JP2003164753A - Gas blowing device - Google Patents

Gas blowing device

Info

Publication number
JP2003164753A
JP2003164753A JP2001368719A JP2001368719A JP2003164753A JP 2003164753 A JP2003164753 A JP 2003164753A JP 2001368719 A JP2001368719 A JP 2001368719A JP 2001368719 A JP2001368719 A JP 2001368719A JP 2003164753 A JP2003164753 A JP 2003164753A
Authority
JP
Japan
Prior art keywords
pipe
gas
blowing device
reaction tank
gas blowing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001368719A
Other languages
Japanese (ja)
Other versions
JP4065683B2 (en
JP2003164753A5 (en
Inventor
Kenji Ogawa
憲二 小川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Okutama Kogyo Co Ltd
Original Assignee
Okutama Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Okutama Kogyo Co Ltd filed Critical Okutama Kogyo Co Ltd
Priority to JP2001368719A priority Critical patent/JP4065683B2/en
Publication of JP2003164753A publication Critical patent/JP2003164753A/en
Publication of JP2003164753A5 publication Critical patent/JP2003164753A5/ja
Application granted granted Critical
Publication of JP4065683B2 publication Critical patent/JP4065683B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00Technologies for wastewater treatment
    • Y02W10/10Biological treatment of water, waste water, or sewage

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treating Waste Gases (AREA)
  • Aeration Devices For Treatment Of Activated Polluted Sludge (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a gas blowing device which can structurally suppress the stagnation of scales and remarkably reduce the frequency of maintenance. <P>SOLUTION: In this gas blowing device with a gas introduction pipe 20 for introducing gas to the bottom of a reaction tank 10 filled with liquid, a part (a second pipe) 22 of the gas introduction pipe 20 connected to the reaction tank is connected obliquely to the vertical direction. As the second pipe 22 is installed obliquely, liquid hardly stays thereon to suppress scale generation. In order to facilitate the removal of the scales in the pipe 22, a connection part connected with a vertical part (a first pipe) 21 of the gas introduction pipe is located inside the end of the second pipe 22, and the end is covered with a flange 23. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明が属する技術分野】この発明は、軽質炭酸カルシ
ウムの製造、石油化学における気液接触反応、脱硫酸装
置用吸収装置或いは活性汚泥装置用曝気装置等に用いて
好適なガス吹き込み装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas blowing device suitable for use in production of light calcium carbonate, gas-liquid contact reaction in petrochemistry, absorption device for desulfurization device, aeration device for activated sludge device, and the like.

【0002】[0002]

【従来の技術】一般に、気液接触反応を行うための装置
においては、気体と液体との接触を良好にするために、
液相を充填した反応槽の下部から気体を導入する構造と
する必要があり、図4(a)〜(e)に示すような気体導
入管の取り付け構造が使用されている。即ち、(a)、
(b)は、装置上部から気体導入管を垂直に設置し、そ
の導入口が底部近傍に達するようにしたもの、(c)〜
(e)は、気体導入管の垂直部は装置外に設けるととも
に垂直部に連続して水平部又は水平部に続く垂直部を設
け、水平部又は垂直部を装置の側面又は底部から装値内
に導入したものである。
2. Description of the Related Art Generally, in an apparatus for carrying out a gas-liquid contact reaction, in order to make good contact between a gas and a liquid,
It is necessary to have a structure for introducing gas from the lower part of the reaction tank filled with the liquid phase, and a structure for mounting a gas introducing pipe as shown in FIGS. 4 (a) to 4 (e) is used. That is, (a),
In (b), a gas introduction pipe is installed vertically from the top of the device, and its introduction port reaches near the bottom, (c) ~
(E) shows that the vertical part of the gas introduction pipe is provided outside the device, and the vertical part is provided with a horizontal part or a vertical part continuous to the horizontal part. It was introduced in.

【0003】このような気液接触反応用装置では、時間
の経過につれ、ガス導入配管内に反応生成物や件濁物等
の沈積(スケール)が生じ、目詰まりや投入ガス量の変
動をもたらす。その結果、反応槽内に所定のガス量が投
入できず生産効率が低下するという問題があり、これを
防ぐためには定期的に清掃を行う等の保守管理が必要で
ある。スケールの除去は、高圧水で配管内を清掃する方
法のほかに、図4(e)に示すように、装置の底部に導
入される気体導入管の垂直部に、スケーリング除去用清
水を供給するための配管を設けたものも提案されている
(実開平5-30120号)。
In such a gas-liquid contact reaction apparatus, as time passes, deposits (scales) of reaction products, suspended matter, etc. occur in the gas introduction pipe, causing clogging and fluctuations in the amount of input gas. . As a result, there is a problem that a predetermined amount of gas cannot be introduced into the reaction tank and the production efficiency is reduced. To prevent this, maintenance management such as periodical cleaning is necessary. For removing scale, in addition to the method of cleaning the inside of the pipe with high-pressure water, as shown in FIG. 4 (e), clean water for scaling is supplied to the vertical portion of the gas introduction pipe introduced to the bottom of the device. There is also a proposal for piping for this (Actual Kaihei No. 5-30120).

