JP2003288029A - Multilayer film for display element and display element - Google Patents
Multilayer film for display element and display elementInfo
- Publication number
- JP2003288029A JP2003288029A JP2002090927A JP2002090927A JP2003288029A JP 2003288029 A JP2003288029 A JP 2003288029A JP 2002090927 A JP2002090927 A JP 2002090927A JP 2002090927 A JP2002090927 A JP 2002090927A JP 2003288029 A JP2003288029 A JP 2003288029A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- refractive index
- display element
- resin substrate
- laminated film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroluminescent Light Sources (AREA)
- Laminated Bodies (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、光を外部に取り出
す効率が高く、耐屈曲性、水蒸気バリア性に優れる表示
素子用積層フィルムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laminated film for a display device, which has high efficiency of extracting light to the outside, and is excellent in bending resistance and water vapor barrier property.
【0002】[0002]
【従来の技術】近年、情報化社会の進展に伴い、各種の
表示素子が開発されている。その中で、エレクトロルミ
ネッセンス(EL)素子は、自発光型であるため視野角
が広く、応答速度が速く、またバックライト、偏光板な
どが不要であることから薄型が可能であり、完全固体素
子であるため衝撃性も高いなどの特長を有していること
から、薄型表示装置として注目されている。他の薄型デ
ィスプレーと比較しても薄型、軽量、低消費電力であ
る。有機EL発光装置の一般的な構成としては、透明基
板上に、透明電極(例えばITO)、正孔注入層、低分
子あるいは高分子からなる発光層、電極(例えばMg)
が順に積層されてなり、さらにその上層に保護カバーが
配置される。また、トップエミッション型と呼ばれるタ
イプのように、発光層が積層される基板とは別の透明基
板(透明シールと呼ばれることもある。)から光が透過
し、出射する場合もある。2. Description of the Related Art In recent years, various display devices have been developed with the progress of information society. Among them, the electroluminescence (EL) element is a self-luminous type and thus has a wide viewing angle and a high response speed, and since it does not require a backlight, a polarizing plate, etc., it can be thin, and is a completely solid-state element. Therefore, it has attracted attention as a thin display device because of its features such as high impact resistance. It is thinner, lighter, and consumes less power than other thin displays. As a general structure of an organic EL light emitting device, a transparent electrode (eg, ITO), a hole injection layer, a light emitting layer made of a low molecule or a polymer, and an electrode (eg, Mg) are provided on a transparent substrate.
Are sequentially stacked, and a protective cover is arranged on the upper layer. In addition, light may be transmitted through and emitted from a transparent substrate (also referred to as a transparent seal) different from the substrate on which the light emitting layer is laminated, such as a top emission type.
【0003】有機EL発光装置の透明基板には、重くて
割れやすいガラスに替わり、軽くて割れにくいプラスチ
ックの採用が検討されている。透明基板に、透明プラス
チックを用いた場合、ロールトゥロール等での連続加工
に適用できることから、枚葉処理で作らざるを得ないガ
ラスを用いた場合に比べ、効率よく生産することが可能
となる。しかしながら、プラスチックを透明基板として
有機EL素子に用いた場合、水蒸気バリア性が不足し、
有機EL素子の発光材料は水分により劣化しやすいた
め、表示欠陥となり表示品位が低下する。For a transparent substrate of an organic EL light emitting device, it is considered to use a light and hard-to-break plastic instead of a heavy and easily-break glass. When transparent plastic is used for the transparent substrate, it can be applied to continuous processing such as roll-to-roll processing, so it is possible to produce more efficiently than when using glass that must be produced by single-wafer processing. . However, when plastic is used as an organic EL element as a transparent substrate, the water vapor barrier property is insufficient,
Since the light emitting material of the organic EL element is easily deteriorated by moisture, it causes a display defect and deteriorates the display quality.
