JP2003147315A - Adhesive resin paste composition and semiconductor device using the same - Google Patents
Adhesive resin paste composition and semiconductor device using the sameInfo
- Publication number
- JP2003147315A JP2003147315A JP2001351770A JP2001351770A JP2003147315A JP 2003147315 A JP2003147315 A JP 2003147315A JP 2001351770 A JP2001351770 A JP 2001351770A JP 2001351770 A JP2001351770 A JP 2001351770A JP 2003147315 A JP2003147315 A JP 2003147315A
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- silver
- powder
- paste composition
- weight
- coated copper
- Prior art date
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- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Die Bonding (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、ＩＣ、ＬＳＩ等の
半導体素子をリードフレーム、ガラスエポキシ基板等に
接着する、いわゆるダイボンド用として好適な接着用樹
脂ペースト組成物及びこの組成物を用いた半導体装置に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an adhesive resin paste composition suitable for so-called die bonding for adhering semiconductor elements such as IC and LSI to a lead frame, a glass epoxy substrate and the like, and a semiconductor using this composition. Regarding the device.
【０００２】[0002]
【従来の技術】従来、半導体装置を製造する際の半導体
素子とリードフレーム（支持部材）の接合方法として、
（１）金−シリコン共晶体等の無機材料を接着剤として
用いる方法、（２）エポキシ樹脂等の有機材料に銀粉等
を分散させてペースト状態とし、これを接着剤として用
いる方法などがある。しかしながら、前者の方法ではコ
ストが高く、３５０℃から４００℃程度の高い熱処理が
必要であり、また接着剤が硬く、熱応力によってチップ
の破壊が起こるため、最近では銀粉を含んだ銀ペースト
を用いる後者の方が主流となっている。2. Description of the Related Art Conventionally, as a method of joining a semiconductor element and a lead frame (support member) when manufacturing a semiconductor device,
There are (1) a method of using an inorganic material such as a gold-silicon eutectic as an adhesive, (2) a method of dispersing silver powder or the like in an organic material such as an epoxy resin to form a paste, and using this as an adhesive. However, the former method is costly, requires high heat treatment at about 350 ° C. to 400 ° C., the adhesive is hard, and the chip is destroyed by thermal stress. Therefore, recently, a silver paste containing silver powder is used. The latter is the mainstream.
【０００３】しかしながら、この方法では、銀が高価で
あることからペーストも高価になるという問題があっ
た。また、銀は高温多湿の雰囲気下で電解が印加される
と、マイグレーションと称する銀の電析が生じるという
問題もあった。However, this method has a problem that the paste is expensive because silver is expensive. In addition, silver has a problem that when electrolysis is applied in a high temperature and high humidity atmosphere, silver electrodeposition called migration occurs.
【０００４】[0004]
【発明が解決しようとする課題】本発明は、安価な銅を
主成分として使うも、マイグレーション性、接着強度、
導電性に優れる接着用樹脂ペースト組成物を提供するも
のである。また本発明は、導電性の向上効果に優れる接
着用樹脂ペースト組成物を提供するものである。SUMMARY OF THE INVENTION The present invention uses inexpensive copper as a main component,
An adhesive resin paste composition having excellent conductivity is provided. The present invention also provides a resin paste composition for adhesion, which has an excellent effect of improving conductivity.
【０００５】また本発明は、導電性、接着強度及び作業
性のバランスに優れる接着用樹脂ペースト組成物を提供
するものである。さらに本発明は、前記接着用樹脂ペー
スト組成物を使用することにより、信頼性に優れる半導
体装置を提供するものである。The present invention also provides an adhesive resin paste composition having an excellent balance of conductivity, adhesive strength and workability. Further, the present invention provides a semiconductor device having excellent reliability by using the adhesive resin paste composition.
【０００６】[0006]
【課題を解決するための手段】本発明は、（１）エポキ
シ樹脂、（２）硬化剤及び（３）導電性フィラーを含有
してなり、前記導電性フィラーの必須成分が、銅粉又は
銅合金粉の一部を露出して大略銀で被覆された、形状が
扁平状の銀被覆銅粉又は銀被覆銅合金粉であって、前記
銀被覆銅粉又は銀被覆銅合金粉が、（ａ）銀の被覆量が
５〜２５重量％、（ｂ）比重が８．９９〜９．３１及び
（ｃ）銅又は銅合金の露出面積が１０〜６０％のうち、
少なくとも（ａ）〜（ｃ）の１つを満たすものである接
着用樹脂ペースト組成物に関する。The present invention comprises (1) an epoxy resin, (2) a curing agent, and (3) a conductive filler, wherein the essential component of the conductive filler is copper powder or copper. A flattened silver-coated copper powder or a silver-coated copper alloy powder in which a part of the alloy powder is exposed and is coated with substantially silver, wherein the silver-coated copper powder or the silver-coated copper alloy powder is (a) ) Of the coated amount of silver is 5 to 25% by weight, (b) the specific gravity is 8.99 to 9.31 and (c) the exposed area of copper or copper alloy is 10 to 60%,
The present invention relates to an adhesive resin paste composition that satisfies at least one of (a) to (c).
【０００７】また本発明は、前記銀被覆銅粉又は銀被覆
銅合金粉が、銀の被覆量が５〜２５重量％であり、比重
が８．９９〜９．３１であり、かつ、露出面積が１０〜
６０％である接着用樹脂ペースト組成物に関する。In the present invention, the silver-coated copper powder or silver-coated copper alloy powder has a silver coating amount of 5 to 25% by weight, a specific gravity of 8.99 to 9.31, and an exposed area. Is 10
It relates to an adhesive resin paste composition which is 60%.
【０００８】また本発明は、前記銀被覆銅粉又は銀被覆
銅合金粉が、銀の被覆量が５〜２５重量％であり、比重
が８．９９〜９．３１であり、露出面積が１０〜６０％
である接着用樹脂ペースト組成物に関する。また本発明
は、前記銀被覆銅粉又は銀被覆銅合金粉が、長径の平均
粒径１〜３０μｍ、アスペクト比１．５〜２０、タップ
密度２．５〜５．８ｇ／ｃｍ3、相対密度２７〜６３
％、比表面積０．４〜２．０ｍ2／ｇである接着用樹脂
ペースト組成物に関する。According to the present invention, the silver-coated copper powder or silver-coated copper alloy powder has a silver coating amount of 5 to 25% by weight, a specific gravity of 8.99 to 9.31, and an exposed area of 10. ~ 60%
Which is a resin paste composition for adhesion. In the present invention, the silver-coated copper powder or the silver-coated copper alloy powder has an average particle diameter of a long diameter of 1 to 30 μm, an aspect ratio of 1.5 to 20, a tap density of 2.5 to 5.8 g / cm 3 , and a relative density. 27-63
%, And a specific surface area of 0.4 to 2.0 m 2 / g for an adhesive resin paste composition.