【0004】[0004]

【発明が解決しようとする課題】しかし、このようなス
ケーリング除去作業のためには、装置を非稼動とする必
要があり、装置の稼働率が低下するという問題がある。
また従来の気体導入管は特に垂直方向のスケール除去作
業が困難であった。
However, in order to carry out such scaling removal work, it is necessary to make the apparatus inoperative, and there is a problem that the operation rate of the apparatus decreases.
Further, it has been difficult for the conventional gas introduction tube to remove scale particularly in the vertical direction.

【0005】そこで本発明は、構造的にスケールの滞留
を抑制することができ、保守管理の頻度を大幅に低減す
ることが可能なガス吹き込み装置を提供することを目的
とする。また本発明は、ガス導入管の清掃作業、特に垂
直部のスケール除去作業が容易なガス吹き込み装置を提
供することを目的とする。
Therefore, it is an object of the present invention to provide a gas blowing device capable of structurally suppressing the accumulation of scale and greatly reducing the frequency of maintenance management. Another object of the present invention is to provide a gas blowing device which facilitates cleaning work of a gas introduction pipe, especially scale removing work of a vertical portion.

【0006】[0006]

【課題を解決するための手段】上記目的を達成する本発
明のガス吹き込み装置は、液体を充填した反応槽と、前
記反応槽の下部から反応槽内にガスを導入するためのガ
ス導入管とを備えたガス吹き込み装置において、前記ガ
ス導入管は、前記反応槽の外部に設置される第1の管
と、前記第1の管と前記反応槽の底部近傍の側面とを連
結し、一端が反応槽内部に挿入された第2の管とを有
し、第2の管が垂直方向に対し傾斜していることを特徴
とするものである。すなわち、第1の管と第2の管との
連結部は、第2の管と反応槽との連結部に対し、垂直方
向の上部に設けられているものである。
A gas blowing device of the present invention which achieves the above object comprises a reaction tank filled with a liquid, and a gas introducing pipe for introducing a gas into the reaction tank from a lower portion of the reaction tank. In the gas blowing device, the gas introduction pipe connects the first pipe installed outside the reaction tank and the side surface near the bottom of the reaction tank, and one end of the gas introduction pipe is connected to the first pipe. A second tube inserted into the reaction vessel, the second tube being inclined with respect to the vertical direction. That is, the connecting portion between the first pipe and the second pipe is provided at the upper portion in the vertical direction with respect to the connecting portion between the second pipe and the reaction tank.

【0007】このガス吹き込み装置によれば、第2の管
は反応槽に対し角度をもって取り付けられており、管内
に液が滞留しない構造になっているので、スケールの発
生を抑制することができる。その結果、スケール除去作
業の頻度を大幅に低減できる。
According to this gas blowing device, since the second pipe is attached at an angle to the reaction tank and the structure is such that the liquid does not stay in the pipe, it is possible to suppress the generation of scale. As a result, the frequency of scale removal work can be significantly reduced.

【0008】本発明のガス吹き込み装置の好適な態様で
は、第2の管の他端は、第1の管との連結部より外側に
延設されている。このガス吹き込み装置では、ガス供給
時には他端をめくらフランジ等で密閉し、保守時には、
このめくらフランジを外すことにより第2の管内を直接
洗浄することができる。従って従来のガス導入管に比べ
非常に清掃の作業性がよい。
In a preferred aspect of the gas blowing device of the present invention, the other end of the second pipe extends outside the connecting portion with the first pipe. With this gas blowing device, the other end is sealed with a blind flange when supplying gas, and during maintenance,
The inside of the second pipe can be directly washed by removing the blind flange. Therefore, the workability of cleaning is much better than that of the conventional gas introduction pipe.

【0009】本発明のガス吹き込み装置の好適な態様で
は、第1の管は、少なくとも一部が交換可能である。こ
のガス吹き込み装置では、第1の管を必要に応じてホー
ス配管等の他の配管で取り替えることができるので、例
えば第1の管を垂直に設置した場合のスケール除去作業
の困難性を解消することができる。
In a preferred aspect of the gas blowing device of the present invention, the first tube is at least partially replaceable. In this gas blowing device, the first pipe can be replaced with another pipe such as a hose pipe, if necessary, so that the difficulty of scale removal work when the first pipe is installed vertically is eliminated. be able to.

