JP2003218430A5 - - Google Patents
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- JP2003218430A5 JP2003218430A5 JP2002278935A JP2002278935A JP2003218430A5 JP 2003218430 A5 JP2003218430 A5 JP 2003218430A5 JP 2002278935 A JP2002278935 A JP 2002278935A JP 2002278935 A JP2002278935 A JP 2002278935A JP 2003218430 A5 JP2003218430 A5 JP 2003218430A5
- Authority
- JP
- Japan
- Prior art keywords
- magnetization vector
- reset
- pinned layer
- layer
- magnetization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005415 magnetization Effects 0.000 claims 34
- 230000005291 magnetic Effects 0.000 claims 15
- 230000001808 coupling Effects 0.000 claims 7
- 238000010168 coupling process Methods 0.000 claims 7
- 238000005859 coupling reaction Methods 0.000 claims 7
- 230000005290 antiferromagnetic Effects 0.000 claims 4
- 238000000137 annealing Methods 0.000 claims 3
- 230000005294 ferromagnetic Effects 0.000 claims 3
- 230000000903 blocking Effects 0.000 claims 1
- 230000000875 corresponding Effects 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000007689 inspection Methods 0.000 claims 1
Claims (31)
前記層の少なくとも1つの磁化ベクトルを再設定するステップ
を含む、方法。Forming a magnetic tunnel junction including a pinned layer and a sense layer;
Resetting at least one magnetization vector of the layer.
検査結果にしたがって少なくとも1つの磁化ベクトルを再設定するステップ
をさらに含む、請求項1の方法。Inspecting the switching characteristics of the joint;
The method of claim 1, further comprising resetting at least one magnetization vector according to the inspection result.
前記接合についての所望の切替え曲線を決定するステップと、
前記層の少なくとも1つの層の磁化ベクトルを再設定するステップ
を含む、方法。Forming a magnetic tunnel junction including a pinned layer and a sense layer;
Determining a desired switching curve for the joint;
Resetting the magnetization vector of at least one of the layers.
ピン止め層であって、該ピン止め層の面に存在する第1の磁化ベクトルを有する、ピン止め層と、
センス層であって、該センス層の面に存在する第2の磁化ベクトルを有するセンス層
を有し、
前記第1の磁化ベクトルと第2の磁化ベクトルの少なくとも1つが、異なる角度に再設定されており、前記異なる角度は、前記接合の所望の切替え曲線に対応することからなる、磁気トンネル接合。In magnetic tunnel junctions,
A pinned layer having a first magnetization vector present on a surface of the pinned layer;
A sense layer, comprising a sense layer having a second magnetization vector present on a surface of the sense layer;
A magnetic tunnel junction, wherein at least one of the first magnetization vector and the second magnetization vector is reset to a different angle, the different angle corresponding to a desired switching curve of the junction.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/971,347 US6649423B2 (en) | 2001-10-04 | 2001-10-04 | Method for modifying switching field characteristics of magnetic tunnel junctions |
US09/971347 | 2001-10-04 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2003218430A JP2003218430A (en) | 2003-07-31 |
JP2003218430A5 true JP2003218430A5 (en) | 2005-04-14 |
JP4456805B2 JP4456805B2 (en) | 2010-04-28 |
Family
ID=25518254
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002278935A Expired - Fee Related JP4456805B2 (en) | 2001-10-04 | 2002-09-25 | Manufacturing method of magnetic tunnel junction |
Country Status (7)
Country | Link |
---|---|
US (2) | US6649423B2 (en) |
EP (1) | EP1300853B1 (en) |
JP (1) | JP4456805B2 (en) |
KR (1) | KR100923772B1 (en) |
CN (1) | CN100336239C (en) |
DE (1) | DE60203677T2 (en) |
TW (1) | TWI222063B (en) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100407907B1 (en) * | 2001-05-15 | 2003-12-03 | 한국과학기술연구원 | Thermal anneal method of magnetic tunnel junction, and magnetic tunneling junction fabricated by the method |
US6717194B2 (en) * | 2001-10-30 | 2004-04-06 | Micron Technology, Inc. | Magneto-resistive bit structure and method of manufacture therefor |
FR2832542B1 (en) * | 2001-11-16 | 2005-05-06 | Commissariat Energie Atomique | MAGNETIC DEVICE WITH MAGNETIC TUNNEL JUNCTION, MEMORY AND METHODS OF WRITING AND READING USING THE DEVICE |
US6744651B2 (en) * | 2002-09-20 | 2004-06-01 | Taiwan Semiconductor Manufacturing Company | Local thermal enhancement of magnetic memory cell during programming |
US20040085463A1 (en) * | 2002-11-06 | 2004-05-06 | Manish Sharma | Imaging system with non-volatile memory |
US7189583B2 (en) * | 2003-07-02 | 2007-03-13 | Micron Technology, Inc. | Method for production of MRAM elements |
US7473656B2 (en) | 2003-10-23 | 2009-01-06 | International Business Machines Corporation | Method for fast and local anneal of anti-ferromagnetic (AF) exchange-biased magnetic stacks |
US20050237676A1 (en) * | 2004-04-26 | 2005-10-27 | Hitachi Global Storage Technologies | Fe seeded self-pinned sensor |
JP2007207919A (en) | 2006-01-31 | 2007-08-16 | Toshiba Corp | Magnetoresistance effect element and magnetic memory |
