JP2003207457A - Surface defect-inspecting apparatus - Google Patents

Surface defect-inspecting apparatus

Info

Publication number
JP2003207457A
JP2003207457A JP2002002869A JP2002002869A JP2003207457A JP 2003207457 A JP2003207457 A JP 2003207457A JP 2002002869 A JP2002002869 A JP 2002002869A JP 2002002869 A JP2002002869 A JP 2002002869A JP 2003207457 A JP2003207457 A JP 2003207457A
Authority
JP
Japan
Prior art keywords
light
reflected
mask
scattered
scattered light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002002869A
Other languages
Japanese (ja)
Other versions
JP3983549B2 (en
Inventor
Kyoichi Mori
恭一 森
Hiroshi Nakajima
洋 中島
Takayuki Ishiguro
隆之 石黒
Hiroshi Okumura
寛 奥村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP2002002869A priority Critical patent/JP3983549B2/en
Publication of JP2003207457A publication Critical patent/JP2003207457A/en
Application granted granted Critical
Publication of JP3983549B2 publication Critical patent/JP3983549B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To simplify the configuration of a surface defect-inspecting apparatus for inspecting by an interference phase measuring system and a scattered light detection system. <P>SOLUTION: Laser beams that are generated by a laser source 10 are branched by a polarization beam splitter 21, are modulated at each different frequency by acoustic optical elements 22A and 22B, and are applied to a reflector 20 or the surface of a magnetic disk 1. A beam splitter 41 divides reflection light from the reflector 20 and that from the surface of the magnetic disk 1 into each two portions. A condensing lens 42 condenses the split beams of light and condenses regular reflection light in it. A mask 43 shields the condensed regular reflection light, and a mask 45 shields the diffraction light of the regular reflection light passing through the periphery of the mask 43. Almost all of the scattered light is not shielded by the mask 43, passes through a hole that is provided on the mask 45, and is detected by a light receiving element 47. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、磁気ディスク又は
その基板(サブストレート)等の表面に欠陥がないどう
かを検査する表面欠陥検査装置に係り、特に干渉位相測
定系と散乱光検出系とを備えた表面欠陥検査装置に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface defect inspection apparatus for inspecting a surface of a magnetic disk or its substrate (substrate) for defects, and more particularly to an interferometric phase measurement system and a scattered light detection system. The present invention relates to a surface defect inspection device.

【0002】[0002]

【従来の技術】一般に、磁気ディスク又はその基板等の
表面の欠陥を光学的に検査する表面欠陥検査装置は、欠
陥の形状、大きさ、光学的性質等の違いを考慮して、複
数の検出系を備えている。その一つとしては、例えば特
開2000−121318号公報に記載のような、基準
面からの反射光と被測定面からの正反射光との干渉を利
用した干渉位相測定系がある。干渉位相測定系は、被測
定面の突起物等の高さを検出するのに適している。これ
とは別に、被測定面の欠陥で散乱された散乱光を利用し
た散乱光検出系がある。散乱光検出系は、干渉位相測定
系では検出が困難な微小欠陥を検出するのに適してい
る。
2. Description of the Related Art Generally, a surface defect inspection apparatus for optically inspecting defects on the surface of a magnetic disk or a substrate thereof has a plurality of detections in consideration of differences in defect shape, size, optical properties and the like. It has a system. One of them is, for example, an interference phase measurement system as described in Japanese Patent Laid-Open No. 2000-121318, which utilizes interference between reflected light from a reference surface and specularly reflected light from a surface to be measured. The interference phase measurement system is suitable for detecting the height of a protrusion or the like on the surface to be measured. Apart from this, there is a scattered light detection system that uses scattered light scattered by defects on the surface to be measured. The scattered light detection system is suitable for detecting minute defects that are difficult to detect with an interference phase measurement system.

