JP2003149570A - Optical address device and optical addressing type display using the optical address device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make a display element, used for information display, low in cost and high in luminance. SOLUTION: The optical address device has a light projecting device 13 equipped with at least a light source 11 and a shutter means 12 having a shutter function for light as to a specified position of the light source 11 and a reflecting device 14 which reflects the light emitted by the light projecting device 13, and the reflecting device 14 is equipped with a reflecting plate 15 which reflects the light from the light projecting device 13 to the flank of a rotatable prism member. The address device irradiates an exposed surface 16 with the light by scanning the reflecting device 14 and an optical address type display is equipped with the optical address device.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical addressing device and an optical addressing type display using the optical addressing device.

[0002]

2. Description of the Related Art Conventional display devices used for displaying image information include, for example, CRTs, liquid crystal display devices,
Also, EL display devices and the like have been put to practical use.

[0003]

Of the above display devices,
CRTs have been widely used from the past to the present because high display quality can be obtained with a relatively low device cost, but it has been difficult to reduce the size of the cathode ray tube and the power consumption. On the other hand, liquid crystal display devices are easy to miniaturize and reduce power consumption, and due to the spread of active display elements in recent years, display quality has been improved and the cost of the device has been reduced. However, there is still a problem that the production cost is higher than that of the CRT.

This is because the whole display area is patterned with high precision and a switching transistor is incorporated in each pixel which is patterned with high precision, so that the manufacturing process may be complicated. Responsible. Such an active display element is disclosed in, for example, Japanese Patent Laid-Open No. 07-234420.

Similarly, the EL display device also has a problem that it is necessary to manufacture an active display element in order to obtain high display quality, and the production cost is high. In view of the above problems, the present inventors have attempted to simplify the manufacturing process and reduce the production cost, and at the same time, can address light to an arbitrary area, and an optical addressing device using the optical addressing device. Type display was decided to be provided.

[0006]

An optical addressing device according to a first aspect of the present invention is an optical addressing device capable of performing exposure on an arbitrary portion on a plane, and at least a light source and a specific light source for the light source. It is assumed that the light emitting device includes a shutter unit having a light shutter function for a portion, and a reflecting device that reflects light emitted from the light emitting device. The reflecting device is a rotatable polygonal column member. On the side of
It is assumed that a reflection plate for reflecting the light from the light emitting device is provided, and the light is addressed to an arbitrary area by scanning the reflecting device.

According to another aspect of the optical addressing device of the present invention, the shutter means is made of liquid crystal using a light scattering mode.

In the optical addressing device according to a third aspect of the present invention, the shutter means is provided with a plurality of mirror arrays that can be driven independently.

An optical addressing type display according to a fourth aspect is the optical addressing device according to the first to third aspects, at least a transparent substrate, a transparent electrode, a photoconductive layer having conductivity by absorbing light, and application of a voltage. And a display portion including a light emitting layer having a function of emitting light.

An optical addressing display according to a fifth aspect is the optical addressing display according to the fourth aspect, in which the transparent substrate, the transparent electrode, the photoconductive layer and the light emitting layer have flexibility. And

In the optical addressing type display according to claim 6, the photoconductive layer and the light emitting layer are made of an organic material.

In the photo-addressing type display according to claim 7, the photo-conductive layer is a P-type semiconductor, and the photo-conductive layer is formed between the electrode to which the positive electrode is applied and the light-emitting layer. I shall.

In the photo-addressing type display according to claim 8, the photo-conductive layer is an N-type semiconductor, and the photo-conductive layer is formed between the electrode to which the negative electrode is applied and the light-emitting layer. I shall.

According to the optical addressing device of the first aspect, it is possible to address light to an arbitrary area with a very low cost device without requiring a complicated manufacturing process.

According to the optical addressing device of the second aspect, the shutter means of the first aspect is configured by applying the liquid crystal using the light scattering mode, so that the optical rotation is used like the TN type liquid crystal. Compared with, the device configuration of the shutter means can be further simplified.

