breaking. The heater roller 2 and the tension roller 4 are peeled off, and the peeling roller 2 has a frame structure so that it can be lifted and lowered while maintaining the geometrical shape of the processed portion.

【0018】特殊な変形例として片側のスタンパ1は鏡
面のままのフープにすると片面のみのエンボス加工も可
能である。
As a special modification, if the stamper 1 on one side is a hoop with a mirror surface, it is possible to emboss only one surface.

【0019】上下のヒータローラ2の間隔は加工時は樹
脂板5の板厚になぞらう荷重制御の定圧圧下で板厚やロ
ーラ偏心などの誤差を吸収できるよう制御され、加工直
前は加工時より多少ギャップが少なくなるよう位置制御
されることが好ましい。このようにすると樹脂板5に対
し一定圧力でスタンパを押圧するので、樹脂板5の板厚
偏差や機械寸法誤差が吸収され、転写不良を防止する。
The distance between the upper and lower heater rollers 2 is controlled so as to absorb errors such as the plate thickness and roller eccentricity under a constant pressure of load control which is similar to the plate thickness of the resin plate 5 at the time of processing. The position is preferably controlled so that the gap becomes slightly smaller. In this way, the stamper is pressed against the resin plate 5 with a constant pressure, so that the deviation in the thickness of the resin plate 5 and the mechanical dimension error are absorbed, and the transfer failure is prevented.

【0020】構造物の性格上どうしても常温時の寸法精
度が高温時に保てるとは限らない。そのためヒータロー
ラ2および対向ローラ6の最終仕上げ研削加工は、使用
温度に加熱しながら加工すると真円度、平行度、円筒度
がより高精度に確保できる。
Due to the nature of the structure, the dimensional accuracy at room temperature cannot always be maintained at high temperature. Therefore, in the final finish grinding of the heater roller 2 and the facing roller 6, the circularity, parallelism, and cylindricity can be ensured with higher accuracy if the heating roller 2 and the opposing roller 6 are processed while being heated to the operating temperature.

【0021】図1に示すように、上下のローラユニット
の間には、樹脂板5を実線矢印のように左から右に向か
って搬送するローラコンベアが設置されている。
As shown in FIG. 1, between the upper and lower roller units, there is provided a roller conveyor that conveys the resin plate 5 from left to right as indicated by solid arrows.

【0022】ヒータローラ2とはがしローラ2の距離L
は調整可能なように構成される。すなわち本特許の加工
法では樹脂板5の板厚は1mmから10mmの間がほと
んどであり、他方、エンボス加工の凹凸深さは0.1m
m以下がほとんどである。したがって加工の際の加熱深
さは0.1mm台以下をガラス転移温度以上にすれば十
分である。すなわち図2に示すように樹脂板5はヒータ
ローラ2直下でスタンパ1により表層部のみが急速にガ
ラス転移温度以上に加熱され軟化して、加圧、塑性変形
された後にスタンパ1と接触したまま搬送される。この
ときスタンパ1表面から外気への冷却とともに樹脂板5
自身内部への伝熱によって樹脂板5の表面付近はなだら
かな温度分布になりながら冷却、固化する。
The distance L between the heater roller 2 and the peeling roller 2
Is configured to be adjustable. That is, in the processing method of the present patent, the thickness of the resin plate 5 is mostly between 1 mm and 10 mm, while the embossing unevenness depth is 0.1 m.
Most are m or less. Therefore, it is sufficient that the heating depth during processing is in the range of 0.1 mm or less and above the glass transition temperature. That is, as shown in FIG. 2, the resin plate 5 is immediately under the heater roller 2, only the surface layer portion is rapidly heated to the glass transition temperature or higher by the stamper 1 to be softened, and is pressed and plastically deformed, and then conveyed while being in contact with the stamper 1. To be done. At this time, the resin plate 5 is cooled while cooling the surface of the stamper 1 to the outside air.
Due to the heat transfer to itself, the vicinity of the surface of the resin plate 5 is cooled and solidified with a gentle temperature distribution.