【0003】[0003]

【発明が解決しようとする課題】従来、干渉位相測定系
と散乱光検出系とを備えた表面欠陥検査装置は、各検出
系用にそれぞれ別の投光系が必要であり、装置の構成が
複雑となっていた。また、干渉位相測定系による検査と
散乱光検出系による検査を別々に行うため、検査時間が
長くなるという問題があった。
Conventionally, a surface defect inspection apparatus equipped with an interference phase measuring system and a scattered light detecting system requires a separate light projecting system for each detecting system, and therefore the apparatus configuration is It was complicated. Further, since the inspection by the interference phase measurement system and the inspection by the scattered light detection system are separately performed, there is a problem that the inspection time becomes long.

【0004】本発明は、干渉位相測定系及び散乱光検出
系による検査を行う表面欠陥検査装置の構成を簡略化す
ることを目的とする。
It is an object of the present invention to simplify the structure of a surface defect inspection device for inspecting by an interference phase measuring system and a scattered light detecting system.

【0005】本発明はまた、干渉位相測定系及び散乱光
検出系による検査時間を短縮することを目的とする。
Another object of the present invention is to shorten the inspection time by the interference phase measuring system and the scattered light detecting system.

【0006】[0006]

【課題を解決するための手段】請求項1に記載された表
面欠陥検査装置は、光ビームを発生する光源と、光源が
発生した光ビームを分岐する分岐手段と、分岐手段で分
岐された光ビームをそれぞれ異なる周波数で変調する第
1及び第2の変調手段と、第1の変調手段で変調された
光ビームが被測定面で反射した反射光及び第2の変調手
段で変調された光ビームが基準面で反射した反射光を分
割する分割手段と、分割手段で分割された一方から、被
測定面で反射した反射光と基準面で反射した反射光との
干渉成分を検出する干渉検出手段と、分割手段で分割さ
れた他方から、散乱光を検出する散乱光検出手段とを備
えたものである。
According to another aspect of the present invention, there is provided a surface defect inspection apparatus including a light source for generating a light beam, a branching unit for branching the light beam generated by the light source, and a light beam branched by the branching unit. First and second modulating means for modulating the beams at different frequencies, reflected light obtained by reflecting the light beam modulated by the first modulating means on the surface to be measured, and light beam modulated by the second modulating means. A dividing means for dividing the reflected light reflected by the reference surface, and an interference detecting means for detecting an interference component of the reflected light reflected by the measured surface and the reflected light reflected by the reference surface from one of the divided means. And a scattered light detecting means for detecting scattered light from the other divided by the dividing means.

【0007】被測定面に欠陥が存在する場合、被測定面
で反射した反射光には、正反射光と被測定面の欠陥で散
乱された散乱光とが含まれる。分割手段により被測定面
で反射した反射光を分割し、一方を干渉検出手段で利用
し、他方を散乱光検出手段で利用することによって、同
じ光源が発生した光ビームで同時に干渉位相測定系及び
散乱光検出系の検査を行うことができる。
When the surface to be measured has a defect, the reflected light reflected by the surface to be measured includes specularly reflected light and scattered light scattered by the defect on the surface to be measured. The reflected light reflected by the surface to be measured is split by the splitting means, one of which is used as the interference detecting means, and the other of which is used as the scattered light detecting means. The scattered light detection system can be inspected.

【0008】請求項2に記載された表面欠陥検査装置
は、請求項1のものにおいて、散乱光検出手段が、分割
手段で分割された他方に含まれる正反射光を集束する集
束手段と、集束手段により集束された正反射光の集束点
付近に設けられた第1の遮断手段と、第1の遮断手段の
周辺を通過した正反射光の回折光を遮断する第2の遮断
手段とを備えたものである。
According to a second aspect of the present invention, in the surface defect inspection apparatus according to the first aspect, the scattered light detecting means focuses the specular reflection light included in the other divided by the dividing means, and the focusing means. A first blocking means provided near a focal point of the specularly reflected light focused by the means, and a second blocking means for blocking the diffracted light of the specularly reflected light that has passed around the first blocking means. It is a thing.

