JP2003246841A - Epoxy resin composition and electronic part device - Google Patents
Epoxy resin composition and electronic part deviceInfo
- Publication number
- JP2003246841A JP2003246841A JP2002253794A JP2002253794A JP2003246841A JP 2003246841 A JP2003246841 A JP 2003246841A JP 2002253794 A JP2002253794 A JP 2002253794A JP 2002253794 A JP2002253794 A JP 2002253794A JP 2003246841 A JP2003246841 A JP 2003246841A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- group
- benzoquinone
- addition reaction
- reaction product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 122
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 122
- 239000000203 mixture Substances 0.000 title claims abstract description 64
- AZQWKYJCGOJGHM-UHFFFAOYSA-N para-benzoquinone Natural products O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims abstract description 94
- -1 phosphine compound Chemical class 0.000 claims abstract description 84
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Natural products P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims abstract description 50
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims abstract description 34
- 239000005011 phenolic resin Substances 0.000 claims abstract description 28
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 26
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 13
- 125000004434 sulfur atom Chemical group 0.000 claims abstract description 13
- 229920001568 phenolic resin Polymers 0.000 claims abstract description 11
- 125000004437 phosphorous atom Chemical group 0.000 claims abstract description 11
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000007259 addition reaction Methods 0.000 claims description 136
- 239000007795 chemical reaction product Substances 0.000 claims description 134
- 125000004432 carbon atom Chemical group C* 0.000 claims description 22
- 239000011256 inorganic filler Substances 0.000 claims description 21
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 21
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 19
- 125000003118 aryl group Chemical group 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 15
- 229910052698 phosphorus Inorganic materials 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 239000004593 Epoxy Substances 0.000 claims description 7
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 3
- 125000000101 thioether group Chemical group 0.000 claims description 3
- 239000011342 resin composition Substances 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 238000010521 absorption reaction Methods 0.000 abstract description 11
- 229940005561 1,4-benzoquinone Drugs 0.000 description 38
- VTWDKFNVVLAELH-UHFFFAOYSA-N 2-methylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C=CC1=O VTWDKFNVVLAELH-UHFFFAOYSA-N 0.000 description 31
- AIACLXROWHONEE-UHFFFAOYSA-N 2,3-dimethylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=C(C)C(=O)C=CC1=O AIACLXROWHONEE-UHFFFAOYSA-N 0.000 description 19
- NCCTVAJNFXYWTM-UHFFFAOYSA-N 2-tert-butylcyclohexa-2,5-diene-1,4-dione Chemical compound CC(C)(C)C1=CC(=O)C=CC1=O NCCTVAJNFXYWTM-UHFFFAOYSA-N 0.000 description 19
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 16
- RMMPZDDLWLALLJ-UHFFFAOYSA-N Thermophillin Chemical compound COC1=CC(=O)C(OC)=CC1=O RMMPZDDLWLALLJ-UHFFFAOYSA-N 0.000 description 16
- NADHCXOXVRHBHC-UHFFFAOYSA-N 2,3-dimethoxycyclohexa-2,5-diene-1,4-dione Chemical compound COC1=C(OC)C(=O)C=CC1=O NADHCXOXVRHBHC-UHFFFAOYSA-N 0.000 description 15
- ZXKWUYWWVSKKQZ-UHFFFAOYSA-N cyclohexyl(diphenyl)phosphane Chemical compound C1CCCCC1P(C=1C=CC=CC=1)C1=CC=CC=C1 ZXKWUYWWVSKKQZ-UHFFFAOYSA-N 0.000 description 15
- WXMZPPIDLJRXNK-UHFFFAOYSA-N butyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(CCCC)C1=CC=CC=C1 WXMZPPIDLJRXNK-UHFFFAOYSA-N 0.000 description 14
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 14
- KEJVUXJFDYXFSK-UHFFFAOYSA-N octyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(CCCCCCCC)C1=CC=CC=C1 KEJVUXJFDYXFSK-UHFFFAOYSA-N 0.000 description 14
- 239000000047 product Substances 0.000 description 14
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 14
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 14
- RLQZIECDMISZHS-UHFFFAOYSA-N 2-phenylcyclohexa-2,5-diene-1,4-dione Chemical compound O=C1C=CC(=O)C(C=2C=CC=CC=2)=C1 RLQZIECDMISZHS-UHFFFAOYSA-N 0.000 description 13
- VPLLTGLLUHLIHA-UHFFFAOYSA-N dicyclohexyl(phenyl)phosphane Chemical compound C1CCCCC1P(C=1C=CC=CC=1)C1CCCCC1 VPLLTGLLUHLIHA-UHFFFAOYSA-N 0.000 description 13
- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 13
- 239000003795 chemical substances by application Substances 0.000 description 12
- 150000002430 hydrocarbons Chemical group 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 12
- 239000007983 Tris buffer Substances 0.000 description 11
- HXUARCOTWDKZOU-UHFFFAOYSA-N dioctyl(phenyl)phosphane Chemical compound CCCCCCCCP(CCCCCCCC)C1=CC=CC=C1 HXUARCOTWDKZOU-UHFFFAOYSA-N 0.000 description 11
- ORICWOYODJGJMY-UHFFFAOYSA-N dibutyl(phenyl)phosphane Chemical compound CCCCP(CCCC)C1=CC=CC=C1 ORICWOYODJGJMY-UHFFFAOYSA-N 0.000 description 10
- ZJKWJHONFFKJHG-UHFFFAOYSA-N 2-Methoxy-1,4-benzoquinone Chemical compound COC1=CC(=O)C=CC1=O ZJKWJHONFFKJHG-UHFFFAOYSA-N 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 9
- 229920003986 novolac Polymers 0.000 description 9
- 125000003545 alkoxy group Chemical group 0.000 description 8
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 8
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 8
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 8
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 8
- 238000000465 moulding Methods 0.000 description 8
- DGQOCLATAPFASR-UHFFFAOYSA-N tetrahydroxy-1,4-benzoquinone Chemical compound OC1=C(O)C(=O)C(O)=C(O)C1=O DGQOCLATAPFASR-UHFFFAOYSA-N 0.000 description 8
- ZEGDFCCYTFPECB-UHFFFAOYSA-N 2,3-dimethoxy-1,4-benzoquinone Natural products C1=CC=C2C(=O)C(OC)=C(OC)C(=O)C2=C1 ZEGDFCCYTFPECB-UHFFFAOYSA-N 0.000 description 7
- 150000002989 phenols Chemical class 0.000 description 7
- 238000005476 soldering Methods 0.000 description 7
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 239000003063 flame retardant Substances 0.000 description 6
- 229910052736 halogen Inorganic materials 0.000 description 6
- 239000012778 molding material Substances 0.000 description 6
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 6
- 239000001993 wax Substances 0.000 description 6
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 5
- 125000002723 alicyclic group Chemical group 0.000 description 5
- 125000003277 amino group Chemical group 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 5
- 239000004305 biphenyl Substances 0.000 description 5
- 235000010290 biphenyl Nutrition 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 238000004898 kneading Methods 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 229920000098 polyolefin Polymers 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 4
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 125000005037 alkyl phenyl group Chemical group 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 238000013329 compounding Methods 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 4
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 4
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 4
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 4
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000004104 aryloxy group Chemical group 0.000 description 3
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 150000004780 naphthols Chemical class 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 150000003003 phosphines Chemical class 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 150000004053 quinones Chemical class 0.000 description 3
- 230000003578 releasing effect Effects 0.000 description 3
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 3
- 229960001755 resorcinol Drugs 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 125000000547 substituted alkyl group Chemical group 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 150000004057 1,4-benzoquinones Chemical class 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- MYKLQMNSFPAPLZ-UHFFFAOYSA-N 2,5-dimethylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C(C)=CC1=O MYKLQMNSFPAPLZ-UHFFFAOYSA-N 0.000 description 2
- AMQCWFKKFGSNNA-UHFFFAOYSA-N 2-butylcyclohexa-2,5-diene-1,4-dione Chemical compound CCCCC1=CC(=O)C=CC1=O AMQCWFKKFGSNNA-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000005036 alkoxyphenyl group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- MHFBYODDORCOHT-UHFFFAOYSA-N butyl-bis(4-methylphenyl)phosphane Chemical compound C=1C=C(C)C=CC=1P(CCCC)C1=CC=C(C)C=C1 MHFBYODDORCOHT-UHFFFAOYSA-N 0.000 description 2
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000004203 carnauba wax Substances 0.000 description 2
- 235000013869 carnauba wax Nutrition 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- ADHYEWYQOIXXJV-UHFFFAOYSA-N cyclohexyl-bis(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1CCCCC1 ADHYEWYQOIXXJV-UHFFFAOYSA-N 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 238000007429 general method Methods 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910000000 metal hydroxide Inorganic materials 0.000 description 2
- 150000004692 metal hydroxides Chemical class 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- UTOPWMOLSKOLTQ-UHFFFAOYSA-N octacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O UTOPWMOLSKOLTQ-UHFFFAOYSA-N 0.000 description 2
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 125000003107 substituted aryl group Chemical group 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 235000007586 terpenes Nutrition 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- UIXPTCZPFCVOQF-UHFFFAOYSA-N ubiquinone-0 Chemical compound COC1=C(OC)C(=O)C(C)=CC1=O UIXPTCZPFCVOQF-UHFFFAOYSA-N 0.000 description 2
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 2
- KYLUAQBYONVMCP-UHFFFAOYSA-N (2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P KYLUAQBYONVMCP-UHFFFAOYSA-N 0.000 description 1
- CEOZOEAOJLFZND-UHFFFAOYSA-N (4-methylphenyl)-dioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)C1=CC=C(C)C=C1 CEOZOEAOJLFZND-UHFFFAOYSA-N 0.000 description 1
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 description 1
- QKUSYGZVIAWWPY-UHFFFAOYSA-N 1,3-dioxane;7-oxabicyclo[4.1.0]heptane Chemical compound C1COCOC1.C1CCCC2OC21 QKUSYGZVIAWWPY-UHFFFAOYSA-N 0.000 description 1
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- BLBVJHVRECUXKP-UHFFFAOYSA-N 2,3-dimethoxy-1,4-dimethylbenzene Chemical group COC1=C(C)C=CC(C)=C1OC BLBVJHVRECUXKP-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- SENUUPBBLQWHMF-UHFFFAOYSA-N 2,6-dimethylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C=C(C)C1=O SENUUPBBLQWHMF-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- BNDNAARXJVXTED-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-yl 4-methyl-7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1OC(=O)C1(C)CC2OC2CC1 BNDNAARXJVXTED-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 101100321669 Fagopyrum esculentum FA02 gene Proteins 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003172 aldehyde group Chemical group 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229920005603 alternating copolymer Polymers 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical group [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 125000005110 aryl thio group Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- FSHXODRICVTBJO-UHFFFAOYSA-N benzene-1,2-diol;benzene-1,4-diol Chemical compound OC1=CC=C(O)C=C1.OC1=CC=CC=C1O FSHXODRICVTBJO-UHFFFAOYSA-N 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 1
- CRGRWBQSZSQVIE-UHFFFAOYSA-N diazomethylbenzene Chemical compound [N-]=[N+]=CC1=CC=CC=C1 CRGRWBQSZSQVIE-UHFFFAOYSA-N 0.000 description 1
- PKEYSVJAUISCGA-UHFFFAOYSA-N dibutyl-(2-methylphenyl)phosphane Chemical compound CCCCP(CCCC)C1=CC=CC=C1C PKEYSVJAUISCGA-UHFFFAOYSA-N 0.000 description 1
- IRUZBSXYWMIFPP-UHFFFAOYSA-N dibutyl-(4-methylphenyl)phosphane Chemical compound CCCCP(CCCC)C1=CC=C(C)C=C1 IRUZBSXYWMIFPP-UHFFFAOYSA-N 0.000 description 1
- MKHYBAIPMJGEQO-UHFFFAOYSA-N dicyclohexyl-(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C1CCCCC1)C1CCCCC1 MKHYBAIPMJGEQO-UHFFFAOYSA-N 0.000 description 1
- NKVOVJOFRHVNKV-UHFFFAOYSA-N dicyclohexyl-(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C1CCCCC1)C1CCCCC1 NKVOVJOFRHVNKV-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910001701 hydrotalcite Inorganic materials 0.000 description 1
- 229960001545 hydrotalcite Drugs 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 235000013872 montan acid ester Nutrition 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Chemical group CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- DOXFBSZBACYHFY-UHFFFAOYSA-N phenol;stilbene Chemical class OC1=CC=CC=C1.C=1C=CC=CC=1C=CC1=CC=CC=C1 DOXFBSZBACYHFY-UHFFFAOYSA-N 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical compound NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 125000005415 substituted alkoxy group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- MDCWDBMBZLORER-UHFFFAOYSA-N triphenyl borate Chemical compound C=1C=CC=CC=1OB(OC=1C=CC=CC=1)OC1=CC=CC=C1 MDCWDBMBZLORER-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、成形材料、積層板
用又は接着剤の材料として好適なエポキシ樹脂組成物、
及びこのエポキシ樹脂組成物により封止された素子を備
えた電子部品装置に関する。TECHNICAL FIELD The present invention relates to an epoxy resin composition suitable as a molding material, a laminate, or an adhesive material,
Also, the present invention relates to an electronic component device including an element sealed with the epoxy resin composition.
【0002】[0002]
【従来の技術】従来から、成形材料、積層板用、接着剤
用材料等にエポキシ樹脂が広範囲に使用され、トランジ
スタ、IC等の電子部品の素子封止の分野ではエポキシ
樹脂組成物が広く用いられている。この理由としては、
エポキシ樹脂が成形性、電気特性、耐湿性、耐熱性、機
械特性、インサート品との接着性等の諸特性にバランス
がとれているためである。特に、オルソクレゾールノボ
ラック型エポキシ樹脂とフェノールノボラック硬化剤の
組み合わせはこれらのバランスに優れており、IC封止
用成形材料のベース樹脂として主流になっている。ま
た、硬化促進剤としては3級アミン、イミダゾール等の
アミン化合物、ホスフィン類、ホスホニウム等のリン化
合物が一般に使用されている。2. Description of the Related Art Conventionally, epoxy resins have been widely used as molding materials, laminates, adhesive materials, etc., and epoxy resin compositions have been widely used in the field of encapsulating electronic parts such as transistors and ICs. Has been. The reason for this is
This is because the epoxy resin has a good balance of various properties such as moldability, electrical properties, moisture resistance, heat resistance, mechanical properties, and adhesiveness with insert products. In particular, a combination of an orthocresol novolac type epoxy resin and a phenol novolac curing agent has an excellent balance of these, and has become the mainstream as a base resin for a molding material for IC encapsulation. Further, as the curing accelerator, an amine compound such as a tertiary amine or imidazole, or a phosphorus compound such as phosphine or phosphonium is generally used.
【0003】[0003]
【発明が解決しようとする課題】近年、電子部品のプリ
ント配線板への高密度実装化が進んでおり、これに伴い
電子部品は従来のピン挿入型のパッケージから、表面実
装型のパッケージが主流になりつつある。IC、LSI
などの表面実装型ICは、実装密度を高くするために素
子のパッケージに対する占有体積がしだいに大きくな
り、パッケージの肉厚は非常に薄くなってきた。さら
に、ピン挿入型パッケージは、ピンを配線板に挿入した
後に配線板裏面からはんだ付けが行われるためパッケー
ジが直接高温にさらされることがなかったのに対し、表
面実装型ICは配線板表面に仮止めを行った後、はんだ
バスやリフロー装置などで処理されるため、直接はんだ
付け温度にさらされる。この結果、ICパッケージが吸
湿した場合、はんだ付け時に吸湿水分が急激に膨張しパ
ッケージクラックに至り、これが大きな問題になってい
る。In recent years, high density mounting of electronic parts on a printed wiring board has been progressing, and along with this, electronic parts are mainly surface mount type packages instead of conventional pin insertion type packages. Is becoming. IC, LSI
In surface mounting type ICs such as those described above, the volume occupied by the elements in the package is gradually increasing in order to increase the mounting density, and the thickness of the package has become very thin. Further, in the pin insertion type package, since the pins are inserted into the wiring board and soldering is performed from the rear surface of the wiring board, the package is not directly exposed to high temperature, whereas the surface mount type IC is mounted on the surface of the wiring board. After the temporary fixing, it is treated with a solder bath or a reflow device, so that it is directly exposed to the soldering temperature. As a result, when the IC package absorbs moisture, the absorbed moisture rapidly expands during soldering and leads to package cracking, which is a serious problem.