According to the optical addressing device of the third aspect, the shutter means is constituted by using a plurality of minute mirror arrays, each of which can be independently driven. It is possible to reduce the loss due to the transmission of light as compared with the case where the contrast of light and dark is formed.

According to the optical addressing type display of claim 4, it is possible to provide a low-cost display device by eliminating a complicated manufacturing process.

According to the optical addressing type display of claim 5, since the transparent substrate, the transparent electrode, the photoconductive layer and the light emitting layer have flexibility, a force such as bending of the display can be obtained. Even if you join
You can avoid damage.

According to the optical addressing type display of the sixth aspect, since the photoconductive layer and the light emitting layer are made of an organic material, it is possible to form a film by a vacuum vapor deposition method or a wet coating method. Manufacturing cost can be reduced.

According to the optical addressing type display of claim 7, the photoconductive layer is a P type semiconductor, and the photoconductive layer is formed between the electrode to which the positive electrode is applied and the light emitting layer. As a result, holes are efficiently injected into the light emitting layer, and high brightness can be obtained.

According to the optical addressing type display of claim 8, the photoconductive layer is an N type semiconductor, and the photoconductive layer is formed between the electrode to which the negative electrode is applied and the light emitting layer. As a result, electrons are efficiently injected into the light emitting layer, and high brightness can be obtained.

[0022]

BEST MODE FOR CARRYING OUT THE INVENTION The optical addressing device of the present invention will be described in detail below with reference to the drawings. FIG. 1 shows a schematic configuration diagram of an example of an optical addressing device 10 of the present invention. The optical addressing device 10 includes a light source 11 and a shutter unit 12 having a light shutter function for a specific portion of the light source 11.
And a light emitting device 13 comprising:
3 and a reflection device 14 that reflects the light L emitted from the light source 3. The reflection device 14 reflects a light on a side surface of a polygonal prism member that is rotatable in the axial center of the polygonal prism, for example, in the direction of an arrow a in FIG. 1, and has a reflector 15 for controlling the traveling direction of the light. Be prepared. The light emitting device 13 and the reflecting device 14 are arranged such that the light source 11 and the reflecting plate 15 face each other, and the light L emitted from the light source 11 and addressed by the shutter means 12 is reflected by the reflecting plate 15. The light is reflected and irradiates an arbitrary position on the exposure surface 16. The reflecting device 14 and the exposure surface 16 are moved relative to each other by, for example, moving the exposure surface in the direction of arrow A in FIG. Has been done. As the light source 11, any light such as white light or monochromatic light can be applied. When the reflecting device 14 is a rotatable polygonal prism member, the scanning speed can be increased as the polygonal prism member is formed into a polygonal prism having three or more prisms, but the machining becomes difficult. It is preferably about 12 prisms.

When the reflecting device 14 is a polygonal prism member, each side face of the polygonal prism member, that is, the light reflecting surface is not processed in parallel with the rotation axis, and the reflected light is a reflecting surface. This causes a shift, which causes so-called trouble. In order to correct such surface tilt, a correction lens is usually provided between the polygonal prism member and the exposure surface 16. The polygonal members that form the reflection device 14 are 3000 to 30000.
It shall rotate at a speed of about rpm.

Next, the shutter means 12 constituting the optical addressing device 10 of the present invention will be described in detail with reference to the drawings. FIG. 2 shows a schematic view of an example of the shutter means 12 constituting the optical addressing device 10 of the present invention, and FIG. 3 shows a schematic view of the liquid crystal cell 23 constituting the shutter means 12. Here, an example using a TN type liquid crystal is shown.
The shutter means 12 is the first polarizing plate 2 from the light source 11 side.
1, a liquid crystal cell 23, and a second polarizing plate 22 are sequentially arranged. The second polarizing plate 21 selectively transmits light that oscillates only in the vertical direction indicated by the arrow in the figure, and the second polarizing plate 22 transmits light that oscillates only in the horizontal direction indicated by the arrow in the figure. It shall be selectively transparent.