【0009】集束手段により集束された正反射光は、集
束点付近に設けられた第1の遮断手段によりそのほとん
どが遮断される。第1の遮断手段の周辺を通過した正反
射光の回折光は、第2の遮断手段により遮断される。従
って、散乱光検出手段は、第1及び第2の遮断手段によ
り正反射光を効率よく遮断することができる。一方、散
乱光は、その方向がばらばらであり、集束手段により集
束されず、第1の遮断手段及び第2の遮断手段で遮断さ
れることなく検出される。
Most of the specularly reflected light focused by the focusing means is blocked by the first blocking means provided near the focusing point. The diffracted light of the specularly reflected light that has passed around the first blocking unit is blocked by the second blocking unit. Therefore, the scattered light detecting means can efficiently block the specularly reflected light by the first and second blocking means. On the other hand, the scattered light has different directions, is not focused by the focusing means, and is detected without being blocked by the first blocking means and the second blocking means.

【0010】請求項3に記載された表面欠陥検査装置
は、請求項1のものにおいて、干渉検出手段が偏光手段
を備え、分割手段が干渉検出手段の偏光手段を兼ねたも
のである。
According to a third aspect of the present invention, in the surface defect inspection apparatus according to the first aspect, the interference detecting means includes a polarizing means, and the dividing means also serves as the polarizing means of the interference detecting means.

【0011】一般に、干渉検出手段は、被測定面で反射
した反射光と基準面で反射した反射光とを干渉させるた
めの偏光手段を備えている。この偏光手段に入射した光
のうち半分は、偏光手段を透過しない偏光面を有し、偏
光手段を透過する透過光と垂直方向へ放出される。分割
手段が干渉検出手段の偏光手段を兼ねることにより、偏
光手段から透過光と垂直方向へ放出される光を散乱光検
出系で利用することができるので、分割手段を偏光手段
と別に設ける場合に比べ、干渉位相測定系で利用できる
光量が多くなる。
Generally, the interference detecting means is provided with a polarizing means for causing the reflected light reflected by the surface to be measured and the reflected light reflected by the reference surface to interfere with each other. Half of the light that has entered the polarization means has a plane of polarization that does not pass through the polarization means, and is emitted in the direction perpendicular to the transmitted light that passes through the polarization means. Since the splitting means also serves as the polarizing means of the interference detecting means, the light emitted from the polarizing means in the direction perpendicular to the transmitted light can be used in the scattered light detection system. Therefore, when the splitting means is provided separately from the polarizing means. In comparison, the amount of light available in the interference phase measurement system increases.

【0012】[0012]

【発明の実施の形態】以下、本発明の実施の形態を添付
図面に従って説明する。図1は、本発明の一実施の形態
による表面欠陥検査装置の概略構成を示す図である。表
面欠陥検査装置は、レーザー光源10と、干渉位相測定
系と、散乱光検出系40とを含んで構成されている。干
渉位相測定系は、反射鏡20,23A,23B、偏光ビ
ームスプリッタ21,24,25、音響光学素子(AO
M:Acousto−Optic Modulato
r)22A,22B、4分の1波長板26A,26B、
対物レンズ27A,27B、偏光板28、ラインセンサ
30、及び検出回路31を含んで構成されている。散乱
光検出系40は、ビームスプリッタ41、集光レンズ4
2、マスク43,45、レンズ44、結像レンズ46、
及び受光素子47を含んで構成されている。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a diagram showing a schematic configuration of a surface defect inspection apparatus according to an embodiment of the present invention. The surface defect inspection apparatus includes a laser light source 10, an interference phase measurement system, and a scattered light detection system 40. The interference phase measurement system includes reflecting mirrors 20, 23A and 23B, polarization beam splitters 21, 24 and 25, an acousto-optic device (AO).
M: Accousto-Optic Modulato
r) 22A, 22B, quarter wave plates 26A, 26B,
The objective lens 27A, 27B, a polarizing plate 28, a line sensor 30, and a detection circuit 31 are included. The scattered light detection system 40 includes a beam splitter 41 and a condenser lens 4.
2, masks 43 and 45, lens 44, imaging lens 46,
And a light receiving element 47.