【0004】このはんだ付け時のパッケージクラックに
対する耐性、いわゆる耐リフロークラック性を改良する
ために、無機充填剤を多く含むエポキシ樹脂組成物が提
案されている。しかし、無機充填剤量の増加は成形時の
流動性の低下を招き、充填不良、ボイド発生等の成形上
の障害やICチップのボンディングワイヤが断線し導通
不良が発生するなど、成形品の性能低下を招くため、無
機充填剤の増加量には限界があり、結果として耐リフロ
ークラック性の著しい向上が望めないという問題があっ
た。In order to improve resistance to package cracks at the time of soldering, so-called reflow crack resistance, an epoxy resin composition containing a large amount of an inorganic filler has been proposed. However, an increase in the amount of inorganic filler leads to a decrease in fluidity during molding, which results in molding defects such as filling defects and voids, and IC chip bonding wires are broken and conduction defects occur. Since this causes a decrease, there is a limit to the amount of increase in the inorganic filler, and as a result, there is a problem in that reflow crack resistance cannot be significantly improved.
【0005】特にトリフェニルホスフィン等のリン系硬
化促進剤や1,8−ジアザビシクロ[5.4.0]ウン
デセン−7等のアミン系硬化促進剤を用いた場合、流動
性が低く、耐リフロークラック性の著しい向上が望めな
いのが実情である。このような問題点を改善するため
に、トリフェニルホスフィンと1,4−ベンゾキノンと
の付加反応物を硬化促進剤として用いる方法(特開平9
−157497公報)、電子供与性置換基を有するフェ
ニル基を3つ有するホスフィンと無水マレイン酸又はキ
ノン類との付加反応物を硬化促進剤として用いる方法
(特開平7−228672号公報)等が提案されている
が、吸湿時の硬化性に問題があった。吸湿時の硬化性が
低い場合、エポキシ樹脂組成物が製造、輸送及び使用時
に吸湿し、硬化不良などの問題を起こしやすい。特に、
夏場の湿度の高い時期に顕著である。Particularly when a phosphorus-based curing accelerator such as triphenylphosphine or an amine-based curing accelerator such as 1,8-diazabicyclo [5.4.0] undecene-7 is used, the fluidity is low and the reflow crack resistance is low. The reality is that no significant improvement in sex can be expected. In order to improve such a problem, a method of using an addition reaction product of triphenylphosphine and 1,4-benzoquinone as a curing accelerator (Japanese Patent Laid-Open Publication No. H9-96952).
No. 157497), a method using an addition reaction product of a phosphine having three phenyl groups having an electron-donating substituent and maleic anhydride or a quinone as a curing accelerator (JP-A-7-228672). However, there was a problem with the curability when absorbing moisture. When the curability at the time of moisture absorption is low, the epoxy resin composition absorbs moisture at the time of production, transportation and use, and problems such as curing failure are likely to occur. In particular,
It is particularly noticeable during high humidity in summer.
【0006】更に最近、環境意識の高まりから、従来の
鉛含有はんだから鉛非含有はんだを使用することが提案
されている。鉛含有はんだに比べ、鉛非含有はんだは融
点が高いことから、はんだ付けを行う温度も約20℃上
げる必要がある。はんだ付け時の温度が上がると、水分
が蒸発し膨張して生じる応力も増大し、パッケージクラ
ックが起こりやすくなる。このため、従来に比べ更に耐
リフロークラック性に優れるエポキシ樹脂組成物が要求
されている。[0006] More recently, due to increasing environmental awareness, it has been proposed to use lead-free solder instead of conventional lead-containing solder. Since lead-free solder has a higher melting point than lead-containing solder, it is necessary to raise the soldering temperature by about 20 ° C. When the temperature at the time of soldering rises, the stress generated by the evaporation of water and expansion also increases, and package cracks easily occur. Therefore, there is a demand for an epoxy resin composition that is more excellent in reflow crack resistance than ever before.
【0007】本発明は、このような状況に鑑みなされた
もので、吸湿時の硬化性、流動性及び高温においても耐
リフロークラック性に優れるエポキシ樹脂組成物、及び
このエポキシ樹脂組成物により封止された素子を備えた
電子部品装置を提供しようとするものである。The present invention has been made in view of the above circumstances, and an epoxy resin composition having excellent curability and fluidity when absorbing moisture and reflow crack resistance even at high temperatures, and sealing with the epoxy resin composition It is intended to provide an electronic component device provided with the above-mentioned element.
【0008】[0008]
【課題を解決するための手段】本発明者らは上記の課題
を解決するために鋭意検討を重ねた結果、ジアリールス
ルフィド骨格を有する特定のエポキシ樹脂等の硫黄原子
を含有するエポキシ樹脂と少なくとも一つの置換基を有
するホスフィン化合物とキノン化合物を組み合わせて配
合することにより、吸湿時の硬化性、流動性及び従来に
比べ更に耐リフロークラック性に優れるエポキシ樹脂組
成物が得られ、上記の目的を達成しうることを見い出
し、本発明を完成するに至った。Means for Solving the Problems As a result of intensive studies to solve the above problems, the present inventors have found that at least one epoxy resin containing a sulfur atom such as a specific epoxy resin having a diaryl sulfide skeleton is used. By combining and combining a phosphine compound having one substituent and a quinone compound, an epoxy resin composition having excellent curability upon moisture absorption, fluidity, and reflow crack resistance superior to conventional ones can be obtained, and the above-mentioned object is achieved. The inventors have discovered what is possible and have completed the present invention.
【0009】すなわち、本発明は以下に関する。
(1)(A)硫黄原子を含有するエポキシ樹脂、(B)
フェノール樹脂及び(C)リン原子に少なくとも一つの
アルキル基が結合したホスフィン化合物とキノン化合物
との付加反応物を必須成分とするエポキシ樹脂組成物。
(2)(A)硫黄原子を含有するエポキシ樹脂がスルフ
ィド骨格を有するエポキシ樹脂である(1)記載のエポ
キシ樹脂組成物。
(3)(A)硫黄原子を含有するエポキシ樹脂が下記一
般式(I)で示される化合物である(1)又は(2)記
載のエポキシ樹脂組成物That is, the present invention relates to the following: (1) (A) Epoxy resin containing sulfur atom, (B)
An epoxy resin composition comprising a phenol resin and (C) an addition reaction product of a phosphine compound having at least one alkyl group bonded to a phosphorus atom and a quinone compound as essential components. (2) The epoxy resin composition according to (1), wherein the epoxy resin containing a sulfur atom (A) is an epoxy resin having a sulfide skeleton. (3) The epoxy resin composition according to (1) or (2), wherein the epoxy resin containing a sulfur atom (A) is a compound represented by the following general formula (I).
【化5】
(ここで、式(I)中のR1は水素原子又は炭素数1〜
12のアルキル基及びアリール基を示し、それぞれ全て
が同一でも異なっていてもよい。nは、平均値であり0
〜10の正数を示す。)。
(4)(C)リン原子に少なくとも一つのアルキル基が
結合したホスフィン化合物とキノン化合物との付加反応
物が、下記一般式(II)で示されるホスフィン化合物と
下記一般式(III)で示されるキノン化合物との付加反
応物である(1)〜(3)記載のエポキシ樹脂組成物[Chemical 5] (Here, R 1 in the formula (I) is a hydrogen atom or a carbon number of 1 to
12 alkyl and aryl groups are shown, which may be the same or different. n is an average value and is 0
Indicates a positive number from -10. ). (4) (C) An addition reaction product of a phosphine compound having a phosphorus atom bonded to at least one alkyl group and a quinone compound is represented by the phosphine compound represented by the following general formula (II) and the following general formula (III). The epoxy resin composition according to (1) to (3), which is an addition reaction product with a quinone compound.
【化6】
(ここで、式(II)中のR2は炭素数1〜12のアルキ
ル基を示し、R3及びR 4は、水素原子又は炭素数1〜
12の炭化水素基を示し、それぞれ全てが同一でも異な
っていてもよい。また、式(III)中のR5〜R7は、
水素原子又は炭素数1〜18の炭化水素基を示し、それ
ぞれ全てが同一でも異なっていてもよい。R5とR6が
結合して環状構造となっていてもよい。)。
(5)(D)無機充填剤をさらに含有し、その配合量が
エポキシ樹脂組成物に対して55〜90体積%である
(1)〜(4)記載のエポキシ樹脂組成物。
(6)(A)硫黄原子を含有するエポキシ樹脂が下記一
般式(IV)で表されるエポキシ樹脂を含有してなる
(1)〜(5)のいずれかに記載のエポキシ樹脂組成物[Chemical 6]
(Where R in the formula (II)TwoIs an alky having 1 to 12 carbons
R groupThreeAnd R FourIs a hydrogen atom or a carbon number of 1 to
12 hydrocarbon groups, all of which are the same or different
You may In addition, R in the formula (III)5~ R7Is
A hydrogen atom or a hydrocarbon group having 1 to 18 carbon atoms,
All of them may be the same or different. R5And R6But
It may be bonded to form a ring structure. ).
(5) (D) An inorganic filler is further contained, and the blending amount thereof is
55 to 90% by volume based on the epoxy resin composition
The epoxy resin composition according to any one of (1) to (4).
(6) (A) An epoxy resin containing a sulfur atom is one of the following
Containing an epoxy resin represented by general formula (IV)
The epoxy resin composition according to any one of (1) to (5)
【化7】
(ここで、一般式(IV)中のnは平均値であり0〜10
の正数を示す。)。
(7)(B)フェノール樹脂が下記一般式(V)〜(I
X)のいずれかで示されるフェノール樹脂の少なくとも
1種を含有してなる(1)〜(6)のいずれかに記載の
エポキシ樹脂組成物[Chemical 7] (Here, n in the general formula (IV) is an average value and is 0 to 10
Indicates a positive number. ). (7) (B) Phenolic resin is represented by the following general formulas (V) to (I
The epoxy resin composition according to any one of (1) to (6), which comprises at least one phenolic resin represented by any of X).
【化8】
(ここで、一般式(V)〜(IX)中のR8〜R17は水
素原子又は炭素数1〜6のアルキル基を示し、それぞれ
全てが同一でも異なっていてもよい。nは平均値であり
0〜10の正数を示し、iは0〜3の整数、jは0〜2
の整数、kは0〜4の整数、rは0〜4の整数を示
す。)。並びに
(8)(1)〜(7)のいずれかに記載のエポキシ樹脂
組成物により封止された素子を備えた電子部品装置。[Chemical 8] (Here, R < 8 > -R < 17 > in General Formula (V)-(IX) shows a hydrogen atom or a C1-C6 alkyl group, and all may be the same or different. N is an average value. Is a positive number from 0 to 10, i is an integer from 0 to 3, and j is 0 to 2.
Is an integer, k is an integer of 0 to 4, and r is an integer of 0 to 4. ). And (8) An electronic component device comprising an element sealed with the epoxy resin composition according to any one of (1) to (7).
【0010】[0010]
【発明の実施の形態】本発明において用いられる(A)
硫黄原子を含有するエポキシ樹脂としては特に制限はな
いが、スルフィド骨格を有するエポキシ樹脂が好まし
く、下記一般式で示されるエポキシ樹脂がより好まし
い。BEST MODE FOR CARRYING OUT THE INVENTION (A) Used in the Present Invention
The sulfur atom-containing epoxy resin is not particularly limited, but an epoxy resin having a sulfide skeleton is preferable, and an epoxy resin represented by the following general formula is more preferable.
【0011】[0011]
【化9】
(ここで、式(I)中のR1は水素原子又は炭素数1〜
12のアルキル基及びアリール基を示し、それぞれ全て
が同一でも異なっていてもよい。nは、平均値であり、
0〜10の正数を示す。)[Chemical 9] (Here, R 1 in the formula (I) is a hydrogen atom or a carbon number of 1 to
12 alkyl and aryl groups are shown, which may be the same or different. n is an average value,
A positive number from 0 to 10 is shown. )
【0012】上記一般式(I)で示される硫黄原子を含
有するエポキシ樹脂の中でも下記一般式(IV)で示され
るエポキシ樹脂がさらに好ましい。このようなエポキシ
樹脂としては、YSLV-120TE(新日鐵化学社製)等が市販品
として入手可能である。Among the epoxy resins containing a sulfur atom represented by the above general formula (I), the epoxy resin represented by the following general formula (IV) is more preferable. As such an epoxy resin, YSLV-120TE (manufactured by Nippon Steel Chemical Co., Ltd.) and the like are commercially available.
【0013】[0013]
【化10】
(ここで、一般式(IV)中のnは平均値であり0〜10
の正数を示す。)[Chemical 10] (Here, n in the general formula (IV) is an average value and is 0 to 10
Indicates a positive number. )
【0014】本発明のエポキシ樹脂組成物にはエポキシ
樹脂として硫黄原子を含有するエポキシ樹脂(A)は単
独で用いてもよいが、1種以上の(A)以外のエポキシ
樹脂併用してもよい。ただし、その性能を発揮するため
に、エポキシ樹脂全量に対して、(A)成分を合わせて
30重量%以上使用することが好ましく、50重量%以
上使用することがより好ましい。併用できるエポキシ樹
脂としては特に制限はないが、例えば、一般に使用され
ている1分子中に2個以上のエポキシ基を有するエポキ
シ樹脂で、フェノールノボラック型エポキシ樹脂、オル
ソクレゾールノボラック型エポキシ樹脂をはじめとする
フェノール、クレゾール、キシレノール、レゾルシン、
カテコール、ビスフェノールA、ビスフェノールF等の
フェノール類及び/又はα−ナフトール、β−ナフトー
ル、ジヒドロキシナフタレン等のナフトール類とホルム
アルデヒド、アセトアルデヒド、プロピオンアルデヒ
ド、ベンズアルデヒド、サリチルアルデヒド等のアルデ
ヒド基を有する化合物とを酸性触媒下で縮合又は共縮合
させて得られるノボラック樹脂をエポキシ化したもの、
ビスフェノールA、ビスフェノールF、ビスフェノール
S、アルキル置換又は非置換のビフェノール、スチルベ
ン系フェノール類等のジグリシジルエーテル、ブタンジ
オ一ル、ポリエチレングリコール、ポリプロピレングリ
コール等のアルコール類のグリシジルエーテル、フタル
酸、イソフタル酸、テトラヒドロフタル酸等のカルボン
酸類のグリシジルエステル、アニリン、イソシアヌール
酸等の窒素原子に結合した活性水素をグリシジル基で置
換したもの等のグリシジル型またはメチルグリシジル型
のエポキシ樹脂、分子内のオレフィン結合をエポキシ化
して得られるビニルシクロヘキセンジエポキシド、3,
4−エポキシシクロヘキシルメチル−3,4−エポキシ
シクロヘキサンカルボキシレート、2−(3,4−エポ
キシ)シクロヘキシル−5,5−スピロ(3,4−エポ
キシ)シクロヘキサン−m−ジオキサン等の脂環型エポ
キシ樹脂、パラキシリレン及び/又はメタキシリレン変
性フェノール樹脂のグリシジルエーテル、テルペン変性
フェノール樹脂のグリシジルエーテル、ジシクロペンタ
ジエン変性フェノール樹脂のグリシジルエーテル、シク
ロペンタジエン変性フェノール樹脂のグリシジルエーテ
ル、多環芳香環変性フェノール樹脂のグリシジルエーテ
ル、ナフタレン環含有フェノール樹脂のグリシジルエー
テル、ビフェニル型エポキシ樹脂、ハロゲン化フェノー
ルノボラック型エポキシ樹脂などが挙げられる。これら
の2種以上を組み合わせて併用してもよい。なかでも、
下記一般式(III)〜(VIII)のいずれかで示されるエ
ポキシ樹脂が耐リフロークラック性及び流動性の点で好
ましく、特に4,4'−ビス(2,3−エポキシプロポ
キシ)−3,3',5,5'−テトラメチルビフェニルが
より好ましい。In the epoxy resin composition of the present invention, the epoxy resin (A) containing a sulfur atom may be used alone as the epoxy resin, but one or more epoxy resins other than (A) may be used in combination. . However, in order to exert its performance, the total amount of the component (A) is preferably 30% by weight or more, and more preferably 50% by weight or more, based on the total amount of the epoxy resin. There is no particular limitation on the epoxy resin that can be used in combination, for example, commonly used epoxy resins having two or more epoxy groups in one molecule, such as phenol novolac type epoxy resin and orthocresol novolac type epoxy resin. Phenol, cresol, xylenol, resorcin,
Acidic phenols such as catechol, bisphenol A and bisphenol F and / or naphthols such as α-naphthol, β-naphthol and dihydroxynaphthalene, and compounds having an aldehyde group such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde and salicylaldehyde Epoxidized novolak resin obtained by condensation or co-condensation under a catalyst,
Bisphenol A, bisphenol F, bisphenol S, alkyl-substituted or unsubstituted biphenol, diglycidyl ether of stilbene phenols, glycidyl ether of alcohols such as butanediol, polyethylene glycol, polypropylene glycol, phthalic acid, isophthalic acid, Glycidyl-type or methylglycidyl-type epoxy resins such as glycidyl esters of carboxylic acids such as tetrahydrophthalic acid, aniline, isocyanuric acid, etc., in which the active hydrogen bonded to the nitrogen atom is replaced with a glycidyl group, olefin bonds in the molecule Vinyl cyclohexene diepoxide obtained by epoxidation, 3,
Alicyclic epoxy resins such as 4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 2- (3,4-epoxy) cyclohexyl-5,5-spiro (3,4-epoxy) cyclohexane-m-dioxane , Glycidyl ether of para-xylylene and / or meta-xylylene modified phenolic resin, glycidyl ether of terpene modified phenolic resin, glycidyl ether of dicyclopentadiene modified phenolic resin, glycidyl ether of cyclopentadiene modified phenolic resin, glycidyl ether of polycyclic aromatic ring modified phenolic resin , Glycidyl ether of naphthalene ring-containing phenol resin, biphenyl type epoxy resin, halogenated phenol novolac type epoxy resin and the like. You may use together combining these 2 or more types. Above all,
Epoxy resins represented by any of the following general formulas (III) to (VIII) are preferable in terms of reflow crack resistance and fluidity, and particularly 4,4′-bis (2,3-epoxypropoxy) -3,3 More preferred is', 5,5'-tetramethylbiphenyl.