【０００９】また本発明は、（１）エポキシ樹脂、
（２）硬化剤及び（３）導電性フィラーの総量１００重
量部に対して、（１）エポキシ樹脂を１０〜８０重量
部、（２）硬化剤を０．５〜２０重量部及び（３）導電
性フィラーを１９．５〜８０重量部含有する前記接着用
樹脂ペースト組成物に関する。さらに本発明は、前記の
いずれか記載の接着用樹脂ペースト組成物を用いて半導
体素子と基板とを接着した後、封止してなる半導体装置
に関する。The present invention also provides (1) an epoxy resin,
(1) Epoxy resin is 10 to 80 parts by weight, (2) Curing agent is 0.5 to 20 parts by weight, and (3) to 100 parts by weight of the total of (2) curing agent and (3) conductive filler. The present invention relates to the adhesive resin paste composition containing 19.5 to 80 parts by weight of a conductive filler. Further, the present invention relates to a semiconductor device obtained by adhering a semiconductor element and a substrate using the adhesive resin paste composition as described above and then encapsulating the same.
【００１０】[0010]
【発明の実施の形態】本発明の接着用樹脂ペースト組成
物は、前記のように、（１）〜（３）成分を含有するも
のであるが、（１）成分として用いられるエポキシ樹脂
としては、２０℃（室温）で液状であり、芳香族基を有
するエポキシ樹脂が好ましく用いられる。２０℃で液状
のエポキシ樹脂としては、希釈剤を低減できる等の点か
ら、粘度の低いもの、具体的には２０℃で粘度が５Ｐａ
・ｓ以下のものが好ましく用いらまた、硬化性の点か
ら、１分子中に２個以上のエポキシ基を有するものが好
ましい。BEST MODE FOR CARRYING OUT THE INVENTION The adhesive resin paste composition of the present invention contains the components (1) to (3) as described above, but the epoxy resin used as the component (1) is An epoxy resin which is liquid at 20 ° C. (room temperature) and has an aromatic group is preferably used. An epoxy resin which is liquid at 20 ° C. has a low viscosity from the viewpoint of reducing the amount of diluent, and specifically, a viscosity of 5 Pa at 20 ° C.
-S or less is preferably used, and those having two or more epoxy groups in one molecule are preferable from the viewpoint of curability.
【００１１】２０℃で液状である、ベンゼン環等の芳香
族基を有するエポキシ樹脂としては、例えば、ビスフェ
ノールＡ型エポキシ樹脂［ＡＥＲ−Ｘ８５０１（旭化成
（株）、商品名）等］、ビスフェノールＦ型エポキシ樹
脂［ＹＤＦ−１７０（東都化成（株）、商品名）等］、
ビスフェノールＡＤ型エポキシ樹脂［Ｒ−１７１０（三
井化学工業（株）、商品名）等］、芳香族系のグリシジ
ルアミン型エポキシ樹脂［ＥＬＭ−１００（住友化学工
業（株）、商品名）等］、レゾルシン型エポキシ樹脂
［デナコールＥＸ−２０１（ナガセ化成工業（株）、商
品名）等］、一般式（１）Examples of the epoxy resin having an aromatic group such as a benzene ring which is liquid at 20 ° C. include bisphenol A type epoxy resin [AER-X8501 (Asahi Kasei Co., Ltd., trade name)], bisphenol F type. Epoxy resin [YDF-170 (Toto Kasei Co., Ltd., trade name), etc.],
Bisphenol AD type epoxy resin [R-1710 (Mitsui Chemicals, Inc., trade name), etc.], aromatic glycidyl amine type epoxy resin [ELM-100 (Sumitomo Chemical Co., Ltd., trade name)], Resorcin-type epoxy resin [Denacol EX-201 (Nagase Kasei Co., Ltd., trade name), etc.], general formula (1)
【化１】
（式中、ｎは０〜５の整数を表す）で示されるエポキシ
樹脂［Ｅ−ＸＬ−２４、Ｅ−ＸＬ−３Ｌ（三井東圧化学
（株）、商品名）等］などが挙げられる。これらのエポ
キシ樹脂は、２種以上を適宜組み合わせて用いることも
できる。[Chemical 1] (In the formula, n represents an integer of 0 to 5) epoxy resin [E-XL-24, E-XL-3L (Mitsui Toatsu Chemicals, Inc., trade name), etc.] and the like. These epoxy resins may be used in combination of two or more kinds.
【００１２】（１）成分は、耐半田リフロー性の点か
ら、（１）〜（３）成分の総量１００重量部に対して１
０〜８０重量部使用することが好ましく、２０〜５０重
量部使用することがより好ましい。また、上記エポキシ
樹脂のうち、ビスフェノールＦ型エポキシ樹脂及びビス
フェノールＡＤ型エポキシ樹脂は、粘度が低く、希釈剤
量を低減できるため好ましい。なお、ビスフェノールＦ
は、２つのヒドロキシフェニル基を結ぶ基がメチレン基
である化合物であり、ビスフェノールＡＤは、２つのヒ
ドロキシフェニル基を結ぶ基が１，１−エチレン基であ
る化合物である。From the standpoint of solder reflow resistance, the component (1) is 1 per 100 parts by weight of the total amount of the components (1) to (3).
It is preferable to use 0 to 80 parts by weight, and more preferably 20 to 50 parts by weight. Among the above epoxy resins, bisphenol F type epoxy resin and bisphenol AD type epoxy resin are preferable because they have low viscosity and can reduce the amount of diluent. In addition, bisphenol F
Is a compound in which the group connecting two hydroxyphenyl groups is a methylene group, and bisphenol AD is a compound in which the group connecting two hydroxyphenyl groups is a 1,1-ethylene group.
