JP2003219535A - Wiring storage pit for clean room - Google Patents

Wiring storage pit for clean room

Info

Publication number
JP2003219535A
JP2003219535A JP2002014927A JP2002014927A JP2003219535A JP 2003219535 A JP2003219535 A JP 2003219535A JP 2002014927 A JP2002014927 A JP 2002014927A JP 2002014927 A JP2002014927 A JP 2002014927A JP 2003219535 A JP2003219535 A JP 2003219535A
Authority
JP
Japan
Prior art keywords
clean room
pit
wiring storage
storage pit
floor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002014927A
Other languages
Japanese (ja)
Other versions
JP3933942B2 (en
Inventor
Tadahiro Omi
忠弘 大見
Takahisa Yamada
高久 山田
Hiroshi Sumihama
浩 角濱
Katsunori Nakazawa
克典 中沢
Hirokazu Suzuki
宏和 鈴木
Kenji Muraoka
憲司 村岡
Masayasu Miura
正泰 三浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kumagai Gumi Co Ltd
Original Assignee
Kumagai Gumi Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kumagai Gumi Co Ltd filed Critical Kumagai Gumi Co Ltd
Priority to JP2002014927A priority Critical patent/JP3933942B2/en
Publication of JP2003219535A publication Critical patent/JP2003219535A/en
Application granted granted Critical
Publication of JP3933942B2 publication Critical patent/JP3933942B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Ventilation (AREA)
  • Details Of Indoor Wiring (AREA)
  • Installation Of Indoor Wiring (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To solve the problem of a floor in an underfloor area of the clean room, such as a semiconductor manufacturing factory, being provided with a wiring storage pit for storing electric wires for electrical apparatuses or the like, where electric charges are apt to gather, however, a conventional wiring storage pit for a clean room causes troubles in semiconductor manufacture, because it has no complete antistatic measures. <P>SOLUTION: In this wiring storage pit 47 for the clean room, the inner surface of a pit hole 22 is formed out of a conductor plate (mold form 1), so as to make the surface of the floor 21 subjected to conductive treatment, the surface of a lid 2, and the conductor plate to be electrically conducting with each other. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、半導体製造等に使
用されるクリーンルームの配線収納ピットに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wiring accommodating pit in a clean room used for semiconductor manufacturing or the like.

【0002】[0002]

【従来の技術】従来、半導体製造工場等のクリーンルー
ムの床下エリアの床には、電気機器などの配線を収納す
るための配線収納ピットが設けられている。
2. Description of the Related Art Conventionally, a wiring storage pit for accommodating wiring of electric equipment is provided on the floor of an underfloor area of a clean room such as a semiconductor manufacturing factory.

【0003】[0003]

【発明が解決しようとする課題】配線収納ピットにおい
ては電荷が溜まりやすいが、従来のクリーンルームの配
線収納ピットにおいては、帯電防止対策が万全とは言え
ず、半導体製造においてトラブルの原因となるという課
題があった。
Electric charges easily accumulate in the wiring storage pits, but in the conventional wiring storage pits of a clean room, antistatic measures cannot be said to be perfect and cause troubles in semiconductor manufacturing. was there.

【0004】[0004]

【課題を解決するための手段】請求項1に係るクリーン
ルームの配線収納ピットは、ピット穴の内面を導体板で
形成し、導電処理された床表面および蓋表面と上記導体
板とを導通させた。請求項2は、ピット穴の内面におけ
る底側壁面と底面とを傾斜面で接続した。請求項3は、
ガス発散の少ない導電性塗料により上記導電処理を施し
た。
In the wiring accommodating pit of the clean room according to claim 1, the inner surface of the pit hole is formed of a conductor plate, and the floor surface and lid surface subjected to the conductive treatment are electrically connected to the conductor plate. . According to the second aspect, the bottom side wall surface and the bottom surface of the inner surface of the pit hole are connected by the inclined surface. Claim 3
The above conductive treatment was carried out with a conductive paint with little gas emission.