The liquid crystal cell 23 has a structure in which a transparent common electrode 32, a liquid crystal layer 33, and a transparent drive electrode 34 are laminated between the substrates 31 and 35. A line-shaped transparent common electrode 32 is arranged on the substrate 31, and the liquid crystal layer 3 is formed on the transparent common electrode 32.
3 are formed, and linear transparent drive electrodes 34 are arranged in a direction intersecting with the arrangement direction of the transparent common electrode 32.

As shown in FIG. 2, the light L ₀ emitted from the line light source 11 is transmitted by the first polarizing plate 21 only the light L ₁ oscillating in the vertical direction in FIG. This light enters the liquid crystal cell 23, enters the liquid crystal layer 33 from the transparent common electrode 32, and the light transmitted through the portion selected by the transparent drive electrode 34 is vertically oscillated. However, the light transmitted through the non-selected portion is rotated by 90 °. Therefore, the light L ₂ transmitted through the liquid crystal cell 23 is the line light that is selectively polarized. Of the light L ₂ that has passed through the liquid crystal cell 23, the light that oscillates in the vertical direction cannot pass through the second polarizing plate 22, but as described above, it passes through the non-selected portion and is 90 °
The rotated light transmits through the second polarizing plate 22. This is Figure 1
Is the addressed light L, which enables the formation of bright and dark contrast.

Using the optical addressing device 10 having the structure shown in FIGS. 1 to 3, the light is switched on and off at high speed.
By controlling the further rotating reflector device 14,
Exposure can be performed at any position on the exposure surface 16.

Next, an optical addressing device according to a second aspect will be described with reference to FIGS. 4 and 5. In this example, a liquid crystal cell 43 using a light scattering mode is applied as the shutter means 12 shown in FIG. As shown in FIG. 5, the liquid crystal cell 43 includes a transparent common electrode 52, a liquid crystal layer 53, and a transparent drive electrode 5 between substrates 51 and 55.
4 has a configuration in which they are stacked. A line-shaped transparent common electrode 52 is arranged on a substrate 51, a liquid crystal layer 53 is formed on this, and transparent driving electrodes 54 are arranged in a direction intersecting with the transparent common electrode 52. A polymer-dispersed liquid crystal using a light scattering mode is applied to the liquid crystal layer 53. With such a structure, incident light is transmitted / scattered between the selective electrode and the non-selective electrode, thereby forming contrast of brightness and darkness, so that a polarizing plate is not necessary, and in the case of the TN liquid crystal described above. As described above, the device configuration of the shutter unit 12 can be simplified as compared with the case where the optical rotatory power is used.

Next, the address device of claim 3 will be described with reference to FIGS. 6 and 7. In this example,
The shutter means 12 is composed of a plurality of minute mirror arrays. FIG. 7 shows a schematic view of a main part of the shutter means 12. In this example, a plurality of minute mirror arrays 60 each having a light reflecting surface are continuously arranged, and each of them can be driven independently and independently in the direction of the arrow in FIG. 7, and in the incident direction of the light L _0. On the other hand, a predetermined angle can be set. As a result, only the light reflected by any mirror array 60 is selected and emitted from the shutter means 12. Shutter means 1
By configuring 2 as shown in FIGS. 6 and 7, it is possible to reduce the loss due to the transmission of light as compared with the case of using the liquid crystal as described above.

Next, the optical addressing type display according to claim 4 will be described with reference to FIG. The optical addressing display 70 in this example is assumed to be composed of the optical addressing device 10 shown in FIG. 1 and a display section 80 for displaying an image. The display unit 80 includes a transparent substrate 83, a first transparent electrode 81, a photoconductive layer 84 having conductivity by absorbing light, a light emitting layer 85 that emits light when a voltage is applied, and a second transparent electrode 82. It has a structure in which layers are sequentially formed. In this example, the photoconductive layer 84 is formed on the non-display surface side when viewed from the light emitting layer 85 side.