【0004】また、上記のような有機EL発光装置の構
成においては、基板に例えば屈折率が1.5〜1.6程
度の材料を用いた場合、約20%しか光を取り出せず、
残りの約80%は素子の界面で生じる全反射により導波
光として失われ、明るさが不足していた。一方、液晶素
子等においても光の取り出し効率を上げることによっ
て、バックライトの消費電力を低減することができ、連
続使用時間の延長、省エネルギーといった効果を期待で
きることから、表示素子全般に、光を外部に取り出す効
率を上げることが課題となっていた。Further, in the structure of the organic EL light emitting device as described above, when a material having a refractive index of about 1.5 to 1.6 is used for the substrate, only about 20% of light can be extracted,
The remaining about 80% was lost as guided light due to total reflection occurring at the interface of the element, and the brightness was insufficient. On the other hand, by increasing the light extraction efficiency in liquid crystal devices, etc., the power consumption of the backlight can be reduced, and the effects of extending the continuous use time and saving energy can be expected. There was a challenge to improve the efficiency of taking out to the.
【0005】[0005]
【発明が解決しようとする課題】本発明の目的は、光を
外部に取り出す効率が高く、耐屈曲性、水蒸気バリア性
に優れた表示素子用積層フィルムを提供することにあ
る。SUMMARY OF THE INVENTION An object of the present invention is to provide a laminated film for a display device, which has a high efficiency of extracting light to the outside, and is excellent in bending resistance and water vapor barrier property.
【0006】[0006]
【課題を解決するための手段】古典光学の屈折の法則に
よれば、発光した光が一旦、屈折率が1の層中に入射さ
れると、屈折率が1よりもはるかに大きい透明層を通過
しても、導波光を生じない。そのため、入射光の全量を
空気中に取り出すことができる。有機EL発光素子等の
表示素子において、基板と透明電極層の間に屈折率が小
さい層を設けると、導波光を低減でき、発光した光を外
部に取り出す効率を高くすることができる。According to the law of refraction of classical optics, once emitted light is incident on a layer having a refractive index of 1, a transparent layer having a refractive index much larger than 1 is formed. Even if it passes, it does not generate guided light. Therefore, the entire amount of incident light can be extracted into the air. In a display element such as an organic EL light emitting element, when a layer having a small refractive index is provided between the substrate and the transparent electrode layer, guided light can be reduced and the efficiency of extracting emitted light to the outside can be increased.
【0007】すなわち本発明は、
(1)樹脂基材上に少なくとも1層以上の有機物層、無
機物層および該樹脂基材より屈折率の小さい層が積層さ
れた表示素子用積層フィルム。
(2)前記各層が有機物層、樹脂基材、有機物層、無機
物層、樹脂基材より屈折率の小さい層の順に積層されて
いる(1)の表示素子用積層フィルム。
(3)前記樹脂基材より屈折率の小さい層の屈折率が
1.0〜1.3である(1)、(2)の表示素子用積層
フィルム。
(4)前記樹脂基材より屈折率の小さい層が、孔径が可
視光の波長よりも小さい多孔質体を主成分とする(1)
〜(3)の表示素子用積層フィルム。
(5)総厚みが50〜1000μmであり、直径100
mm円柱上で180°折り曲げても、各層に各層に亀裂
が生じない(1)〜(4)の表示素子用積層フィルム。
(6)(1)〜(5)の表示素子用積層フィルムを用
い、前記基板より屈折率の小さい層が、表示素子の透明
電極層と接するように配置された表示素子。
(7)(1)〜(5)の表示素子用積層フィルムを用
い、前記基板より屈折率の小さい層が、エレクトロルミ
ネッセンス素子の透明電極層と接するように配置された
エレクトロルミネッセンス素子。
である。That is, the present invention is: (1) A laminated film for a display device, in which at least one organic layer, an inorganic layer and a layer having a smaller refractive index than the resin substrate are laminated on a resin substrate. (2) The laminated film for a display device according to (1), in which each layer is laminated in the order of an organic layer, a resin substrate, an organic layer, an inorganic layer, and a layer having a smaller refractive index than the resin substrate. (3) The laminated film for a display element according to (1) or (2), wherein the layer having a smaller refractive index than the resin substrate has a refractive index of 1.0 to 1.3. (4) The layer whose refractive index is smaller than that of the resin base material is mainly composed of a porous body having a pore diameter smaller than the wavelength of visible light (1)
The laminated film for display devices of (3) to (3). (5) The total thickness is 50 to 1000 μm, and the diameter is 100.