【0005】[0005]

【発明の実施の形態】以下、本発明の実施の形態を図1
〜図3に基づき説明する。まず、本実施の形態における
配線収納ピットが採用される半導体製造工場のクリーン
ルームの概要を図3に基づいて説明する。クリーンルー
ムは3層構造となっている。即ち、半導体製造や検査な
どに必要な精密機器が設置されるプロセスエリア10
と、床下エリア20と、天井エリア30とを備える。プ
ロセスエリア10の床は有孔床(グレーチング)11と
なっており、プロセスエリア10の天井は有孔天井12
となっている。天井エリア30には、空調機31と空気
洗浄フィルタ32が設けられている。プロセスエリア1
0の横には空気循環空間10Aが設けられ、これによ
り、空気が空気洗浄フィルタ32で浄化されて、矢示の
ように各エリア10,20,30を循環する構造となっ
ている。また、出入口40と外部との間にはエアーシャ
ワーが装備された前室が設けられており、クリーンルー
ムへの入室者は前室で空気洗浄を行った後にクリーンル
ーム内に入る。前室は、クリーンルーム側のドア40a
と外部側のドアとで密閉空間となる。尚、41は空気循
環空間10Aとプロセスエリア10との間の出入口、4
1aはこの出入口41のドア、42は柱、43、44は
耐火被覆梁、45は二重サッシュ窓、46は廊下、47
は配線を収納する配線収納ピットである。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to FIG.
~ It demonstrates based on FIG. First, an outline of a clean room of a semiconductor manufacturing factory in which the wiring storage pit according to the present embodiment is adopted will be described with reference to FIG. The clean room has a three-layer structure. That is, the process area 10 in which precision equipment necessary for semiconductor manufacturing and inspection is installed.
And an underfloor area 20 and a ceiling area 30. The floor of the process area 10 is a perforated floor (grating) 11, and the ceiling of the process area 10 is a perforated ceiling 12.
Has become. An air conditioner 31 and an air cleaning filter 32 are provided in the ceiling area 30. Process area 1
An air circulation space 10A is provided on the side of 0, whereby the air is purified by the air cleaning filter 32 and circulates in each area 10, 20, 30 as shown by the arrow. Further, a front room equipped with an air shower is provided between the entrance 40 and the outside, and a person entering the clean room enters the clean room after performing air cleaning in the front room. The front room is the door 40a on the clean room side
And the outside door form a closed space. Reference numeral 41 denotes an entrance / exit between the air circulation space 10A and the process area 4,
1a is a door of this entrance / exit 41, 42 is a pillar, 43 and 44 are fireproof coated beams, 45 is a double sash window, 46 is a corridor, 47
Is a wiring storage pit for storing wiring.