【0015】[0015]
【化11】
(ここで、一般式(X)〜(XV)中のR19〜R29は
水素原子又は炭素数1〜12のアルキル基を示し、それ
ぞれ全てが同一でも異なっていてもよい。nは平均値で
あり0〜10の正数、pは1又は0を示し、l、mはそ
れぞれ平均値であり0〜11の正数で(l+m)は平均
値であり1〜11の正数を示す。iは0〜3の整数、j
は0〜2の整数、kは0〜4の整数、qは1〜3の整数
を示す。)上記一般式(X)〜(XV)中のR19〜R
29について、それぞれ全てが同一でも異なっていても
よいの意味は、例えば式(III)中の16個のR19の
全てが同一でも異なっていてもよいの意味である。他の
R20〜R29についても式中に含まれるそれぞれの個
数について全てが同一でも異なっていてもよいとの意味
である。また、R19〜R29はそれぞれが同一でも異
なっていてもよい。例えば式(X)中のR20とR21
の全てについて同一でも異なっていてもよい。[Chemical 11] (Here, R < 19 > -R < 29 > in General formula (X)-(XV) shows a hydrogen atom or a C1-C12 alkyl group, all may be the same or different. N is an average value. Is a positive number from 0 to 10, p is 1 or 0, 1 and m are average values, positive numbers from 0 to 11 (l + m) are average values, and positive numbers from 1 to 11 are shown. i is an integer of 0 to 3, j
Is an integer of 0 to 2, k is an integer of 0 to 4, and q is an integer of 1 to 3. ) R 19 to R in the above general formulas (X) to (XV)
With respect to 29 , the meaning that they may all be the same or different means, for example, that all 16 R 19 s in formula (III) may be the same or different. With respect to the other R 20 to R 29 , it is meant that all the numbers included in the formula may be the same or different. Further, R 19 to R 29 may be the same or different. For example, R 20 and R 21 in formula (X)
Of all may be the same or different.
【0016】上記一般式(XV)で示されるエポキシ樹脂
としては、l個の構成単位及びm個の構成単位をランダ
ムに含むランダム共重合体、交互に含む交互共重合体、
規則的に含む共重合体、ブロック状に含むブロック共重
合体が挙げられ、これらのいずれか1種を単独で用いて
も、2種以上を組み合わせて用いてもよい。As the epoxy resin represented by the above general formula (XV), a random copolymer containing 1 constitutional unit and m constitutional units at random, an alternating copolymer containing alternating units,
Examples thereof include a regularly-containing copolymer and a block-containing block copolymer, and any one of these may be used alone, or two or more thereof may be used in combination.
【0017】本発明において用いられる(B)フェノー
ル樹脂としては特に制限はないが、例えば、一般に使用
されている1分子中に2個以上のフェノール性水酸基を
有するフェノール樹脂で、フェノール、クレゾール、キ
シレノール、レゾルシン、カテコール、ヒドロキノン、
ビスフェノールA、ビスフェノールF、フェニルフェノ
ール、アミノフェノール等のフェノール類及び/又はα
−ナフトール、β−ナフトール、ジヒドロキシナフタレ
ン等のナフトール類とホルムアルデヒド、アセトアルデ
ヒド、プロピオンアルデヒド、ベンズアルデヒド、サリ
チルアルデヒド等のアルデヒド類とを酸性触媒下で縮合
又は共縮合させて得られる樹脂、フェノール類及び/又
はナフトール類とジメトキシパラキシレンやビス(メト
キシメチル)ビフェニルから合成されるフェノール・ア
ラルキル樹脂、ナフトール・アラルキル樹脂等のアラル
キル型フェノール樹脂、パラキシリレン及び/又はメタ
キシリレン変性フェノール樹脂、メラミン変性フェノー
ル樹脂、テルペン変性フェノール樹脂、ジシクロペンタ
ジエン変性フェノール樹脂、シクロペンタジエン変性フ
ェノール樹脂、多環芳香環変性フェノール樹脂、レゾル
シン、カテコール、ヒドロキノン、ビスフェノールA、
ビスフェノールFなどの2官能フェノール化合物などが
挙げられ、これらを単独で用いても2種以上を組み合わ
せて用いてもよい。なかでも、耐リフロークラック性の
観点からは下記一般式(IX)〜(XII)のいずれかで示
されるフェノール樹脂が好ましい。これら一般式(IX)
〜(XII)のいずれかで示されるフェノール樹脂は、い
ずれか1種を単独で用いても2種以上を組み合わせて用
いてもよいが、その性能を発揮するためには、(B)成
分のフェノール樹脂全量に対して合わせて30重量%以
上使用することが好ましく、50重量%以上使用するこ
とがより好ましい。The (B) phenol resin used in the present invention is not particularly limited. For example, it is a commonly used phenol resin having two or more phenolic hydroxyl groups in one molecule, such as phenol, cresol and xylenol. , Resorcin, catechol, hydroquinone,
Phenols such as bisphenol A, bisphenol F, phenylphenol, aminophenol and / or α
-Naphthol, β-naphthol, naphthols such as dihydroxynaphthalene and formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, resins obtained by condensation or co-condensation with aldehydes such as salicylaldehyde under acidic catalyst, phenols and / or Phenol / aralkyl resins synthesized from naphthols and dimethoxyparaxylene or bis (methoxymethyl) biphenyl, aralkyl type phenolic resins such as naphthol / aralkyl resins, paraxylylene and / or metaxylylene modified phenolic resins, melamine modified phenolic resins, terpene modified phenols Resin, dicyclopentadiene modified phenol resin, cyclopentadiene modified phenol resin, polycyclic aromatic ring modified phenol resin, resorcin, catechol Hydroquinone, bisphenol A,
Examples thereof include bifunctional phenol compounds such as bisphenol F, and these may be used alone or in combination of two or more kinds. Among them, from the viewpoint of reflow crack resistance, a phenol resin represented by any of the following general formulas (IX) to (XII) is preferable. These general formulas (IX)
The phenol resin represented by any of (XII) to (XII) may be used alone or in combination of two or more, but in order to exert its performance, The total amount of the phenolic resin is preferably 30% by weight or more, more preferably 50% by weight or more.
【0018】[0018]
【化12】
(ここで、一般式(V)〜(IX)中のR8〜R17は水
素原子又は炭素数1〜6のアルキル基を示し、それぞれ
全てが同一でも異なっていてもよい。nは平均値であり
0〜10の正数を示し、iは0〜3の整数、jは0〜2
の整数、kは0〜4の整数、rは0〜4の整数を示
す。)[Chemical 12] (Here, R < 8 > -R < 17 > in General Formula (V)-(IX) shows a hydrogen atom or a C1-C6 alkyl group, and all may be the same or different. N is an average value. Is a positive number from 0 to 10, i is an integer from 0 to 3, and j is 0 to 2.
Is an integer, k is an integer of 0 to 4, and r is an integer of 0 to 4. )
【0019】上記一般式(V)〜(IX)中のR8〜R
17について、それぞれ全てが同一でも異なっていても
よいの意味は、例えば式(IX)中のi個のR8の全てが
同一でも相互に異なっていてもよいの意味である。他の
R9〜R17についても式中に含まれるそれぞれの個数
について全てが同一でも相互に異なっていてもよいとの
意味である。また、R8〜R17はそれぞれが同一でも
異なっていてもよい。例えばR8とR9の全てについて
同一でも異なっていてもよく、R12とR14の全てに
ついて同一でも異なっていてもよい。上記一般式(IX)
〜(XII)中のnは0〜10の範囲であることが必要
で、10を超えた場合は(B)成分の溶融粘度が高くな
るため、エポキシ樹脂組成物の溶融成形時の粘度も高く
なり、未充填不良やボンディングワイヤ(素子とリード
を接続する金線)の変形を引き起こしやすくなる。1分
子中の平均nは0〜4の範囲に設定されることが好まし
い。R 8 to R in the above general formulas (V) to (IX)
With respect to 17 , the meaning that all of them may be the same or different means that, for example, all i R 8 s in the formula (IX) may be the same or different from each other. It is also meant that the other R 9 to R 17 may all be the same or different from each other with respect to the respective numbers included in the formula. Further, R 8 to R 17 may be the same or different. For example, all of R 8 and R 9 may be the same or different, and all of R 12 and R 14 may be the same or different. The above general formula (IX)
N in (XII) needs to be in the range of 0 to 10. When it exceeds 10, the melt viscosity of the component (B) becomes high, and therefore the viscosity at the time of melt molding of the epoxy resin composition is also high. As a result, unfilling failure and deformation of the bonding wire (gold wire connecting the element and the lead) are likely to occur. The average n in one molecule is preferably set in the range of 0 to 4.
【0020】本発明において(A)エポキシ樹脂と
(B)フェノール樹脂との配合比率は、全エポキシ樹脂
のエポキシ当量に対する全フェノール樹脂の水酸基当量
の比率(フェノール樹脂中の水酸基数/エポキシ樹脂中
のエポキシ基数)で0.5〜2.0の範囲に設定される
ことが好ましく、0.7〜1.5がより好ましく、0.
8〜1.3がさらに好ましい。この比率が0.5未満で
はエポキシ樹脂の硬化が不充分となり、硬化物の耐熱
性、耐湿性及び電気特性が劣る傾向があり、2.0を超
えるとフェノール樹脂成分が過剰なため硬化が不充分と
なったり、硬化樹脂中に多量のフェノール性水酸基が残
るため電気特性及び耐湿性が悪くなったりする傾向があ
る。In the present invention, the compounding ratio of the epoxy resin (A) and the phenol resin (B) is the ratio of the hydroxyl equivalents of all phenolic resins to the epoxy equivalents of all epoxy resins (number of hydroxyl groups in phenolic resin / epoxy resin in epoxy resin). The number of epoxy groups) is preferably set in the range of 0.5 to 2.0, more preferably 0.7 to 1.5, and 0.1.
8-1.3 is more preferable. If this ratio is less than 0.5, the curing of the epoxy resin will be insufficient, and the heat resistance, moisture resistance and electrical properties of the cured product will tend to be inferior. If it exceeds 2.0, the curing will be inadequate because the phenol resin component will be excessive. There is a tendency that the electric properties and the moisture resistance are deteriorated because the amount becomes sufficient and a large amount of phenolic hydroxyl groups remain in the cured resin.
【0021】本発明において用いられる(C)リン原子
に少なくとも一つのアルキル基が結合したホスフィン化
合物とキノン化合物との付加反応物としては、硬化促進
剤として働くものであれば特に制限されるものではない
が、なかでも、硬化性の観点から下記一般式(II)で示
されるホスフィン化合物と下記一般式(III)で示され
るキノン化合物との付加反応物が好ましい。The addition reaction product of the phosphine compound (C) having at least one alkyl group bonded to the phosphorus atom and the quinone compound used in the present invention is not particularly limited as long as it acts as a curing accelerator. Of these, an addition reaction product of a phosphine compound represented by the following general formula (II) and a quinone compound represented by the following general formula (III) is preferable from the viewpoint of curability.
【0022】[0022]
【化13】
(ここで、式(II)中のR2は炭素数1〜12のアルキ
ル基を示し、R3及びR 4は、水素原子又は炭素数1〜
12の炭化水素基を示し、それぞれ全てが同一でも異な
っていてもよい。また、式(III)中のR5〜R7は、
水素原子又は炭素数1〜18の炭化水素基を示し、それ
ぞれ全てが同一でも異なっていてもよい。R5とR6が
結合して環状構造となっていてもよい。)[Chemical 13]
(Where R in the formula (II)TwoIs an alky having 1 to 12 carbons
R groupThreeAnd R FourIs a hydrogen atom or a carbon number of 1 to
12 hydrocarbon groups, all of which are the same or different
You may In addition, R in the formula (III)5~ R7Is
A hydrogen atom or a hydrocarbon group having 1 to 18 carbon atoms,
All of them may be the same or different. R5And R6But
It may be bonded to form a ring structure. )
【0023】上記一般式(I)中のR1は、炭素数1〜
12のアルキル基を示すが、炭素数1〜12のアルキル
基としては特に制限はなく、例えば、メチル基、エチル
基、プロピル基、イソプロピル基、n-ブチル基、sec-
ブチル基、tert-ブチル基、ペンチル基、ヘキシル基、
オクチル基、デキル基、ドデキル基等の鎖状アルキル
基、シクロペンチル基、シクロヘキシル基、シクロヘプ
チル基、シクロペンテニル基、シクロヘキセニル基等の
環状アルキル基、ベンジル基等のアリール基置換アルキ
ル基、メトキシ基置換アルキル基、エトキシ基置換アル
キル基、ブトキシ基置換アルキル基等のアルコキシ基置
換アルキル基、ジメチルアミノ基、ジエチルアミノ基等
のアミノ基置換アルキル基、水酸基置換アルキル基等が
挙げられる。R 1 in the above general formula (I) has 1 to 1 carbon atoms.
12 is an alkyl group, but the alkyl group having 1 to 12 carbon atoms is not particularly limited, and examples thereof include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, sec-
Butyl group, tert-butyl group, pentyl group, hexyl group,
Chain alkyl group such as octyl group, decyl group, dodecyl group, cyclopentyl group, cyclohexyl group, cycloalkyl group such as cycloheptyl group, cyclopentenyl group, cyclohexenyl group, aryl group-substituted alkyl group such as benzyl group, methoxy group Examples thereof include a substituted alkyl group, an ethoxy group-substituted alkyl group, an alkoxy group-substituted alkyl group such as a butoxy group-substituted alkyl group, an amino group-substituted alkyl group such as a dimethylamino group and a diethylamino group, and a hydroxyl group-substituted alkyl group.