The laminated film for a display device according to any one of (1) to (4), wherein each layer does not crack when bent 180 ° on a mm cylinder. (6) A display device using the laminated film for a display device according to (1) to (5), in which a layer having a refractive index smaller than that of the substrate is arranged so as to be in contact with a transparent electrode layer of the display device. (7) An electroluminescent element, which is formed by using the laminated film for a display element according to any one of (1) to (5) and in which a layer having a refractive index smaller than that of the substrate is arranged in contact with a transparent electrode layer of the electroluminescent element. Is.
【0008】[0008]
【発明の実施の形態】本発明に用いられる樹脂基材とし
ては、光学用途に用いられる透明樹脂であれば特に限定
されないが、例えば、アクリル樹脂、メタクリル樹脂、
ポリカーボネート樹脂、ポリエステル樹脂、ポリエチレ
ンテレフタレート樹脂、ポリアリレート樹脂、ポリエー
テルスルホン樹脂、脂環式ポリオレフィン樹脂、およ
び、これらの共重合体等を挙げることができる。BEST MODE FOR CARRYING OUT THE INVENTION The resin base material used in the present invention is not particularly limited as long as it is a transparent resin used for optical applications. For example, acrylic resin, methacrylic resin,
Examples thereof include polycarbonate resin, polyester resin, polyethylene terephthalate resin, polyarylate resin, polyether sulfone resin, alicyclic polyolefin resin, and copolymers thereof.
【0009】表示素子用の基板に要求される水蒸気バリ
ア性を満たすために、基板には少なくとも1層以上の有
機物層、無機物層が積層される。本発明に用いられる無
機物層としては、例えば、Si、Al、In、Sn、Z
n、Ti、Cu、Ce等の1種以上を含む酸化物、窒化
物、酸化窒化物等が挙げることができるが、これらに限
定されない。In order to satisfy the water vapor barrier property required for a substrate for a display device, at least one organic layer or inorganic layer is laminated on the substrate. Examples of the inorganic layer used in the present invention include Si, Al, In, Sn, and Z.
Examples thereof include, but are not limited to, oxides, nitrides, and oxynitrides containing one or more of n, Ti, Cu, Ce and the like.
【0010】本発明に用いられる有機物層としては、例
えば、アクリル系樹脂、ウレタン系樹脂、ポリエステル
樹脂等を挙げることができるが、これらに限定されな
い。Examples of the organic material layer used in the present invention include, but are not limited to, acrylic resins, urethane resins, polyester resins and the like.
【0011】樹脂基材、無機物層、有機物層の配置に関
しては、特に限定はしないが、層間の密着性、水蒸気バ
リア性、耐屈曲性を良好にするため、有機物層、透明基
材、有機物層、無機物層の順であるものが好ましい。さ
らに透明基板のバリア性を良好にするため、無機物層側
に、有機物層または無機物層を一層以上積層してもよ
い。また、樹脂基材より屈折率の小さい層の位置に関し
ても、特に限定はしないが、また、本発明の表示素子用
積層フィルムをEL素子等の表示素子に使用する場合、
表示素子用積層フィルムは光を透過し出射させる透明基
板として使用し、樹脂基材より屈折率の小さい層は、透
明基板の無機物層と表示素子と透明電極層の間に設けら
れていることが好ましい。すなわち本発明の表示素子用
積層フィルムの樹脂基材より屈折率の小さい層は、EL
素子の透明電極層と接するように配置することが好まし
い。こうすることによって、光は水蒸気バリア層等の層
と透明電極との界面での反射が起こる前に低屈折率層に
入射するため、出射効率をより高めることができる。し
たがって、各層の構成に関しては、有機物層、樹脂基
材、有機物層、無機物層、樹脂基材より屈折率の小さい
層の順が最も好ましい。The arrangement of the resin base material, the inorganic material layer, and the organic material layer is not particularly limited, but in order to improve the adhesion between layers, the water vapor barrier property, and the bending resistance, an organic material layer, a transparent base material, and an organic material layer are provided. The order of the inorganic material layer is preferable. Further, in order to improve the barrier property of the transparent substrate, one or more organic material layers or inorganic material layers may be laminated on the inorganic material layer side. The position of the layer having a smaller refractive index than the resin base material is not particularly limited, but when the laminated film for a display device of the present invention is used for a display device such as an EL device,
The laminated film for a display element is used as a transparent substrate that transmits and emits light, and the layer having a smaller refractive index than the resin base material is provided between the inorganic layer of the transparent substrate and the display element and the transparent electrode layer. preferable. That is, the layer having a smaller refractive index than the resin base material of the laminated film for a display device of the present invention is EL
It is preferably arranged so as to be in contact with the transparent electrode layer of the device. By doing so, light enters the low refractive index layer before being reflected at the interface between the layer such as the water vapor barrier layer and the transparent electrode, so that the emission efficiency can be further improved. Therefore, regarding the configuration of each layer, the order of the organic material layer, the resin base material, the organic material layer, the inorganic material layer, and the layer having a smaller refractive index than the resin base material is most preferable.