【0023】ここでその温度がガラス転移温度以下にな
って固化する位置でスタンパ1を樹脂板5から分離すれ
ば形状の乱れがなく良好な転写がされる。というのはス
タンパ1はニッケルを主とする金属でありその熱膨張率
は樹脂と比較するとはるかに小さい、更に、樹脂板5は
加工時はその表層部のみの加熱であり板厚全体の平均温
度はほとんど変化しないからである。樹脂の性質、エン
ボス加工の深さ、形状の特質によってヒータローラ2の
加熱温度、加圧力を決めるとともに距離Lも決められ
る。
Here, if the stamper 1 is separated from the resin plate 5 at a position where the temperature is below the glass transition temperature and solidifies, the shape is not disturbed and good transfer is achieved. This is because the stamper 1 is a metal mainly composed of nickel and its coefficient of thermal expansion is much smaller than that of resin. Furthermore, the resin plate 5 heats only its surface layer during processing and the average temperature of the entire plate thickness. Is almost unchanged. The heating temperature and pressure of the heater roller 2 are determined and the distance L is determined by the properties of the resin, the depth of embossing, and the characteristics of the shape.

【0024】一例として、ガラス転移温度120℃のア
クリル板にエンボス深さ25μmmのプリズム形導光板
加工においてヒータローラ温度180℃、加圧力4kg
/mm、速度600mm/min、L=100mmで転
写深さほぼ100%の良好な転写を得た。
As an example, when processing a prism type light guide plate with an emboss depth of 25 μm on an acrylic plate having a glass transition temperature of 120 ° C., the heater roller temperature is 180 ° C. and the pressing force is 4 kg.
/ Mm, speed 600 mm / min, L = 100 mm, and good transfer with a transfer depth of almost 100% was obtained.

【0025】加工前の樹脂板5は温度が一定であること
が操業の安定のために好ましく、更に生産性をも向上さ
せるために一定温度に加熱保持しておくとよい。
It is preferable that the temperature of the resin plate 5 before processing is constant in order to stabilize the operation, and it is preferable that the resin plate 5 is heated and maintained at a constant temperature in order to improve productivity.

【0026】エンボス模様の断面形状が急峻ではがれに
くく樹脂の微小部分がスタンパ1に固着してしまうよう
な場合にはスタンパ1又は樹脂板5に離型済をスプレー
するか樹脂板5の成分に離型剤を含んだものとすると良
い。
When the embossed pattern has a sharp cross-sectional shape and is hard to peel off and a minute portion of the resin sticks to the stamper 1, the stamper 1 or the resin plate 5 is sprayed with a demolded or the resin plate 5 is used as a component. It is better to include a release agent.

【0027】他の距離Lを決める要因は加工後の樹脂板
5の板反りである。加工法が板表面の局部加熱であるた
め冷却後樹脂板5が反ることを防止するためヒータロー
ラ2の加熱温度とともにはがしローラ3までの距離Lも
板反り制御のためのパラメータの一つとされる。尚、は
がしローラ3の温度も制御項目の一つとしてもよい。
Another factor that determines the distance L is the warp of the resin plate 5 after processing. Since the processing method is local heating of the plate surface, in order to prevent the resin plate 5 from warping after cooling, the heating temperature of the heater roller 2 and the distance L to the peeling roller 3 are also one of the parameters for plate warpage control. . The temperature of the peeling roller 3 may be one of the control items.

【0028】図3に示すのは、生産量が多くなく可逆式
にした例である。スタンパ1はその両端でベルト7に接
続され図示しない張力附加装置が備わっている。図では
ヒータローラ2は、円筒であるがエンボス深さが深く半
径が大径で所要展開長が一回転以下の場合は扇形のよう
な部分円にしてもよい。
FIG. 3 shows an example of a reversible type in which the production amount is small. The stamper 1 is connected to the belt 7 at both ends thereof and is provided with a tension applying device (not shown). Although the heater roller 2 is a cylinder in the figure, it may be a partial circle such as a fan when the embossing depth is deep, the radius is large, and the required development length is one rotation or less.