【0024】また、上記一般式(II)中のR2〜R
3は、水素原子又は炭素数1〜12の炭化水素基を示す
が、炭素数1〜12の炭化水素基としては特に制限はな
く、例えば、炭素数1〜12の置換又は非置換の脂肪族
炭化水素基、炭素数1〜12の置換又は非置換の脂環式
炭化水素基、炭素数1〜12の置換又は非置換の芳香族
炭化水素基等が挙げられる。炭素数1〜12の置換又は
非置換の脂肪族炭化水素基としては、例えば、メチル
基、エチル基、プロピル基、イソプロピル基、n-ブチ
ル基、sec-ブチル基、tert-ブチル基、ペンチル基、ヘ
キシル基、オクチル基、デキル基、ドデキル基等の鎖状
アルキル基、シクロペンチル基、シクロヘキシル基、シ
クロヘプチル基、シクロペンテニル基、シクロヘキセニ
ル基等の環状アルキル基、ベンジル基等のアリール基置
換アルキル基、メトキシ基置換アルキル基、エトキシ基
置換アルキル基、ブトキシ基置換アルキル基等のアルコ
キシ基置換アルキル基、ジメチルアミノ基、ジエチルア
ミノ基等のアミノ基置換アルキル基、水酸基置換アルキ
ル基等が挙げられる。炭素数1〜12の置換又は非置換
の脂環式炭化水素基としては、例えば、シクロペンチル
基、シクロヘキシル基、シクロヘプチル基、シクロペン
テニル基、シクロヘキセニル基等及びこれらにアルキル
基、アルコキシ基、アリール基、水酸基、アミノ基、ハ
ロゲン等が置換したものなどが挙げられる。炭素数1〜
12の置換又は非置換の芳香族炭化水素基としては、例
えば、フェニル基、ナフチル基等のアリール基、トリル
基、ジメチルフェニル基、エチルフェニル基、ブチルフ
ェニル基、t-ブチルフェニル基、ジメチルナフチル基
等のアルキル基置換アリール基、メトキシフェニル基、
エトキシフェニル基、ブトキシフェニル基、t-ブトキ
シフェニル基、メトキシナフチル基等のアルコキシ基置
換アリール基、ジメチルアミノ基、ジエチルアミノ基等
のアミノ基置換アリール基、ヒドロキシフェニル基、ジ
ヒドロキシフェニル基等のハロゲン置換アリール基、フ
ェノキシ基、クレゾキシ基等のアリーロキシ基、フェニ
ルチオ基、トリルチオ基、ジフェニルアミノ基など、及
びこれらにアミノ基、ハロゲン等が置換したものなどが
挙げられる。なかでも、置換又は非置換のアルキル基及
びアリール基が好ましい。Further, R 2 to R in the above general formula (II)
3 represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, but the hydrocarbon group having 1 to 12 carbon atoms is not particularly limited, and includes, for example, a substituted or unsubstituted aliphatic group having 1 to 12 carbon atoms. Examples thereof include a hydrocarbon group, a substituted or unsubstituted alicyclic hydrocarbon group having 1 to 12 carbon atoms, and a substituted or unsubstituted aromatic hydrocarbon group having 1 to 12 carbon atoms. Examples of the substituted or unsubstituted aliphatic hydrocarbon group having 1 to 12 carbon atoms include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, pentyl group. , Chain alkyl groups such as hexyl group, octyl group, decyl group and dodecyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclopentenyl group, cyclohexenyl group and other cyclic alkyl groups, benzyl group and other aryl group substituted alkyl Group, a methoxy group-substituted alkyl group, an ethoxy group-substituted alkyl group, an alkoxy group-substituted alkyl group such as a butoxy group-substituted alkyl group, an amino group-substituted alkyl group such as a dimethylamino group and a diethylamino group, and a hydroxyl group-substituted alkyl group. Examples of the substituted or unsubstituted alicyclic hydrocarbon group having 1 to 12 carbon atoms include a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclopentenyl group, a cyclohexenyl group, and the like, and an alkyl group, an alkoxy group, an aryl. Examples thereof include those substituted with groups, hydroxyl groups, amino groups, halogens and the like. Carbon number 1
Examples of the substituted or unsubstituted aromatic hydrocarbon group of 12 include aryl groups such as phenyl group and naphthyl group, tolyl group, dimethylphenyl group, ethylphenyl group, butylphenyl group, t-butylphenyl group and dimethylnaphthyl group. An alkyl group-substituted aryl group such as a group, a methoxyphenyl group,
Alkoxy group substituted aryl groups such as ethoxyphenyl group, butoxyphenyl group, t-butoxyphenyl group and methoxynaphthyl group, amino group substituted aryl groups such as dimethylamino group and diethylamino group, halogen substitution such as hydroxyphenyl group and dihydroxyphenyl group Examples thereof include aryloxy groups such as aryl groups, phenoxy groups and cresoxy groups, phenylthio groups, tolylthio groups, diphenylamino groups, and the like, and those in which amino groups, halogens and the like are substituted. Of these, a substituted or unsubstituted alkyl group and aryl group are preferable.
【0025】上記一般式(III)中のR5〜R7は、水
素原子又は炭素数1〜18の炭化水素基を示すが、炭素
数1〜18の炭化水素基としては特に制限はなく、例え
ば、炭素数1〜18の置換又は非置換の脂肪族炭化水素
基、炭素数1〜12の置換又は非置換の脂環式炭化水素
基、炭素数1〜12の置換又は非置換の芳香族炭化水素
基等が挙げられる。R 5 to R 7 in the above general formula (III) represent a hydrogen atom or a hydrocarbon group having 1 to 18 carbon atoms, but the hydrocarbon group having 1 to 18 carbon atoms is not particularly limited, For example, a substituted or unsubstituted aliphatic hydrocarbon group having 1 to 18 carbon atoms, a substituted or unsubstituted alicyclic hydrocarbon group having 1 to 12 carbon atoms, a substituted or unsubstituted aromatic group having 1 to 12 carbon atoms Examples thereof include hydrocarbon groups.
【0026】炭素数1〜12の置換又は非置換の脂肪族
炭化水素基としては、例えば、メチル基、エチル基、プ
ロピル基、イソプロピル基、n-ブチル基、sec-ブチル
基、tert-ブチル基、ペンチル基、ヘキシル基、オクチ
ル基、デキル基、ドデキル基等のアルキル基、アリル
基、メトキシ基、エトキシ基、プロポキシル基、n-ブ
トキシ基、tert-ブトキシ基等のアルコキシ基、ジメチ
ルアミノ基、ジエチルアミノ基等のアルキルアミノ基、
メチルチオ基、エチルチオ基、ブチルチオ基、ドデキル
チオ基等のアルキルチオ基、アミノ基置換アルキル基、
アルコキシ置換アルキル基、水酸基置換アルキル基、ア
リール基置換アルキル基等の置換アルキル基、アミノ基
置換アルコキシ基、水酸基置換アルコキシ基、アリール
基置換アルコキシ基等の置換アルコキシ基などが挙げら
れる。Examples of the substituted or unsubstituted aliphatic hydrocarbon group having 1 to 12 carbon atoms include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, sec-butyl group and tert-butyl group. Alkyl group such as pentyl group, hexyl group, octyl group, decyl group and dodecyl group, allyl group, methoxy group, ethoxy group, propoxy group, alkoxy group such as n-butoxy group and tert-butoxy group, dimethylamino group , An alkylamino group such as a diethylamino group,
Alkylthio groups such as methylthio group, ethylthio group, butylthio group, dodecylthio group, amino group-substituted alkyl groups,
Examples thereof include a substituted alkyl group such as an alkoxy-substituted alkyl group, a hydroxyl group-substituted alkyl group and an aryl group-substituted alkyl group, an amino group-substituted alkoxy group, a hydroxyl group-substituted alkoxy group and a substituted alkoxy group such as an aryl group-substituted alkoxy group.
【0027】炭素数1〜18の置換又は非置換の脂環式
炭化水素基としては、例えば、シクロペンチル基、シク
ロヘキシル基、シクロヘプチル基、シクロペンテニル
基、シクロヘキセニル基等及びこれらにアルキル基、ア
ルコキシ基、アリール基、水酸基、アミノ基、ハロゲン
等が置換したものなどが挙げられる。Examples of the substituted or unsubstituted alicyclic hydrocarbon group having 1 to 18 carbon atoms include cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclopentenyl group, cyclohexenyl group and the like, and alkyl group, alkoxy group Examples thereof include those substituted with groups, aryl groups, hydroxyl groups, amino groups, halogens and the like.
【0028】炭素数1〜18の置換又は非置換の芳香族
炭化水素基としては、例えば、フェニル基、トリル基等
のアリール基、ジメチルフェニル基、エチルフェニル
基、ブチルフェニル基、t-ブチルフェニル基等のアル
キル基置換アリール基、メトキシフェニル基、エトキシ
フェニル基、ブトキシフェニル基、t-ブトキシフェニ
ル基等のアルコキシ基置換アリール基、フェノキシ基、
クレゾキシ基等のアリーロキシ基、フェニルチオ基、ト
リルチオ基、ジフェニルアミノ基など、及びこれらにア
ミノ基、ハロゲン等が置換したもの等が挙げられる。Examples of the substituted or unsubstituted aromatic hydrocarbon group having 1 to 18 carbon atoms include aryl groups such as phenyl group and tolyl group, dimethylphenyl group, ethylphenyl group, butylphenyl group and t-butylphenyl. Alkyl-substituted aryl group such as group, methoxyphenyl group, ethoxyphenyl group, butoxyphenyl group, alkoxy group-substituted aryl group such as t-butoxyphenyl group, phenoxy group,
An aryloxy group such as a cresoxy group, a phenylthio group, a tolylthio group, a diphenylamino group, and the like, and a group in which an amino group, a halogen or the like is substituted, and the like can be given.
【0029】なかでも、水素原子、置換又は非置換のア
ルキル基、置換又は非置換のアルコキシ基、置換又は非
置換のアリーロキシ基、置換又は非置換のアリール基、
置換又は非置換のアルキルチオ基及び置換又は非置換の
アリールチオ基が好ましい。Among them, a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryloxy group, a substituted or unsubstituted aryl group,
A substituted or unsubstituted alkylthio group and a substituted or unsubstituted arylthio group are preferred.
【0030】上記一般式(II)で示されるホスフィン化
合物の中でも、吸湿時の硬化性の観点からは、トリシク
ロヘキシルホスフィン、トリブチルホスフィン、トリオ
クチルホスフィン等のトリアルキルホスフィンが好まし
い。耐リフロークラック性の観点からは、シクロヘキシ
ルジフェニルホスフィン、ジシクロヘキシルフェニルホ
スフィン、ブチルジフェニルホスフィン、ジブチルフェ
ニルホスフィン、オクチルジフェニルホスフィン、ジオ
クチルフェニルホスフィン等のアルキルジフェニルホス
フィン及びジアルキルフェニルホスフィンが好ましい。Among the phosphine compounds represented by the general formula (II), trialkylphosphines such as tricyclohexylphosphine, tributylphosphine and trioctylphosphine are preferable from the viewpoint of curability when absorbing moisture. From the viewpoint of reflow crack resistance, alkyldiphenylphosphine and dialkylphenylphosphine such as cyclohexyldiphenylphosphine, dicyclohexylphenylphosphine, butyldiphenylphosphine, dibutylphenylphosphine, octyldiphenylphosphine and dioctylphenylphosphine are preferable.
【0031】また、上記一般式(III)で示されるキノ
ン化合物は、R5とR6が結合し環状構造となっていて
もよい。本発明において用いられる、R5とR6が結合
して環状構造をとる多環式のキノン化合物としては、特
に制限はないが、例えば、置換したテトラメチレン基、
テトラメチン基等が結合した下記一般式(XVI)〜(XVI
II)のいずれかで示される多環式キノン化合物等が挙げ
られる。The quinone compound represented by the general formula (III) may have a ring structure in which R 5 and R 6 are bonded. The polycyclic quinone compound having a cyclic structure formed by combining R 5 and R 6 used in the present invention is not particularly limited, and examples thereof include a substituted tetramethylene group,
The following general formulas (XVI) to (XVI having a tetramethine group bonded thereto
Examples thereof include polycyclic quinone compounds represented by any of II).
【0032】[0032]
【化14】 [Chemical 14]
【0033】上記一般式(III)で示されるキノン化合
物のなかでも、ホスフィン化合物との反応性の観点から
は1,4−ベンゾキノン及びメチル−1,4−ベンゾキ
ノンが好ましく、吸湿時の硬化性の観点からは、2,3
−ジメトキシ−1,4ベンゾキノン、2,5−ジメトキ
シ−1,4−ベンゾキノン、メトキシ−1,4−ベンゾ
キノン等のアルコキシ基置換1,4−ベンゾキノン、及
び2,3−ジメチル−1,4−ベンゾキノン、2,5−
ジメチル−1,4−ベンゾキノン、メチル−1,4−ベ
ンゾキノン等のアルキル基置換1,4−ベンゾキノンが
好ましく、保存安定性の観点からは、2,5−ジ−t−
ブチル−1,4−ベンゾキノン、t−ブチル−1,4−
ベンゾキノン、フェニル−1,4−ベンゾキノンが好ま
しい。Among the quinone compounds represented by the above general formula (III), 1,4-benzoquinone and methyl-1,4-benzoquinone are preferable from the viewpoint of reactivity with the phosphine compound, and the curability at the time of moisture absorption is high. From a perspective, a few
-Alkoxy group-substituted 1,4-benzoquinone such as dimethoxy-1,4 benzoquinone, 2,5-dimethoxy-1,4-benzoquinone and methoxy-1,4-benzoquinone, and 2,3-dimethyl-1,4-benzoquinone , 2,5-
An alkyl group-substituted 1,4-benzoquinone such as dimethyl-1,4-benzoquinone and methyl-1,4-benzoquinone is preferable, and 2,5-di-t- from the viewpoint of storage stability.
Butyl-1,4-benzoquinone, t-butyl-1,4-
Benzoquinone and phenyl-1,4-benzoquinone are preferred.
【0034】上記一般式(II)で示されるホスフィン化
合物と上記一般式(III)で示されるキノン化合物との
付加反応物の構造としては、例えば、下記一般式(XI
X)で示される化合物が挙げられる。The structure of the addition reaction product of the phosphine compound represented by the general formula (II) and the quinone compound represented by the general formula (III) is, for example, the following general formula (XI
Examples include compounds represented by X).
【0035】[0035]
【化15】
(ここで、R2は炭素数1〜12のアルキル基を示し、
R3及びR4は、水素原子又は炭素数1〜12の炭化水
素基を示し、R5〜R7は、水素原子又は炭素数1〜1
8の炭化水素基を示し、それぞれ全てが同一でも異なっ
ていてもよい。R 5とR6が結合して環状構造となって
いてもよい。)[Chemical 15]
(Where RTwoRepresents an alkyl group having 1 to 12 carbon atoms,
RThreeAnd RFourIs a hydrogen atom or hydrocarbon water having 1 to 12 carbon atoms
Indicates a basic group, R5~ R7Is a hydrogen atom or a carbon number of 1 to 1.
8 hydrocarbon groups, all of which are the same or different
May be. R 5And R6Combine to form a ring structure
You may stay. )
【0036】(C)リン原子に少なくとも一つのアルキ
ル基が結合したホスフィン化合物とキノン化合物との付
加反応物のなかでも、吸湿時の硬化性の観点からは、ト
リシクロヘキシルホスフィンと1,4−ベンゾキノンと
の付加反応物、トリシクロヘキシルホスフィンとメチル
−1,4−ベンゾキノンとの付加反応物、トリシクロヘ
キシルホスフィンと2,3−ジメチル−1,4−ベンゾ
キノンとの付加反応物、トリシクロヘキシルホスフィン
と2,5−ジメチル−1,4−ベンゾキノンとの付加反
応物、トリシクロヘキシルホスフィンとメトキシ−1,
4−ベンゾキノンとの付加反応物、トリシクロヘキシル
ホスフィンと2,3−ジメトキシ−1,4−ベンゾキノ
ンとの付加反応物、トリシクロヘキシルホスフィンと
2,5−ジメトキシ−1,4−ベンゾキノンとの付加反
応物、トリブチルホスフィンと1,4−ベンゾキノンと
の付加反応物、トリブチルホスフィンとメチル−1,4
−ベンゾキノンとの付加反応物、トリブチルホスフィン
と2,3−ジメチル−1,4−ベンゾキノンとの付加反
応物、トリブチルホスフィンと2,5−ジメチル−1,
4−ベンゾキノンとの付加反応物、トリブチルホスフィ
ンとメトキシ−1,4−ベンゾキノンとの付加反応物、
トリブチルホスフィンと2,3−ジメトキシ−1,4−
ベンゾキノンとの付加反応物、トリブチルホスフィンと
2,5−ジメトキシ−1,4−ベンゾキノンとの付加反
応物、トリオクチルホスフィンと1,4−ベンゾキノン
との付加反応物、トリオクチルホスフィンとメチル−
1,4−ベンゾキノンとの付加反応物、トリオクチルホ
スフィンと2,3−ジメチル−1,4−ベンゾキノンと
の付加反応物、トリオクチルホスフィンと2,5−ジメ
チル−1,4−ベンゾキノンとの付加反応物、トリオク
チルホスフィンとメトキシ−1,4−ベンゾキノンとの
付加反応物、トリオクチルホスフィンと2,3−ジメト
キシ−1,4−ベンゾキノンとの付加反応物、トリオク
チルホスフィンと2,5−ジメトキシ−1,4−ベンゾ
キノンとの付加反応物等のトリアルキルホスフィンとキ
ノン化合物との付加反応物が好ましい。Among the addition reaction products of (C) a phosphine compound having at least one alkyl group bonded to a phosphorus atom and a quinone compound, tricyclohexylphosphine and 1,4-benzoquinone are used from the viewpoint of curability during moisture absorption. Addition reaction product with tricyclohexylphosphine and methyl-1,4-benzoquinone, addition reaction product with tricyclohexylphosphine and 2,3-dimethyl-1,4-benzoquinone, tricyclohexylphosphine and 2, Addition reaction product with 5-dimethyl-1,4-benzoquinone, tricyclohexylphosphine and methoxy-1,
Addition reaction product of 4-benzoquinone, addition reaction product of tricyclohexylphosphine and 2,3-dimethoxy-1,4-benzoquinone, addition reaction product of tricyclohexylphosphine and 2,5-dimethoxy-1,4-benzoquinone , Tributylphosphine and 1,4-benzoquinone addition reaction product, tributylphosphine and methyl-1,4
-Addition reaction product of benzoquinone, addition reaction product of tributylphosphine and 2,3-dimethyl-1,4-benzoquinone, tributylphosphine and 2,5-dimethyl-1,
Addition reaction product with 4-benzoquinone, addition reaction product with tributylphosphine and methoxy-1,4-benzoquinone,
Tributylphosphine and 2,3-dimethoxy-1,4-
Addition reaction product of benzoquinone, addition reaction product of tributylphosphine and 2,5-dimethoxy-1,4-benzoquinone, addition reaction product of trioctylphosphine and 1,4-benzoquinone, trioctylphosphine and methyl-
Addition reaction product of 1,4-benzoquinone, addition reaction product of trioctylphosphine and 2,3-dimethyl-1,4-benzoquinone, addition reaction product of trioctylphosphine and 2,5-dimethyl-1,4-benzoquinone Reaction product, addition reaction product of trioctylphosphine and methoxy-1,4-benzoquinone, addition reaction product of trioctylphosphine and 2,3-dimethoxy-1,4-benzoquinone, trioctylphosphine and 2,5-dimethoxy An addition reaction product of a trialkylphosphine and a quinone compound such as an addition reaction product of -1,4-benzoquinone is preferable.