【0013】レーザー光源10は、光ビームとして所定
の波長のレーザー光を発生する。偏光ビームスプリッタ
21は、レーザー光源10が発生したレーザー光を偏光
面が90度異なる2つの光(P偏光,S偏光)に分岐
し、一方を音響光学素子22Aへ、他方を音響光学素子
22Bへ射出する。
The laser light source 10 generates a laser beam having a predetermined wavelength as a light beam. The polarization beam splitter 21 splits the laser light generated by the laser light source 10 into two lights (P-polarized light and S-polarized light) whose polarization planes are different by 90 degrees, one of which is directed to the acousto-optic element 22A and the other of which is directed to the acousto-optic element 22B. To eject.

【0014】音響光学素子22Aは、偏光ビームスプリ
ッタ21で分岐されたレーザー光を所定の周波数faで
変調する。音響光学素子22Aで変調されたレーザー光
は、反射鏡23Aで反射し、偏光ビームスプリッタ2
4,25を透過して、4分の1波長板26A及び対物レ
ンズ27Aを介して反射鏡20へ照射される。基準面と
なる反射鏡20の反射面は、被測定面となる磁気ディス
ク1の表面と光学的距離が等しい位置に置かれている。
照射されたレーザー光が反射鏡20で反射した反射光
は、対物レンズ27A及び4分の1波長板26Aを介し
て、偏光ビームスプリッタ25へ達する。偏光ビームス
プリッタ25へ達した反射光は、4分の1波長板26A
により直線偏光から円偏光に変換されているので、偏光
ビームスプリッタ25で反射され、ビームスプリッタ4
1へ射出される。
The acousto-optic element 22A modulates the laser beam split by the polarization beam splitter 21 at a predetermined frequency fa. The laser light modulated by the acousto-optic element 22A is reflected by the reflecting mirror 23A, and the polarization beam splitter 2
The light passes through 4 and 25 and is irradiated onto the reflecting mirror 20 through the quarter-wave plate 26A and the objective lens 27A. The reflecting surface of the reflecting mirror 20 serving as the reference surface is placed at a position having the same optical distance as the surface of the magnetic disk 1 serving as the measured surface.
The reflected light, which is the reflected laser light reflected by the reflecting mirror 20, reaches the polarization beam splitter 25 via the objective lens 27A and the quarter-wave plate 26A. The reflected light that has reached the polarization beam splitter 25 is a quarter-wave plate 26A.
Since the linearly polarized light is converted to the circularly polarized light by the
It is ejected to 1.

【0015】一方、音響光学素子22Bは、偏光ビーム
スプリッタ21で分岐されたレーザー光を周波数faと
は異なる所定の周波数fbで変調する。音響光学素子2
2Bで変調されたレーザー光は、反射鏡23Bで反射
し、偏光ビームスプリッタ24,25で反射して、4分
の1波長板26B及び対物レンズ27Bを介して磁気デ
ィスク1の表面へ照射される。磁気ディスク1の表面に
欠陥が存在すると、照射されたレーザー光の一部は正反
射し、一部は欠陥で散乱される。従って、磁気ディスク
1の表面からの反射光には、正反射光と散乱光とが含ま
れる。磁気ディスク1の表面からの反射光は、対物レン
ズ27B及び4分の1波長板26Bを介して、偏光ビー
ムスプリッタ25へ達する。偏光ビームスプリッタ25
へ達した反射光は、4分の1波長板26Bにより直線偏
光から円偏光に変換されているので、偏光ビームスプリ
ッタ25を透過し、ビームスプリッタ41へ射出され
る。
On the other hand, the acousto-optic element 22B modulates the laser beam split by the polarization beam splitter 21 at a predetermined frequency fb different from the frequency fa. Acousto-optic element 2
The laser beam modulated by 2B is reflected by the reflecting mirror 23B, reflected by the polarization beam splitters 24, 25, and is applied to the surface of the magnetic disk 1 via the quarter-wave plate 26B and the objective lens 27B. . When a defect exists on the surface of the magnetic disk 1, a part of the irradiated laser light is specularly reflected and a part is scattered by the defect. Therefore, the reflected light from the surface of the magnetic disk 1 includes specularly reflected light and scattered light. The reflected light from the surface of the magnetic disk 1 reaches the polarization beam splitter 25 via the objective lens 27B and the quarter-wave plate 26B. Polarizing beam splitter 25
Since the reflected light that has reached (1) has been converted from linearly polarized light to circularly polarized light by the quarter-wave plate 26B, it passes through the polarization beam splitter 25 and is emitted to the beam splitter 41.