【0012】本発明の表示素子用積層フィルムは、いか
なる製造方法によって製造されても構わないが、ロール
トゥロール等の連続加工に適用することを考慮すると、
厚みが50〜1000μmであり、かつ、直径100m
m円柱上で180°折り曲げても各層に亀裂が生じない
ものが好ましい。厚みが50μmより薄くなると、折り
曲げると亀裂やしわが生じ易く、ロールトゥロール等の
連続加工に適用することができないおそれがある。厚み
が1000μmより厚くなると、重量が大きくなり、軽
量化を目的とする透明基板に樹脂基材を用いるメリット
が失われるおそれがある。直径100mm円柱上で18
0°折り曲げても各層に亀裂が生じないという基準は、
ハンドリング等の目安となるものである。The laminated film for a display element of the present invention may be manufactured by any manufacturing method, but considering that it is applied to continuous processing such as roll-to-roll,
The thickness is 50 to 1000 μm and the diameter is 100 m.
It is preferable that each layer does not crack even if it is bent 180 ° on a m-cylinder. If the thickness is less than 50 μm, cracks and wrinkles are likely to occur when bent, and it may not be applicable to continuous processing such as roll-to-roll processing. If the thickness is more than 1000 μm, the weight becomes large, and the advantage of using the resin base material for the transparent substrate for the purpose of weight reduction may be lost. 18 on a 100 mm diameter cylinder
The criteria that each layer does not crack even if it is bent by 0 ° is
It is a standard for handling.
【0013】本発明に用いられる透明基板より屈折率の
小さい層としては、樹脂基材の屈折率より小さければ、
特に限定されないが、屈折率が1.0〜1.3であるこ
とが好ましく、その値は、真空中での屈折率である1に
近いほど好ましい。屈折率が1.3より大きくなると、
光を外部に取り出す効率を高くする効果が得られないお
それがある。As the layer having a smaller refractive index than the transparent substrate used in the present invention, if it is smaller than the refractive index of the resin substrate,
Although not particularly limited, the refractive index is preferably 1.0 to 1.3, and the value thereof is preferably as close to 1 as the refractive index in vacuum. When the refractive index becomes larger than 1.3,
There is a possibility that the effect of increasing the efficiency of extracting light to the outside cannot be obtained.
【0014】上記の屈折率を満たす透明基板より屈折率
の小さい層としては、多孔質体を主成分とする層が好ま
しく、多孔質体しては、有機物または無機物の多孔質
体、すなわち、シリカエアロゲル、アルミナエアロゲ
ル、ポリイミド空孔体等が挙げられる。上記多孔質体
は、可視光の波長よりも小さい孔径を有するものが好ま
しく、0.1μm以下の孔径を有するものがさらに好ま
しい。The layer having a refractive index smaller than that of the transparent substrate satisfying the above refractive index is preferably a layer containing a porous body as a main component, and the porous body is an organic or inorganic porous body, that is, silica. Examples thereof include aerogel, alumina aerogel, polyimide porous body and the like. The porous body preferably has a pore diameter smaller than the wavelength of visible light, and more preferably has a pore diameter of 0.1 μm or less.
【0015】孔径が可視光の波長よりも小さい多孔質体
を主成分とする層の作製方法は特に限定されないが、例
えば、フォトマスクを用いたパターニング法、透明基板
よりも屈折率の小さい膜を作製した後、やすり等の適当
な材料で擦る方法、二成分のうち一成分を揮発または分
解させる方法などが挙げられる。The method for producing the layer whose main component is a porous material having a pore diameter smaller than the wavelength of visible light is not particularly limited. For example, a patterning method using a photomask, a film having a smaller refractive index than the transparent substrate is used. Examples of the method include a method of rubbing with a suitable material such as a file after production, and a method of volatilizing or decomposing one of the two components.