Unlike the structure shown in FIG. 8, the photoconductive layer 84 is used.
However, when the film is formed on the display surface side when viewed from the light emitting layer 85 side, the light L addressed by the optical addressing device 10 transmits the transparent substrate 83, the first transparent electrode 81, and the light emitting layer 85.
And then reaches the photoconductive layer 84. In this case, the loss of light due to transmission increases, so the configuration shown in FIG. 8 is preferable.

Since the photoconductive layer 84 constituting the display section 80 shown in FIG. 8 exhibits conductivity by exposure, a voltage is applied to the light emitting layer 85 by the light addressed to a specific portion, so that the specific portion is exposed. It is made to emit light. For this reason,
An image is displayed on the second transparent electrode 82.

The transparent substrate 83 constituting the display section 80 is preferably formed of a material having high transparency to visible light, such as glass, polycarbonate, acrylic resin, polyester resin or the like.

As the photoconductive layer 84, for example, ZnO, S
Inorganic materials such as i and Se, alloy materials containing these, and organic materials such as phthalocyanine materials, azo materials, and perylene materials are applicable.

The light emitting layer 85 is made of, for example, an inorganic material such as ZnS, a low molecular organic material such as AlQ3 (tris (8-hydroxy-quinolino) aluminum), or a high molecular organic material such as PPV (polyphenylene vinylene). Both are applicable. In particular, in the case of a polymer organic material, many can be formed by a wet coating method instead of vacuum film formation, and the manufacturing cost can be reduced.

In the optical addressing type display shown in FIG. 8, the light addressed by the shutter means 12 makes an arbitrary portion of the photoconductive layer 84 conductive, which is an example corresponding to an image portion. Here, visible light is obtained from the display surface side, but this is also emitted to the non-display surface side.
At this time, if the light radiated to the non-display surface side is diffusely reflected at the interface between the photoconductive layer 84 and the light emitting layer 85, the non-image portion is illuminated, and thus a desired image may not be obtained. . A method for avoiding such an inconvenience is shown below.

First method: In order to prevent irregular reflection at the interface between the light emitting layer 85 and the photoconductive layer 84, disturbance at the interface is prevented during film formation. Second method: A visible light absorption filter layer is formed between the light emitting layer 85 and the photoconductive layer 84. When the positive electrode is applied to the first transparent electrode 81, it is desirable that this visible light absorption filter has a hole transfer ability. On the other hand, when the negative electrode is applied to the first transparent electrode 81, it is desirable that this visible light absorption filter has electron transfer ability. Third method: As a material for forming the photoconductive layer 84, a material having an extremely low absorption capacity for visible light is applied.

Next, an optical addressing display according to a fifth aspect will be described. In this example, it is assumed that the transparent substrate 83, the first transparent electrode 81, the second transparent electrode 82, the photoconductive layer 84, and the light emitting layer 85 shown in FIG. 8 have flexibility. By doing this, even when a force such as bending is applied to the display,
The possibility of breakage can be reduced and durability can be improved.
In this example, as the material for forming the transparent substrate 83, a material having high transparency to visible light, such as polycarbonate, acrylic resin, or polyester resin, is suitable.
Further, as the photoconductive layer 84, for example, an organic material such as a phthalocyanine material, an azo material, or a perylene material can be applied. For the light emitting layer 85, for example, AlQ
Any of a low molecular weight organic material such as 3 (tris (8-hydroxy-quinolino) aluminum) and a high molecular weight organic material such as PPV (polyphenylene vinylene) can be applied.

Next, an optical addressing display according to claim 6 will be described. In this example, the photoconductive layer 84 and the light emitting layer 85 are made of an organic material. With such a configuration, these layers can be formed by a vacuum vapor deposition method, a wet coating method, or the like, and the manufacturing cost can be reduced. In this case, as the light emitting layer 85, for example, AlQ3 (tris (8
Any of low molecular weight organic materials such as -hydroxy-quinolino) aluminum) and high molecular weight organic materials such as PPV (polyphenylene vinylene) can be applied. In particular, when a high molecular organic material is used, it is possible to form a film by a wet coating method instead of a vacuum film forming method, so that the manufacturing cost can be reduced.

