JP2003224182A - Abnormality detecting device for substrate carrying container - Google Patents

Abnormality detecting device for substrate carrying container

Info

Publication number
JP2003224182A
JP2003224182A JP2002018753A JP2002018753A JP2003224182A JP 2003224182 A JP2003224182 A JP 2003224182A JP 2002018753 A JP2002018753 A JP 2002018753A JP 2002018753 A JP2002018753 A JP 2002018753A JP 2003224182 A JP2003224182 A JP 2003224182A
Authority
JP
Japan
Prior art keywords
container
substrate
sensor
abnormality detecting
detecting device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002018753A
Other languages
Japanese (ja)
Inventor
Norio Kimura
憲雄 木村
Tomonori Ohashi
知範 大橋
Akira Tanaka
亮 田中
Yoko Suzuki
庸子 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Priority to JP2002018753A priority Critical patent/JP2003224182A/en
Publication of JP2003224182A publication Critical patent/JP2003224182A/en
Pending legal-status Critical Current

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  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
  • Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
  • Packaging Frangible Articles (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an abnormality detecting device for a substrate carrying container which can detect a gaseous contaminant being abnormally present in the atmosphere in the substrate carrying container in such a case. <P>SOLUTION: Provided are the container which carries a substrate and a sensor which detects the gaseous contaminant present in the container. The sensor is equipped with PH paper which discolors with the gaseous contaminant and an optical sensor which detects its discoloration. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、半導体ウェハ、液
晶基板等の基板を清浄度の高い雰囲気下で保管または搬
送するのに好適な基板搬送容器に係り、特に容器内部の
ガス状汚染物質についての異常を検知するシステムに関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate transfer container suitable for storing or transferring a substrate such as a semiconductor wafer or a liquid crystal substrate in an atmosphere of high cleanliness, and more particularly to a gaseous pollutant inside the container. System for detecting abnormalities in

【0002】[0002]

【従来の技術】半導体ウェハ、或いは液晶デバイス用の
ガラス基板等を保管または搬送する場合には、塵埃等の
微粒子やガス状汚染物質が当該基板に付着すると、基板
が汚染され、デバイスの製造歩留まりの低下につなが
る。このため、半導体ウェハやガラス基板等の高清浄度
を要求される基板を保管・搬送するには、微粒子等の汚
染物質やガス状汚染物質の存在しない清浄空間を作りだ
し、その空間内に基板を収納し、保管・搬送することが
必要である。
2. Description of the Related Art When a semiconductor wafer, a glass substrate for a liquid crystal device, or the like is stored or transported, when fine particles such as dust or gaseous pollutants adhere to the substrate, the substrate is contaminated and the manufacturing yield of the device is increased. Leading to a decrease in Therefore, to store and transport semiconductor wafers, glass substrates, and other substrates that require high cleanliness, create a clean space free from contaminants such as fine particles and gaseous contaminants, and place the substrate in that space. It is necessary to store, store and transport.

【0003】係る局部的な清浄空間を作り出す手段とし
て、容器中にHEPAまたはULPAフィルタ等の粒子
除去フィルタと、ガス状汚染物質除去用のケミカルフィ
ルタとを用い、これらを介して空気をファンにより循環
させ、フィルタを通過した清浄な空気中に基板を収納す
る基板搬送容器が知られている。
As means for creating such a locally clean space, a particle removal filter such as a HEPA or ULPA filter and a chemical filter for removal of gaseous pollutants are used in a container, and air is circulated by a fan through these. There is known a substrate transfer container that stores a substrate in clean air that has passed through a filter.

【0004】[0004]

【発明が解決しようとする課題】このようなガス状汚染
物質除去用ケミカルフィルタを備えた基板搬送容器にお
いては、容器内にガス状汚染物質が存在すると、上記フ
ィルタにより除去されるが、基板搬送容器は一般に容積
が小さい。従って、容器内に持ち込む基板がその前工程
で極端にガス状汚染物質を含むような場合には、容器内
壁にガス状汚染物質が付着し、容器自体を汚染すること
にもなりかねない。このため、容器内部にガス状汚染物
質が異常に存在する場合には、これを検知して早急に対
策を施す必要がある。
In a substrate transfer container provided with such a chemical filter for removing gaseous pollutants, when a gaseous pollutant is present in the container, it is removed by the above-mentioned filter. The container generally has a small volume. Therefore, when the substrate brought into the container contains an extremely large amount of gaseous pollutants in the previous step, the gaseous pollutants may adhere to the inner wall of the container and contaminate the container itself. Therefore, when the gaseous pollutant is abnormally present inside the container, it is necessary to detect it and take immediate action.