【００１３】本発明に用いられる（２）硬化剤には特に
制限はないが、例えば、フェノールノボラック樹脂、フ
ェノールアラルキル樹脂、ジシアンジアミド、二塩基酸
ジヒドラジドなどを用いることができる。上記の硬化剤
は、フェノール樹脂Ｈ−１（明和化成（株）製）、フェ
ノールアラルキル樹脂ＸＬ−２２５（三井化学（株）
製）、ジシアンジアミドＳＰ−１０（日本カーバイド
（株）製）、二塩基酸ジヒドラジドＡＤＨ、ＰＤＨ、Ｓ
ＤＨ、（日本ヒドラジン（株）製）、マイクロカプセル
型硬化剤ノバキュア（旭化成（株）製）などとして市販
されている。また、（２）成分である硬化剤の配合量は
（１）〜（３）成分の総量１００重量部に対して０．５
〜２０重量部が好ましく、１〜１０重量部がより好まし
い。The curing agent (2) used in the present invention is not particularly limited, but for example, phenol novolac resin, phenol aralkyl resin, dicyandiamide, dibasic acid dihydrazide and the like can be used. The above curing agents are phenol resin H-1 (manufactured by Meiwa Kasei Co., Ltd.) and phenol aralkyl resin XL-225 (Mitsui Chemicals, Inc.).
), Dicyandiamide SP-10 (manufactured by Nippon Carbide Co., Ltd.), dibasic acid dihydrazide ADH, PDH, S
It is commercially available as DH, (manufactured by Nippon Hydrazine Co., Ltd.), Microcapsule type curing agent Novacure (manufactured by Asahi Kasei Co., Ltd.) and the like. The compounding amount of the curing agent which is the component (2) is 0.5 with respect to 100 parts by weight of the total amount of the components (1) to (3).
-20 parts by weight is preferable, and 1-10 parts by weight is more preferable.
【００１４】本発明に（３）成分として用いられる導電
性フィラーの必須成分は、銅粉又は銅合金粉の一部を露
出して表面が大略銀で被覆された銀被覆銅粉又は銀被覆
銅合金粉である。それとともに、（ａ）銀の被覆量が５
〜２５重量％、（ｂ）比重が８．９９〜９．３１及び
（ｃ）銅又は銅合金の露出面積が１０〜６０％のうち、
少なくとも（ａ）〜（ｃ）のいずれか１つを満たす銀被
覆銅粉又は銀被覆銅合金粉であることが必要である。全
てを満たすものが好ましい。もし銅粉又は銅合金粉の一
部を露出させないで全面に銀を被覆したものや上記
（ａ）〜（ｃ）のいずれも満たさないものを用いるとマ
イグレーション性が悪くなる。The essential component of the conductive filler used as the component (3) in the present invention is a silver-coated copper powder or a silver-coated copper whose surface is roughly covered with silver by exposing a part of the copper powder or copper alloy powder. Alloy powder. At the same time, (a) silver coverage is 5
25% by weight, (b) specific gravity of 8.99 to 9.31 and (c) copper or copper alloy exposed area of 10 to 60%,
It is necessary that the silver-coated copper powder or the silver-coated copper alloy powder satisfy at least any one of (a) to (c). Those satisfying all are preferable. If a copper powder or a copper alloy powder whose whole surface is covered with silver without being exposed or a powder that does not satisfy any of the above (a) to (c) is used, the migration property is deteriorated.
【００１５】銅粉又は銅合金粉の露出面積は、マイグレ
ーション性、露出部の酸化、導電性等の点から、平均値
として１０〜６０％の範囲が好ましく、１０〜５５％の
範囲がさらに好ましい。銅粉又は銅合金粉は、アトマイ
ズ法で作製された粉体を用いることが好ましく、その粒
径は小さいほど好ましい。例えば平均粒径が１〜３０μ
ｍの範囲の粉体を用いることが好ましく、平均粒径が１
〜２０μｍの範囲の粉体を用いることがより好ましく、
１〜１０μｍの範囲の粉体を用いることがさらに好まし
い。The exposed area of the copper powder or copper alloy powder is preferably in the range of 10 to 60%, and more preferably in the range of 10 to 55% as an average value from the viewpoints of migration property, oxidation of exposed portion, conductivity and the like. . As the copper powder or the copper alloy powder, it is preferable to use a powder produced by an atomizing method, and the smaller the particle size, the more preferable. For example, the average particle size is 1 to 30μ
It is preferable to use powder in the range of m, and the average particle size is 1
It is more preferable to use a powder in the range of
It is more preferable to use powder in the range of 1 to 10 μm.
【００１６】銅粉又は銅合金粉の表面に銀を被覆するに
は、置換めっき、電気めっき、無電解めっき等の方法が
あり、銅粉又は銅合金粉と銀の付着力が高いこと及びラ
ンニングコストが安価であることから、置換めっきで被
覆することが好ましい。銅粉又は銅合金粉の表面への銀
の被覆量及び比重は、耐マイグレーション性、コスト、
導電性向上等の点から銅粉に対して５〜２５重量％、比
重は８．９９〜９．３１の範囲が好ましく、銀の被覆量
１０〜２３重量％、比重は９．０８〜９．２８の範囲が
さらに好ましい。There are methods such as displacement plating, electroplating, and electroless plating for coating the surface of copper powder or copper alloy powder with silver. The adhesion of copper powder or copper alloy powder and silver is high and running Since the cost is low, it is preferable to cover with displacement plating. The coating amount and specific gravity of silver on the surface of copper powder or copper alloy powder are migration resistance, cost,
From the standpoint of improving conductivity, the range of 5 to 25% by weight and the specific gravity of 8.99 to 9.31 are preferable with respect to the copper powder. A range of 28 is more preferred.
【００１７】本発明に用いられる銀被覆銅粉又は銀被覆
銅合金粉の形状は、導電性、熱放散性、接着強度等の点
から扁平状である。使用する扁平状銀被覆銅粉又は銀被
覆銅合金粉は、長径の平均粒径５〜３０μｍ、アスペク
ト比１．５〜２０、タップ密度２．５〜５．８ｇ／ｃｍ
3、相対密度２７〜６３％及び比表面積０．４〜１．３
ｍ2／ｇの範囲のものを用いることが好ましい。The silver-coated copper powder or silver-coated copper alloy powder used in the present invention has a flat shape in terms of conductivity, heat dissipation, adhesive strength and the like. The flat silver-coated copper powder or silver-coated copper alloy powder used has an average major axis diameter of 5 to 30 μm, an aspect ratio of 1.5 to 20, and a tap density of 2.5 to 5.8 g / cm.
3 , relative density 27-63% and specific surface area 0.4-1.3
It is preferable to use one having a range of m 2 / g.