【0029】図4は更に樹脂板5の裏面を用いてカート
リッジ8に位置決め、搭載させた例でカートリッジ8の
進行は、スタンパ1のエンボス模様が樹脂板5の正しい
位置に押印されるよう制御される。
FIG. 4 shows an example in which the back surface of the resin plate 5 is used for positioning and mounting in the cartridge 8, and the progress of the cartridge 8 is controlled so that the embossed pattern of the stamper 1 is imprinted at the correct position on the resin plate 5. It

【0030】カートリッジ8にはやはり板反り防止のた
めにヒータがあり、温度制御されることが好適である
が、後処理で樹脂板5の反り修正を行う場合にはカート
リッジ8へのヒータの装着は不要である。
The cartridge 8 also has a heater for preventing the warp and it is preferable to control the temperature. However, when the warp of the resin plate 5 is corrected in the post-treatment, the heater is attached to the cartridge 8. Is unnecessary.

【0031】図5に示すのは、樹脂板5の裏面側は鏡面
加工し、加熱温度制御された対向ローラ6としたもので
対向ローラ6はエンボス加工時の反力支持、回転搬送、
板反り防止加熱の機能を持つ。尚、裏面もエンボス加工
が可能であるが熱いうちに離れてしまい、模様の深さが
浅くなるので対向ローラ6には深めの刻印が必要にな
る。
In FIG. 5, the rear surface of the resin plate 5 is mirror-finished to form a counter roller 6 whose heating temperature is controlled. The counter roller 6 supports reaction force during embossing, rotational conveyance,
It has the function of heating to prevent warpage. It should be noted that the back surface can be embossed, but it is separated while it is hot, and the pattern becomes shallower.

【0032】図6に示すのは、スタンパ1の剛性が十分
高い場合の実施例で熱ひずみの影響が出ないようにスタ
ンパ1とカートリッジ8をその後端部で締結し、加工の
進行に従いコンタクトローラ9とはがしローラ3によっ
て樹脂板5からスタンパ1を連続的に剥がすものでここ
でも距離Lは可変にしてある。コンタクトローラ9はス
タンパ1のエンボス模様を傷めることがなく、かつ耐熱
性が求められるため、その表面はフッ素ゴム、シリコン
ラバーなどが好ましい。
FIG. 6 shows an embodiment in which the rigidity of the stamper 1 is sufficiently high so that the stamper 1 and the cartridge 8 are fastened at their rear end portions so as not to be affected by thermal strain, and the contact roller is advanced in accordance with the progress of processing. The peeling roller 9 continuously peels off the stamper 1 from the resin plate 5, and the distance L is also variable here. The contact roller 9 is required to have heat resistance without damaging the embossed pattern of the stamper 1, and therefore its surface is preferably made of fluororubber or silicon rubber.

【0033】ここでは樹脂板5の装荷、排出は共に矢印
の方向へ進行した後の右側になる。加工前の樹脂板5を
載せたカートリッジ8は破線矢印の方向へ後退するが、
この時ヒータローラ2は上昇させて後退時には加工せ
ず、スタンパ1は単に樹脂板5に軽く乗っているだけに
とどめる。本図によると生産性は最も低いが装置も最も
安価で済む。
Here, the loading and discharging of the resin plate 5 are both on the right side after advancing in the direction of the arrow. The cartridge 8 on which the unprocessed resin plate 5 is placed retreats in the direction of the dashed arrow,
At this time, the heater roller 2 is raised and is not processed when retracted, and the stamper 1 is merely put on the resin plate 5 lightly. According to this figure, the productivity is the lowest, but the equipment is also the cheapest.