【0010】さらに本発明のガス吹き込み装置は、第2
の管の一端に、上部に多孔板で覆われた開口部を有する
ガス分散函を連結したものとすることができる。このよ
うなすることにより、スケールの生成をさらに低減でき
るとともに、ガスの圧力を一定にして、ガスの均一な分
散を図るとともに、気泡の微細化による気液接触の効率
化を図ることができる。尚、本発明のガス吹き込み装置
において第1の管は反応槽と平行に垂直に設置すること
が一般的であるが、垂直以外の設置の仕方であってもよ
い。
Further, the gas blowing device of the present invention is the second
A gas dispersion box having an opening covered with a perforated plate may be connected to one end of the pipe. By doing so, the generation of scale can be further reduced, the gas pressure can be made constant, the gas can be uniformly dispersed, and the gas-liquid contact efficiency can be improved by making the bubbles fine. In the gas blowing apparatus of the present invention, the first tube is generally installed vertically in parallel with the reaction tank, but it may be installed other than vertically.

【0011】[0011]

【発明の実施の形態】以下、本発明のガス吹き込み装置
の実施形態を図面を参照して説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a gas blowing device of the present invention will be described below with reference to the drawings.

【0012】図1は、本発明のガス吹き込み装置の一実
施形態を模式的に示す図である。このガス吹き込み装置
は、例えば、回分式或いは半回分式の軽質炭酸カルシウ
ムの製造装置であり、消石灰の懸濁液を充填した反応槽
10と、反応槽10に炭酸ガスを供給するためのガス導入管
20を備えている。
FIG. 1 is a diagram schematically showing an embodiment of the gas blowing device of the present invention. This gas blowing device is, for example, a batch type or semi-batch type light calcium carbonate production device, and a reaction tank filled with a suspension of slaked lime.
10 and a gas introduction pipe for supplying carbon dioxide gas to the reaction tank 10.
Equipped with 20.

【0013】反応槽10は、図示しないが、その上部に所
定濃度の消石灰を供給するための配管が接続されるとと
もに、その内部には攪拌装置11、例えばプロペラ付き攪
拌棒や邪魔板付き攪拌棒が設置されている。反応槽10の
底部には、反応後の生成物(ここでは軽質炭酸カルシウ
ム)を取り出すための排出バルブ(図示せず)が備えられ
ている。
Although not shown, the reaction tank 10 is connected to a pipe for supplying slaked lime of a predetermined concentration to the upper portion thereof, and a stirring device 11, for example, a stirring rod with a propeller or a stirring rod with a baffle plate is provided inside thereof. Is installed. At the bottom of the reaction tank 10, a discharge valve (not shown) for taking out a product (here, light calcium carbonate) after the reaction is provided.

【0014】ガス導入管20は、反応槽10の外部に垂直方
向に設置された第1の管21と、第1の管22に連結された
第2の管22とからなり、第1の管21は、例えば、排ガス
キルン等の炭酸ガス供給源に、配管、フィルター、ガス
量制御バルブ等を介して接続されている。第2の管22
は、一端側22aが反応槽10の側面を貫通してその内部
(反応槽の下部)に位置するように反応槽10に連結さ
れ、他端側22bが第1の管21の下端に連結されている。
これにより第1の管21を通して供給されるガスを反応槽
10の下部に導入することができる。
The gas introduction pipe 20 is composed of a first pipe 21 vertically installed outside the reaction vessel 10 and a second pipe 22 connected to the first pipe 22. Reference numeral 21 is connected to a carbon dioxide gas supply source such as an exhaust gas kiln via a pipe, a filter, a gas amount control valve, and the like. Second tube 22
Is connected to the reaction tank 10 so that one end side 22a penetrates the side surface of the reaction tank 10 and is located inside thereof (the lower part of the reaction tank), and the other end side 22b is connected to the lower end of the first pipe 21. ing.
As a result, the gas supplied through the first pipe 21 is supplied to the reaction tank.
Can be introduced at the bottom of 10.