【００１８】さらに、本発明では銀粉を併用することが
できる。導電性、熱放散性、マイグレーション性等の点
から、重量比で扁平状銀被覆銅粉又は銀被覆銅合金粉：
銀粉が３０：７０〜１００：０の範囲が好ましく、重量
比で扁平状銀被覆銅粉又は銀被覆銅合金粉：銀粉が４
０：６０〜１００：０の範囲がさらに好ましい。Further, silver powder can be used in combination in the present invention. From the viewpoint of conductivity, heat dissipation, migration, etc., flat silver-coated copper powder or silver-coated copper alloy powder in weight ratio:
The silver powder is preferably in the range of 30:70 to 100: 0, and the weight ratio of flat silver-coated copper powder or silver-coated copper alloy powder: silver powder is 4
The range of 0:60 to 100: 0 is more preferable.
【００１９】なお上記でいう平均粒径はマスターサイザ
ー・レーザー散乱型粒度分布測定装置（マルバン社製）
により測定し、比表面積はガス吸着式比表面積・細孔径
分布測定装置（ユアサアイオニクス社製）により測定し
た。また、上記に示すタップ密度は、メスシリンダーに
適量の導電粉を投入し、１０００回タッピングを行い、
投入した量と１０００回タッピング後のメスシリンダー
が示す体積から換算して求める。より具体的には、内径
２２ｍｍの１００ｍｌメスシリンダーに、導電粉１００
ｇを投入し、落差２０ｍｍで１分間に６０回の速度で１
０００回行うことにより測定することができる。The average particle size referred to above is a master sizer / laser scattering type particle size distribution measuring device (manufactured by Malvan).
The specific surface area was measured by a gas adsorption type specific surface area / pore size distribution measuring device (manufactured by Yuasa Ionics). Moreover, the tap density shown above is obtained by charging an appropriate amount of conductive powder into a graduated cylinder and performing tapping 1000 times.
It is calculated by converting the charged amount and the volume indicated by the graduated cylinder after 1000 taps. More specifically, the conductive powder 100 is placed in a 100 ml graduated cylinder with an inner diameter of 22 mm.
1 g at a speed of 60 times per minute with a drop of 20 mm
It can be measured by performing 000 times.
【００２０】また、相対密度は次式から求めた。 相対密度（％）＝（タップ密度／真密度）×ｆ×１００ （ただしｆは実測値による補正係数である。）The relative density was obtained from the following equation. Relative density (%) = (tap density / true density) × f × 100 (However, f is a correction coefficient based on the actual measurement value.)
【００２１】本発明におけるアスペクト比とは、導電粉
の粒子の長径と短径の比率（長径／短径）をいう。本発
明においては、粘度の低い硬化性樹脂中に導電粉の粒子
をよく混合し、静置して粒子を沈降させるとともにその
まま樹脂を硬化させ、得られた硬化物を垂直方向に切断
し、その切断面に現れる粒子の形状を電子顕微鏡で拡大
して観察し、少なくとも１００の粒子について一つ一つ
の粒子の長径／短径を求め、それらの平均値をもってア
スペクト比とする。The aspect ratio in the present invention means the ratio of the major axis to the minor axis of the particles of the conductive powder (major axis / minor axis). In the present invention, particles of conductive powder are mixed well in a curable resin having a low viscosity, the resin is cured as it is while the particles are allowed to settle by allowing it to stand, and the resulting cured product is cut in the vertical direction. The shape of the particles appearing on the cut surface is magnified and observed with an electron microscope, the major axis / minor axis of each particle is obtained for at least 100 particles, and the average value thereof is used as the aspect ratio.
【００２２】ここで、短径とは、前記切断面に現れる粒
子について、その粒子の外側に接する二つの平行線の組
み合わせ粒子を挟むように選択し、それらの組み合わせ
のうち最短間隔になる二つの平行線の距離である。一
方、長径とは、前記短径を決する平行線に直角方向の二
つの平行線であって、粒子の外側に接する二つの平行線
の組み合わせのうち、最長間隔になる二つの平行線の距
離である。これらの四つの線で形成される長方形は、粒
子がちょうどその中に納まる大きさとなる。なお、本発
明において行った具体的方法については後述する。Here, the minor axis is selected such that the particles appearing on the cut surface sandwich a combination particle of two parallel lines in contact with the outside of the particle, and the two particles having the shortest interval among the combinations are selected. The distance between parallel lines. On the other hand, the major axis is the distance between the two parallel lines that are the longest distance among the two parallel lines that are in contact with the outside of the particle and are the two parallel lines that are perpendicular to the parallel lines that determine the minor axis. is there. The rectangle formed by these four lines is the size that the particles will fit within. The specific method used in the present invention will be described later.
【００２３】（３）成分の導電性フィラーの配合量は、
接着性、導電性、作業性の点から、（１）〜（３）成分
の総量１００重量部に対して１９．５〜８０重量部が好
ましく、３０〜５０重量部がより好ましい。The compounding amount of the conductive filler of the component (3) is
From the viewpoint of adhesiveness, conductivity, and workability, 19.5 to 80 parts by weight is preferable, and 30 to 50 parts by weight is more preferable, relative to 100 parts by weight of the total amount of the components (1) to (3).
【００２４】更に、本発明の接着用樹脂ペースト組成物
には、必要に応じて硬化促進剤を添加することができ
る。硬化促進剤としては、有機ボロン塩［ＥＭＺ・Ｋ、
ＴＰＰ（北興化学（株）、商品名）等］、三級アミン類
及びその塩［ＤＢＵ、Ｕ−ＣＡＴ１０２、１０６、８３
０、８４０、５００２（いずれもサンアプロ（株）、商
品名）等］、イミダゾール類は［キュアゾール２Ｐ４Ｍ
ＨＺ、Ｃ１７Ｚ、２ＰＺ−Ｏ（いずれも四国化成
（株）、商品名）等］、アセチルアセトン金属塩（金属
としてＡｌ、Ｃｕ、Ｃｏ、Ｎｉ、Ｚｎ等）などが挙げら
れる。必要に応じて添加される硬化促進剤は単独でもよ
く、複数種の硬化促進剤を適宜組み合わせて用いてもよ
い。これらを用いる場合、その量は（１）成分のエポキ
シ樹脂１００重量部に対して０．１〜２０重量部が好ま
しく、１〜１０重量部がより好ましい。Further, a curing accelerator can be added to the adhesive resin paste composition of the present invention, if necessary. As the curing accelerator, organic boron salt [EMZ · K,
TPP (Hokuko Chemical Co., Ltd., trade name), etc., tertiary amines and salts thereof [DBU, U-CAT 102, 106, 83]
0, 840, 5002 (all are San Apro Co., Ltd., trade name), etc., imidazoles are [Curezol 2P4M
HZ, C17Z, 2PZ-O (all are trade names of Shikoku Kasei Co., Ltd.), acetylacetone metal salts (metals such as Al, Cu, Co, Ni, and Zn). The curing accelerator added as necessary may be used alone, or a plurality of types of curing accelerators may be appropriately combined and used. When these are used, the amount thereof is preferably 0.1 to 20 parts by weight, and more preferably 1 to 10 parts by weight, based on 100 parts by weight of the component (1) epoxy resin.