【0016】透明基板より屈折率の小さい層の凹凸等に
より生じる表示欠陥発生を防ぐため、樹脂基材より屈折
率の小さい層は平坦な層を複数枚積層してもよい。In order to prevent the occurrence of display defects caused by unevenness of the layer having a smaller refractive index than the transparent substrate, a plurality of layers having a smaller refractive index than the resin substrate may be laminated.
【0017】[0017]
【実施例】以下本発明の実施例について詳細に説明する
が、本発明は、何ら下記実施例に限定されるものではな
い。
(実施例1)ポリエーテルサルホン樹脂(屈折率1.6
5、厚み200μm)フィルムにエポキシアクリレート
(昭和高分子:VR−60−LAV)25wt%、ジエ
チレングリコール50wt%、酢酸エチル24wt%、
シランカップリング剤1wt%からなる均一な混合溶液
をスピンコーターで塗布し、80℃10分加熱乾燥後さ
らにUV照射で硬化させて2μmの有機物層を形成し
た。つぎに、スパッタ装置の真空槽内に前記有機物層を
形成したフィルムをセットし、10-4Pa台まで真空引
きし、放電ガスとしてアルゴンを分圧で0.04Pa導
入、反応ガスとして酸素を分圧で0.04Pa導入し
た。雰囲気圧力が安定したところで放電を開始しSiタ
ーゲット上にプラズマを発生させ、スパッタリングプロ
セスを介しした。プロセスが安定したところでシャッタ
ーを開きフィルムへのSiOx無機物層の形成を開始し
た。50nmの膜が堆積したところでシャッターを閉じ
て成膜を終了した。その後、真空槽内に大気を導入しS
iOx無機物層の形成されたフィルムを取り出した。さ
らに、該フィルムのSiOx無機膜堆積面にエポシキア
クリレート(昭和高分子:VR−60−LAV)25w
t%、ジエチレングリコール50wt%、酢酸エチル2
4wt%、シランカップリング剤1wt%からなる均一
な混合溶液をスピンコーターで塗布し、80℃10分加
熱乾燥後さらにUV照射で硬化させて0.5μmの有機
物層を形成した。再び該フィルムをスパッタ装置の真空
槽内にセットし、10−4Pa台まで真空引きし、放電
ガスとしてアルゴンを分圧で0.04Pa導入、反応ガ
スとして酸素を分圧で0.04Pa導入した。雰囲気圧
力が安定したところで放電を開始しSiターゲット上に
プラズマを発生させ、スパッタリングプロセスを開始し
た。プロセスが安定したところでシャッターを開きフィ
ルムへのSiOx無機膜の形成を開始した。50nmの
膜が堆積したところでシャッターを閉じて成膜を終了し
た。その後、真空槽内に大気を導入しSiOx無機物層
の形成されたフィルムを取り出した。EXAMPLES Examples of the present invention will be described in detail below, but the present invention is not limited to the following examples. (Example 1) Polyether sulfone resin (refractive index 1.6
5. Epoxy acrylate (Showa High Polymer: VR-60-LAV) 25 wt%, diethylene glycol 50 wt%, ethyl acetate 24 wt%, on a film having a thickness of 200 μm.
A uniform mixed solution containing 1 wt% of a silane coupling agent was applied by a spin coater, dried by heating at 80 ° C. for 10 minutes, and further cured by UV irradiation to form a 2 μm organic material layer. Next, the film on which the organic layer was formed was set in a vacuum tank of a sputtering apparatus, vacuumed to the level of 10 −4 Pa, and argon was introduced as a discharge gas at a partial pressure of 0.04 Pa, and oxygen was separated as a reaction gas. A pressure of 0.04 Pa was introduced. When the atmospheric pressure became stable, discharge was started to generate plasma on the Si target, and the sputtering process was performed. When the process became stable, the shutter was opened and the formation of the SiOx inorganic layer on the film was started. When a 50 nm film was deposited, the shutter was closed to complete the film formation. After that, the atmosphere is introduced into the vacuum chamber and S
The film on which the iOx inorganic layer was formed was taken out. Further, on the SiOx inorganic film deposition surface of the film, epoxy acrylate (Showa High Polymer: VR-60-LAV) 25w
t%, diethylene glycol 50 wt%, ethyl acetate 2
A uniform mixed solution of 4 wt% and 1 wt% of silane coupling agent was applied by a spin coater, dried by heating at 80 ° C. for 10 minutes, and further cured by UV irradiation to form a 0.5 μm organic material layer. The film was set in the vacuum tank of the sputtering apparatus again, and the vacuum was evacuated to the level of 10 −4 Pa. Argon was introduced as a discharge gas at a partial pressure of 0.04 Pa and oxygen was introduced as a reaction gas at a partial pressure of 0.04 Pa. When the atmospheric pressure became stable, electric discharge was started to generate plasma on the Si target, and the sputtering process was started. When the process became stable, the shutter was opened and the formation of the SiOx inorganic film on the film was started. When a 50 nm film was deposited, the shutter was closed to complete the film formation. Then, the atmosphere was introduced into the vacuum chamber, and the film having the SiOx inorganic layer formed thereon was taken out.