【0005】本発明は、上述した事情に鑑みて為された
もので、基板搬送容器内の雰囲気中にガス状汚染物質が
異常に存在する場合には、これを検知することができる
異常検地装置を備えた基板搬送容器を提供することを目
的とする。
The present invention has been made in view of the above-mentioned circumstances, and when an abnormal gas pollutant is present in the atmosphere in the substrate transfer container, it can be detected. An object of the present invention is to provide a substrate transfer container including

【0006】[0006]

【課題を解決するための手段】本発明の基板搬送容器
は、基板を保管または搬送する容器において、前記容器
に接続して、容器内に存在するガス状汚染物質を検知す
るセンサを備えたことを特徴とする。
The substrate transport container of the present invention is a container for storing or transporting substrates, which comprises a sensor connected to the container for detecting a gaseous pollutant present in the container. Is characterized by.

【0007】上記本発明によれば、基板搬送容器内のガ
ス状汚染物質の存在を検知するセンサを備えたので、基
板搬送容器内の異常を早急に検知することが可能とな
る。これにより、基板搬送容器自体が汚染されることを
防止し、また前工程の異常等を速やかに検知することが
可能となる。
According to the present invention, since the sensor for detecting the presence of the gaseous pollutant in the substrate transfer container is provided, it is possible to immediately detect the abnormality in the substrate transfer container. As a result, it is possible to prevent the substrate transport container itself from being contaminated, and it is possible to quickly detect an abnormality or the like in the previous process.

【0008】ここで、前記センサは、前記ガス状汚染物
質に対して変色するPH紙と、その変色を検知する光学
センサとを備えることが好ましい。ただし、ガス状汚染
物質の検出方法として迅速かつメンテナンスの簡便な手
法であればいずれの手段に置き換えてもよい。例えば電
気化学的手法や電気的手法を用いたセンサを用いること
ができる。
Here, it is preferable that the sensor includes PH paper that changes color with respect to the gaseous pollutants, and an optical sensor that detects the color change. However, as a method for detecting a gaseous pollutant, any means may be used as long as it is a quick and easy maintenance method. For example, a sensor using an electrochemical method or an electric method can be used.

【0009】また、前記センサの動作を開始させる時間
を調整するタイマ機構を備えることが好ましい。これに
より、検知対象の基板の投入後に所定時間が経過して落
ち着いた状態で、ガス状汚染物質の検知を行うことがで
きる。
Further, it is preferable that a timer mechanism for adjusting the time for starting the operation of the sensor is provided. As a result, it is possible to detect the gaseous pollutant in a state where the substrate to be detected has been calmed down for a predetermined time after being input.

【0010】[0010]

【発明の実施の形態】以下、本発明の実施の形態につい
て、添付図面を参照しながら説明する。
DETAILED DESCRIPTION OF THE INVENTION Embodiments of the present invention will be described below with reference to the accompanying drawings.

【0011】図1は、本発明の実施形態の基板搬送容器
の異常検知装置を示す。基板搬送容器11は、半導体ウ
ェハ等の基板12を収納し、これを保管または搬送する
ための容器である。この基板搬送容器11には、ファン
13、ガス状汚染物質を吸着して除去するケミカルフィ
ルタ14、および粒子を除去する粒子除去フィルタ15
とを備えている。そして、ファン13により気流がケミ
カルフィルタ14および粒子除去フィルタ15を通して
流れ、これにより清浄化された気流が基板12の収納部
に流れるように、循環気流が形成されている。
FIG. 1 shows an abnormality detecting device for a substrate carrying container according to an embodiment of the present invention. The substrate transport container 11 is a container for housing a substrate 12 such as a semiconductor wafer and storing or transporting the substrate 12. A fan 13, a chemical filter 14 that adsorbs and removes gaseous pollutants, and a particle removal filter 15 that removes particles are provided in the substrate transfer container 11.
It has and. A circulating airflow is formed so that the fan 13 causes the airflow to flow through the chemical filter 14 and the particle removal filter 15, and the cleaned airflow to flow into the housing portion of the substrate 12.