【００２５】本発明になる接着用樹脂ペースト組成物に
は、ペースト組成物の作製時の作業性及び使用時の塗布
製をより良好するため、必要に応じて希釈剤を添加する
ことができる。これらの希釈剤としては、ブチルセロソ
ルブ、カルビトール、酢酸ブチルセロソルブ、酢酸カル
ビトール、エチレングリコールジエチルエーテル、α−
テルピネオールなどの比較的沸点の高い有機溶剤、ＰＧ
Ｅ（日本化薬（株）、商品名）ＰＰ−１０１（東都化成
（株）、商品名）、ＥＤ−５０２、５０３、５０９（旭
電化（株）、商品名）、ＹＥＤ−１２２（油化シェルエ
ポキシ（株）、商品名）、ＫＢＭ−４０３、ＬＳ−７９
７０（信越化学工業（株）、商品名）、ＴＳＬ−８３５
０、ＴＳＬ−８３５５、ＴＳＬ−９９０５（東芝シリコ
ーン（株）、商品名）など１分子中に１〜２個のエポキ
シ基を有する反応性希釈剤が挙げられる。これらは接着
用樹脂ペースト組成物中に５質量％以上配合することが
好ましく、１０〜２０質量％配合することがより好まし
い。A diluent may be added to the adhesive resin paste composition of the present invention, if necessary, in order to improve workability during preparation of the paste composition and coating during use. These diluents include butyl cellosolve, carbitol, butyl cellosolve acetate, carbitol acetate, ethylene glycol diethyl ether, α-
PG with a relatively high boiling point such as terpineol
E (Nippon Kayaku Co., Ltd., trade name) PP-101 (Toto Kasei Co., Ltd., trade name), ED-502, 503, 509 (Asahi Denka Co., Ltd., trade name), YED-122 (Okaka) Shell Epoxy Co., Ltd., trade name), KBM-403, LS-79
70 (Shin-Etsu Chemical Co., Ltd., trade name), TSL-835
0, TSL-8355, TSL-9905 (Toshiba Silicone Co., Ltd., trade name) such as reactive diluents having 1 to 2 epoxy groups in one molecule. These are preferably blended in the adhesive resin paste composition in an amount of 5% by mass or more, more preferably 10 to 20% by mass.
【００２６】更に、本発明になる接着用樹脂ペースト組
成物には、必要に応じてシランカップリング剤、チタン
カップリング剤等の接着力向上剤、ノニオン系界面活性
剤、フッ素系界面活性剤等の濡れ性向上剤、シリコーン
油等の消泡剤、無機イオン交換体等のイオントラップ剤
などを適宜添加することができる。Further, in the adhesive resin paste composition of the present invention, if necessary, an adhesive strength improving agent such as a silane coupling agent or a titanium coupling agent, a nonionic surfactant, a fluorine type surfactant, etc. A wettability improver, a defoaming agent such as silicone oil, an ion trap agent such as an inorganic ion exchanger, and the like can be appropriately added.
【００２７】本発明の接着用樹脂ペースト組成物を製造
するには、前記の（１）、（２）及び（３）成分並びに
必要に応じて添加される硬化促進剤、希釈剤及び各種添
加剤を、一括又は分割して、攪拌機、らいかい機、３本
ロール、プラネタリーミキサー等の分散、溶解装置又は
これらを適宜組み合わせた装置に投入し、必要に応じて
加熱して混合、溶解、解粒混練又は分散して均一なペー
スト状とすればよい。To produce the adhesive resin paste composition of the present invention, the above-mentioned components (1), (2) and (3) and a curing accelerator, a diluent and various additives which are added as necessary. The ingredients are collectively or divided into a stirrer, a raker, a three-roller, a dispersion machine such as a planetary mixer, a dissolution apparatus, or an apparatus in which these are appropriately combined, and heated as necessary to mix, dissolve, and dissolve. The particles may be kneaded or dispersed to form a uniform paste.
【００２８】更に、本発明においては、上記のようにし
て製造した接着用樹脂ペースト組成物をダイボンド材と
して用いて半導体素子と基板とを接着した後、封止する
ことにより半導体装置とすることができる。本発明の接
着用樹脂ペースト組成物を用いて半導体素子をリードフ
レーム等の基板と接着させるには、まず、基板上に接着
用樹脂ペースト組成物をディスペンス法、スクリーン印
刷法、スタンピング法などにより塗布した後、半導体素
子を圧着し、その後、オーブン、ヒートブロック等の加
熱装置を用いて、例えば１２０〜２５０℃に加熱硬化す
ることにより行うことができる。さらにワイヤボンド工
程を経た後、通常の方法、例えば各種封止剤を用いて封
止することにより完成された半導体装置とすることがで
きる。Further, in the present invention, the resin paste composition for bonding produced as described above is used as a die bond material to bond a semiconductor element and a substrate, and then sealed to obtain a semiconductor device. it can. To bond a semiconductor element to a substrate such as a lead frame using the adhesive resin paste composition of the present invention, first, the adhesive resin paste composition is applied onto the substrate by a dispensing method, a screen printing method, a stamping method, or the like. After that, the semiconductor element is pressure-bonded, and then it is heated and cured to 120 to 250 ° C. by using a heating device such as an oven and a heat block. Further, after a wire bonding step, a completed semiconductor device can be obtained by an ordinary method, for example, encapsulation using various encapsulants.
【００２９】[0029]
【実施例】以下、本発明の実施例及びその比較例によっ
て本発明をさらに具体的に説明する。なお、以下の実施
例及び比較例で用いた材料は、下記の方法で作製したも
の、あるいは入手したものである。EXAMPLES The present invention will be described in more detail with reference to Examples and Comparative Examples thereof. The materials used in the following examples and comparative examples are those produced by the following method or obtained.