【0015】ここで第2の管22は、第1の管21との連結
部よりも反応槽10との連結部の方が低い位置となるよう
に、即ち水平方向に対し角度を持つように設置されてい
る。これによって反応槽10内の液体が管22に滞留するの
を防止することができ、スケールの発生を最小限にする
ことができる。第2の管22の角度は特に限定されない
が、清掃時の作業性、液の滞留性等を考慮し、水平方向
に対し好ましくは10〜80度、より好ましくは20〜70度の
範囲とする。また第2の管22の他端側22bの端面は、第
1の管21との接続部よりも外側に存在し、通常はめくら
フランジ23によって気密が保たれている。
Here, the second pipe 22 is positioned so that the connecting portion with the reaction vessel 10 is lower than the connecting portion with the first pipe 21, that is, the second pipe 22 has an angle with respect to the horizontal direction. is set up. This makes it possible to prevent the liquid in the reaction tank 10 from staying in the pipe 22 and minimize the generation of scale. The angle of the second pipe 22 is not particularly limited, but in consideration of workability during cleaning, liquid retention, etc., it is preferably in the range of 10 to 80 degrees, more preferably 20 to 70 degrees with respect to the horizontal direction. . The end surface of the other end side 22b of the second pipe 22 is located outside the connection portion with the first pipe 21, and is normally kept airtight by the blind flange 23.

【0016】このような構成とすることにより、清掃時
にめくらフランジ23を外すことにより、この他端側22b
から容易に管内の清掃を行うことができる。従って、第
2の管22の一端側22aは常時液に浸っているが、この部
分にスケールが発生しても容易に取り除くことができ
る。
With this structure, the blind flange 23 is removed during cleaning, so that the other end 22b can be removed.
Therefore, the inside of the pipe can be easily cleaned. Therefore, the one end side 22a of the second pipe 22 is always immersed in the liquid, but even if scale is generated in this portion, it can be easily removed.

【0017】第2の管22の一端近傍には、そこから噴出
されるガスの液相内拡散を高めるために、公知の多孔板
やガス分散装置などを配置することが可能であり、図示
する実施形態では、円筒状のガス分散函30が配置されて
いる。
In the vicinity of one end of the second pipe 22, a known perforated plate, a gas dispersion device or the like can be arranged in order to enhance the diffusion of the gas ejected from the second pipe 22 in the liquid phase. In the embodiment, a cylindrical gas dispersion box 30 is arranged.

【0018】ガス分散函30は、図2に示すように、上下
が開放された円筒状の形状を有し、上部は多孔板31で覆
われている。ガス多孔板31は、多数の孔が形成された板
で、第2の管22から導入されたガスを微細気泡として反
応槽に分散させるものであり、金属や可撓性のある材料
で構成することができる。炭酸カルシウムの製造におい
ては、ゴム、エラストマー等の可撓性材料が好適であ
る。
As shown in FIG. 2, the gas dispersion box 30 has a cylindrical shape whose upper and lower sides are open, and its upper portion is covered with a perforated plate 31. The gas perforated plate 31 is a plate having a large number of holes formed therein, and serves to disperse the gas introduced from the second tube 22 as fine bubbles in the reaction tank, and is made of a metal or a flexible material. be able to. In the production of calcium carbonate, flexible materials such as rubber and elastomer are suitable.

【0019】ガス分散函30の円筒の長さは、ガス分散函
30に導入されたガスが下端から飛び出さない長さ、即ち
ガス分散函30内の液面の高さが下端より上にあることを
確保するに十分な長さを有し、これによってガス分散函
30内のガスの圧力を一定に保ち、多孔板31から円滑に供
給されるようにする。
The length of the cylinder of the gas dispersion box 30 is
The gas introduced into 30 has a length that does not jump out from the lower end, that is, a length long enough to ensure that the height of the liquid surface in the gas dispersion box 30 is above the lower end, and thus the gas dispersion Box
The gas pressure in 30 is kept constant so that the gas can be smoothly supplied from the perforated plate 31.

【0020】尚、図2では、ガス分散函30として比較的
深い円筒状のものを示したが、ガス分散函30の円筒自体
は浅くして、その底面を閉じた形状とし、底面に圧力を
調整するための液封管を別途設けたガス分散函30を用い
てもよい。このようなガス分散函30の構成は、特開平3-
38232号に開示されており、同様のものを採用できる。
In FIG. 2, the gas distribution box 30 has a relatively deep cylindrical shape. However, the cylinder itself of the gas distribution box 30 is shallow so that the bottom surface is closed and the pressure is applied to the bottom surface. A gas dispersion box 30 provided with a liquid sealing tube for adjustment may be used. The configuration of such a gas dispersion box 30 is disclosed in
It is disclosed in No. 38232, and a similar one can be adopted.