【0037】耐リフロークラック性の観点からは、シク
ロヘキシルジフェニルホスフィンと1,4−ベンゾキノ
ンとの付加反応物、シクロヘキシルジフェニルホスフィ
ンとメチル−1,4−ベンゾキノンとの付加反応物、シ
クロヘキシルジフェニルホスフィンと2,3−ジメチル
−1,4−ベンゾキノンとの付加反応物、シクロヘキシ
ルジフェニルホスフィンと2,5−ジメチル−1,4−
ベンゾキノンとの付加反応物、シクロヘキシルジフェニ
ルホスフィンとメトキシ−1,4−ベンゾキノンとの付
加反応物、シクロヘキシルジフェニルホスフィンと2,
3−ジメトキシ−1,4−ベンゾキノンとの付加反応
物、シクロヘキシルジフェニルホスフィンと2,5−ジ
メトキシ−1,4−ベンゾキノンとの付加反応物、ブチ
ルジフェニルホスフィンと1,4−ベンゾキノンとの付
加反応物、ブチルジフェニルホスフィンとメチル−1,
4−ベンゾキノンとの付加反応物、ブチルジフェニルホ
スフィンと2,3−ジメチル−1,4−ベンゾキノンと
の付加反応物、ブチルジフェニルホスフィンと2,5−
ジメチル−1,4−ベンゾキノンとの付加反応物、ブチ
ルジフェニルホスフィンとメトキシ−1,4−ベンゾキ
ノンとの付加反応物、ブチルジフェニルホスフィンと
2,3−ジメトキシ−1,4−ベンゾキノンとの付加反
応物、ブチルジフェニルホスフィンと2,5−ジメトキ
シ−1,4−ベンゾキノンとの付加反応物、オクチルジ
フェニルホスフィンと1,4−ベンゾキノンとの付加反
応物、オクチルジフェニルホスフィンとメチル−1,4
−ベンゾキノンとの付加反応物、オクチルジフェニルホ
スフィンと2,3−ジメチル−1,4−ベンゾキノンと
の付加反応物、オクチルジフェニルホスフィンと2,5
−ジメチル−1,4−ベンゾキノンとの付加反応物、オ
クチルジフェニルホスフィンとメトキシ−1,4−ベン
ゾキノンとの付加反応物、オクチルジフェニルホスフィ
ンと2,3−ジメトキシ−1,4−ベンゾキノンとの付
加反応物、オクチルジフェニルホスフィンと2,5−ジ
メトキシ−1,4−ベンゾキノンとの付加反応物、ジシ
クロヘキシルフェニルホスフィンと1,4−ベンゾキノ
ンとの付加反応物、ジシクロヘキシルフェニルホスフィ
ンとメチル−1,4−ベンゾキノンとの付加反応物、ジ
シクロヘキシルフェニルホスフィンと2,3−ジメチル
−1,4−ベンゾキノンとの付加反応物、ジシクロヘキ
シルフェニルホスフィンと2,5−ジメチル−1,4−
ベンゾキノンとの付加反応物、ジシクロヘキシルフェニ
ルホスフィンとメトキシ−1,4−ベンゾキノンとの付
加反応物、ジシクロヘキシルフェニルホスフィンと2,
3−ジメトキシ−1,4−ベンゾキノンとの付加反応
物、ジシクロヘキシルフェニルホスフィンと2,5−ジ
メトキシ−1,4−ベンゾキノンとの付加反応物、ジブ
チルフェニルホスフィンとメチル−1,4−ベンゾキノ
ンとの付加反応物、ジブチルフェニルホスフィンと2,
3−ジメチル−1,4−ベンゾキノンとの付加反応物、
ジブチルフェニルホスフィンと2,5−ジメチル−1,
4−ベンゾキノンとの付加反応物、ジブチルフェニルホ
スフィンとメトキシ−1,4−ベンゾキノンとの付加反
応物、ジブチルフェニルホスフィンと2,3−ジメトキ
シ−1,4−ベンゾキノンとの付加反応物、ジブチルフ
ェニルホスフィンと2,5−ジメトキシ−1,4−ベン
ゾキノンとの付加反応物、ジオクチルフェニルホスフィ
ンと1,4−ベンゾキノンとの付加反応物、ジオクチル
フェニルホスフィンとメチル−1,4−ベンゾキノンと
の付加反応物、ジオクチルフェニルホスフィンと2,3
−ジメチル−1,4−ベンゾキノンとの付加反応物、ジ
オクチルフェニルホスフィンと2,5−ジメチル−1,
4−ベンゾキノンとの付加反応物、ジオクチルフェニル
ホスフィンとメトキシ−1,4−ベンゾキノンとの付加
反応物、ジオクチルフェニルホスフィンと2,3−ジメ
トキシ−1,4−ベンゾキノンとの付加反応物、ジオク
チルフェニルホスフィンと2,5−ジメトキシ−1,4
−ベンゾキノンとの付加反応物等のアルキルジフェニル
ホスフィン又はジアルキルフェニルホスフィンとキノン
化合物との付加反応物が好ましく、なかでも、シクロヘ
キシルジフェニルホスフィンと1,4−ベンゾキノンと
の付加反応物、ブチルジフェニルホスフィンと1,4−
ベンゾキノンとの付加反応物、オクチルジフェニルホス
フィンと1,4−ベンゾキノンとの付加反応物等のアル
キルジフェニルホスフィンと1,4−ベンゾキノンとの
付加反応物がより好ましい。From the viewpoint of reflow crack resistance, an addition reaction product of cyclohexyldiphenylphosphine and 1,4-benzoquinone, an addition reaction product of cyclohexyldiphenylphosphine and methyl-1,4-benzoquinone, cyclohexyldiphenylphosphine and 2, Addition reaction product with 3-dimethyl-1,4-benzoquinone, cyclohexyldiphenylphosphine and 2,5-dimethyl-1,4-
Addition reaction product of benzoquinone, addition reaction product of cyclohexyldiphenylphosphine and methoxy-1,4-benzoquinone, cyclohexyldiphenylphosphine and 2,
Addition reaction product of 3-dimethoxy-1,4-benzoquinone, addition reaction product of cyclohexyldiphenylphosphine and 2,5-dimethoxy-1,4-benzoquinone, addition reaction product of butyldiphenylphosphine and 1,4-benzoquinone , Butyldiphenylphosphine and methyl-1,
Addition reaction product of 4-benzoquinone, addition reaction product of butyldiphenylphosphine and 2,3-dimethyl-1,4-benzoquinone, butyldiphenylphosphine and 2,5-
Addition reaction product of dimethyl-1,4-benzoquinone, addition reaction product of butyldiphenylphosphine and methoxy-1,4-benzoquinone, addition reaction product of butyldiphenylphosphine and 2,3-dimethoxy-1,4-benzoquinone Addition product of butyldiphenylphosphine and 2,5-dimethoxy-1,4-benzoquinone, addition reaction product of octyldiphenylphosphine and 1,4-benzoquinone, octyldiphenylphosphine and methyl-1,4
-Addition reaction product with benzoquinone, addition reaction product with octyldiphenylphosphine and 2,3-dimethyl-1,4-benzoquinone, octyldiphenylphosphine and 2,5
-Addition reaction product of dimethyl-1,4-benzoquinone, addition reaction product of octyldiphenylphosphine and methoxy-1,4-benzoquinone, addition reaction of octyldiphenylphosphine and 2,3-dimethoxy-1,4-benzoquinone , An addition reaction product of octyldiphenylphosphine and 2,5-dimethoxy-1,4-benzoquinone, an addition reaction product of dicyclohexylphenylphosphine and 1,4-benzoquinone, dicyclohexylphenylphosphine and methyl-1,4-benzoquinone Addition reaction product of dicyclohexylphenylphosphine and 2,3-dimethyl-1,4-benzoquinone, dicyclohexylphenylphosphine and 2,5-dimethyl-1,4-
Addition reaction product of benzoquinone, addition reaction product of dicyclohexylphenylphosphine and methoxy-1,4-benzoquinone, dicyclohexylphenylphosphine and 2,
Addition reaction product of 3-dimethoxy-1,4-benzoquinone, addition reaction product of dicyclohexylphenylphosphine and 2,5-dimethoxy-1,4-benzoquinone, addition product of dibutylphenylphosphine and methyl-1,4-benzoquinone Reactant, dibutylphenylphosphine and 2,
An addition reaction product with 3-dimethyl-1,4-benzoquinone,
Dibutylphenylphosphine and 2,5-dimethyl-1,
Addition reaction product of 4-benzoquinone, addition reaction product of dibutylphenylphosphine and methoxy-1,4-benzoquinone, addition reaction product of dibutylphenylphosphine and 2,3-dimethoxy-1,4-benzoquinone, dibutylphenylphosphine And an addition reaction product of 2,5-dimethoxy-1,4-benzoquinone, an addition reaction product of dioctylphenylphosphine and 1,4-benzoquinone, an addition reaction product of dioctylphenylphosphine and methyl-1,4-benzoquinone, Dioctylphenylphosphine and a few
-Addition reaction product with dimethyl-1,4-benzoquinone, dioctylphenylphosphine and 2,5-dimethyl-1,
Addition reaction product of 4-benzoquinone, addition reaction product of dioctylphenylphosphine and methoxy-1,4-benzoquinone, addition reaction product of dioctylphenylphosphine and 2,3-dimethoxy-1,4-benzoquinone, dioctylphenylphosphine And 2,5-dimethoxy-1,4
An addition reaction product of an alkyldiphenylphosphine or a dialkylphenylphosphine and a quinone compound such as an addition reaction product of benzoquinone is preferred, and an addition reaction product of cyclohexyldiphenylphosphine and 1,4-benzoquinone, butyldiphenylphosphine and 1 , 4-
Addition reaction products of alkyldiphenylphosphine and 1,4-benzoquinone such as addition reaction products of benzoquinone and addition products of octyldiphenylphosphine and 1,4-benzoquinone are more preferable.
【0038】また、保存安定性の観点からは、トリシク
ロヘキシルホスフィンとt−ブチル−1,4−ベンゾキ
ノンとの付加反応物、トリブチルホスフィンとt−ブチ
ル−1,4−ベンゾキノンとの付加反応物、トリオクチ
ルホスフィンとt−ブチル−1,4−ベンゾキノンとの
付加反応物、ジシクロヘキシルフェニルホスフィンとt
−ブチル−1,4−ベンゾキノンとの付加反応物、ジブ
チルフェニルホスフィンとt−ブチル−1,4−ベンゾ
キノンとの付加反応物、ジオクチルフェニルホスフィン
とt−ブチル−1,4−ベンゾキノンとの付加反応物、
シクロヘキシルジフェニルホスフィンとt−ブチル−
1,4−ベンゾキノンとの付加反応物、ブチルジフェニ
ルホスフィンとt−ブチル−1,4−ベンゾキノンとの
付加反応物、オクチルジフェニルホスフィンとt−ブチ
ル−1,4−ベンゾキノンとの付加反応物、ジシクロヘ
キシル−p−トリルホスフィンとt−ブチル−1,4−
ベンゾキノンとの付加反応物、ジブチル−p−トリルホ
スフィンとt−ブチル−1,4−ベンゾキノンとの付加
反応物、ジオクチル−p−トリルホスフィンとt−ブチ
ル−1,4−ベンゾキノンとの付加反応物、シクロヘキ
シルジ−p−トリルホスフィンとt−ブチル−1,4−
ベンゾキノンとの付加反応物、ブチルジ−p−トリルホ
スフィンとt−ブチル−1,4−ベンゾキノンとの付加
反応物、オクチルジ−p−トリルホスフィンとt−ブチ
ル−1,4−ベンゾキノンとの付加反応物、トリシクロ
ヘキシルホスフィンとフェニル−1,4−ベンゾキノン
との付加反応物、トリブチルホスフィンとフェニル−
1,4−ベンゾキノンとの付加反応物、トリオクチルホ
スフィンとフェニル−1,4−ベンゾキノンとの付加反
応物、ジシクロヘキシルフェニルホスフィンとフェニル
−1,4−ベンゾキノンとの付加反応物、ジブチルフェ
ニルホスフィンとフェニル−1,4−ベンゾキノンとの
付加反応物、ジオクチルフェニルホスフィンとフェニル
−1,4−ベンゾキノンとの付加反応物、シクロヘキシ
ルジフェニルホスフィンとフェニル−1,4−ベンゾキ
ノンとの付加反応物、ブチルジフェニルホスフィンとフ
ェニル−1,4−ベンゾキノンとの付加反応物、オクチ
ルジフェニルホスフィンとフェニル−1,4−ベンゾキ
ノンとの付加反応物、ジシクロヘキシル−p−トリルホ
スフィンとフェニル−1,4−ベンゾキノンとの付加反
応物、ジブチル−p−トリルホスフィンとフェニル−
1,4−ベンゾキノンとの付加反応物、ジオクチル−p
−トリルホスフィンとフェニル−1,4−ベンゾキノン
との付加反応物、シクロヘキシルジ−p−トリルホスフ
ィンとフェニル−1,4−ベンゾキノンとの付加反応
物、ブチルジ−p−トリルホスフィンとフェニル−1,
4−ベンゾキノンとの付加反応物、オクチルジ−p−ト
リルホスフィンとフェニル−1,4−ベンゾキノンとの
付加反応物等が好ましく、なかでも、トリシクロヘキシ
ルホスフィンとt−ブチル−1,4−ベンゾキノンとの
付加反応物、トリブチルホスフィンとt−ブチル−1,
4−ベンゾキノンとの付加反応物、トリオクチルホスフ
ィンとt−ブチル−1,4−ベンゾキノンとの付加反応
物、ジシクロヘキシルフェニルホスフィンとt−ブチル
−1,4−ベンゾキノンとの付加反応物、ジブチルフェ
ニルホスフィンとt−ブチル−1,4−ベンゾキノンと
の付加反応物、ジオクチルフェニルホスフィンとt−ブ
チル−1,4−ベンゾキノンとの付加反応物、シクロヘ
キシルジフェニルホスフィンとt−ブチル−1,4−ベ
ンゾキノンとの付加反応物、ブチルジフェニルホスフィ
ンとt−ブチル−1,4−ベンゾキノンとの付加反応
物、オクチルジフェニルホスフィンとt−ブチル−1,
4−ベンゾキノンとの付加反応物等の少なくとも一つの
アルキル基を有するホスフィン化合物とt−ブチル基を
有するキノン化合物との付加反応物がより好ましい。From the viewpoint of storage stability, addition reaction products of tricyclohexylphosphine and t-butyl-1,4-benzoquinone, addition reaction products of tributylphosphine and t-butyl-1,4-benzoquinone, Addition reaction product of trioctylphosphine and t-butyl-1,4-benzoquinone, dicyclohexylphenylphosphine and t
-Addition reaction product of butyl-1,4-benzoquinone, addition reaction product of dibutylphenylphosphine and t-butyl-1,4-benzoquinone, addition reaction reaction of dioctylphenylphosphine and t-butyl-1,4-benzoquinone object,
Cyclohexyldiphenylphosphine and t-butyl-
Addition reaction product of 1,4-benzoquinone, addition reaction product of butyldiphenylphosphine and t-butyl-1,4-benzoquinone, addition reaction product of octyldiphenylphosphine and t-butyl-1,4-benzoquinone, dicyclohexyl -P-tolylphosphine and t-butyl-1,4-
Addition reaction product of benzoquinone, addition reaction product of dibutyl-p-tolylphosphine and t-butyl-1,4-benzoquinone, addition reaction product of dioctyl-p-tolylphosphine and t-butyl-1,4-benzoquinone , Cyclohexyldi-p-tolylphosphine and t-butyl-1,4-
Addition reaction product of benzoquinone, addition reaction product of butyldi-p-tolylphosphine and t-butyl-1,4-benzoquinone, addition reaction product of octyldi-p-tolylphosphine and t-butyl-1,4-benzoquinone , An addition reaction product of tricyclohexylphosphine and phenyl-1,4-benzoquinone, tributylphosphine and phenyl-
Addition reaction product with 1,4-benzoquinone, addition reaction product with trioctylphosphine and phenyl-1,4-benzoquinone, addition reaction product with dicyclohexylphenylphosphine and phenyl-1,4-benzoquinone, dibutylphenylphosphine and phenyl Addition reaction product of -1,4-benzoquinone, addition reaction product of dioctylphenylphosphine and phenyl-1,4-benzoquinone, addition reaction product of cyclohexyldiphenylphosphine and phenyl-1,4-benzoquinone, butyldiphenylphosphine An addition reaction product of phenyl-1,4-benzoquinone, an addition reaction product of octyldiphenylphosphine and phenyl-1,4-benzoquinone, an addition reaction product of dicyclohexyl-p-tolylphosphine and phenyl-1,4-benzoquinone, Dibutyl- - tolylphosphine and phenyl -
Dioctyl-p, an addition reaction product with 1,4-benzoquinone
-Addition reaction product of tolylphosphine and phenyl-1,4-benzoquinone, addition reaction product of cyclohexyldi-p-tolylphosphine and phenyl-1,4-benzoquinone, butyldi-p-tolylphosphine and phenyl-1,
An addition reaction product with 4-benzoquinone, an addition reaction product with octyldi-p-tolylphosphine and phenyl-1,4-benzoquinone, and the like are preferable. Among them, tricyclohexylphosphine and t-butyl-1,4-benzoquinone are preferable. Addition reaction product, tributylphosphine and t-butyl-1,
Addition reaction product of 4-benzoquinone, addition reaction product of trioctylphosphine and t-butyl-1,4-benzoquinone, addition reaction product of dicyclohexylphenylphosphine and t-butyl-1,4-benzoquinone, dibutylphenylphosphine Addition product of t-butyl-1,4-benzoquinone with dioctylphenylphosphine and t-butyl-1,4-benzoquinone, cyclohexyldiphenylphosphine with t-butyl-1,4-benzoquinone Addition reaction product, addition reaction product of butyldiphenylphosphine and t-butyl-1,4-benzoquinone, octyldiphenylphosphine and t-butyl-1,
An addition reaction product of a phosphine compound having at least one alkyl group such as an addition reaction product with 4-benzoquinone and a quinone compound having a t-butyl group is more preferable.