【００３０】（１）エポキシ樹脂
ビスフェノールＦ型エポキシ樹脂（東都化成（株）、商
品名ＹＤＦ−１７０）、ビスフェノールＡＤ型エポキシ
樹脂（三井化学（株）、商品名Ｒ−１７１０）
（２）フェノール樹脂溶液
フェノールノボラック樹脂（明和化成（株）、商品名Ｈ
−１、ＯＨ当量＝１６０）３重量部及び希釈剤としてア
ルキルフェニルグリシジルエーテル（東都化成（株）、
商品名ＰＰ−１０１、エポキシ当量＝２３０）２重量部
を１００℃に加熱し、１時間撹拌を続け、均一なフェノ
ール樹脂を得た。(1) Epoxy resin Bisphenol F type epoxy resin (Toto Kasei Co., Ltd., trade name YDF-170), Bisphenol AD type epoxy resin (Mitsui Chemicals Co., Ltd., trade name R-1710) (2) Phenolic resin Solution phenol novolac resin (Meiwa Kasei Co., Ltd., trade name H)
-1, OH equivalent = 160) 3 parts by weight and alkylphenyl glycidyl ether (Toto Kasei Co., Ltd.) as a diluent.
2 parts by weight of trade name PP-101, epoxy equivalent = 230) was heated to 100 ° C. and stirring was continued for 1 hour to obtain a uniform phenol resin.
【００３１】（３）希釈剤
アルキルフェニルグリシジルエーテル（東都化成
（株）、商品名ＰＰ−１０１、エポキシ当量＝２３０）
（４）硬化促進剤
２−フェニル−４−メチル−５−ヒドロキシイミダゾー
ル（四国化成（株）、商品名２Ｐ４ＭＨＺ）(3) Diluent Alkyl phenyl glycidyl ether (Toto Kasei Co., Ltd., trade name PP-101, epoxy equivalent = 230) (4) Curing accelerator 2-phenyl-4-methyl-5-hydroxyimidazole (Shikoku Kasei Co., Ltd., product name 2P4MHZ)
【００３２】（５）銀被覆銅粉
アトマイズ法で作製した平均粒径５．１μｍの球状銅粉
（日本アトマイズ加工（株）、商品名ＳＦＲ−Ｃｕ）を
希塩酸及び純水で洗浄した後、水1リットルあたりＡｇＣ
Ｎ ８０ｇ及びＮａＣＮ７５ｇ含むめっき溶液で球状銅
粉に対して銀の量が１８重量％、比重が９．２０になる
ように置換めっきを行い、水洗、乾燥して銀めっき銅粉
を得た。この後、２リットルのボールミル容器内に上記で
得た銀めっき銅粉７５０ｇ及び直径が１０ｍｍのジルコ
ニアボール３ｋｇを投入し、８時間回転させて、１０００
回のタッピングによるタップ密度が３．７９ｇ／ｃ
ｍ3、相対密度が４８％、アスペクト比が平均５．２及
び長径の平均粒径が７．７μｍの扁平状銀被覆銅粉を得
た。(5) Silver-coated copper powder Spherical copper powder having an average particle size of 5.1 μm (trade name: SFR-Cu, manufactured by Nippon Atomize Co., Ltd.) prepared by atomizing was washed with diluted hydrochloric acid and pure water, and then washed with water. AgC per liter
The plating solution containing 80 g of N and 75 g of NaCN was subjected to displacement plating so that the amount of silver was 18% by weight and the specific gravity was 9.20 with respect to the spherical copper powder, washed with water, and dried to obtain silver-plated copper powder. Then, 750 g of the silver-plated copper powder obtained above and 3 kg of zirconia balls having a diameter of 10 mm were placed in a 2 liter ball mill container and rotated for 8 hours to 1000
Tap density of 3.79 g / c by tapping once
A flat silver-coated copper powder having m 3 , a relative density of 48%, an average aspect ratio of 5.2 and an average major axis diameter of 7.7 μm was obtained.
【００３３】得られた銀被覆銅粉の粒子を５個取り出
し、走査型オージェ電子分光分析装置で定量分析して銅
の露出面積について調べたところ１０〜６０％の範囲で
平均が４１％であった。なお、本実施例におけるアスペク
ト比の具体的測定法を以下に示す。低粘度のエポキシ樹
脂（ビューラー社）の主剤（Ｎｏ．１０−８１３０）８
ｇと硬化剤（Ｎｏ．１０−８１３２）２ｇを混合し、こ
こへ導電粉２ｇを混合して良く分散させ、そのまま３０
℃で真空脱泡した後、１０時間３０℃で静置して粒子を
沈降させ硬化させた。その後、得られた硬化物を垂直方向
に切断し、切断面を電子顕微鏡で１０００倍に拡大して
切断面に現れた１５０個の粒子について長径／短径を求
め、それらの平均値をもって、アスペクト比とした。Five particles of the obtained silver-coated copper powder were taken out and quantitatively analyzed by a scanning Auger electron spectroscopy analyzer to examine the exposed area of copper. The average was 41% in the range of 10 to 60%. It was The specific method of measuring the aspect ratio in this example is shown below. Base agent (No. 10-8130) of low-viscosity epoxy resin (Buehler) 8
g and a curing agent (No. 10-8132) 2 g are mixed, and conductive powder 2 g is mixed and well dispersed therein.
After vacuum degassing at 0 ° C, the particles were allowed to settle by standing at 30 ° C for 10 hours to cure. After that, the obtained cured product is cut in the vertical direction, the cut surface is magnified 1000 times with an electron microscope, and the major axis / minor axis of 150 particles appearing on the cut surface is determined. Ratio.
【００３４】（６）銀粉
銀粉（（株）徳力化学研究所、商品名ＴＣＧ−１）
（７）銀被覆銅粉−１〜２
前記（５）の銀被覆銅粉と同様の球状銅粉を用い、Ａｇ
ＣＮ 及びＮａＣＮの量を変え球状銅粉に対して銀の量
が２重量％、比重が８．９５及び銀の量が３２重量％、
比重が９．４２になるように置換めっきを行い、水洗、
乾燥して銀めっき銅粉を得た。(6) Silver powder Silver powder (TCG-1 Co., Ltd., trade name TCG-1) (7) Silver-coated copper powder-1 to 2 The same spherical copper powder as the silver-coated copper powder of (5) above is used. Used, Ag
By changing the amounts of CN and NaCN, the amount of silver is 2% by weight, the specific gravity is 8.95 and the amount of silver is 32% by weight with respect to the spherical copper powder.
Perform displacement plating so that the specific gravity becomes 9.42, wash with water,
It was dried to obtain silver-plated copper powder.