【0021】このような構成のガス吹き込み装置では、
第2の管22を角度を持たせて接続したことにより、第2
の管22の反応槽内部に設置される距離を短くし第2の管
22内への液体の滞留とそれによるスケールの発生を抑制
し、保守の頻度を低減し装置の稼働率を高めることがで
きる。また第2の管22の他端側22bの端面をフランジ23
で覆った構成とすることにより、管22内の清掃が容易と
なり、先端にスケールが発生しても容易に除去できる。
In the gas blowing device having such a structure,
By connecting the second pipe 22 at an angle,
The second tube that shortens the distance installed inside the reaction tank
It is possible to suppress the retention of the liquid in 22 and the generation of scale due to the liquid, reduce the frequency of maintenance and increase the operation rate of the device. In addition, the end surface of the other end side 22b of the second pipe 22 is provided with a flange 23
With the configuration covered by, the inside of the pipe 22 can be easily cleaned, and even if scale is generated at the tip, it can be easily removed.

【0022】次に、本発明のガス吹き込み装置の他の実
施形態を説明する。図3は、他の実施形態を模式的に示
す図である。
Next, another embodiment of the gas blowing device of the present invention will be described. FIG. 3 is a diagram schematically showing another embodiment.

【0023】図3(a)、(d)に示すガス吹き込み装置
は、第2の管22が反応槽10に対し角度を持って接続され
ていることは図1の実施形態と同様であるが、第1の間
21と、第2の管22の端部を連結したものである。図3
(b)、(c)は、図1の実施形態と同様に、第2の管
の他端側22b端面が第1の管21との接続部よりも外側に
存在し、めくらフランジ23によって気密を保っているも
のである。このように、管21、22の接続部の構造は、反
応の種類やスケールの発生しやすさ等を考慮し適宜選択
できる。
In the gas blowing device shown in FIGS. 3 (a) and 3 (d), the second pipe 22 is connected to the reaction tank 10 at an angle, which is similar to the embodiment shown in FIG. During the first
21 and the end of the second tube 22 are connected. Figure 3
Similar to the embodiment of FIG. 1, (b) and (c) show that the other end side 22b of the second pipe has an end face outside the connection portion with the first pipe 21, and is airtight by the blind flange 23. It is what keeps. As described above, the structure of the connecting portion between the tubes 21 and 22 can be appropriately selected in consideration of the type of reaction, the likelihood of scale generation, and the like.

【0024】また図3(c)、(d)に示すガス吹き込
み装置では、第1の管21に交換可能な管やホースを設け
たものである。このため、第1の管21の、第2の管22と
の接続部とは反対側の端部にはフランジ24が設けられ、
他のフランジ付き配管25にフランジ接続されている。
尚、フランジ接続の代わりに、カップラーを介して耐圧
ゴムホース等を着脱するようにしてもよい。この実施形
態のガス吹き込み装置では、垂直に設置される第1の管
21の一部を他の配管で取り替えることができるので、清
掃すべき垂直方向の距離を削減し、スケール除去作業を
容易に行うことができる。
In the gas blowing device shown in FIGS. 3C and 3D, the first pipe 21 is provided with a replaceable pipe or hose. For this reason, a flange 24 is provided at the end of the first pipe 21 opposite to the connection with the second pipe 22,
It is flanged to another flanged pipe 25.
Instead of the flange connection, a pressure resistant rubber hose or the like may be attached and detached via a coupler. In the gas blowing device of this embodiment, the first tube installed vertically
Since part of 21 can be replaced by another pipe, the vertical distance to be cleaned can be reduced and the scale removal work can be easily performed.

【0025】尚、図3では図示を省略しているが、これ
ら各実施形態の装置においても、第2の管22の一端に
は、図2に示すような分散函30を接続することができ、
これにより反応槽中のガス分布の均一性を高め、また気
液接触の効率化を図ることができる。
Although not shown in FIG. 3, the dispersion box 30 as shown in FIG. 2 can be connected to one end of the second tube 22 in the apparatus of each of these embodiments. ,
As a result, the uniformity of gas distribution in the reaction tank can be improved and the efficiency of gas-liquid contact can be improved.