【0012】ここで、ケミカルフィルタ(ガス状汚染物
質除去フィルタ)14について説明する。ガス状不純物
除去手段としては、除去対象物質に応じて種々選択する
ことができる。塩基性ガス除去手段としては、強酸性、
弱酸性カチオン不織布または繊維、あるいは強酸性、弱
酸性カチオン交換ビーズ等が好適であり、これらで塩基
性ガスを効率よく除去することができる。また、酸性薬
液を添着した活性炭やセラミックでも塩基性ガスを除去
できる。酸性ガスやボロン、リン等の除去手段として
は、強塩基性、弱塩基性アニオン交換不織布または繊
維、あるいは強塩基性、弱塩基性カチオン交換ビーズ等
が好適であり、これらで効率よく酸性ガス等を除去する
ことができる。また、塩基性薬液を添着した活性炭やセ
ラミックでも酸性ガス等を除去できる。
Here, the chemical filter (gas pollutant removal filter) 14 will be described. Various means for removing the gaseous impurities can be selected according to the substance to be removed. As a basic gas removing means, strong acid,
Weakly acidic cation non-woven fabric or fiber, strongly acidic or weakly acidic cation exchange beads and the like are suitable, and these can efficiently remove the basic gas. Also, basic gas can be removed by activated carbon or ceramics impregnated with an acidic chemical solution. As a means for removing acidic gas, boron, phosphorus, etc., strong basic, weak basic anion exchange nonwoven fabric or fiber, or strong basic, weak basic cation exchange beads are suitable, and acidic gas etc. can be efficiently used. Can be removed. Further, the activated carbon or ceramic impregnated with the basic chemical liquid can also remove the acidic gas and the like.

【0013】有機物は、活性炭、活性炭素繊維、ゼオラ
イト、モレキュラーシープ、シリカゲル、多孔質セラミ
ックで除去できる。オゾンは、粒状またはシート状の二
酸化マンガンを担持または添着したメディアや活性炭な
どで除去できる。また、蒸気状でイオン化したメタル、
例えば硫酸銅などは、イオン交換不織布やイオン交換ビ
ーズで除去できる。吸着素材構成は除去対象物質とフィ
ルタの許容寸法、形状、圧力損失などに応じて適宜選択
することができる。
Organic matter can be removed by activated carbon, activated carbon fiber, zeolite, molecular sheep, silica gel, porous ceramics. Ozone can be removed by media such as granular or sheet-shaped manganese dioxide supported or attached or activated carbon. In addition, vaporized metal ionized,
For example, copper sulfate or the like can be removed with an ion exchange non-woven fabric or ion exchange beads. The structure of the adsorbing material can be appropriately selected according to the removal target substance and the allowable size, shape, pressure loss, etc. of the filter.

【0014】この基板搬送容器11には、その内部のガ
ス状汚染物質の異常を検知する異常検知装置21を備え
ている。容器11には、その容器内部の空気を配管22
から取り込み、センサ容器28でガス状汚染物質の異常
を検知し、配管25を介して容器11に気流を循環させ
る分岐路を備えている。即ち、この分岐路には配管2
2,23を介して気流がセンサ室28に導入され、異常
の検知が終了した気流は配管24,25を介して容器1
1のケミカルフィルタ14の下流側に戻される。配管2
2,23の間には開閉バルブ26が配置され、配管2
4,25の間には同様に開閉バルブ27が配置されてい
る。従って、開閉バルブ26,27の開閉により、分岐
路に気流が流れるか否かが制御される。
The substrate transfer container 11 is provided with an abnormality detection device 21 for detecting an abnormality of the gaseous pollutants inside the substrate transfer container 11. In the container 11, the air inside the container is piped 22
The sensor container 28 is provided with a branch passage for detecting an abnormality of the gaseous pollutant and for circulating an air flow through the pipe 25 to the container 11. That is, the pipe 2
The airflow is introduced into the sensor chamber 28 through the pipes 2 and 23, and the airflow after the detection of abnormality is completed through the pipes 24 and 25.
It is returned to the downstream side of the No. 1 chemical filter 14. Piping 2
An opening / closing valve 26 is arranged between the pipes 2 and 23, and the pipe 2
An opening / closing valve 27 is similarly arranged between the No. 4 and No. 25. Therefore, by opening / closing the opening / closing valves 26 and 27, it is controlled whether or not the airflow flows through the branch passage.