【0006】次に、実施の形態による上記配線収納ピッ
ト47の詳細を図1,2に基づき説明する。配線収納ピ
ット47の施工方法は次のとおりである。まず、床下エ
リア20の床21を施工する際に、配線収納ピット47
を設ける位置に配線収納ピット47の内面を構成する導
体板であるガルバリウム鋼板でコンクリート打ち込み型
枠1を形成し、型枠1の外側に鉄筋を配置した後に当該
外側にコンクリートを打ち込んで床下エリア20のコン
クリート床21を構築する。これにより、コンクリート
床21に形成されるピット穴22の内面が上記型枠1で
形成されることになる。型枠1の壁100と底101は
コンクリートビス102でコンクリートに固定する。上
記型枠1の上部には、蓋2を受けるための受け枠部1A
が形成されている。蓋2は鋼板より成り、受け枠部1A
の受け面1dに載置されて蓋上面2aを床面21aとほ
ぼ同一面上に維持する保持部2bを備える。床21の床
面21aには受け枠部1Aの上端1tまで被るように導
電性塗装が施されて成る導電処理層3が設けられ、受け
枠部1Aと導通するように構成されている。尚、図示し
ないが、蓋2の表面及び型枠1の内面における壁面1a
にも導電性塗料が施されて成る導電処理層が設けられて
いる。また、保持部2bは長ビス4により受け面1dに
固定され、受け面1dと蓋2との導通を確保するためと
防振のために、保持部2bの下部あるいは受け面1d上
に導電性ゴム5を設けている。また、上記各導電処理層
は、ガス発散の少ない導電性塗料を用いて形成してい
る。また、図2に示すように、型枠1の壁面1aの底側
と底面1bとがガルバリウム鋼板で形成された導体板6
で接続され、傾斜面7が形成されている。尚、導体板6
は長尺なもので巾木のような機能を果たすものであり、
ビス103で壁100と底101に固定される。
Next, details of the wiring storage pit 47 according to the embodiment will be described with reference to FIGS. The construction method of the wiring storage pit 47 is as follows. First, when constructing the floor 21 of the underfloor area 20, the wiring storage pit 47
An underfloor area 20 is formed by forming a concrete driving form 1 with a galvalume steel plate which is a conductor plate forming the inner surface of the wiring storage pit 47 at the position where the The concrete floor 21 of is constructed. As a result, the inner surface of the pit hole 22 formed in the concrete floor 21 is formed by the mold 1. The wall 100 and the bottom 101 of the formwork 1 are fixed to the concrete with concrete screws 102. On the upper part of the mold 1 is a receiving frame portion 1A for receiving the lid 2.
Are formed. The lid 2 is made of steel plate and has a receiving frame portion 1A
The holding portion 2b is mounted on the receiving surface 1d of the above and keeps the lid upper surface 2a substantially flush with the floor surface 21a. The floor surface 21a of the floor 21 is provided with a conductive treatment layer 3 formed by applying conductive coating so as to cover the upper end 1t of the receiving frame portion 1A, and is configured to be electrically connected to the receiving frame portion 1A. Although not shown, the wall surface 1a on the surface of the lid 2 and the inner surface of the mold 1
Also, a conductive treatment layer formed by applying a conductive paint is provided. Further, the holding portion 2b is fixed to the receiving surface 1d by a long screw 4, and in order to secure conduction between the receiving surface 1d and the lid 2 and for vibration isolation, the holding portion 2b is electrically conductive on the lower portion of the holding portion 2b or on the receiving surface 1d. A rubber 5 is provided. In addition, each of the conductive treatment layers is formed by using a conductive paint that emits less gas. In addition, as shown in FIG. 2, a conductor plate 6 in which the bottom side and the bottom surface 1b of the wall surface 1a of the mold 1 are formed of a galvalume steel plate.
And the inclined surface 7 is formed. The conductor plate 6
Is a long one and functions like a skirting board.
It is fixed to the wall 100 and the bottom 101 with screws 103.

【0007】以上によれば、ガルバリウム鋼板で形成さ
れた型枠1と表面に導電処理層が設けられた床21の表
面と蓋2の表面とが導通するので、例えば、導電処理層
3や型枠1をアースすることで、型枠1と導電処理層と
が均一電位となり、型枠1や導電処理層の帯電電流をア
ースに素早く逃がすことができるようになる。また、最
も電荷が帯電しやすい型枠1の内面の壁面1aにも導電
処理層を設けたので配線収納ピット47内の帯電防止効
果を向上させることができる。また、静電気による埃の
付着も防止でき、クリーンルームの埃汚染を少なくでき
る。また、型枠1の内面の底側に傾斜面7を設けたの
で、ピット底隅の埃たまりを防止でき、クリーンルーム
の埃汚染を防止できる。また、以上の帯電防止及び埃防
止構造により、静電気スパークによる有機物反応により
生じるガスの発生も防止でき、クリーンルーム内のガス
汚染を少なくできる。また、導電処理層をガス発散の少
ない導電性塗料を用いて形成しているので、導電処理層
からのガス発散、及びコンクリートからのガス発生を抑
えることができるので、半導体製造においてトラブルの
原因となるガスを抑えることができる。即ち、クリーン
ルームのガス汚染を少なくできる。
According to the above, the mold 1 made of a galvalume steel plate and the surface of the floor 21 having the conductive treatment layer on the surface and the surface of the lid 2 are electrically connected to each other. By grounding the frame 1, the mold 1 and the conductive treatment layer have a uniform potential, and the charging current of the mold 1 and the conductive treatment layer can be quickly released to the ground. Further, since the conductive treatment layer is also provided on the inner wall surface 1a of the mold 1 which is most easily charged with electric charges, the antistatic effect in the wiring storage pit 47 can be improved. Further, it is possible to prevent dust from adhering due to static electricity and reduce dust contamination in the clean room. Further, since the inclined surface 7 is provided on the bottom side of the inner surface of the form 1, dust accumulation at the bottom corner of the pit can be prevented, and dust contamination in the clean room can be prevented. Further, with the above-described antistatic and dust prevention structure, it is possible to prevent the generation of gas caused by the reaction of organic substances due to electrostatic sparks and reduce the gas pollution in the clean room. Further, since the conductive treatment layer is formed by using a conductive paint having a small gas emission, it is possible to suppress the gas emission from the conductive treatment layer and the gas generation from the concrete, and cause a trouble in semiconductor manufacturing. It is possible to suppress the gas that becomes. That is, gas pollution in the clean room can be reduced.