【0016】ビームスプリッタ41は、反射鏡20から
の反射光及び磁気ディスク1の表面からの反射光をそれ
ぞれ2つに分割し、一方を偏光板28へ、他方を集光レ
ンズ42へ射出する。偏光板28は、ビームスプリッタ
41から入射した光の偏光面を45度傾けて、透過光を
ラインセンサ30へ射出する。偏光板28の透過光は、
反射鏡20からの反射光と磁気ディスク1の表面からの
反射光とが干渉し、ラインセンサ30は、その強度を電
気信号に変換して検出回路31へ出力する。検出回路3
1は、ラインセンサ30からの電気信号により、反射鏡
20からの反射光と磁気ディスク1の表面からの反射光
との位相差を検出する。
The beam splitter 41 splits the reflected light from the reflecting mirror 20 and the reflected light from the surface of the magnetic disk 1 into two, one of which is emitted to the polarizing plate 28 and the other of which is emitted to the condenser lens 42. The polarizing plate 28 tilts the polarization plane of the light incident from the beam splitter 41 by 45 degrees and emits the transmitted light to the line sensor 30. The transmitted light of the polarizing plate 28 is
The reflected light from the reflecting mirror 20 interferes with the reflected light from the surface of the magnetic disk 1, and the line sensor 30 converts the intensity into an electric signal and outputs it to the detection circuit 31. Detection circuit 3
1 detects the phase difference between the reflected light from the reflecting mirror 20 and the reflected light from the surface of the magnetic disk 1 by the electric signal from the line sensor 30.

【0017】集光レンズ42は、ビームスプリッタ41
で分割された他方の光を集光して、そのうちの正反射光
を集束させる。磁気ディスク1の表面の欠陥で散乱され
た散乱光は、その方向がばらばらであり、集光レンズ4
2により集束されない。マスク43は、集光レンズ42
で集束された正反射光の集束点付近に設けられ、集光レ
ンズ42で集束された正反射光を遮断する。
The condenser lens 42 is a beam splitter 41.
The other light split by is condensed, and the specularly reflected light is focused. The directions of scattered light scattered by defects on the surface of the magnetic disk 1 are scattered, and the condensing lens 4
Not focused by 2. The mask 43 is a condenser lens 42.
It is provided in the vicinity of the focal point of the specularly reflected light that has been focused by, and blocks the specularly reflected light that has been focused by the condenser lens 42.

【0018】図2(a)はマスク43の上面図、図2
(b)は図2(a)のA−A部分の断面図である。ま
た、図3は散乱光検出系の動作を説明する図である。マ
スク43は円板状で、その直径は、散乱光を遮断しない
ように小さくしてある。そのため、図3に実線で示した
正反射光Cの一部は、集光レンズ42で集束された後、
マスク43の周辺を回折して通過し、図3に二点鎖線で
示した回折光Dとなる。この回折光Dは、レンズ44を
透過して平行光線となり、マスク45へ照射される。
FIG. 2A is a top view of the mask 43, and FIG.
2B is a cross-sectional view taken along the line AA of FIG. Further, FIG. 3 is a diagram for explaining the operation of the scattered light detection system. The mask 43 is disk-shaped, and its diameter is made small so as not to block scattered light. Therefore, a part of the regular reflection light C shown by the solid line in FIG.
Diffract the light around the mask 43 and pass through it to become the diffracted light D shown by the two-dot chain line in FIG. The diffracted light D passes through the lens 44 and becomes a parallel light beam, which is applied to the mask 45.