【0034】図7は図1と同様な設備において樹脂板5
の搬送を垂直にした場合の模式図である。ここではロー
ラコンベアはその必要な箇所はV溝形として搬送中に樹
脂板5が落下することの無い様配慮されている。このよ
うにすると下面側において熱のこもることが防がれる。
図4、図6のようにカートリッジ8に樹脂板5を収納す
る場合は単にカートリッジ8に真空吸引装置をつけて樹
脂板5をカートリッジ8に吸着させればよい。
FIG. 7 shows a resin plate 5 in the same equipment as in FIG.
It is a schematic diagram at the time of making the conveyance of the perpendicular | vertical. Here, the roller conveyor is provided with V-grooves at the necessary portions so that the resin plate 5 does not drop during transportation. In this way, it is possible to prevent heat from being accumulated on the lower surface side.
When the resin plate 5 is housed in the cartridge 8 as shown in FIGS. 4 and 6, it suffices to simply attach a vacuum suction device to the cartridge 8 so that the resin plate 5 is adsorbed to the cartridge 8.

【0035】[0035]

【発明の効果】本発明によれば簡単な装置により、安価
で信頼性、生産性が高く板反りの無いエンボス加工装置
とその製品を提供することができる。
According to the present invention, it is possible to provide an embossing device and its product which are inexpensive, have high reliability and productivity, and have no plate warp, by a simple device.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明によるエンボス加工装置の一実施例の側
断面の構成を示す模式図。
FIG. 1 is a schematic view showing a configuration of a side section of an embodiment of an embossing device according to the present invention.

【図2】図1のII部の詳細を示す模式図である。FIG. 2 is a schematic view showing details of a II portion in FIG.

【図3】本発明のエンボス加工装置の他の一実施例の構
成を示す模式図。
FIG. 3 is a schematic diagram showing the configuration of another embodiment of the embossing device of the present invention.

【図4】本発明のエンボス加工装置の更に他の一実施例
を示す模式図。
FIG. 4 is a schematic view showing still another embodiment of the embossing device of the present invention.

【図5】本発明のエンボス加工装置のまた他の一実施例
を示す模式図。
FIG. 5 is a schematic view showing another embodiment of the embossing device of the present invention.

【図6】本発明のエンボス加工装置のまた他の一実施例
を示す模式図
FIG. 6 is a schematic view showing another embodiment of the embossing device of the present invention.

【図7】垂直搬送の場合の板厚断面から見た他の一実施
例を示す模式図である。
FIG. 7 is a schematic view showing another embodiment as seen from the plate thickness cross section in the case of vertical conveyance.

【符号の説明】[Explanation of symbols]

1・・・スタンパ、2・・・ヒータローラ、3・・・は
がしローラ、4・・・テンションローラ、5・・・樹脂
板、6・・・対向ローラ、7・・・ロープ、8・・・カ
ートリッジ、9・・・コンタクトローラ
1 ... Stamper, 2 ... Heater roller, 3 ... Peeling roller, 4 ... Tension roller, 5 ... Resin plate, 6 ... Opposing roller, 7 ... Rope, 8 ... Cartridge, 9 ... Contact roller