【0015】センサ容器28内には、ガス状汚染物質が
存在すると変色するPH紙29を備え、その変色の状況
を光学センサ30で捉えるようになっている。即ち、気
流中に予想外の酸およびアルカリが存圧する場合にPH
紙29が変色し、この変色をCCD撮像素子等の光学セ
ンサ30により検出する。
The sensor container 28 is provided with PH paper 29 that changes color when a gaseous pollutant is present, and the optical sensor 30 detects the color change condition. That is, when unexpected acid and alkali are present in the air flow,
The paper 29 discolors, and this discoloration is detected by an optical sensor 30 such as a CCD image sensor.

【0016】開閉バルブ26,27はタイマ31により
制御され、マイクロコンピュータ等からなる制御装置3
2の指令により所定時間の開閉制御を行う。また、制御
装置32は、基板搬送容器11と信号の送受信を行う。
これにより、基板搬送容器11への基板12の投入等に
同期して開閉バルブ26,27の開閉を制御できるよう
になっている。基板搬送容器11には、循環気流流路の
ケミカルフィルタ14の上流側と下流側に分岐管を挿入
する開口を設け、その開口部に配管22,25を挿入
し、分岐路の接続時以外にはその開口をゴム栓等で封止
するようにしてもよい。また、基板容器11自体に配管
22,25と開閉バルブ26,27とセンサ容器28と
光学センサ30等からなる異常検知装置21の一式を備
えるようにしてもよい。
The open / close valves 26 and 27 are controlled by a timer 31, and are a control device 3 including a microcomputer or the like.
The opening / closing control for a predetermined time is performed according to the command of 2. The control device 32 also transmits and receives signals to and from the substrate transport container 11.
Thus, opening / closing of the opening / closing valves 26 and 27 can be controlled in synchronization with loading of the substrate 12 into the substrate transport container 11. The substrate transfer container 11 is provided with openings for inserting branch pipes on the upstream side and the downstream side of the chemical filter 14 in the circulating air flow path, and the pipes 22 and 25 are inserted into the openings, except when the branch paths are connected. The opening may be sealed with a rubber stopper or the like. Further, the substrate container 11 itself may be provided with a set of the abnormality detecting device 21 including the pipes 22 and 25, the opening / closing valves 26 and 27, the sensor container 28, the optical sensor 30, and the like.

【0017】図2は、基板搬送容器内のPHの変化例を
示す図である。この例の場合には、基板の投入時には基
板搬送容器内の気流中のPHが非常に高く、その後徐々
に時間の経過と共に低減する場合を示している。このよ
うな場合には、タイマ31による開閉バルブ26,27
の開閉のタイミングを、基板投入からある一定時間経過
してから、容器11内の気流をセンサ容器28側に取り
込むことが好ましい。これにより、基板搬送容器内の気
流中のPHが定常状態に落ち着いてからその異常の有無
を検知することができる。なお、このタイマ31の動作
は、予め対象容器および対象工程について各工程毎に設
定を変えるようにしてもよい。
FIG. 2 is a diagram showing an example of changes in PH in the substrate transfer container. In the case of this example, the case is shown in which the PH in the air flow in the substrate transport container is very high at the time of loading the substrate and then gradually decreases with the passage of time. In such a case, the opening / closing valves 26, 27 by the timer 31
It is preferable that the opening / closing timing of (1) is taken into the sensor container 28 side by the air flow in the container 11 after a certain period of time has elapsed since the substrate was charged. This makes it possible to detect the presence / absence of the abnormality after the PH in the air flow in the substrate transport container has settled in a steady state. The operation of the timer 31 may be changed in advance for each process for the target container and the target process.