【００３５】この後、（５）の扁平状銀被覆銅粉と同様
の操作を行い、銀の被覆量が２重量％、比重が８．９
５、タップ密度が３．８１ｇ／ｃｍ3、相対密度が４８
％、アスペクト比が平均５．２、長径の平均粒径が７．
６μｍ、露出面積の平均が８２％の扁平状銀被覆銅粉−
１、銀の被覆量が３２重量％、比重が９．４２、タップ
密度が３．６０ｇ／ｃｍ3、相対密度が４８％、アスペ
クト比が平均５．２、長径の平均粒径が７．３μｍ、露
出面積の平均が２％の扁平状銀被覆銅粉−２を得た。Thereafter, the same operation as in the flat silver-coated copper powder of (5) was performed, and the silver coating amount was 2% by weight and the specific gravity was 8.9.
5, tap density 3.81 g / cm 3 , relative density 48
%, The aspect ratio is 5.2 on average, and the average diameter of major axis is 7.
6 μm, flat silver-coated copper powder with an average exposed area of 82% −
1, the coating amount of silver is 32% by weight, the specific gravity is 9.42, the tap density is 3.60 g / cm 3 , the relative density is 48%, the aspect ratio is 5.2 on average, and the average diameter of major axis is 7.3 μm. A flat silver-coated copper powder-2 having an average exposed area of 2% was obtained.
【００３６】実施例１〜２及び比較例１〜２
表１に示す配合割合で各成分を混合し、３本ロールを用
いて混練した後、６６６．６１Ｐａ（５トル（Ｔｏｒ
ｒ））以下で１０分間脱泡処理を行い、接着用樹脂ペー
スト組成物を得た。Examples 1 and 2 and Comparative Examples 1 and 2 The respective components were mixed in the mixing ratios shown in Table 1 and kneaded using a three-roll mill, and then 666.61 Pa (5 Torr (Tor)
r)) Defoaming treatment was performed for 10 minutes at the following to obtain a resin paste composition for adhesion.
【００３７】この接着用樹脂ペースト組成物の特性（粘
度、接着強度、ピール強度、体積固有抵抗及びマイグレ
ーション性）を下記の方法で測定し、結果を表１に示
す。
（１）粘度
ＥＨＤ型回転粘度計（東京計器（株））を用いて２５℃
における粘度（Ｐａ・ｓ）を測定した。The properties (viscosity, adhesive strength, peel strength, volume resistivity and migration property) of this adhesive resin paste composition were measured by the following methods, and the results are shown in Table 1. (1) Viscosity EHD type rotational viscometer (Tokyo Keiki Co., Ltd.) at 25 ° C
The viscosity (Pa · s) at was measured.
【００３８】（２）接着強度
接着用樹脂ペースト組成物をＡｇめっき付き銅リードフ
レーム上に約８０μｇ塗布し、この上に２ｍｍ×２ｍｍ
のＳｉチップ（厚さ０．４ｍｍ）を圧着し、更に２００
℃に設定したヒートブロック上に載せ、６０秒加熱し
た。この試料について自動接着力試験装置（Ｄａｇｅ
社、マイクロテスター）を用いて室温における剪断接着
強度（ｋｇ／チップ）を測定した。(2) Adhesion Strength About 80 μg of the resin paste composition for adhesion was applied on a copper lead frame with Ag plating, and 2 mm × 2 mm was applied thereon.
Si chips (thickness 0.4 mm) are crimped and then 200
It was placed on a heat block set at 0 ° C. and heated for 60 seconds. About this sample, automatic adhesive strength tester (Dage
The shear adhesive strength (kg / chip) at room temperature was measured using a Micro Tester manufactured by K.K.
【００３９】（３）ピール強度
接着用樹脂ペースト組成物を４２アロイ上に約１．０ｍ
ｍｇ塗布し、この上に８ｍｍ×８ｍｍのＳｉチップ（厚
さ０．４ｍｍ）を圧着し、更に２００℃に設定したヒー
トブロック上に載せ、６０秒加熱した。この試料につい
て自動接着力試験装置（日立化成工業（株））を用いて
２４０℃における引き剥がし強さ（ｋｇ／チップ）を測
定した。(3) Peel strength Adhesive resin paste composition is applied to 42 alloy to about 1.0 m.
8 mg × 8 mm Si chip (thickness 0.4 mm) was pressure-bonded onto this, further placed on a heat block set at 200 ° C., and heated for 60 seconds. The peel strength (kg / chip) at 240 ° C. of this sample was measured using an automatic adhesive strength tester (Hitachi Chemical Co., Ltd.).
【００４０】（４）体積固有抵抗
接着用樹脂ペースト組成物をガラス板上に図１のように
塗布し、更に１８０℃１時間乾燥機で加熱した。この試
料について抵抗値、厚さ、幅及び長さを測定し、体積固
有抵抗を算出した。(4) The resin paste composition for volume resistivity adhesion was applied on a glass plate as shown in FIG. 1, and further heated at 180 ° C. for 1 hour in a dryer. The resistance value, thickness, width and length of this sample were measured, and the volume resistivity was calculated.
【００４１】（５）マイグレーション性
ウォータードロップ法でマイグレーション性を評価し
た。接着用樹脂ペースト組成物をよく洗浄したガラス板
上に図２のように塗布し、更に１８０℃１時間乾燥機で
加熱した。この電極間上に純水で湿らせたろ紙を置き、
１０Ｖ印加した。印加中、ろ紙が乾かないように純水を
随時ろ紙に滴下し、電極間に１００μＡ流れるまでの時
間を測定した。(5) Migration property The migration property was evaluated by the water drop method. The adhesive resin paste composition was applied onto a well-washed glass plate as shown in FIG. 2, and further heated at 180 ° C. for 1 hour in a dryer. Place a filter paper moistened with pure water between these electrodes,
10V was applied. During the application, pure water was dropped on the filter paper at any time so that the filter paper did not dry, and the time until 100 μA was passed between the electrodes was measured.
【００４２】表１に示した結果から、本発明の銀被覆銅
粉を用いた実施例１及び２は、導電性が高く、耐マイグ
レーション性が良好であり、接着強度も良好であること
が確認された。From the results shown in Table 1, it was confirmed that Examples 1 and 2 using the silver-coated copper powder of the present invention have high conductivity, good migration resistance and good adhesive strength. Was done.