【0018】このフィルムに樹脂基材より屈折率の小さ
い層(以下、低屈折率層)として、シリカエアロゲル膜
(屈折率1.01、孔径約0.05μm、厚み2μm)
をSiOx無機膜側に設けた。この積層フィルムの低屈
折率層側に透明電極層(ITO)、発光層(TPD/A
lq3)を設け、有機EL素子を作製し、正面輝度、水
蒸気透過度を測定し、直径100mm円柱上で180°
折り曲げてフィルムの耐屈曲性を目視で観察した。正面
輝度は407cd/m2、水蒸気透過度は0.1g/m2
/day未満(信頼限界未満)、直径100mm円柱上
で180°折り曲げても亀裂はなかった。
(実施例2)実施例1と同様にして、有機物層/ポリエ
ーテルスルホン樹脂/有機物層/無機物層の構成とし、
このフィルムに低屈折率層として、ポリイミド空孔体
(屈折率1.20、孔径約0.01μm、厚み2μm)
をSiOx無機膜側に設けた積層フィルムを作製した。
この積層フィルムの低屈折率層側に透明電極層(IT
O)、発光層(TPD/Alq3)を設け、有機EL素
子を作製し、実施例1と同様の測定を行った。正面輝度
は359cd/m2、水蒸気透過度は0.1g/m 2/
day未満(信頼限界未満)、直径100mm円柱上で
180°折り曲げても亀裂はなかった。
(実施例3)透明基板の樹脂基材をポリカーボネート樹
脂(屈折率1.58、厚み200μm)、低屈折率層を
シリカエアロゲル(屈折率1.01、孔径約0.05μ
m、厚み2μm)として、実施例1と同様に有機EL素
子を作成し、測定を行った。正面輝度は397cd/m
2、水蒸気透過度は0.1g/m2/day未満(信頼限
界未満)、直径100mm円柱上で180°折り曲げて
も亀裂はなかった。This film has a smaller refractive index than the resin base material.
Silica airgel film as the first layer (hereinafter, low refractive index layer)
(Refractive index 1.01, hole diameter about 0.05 μm, thickness 2 μm)
Was provided on the SiOx inorganic film side. Low bending of this laminated film
A transparent electrode layer (ITO) and a light emitting layer (TPD / A) on the folding rate layer side.
lq3) Is provided to produce an organic EL device, and the front brightness, water
Measure the vapor permeability and 180 ° on a 100 mm diameter cylinder
After bending, the bending resistance of the film was visually observed. front
Brightness is 407 cd / m2, Water vapor permeability is 0.1g / m2
Less than / day (less than confidence limit), on a 100 mm diameter cylinder
There was no crack even when bent by 180 °.
(Example 2) In the same manner as in Example 1, the organic material layer / polyethylene
Ter sulfone resin / organic material layer / inorganic material layer,
As a low refractive index layer on this film, polyimide porous material
(Refractive index 1.20, pore diameter about 0.01 μm, thickness 2 μm)
Was prepared on the SiOx inorganic film side to prepare a laminated film.
On the low refractive index layer side of this laminated film, a transparent electrode layer (IT
O), light emitting layer (TPD / Alq3) Is provided and the organic EL element is
A child was produced and the same measurement as in Example 1 was performed. Front brightness
Is 359 cd / m2, and water vapor permeability is 0.1 g / m 2/
less than day (less than confidence limit), on a 100 mm diameter cylinder
There was no crack when bent 180 °.