【0018】測定するエア中には複数のガス種が混在す
る。そのため対象ガスごとにガス状汚染物質に対して変
色する発色剤含浸紙と、その変色を検知する光学センサ
の組み合わせでガス濃度を測定する場合、複数のガス種
の干渉を防ぐため発色剤含浸紙は単一ガスのみ測定する
ように設定することが望ましい。上記発色剤含浸紙とし
ては大きく分けて3種類の原理を用いたものが実用化さ
れている。第1に、紙に含浸させた金属塩が測定ガスに
還元され、発色するものとして、例えば、ホスフィン、
アルシン等がある。第2に、紙に含浸させた化合物と測
定ガスが反応し生成した化合物が発色するものとして、
例えば塩素等がある。第3に、狭領域で変色するPH指
示薬を紙に含浸させ、特定のガスのみの測定を可能にす
るものとして、例えばアンモニア等がある。
A plurality of gas species are mixed in the air to be measured. Therefore, when measuring the gas concentration with a combination of a color-developer impregnated paper that changes the color of each target gas with respect to gaseous pollutants and an optical sensor that detects the color change, the color-developer impregnated paper is used to prevent interference of multiple gas species. Is preferably set to measure only a single gas. As the above-mentioned color-forming agent-impregnated paper, papers that are roughly divided into three types and are used in practice. Firstly, the metal salt impregnated in the paper is reduced to a measuring gas to generate a color, for example, phosphine,
There are arsine, etc. Secondly, it is assumed that the compound impregnated in the paper and the measuring gas react with each other to generate a color,
For example chlorine. Thirdly, there is, for example, ammonia or the like as a material capable of measuring only a specific gas by impregnating a paper with a PH indicator which discolors in a narrow region.

【0019】なお、本発明の基板搬送容器の異常検知装
置は、上述の図示例にのみ限定されるものではなく、本
発明の要旨を逸脱しない範囲内において種々変更を加え
得ることは勿論である。
The abnormality detecting device for a substrate transport container according to the present invention is not limited to the above-described illustrated example, and various modifications can be made without departing from the scope of the present invention. .

【0020】[0020]

【発明の効果】以上説明したように本発明によれば、基
板搬送容器内のガス状汚染物質についての異常検知が行
えるようになり、これにより半導体基板等の収納物につ
いて、その製造歩留まりの低下等の異常を未然に防止す
ることが可能となる。
As described above, according to the present invention, it is possible to detect an abnormality regarding a gaseous pollutant in a substrate transfer container, which reduces the manufacturing yield of stored items such as semiconductor substrates. It is possible to prevent such abnormalities.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施形態の基板搬送容器と、その異常
検知装置を示す図である。
FIG. 1 is a diagram showing a substrate transfer container according to an embodiment of the present invention and an abnormality detection device therefor.

【図2】基板搬送容器内のPHの変化例を示すグラフで
ある。
FIG. 2 is a graph showing an example of changes in PH in a substrate transport container.

【符号の説明】[Explanation of symbols]

11 基板搬送容器 12 基板(半導体ウェハ) 13 ファン 14 ケミカルフィルタ 15 粒子除去フィルタ 21 異常検知装置 22,23,24,25 配管 26,27 開閉バルブ 28 センサ容器 29 PH紙 30 光学センサ 31 タイマ 32 制御装置 11 Substrate transport container 12 Substrate (semiconductor wafer) 13 fans 14 Chemical filter 15 Particle removal filter 21 Abnormality detection device 22, 23, 24, 25 Piping 26,27 open / close valve 28 sensor containers 29 PH paper 30 Optical sensor 31 timer 32 control device

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01L 21/02 B65D 85/38 R (72)発明者 田中 亮 東京都大田区羽田旭町11番1号 株式会社 荏原製作所内 (72)発明者 鈴木 庸子 東京都大田区羽田旭町11番1号 株式会社 荏原製作所内 Fターム(参考) 2G042 AA01 CB01 DA08 FB07 FC00 GA05 2G054 AA01 CA03 CE01 GB10 3E096 BA15 CA02 DA26 DC02 FA03 FA22 FA40 GA20 5F031 CA02 CA05 EA14 EA19 JA02 JA08 JA22 JA31 NA14 NA15 NA20 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) H01L 21/02 B65D 85/38 R (72) Inventor Ryo Tanaka 11-1 Haneda Asahi-cho, Ota-ku, Tokyo In the EBARA CORPORATION (72) Inventor Yoko Yoko 11-11 Haneda Asahi-cho, Ota-ku, Tokyo F-term inside the EBARA Corporation (reference) 2G042 AA01 CB01 DA08 FB07 FC00 GA05 2G054 AA01 CA03 CE01 GB10 3E096 BA15 CA02 DA26 DC02 FA03 FA22 FA40 GA20 5F031 CA02 CA05 EA14 EA19 JA02 JA08 JA22 JA31 NA14 NA15 NA20