【0019】図2(c)はマスク45の上面図、図2
(d)は図2(c)のB−B部分の断面図である。マス
ク45は円板状でその中央に穴が設けられている。マス
ク45は、レンズ44によって平行光線となった回折光
Dを遮断する。なお、図3の点線は、以上の動作の理解
を助けるために、マスク43,45がない場合の正反射
光Cの経路を示したものである。マスク43,45を設
けることによって、点線で示した経路が遮断される。
FIG. 2C is a top view of the mask 45, FIG.
2D is a cross-sectional view taken along the line BB in FIG. 2C. The mask 45 is disk-shaped and has a hole in its center. The mask 45 blocks the diffracted light D that has been converted into parallel rays by the lens 44. Note that the dotted line in FIG. 3 shows the path of the specularly reflected light C when the masks 43 and 45 are not provided, in order to facilitate understanding of the above operation. By providing the masks 43 and 45, the path shown by the dotted line is blocked.

【0020】一方、散乱光のほとんどは、マスク43で
遮断されず、マスク45に設けられた穴を通過する。マ
スク45の穴を通過した散乱光は、結像レンズ46を介
して受光素子47へ照射される。受光素子47は、アバ
ランシェフォトダイオード(APD)又はピンフォトダ
イオード等で構成され、散乱光を検出してその強度を電
気信号に変換する。
On the other hand, most of the scattered light is not blocked by the mask 43 and passes through the holes provided in the mask 45. The scattered light that has passed through the holes of the mask 45 is applied to the light receiving element 47 via the imaging lens 46. The light receiving element 47 is composed of an avalanche photodiode (APD), a pin photodiode, or the like, and detects scattered light and converts its intensity into an electric signal.

【0021】図4は、本発明の他の実施の形態による表
面欠陥検査装置の概略構成を示す図である。図1に示し
た実施の形態との相違は、ビームスプリッタ41を設け
ず、偏光板28の代わりに偏光器29を設けた点であ
る。その他の構成は、図1に示した実施の形態と同様で
ある。偏光器29は、偏光ビームスプリッタ25から入
射した光の偏光面を45度傾けて、偏光器29を透過す
る偏光面を有する光をラインセンサ30へ、偏光器29
を透過しない偏光面を有する光を集光レンズ42へ射出
する。
FIG. 4 is a diagram showing a schematic structure of a surface defect inspection apparatus according to another embodiment of the present invention. The difference from the embodiment shown in FIG. 1 is that the beam splitter 41 is not provided and a polarizer 29 is provided instead of the polarizing plate 28. Other configurations are similar to those of the embodiment shown in FIG. The polarizer 29 tilts the polarization plane of the light incident from the polarization beam splitter 25 by 45 degrees, and directs the light having the polarization plane passing through the polarizer 29 to the line sensor 30 and the polarizer 29.
Light having a polarization plane that does not pass through is emitted to the condenser lens 42.

【0022】図1に示した実施の形態では、偏光板28
に入射したレーザー光のうち半分は、偏光板28を透過
しない偏光面を有し、透過光と垂直方向へ放出されてい
た。これに対し、図3に示した実施の形態によれば、透
過光と垂直方向へ放出されていた光を散乱光検出系40
で利用することができるので、干渉位相測定系で利用で
きる光量が多くなる。
In the embodiment shown in FIG. 1, the polarizing plate 28
Half of the laser light that entered the laser had a polarization plane that did not pass through the polarizing plate 28 and was emitted in the direction perpendicular to the transmitted light. On the other hand, according to the embodiment shown in FIG. 3, the scattered light detection system 40 detects the light emitted in the direction perpendicular to the transmitted light.
Therefore, the amount of light that can be used in the interference phase measurement system increases.

【0023】以上説明した実施の形態によれば、散乱光
検出系40は、マスク43,45により正反射光を効率
よく遮断し、散乱光だけを検出することができる。
According to the embodiment described above, the scattered light detecting system 40 can efficiently block the specularly reflected light by the masks 43 and 45 and detect only the scattered light.

【0024】本発明の表面欠陥検査装置は、磁気ディス
ク又はその基板に限らず、様々な物体表面の欠陥の検査
に使用することができる。また、本発明では、光ビーム
としてレーザー光の例を示したが、白色光や紫外線等で
あってもよい。
The surface defect inspection apparatus of the present invention is not limited to the magnetic disk or its substrate, and can be used for inspection of various surface defects of an object. Further, in the present invention, the example of the laser beam is shown as the light beam, but it may be white light, ultraviolet light or the like.