【0026】以上、本発明のガス吹き込み装置の実施形
態を説明したが、本発明のガス吹き込み装置は上記実施
形態に限定されることなく、種々の変更が可能である。
例えば、上記実施形態では第1の管21は、垂直に設置さ
れるものとしたが、水平方向に設置される場合にも本発
明を適用することが可能である。また図1及び図3の実
施形態では、反応槽10に対し1本のガス導入管20を設け
たものを示したが、ガス導入管の数は装置の規模や反応
の種類等に応じて任意に変更することができる。ガス導
入管が1本の場合には、ガス分散函とは別に分岐用の導
管を設けることも可能である。
Although the embodiment of the gas blowing device of the present invention has been described above, the gas blowing device of the present invention is not limited to the above embodiment, and various modifications can be made.
For example, although the first pipe 21 is installed vertically in the above embodiment, the present invention can be applied to the case where the first pipe 21 is installed horizontally. Further, in the embodiment of FIGS. 1 and 3, one gas introduction pipe 20 is provided for the reaction tank 10, but the number of gas introduction pipes is arbitrary depending on the scale of the apparatus and the type of reaction. Can be changed to When the number of gas introduction pipes is one, it is possible to provide a branching conduit separately from the gas dispersion box.

【0027】更に、上記実施形態は、本発明のガス吹き
込み装置の基本的な構成要素を示したものであり、その
他、本発明のガス吹き込み装置が適用される用途に応じ
て公知の機構、例えばオーバーフローする液体の排出
管、反応系の温度、圧力、導電率を計測する計測機器や
レベル計等を設けることができることは言うまでもな
い。
Further, the above-mentioned embodiment shows the basic constituent elements of the gas blowing device of the present invention, and other known mechanisms such as a known mechanism depending on the application to which the gas blowing device of the present invention is applied. It goes without saying that a discharge pipe for the overflowing liquid, a measuring device for measuring the temperature, pressure and conductivity of the reaction system, a level meter, etc. can be provided.

【0028】[0028]

【実施例】以下、本発明のガス吹き込み装置を軽質炭酸
カルシウムの製造に用いた実施例を説明する。
EXAMPLES Examples in which the gas blowing apparatus of the present invention is used for producing light calcium carbonate will be described below.

【0029】実施例1 ガス吹き込み装置として、高さ4000mm、直径3000mm
の反応槽と直径125mmのガス導入管を備え、図3(b)
に示す構造のガス吹き込み装置を用いた。まず、反応槽
に水酸化カルシウム懸濁液(温度70℃、濃度74g/L)2
0m3を15分で供給した後、炭酸ガス含有ガス(炭酸ガス
濃度30%、温度50℃)を1時間に1500Nm3の吹込み速
度でガス導入管から150分間吹込み、反応させた。その
後、反応生成物の排出を15分行った。このようなサイク
ル(180分〜200分)を繰り返し連続反応を行った。
Example 1 As a gas blowing device, height 4000 mm, diameter 3000 mm
Equipped with a reaction tank and a gas inlet pipe with a diameter of 125 mm.
A gas blowing device having the structure shown in was used. First, calcium hydroxide suspension (temperature 70 ° C, concentration 74g / L) 2 in the reaction tank
After supplying 0 m 3 for 15 minutes, carbon dioxide gas (carbon dioxide concentration 30%, temperature 50 ° C.) was blown through the gas introduction pipe for 150 minutes at a blowing rate of 1500 Nm 3 for 1 hour to react. Then, the reaction product was discharged for 15 minutes. Such a cycle (180 to 200 minutes) was repeated to carry out a continuous reaction.

【0030】連続反応開始から1ヶ月後に、ガス量制御
バルブの開度を一定にしてガス量の確認を行うととも
に、ガス導入管から所定量のガスを出すときのバルブの
開度を調べた。またガス導入管のうち横向きの管(第2
の管)を外して、内部のスケールを掻き落し、スケール
量を測定した。垂直部の管(第1の管)は高圧水で洗浄
しスケールを除去し、再度組み立てて、上述した連続反
応を1週間行った。1週間後にガス量制御バルブの開度
を確認した。バルブ開度及びスケール量の調査の結果を
表1に示す。
One month after the start of the continuous reaction, the opening of the gas amount control valve was kept constant to check the gas amount, and the opening of the valve when a predetermined amount of gas was discharged from the gas introduction pipe was examined. Of the gas introduction pipes, the horizontal pipe (second pipe)
Tube was removed, the internal scale was scraped off, and the scale amount was measured. The vertical tube (first tube) was washed with high-pressure water to remove the scale, reassembled, and the above continuous reaction was carried out for 1 week. After one week, the opening of the gas amount control valve was confirmed. Table 1 shows the results of the investigation of the valve opening degree and the scale amount.