【0039】上記のなかでも、ホスフィン化合物とキノ
ン化合物との反応性の観点からは、トリシクロヘキシル
ホスフィンと1,4−ベンゾキノンとの付加反応物、ト
リシクロヘキシルホスフィンとメチル−1,4−ベンゾ
キノンとの付加反応物、トリブチルホスフィンと1,4
−ベンゾキノンとの付加反応物、トリブチルホスフィン
とメチル−1,4−ベンゾキノンとの付加反応物、トリ
オクチルホスフィンと1,4−ベンゾキノンとの付加反
応物、トリオクチルホスフィンとメチル−1,4−ベン
ゾキノンとの付加反応物、シクロヘキシルジフェニルホ
スフィンと1,4−ベンゾキノンとの付加反応物、シク
ロヘキシルジフェニルホスフィンとメチル−1,4−ベ
ンゾキノンとの付加反応物、ブチルジフェニルホスフィ
ンと1,4−ベンゾキノンとの付加反応物、ブチルジフ
ェニルホスフィンとメチル−1,4−ベンゾキノンとの
付加反応物、オクチルジフェニルホスフィンと1,4−
ベンゾキノンとの付加反応物、オクチルジフェニルホス
フィンとメチル−1,4−ベンゾキノンとの付加反応
物、ジシクロヘキシルフェニルホスフィンと1,4−ベ
ンゾキノンとの付加反応物、ジシクロヘキシルフェニル
ホスフィンとメチル−1,4−ベンゾキノンとの付加反
応物等のリン原子に少なくとも一つのアルキル基が結合
したホスフィン化合物と1,4−ベンゾキノン又はメチ
ル−1,4−ベンゾキノンとの付加反応物がより好まし
い。Among the above, from the viewpoint of the reactivity between the phosphine compound and the quinone compound, the addition reaction product of tricyclohexylphosphine and 1,4-benzoquinone, and the addition reaction product of tricyclohexylphosphine and methyl-1,4-benzoquinone. Addition reaction product, tributylphosphine and 1,4
-Addition reaction product of benzoquinone, addition reaction product of tributylphosphine and methyl-1,4-benzoquinone, addition reaction product of trioctylphosphine and 1,4-benzoquinone, trioctylphosphine and methyl-1,4-benzoquinone Addition reaction product of cyclohexyldiphenylphosphine with 1,4-benzoquinone, addition reaction product of cyclohexyldiphenylphosphine with methyl-1,4-benzoquinone, addition of butyldiphenylphosphine with 1,4-benzoquinone Reaction product, addition reaction product of butyldiphenylphosphine and methyl-1,4-benzoquinone, octyldiphenylphosphine and 1,4-
Addition reaction product of benzoquinone, addition reaction product of octyldiphenylphosphine and methyl-1,4-benzoquinone, addition reaction product of dicyclohexylphenylphosphine and 1,4-benzoquinone, dicyclohexylphenylphosphine and methyl-1,4-benzoquinone More preferred is an addition reaction product of 1,4-benzoquinone or methyl-1,4-benzoquinone with a phosphine compound having at least one alkyl group bonded to a phosphorus atom, such as an addition reaction product of.
【0040】(C)リン原子に少なくとも一つのアルキ
ル基が結合したホスフィン化合物とキノン化合物との付
加反応物の製造方法としては特に制限はないが、例え
ば、原料として用いられるホスフィン化合物とキノン化
合物とを両者が溶解する有機溶媒中で付加反応させて単
離する方法、(B)成分のフェノール樹脂中で付加反応
させる方法等が挙げられ、後者の方法においては単離せ
ずにそのままフェノール樹脂中に溶解した状態で、エポ
キシ樹脂組成物の配合成分として用いることができる。
(C)リン原子に少なくとも一つのアルキル基が結合し
たホスフィン化合物とキノン化合物との付加反応物は、
1種を単独で用いても2種以上を組み合わせて用いても
よい。There are no particular restrictions on the method for producing the addition reaction product of (C) the phosphine compound in which at least one alkyl group is bonded to the phosphorus atom, and the quinone compound. For example, the phosphine compound and the quinone compound used as raw materials may be used. Examples of the method include a method of performing an addition reaction in an organic solvent in which both are dissolved, and a method of performing an addition reaction in a phenol resin as the component (B). In the latter method, the product is directly isolated in the phenol resin without isolation. In a dissolved state, it can be used as a blending component of the epoxy resin composition.
(C) An addition reaction product of a phosphine compound in which at least one alkyl group is bonded to a phosphorus atom and a quinone compound is
You may use individually by 1 type and may be used in combination of 2 or more type.
【0041】また、本発明の樹脂組成物には、(C)成
分以外に、エポキシ樹脂とフェノール樹脂との硬化反応
を促進する硬化促進剤として一般に用いられているもの
を1種以上併用することができる。これらの硬化促進剤
としては、例えば、1,5−ジアザビシクロ[4.3.
0]ノネン−5、1,8−ジアザビシクロ[5.4.
0]ウンデセン−7等のジアザビシクロアルケンなどの
シクロアミジン化合物、その誘導体、それらのフェノー
ルノボラック塩及びこれらの化合物に無水マレイン酸、
1,4−ベンゾキノン、2,5−トルキノン、1,4−
ナフトキノン、2,3−ジメチルベンゾキノン、2,6
−ジメチルベンゾキノン、2,3−ジメトキシ−5−メ
チル−1,4−ベンゾキノン、2,3−ジメトキシ−
1,4−ベンゾキノン、フェニル−1,4−ベンゾキノ
ン等のキノン化合物、ジアゾフェニルメタンなどのπ結
合をもつ化合物を付加してなる分子内分極を有する化合
物、トリエチレンジアミン、ベンジルジメチルアミン、
トリエタノールアミン、ジメチルアミノエタノール、ト
リス(ジメチルアミノメチル)フェノール等の三級アミ
ン類及びこれらの誘導体、2−メチルイミダゾール、2
−フェニルイミダゾール、2−フェニル−4−メチルイ
ミダゾール、2−ヘプタデシルイミダゾール等のイミダ
ゾール類、テトラフェニルホスホニウム・テトラフェニ
ルボレート等のテトラ置換ホスホニウム・テトラ置換ボ
レート、2−エチル−4−メチルイミダゾール・テトラ
フェニルボレート、N−メチルモルホリン・テトラフェ
ニルボレート等のテトラフェニルボロン塩、トリフェニ
ルホスフィン、ジフェニル(アルキルフェニル)ホスフ
ィン、トリス(アルキルフェニル)ホスフィン、トリス
(アルコキシフェニル)ホスフィン、トリス(アルキル
・アルコキシフェニル)ホスフィン、トリス(ジアルキ
ルフェニル)ホスフィン、トリス(トリアルキルフェニ
ル)ホスフィン、トリス(テトラアルキルフェニル)ホ
スフィン、トリス(ジアルコキシフェニル)ホスフィ
ン、トリス(トリアルコキシフェニル)ホスフィン、ト
リス(テトラアルコキシフェニル)ホスフィン、トリア
ルキルホスフィン、ジアルキルアリールホスフィン、ア
ルキルジアリールホスフィン等の有機ホスフィン類、こ
れら有機ホスフィン類と有機ボロン類との錯体、トリフ
ェニルホスフィン、トリス(アルキルフェニル)ホスフ
ィン、トリス(アルコキシフェニル)ホスフィン、ジフ
ェニル(アルキルフェニル)ホスフィン等のアリールホ
スフィンと1,4−ベンゾキノン等の上記キノン化合物
とのベタイン型付加反応物などが挙げられる。In addition to the component (C), the resin composition of the present invention may be used in combination with one or more of the compounds generally used as a curing accelerator for promoting the curing reaction between the epoxy resin and the phenol resin. You can Examples of these curing accelerators include 1,5-diazabicyclo [4.3.
0] nonene-5,1,8-diazabicyclo [5.4.
[0] Cycloamidine compounds such as diazabicycloalkene such as undecene-7, derivatives thereof, phenol novolac salts thereof and maleic anhydride to these compounds,
1,4-benzoquinone, 2,5-toluquinone, 1,4-
Naphthoquinone, 2,3-dimethylbenzoquinone, 2,6
-Dimethylbenzoquinone, 2,3-dimethoxy-5-methyl-1,4-benzoquinone, 2,3-dimethoxy-
1,4-benzoquinone, quinone compounds such as phenyl-1,4-benzoquinone, compounds having intramolecular polarization formed by adding compounds having a π bond such as diazophenylmethane, triethylenediamine, benzyldimethylamine,
Tertiary amines such as triethanolamine, dimethylaminoethanol, tris (dimethylaminomethyl) phenol and their derivatives, 2-methylimidazole, 2
-Phenylimidazole, 2-phenyl-4-methylimidazole, 2-imidazole such as 2-heptadecylimidazole, tetra-substituted phosphonium / tetra-substituted borate such as tetraphenylphosphonium / tetraphenylborate, 2-ethyl-4-methylimidazole / tetra Phenylborate, tetraphenylboron salts such as N-methylmorpholine / tetraphenylborate, triphenylphosphine, diphenyl (alkylphenyl) phosphine, tris (alkylphenyl) phosphine, tris (alkoxyphenyl) phosphine, tris (alkylalkoxyphenyl) Phosphine, tris (dialkylphenyl) phosphine, tris (trialkylphenyl) phosphine, tris (tetraalkylphenyl) phosphine, tris Organic phosphines such as dialkoxyphenyl) phosphine, tris (trialkoxyphenyl) phosphine, tris (tetraalkoxyphenyl) phosphine, trialkylphosphine, dialkylarylphosphine, alkyldiarylphosphine, and complexes of these organic phosphines with organic borons. Examples include betaine-type addition reaction products of arylphosphines such as triphenylphosphine, tris (alkylphenyl) phosphine, tris (alkoxyphenyl) phosphine, and diphenyl (alkylphenyl) phosphine with the above quinone compounds such as 1,4-benzoquinone. To be
【0042】これらの硬化促進剤を併用する場合、
(C)成分の配合量は、全硬化促進剤量に対して30重
量%以上が好ましく、より好ましくは50重量%以上で
ある。(C)成分の配合量が30重量%未満であると吸
湿時の硬化性又は流動性が低下し、本発明の効果が少な
くなる傾向がある。When these curing accelerators are used in combination,
The content of the component (C) is preferably 30% by weight or more, and more preferably 50% by weight or more, based on the total amount of the curing accelerator. When the content of the component (C) is less than 30% by weight, the curability or fluidity when absorbing moisture decreases, and the effect of the present invention tends to decrease.
【0043】(C)成分を含む全硬化促進剤の合計配合
量は、硬化促進効果が得られれば特に制限はないが、吸
湿時硬化性及び流動性の観点からは(A)エポキシ樹脂
と(B)フェノール樹脂の合計量100重量部に対して
0.1〜10重量部が好ましく、1〜7重量部がより好
ましい。0.1重量部未満では短時間で硬化させること
が困難で、10重量部を超えると硬化速度が速すぎて良
好な成形品が得られない場合が生じる傾向がある。The total amount of all the curing accelerators containing the component (C) is not particularly limited as long as the curing acceleration effect can be obtained, but from the viewpoint of curability during moisture absorption and fluidity, the epoxy resin (A) and the epoxy resin ( The total amount of the B) phenol resin is preferably 0.1 to 10 parts by weight, more preferably 1 to 7 parts by weight, based on 100 parts by weight. If it is less than 0.1 part by weight, it is difficult to cure it in a short time, and if it exceeds 10 parts by weight, the curing rate tends to be too fast and a good molded product may not be obtained.
【0044】本発明のエポキシ樹脂組成物には、(D)
無機充填剤を必要に応じてさらに配合することができ
る。特にエポキシ樹脂組成物を封止用成形材料として用
いる場合には、(D)無機充填剤を配合することが好ま
しい。本発明において用いられる(D)無機充填剤とし
ては、一般に封止用成形材料に用いられるもので特に限
定はないが、例えば、溶融シリカ、結晶シリカ、ガラ
ス、アルミナ、炭酸カルシウム、ケイ酸ジルコニウム、
ケイ酸カルシウム、窒化珪素、窒化アルミ、窒化ホウ
素、ベリリア、ジルコニア、ジルコン、フォステライ
ト、ステアタイト、スピネル、ムライト、チタニア、タ
ルク、クレー、マイカ等の微粉未、又はこれらを球形化
したビーズなどが挙げられる。さらに、難燃効果のある
無機充填剤としては、例えば、水酸化アルミニウム、水
酸化マグネシウム、マグネシウムと亜鉛の複合水酸化物
等の複合金属水酸化物、硼酸亜鉛などが挙げられる。な
かでも、線膨張係数低減の観点からは溶融シリカが、高
熱伝導性の観点からはアルミナが好ましい。これらの無
機充填剤は1種を単独で用いても2種以上を組み合わせ
て用いてもよい。The epoxy resin composition of the present invention comprises (D)
Inorganic fillers can be further added if necessary. Particularly when the epoxy resin composition is used as a molding material for sealing, it is preferable to incorporate (D) an inorganic filler. The inorganic filler (D) used in the present invention is not particularly limited and is generally used for molding materials for sealing, and examples thereof include fused silica, crystalline silica, glass, alumina, calcium carbonate, zirconium silicate,
Calcium silicate, silicon nitride, aluminum nitride, boron nitride, beryllia, zirconia, zircon, fosterite, steatite, spinel, mullite, titania, talc, clay, mica, etc. Can be mentioned. Furthermore, examples of the inorganic filler having a flame retardant effect include aluminum hydroxide, magnesium hydroxide, complex metal hydroxides such as complex hydroxide of magnesium and zinc, and zinc borate. Of these, fused silica is preferable from the viewpoint of reducing the linear expansion coefficient, and alumina is preferable from the viewpoint of high thermal conductivity. These inorganic fillers may be used alone or in combination of two or more.