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】温度制御されて回転するヒーターローラに
よりエンボスパターンをほどこしたスタンパを樹脂板に
加熱押圧加工した後にヒーターローラの回転に従いスタ
ンパと樹脂板は接触したまま進行させた後にはがしロー
ラによりスタンパを樹脂板から連続的に分離させること
を特徴とするエンボス加工装置とその製品。
1. A stamper having an embossing pattern applied by a heater roller rotating under temperature control is heated and pressed on a resin plate, and then the stamper and the resin plate are moved in contact with each other according to the rotation of the heater roller, and then the stamper is peeled off by a peel roller. An embossing device and its product, which continuously separates from a resin plate.
【請求項2】はがしローラとヒーターローラの距離は変
更可能としたことを特徴とする第1項記載のエンボス加
工装置とその製品。
2. The embossing apparatus and its product according to claim 1, wherein the distance between the peeling roller and the heater roller is changeable.
【請求項3】スタンパはエンドレスベルト状となってい
ることを特徴とする第1項記載のエンボス加工装置とそ
の製品。
3. The embossing apparatus and the product thereof according to claim 1, wherein the stamper has an endless belt shape.
【請求項4】スタンパおよびヒーターローラは樹脂板の
両側にあり、両面を同時に加工することを特徴とする第
1項記載のエンボス加工装置とその製品。
4. The embossing apparatus and its product according to claim 1, wherein the stamper and the heater roller are provided on both sides of the resin plate and both sides are processed simultaneously.
【請求項5】樹脂板の非エンボス加工面には、平板状の
樹脂板を収納するカートリッジを設けてエンボス加工時
の反力支持、樹脂板の搬送を行うことを特徴とする第1
項記載のエンボス加工装置とその製品。
5. A cartridge for accommodating a flat resin plate is provided on a non-embossed surface of the resin plate to support reaction force during embossing and convey the resin plate.
The embossing device and its product according to the item.
【請求項6】カートリッジは加熱され、温度制御され
て、偏熱による樹脂板の反り防止を行うことを特徴とす
る第5項記載のエンボス加工装置とその製品。
6. The embossing apparatus and its product according to claim 5, wherein the cartridge is heated and the temperature is controlled to prevent the resin plate from warping due to uneven heat.
【請求項7】樹脂板の非エンボス加工面には、加熱さ
れ、温度制御された対向ローラを設けてエンボス加工時
の反力支持、樹脂板の搬送、偏熱による樹脂板の反り防
止を行うことを特徴とする第1項記載のエンボス加工装
置とその製品。
7. A non-embossed surface of the resin plate is provided with a heated and temperature-controlled counter roller to support reaction force during embossing, convey the resin plate, and prevent warping of the resin plate due to uneven heat. The embossing device and the product thereof according to claim 1, characterized in that.
【請求項8】樹脂板を垂直に搬送しながらエンボス加工
を行うことを特徴とする第1から7項記載のエンボス加
工装置とその製品。
8. The embossing apparatus and the product thereof according to any one of claims 1 to 7, wherein the embossing is performed while the resin plate is conveyed vertically.
JP2002132082A 2002-04-01 2002-04-01 Embossing equipment and products Expired - Fee Related JP4035840B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002132082A JP4035840B2 (en) 2002-04-01 2002-04-01 Embossing equipment and products

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002132082A JP4035840B2 (en) 2002-04-01 2002-04-01 Embossing equipment and products

Publications (2)

Publication Number Publication Date
JP2003291211A true JP2003291211A (en) 2003-10-14
JP4035840B2 JP4035840B2 (en) 2008-01-23

Family

ID=29244036

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP4035840B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008122912A (en) * 2006-11-14 2008-05-29 Samsung Electronics Co Ltd Manufacturing method for optical member
EP2319680A2 (en) 2009-11-09 2011-05-11 Hitachi Industrial Equipment Systems Co., Ltd. Fine structure formation apparatus
JP2013119254A (en) * 2011-12-06 2013-06-17 Chung Yuan Christian Univ Roller-based imprinting system
WO2015072572A1 (en) * 2013-11-18 2015-05-21 Scivax株式会社 Mold release device and mold release method
CN105666771A (en) * 2016-03-08 2016-06-15 深圳市帝显电子有限公司 Hot rolling method of light guide plate

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008122912A (en) * 2006-11-14 2008-05-29 Samsung Electronics Co Ltd Manufacturing method for optical member
EP2319680A2 (en) 2009-11-09 2011-05-11 Hitachi Industrial Equipment Systems Co., Ltd. Fine structure formation apparatus
US8485811B2 (en) 2009-11-09 2013-07-16 Hitachi Industrial Equipment Systems Co., Ltd. Fine structure formation apparatus
JP2013119254A (en) * 2011-12-06 2013-06-17 Chung Yuan Christian Univ Roller-based imprinting system
WO2015072572A1 (en) * 2013-11-18 2015-05-21 Scivax株式会社 Mold release device and mold release method
CN105666771A (en) * 2016-03-08 2016-06-15 深圳市帝显电子有限公司 Hot rolling method of light guide plate

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