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 基板を保管または搬送する容器と、前記
容器に接続して、容器内に存在するガス状汚染物質を検
知するセンサとを備えたことを特徴とする基板搬送容器
の異常検知装置。
1. An abnormality detecting apparatus for a substrate transfer container, comprising: a container for storing or transferring a substrate; and a sensor connected to the container for detecting a gaseous contaminant existing in the container. .
【請求項2】 前記容器には、ガス状汚染物質を除去す
るためのケミカルフィルタとファンとを備えたことを特
徴とする請求項1記載の基板搬送容器の異常検知装置。
2. The abnormality detecting device for a substrate transfer container according to claim 1, wherein the container is provided with a chemical filter for removing gaseous pollutants and a fan.
【請求項3】 前記センサは、前記ガス状汚染物質に対
して変色するPH紙と、その変色を検知する光学センサ
とからなることを特徴とする請求項1記載の基板搬送容
器の異常検知装置。
3. The abnormality detecting device for a substrate transport container according to claim 1, wherein the sensor comprises PH paper that changes color with respect to the gaseous pollutants, and an optical sensor that detects the color change. .
【請求項4】 前記センサの動作を開始させる時間を調
整するタイマ機構を備えたことを特徴とする請求項1記
載の基板搬送容器の異常検知装置。
4. The abnormality detecting device for a substrate transport container according to claim 1, further comprising a timer mechanism for adjusting a time for starting the operation of the sensor.
JP2002018753A 2002-01-28 2002-01-28 Abnormality detecting device for substrate carrying container Pending JP2003224182A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002018753A JP2003224182A (en) 2002-01-28 2002-01-28 Abnormality detecting device for substrate carrying container

Publications (1)

Publication Number Publication Date
JP2003224182A true JP2003224182A (en) 2003-08-08

Family

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Family Applications (1)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8591809B2 (en) 2010-03-15 2013-11-26 Samsung Electronics Co., Ltd. Substrate transfer container, gas purge monitoring tool, and semiconductor manufacturing equipment with the same
WO2014092074A1 (en) * 2012-12-10 2014-06-19 東京エレクトロン株式会社 Substrate processing device, substrate processing system, and transport-container anomaly detection method
CN105241880A (en) * 2015-09-08 2016-01-13 中国农业大学 PH value automatic monitoring system
KR20200013614A (en) * 2018-07-30 2020-02-07 티디케이가부시기가이샤 Sensor built-in filter structure and wafer accommodation container

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8591809B2 (en) 2010-03-15 2013-11-26 Samsung Electronics Co., Ltd. Substrate transfer container, gas purge monitoring tool, and semiconductor manufacturing equipment with the same
WO2014092074A1 (en) * 2012-12-10 2014-06-19 東京エレクトロン株式会社 Substrate processing device, substrate processing system, and transport-container anomaly detection method
JP2014116464A (en) * 2012-12-10 2014-06-26 Tokyo Electron Ltd Substrate processing apparatus, substrate processing system and method of detecting abnormality of conveying container
US9773690B2 (en) 2012-12-10 2017-09-26 Tokyo Electron Limited Substrate processing apparatus, substrate processing system, and method of detecting abnormality in transport container
CN105241880A (en) * 2015-09-08 2016-01-13 中国农业大学 PH value automatic monitoring system
KR20200013614A (en) * 2018-07-30 2020-02-07 티디케이가부시기가이샤 Sensor built-in filter structure and wafer accommodation container
KR102236844B1 (en) 2018-07-30 2021-04-06 티디케이가부시기가이샤 Sensor built-in filter structure and wafer accommodation container

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