【0025】[0025]

【発明の効果】本発明によれば、同じ投光系を用いて干
渉位相測定系による検査と散乱光検出系による検査を行
うことができるので、表面欠陥検査装置の構成を簡略化
することができる。
According to the present invention, since the inspection by the interference phase measuring system and the inspection by the scattered light detecting system can be performed using the same light projecting system, the structure of the surface defect inspection apparatus can be simplified. it can.

【0026】また、本発明の表面欠陥検査装置によれ
ば、干渉位相測定系による検査と散乱光検出系による検
査を同時に行うことができるので、検査時間を短縮する
ことができる。
Further, according to the surface defect inspection apparatus of the present invention, the inspection by the interference phase measurement system and the inspection by the scattered light detection system can be performed simultaneously, so that the inspection time can be shortened.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の一実施の形態による表面欠陥検査装
置の概略構成を示す図である。
FIG. 1 is a diagram showing a schematic configuration of a surface defect inspection apparatus according to an embodiment of the present invention.

【図2】 (a)はマスク43の上面図、(b)は
(a)のA−A部分の断面図、(c)はマスク45の上
面図、(d)は(c)のB−B部分の断面図である。
2A is a top view of a mask 43, FIG. 2B is a cross-sectional view taken along the line AA of FIG. 2A, FIG. 2C is a top view of the mask 45, and FIG. It is sectional drawing of B part.

【図3】 散乱光検出系の動作を説明する図である。FIG. 3 is a diagram illustrating an operation of a scattered light detection system.

【図4】 本発明の他の実施の形態による表面欠陥検査
装置の概略構成を示す図である。
FIG. 4 is a diagram showing a schematic configuration of a surface defect inspection apparatus according to another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1…磁気ディスク 10…レーザー光源 20,23A,23B…反射鏡 21,24,25…偏光ビームスプリッタ 22A,22B…音響光学素子 26A,26B…4分の1波長板 27A,27B…対物レンズ 28…偏光板 29…偏光器 30…ラインセンサ 31…検出回路 40…散乱光検出系 41…ビームスプリッタ 42…集光レンズ 43,45…マスク 44…レンズ 46…結像レンズ 47…受光素子 1 ... Magnetic disk 10 ... Laser light source 20, 23A, 23B ... Reflector 21, 24, 25 ... Polarizing beam splitter 22A, 22B ... Acousto-optic element 26A, 26B ... Quarter wave plate 27A, 27B ... Objective lens 28 ... Polarizing plate 29 ... Polarizer 30 ... Line sensor 31 ... Detection circuit 40 ... Scattered light detection system 41 ... Beam splitter 42 ... Condenser lens 43, 45 ... Mask 44 ... Lens 46 ... Imaging lens 47 ... Light receiving element

───────────────────────────────────────────────────── フロントページの続き (72)発明者 石黒 隆之 東京都渋谷区東3丁目16番3号 日立電子 エンジニアリング株式会社内 (72)発明者 奥村 寛 東京都渋谷区東3丁目16番3号 日立電子 エンジニアリング株式会社内 Fターム(参考) 2F065 AA49 BB03 BB25 CC03 DD02 DD06 FF04 FF52 GG04 JJ01 JJ02 JJ05 JJ18 JJ25 LL12 LL30 LL33 LL34 LL36 LL37 LL57 QQ25 QQ28 QQ31 2G051 AA71 AB02 AB07 BA10 BB20 BC10 CB01 CB05    ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Takayuki Ishiguro             Hitachi Electronics, 3-16-3 Higashi, Shibuya-ku, Tokyo             Engineering Co., Ltd. (72) Inventor Hiroshi Okumura             Hitachi Electronics, 3-16-3 Higashi, Shibuya-ku, Tokyo             Engineering Co., Ltd. F term (reference) 2F065 AA49 BB03 BB25 CC03 DD02                       DD06 FF04 FF52 GG04 JJ01                       JJ02 JJ05 JJ18 JJ25 LL12                       LL30 LL33 LL34 LL36 LL37                       LL57 QQ25 QQ28 QQ31                 2G051 AA71 AB02 AB07 BA10 BB20                       BC10 CB01 CB05