【0008】[0008]

【発明の効果】本発明の請求項1によれば、穴の内面を
導体板で形成し、導電処理された床面および蓋表面と導
体板とを導通させたので、帯電防止効果に優れたクリー
ンルームの配線収納ピットを得ることができる。請求項
2によれば、ピット穴の内面における底側に傾斜面を設
けたので、ピット底隅の埃たまりを防止でき、クリーン
ルームの埃汚染を防止できる。請求項3によれば、ガス
発散の少ない導電性塗料により上記導電処理を施したの
で、クリーンルームのガス汚染を少なくできる。
According to the first aspect of the present invention, the inner surface of the hole is formed of the conductor plate, and the conductive surface and the surface of the floor and the lid are electrically connected to each other, so that the antistatic effect is excellent. You can get the wiring storage pit in the clean room. According to the second aspect, since the inclined surface is provided on the bottom side of the inner surface of the pit hole, dust accumulation at the bottom corner of the pit can be prevented, and dust contamination in the clean room can be prevented. According to the third aspect, since the conductive treatment is performed with the conductive paint having a small gas emission, the gas contamination in the clean room can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の実施の形態によるクリーンルームの
配線収納ピットの断面図。
FIG. 1 is a sectional view of a wiring storage pit in a clean room according to an embodiment of the present invention.

【図2】 実施の形態による配線収納ピットの底部の拡
大断面図。
FIG. 2 is an enlarged cross-sectional view of the bottom of the wiring storage pit according to the embodiment.

【図3】 実施の形態による配線収納ピットを採用する
クリーンルームの概要を示す断面図。
FIG. 3 is a cross-sectional view showing an outline of a clean room adopting the wiring storage pit according to the embodiment.

【符号の説明】[Explanation of symbols]

1 型枠(導体板)、1a 壁面、1b 底面、7 傾
斜面、22 ピット穴。
1 Formwork (conductor plate), 1a wall surface, 1b bottom surface, 7 inclined surface, 22 pit holes.

フロントページの続き (72)発明者 山田 高久 東京都新宿区津久戸町2番1号 株式会社 熊谷組東京本社内 (72)発明者 角濱 浩 宮城県仙台市青葉区立町26番20号 株式会 社熊谷組東北支店内 (72)発明者 中沢 克典 宮城県仙台市青葉区立町26番20号 株式会 社熊谷組東北支店内 (72)発明者 鈴木 宏和 東京都新宿区津久戸町2番1号 株式会社 熊谷組東京本社内 (72)発明者 村岡 憲司 宮城県仙台市青葉区立町26番20号 株式会 社熊谷組東北支店内 (72)発明者 三浦 正泰 北海道札幌市中央区北2条西13丁目1番地 株式会社熊谷組北海道支店内 Fターム(参考) 3L058 BF09 5G357 DA05 DB01 DC05 DD02 DD06 DD14 DE03 DE08 5G363 AA09 BA01 DB11 DB25 Continued front page    (72) Inventor Takahisa Yamada             No. 2 Tsukutocho, Shinjuku-ku, Tokyo Co., Ltd.             Kumagai Gumi Tokyo Head Office (72) Inventor Hiroshi Kakuhama             26-20 Tatemachi, Aoba-ku, Sendai City, Miyagi Prefecture Stock Association             Company Kumagaya Gumi Tohoku Branch (72) Inventor Katsunori Nakazawa             26-20 Tatemachi, Aoba-ku, Sendai City, Miyagi Prefecture Stock Association             Company Kumagaya Gumi Tohoku Branch (72) Inventor Hirokazu Suzuki             No. 2 Tsukutocho, Shinjuku-ku, Tokyo Co., Ltd.             Kumagai Gumi Tokyo Head Office (72) Inventor Kenji Muraoka             26-20 Tatemachi, Aoba-ku, Sendai City, Miyagi Prefecture Stock Association             Company Kumagaya Gumi Tohoku Branch (72) Inventor Masayasu Miura             13-1, Kita 2-jo Nishi, Chuo-ku, Sapporo-shi, Hokkaido               Kumagai Gumi Hokkaido Branch F term (reference) 3L058 BF09                 5G357 DA05 DB01 DC05 DD02 DD06                       DD14 DE03 DE08                 5G363 AA09 BA01 DB11 DB25