【0045】(D)無機充填剤の配合量は、本発明の効
果が得られれば特に制限はないが、エポキシ樹脂組成物
に対して55〜90体積%の範囲であることが好まし
い。これら無機充填剤は硬化物の熱膨張係数、熱伝導
率、弾性率等の改良を目的に配合するものであり、配合
量が55体積%未満ではこれらの特性の改良が不十分と
なる傾向があり、90体積%を超えるとエポキシ樹脂組
成物の粘度が上昇して流動性が低下し成形が困難になる
傾向がある。また、(D)無機充填剤の平均粒径は1〜
50μmが好ましく、10〜30μmがより好ましい。
1μm未満ではエポキシ樹脂組成物の粘度が上昇しやす
く、50μmを超えると樹脂成分と無機充墳剤とが分離
しやすくなり、硬化物が不均一になったり硬化物特性が
ばらついたり、狭い隙間への充填性が低下したりする傾
向がある。流動性の観点からは、(D)無機充填剤の粒
子形状は角形より球形が好ましく、(D)無機充填剤の
粒度分布は広範囲に分布したものが好ましい。例えば、
無機充填剤を75体積%以上配合する場合、その70重
量%以上を球状粒子とし、0.1〜80μmという広範
囲に分布したものが好ましい。このような無機充填剤は
最密充填構造をとりやすいため配合量を増加させても材
料の粘度上昇が少なく、流動性に優れたエポキシ樹脂組
成物を得ることができる。The amount of the inorganic filler (D) is not particularly limited as long as the effects of the present invention can be obtained, but it is preferably in the range of 55 to 90% by volume with respect to the epoxy resin composition. These inorganic fillers are added for the purpose of improving the thermal expansion coefficient, thermal conductivity, elastic modulus, etc. of the cured product, and if the content is less than 55% by volume, the improvement of these properties tends to be insufficient. However, if it exceeds 90% by volume, the viscosity of the epoxy resin composition increases, the fluidity decreases, and molding tends to be difficult. The average particle size of the (D) inorganic filler is 1 to
50 μm is preferable, and 10 to 30 μm is more preferable.
If it is less than 1 μm, the viscosity of the epoxy resin composition tends to increase, and if it exceeds 50 μm, the resin component and the inorganic filler are likely to separate from each other, and the cured product becomes non-uniform, the cured product characteristics vary, or a narrow gap is formed. The filling property of the product tends to decrease. From the viewpoint of fluidity, the particle shape of the (D) inorganic filler is preferably spherical rather than square, and the particle size distribution of the (D) inorganic filler is preferably in a wide range. For example,
When 75% by volume or more of the inorganic filler is blended, 70% by weight or more of the inorganic filler is preferably spherical particles and distributed in a wide range of 0.1 to 80 μm. Since such an inorganic filler tends to have a close-packed structure, the viscosity of the material does not increase even if the compounding amount is increased, and an epoxy resin composition having excellent fluidity can be obtained.
【0046】本発明のエポキシ樹脂組成物には、陰イオ
ン交換体を必要に応じて配合することができる。特にエ
ポキシ樹脂組成物を封止用成形材料として用いる場合に
は、封止される素子を備える電子部品装置の耐湿性及び
高温放置特性を向上させる観点から、陰イオン交換体を
配合することが好ましい。本発明において用いられる陰
イオン交換体としては特に制限はなく、従来公知のもの
を用いることができるが、例えば、ハイドロタルサイト
類や、マグネシウム、アルミニウム、チタン、ジルコニ
ウム、ビスマスから選ばれる元素の含水酸化物等が挙げ
られ、これらを単独で又は2種以上を組み合わせて用い
ることができる。なかでも、下記一般式(XX)で示され
るハイドロタルサイトが好ましい。
Mg1−XAlX(OH)2(CO3)X/2・mH2O ……(XX)
(0<X≦0.5、mは正の整数)
これらの陰イオン交換体の配合量は、ハロゲンイオンな
どの陰イオンを捕捉できる十分量であれば特に制限はな
いが、(A)エポキシ樹脂に対して0.1〜30重量%
の範囲が好ましく、1〜5重量%がより好ましい。An anion exchanger can be added to the epoxy resin composition of the present invention as required. Particularly when the epoxy resin composition is used as a molding material for sealing, it is preferable to mix an anion exchanger from the viewpoint of improving the moisture resistance and the high temperature storage property of the electronic component device including the element to be sealed. . There is no particular limitation on the anion exchanger used in the present invention, and conventionally known ones can be used. For example, hydrotalcites and water containing an element selected from magnesium, aluminum, titanium, zirconium and bismuth. Examples thereof include oxides, and these can be used alone or in combination of two or more kinds. Among them, hydrotalcite represented by the following general formula (XX) is preferable. Mg 1-X Al X (OH ) 2 (CO 3) X / 2 · mH 2 O ...... (XX) (0 <X ≦ 0.5, m is a positive integer) The amount of the anion exchanger Is not particularly limited as long as it is an amount sufficient to capture anions such as halogen ions, but is 0.1 to 30% by weight with respect to the epoxy resin (A).
Is preferable, and 1 to 5% by weight is more preferable.
【0047】本発明のエポキシ樹脂組成物には、樹脂成
分と無機充項剤との接着性を高めるためのカップリング
剤として、エポキシシラン、メルカプトシラン、アミノ
シラン、アルキルシラン、ウレイドシラン、ビニルシラ
ン等の各種シラン系化合物、チタン系化合物、アルミニ
ウムキレート類、アルミニウム/ジルコニウム系化合物
等の公知の添加剤を必要に応じて配合することができ
る。また、カーボンブラック、有機染料、有機顔料、酸
化チタン、鉛丹、ベンガラ等の公知の着色剤を配合して
もよい。The epoxy resin composition of the present invention contains epoxysilane, mercaptosilane, aminosilane, alkylsilane, ureidosilane, vinylsilane, etc. as a coupling agent for increasing the adhesiveness between the resin component and the inorganic filler. Known additives such as various silane compounds, titanium compounds, aluminum chelates, and aluminum / zirconium compounds can be blended as necessary. Further, known colorants such as carbon black, organic dyes, organic pigments, titanium oxide, red lead and red iron oxide may be added.
【0048】本発明のエポキシ樹脂組成物には、成形時
に金型との良好な離型性を持たせるため離型剤を配合し
てもよい。本発明において用いられる離型剤としては特
に制限はなく従来公知のものを用いることができるが、
例えば、カルナバワックス、モンタン酸、ステアリン酸
等の高級脂肪酸、高級脂肪酸金属塩、モンタン酸エステ
ル等のエステル系ワックス、酸化ポリエチレン、非酸化
ポリエチレン等のポリオレフィン系ワックス等が挙げら
れ、これらの1種を単独で用いても2種以上を組み合わ
せて用いてもよい。中でも、酸化型又は非酸化型のポリ
オレフィン系ワックスが好ましく、その配合量としては
(A)エポキシ樹脂に対して0.01〜10重量%が好
ましく、0.1〜5重量%がより好ましい。ポリオレフ
ィン系ワックスの配合量が0.01重量%未満では離型
性が不十分な傾向があり、10重量%を超えると接着性
が阻害されるおそれがある。ポリオレフィン系ワックス
としては、例えば市販品ではヘキスト社製のH4、P
E、PEDシリーズ等の数平均分子量が500〜100
00程度の低分子量ポリエチレンなどが挙げられる。ま
た、ポリオレフィン系ワックスに他の離型剤を併用する
場合、その配合量は(A)エポキシ樹脂に対して0.1
〜10重量%が好ましく、0.5〜3重量%がより好ま
しい。A releasing agent may be added to the epoxy resin composition of the present invention in order to have a good releasing property with respect to the mold at the time of molding. The release agent used in the present invention is not particularly limited and may be a conventionally known one.
Examples thereof include higher fatty acids such as carnauba wax, montanic acid and stearic acid, higher fatty acid metal salts, ester waxes such as montanic acid ester, polyolefin waxes such as oxidized polyethylene and non-oxidized polyethylene, and the like. They may be used alone or in combination of two or more. Above all, an oxidized or non-oxidized polyolefin wax is preferable, and its compounding amount is preferably 0.01 to 10% by weight, and more preferably 0.1 to 5% by weight, relative to the epoxy resin (A). If the content of the polyolefin wax is less than 0.01% by weight, the releasability tends to be insufficient, and if it exceeds 10% by weight, the adhesiveness may be impaired. Examples of the polyolefin wax include commercially available products such as H4 and P manufactured by Hoechst.
The number average molecular weight of E, PED series, etc. is 500-100.
A low molecular weight polyethylene of about 00 and the like can be mentioned. When other releasing agent is used in combination with the polyolefin wax, the compounding amount is 0.1 with respect to the epoxy resin (A).
10 to 10% by weight is preferable, and 0.5 to 3% by weight is more preferable.
【0049】本発明のエポキシ樹脂組成物には、難燃性
を付与するために必要に応じて難燃剤を配合することが
できる。本発明において用いられる難燃剤としては特に
制限はなく、例えば、ハロゲン原子、アンチモン原子、
窒素原子又はリン原子を含む公知の有機若しくは無機の
化合物、金属水酸化物などが挙げられ、これらの1種を
単独で用いても2種以上を組み合わせて用いてもよい。
難燃剤の配合量は、難燃効果が達成されれば特に制限は
ないが、(A)エポキシ樹脂に対して1〜30重量%が
好ましく、2〜15重量%がより好ましい。さらに、本
発明のエポキシ樹脂組成物には、その他の添加剤とし
て、シリコーンオイル、シリコーンゴム粉末等の応力緩
和剤などを必要に応じて配合することができる。A flame retardant may be added to the epoxy resin composition of the present invention, if necessary, in order to impart flame retardancy. The flame retardant used in the present invention is not particularly limited, for example, a halogen atom, an antimony atom,
Known organic or inorganic compounds containing a nitrogen atom or a phosphorus atom, metal hydroxides and the like can be mentioned, and one kind thereof may be used alone or two or more kinds thereof may be used in combination.
The amount of the flame retardant compounded is not particularly limited as long as the flame retardant effect is achieved, but is preferably 1 to 30% by weight, more preferably 2 to 15% by weight, based on the epoxy resin (A). Further, the epoxy resin composition of the present invention may be blended with other additives such as stress relieving agents such as silicone oil and silicone rubber powder, if necessary.
【0050】本発明のエポキシ樹脂組成物は、各種成分
を均一に分散混合できるのであれば、いかなる手法を用
いても調製できるが、一般的な手法として、所定の配合
量の成分をミキサー等によって十分混合した後、ミキシ
ングロール、押出機等によって溶融混練した後、冷却、
粉砕する方法を挙げることができる。例えば、上述した
成分の所定量を均一に撹拌、混合し、予め70〜140
℃に加熱してあるニーダー、ロール、エクストルーダー
等で混練、冷却し、粉砕するなどの方法で得ることがで
きる。成形条件に合うような寸法及び重量でタブレット
化すると使いやすい。The epoxy resin composition of the present invention can be prepared by any method as long as it can uniformly disperse and mix various components. As a general method, a predetermined amount of the components is mixed with a mixer or the like. After mixing well, after mixing and kneading by mixing roll, extruder, etc., cooling,
A method of crushing can be mentioned. For example, a predetermined amount of the above-mentioned components are uniformly stirred and mixed, and 70 to 140 in advance.
It can be obtained by a method such as kneading with a kneader, roll, extruder or the like heated to ℃, cooling, and pulverizing. It is easy to use if it is made into a tablet with dimensions and weight that match the molding conditions.
【0051】本発明で得られるエポキシ樹脂組成物によ
り素子を封止して得られる電子部品装置としては、リー
ドフレーム、配線済みのテープキャリア、配線板、ガラ
ス、シリコンウエハ等の支持部材に、半導体チップ、ト
ランジスタ、ダイオード、サイリスタ等の能動素子、コ
ンデンサ、抵抗体、コイル等の受動素子等の素子を搭載
し、必要な部分を本発明のエポキシ樹脂組成物で封止し
た、電子部品装置などが挙げられる。このような電子部
品装置としては、例えば、リードフレーム上に半導体素
子を固定し、ボンディングパッド等の素子の端子部とリ
ード部をワイヤボンディングやバンプで接続した後、本
発明のエポキシ樹脂組成物を用いてトランスファ成形な
どにより封止してなる、DIP(Dual Inline Packag
e)、PLCC(Plastic Leaded Chip Carrier)、QF
P(Quad Flat Package)、SOP(Small Outline Pac
kage)、SOJ(Small Outline J-lead Package)、T
SOP(Thin Small Outline Package)、TQFP(Th
in Quad Flat Package)等の一般的な樹脂封止型IC、
テープキャリアにバンプで接続した半導体チップを、本
発明のエポキシ樹脂組成物で封止したTCP(Tape Car
rier Package)、配線板やガラス上に形成した配線に、
ワイヤボンディング、フリップチップボンディング、は
んだ等で接続した半導体チップ、トランジスタ、ダイオ
ード、サイリスタ等の能動素子及び/又はコンデンサ、
抵抗体、コイル等の受動素子を、本発明のエポキシ樹脂
組成物で封止したCOB(Chip On Board)モジュー
ル、ハイブリッドIC、マルチチップモジュール、裏面
に配線板接続用の端子を形成した有機基板の表面に素子
を搭載し、バンプまたはワイヤボンディングにより素子
と有機基板に形成された配線を接続した後、本発明のエ
ポキシ樹脂組成物で素子を封止したBGA(Ball Grid
Array)、CSP(Chip Size Package)などが挙げられ
る。また、プリント回路板にも本発明のエポキシ樹脂組
成物は有効に使用できる。An electronic component device obtained by encapsulating an element with the epoxy resin composition obtained in the present invention includes a lead frame, a pre-wiring tape carrier, a wiring board, glass, a silicon wafer, and other supporting members, and a semiconductor. Chips, transistors, diodes, active elements such as thyristors, elements such as capacitors, resistors, passive elements such as coils, etc. are mounted, and necessary parts are sealed with the epoxy resin composition of the present invention. Can be mentioned. As such an electronic component device, for example, a semiconductor element is fixed on a lead frame, the terminal portion of the element such as a bonding pad and the lead portion are connected by wire bonding or bumps, and then the epoxy resin composition of the present invention is used. DIP (Dual Inline Packag)
e), PLCC (Plastic Leaded Chip Carrier), QF
P (Quad Flat Package), SOP (Small Outline Pac)
kage), SOJ (Small Outline J-lead Package), T
SOP (Thin Small Outline Package), TQFP (Th
in Quad Flat Package) general resin encapsulation type IC,
A TCP (Tape Car) in which a semiconductor chip connected to a tape carrier by a bump is sealed with the epoxy resin composition of the present invention.
rier Package), wiring formed on a wiring board or glass,
Active elements and / or capacitors such as semiconductor chips, transistors, diodes and thyristors connected by wire bonding, flip chip bonding, soldering, etc.
A COB (Chip On Board) module in which passive elements such as resistors and coils are sealed with the epoxy resin composition of the present invention, a hybrid IC, a multi-chip module, and an organic substrate in which terminals for connecting a wiring board are formed on the back surface. BGA (Ball Grid) in which an element is mounted on the surface, the element and the wiring formed on the organic substrate are connected by bumping or wire bonding, and then the element is sealed with the epoxy resin composition of the present invention.
Array), CSP (Chip Size Package) and the like. Also, the epoxy resin composition of the present invention can be effectively used for printed circuit boards.
【0052】本発明のエポキシ樹脂組成物を用いて、電
子部品装置を封止する方法としては、低圧トランスファ
成形法が最も一般的であるが、インジェクション成形
法、圧縮成形法等を用いてもよい。Although the low-pressure transfer molding method is the most general method for sealing an electronic component device using the epoxy resin composition of the present invention, an injection molding method, a compression molding method or the like may be used. .