【0031】実施例2、比較例1、2 実施例1と同様の反応槽を備え、ガス導入管の構造の異
なるガス吹き込み装置を用いて、実施例1と同様に1ヶ
月の連続反応を行った。実施例2では、図3(c)の構
造の装置、比較例1、2では図4(c)、(d)の装置を
それぞれ用いた。1ヶ月連続反応後、実施例1と同様に
バルブ開度及びスケール量を調査するとともに、洗浄後
にさらに1週間稼動した後のバルブ開度を調査した。結
果を併せて表1に示す。
Example 2, Comparative Examples 1 and 2 The same reaction tank as in Example 1 was used, and a continuous gas reaction for 1 month was carried out in the same manner as in Example 1 by using a gas blowing device having a different gas inlet pipe structure. It was In Example 2, the device having the structure of FIG. 3C was used, and in Comparative Examples 1 and 2, the devices of FIGS. 4C and 4D were used. After continuously reacting for one month, the valve opening degree and the scale amount were examined in the same manner as in Example 1, and the valve opening degree after the operation for another week after the washing was examined. The results are also shown in Table 1.

【0032】[0032]

【表1】 [Table 1]

【0033】表1の結果からもわかるように、実施例
1、2の装置ではスケール発生量が比較例1、2の装置
に比べ少なく、ガス量制御バルブ開度を55%とすること
により、反応時と同じ量のガス量(1500Nm3/hr)を供
給することができた。これに対し、バルブ開度55%では
反応時と同じガス量を供給することができず(供給ガス
量が低下し)、バルブ開度を、それぞれ60%、64%に開
くことによって1500Nm 3/hrを供給することができた。
As can be seen from the results shown in Table 1, the examples
In the apparatus of Nos. 1 and 2, the scale generation amount is the apparatus of Comparative Examples 1 and 2.
Compared to the above, the gas amount control valve opening should be 55%.
The same amount of gas as during the reaction (1500 Nm3/ hr)
I was able to pay. On the other hand, at a valve opening of 55%
Cannot supply the same amount of gas as during reaction (supply gas
The valve opening is increased to 60% and 64% respectively.
1500 Nm by doing 3/ hr could be supplied.

【0034】また実施例2の装置では、垂直方向の管へ
のスケール附着が少ないため、高圧水洗浄によって、初
期と同程度のガス供給量が得られた。洗浄後、1週間稼
動した結果では、比較例1、2の装置ではすぐにスケー
ルが生じ、ガス供給量が低下した(即ち、開度を大きく
しないと一定量のガス量を供給できなかった)のに対
し、実施例1、2の装置ではガス供給量の低下が少な
く、特に垂直方向にホース配管した実施例2の装置で
は、非常に優れた結果が得られた。
Further, in the apparatus of Example 2, since the scale was not attached to the pipe in the vertical direction, the gas supply amount similar to the initial amount was obtained by the high pressure water washing. As a result of operating for one week after cleaning, scales were immediately generated in the devices of Comparative Examples 1 and 2, and the gas supply amount decreased (that is, a constant amount of gas could not be supplied unless the opening was increased). On the other hand, the apparatus of Examples 1 and 2 showed a small decrease in the gas supply amount, and particularly the apparatus of Example 2 in which the hose pipe was arranged in the vertical direction gave extremely excellent results.

【0035】[0035]

【発明の効果】本発明によれば、ガス吹き込み装置のガ
ス導入管の取り付け構造を改良することにより、構造的
にスケールの発生を抑制することができ、それによりガ
ス供給量の低下による生産性の低下や稼働率の低下のな
いガス吹き込み装置を提供できる。また本発明によれ
ば、ガス導入管の清掃が容易で、確実な清掃を行うこと
ができるガス吹き込み装置を提供できる。さらに本発明
によれば、清掃しにくい部分について他の配管への取替
えを容易にできるガス吹き込み装置を提供できる。
According to the present invention, by improving the mounting structure of the gas introduction pipe of the gas blowing device, it is possible to structurally suppress the generation of scale, thereby reducing the productivity due to the reduction of the gas supply amount. It is possible to provide a gas blowing device that does not cause a decrease in power consumption and a decrease in operating rate. Further, according to the present invention, it is possible to provide a gas blowing device in which the gas introduction pipe can be easily cleaned and can be reliably cleaned. Further, according to the present invention, it is possible to provide a gas blowing device that can easily replace a portion that is difficult to clean with another pipe.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のガス吹き込み装置の一実施形態を示す
図。
FIG. 1 is a diagram showing an embodiment of a gas blowing device of the present invention.

【図2】本発明のガス吹き込み装置に付属するガス分散
函の一例を示す図。
FIG. 2 is a view showing an example of a gas dispersion box attached to the gas blowing device of the present invention.

【図3】本発明のガス吹き込み装置の他の実施形態を示
す図。
FIG. 3 is a diagram showing another embodiment of the gas blowing device of the present invention.