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 クリーンルームの床に形成され、床に沿
って延長するピット穴の上を蓋で覆って成る配線収納ピ
ットであって、 ピット穴の内面を導体板で形成し、導電処理された床表
面および蓋表面と上記導体板とを導通させたことを特徴
とするクリーンルームの配線収納ピット。
1. A wiring storage pit which is formed on a floor of a clean room and is formed by covering a pit hole extending along the floor with a lid, wherein the inner surface of the pit hole is formed of a conductive plate and is subjected to a conductive treatment. A wiring storage pit in a clean room, characterized in that the floor surface and the lid surface are electrically connected to the conductor plate.
【請求項2】 ピット穴の内面における底側壁面と底面
とが傾斜面で接続されていることを特徴とする請求項1
に記載のクリーンルームの配線収納ピット。
2. The inner surface of the pit hole is connected to the bottom side wall surface and the bottom surface by an inclined surface.
Wiring storage pit in the clean room described in.
【請求項3】 ガス発散の少ない導電性塗料により上記
導電処理が施されていることを特徴とする請求項1又は
請求項2に記載のクリーンルームの配線収納ピット。
3. The wiring accommodating pit for a clean room according to claim 1 or 2, wherein the conductive treatment is performed with a conductive paint having a small gas emission.
JP2002014927A 2002-01-24 2002-01-24 Wiring storage pit in clean room Expired - Fee Related JP3933942B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002014927A JP3933942B2 (en) 2002-01-24 2002-01-24 Wiring storage pit in clean room

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002014927A JP3933942B2 (en) 2002-01-24 2002-01-24 Wiring storage pit in clean room

Publications (2)

Publication Number Publication Date
JP2003219535A true JP2003219535A (en) 2003-07-31
JP3933942B2 JP3933942B2 (en) 2007-06-20

Family

ID=27651470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002014927A Expired - Fee Related JP3933942B2 (en) 2002-01-24 2002-01-24 Wiring storage pit in clean room

Country Status (1)

Country Link
JP (1) JP3933942B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101644476A (en) * 2008-08-05 2010-02-10 株式会社海广 Exhaust system of dust free room and construction method thereof
JP2011257018A (en) * 2010-06-05 2011-12-22 Takenaka Komuten Co Ltd Clean room facility and zoning method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101644476A (en) * 2008-08-05 2010-02-10 株式会社海广 Exhaust system of dust free room and construction method thereof
JP2010037931A (en) * 2008-08-05 2010-02-18 Hae Kwang Co Ltd Exhaust system of clean room and construction method used for the same
JP4500871B2 (en) * 2008-08-05 2010-07-14 株式会社海廣 Clean room exhaust system and construction method thereof
KR101004008B1 (en) 2008-08-05 2010-12-31 주식회사 해광 Air exhausting apparatus for clean-room and method for establishing a system
JP2011257018A (en) * 2010-06-05 2011-12-22 Takenaka Komuten Co Ltd Clean room facility and zoning method thereof

Also Published As

Publication number Publication date
JP3933942B2 (en) 2007-06-20

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