(Example 3) Polycarbonate resin was used as the resin base material of the transparent substrate.
Oil (refractive index 1.58, thickness 200 μm), low refractive index layer
Silica airgel (refractive index 1.01, pore size about 0.05μ
m, thickness 2 μm) as in Example 1.
A child was created and measurements were taken. Front brightness is 397 cd / m
2, Water vapor permeability is 0.1g / m2Less than / day (confidence limit
(Below the boundary), bend 180 ° on a 100 mm diameter cylinder
There was no crack.
【0019】[0019]
【表1】 [Table 1]
【0020】(比較例1)実施例1において、低屈折率
層を設けていない有機EL素子を作成し、実施例1と同
様の測定を行った。正面輝度は251cd/m2、水蒸
気透過度は0.1g/m2/day未満(信頼限界未
満)、直径100mm円柱上で180°折り曲げても亀
裂はなかった。
(比較例2)透明基板の基材をガラス(屈折率1.5
2、厚み700μm)とし、低屈折率層としてシリカエ
アロゲル(屈折率1.01、孔径約0.05μm、厚み
2μm)をガラス上に設けて透明基板を作製した。この
透明基板の低屈折率層側に電極、発光層を設け、有機E
L素子を作製し、実施例1と同様の測定を行った。正面
輝度は414cd/m2、水蒸気透過度は0.1g/m
2/day未満(信頼限界未満)であったが、直径10
0mm円柱上で180°折り曲げが不可能なため、測定
できなかった。(Comparative Example 1) In Example 1, an organic EL device having no low refractive index layer was prepared, and the same measurement as in Example 1 was performed. The front luminance was 251 cd / m 2 , the water vapor permeability was less than 0.1 g / m 2 / day (less than the confidence limit), and there was no crack even when bent 180 ° on a cylinder having a diameter of 100 mm. (Comparative Example 2) The base material of the transparent substrate was glass (refractive index 1.5
2, thickness 700 μm), and silica airgel (refractive index 1.01, pore size about 0.05 μm, thickness 2 μm) was provided on the glass as a low refractive index layer to prepare a transparent substrate. The transparent substrate is provided with an electrode and a light emitting layer on the low refractive index layer side,
An L element was produced and the same measurement as in Example 1 was performed. Front brightness is 414 cd / m 2, water vapor permeability is 0.1 g / m
Less than 2 / day (less than confidence limit), but diameter 10
Since it was impossible to bend 180 ° on a 0 mm cylinder, measurement could not be performed.
【0021】[0021]
【表2】 [Table 2]
【0022】[0022]
【発明の効果】本発明の表示素子用積層フィルムは、光
を外部に取り出す効率が高く、優れた耐屈曲性、水蒸気
バリア性を有しているので、本発明のフィルムを有機E
L発光素子に適用すれば、軽くて割れにくく、より信頼
性の高い表示装置を得ることができる。EFFECT OF THE INVENTION Since the laminated film for a display element of the present invention has a high efficiency of extracting light to the outside, and has excellent bending resistance and water vapor barrier property, the film of the present invention can be produced by organic E
When applied to the L light emitting element, it is possible to obtain a display device that is light and hard to break and has higher reliability.
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 3K007 AB03 AB13 BA07 CA06 DB03 4F100 AA00D AA20 AH01A AH01C AH06 AK01B AK54 AR00E BA05 BA07 BA10A BA10E DC11E EH46 EH66 EJ08 GB41 JD04 JD08E JD20E JK04 JN18B JN18E YY00E 5C094 AA10 AA31 BA27 EB10 JA08 JA13 ─────────────────────────────────────────────────── ─── Continued front page F-term (reference) 3K007 AB03 AB13 BA07 CA06 DB03 4F100 AA00D AA20 AH01A AH01C AH06 AK01B AK54 AR00E BA05 BA07 BA10A BA10E DC11E EH46 EH66 EJ08 GB41 JD04 JD08E JD20E JK04 JN18B JN18E YY00E 5C094 AA10 AA31 BA27 EB10 JA08 JA13
Claims (7)
層、無機物層および該樹脂基材より屈折率の小さい層が
積層された表示素子用積層フィルム。1. A laminated film for a display device, comprising: a resin substrate, and at least one organic layer, an inorganic layer, and a layer having a refractive index smaller than that of the resin layer laminated on the resin substrate.