Next, an optical addressing display according to a seventh aspect will be described. In this example, it is assumed that the photoconductive layer 84 is a P-type semiconductor and that this layer is formed between the electrode applied to the positive electrode and the light emitting layer 85. With such a configuration, the light emitting layer 85
As a result, holes are injected efficiently, so that high brightness can be obtained.

Next, an optical addressing type display according to claim 8 will be described. In this example, it is assumed that the photoconductive layer 84 is an N-type semiconductor and that this layer is formed between the electrode applied to the negative electrode and the light emitting layer 85. With such a configuration, the light emitting layer 8
Since the electrons are efficiently injected into No. 5, high brightness can be obtained.

Next, using the optical addressing display 70 shown in FIG. 8, the light emitting layer 85 was caused to emit light under the following conditions, and the light emitting efficiency (light emitting intensity / power consumption) was measured. [Example 1] Photoconductive layer 84: x-type metal-free phthalocyanine (P type) First transparent electrode 81: Apply positive electrode Second transparent electrode 82: Apply negative electrode Light emitting layer: PPV (polyphenylene vinylene) Example 2] Photoconductive layer 84: Disazo-based material (N
Type) first transparent electrode 81: negative electrode applied second transparent electrode 82: positive electrode applied light emitting layer: PPV (polyphenylene vinylene)

[0043]

[Chemical 1]

[Comparative Example 1] The positive electrode and the negative electrode of Example 1 were replaced with each other. The other conditions were the same as in Example 1. A relative value was measured when the value of the luminous efficiency obtained in Example 1 was 1. Photoconductive layer 84: x-type metal-free phthalocyanine (P type) First transparent electrode 81: Negative electrode is applied Second transparent electrode 82: Positive electrode is applied Luminescent layer: PPV (polyphenylene vinylene) [Comparative Example 2] The above implementation The positive electrode and the negative electrode of Example 2 were exchanged.
Other conditions were the same as in Example 2. Photoconductive layer 84: Disazo-based material (N
Type) 1st transparent electrode 81: positive electrode is applied 2nd transparent electrode 82: negative electrode is applied Light emitting layer: PPV (polyphenylene vinylene) Relative value when the value of the luminous efficiency obtained in Example 2 is 1 It was measured. The luminous efficiency values of Examples 1 and 2 and Comparative Examples 1 and 2 are shown in Table 1 below.

[0045]

[Table 1]

As shown in [Table 1], when the luminous efficiency of Example 1 was set to 1.0, the luminous efficiency of Comparative Example 1 in which the positive electrode and the negative electrode were replaced was 0.6. Therefore, when the photoconductive layer 84 is a P-type semiconductor and the photoconductive layer 84 is formed between the first transparent electrode 81 to which the positive electrode is applied and the light emitting layer 85, high luminous efficiency is obtained. It was found that

When the issuing efficiency of Example 2 was 1.0, the luminous efficiency of Comparative Example 2 in which the positive electrode and the negative electrode were replaced was 0.6. Therefore, when the photoconductive layer 84 is an N-type semiconductor and the photoconductive layer 84 is formed between the first transparent electrode 81 to which the negative electrode is applied and the light emitting layer 85, it is high. It was found that luminous efficiency can be obtained.

[0048]

According to the optical addressing device of the first aspect, the complicated manufacturing process is not required, and the light can be addressed to an arbitrary region with a very low cost device.

According to the optical addressing device of the second aspect, since the liquid crystal using the light scattering mode is applied as the shutter means of the first aspect, as compared with the case of using the optical rotatory power like the TN type liquid crystal. As a result, the device structure of the shutter means can be further simplified.

According to the optical addressing device of the third aspect, since a plurality of minute mirror arrays, each of which can be independently driven, are used as the shutter means, the transmitted light is bright and dark like when liquid crystal is used. It is possible to reduce the loss due to the transmission of light as compared with the case where the contrast is formed.

According to the optical addressing type display of claim 4, a complicated manufacturing process is unnecessary and a low cost display device can be provided.