【図4】従来の各種ガス吹き込み装置を示す図。FIG. 4 is a view showing various conventional gas blowing devices.

【符号の説明】[Explanation of symbols]

10…反応槽、20…ガス導入管、21…第1の管、22…第2の
管、30…ガス分散函
10 ... Reaction tank, 20 ... Gas introduction pipe, 21 ... First pipe, 22 ... Second pipe, 30 ... Gas dispersion box

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4D002 AA02 BA02 CA06 HA02 HA05 4D029 AA01 AB07 BB10 DD01 4G075 AA03 AA15 AA52 AA57 AA61 BA10 BB08 BD13 CA57 EA01 EB01 ED02 ED08 FA02 FB13 FC02    ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 4D002 AA02 BA02 CA06 HA02 HA05                 4D029 AA01 AB07 BB10 DD01                 4G075 AA03 AA15 AA52 AA57 AA61                       BA10 BB08 BD13 CA57 EA01                       EB01 ED02 ED08 FA02 FB13                       FC02

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 液体を充填した反応槽と、前記反応槽の
下部から反応槽内にガスを導入するためのガス導入管と
を備えたガス吹き込み装置において、前記ガス導入管
は、前記反応槽の外部に設置される第1の管と、前記第
1の管と前記反応槽の底部近傍の側面とを連結し、一端
が反応槽内部に挿入された第2の管とを有し、前記第2
の管は垂直方向に対し傾斜していることを特徴とするガ
ス吹き込み装置。
1. A gas blowing device comprising a reaction tank filled with a liquid and a gas introduction tube for introducing a gas into the reaction tank from a lower portion of the reaction tank, wherein the gas introduction tube is the reaction tank. A first pipe installed outside of the reactor, a second pipe connecting the first pipe and a side surface near the bottom of the reaction tank, and having one end inserted into the reaction tank, Second
The gas blowing device is characterized in that the pipe is inclined with respect to the vertical direction.
【請求項2】 請求項1記載のガス吹き込み装置であっ
て、前記第2の管の他端は、前記第1の管との連結部よ
り外側にあることを特徴とするガス吹き込み装置。
2. The gas blowing device according to claim 1, wherein the other end of the second pipe is outside the connecting portion with the first pipe.
【請求項3】 請求項1又は2に記載のガス吹き込み装
置であって、前記第1の管は、少なくとも一部が交換可
能であることを特徴とするガス吹込み装置。
3. The gas blowing device according to claim 1 or 2, wherein at least a part of the first pipe is replaceable.
【請求項4】 請求項1ないし3のいずれ1項に記載の
ガス吹き込み装置であって、前記第2の管の一端は、上
部に多孔板で覆われた開口部を有するガス分散函に連結
されていることを特徴とするガス吹き込み装置。
4. The gas blowing device according to claim 1, wherein one end of the second pipe is connected to a gas dispersion box having an opening covered with a perforated plate at an upper portion thereof. The gas blowing device is characterized in that
JP2001368719A 2001-12-03 2001-12-03 Gas blowing device Expired - Fee Related JP4065683B2 (en)

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JP2003164753A5 JP2003164753A5 (en) 2005-07-21
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006247486A (en) * 2005-03-09 2006-09-21 Kyushu Institute Of Technology Gas separation method and apparatus
JP2007111663A (en) * 2005-10-21 2007-05-10 Okutama Kogyo Co Ltd Box for dispersing gas, device for blowing gas and gas-liquid contact apparatus using the device
JP2014188498A (en) * 2013-03-28 2014-10-06 Taiyo Nippon Sanso Corp Detoxification treatment apparatus and detoxification treatment method
JP2019041645A (en) * 2017-08-31 2019-03-22 フタバ産業株式会社 Carbon dioxide application device
CN116020257A (en) * 2023-03-30 2023-04-28 江苏安舟科技有限公司 Multistage screening formula rubber production is with desulfurization governing system

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006247486A (en) * 2005-03-09 2006-09-21 Kyushu Institute Of Technology Gas separation method and apparatus
JP2007111663A (en) * 2005-10-21 2007-05-10 Okutama Kogyo Co Ltd Box for dispersing gas, device for blowing gas and gas-liquid contact apparatus using the device
JP2014188498A (en) * 2013-03-28 2014-10-06 Taiyo Nippon Sanso Corp Detoxification treatment apparatus and detoxification treatment method
JP2019041645A (en) * 2017-08-31 2019-03-22 フタバ産業株式会社 Carbon dioxide application device
CN116020257A (en) * 2023-03-30 2023-04-28 江苏安舟科技有限公司 Multistage screening formula rubber production is with desulfurization governing system

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