US7646569B2 (en) * | 2006-07-20 | 2010-01-12 | Hitachi Global Storage Technologies Netherlands B.V. | Pinned layer in magnetoresistive sensor |
US20090218645A1 (en) * | 2007-02-12 | 2009-09-03 | Yadav Technology Inc. | multi-state spin-torque transfer magnetic random access memory |
US7834410B2 (en) * | 2009-04-13 | 2010-11-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Spin torque transfer magnetic tunnel junction structure |
US20100315869A1 (en) * | 2009-06-15 | 2010-12-16 | Magic Technologies, Inc. | Spin torque transfer MRAM design with low switching current |
CN104766924A (en) * | 2014-01-08 | 2015-07-08 | 上海矽睿科技有限公司 | Annealing process of magnetic material |
KR101661275B1 (en) * | 2014-04-18 | 2016-09-29 | 한양대학교 산학협력단 | Memory device |
CN105280214B (en) * | 2015-09-10 | 2018-02-27 | 中国科学院物理研究所 | Current drive-type MAGNETIC RANDOM ACCESS MEMORY and spin logical device |
CN112289922B (en) * | 2019-07-22 | 2023-05-30 | 中电海康集团有限公司 | Magnetic sensor and method for manufacturing the same |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5650958A (en) * | 1996-03-18 | 1997-07-22 | International Business Machines Corporation | Magnetic tunnel junctions with controlled magnetic response |
JP3219713B2 (en) * | 1997-02-07 | 2001-10-15 | アルプス電気株式会社 | Method of manufacturing magnetoresistive element |
US6048739A (en) * | 1997-12-18 | 2000-04-11 | Honeywell Inc. | Method of manufacturing a high density magnetic memory device |
US6114719A (en) * | 1998-05-29 | 2000-09-05 | International Business Machines Corporation | Magnetic tunnel junction memory cell with in-stack biasing of the free ferromagnetic layer and memory array using the cell |
US6081446A (en) * | 1998-06-03 | 2000-06-27 | Hewlett-Packard Company | Multiple bit magnetic memory cell |
US5982660A (en) | 1998-08-27 | 1999-11-09 | Hewlett-Packard Company | Magnetic memory cell with off-axis reference layer orientation for improved response |
US6166948A (en) * | 1999-09-03 | 2000-12-26 | International Business Machines Corporation | Magnetic memory array with magnetic tunnel junction memory cells having flux-closed free layers |
US6326637B1 (en) * | 1999-10-18 | 2001-12-04 | International Business Machines Corporation | Antiferromagnetically exchange-coupled structure for magnetic tunnel junction device |
US6285581B1 (en) * | 1999-12-13 | 2001-09-04 | Motorola, Inc. | MRAM having semiconductor device integrated therein |
JP2001196658A (en) * | 2000-01-07 | 2001-07-19 | Fujitsu Ltd | Magnetic element and magnetic memory device |
US6172904B1 (en) * | 2000-01-27 | 2001-01-09 | Hewlett-Packard Company | Magnetic memory cell with symmetric switching characteristics |
US6727105B1 (en) * | 2000-02-28 | 2004-04-27 | Hewlett-Packard Development Company, L.P. | Method of fabricating an MRAM device including spin dependent tunneling junction memory cells |
JP3550533B2 (en) * | 2000-07-06 | 2004-08-04 | 株式会社日立製作所 | Magnetic field sensor, magnetic head, magnetic recording / reproducing device, and magnetic storage element |
US6541316B2 (en) * | 2000-12-22 | 2003-04-01 | The Regents Of The University Of California | Process for direct integration of a thin-film silicon p-n junction diode with a magnetic tunnel junction |
US6744086B2 (en) * | 2001-05-15 | 2004-06-01 | Nve Corporation | Current switched magnetoresistive memory cell |
US6430084B1 (en) * | 2001-08-27 | 2002-08-06 | Motorola, Inc. | Magnetic random access memory having digit lines and bit lines with a ferromagnetic cladding layer |
US6430085B1 (en) * | 2001-08-27 | 2002-08-06 | Motorola, Inc. | Magnetic random access memory having digit lines and bit lines with shape and induced anisotropy ferromagnetic cladding layer and method of manufacture |
US6741496B2 (en) * | 2001-09-27 | 2004-05-25 | Intel Corporation | Electron spin mechanisms for inducing magnetic-polarization reversal |
US7190611B2 (en) * | 2003-01-07 | 2007-03-13 | Grandis, Inc. | Spin-transfer multilayer stack containing magnetic layers with resettable magnetization |
-
2001
- 2001-10-04 US US09/971,347 patent/US6649423B2/en not_active Expired - Lifetime
-
2002
- 2002-08-30 TW TW091119863A patent/TWI222063B/en not_active IP Right Cessation
- 2002-09-25 JP JP2002278935A patent/JP4456805B2/en not_active Expired - Fee Related
- 2002-09-30 CN CNB021444978A patent/CN100336239C/en not_active Expired - Lifetime
- 2002-10-02 KR KR1020020060055A patent/KR100923772B1/en active IP Right Grant
- 2002-10-03 EP EP02256879A patent/EP1300853B1/en not_active Expired - Lifetime
- 2002-10-03 DE DE60203677T patent/DE60203677T2/en not_active Expired - Lifetime
-
2003
- 2003-07-23 US US10/626,447 patent/US6828610B2/en not_active Expired - Lifetime
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