【0053】[0053]
【実施例】次に本発明の実施例を示すが、本発明の範囲
はこれらの実施例に限定されるものではない。
実施例1〜9、比較例1〜10
エポキシ樹脂としてはエポキシ当量245、融点110
℃のジアリールスルフィド骨格型エポキシ樹脂(エポキ
シ樹脂1:新日鐵化学株式会社製商品名YSLV−12
0TE)、エポキシ当量196、融点106℃のビフェ
ニル骨格型エポキシ樹脂(エポキシ樹脂2:油化シェル
エポキシ株式会社製商品名YX−4000H)、エポキ
シ当量195、軟化点62℃のオルトクレゾールノボラ
ック型エポキシ樹脂(エポキシ樹脂3:住友化学工業株
式会社製商品名ESCN−190−2)、エポキシ当量
393、軟化点80℃、臭素含有量48重量%の臭素化
ビスフェノールA型エポキシ樹脂(臭素化エポキシ樹
脂)、硬化剤としては水酸基当量176、軟化点70℃
のフェノールアラルキル樹脂(硬化剤1:三井化学株式
会社製商品名ミレックスXL−225)、水酸基当量1
99、軟化点89℃のビフェニル骨格型フェノール樹脂
(硬化剤2:明和化成株式会社製商品名MEH−785
1)、水酸基当量183、軟化点79℃のナフトールア
ラルキル樹脂(硬化剤3:新日鐵化学株式会社製商品名
SN−170)、水酸基当量170、軟化点93℃のジ
シクロペンタジエン変性フェノールノボラック樹脂(硬
化剤4:日本石油化学株式会社製商品名DPP)、硬化
促進剤としてはトリブチルホスフィンと1,4−ベンゾ
キノンとの付加反応物(硬化促進剤1)、トリシクロヘ
キシルホスフィンと1,4−ベンゾキノンとの付加反応
物(硬化促進剤2)、シクロヘキシルジフェニルホスフ
ィンと1,4−ベンゾキノンとの付加反応物(硬化促進
剤3)、トリフェニルホスフィンと1,4−ベンゾキノ
ンとの付加反応物(硬化促進剤4)、トリフェニルホス
フィン(硬化促進剤5)、無機充填剤としては平均粒径
17.5μm、比表面積3.8m2/gの球状溶融シリ
カを用い、その他の添加成分としてはカップリング剤と
してγ−グリシドキシプロピルトリメトキシシラン、着
色剤としてカーボンブラック(三菱化学株式会社製商品
名MA−100)、離型剤としてカルナバワックス(株
式会社セラリカNODA製)、難燃剤として三酸化アン
チモンを用い、表1及び表2に示す重量部で配合し、混
練温度80℃、混練時間15分の条件でロール混練を行
い、実施例1〜9、比較例1〜10のエポキシ樹脂組成
物を得た。EXAMPLES Examples of the present invention will be shown below, but the scope of the present invention is not limited to these examples. Examples 1 to 9 and Comparative Examples 1 to 10 Epoxy equivalent of the epoxy resin is 245, melting point 110
Diaryl sulfide skeleton epoxy resin (epoxy resin 1: trade name YSLV-12 manufactured by Nippon Steel Chemical Co., Ltd.
0TE), epoxy equivalent 196, melting point 106 ° C. biphenyl skeleton type epoxy resin (epoxy resin 2: Yuka Shell Epoxy Co., Ltd. product name YX-4000H), epoxy equivalent 195, softening point 62 ° C. orthocresol novolac type epoxy resin. (Epoxy resin 3: Sumitomo Chemical Co., Ltd., trade name ESCN-190-2), epoxy equivalent 393, softening point 80 ° C., bromine content 48 weight% brominated bisphenol A type epoxy resin (brominated epoxy resin), As a curing agent, the hydroxyl equivalent is 176 and the softening point is 70 ° C.
Phenol aralkyl resin (hardening agent 1: Mitsui Chemicals, Inc., trade name Milex XL-225), hydroxyl equivalent 1
Biphenyl skeleton type phenol resin having a softening point of 89 ° C. (hardening agent 2: Meiwa Kasei Co., Ltd., trade name MEH-785
1), a hydroxyl equivalent 183, a naphthol aralkyl resin having a softening point of 79 ° C. (curing agent 3: Nippon Steel Chemical Co., Ltd. trade name SN-170), a hydroxyl equivalent 170, and a dicyclopentadiene-modified phenol novolac resin having a softening point of 93 ° C. (Curing agent 4: trade name DPP manufactured by Nippon Petrochemical Co., Ltd.), as a curing accelerator, an addition reaction product of tributylphosphine and 1,4-benzoquinone (curing accelerator 1), tricyclohexylphosphine and 1,4-benzoquinone. Addition reaction product (curing accelerator 2), cyclohexyldiphenylphosphine and 1,4-benzoquinone addition reaction product (curing accelerator 3), triphenylphosphine and 1,4-benzoquinone addition reaction product (curing acceleration) Agent 4), triphenylphosphine (curing accelerator 5), inorganic filler having an average particle size of 17.5 μm, ratio With spherical fused silica area 3.8 m 2 / g, .gamma.-glycidoxypropyltrimethoxysilane as a coupling agent as other additives components, carbon black (Mitsubishi Chemical Corporation, trade name MA-100 as a colorant ), Carnauba wax (manufactured by Celarica NODA Co., Ltd.) as a release agent, antimony trioxide as a flame retardant, and blended in parts by weight shown in Tables 1 and 2, under conditions of a kneading temperature of 80 ° C. and a kneading time of 15 minutes. Roll kneading was performed to obtain epoxy resin compositions of Examples 1-9 and Comparative Examples 1-10.
【0054】[0054]
【表1】 [Table 1]
【0055】[0055]
【表2】 [Table 2]
【0056】実施例、比較例のエポキシ樹脂組成物を、
次の各試験により評価した。評価結果を表3及び表4に
示す。なお、エポキシ樹脂組成物の成形は、トランスフ
ァ成形機により、金型温度180℃、成形圧力7MP
a、硬化時間90秒の条件で行った。また、後硬化は1
75℃で6時間行った。
(1)スパイラルフロー(流動性の指標)
EMMI−1−66に準じたスパイラルフロー測定用金
型を用いて、上記条件でエポキシ樹脂組成物を成形して
流動距離(cm)を測定した。
(2)熱時硬度
エポキシ樹脂組成物を上記条件で直径50mm×厚さ3
mmの円板に成形し、成形後直ちにショアD型硬度計を
用いて測定した。
(3)吸湿時熱時硬度
エポキシ樹脂組成物を25℃/50%RHの条件で72
時間放置後、上記(2)と同様に成形しショアD型硬度
計を用いて測定した。
(4)耐リフロークラック性1
42アロイフレームに寸法8×10×0.4mmのテス
ト用シリコンチップを銀ペーストを用いて搭載した、外
形寸法14×20×2.0mmのQFP80ピンのパッ
ケージを、エポキシ樹脂組成物を用いて上記条件で成
形、後硬化して作製し、85℃、85%RHの条件で1
68時間吸湿させた後、ベーパーフェーズリフロー装置
により、215℃、90秒の条件でリフロー処理を行っ
て、クラックの発生の有無を確認し、試験パッケージ数
(5)に対するクラック発生パッケージ数で評価した。
(5)耐リフロークラック性2
吸湿時間を168時間とし、IRリフロー装置で240
℃、10秒の条件でリフロー処理を行った以外は、上記
(4)と同様にして評価した。
(6)耐リフロークラック性3
吸湿時間を72時間、96時間、168時間とし、IR
リフロー装置で260℃、10秒の条件でリフロー処理
を行った以外は、上記(4)と同様にして評価した。The epoxy resin compositions of Examples and Comparative Examples were
It evaluated by the following each test. The evaluation results are shown in Tables 3 and 4. The epoxy resin composition is molded by a transfer molding machine at a mold temperature of 180 ° C and a molding pressure of 7MP.
a, the curing time was 90 seconds. Also, the post-curing is 1
It was carried out at 75 ° C for 6 hours. (1) Spiral flow (index of fluidity) Using a mold for spiral flow measurement according to EMMI-1-66, the epoxy resin composition was molded under the above conditions and the flow distance (cm) was measured. (2) Hardness at heat The epoxy resin composition is 50 mm in diameter and 3 in thickness under the above conditions.
It was molded into a disc having a size of mm, and immediately after molding, the hardness was measured using a Shore D type hardness meter. (3) Hardness at the time of moisture absorption When the epoxy resin composition is heated at a temperature of 25 ° C./50% RH
After standing for a time, it was molded in the same manner as in (2) above and measured using a Shore D hardness meter. (4) Reflow crack resistance 14 A QFP80 pin package having an external dimension of 14 × 20 × 2.0 mm, in which a test silicon chip having a dimension of 8 × 10 × 0.4 mm is mounted on a 142 alloy frame by using a silver paste, Molded under the above conditions using an epoxy resin composition and post-cured to prepare, and under the conditions of 85 ° C. and 85% RH, 1
After absorbing moisture for 68 hours, a reflow process was performed under the conditions of 215 ° C. and 90 seconds by a vapor phase reflow device to confirm the presence or absence of cracks, and the number of cracked packages against the number of test packages (5) was evaluated. . (5) Resistance to reflow cracking 2 Moisture absorption time was set to 168 hours and 240 with an IR reflow device.
Evaluation was carried out in the same manner as in (4) above, except that the reflow treatment was carried out under the conditions of ° C and 10 seconds. (6) Reflow crack resistance 3 Moisture absorption time is 72 hours, 96 hours, 168 hours, IR
Evaluation was performed in the same manner as in (4) above, except that the reflow treatment was carried out at 260 ° C. for 10 seconds using a reflow device.
【0057】[0057]
【表3】 [Table 3]
【0058】[0058]
【表4】 [Table 4]
【0059】実施例1〜9は、いずれも流動性(110
cm以上)、熱時硬度(79以上)、吸湿時熱時硬度(7
8以上)に優れている。耐リフロークラック性も85
℃、85%RHで96時間吸湿後、260℃でリフロー
という厳しい条件でもクラックがなく良好である。これ
に対して、本発明の(A)成分を含まない比較例7及び
9では実施例に比べ260℃での耐リフロークラック性
に劣っている。また、本発明の(C)成分を含まない比
較例1〜6、8、10では、吸湿時熱時硬度が著しく劣
っている。更に比較例2で流動性も劣っている。In each of Examples 1 to 9, the fluidity (110
cm or more), hardness at heat (79 or more), hardness at heat absorption (7
8 or more). Reflow crack resistance is also 85
Even after a rigorous condition of reflowing at 260 ° C. after absorbing moisture for 96 hours at 85 ° C. and 85% RH, it is good without cracks. On the other hand, in Comparative Examples 7 and 9 not containing the component (A) of the present invention, the reflow crack resistance at 260 ° C. was inferior to that of the Examples. Further, in Comparative Examples 1 to 6, 8 and 10 which do not contain the component (C) of the present invention, the hardness at the time of moisture absorption and heat is significantly inferior. Further, in Comparative Example 2, the fluidity is also inferior.
【0060】[0060]
【発明の効果】本発明になるエポキシ樹脂組成物は、吸
湿時の硬化性及び流動性に優れ、このエポキシ樹脂組成
物を用いてIC、LSI等の電子部品を封止すれば、実
施例で示したように耐リフロークラック性が良好で、信
頼性に優れる電子部品装置を得ることができるので、そ
の工業的価値は大である。The epoxy resin composition according to the present invention is excellent in curability and fluidity when absorbing moisture. If the epoxy resin composition is used to seal electronic parts such as IC and LSI, As shown, it is possible to obtain an electronic component device having excellent reflow crack resistance and excellent reliability, so that its industrial value is great.
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Claims (8)
脂、(B)フェノール樹脂及び(C)リン原子に少なく
とも一つのアルキル基が結合したホスフィン化合物とキ
ノン化合物との付加反応物を必須成分とするエポキシ樹
脂組成物。1. An addition reaction product of (A) an epoxy resin containing a sulfur atom, (B) a phenol resin, and (C) a phosphine compound having at least one alkyl group bonded to a phosphorus atom, and a quinone compound as essential components. Epoxy resin composition.
がスルフィド骨格を有するエポキシ樹脂である請求項1
記載のエポキシ樹脂組成物。2. The epoxy resin (A) containing a sulfur atom is an epoxy resin having a sulfide skeleton.
The epoxy resin composition described.
が下記一般式(I)で示される化合物である請求項1記
載又は請求項2記載のエポキシ樹脂組成物 【化1】 (ここで、式(I)中のR1は水素原子又は炭素数1〜
12のアルキル基及びアリール基を示し、それぞれ全て
が同一でも異なっていてもよい。nは、平均値であり0
〜10の正数を示す。)。3. The epoxy resin composition according to claim 1 or 2, wherein the epoxy resin (A) containing a sulfur atom is a compound represented by the following general formula (I). (Here, R 1 in the formula (I) is a hydrogen atom or a carbon number of 1 to
12 alkyl and aryl groups are shown, which may be the same or different. n is an average value and is 0
Indicates a positive number from -10. ).
キル基が結合したホスフィン化合物とキノン化合物との
付加反応物が、下記一般式(II)で示されるホスフィン
化合物と下記一般式(III)で示されるキノン化合物と
の付加反応物である請求項1〜3記載のエポキシ樹脂組
成物 【化2】 (ここで、式(II)中のR2は炭素数1〜12のアルキ
ル基を示し、R3及びR 4は、水素原子又は炭素数1〜
12の炭化水素基を示し、それぞれ全てが同一でも異な
っていてもよい。また、式(III)中のR5〜R7は、
水素原子又は炭素数1〜18の炭化水素基を示し、それ
ぞれ全てが同一でも異なっていてもよい。R5とR6が
結合して環状構造となっていてもよい。)。4. (C) At least one alkyl group at a phosphorus atom
Of a phosphine compound having a killed group and a quinone compound
The addition reaction product is a phosphine represented by the following general formula (II).
A compound and a quinone compound represented by the following general formula (III):
The epoxy resin set according to claim 1, which is an addition reaction product of
Adult [Chemical 2] (Where R in the formula (II)TwoIs an alky having 1 to 12 carbons
R groupThreeAnd R FourIs a hydrogen atom or a carbon number of 1 to
12 hydrocarbon groups, all of which are the same or different
You may In addition, R in the formula (III)5~ R7Is
A hydrogen atom or a hydrocarbon group having 1 to 18 carbon atoms,
All of them may be the same or different. R5And R6But
It may be bonded to form a ring structure. ).
配合量がエポキシ樹脂組成物に対して55〜90体積%
である請求項1〜4記載のエポキシ樹脂組成物。5. An inorganic filler (D) is further contained, and the amount thereof is 55 to 90% by volume based on the epoxy resin composition.
The epoxy resin composition according to any one of claims 1 to 4.
が下記一般式(IV)で表されるエポキシ樹脂を含有して
なる請求項1〜5のいずれかに記載のエポキシ樹脂組成
物 【化3】 (ここで、一般式(IV)中のnは平均値であり0〜10
の正数を示す。)。6. The epoxy resin composition according to claim 1, wherein the epoxy resin (A) containing a sulfur atom contains an epoxy resin represented by the following general formula (IV). 3] (Here, n in the general formula (IV) is an average value and is 0 to 10
Indicates a positive number. ).
(V)〜(IX)のいずれかで示されるフェノール樹脂の
少なくとも1種を含有してなる請求項1〜6のいずれか
に記載のエポキシ樹脂組成物 【化4】 (ここで、一般式(V)〜(IX)中のR8〜R17は水
素原子又は炭素数1〜6のアルキル基を示し、それぞれ
全てが同一でも異なっていてもよい。nは平均値であり
0〜10の正数を示し、iは0〜3の整数、jは0〜2
の整数、kは0〜4の整数、rは0〜4の整数を示
す。)。7. The epoxy according to claim 1, wherein the (B) phenolic resin contains at least one phenolic resin represented by any one of the following general formulas (V) to (IX). Resin composition [Chemical formula 4] (Here, R < 8 > -R < 17 > in General Formula (V)-(IX) shows a hydrogen atom or a C1-C6 alkyl group, and all may be the same or different. N is an average value. Is a positive number from 0 to 10, i is an integer from 0 to 3, and j is 0 to 2.
Is an integer, k is an integer of 0 to 4, and r is an integer of 0 to 4. ).
シ樹脂組成物により封止された素子を備えた電子部品装
置。8. An electronic component device comprising an element sealed with the epoxy resin composition according to claim 1.
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JP2001-388008 | 2001-12-20 | ||
JP2001388008 | 2001-12-20 | ||
JP2002253794A JP2003246841A (en) | 2001-12-20 | 2002-08-30 | Epoxy resin composition and electronic part device |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7218482B2 (en) | 2004-01-26 | 2007-05-15 | Sae Magnetics (H.K.) Ltd. | Micro-actuator, head gimbal assembly and manufacturing method thereof |
-
2002
- 2002-08-30 JP JP2002253794A patent/JP2003246841A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7218482B2 (en) | 2004-01-26 | 2007-05-15 | Sae Magnetics (H.K.) Ltd. | Micro-actuator, head gimbal assembly and manufacturing method thereof |
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