層、無機物層、樹脂基材より屈折率の小さい層の順に積
層されている請求項1記載の表示素子用積層フィルム。2. The laminated film for a display element according to claim 1, wherein the respective layers are laminated in the order of an organic material layer, a resin base material, an organic material layer, an inorganic material layer, and a layer having a smaller refractive index than the resin base material.
率が1.0〜1.3である請求項1または2記載の表示
素子用積層フィルム。3. The laminated film for a display element according to claim 1, wherein the layer having a smaller refractive index than the resin substrate has a refractive index of 1.0 to 1.3.
径が可視光の波長よりも小さい多孔質体を主成分とする
請求項1〜3何れか一項記載の表示素子用積層フィル
ム。4. The laminated film for a display device according to claim 1, wherein the layer having a refractive index smaller than that of the resin base material is mainly composed of a porous body having a pore diameter smaller than a wavelength of visible light. .
100mm円柱上で180°折り曲げても、亀裂が生じ
ない請求項1〜4何れか一項記載の表示素子用積層フィ
ルム。5. The laminated film for a display element according to claim 1, which has a total thickness of 50 to 1000 μm and does not crack even when bent 180 ° on a cylinder having a diameter of 100 mm.
積層フィルムを用い、前記樹脂基材より屈折率の小さい
層が、表示素子の透明電極層と接するように配置された
表示素子。6. A display comprising the laminated film for a display element according to claim 1, wherein a layer having a refractive index smaller than that of the resin substrate is in contact with a transparent electrode layer of the display element. element.
積層フィルムを用い、前記樹脂基材より屈折率の小さい
層が、エレクトロルミネッセンス素子の透明電極層と接
するように配置されたエレクトロルミネッセンス素子。7. The laminated film for a display device according to claim 1, wherein a layer having a refractive index smaller than that of the resin substrate is arranged so as to be in contact with the transparent electrode layer of the electroluminescence device. Electroluminescent device.
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008226629A (en) * | 2007-03-13 | 2008-09-25 | Sumitomo Bakelite Co Ltd | Optical laminated sheet |
JP2012051172A (en) * | 2010-08-31 | 2012-03-15 | Fujifilm Corp | Functional film and method of manufacturing the same |
WO2016121798A1 (en) * | 2015-01-27 | 2016-08-04 | 日立化成株式会社 | Production method for aerogel laminate, and aerogel laminate roll |
-
2002
- 2002-03-28 JP JP2002090927A patent/JP2003288029A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008226629A (en) * | 2007-03-13 | 2008-09-25 | Sumitomo Bakelite Co Ltd | Optical laminated sheet |
JP2012051172A (en) * | 2010-08-31 | 2012-03-15 | Fujifilm Corp | Functional film and method of manufacturing the same |
US9394416B2 (en) | 2010-08-31 | 2016-07-19 | Fujifilm Corporation | Functional film and method of manufacturing functional film |
KR101789333B1 (en) * | 2010-08-31 | 2017-10-23 | 후지필름 가부시키가이샤 | Functional film and method of manufacturing functional film |
WO2016121798A1 (en) * | 2015-01-27 | 2016-08-04 | 日立化成株式会社 | Production method for aerogel laminate, and aerogel laminate roll |
CN107206760A (en) * | 2015-01-27 | 2017-09-26 | 日立化成株式会社 | The folded volume of the manufacture method and aerogel layer of aerogel layer stack |
JPWO2016121798A1 (en) * | 2015-01-27 | 2017-10-05 | 日立化成株式会社 | Airgel laminate manufacturing method and airgel laminate roll |
US20180009199A1 (en) * | 2015-01-27 | 2018-01-11 | Hitachi Chemical Company, Ltd. | Production method for aerogel laminate, and aerogel laminate roll |
US10556405B2 (en) | 2015-01-27 | 2020-02-11 | Hitachi Chemical Company, Ltd. | Production method for aerogel laminate, and aerogel laminate roll |
US11117353B2 (en) | 2015-01-27 | 2021-09-14 | Showa Denko Materials Co., Ltd. | Production method for aerogel laminate, and aerogel laminate roll |
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