According to the optical addressing type display of the fifth aspect, since the transparent substrate, the transparent electrode, the photoconductive layer and the light emitting layer have flexibility, a force such as bending of the display can be obtained. Even when added, damage could be avoided.

According to the optical addressing type display of the sixth aspect, since the photoconductive layer and the light emitting layer are made of an organic material, the film can be formed by vacuum vapor deposition, wet coating, etc., so that the manufacturing cost can be reduced. Was reduced.

According to the optical addressing type display of claim 7, the photoconductive layer is a P-type semiconductor, and the photoconductive layer is formed between the electrode to which the positive electrode is applied and the light emitting layer. Since the holes are efficiently injected into the light emitting layer, a high brightness can be obtained.

According to the eighth aspect of the optical addressing type display, the photoconductive layer is an N-type semiconductor, and the photoconductive layer is formed between the electrode to which the negative electrode is applied and the light emitting layer. As a result, electrons are efficiently injected into the light emitting layer, so that high brightness can be obtained.

[Brief description of drawings]

FIG. 1 shows a schematic configuration diagram of an example of an optical addressing device of the present invention.

FIG. 2 is a schematic configuration diagram of an example of shutter means of the light emitting device.

FIG. 3 is a schematic configuration diagram of a liquid crystal cell that constitutes shutter means.

FIG. 4 is a schematic configuration diagram of another example of shutter means.

FIG. 5 is a schematic configuration diagram of another example of a liquid crystal cell that constitutes shutter means.

FIG. 6 shows a schematic configuration diagram of another example of shutter means.

FIG. 7 is a schematic view of a main part of a shutter unit according to another example.

FIG. 8 shows a schematic configuration diagram of an example of an optical addressing type display of the present invention.

[Explanation of symbols]

10: Optical address device 11 ... Light source 12 ... Shutter means 13 ... Light emitting device 14 ... Reflector 15 ... Reflector 16: exposed surface 21 ... the first polarizing plate 22 ... Second polarizing plate 23 ... Liquid crystal cell 31 ... substrate 32 ... Transparent common electrode 33 ... Liquid crystal layer 34 ... Transparent drive electrode 43 ... Liquid crystal cell 51 ... substrate 52 ... Transparent common electrode 53 ... Liquid crystal layer 54: Transparent drive electrode 55 ... substrate 60 ... Mirror array 70 ... Optical addressing type display 80 ... Display 81: first transparent electrode 82 ... Second transparent electrode 83 ... Transparent substrate 84 ... Photoconductive layer 85: Light emitting layer

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Claims (8)

[Claims] 1. An optical addressing device capable of performing exposure on an arbitrary portion on a plane, which comprises at least a light source and a shutter means having a light shutter function for a specific portion of the light source. It has a light emitting device and a reflecting device for reflecting the light emitted from the light emitting device, and the reflecting device reflects the light from the light emitting device on the side surface of the rotatable polygonal column member. An optical addressing device comprising a reflecting plate, wherein exposure is performed by scanning the reflecting device. 2. The optical address device according to claim 1, wherein the shutter means is made of liquid crystal using a light scattering mode. 3. The optical address device according to claim 1, wherein the shutter means comprises a plurality of mirror arrays that can be driven independently of each other. 4. The optical addressing device according to claim 1, at least a transparent substrate, a transparent electrode, a photoconductive layer having conductivity by absorbing light, and a function of emitting light when a voltage is applied. An optical addressing type display, comprising: a display section comprising a light emitting layer. 5. The optical addressing display according to claim 4, wherein the transparent substrate, the transparent electrode, the photoconductive layer, and the light emitting layer have flexibility. 6. The optical addressing type display according to claim 4, wherein the photoconductive layer and the light emitting layer are made of an organic material. 7. The photoconductive layer is a P-type semiconductor, and the photoconductive layer is formed between the electrode to which the positive electrode is applied and the light emitting layer. Item 7. An optical addressing type display according to items 4-6. 8. The photoconductive layer is an N-type semiconductor, and the photoconductive layer is formed between the electrode to which the negative electrode is applied and the light emitting layer. Item 7. An optical addressing type display according to items 4-6.