【００４３】[0043]
【表１】 [Table 1]
【００４４】[0044]
【発明の効果】本発明の接着用樹脂ペースト組成物は、
マイグレーション性、接着強度、導電性に優れる。また
本発明の接着用樹脂ペースト組成物は、導電性の向上効
果に優れる。また本発明の接着用樹脂ペースト組成物
は、導電性、接着強度及び作業性のバランスに優れる。
さらに本発明の半導体装置は、信頼性に優れる。The adhesive resin paste composition of the present invention is
Excellent migration, adhesive strength and conductivity. Further, the adhesive resin paste composition of the present invention is excellent in the effect of improving conductivity. Moreover, the adhesive resin paste composition of the present invention has an excellent balance of conductivity, adhesive strength and workability.
Further, the semiconductor device of the present invention has excellent reliability.
【図１】ガラス板上に体積固有抵抗測定回路を形成した
状態を示す平面図である。FIG. 1 is a plan view showing a state in which a volume resistivity measuring circuit is formed on a glass plate.
【図２】ガラス板上にウォータードロップ法を行うため
の回路を形成した状態を示す平面図である。FIG. 2 is a plan view showing a state in which a circuit for performing a water drop method is formed on a glass plate.
フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｈ０１Ｌ 21/52 Ｈ０１Ｌ 21/52 Ｅ Ｆターム(参考） 4J037 AA04 AA06 CA03 FF11 4J040 EB052 EC061 HA066 HA076 HC12 HC15 JB10 KA16 LA09 MA10 NA20 5F047 BA34 BA52 BB13 BB16 Front page continuation (51) Int.Cl. 7 Identification code FI theme code (reference) H01L 21/52 H01L 21/52 EF term (reference) 4J037 AA04 AA06 CA03 FF11 4J040 EB052 EC061 HA066 HA076 HC12 HC15 JB10 KA16 LA09 MA10 NA20 5F047 BA34 BA52 BB13 BB16
Claims (5)
（３）導電性フィラーを含有してなり、前記導電性フィ
ラーの必須成分が、銅粉又は銅合金粉の一部を露出して
大略銀で被覆された、形状が扁平状の銀被覆銅粉又は銀
被覆銅合金粉であって、前記銀被覆銅粉又は銀被覆銅合
金粉が、（ａ）銀の被覆量が５〜２５重量％、（ｂ）比
重が８．９９〜９．３１及び（ｃ）銅又は銅合金の露出
面積が１０〜６０％のうち、少なくとも（ａ）〜（ｃ）
の１つを満たすものである接着用樹脂ペースト組成物。1. An epoxy resin, (2) a curing agent and (3) a conductive filler are contained, and the essential component of the conductive filler exposes a part of the copper powder or the copper alloy powder. Which is a flat-shaped silver-coated copper powder or silver-coated copper alloy powder coated with substantially silver, the silver-coated copper powder or the silver-coated copper alloy powder having (a) a silver coating amount of 5 to At least (a) to (c) out of 25% by weight, (b) specific gravity of 8.99 to 9.31 and (c) 10 to 60% of exposed area of copper or copper alloy.
An adhesive resin paste composition which satisfies one of the above.
被覆量が５〜２５重量％であり、比重が８．９９〜９．
３１であり、かつ、露出面積が１０〜６０％である請求
項１記載の接着用樹脂ペースト組成物。2. The silver-coated copper powder or silver-coated copper alloy powder has a silver coating amount of 5 to 25% by weight and a specific gravity of 8.99 to 9.
The adhesive resin paste composition according to claim 1, which has an exposed area of 10 to 60%.
の平均粒径１〜３０μｍ、アスペクト比１．５〜２０、
タップ密度２．５〜５．８ｇ／ｃｍ3、相対密度２７〜
６３％、比表面積０．４〜２．０ｍ2／ｇである請求項
１又は２記載の接着用樹脂ペースト組成物。3. A silver-coated copper powder or a silver-coated copper alloy powder, wherein the long diameter has an average particle diameter of 1 to 30 μm and an aspect ratio of 1.5 to 20.
Tap density 2.5 to 5.8 g / cm 3 , relative density 27 to
The adhesive resin paste composition according to claim 1, which has a specific surface area of 63% and a specific surface area of 0.4 to 2.0 m 2 / g.
（３）導電性フィラーの総量１００重量部に対して、
（１）エポキシ樹脂を１０〜８０重量部、（２）硬化剤
を０．５〜２０重量部及び（３）導電性フィラーを１
９．５〜８０重量部含有する請求項１、２又は３記載の
接着用樹脂ペースト組成物。4. A total amount of 100 parts by weight of (1) epoxy resin, (2) curing agent and (3) conductive filler,
(1) 10 to 80 parts by weight of epoxy resin, (2) 0.5 to 20 parts by weight of curing agent, and (3) 1 part of conductive filler
The resin paste composition for adhesion according to claim 1, 2 or 3, containing 9.5 to 80 parts by weight.
脂ペースト組成物を用いて半導体素子と基板とを接着し
た後、封止してなる半導体装置。5. A semiconductor device obtained by bonding a semiconductor element and a substrate using the bonding resin paste composition according to any one of claims 1 to 4 and then sealing the same.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001351770A JP2003147315A (en) | 2001-11-16 | 2001-11-16 | Adhesive resin paste composition and semiconductor device using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001351770A JP2003147315A (en) | 2001-11-16 | 2001-11-16 | Adhesive resin paste composition and semiconductor device using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003147315A true JP2003147315A (en) | 2003-05-21 |
Family
ID=19164038
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001351770A Pending JP2003147315A (en) | 2001-11-16 | 2001-11-16 | Adhesive resin paste composition and semiconductor device using the same |
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| Country | Link |
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| JP (1) | JP2003147315A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005060656A (en) * | 2003-07-28 | 2005-03-10 | Murata Mfg Co Ltd | Conductive adhesive and conductive adhesive-cured product |
| JP2011058050A (en) * | 2009-09-10 | 2011-03-24 | Ricoh Co Ltd | Composite metal nanoparticle and method for producing the same, and multiphoton absorption material or multiphoton absorption reaction auxiliary containing composite metal nanoparticle |
-
2001
- 2001-11-16 JP JP2001351770A patent/JP2003147315A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005060656A (en) * | 2003-07-28 | 2005-03-10 | Murata Mfg Co Ltd | Conductive adhesive and conductive adhesive-cured product |
| JP2011058050A (en) * | 2009-09-10 | 2011-03-24 | Ricoh Co Ltd | Composite metal nanoparticle and method for producing the same, and multiphoton absorption material or multiphoton absorption reaction auxiliary containing composite metal nanoparticle |
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