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 光ビームを発生する光源と、 前記光源が発生した光ビームを分岐する分岐手段と、 前記分岐手段で分岐された光ビームをそれぞれ異なる周
波数で変調する第1及び第2の変調手段と、 前記第1の変調手段で変調された光ビームが被測定面で
反射した反射光及び前記第2の変調手段で変調された光
ビームが基準面で反射した反射光を分割する分割手段
と、 前記分割手段で分割された一方から、被測定面で反射し
た反射光と基準面で反射した反射光との干渉成分を検出
する干渉検出手段と、 前記分割手段で分割された他方から、散乱光を検出する
散乱光検出手段とを備えたことを特徴とする表面欠陥検
査装置。
1. A light source that generates a light beam, a branching unit that branches the light beam generated by the light source, and first and second modulations that modulate the light beams that are branched by the branching unit at different frequencies. Means, and a splitting means for splitting the reflected light in which the light beam modulated by the first modulation means is reflected on the surface to be measured and the reflected light in which the light beam modulated by the second modulation means is reflected on the reference surface From one divided by the dividing means, interference detection means for detecting an interference component of the reflected light reflected on the surface to be measured and the reflected light reflected on the reference surface, from the other divided by the dividing means, A surface defect inspection apparatus comprising: scattered light detecting means for detecting scattered light.
【請求項2】 前記散乱光検出手段は、 前記分割手段で分割された他方に含まれる正反射光を集
束する集束手段と、 前記集束手段により集束された正反射光の集束点付近に
設けられた第1の遮断手段と、 前記第1の遮断手段の周辺を通過した正反射光の回折光
を遮断する第2の遮断手段とを備えたことを特徴とする
請求項1に記載の表面欠陥検査装置。
2. The scattered light detecting means is provided in the vicinity of a converging means for converging the regular reflection light included in the other divided by the dividing means, and a converging point of the regular reflection light converged by the converging means. The surface defect according to claim 1, further comprising: a first blocking unit; and a second blocking unit that blocks the diffracted light of the specular reflection light that has passed through the periphery of the first blocking unit. Inspection device.
【請求項3】 前記干渉検出手段は偏光手段を備え、 前記分割手段は前記偏光手段を兼ねたことを特徴とする
請求項1に記載の表面欠陥検査装置。
3. The surface defect inspection apparatus according to claim 1, wherein the interference detection unit includes a polarization unit, and the division unit also serves as the polarization unit.
JP2002002869A 2002-01-09 2002-01-09 Surface defect inspection equipment Expired - Fee Related JP3983549B2 (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007121312A (en) * 2006-12-18 2007-05-17 Hitachi High-Technologies Corp Surface defect inspection device
US7612888B2 (en) 2006-03-03 2009-11-03 Hitachi High-Technologies Corporation Method and apparatus for measuring heterodyne optical interference utilizing adjustable polarizing plate
JP2018205018A (en) * 2017-05-31 2018-12-27 株式会社ニコン Inspection apparatus and inspection method, exposure apparatus and exposure method, and method for manufacturing device
CN112798605A (en) * 2021-01-18 2021-05-14 上海御微半导体技术有限公司 Surface defect detection device and method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101870989B1 (en) * 2011-09-27 2018-08-02 광주과학기술원 Optical system and interferometer having the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7612888B2 (en) 2006-03-03 2009-11-03 Hitachi High-Technologies Corporation Method and apparatus for measuring heterodyne optical interference utilizing adjustable polarizing plate
JP2007121312A (en) * 2006-12-18 2007-05-17 Hitachi High-Technologies Corp Surface defect inspection device
JP4684215B2 (en) * 2006-12-18 2011-05-18 株式会社日立ハイテクノロジーズ Surface defect inspection equipment
JP2018205018A (en) * 2017-05-31 2018-12-27 株式会社ニコン Inspection apparatus and inspection method, exposure apparatus and exposure method, and method for manufacturing device
CN112798605A (en) * 2021-01-18 2021-05-14 上海御微半导体技术有限公司 Surface defect detection device and method

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